CN102928893B - Manufacturing method for optical planar substrate - Google Patents

Abstract

The invention belongs to the technical field of optical instruments and accessories, and in particular relates to a method for manufacturing an optical flat substrate; it is characterized in that it includes the following steps in sequence: selecting raw materials, preforming, profiling, grinding, polishing, cleaning, test. The present invention adopts the combination of physics and chemistry to make the optical flat substrate, and most of the processes are carried out by machines, with little manual participation; therefore, the present invention has the following beneficial effects: the production time of the optical flat substrate is short, and the difference between products is small , Suitable for industrial large-scale application, high efficiency, and the flatness, parallelism, and roughness parameters of the flat substrate produced are good.

Description

A kind of manufacturing method of optical planar substrate

technical field

The invention belongs to the technical field of optical instruments and accessories, in particular to a method for manufacturing an optical flat substrate.

Background technique

With the advancement of science and technology, the use of optical instruments is increasing, and optical instruments usually use flat substrates, which can be seen everywhere around us, such as: CD, HD, LD, VCD, DVD, CD -CD substrates such as ROM and CVD; mobile phone panels, MP3 panels, camera slides, precision instrument panels, etc., all belong to planar substrates; in the prior art, the production of planar substrates is more manual, so the production The time is long, the difference between products is large, the efficiency is low, and the flatness, parallelism, and roughness of the flat substrate produced are relatively poor; however, the society's demand growth for this type of product is quite amazing. Therefore, the existing technology can no longer meet the requirements.

Contents of the invention

In order to solve the above problems, the purpose of this invention is to provide a kind of preparation method of optical planar substrate, and it can improve production efficiency greatly, and it adopts following technical scheme to realize:

A method for making an optical planar substrate is characterized in that it comprises the following steps carried out in sequence:

Step 1: Select raw materials: select the substrate motherboard with a thickness of 0.1mm to 1.0mm;

Step 2: Preforming: Use a dicing machine to draw the substrate blank of the required size on the substrate master;

Step 3: Profiling: use a core taking machine to core the substrate blank to achieve the expected contour;

Step 4: Grinding: Use a spherical grinder or a double-sided grinder to grind the core slices. The grinding is carried out in a class 100 clean room at a temperature of 20°C to 28°C; the grinding is carried out in grinding oil. Complete the formation of abrasive sheets;

Step 5: Polishing: Use a ring polishing machine to polish the surface of the abrasive sheet; polishing is carried out in a polishing solution, the polishing time is 3 minutes to 10 minutes, the polishing temperature is 32°C-40°C, and the polishing pressure is 150-250g /cm ² ; Polishing is completed to form a polishing sheet;

Step 6: Cleaning: Use an ultrasonic cleaning machine to clean the polished sheet, clean and dry to obtain a cleaned sheet;

Step 7: Inspection: Carry out roughness, parallelism, flatness, thickness, surface cracks, and light transmittance inspections on the cleaning sheet, and select all qualified ones to form an optical flat substrate.

A method for making an optical planar substrate is characterized in that it comprises the following steps carried out in sequence:

Step 1: Select raw materials: select the substrate motherboard with a thickness of 0.1mm to 1.0mm;

Step 2: Preforming: Use a dicing machine to draw the substrate blank of the required size on the substrate master;

Step 3: Profiling: use a core taking machine to core the substrate blank to achieve the expected contour;

Step 4: Grinding: Use a spherical grinder or a double-sided grinder to grind the core slices. The grinding is carried out in a class 100 clean room at a temperature of 20°C to 28°C; the grinding is carried out in grinding oil. Complete the formation of abrasive sheets;

Step 5: Polishing: Use a ring polishing machine to polish the surface of the abrasive sheet; polishing is carried out in a polishing solution, the polishing time is 3 minutes to 10 minutes, the polishing temperature is 32°C-40°C, and the polishing pressure is 150-250g /cm ² ; Polishing is completed to form a polishing sheet;

Step 6: Cleaning: Use an ultrasonic cleaning machine to clean the polished sheet, clean and dry to obtain a cleaned sheet;

Step 7: Sticking film: Paste a light-transmitting film on the surface of the cleaning sheet to form a sticking film substrate;

Step 8: Inspection: Check the roughness, parallelism, flatness, thickness, surface cracks, and light transmittance of the film substrate, and select all qualified ones to form an optical flat substrate.

The above-mentioned method for making an optical flat substrate is characterized in that the polishing liquid has the following components: 15% to 40% (weight) of silicon dioxide; ≤0.3% (weight) of sodium oxide; ≤40ppb of heavy metals and impurities; Pure water: 1 to 20 times the weight of silicon dioxide, sodium oxide, heavy metals and impurities; the density of the polishing solution is 1.1 g/ml to 1.2 g/ml.

The manufacturing method of the above-mentioned optical planar substrate is characterized in that the heavy metal in the polishing solution is copper.

