CN102512926B - Method for removing sulfuryl fluoride by coupling plasma and chemical absorbing - Google Patents
Method for removing sulfuryl fluoride by coupling plasma and chemical absorbing Download PDFInfo
- Publication number
- CN102512926B CN102512926B CN201110445113.9A CN201110445113A CN102512926B CN 102512926 B CN102512926 B CN 102512926B CN 201110445113 A CN201110445113 A CN 201110445113A CN 102512926 B CN102512926 B CN 102512926B
- Authority
- CN
- China
- Prior art keywords
- gas
- sulfuryl fluoride
- plasma
- lye
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Treating Waste Gases (AREA)
Abstract
本发明属于气体污染物处理技术领域，提供了一种等离子体耦合化学吸收无害化脱除硫酰氟气体方法，用于脱除熏蒸后残留的硫酰氟气体。该方法的处理过程是把含硫酰氟的气体导入等离子体反应器，在等离子体作用下，硫酰氟分解形成有害气体产物主要包括硫氧化物及氟化物，反应后的气体产物再进入气液吸收塔被碱液吸收，从而达到无害化脱除硫酰氟废气。本发明有益的效果是:本发明采用等离子体技术耦合化学吸收脱除硫酰氟，经过处理后的气体达到国家排放标准。该发明相对于目前通风方式将硫酰氟排到大气中不仅保护了自然环境，同时保护了人类的身体健康。另外，本发明工艺流程简单，运行费用低，较适合在现场使用。
The invention belongs to the technical field of gas pollutant treatment, and provides a method for harmlessly removing sulfuryl fluoride gas by plasma coupling chemical absorption, which is used for removing residual sulfuryl fluoride gas after fumigation. The treatment process of this method is to introduce the gas containing sulfuryl fluoride into the plasma reactor. Under the action of the plasma, the sulfuryl fluoride is decomposed to form harmful gas products mainly including sulfur oxides and fluorides, and the gas products after the reaction enter the gas The liquid absorption tower is absorbed by the lye, so as to achieve the harmless removal of sulfuryl fluoride waste gas. The beneficial effects of the present invention are: the present invention adopts plasma technology coupling chemical absorption to remove sulfuryl fluoride, and the treated gas reaches the national discharge standard. Compared with the current ventilation method, the invention discharges sulfuryl fluoride into the atmosphere, which not only protects the natural environment, but also protects human health. In addition, the invention has simple technological process and low operation cost, and is more suitable for on-site use.
Description
Technical field
The invention belongs to gas pollutant processing technology field, is mainly a kind of method that plasmon coupling chemical absorbing removes vikane.
Background technology
Vikane substitutes Celfume as a kind of fumigant and is worldwide applied gradually, but the toxicity that vikane has can be destroyed nervous centralis, and Long Term Contact produces and has a strong impact on human health, even causes death.According to another current research, find to show: vikane is a kind of strong greenhouse gas.It is 4800 times of one kilogram of carbon dioxide that one kilogram of vikane is discharged in atmosphere the effect of global warming, and in air, vikane content is just increasing with annual 5% speed, and can in air, exist about 36 years.Therefore,, in order to protect people's healthy and natural environment, the harmless treatment of residual fumigant vikane is very urgent.
Because substituting Celfume, vikane is employed the time soon as fumigant, and the relevant harm of vikane does not also cause enough attention, so, at present for the unified feasible method of harmless treatment of sulfuryl fluoride gas, common method be adopt the mode of ventilating by residual vikane toxic emission in atmosphere.The method is contaminated environment not only, increases greenhouse effects, but also harm periphery resident's is healthy.Therefore, in the urgent need to development new technologies, remove sulfuryl fluoride gas.
Nonequilibrium plasma is processed waste gas technology and is furtherd investigate, and has been used for removing NO
x, SO
2with VOCs etc., nonequilibrium plasma can be produced by gas discharge, comprises glow discharge, corona discharge, dielectric barrier discharge, microwave discharge etc., but when nonequilibrium plasma is processed waste gas, still, containing toxic and harmful composition, there is secondary pollution problem in emission gases.
Summary of the invention
Object of the present invention will overcome the deficiency of above-mentioned technology just, and provide a kind of plasmon coupling chemical absorbing to remove the method for vikane, be used for the innoxious residual fumigant vikane that removes, the present invention can be used for the innoxious stifling rear residual sulfuryl fluoride gas such as freighter, container, storage, building, museum, food that removes.
