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CN102881295A - Glass substrate used in magnetic recording media and method for manufacturing the same - Google Patents

Glass substrate used in magnetic recording media and method for manufacturing the same Download PDF

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Publication number
CN102881295A
CN102881295A CN2012102397223A CN201210239722A CN102881295A CN 102881295 A CN102881295 A CN 102881295A CN 2012102397223 A CN2012102397223 A CN 2012102397223A CN 201210239722 A CN201210239722 A CN 201210239722A CN 102881295 A CN102881295 A CN 102881295A
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magnetic recording
glass
protective film
glass substrate
main plane
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万波和夫
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AGC Inc
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Asahi Glass Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

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Abstract

【课题】以高产率获得防止在主平面研磨工序前产生的伤痕等缺陷、主平面的平滑性优异的磁记录介质用玻璃基板。【解决方法】一种磁记录介质用玻璃素板,是用于形成在中央部具有圆孔的圆盘形状的磁记录介质用玻璃基板的玻璃素板,在至少一个主平面上,具有含有树脂的保护膜。磁记录介质用玻璃基板的制造方法,该方法具有:磁记录介质用玻璃素板准备工序;将所述玻璃素板加工成中央部具有圆孔的圆盘形状的玻璃基板的赋形工序;研磨所述玻璃基板的主平面的主平面研磨工序;和所述玻璃基板的清洗工序,所述磁记录介质用玻璃素板准备工序具有:在玻璃素板的至少一个主平面上形成含有树脂的保护膜、制成磁记录介质用玻璃素板的保护膜形成工序。

[Problem] Obtain a glass substrate for magnetic recording media with high yield and excellent smoothness of the main plane while preventing defects such as scratches generated before the main plane polishing step. [Solution] A glass plain plate for magnetic recording media, which is a glass plain plate for forming a disc-shaped glass substrate for magnetic recording media having a circular hole in the center, and has resin-containing glass on at least one main plane. protective film. A method for manufacturing a glass substrate for a magnetic recording medium, the method comprising: a step of preparing a glass plain plate for a magnetic recording medium; a step of forming the glass plain plate into a disk-shaped glass substrate having a hole in the center; and grinding The main plane grinding process of the main plane of the glass substrate; and the cleaning process of the glass substrate, the preparation process of the glass plain plate for magnetic recording media includes: forming a protective film containing resin on at least one main plane of the glass plate. film, and a protective film forming process to make a glass plate for magnetic recording media.

Description

磁记录介质用玻璃素板以及磁记录介质用玻璃基板的制造方法Glass plain plate for magnetic recording medium and method for producing glass substrate for magnetic recording medium

技术领域 technical field

本发明涉及磁记录介质用玻璃素板和使用该素板的磁记录介质用玻璃基板的制造方法。The present invention relates to a glass substrate for magnetic recording media and a method for producing a glass substrate for magnetic recording media using the same.

背景技术 Background technique

近年,在磁记录介质、尤其是磁盘存储器中,正在推进快速的高记录密度化。磁盘存储器是通过使磁头略微露出到高速旋转的记录介质(磁盘)上进行扫描而实现随机存取,为了兼具高记录密度和高速存取,希望降低磁盘和磁头的间隔(磁头露出量)以及提高磁盘的转数。目前主流的磁盘基材是在铝(Al)上镀了镍磷(Ni-P)的基板,但是,发展趋势是使用玻璃基板,玻璃基板比铝合金基板硬,磁头对基板表面的耐冲击性优异,平坦性和平滑性优异。In recent years, magnetic recording media, particularly magnetic disk memories, have rapidly increased recording density. Disk storage achieves random access by exposing the magnetic head slightly to the high-speed rotating recording medium (disk) for scanning. In order to achieve both high recording density and high-speed access, it is desirable to reduce the distance between the magnetic disk and the magnetic head (the exposure of the magnetic head) and Increase the rotation speed of the disk. At present, the mainstream disk substrate is a substrate plated with nickel phosphorus (Ni-P) on aluminum (Al). However, the development trend is to use a glass substrate. The glass substrate is harder than the aluminum alloy substrate, and the impact resistance of the magnetic head to the substrate surface Excellent, excellent flatness and smoothness.

降低磁头的浮上量时,如果磁头的主平面不是平滑的面,存在磁头接触主平面发生障碍的担忧。此外,如果磁盘的主平面的表面粗糙度大、与磁头的距离变动时,则存在读取和写入的可靠性下降的问题。进而,如果主平面上有伤痕等缺陷,则有读取和写入量下降的担忧,因此,需要的是在主平面上没有伤痕等缺陷的磁记录介质用玻璃基板。When reducing the lift-off amount of the magnetic head, if the main plane of the magnetic head is not a smooth surface, there is a possibility that the magnetic head may be hindered from contacting the main plane. In addition, when the surface roughness of the main plane of the magnetic disk is large and the distance from the magnetic head varies, there is a problem that the reliability of reading and writing decreases. Furthermore, if there are defects such as scratches on the main plane, there is a possibility that the reading and writing volume may decrease. Therefore, a glass substrate for a magnetic recording medium without defects such as scratches on the main plane is required.

通常,磁记录介质用玻璃基板经过以下工序制造:按照以下工序将玻璃素板切断加工成易于加工的形状的工序;加工成中央部具有圆孔的圆盘形状的圆盘形状加工工序;磨削加工圆盘形状基板的内周端部和外周端部的倒角工序;研磨倒角后的内周端部和/或外周端部的端面研磨工序;研磨端面研磨后的玻璃基板的主平面的主平面研磨工序;以及清洗玻璃基板、提高清洁度的清洗工序等。根据需要,可以在所述各工序间设置清洗玻璃基板的工序、蚀刻玻璃基板的工序。Generally, glass substrates for magnetic recording media are manufactured through the following steps: a step of cutting a glass plain plate into a shape that is easy to process; a disc shape processing step of processing it into a disc shape with a hole in the center; grinding The process of chamfering the inner peripheral end and the outer peripheral end of the disc-shaped substrate; the process of grinding the inner peripheral end and/or the outer peripheral end after grinding the chamfer; grinding the main plane of the glass substrate after grinding the end surface The main plane grinding process; and the cleaning process for cleaning the glass substrate and improving the cleanliness, etc. If necessary, a step of cleaning the glass substrate and a step of etching the glass substrate may be provided between the above steps.

这样的磁记录介质用玻璃基板的制造中,在主平面研磨工序前的加工工序中,进行使多片玻璃基板的主平面之间重合或者直接保持主平面,那样的重合和保持时,容易发生玻璃碎片或异物的夹杂。因此,存在玻璃基板的主平面上容易产生伤痕等缺陷的问题。In the manufacture of such glass substrates for magnetic recording media, in the processing process before the main plane grinding process, the main planes of the plurality of glass substrates are overlapped or directly held. Inclusion of glass shards or foreign matter. Therefore, there is a problem that defects such as scratches are likely to occur on the main plane of the glass substrate.

通常,玻璃基板的主平面上产生的伤痕等缺陷可以通过在主平面研磨工序中研磨主平面来除去,但是,由于因夹杂异物等产生的伤痕的深度不是一定的,因此,深的伤痕在主平面研磨工序中不能被完全除去,存在伤痕等缺陷残留在产品中,降低产品的产率的担忧。此外,为了除去因夹杂异物产生的深伤痕等缺陷,有必要增大主平面研磨工序中的研磨量,且增大研磨量时,为了确保作为产品的规定的板厚,有必要增加玻璃素板的板厚。因此,存在材料的损失大,且研磨工序等作业消耗时间的问题。Generally, defects such as scratches generated on the main plane of the glass substrate can be removed by grinding the main plane in the main plane grinding process. The surface grinding process cannot be completely removed, and there is a concern that defects such as scratches may remain in the product, reducing the yield of the product. In addition, in order to remove defects such as deep scratches caused by inclusions of foreign matter, it is necessary to increase the amount of grinding in the main plane grinding process. of plate thickness. Therefore, there is a problem that the loss of material is large, and operations such as a polishing process take time.

一直以来,为了防止板玻璃的制造、搬送、运送、加工工序中产生伤痕等缺陷,有人提出用亚硫酸气体等处理玻璃板,在表面形成由硫酸盐等无机盐类构成的被膜的方法(例如,参考专利文献1)。但是,即使想将专利文献1中记载的方法用于防止在磁记录介质用玻璃基板制造工序中的所述伤痕等缺陷,由于被膜的厚膜非常薄,不能充分防止由于玻璃基板主平面的异物夹杂等引起的伤痕等缺陷。For a long time, in order to prevent defects such as scratches in the manufacturing, conveying, conveying, and processing steps of plate glass, it has been proposed to treat the glass plate with sulfurous acid gas, etc., and form a coating film composed of inorganic salts such as sulfate on the surface (such as , refer to Patent Document 1). However, even if the method described in Patent Document 1 is intended to prevent defects such as the above-mentioned scratches in the manufacturing process of the glass substrate for magnetic recording media, since the thick film of the film is very thin, it cannot sufficiently prevent foreign matter caused by the main plane of the glass substrate. Defects such as scratches caused by inclusions, etc.

现有技术文献prior art literature

专利文献patent documents

专利文献1:国际公开WO2002/051767号公报Patent Document 1: International Publication No. WO2002/051767

发明内容 Contents of the invention

发明所要解决的技术问题The technical problem to be solved by the invention

本发明是为了解决所述问题而完成的发明,目的是提供能够以良好的产率获得防止主平面研磨工序前产生的伤痕等缺陷、尤其是防止由于异物夹杂等产生的伤痕等缺陷、主平面的平滑性优异的磁记录介质用玻璃基板的磁记录介质用玻璃素板、以及磁记录介质用玻璃基板的制造方法。The present invention was conceived to solve the above-mentioned problems, and its object is to provide a main plane capable of preventing defects such as scratches generated before the grinding process of the main plane, especially preventing defects such as scratches caused by inclusion of foreign matter, etc., with good yield. A method for producing a glass substrate for a magnetic recording medium, a glass substrate for a magnetic recording medium having excellent smoothness, and a glass substrate for a magnetic recording medium.

