CN102534799B - Preparation method of low-dimensional nano-structure sulfur group compounds - Google Patents
Preparation method of low-dimensional nano-structure sulfur group compounds Download PDFInfo
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Abstract
本发明涉及一种低维纳米结构的硫族化合物的制备方法,以锑、铅、铟、锌或银等盐,及硒、碲和硫的无机化合物物为原料,以乙二醇或丙三醇等为溶剂制备前驱体溶液,以联氨或乙二胺等为还原剂,在180℃至280℃条件下,使最初与前驱体溶液隔离的液态还原剂蒸发为气体分子,逐渐融入前驱体溶液中将前驱体溶液中的溶质还原并经热处理形成目标产物。与现有技术相比,本发明物相准确,纯度高,产率接近100%。整个工艺使用的原料便宜易得,反应过程中避免使用任何模板和表面活性剂及络合剂,工艺简单,容易实现规模化生产,可用于微型热电、光电器件、相变存储器件的微型化和集成化。
The invention relates to a preparation method of a low-dimensional nanostructured chalcogenide compound, which uses salts of antimony, lead, indium, zinc or silver, and inorganic compounds of selenium, tellurium and sulfur as raw materials, and ethylene glycol or glycerine Alcohol is used as solvent to prepare precursor solution, using hydrazine or ethylenediamine as reducing agent, under the condition of 180°C to 280°C, the liquid reducing agent initially isolated from the precursor solution is evaporated into gas molecules, and gradually integrated into the precursor In the solution, the solute in the precursor solution is reduced and heat-treated to form the target product. Compared with the prior art, the invention has accurate phase, high purity and close to 100% yield. The raw materials used in the whole process are cheap and easy to obtain, and any template, surfactant and complexing agent are avoided in the reaction process. The process is simple, and it is easy to realize large-scale production. It can be used for the miniaturization and Integrated.
Description
技术领域 technical field
本发明涉及材料领域,尤其是涉及一种低维纳米结构的硫族化合物的制备方法。The invention relates to the field of materials, in particular to a preparation method of a chalcogenide compound with a low-dimensional nanostructure.
背景技术 Background technique
系列硫族化合物包括(Bi,Sb)2(Se,Te,S)3、PbTe、In2Te3、Ag2Te或ZnTe等以及它们的多组元合金是研究较早也较为重要的一类半导体材料,近年来这类材料在热电转换、微电子、光电子以及激光技术等高新技术领域显示出巨大的应用潜力。在Moore定律的推动下芯片的集成度越来越高,运行速度越来越快,其散热问题已经成为制约IC设计和微电子行业进一步发展的重要因素,从而提出了器件的微型化和功能集成化策略,希望将热电元件与微电子和光电器件集成在一个芯片上,以实现芯片的快速散热。热电制冷要求材料在室温和低温有高的制冷效率,传统的热电块材已不能满足这种需求。上述硫族化合物材料的低维纳米结构如量子阱、超晶格、量子线、量子点极有可能再度大幅提高材料的热电性能。A series of chalcogenides including (Bi, Sb) 2 (Se, Te, S) 3 , PbTe, In 2 Te 3 , Ag 2 Te or ZnTe, etc. and their multi-component alloys are an earlier and more important class of research Semiconductor materials, in recent years, these materials have shown great application potential in high-tech fields such as thermoelectric conversion, microelectronics, optoelectronics and laser technology. Driven by Moore's law, the integration of chips is getting higher and higher, and the running speed is getting faster and faster. The heat dissipation problem has become an important factor restricting the further development of IC design and the microelectronics industry, thus proposing the miniaturization and functional integration of devices. It is hoped that thermoelectric elements, microelectronics and optoelectronic devices will be integrated on one chip to achieve rapid heat dissipation of the chip. Thermoelectric refrigeration requires materials to have high cooling efficiency at room temperature and low temperature, and traditional thermoelectric bulk materials can no longer meet this demand. The low-dimensional nanostructures of the above-mentioned chalcogenide materials such as quantum wells, superlattices, quantum wires, and quantum dots are very likely to greatly improve the thermoelectric properties of the materials again.
目前,硫族化合物低维纳米结构通常采用化学气相沉积(CVD)、物理气相沉积(PVD)、激光刻蚀法、电弧放电法、电化学沉积、水热/溶剂热等方法制备,气相沉积方法通常需要高温,激光刻蚀等由上而下的物理方法成本较高;电化学沉积制备硫族化合物纳米一维机构的缺点在于必须使用导电基片及模板,适用范围较窄,且一维纳米产物的表面性质受到模板质量的影响;而水热/溶剂热等湿化学方法则通常需引入表面活性剂和络合剂等物质,且需后续的清洗和干燥等步骤。At present, low-dimensional nanostructures of chalcogenides are usually prepared by chemical vapor deposition (CVD), physical vapor deposition (PVD), laser etching, arc discharge, electrochemical deposition, hydrothermal/solvothermal and other methods. Usually high temperature is required, and the cost of top-down physical methods such as laser etching is relatively high; the disadvantage of preparing chalcogenide nano-one-dimensional structures by electrochemical deposition is that conductive substrates and templates must be used, and the scope of application is narrow, and one-dimensional nanostructures The surface properties of the product are affected by the quality of the template; while wet chemical methods such as hydrothermal/solvothermal methods usually need to introduce substances such as surfactants and complexing agents, and subsequent steps such as cleaning and drying are required.
发明内容 Contents of the invention
本发明的目的就是为了克服上述现有技术存在的缺陷而提供一种原料易得、成本低廉、操作简便可行的方法,成分可控的低维纳米结构的硫族化合物的制备方法。The object of the present invention is to provide a method for preparing chalcogenides with low-dimensional nanostructure with controllable composition, which has easy-to-obtain raw materials, low cost, simple and feasible operation, in order to overcome the above-mentioned defects in the prior art.