The preparation method of the above-mentioned optical flat substrate is characterized in that the grinding oil contains the following components by weight: 10% to 30% of borate, 5% to 20% of polyol, 5% of anionic surfactant %~15%, lubricant 5%~10%, rust inhibitor 5%~10%, deionized water or purified water 15%~60%, sodium oxide 5%~10%.

The preparation method of the above-mentioned optical planar substrate is characterized in that the polyhydric alcohol is ethylene glycol or glycerol or sorbitol; the anionic surfactant is carboxylate or sulfate ester salt or sulfonate or phosphoric acid ester salt; the lubricant is such as silicone oil or silicate ester or phosphoric acid ester or fluorine oil; the rust inhibitor is a commercially available YG-901 type rust inhibitor.

The present invention adopts the combination of physics and chemistry to make the optical flat substrate, and most of the processes are carried out by machines, with little manual participation; therefore, the present invention has the following beneficial effects: the production time of the optical flat substrate is short, and the difference between products is small , Suitable for large-scale industrial applications, high efficiency, and the flatness, parallelism, and roughness parameters of the flat substrate produced are good.

Description of drawings

Fig. 1 is the functional block diagram of embodiment example 1 of the present invention;

Fig. 2 is a functional block diagram of Embodiment 2 of the present invention.

Detailed ways

The present invention will be described in further detail below in conjunction with the accompanying drawings.

Implementation example 1

Please see Fig. 1, a kind of preparation method of optical planar substrate is characterized in that it comprises the following steps of carrying out successively:

Step 10: Select raw materials: select the substrate motherboard with a thickness of 0.1mm to 1.0mm;

Step 20: Preforming: use a dicing machine to draw a substrate blank of the required size on the substrate motherboard;

Step 30: profiling: using a coring machine to core the substrate blank to achieve the desired contour;

Step 40: Grinding: Use a spherical grinder or a double-sided grinder to grind the core pieces. The grinding is carried out in a class 100 clean room at a temperature of 20°C to 28°C; the grinding is carried out in grinding oil. Complete the formation of abrasive sheets;

Step 50: Polishing: Use a ring polishing machine to polish the surface of the abrasive sheet; polishing is carried out in a polishing solution, the polishing time is 3 minutes to 10 minutes, the polishing temperature is 32 ° C ~ 40 ° C, and the polishing pressure is 150 ~ 250 g /cm ² ; Polishing is completed to form a polishing sheet;

Step 60: Cleaning: Use an ultrasonic cleaning machine to clean the polished sheet, clean and dry to obtain a cleaned sheet;

Step 70: Inspection: Carry out roughness, parallelism, flatness, thickness, surface cracks, and light transmittance inspections on the cleaning sheet, and select all qualified ones to form an optical flat substrate.

Implementation Example 2

Please see Fig. 2, a kind of preparation method of optical planar substrate is characterized in that it comprises the following steps of carrying out successively:

Step 10: Select raw materials: select the substrate motherboard with a thickness of 0.1mm to 1.0mm;

Step 20: Preforming: use a dicing machine to draw a substrate blank of the required size on the substrate motherboard;

Step 30: profiling: using a coring machine to core the substrate blank to achieve the desired contour;

Step 40: Grinding: Use a spherical grinder or a double-sided grinder to grind the core pieces. The grinding is carried out in a class 100 clean room at a temperature of 20°C to 28°C; the grinding is carried out in grinding oil. Complete the formation of abrasive sheets;

Step 50: Polishing: Use a ring polishing machine to polish the surface of the abrasive sheet; polishing is carried out in a polishing solution, the polishing time is 3 minutes to 10 minutes, the polishing temperature is 32 ° C ~ 40 ° C, and the polishing pressure is 150 ~ 250 g /cm ² ; Polishing is completed to form a polishing sheet;

Step 60: Cleaning: Use an ultrasonic cleaning machine to clean the polished sheet, clean and dry to obtain a cleaned sheet;

Step 70: Sticking the film: Paste a light-transmitting film on the surface of the cleaning sheet to form a film base;

Step 80: Inspection: Check the roughness, parallelism, flatness, thickness, surface cracks, and light transmittance of the film substrate, and select all qualified ones to form an optical flat substrate.

Certainly, the preparation method of any one of the above-mentioned optical planar substrates is characterized in that the polishing liquid has the following components: silicon dioxide 15% to 40% (weight); sodium oxide≤0.3% (weight); heavy metal and impurities≤40ppb; pure water: 1-20 times the sum of the weight of silicon dioxide, sodium oxide, heavy metals and impurities; the density of the polishing liquid is 1.1g/ml-1.2g/ml.

Furthermore, the above-mentioned method for manufacturing an optical flat substrate is characterized in that the heavy metal in the polishing solution is copper.

