CN102723141B - Gd1-xCaxBiO3 buffering layer of high temperature superconducting coated conductor and preparation method thereof - Google Patents
Gd1-xCaxBiO3 buffering layer of high temperature superconducting coated conductor and preparation method thereof Download PDFInfo
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Abstract
本发明公开了一种高温超导涂层导体Gd1-xCaxBiO3缓冲层,其特征在于,为对高温超导涂层导体GdBiO3缓冲层进行Gd的Ca的替代进而外延成相热处理生成氧化物Gd1-xCaxBiO3固溶体,其中0.1≤x≤0.4。本发明所述高温超导涂层导体的Gd1-xCaxBiO3缓冲层,它是对高温超导涂层导体GdBiO3缓冲层进行Gd的Ca的替代后,将使GdBiO3缓冲层元素环境和晶格参数产生微调,从而调整GdBiO3缓冲层与REBCO超导层的晶格失配情况,该缓冲层能在810℃左右空气中外延生长,其结构致密并且表面平整,并在随后的高温超导涂层导体的超导层的制备过程中保持结构的稳定。本发明所述的Gd1-xCaxBiO3缓冲层的制备方法,该方法采用以硝酸盐作为前驱物的化学溶液沉积法在空气中进行制备,具有成本低廉,操作控制容易,适合大规模沉积等优点。
The invention discloses a high-temperature superconducting coating conductor Gd 1-x Ca x BiO 3 buffer layer, which is characterized in that the high-temperature superconducting coating conductor GdBiO 3 buffer layer is replaced by Ca of Gd and then epitaxial phase forming heat treatment Generate oxide Gd 1-x Ca x BiO 3 solid solution, where 0.1≤x≤0.4. The Gd 1-x Ca x BiO buffer layer of the high-temperature superconducting coating conductor of the present invention, after it is to replace the Ca of Gd to the GdBiO buffer layer of the high-temperature superconducting coating conductor, will make the GdBiO buffer layer element The environment and lattice parameters are fine-tuned to adjust the lattice mismatch between the GdBiO 3 buffer layer and the REBCO superconducting layer. The buffer layer can be grown epitaxially in the air at about 810 ° C. Its structure is dense and the surface is flat, and in the subsequent High-temperature superconducting coated conductors maintain structural stability during the preparation of the superconducting layer. The preparation method of the Gd 1-x Ca x BiO 3 buffer layer described in the present invention adopts the chemical solution deposition method using nitrate as the precursor to prepare in the air, has the advantages of low cost, easy operation and control, and is suitable for large-scale deposition and other advantages.
Description
技术领域 technical field
本发明涉及高温超导材料制备技术领域,尤其涉及一种高温超导涂层导体Gd1-xCaxBiO3缓冲层及其制备技术。 The invention relates to the technical field of preparation of high-temperature superconducting materials, in particular to a high-temperature superconducting coating conductor Gd 1-x Ca x BiO 3 buffer layer and its preparation technology.
背景技术 Background technique
近年来,第二代高温超导带材即稀土钡铜氧涂层导体由于其潜在的应用前景受到了全世界范围内的普遍关注。由于第二代高温超导带材在液氮温区和外磁场下比第一代铋系超导体有更好的载流性能,其在超导电缆、发电机、电动机、磁能存储及磁共振成像等方面都有着重要应用。各发达国家从本国电力能源的技术革新和长远利益出发,大力推进第二代高温超导体研究与实用化进程,国际间竞争愈来愈激烈。 In recent years, the second-generation high-temperature superconducting tape, that is, rare-earth barium-copper-oxide-coated conductors, has attracted worldwide attention due to its potential application prospects. Because the second-generation high-temperature superconducting tape has better current-carrying performance than the first-generation bismuth-based superconductor in the liquid nitrogen temperature zone and external magnetic field, it is used in superconducting cables, generators, motors, magnetic energy storage and magnetic resonance imaging. etc. have important applications. Starting from the technological innovation and long-term interests of their own electric energy, the developed countries are vigorously promoting the research and practical application of the second-generation high-temperature superconductors, and the international competition is becoming more and more fierce. the
涂层导体的高温超导层的成分为REBa2Cu3Ox(简称REBCO,RE为钇或镧系元素)。对于超导线材、超导磁体等实际应用领域,脆性的REBCO高温氧化物超导材料必须涂覆在机械性能(强度、韧性)优良的金属衬底上才能减少或避免加工或使用过程中的机械损伤。另外,这种衬底材料还需具有良好的导电性和导热性,以避免使用过程中由于局部失超引发的系统失效和崩溃。 The composition of the high temperature superconducting layer of the coated conductor is REBa 2 Cu 3 O x (referred to as REBCO, RE is yttrium or lanthanide). For practical applications such as superconducting wires and superconducting magnets, brittle REBCO high-temperature oxide superconducting materials must be coated on metal substrates with excellent mechanical properties (strength, toughness) to reduce or avoid mechanical damage during processing or use. damage. In addition, this substrate material also needs to have good electrical and thermal conductivity to avoid system failure and collapse caused by local quenching during use.