本发明的目的可以通过以下技术方案来实现:The purpose of the present invention can be achieved through the following technical solutions:
一种低维纳米结构的硫族化合物的制备方法,其特征在于,该方法包括以下步骤:A method for preparing chalcogenides with a low-dimensional nanostructure, characterized in that the method comprises the following steps:
(1)驱体溶液的配置:将硫族元素化合物溶于溶剂中,制得0.01~0.1mol/L的硫族元素的酸溶液,另将锑、铅、铟、锌或银的盐溶于溶剂中,制备0.01~0.1mol/L的锑、铅、铟、锌或银盐溶液;将上述两种溶液通过超声分散、加热、滴加有机酸或无机酸调节酸碱度至PH=2-7和磁力搅拌等手段使其充分溶解,直至得到均匀稳定的前驱体溶液,即制成均匀稳定的前驱体溶液;(1) Configuration of the flooding solution: dissolve the chalcogen compound in the solvent to obtain an acid solution of 0.01-0.1mol/L chalcogen, and dissolve the salt of antimony, lead, indium, zinc or silver in In the solvent, prepare 0.01~0.1mol/L antimony, lead, indium, zinc or silver salt solution; the above two solutions are dispersed by ultrasonic, heated, and dropwise added organic acid or inorganic acid to adjust the pH to PH=2-7 and Magnetic stirring and other means to fully dissolve until a uniform and stable precursor solution is obtained, that is, a uniform and stable precursor solution is made;
(2)共还原处理:将步骤(1)得到的前驱体溶液承载在基片上或坩埚内,然后将其置于密封还原装置中,控制装置的温度为室温至180温度条件下,采用还原性气体对前驱体溶液进行共还原10~30分钟,密封还原装置中与前驱体溶液隔离的液体还原剂被加热蒸发,以气体分子的形式逐渐融入前驱体溶液中参与反应,将含锑、铅、铟、锌或银的盐以及含硒、碲和硫的化合物还原成相应的活性单质原子,这些活性单质原子结合形成目标硫族化合物结晶程度较低的低维纳米结构;(2) Co-reduction treatment: load the precursor solution obtained in step (1) on the substrate or in the crucible, and then place it in a sealed reduction device. The temperature of the control device is from room temperature to 180 °C. The gas reduces the precursor solution for 10 to 30 minutes. The liquid reducing agent isolated from the precursor solution in the sealed reduction device is heated and evaporated, and gradually melts into the precursor solution in the form of gas molecules to participate in the reaction. Antimony, lead, Salts of indium, zinc, or silver, and compounds containing selenium, tellurium, and sulfur are reduced to corresponding active elemental atoms, which combine to form low-dimensional nanostructures with less crystallinity of the target chalcogenide;
(3)热处理:在还原性气体的气氛下,对步骤(2)得到的结晶程度较低的硫族化合物低维纳米结构在180℃~280℃条件下恒温生长0.5~12小时,在降温过程中,反应容器的冷缩效应可使前驱体溶液中的溶剂以气体形式从还原反应装置中释放出去,从而仅有干燥的硫族化合物低维纳米产物留在基片上或坩埚中得到的产物均匀沉积在基片上或坩埚内,即为产品。(3) Heat treatment: under the atmosphere of reducing gas, the chalcogenide low-dimensional nanostructure with low crystallization degree obtained in step (2) is grown at a constant temperature of 180° C. to 280° C. for 0.5 to 12 hours. In the process, the cold shrinkage effect of the reaction vessel can make the solvent in the precursor solution be released from the reduction reaction device in the form of gas, so that only the dry chalcogenide low-dimensional nano-products remain on the substrate or in the crucible to obtain uniform products. Deposited on a substrate or in a crucible, it is the product.
步骤(1)中所述的硫族化合物为硒、碲及硫的氧化物或酸或含硫有机物中的一种。The chalcogen compound described in step (1) is one of selenium, tellurium and sulfur oxides or acids or sulfur-containing organic compounds.
步骤(1)中所述的锑、铅、铟、锌或银的盐为锑、铅、铟、锌或银的硝酸盐、醋酸盐、氯化盐或金属醇盐中的一种。The salt of antimony, lead, indium, zinc or silver described in step (1) is one of nitrate, acetate, chloride or metal alkoxide of antimony, lead, indium, zinc or silver.
步骤(1)中所述的溶剂选自乙二醇、丙三醇、去离子水、无水乙醇、苯、甲苯或四氯化碳中的一种或几种。The solvent described in step (1) is selected from one or more of ethylene glycol, glycerol, deionized water, absolute ethanol, benzene, toluene or carbon tetrachloride.
步骤(1)中所述的前驱体溶液中各元素的摩尔比选自Sb∶Te为2∶3、Sb∶Se为2∶3、Sb∶S为2∶3、Pb∶Te为1∶1、In∶Te为2∶3、Ag∶Te为2∶1或Zn∶Te为1∶1中的一种或几种。The molar ratio of each element in the precursor solution described in step (1) is selected from Sb: Te is 2: 3, Sb: Se is 2: 3, Sb: S is 2: 3, Pb: Te is 1: 1 , In:Te ratio of 2:3, Ag:Te ratio of 2:1 or Zn:Te ratio of 1:1.
所述的基片为单晶硅、石英玻璃、蓝宝石、普通玻璃、陶瓷或有机衬底材料,大小与所用容器匹配。The substrate is single crystal silicon, quartz glass, sapphire, common glass, ceramics or organic substrate material, and its size matches the container used.
所述的坩埚为陶瓷坩埚、普通坩埚或石英玻璃坩埚,大小与所用容器匹配。The crucible is a ceramic crucible, an ordinary crucible or a quartz glass crucible, and its size matches the container used.
所述的还原性气体为N2H4、NH3、C2N2H8、H2S或CH2N2S。The reducing gas is N 2 H 4 , NH 3 , C 2 N 2 H 8 , H 2 S or CH 2 N 2 S.
所述的密封还原装置由聚四氟乙烯内衬及不锈钢或铜包套构成,所述的聚四氟乙烯内衬内置有聚四氟乙烯支柱作为基片的承载平台,顶部设置聚四氟乙烯密封顶盖,所述的不锈钢或铜包套设在聚四氟乙烯内衬外部,将聚四氟乙烯内衬密封在内。The sealing recovery device is composed of a polytetrafluoroethylene lining and a stainless steel or copper sheath, the polytetrafluoroethylene lining is built with a polytetrafluoroethylene pillar as a bearing platform for the substrate, and the top is provided with a polytetrafluoroethylene Sealing the top cover, the stainless steel or copper sheath is arranged outside the polytetrafluoroethylene lining to seal the polytetrafluoroethylene lining inside.