Certainly, the preparation method of any one of the above-mentioned optical plane substrates is characterized in that the grinding oil contains the following components by weight: 10% to 30% of borate, 5% to 20% of polyhydric alcohol, Anionic surfactant 5% to 15%, lubricant 5% to 10%, rust inhibitor 5% to 10%, deionized water or purified water 15% to 60%, sodium oxide 5% to 10%.

Further, the above-mentioned method for making an optical planar substrate is characterized in that the polyhydric alcohol is ethylene glycol or glycerin or sorbitol; the anionic surfactant is a carboxylate or sulfate ester salt or sulfonate Or phosphate ester salt; Described lubricant is as silicone oil or silicate or phosphoric acid ester or fluorine oil; Described antirust agent is commercially available YG-901 type antirust agent.

The present invention adopts the combination of physics and chemistry to make the optical flat substrate, and most of the processes are carried out by machines, with little manual participation; therefore, the present invention has the following beneficial effects: the production time of the optical flat substrate is short, and the difference between products is small , Suitable for large-scale industrial applications, high efficiency, and the flatness, parallelism, and roughness parameters of the flat substrate produced are good.

The present invention is not limited to the best implementation mode above, it should be understood that the concept of the present invention can be implemented in other forms, and they also fall within the protection scope of the present invention.

Claims (4)

1. a method for making for optical flat substrate, is characterized in that it includes the following steps of carrying out successively:

The first step: choose starting material: choosing thickness is the substrate motherboard of 0.1mm～1.0mm;

Second step: preformed: adopt scribing machine to draw the substrate blank of lower required size on substrate motherboard;

The 3rd step: profiling: adopt core to get machine, substrate blank is carried out to core and get the core that reaches expection profile and get sheet;

The 4th step: grind: adopt sphere grinding machine or twin grinder that core is got to sheet and grind, carry out in grinding Shi Baiji toilet, temperature is 20 ℃～28 ℃; Grinding is carried out in grinding oil, has ground formation abrasive sheet;

The 5th step: polishing: adopt glass polishing machine to carry out polishing to the surface of abrasive sheet; Polishing is carried out in polishing fluid, and polishing time is 3 minutes to 10 minutes, and polish temperature is 32 ℃～40 ℃, polish pressure 150～250 g/cm ²; Polishing completes formation polished silicon wafer;

The 6th step: clean: adopt supersonic wave cleaning machine to clean polished silicon wafer, clean and be dried and obtain cleaning sheet;

The 7th step: check: cleaning sheet is carried out to roughness, the depth of parallelism, flatness, thickness, surface crack, penetrability check, pick out all qualified optical flat substrates that formed.

2. a method for making for optical flat substrate, is characterized in that it includes the following steps of carrying out successively:

The first step: choose starting material: choosing thickness is the substrate motherboard of 0.1mm～1.0mm;

Second step: preformed: adopt scribing machine to draw the substrate blank of lower required size on substrate motherboard;

The 3rd step: profiling: adopt core to get machine, substrate blank is carried out to core and get the core that reaches expection profile and get sheet;

The 4th step: grind: adopt sphere grinding machine or twin grinder that core is got to sheet and grind, carry out in grinding Shi Baiji toilet, temperature is 20 ℃～28 ℃; Grinding is carried out in grinding oil, has ground formation abrasive sheet;

The 5th step: polishing: adopt glass polishing machine to carry out polishing to the surface of abrasive sheet; Polishing is carried out in polishing fluid, and polishing time is 3 minutes to 10 minutes, and polish temperature is 32 ℃～40 ℃, polish pressure 150～250 g/cm ²; Polishing completes formation polished silicon wafer;

The 6th step: clean: adopt supersonic wave cleaning machine to clean polished silicon wafer, clean and be dried and obtain cleaning sheet;

The 7th step: pad pasting: light transmission film has formed pad pasting substrate on cleaning sheet surface label;

The 8th step: check: pad pasting substrate is carried out to roughness, the depth of parallelism, flatness, thickness, surface crack, penetrability check, pick out all qualified optical flat substrates that formed.

3. according to the method for making of claim 1 or a kind of optical flat substrate claimed in claim 2, it is characterized in that including by weight in described grinding oil following composition: borate 10%～30%, polyvalent alcohol 5%～20%, anionic surfactant 5%～15%, lubricant 5%～10%, rust preventive 5%～10%, deionized water or pure water 15～60%, sodium oxide molybdena 5%～10%.

4. the method for making of a kind of optical flat substrate according to claim 3, is characterized in that described polyvalent alcohol is ethylene glycol or glycerine or sorbierite; Described anionic surfactant is carboxylate or sulfuric acid or sulfonate or phosphate ester salt; Described lubricant is as silicone oil or esters of silicon acis or phosphate or fluorocarbon oil; Described rust preventive is commercially available YG-901 type rust preventive.