CN102540297B - Preparation method of micron-sized anti-reflection metal grating - Google Patents
Preparation method of micron-sized anti-reflection metal grating Download PDFInfo
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- 239000002184 metal Substances 0.000 title claims abstract description 33
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 33
- 238000002360 preparation method Methods 0.000 title claims description 4
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 18
- 238000000576 coating method Methods 0.000 claims abstract description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000011248 coating agent Substances 0.000 claims abstract description 8
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 5
- 238000004140 cleaning Methods 0.000 claims abstract description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- 239000000243 solution Substances 0.000 claims description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- 229960000583 acetic acid Drugs 0.000 claims description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- 239000012362 glacial acetic acid Substances 0.000 claims description 3
- 239000011259 mixed solution Substances 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 13
- 238000005516 engineering process Methods 0.000 abstract description 5
- 239000003085 diluting agent Substances 0.000 abstract description 3
- 238000002310 reflectometry Methods 0.000 abstract description 3
- 238000001035 drying Methods 0.000 abstract description 2
- 230000003667 anti-reflective effect Effects 0.000 abstract 1
- 238000001914 filtration Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- 238000002834 transmittance Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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Abstract
微米级抗反射金属光栅的制备方法，属于红外光学领域。本发明包括下述步骤：1)磁控溅射镀膜；2)在膜正面涂覆光刻正胶；3)烘烤去除光刻胶的稀释剂；4)曝光，然后烘烤使图形固定；5)腐蚀多余的金属；6)使用丙酮溶解光刻胶；7)清洗光栅后干燥。本发明技术制备出的金属光栅在红外波段反射率比原有金属反射率降低50％左右，且具有类似滤波的特性。
The invention discloses a method for preparing a micron-level anti-reflective metal grating, which belongs to the field of infrared optics. The invention comprises the following steps: 1) magnetron sputtering coating; 2) coating a positive photoresist on the front of the film; 3) baking to remove the diluent of the photoresist; 4) exposing, and then baking to fix the pattern; 5) corroding the excess metal; 6) using acetone to dissolve the photoresist; 7) cleaning the grating and drying. The reflectivity of the metal grating prepared by the technology of the invention is about 50% lower than that of the original metal in the infrared band, and has similar filtering characteristics.
Description
技术领域 technical field
本发明属于红外光学领域，特别涉及抗反射金属光栅的制作方法。The invention belongs to the field of infrared optics, in particular to a manufacturing method of an anti-reflection metal grating.
背景技术 Background technique
光栅是大量等宽等间距的平行狭缝或刻痕构成的光学元件，大体上分为反射光栅和透射光栅两种。由于金属光栅的衍射等特性，使其在红外波段的反射率大大低于金属，透过率增加，为制备红外光学器件提供了条件。A grating is an optical element composed of a large number of equal-width and equal-spaced parallel slits or notches, which are generally divided into reflection gratings and transmission gratings. Due to the diffraction and other characteristics of the metal grating, its reflectivity in the infrared band is much lower than that of metal, and the transmittance increases, which provides conditions for the preparation of infrared optical devices.
