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CN102897704A - Micro-electro-mechanical comb tooth mechanism capable of adjusting tooth gaps by electrostatic force - Google Patents

Micro-electro-mechanical comb tooth mechanism capable of adjusting tooth gaps by electrostatic force Download PDF

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CN102897704A
CN102897704A CN2012103949067A CN201210394906A CN102897704A CN 102897704 A CN102897704 A CN 102897704A CN 2012103949067 A CN2012103949067 A CN 2012103949067A CN 201210394906 A CN201210394906 A CN 201210394906A CN 102897704 A CN102897704 A CN 102897704A
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moving
tooth
broach
moves
teeth
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CN102897704B (en
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李伟华
浦烜
周再发
黄庆安
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Southeast University
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Abstract

本发明公开了一种静电力调变齿间隙的微机电梳齿机构,包括静电驱动齿、由左移定齿和右移定齿组成的定齿、动齿、第一锚区和绝缘衬底,第一锚区固定连接在绝缘衬底上;左移定齿包括第一宽梁、左移梳齿、四个沿横向弯折的第一折叠梁;右移定齿包括第二宽梁、右移梳齿、四个沿横向弯折的第二折叠梁;静电驱动齿包括梳齿和第三锚区,右移梳齿、梳齿和左移梳齿依次交替布置;动齿包括质量块、动齿梳齿、第二锚区和沿纵向弯曲的第三折叠梁,且右移梳齿、动齿梳齿和左移梳齿依次交替布置,第一宽梁上设有左移止挡块,第二宽梁上设有右移止挡块。该微机电梳齿机构在静电力的驱动下,调变齿间隙,使得微机电振动所产生的信号强。

The invention discloses a micro-electromechanical comb tooth mechanism for modulating tooth gaps by electrostatic force, including electrostatic drive teeth, fixed teeth composed of left-moving fixed teeth and right-moving fixed teeth, movable teeth, a first anchor area and an insulating substrate , the first anchor area is fixedly connected on the insulating substrate; the left-moving fixed teeth include the first wide beam, the left-moving comb teeth, and four first folded beams bent along the transverse direction; the right-moving fixed teeth include the second wide beam, Right-moving comb teeth, four second folded beams bent along the transverse direction; the electrostatic drive teeth include comb teeth and the third anchor area, and the right-moving comb teeth, comb teeth and left-moving comb teeth are arranged alternately in sequence; the movable teeth include mass blocks , movable tooth comb, second anchor area and third folded beam bent longitudinally, and the right-moving comb, movable tooth comb and left-moving comb are arranged alternately in sequence, and the first wide beam is provided with a left-moving stopper block, the second wide beam is provided with a right-moving stop block. Driven by the electrostatic force, the micro-electromechanical comb tooth mechanism adjusts the tooth gap, so that the signal generated by the micro-electromechanical vibration is strong.

Description

一种静电力调变齿间隙的微机电梳齿机构A Micro-Electro-Mechanical Comb Mechanism Using Electrostatic Force to Modulate the Teeth Gap

技术领域 technical field

本发明属于微机电系统结构技术领域,具体来说,涉及一种静电力调变齿间隙的微机电梳齿机构。The invention belongs to the technical field of micro-electro-mechanical system structure, and in particular relates to a micro-electro-mechanical comb mechanism for adjusting the gap between teeth by electrostatic force.

背景技术 Background technique

梳齿结构在微机电系统中有广泛地应用,例如,谐振器、加速度计、角速度计、陀螺等。传统的梳齿结构由定齿与动齿配对组成,定齿与动齿间隔排列并通常有许多对。传统结构中,定齿保持静止状态,没有纵向和横向位移,动齿则通常在外力的作用下以振动形式做运动,其运动方向沿着齿的长度方向。Comb structures are widely used in MEMS, for example, resonators, accelerometers, angular velocity meters, gyroscopes, etc. The traditional comb structure consists of paired fixed teeth and movable teeth. The fixed teeth and movable teeth are arranged at intervals and usually have many pairs. In the traditional structure, the fixed teeth remain in a static state without longitudinal and lateral displacement, while the movable teeth usually move in the form of vibration under the action of external force, and the direction of motion is along the length of the teeth.