此外,REBCO高温超导层材料由于本身的层状结构,导致极强的各向异性,晶格的ab面上的负载电流能力远远高于c轴方向。REBCO高温超导材料的载流性能对a、b方向上的晶格失配极为敏感,为保证REBCO的载流能力,外延织构成了其制备技术中不可或缺的工艺过程。迄今为止,国内外公认的最佳衬底材料为Ni基合金材料。而Ni基合金和REBCO高温超导材料的ab面存在一定的晶格失配,直接在Ni基合金基带上外延生长REBCO高温超导材料其超导性能极差,必须在合金基带上加一层缓冲层。一方面阻止Ni基合金与REBCO之间的相互扩散和化学反应,另一方面充当从Ni基合金到REBCO外延生长的中间模板。这样才能保证制备出性能优良的REBCO高温超导涂层导体。因此,高温超导涂层导体都具有衬底、缓冲层(至少一层)和REBCO超导涂层三层结构。 In addition, REBCO high-temperature superconducting layer material has extremely strong anisotropy due to its own layered structure, and the carrying current capacity of the ab plane of the crystal lattice is much higher than that of the c-axis direction. The current-carrying performance of REBCO high-temperature superconducting materials is extremely sensitive to the lattice mismatch in the a and b directions. To ensure the current-carrying capacity of REBCO, epitaxial weaving constitutes an indispensable process in its preparation technology. So far, the best substrate material recognized at home and abroad is Ni-based alloy material. However, there is a certain lattice mismatch between the ab plane of Ni-based alloy and REBCO high-temperature superconducting material, and the epitaxial growth of REBCO high-temperature superconducting material directly on the Ni-based alloy substrate has extremely poor superconductivity, so a layer must be added to the alloy substrate. The buffer layer. On the one hand, it prevents the interdiffusion and chemical reaction between Ni-based alloy and REBCO, and on the other hand, it acts as an intermediate template for epitaxial growth from Ni-based alloy to REBCO. Only in this way can we ensure the preparation of REBCO high temperature superconducting coated conductors with excellent performance. Therefore, all high-temperature superconducting coated conductors have a three-layer structure of substrate, buffer layer (at least one layer) and REBCO superconducting coating.
目前,各发达国家投入巨资并经过二十多年的发展开发出了一系列具有实用化水平的缓冲层材料。比如SrTiO3, La2Zr2O7, CeO2,YSZ, RE2O3等。但这些材料大都熔点很高,需在1000℃左右才能外延生长成性能良好的缓冲层,并需要在低的氧分压下进行制备,高额的制备成本严重影响了高温涂层导体的实用化进展。而更为重要的是这些缓冲层材料大都在欧,美,日等国的知识产权保护之下,这将严重影响和制约我国在第二代高温超导涂层导体上研究开发与产业化生产。 At present, various developed countries have invested heavily and developed a series of buffer layer materials with practical level after more than 20 years of development. Such as SrTiO 3 , La 2 Zr 2 O 7 , CeO 2 , YSZ, RE 2 O 3 and so on. However, most of these materials have a high melting point, and they need to be epitaxially grown at about 1000°C to form a buffer layer with good performance, and they need to be prepared under low oxygen partial pressure. The high preparation cost seriously affects the practical application of high-temperature coated conductors. progress. More importantly, most of these buffer layer materials are under the protection of intellectual property rights in Europe, the United States, Japan and other countries, which will seriously affect and restrict my country's research and development and industrial production of second-generation high-temperature superconducting coated conductors. .
另外,制备高温超导涂层导体的方法有物理气相沉积(PVD),金属有机物化学气相沉积(MOCVD),化学溶液沉积(CSD)等。CSD法相比其它方法具有成本低,操作相对简单,成分控制精确以及适合大面积沉积等独特优势。有利于加快第二代高温超导涂层导体规模化工业应用进程,已逐渐成为制备缓冲层和REBCO层的主要工艺方法和研究热点。 In addition, methods for preparing high-temperature superconducting coated conductors include physical vapor deposition (PVD), metal-organic chemical vapor deposition (MOCVD), and chemical solution deposition (CSD). Compared with other methods, the CSD method has unique advantages such as low cost, relatively simple operation, precise composition control and suitable for large-area deposition. It is conducive to accelerating the large-scale industrial application of the second-generation high-temperature superconducting coated conductors, and has gradually become the main process method and research hotspot for preparing buffer layers and REBCO layers.