解决技术问题所采用的技术方案Technical solutions adopted to solve technical problems

本发明的磁记录介质用玻璃素板,是用于形成在中央部具有圆孔的圆盘形状的磁记录介质用玻璃基板的、具有主平面和侧面的玻璃素板,其特征在于,在至少一个主平面上,具有含有树脂的保护膜。The glass plain plate for magnetic recording media of the present invention is a glass plain plate having a main plane and side surfaces for forming a disk-shaped glass substrate for magnetic recording media having a circular hole in the center, and is characterized in that at least On one main plane, there is a protective film containing resin.

本发明的磁记录介质用玻璃素板中,优选所述保护膜具有在中央部有圆形孔部的圆环形的平面形状。此外,所述保护膜优选具有0.01mm~0.5mm的膜厚。In the glass plain plate for magnetic recording media of the present invention, it is preferable that the protective film has a circular planar shape having a circular hole in the center. In addition, the protective film preferably has a film thickness of 0.01 mm to 0.5 mm.

本发明的磁记录介质用玻璃基板的制造方法具有:准备具有主平面和侧面的磁记录介质用玻璃素板的磁记录介质用玻璃素板准备工序;将所述磁记录介质用玻璃素板加工成中央部具有圆孔的圆盘形状的玻璃基板的赋形工序;研磨所述玻璃基板的主平面的主平面研磨工序;和所述玻璃基板的清洗工序,其特征在于,所述磁记录介质用玻璃素板准备工序具有:在玻璃素板的至少一个主平面上形成含有树脂的保护膜、制成磁记录介质用玻璃素板的保护膜形成工序。The manufacturing method of the glass substrate for magnetic recording media of the present invention comprises: preparing a glass frit plate for magnetic recording medium having a main plane and a side surface of a frit sheet for magnetic recording medium; A step of shaping the glass substrate into a disk-shaped glass substrate with a hole in the center; a main plane grinding step of grinding the main plane of the glass substrate; and a cleaning step of the glass substrate, wherein the magnetic recording medium The step of preparing a glass plain plate includes a protective film forming step of forming a protective film containing a resin on at least one main plane of the glass plain plate to obtain a glass plain plate for magnetic recording media.

本发明的磁记录介质用玻璃基板的制造方法中,所述保护膜形成工序具有:在所述玻璃素板的至少一个主平面上印刷或涂布含有液态固化性树脂的组合物的工序;和使该印刷层或涂布层固化的工序。此外,所述保护膜形成工序可以具有:在所述玻璃素板的至少一个主平面上贴合含有树脂的保护膜的工序。在所述保护膜形成工序中形成的所述保护膜优选具有在中央部有圆形孔部的圆环形的平面形状。此外,所述保护膜形成工序中形成的所述保护膜优选具有0.01mm~0.5mm的膜厚。进而,优选在所述赋形工序和所述主平面研磨工序之间具有除去所述保护膜的保护膜除去工序。In the method for producing a glass substrate for magnetic recording media according to the present invention, the protective film forming step includes: printing or applying a composition containing a liquid curable resin on at least one main plane of the vitrified glass plate; and A step of curing the printed layer or coated layer. In addition, the protective film forming step may include a step of bonding a protective film containing a resin to at least one main plane of the vitrified glass plate. The protective film formed in the protective film forming step preferably has a circular planar shape with a circular hole in the center. In addition, the protective film formed in the protective film forming step preferably has a film thickness of 0.01 mm to 0.5 mm. Furthermore, it is preferable to include a protective film removal step for removing the protective film between the shaping step and the main surface polishing step.

本说明书中,将保护膜形成前的玻璃板记为“玻璃素板”。此外,将在该“玻璃素板”的主平面上形成了保护膜的结构的记为“磁记录介质用玻璃素板”,“玻璃素板”和“磁记录介质用玻璃素板”区别记载。In this specification, the glass plate before formation of a protective film is described as a "vitreous plain plate". In addition, the structure in which the protective film is formed on the main plane of the "vitreous plain plate" is described as "vitreous plain plate for magnetic recording media", and "vitreous plain plate" and "vitreous plain plate for magnetic recording medium" are described separately. .

发明的效果The effect of the invention

根据本发明的磁记录介质用玻璃素板和磁记录介质用玻璃基板的制造方法,可以以良好的产率获得防止在主平面研磨工序前产生的伤痕等缺陷、主平面的平滑性优异、没有凹形缺陷的磁记录介质用玻璃基板。此外,能够降低供给制造磁记录介质用玻璃基板的磁记录介质用玻璃素板和玻璃素板的厚度,减少研磨量,实现降低材料损失和提高生产率。According to the manufacturing method of the vitrified glass plate for magnetic recording media and the glass substrate for magnetic recording media of the present invention, it is possible to obtain defects such as preventing defects such as scratches generated before the grinding process of the main plane, excellent smoothness of the main plane, and no defects in the main plane with good yield. A glass substrate for a magnetic recording medium with concave defects. In addition, it is possible to reduce the thickness of the vitrified glass plate for magnetic recording media and the vitrified glass plate supplied to manufacture the glass substrate for magnetic recording media, reduce the amount of grinding, reduce material loss and improve productivity.

附图说明 Description of drawings

【图1】通过本发明制造的磁记录介质用玻璃基板的剖面立体图。[ Fig. 1 ] A cross-sectional perspective view of a glass substrate for magnetic recording media produced by the present invention.

【图2】表示本发明的磁记录介质用玻璃素板的一个实施方式的平面图。[ Fig. 2] Fig. 2 is a plan view showing an embodiment of the glass plate for magnetic recording media of the present invention.

【图3】表示本发明的实施方式中印刷保护膜形成用树脂材料的方法的一例的图。[ Fig. 3] Fig. 3 is a diagram showing an example of a method of printing a resin material for forming a protective film in an embodiment of the present invention.

【图4】表示本发明的实施方式中通过印刷等形成的树脂组合物的固化方法的一例的图。[ Fig. 4] Fig. 4 is a diagram showing an example of a curing method of a resin composition formed by printing or the like in an embodiment of the present invention.

【图5】表示本发明的实施例例1~3的磁记录介质用玻璃基板的制造方法的流程图。[ Fig. 5 ] is a flow chart showing a method of manufacturing a glass substrate for a magnetic recording medium according to Examples 1 to 3 of the present invention.

【图6】表示本发明的实施例例4~6的磁记录介质用玻璃基板的制造方法的流程图。[ Fig. 6] Fig. 6 is a flow chart showing a method for manufacturing a glass substrate for a magnetic recording medium according to Examples 4 to 6 of the present invention.

【图7】表示本发明的实施例例7~9的磁记录介质用玻璃基板的制造方法的流程图。[ Fig. 7] Fig. 7 is a flowchart showing a method of manufacturing a glass substrate for a magnetic recording medium according to Examples 7 to 9 of the present invention.

【图8】表示本发明的实施例例10和比较例例11的磁记录介质用玻璃基板的制造方法的流程图。[ Fig. 8 ] A flow chart showing a method for manufacturing a glass substrate for a magnetic recording medium according to Example 10 of the present invention and Comparative Example 11.

具体实施方式 Detailed ways

以下,说明实施本发明的方式,但本发明不受以下记载的实施方式的限制。Hereinafter, modes for implementing the present invention will be described, but the present invention is not limited to the embodiments described below.

<磁记录介质用玻璃素板><Glass plain plate for magnetic recording media>

本发明的磁记录介质用玻璃素板是用于制造在中央部具有圆孔的圆盘形状的磁记录介质用玻璃基板的玻璃素板。The glass plain plate for magnetic recording media of this invention is a glass plain plate for manufacturing the disk-shaped glass substrate for magnetic recording media which has a circular hole in the center part.

首先,将使用本发明的磁记录介质用玻璃素板制造的磁记录介质用玻璃基板的一例示于图1。图1所示的磁记录介质用玻璃基板10具有在中央部有圆形贯通孔即圆孔11的圆盘形状,具有由圆孔11的内壁面即内周侧面101和外周侧面102、以及上下1对主平面103构成的圆盘形状。此外,在内周侧面101和上下两个主平面103的交叉部以及外周侧面102和上下两个主平面103的交叉部分别形成倒角部104(内周面倒角部和外周面倒角部)。First, an example of the glass substrate for magnetic recording media manufactured using the glass frit plate for magnetic recording media of this invention is shown in FIG. 1. The glass substrate 10 for magnetic recording media shown in FIG. 1 has a disc shape with a circular through hole, namely a circular hole 11, at the central portion, and has an inner peripheral side 101 and an outer peripheral side 102 formed by the inner wall surface of the circular hole 11, and the upper and lower sides. A disc shape formed by a pair of main planes 103 . Furthermore, the intersections of the inner peripheral side 101 and the upper and lower main planes 103 and the intersections of the outer peripheral side 102 and the upper and lower main planes 103 form chamfers 104 (inner peripheral chamfers and outer peripheral chamfers), respectively.

