CN102430827B - Vacuum brazing method of plasma cutting electrode - Google Patents
Vacuum brazing method of plasma cutting electrode Download PDFInfo
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- CN102430827B CN102430827B CN 201110302963 CN201110302963A CN102430827B CN 102430827 B CN102430827 B CN 102430827B CN 201110302963 CN201110302963 CN 201110302963 CN 201110302963 A CN201110302963 A CN 201110302963A CN 102430827 B CN102430827 B CN 102430827B
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- plasma cutting
- cutting electrode
- vacuum
- brazing
- heated
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- 238000005219 brazing Methods 0.000 title claims abstract description 51
- 238000005520 cutting process Methods 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims abstract description 29
- 229910000679 solder Inorganic materials 0.000 claims abstract description 34
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 31
- 229910052802 copper Inorganic materials 0.000 claims abstract description 31
- 239000010949 copper Substances 0.000 claims abstract description 31
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims abstract description 21
- 238000001816 cooling Methods 0.000 claims abstract description 5
- 229910052735 hafnium Inorganic materials 0.000 claims description 19
- 238000009413 insulation Methods 0.000 claims description 15
- 238000005476 soldering Methods 0.000 claims description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical group [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 6
- 230000005496 eutectics Effects 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 239000004332 silver Substances 0.000 claims description 6
- 238000001291 vacuum drying Methods 0.000 claims description 5
- 238000003466 welding Methods 0.000 abstract description 4
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 238000010438 heat treatment Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000002950 deficient Effects 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003698 laser cutting Methods 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 208000037656 Respiratory Sounds Diseases 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
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Abstract
本发明公开了一种等离子切割电极的真空钎焊方法，包括：组装等离子切割电极组合件、将组装件放入真空炉、抽真空、分步加热到钎焊温度、钎焊、冷却、出炉，其特征在于：所述的组装等离子切割电极组合件是指将钎料丝和铪丝自下至上依次放入铜套座里，然后将铜套座正置，放在底部为水平面的夹具中。与现有技术相比，本发明的有益效果在于简化了等离子切割电极的真空钎焊工艺，采用真空钎焊方法直接对铜套座和铪丝进行钎焊，使所获得的电极不仅结构简单，成本低，而且表面质量好，焊缝均匀致密，采用电阻法测得电极的电阻率只有(0.03～0.04)×10-6Ω·m。
The invention discloses a vacuum brazing method for a plasma cutting electrode, comprising: assembling a plasma cutting electrode assembly, putting the assembly into a vacuum furnace, vacuuming, stepwise heating to the brazing temperature, brazing, cooling, and taking out of the furnace, It is characterized in that: the assembly of the plasma cutting electrode assembly refers to putting the solder wire and the hafnium wire into the copper sleeve from bottom to top, and then placing the copper sleeve upright and placing it in a fixture whose bottom is a horizontal plane. Compared with the prior art, the invention has the beneficial effect of simplifying the vacuum brazing process of the plasma cutting electrode, directly brazing the copper sleeve and the hafnium wire by adopting the vacuum brazing method, so that the obtained electrode is not only simple in structure, The cost is low, the surface quality is good, the welding seam is uniform and dense, and the resistivity of the electrode measured by the resistance method is only (0.03～0.04)×10 -6 Ω·m.
Description
Technical field
The present invention relates to a kind of vacuum brazing method, specifically, relate to a kind of vacuum brazing method of plasma cutting electrode, belong to the material welding technology field.
Background technology
In industrial production, near the quality of laser cutting, but cost is far below laser cutting aspect the cutting surface quality of material for meticulous plasma cutting technique.Therefore, in recent years, the quantity of digital controlling plasma cutting equipment gathers way very fast in each enterprise.Yet the at present main dependence on import of efficient numerically controlled plasma cutting machines must be bought as annex simultaneously as the crucial consumable accessory electrode of equipment, and it is expensive.And electrode is as the main consumables in the plasma cutting operation, and the length in its service life directly has influence on processing cost and the production efficiency of plasma cutting, and electrode is changed more frequent, and its processing cost is more high, and production efficiency is corresponding just more low.