发明内容 Contents of the invention
本发明的目的在于提供一种高温超导涂层导体的缓冲层(Gd1-xCaxBiO3),该缓冲层能在810℃左右空气中外延生长,其结构致密并且表面平整。并在随后的高温超导涂层导体的超导层的制备过程中保持结构的稳定。 The object of the present invention is to provide a buffer layer (Gd 1-x Ca x BiO 3 ) of a high-temperature superconducting coated conductor, which can be epitaxially grown in air at about 810°C, and has a dense structure and a flat surface. And the structure is kept stable during the subsequent preparation process of the superconducting layer of the high-temperature superconducting coated conductor.
本发明是这样实现的,构造一种高温超导涂层导体Gd1-xCaxBiO3缓冲层, 它是对高温超导涂层导体GdBiO3缓冲层进行Gd的Ca的替代进而外延成相热处理生成的氧化物Gd1-xCaxBiO3固溶体,其中0.1≤x≤0.4。 The present invention is achieved by constructing a high-temperature superconducting coating conductor Gd 1-x Ca x BiO 3 buffer layer, which replaces Ca of Gd on the high-temperature superconducting coating conductor GdBiO 3 buffer layer and then epitaxially forms a phase The oxide Gd 1-x Ca x BiO 3 solid solution formed by heat treatment, where 0.1≤x≤0.4.
REBiO3系列缓冲层材料是西南交通大学超导与新能源中心自主研发的新型缓冲层材料,并对它们的晶体结构、成相温度、电、磁性质以及在REBCO制备过程中的稳定性作了研究,结果表明,REBiO3系列缓冲层材料在晶体结构上与REBCO相匹配,较低的成相温度成为此类材料的亮点;另外在REBCO薄膜的制备过程中,REBiO3也保持了较高的稳定性。GdBiO3是REBiO3系列缓冲层材料之一,其化学式中Gd元素具有与Ca元素接近的离子半径。对GdBiO3缓冲层进行Gd的Ca的替代后,将对GdBiO3缓冲层元素环境和晶格参数产生微调,从而调整GdBiO3缓冲层与REBCO超导层的晶格失配情况。并得到了一系列新的高温超导涂层导体的缓冲层Gd1-xCaxBiO3,其中0.1≤x≤0.4。 REBiO 3 series buffer layer materials are new buffer layer materials independently developed by the Superconducting and New Energy Center of Southwest Jiaotong University, and their crystal structure, phase formation temperature, electrical and magnetic properties, and stability during the preparation of REBCO were studied. The results show that REBiO 3 series buffer layer materials match REBCO in crystal structure, and the lower phase formation temperature becomes the highlight of this type of material; in addition, during the preparation process of REBCO thin film, REBiO 3 also maintains a high stability. GdBiO 3 is one of REBiO 3 series buffer layer materials, and the Gd element in its chemical formula has an ionic radius close to that of Ca element. After replacing Ca with Gd in the GdBiO 3 buffer layer, the element environment and lattice parameters of the GdBiO 3 buffer layer will be fine-tuned, thereby adjusting the lattice mismatch between the GdBiO 3 buffer layer and the REBCO superconducting layer. And obtained a series of buffer layer Gd 1-x Ca x BiO 3 of new high-temperature superconducting coated conductors, where 0.1≤x≤0.4.
此外Gd1-xCaxBiO3缓冲层是由Gd2O3,CaO,Bi2O3外延成相热处理制得,Gd2O3,CaO,Bi2O3的晶格参数大都为立方结构或四方结构,并与REBCO超导层晶格有着良好的匹配性,由它们固溶生成的Gd1-xCaxBiO3也应将与REBCO超导层晶格匹配良好。CaO的熔点为2580℃左右,远高于REBCO超导层的熔点(约1050℃),将GdBiO3缓冲层Gd元素进行Ca元素的替代制得的Gd1-xCaxBiO3缓冲层在随后的高温超导涂层导体的超导层的制备过程中将保持结构的稳定。 In addition, the Gd 1-x Ca x BiO 3 buffer layer is made by epitaxial phase formation heat treatment of Gd 2 O 3 , CaO, Bi 2 O 3 , and the lattice parameters of Gd 2 O 3 , CaO, Bi 2 O 3 are mostly cubic structure. Or tetragonal structure, and has a good match with the REBCO superconducting layer lattice, and the Gd 1-x Ca x BiO 3 formed by their solid solution should also have a good lattice match with the REBCO superconducting layer. The melting point of CaO is about 2580°C, which is much higher than the melting point of the REBCO superconducting layer (about 1050°C). The Gd 1-x Ca x BiO 3 buffer layer prepared by replacing the Gd element of the GdBiO 3 buffer layer with Ca element is subsequently The superconducting layer of the HTS coated conductor will maintain structural stability during the preparation process.
本发明的Gd1-xCaxBiO3缓冲层的性能将由本发明所提供的实验得到验证。 The performance of the Gd 1-x Ca x BiO 3 buffer layer of the present invention will be verified by the experiments provided by the present invention.