与现有技术相比,本发明利用液相化学法制备硫族化合物低维纳米机构的方法,其原料便宜易得,工艺简单,成分可控。可以实现微型热电、光电器件的集成化,从而促进热电制冷及微电子、光电子、通讯、激光、超导等领域的发展,进一步说,通过液相化学法制备硫族化合物低维纳米机构的方法首次以无机化合物为原料,用气体还原剂逐渐被溶解并扩散进入前驱体溶液中进行共还原,并诱导形成硫族化合物低维纳米结构。采用此方法还可以原位形成由硫族化合物低维纳米结构组装的纳米结构膜,形貌和厚度可控。这类纳米结构膜搭建起连接纳米尺度量子效应与宏观易测量易操作应用的桥梁,因其集高性能、高能量密度和高换能速度于一身,将可能在微电热系统、片上热化学和微机电系统等领域具有潜在的应用前景。Compared with the prior art, the present invention utilizes the liquid-phase chemical method to prepare the chalcogenide low-dimensional nanostructure, and the raw materials are cheap and easy to obtain, the process is simple, and the composition is controllable. It can realize the integration of micro-thermoelectric and optoelectronic devices, thereby promoting the development of thermoelectric refrigeration and microelectronics, optoelectronics, communications, lasers, superconductivity and other fields. Furthermore, the method of preparing low-dimensional nanostructures of chalcogenides by liquid phase chemistry For the first time, inorganic compounds are used as raw materials, and the gas reducing agent is gradually dissolved and diffused into the precursor solution for co-reduction, and induces the formation of low-dimensional nanostructures of chalcogenides. This method can also form nanostructured films assembled from low-dimensional chalcogenide nanostructures in situ, with controllable morphology and thickness. This kind of nanostructured film builds a bridge between nanoscale quantum effects and macroscopic easy-to-measure and easy-to-operate applications. Because of its combination of high performance, high energy density and high energy conversion speed, it will be possible in micro-electrothermal systems, on-chip thermochemistry and Micro-electro-mechanical systems and other fields have potential application prospects.
附图说明 Description of drawings
图1为采用本发明合成硒化锑纳米线的X-射线衍射图谱;Fig. 1 is the X-ray diffraction pattern that adopts the present invention to synthesize antimony selenide nanowire;
图2为采用本发明合成碲化锑纳米线的X-射线衍射图谱;Fig. 2 is the X-ray diffraction pattern that adopts the present invention to synthesize antimony telluride nanowire;
图3为采用本发明合成碲硒锑(Sb2Se2Te)三元合金纳米低维纳米结构的X-射线衍射图谱;Fig. 3 is the X-ray diffraction spectrum of the nano low-dimensional nanostructure of the synthetic tellurium selenium antimony (Sb 2 Se 2 Te) ternary alloy of the present invention;
图4为采用本发明经200℃热处理得到的硒化锑纳米线的扫描电镜图片;Fig. 4 is a scanning electron microscope picture of antimony selenide nanowires obtained by heat treatment at 200°C in the present invention;
图5为采用本发明经240℃热处理得到的硒化锑纳米线的扫描电镜图片;Figure 5 is a scanning electron microscope picture of antimony selenide nanowires obtained by heat treatment at 240°C in the present invention;
图6为采用本发明经280℃热处理得到的硒化锑纳米线的扫描电镜图片;Fig. 6 is a scanning electron microscope picture of antimony selenide nanowires obtained by heat treatment at 280°C in the present invention;
图7为采用本发明合成硒化锑纳米六方片的扫描电镜图片;Fig. 7 is the scanning electron microscope picture that adopts the present invention to synthesize antimony selenide nano-hexagonal sheet;
图8为采用本发明合成碲化锑纳米六方片的扫描电镜图片;Fig. 8 is the scanning electron microscope picture of adopting the present invention to synthesize antimony telluride nano-hexagonal sheet;
图9为采用本发明合成硫化锑纳米带的扫描电镜图片;Fig. 9 is the scanning electron microscope picture that adopts the present invention to synthesize antimony sulfide nanobelt;
图10为采用本发明合成碲化铅纳米线的扫描电镜图片;Fig. 10 is a scanning electron microscope picture of a lead telluride nanowire synthesized by the present invention;
图11为采用本发明合成碲化铟纳米线编织而成的纳米结构膜的扫描电镜图片;Fig. 11 is a scanning electron microscope picture of a nanostructured film woven from indium telluride nanowires synthesized by the present invention;
图12为采用本发明合成碲化锌纳米线的扫描电镜图片;Figure 12 is a scanning electron microscope picture of zinc telluride nanowires synthesized by the present invention;
图13为采用本发明合成碲化银纳米线的扫描电镜图片;Figure 13 is a scanning electron microscope picture of silver telluride nanowires synthesized by the present invention;
图14为采用本发明合成碲硒锑三元合金低维纳米结构的扫描电镜图片。Fig. 14 is a scanning electron microscope picture of a low-dimensional nanostructure of a tellurium-selenide-antimony ternary alloy synthesized by the present invention.
具体实施方式 Detailed ways
下面结合附图和具体实施例对本发明进行详细说明。The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.
实施例1Example 1
200℃合成硒化锑纳米短棒Synthesis of Antimony Selenide Nanorods at 200℃
1配料1 ingredient
(1)0.2mol/LH2SeO3溶液的配置:0.002mol的SeO2溶于乙二醇,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.2mol/L的H2SeO3溶液。(1) Configuration of 0.2mol/L H 2 SeO 3 solution: Dissolve 0.002mol of SeO 2 in ethylene glycol, set the volume to 10ml solution, put in stirring magnet and stir to make H 2 SeO with a concentration of 0.2mol/L 3 solutions.
(2)0.1mol/LSb2(OCH2CH2O)3溶液的配置:0.001mol的Sb2(OCH2CH2O)3溶于乙二醇,加入0.4ml硝酸,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的Sb2(OCH2CH2O)3溶液。(2) Configuration of 0.1mol/LSb 2 (OCH 2 CH 2 O) 3 solution: dissolve 0.001mol of Sb 2 (OCH 2 CH 2 O) 3 in ethylene glycol, add 0.4ml of nitric acid, and dilute to 10ml of solution, Stir with a stirring magnet to prepare a Sb 2 (OCH 2 CH 2 O) 3 solution with a concentration of 0.1 mol/L.
(3)Se+Sb混合溶液的配置:取12ml的0.2mol/L的H2SeO3溶液和8ml的0.1mol/L的Sb2(OCH2CH2O)3溶液,混合,持续搅拌30分钟,制成产物为Sb2Se3按化学计量比配比的Se+Sb前驱体混合溶液;备用。(3) Configuration of Se+Sb mixed solution: Take 12ml of 0.2mol/L H 2 SeO 3 solution and 8ml of 0.1mol/L Sb 2 (OCH 2 CH 2 O) 3 solution, mix and keep stirring for 30 minutes , and the product is a mixed solution of Se+Sb precursors in a stoichiometric ratio of Sb 2 Se 3 ; set aside.
2共还原反应2 co-reduction reaction
将承载前驱体溶液的基片置入反应装置的聚四氟乙烯柱状平台上,注射1ml85vol%的联胺于聚四氟乙烯容器底部,将反应容器置于不锈钢或铜包套中,密封。缓慢升温至180℃,反应10分钟。Place the substrate carrying the precursor solution on the polytetrafluoroethylene column platform of the reaction device, inject 1ml of 85vol% hydrazine into the bottom of the polytetrafluoroethylene container, place the reaction container in a stainless steel or copper sheath, and seal it. Slowly raise the temperature to 180°C and react for 10 minutes.
