CN102707564B - Color filter and manufacturing method thereof - Google Patents
Color filter and manufacturing method thereof Download PDFInfo
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- CN102707564B CN102707564B CN201110210807.4A CN201110210807A CN102707564B CN 102707564 B CN102707564 B CN 102707564B CN 201110210807 A CN201110210807 A CN 201110210807A CN 102707564 B CN102707564 B CN 102707564B
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- film layer
- black matrix
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- colored film
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Abstract
The invention provides a color filter and a manufacturing method thereof, and belongs to the field of liquid crystal display. The manufacturing method of the color filter comprises the following steps: coating or depositing a first color film layer; coating or depositing a black matrix material layer on the first color film layer; performing primary exposure development of the first color film layer and the black matrix material layer to form a first region and a second region, removing the black matrix material layer of the first region with the first color film layer being left to form a first color film pattern, retaining both the black matrix material layer and the first color film layer of the second region to form a black matrix. Embodiments of the invention can simplify manufacturing procedures of a color film substrate, and improve production efficiency. The technical scheme of the invention is applicable to manufacture of color filters.
Description
Technical field
The present invention relates to field of liquid crystal display, refer to especially a kind of colored filter and manufacture method thereof.
Background technology
Liquid crystal display device (Liquid Crvstal Display, LCD) is non-active luminous device, and colored filter is exactly to make liquid crystal display device realize colored critical component.
Existing color membrane substrates comprises underlay substrate, on underlay substrate, be provided with black matrix, in the interval of black matrix, be provided with color film pattern, generally color film pattern can comprise and corresponds respectively to the first color film pattern a kind of in red-green-blue, the second color film pattern, the 3rd color film pattern, or can also comprise the color film pattern of other colors such as white, yellow.On black matrix and color film pattern, can also form planarization layer, on planarization layer, can also lay public electrode and form chock insulator matter.
In the manufacturing process of existing color membrane substrates, the manufacture process of black matrix and each color film pattern is substantially identical, all utilize mask to carry out the realization of composition technique, specifically by the resin-coating of respective color or be deposited on underlay substrate, utilize mask plate to expose to it, then develop and obtain setting black matrix or the color film pattern of pattern.The defects such as the process for making of existing color membrane substrates is to manufacture respectively black matrix and versicolor color film pattern, exists operation more, and production efficiency is lower.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of colored filter and manufacture method thereof, can simplify the manufacturing process of color membrane substrates, enhances productivity.
For solving the problems of the technologies described above, embodiments of the invention provide technical scheme as follows:
On the one hand, provide a kind of manufacture method of colored filter, comprising:
Apply or deposition the first colored film layer;
On described the first colored film layer, apply or deposition one black matrix material layer;
Described the first colored film layer and described black matrix material layer are carried out to single exposure development, form first area and second area, the black matrix material layer of described first area is removed and the first colored film layer is retained and forms the first color film pattern, and the black matrix material layer of described second area and the first colored film layer are all retained the black matrix of formation.
Further, described described the first colored film layer and described black matrix material layer are carried out being also formed with one the 3rd region after single exposure development, black matrix material layer and first colored film layer in described the 3rd region are all removed.
Further, before described coating or deposition the first colored film layer, also comprise:
On underlay substrate, apply or deposition the second colored film layer;
Described the second colored film layer is carried out to exposure imaging, and the second colored film layer being retained forms the second color film pattern, and wherein said the second color film pattern is positioned on described the 3rd region.
Further, describedly described the first colored film layer and described black matrix material layer carried out to single exposure also comprise after developing:
On described first area, second area and the 3rd region, apply or deposition the 3rd colored film layer;
Described the 3rd colored film layer is carried out to exposure imaging, and the 3rd colored film layer being retained forms the 3rd color film pattern, and wherein said the 3rd color film pattern is positioned on described the 3rd region.
Wherein, described coating or deposition the first colored film layer are specially:
On the underlay substrate that is formed with described the second color film pattern, apply or deposition the first colored film layer.
The embodiment of the present invention also provides more than one to state the colored filter that method is manufactured, and comprising:
One underlay substrate;
Be positioned at the first colored film layer on described underlay substrate and be positioned at the black matrix on described the first colored film layer, described the first colored film layer is not formed the first color film pattern by the region of described black Matrix cover.
