CN102529212A - Coated product - Google Patents
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- CN102529212A CN102529212A CN2011104378877A CN201110437887A CN102529212A CN 102529212 A CN102529212 A CN 102529212A CN 2011104378877 A CN2011104378877 A CN 2011104378877A CN 201110437887 A CN201110437887 A CN 201110437887A CN 102529212 A CN102529212 A CN 102529212A
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Abstract
The invention discloses a coated product and particularly relates to coated glass which can be processed at a high temperature. The material of a reflective infrared film layer of the coated product is changed from the traditional pure silver material to an alloy material Ag1-aSba including silver (Ag) and stibium (Sb) metals, wherein a is greater than 0 and is less than or equal to 9wt%, and Sb is used as a wetting agent in the deposition process of a silver layer and enables the silver layer to grow in a two-dimensional shape; meanwhile, Sb can prevent Ag to interact with the adjacent oxide layer, improve the stability of a coating system in a high-temperature heat treatment and further improve the chemical stability as well as mechanical property of the silver layer. The coated product disclosed by the invention has high visible light transmittance, favorable mechanical resistance and chemical stability and is mainly applied to automobile windshields.
Description
[technical field]
The present invention relates to a kind of plated film product, refer more particularly to a kind of coated glass that carries out high-temperature heat treatment.
[background technology]
Common glass does not have heat insulating function; The enhancing of Along with people's awareness of saving energy; Now a lot of buildings or automobile have all used low radiation coated glass or heat reflection coated glass, and these coated glasses can play good effect of heat insulation, and the comfort level in interior of building or the car is increased.
U.S. Pat 2004/0258928A1 openly knows clearly a kind of metal alloy film as solar control film; The infrared-reflecting layers of this solar control film adopts a kind of metal alloy; Metal alloy is made up of silver and one or more elements of being selected from copper, gold, aluminium, titanium, zirconium, the hafnium, its preferably the alloy of the copper composition of silver and 15% atomic percent of 85% atomic percent as the infrared external reflection layer material.The radiance of this solar control film is more than or equal to 0.05, and face resistance is less than or equal to 20 Ω/square.The silver alloy of the disclosed employing cupric of this patent has good infrared reflection function as infrared reflecting layer, can make rete produce the danger of erythema defective in follow-up process but contain copper in the silver alloy.
Produce the off-line low radiation coated glass now; Mostly be to use the functional film layer of fine silver as reflected infrared ray; Because pure metallic silver makes easily the performance degradation of silver with the sulfide gas reaction in air, silver is oxidized easily and lose low radiation functions in high-temperature heat treatment process, therefore; The making of present low radiation coated glass all is to use the multilayer dielectricity layer to protect silver layer, and a lot of low-radiation film is to stand high-temperature heat treatment.Because metal is different with the characteristic of dielectric material; The wetability of silver on deielectric-coating is not so good; Through a lot of researchs, find to make the deposition of silverskin comparatively even as the Seed Layer of deposition of silver, on the other hand with zinc oxide; This has also limited the deposition of silver on other dielectric layer, thereby has limited the design of film structure.
[summary of the invention]
The objective of the invention is in order to solve the deficiency of above low-radiation film, use the alloy material of silver, two kinds of metals of antimony to replace the functional film layer material of fine silver material as low-radiation film.Sb in this alloy material can make the deposition of silver layer on arbitrary dielectric layer more even, and Sb plays the effect of wetting agent in deposition process, and silver layer is grown with two-dimentional form in deposition process; Can stop simultaneously the interaction of silver-colored with contiguous oxide skin(coating), improve the stability that film ties up to high-temperature heat treatment, can improve the chemical stability of silver layer simultaneously again and improve its mechanical performance.
The present invention is directed to the unstability of silver film in the existing low-emission coated product; With the functional film layer material of the high-purity ag material of the binary metal alloy replacing of metallic antimony silver-doped as low-radiation film; Make the radiance of low-emission coated product be less than or equal to 0.05, face resistance is less than or equal to 18 Ω/square.