由于加工精度的限制,梳齿结构中定齿和动齿的间隙不能小于工艺的分辨率,同时还受到干法刻蚀的高宽比限制。另一方面,动齿运动的幅度除和所加外力的大小有关外,还和定齿与动齿的间隙有关。由于传统结构的梳齿间隙是不可变的,又受到工艺的限制不能做的很小,因此,由微机电振动所产生的传感检出信号也很微弱。Due to the limitation of machining accuracy, the gap between the fixed tooth and the movable tooth in the comb tooth structure cannot be smaller than the resolution of the process, and it is also limited by the aspect ratio of dry etching. On the other hand, the movement range of the movable teeth is not only related to the magnitude of the applied external force, but also related to the gap between the fixed teeth and the movable teeth. Since the gap between the teeth of the comb in the traditional structure is invariable and cannot be made very small due to the limitation of the technology, the sensing detection signal generated by the micro-electromechanical vibration is also very weak.

有研究者提出了单边间隙可调的梳齿结构,但该结构存在如下两个主要缺点:因为梳齿通常是多对结构,单边间隙的减小必然导致另一边的间隙增大,浪费了一边的驱动力;因为动齿两边的间隙不对称,导致动齿与两边的定齿间的静电力大小不同,动齿的一维直线运动将受到影响,出现两维运动。Some researchers have proposed a comb structure with adjustable gaps on one side, but this structure has the following two main disadvantages: because the comb teeth are usually a multi-pair structure, the reduction of the gap on one side will inevitably lead to the increase of the gap on the other side, which is wasteful. The driving force on one side; because the gap on both sides of the movable tooth is asymmetrical, the magnitude of the electrostatic force between the movable tooth and the fixed teeth on both sides is different, and the one-dimensional linear motion of the movable tooth will be affected, resulting in two-dimensional motion.

发明内容 Contents of the invention

技术问题:本发明所要解决的技术问题是:提供一种静电力调变齿间隙的微机电梳齿机构,该微机电梳齿机构在静电力的驱动下,调变齿间隙,使得微机电振动所产生的信号强。Technical problem: The technical problem to be solved by the present invention is to provide a micro-electromechanical comb tooth mechanism that modulates the gap between the teeth by electrostatic force. The resulting signal is strong.

技术方案:为实现上述目的,本发明采用的技术方案是:Technical scheme: in order to achieve the above object, the technical scheme adopted in the present invention is:

一种静电力调变齿间隙的微机电梳齿机构,该微机电梳齿机构包括静电驱动齿、由左移定齿和右移定齿组成的定齿、动齿、四个第一锚区和绝缘衬底,四个第一锚区分别固定连接在绝缘衬底上;A micro-electromechanical comb tooth mechanism that modulates the tooth gap by electrostatic force, the micro-electromechanical comb tooth mechanism includes electrostatic drive teeth, fixed teeth consisting of left-moving fixed teeth and right-moving fixed teeth, movable teeth, and four first anchor areas and an insulating substrate, the four first anchor regions are respectively fixedly connected to the insulating substrate;

所述的左移定齿包括第一宽梁、左移梳齿、四个沿横向弯折的第一折叠梁,左移梳齿固定在第一宽梁的两侧,第一宽梁两端的两侧分别通过一个第一折叠梁连接在一个第一锚区上;左移定齿处于悬空状态;The left-moving fixed teeth include a first wide beam, left-moving comb teeth, and four first folded beams bent transversely. The left-moving comb teeth are fixed on both sides of the first wide beam, and the two ends of the first wide beam The two sides are respectively connected to a first anchorage area through a first folding beam; the left-moving fixed teeth are in a suspended state;

所述的右移定齿包括第二宽梁、右移梳齿、四个沿横向弯折的第二折叠梁,右移梳齿固定在第二宽梁的两侧,第二宽梁两端的两侧分别通过一个第二折叠梁连接在一个第一锚区上;右移定齿处于悬空状态;The right-moving fixed teeth include a second wide beam, right-moving comb teeth, and four second folded beams bent transversely. The right-moving comb teeth are fixed on both sides of the second wide beam, and the two ends of the second wide beam The two sides are respectively connected to a first anchorage area through a second folded beam; the right-moving fixed teeth are in a suspended state;

所述的静电驱动齿包括梳齿和第三锚区,第三锚区固定连接在绝缘衬底上,梳齿固定在第三锚区的一侧,且右移梳齿、梳齿和左移梳齿依次交替布置;梳齿处于悬空状态;The electrostatically driven teeth include comb teeth and a third anchor area, the third anchor area is fixedly connected to the insulating substrate, the comb teeth are fixed on one side of the third anchor area, and the comb teeth move right, comb teeth and left The comb teeth are arranged alternately in sequence; the comb teeth are in a suspended state;