本发明还在于提供一种制备高温超导涂层导体Gd1-xCaxBiO3缓冲层的方法,它是采用以硝酸盐作为前驱物的化学溶液沉积法在空气中进行制备,具有成本低廉,适合大规模沉积等优点。对高温超导涂层导体GdBiO3缓冲层进行Gd的Ca的替代进而外延成相热处理生成氧化物Gd1-xCaxBiO3固溶体,其中0.1≤x≤0.4,其制备方法包括以下步骤: The present invention also provides a method for preparing the high-temperature superconducting coating conductor Gd 1-x Ca x BiO 3 buffer layer, which is prepared in air by chemical solution deposition using nitrate as a precursor, and has the advantages of low cost , suitable for large-scale deposition and other advantages. Substituting Ca of Gd for the high-temperature superconducting coating conductor GdBiO 3 buffer layer and then epitaxially forming a phase-forming heat treatment to generate an oxide Gd 1-x Ca x BiO 3 solid solution, wherein 0.1≤x≤0.4, and the preparation method includes the following steps:
a、胶体制备:将前驱物Gd,Ca,Bi的硝酸盐按金属阳离子比Gd:Ca:Bi=1-x:x:1的比例溶于适量的聚丙烯酸中,其中0.1≤x≤0.4,最终溶液总的摩尔浓度为0.2mol/L; a. Colloid preparation: dissolve the precursors Gd, Ca, and Bi nitrate in an appropriate amount of polyacrylic acid according to the metal cation ratio Gd:Ca:Bi=1-x:x:1, where 0.1≤x≤0.4, The total molar concentration of the final solution is 0.2mol/L;
b、胶体涂敷与干燥及热分解处理:将a步制得的胶体涂覆在基片上,再进行干燥;干燥后,进行烧结前在空气中的热分解处理,即将涂敷有胶体的基片置于烧结炉中,使炉温从室温缓慢升至180℃ -230℃,并以0.1-2℃/min的速度升至在300℃-340℃,再以0.1-1℃/min的速度升至540℃-560℃,保温0.5小时,以使得烧结形成的涂层更平整,更致密; b. Colloid coating and drying and thermal decomposition treatment: coat the colloid prepared in step a on the substrate, and then dry; after drying, perform thermal decomposition treatment in the air before sintering, that is, the substrate coated with colloid The piece is placed in the sintering furnace, and the furnace temperature is slowly raised from room temperature to 180°C-230°C, and then raised to 300°C-340°C at a speed of 0.1-2°C/min, and then at a speed of 0.1-1°C/min Raise to 540°C-560°C and keep it warm for 0.5 hours to make the coating formed by sintering smoother and denser;
c、烧结成相:将涂覆有胶体的基片干燥及热处理分解后,再放入烧结炉中烧结成相,最终得到Gd1-xCaxBiO3缓冲层;具体作法为:在空气中将炉温快速以10-100℃/min的速度升至800℃ -820℃,保温40-60分钟;再让炉温缓慢降至室温。 c. Sintering to form a phase: After drying and decomposing the colloid-coated substrate, put it into a sintering furnace to sinter to form a phase, and finally obtain a Gd 1-x Ca x BiO 3 buffer layer; the specific method is: in the air Rapidly raise the furnace temperature to 800°C -820°C at a rate of 10-100°C/min, and keep it warm for 40-60 minutes; then let the furnace temperature slowly drop to room temperature.
根据本发明所述的高温超导涂层导体Gd1-xCaxBiO3缓冲层的制备方法,其特征在于:所述b步中, 胶体涂覆在基片上的具体作法为:将胶体滴在基片上,用匀胶机旋转,使胶体均匀涂敷在基片上。 According to the preparation method of the high-temperature superconducting coating conductor Gd 1-x Ca x BiO buffer layer of the present invention, it is characterized in that: in the b step, the specific way of coating the colloid on the substrate is: drop the colloid On the substrate, use a glue leveler to rotate, so that the colloid is evenly coated on the substrate.
根据本发明所述的高温超导涂层导体Gd1-xCaxBiO3缓冲层的制备方法,其特征在于:所述b步中干燥时的温度为100℃-150℃。 According to the preparation method of the high-temperature superconducting coated conductor Gd 1-x Ca x BiO 3 buffer layer of the present invention, it is characterized in that: the drying temperature in the b step is 100°C-150°C.