The preparation of a kind of low-emission coated product of the present invention is carried out as follows:
1) growth bottom dielectric membranous layer on glass substrate, the bottom dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, its thicknesses of layers are 20～50nm.
2) Ag of grow doping antimony on the bottom dielectric membranous layer
1-aSb
aRete, 0＜a≤9wt% wherein, preferably 0.2wt%≤a≤6wt% is more preferably 0.5wt%≤a≤3wt%, and its thicknesses of layers is 6～20nm.
3) at the Ag of antimony dopant
1-aSb
aGrowth first sacrifice layer on the rete, first sacrifice layer can be NiCr, Ti, Nb, NiCrOx, Sb, its thicknesses of layers is 1～5nm.
4) growth top layer dielectric membranous layer on first sacrifice layer; The top layer dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiOx, its thicknesses of layers are 10～35nm.
5) growth protecting layer on the top layer dielectric membranous layer, protective layer is selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiNOx, its thicknesses of layers are 10～25nm.
6) at last low radiation coated glass is made hollow or laminated glass.
The preparation of the low-emission coated product of another kind of the present invention is carried out as follows:
1) growth bottom dielectric membranous layer on glass substrate, the bottom dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, its thicknesses of layers are 20～50nm.
2) Ag of grow doping antimony on the bottom dielectric membranous layer
1-aSb
aRete, 0＜a≤9wt% wherein, preferably 0.2wt%≤a≤6wt% is more preferably 0.5wt%≤a≤3wt%, and its thicknesses of layers is 6～20nm.
3) at the Ag of antimony dopant
1-aSb
aGrowth first sacrifice layer on the rete, first sacrifice layer can be NiCr, Ti, Nb, NiCrOx, Sb, its thicknesses of layers is 1～5nm.
4) growth second dielectric membranous layer on first sacrifice layer, second dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, its thicknesses of layers are 40～90nm.
5) Ag of grow doping antimony on second dielectric membranous layer
1-aSb
aRete, 0＜a≤9wt% wherein, preferably 0.2wt%≤a≤6wt% is more preferably 0.5wt%≤a≤3wt%, and its thicknesses of layers is 6～20nm.
6) at the Ag of antimony dopant
1-aSb
aGrowth second sacrifice layer on the rete, second sacrifice layer can be NiCr, Ti, Nb, NiCrOx, Sb, its thicknesses of layers is 1～5nm.
7) deposited top layer dielectric membranous layer on second sacrifice layer; The top layer dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiOx, its thicknesses of layers are 10～35nm.
8) growth protecting layer on the top layer dielectric membranous layer, protective layer is selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiNOx, its thicknesses of layers are 10～25nm.
9) at last low radiation coated glass is made hollow or laminated glass.
The preparation of the third low-emission coated product of the present invention is carried out as follows:
1) growth bottom dielectric membranous layer on glass substrate, the bottom dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, its thicknesses of layers are 20～50nm.
2) Ag of grow doping antimony on the bottom dielectric membranous layer
1-aSb
aRete, 0＜a≤9wt% wherein, preferably 0.2wt%≤a≤6wt% is more preferably 0.5wt%≤a≤3wt%, and its thicknesses of layers is 6～20nm.
3) at the Ag of antimony dopant
1-aSb
aGrowth first sacrifice layer on the rete, first sacrifice layer can be NiCr, Ti, Nb, NiCrOx, Sb, its thicknesses of layers is 1～5nm.
4) growth second dielectric membranous layer on first sacrifice layer, second dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, its thicknesses of layers are 40～90nm.
5) Ag of grow doping antimony on second dielectric membranous layer
1-aSb
aRete, 0＜a≤9wt% wherein, preferably 0.2wt%≤a≤6wt% is more preferably 0.5wt%≤a≤3wt%, and its thicknesses of layers is 6～20nm.
6) at the Ag of antimony dopant
1-aSb
aGrowth second sacrifice layer on the rete, second sacrifice layer can be NiCr, Ti, Nb, NiCrOx, Sb, its thicknesses of layers is 1～5nm.
7) deposition the 3rd dielectric membranous layer on second sacrifice layer, the 3rd dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, its thicknesses of layers are 40～90nm.
