[go: up one dir, main page]

CN102694341A - Etching heat dissipation enhanced type vertical-cavity surface-emitting laser - Google Patents

Etching heat dissipation enhanced type vertical-cavity surface-emitting laser Download PDF

Info

Publication number
CN102694341A
CN102694341A CN2011100727690A CN201110072769A CN102694341A CN 102694341 A CN102694341 A CN 102694341A CN 2011100727690 A CN2011100727690 A CN 2011100727690A CN 201110072769 A CN201110072769 A CN 201110072769A CN 102694341 A CN102694341 A CN 102694341A
Authority
CN
China
Prior art keywords
substrate
bragg reflector
laser
distribution bragg
heat sink
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011100727690A
Other languages
Chinese (zh)
Inventor
晏长岭
邓昀
徐莉
冯源
郝永芹
田春雨
贾霄
赵英杰
李鹏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changchun University of Science and Technology
Original Assignee
Changchun University of Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changchun University of Science and Technology filed Critical Changchun University of Science and Technology
Priority to CN2011100727690A priority Critical patent/CN102694341A/en
Publication of CN102694341A publication Critical patent/CN102694341A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Semiconductor Lasers (AREA)

Abstract

本发明的一种刻蚀散热增强型垂直腔面发射激光器,在衬底的中央采用湿法腐蚀或干法刻蚀方法去掉相应的衬底形成衬底沟槽,形成的衬底沟槽由高导热焊料填充,减少衬底对有源区产生的热向热沉扩散的阻隔,使有源增益区与散热片或热沉实现近距离接触,实现对有源增益区产生的热量进行很好的散热作用,实现增强散热效果;与此同时还可以减少部分衬底对激光器串联电阻的贡献。与传统的垂直腔面发射激光器衬底与散热片或热沉直接焊接相比,这种结构设计的激光器增强散热能力在30%以上,提高激光器件的光输出功率在20%以上,提高器件电光转换效率在20%以上,克服了现有结构的不足。

Figure 201110072769

In the etching and heat dissipation enhanced vertical cavity surface emitting laser of the present invention, the corresponding substrate is removed by wet etching or dry etching in the center of the substrate to form a substrate groove, and the formed substrate groove is composed of high Thermally conductive solder filling reduces the barrier of the substrate to the heat generated by the active area to diffuse to the heat sink, so that the active gain area can be in close contact with the heat sink or heat sink, and realizes a good control of the heat generated by the active gain area The heat dissipation effect can be realized to enhance the heat dissipation effect; at the same time, it can also reduce the contribution of part of the substrate to the series resistance of the laser. Compared with the direct welding of the traditional vertical cavity surface emitting laser substrate with the heat sink or heat sink, the laser with this structure design can enhance the heat dissipation capacity by more than 30%, improve the optical output power of the laser device by more than 20%, and improve the electro-optical efficiency of the device. The conversion efficiency is above 20%, which overcomes the shortcomings of the existing structure.