本发明的磁记录介质用玻璃素板的一例示于图2。图2所示的磁记录介质用玻璃素板20具有上下一对主平面和侧面,在至少一个主平面21上具有含有树脂的保护膜22。构成保护膜22的树脂可以例举液态的、在涂布后形成固化膜的固化型树脂,例如,热固化性树脂、光固化型树脂等反应固化型树脂。从固化作业的安全性、作业环境、操作容易性等观点,优选光固化型树脂,更优选可见光固化型树脂。此外,优选固化物对玻璃的粘结性(密合性)良好且易于剥离的树脂,与在有机溶剂中剥离的类型相比,优选在水或温水中能够剥离的树脂。此外,含有树脂的保护膜22可以贴合树脂膜形成。An example of the vitrified glass plate for magnetic recording media of the present invention is shown in FIG. 2 . The glass plain plate 20 for magnetic recording media shown in FIG. 2 has a pair of upper and lower main planes and side surfaces, and has a resin-containing protective film 22 on at least one of the main planes 21 . The resin constituting the protective film 22 may, for example, be a liquid curable resin that forms a cured film after coating, for example, a reaction curable resin such as a thermosetting resin or a photocurable resin. From the viewpoints of safety in curing work, working environment, ease of handling, etc., photocurable resins are preferred, and visible light curable resins are more preferred. In addition, a cured product is preferably a resin that has good adhesion (adhesion) to glass and is easy to peel, and a resin that can be peeled in water or warm water is more preferable than a type that peels in an organic solvent. In addition, the resin-containing protective film 22 can be formed by bonding a resin film.

关于用于形成保护膜22的优选树脂材料以及保护膜22的形成方法将在后述的磁记录介质用玻璃基板的制造方法项下说明。The preferable resin material for forming the protective film 22 and the formation method of the protective film 22 are demonstrated under the manufacturing method of the glass substrate for magnetic recording media mentioned later.

保护膜22的平面形状如图2所示,优选中央部具有圆形孔部的圆环形,即甜甜圈形。此外,所述甜甜圈形保护膜22的外径尺寸和圆形孔部的内径尺寸优选均与后述的圆形加工工序后的玻璃基板的主平面的外径尺寸和内径尺寸相同,更优选与倒角加工后的上述尺寸相同。进而,出于主平面研磨前的加工工序中不用削掉保护膜、加工作业性良好,而且保护膜材料的损失成分少的理由,特别优选保护膜22的外径尺寸和圆形孔部的内径尺寸与最终产品磁记录介质用玻璃基板的所述尺寸相同。The planar shape of the protective film 22 is, as shown in FIG. 2 , preferably a donut shape having a circular hole in the center. In addition, the outer diameter of the donut-shaped protective film 22 and the inner diameter of the circular hole are preferably the same as the outer diameter and inner diameter of the main plane of the glass substrate after the circular processing step described later. It is preferably the same as the above-mentioned dimension after chamfering. Furthermore, the outer diameter of the protective film 22 and the inner diameter of the circular hole are particularly preferable because the protective film does not need to be chipped off in the processing step before the main plane grinding, the processing workability is good, and the loss component of the protective film material is small. The size is the same as the above-mentioned size of the glass substrate for a magnetic recording medium as a final product.

保护膜22不限定于无间隙地被覆所述甜甜圈形等平面区域的所谓β标准膜形的膜,也可以为以格栅状或点状等小尺寸的图案盖住该平面区域的膜。以格栅状或点状等图案形成甜甜圈形状的保护膜22,在主平面的保护这一点上逊色于所述β标准膜形的保护膜,但是具有易于剥离且能够降低树脂等保护膜材料的使用量这些优点。The protective film 22 is not limited to the so-called β-standard film-shaped film that covers the flat area such as the donut shape without gaps, and may be a film that covers the flat area in a small-sized pattern such as a grid shape or a dot shape. . The donut-shaped protective film 22 formed in a grid-like or dot-like pattern is inferior to the β-standard film-shaped protective film in terms of the protection of the main plane, but it has the advantages of being easy to peel and can reduce resin and other protective films. The amount of material used has these advantages.

保护膜22的膜厚优选0.01mm~0.5mm。保护膜22的膜厚不足0.01mm时,有不能充分防止玻璃碎片或异物的夹杂等引起的主平面的伤痕等缺陷的担忧。此外,膜厚超过0.5mm时,存在除去保护膜22较为耗时,形成保护膜22的树脂材料的固化较为耗时等问题的担忧。此外,在从保护膜22的形成到主平面研磨之间实施的其他加工工序(例如,端面研磨工序等)中也存在产率下降的担忧。保护膜22的膜厚优选0.05mm~0.5mm,更优选0.05mm~0.4mm,特别优选0.06mm~0.2mm。The film thickness of the protective film 22 is preferably 0.01 mm to 0.5 mm. When the film thickness of the protective film 22 is less than 0.01 mm, defects such as scratches on the main plane caused by glass shards or inclusion of foreign matter may not be sufficiently prevented. In addition, when the film thickness exceeds 0.5 mm, it may take time to remove the protective film 22 and it may take time to cure the resin material forming the protective film 22 . In addition, there is also a possibility that the yield may be lowered in other processing steps (for example, an end surface grinding step, etc.) performed between the formation of the protective film 22 and the grinding of the main plane. The film thickness of the protective film 22 is preferably 0.05 mm to 0.5 mm, more preferably 0.05 mm to 0.4 mm, particularly preferably 0.06 mm to 0.2 mm.

这样,通过使用在玻璃素板的至少一个主平面上具有含有树脂的保护膜的磁记录介质用玻璃素板,按照下述方法制造磁记录介质用玻璃基板,可以以良好的产率获得防止在主平面研磨工序前发生的伤痕等缺陷、具有平滑性优异的主平面的磁记录介质用玻璃基板。此外,可以降低玻璃素板的厚度、减少研磨量,实现降低玻璃材料等的损失和缩短研磨时间等带来的产率的提高。In this way, by using a glass substrate for magnetic recording media having a protective film containing resin on at least one main plane of the glass substrate, and manufacturing a glass substrate for magnetic recording media according to the following method, it is possible to obtain a good yield to prevent A glass substrate for magnetic recording media having a main plane excellent in smoothness due to defects such as scratches that occurred before the main plane polishing process. In addition, the thickness of the glass plate can be reduced, the amount of grinding can be reduced, the loss of glass materials, etc. can be reduced, and the productivity can be improved by shortening the grinding time.

<磁记录介质用玻璃基板的制造方法><Manufacturing method of glass substrate for magnetic recording medium>

本发明的实施方式涉及的磁记录介质用玻璃基板的制造方法具有:The manufacturing method of the glass substrate for magnetic recording media which concerns on embodiment of this invention has:

(1)磁记录介质用玻璃素板准备工序、(1) Preparation process of glass plain plate for magnetic recording medium,

(2)赋形工序、(2) Forming process,

(3)端面研磨工序、(3) End face grinding process,

(4)保护膜除去工序、(4) Protective film removal process,

(5)主平面研磨工序、和(5) Main plane grinding process, and

(6)清洗工序。其特征在于,(1)磁记录介质用玻璃素板准备工序具有在玻璃素板的至少一个主平面上形成含有树脂的保护膜的保护膜形成工序(1a)。(6) Cleaning process. (1) The step of preparing a glass fibrous plate for a magnetic recording medium includes a protective film forming step (1a) of forming a protective film containing a resin on at least one main plane of the glass fibrous plate.

实施方式的磁记录介质用玻璃基板的制造方法中,可以在各工序之间实施玻璃基板的清洗(工序间清洗)和玻璃基板表面(玻璃基板的部分或全部表面(例如,主平面、内周端面和外周端面中的至少一部分))的蚀刻(工序间蚀刻)。此外,要求磁记录介质用玻璃基板具有高机械强度时,可以在主平面研磨工序前或主平面研磨工序后,或者主平面研磨工序之间(一次研磨和二次研磨之间或二次研磨和三次研磨之间)实施在玻璃基板的表层形成强化层的强化工序(例如,化学强化工序)。In the method for manufacturing a glass substrate for a magnetic recording medium according to the embodiment, cleaning of the glass substrate (cleaning between processes) and the surface of the glass substrate (partial or entire surfaces of the glass substrate (for example, main plane, inner periphery, etc.) may be performed between each process. end face and at least a part of the peripheral end face)) (inter-process etching). In addition, when the glass substrate for magnetic recording media is required to have high mechanical strength, it can be ground before the main plane grinding process or after the main plane grinding process, or between the main plane grinding process (between the first grinding and the second grinding or between the second grinding and the third grinding). Between grinding) a strengthening step (for example, a chemical strengthening step) is performed to form a strengthening layer on the surface layer of the glass substrate.

下面对各工序进行说明。Each step will be described below.

(1)磁记录介质用玻璃素板准备工序(1) Preparation process of glass plain plate for magnetic recording medium

(1)磁记录介质用玻璃素板准备工序是准备具有主平面和侧面、在至少一个主平面上具有含有树脂的保护膜的玻璃素板即磁记录介质用玻璃素板的工序,具有在玻璃素板表面形成保护膜的保护膜形成工序(1a)和将在表面上形成了保护膜的玻璃素板切断为规定的尺寸的切断工序(1b)。(1) The process of preparing a glass plain plate for magnetic recording media is a process of preparing a glass plain plate for magnetic recording media that has a main plane and side surfaces, and a protective film containing resin on at least one of the main planes. A protective film forming step (1a) of forming a protective film on the surface of a plain plate, and a cutting process (1b) of cutting the glass plain plate on which the protective film is formed on the surface into a predetermined size.

构成玻璃素板的玻璃可以是无定形玻璃也可以是晶体玻璃,还可以是表层具有强化层的强化玻璃(例如,化学强化玻璃)。此外,玻璃素板可以是通过浮法成形的玻璃素板也可以是通过熔融法、下拉法(down draw)、再曳引(redraw)法、辊压法或加压成形法成形的玻璃素板。The glass constituting the vitreous plate may be amorphous glass or crystal glass, or tempered glass (for example, chemically strengthened glass) with a strengthening layer on the surface. In addition, the glass plain plate can be formed by float method or formed by melting method, down draw method, redraw method, rolling method or pressure forming method. .

(1a)保护膜形成工序(1a) Protective film formation process

保护膜形成工序中,在玻璃素板的至少一个主平面上形成含有树脂的保护膜。保护膜可以形成在玻璃素板的一个主平面上,优选在两个主平面上形成保护膜。In the protective film forming step, a protective film containing a resin is formed on at least one main plane of the glass plain plate. The protective film may be formed on one main plane of the plain glass plate, preferably on two main planes.