8) Ag of grow doping antimony on the 3rd dielectric membranous layer
1-aSb
aRete, 0＜a≤9wt% wherein, preferably 0.2wt%≤a≤6wt% is more preferably 0.5wt%≤a≤3wt%, and its thicknesses of layers is 6～20nm.
9) at the Ag of antimony dopant
1-aSb
aGrowth regulation three sacrifice layers on the rete, the 3rd sacrifice layer can be NiCr, Ti, Nb, NiCrOx, Sb, its thicknesses of layers is 1～5nm.
10) deposited top layer dielectric membranous layer on the 3rd sacrifice layer; The top layer dielectric membranous layer can be one or more following combinations of materials: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiOx, its thicknesses of layers are 10～35nm.
11) growth protecting layer on the top layer dielectric membranous layer, protective layer is selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiNOx, its thicknesses of layers are 10～25nm.
12) at last low radiation coated glass is made hollow or laminated glass.
In above-mentioned film structure, can be at the Ag of dopant deposition antimony
1-aSb
aDeposit one deck sacrifice layer before the rete earlier.
Compared with prior art the present invention has the following advantages:
The silver-antimony alloy that is employed in antimony dopant element formation in the fine silver is as the target depositional coating, and in the process of depositional coating, doped chemical antimony plays and is similar to influence of surfactant, makes coating growth more even; Because can alleviating rete, the existence of antimony is exposed to the corrosion that receives pernicious gas when perhaps heat-treating in the atmosphere simultaneously; Adopt silver-colored antimony bianry alloy more cheap, for the large-scale production positive role that reduced cost than fine silver material.
The surfactant here is to help the element that film is successively grown on the dynamics, utilizes it can reduce the surface roughness of film, makes the growth of rete more even.It can constantly rise to the surface and have an effect constantly in the process that film is successively grown, its consumption seldom is generally less than a monoatomic layer.
If there be not the situation of Sb as surfactant: this moment, the potential barrier of step edge was more much higher than diffusion barrier; Make additional edge potential barrier (potential barrier that atom falls step deducts the potential barrier of diffusion into the surface) quite big; Adatom on the upper table surface is not easy to jump off; The reason that additional edge potential barrier produces is: when atom jumped off step, its ligancy certainly will reduce, so potential barrier can appear in this process.The introducing of Sb is increased diffusion barrier, has reduced the mobility of Ag adatom on table top, and additional edge potential barrier is reduced.Island density is increased, and the probability that the adatom at step place is jumped off is close with the diffusion probability on the table top.Secondly the introducing of Sb makes atom along step edge diffusion difficulty, makes the edge very irregular, and a lot of kinkings are promptly arranged on the step.In general there is strain relaxation in kinking place of step, and the potential barrier of jumping off in kinking place can decrease.Once more, the density on the island of increase reduces the size on island, or the branch on island is narrowed down, and these can increase the probability that the Ag adatom arrives step.These effects all make the Ag film growth be more prone to two-dimensional growth, make the Ag layer growth more even, fine and close.
When oxygen existed, silver was unstable on thermodynamics, was prone to generated silver oxide by the dioxygen oxidation in the atmosphere.Owing to have O in the atmosphere
2, SO
2Deng gas, these gases have corrosiveness to silver film, thereby the performances such as optics, electricity, mechanics of silver film are descended.Like silver film at O
2Meeting and SO under the condition that exists
2Gas reaction generates whiteness Ag
2SO
4Deng.Reaction above-mentioned when particularly rete being heat-treated (as 630 ℃) is fierce more.Use Ag
1-aSb
aRete replacement fine silver rete makes its influence that is not subject to environment, improves the chemical resistance of silver film.When oxygen is participated in reaction, Ag
1-aSb
aSb in the rete is with respect to Ag, and the preferential and oxygen reaction of meeting receives O thereby alleviate Ag
2Corrosion; As SO
2When gas is participated in reaction, Ag
1-aSb
aSb in the rete can preferential and SO with respect to Ag
2Gas reaction receives SO thereby alleviate Ag
2The corrosion of gas.