External plasma cutting electrode is cooperated with the axis body mechanical compaction by copper sheathing seat, silver-colored body and hafnium filament core three and forms, and when heavy current is passed through, has two bed boundary contact resistances and gap thermal resistance, makes radiating effect and conductive effect not good enough.Chinese patent ZL03150716.6 discloses a kind of employing vacuum brazing method oxygen-free copper block set, silver-colored body, hafnium filament has been connected, by brazing member being assembled (as adopting positioning fixture control postweld interval), being placed thread and foil-shaped brazing material, and control soldering processes, the electrode surface quality that obtains is good, non-oxidation, coloured light is bright, the welding even compact, and steady quality, product percent of pass reach more than 98%; Operating mode is used and is shown, the electrode that obtains reaches 500 meters for the cutting ship plate single-piece life-span, than exceed 200 meters of inlet electrode.But, not only there is the expensive problem of pure white silver-colored coolant jacket of use in this technology, and when welding needs itself and copper sheathing seat and hafnium filament are coupled together respectively, also need adopt paper tinsel shape and thread solder during connection, in addition, also need formulate special positioning fixture the joint clearance of brazing is positioned, have complex operation, the defective of plasma cutting electrode assembling unit structure complexity.
Summary of the invention
At existing in prior technology the problems referred to above and defective; the purpose of this invention is to provide that a kind of cost is low, simple to operate, quality is good, be fit to the vacuum brazing method of the plasma cutting electrode of large-scale production, to satisfy the market demand of plasma cutting electrode.
For achieving the above object, the technical solution used in the present invention is as follows:
A kind of vacuum brazing method of plasma cutting electrode, comprise: assemble plasma cutting electrode sub-assembly, assembly is put into vacuum drying oven, vacuumizes, is heated to brazing temperature, soldering step by step, is cooled off, comes out of the stove, it is characterized in that: described assembling plasma cutting electrode sub-assembly refers to put into solder wire and hafnium filament in the copper sheathing seat from bottom to top successively, then the copper sheathing seat is just put, be placed on the bottom in the anchor clamps of horizontal plane.
As preferred version, the fit-up gap of copper sheathing seat and hafnium filament is 0.02～0.05mm.
As preferred version, the diameter of described solder wire and hafnium filament diameter are equal to.
As preferred version, the draw ratio of described solder wire is 0.6～0.8.
As preferred version, described solder wire is silver-bearing copper eutectic solder silk.
As preferred version, being evacuated to vacuum is 1.0 * 10
-2～8 * 10
-3Pa.
As preferred version, described substep is heated to brazing temperature and refers to: be heated to 400～500 ℃ with 15～25 ℃/min earlier, insulation 10～30min; Be heated to 700～770 ℃ with 5～15 ℃/min then, insulation 40～80min; Be heated to brazing temperature with 15～25 ℃/min again.
As preferred version, described brazing temperature is 810～850 ℃.
As preferred version, described soldering refers at brazing temperature insulation 15～40min.
As preferred version, described cooling refers to cool off with stove.
Compared with prior art, beneficial effect of the present invention has been to simplify the vacuum brazing technique of plasma cutting electrode, adopt vacuum brazing method directly copper sheathing seat and hafnium filament to be carried out soldering, make the electrode that obtains not only simple in structure, cost is low, and surface quality is good, the even weld densification, and the resistivity that adopts electric-resistivity method to record electrode has only (0.03～0.04) * 10
-6Ω m.
Description of drawings
Fig. 1 is the structural representation of plasma cutting electrode sub-assembly of the present invention.
Fig. 2 is the main TV structure schematic diagram of anchor clamps described in the embodiment.