3热处理3 heat treatment
将容器继续升温至200℃,保温12小时,随炉冷却,制得大量堆积在玻璃基片上的直径0.5~1微米,长5~10微米的一维纳米短棒,合成的硒化锑纳米线的X-射线衍射图谱如图1所示,热处理得到的硒化锑纳米线的扫描电镜图片如图4所示。Continue to heat up the container to 200°C, keep it warm for 12 hours, and cool it with the furnace to make a large number of one-dimensional nanorods with a diameter of 0.5-1 micron and a length of 5-10 microns accumulated on the glass substrate, and the synthesized antimony selenide nanowires The X-ray diffraction pattern is shown in Figure 1, and the scanning electron microscope picture of the antimony selenide nanowire obtained by heat treatment is shown in Figure 4.
实施例2Example 2
240℃合成硒化锑纳米线Synthesis of Antimony Selenide Nanowires at 240℃
1配料1 ingredient
(1)0.2mol/LH2SeO3溶液的配置:0.002mol的SeO2溶于乙二醇,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.2mol/L的H2SeO3溶液。(1) Configuration of 0.2mol/L H 2 SeO 3 solution: Dissolve 0.002mol of SeO 2 in ethylene glycol, set the volume to 10ml solution, put in stirring magnet and stir to make H 2 SeO with a concentration of 0.2mol/L 3 solutions.
(2)0.1mol/LSb2(OCH2CH2O)3溶液的配置:0.001mol的Sb2(OCH2CH2O)3(0.423g)溶于乙二醇,加入0.4ml硝酸,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的Sb2(OCH2CH2O)3溶液。(2) Configuration of 0.1mol/LSb 2 (OCH 2 CH 2 O) 3 solution: 0.001mol of Sb 2 (OCH 2 CH 2 O) 3 (0.423g) was dissolved in ethylene glycol, and 0.4ml of nitric acid was added to constant volume to 10ml of the solution, put into a stirring magnet to stir, and make a Sb 2 (OCH 2 CH 2 O) 3 solution with a concentration of 0.1 mol/L.
(3)Se+Sb混合溶液的配置:取12ml的0.2mol/L的H2SeO3溶液和8ml的0.1mol/L的Sb2(OCH2CH2O)3溶液,混合,持续搅拌30分钟,制成产物为Sb2Se3按化学计量比配比的Se+Sb前驱体混合溶液;备用。(3) Configuration of Se+Sb mixed solution: Take 12ml of 0.2mol/L H 2 SeO 3 solution and 8ml of 0.1mol/L Sb 2 (OCH 2 CH 2 O) 3 solution, mix and keep stirring for 30 minutes , and the product is a mixed solution of Se+Sb precursors in a stoichiometric ratio of Sb 2 Se 3 ; set aside.
2共还原反应2 co-reduction reaction
将承载前驱体溶液的基片置入反应装置的聚四氟乙烯柱状平台上,注射1ml85vol%的联胺于聚四氟乙烯容器底部,将反应容器置于高压釜中,密封。缓慢升温至180℃,反应10分钟。Place the substrate carrying the precursor solution on the polytetrafluoroethylene columnar platform of the reaction device, inject 1ml of 85vol% hydrazine into the bottom of the polytetrafluoroethylene container, place the reaction container in an autoclave, and seal it. Slowly raise the temperature to 180°C and react for 10 minutes.
3热处理3 heat treatment
将容器继续升温至240℃,保温12小时,随炉冷却,制得大量分布在玻璃基片上的直径100~500纳米,长度为几十到几百微米的纳米线,热处理得到的硒化锑纳米线的扫描电镜图片如图5所示。Continue to heat up the container to 240°C, keep it warm for 12 hours, and cool it with the furnace to prepare a large number of nanowires with a diameter of 100-500 nanometers and a length of tens to hundreds of microns distributed on the glass substrate. The antimony selenide nanowires obtained by heat treatment The scanning electron microscope picture of the line is shown in Fig. 5.
实施例3Example 3
280℃合成硒化锑纳米线Synthesis of Antimony Selenide Nanowires at 280℃
1配料1 ingredient
(1)0.2mol/LH2SeO3溶液的配置:0.002mol的SeO2(0.222g)溶于乙二醇,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.2mol/L的H2SeO3溶液。(1) Configuration of 0.2mol/LH 2 SeO 3 solution: Dissolve 0.002mol of SeO 2 (0.222g) in ethylene glycol, set the volume to 10ml of solution, put in stirring magnet and stir to make the concentration 0.2mol/L H 2 SeO 3 solution.
(2)0.1mol/LSb2(OCH2CH2O)3溶液的配置:0.001mol的Sb2(OCH2CH2O)3(0.423g)溶于乙二醇,加入0.4ml硝酸,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的Sb2(OCH2CH2O)3溶液。(2) Configuration of 0.1mol/LSb 2 (OCH 2 CH 2 O) 3 solution: 0.001mol of Sb 2 (OCH 2 CH 2 O) 3 (0.423g) was dissolved in ethylene glycol, and 0.4ml of nitric acid was added to constant volume to 10ml of the solution, put into a stirring magnet to stir, and make a Sb 2 (OCH 2 CH 2 O) 3 solution with a concentration of 0.1 mol/L.
(3)Se+Sb混合溶液的配置:取12ml的0.2mol/L的H2SeO3溶液和8ml的0.1mol/L的Sb2(OCH2CH2O)3溶液,混合,持续搅拌30分钟,制成产物为Sb2Se3按化学计量比配比的Se+Sb前驱体混合溶液;备用。(3) Configuration of Se+Sb mixed solution: Take 12ml of 0.2mol/L H 2 SeO 3 solution and 8ml of 0.1mol/L Sb 2 (OCH 2 CH 2 O) 3 solution, mix and keep stirring for 30 minutes , and the product is a mixed solution of Se+Sb precursors in a stoichiometric ratio of Sb 2 Se 3 ; set aside.
2共还原反应2 co-reduction reaction
将承载前驱体溶液的基片置入反应装置的聚四氟乙烯柱状平台上,注射1ml85vol%的联胺于聚四氟乙烯容器底部,将反应容器置于高压釜中,密封。缓慢升温至180℃,反应10分钟。Place the substrate carrying the precursor solution on the polytetrafluoroethylene columnar platform of the reaction device, inject 1ml of 85vol% hydrazine into the bottom of the polytetrafluoroethylene container, place the reaction container in an autoclave, and seal it. Slowly raise the temperature to 180°C and react for 10 minutes.