Figure 201110072769

Description

A kind of etching heat radiation enhancement mode vertical cavity surface emitting laser
Technical field
The invention belongs to field of semiconductor lasers, relate to a kind of etching heat radiation enhancement mode vertical cavity surface emitting laser.
Background technology
Vertical cavity surface emitting laser is one of most active research topic of current photoelectron laser technology field as a kind of novel semi-conductor laser.Compare with edge-emission semiconductor laser, vertical cavity surface emitting laser with its circular symmetry light beam, far-field divergence angle is little and the characteristics that are easy to form the planar array are with a wide range of applications in fields such as laser communication, laser display, materials processing, medical treatment and defence engineerings.Particularly it is easy to form the flat two-dimensional arrays laser, in fields such as parallel laser communication, parallel laser data processing very large research and development prospect is arranged.Meanwhile, high-power vertical cavity surface emitting laser and array device are in the laser pumping technology, and nonlinear effect and laser processing etc. has also shown good development potentiality.The vertical cavity surface emitting laser device architecture mainly comprises: light-emitting window, light-emitting window anti-reflection film, top electrode, last distribution Bragg reflector, oxidation limiting layer, active gain district, following distribution Bragg reflector, substrate, bottom electrode etc.; Individual laser package when welding, bottom electrode through scolder be welded to heat sink on, in order further to improve the radiating effect of device, can bottom electrode and heat sink between add fin, be generally metallized diamond heat sink.Laser injects work under the pumping energisation mode at electricity; Form the Stimulated Light amplification in the active gain district, in the resonant cavity that distribution Bragg reflector forms up and down, produce vibration, and from the outgoing of last distribution Bragg reflector process light-emitting window; In order to increase the outgoing effect, increase the plating anti-reflection film.The heat that the active gain district produced when vertical cavity surface emitting laser was worked under electricity injection pumping energisation mode need be passed through distribution Bragg reflector and substrate down, is shed heat to heat sink by fin again; Since active gain district and fin or heat sink between have thicker substrate to be separated by, reduced the heat-sinking capability of Laser Devices, reduced the bright dipping of laser Power, also reduced the job stability of laser, ForReduce these adverse effects, substrate will be thinned processing usually, but also have the substrate of 150-200 micron.(list of references (1) Journal of materials science:materials inelectronics, 15 (2004) pp.115-117, (2) Journal of vacuum science&technology B; 23 (4) (2005); Pp.1428-1433, (3) Journal of crystal growth, 272 (1-4) (2004); Pp.549-554) therefore need a kind of better vertical-cavity surface emitting laser structure; Strengthen the heat-sinking capability of Laser Devices, improve the electro-optical efficiency of laser, strengthen the job stability of laser.
Summary of the invention
In order to solve the problem that prior art exists, the present invention proposes a kind of etching heat radiation enhancement mode vertical cavity surface emitting laser.
A kind of etching heat radiation enhancement mode vertical cavity surface emitting laser of the present invention comprises anti-reflection film, top electrode, last distribution Bragg reflector, oxidation limiting layer, active gain district and the following distribution Bragg reflector that connects in order; And anti-reflection film also is connected with last distribution Bragg reflector; Last distribution Bragg reflector also is connected with the active gain district; Anti-reflection film in the middle of the described top electrode is a light-emitting window; The shape of oxidation limiting layer is identical with the shape of top electrode, and middle body forms electric current and injects window; It is characterized in that; Thereby the central authorities of described substrate adopt wet etching or dry etching method to remove corresponding substrate and form substrate trenches; The upper surface of this substrate trenches contacts with the corresponding part of the lower surface of following distribution Bragg reflector; Lower surface and described substrate trenches surface along substrate make bottom electrode, in the substrate trenches of having made bottom electrode, fill high heat conduction scolder, so that better heat radiation; Bottom electrode is welded to fin, fin be welded to heat sink on;
Active gain district and fin, heat sink realization close contact, the heat that the active gain district produces can pass through down distribution Bragg reflector directly to fin, heat sinkly well spread, strengthened radiating effect;
The cycle logarithm of distribution Bragg reflector is many 3 to 50 pairs on the cycle logarithm ratio of described following distribution Bragg reflector, guarantees the light-emitting window outgoing of laser from the vertical cavity surface of last distribution Bragg reflector.
This structure can be applicable to also can be applicable in the OLED structure design in III-V and II-VI family semiconductor laser or the panel detector structure design.
When a kind of etching heat radiation enhancement mode vertical cavity surface emitting laser of the present invention was worked: laser injected the work of pumping energisation mode with electricity; Electric current is the utmost point and bottom electrode injection from power on; Injected electrons and hole are carried out compound in the active gain district; The generation Stimulated Light is amplified, and the resonant cavity modeling vibration through being made up of last distribution Bragg reflector and following distribution Bragg reflector, swashs and penetrates the light-emitting window outgoing of light from last distribution Bragg reflector and anti-reflection film formed vertical cavity surface.
Beneficial effect: a kind of etching heat radiation enhancement mode vertical cavity surface emitting laser of the present invention; Central authorities at substrate adopt wet etching or dry etching method to remove corresponding substrate formation substrate trenches; The substrate trenches that forms is filled by high heat conduction scolder, reduces the obstruct of substrate to the hot heat sink diffusion of active area generation, makes active gain district and fin or heat sink realization close contact; Realization is carried out good thermolysis to the heat that the active gain district produces, and realizes strengthening radiating effect; Meanwhile can also reduce of the contribution of part substrate to the laser series resistance.Compare with fin or heat sink direct welding with traditional vertical cavity surface emitting laser substrate; The laser of this structural design strengthens heat-sinking capability more than 30%; The optical output power that improves Laser Devices is more than 20%; Improve the device electro-optical conversion efficiency more than 20%, overcome the deficiency of existing structure.