构成保护膜的树脂可以例举热固化型树脂、光固化型树脂等固化型树脂。这些固化型树脂中,作为光固化性树脂可以例举可见光固化型树脂和紫外线固化型树脂。可见光固化型树脂具体可以例举丙烯酸类树脂、聚硫醇改性丙烯酸类树脂等,紫外线固化型树脂可以例举环氧类树脂、丙烯酸类树脂、甲基丙烯酸类树脂、聚酰亚胺类树脂、硅氧烷树脂、环氧丙烯酸酯树脂、丙烯酸氨基甲酸乙酯树脂、氧杂环丁烷树脂、乙烯基醚树脂、苯并噁嗪树脂等。此外,热固化型树脂可以例举环氧树脂、三聚氰胺树脂、酚醛树脂、醋酸乙烯酯树脂等。The resin constituting the protective film may, for example, be curable resins such as thermosetting resins and photocurable resins. Among these curable resins, examples of photocurable resins include visible light curable resins and ultraviolet curable resins. Specific examples of visible light-curable resins include acrylic resins and polythiol-modified acrylic resins, and examples of ultraviolet-curable resins include epoxy resins, acrylic resins, methacrylic resins, and polyimide resins. , silicone resin, epoxy acrylate resin, acrylate urethane resin, oxetane resin, vinyl ether resin, benzoxazine resin, etc. In addition, examples of thermosetting resins include epoxy resins, melamine resins, phenol resins, vinyl acetate resins, and the like.

在玻璃素板的至少一个主平面上贴合树脂膜形成含有树脂的保护膜时,树脂膜可以例举聚对苯二甲酸乙二醇酯类膜、聚硅氧烷树脂类膜、聚氯乙烯树脂膜、聚乙烯类膜、聚烯烃类膜、聚酯类膜、氟树脂类膜、聚碳酸酯类膜、聚丙烯类膜、聚苯硫醚类膜、对位芳族聚酰胺类膜、聚乳酸膜、聚酰亚胺类膜、尼龙类膜等。When bonding a resin film on at least one main plane of a glass plain plate to form a resin-containing protective film, the resin film may, for example, be a polyethylene terephthalate film, a polysiloxane resin film, a polyvinyl chloride film, or a polyvinyl chloride film. Resin film, polyethylene film, polyolefin film, polyester film, fluororesin film, polycarbonate film, polypropylene film, polyphenylene sulfide film, para-aramid film, Polylactic acid film, polyimide film, nylon film, etc.

如上所述,从固化作业的安全性、作业环境、操作容易性等观点,优选光固化型树脂,更优选可见光固化型树脂。此外,优选固化物对玻璃的粘结性(密合性)良好且易于剥离的树脂,与在有机溶剂中剥离的类型相比,优选在水或温水中能够剥离的树脂。As described above, from the viewpoints of safety in curing work, working environment, ease of handling, etc., photocurable resins are preferred, and visible light curable resins are more preferred. In addition, a cured product is preferably a resin that has good adhesion (adhesion) to glass and is easy to peel, and a resin that can be peeled in water or warm water is more preferable than a type that peels in an organic solvent.

所述固化型树脂是能够通过热、光固化的树脂,本发明的保护膜实际上是由该固化型树脂的固化物构成,本说明书中,由构成保护膜的树脂固化后固化物(树脂固化物)也记为“固化树脂”,用于形成该“固化树脂”的树脂材料(含有固化性树脂的组合物)也记为“固化性树脂组合物”。The curable resin is a resin that can be cured by heat and light. The protective film of the present invention is actually composed of a cured product of the curable resin. In this specification, the cured product (resin cured) material) is also referred to as "cured resin", and the resin material (composition containing curable resin) used to form the "cured resin" is also referred to as "curable resin composition".

由这样的固化型树脂构成的保护膜中,可以含有以树脂为主体的微珠或微囊(平均粒径0.005~0.5mm)、或者二氧化硅粒子(平均粒径0.005~0.1mm)。含有比例相对于构成保护膜的树脂优选为88质量%以下。本说明书中,平均粒径表示粒度分布累积50%点的粒子直径即d50。粒径是使用激光衍射式或激光散射式等粒度分布计或扫描型电子显微镜(SEM)测定的值。The protective film made of such a curable resin may contain resin-based beads or microcapsules (average particle diameter: 0.005 to 0.5 mm), or silica particles (average particle diameter: 0.005 to 0.1 mm). The content ratio is preferably 88% by mass or less with respect to the resin constituting the protective film. In the present specification, the average particle diameter means d50 which is the particle diameter at the cumulative 50% point of the particle size distribution. The particle size is a value measured using a particle size distribution meter such as a laser diffraction type or a laser scattering type, or a scanning electron microscope (SEM).

能够使用的微珠或微囊可以举例如下。Examples of microbeads or microcapsules that can be used are as follows.

·高分子中空微球复合物混合中空微球· Polymer hollow microsphere composite mixed hollow microspheres

…………マツモトマイクロスフエア一M F L系列(松本油脂制药株式会社制)……… MatsumotoMaikrosfea-MFL series (manufactured by Matsumoto Yushi Pharmaceutical Co., Ltd.)

·高分子中空微球复合物(外壳热塑性树脂+内部脂肪族烃发泡剂)· Polymer hollow microsphere composite (shell thermoplastic resin + internal aliphatic hydrocarbon foaming agent)

…………クレハマイクロスフエア一(株式会社吴羽((株)クレハ)制)………Krehamai Crossfea One (manufactured by Kureha Co., Ltd.)

·热膨胀性微囊(热塑性高分子外壳+低沸点烃内核)Heat-expandable microcapsules (thermoplastic polymer shell + low-boiling hydrocarbon core)

…………マツモトマイクロスフエア一F、FN系列(松本油脂制药株式会社制)………… Matsumotomaicross Feria-F, FN series (manufactured by Matsumoto Yushi Pharmaceutical Co., Ltd.)

·热膨胀性微囊(在树脂外壳中包裹发泡剂(液态烃))・Heat-expandable microcapsules (encapsulation of a blowing agent (liquid hydrocarbon) in a resin shell)

…………EXPANCEL(日本菲莱特株式会社(日本フイライト(株))制)………… EXPANCEL (manufactured by Japan Phillight Co., Ltd.

·微珠(聚甲基丙烯酸甲酯构成的微粒)・Microbeads (fine particles made of polymethyl methacrylate)

…………マツモトマイクロスフエア一M系列(松本油脂制药株式会社制)………… Matsumotomaicrossfea-M series (manufactured by Matsumoto Yushi Pharmaceutical Co., Ltd.)

·微珠(交联聚丙烯酸烷基酯构成的具有橡胶状弹性的微粒)・Microbeads (rubber-like elastic particles composed of cross-linked polyalkylacrylate)

…………マツモトマイクロスフエア一S系列(松本油脂制药株式会社制)………… Matsumotomaicrossfea-S series (manufactured by Matsumoto Yushi Pharmaceutical Co., Ltd.)

·亲水性微珠(丙烯酸类聚合物微粒)・Hydrophilic microbeads (acrylic polymer particles)

·微树脂珠(丙烯酸珠、聚乙烯珠、聚丙烯珠、聚氯乙烯珠、聚苯乙烯珠)· Micro resin beads (acrylic beads, polyethylene beads, polypropylene beads, polyvinyl chloride beads, polystyrene beads)

通过在保护膜中含有这样的微小粒子(微珠或微囊),具有可以减少构成保护膜的固化型树脂的量,膜厚的控制容易,在温水中容易剥离,玻璃基板之间难以密合,端面研磨后容易将玻璃基板从玻璃基板层叠体中分离等优点。By including such fine particles (beads or microcapsules) in the protective film, the amount of curable resin constituting the protective film can be reduced, the control of the film thickness is easy, it is easy to peel off in warm water, and it is difficult to adhere to the glass substrates , It is easy to separate the glass substrate from the glass substrate laminate after end surface grinding.

由固化树脂构成的用于形成保护膜的优选树脂材料(固化性树脂组合物)可以例举クリアプレストCP3722(商品名:安德鲁株式会社((株)ア一デル)制)。该树脂材料是以含有热膨胀性微囊的高沸点甲基丙烯酸和高沸点二甲基丙烯酸为主成分的液态材料,通过照射可见光固化,形成以丙烯酸类树脂为主体的粘结性良好的保护膜。此外,这样形成的保护膜通过浸渍在温水中被轻易地剥离。A preferable resin material (curable resin composition) for forming a protective film made of a cured resin may, for example, be Clear Presto CP3722 (trade name: manufactured by Andrew Co., Ltd.). This resin material is a liquid material mainly composed of high-boiling-point methacrylic acid and high-boiling-point dimethacrylic acid containing heat-expandable microcapsules. It is cured by irradiating visible light to form a protective film with good adhesion mainly composed of acrylic resin. . In addition, the protective film thus formed was easily peeled off by immersion in warm water.

为了形成由所述固化树脂构成的保护膜,将用于形成该固化树脂的树脂材料即液态固化性树脂组合物印刷或涂布在玻璃素板的至少一个主平面上形成印刷层或涂布层后,使该印刷层或涂布层固化。印刷方法和涂布方法可以例举下述方法。In order to form the protective film composed of the cured resin, the resin material for forming the cured resin, that is, the liquid curable resin composition is printed or coated on at least one main plane of the glass plate to form a printed layer or a coated layer Afterwards, the printed layer or coated layer is cured. As the printing method and coating method, the following methods can be exemplified.