Fig. 3 is the plan structure schematic diagram of anchor clamps described in the embodiment.
Among the figure: 1, oxygen-free copper block set; 2, solder wire; 3, hafnium filament; 4, anchor clamps; 41, upper plate; 42, lower plate; 43, support bar; 44, fixing hole; 45, locating hole.
The specific embodiment
The present invention will be further described in detail below in conjunction with drawings and Examples.
The vacuum brazing method of a kind of plasma cutting electrode provided by the invention, comprise: assemble plasma cutting electrode sub-assembly, assembly is put into vacuum drying oven, vacuumizes, is heated to brazing temperature, soldering step by step, is cooled off, comes out of the stove, it is characterized in that: described assembling plasma cutting electrode sub-assembly refers to solder wire 2 and hafnium filament 3 are put into 1 li of copper sheathing seat from bottom to top successively, then copper sheathing seat 1 is just being put, be placed on the bottom in the anchor clamps 4 of horizontal plane (as shown in Figure 1).
Described anchor clamps 4 are made up of upper plate 41, lower plate 42 and four support bars 43, and upper plate 41 is provided with fixing hole 44 and several locating holes 45 of 4 fixed support bars 43, the upper surface of described lower plate 42 is the plane, the external diameter of the internal diameter of described locating hole 45 and copper sheathing seat 1 is complementary (as shown in Figures 2 and 3), places a plasma cutting electrode sub-assembly that assembles in each locating hole.
Because of the fit-up gap of copper sheathing seat and hafnium filament size influence solder the capillary joint filling and and the interaction degree of solder and mother metal, thereby influence compactness and the performance of soldering; The joint clearance of brazing is excessive, and capillarity weakens even disappears, and solder is difficult to fill up the gap; The joint clearance of brazing is too little, hinders solder and fills, and is difficult to form the high joint of ratio of brazing area; Therefore, the fit-up gap of preferably copper block set of the present invention and hafnium filament is 0.02～0.05mm.
Because what of shape, size and the solder amount of solder have certain influence to brazing quality, and the plasma electric pole piece is columned, therefore, the present invention selects brazing wire, diameter and the hafnium filament diameter of preferred solder wire are equal to, and assembling is simple like this, and the solder amount is controlled easily.In addition, the draw ratio of the preferred solder wire of the present invention is 0.6～0.8, and can satisfy solder fills up whole joint clearance of brazing to this solder amount on the one hand, can prevent that on the other hand the solder amount from too much flowing out brazed seam and polluting surface of the work and cause waste etc.
Because the fusing point of silver-bearing copper eutectic solder is moderate, good manufacturability, and have good electrical conductivity, thermal conductivity, intensity and toughness, and therefore, the preferred silver-bearing copper eutectic solder of the present invention silk.
Influence the wetting of solder and brazing member surface state because the vacuum degree is too low, and the too high volatilization that can accelerate metallic element of vacuum, therefore, the preferred vacuum of the present invention is 1.0 * 10
-2～8 * 10
-3Pa.
As preferred version, the present invention carries out the process that substep is heated to brazing temperature and is: be heated to 400～500 ℃ with 15～25 ℃/min earlier, and insulation 10～30min, purpose is impurity and the gas of extracting out in the stove, reduces generation of defects; Be heated to 700～770 ℃ with 5～15 ℃/min then, insulation 40～80min, mainly be to make the temperature of test specimen even this moment; Be heated to brazing temperature with 15～25 ℃/min at last.
The inventor also discovers: brazing temperature is too low or temperature retention time is too short, can cause the solder fusing insufficient, form the cavity in the joint easily, and brazing temperature be too high or the long meeting of temperature retention time causes the more frangible compounds of generation in the joint, even crackle appears, influence the performance of joint.Therefore, brazing temperature of the present invention is preferably 810～850 ℃, at brazing temperature insulation 15～40min, cools off with stove then.