所述的动齿包括质量块、动齿梳齿、两个第二锚区和两个沿纵向弯曲的第三折叠梁,两个第二锚区固定连接在绝缘衬底上,每个第二锚区与一个第三折叠梁的一端连接,第三折叠梁的另一端与质量块连接,动齿梳齿设置在质量块的一侧,且右移梳齿、动齿梳齿和左移梳齿依次交替布置,相邻的右移梳齿和动齿梳齿之间的距离、相邻的动齿梳齿和左移梳齿之间的距离、相邻的右移梳齿和梳齿之间的距离、以及相邻的梳齿和左移梳齿之间的距离相等;质量块、动齿梳齿、和第三折叠梁均处于悬空状态;The movable tooth includes a mass block, a movable tooth comb, two second anchor areas and two third folded beams bent longitudinally, the two second anchor areas are fixedly connected to the insulating substrate, and each second The anchor area is connected to one end of a third folded beam, and the other end of the third folded beam is connected to the mass block, and the movable tooth comb is set on one side of the mass block, and the right moving comb, the movable tooth comb and the left moving comb The teeth are alternately arranged in turn, the distance between adjacent right-moving comb teeth and moving tooth comb teeth, the distance between adjacent moving tooth comb teeth and left-moving comb teeth, and the distance between adjacent right-moving comb teeth and comb teeth The distance between the adjacent comb teeth and the left-moving comb teeth is equal; the mass block, the movable tooth comb teeth, and the third folded beam are all in a suspended state;

所述的左移定齿的第一宽梁上设有左移止挡块,右移定齿的第二宽梁上设有右移止挡块,左移止挡块和右移止挡块相对设置,且左移止挡块和右移止挡块之间的距离小于相邻的右移梳齿和动齿梳齿之间设计距离的两倍。The first wide beam of the left-moving fixed teeth is provided with a left-moving stop block, and the second wide beam of the right-moving fixed teeth is provided with a right-moving stop block, a left-moving stop block and a right-moving stop block They are arranged oppositely, and the distance between the left-moving stopper and the right-movement stopper is less than twice the design distance between the adjacent right-moving comb teeth and the movable tooth comb teeth.

有益效果:与现有技术相比,本发明具有以下有益效果:Beneficial effects: compared with the prior art, the present invention has the following beneficial effects:

该微机电梳齿机构在静电力的驱动下,调变齿间隙,使得微机电振动所产生的信号强。本发明的微机电梳齿机构中,在机构的一侧,右移梳齿、动齿梳齿和左移梳齿依次交替布置,在机构的另一侧,右移梳齿、梳齿和左移梳齿依次交替布置。在第三锚区和第一锚区之间施加电压,同时,在第二锚区与第一锚区之间施加电压,使得右移定齿向右移动,左移定齿向左移动。右移定齿和左移定齿同步调整其与动齿梳齿或者梳齿之间的间隙,可以增加传感器的传感检出信号幅度。通过改变施加电压大小,可以调整右移梳齿和左移梳齿的移动距离。在微机电传感器设计中,可以方便地引用本发明的结构,减小齿间间隙,大大地增加传感器的检测灵敏度。另一方面,如果改变齿间隙的驱动信号幅度随时间变化则可以使间隙也随时间变化,由此可以对处于谐振状态的动齿振动幅度进行调制,实现信号的调幅,拓展梳齿结构的应用范围。Driven by the electrostatic force, the micro-electromechanical comb tooth mechanism adjusts the tooth gap, so that the signal generated by the micro-electromechanical vibration is strong. In the micro-electromechanical comb mechanism of the present invention, on one side of the mechanism, the right-moving combs, movable combs and left-moving combs are arranged alternately in sequence, and on the other side of the mechanism, the right-moving combs, combs and left The comb teeth are arranged alternately in turn. A voltage is applied between the third anchor area and the first anchor area, and at the same time, a voltage is applied between the second anchor area and the first anchor area, so that the right-moving fixed teeth move to the right, and the left-moving fixed teeth move to the left. Moving the fixed teeth to the right and moving the fixed teeth to the left synchronously adjusts the gap between them and the comb teeth of the movable teeth or between the comb teeth, which can increase the sensing detection signal amplitude of the sensor. By changing the magnitude of the applied voltage, the moving distance of the right-moving comb and the left-moving comb can be adjusted. In the design of the micro-electromechanical sensor, the structure of the present invention can be conveniently used to reduce the gap between the teeth and greatly increase the detection sensitivity of the sensor. On the other hand, if the driving signal amplitude of the tooth gap is changed with time, the gap can also be changed with time, so that the vibration amplitude of the movable tooth in the resonant state can be modulated to realize the amplitude modulation of the signal and expand the application of the comb structure scope.

附图说明 Description of drawings

图1是本发明的俯视图。Figure 1 is a top view of the present invention.

图2是本发明的局部结构图。Fig. 2 is a partial structural diagram of the present invention.

图3是图2中A-A剖视图。Fig. 3 is a sectional view of A-A in Fig. 2 .