[specific embodiment]
Define earlier at this: 1) " Ag
1-aSb
a" be illustrated in doping Sb element among the pure Ag, wherein a representes the weight percent content of element sb, in whole specification, all representes with wt%.2) " baking is curved heats " is meant that coated glass stands the high-temperature heat treatment more than 620 ℃, and under this high temperature, stops 2～5min.3) value of x is 0＜x≤2 among SnOx, TiOx, ZrOx and the SiOx; The value of x is 0＜x≤1 among the ZnOx; The value of x is 0＜x≤4/3 among the SiNx; The value of n is 0＜n≤x+2y among ZnxSnyOn and the ZnxTiyOn, wherein x and y get arbitrarily on the occasion of; The value of x is 0＜x≤5/2 among the NbOx; The value of x is 0＜x≤1/2 among the SiNOx; The value of x is 0＜x≤3.5 among the NiCrOx.In the middle of this entire chapter invention, all use above method for expressing.
Below in conjunction with specific embodiment the present invention is elaborated.
Below relate to embodiment and Comparative Examples, all on the air surface of the transparent float glass former (being labeled as glass substrate 2.0C) clean, that thickness is 2.0mm, plate each rete successively.
After the baking of monolithic glass substrate film coating is curved; The outermost coatings of coated glass substrate is the outermost protective layer; The outermost protective layer outwards successively with thickness be the PVB of 0.76mm, in addition a slice not have the thickness of plated film be that the clear float glass substrate of 2.0mm is laminated together, form low-emission coated laminated glass.And the low-emission coated laminated glass that forms need be through knocking experiment---one of most important physical property test, this experiment are the detection methods of weighing adhesive property between rete and PVB, the glass.Solutia Europe s.a. company is divided into 9 grades with the laminated glass standard of knocking.According to knock the back cullet be bonded at amount on the PVB from few to many, the required standard grade is the 1st grade to the 9th grade.Satisfying the grade of knocking that automobile laminated glass needs that GB GB9656-2003 requires meet is: 3rd level≤knock grade≤6th grade.
Knocking experimental procedure is:
A. downcut the test film of two 100 * 300mm from whole low-emission coated laminated glass; B. two samples being placed on-18 ℃ ± 2 ℃ preserved 2 hours down at least; C. sample is taken out from above-mentioned low temperature and placed 1-2 minute at normal temperatures, just be placed on the sample case and knock with iron hammer; D. knock the back sample allow to return to room temperature again with standard sample of photo contrast, but after will waiting until the condensed water volatilization; E. the conscientious and standard sample of photo comparison with sample just can be judged the grade of knocking experiment.
Embodiment 1
On glass substrate 2.0C, plate the ZnSnO that thickness is 40nm successively
2Rete; Thickness is the Ag of 12nm
1-aSb
aRete, wherein a=9wt%; Thickness is the Ti rete of 3nm; Thickness is the ZnSnO of 25nm
2Rete; Thickness is the Si of 15nm
3N
4Rete is as protective layer, but obtains the heat treatment low radiation coated glass.
Optical performance test
Before heat treatment, the radiance of monolithic low radiation coated glass is 0.05, visible light transmissivity 80.1%; The curved heating of baking back is detected, and the radiance of monolithic low radiation coated glass is 0.035, and visible light transmissivity is 82.2%, and face resistance is 10.2 Ω/square; Wash, close the low-emission coated laminated glass that obtains after the operation such as sheet then, through detecting, its visible light transmissivity is 75.9%, the direct transmitance 47.8% of solar energy.
Physical property
According to GB9656-2003, impact experiment, anti-irradiation experiment, damp and hot circulation experiment etc. all can meet the demands.Through detecting, knocking experimental grade is 3 grades, explains that the adhesive force of rete and glass and PVB is all fine.