According to Fig. 1, earlier oxygen-free copper block set 1, silver-bearing copper eutectic solder silk 2 (diameter is 2.5mm, highly is 1.6mm), hafnium filament 3 are pressed the fit-up gap assembling of 0.03mm, then the oxygen-free copper block set is just put, be placed on the bottom in the anchor clamps 4 of horizontal plane.
Assembly is put into vacuum drying oven, be evacuated to 8 * 10
-3Pa.
Earlier be heated to 400 ℃ with 20 ℃/min, insulation 20min; Be heated to 750 ℃ with 10 ℃/min again, insulation 60min; Be heated to 840 ℃ with 20 ℃/min again, insulation 20min.
Come out of the stove with the stove cooling, it is full namely to obtain joint filling, and solder does not have the cross flow phenomenon, joint flawless, and the moderate plasma cutting electrode of compound layer thickness, and described plasma cutting electrode only is made up of copper sheathing seat and hafnium filament.
The resistivity that adopts electric-resistivity method to record the electrode that obtains is 0.04 * 10
-6Ω m.
Embodiment 2
According to Fig. 1, earlier oxygen-free copper block set 1, silver-bearing copper eutectic solder silk 2 (diameter is 2.5mm, highly is 1.8mm), hafnium filament 3 are pressed the fit-up gap assembling of 0.05mm, then the oxygen-free copper block set is just put, be placed on the bottom in the anchor clamps 4 of horizontal plane.
Assembly is put into vacuum drying oven, be evacuated to 1 * 10
-2Pa.
Earlier be heated to 400 ℃ with 20 ℃/min, insulation 20min; Be heated to 750 ℃ with 10 ℃/min again, insulation 60min; Be heated to 820 ℃ with 20 ℃/min again, insulation 40min.
Come out of the stove with the stove cooling, it is full namely to obtain joint filling, and solder does not have the cross flow phenomenon, joint flawless, and the moderate plasma cutting electrode of compound layer thickness, and described plasma cutting electrode only is made up of copper sheathing seat and hafnium filament.
The resistivity that adopts electric-resistivity method to record the electrode that obtains is 0.03 * 10
-6Ω m.
In sum, the vacuum brazing technique of plasma cutting electrode of the present invention is simple, and the electrode that obtains is not only simple in structure, and cost is low, and surface quality is good, the even weld densification, and the resistivity that adopts electric-resistivity method to record electrode has only (0.03～0.04) * 10
-6Ω m.
Should be noted that at last: above embodiment only is used for the present invention is further specified; can not be interpreted as limiting the scope of the invention, some nonessential improvement that those skilled in the art's foregoing according to the present invention is made and adjustment all belong to protection scope of the present invention.
Claims (7)
1. the vacuum brazing method of a plasma cutting electrode, comprise: assemble plasma cutting electrode sub-assembly, assembly is put into vacuum drying oven, vacuumizes, is heated to brazing temperature, soldering step by step, is cooled off, comes out of the stove, described assembling plasma cutting electrode sub-assembly refers to put into solder wire and hafnium filament in the copper sheathing seat from bottom to top successively, then the copper sheathing seat is just put, be placed on the bottom in the anchor clamps of horizontal plane; It is characterized in that: described solder wire is silver-bearing copper eutectic solder silk, and the diameter of described solder wire and hafnium filament diameter are equal to; Described substep is heated to brazing temperature and refers to: be heated to 400～500 ℃ with 15～25 ℃/min earlier, insulation 10～30min; Be heated to 700～770 ℃ with 5～15 ℃/min then, insulation 40～80min; Be heated to brazing temperature with 15～25 ℃/min again.
2. the vacuum brazing method of plasma cutting electrode according to claim 1, it is characterized in that: the fit-up gap of copper sheathing seat and hafnium filament is 0.02～0.05mm.
3. the vacuum brazing method of plasma cutting electrode according to claim 1, it is characterized in that: the draw ratio of described solder wire is 0.6～0.8.