根据本发明所述的高温超导涂层导体Gd1-xCaxBiO3缓冲层的制备方法,其特征是:上述b步的干燥后、c步的烧结成相前,还进行烧结前在空气中的热分解处理,即将涂敷有胶体的基片置于烧结炉中,使炉温从室温缓慢升至180℃ -230℃,并以0.1-2℃/min的速度升至在300℃-340℃,再以0.1-1℃/min的速度升至540℃-560℃,保温0.5小时,经过这样的烧结前的热分解处理,可使得烧结形成的涂层更平整,更致密。 According to the preparation method of the high-temperature superconducting coating conductor Gd 1-x Ca x BiO buffer layer of the present invention, it is characterized in that: after the drying of the above-mentioned b step, before the sintering of the c step to form a phase, also carry out the sintering before the sintering Thermal decomposition treatment in the air, that is, place the colloid-coated substrate in a sintering furnace, and slowly increase the temperature of the furnace from room temperature to 180°C-230°C, and rise to 300°C at a speed of 0.1-2°C/min. -340°C, then rise to 540°C-560°C at a speed of 0.1-1°C/min, and hold for 0.5 hours. After such thermal decomposition treatment before sintering, the coating formed by sintering can be made smoother and denser.
本发明的有益效果在于:本发明所述高温超导涂层导体的Gd1-xCaxBiO3缓冲层,它是对高温超导涂层导体GdBiO3缓冲层进行Gd的Ca的替代后,将使GdBiO3缓冲层元素环境和晶格参数产生微调,从而调整GdBiO3缓冲层与REBCO超导层的晶格失配情况,得到的一系列新的高温超导涂层导体的缓冲层Gd1-xCaxBiO3,其中0.1≤x≤0.4。此外,该缓冲层能在810℃左右空气中外延生长,其结构致密并且表面平整。并在随后的高温超导涂层导体的超导层的制备过程中保持结构的稳定。本发明所述的Gd1-xCaxBiO3缓冲层的制备方法,该方法采用以硝酸盐作为前驱物的化学溶液沉积法在空气中进行制备,具有成本低廉,操作控制容易,适合大规模沉积等优点。 The beneficial effect of the present invention is: the Gd 1-x Ca x BiO buffer layer of the high-temperature superconducting coating conductor of the present invention, it is after the replacement of Ca of Gd to the high-temperature superconducting coating conductor GdBiO 3 buffer layer, The element environment and lattice parameters of the GdBiO 3 buffer layer will be fine-tuned, thereby adjusting the lattice mismatch between the GdBiO 3 buffer layer and the REBCO superconducting layer, and a series of new high-temperature superconducting coated conductor buffer layers Gd 1 will be obtained. -x Ca x BiO 3 , where 0.1≤x≤0.4. In addition, the buffer layer can be epitaxially grown in air at about 810°C, and its structure is dense and its surface is flat. And the structure is kept stable during the subsequent preparation process of the superconducting layer of the high-temperature superconducting coated conductor. The preparation method of the Gd 1-x Ca x BiO 3 buffer layer described in the present invention adopts the chemical solution deposition method using nitrate as the precursor to prepare in the air, has the advantages of low cost, easy operation and control, and is suitable for large-scale deposition and other advantages.
附图说明 Description of drawings
图 1是实施例一的Gd0.9Ca0.1BiO3缓冲层的X射线衍射图谱。 Fig. 1 is the X-ray diffraction pattern of the Gd 0.9 Ca 0.1 BiO 3 buffer layer in Example 1.
图 2是实施例一的Gd0.9Ca0.1BiO3缓冲层的10000倍扫描电子显微镜(SEM)照片。 Fig. 2 is a 10000 times scanning electron microscope (SEM) photo of the Gd 0.9 Ca 0.1 BiO 3 buffer layer in Example 1.
图 3是实施例二的Gd0.7Ca0.3BiO3缓冲层的X射线衍射图谱。 Fig. 3 is the X-ray diffraction pattern of the Gd 0.7 Ca 0.3 BiO 3 buffer layer in Example 2.
图 4是实施例二的Gd0.7Ca0.3BiO3缓冲层的10000倍扫描电子显微镜(SEM)照片。 Fig. 4 is a 10000 times scanning electron microscope (SEM) photo of the Gd 0.7 Ca 0.3 BiO 3 buffer layer in Example 2.
图 5是实施例三的Gd0.6Ca0.4BiO3缓冲层的X射线衍射图谱。 Fig. 5 is the X-ray diffraction pattern of the Gd 0.6 Ca 0.4 BiO 3 buffer layer in Example 3.
图 6是实施例三的Gd0.6Ca0.4BiO3缓冲层的10000倍扫描电子显微镜(SEM)照片。 Fig. 6 is a 10000 times scanning electron microscope (SEM) photo of the Gd 0.6 Ca 0.4 BiO 3 buffer layer in Example 3.