(1)印刷方法(1) Printing method

使用凸版印刷(活版印刷)、凹版印刷(gravure printing)、平版印刷(off set printing)、丝网印刷(screen printing)等版式,或使用喷墨方式,将液态的固化性树脂组合物印刷成规定的形状。Print the liquid curable resin composition into a prescribed form using letterpress printing, gravure printing, offset printing, screen printing, or inkjet. shape.

如图3所示,凸版印刷(活版印刷)可以采用浸透方式进行印刷。图3中,符号30表示浸透式压模,符号31表示玻璃素板。此外,符号32表示印刷层。该压模30由多孔质橡胶等构成,具有要印刷的规定的图案形状(例如,甜甜圈形状)的印刷部301和设置在印刷部301上、在微细的连续气泡内吸纳液态固化性树脂组合物的吸纳部302。此外,通过将印刷部301压在玻璃素板31上,将从吸纳部302浸透到印刷部301的所述液态固化性树脂组合物转印到玻璃素板31的主平面上,形成与印刷部301同形状的印刷层32。As shown in Figure 3, letterpress printing (type printing) can be printed by dipping. In Fig. 3, reference numeral 30 denotes a immersion stamper, and reference numeral 31 denotes a glass plain plate. In addition, reference numeral 32 denotes a printing layer. This stamper 30 is made of porous rubber or the like, has a printing part 301 of a predetermined pattern shape (for example, a donut shape) to be printed, and a liquid curable resin that is provided on the printing part 301 and absorbed in fine open cells. The absorption part 302 of the composition. In addition, by pressing the printing part 301 on the glass plain plate 31, the liquid curable resin composition permeated into the printing part 301 from the receiving part 302 is transferred to the main plane of the glass plain plate 31 to form a printed part. 301 is the same shape as the printing layer 32.

(2)涂布方法(2) Coating method

通过刷涂、辊涂、吹涂(喷涂、无空气喷涂)、滚涂等,在玻璃素板的主平面上形成规定的平面形状(例如,甜甜圈形状)的涂布层。By brushing, roller coating, blow coating (spray coating, airless spray coating), roll coating, etc., a coating layer with a predetermined planar shape (eg, donut shape) is formed on the main plane of the glass plate.

这样形成于玻璃素板主平面上的印刷层或涂布层(以下也表示为印刷层等)可以通过施加对应于树脂种类的固化方法,即可见光或紫外线照射、加热等固化方法使其固化。The printed layer or coated layer (hereinafter also referred to as printed layer, etc.) formed on the main plane of the vitrified plate can be cured by applying a curing method corresponding to the type of resin, that is, visible light or ultraviolet radiation, heating, and other curing methods.

例如,以光固化性树脂为主成分的液态树脂组合物的固化可以如图4所示进行。即,可以采取一边通过传送带43使形成了印刷层等41的玻璃素板42连续移动,一边向印刷层等41照射来自可见光源44的光从而使其固化的方式。For example, curing of a liquid resin composition containing a photocurable resin as a main component can be performed as shown in FIG. 4 . That is, a method may be adopted in which the printed layer 41 is irradiated with light from the visible light source 44 to cure the printed layer 41 while continuously moving the glass plate 42 on which the printed layer 41 is formed by the conveyor belt 43 .

虽然在形成由这样的固化型树脂构成的保护膜时采用印刷或涂布通过固化形成所述固化树脂的液态固化性树脂组合物从而使印刷层等固化的方法,但也可以通过事先将形成甜甜圈形状等规定形状的带有粘结剂的树脂膜或自粘结型树脂膜贴合在玻璃素板的主平面上以形成保护膜。这样的保护膜形成用树脂膜可以例举聚氯乙烯树脂膜、聚乙烯类膜、聚烯烃类膜、聚酯类膜、氟树脂类膜、聚碳酸酯类膜、聚丙烯类膜、聚苯硫醚类膜、对位芳族聚酰胺类膜、聚乳酸膜、聚酰亚胺类膜、聚对苯二甲酸乙二醇酯类膜、聚硅氧烷树脂类膜、尼龙类膜等。When forming a protective film made of such a curable resin, a method of printing or applying a liquid curable resin composition that forms the curable resin by curing to cure the printed layer, etc. A resin film with an adhesive or a self-adhesive resin film having a predetermined shape such as a donut shape is bonded to the main plane of the plain glass plate to form a protective film. Such protective film-forming resin films include polyvinyl chloride resin films, polyethylene films, polyolefin films, polyester films, fluororesin films, polycarbonate films, polypropylene films, polystyrene films, and polystyrene films. Sulfide film, para-aramid film, polylactic acid film, polyimide film, polyethylene terephthalate film, polysiloxane resin film, nylon film, etc.

(1b)切断工序(1b) Cutting process

(1b)切断工序中,将在主平面上形成规定形状(例如,甜甜圈形状)的保护膜的玻璃素板切断成规定的形状和尺寸以使其包围保护膜的外周,制成具有规定的平面形状(例如正方形等矩形平面形状或圆盘形状)的小板。该切断工序(1b)可以在保护膜形成工序(1a)前进行。即,将大尺寸的玻璃素板切断成相当于1片磁记录介质用玻璃基板的尺寸的小板后,在每1片小板上形成具有所述甜甜圈形状等平面形状的保护膜。或者,对于每一片通过加压成型成型为圆盘形状或甜甜圈形状的玻璃素板,形成具有所述甜甜圈形状等平面形状的保护膜。这样获得具有规定的形状和尺寸、且至少一个主平面上具有保护膜的磁记录介质用玻璃素板。(1b) In the cutting process, the glass plate with a protective film of a predetermined shape (for example, a donut shape) is cut into a predetermined shape and size on the main plane so that it surrounds the outer periphery of the protective film, and a glass plate with a predetermined shape is formed. Small plates of planar shapes (such as rectangular planar shapes such as squares or disc shapes). This cutting step (1b) may be performed before the protective film forming step (1a). That is, after cutting a large-sized glass plain plate into small plates corresponding to the size of one glass substrate for magnetic recording media, a protective film having a planar shape such as the donut shape described above is formed on each small plate. Alternatively, a protective film having a planar shape such as the donut shape is formed for each plain glass plate formed into a disc shape or a donut shape by press molding. In this way, a vitrified glass plate for magnetic recording media having a predetermined shape and size and having a protective film on at least one main plane was obtained.

(1c)第1主平面磨削工序(1c) The first main surface grinding process

在(1c)第1主平面磨削工序中,磨削玻璃素板的上下两个主平面或在设置于保护膜形成工序(1a)之前的切断工序(1b)中被切断为规定的尺寸和形状的玻璃素板的主平面。该主平面磨削中,通过双面磨削装置或单面磨削装置,进行使用了游离研磨粒的游离研磨粒磨削或使用了固定研磨粒工具的固定研磨粒磨削。游离研磨粒和固定研磨粒可以使用平均粒径大于在后述的第2主平面磨削工序中使用的研磨粒的平均粒径的金刚石粒子、氧化铝粒子、碳化硅粒子等。In (1c) the first main plane grinding step, the upper and lower main planes of the glass plain plate are ground or cut into predetermined dimensions and The principal plane of the plain glass plate of the shape. In this main surface grinding, free abrasive grinding using free abrasives or fixed abrasive grinding using a fixed abrasive tool is performed by a double-side grinding device or a single-side grinding device. As the free abrasive grains and the fixed abrasive grains, diamond grains, alumina grains, silicon carbide grains, etc. having an average grain diameter larger than that of the abrasive grains used in the second main surface grinding step described later can be used.

(2)赋形工序(2) Shaping process

(2)赋形工序是将具有规定尺寸的平面形状、至少一个主平面上具有保护膜的磁记录介质用玻璃素板加工成中央部具有圆孔的圆盘形状的玻璃基板的工序,具有(2a)圆形加工工序和(2b)倒角工序。在保护膜形成工序(1a)后进行切断工序(1b)的流程中,可以将切断工序(1b)插入(2)赋形工序中。(2) The shaping step is a step of processing a glass substrate for magnetic recording media having a planar shape of a predetermined size and having a protective film on at least one main plane into a disc-shaped glass substrate with a round hole in the center, which has ( 2a) Circular machining process and (2b) chamfering process. In the flow of performing the cutting step (1b) after the protective film forming step (1a), the cutting step (1b) may be inserted into the (2) shaping step.

(2a)圆形加工工序(2a) Circular machining process

(2a)圆形加工工序中,将所述磁记录介质用玻璃素板切成圆形的同时,在中央部形成圆孔(圆形的贯通孔)。(2a) In the circular processing step, a circular hole (circular through-hole) is formed in the center while cutting the above-mentioned glass plain plate for magnetic recording media into a circular shape.

(2b)倒角工序(2b) Chamfering process

(2b)倒角工序中,在经圆形加工过的玻璃基板的内周侧面和上下两个主平面的交叉部、以及外周侧面和上下两个主平面的交叉部分别进行倒角加工,形成内周面倒角部和外周面倒角部。(2b) In the chamfering process, chamfering is performed on the inner peripheral side of the circularly processed glass substrate and the intersection of the upper and lower main planes, and the intersection of the outer peripheral side and the upper and lower main planes, respectively, to form The chamfered part of the inner peripheral surface and the chamfered part of the outer peripheral surface.

(3)端面研磨工序(3) End face grinding process

(3)端面研磨工序中,为了除去在玻璃基板的圆形加工和倒角加工时生成的伤痕等,同时将在倒角加工中形成端面的凹凸磨削面平滑化,降低端面的粗糙度,进行内周端面(内周侧面和内周面倒角部)和外周端面(外周侧面和外周面倒角部)的研磨。也可以在端面研磨后进行内周端面的蚀刻。(3) In the end surface grinding process, in order to remove scratches and the like generated during rounding and chamfering of the glass substrate, and at the same time to smooth the concave-convex grinding surface that forms the end surface during the chamfering process, and reduce the roughness of the end surface, Grinding of the inner peripheral end face (inner peripheral side and inner peripheral chamfer) and outer peripheral end (outer peripheral side and outer peripheral chamfer) is performed. Etching of the inner peripheral end face may also be performed after end face grinding.