图4是图2中B-B剖视图。Fig. 4 is a B-B sectional view in Fig. 2 .

图5是本发明中第一锚区在绝缘衬底上的示意图。Fig. 5 is a schematic diagram of the first anchor region on the insulating substrate in the present invention.

图6是本发明在制备时,第一层多晶硅层的俯视图。Fig. 6 is a top view of the first polysilicon layer during preparation of the present invention.

图7是本发明在制备时,第一层多晶硅层和第二层多晶硅层复合后的俯视图。Fig. 7 is a top view of the composite of the first polysilicon layer and the second polysilicon layer during the preparation of the present invention.

图8是本发明在制备时,第三层多晶硅层的俯视图。Fig. 8 is a top view of the third polysilicon layer during preparation of the present invention.

图中有:绝缘衬底100、梳齿101、第三锚区102、左移定齿103、右移定齿104、质量块105、动齿梳齿106、第一宽梁107、左移梳齿108、第二宽梁109、右移梳齿110、第一折叠梁111、第一锚区112、第二折叠梁113、第三折叠梁114、第二锚区115、左移止挡块116、右移止挡块117、第一层多晶硅层200、第二层多晶硅层201、第三层多晶硅层202、金属块203。In the figure, there are: insulating substrate 100, comb teeth 101, third anchor region 102, left-moving fixed teeth 103, right-moving fixed teeth 104, mass block 105, movable tooth comb teeth 106, first wide beam 107, left-shift comb Teeth 108, second wide beam 109, right-moving comb teeth 110, first folding beam 111, first anchor area 112, second folding beam 113, third folding beam 114, second anchor area 115, left-moving stop block 116 . Move the stop block 117 to the right, the first polysilicon layer 200 , the second polysilicon layer 201 , the third polysilicon layer 202 , and the metal block 203 .

具体实施方式 Detailed ways

下面结合附图对本发明做更进一步的说明。The present invention will be further described below in conjunction with the accompanying drawings.