图1,3,5的纵坐标为衍射强度(Intensity)、任意单位(a.u.);横坐标为衍射角2θ, 单位为度(deg)。 The vertical coordinates of Figures 1, 3 and 5 are diffraction intensity (Intensity), arbitrary unit (a.u.); the horizontal coordinate is diffraction angle 2θ, and the unit is degree (deg). the
具体实施方式 Detailed ways
下面结合附图和具体实施方式对本发明作进一步的详细说明: Below in conjunction with accompanying drawing and specific embodiment the present invention will be described in further detail:
实施例一 Embodiment one
本发明提供一种高温超导涂层导体的缓冲层Gd0.9Ca0.1BiO3。及一种制备高温超导涂层导体Gd0.9Ca0.1BiO3缓冲层薄膜的方法,其步骤是: The invention provides a buffer layer Gd 0.9 Ca 0.1 BiO 3 of a high-temperature superconducting coated conductor. And a kind of method for preparing high-temperature superconducting coating conductor Gd 0.9 Ca 0.1 BiO buffer layer film, its steps are:
a、Gd0.9Ca0.1BiO3缓冲层胶体制备:将前驱物Gd,Ca,Bi的硝酸盐按阳离子浓度0.9:0.1:1溶于适量的聚丙烯酸(PAA)中,从而得到有机物体系。最终溶液总的摩尔浓度为0.2mol/L。 a. Gd 0.9 Ca 0.1 BiO 3 buffer layer colloid preparation: the precursors Gd, Ca, and Bi nitrate were dissolved in an appropriate amount of polyacrylic acid (PAA) at a cation concentration of 0.9:0.1:1 to obtain an organic system. The total molar concentration of the final solution is 0.2mol/L.
b、Gd0.9Ca0.1BiO3缓冲层涂敷,干燥与分解:将a步制得的胶体涂覆在LaAlO3单晶基片上,再在100℃进行干燥;再将其置于烧结炉中,在空气中使炉温从室温缓慢升至180℃,并以0.1℃/min的速度升至在300℃,再以0.1℃/min的速度升至540℃,保温30分钟。 b. Coating of Gd 0.9 Ca 0.1 BiO 3 buffer layer, drying and decomposition: Coating the colloid prepared in step a on the LaAlO 3 single crystal substrate, and then drying at 100°C; then placing it in a sintering furnace, In the air, the furnace temperature was slowly raised from room temperature to 180°C, and then raised to 300°C at a speed of 0.1°C/min, and then raised to 540°C at a speed of 0.1°C/min, and kept for 30 minutes.
c、烧结成相:将上述干燥及热处理分解后所制得的基片放入烧结炉中,在空气中将炉温快速以10℃/min的速度升至800℃,保温50分钟;再让炉温缓慢降至室温,最终得到Gd0.9Ca0.1BiO3缓冲层。 c. Sintering phase formation: Put the substrate obtained after the above drying and heat treatment decomposition into a sintering furnace, rapidly raise the furnace temperature to 800°C at a rate of 10°C/min in the air, and keep it warm for 50 minutes; The furnace temperature was slowly lowered to room temperature, and finally a Gd 0.9 Ca 0.1 BiO 3 buffer layer was obtained.
图 1是本发明实施例一的Gd0.9Ca0.1BiO3缓冲层的X射线衍射图谱。由图可以看出除了Gd0.9Ca0.1BiO3缓冲层(002)衍射峰和基片LaAlO3的衍射峰外,无Gd0.9Ca0.1BiO3其他杂峰,暗示出Gd0.9Ca0.1BiO3缓冲层薄膜存在很强的面外织构。 Fig. 1 is the X-ray diffraction pattern of the Gd 0.9 Ca 0.1 BiO 3 buffer layer in Example 1 of the present invention. It can be seen from the figure that except for the diffraction peak of the Gd 0.9 Ca 0.1 BiO 3 buffer layer (002) and the diffraction peak of the substrate LaAlO 3 , there are no other impurity peaks of Gd 0.9 Ca 0.1 BiO 3 , implying that the Gd 0.9 Ca 0.1 BiO 3 buffer layer The film has a strong out-of-plane texture.
图 2是本发明实施例一Gd0.9Ca0.1BiO3缓冲层的10000倍扫描电子显微镜(SEM)照片。由图2可知:薄膜样品表面平整、致密,无洞无缝。由此可知此实施例一制备出了织构良好,表面致密平整的Gd0.9Ca0.1BiO3缓冲层薄膜。 Fig. 2 is a scanning electron microscope (SEM) photograph at 10,000 times of a Gd 0.9 Ca 0.1 BiO 3 buffer layer according to Example 1 of the present invention. It can be seen from Figure 2 that the surface of the thin film sample is smooth and dense, without holes and seamless. From this, it can be seen that in Example 1, a Gd 0.9 Ca 0.1 BiO 3 buffer layer film with a good texture and a dense and flat surface was prepared.