Wherein, described colored filter also comprises:
Be positioned at the second color film pattern on described underlay substrate, described the second color film pattern is to be formed on described the first color film pattern and described black matrix color film pattern before.
Wherein, described colored filter also comprises:
Be positioned at the 3rd color film pattern on described underlay substrate, described the 3rd color film pattern is to be formed on described the first color film pattern and described black matrix color film pattern afterwards.
Embodiments of the invention have following beneficial effect:
In such scheme, by single exposure, developed and formed the first color film pattern and black matrix simultaneously, the technical method that adopts black matrix to form together with color film pattern, has reduced the manufacturing process of color membrane substrates, has improved production efficiency, and then has reduced the cost of product.
Accompanying drawing explanation
Fig. 1 is the schematic flow sheet of the manufacture method of color membrane substrates in prior art;
Fig. 2 is the schematic flow sheet of manufacture method of the colored filter of the embodiment of the present invention;
Fig. 3 is the manufacture method schematic diagram that in first embodiment of the invention, black matrix and the first color film pattern form simultaneously;
Fig. 4 is the schematic diagram of whole three kinds of color film patterns after forming in first embodiment of the invention.
Embodiment
For technical matters, technical scheme and advantage that embodiments of the invention will be solved are clearer, be described in detail below in conjunction with the accompanying drawings and the specific embodiments.
Embodiments of the invention are more for the manufacturing process operation of color membrane substrates in prior art, and the problem that production efficiency is lower provides a kind of colored filter and manufacture method thereof, can simplify the manufacturing process of color membrane substrates, enhances productivity.
Fig. 1 is the schematic flow sheet of the manufacture method of color membrane substrates in prior art, and as shown in Figure 1, in prior art, the manufacture method of middle color membrane substrates comprises the following steps:
Step 101: apply or deposit black matrix layer on underlay substrate, adopt composition technique to form the pattern of black matrix;
Step 102: adopt composition technique to form successively the color film pattern of other n kinds on the underlay substrate through after step 101, n is natural number;
Step 103: apply planarization layer on the underlay substrate through after step 102, and deposition of transparent conductive film layer is as public electrode.
Can find out the defect such as the manufacture method of prior art color membrane substrates is to manufacture respectively black matrix and versicolor color film pattern, exists operation more, and production efficiency is lower.
Fig. 2 is the schematic flow sheet of manufacture method of the colored filter of the embodiment of the present invention, and as shown in Figure 2, the present embodiment comprises:
Step 201: apply or deposition the first colored film layer;
Step 202: apply on the first colored film layer or deposition one black matrix material layer;
Step 203: the first colored film layer and black matrix material layer are carried out to single exposure development, form first area and second area, the black matrix material layer of first area is removed and the first colored film layer is retained and forms the first color film pattern, and the black matrix material layer of second area and the first colored film layer are all retained the black matrix of formation.
The first colored film layer and black matrix material layer are carried out being also formed with one the 3rd region after single exposure development, and black matrix material layer and first colored film layer in the 3rd region are all removed.
Wherein, applying or deposit the first colored film layer can also comprise before:
On underlay substrate, apply or deposition the second colored film layer;
The second colored film layer is carried out to exposure imaging, and the second colored film layer being retained forms the second color film pattern, and wherein the second color film pattern is positioned on the 3rd region.
Further, applying or deposit the first colored film layer is specially:
On the underlay substrate that is formed with the second color film pattern, apply or deposition the first colored film layer.
Further, the first colored film layer and black matrix material layer are carried out also comprising after single exposure development:
On first area, second area and the 3rd region, apply or deposition the 3rd colored film layer;
The 3rd colored film layer is carried out to exposure imaging, and the 3rd colored film layer being retained forms the 3rd color film pattern, and wherein the 3rd color film pattern is positioned on the 3rd region.
After forming all color film patterns, on the underlay substrate that is formed with all color film patterns and black matrix, apply planarization layer, then deposit transparent conductive layer is as public electrode.
The embodiment of the present invention is developed and is formed the first color film pattern and black matrix simultaneously by single exposure, and the technical method that adopts black matrix to form together with color film pattern has reduced the manufacturing process of color membrane substrates, has improved production efficiency, and then has reduced the cost of product.