如图1至图4所示,本发明的一种静电力调变齿间隙的微机电梳齿机构,包括静电驱动齿、由左移定齿103和右移定齿104组成的定齿、动齿、四个第一锚区112和绝缘衬底100。四个第一锚区112分别固定连接在绝缘衬底100上。左移定齿103包括第一宽梁107、左移梳齿108、四个沿横向弯折的第一折叠梁111。沿横向弯折的第一折叠梁111在移动时,只能沿横向移动。左移梳齿108固定在第一宽梁107的两侧。第一宽梁107两端的两侧分别通过一个第一折叠梁111连接在一个第一锚区112上。左移定齿103处于悬空状态。右移定齿104包括第二宽梁109、右移梳齿110、四个沿横向弯折的第二折叠梁113。右移梳齿110固定在第二宽梁109的两侧。第二宽梁109两端的两侧分别通过一个第二折叠梁113连接在一个第一锚区112上。右移定齿104处于悬空状态。静电驱动齿包括梳齿101和第三锚区102。第三锚区102固定连接在绝缘衬底100上。梳齿101固定在第三锚区102的一侧,且右移梳齿110、梳齿101和左移梳齿108依次交替布置。也就是说,以右移梳齿110、梳齿101、左移梳齿108为单元顺序排列,即右移梳齿110、梳齿101、左移梳齿108、……、右移梳齿110、梳齿101、左移梳齿108。梳齿101处于悬空状态。动齿包括质量块105、动齿梳齿106、两个第二锚区115和两个沿纵向弯曲的第三折叠梁114。两个第二锚区115固定连接在绝缘衬底100上。每个第二锚区115与一个第三折叠梁114的一端连接,第三折叠梁114的另一端与质量块105连接,动齿梳齿106设置在质量块105的一侧,且右移梳齿110、动齿梳齿106和左移梳齿108依次交替布置。也就是说,以右移梳齿110、动齿梳齿106、左移梳齿108为单元顺序排列,即右移梳齿110、动齿梳齿106、左移梳齿108、……、右移梳齿110、动齿梳齿106、左移梳齿108。相邻的右移梳齿110和动齿梳齿106之间的距离、相邻的动齿梳齿106和左移梳齿108之间的距离、相邻的右移梳齿110和梳齿101之间的距离、以及相邻的梳齿101和左移梳齿108之间的距离相等。质量块105、动齿梳齿106、和第三折叠梁114均处于悬空状态。左移定齿103的第一宽梁107上设有左移止挡块116,右移定齿104的第二宽梁109上设有右移止挡块117,左移止挡块116和右移止挡块117相对设置。左移止挡块116和右移止挡块117之间的距离小于相邻的右移梳齿110和动齿梳齿106之间设计距离的两倍。设计距离是指工艺加工完成以后,处于静止状态的梳齿之间的距离。也就是说,当左移止挡块116和右移止挡块117相抵触时,右移梳齿110和动齿梳齿106之间的距离,以及动齿梳齿106和左移梳齿108之间的距离就不能再调整了。通过设置左移止挡块116和右移止挡块117,避免右移梳齿110和动齿梳齿106之间,以及动齿梳齿106和左移梳齿108之间接触。As shown in Fig. 1 to Fig. 4, a micro-electromechanical comb-tooth mechanism of the present invention for modulating the tooth gap by electrostatic force includes electrostatically driven teeth, a fixed tooth consisting of a left-moving fixed tooth 103 and a right-moving fixed tooth 104, a moving teeth, the four first anchor regions 112 and the insulating substrate 100. The four first anchor regions 112 are respectively fixedly connected to the insulating substrate 100 . The left-moving fixed tooth 103 includes a first wide beam 107 , a left-moving comb tooth 108 , and four first folded beams 111 bent along the transverse direction. When the first folded beam 111 bent along the transverse direction moves, it can only move along the transverse direction. The left-moving comb teeth 108 are fixed on both sides of the first wide beam 107 . Both ends of the first wide beam 107 are respectively connected to a first anchor area 112 through a first folded beam 111 . The left fixed tooth 103 is in a suspended state. The right-moving fixed tooth 104 includes a second wide beam 109 , a right-moving comb tooth 110 , and four second folded beams 113 bent along the transverse direction. The right-moving comb teeth 110 are fixed on both sides of the second wide beam 109 . Both ends of the second wide beam 109 are respectively connected to a first anchor area 112 through a second folded beam 113 . The right-moving fixed tooth 104 is in a suspended state. The electrostatically driven teeth include comb teeth 101 and a third anchor region 102 . The third anchor region 102 is fixedly connected to the insulating substrate 100 . The comb teeth 101 are fixed on one side of the third anchor area 102, and the right-moving comb teeth 110, the comb teeth 101 and the left-moving comb teeth 108 are arranged alternately in sequence. That is to say, the comb teeth 110 to the right, the comb teeth 101 to the left, and the comb teeth 108 to the left are arranged sequentially, that is, the comb teeth 110 to the right, the comb teeth 101, the comb teeth 108 to the left, ..., the comb teeth 110 to the right , comb teeth 101, move comb teeth 108 to the left. The comb teeth 101 are in a suspended state. The movable tooth includes a mass 105 , a movable tooth comb 106 , two second anchor areas 115 and two third folded beams 114 bent longitudinally. The two second anchor regions 115 are fixedly connected to the insulating substrate 100 . Each second anchorage area 115 is connected to one end of a third folded beam 114, and the other end of the third folded beam 114 is connected to the mass block 105, and the movable tooth comb 106 is arranged on one side of the mass block 105, and moves to the right The teeth 110, the movable comb teeth 106 and the left shift comb teeth 108 are arranged alternately in sequence. That is to say, the right-moving comb teeth 110, the moving-tooth comb teeth 106, and the left-moving comb teeth 108 are arranged sequentially, that is, the right-moving comb teeth 110, the moving-tooth comb teeth 106, the left-moving comb teeth 108, ..., right Move the comb teeth 110, move the comb teeth 106, and move the comb teeth 108 to the left. The distance between the adjacent right-moving comb teeth 110 and the moving-tooth comb teeth 106, the distance between the adjacent moving-tooth comb teeth 106 and the left-moving comb teeth 108, the adjacent right-moving comb teeth 110 and the comb teeth 101 The distance between them, and the distance between the adjacent comb teeth 101 and the left-moving comb teeth 108 are equal. The mass block 105, the movable tooth comb 106, and the third folded beam 114 are all in a suspended state. The first wide beam 107 of the fixed tooth 103 left is provided with a left stop block 116, the second wide beam 109 of the fixed tooth 104 moved right is provided with a right stop block 117, the left stop block 116 and the right The moving stopper 117 is arranged oppositely. The distance between the left-moving stop block 116 and the right-moving stop block 117 is less than twice the designed distance between the adjacent right-moving comb teeth 110 and the movable tooth comb teeth 106 . The design distance refers to the distance between the comb teeth in a static state after the process is completed. That is to say, when the left-moving stop block 116 and the right-moving stop block 117 conflict, the distance between the right-moving comb 110 and the movable comb 106, and the distance between the movable comb 106 and the left comb 108 The distance between them can no longer be adjusted. By setting the left-moving stop block 116 and the right-moving stop block 117, contact between the right-moving comb 110 and the movable comb 106, and between the movable comb 106 and the left 108 is avoided.