Description of drawings
Fig. 1 is the profile of a kind of etching heat radiation enhancement mode vertical cavity surface emitting laser front view of embodiment 1.
Fig. 2 is the profile of a kind of etching heat radiation enhancement mode vertical cavity surface emitting laser 3 * 3 flat two-dimensional arrays device front views of embodiment 3.
Embodiment
Embodiment 1
Fig. 1 is the profile of a kind of etching heat radiation enhancement mode vertical cavity surface emitting laser front view of embodiment 1.
The formation of a kind of etching heat radiation enhancement mode vertical cavity surface emitting laser of the present invention comprises anti-reflection film 1, top electrode 2, upward distribution Bragg reflector 3, oxidation limiting layer 4, active gain district 5 are connected with following distribution Bragg reflector 6 in order; And anti-reflection film 1 also is connected with last distribution Bragg reflector 3; Last distribution Bragg reflector 3 also is connected with active gain district 5; Anti-reflection film 1 in the middle of the described top electrode 2 is a light-emitting window; The shape of oxidation limiting layer 4 is identical with the shape of top electrode 2, and middle body forms electric current and injects window; It is characterized in that; Thereby the central authorities of described substrate 7 adopt wet etching or dry etching method to remove corresponding substrate and form substrate trenches 11; The upper surface of this substrate trenches contacts with the corresponding part of the lower surface of following distribution Bragg reflector 6; Make bottom electrode 8 along the lower surface of substrate 7 and the surface of described substrate trenches 11, in the substrate trenches of having made bottom electrode 11, fill high heat conduction scolder, so that better heat radiation; Bottom electrode 8 is welded to fin 9, and fin 9 is welded on heat sink 10.
Active gain district 5 realizes close contact with fin 9, heat sink 10, and the heat that active gain district 5 produces can be passed through down distribution Bragg reflector 6 and directly well spread to fin 9, heat sink 10, has strengthened radiating effect;
The cycle logarithm of distribution Bragg reflector is many 3 to 50 pairs on the cycle logarithm ratio of described following distribution Bragg reflector, guarantees the light-emitting window outgoing of laser from the vertical cavity surface of last distribution Bragg reflector.
When a kind of etching heat radiation enhancement mode vertical cavity surface emitting laser of the present invention was worked: laser injected the work of pumping energisation mode with electricity; Electric current is the utmost point and bottom electrode injection from power on; Injected electrons and hole are carried out compound in the active gain district; The generation Stimulated Light is amplified, and the resonant cavity modeling vibration through being made up of last distribution Bragg reflector and following distribution Bragg reflector, swashs and penetrates light from the light-emitting window outgoing of last distribution Bragg reflector with circular anti-reflection film formed vertical cavity surface.
The concrete technical data of present embodiment is following: circular anti-reflection film 1 is the anti-reflection film to excitation wavelength 800-850nm, the circular anti-reflection film 1 of light-emitting window half through being 50 microns; Top electrode 2 is Ti-Pt-Au electrodes; Last distribution Bragg reflector 3 adopts p type AlGaAs/AlAs periodic structure, 28 pairs of periodicities; Oxidation limiting layer 4 is the AlGaAs material of high Al component; The mass content of Al component is 0.98; Under 400 ℃ of water vapor atmosphere of high temperature, through the oxidized formation insulating material of high warm and humid nitrogen, injection current is played restriction, the electric current that forms 50 microns of radiuses injects window; Active gain district 5 is a GaAs/AlGaAs MQW gain region; Following distribution Bragg reflector 6 is a n type AlGaAs/AlAs periodic structure, and periodicity is 40 pairs, and substrate 7 is the GaAs backing material; Bottom electrode 8 is the Au-Ge-Ni electrode; Fin 9 adopts metallized diamond heat sink or aluminium nitride, or the beryllium oxide material; Heat sink 10 adopt fine copper or oxygen-free copper or red copper; Scolder 11 adopts the Au-Sn solder.Adopt the micromechanics mounting technology chip of laser, fin and heat sink etc. to be carried out the assembling of laser.
Embodiment 2
The formation of a kind of etching heat radiation enhancement mode vertical cavity surface emitting laser of the present invention is with embodiment 1.
The concrete technical data of present embodiment is following: circular anti-reflection film 1 is the anti-reflection film to excitation wavelength 650-670nm, the circular anti-reflection film 1 of light-emitting window half through being 50 microns; Top electrode 2 is Au-Zn alloy electrodes; Last distribution Bragg reflector 3 adopts p type AlGaAs/AlAs periodic structure, 40 pairs of periodicities; Oxidation limiting layer 4 is the AlGaAs material of high Al component; The mass content of Al component is 0.98; Under 400 ℃ of water vapor atmosphere of high temperature, through the oxidized formation insulating material of high warm and humid nitrogen, injection current is played restriction, the electric current that forms 50 microns of radiuses injects window; Active gain district 5 is an AlGaInP/GaInP MQW gain region; Following distribution Bragg reflector 6 is a n type AlGaAs/AlAs periodic structure, and periodicity is 70 pairs, and substrate 7 is the GaAs backing material; Bottom electrode 8 is the Au-Ge-Ni electrode; Fin 9 adopts metallized diamond heat sink or aluminium nitride, or the beryllium oxide material; Heat sink 10 adopt fine copper or oxygen-free copper or red copper; Scolder 11 adopts the Au-Sn solder.
Embodiment 3
Fig. 2 is the profile of a kind of etching heat radiation enhancement mode vertical cavity surface emitting laser 3 * 3 flat two-dimensional arrays device front views of embodiment 3.
A kind of etching heat radiation enhancement mode vertical cavity surface emitting laser forms 3 * 3 flat two-dimensional arrays devices, and each unit laser structure is identical with embodiment 1 or 2 in the array laser device.
Embodiment 4
When the current injection area of vertical cavity surface emitting laser is very little, when promptly radius is less than 20 microns, when the corresponding substrate side raceway groove that need open is very little, adopt the size of the raceway groove opened can be bigger than current injection area, strengthen filling out of scolder.