3热处理3 heat treatment
将容器继续升温至280℃,保温12小时,随炉冷却,制得大量分布在玻璃基片上的直径1微米左右,长达数十微米的纳米柱,热处理得到的硒化锑纳米线的扫描电镜图片如图6所示。Continue to raise the temperature of the container to 280°C, keep it warm for 12 hours, and cool it with the furnace to produce a large number of nanopillars with a diameter of about 1 micron and a length of tens of microns distributed on the glass substrate. The scanning electron microscope of the antimony selenide nanowires obtained by heat treatment The picture is shown in Figure 6.
实施例4Example 4
快速升温条件下,250℃合成硒化锑纳米片Synthesis of antimony selenide nanosheets at 250°C under rapid heating conditions
1配料1 ingredient
(1)0.1mol/LH2SeO3溶液的配置:0.002mol的SeO2(0.222g)溶于乙二醇,定容至20ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的H2SeO3溶液。(1) Configuration of 0.1mol/LH 2 SeO 3 solution: Dissolve 0.002mol of SeO 2 (0.222g) in ethylene glycol, set the volume to 20ml solution, put in stirring magnet and stir to make the concentration 0.1mol/L H 2 SeO 3 solution.
(2)0.05mol/LSb2(OCH2CH2O)3溶液的配置:0.001mol的Sb2(OCH2CH2O)3(0.423g)溶于乙二醇,加入0.4ml硝酸,定容至20ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的Sb2(OCH2CH2O)3溶液。(2) Configuration of 0.05mol/LSb 2 (OCH 2 CH 2 O) 3 solution: 0.001mol of Sb 2 (OCH 2 CH 2 O) 3 (0.423g) was dissolved in ethylene glycol, and 0.4ml of nitric acid was added to constant volume to 20ml of the solution, put into a stirring magnet to stir, and make a Sb 2 (OCH 2 CH 2 O) 3 solution with a concentration of 0.1 mol/L.
(3)Se+Sb混合溶液的配置:取12ml的0.1mol/L的H2SeO3溶液和8ml的0.05mol/L的Sb2(OCH2CH2O)3溶液,混合,持续搅拌30分钟,制成产物为Sb2Se3按化学计量比配比的Se+Sb前驱体混合溶液;备用。(3) Configuration of Se+Sb mixed solution: Take 12ml of 0.1mol/L H 2 SeO 3 solution and 8ml of 0.05mol/L Sb 2 (OCH 2 CH 2 O) 3 solution, mix and keep stirring for 30 minutes , and the product is a mixed solution of Se+Sb precursors in a stoichiometric ratio of Sb 2 Se 3 ; set aside.
2共还原反应2 co-reduction reaction
将承载前驱体溶液的基片置入反应装置的聚四氟乙烯柱状平台上,注射1ml85vol%的联胺于聚四氟乙烯容器底部,将反应容器置于高压釜中,密封。快速升温至180℃,反应10分钟。Place the substrate carrying the precursor solution on the polytetrafluoroethylene columnar platform of the reaction device, inject 1ml of 85vol% hydrazine into the bottom of the polytetrafluoroethylene container, place the reaction container in an autoclave, and seal it. Rapidly raise the temperature to 180°C and react for 10 minutes.
3热处理3 heat treatment
马上置入250℃环境中,保温20分钟,随炉冷却,制得大量分布在玻璃基片上的厚度数十纳米,1微米左右大小的二维纳米六方薄片,扫描电镜图片如图7所示。Immediately placed in an environment of 250°C, kept warm for 20 minutes, and cooled with the furnace, a large number of two-dimensional nanohexagonal sheets with a thickness of tens of nanometers and a size of about 1 micron distributed on the glass substrate were produced. The scanning electron microscope picture is shown in Figure 7.
实施例5Example 5
260℃合成碲化锑纳米片Synthesis of Antimony Telluride Nanosheets at 260℃
1配料1 ingredient
(1)0.2mol/LH2TeO3溶液的配置:0.002mol的TeO2(0.319g)溶于乙二醇,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.2mol/L的H2TeO3溶液。(1) Configuration of 0.2mol/LH 2 TeO 3 solution: Dissolve 0.002mol of TeO 2 (0.319g) in ethylene glycol, set the volume to 10ml solution, put in stirring magnet and stir to make the concentration 0.2mol/L H 2 TeO 3 solution.
(2)0.1mol/LSb2(OCH2CH2O)3溶液的配置:0.001mol的Sb2(OCH2CH2O)3(0.423g)溶于乙二醇,加入0.4ml硝酸,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的Sb2(OCH2CH2O)3溶液。(2) Configuration of 0.1mol/LSb 2 (OCH 2 CH 2 O) 3 solution: 0.001mol of Sb 2 (OCH 2 CH 2 O) 3 (0.423g) was dissolved in ethylene glycol, and 0.4ml of nitric acid was added to constant volume to 10ml of the solution, put into a stirring magnet to stir, and make a Sb 2 (OCH 2 CH 2 O) 3 solution with a concentration of 0.1 mol/L.
(3)Te+Sb混合溶液的配置:取12ml的0.2mol/L的H2TeO3溶液和8ml的0.1mol/L的Sb2(OCH2CH2O)3溶液,混合,持续搅拌30分钟,制成产物为Sb2Te3按化学计量比配比的Te+Sb前驱体混合溶液;备用。(3) Configuration of Te+Sb mixed solution: Take 12ml of 0.2mol/L H 2 TeO 3 solution and 8ml of 0.1mol/L Sb 2 (OCH 2 CH 2 O) 3 solution, mix and keep stirring for 30 minutes , and the product is a Te+Sb precursor mixed solution with a stoichiometric ratio of Sb 2 Te 3 ; set aside.
2共还原反应2 co-reduction reaction
将承载前驱体溶液的基片置入反应装置的聚四氟乙烯柱状平台上,注射1ml85vol%的联胺于聚四氟乙烯容器底部,将反应容器置于高压釜中,密封。缓慢升温至180℃,反应10分钟。Place the substrate carrying the precursor solution on the polytetrafluoroethylene columnar platform of the reaction device, inject 1ml of 85vol% hydrazine into the bottom of the polytetrafluoroethylene container, place the reaction container in an autoclave, and seal it. Slowly raise the temperature to 180°C and react for 10 minutes.