专利200810023911提供了一种基于纳米压印技术制备的自支撑透射金属光栅的方法，光栅无衬底支撑，周期为1～40微米。构成光栅的金属是金，金属线条强度大。其制备过程主要包括：在硅基片的背面涂光刻负胶，采用曝光显影工艺在负胶上形成与光通口径大小一致的窗口，露出基片；在基片的正面采用镀金属薄膜，并涂纳米压印胶的传递层和紫外光固化压印层，采用纳米压印技术，把具有光栅图案的模板压入纳米压印胶中；通过反应离子刻蚀工艺把紫外光固化压印层的光栅结构传递到传递层，光栅结构传递至露出的金属薄膜；以金属薄膜作为阳极，有光栅图案的基片为阴极，用电化学镀膜工艺，在光栅空白处露出金属薄膜的部分沉积光栅金属；溶解传递层，即在金属薄膜上形成光栅；基片背面腐蚀除去光刻胶未覆盖的光通窗口处的基片材料，形成光通窗口，使金属结构镂空。利用该方法制备的光栅优点在于没有衬底，栅条与空白处的反射率差别大，但缺点是制作方法复杂，且光栅面积太小。Patent 200810023911 provides a method of self-supporting transmission metal grating based on nanoimprinting technology. The grating has no substrate support and the period is 1-40 microns. The metal that makes up the grating is gold, and the metal lines are strong. The preparation process mainly includes: coating a photoresist negative resist on the back of the silicon substrate, forming a window on the negative resist that is the same size as the luminous aperture by exposure and development technology, exposing the substrate; using a metal-coated film on the front of the substrate, The transfer layer and the UV-cured imprint layer coated with nano-imprinting adhesive, using nano-imprinting technology, press the template with the grating pattern into the nano-imprinting adhesive; The grating structure is transferred to the transfer layer, and the grating structure is transferred to the exposed metal film; the metal film is used as the anode, and the substrate with the grating pattern is used as the cathode, and the grating metal is deposited on the part of the metal film exposed in the blank space of the grating by electrochemical coating process. Dissolving the transmission layer, that is, forming a grating on the metal film; etching the back of the substrate to remove the substrate material at the light passage window not covered by the photoresist, forming a light passage window, and hollowing out the metal structure. The advantage of the grating prepared by this method is that there is no substrate, and the reflectivity difference between the grid strip and the blank space is large, but the disadvantage is that the manufacturing method is complicated and the grating area is too small.
专利200410009488公开了一种反射式金属光栅的制作方法，其特征在于用光化学方法直接对精密加工的金属基板进行腐蚀。其制作步骤为：对金属基板光栅面进行精密加工，然后在精密加工后的表面上涂上均匀厚度的光刻胶，前烘去除光刻胶中的稀释剂后在基板上放置光栅模板并进行曝光，再用显影液进行离心显影，烘烤后在FeCl3中腐蚀成型，最后清洁光栅表面。用此方法制作的反射式金属光栅结构简单、成本低、强度高、线条牢固度好。其缺点在于光栅槽深不可调节，周期大，光栅条纹宽。Patent 200410009488 discloses a method for manufacturing a reflective metal grating, which is characterized in that the precision-processed metal substrate is directly corroded by a photochemical method. The production steps are as follows: Precisely process the grating surface of the metal substrate, and then coat the photoresist with a uniform thickness on the surface after the precision processing, pre-baked to remove the diluent in the photoresist, and then placed the grating template on the substrate and carried out After exposure, centrifugal development is carried out with a developer, after baking, it is etched in FeCl 3 to shape, and finally the surface of the grating is cleaned. The reflective metal grating made by this method has the advantages of simple structure, low cost, high strength and good line firmness. Its disadvantages are that the groove depth of the grating cannot be adjusted, the period is large, and the grating stripes are wide.
发明内容 Contents of the invention
本发明所要解决的技术问题是，提供一种简单方便的制作具有良好抗反射性能的光栅的方法。The technical problem to be solved by the present invention is to provide a simple and convenient method for making a grating with good anti-reflection performance.
本发明解决所述技术问题采用的技术方案是，微米级抗反射金属光栅的制备方法，其特征在于，包括下述步骤：The technical solution adopted by the present invention to solve the technical problem is a method for preparing a micron-scale anti-reflection metal grating, which is characterized in that it includes the following steps:
1)磁控溅射镀膜；1) Magnetron sputtering coating;
2)在膜正面涂覆光刻正胶；2) Coating photoresist positive resist on the front side of the film;
3)烘烤去除光刻胶的稀释剂；3) Baking removes the thinner of the photoresist;
4)曝光，然后烘烤使图形固定；4) exposure, then bake to fix the graphics;
5)腐蚀多余的金属；5) Corrosion of excess metal;
6)使用丙酮溶解光刻胶；6) using acetone to dissolve the photoresist;
7)清洗光栅后干燥。7) Dry the grating after cleaning.
步骤4)中，采用双面对照曝光机曝光6秒，烘烤30分钟；In step 4), use a double-sided contrast exposure machine to expose for 6 seconds and bake for 30 minutes;
步骤5)中，以摩尔比1∶1∶6的比例调配硝酸、磷酸和冰醋酸的混合溶液，用该溶液腐蚀多余的金属。In step 5), a mixed solution of nitric acid, phosphoric acid and glacial acetic acid is prepared at a molar ratio of 1:1:6, and the excess metal is corroded with the solution.