Claims (1)

1. etching heat radiation enhancement mode vertical cavity surface emitting laser, its formation comprise the anti-reflection film (1), the top electrode (2) that connect in order, go up distribution Bragg reflector (3), oxidation limiting layer (4), active gain district (5) and following distribution Bragg reflector (6); And anti-reflection film (1) also is connected with last distribution Bragg reflector (3); Last distribution Bragg reflector (3) also is connected with active gain district (5); Anti-reflection film (1) in the middle of the described top electrode (2) is a light-emitting window; The shape of oxidation limiting layer (4) is identical with the shape of top electrode (2), and its middle body forms electric current and injects window; It is characterized in that; Described substrate (7) thus central authorities adopt wet etching or dry etching method to remove corresponding substrate to form substrate trenches; The upper surface of this substrate trenches contacts with the corresponding part of the lower surface of following distribution Bragg reflector (6); Make bottom electrode (8) along the lower surface of substrate (7) and the surface of described substrate trenches (11), in the substrate trenches of having made bottom electrode (11), fill high heat conduction scolder; Bottom electrode 8 is welded to fin (9), and fin (9) is welded on heat sink (10); The cycle logarithm of distribution Bragg reflector (3) is many 3 to 50 pairs on the cycle logarithm ratio of described following distribution Bragg reflector (6).
CN2011100727690A 2011-03-25 2011-03-25 Etching heat dissipation enhanced type vertical-cavity surface-emitting laser Pending CN102694341A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2011100727690A CN102694341A (en) 2011-03-25 2011-03-25 Etching heat dissipation enhanced type vertical-cavity surface-emitting laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2011100727690A CN102694341A (en) 2011-03-25 2011-03-25 Etching heat dissipation enhanced type vertical-cavity surface-emitting laser