进一步,所述的左移梳齿108与第一宽梁107相垂直,右移定齿104与第二宽梁109相垂直,质量块105与动齿梳齿106相垂直,梳齿101与第三锚区102相垂直。Further, the left-moving comb teeth 108 are perpendicular to the first wide beam 107, the right-moving fixed teeth 104 are perpendicular to the second wide beam 109, the mass block 105 is perpendicular to the movable comb teeth 106, and the comb teeth 101 are perpendicular to the second wide beam 109. The three anchor regions 102 are perpendicular.

在上述技术方案中,四个第一折叠梁111一端分别连接在第一宽梁107上,四个第一折叠梁111另一端分别连接在一个第一锚区112上。通过四个第一折叠梁111形成对第一宽梁107和左移梳齿108的支撑。四个第二折叠梁113一端分别连接在第二宽梁109上,四个第二折叠梁113另一端分别连接在一个第一锚区112上。通过四个第二折叠梁113形成对第二宽梁109和右移梳齿110的支撑。In the above technical solution, one end of the four first folded beams 111 is respectively connected to the first wide beam 107 , and the other ends of the four first folded beams 111 are respectively connected to one first anchoring area 112 . The support for the first wide beam 107 and the left-moving comb teeth 108 is formed by four first folded beams 111 . One ends of the four second folded beams 113 are respectively connected to the second wide beam 109 , and the other ends of the four second folded beams 113 are respectively connected to one first anchoring area 112 . The support for the second wide beam 109 and the right-moving comb teeth 110 is formed by four second folded beams 113 .

上述结构的静电力调变齿间隙的微机电梳齿机构的工作原理是:在第三锚区102和第一锚区112之间施加电压,同时,在第二锚区115与第一锚区112之间施加电压,该电压幅值与在第三锚区102和第一锚区112之间所施加的电压幅值相同。由施加电压所产生的静电力,使左移定齿103和右移定齿104以梳齿101或者动齿梳齿106为中心,相向移动。显然,施加电压的幅值越大,右移梳齿110和动齿梳齿106之间的距离减小的越多,左移梳齿108和动齿梳齿106之间的距离也减小的越多。这样就达到调变梳齿间隙的目的。通过设置左移止挡块116和右移止挡块117的间距,可以控制右移梳齿110和动齿梳齿106之间,右移梳齿110和梳齿101之间、左移梳齿108和梳齿101之间,以及左移梳齿108和动齿梳齿106之间的最小间隙。The working principle of the micro-electromechanical comb-tooth mechanism of the electrostatic force modulating tooth gap of the above structure is: a voltage is applied between the third anchor area 102 and the first anchor area 112, and at the same time, a voltage is applied between the second anchor area 115 and the first anchor area. A voltage is applied between 112 , and the magnitude of the voltage is the same as that applied between the third anchor region 102 and the first anchor region 112 . The electrostatic force generated by the applied voltage makes the left-moving fixed tooth 103 and the right-moving fixed tooth 104 move toward each other with the comb tooth 101 or the movable tooth comb tooth 106 as the center. Obviously, the greater the magnitude of the applied voltage, the more the distance between the right-moving comb 110 and the movable comb 106 decreases, and the distance between the left-moving comb 108 and the movable comb 106 also decreases. more. In this way, the purpose of adjusting the gap between comb teeth is reached. By setting the distance between the left-moving stop block 116 and the right-moving stop block 117, it is possible to control the movement between the right-moving comb teeth 110 and the movable-tooth comb teeth 106, between the right-moving comb teeth 110 and the comb teeth 101, and between the left-moving comb teeth. 108 and the comb tooth 101, and the minimum gap between the left comb tooth 108 and the movable tooth comb tooth 106.

本发明的结构采用基本的微机电加工工艺完成。如图6至图8所示,制备时,本发明的结构材料自下而上为:绝缘衬底100、第一层多晶硅层200、第二层多晶硅层201、第三层多晶硅层202和金属层203。The structure of the present invention is completed using basic micro-electromechanical processing technology. As shown in Figures 6 to 8, during preparation, the structural materials of the present invention are from bottom to top: insulating substrate 100, first polysilicon layer 200, second polysilicon layer 201, third polysilicon layer 202 and metal Layer 203.

左移定齿103的第一宽梁107和第一折叠梁111由第二层多晶硅层201制造。左移定齿103的左移梳齿108,沿长度方向的主体由第二层多晶硅层201与第三层多晶硅层202叠合制造。The first wide beam 107 and the first folded beam 111 of the left-moving fixed teeth 103 are made of the second polysilicon layer 201 . The left-moving comb teeth 108 of the left-moving fixed teeth 103 are manufactured along the length direction by laminating the second polysilicon layer 201 and the third polysilicon layer 202 .