3热处理3 heat treatment
将容器继续升温至260℃,保温10小时,随炉冷却,制得大量分布在玻璃基片上的厚度数十纳米,1微米左右大小的二维纳米六方薄片,X-射线衍射图谱如图2所示,扫描电镜图片如图8所示。Continue to heat up the container to 260°C, keep it warm for 10 hours, and cool it with the furnace to produce a large number of two-dimensional nanohexagonal sheets with a thickness of tens of nanometers and a size of about 1 micron distributed on the glass substrate. The X-ray diffraction pattern is shown in Figure 2 The scanning electron microscope picture is shown in Figure 8.
实施例6Example 6
250℃合成硫化锑纳米带Synthesis of Antimony Sulfide Nanoribbons at 250℃
1配料1 ingredient
(1)0.2mol/CH4N2S溶液的配置:0.002mol的CH4N2S(0.152g)溶于乙二醇,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.2mol/L的CH4N2S溶液。(1) Configuration of 0.2mol/CH 4 N 2 S solution: 0.002mol of CH 4 N 2 S (0.152g) was dissolved in ethylene glycol, and the volume was adjusted to 10ml solution, and stirred with a stirring magnet to make a concentration of 0.2mol/L CH 4 N 2 S solution.
(2)0.1mol/LSb2(OCH2CH2O)3溶液的配置:0.001mol的Sb2(OCH2CH2O)3(0.423g)溶于乙二醇,加入0.4ml硝酸,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的Sb2(OCH2CH2O)3溶液。(2) Configuration of 0.1mol/LSb 2 (OCH 2 CH 2 O) 3 solution: 0.001mol of Sb 2 (OCH 2 CH 2 O) 3 (0.423g) was dissolved in ethylene glycol, and 0.4ml of nitric acid was added to constant volume to 10ml of the solution, put into a stirring magnet to stir, and make a Sb 2 (OCH 2 CH 2 O) 3 solution with a concentration of 0.1 mol/L.
(3)S+Sb混合溶液的配置:取12ml的0.2mol/L的CH4N2S溶液和8ml的0.1mol/L的Sb2(OCH2CH2O)3溶液,混合,持续搅拌30分钟,制成产物为Sb2S3按化学计量比配比的S+Sb前驱体混合溶液;备用。(3) Configuration of S+Sb mixed solution: take 12ml of 0.2mol/L CH 4 N 2 S solution and 8ml of 0.1mol/L Sb 2 (OCH 2 CH 2 O) 3 solution, mix and keep stirring for 30 Minutes, the product is Sb 2 S 3 S+Sb precursor mixed solution with a stoichiometric ratio; set aside.
2共还原反应2 co-reduction reaction
将承载前驱体溶液的基片置入反应装置的聚四氟乙烯柱状平台上,注射1ml85vol%的联胺于聚四氟乙烯容器底部,将反应容器置于高压釜中,密封。缓慢升温至180℃,反应10分钟。Place the substrate carrying the precursor solution on the polytetrafluoroethylene columnar platform of the reaction device, inject 1ml of 85vol% hydrazine into the bottom of the polytetrafluoroethylene container, place the reaction container in an autoclave, and seal it. Slowly raise the temperature to 180°C and react for 10 minutes.
3热处理3 heat treatment
将容器继续升温至250℃,保温10小时,随炉冷却,制得大量分布在玻璃基片上的宽度为数百纳米至1微米,长达数十微米的纳米带,扫描电镜图片如图9所示。Continue to heat up the container to 250°C, keep it warm for 10 hours, and cool with the furnace to produce a large number of nanobelts distributed on the glass substrate with a width of several hundred nanometers to 1 micron and a length of tens of microns. The scanning electron microscope picture is shown in Figure 9. Show.
实施例7Example 7
200℃合成碲化铅纳米线Synthesis of lead telluride nanowires at 200°C
1配料1 ingredient
(1)0.2mol/LH2TeO3溶液的配置:0.002mol的TeO2(0.319g)溶于乙二醇,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.2mol/L的H2TeO3溶液。(1) Configuration of 0.2mol/LH 2 TeO 3 solution: Dissolve 0.002mol of TeO 2 (0.319g) in ethylene glycol, set the volume to 10ml solution, put in stirring magnet and stir to make the concentration 0.2mol/L H 2 TeO 3 solution.
(2)0.2mol/LPb(CH3COO)3溶液的配置:0.002mol的Pb(CH3COO)3·3H2O(0.758g)溶于乙二醇,加入0.4ml硝酸,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的Sb2(OCH2CH2O)3溶液。(2) Configuration of 0.2mol/LPb(CH 3 COO) 3 solution: Dissolve 0.002mol of Pb(CH 3 COO) 3 ·3H 2 O (0.758g) in ethylene glycol, add 0.4ml of nitric acid, and dilute to 10ml solution, put it into a stirring magnet to stir, and make a Sb 2 (OCH 2 CH 2 O) 3 solution with a concentration of 0.1 mol/L.
(3)Te+Pb混合溶液的配置:取10ml的0.2mol/L的H2TeO3溶液和10ml的0.2mol/L的Pb(CH3COO)3溶液,混合,持续搅拌30分钟,制成产物为PbTe按化学计量比配比的Te+Pb前驱体混合溶液;备用。(3) Configuration of Te+Pb mixed solution: Take 10ml of 0.2mol/L H 2 TeO 3 solution and 10ml of 0.2mol/L Pb(CH 3 COO) 3 solution, mix and keep stirring for 30 minutes to prepare The product is a Te+Pb precursor mixed solution of PbTe according to the stoichiometric ratio; it is ready for use.
2共还原反应2 co-reduction reaction
将承载前驱体溶液的基片置入反应装置的聚四氟乙烯柱状平台上,注射1ml85vol%的联胺于聚四氟乙烯容器底部,将反应容器置于高压釜中,密封。缓慢升温至180℃,反应10分钟。Place the substrate carrying the precursor solution on the polytetrafluoroethylene columnar platform of the reaction device, inject 1ml of 85vol% hydrazine into the bottom of the polytetrafluoroethylene container, place the reaction container in an autoclave, and seal it. Slowly raise the temperature to 180°C and react for 10 minutes.
3热处理3 heat treatment
将容器继续升温至200℃,保温12小时,随炉冷却,制得大量分布在玻璃基片上的直径100~200纳米,长3~6微米的纳米线,扫描电镜图片如图10所示。Continue to raise the temperature of the container to 200°C, keep it warm for 12 hours, and cool down with the furnace to produce a large number of nanowires with a diameter of 100-200 nm and a length of 3-6 microns distributed on the glass substrate. The scanning electron microscope picture is shown in Figure 10.