Embodiment 2
On glass substrate 2.0C, plate the ZnSnO that thickness is 35nm successively
1.8Rete; Thickness is the Ag of 10nm
1-aSb
aRete, wherein a=1wt%; Thickness is the Ti rete of 2nm; Thickness is the ZnSnO of 75nm
1.8Rete; Thickness is the Ag of 12nm
1-aSb
aRete, wherein a=1wt%; Thickness is the Ti rete of 3nm; Thickness is the ZnSnO of 25nm
1.8Rete; Thickness is the TiO of 10nm
2Rete is as protective layer, but obtains the heat treatment low radiation coated glass.
Optical performance test
Before heat treatment, the radiance of monolithic low radiation coated glass is 0.04, visible light transmissivity 78.5%; The curved heating of baking back is detected, and the radiance of monolithic low radiation coated glass is 0.03, and visible light transmissivity is 80%, and face resistance is 4 Ω/square; Wash, close the low-emission coated laminated glass that obtains after the operation such as sheet then, through detecting, its visible light transmissivity is 75.6%, the direct transmitance 41.5% of solar energy.
Physical property
According to GB9656-2003, impact experiment, anti-irradiation experiment, damp and hot circulation experiment etc. all can meet the demands.Through detecting, knocking experimental grade is 3 grades, explains that the adhesive force of rete and glass and PVB is all fine.
Embodiment 3
On glass substrate 2.0C, plate the ZnSnO that thickness is 35nm successively
2.3Rete; Thickness is the Ag of 12nm
1-aSb
aRete, wherein a=0.01wt%; Thickness is the Ti rete of 2nm; Thickness is the ZnSnO of 70nm
2.3Rete; Thickness is the Ag of 10nm
1-aSb
aRete, wherein a=0.01wt%; Thickness is the Ti rete of 3nm; Thickness is the ZnSnO of 65nm
2.3Rete; Thickness is the Ag of 9nm
1-aSb
aRete, wherein a=0.01wt%; Thickness is the Ti rete of 3nm; Thickness is the ZnSnO of 20nm
2.3Rete; Thickness is the ZrO of 15nm
2Rete is as protective layer, but obtains the heat treatment low radiation coated glass.
Optical performance test
Before heat treatment, the radiance of monolithic low radiation coated glass is 0.025, visible light transmissivity 76.6%; The curved heating of baking back is detected, and the radiance of monolithic low radiation coated glass is 0.019, and visible light transmissivity is 78.3%, and face resistance is 2.3 Ω/square; Wash, close the low-emission coated laminated glass that obtains after the operation such as sheet then, through detecting, its visible light transmissivity is 71.2%, the direct transmitance 37.1% of solar energy.
Physical property
According to GB9656-2003, impact experiment, anti-irradiation experiment, damp and hot circulation experiment etc. all can meet the demands.Through detecting, knocking experimental grade is 3 grades, explains that the adhesive force of rete and glass and PVB is all fine.
Embodiment 4 (doing contrast) with example 2
On glass substrate 2.0C, plate the ZnSnO that thickness is 35nm successively
1.8Rete; Thickness is the Ag rete of 10nm; Thickness is the Ti rete of 2nm; Thickness is the ZnSnO of 75nm
1.8Rete; Thickness is the Ag rete of 12nm; Thickness is the Ti rete of 3nm; Thickness is the ZnSnO of 25nm
1.8Rete; Thickness is the TiO of 10nm
2Rete is as protective layer, but obtains the heat treatment low radiation coated glass.
Optical performance test
Before heat treatment, the radiance of monolithic low radiation coated glass is 0.045, visible light transmissivity 78.1%; The curved heating of baking back is detected, and the radiance of monolithic low radiation coated glass is 0.033, and visible light transmissivity is 80.2%, and face resistance is 4.7 Ω/square; Wash, close the low-emission coated laminated glass that obtains after the operation such as sheet then, through detecting, its visible light transmissivity is 75.3%, the direct transmitance 42.9% of solar energy.
Physical property
According to GB9656-2003, impact experiment, anti-irradiation experiment, damp and hot circulation experiment etc. all can meet the demands.Through detecting, knocking experimental grade is 3 grades, explains that the adhesive force of rete and glass and PVB is all fine.