实施例二 Example two
本发明提供一种高温超导涂层导体的缓冲层Gd0.7Ca0.3BiO3。及一种制备高温超导涂层导体Gd0.7Ca0.3BiO3缓冲层薄膜的方法,其步骤是: The invention provides a buffer layer Gd 0.7 Ca 0.3 BiO 3 of a high-temperature superconducting coated conductor. And a kind of method for preparing high temperature superconducting coating conductor Gd 0.7 Ca 0.3 BiO buffer layer film, its steps are:
a、Gd0.7Ca0.3BiO3缓冲层胶体制备:将前驱物Gd,Ca,Bi的硝酸盐按阳离子浓度0.7:0.3:1溶于适量的聚丙烯酸(PAA)中,从而得到有机物体系。最终溶液总的摩尔浓度为0.2mol/L。 a. Gd 0.7 Ca 0.3 BiO 3 buffer layer colloid preparation: the precursors Gd, Ca, and Bi nitrate were dissolved in an appropriate amount of polyacrylic acid (PAA) at a cation concentration of 0.7:0.3:1 to obtain an organic system. The total molar concentration of the final solution is 0.2mol/L.
b、Gd0.7Ca0.3BiO3缓冲层涂敷,干燥与分解:将a步制得的胶体涂覆在LaAlO3单晶基片上,再在120℃进行干燥;再将其置于烧结炉中,在空气中使炉温从室温缓慢升至200℃,并以2℃/min的速度升至在320℃,再以0.5℃/min的速度升至550℃,保温30分钟。 b. Gd 0.7 Ca 0.3 BiO 3 buffer layer coating, drying and decomposition: coat the colloid prepared in step a on the LaAlO 3 single crystal substrate, and then dry it at 120°C; then place it in a sintering furnace, In the air, the furnace temperature was slowly raised from room temperature to 200°C, and then raised to 320°C at a speed of 2°C/min, and then raised to 550°C at a speed of 0.5°C/min, and kept for 30 minutes.
c、烧结成相:将上述干燥及热处理分解后所制得的基片放入烧结炉中,在空气中将炉温快速以70℃/min的速度升至810℃,保温40分钟;再让炉温缓慢降至室温,最终得到Gd0.7Ca0.3BiO3缓冲层。 c. Sintering phase formation: Put the substrate obtained after the above drying and heat treatment decomposition into a sintering furnace, rapidly raise the furnace temperature to 810°C at a rate of 70°C/min in the air, and keep it warm for 40 minutes; The furnace temperature was slowly lowered to room temperature, and finally a Gd 0.7 Ca 0.3 BiO 3 buffer layer was obtained.
图 3是本发明实施例二的Gd0.7Ca0.3BiO3缓冲层的X射线衍射图谱。由图可以看出除了Gd0.7Ca0.3BiO3缓冲层(002)衍射峰和基片LaAlO3的衍射峰外,无Gd0.7Ca0.3BiO3其他杂峰,暗示出Gd0.7Ca0.3BiO3缓冲层薄膜存在很强的面外织构。 Fig. 3 is an X-ray diffraction pattern of the Gd 0.7 Ca 0.3 BiO 3 buffer layer in Example 2 of the present invention. It can be seen from the figure that except for the diffraction peak of the Gd 0.7 Ca 0.3 BiO 3 buffer layer (002) and the diffraction peak of the substrate LaAlO 3 , there are no other impurity peaks of Gd 0.7 Ca 0.3 BiO 3 , implying that the Gd 0.7 Ca 0.3 BiO 3 buffer layer The film has a strong out-of-plane texture.
图 4是本发明实施例二Gd0.7Ca0.3BiO3缓冲层的10000倍扫描电子显微镜(SEM)照片。由图4可知:薄膜样品表面平整、致密,无洞无缝。由此可知此实施例一制备出了织构良好,表面致密平整的Gd0.7Ca0.3BiO3缓冲层薄膜。 Fig. 4 is a scanning electron microscope (SEM) photograph at 10,000 times the Gd 0.7 Ca 0.3 BiO 3 buffer layer of Example 2 of the present invention. It can be seen from Figure 4 that the surface of the thin film sample is smooth and dense, without holes and seamless. From this, it can be seen that in Example 1, a Gd 0.7 Ca 0.3 BiO 3 buffer layer film with a good texture and a dense and flat surface was prepared.
实施例三 Embodiment three
本发明提供提供一种高温超导涂层导体的缓冲层Gd0.6Ca0.4BiO3。及一种制备高温超导涂层导体Gd0.6Ca0.4BiO3缓冲层薄膜的方法,其步骤是: The invention provides a buffer layer Gd 0.6 Ca 0.4 BiO 3 for a high-temperature superconducting coated conductor. And a kind of method for preparing high-temperature superconducting coating conductor Gd 0.6 Ca 0.4 BiO buffer layer film, its steps are:
a、Gd0.6Ca0.4BiO3缓冲层胶体制备:将前驱物Gd,Ca,Bi的硝酸盐按阳离子浓度0.6:0.4:1溶于适量的聚丙烯酸(PAA)中,从而得到有机物体系。最终溶液总的摩尔浓度为0.2mol/L。 a. Gd 0.6 Ca 0.4 BiO 3 buffer layer colloid preparation: the precursors Gd, Ca, and Bi nitrate were dissolved in an appropriate amount of polyacrylic acid (PAA) at a cation concentration of 0.6:0.4:1 to obtain an organic system. The total molar concentration of the final solution is 0.2mol/L.
b、Gd0.6Ca0.4BiO3缓冲层涂敷,干燥与分解:将a步制得的胶体涂覆在LaAlO3单晶基片上,再在150℃进行干燥;再将其置于烧结炉中,在空气中使炉温从室温缓慢升至230℃,并以1℃/min的速度升至在340℃,再以1℃/min的速度升至560℃,保温30分钟。 b. Coating of Gd 0.6 Ca 0.4 BiO 3 buffer layer, drying and decomposition: Coating the colloid prepared in step a on the LaAlO 3 single crystal substrate, and then drying at 150°C; then placing it in a sintering furnace, In the air, the furnace temperature was slowly raised from room temperature to 230°C, and then raised to 340°C at a speed of 1°C/min, and then raised to 560°C at a speed of 1°C/min, and kept for 30 minutes.
c、烧结成相:将上述干燥及热处理分解后所制得的基片放入烧结炉中,在空气中将炉温快速以100℃/min的速度升至820℃,保温60分钟;再让炉温缓慢降至室温,最终得到Gd0.6Ca0.4BiO3缓冲层。 c. Sintering phase formation: Put the substrate obtained after the above drying and heat treatment decomposition into a sintering furnace, rapidly raise the furnace temperature to 820°C at a rate of 100°C/min in the air, and keep it warm for 60 minutes; The furnace temperature was slowly lowered to room temperature, and finally a Gd 0.6 Ca 0.4 BiO 3 buffer layer was obtained.
图 5是本发明实施例三的Gd0.6Ca0.4BiO3缓冲层的X射线衍射图谱。由图可以看出除了Gd0.6Ca0.4BiO3缓冲层(002)衍射峰和基片LaAlO3的衍射峰外,无Gd0.6Ca0.4BiO3其他杂峰,暗示出Gd0.6Ca0.4BiO3缓冲层薄膜存在很强的面外织构。 Fig. 5 is an X-ray diffraction pattern of the Gd 0.6 Ca 0.4 BiO 3 buffer layer in Example 3 of the present invention. It can be seen from the figure that except for the diffraction peak of the Gd 0.6 Ca 0.4 BiO 3 buffer layer (002) and the diffraction peak of the substrate LaAlO 3 , there are no other impurity peaks of Gd 0.6 Ca 0.4 BiO 3 , implying that the Gd 0.6 Ca 0.4 BiO 3 buffer layer The film has a strong out-of-plane texture.
图 6是本发明实施例三Gd0.6Ca0.4BiO3缓冲层的10000倍扫描电子显微镜(SEM)照片。由图6可知:薄膜样品表面平整、致密,无洞无缝。由此可知此实施例一制备出了织构良好,表面致密平整的Gd0.6Ca0.4BiO3缓冲层薄膜。 Fig. 6 is a scanning electron microscope (SEM) photo at 10,000 times the Gd 0.6 Ca 0.4 BiO 3 buffer layer of Example 3 of the present invention. It can be seen from Figure 6 that the surface of the film sample is flat and compact, without holes and seamless. From this, it can be seen that in Example 1, a Gd 0.6 Ca 0.4 BiO 3 buffer layer film with a good texture and a dense and smooth surface was prepared.
本发明的一种高温超导涂层导体缓冲层Gd1-xCaxBiO3及其制备方法,其制备过程中所使用的Gd,Ca,Bi的硝酸盐为分析纯。本发明的聚丙烯酸(PAA)有机溶剂体系是将丙烯酸单体加入N,N-二甲基甲酰胺(DMF)中,聚合生成聚丙烯酸,从而形成有机溶剂体系。 The present invention relates to a high-temperature superconducting coating conductor buffer layer Gd 1-x Ca x BiO 3 and a preparation method thereof. The Gd, Ca, and Bi nitrates used in the preparation process are analytically pure. In the polyacrylic acid (PAA) organic solvent system of the present invention, acrylic acid monomer is added into N,N-dimethylformamide (DMF) to polymerize polyacrylic acid, thereby forming an organic solvent system.
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CN101546630A (en) * | 2008-03-29 | 2009-09-30 | Z能源电力有限公司 | High-temperature superconductor allocation |
US7807608B2 (en) * | 2006-05-18 | 2010-10-05 | Nexans | Coated conductor and polycrystalline films useful for the production of high temperatures superconductor layers |
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US7807608B2 (en) * | 2006-05-18 | 2010-10-05 | Nexans | Coated conductor and polycrystalline films useful for the production of high temperatures superconductor layers |
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