The present invention solves the technical scheme that its technical problem adopts: this plasmon coupling chemical absorbing removes the method for vikane, and step is as follows:
1) regulate high voltage source, make to start to discharge in plasma reactor;
2), by importing to plasma reactor containing the gas of vikane by air inlet, under action of plasma, sulfuryl fluoride gas is discharged and produces high energy electron and clash into and be decomposed to form pernicious gas product and comprise oxysulfide and fluoride gas product;
3) pernicious gas product is imported in liquid gas absorption tower by reactant air inlet;
4) the pernicious gas product that the decomposition of sulfonyl fluorine gas produces is reacted by alkali liquor absorption in liquid gas absorption tower, and harmless gas is gone out from gas outlet, and the liquid after absorption is discharged from liquid outlet, thereby realizes the innoxious sulfuryl fluoride gas that removes;
5) alkali lye is by the circulating pump absorption that circulates, and the alkali lye pH value of controlling alkali liquid tank the inside is greater than 8.
Described plasma reactor discharge type is dielectric barrier discharge, glow discharge and corona discharge.
Described liquid gas absorption tower is packed tower, plate column, spray column and high-gravity rotating bed gas-liquid mass transfer (contact) equipment.
Described alkali lye is potassium hydroxide, NaOH, calcium hydroxide and other alkali lye, and alkali lye can be used the circulating pump absorption that circulates, and alkali lye all can be recycled before PH is greater than 8.
The effect that the present invention is useful is: using plasma technology coupling chemical absorbing of the present invention removes vikane, and emission gases after treatment reaches discharging standards.This invention is discharged to vikane in atmosphere and has not only protected natural environment with respect to current draft type, has protected that the mankind's is healthy simultaneously.In addition, technological process of the present invention is simple, and operating cost is low, is adapted at on-the-spot use.
Accompanying drawing explanation
Fig. 1 is process device figure of the present invention.
Fig. 2 is spectrogram schematic diagram of the present invention.
Description of reference numerals 1. air inlets, 2. plasma reactor, 3. high voltage source, 4. stainless steel bar (discharge electrode), 5. stainless iron silk screen (earthing pole), 6. reactant air inlet, 7. liquid gas absorption tower, 8. inlet, 9. gas outlet, 10. liquid outlet, 11. circulating pumps, 12. alkali liquid tanks.
The specific embodiment
In order to make object of the present invention, technical scheme and advantage clearer, below in conjunction with for example, the present invention is further elaborated.Should be appreciated that described herein giving an example only in order to explain the present invention, be not intended to limit the present invention.
This plasmon coupling chemical absorbing of the present invention removes the method for vikane, and step is as follows:
1) regulate high voltage source 3, in plasma reactor 3, have stainless steel bar (discharge electrode) 4 and stainless iron silk screen (earthing pole) 5, the interior beginning of plasma reactor 2 discharged;
2), by importing to plasma reactor 2 containing the gas of vikane by air inlet 1, under action of plasma, sulfuryl fluoride gas is discharged and produces high energy electron and clash into and be decomposed to form pernicious gas product and comprise oxysulfide and fluoride gas product;
3) pernicious gas product is imported in liquid gas absorption tower 7 by reactant air inlet 6;
4) the pernicious gas product that vikane decompose to produce is reacted by alkali liquor absorption liquid gas absorption tower 7 is interior, and harmless gas 9 is gone out from gas outlet, and the liquid after absorption is discharged from liquid outlet 10, thus the innoxious sulfuryl fluoride gas that removes;
5) alkali lye is by the absorption that circulates of circulating pump 11, inlet 8, and the alkali lye pH value of controlling alkali liquid tank 12 the insides is greater than 8.
Example 1, adopts line-cartridge reactor as shown in Figure 1 at experiment applying plasma reaction response device, and discharge type adopts dielectric barrier discharge, and Gas-Liquid Absorption tower diameter is 20mm, is highly the packed tower of 740mm, and concentration of lye is 0.1mol/LNaOH solution.Wherein plasma reactor is that 35mm, wall thickness are 2.5mm quartz ampoule by cylinder internal diameter, stainless steel bar discharge electrode, the stainless steel and iron silk screen earthing pole of parcel quartz ampoule and the quartz glass pearl that is filled in the 2-4mm between two discharge electrodes.Gas-chromatography GC9790 and fourier infrared analyzer Nicolet that sulfuryl fluoride gas, plasma discharge gaseous product and the utilization of alkali liquor absorption afterproduct are furnished with FPD detector analyze, gas chromatographic detection sensitivity is 1ppm, lower than discharging standards≤5ppm.
Discharge parameter: crest voltage 12kV, discharge frequency 8.0kHz, discharge length 16mm, discharging distance 7.5mm
Technological parameter: input concentration 0.5% (background gas is air), feed rate 400ml/min
Acquired results is as follows:
Fig. 2 illustrates the infrared spectrum a of vikane charging; Plasma treatment afterproduct spectrogram b; Plasmon coupling chemical absorbing afterproduct spectrogram c.