(3)端面研磨工序中,例如,叠层多片玻璃基板形成多个玻璃基板叠层体,使用含有研磨粒的研磨液和研磨刷研磨内周端面和外周端面。内周端面的研磨和外周端面的研磨可以同时进行也可以分别进行。此外,也可以只实施内周端面的研磨或外周端面的研磨中的其一。分别进行内周端面的研磨和外周端面的研磨时,进行的顺序没有特别限定,先进行哪个研磨都可以。例如,也可以采用这样的方法:对叠层玻璃基板的玻璃基板叠层体进行外周端面的研磨,接着在玻璃基板叠层体的状态下直接进行内周端面的研磨,然后,将玻璃基板层叠体分离,将玻璃基板一片一片地收纳在盒子等中,送至下一个工序。(3) In the end surface polishing step, for example, a plurality of glass substrates are stacked to form a plurality of glass substrate laminates, and the inner peripheral end surface and the outer peripheral end surface are polished using a polishing liquid containing abrasive grains and a polishing brush. The grinding of the inner peripheral end surface and the grinding of the outer peripheral end surface may be performed simultaneously or separately. In addition, only one of the grinding of the inner peripheral end surface and the grinding of the outer peripheral end surface may be performed. When the grinding of the inner peripheral end surface and the grinding of the outer peripheral end surface are performed separately, the order of performing is not particularly limited, and either grinding may be performed first. For example, it is also possible to adopt a method of grinding the outer peripheral end face of the glass substrate laminated body of the laminated glass substrate, then directly polishing the inner peripheral end face in the state of the glass substrate laminated body, and then laminating the glass substrates. The body is separated, and the glass substrates are stored one by one in a box or the like, and sent to the next process.

研磨粒可以使用二氧化铈粒子、二氧化硅离子、氧化铝粒子、氧化锆粒子、锆石粒子、碳化硅粒子、碳化硼粒子、金刚石粒子等。从研磨速度这一点,优选使用二氧化铈粒子。从端面研磨的效率(研磨速度)和通过研磨获得的端面的平滑性等观点,研磨粒的平均粒径优选为0.1~5μm。如前所述,本说明书中,平均粒径表示粒度分布累积50%点的粒子直径即d50。粒径是使用激光衍射式或激光散射式等的粒度分布计测定的值。As abrasive grains, ceria particles, silica ions, alumina particles, zirconia particles, zircon particles, silicon carbide particles, boron carbide particles, diamond particles and the like can be used. From the point of view of the polishing rate, it is preferable to use ceria particles. The average particle size of the abrasive grains is preferably 0.1 to 5 μm from the viewpoint of the efficiency of end surface grinding (polishing speed) and the smoothness of the end surface obtained by grinding. As mentioned above, in this specification, an average particle diameter means the particle diameter of the cumulative 50% point of a particle size distribution, ie d50. The particle size is a value measured using a particle size distribution meter such as a laser diffraction type or a laser scattering type.

(4)保护膜除去工序(4) Protective film removal process

保护膜除去工序中,将玻璃基板的主平面的保护膜在后述的(5)主平面研磨工序前除去。保护膜的除去可以通过直接剥去保护膜的方法或通过浸渍在水、温水或有机溶剂等中剥离或溶解保护膜进来行。此外,也可以在(5)主平面研磨工序前设置磨削主平面的工序(第2主平面磨削工序),通过该工序磨削除去保护膜。也可以在通过水、温水或有机溶剂等玻璃保护膜后,再进行所述第2主平面磨削工序。还可以省略这样的(4)保护膜除去工序。即,虽然(5)主平面研磨工序中的研磨速度下降,但可以对带有保护膜状态下的玻璃基板直接进行主平面研磨工序。In the protective film removal process, the protective film of the main plane of a glass substrate is removed before the (5) main plane grinding process mentioned later. Removal of the protective film can be performed by a method of directly peeling off the protective film, or by immersing in water, warm water, or an organic solvent to peel or dissolve the protective film. In addition, a step of grinding the main plane (second main plane grinding step) may be provided before the (5) main plane grinding step, and the protective film may be removed by grinding in this step. The second main surface grinding step may be performed after passing through a glass protective film such as water, warm water, or an organic solvent. Such (4) protective film removal process can also be omitted. That is, although the polishing rate in the (5) main surface polishing step decreases, the main surface polishing step can be directly performed on the glass substrate in a state with a protective film.

(4a)保护膜剥离工序(4a) Protective film peeling process

(4a)保护膜剥离工序中,将玻璃基板浸渍在水、温水或有机溶剂等剥离性或溶解性的溶剂中使构成保护膜的树脂软化、膨润或溶解,由此将保护膜从玻璃基板剥离,或溶解除去。剥离性溶剂可以根据构成保护膜的树脂的种类选择。此外,将玻璃基板浸渍在水、温水或有机溶剂等剥离性或溶解性溶剂中时,可以照射超声波。(4a) In the protective film peeling process, the glass substrate is immersed in a peelable or soluble solvent such as water, warm water, or an organic solvent to soften, swell or dissolve the resin constituting the protective film, thereby removing the protective film from the glass substrate. Peel off, or dissolve and remove. The peeling solvent can be selected according to the type of resin constituting the protective film. In addition, ultrasonic waves may be irradiated when the glass substrate is immersed in a releasable or soluble solvent such as water, warm water, or an organic solvent.

(4b)第2主平面磨削工序(4b) The second main surface grinding process

(4b)在第2主平面磨削工序中调整玻璃基板的平坦度和板厚。此外,可以通过磨削玻璃基板的主平面削掉主平面上形成的保护膜。在第2主平面磨削中,通过双面磨削装置或单面磨削装置,进行使用了游离研磨粒的游离研磨粒磨削或使用了固定研磨粒工具的固定研磨粒磨削。游离研磨粒和固定研磨粒可以使用例如平均粒径为0.5~10μm的金刚石粒子、氧化铝粒子、碳化硅粒子等。(4b) Adjust the flatness and plate thickness of the glass substrate in the second main surface grinding step. In addition, the protective film formed on the main plane can be chipped off by grinding the main plane of the glass substrate. In the second main surface grinding, free abrasive grinding using free abrasives or fixed abrasive grinding using a fixed abrasive tool is performed by a double-side grinding device or a single-side grinding device. As the free abrasive grains and the fixed abrasive grains, for example, diamond grains, alumina grains, silicon carbide grains and the like having an average grain diameter of 0.5 to 10 μm can be used.

(5)主平面研磨工序(5) Main plane grinding process

磁记录介质用玻璃基板的制造中,主平面的研磨是为了除去在圆形加工或倒角加工、主平面的磨削等时生成的伤痕等,将凹凸平滑化制成镜面的目的而进行的。(5)主平面研磨工序中优选使用含有研磨粒的研磨液和发泡树脂制研磨垫(硬质研磨垫或软质研磨垫),通过双面研磨装置进行上下两个主平面的研磨。In the manufacture of glass substrates for magnetic recording media, the grinding of the main plane is performed for the purpose of removing flaws, etc. generated during circular processing, chamfering, grinding of the main plane, etc., and smoothing the unevenness to make a mirror surface . (5) In the main plane polishing process, it is preferable to use a polishing liquid containing abrasive grains and a foamed resin polishing pad (hard polishing pad or soft polishing pad), and use a double-sided polishing device to polish the upper and lower main planes.

研磨粒可以使用二氧化硅粒子、氧化铝粒子、氧化锆粒子、锆石粒子、二氧化铈粒子等。可以只进行一次研磨,也可以在进行一次研磨之后使用平均粒径更小的研磨粒进行二次研磨。此外,也可以在二次研磨后使用粒径小的研磨粒进一步进行三次研磨(最终研磨)。As abrasive grains, silica particles, alumina particles, zirconia particles, zircon particles, ceria particles and the like can be used. Grinding may be performed only once, or secondary grinding may be performed using abrasive grains with a smaller average particle size after the primary grinding. In addition, it is also possible to further perform third grinding (final grinding) using abrasive grains having a small particle size after the second grinding.

(6)清洗工序(6) Cleaning process

(6)清洗工序中,对主平面被研磨后的玻璃基板进行了例如使用洗剂的擦洗清洗后,依次进行浸渍在洗剂溶液中的状态下的超声波清洗、浸渍在纯水中的状态下的超声波清洗。清洗后,实施干燥。干燥方法有例如采用异丙醇蒸气的蒸气干燥、采用暖风的暖水暖风干燥、旋转干燥等。在这样制造的磁记录介质用玻璃基板上形成磁性层等的薄膜,制造磁盘。(6) In the cleaning process, after the glass substrate whose main plane has been polished is scrubbed with detergent, for example, ultrasonic cleaning in a state of immersion in a detergent solution, and immersion in pure water are sequentially performed. ultrasonic cleaning. After washing, carry out drying. Drying methods include, for example, steam drying using isopropanol vapor, warm water and warm air drying using warm air, and spin drying. Thin films such as a magnetic layer are formed on the glass substrate for magnetic recording media manufactured in this way to manufacture a magnetic disk.

根据本发明的实施方式涉及的磁记录介质用玻璃基板的制造方法,可以以良好的产率获得防止在主平面研磨工序前产生的伤痕等缺陷、主平面的平滑性优异的磁记录介质用玻璃基板。此外,能够降低供给制造磁记录介质用玻璃基板的玻璃素板的厚度,减少研磨量,实现降低材料损失和提高生产率。According to the method for producing a glass substrate for magnetic recording media according to an embodiment of the present invention, glass for magnetic recording media that prevents defects such as scratches generated before the main plane grinding step and has excellent smoothness of the main plane can be obtained with good yield. substrate. In addition, it is possible to reduce the thickness of the vitrified plate supplied to manufacture the glass substrate for magnetic recording media, reduce the amount of grinding, reduce material loss and improve productivity.

实施例Example

下面通过实施例对本发明进行具体说明,但本发明不受这些实施例的限定。以下的例1~11中,例1~10是本发明的实施例,例11是比较例。The present invention will be specifically described below through examples, but the present invention is not limited by these examples. Among the following Examples 1 to 11, Examples 1 to 10 are examples of the present invention, and Example 11 is a comparative example.

例1example 1

将通过浮法成形的以SiO2为主成分的板厚0.7mm的玻璃素板按照图5所示的例1的流程图进行加工,制造磁记录介质用玻璃基板。例1的流程图中各工序的具体情况如下所示。A vitreous plate with a thickness of 0.7 mm and mainly composed of SiO 2 formed by the float process was processed according to the flow chart of Example 1 shown in FIG. 5 to manufacture a glass substrate for magnetic recording media. The details of each process in the flowchart of Example 1 are as follows.

[第1主平面固定研磨粒磨削工序](S101)[The first main plane fixed abrasive grinding process] (S101)

通过双面磨削装置,使用含有平均粒径为20μm的金刚石研磨粒的固定研磨粒工具,进行玻璃素板的两个主平面的磨削。磨削加工量(深度)在两个面上为25μm(0.025mm)。Grinding of both main planes of the vitrified plate was performed by a double-sided grinding apparatus using a fixed abrasive tool containing diamond abrasive grains with an average particle diameter of 20 μm. The amount of grinding (depth) was 25 μm (0.025 mm) on both surfaces.

[保护膜形成工序](S102)[Protective film forming process] (S102)

在玻璃素板的两个主平面上,使用图3所示的浸透压模式印刷装置,将可见光固化型树脂(安德鲁株式会社(ア一デル社)制,产品クリアプレストCP3722)印刷成中央部具有圆形孔部的圆环形状(甜甜圈形状)。然后,照射可见光10分钟左右,使印刷层固化,形成膜厚100μm(0.1mm)的保护膜。On the two main planes of the plain glass plate, using the osmotic pressure pattern printing device shown in Fig. 3, a visible light-curable resin (Adel Co., Ltd., product CLIA PRESTO CP3722) was printed so that the central part had The ring shape (doughnut shape) of the circular hole. Then, the printed layer was cured by irradiating with visible light for about 10 minutes to form a protective film with a film thickness of 100 μm (0.1 mm).

[切角(切碎)工序](S103)[Cut corner (chopping) process] (S103)

将两个主平面上形成甜甜圈形状的保护膜的磁记录介质用玻璃素板切断成为四边围住保护膜的外周,制成具有长宽75mm的正方形的平面形状的方板。这样得到在两个主平面上具有保护膜的磁记录介质用玻璃素板。A vitrified glass plate for magnetic recording media having a donut-shaped protective film formed on two main planes was cut so that the outer periphery of the protective film was surrounded by four sides, and a square plate having a square planar shape with a length and width of 75 mm was produced. Thus, a vitrified glass plate for magnetic recording media having protective films on both main planes was obtained.

[圆形加工工序](S104)[Circular machining process] (S104)

将上述方板沿圆形外周切割,同时在中央部形成圆孔,最终形成外径65mm、内径20mm的磁记录介质用玻璃基板。The above-mentioned square plate was cut along the circular outer periphery, and a circular hole was formed in the central part, and finally a glass substrate for magnetic recording media with an outer diameter of 65 mm and an inner diameter of 20 mm was formed.

[倒角工序](S105)[Chamfering process] (S105)

对加工成中央部具有圆孔的圆盘形状的玻璃基板的内周侧面和外周侧面进行倒角加工以获得最终倒角宽度0.15mm、倒角角度45°的磁记录介质用玻璃基板。A glass substrate for magnetic recording media with a final chamfer width of 0.15 mm and a chamfer angle of 45° was obtained by chamfering the inner and outer side surfaces of a disc-shaped glass substrate having a circular hole in the center.

[端面研磨工序](S106)[End surface grinding process] (S106)

使用含有平均粒径为1.3μm的二氧化铈研磨粒的研磨液和研磨刷研磨经过倒角加工的玻璃基板的外周端面(外周侧面和外周倒角部)与内周端面(内周侧面和内周倒角部)。依序在进行完外周端面的研磨后接着进行内周端面的研磨。研磨量(深度)在外周端面和内周端面上均为12μm(0.012mm)。The outer peripheral end surface (outer peripheral side and outer peripheral chamfer) and inner peripheral end surface (inner peripheral side and inner week chamfer). The grinding of the inner peripheral end surface is performed sequentially after the grinding of the outer peripheral end surface. The amount of grinding (depth) was 12 μm (0.012 mm) on both the outer peripheral end surface and the inner peripheral end surface.

[蚀刻工序](S107)[Etching process] (S107)

用氢氟酸-硝酸混合酸水溶液蚀刻端面研磨后的玻璃基板的内周面。然后,使内周端面的加工伤痕的前部钝化。The inner peripheral surface of the end-polished glass substrate was etched with a hydrofluoric acid-nitric acid mixed acid aqueous solution. Then, the front part of the processing flaw on the inner peripheral end surface was blunted.

[保护膜剥离工序](S108)[Protective film peeling process] (S108)

将玻璃基板浸渍在60℃的温水中,剥离保护膜。The glass substrate was immersed in warm water at 60° C., and the protective film was peeled off.

[第2主平面固定研磨粒磨削工序](S109)[Second main plane fixed abrasive grinding process] (S109)

通过双面磨削装置使用含有平均粒径为3μm的金刚石研磨粒的固定研磨粒工具磨削剥离了保护膜后的玻璃基板的主平面。磨削加工量(深度)在两个面上为20μm(0.02mm)。The main plane of the glass substrate from which the protective film was peeled was ground using a fixed abrasive tool containing diamond abrasive grains having an average particle diameter of 3 μm with a double-side grinding apparatus. The grinding amount (depth) was 20 μm (0.02 mm) on both surfaces.

[主平面研磨工序](S110)[Main surface grinding process] (S110)

使用双面研磨装置研磨玻璃基板的主平面。研磨分为一次研磨和最终研磨两个阶段研磨,一次研磨中使用含有平均粒径为0.8μm的二氧化铈研磨粒的研磨液和起毛革(スウエ一ド;Suede)垫,最终研磨中使用含有平均粒径为20nm的二氧化硅研磨粒的研磨液和起毛革垫,分别进行。研磨量(深度),将一次研磨和最终研磨的研磨量合计,在两个面为20μm(0.02mm)。Grind the main planes of the glass substrate using a double-sided grinding device. Grinding is divided into two stages of primary grinding and final grinding. In the primary grinding, a slurry containing ceria abrasive grains with an average particle size of 0.8 μm and a suede pad are used. In the final grinding, a slurry containing The grinding liquid and the suede pad of the silica abrasive grains with an average particle size of 20nm were carried out separately. The amount of grinding (depth) is 20 μm (0.02 mm) on both sides, which is the sum of the grinding amount of the primary grinding and the final grinding.

[精密清洗工序](S111)[Precise cleaning process] (S111)

主平面研磨后的玻璃基板依次进行擦洗清洗、超声波清洗,通过异丙醇进行蒸气干燥。这样得到外径65mm、内径20mm、板厚0.635mm的磁记录介质用玻璃基板。The glass substrate after the grinding of the main surface was scrubbed and cleaned in sequence, ultrasonically cleaned, and vapor-dried with isopropanol. In this way, a glass substrate for a magnetic recording medium having an outer diameter of 65 mm, an inner diameter of 20 mm, and a plate thickness of 0.635 mm was obtained.

例2~例10Example 2~Example 10

按照图5~图8所示的各流程图加工通过浮法成形的以SiO2为主成分的板厚0.7mm的玻璃素板,得到外径65mm、内径20mm、板厚0.635mm的磁记录介质用玻璃基板。例2~例10的各流程只改变例1中的流程和工序顺序,各个工序按照与例1同样的条件进行。例3、4和例8、9中的主平面固定研磨粒磨削工序与例1中的第2主平面固定研磨粒磨削工序同样地进行。According to the flow charts shown in Figures 5 to 8, a glass plain plate with a thickness of 0.7 mm and a main component of SiO2 formed by the float process was processed to obtain a magnetic recording medium with an outer diameter of 65 mm, an inner diameter of 20 mm, and a thickness of 0.635 mm. Use a glass substrate. Each process flow of Examples 2 to 10 only changes the process flow and process sequence in Example 1, and each process is carried out under the same conditions as Example 1. The principal plane fixed abrasive grinding process in Examples 3 and 4 and Examples 8 and 9 were carried out in the same manner as the second principal plane fixed abrasive grinding process in Example 1.

例11Example 11

按照图8所示的例11的流程图加工通过浮法成形的以SiO2为主成分的板厚1.27mm的玻璃素板,得到外径65mm、内径20mm、板厚0.635mm的磁记录介质用玻璃基板。例11中,第1主平面固定研磨粒磨削工序(S101)中的磨削加工量(深度)在两个面上为365μm(0.365mm),第2主平面固定研磨粒磨削工序(S109)中的磨削加工量(深度)在两个面上为250μm(0.25mm),主平面研磨工序(S110)中的研磨量(深度)在两个面上为20μm(0.02mm),其他工序在与例1同样的条件下进行。According to the flow chart of example 11 shown in Fig. 8, process the glass element plate with SiO2 as the main component plate thickness 1.27mm by float forming, obtain the magnetic recording medium with outer diameter 65mm, inner diameter 20mm, plate thickness 0.635mm Glass base board. In Example 11, the amount of grinding (depth) in the first main plane fixed abrasive grinding process (S101) is 365 μm (0.365 mm) on both surfaces, and the second main plane fixed abrasive grinding process (S109 ) is 250 μm (0.25 mm) on both surfaces, the grinding amount (depth) in the main plane grinding process (S110) is 20 μm (0.02 mm) on both surfaces, and other processes Carried out under the same conditions as in Example 1.