Embodiment 5
The coated glass that embodiment 2 is made carries out high-temperature heat treatment, makes it in 620 ℃ baking and bending furnace, stop 10min, and the radiance of testing the monolithic low radiation coated glass then is 0.045, and face resistance is 5.2 Ω/square.
Through closing the low-emission coated laminated glass that obtains after the operations such as sheet according to GB9656-2003, impact experiment, anti-irradiation experiment, damp and hot circulation experiment etc. all can meet the demands with this monolithic low radiation coated glass.Through detecting, knocking experimental grade is 3 grades, explains that the adhesive force of rete and glass and PVB is all fine.
Embodiment 6
The coated glass that embodiment 4 is made carries out high-temperature heat treatment, makes it in 620 ℃ baking and bending furnace, stop 10min, and the radiance of testing the monolithic low radiation coated glass then is 0.095, and face resistance is 16.5 Ω/square.
Through closing the low-emission coated laminated glass that obtains after the operations such as sheet according to GB9656-2003, impact experiment, anti-irradiation experiment, damp and hot circulation experiment etc. all can not meet the demands with this monolithic low radiation coated glass.Through detecting, knocking experimental grade is 2 grades, and the adhesive force variation of rete and glass and PVB is described.
Embodiment 5 can find out with the comparison of embodiment 6: the face resistance of embodiment 5 and the face resistance of embodiment 2 are more or less the same; And the face resistance of the face resistance ratio embodiment 4 of embodiment 6 has increased more than one times, explains through its silver film after the heat treatment of embodiment 6 to receive destructions such as oxidation to a certain degree; Say from another point of view, adopt Ag
1-aSb
aRete instead of pure Ag rete can improve the resistance to elevated temperatures of whole rete, anti-mechanical performance and chemical stability.
Claims (11)
1. a plated film product is characterized in that: contain one deck Ag at least in this plated film product film structure
1-aSb
aFunctional layer.
2. plated film product according to claim 1 is characterized in that: contain one deck Ag in this plated film product film structure
1-aSb
aFunctional layer is followed successively by bottom dielectric layer, Ag outward from glass baseplate surface
1-aSb
aRete, first sacrifice layer, top layer dielectric layer, protective layer.
3. plated film product according to claim 1 is characterized in that: contain two-layer Ag in this plated film product film structure
1-aSb
aFunctional layer is followed successively by bottom dielectric layer, Ag outward from glass baseplate surface
1-aSb
aRete, first sacrifice layer, second dielectric layer, Ag
1-aSb
aRete, second sacrifice layer, top layer dielectric layer, protective layer.
4. plated film product according to claim 1 is characterized in that: contain three layers of Ag in this plated film product film structure
1-aSb
aFunctional layer is followed successively by bottom dielectric layer, Ag outward from glass baseplate surface
1-aSb
aRete, first sacrifice layer, second dielectric layer, Ag
1-aSb
aRete, second sacrifice layer, the 3rd dielectric layer, Ag
1-aSb
aRete, the 3rd sacrifice layer, top layer dielectric layer, protective layer.
5. according to claim 1,2,3 or 4 described plated film products, it is characterized in that: Ag
1-aSb
aIn the rete, the content of Sb is 0＜a≤9wt%, and this thicknesses of layers is 6～20nm.
6. according to claim 2,3 or 4 described plated film products; It is characterized in that: the bottom dielectric layer is selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, the bottom dielectric layer thickness is 20～50nm.
7. according to claim 2,3 or 4 described plated film products, it is characterized in that: first sacrifice layer, second sacrifice layer and the 3rd sacrifice layer are selected following at least a material for use: NiCr, Ti, Nb, NiCrOx, Sb, sacrificial layer thickness is 1～5nm.
8. according to claim 3 or 4 described plated film products; It is characterized in that: second dielectric layer and the 3rd dielectric layer are selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, second dielectric layer and the 3rd dielectric layer thickness are 40～90nm.
9. according to claim 2,3 or 4 described plated film products; It is characterized in that: the top layer dielectric layer is selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiOx, the top layer dielectric layer thickness is 10～35nm.
10. according to claim 2,3 or 4 described plated film products; It is characterized in that: protective layer is selected one or more following combinations of materials for use: SnOx, TiOx, ZnOx, SiNx, ZnxSnyOn, ZnxTiyOn, ZrOx, NbOx, SiNOx, protective layer thickness are 5～25nm.
11. according to claim 1,2,3 or 4 described plated film products, it is characterized in that: this plated film product can be made into laminated glass.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102757185A (en) * | 2012-07-26 | 2012-10-31 | 福耀玻璃工业集团股份有限公司 | Low-radiation heat-treatable coated glass and interlayer glass product thereof |
| CN103895276A (en) * | 2013-10-16 | 2014-07-02 | 信义玻璃工程（东莞）有限公司 | Silver based low emissivity coated glass |
| CN105271819A (en) * | 2015-09-30 | 2016-01-27 | 中国建筑材料科学研究总院 | Temperable low-emissivity coated glass, low-emissivity coated glass and preparation method thereof |
| CN105621901A (en) * | 2015-12-23 | 2016-06-01 | 内蒙古坤瑞玻璃股份有限公司 | Rare earth doped and modified single crystal silver Low-E glass and preparation method thereof |
| CN109467320A (en) * | 2018-04-27 | 2019-03-15 | 福耀玻璃(湖北)有限公司 | A kind of on-line coating and film-removing technology of shield glass |
| CN111253084A (en) * | 2020-03-25 | 2020-06-09 | 四川猛犸半导体科技有限公司 | Thin film device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4451525A (en) * | 1980-03-19 | 1984-05-29 | Nitto Electric Industrial Co., Ltd. | Products having compound membrane |
| CN1483852A (en) * | 2002-08-08 | 2004-03-24 | ��ʽ�������Ƹ��� | Ag base alloy thin film and sputtering target for forming Ag base alloy film |
| CN101497501A (en) * | 2009-03-06 | 2009-08-05 | 中国南玻集团股份有限公司 | Three-silver low radiation film glass |
-
2011
- 2011-12-23 CN CN2011104378877A patent/CN102529212A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4451525A (en) * | 1980-03-19 | 1984-05-29 | Nitto Electric Industrial Co., Ltd. | Products having compound membrane |
| CN1483852A (en) * | 2002-08-08 | 2004-03-24 | ��ʽ�������Ƹ��� | Ag base alloy thin film and sputtering target for forming Ag base alloy film |
| CN101497501A (en) * | 2009-03-06 | 2009-08-05 | 中国南玻集团股份有限公司 | Three-silver low radiation film glass |
Non-Patent Citations (1)
| Title |
|---|
| 向国朴、王萍: "脉冲电镀Ag-Sb合金的研究", 《电镀与精饰》 * |
Cited By (7)
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|---|---|---|---|---|
| CN102757185A (en) * | 2012-07-26 | 2012-10-31 | 福耀玻璃工业集团股份有限公司 | Low-radiation heat-treatable coated glass and interlayer glass product thereof |
| CN102757185B (en) * | 2012-07-26 | 2014-08-20 | 福耀玻璃工业集团股份有限公司 | Low-radiation heat-treatable coated glass and interlayer glass product thereof |
| CN103895276A (en) * | 2013-10-16 | 2014-07-02 | 信义玻璃工程（东莞）有限公司 | Silver based low emissivity coated glass |
| CN105271819A (en) * | 2015-09-30 | 2016-01-27 | 中国建筑材料科学研究总院 | Temperable low-emissivity coated glass, low-emissivity coated glass and preparation method thereof |
| CN105621901A (en) * | 2015-12-23 | 2016-06-01 | 内蒙古坤瑞玻璃股份有限公司 | Rare earth doped and modified single crystal silver Low-E glass and preparation method thereof |
| CN109467320A (en) * | 2018-04-27 | 2019-03-15 | 福耀玻璃(湖北)有限公司 | A kind of on-line coating and film-removing technology of shield glass |
| CN111253084A (en) * | 2020-03-25 | 2020-06-09 | 四川猛犸半导体科技有限公司 | Thin film device |
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