Publications (1)

Publication Number Publication Date
CN102694341A true CN102694341A (en) 2012-09-26

Family

ID=46859660

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011100727690A Pending CN102694341A (en) 2011-03-25 2011-03-25 Etching heat dissipation enhanced type vertical-cavity surface-emitting laser

Country Status (1)

Country Link
CN (1) CN102694341A (en)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108957767A (en) * 2018-07-16 2018-12-07 湖北三江航天红林探控有限公司 High power light energy choking device
CN110829178A (en) * 2019-11-08 2020-02-21 长春理工大学 Distributed Bragg reflector vertical cavity surface emitting semiconductor laser under annular structure
CN110943369A (en) * 2018-09-21 2020-03-31 阿尔戈人工智能有限责任公司 Monolithic series connected laser diode array and method of forming same
CN111129942A (en) * 2019-12-31 2020-05-08 长春理工大学 Device-matched high-efficiency heat-dissipating semiconductor substrate and preparation method thereof
CN111180995A (en) * 2019-11-19 2020-05-19 浙江博升光电科技有限公司 Substrate transfer vertical cavity surface emitting laser and method of manufacturing the same
CN111342338A (en) * 2020-05-20 2020-06-26 北京金太光芯科技有限公司 VCSEL with flip-chip structure, VCSEL array and preparation method thereof
CN111884046A (en) * 2020-07-06 2020-11-03 武汉光谷量子技术有限公司 Distributed Bragg reflector and manufacturing method and design method thereof
CN111969407A (en) * 2020-08-31 2020-11-20 宁波飞芯电子科技有限公司 Semiconductor laser transmitter
CN112490851A (en) * 2020-11-30 2021-03-12 长春理工大学 Vertical cavity surface emitting semiconductor laser with upper and lower electrodes arranged in staggered manner
CN113540962A (en) * 2020-04-21 2021-10-22 青岛海信激光显示股份有限公司 Laser Components
CN113540963A (en) * 2020-04-21 2021-10-22 青岛海信激光显示股份有限公司 Laser assembly
CN113540964A (en) * 2021-06-23 2021-10-22 武汉敏芯半导体股份有限公司 High-reliability edge-emitting laser and process
JP2021182640A (en) * 2017-08-31 2021-11-25 アップル インコーポレイテッドApple Inc. Creating arbitrary patterns on 2-d uniform grid vcsel array
CN113725729A (en) * 2021-09-02 2021-11-30 厦门市三安集成电路有限公司 High-heat-dissipation vertical-cavity surface-emitting laser and manufacturing method thereof
WO2023238429A1 (en) * 2022-06-08 2023-12-14 株式会社村田製作所 Vertical cavity surface emitting laser
US11852463B2 (en) 2011-08-09 2023-12-26 Apple Inc. Projectors of structured light

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11852463B2 (en) 2011-08-09 2023-12-26 Apple Inc. Projectors of structured light
JP7210663B2 (en) 2017-08-31 2023-01-23 アップル インコーポレイテッド Generation of Arbitrary Patterns on Two-Dimensional Uniform Grid VCSEL Arrays
JP2021182640A (en) * 2017-08-31 2021-11-25 アップル インコーポレイテッドApple Inc. Creating arbitrary patterns on 2-d uniform grid vcsel array
CN108957767A (en) * 2018-07-16 2018-12-07 湖北三江航天红林探控有限公司 High power light energy choking device
CN110943369A (en) * 2018-09-21 2020-03-31 阿尔戈人工智能有限责任公司 Monolithic series connected laser diode array and method of forming same
CN110829178B (en) * 2019-11-08 2021-03-26 长春理工大学 Vertical Cavity Surface Emitting Semiconductor Laser with Distributed Bragg Mirror in Ring Structure
CN110829178A (en) * 2019-11-08 2020-02-21 长春理工大学 Distributed Bragg reflector vertical cavity surface emitting semiconductor laser under annular structure
CN111180995A (en) * 2019-11-19 2020-05-19 浙江博升光电科技有限公司 Substrate transfer vertical cavity surface emitting laser and method of manufacturing the same
CN111129942A (en) * 2019-12-31 2020-05-08 长春理工大学 Device-matched high-efficiency heat-dissipating semiconductor substrate and preparation method thereof
CN113540962B (en) * 2020-04-21 2023-07-28 青岛海信激光显示股份有限公司 Laser assembly
CN113540963B (en) * 2020-04-21 2023-05-30 青岛海信激光显示股份有限公司 Laser assembly
CN113540962A (en) * 2020-04-21 2021-10-22 青岛海信激光显示股份有限公司 Laser Components
CN113540963A (en) * 2020-04-21 2021-10-22 青岛海信激光显示股份有限公司 Laser assembly
CN111342338A (en) * 2020-05-20 2020-06-26 北京金太光芯科技有限公司 VCSEL with flip-chip structure, VCSEL array and preparation method thereof
CN111884046B (en) * 2020-07-06 2021-11-09 武汉光谷量子技术有限公司 Distributed Bragg reflector and manufacturing method and design method thereof
CN111884046A (en) * 2020-07-06 2020-11-03 武汉光谷量子技术有限公司 Distributed Bragg reflector and manufacturing method and design method thereof
CN111969407A (en) * 2020-08-31 2020-11-20 宁波飞芯电子科技有限公司 Semiconductor laser transmitter
CN112490851A (en) * 2020-11-30 2021-03-12 长春理工大学 Vertical cavity surface emitting semiconductor laser with upper and lower electrodes arranged in staggered manner
CN113540964A (en) * 2021-06-23 2021-10-22 武汉敏芯半导体股份有限公司 High-reliability edge-emitting laser and process
CN113725729A (en) * 2021-09-02 2021-11-30 厦门市三安集成电路有限公司 High-heat-dissipation vertical-cavity surface-emitting laser and manufacturing method thereof
WO2023238429A1 (en) * 2022-06-08 2023-12-14 株式会社村田製作所 Vertical cavity surface emitting laser

Similar Documents

Publication Publication Date Title
CN102694341A (en) Etching heat dissipation enhanced type vertical-cavity surface-emitting laser
CN101931163A (en) A vertical cavity surface-emitting laser with a light exit window on the substrate side
CN102025111B (en) Small-divergence-angle solid laser pumping module packaging structure
EP2675024B1 (en) Electron beam pumped vertical cavity surface emitting laser
CN115548880A (en) Vertical cavity surface emitting laser array with multi-tunnel junction flip-chip surface relief structure
CN101820136A (en) Asymmetrical 980nm semiconductor laser structure with high power and wide waveguide
CN107069423A (en) A kind of vertical-cavity-face emitting semiconductor laser electrode
CN106098876A (en) A kind of copper base high brightness AlGaInP light emitting diode and manufacture method thereof
CN207338899U (en) A kind of semiconductor laser array encapsulating structure
CN110829178B (en) Vertical Cavity Surface Emitting Semiconductor Laser with Distributed Bragg Mirror in Ring Structure
CN101714744B (en) Non-annular cavity type semiconductor laser
US20120261691A1 (en) Light emitting device and manufacturing method thereof
CN102593717A (en) Semiconductor laser with ultrathin insulating layer and preparation method for semiconductor laser
CN104269740B (en) A kind of laser and preparation method thereof
US8580587B2 (en) Light emitting device and manufacturing method thereof
TWI556470B (en) Light-emitting diode
JP5405039B2 (en) Current confinement type light emitting device and manufacturing method thereof
CN102882124A (en) Semiconductor laser chip structure suitable for being welded reversely
CN110233423A (en) The high-power vertical cavity surface emitting laser of metal grill
CN113851563B (en) Thin film type semiconductor chip structure and photoelectric device using same
CN105119143A (en) Chip structure for reducing packaging stress of semiconductor laser and method of reducing packaging stress
Meng et al. High slope efficiency double and triple junction 808 nm vertical cavity surface emitting lasers
CN214754678U (en) Vertical Cavity Surface Emitting Lasers, Laser Chips and Laser Transmitting Modules
Li et al. High-power InGaAs VCSEL's single devices and 2-D arrays
CN102810813A (en) Elliptical Ring Cavity Semiconductor Laser

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20120926