实施例8Example 8
260℃合成碲化铟纳米线Synthesis of Indium Telluride Nanowires at 260°C
1配料1 ingredient
(1)0.1mol/LH2TeO3溶液的配置:0.001mol的TeO2(0.159g)溶于乙二醇,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的H2TeO3溶液。(1) Configuration of 0.1mol/LH 2 TeO 3 solution: Dissolve 0.001mol of TeO 2 (0.159g) in ethylene glycol, set the volume to 10ml solution, put in stirring magnet and stir to make the concentration 0.1mol/L H 2 TeO 3 solution.
(2)0.1mol/L的In(NO3)3溶液的配置:0.001mol的In(NO3)3·4.5H2O(0.382g)溶于乙二醇,加入0.4ml硝酸,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的In(NO3)3·4.5H2O溶液。(2) Configuration of 0.1mol/L In(NO 3 ) 3 solution: 0.001mol of In(NO 3 ) 3 ·4.5H 2 O (0.382g) was dissolved in ethylene glycol, 0.4ml of nitric acid was added, and the volume was adjusted to 10ml of the solution was put into a stirring magnet and stirred to prepare an In(NO 3 ) 3 ·4.5H 2 O solution with a concentration of 0.1 mol/L.
(3)Te+In混合溶液的配置:取12ml的0.1mol/L的H2TeO3溶液和8ml的0.1mol/L的In(NO3)3·4.5H2O溶液,混合,持续搅拌30分钟,制成产物为In2Te3按化学计量比配比的Te+In前驱体混合溶液;备用。(3) Configuration of Te+In mixed solution: take 12ml of 0.1mol/L H 2 TeO 3 solution and 8ml of 0.1mol/L In(NO 3 ) 3 ·4.5H 2 O solution, mix and keep stirring for 30 Minutes, the product is In 2 Te 3 Te+In precursor mixed solution with a stoichiometric ratio; set aside.
2共还原反应2 co-reduction reaction
将承载前驱体溶液的基片置入反应装置的聚四氟乙烯柱状平台上,注射1ml85vol%的联胺于聚四氟乙烯容器底部,将反应容器置于高压釜中,密封。缓慢升温至180℃,反应10分钟。Place the substrate carrying the precursor solution on the polytetrafluoroethylene columnar platform of the reaction device, inject 1ml of 85vol% hydrazine into the bottom of the polytetrafluoroethylene container, place the reaction container in an autoclave, and seal it. Slowly raise the temperature to 180°C and react for 10 minutes.
3热处理3 heat treatment
将容器继续升温至260℃,保温12小时,随炉冷却,制得堆积在玻璃基片上的直径100纳米左右,长度为1微米左右纳米线编织而成的纳米结构膜,扫描电镜图片如图11所示。Continue to raise the temperature of the container to 260 ° C, keep it warm for 12 hours, and cool it with the furnace to prepare a nanostructured film with a diameter of about 100 nanometers and a length of about 1 micron that is deposited on the glass substrate. The scanning electron microscope picture is shown in Figure 11. shown.
实施例9Example 9
260℃合成碲化锌纳米线Synthesis of ZnTe Nanowires at 260°C
1配料1 ingredient
(1)0.2mol/LH2TeO3溶液的配置:0.002mol的TeO2(0.319g)溶于乙二醇,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.2mol/L的H2TeO3溶液。(1) Configuration of 0.2mol/LH 2 TeO 3 solution: Dissolve 0.002mol of TeO 2 (0.319g) in ethylene glycol, set the volume to 10ml solution, put in stirring magnet and stir to make the concentration 0.2mol/L H 2 TeO 3 solution.
(2)0.2mol/LZn(CH3COO)2溶液的配置:0.002mol的Zn(CH3COO)2·2H2O(0.439g)溶于乙二醇,加入0.4ml硝酸,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.2mol/L的Zn(CH3COO)2溶液。(2) The configuration of 0.2mol/L Zn(CH 3 COO) 2 solution: 0.002mol of Zn(CH 3 COO) 2 ·2H 2 O (0.439g) was dissolved in ethylene glycol, and 0.4ml of nitric acid was added, and the volume was adjusted to 10ml solution, put it into a stirring magnet and stir to make a Zn(CH 3 COO) 2 solution with a concentration of 0.2 mol/L.
(3)Te+Zn混合溶液的配置:取10ml的0.2mol/L的H2TeO3溶液和10ml的0.2mol/L的Zn(CH3COO)2溶液,混合,持续搅拌30分钟,制成产物为ZnTe按化学计量比配比的Te+Zn前驱体混合溶液;备用。(3) Configuration of Te+Zn mixed solution: Take 10ml of 0.2mol/L H 2 TeO 3 solution and 10ml of 0.2mol/L Zn(CH 3 COO) 2 solution, mix and keep stirring for 30 minutes to prepare The product is a Te+Zn precursor mixed solution in which ZnTe is stoichiometrically proportioned; it is ready for use.
2共还原反应2 co-reduction reaction
将承载前驱体溶液的基片置入反应装置的聚四氟乙烯柱状平台上,注射1ml85vol%的联胺于聚四氟乙烯容器底部,将反应容器置于高压釜中,密封。缓慢升温至180℃,反应10分钟。Place the substrate carrying the precursor solution on the polytetrafluoroethylene columnar platform of the reaction device, inject 1ml of 85vol% hydrazine into the bottom of the polytetrafluoroethylene container, place the reaction container in an autoclave, and seal it. Slowly raise the temperature to 180°C and react for 10 minutes.
3热处理3 heat treatment
将容器继续升温至260℃,保温12小时,随炉冷却,制得分布在玻璃基片上长数微米的纳米线,扫描电镜图片如图12所示。Continue to raise the temperature of the container to 260°C, keep it warm for 12 hours, and cool down with the furnace to prepare nanowires with a length of several microns distributed on the glass substrate. The scanning electron microscope picture is shown in Figure 12.
实施例10Example 10
260℃合成碲化银纳米线Synthesis of Silver Telluride Nanowires at 260°C
1配料1 ingredient
(1)0.1mol/LH2TeO3溶液的配置:0.001mol的TeO2(0.159g)溶于乙二醇,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的H2TeO3溶液。(1) Configuration of 0.1mol/LH 2 TeO 3 solution: Dissolve 0.001mol of TeO 2 (0.159g) in ethylene glycol, set the volume to 10ml solution, put in stirring magnet and stir to make the concentration 0.1mol/L H 2 TeO 3 solution.
(2)0.1mol/L的AgNO3溶液的配置:0.001mol的AgNO3(0.170g)溶于乙二醇,加入0.4ml硝酸,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的AgNO3溶液。(2) Configuration of 0.1mol/L AgNO 3 solution: Dissolve 0.001mol AgNO 3 (0.170g) in ethylene glycol, add 0.4ml nitric acid, dilute to 10ml solution, put in stirring magnet and stir to make the concentration 0.1mol/L AgNO 3 solution.