右移定齿104的第二宽梁109和第二折叠梁113由第三层多晶硅层202制造。右移定齿104的右移梳齿110,沿长度方向的主体由第二层多晶硅层201与第三层多晶硅层202叠合制造。The second wide beam 109 and the second folded beam 113 of the right-moving fixed tooth 104 are made of the third polysilicon layer 202 . The right-moving comb teeth 110 of the right-moving fixed teeth 104 are manufactured along the length direction by laminating the second polysilicon layer 201 and the third polysilicon layer 202 .

左移定齿103的左移止挡块116和右移定齿104的右移止挡块117由第二层多晶硅层201和第三层多晶硅层202叠合制造。The left-moving stopper 116 of the left-moving fixed tooth 103 and the right-moving stopper 117 of the right-moving fixed tooth 104 are manufactured by laminating the second polysilicon layer 201 and the third polysilicon layer 202 .

动齿中的质量块105、动齿梳齿106和第三折叠梁114均由第二层多晶硅层201与第三层多晶硅层202叠合而成。The mass block 105 in the movable tooth, the movable tooth comb 106 and the third folded beam 114 are all formed by laminating the second polysilicon layer 201 and the third polysilicon layer 202 .

如图5所示,第一锚区112、第二锚区115和第三锚区102均由四层材料叠合而成:自下而上为第一层多晶硅层200,其与绝缘衬底100连接;第二层多晶硅层201;第三层多晶硅层202;实现电连接的金属层203。As shown in FIG. 5, the first anchor region 112, the second anchor region 115 and the third anchor region 102 are formed by stacking four layers of materials: from bottom to top is the first layer of polysilicon layer 200, which is bonded to the insulating substrate 100 connection; second polysilicon layer 201; third polysilicon layer 202; metal layer 203 for realizing electrical connection.

下面以典型的三层多晶硅微机电表面加工工艺说明该结构的制作过程。The fabrication process of this structure is described below with a typical three-layer polysilicon MEMS surface processing technology.

选择N型半导体硅片,热生长100纳米厚度的二氧化硅层,通过化学气相沉积工艺沉积一层500纳米厚度的氮化硅,形成绝缘衬底。采用化学气相沉积工艺沉积300纳米的第一层多晶硅并进行N型重掺杂使该层多晶硅成为导体,通过光刻工艺刻蚀形成锚区的一部分。使用化学气相沉积工艺沉积2000纳米厚度的磷硅玻璃(PSG),通过光刻工艺形成锚区的图形。利用化学气相沉积工艺淀积2000纳米厚度的第二层多晶硅,对多晶硅进行N型重掺杂,光刻工艺形成位于第二层多晶硅的图形。使用化学气相沉积工艺沉积1500纳米厚度的磷硅玻璃(PSG),通过光刻工艺形成锚区、梳齿叠合区等图形。利用化学气相沉积工艺淀积1500纳米厚度的第三层多晶硅,对多晶硅进行N型重掺杂,光刻工艺形成位于第三层多晶硅的图形。采用剥离工艺在锚区上形成金属电极图形。最后通过腐蚀释放结构。Select an N-type semiconductor silicon wafer, thermally grow a silicon dioxide layer with a thickness of 100 nanometers, and deposit a layer of silicon nitride with a thickness of 500 nanometers through a chemical vapor deposition process to form an insulating substrate. A first layer of polysilicon with a thickness of 300 nanometers is deposited by a chemical vapor deposition process and N-type heavily doped to make the layer of polysilicon a conductor, and a part of the anchor region is formed by etching by a photolithography process. Phospho-silicate glass (PSG) was deposited to a thickness of 2000 nm using a chemical vapor deposition process, and the anchor region was patterned by photolithography. A second layer of polysilicon with a thickness of 2000 nanometers is deposited by chemical vapor deposition process, N-type heavily doped polysilicon is carried out, and a pattern on the second layer of polysilicon is formed by a photolithography process. Phospho-silicate glass (PSG) with a thickness of 1500 nanometers is deposited by chemical vapor deposition process, and patterns such as anchor area and comb superposition area are formed by photolithography process. A third layer of polysilicon with a thickness of 1500 nanometers is deposited by a chemical vapor deposition process, the polysilicon is heavily doped with N type, and a pattern on the third layer of polysilicon is formed by a photolithography process. A metal electrode pattern is formed on the anchor region by a lift-off process. Finally the structure is released by corrosion.