Below in conjunction with specific embodiment, the manufacture method of colored filter of the present invention is specifically introduced.
The first embodiment:
In the present embodiment, specifically on the underlay substrate with colored filter, form three kinds of color film patterns, i.e. the first color film pattern, the second color film pattern and the 3rd color film pattern, and black matrix and the first color film pattern form example simultaneously and describe, and concrete steps are as follows:
Step 11: simultaneously form the first color film pattern and black matrix;
Fig. 3 is the manufacture method schematic diagram that black matrix and the first color film pattern form simultaneously, as shown in Fig. 3 (a), applies or deposition the first colored film layer 301 on underlay substrate 300; On the first colored film layer 301, apply or deposit black matrix material layer 302;
As shown in Fig. 3 (b), with thering is gray tone or the part mask plate 304 through function, expose, on the first colored film layer 301, form and remove region, part reserve area and complete reserve area completely, wherein, part reserve area is first area, reserve area is second area completely, and removing region is completely the 3rd region;
As shown in Fig. 3 (c), then carry out development operation, black matrix material layer and the first colored film layer of removing region 309 are completely completely removed, thereby the black matrix material layer of part reserve area is removed, the first colored film layer is retained and forms the first color film pattern 306, thereby the black matrix material layer of reserve area and the first colored film layer are all retained and form black matrix 305 completely;
Step 12: apply on the underlay substrate that forms the first color film pattern and black matrix or deposition the second colored film layer;
Use mask board to explosure, on aforesaid substrate, form and remove region and complete reserve area completely, then carry out development operation, thereby the second colored film layer of reserve area is retained formation the second color film pattern completely, at the second colored film layer of removing region completely, is completely removed;
Step 13: apply on the underlay substrate that forms the first color film pattern, the second color film pattern and black matrix or deposition the 3rd colored film layer;
Use mask board to explosure, on aforesaid substrate, form and remove region and complete reserve area completely, then carry out development operation, thereby the 3rd colored film layer of reserve area is retained formation the 3rd color film pattern completely, at the 3rd colored film layer of removing region completely, is completely removed.Schematic diagram after being illustrated in figure 4 whole three kinds of color film patterns in the present embodiment and all forming, can find out and on underlay substrate 300, be formed with black matrix 305, the first color film pattern 307 of color film pattern 306, second and the 3rd color film pattern 308.
After this, can after black matrix and all color film patterns all form, on underlay substrate, apply planarization layer, then can be on planarization layer deposit transparent metal material as common electrode layer.
The order of above-mentioned steps 11, step 12 and step 13 can be exchanged, such as order can be step 12-step 11-step 13, step 12-step 13-step 11, step 13-step 11-step 12 or step 13-step 12-step 11, the second embodiment exchanges with step 11 and step 13, and order is specifically described for example for step 13-step 12-step 11:
Step 21: apply on underlay substrate or deposition the first colored film layer;
Use mask board to explosure, on aforesaid substrate, form and remove region and complete reserve area completely, then carry out development operation, thereby the first colored film layer of reserve area is retained formation the first color film pattern completely, at the first colored film layer of removing region completely, is completely removed;
Step 22: apply on the underlay substrate that forms the first color film pattern or deposition the second colored film layer;
Use mask board to explosure, on aforesaid substrate, form and remove region and complete reserve area completely, then carry out development operation, thereby the second colored film layer of reserve area is retained formation the second color film pattern completely, at the second colored film layer of removing region completely, is completely removed;
Step 23: apply on the underlay substrate that forms the first color film pattern and the second color film pattern or deposition the 3rd colored film layer;
On the 3rd colored film layer, apply or deposit black matrix material layer;
With thering is gray tone or the part mask board to explosure through function, forming, remove region, part reserve area and complete reserve area completely on the 3rd colored film layer.Then carry out development operation, black matrix material layer and the 3rd colored film layer of removing region are completely completely removed, thereby the black matrix material layer of part reserve area is removed, the 3rd colored film layer is retained and forms the 3rd color film pattern, thereby the black matrix material layer of reserve area and the 3rd colored film layer are all retained and form black matrix completely.