接着,对于这样在例1~例11中得到的磁记录介质用玻璃基板(各例500片),在暗室内照射30万勒克司的光,目测检查主平面的伤痕缺陷。然后,调查检出伤痕缺陷的玻璃基板的片数,按照下式,求出各例的伤痕缺陷率,算出相对于比较例例11的伤痕缺陷率的相对伤痕缺陷率。这样算出的采用目测的相对伤痕缺陷率的值示于表1中。Next, the glass substrates for magnetic recording media obtained in Examples 1 to 11 in this way (500 sheets for each example) were irradiated with light of 300,000 lux in a dark room, and visually inspected for flaws on the main plane. Then, the number of glass substrates in which flaw defects were detected was investigated, and the flaw defect rate of each example was obtained according to the following formula, and the relative flaw defect rate with respect to the flaw defect rate of Comparative Example 11 was calculated. Table 1 shows the values of the relative flaw defect rate calculated by visual observation in this way.

采用目测的伤痕缺陷率Defect rate of scars by visual inspection

=(采用目测发现伤痕的玻璃基板片数(片)/目测检查的基板的片数(片))×100= (Number of glass substrates (pieces) with flaws found by visual inspection/Number of substrates (pieces) that were visually inspected) × 100

采用目测的相对伤痕缺陷率(%)Relative scar defect rate by visual inspection (%)

=(各实施例的采用目测的伤痕缺陷率/比较例的采用目测的伤痕缺陷率)×100=(Visual flaw defect rate of each example/Visual flaw defect rate of Comparative Example)×100

进而,在例1~例11中得到的磁记录介质用玻璃基板中,对于采用目测检查没有检测到伤痕缺陷的玻璃基板,进行采用AOI(自动光学检查装置)的检查,检测伤痕缺陷。然后,通过下式算出伤痕缺陷率,进一步算出相对于比较例的伤痕缺陷率的相对伤痕缺陷率。Furthermore, among the glass substrates for magnetic recording media obtained in Examples 1 to 11, inspection by AOI (automatic optical inspection apparatus) was performed on glass substrates in which flaws were not detected by visual inspection, and flaws were detected. Then, the flaw defect rate was calculated by the following formula, and the relative flaw defect rate with respect to the flaw defect rate of the comparative example was calculated further.

采用AOI的伤痕缺陷率Scar defect rate using AOI

=(采用AOI发现伤痕的玻璃基板片数(片)/AOI检查的基板的片数(片))×100= (Number of glass substrates (pieces) with flaws found by AOI/Number of substrates (pieces) inspected by AOI) × 100

采用AOI的相对伤痕缺陷率(%)Relative scar defect rate using AOI (%)

=(各实施例的采用AOI的伤痕缺陷率/比较例的采用AOI的伤痕缺陷率)×100=(Scar defect rate using AOI in each example/Scar defect rate using AOI in Comparative Example)×100

这样算出的采用AOI的相对伤痕缺陷率的值示于表1中。Table 1 shows the values of the relative flaw defect rate using AOI thus calculated.

[表1][Table 1]

Figure BDA00001875671400161
Figure BDA00001875671400161

从表1可知,例1~10中使用在主平面上形成了保护膜的磁记录介质用玻璃素板进行圆形加工工序(S104)以后的各加工工序,因此,采用目测检查在主平面上检出伤痕缺陷的玻璃基板的比例与使用没有保护膜的玻璃素板的例11相比,显著减小。此外,采用目测在主平面上没有检出伤痕缺陷的玻璃基板,采用AOI重新检查检出伤痕缺陷的玻璃基板的比例也显著低于例11。As can be seen from Table 1, in Examples 1 to 10, each processing step after the circular processing step (S104) was performed using a glass plain plate for magnetic recording media on which a protective film was formed on the main plane, so visual inspection was performed on the main plane. The ratio of the glass substrates in which flaw defects were detected was significantly smaller than that of Example 11 using a glass plate without a protective film. In addition, the proportion of glass substrates in which flaw defects were not detected on the main plane by visual inspection and re-inspection by AOI was significantly lower than in Example 11.

产业上利用的可能性Possibility of industrial use

根据本发明,可以以良好的产率获得防止在玻璃基板的主平面研磨工序前产生的伤痕等缺陷、主平面的平滑性优异的磁记录介质用玻璃基板。According to the present invention, it is possible to obtain a glass substrate for a magnetic recording medium having excellent smoothness of the main plane while preventing defects such as scratches generated before the main plane grinding step of the glass substrate with good yield.

符号的说明Explanation of symbols

10…磁记录介质用玻璃基板、11…圆孔、103…主平面、20…磁记录介质用玻璃素板、22…保护膜、30…浸透式压模、31,42…玻璃素板、32,41…印刷层、301…印刷部、302…吸纳部、44…可见光源。10...Glass substrate for magnetic recording medium, 11...Circular hole, 103...Principal plane, 20...Glass plain plate for magnetic recording medium, 22...Protective film, 30...Immersion type stamper, 31, 42...Glass plain plate, 32 , 41... printing layer, 301... printing part, 302... absorbing part, 44... visible light source.

Claims (9)

1.一种磁记录介质用玻璃素板,是用于形成在中央部具有圆孔的圆盘形状的磁记录介质用玻璃基板的、具有主平面和侧面的玻璃素板,其特征在于,在至少一个主平面上,具有含有树脂的保护膜。1. A glass plain plate for magnetic recording media, which is used to form a glass substrate for magnetic recording media having a disc shape with a circular hole in the center, a glass plain plate with a main plane and side surfaces, characterized in that, At least one main plane has a resin-containing protective film. 2.如权利要求1所述的磁记录介质用玻璃素板,所述保护膜具有在中央部有圆形孔部的圆环形的平面形状。2. The glass plate for magnetic recording media according to claim 1, wherein the protective film has a circular planar shape with a circular hole in the center. 3.如权利要求1或2所述的磁记录介质用玻璃素板,所述保护膜具有0.01mm~0.5mm的膜厚。3. The glass plain plate for magnetic recording media according to claim 1 or 2, wherein the protective film has a film thickness of 0.01 mm to 0.5 mm. 4.一种磁记录介质用玻璃基板的制造方法,该方法具有:4. A method for manufacturing a glass substrate for a magnetic recording medium, the method having: 准备具有主平面和侧面的磁记录介质用玻璃素板的磁记录介质用玻璃素板准备工序;A process of preparing a glass plain plate for magnetic recording media having a main plane and side surfaces; 将所述磁记录介质用玻璃素板加工成中央部具有圆孔的圆盘形状的玻璃基板的赋形工序;A forming step of processing the glass plain plate for magnetic recording media into a disk-shaped glass substrate having a circular hole in the center; 研磨所述玻璃基板的主平面的主平面研磨工序;和a main plane grinding process of grinding the main plane of the glass substrate; and 所述玻璃基板的清洗工序,其特征在于,所述磁记录介质用玻璃素板准备工序具有:在玻璃素板的至少一个主平面上形成含有树脂的保护膜、制成磁记录介质用玻璃素板的保护膜形成工序。The cleaning process of the glass substrate is characterized in that the preparation process of the glass plain plate for magnetic recording medium includes: forming a protective film containing resin on at least one main plane of the glass plain plate, and forming a glass plain plate for magnetic recording medium. Plate protective film forming process. 5.如权利要求4所述的磁记录介质用玻璃基板的制造方法,所述保护膜形成工序具有:在所述玻璃素板的至少一个主平面上印刷或涂布含有液态固化性树脂的组合物的工序;和使该印刷层或涂布层固化的工序。5. The manufacturing method of a glass substrate for magnetic recording media according to claim 4, wherein said protective film forming step comprises: printing or coating a composition containing a liquid curable resin on at least one main plane of said glass plain plate. and the process of curing the printed layer or coating layer. 6.如权利要求4所述的磁记录介质用玻璃基板的制造方法,所述保护膜形成工序具有:在所述玻璃素板的至少一个主平面上贴合含有树脂的保护膜的工序。6 . The method for manufacturing a glass substrate for magnetic recording media according to claim 4 , wherein the protective film forming step includes a step of attaching a resin-containing protective film to at least one main plane of the vitrified glass plate. 7 . 7.如权利要求4~6中任一项所述的磁记录介质用玻璃基板的制造方法,所述保护膜形成工序中形成的所述保护膜具有在中央部有圆形孔部的圆环形的平面形状。7. The manufacturing method of a glass substrate for magnetic recording media according to any one of claims 4 to 6, wherein the protective film formed in the protective film forming step has a circular ring with a circular hole in the center Shaped plane shape. 8.如权利要求4~7中任一项所述的磁记录介质用玻璃基板的制造方法,所述保护膜形成工序中形成的所述保护膜具有0.01mm~0.5mm的膜厚。The said protective film formed in the said protective film formation process has a film thickness of 0.01 mm - 0.5 mm, The manufacturing method of the glass substrate for magnetic recording media in any one of Claims 4-7. 9.如权利要求4~8中任一项所述的磁记录介质用玻璃基板的制造方法,在所述赋形工序和所述主平面研磨工序之间,具有除去所述保护膜的保护膜除去工序。9. The manufacturing method of a glass substrate for magnetic recording media according to any one of claims 4 to 8, wherein there is a protective film for removing the protective film between the shaping step and the main plane grinding step. Remove process.
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JP2010003365A (en) * 2008-06-20 2010-01-07 Furukawa Electric Co Ltd:The Manufacturing method of glass substrate
JP2010086632A (en) * 2008-10-02 2010-04-15 Konica Minolta Opto Inc Method for manufacturing glass substrate for magnetic recording medium

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