(3)Te+Ag混合溶液的配置:取12ml的0.1mol/L的H2TeO3溶液和8ml的0.1mol/L的AgNO3溶液,混合,持续搅拌30分钟,制成产物为Ag2Te按化学计量比配比的Te+Ag前驱体混合溶液;备用。(3) Configuration of Te+Ag mixed solution: Take 12ml of 0.1mol/L H 2 TeO 3 solution and 8ml of 0.1mol/L AgNO 3 solution, mix and keep stirring for 30 minutes to make the product Ag 2 Te Te+Ag precursor mixed solution according to stoichiometric ratio; ready for use.
2共还原反应2 co-reduction reaction
将承载前驱体溶液的基片置入反应装置的聚四氟乙烯柱状平台上,注射1ml85vol%的联胺于聚四氟乙烯容器底部,将反应容器置于高压釜中,密封。缓慢升温至180℃,反应10分钟。Place the substrate carrying the precursor solution on the polytetrafluoroethylene columnar platform of the reaction device, inject 1ml of 85vol% hydrazine into the bottom of the polytetrafluoroethylene container, place the reaction container in an autoclave, and seal it. Slowly raise the temperature to 180°C and react for 10 minutes.
3热处理3 heat treatment
将容器继续升温至260℃,保温12小时,随炉冷却,制得直径为400纳米左右,长度在数百微米至数毫米范围的超长纳米线,扫描电镜图片如图13所示。Continue to raise the temperature of the container to 260°C, keep it warm for 12 hours, and cool down with the furnace to produce ultra-long nanowires with a diameter of about 400 nanometers and a length ranging from hundreds of microns to several millimeters. The scanning electron microscope picture is shown in Figure 13.
实施例11Example 11
合成碲硒锑三元合金低维纳米结构Synthesis of low-dimensional nanostructures of tellurium-selenide-antimony ternary alloys
1配料1 ingredient
(1)0.2mol/LH2SeO3溶液的配置:0.002mol的SeO2(0.222g)溶于乙二醇,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.2mol/L的H2SeO3溶液。(1) Configuration of 0.2mol/LH 2 SeO 3 solution: Dissolve 0.002mol of SeO 2 (0.222g) in ethylene glycol, set the volume to 10ml of solution, put in stirring magnet and stir to make the concentration 0.2mol/L H 2 SeO 3 solution.
(2)0.1mol/LH2TeO3溶液的配置:0.001mol的TeO2(0.159g)溶于乙二醇,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的H2TeO3溶液。(2) Configuration of 0.1mol/LH 2 TeO 3 solution: Dissolve 0.001mol TeO 2 (0.159g) in ethylene glycol, set the volume to 10ml solution, put in stirring magnet and stir to make the concentration 0.1mol/L H 2 TeO 3 solution.
(3)0.1mol/LSb2(OCH2CH2O)3溶液的配置:0.001mol的Sb2(OCH2CH2O)3(0.423g)溶于乙二醇,加入0.4ml硝酸,定容至10ml溶液,放入搅拌磁子搅拌,制成浓度为0.1mol/L的Sb2(OCH2CH2O)3溶液。(3) Configuration of 0.1mol/LSb 2 (OCH 2 CH 2 O) 3 solution: 0.001mol of Sb 2 (OCH 2 CH 2 O) 3 (0.423g) was dissolved in ethylene glycol, and 0.4ml of nitric acid was added to constant volume to 10ml of the solution, put into a stirring magnet to stir, and make a Sb 2 (OCH 2 CH 2 O) 3 solution with a concentration of 0.1 mol/L.
(4)Te+Se+Sb混合溶液的配置:取5ml的0.1mol/L的H2TeO3溶液和5ml的0.2mol/L的H2SeO3溶液和5ml的0.1mol/L的Sb2(OCH2CH2O)3溶液,混合,持续搅拌30分钟,制成产物为Sb2Se2Te按化学计量比配比的Te+Se+Sb前驱体混合溶液;备用。(4) Configuration of Te+Se+Sb mixed solution: Take 5ml of 0.1mol/L H 2 TeO 3 solution, 5ml of 0.2mol/L H 2 SeO 3 solution and 5ml of 0.1mol/L Sb 2 ( OCH 2 CH 2 O) 3 solution, mixed, and continuously stirred for 30 minutes to prepare a Te+Se+Sb precursor mixed solution of Sb 2 Se 2 Te in a stoichiometric ratio; set aside.
2共还原反应2 co-reduction reaction
将承载前驱体溶液的基片置入反应装置的聚四氟乙烯柱状平台上,注射1ml85vol%的联胺于聚四氟乙烯容器底部,将反应容器置于高压釜中,密封。缓慢升温至180℃,反应10分钟。Place the substrate carrying the precursor solution on the polytetrafluoroethylene columnar platform of the reaction device, inject 1ml of 85vol% hydrazine into the bottom of the polytetrafluoroethylene container, place the reaction container in an autoclave, and seal it. Slowly raise the temperature to 180°C and react for 10 minutes.
3热处理3 heat treatment
将容器继续升温至240℃,保温12小时,随炉冷却,制得大量分布在玻璃基片上的直径100~300纳米,长度为几十微米的纳米线以及大量直径500纳米左右的六方片,X-射线衍射图谱如图3所示,扫描电镜图片如图14所示。Continue to heat up the container to 240°C, keep it warm for 12 hours, and cool it with the furnace to produce a large number of nanowires with a diameter of 100-300 nanometers and a length of tens of microns distributed on the glass substrate and a large number of hexagonal sheets with a diameter of about 500 nanometers. X - The ray diffraction spectrum is shown in Figure 3, and the scanning electron microscope picture is shown in Figure 14.
上述的对实施例的描述是为便于该技术领域的普通技术人员能理解和应用本发明。熟悉本领域技术的人员显然可以容易地对这些实施例做出各种修改,并把在此说明的一般原理应用到其它实施例中而不必经过创造性的劳动。因此,本发明不限于这里的实施例,本领域技术人员根据本发明的揭示,对于本发明做出的改进和修改都应该在本发明的保护范围之内。The above description of the embodiments is for those of ordinary skill in the art to understand and apply the present invention. It is obvious that those skilled in the art can easily make various modifications to these embodiments, and apply the general principles described here to other embodiments without creative effort. Therefore, the present invention is not limited to the embodiments herein, and improvements and modifications made by those skilled in the art according to the disclosure of the present invention should fall within the protection scope of the present invention.
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