以上所述仅是本发明的优选实施方式,应当指出:对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本发明的保护范围。The above is only a preferred embodiment of the present invention, it should be pointed out that for those of ordinary skill in the art, without departing from the principle of the present invention, some improvements and modifications can also be made, and these improvements and modifications are also possible. It should be regarded as the protection scope of the present invention.

Claims (2)

1. the micro electronmechanical broach mechanism of an electrostatic force modulation backlash, it is characterized in that: this micro electronmechanical broach mechanism comprises the static driving gear, decide tooth (103) by moving to left and move to right decide that tooth (104) forms decide tooth, moving tooth, four the first anchor districts (112) and dielectric substrate (100), four the first anchor districts (112) are fixedly connected on respectively on the dielectric substrate (100);
Described moving to left decided the first fold stoplogs (111) that tooth (103) comprises the first wide beam (107), the broach that moves to left (108), four horizontal bendings in edge, the broach (108) that moves to left is fixed on the both sides of the first wide beam (107), and the both sides at the first wide beam (107) two ends are connected in the first anchor district (112) by a first fold stoplog (111) respectively; Move to left and decide tooth (103) and be in vacant state;
Described moving to right decided the second folded beams (113) that tooth (104) comprises the second wide beam (109), the broach that moves to right (110), four horizontal bendings in edge, the broach (110) that moves to right is fixed on the both sides of the second wide beam (109), and the both sides at the second wide beam (109) two ends are connected in the first anchor district (112) by second folded beam (113) respectively; Move to right and decide tooth (104) and be in vacant state;
Described static driving gear comprises broach (101) and the 3rd anchor district (102), the 3rd anchor district (102) is fixedly connected on the dielectric substrate (100), broach (101) is fixed on a side in the 3rd anchor district (102), and the broach that moves to right (110), broach (101) and the broach that moves to left (108) are alternately arranged successively; Broach (101) is in vacant state;
Described moving tooth comprises mass (105), moving stripping fork tooth (106), two the second anchor districts (115) and two are crooked the 3rd folded beam (114) longitudinally, two the second anchor districts (115) are fixedly connected on the dielectric substrate (100), each second anchor district (115) is connected with an end of the 3rd folded beam (114), the other end of the 3rd folded beam (114) is connected with mass (105), moving stripping fork tooth (106) is arranged on a side of mass (105), and the broach that moves to right (110), moving stripping fork tooth (106) and the broach that moves to left (108) are alternately arranged the adjacent broach that moves to right (110) and the distance between the moving stripping fork tooth (106) successively, distance between adjacent moving stripping fork tooth (106) and the broach that moves to left (108), the adjacent broach that moves to right (110) and the distance between the broach (101), and the distance between adjacent broach (101) and the broach that moves to left (108) equates; Mass (105), moving stripping fork tooth (106) and the 3rd folded beam (114) all are in vacant state;
Described the first wide beam (107) of deciding tooth (103) that moves to left is provided with the stop block that moves to left (116), the second wide beam (109) of deciding tooth (104) that moves to right is provided with the stop block that moves to right (117), move to left stop block (116) and the stop block that moves to right (117) is oppositely arranged, and the distance between the stop block that moves to left (116) and the stop block that moves to right (117) is less than the twice of designed distance between the adjacent broach that moves to right (110) and the moving stripping fork tooth (106).
2. according to the micro electronmechanical broach mechanism of electrostatic force modulation claimed in claim 1 backlash, it is characterized in that: the described broach that moves to left (108) is perpendicular with the first wide beam (107), moving to right, it is perpendicular with the second wide beam (109) to decide tooth (104), mass (105) is perpendicular with moving stripping fork tooth (106), and broach (101) is perpendicular with the 3rd anchor district (102).
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CN103145093A (en) * 2013-03-18 2013-06-12 厦门大学 Preparation method of comb tooth clearance silicon micro-inertial component with high depth-to-width ratio
CN103145093B (en) * 2013-03-18 2015-04-08 厦门大学 Preparation method of comb tooth clearance silicon micro-inertial component with high depth-to-width ratio
CN103438783A (en) * 2013-09-05 2013-12-11 东南大学 Micro-electro-mechanical bidirectional vernier scale
CN103438783B (en) * 2013-09-05 2015-11-18 东南大学 Micro electronmechanical two-way vernier scale
CN103901229A (en) * 2014-04-18 2014-07-02 清华大学 Micromechanics accelerometer
CN111381073A (en) * 2020-05-01 2020-07-07 深迪半导体(上海)有限公司 MEMS accelerometer and method for improving shock resistance thereof
CN111381073B (en) * 2020-05-01 2021-11-30 深迪半导体(绍兴)有限公司 MEMS accelerometer and method for improving shock resistance thereof

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