本发明技术制备出的金属光栅在红外波段反射率比原有金属反射率降低50％左右，且具有类似滤波的特性。The reflectance of the metal grating prepared by the technology of the invention is about 50% lower than that of the original metal in the infrared band, and has similar filter characteristics.
本发明与现有技术相比，优点在于：Compared with the prior art, the present invention has the advantages of:
(1)金属光栅采用溅射镀膜，光栅厚度只有纳米级，且由于溅射时间和膜厚成正比，故可以轻易的通过溅射时间来控制光栅厚度；(1) The metal grating is coated by sputtering, the thickness of the grating is only nanometers, and since the sputtering time is proportional to the film thickness, the thickness of the grating can be easily controlled by the sputtering time;
(2)制作光栅的工艺简单，只需一次曝光腐蚀，直接成型；(2) The process of making the grating is simple, only one exposure and corrosion is required, and it can be formed directly;
(3)光栅的基片为K9玻璃，腐蚀和显影需要的材料都是普通化学药品，制作成本低；(3) The substrate of the grating is K9 glass, the materials required for corrosion and development are common chemicals, and the production cost is low;
(4)光栅精度高，线条直，周期和缝宽都可以通过掩膜板图形直接控制。(4) The grating has high precision, straight lines, period and slit width can be directly controlled by the mask pattern.
附图说明Description of drawings
图1为本发明的结构示意图。图中1为金属条，2为玻璃基片。Fig. 1 is a structural schematic diagram of the present invention. In the figure, 1 is a metal strip, and 2 is a glass substrate.
具体实施方式 Detailed ways
磁控溅射是为了在低气压下进行高速溅射，必须有效地提高气体的离化率。通过在靶阴极表面引入磁场，利用磁场对带电粒子的约束来提高等离子体密度以增加溅射率的方法。磁控溅射本身系成熟的工艺，本发明采用该工艺作为光栅镀膜在膜正面涂覆光刻正胶，烘烤15分钟去除光刻胶的稀释剂；采用双面对照曝光机曝光6秒，烘烤30分钟使图形固定；以摩尔比1∶1∶6的比例调配硝酸、磷酸和冰醋酸的混合溶液，并用该溶液腐蚀多余的金属；使用丙酮溶解光刻胶，用去离子水清洗光栅后甩干，得到样品。Magnetron sputtering is to perform high-speed sputtering under low pressure, and the ionization rate of the gas must be effectively increased. By introducing a magnetic field on the surface of the target cathode, using the magnetic field to confine the charged particles to increase the plasma density and increase the sputtering rate. Magnetron sputtering itself is a mature process, and the present invention adopts this process as grating coating to coat photoresist positive resist on the front side of the film, bake for 15 minutes to remove the diluent of photoresist; adopt double-sided contrast exposure machine to expose for 6 seconds, Bake for 30 minutes to fix the pattern; prepare a mixed solution of nitric acid, phosphoric acid and glacial acetic acid at a molar ratio of 1:1:6, and use the solution to etch excess metal; use acetone to dissolve the photoresist and clean the grating with deionized water After drying, the samples were obtained.
光栅的金属厚度可以依据需求自行设定。说明书已经充分说明了本发明的原理及必要技术细节，普通技术人员能够依据说明书加以实施，故对于更具体的技术细节不再赘述。The metal thickness of the grating can be set according to the needs. The description has fully explained the principle and necessary technical details of the present invention, and those of ordinary skill can implement it according to the description, so more specific technical details will not be repeated.
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| CN105296942A (en) * | 2015-12-04 | 2016-02-03 | 北极光电(深圳)有限公司 | Method adopting photoetching mask lifting method for achieving optical coating |
| CN107219723B (en) * | 2017-08-02 | 2021-01-22 | 京东方科技集团股份有限公司 | Manufacturing method of metal grating, metal grating and display device |
| CN108761599A (en) * | 2018-04-09 | 2018-11-06 | 复旦大学 | A kind of electrochemical working electrode and preparation method thereof being carved with metal nano grating |
| TWI742555B (en) * | 2019-07-22 | 2021-10-11 | 神亞科技股份有限公司 | Imaging system |
| CN117348136A (en) * | 2023-11-21 | 2024-01-05 | 中国科学院光电技术研究所 | Off-axis illumination grating and preparation method thereof, detachable off-axis illumination photolithography mask |
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