After this, can after black matrix and all color film patterns all form, on underlay substrate, apply planarization layer, then can be on planarization layer deposit transparent metal material as common electrode layer.
The above is the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, do not departing under the prerequisite of principle of the present invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (4)
1. a manufacture method for colored filter, is characterized in that, comprising:
Apply or deposition the first colored film layer;
On described the first colored film layer, apply or deposition one black matrix material layer;
Described the first colored film layer and described black matrix material layer are carried out to single exposure development, form first area and second area, the black matrix material layer of described first area is removed and the first colored film layer is retained and forms the first color film pattern, and the black matrix material layer of described second area and the first colored film layer are all retained the black matrix of formation;
Described described the first colored film layer and described black matrix material layer are carried out being also formed with one the 3rd region after single exposure development, black matrix material layer and first colored film layer in described the 3rd region are all removed.
2. the manufacture method of colored filter according to claim 1, is characterized in that, before described coating or deposition the first colored film layer, also comprises:
On underlay substrate, apply or deposition the second colored film layer;
Described the second colored film layer is carried out to exposure imaging, and the second colored film layer being retained forms the second color film pattern, and wherein said the second color film pattern is positioned on described the 3rd region.
3. the manufacture method of colored filter according to claim 1 and 2, is characterized in that, describedly described the first colored film layer and described black matrix material layer are carried out to single exposure also comprises after developing:
On described first area, second area and the 3rd region, apply or deposition the 3rd colored film layer;
Described the 3rd colored film layer is carried out to exposure imaging, and the 3rd colored film layer being retained forms the 3rd color film pattern, and wherein said the 3rd color film pattern is positioned on described the 3rd region.
4. the manufacture method of colored filter according to claim 2, is characterized in that, described coating or deposition the first colored film layer are specially:
On the underlay substrate that is formed with described the second color film pattern, apply or deposition the first colored film layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110210807.4A CN102707564B (en) | 2011-07-26 | 2011-07-26 | Color filter and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110210807.4A CN102707564B (en) | 2011-07-26 | 2011-07-26 | Color filter and manufacturing method thereof |
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| Publication Number | Publication Date |
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| CN102707564A CN102707564A (en) | 2012-10-03 |
| CN102707564B true CN102707564B (en) | 2014-04-09 |
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| CN201110210807.4A Expired - Fee Related CN102707564B (en) | 2011-07-26 | 2011-07-26 | Color filter and manufacturing method thereof |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104614931B (en) * | 2015-03-09 | 2019-05-17 | 合肥京东方光电科技有限公司 | Mask plate and the method and color membrane substrates for manufacturing color membrane substrates |
| CN112114453A (en) * | 2019-06-20 | 2020-12-22 | 京东方科技集团股份有限公司 | Color film substrate, display panel and display device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101013173A (en) * | 2007-01-31 | 2007-08-08 | 昆山维信诺显示技术有限公司 | Chromatic color filter base plate and mask plate for its production and formed organic electroluminescent component |
| CN101290419A (en) * | 2007-04-19 | 2008-10-22 | Lg.菲力浦Lcd株式会社 | Liquid crystal display panel and fabricating methods thereof |
| CN101819349A (en) * | 2009-02-27 | 2010-09-01 | 北京京东方光电科技有限公司 | Color film base plate and manufacturing method thereof as well as liquid crystal display panel |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060132678A1 (en) * | 2004-12-17 | 2006-06-22 | Sharp Kabushiki Kaisha | Color filter substrate and liquid crystal display device |
| TWI363196B (en) * | 2007-03-22 | 2012-05-01 | Au Optronics Corp | Color filter and manufacturing method thereof |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101013173A (en) * | 2007-01-31 | 2007-08-08 | 昆山维信诺显示技术有限公司 | Chromatic color filter base plate and mask plate for its production and formed organic electroluminescent component |
| CN101290419A (en) * | 2007-04-19 | 2008-10-22 | Lg.菲力浦Lcd株式会社 | Liquid crystal display panel and fabricating methods thereof |
| CN101819349A (en) * | 2009-02-27 | 2010-09-01 | 北京京东方光电科技有限公司 | Color film base plate and manufacturing method thereof as well as liquid crystal display panel |
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| CN102707564A (en) | 2012-10-03 |
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