Consolidated statement 1 and Fig. 2 can find: the mist containing vikane 0.5% under plasma discharge effect is broken down into SO
2, SiF
4and NO
2gaseous product, gaseous product is fixed after reacting by alkali liquor absorption, and vikane can remove completely, reaches harmless discharge.
Finally, it should be pointed out that above example is only the more representational example of the present invention.Obviously, technical scheme of the present invention is not limited to above-mentioned example, can also have many distortion, and all distortion that those of ordinary skill in the art can directly derive or associate from content disclosed by the invention, all should think protection scope of the present invention.
Claims (4)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110445113.9A CN102512926B (en) | 2011-12-27 | 2011-12-27 | Method for removing sulfuryl fluoride by coupling plasma and chemical absorbing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110445113.9A CN102512926B (en) | 2011-12-27 | 2011-12-27 | Method for removing sulfuryl fluoride by coupling plasma and chemical absorbing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102512926A CN102512926A (en) | 2012-06-27 |
| CN102512926B true CN102512926B (en) | 2014-03-12 |
Family
ID=46284146
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110445113.9A Active CN102512926B (en) | 2011-12-27 | 2011-12-27 | Method for removing sulfuryl fluoride by coupling plasma and chemical absorbing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102512926B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104128083B (en) * | 2014-05-30 | 2016-08-17 | 中国石油化工股份有限公司青岛安全工程研究院 | The method of Biotrickling filter couplant barrier discharge degraded foul gas |
| CN109316917B (en) * | 2018-11-13 | 2020-10-27 | 西安交通大学 | An integrated biogas desulfurization device and method |
| CN115138187B (en) * | 2022-06-16 | 2023-04-21 | 深圳市捷晶科技股份有限公司 | Device and process for treating siloxane in VOCs (volatile organic compounds) by low-temperature plasma |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6886573B2 (en) * | 2002-09-06 | 2005-05-03 | Air Products And Chemicals, Inc. | Plasma cleaning gas with lower global warming potential than SF6 |
| CN101972587B (en) * | 2010-08-17 | 2012-07-11 | 浙江工业大学 | A method for harmless treatment of sulfuryl fluoride gas |
-
2011
- 2011-12-27 CN CN201110445113.9A patent/CN102512926B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN102512926A (en) | 2012-06-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Parthiban et al. | Disposal methods, health effects and emission regulations for sulfur hexafluoride and its by-products | |
| CN103791560B (en) | A kind of air cleaning unit | |
| Shi et al. | Recent advances in degradation of the most potent industrial greenhouse gas sulfur hexafluoride | |
| CN102512926B (en) | Method for removing sulfuryl fluoride by coupling plasma and chemical absorbing | |
| CN110624372A (en) | A method for treating VOCs using low-temperature plasma jet | |
| Wang et al. | Deep removal of organic matter in glyphosate contained industrial waste salt by dielectric barrier discharge plasma | |
| CN205340517U (en) | High -efficient low temperature plasma equipment | |
| CN105944530A (en) | Device for treating volatile organic compounds (VOCs) through plasma and ultraviolet light | |
| Zhang et al. | Decomposition of potent greenhouse gases SF6, CF4 and SF5CF3 by dielectric barrier discharge | |
| Yang et al. | Experimental study on the effect of H 2 on the degradation of SF 6 by pulsed dielectric barrier discharge | |
| CN101972587B (en) | A method for harmless treatment of sulfuryl fluoride gas | |
| CN206688482U (en) | A combined exhaust gas purifier | |
| CN109908749B (en) | Multiphase discharge system for catalyzing and cooperatively removing VOCs with different solubilities | |
| CN201750986U (en) | Harmless treatment system using microwave plasmas for decomposing Freon | |
| CN104689692B (en) | Device and method for treating waste gas by air plasma | |
| CN203235390U (en) | Chemical fiber waste gas purification treatment device | |
| CN209968113U (en) | A multiphase discharge system for catalytic synergistic removal of VOCs with different solubility | |
| TW201350191A (en) | Apparatus and method for processing gas | |
| CN204395743U (en) | CIT medicament compartment organic waste gas treatment device | |
| TWM457859U (en) | Air purifying system | |
| CN107344740A (en) | A kind of technique and method of low-temperature plasma processing high-concentration sewage | |
| JP5918590B2 (en) | Method and apparatus for decomposing dioxins in exhaust gas | |
| CN207102275U (en) | Cooking fume control equipment | |
| CN105833675B (en) | A kind of integrated tubular type gas purge system | |
| US20230347395A1 (en) | Method of destruction of organic waste with low content of water |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |