CN102607772A - Testing method for marginal adaptation of exposure table of exposure machine - Google Patents
Testing method for marginal adaptation of exposure table of exposure machine Download PDFInfo
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- CN102607772A CN102607772A CN2012100559280A CN201210055928A CN102607772A CN 102607772 A CN102607772 A CN 102607772A CN 2012100559280 A CN2012100559280 A CN 2012100559280A CN 201210055928 A CN201210055928 A CN 201210055928A CN 102607772 A CN102607772 A CN 102607772A
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Abstract
The invention relates to a testing method for the marginal adaptation of an exposure table of an exposure machine. The testing method mainly comprises the following steps of: mounting a blank film on an exposure table top, wherein the length and the width of the film are smaller than those of the exposure table by 0-1 cun; sucking 1-5 drops of water or alcohol and dripping the water or the alcohol to the four corners and the middle of the film; closing the framework of the exposure table and vacuumizing the frame; and observing the film diffusion condition of the water or the alcohol, and judging whether the marginal adaptation of the framework is qualified or not according to the film diffusion condition of the water or the alcohol for monitoring the marginal adaptation of the exposure table top. By using the method, the defects of single and general monitoring to the vacuum of the table top and poor light leak monitoring effect on a single point or a local area in the prior art can be overcome, and the marginal adaptation of the exposure table of the exposure machine can be monitored for timely point inspection and maintenance so as to prevent light leak in advance.
Description
Technical field
The present invention relates to the printed-wiring board (PWB) technical field, relate in particular to PCB image transfer exposure production field, be mainly used in monitoring exposure table top adaptation.
Background technology
Present PCB image transfer production field, the management and control of exposure operation vacuum tightness mainly are divided into two kinds in egative film vacuum and table top vacuum.Shown in accompanying drawing 1, between egative film vacuum management and control A and the B or the vacuum tightness between C and the D; Between table top vacuum management and control A and the C or the vacuum tightness between B and the D.
The management and control of egative film vacuum is main with the board vacuum gauge outfit monitoring egative film vacuum values of winding the film mainly, and egative film is inhaled the Newton ring sharpness that shows between egative film and glass after the vacuum and monitored for assisting.The management and control of table top vacuum is mainly monitored the table top vacuum values with board upper table surface vacuum gauge outfit.
Prior art is too single, general to the monitoring of table top vacuum, and is very little to single-point or regional area light leak supervisory function bit.Its reason mainly contains following 2 points: first: operation plank size differs, and makes the unbalance stress of exposure framework and glass table top; Under long-term situation about using, can cause the slight deformation of framework and glass table top.Thereby form single-point or regional area because of vacuum is not enough, cause light leak bad; The second, under the long-term situation about using of exposure framework and glass table top, can cause that frame perimeter is fastening, the wearing and tearing of water-tight equipment or loosening.Cause framework adaptation variation, cause parital vacuum not enough and to produce light leak bad.
Summary of the invention
The method of testing that the purpose of this invention is to provide a kind of exposure machine exposure desk adaptation.The present invention passes through: a will be of a size of the length and width size blank egative film more very little than the little 0-1 of exposure desk and be installed on the exposure table top; B suction 1-5 drips or alcohol drips four jiaos and centre in egative film; The c closure frame is also inhaled into vacuum with it; D observes water or alcohol film diffusion-condition; According to water or alcohol film diffusion-condition, these four steps realize judging whether the framework adaptation is qualified, if even diffused; Be water or alcohol film to around diffusion and drip with the water of centre or alcohol and to be concentric circles, then its adaptation of decidable is better; If spread inhomogeneous, though promptly water or alcohol film to around be diffused as circle, drip with the water of centre or alcohol and be not concentric circles, then its adaptation of decidable is defective.Use that can to overcome prior art after this method too single, general to the monitoring of table top vacuum; To single-point or the very little shortcoming of regional area light leak monitoring effect; Realization is to the monitoring of exposure machine exposure desk adaptation, so that in time spot check is safeguarded, and then prevents the bad generation of light leak in advance.
Description of drawings
The current exposure operation vacuum tightness of Fig. 1 management and control synoptic diagram
Synoptic diagram drips in Fig. 2 specific embodiment 1
Synoptic diagram drips in Fig. 3 specific embodiment 2
Synoptic diagram drips in Fig. 4 specific embodiment 3
The test findings of Fig. 5 specific embodiment 1
The test findings of Fig. 6 specific embodiment 2
The test findings of Fig. 7 specific embodiment 3
Embodiment
Specific embodiment 1
Be installed on the exposure table top being of a size of the length and width size blank egative film more very little than the little 0-1 of exposure desk; Inhale 1 colourless water droplet in four jiaos that wind the film and centre, shown in accompanying drawing 2, wherein the position of four jiaos of drop of liquid is 4 centimetres apart from backsheet edge; Framework is closed and it is inhaled into vacuum; Observe the moisture film diffusion-condition, its test result can judge that thus the tight ness rating of exposure desk is better shown in accompanying drawing 5.
Specific embodiment 2
Be installed on the exposure table top being of a size of the length and width size blank egative film more very little than the little 0-1 of exposure desk; The alcohol of inhaling 1 redness is in four jiaos and centre of lower master film, and shown in accompanying drawing 3, wherein four jiaos of positions of dripping alcohol are 5 centimetres apart from backsheet edge; Framework is closed and it is inhaled into vacuum; Observe alcohol film diffusion-condition, its test result can judge that thus the tight ness rating of exposure desk is bad shown in accompanying drawing 6.
Specific embodiment 3
Be installed on the exposure table top being of a size of the length and width size blank egative film more very little than the little 0-1 of exposure desk; The water droplet of inhaling 5 greens is in four jiaos that wind the film and centre, and shown in accompanying drawing 4, wherein four jiaos of positions of dripping are 10 centimetres apart from backsheet edge; Framework is closed and it is inhaled into vacuum; Observe the moisture film diffusion-condition, its test result can judge that thus the tight ness rating of exposure desk is better shown in accompanying drawing 7.
Claims (3)
1. the method for testing of an exposure machine exposure desk adaptation is characterized in that:
A will be of a size of the length and width size blank egative film more very little than the little 0-1 of exposure desk and be installed on the exposure table top;
B suction 1-5 drips or alcohol drips four jiaos and centre in egative film;
The c closure frame is also inhaled into vacuum with it;
D observes water or alcohol film diffusion-condition, according to water or alcohol film diffusion-condition, judges whether the framework adaptation is qualified.
2. the method for testing of an exposure machine exposure desk tight ness rating as claimed in claim 1, it is characterized in that four jiaos drip or the position of alcohol apart from backsheet edge for more than or equal to 4 centimetres less than 10 centimetres.
3. the method for testing of an exposure machine exposure desk tight ness rating as claimed in claim 1 is characterized in that water or alcohol are colourless or coloured.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012100559280A CN102607772A (en) | 2012-03-06 | 2012-03-06 | Testing method for marginal adaptation of exposure table of exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012100559280A CN102607772A (en) | 2012-03-06 | 2012-03-06 | Testing method for marginal adaptation of exposure table of exposure machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102607772A true CN102607772A (en) | 2012-07-25 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012100559280A Pending CN102607772A (en) | 2012-03-06 | 2012-03-06 | Testing method for marginal adaptation of exposure table of exposure machine |
Country Status (1)
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| CN (1) | CN102607772A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2616344C1 (en) * | 2016-04-18 | 2017-04-14 | Игорь Владимирович Удод | Method of vacuum frame producing and vacuum frame obtained in this way |
| CN107295749A (en) * | 2017-07-12 | 2017-10-24 | 奥士康精密电路（惠州）有限公司 | A kind of inclined management-control method in pcb board hole |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1469295A2 (en) * | 1997-05-26 | 2004-10-20 | Martin Lehmann | Method and apparatus for leak testing |
| CN2932352Y (en) * | 2006-05-17 | 2007-08-08 | 山东新华医疗器械股份有限公司 | Vacuum test pattern plate |
| JP2009109553A (en) * | 2007-10-26 | 2009-05-21 | Adtec Engineeng Co Ltd | Exposure apparatus and correcting device for substrate |
| CN201828768U (en) * | 2010-06-04 | 2011-05-11 | 志圣科技（广州）有限公司 | Platform device of exposure machine |
-
2012
- 2012-03-06 CN CN2012100559280A patent/CN102607772A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1469295A2 (en) * | 1997-05-26 | 2004-10-20 | Martin Lehmann | Method and apparatus for leak testing |
| CN2932352Y (en) * | 2006-05-17 | 2007-08-08 | 山东新华医疗器械股份有限公司 | Vacuum test pattern plate |
| JP2009109553A (en) * | 2007-10-26 | 2009-05-21 | Adtec Engineeng Co Ltd | Exposure apparatus and correcting device for substrate |
| CN201828768U (en) * | 2010-06-04 | 2011-05-11 | 志圣科技（广州）有限公司 | Platform device of exposure machine |
Non-Patent Citations (1)
| Title |
|---|
| 吴琼: "曝光机双玻璃晒架及其真空系统的设计", 《电子工业专用设备》 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2616344C1 (en) * | 2016-04-18 | 2017-04-14 | Игорь Владимирович Удод | Method of vacuum frame producing and vacuum frame obtained in this way |
| CN107295749A (en) * | 2017-07-12 | 2017-10-24 | 奥士康精密电路（惠州）有限公司 | A kind of inclined management-control method in pcb board hole |
| CN107295749B (en) * | 2017-07-12 | 2019-09-17 | 奥士康精密电路（惠州）有限公司 | A kind of inclined management-control method in pcb board hole |
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Application publication date: 20120725 |