4. the vacuum brazing method of plasma cutting electrode according to claim 1, it is characterized in that: being evacuated to vacuum is 1.0 * 10
-2～8 * 10
-3Pa.
5. the vacuum brazing method of plasma cutting electrode according to claim 1, it is characterized in that: described brazing temperature is 810～850 ℃.
6. the vacuum brazing method of plasma cutting electrode according to claim 1 is characterized in that: described soldering refers at brazing temperature insulation 15～40min.
7. the vacuum brazing method of plasma cutting electrode according to claim 1, it is characterized in that: described cooling refers to cool off with stove.
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|---|---|---|---|
| CN 201110302963 CN102430827B (en) | 2011-10-09 | 2011-10-09 | Vacuum brazing method of plasma cutting electrode |
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| CN 201110302963 CN102430827B (en) | 2011-10-09 | 2011-10-09 | Vacuum brazing method of plasma cutting electrode |
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| CN102430827A CN102430827A (en) | 2012-05-02 |
| CN102430827B true CN102430827B (en) | 2013-08-07 |
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Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103121143A (en) * | 2013-03-20 | 2013-05-29 | 安徽西锐重工科技有限公司 | Plasma cutting welding torch electrode and manufacturing method thereof |
| CN103394798A (en) * | 2013-07-31 | 2013-11-20 | 常州特尔玛枪嘴有限公司 | Brazing type plasma electrode and manufacturing method thereof |
| CN104722902B (en) * | 2015-03-31 | 2016-08-03 | 常州特尔玛枪嘴有限公司 | A kind of novel soldering formula plasma electrode and manufacture method thereof |
| CN108237278B (en) * | 2016-12-23 | 2019-12-13 | 桂林金格电工电子材料科技有限公司 | welding method of copper-molybdenum electrode |
| CN108237281B (en) * | 2016-12-23 | 2019-12-13 | 桂林金格电工电子材料科技有限公司 | Welding method of silver-tungsten electrode |
| CN108237280B (en) * | 2016-12-23 | 2019-12-13 | 桂林金格电工电子材料科技有限公司 | Welding method of copper-tungsten electrode |
| CN108237284B (en) * | 2016-12-23 | 2019-12-13 | 桂林金格电工电子材料科技有限公司 | Welding method of silver-molybdenum electrode |
| CN108723533A (en) * | 2017-10-26 | 2018-11-02 | 南京佑天金属科技有限公司 | A kind of ultrasonic wave assisted plasma cutting electrode vacuum soldering method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1187931A (en) * | 1995-04-19 | 1998-07-15 | 株式会社小松制作所 | Electrode for plasma arc torch |
| CN1493430A (en) * | 2003-09-03 | 2004-05-05 | 上海市机械制造工艺研究所 | Plasma cutting electrode vacuum soldering method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100478140B1 (en) * | 2000-11-02 | 2005-03-22 | 재단법인 포항산업과학연구원 | Method for Manufacturing Plasma Cutting Electrode |
| US6657153B2 (en) * | 2001-01-31 | 2003-12-02 | The Esab Group, Inc. | Electrode diffusion bonding |
| KR100750809B1 (en) * | 2005-10-07 | 2007-08-27 | 김태홍 | Electrode for Plasma Cutting and Manufacturing Method Thereof |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1187931A (en) * | 1995-04-19 | 1998-07-15 | 株式会社小松制作所 | Electrode for plasma arc torch |
| CN1493430A (en) * | 2003-09-03 | 2004-05-05 | 上海市机械制造工艺研究所 | Plasma cutting electrode vacuum soldering method |
Non-Patent Citations (2)
| Title |
|---|
| TU2无氧铜与铪的真空钎焊;骆晓萌等;《热加工工艺》;20100315;第39卷(第5期);第141-147页 * |
| 骆晓萌等.TU2无氧铜与铪的真空钎焊.《热加工工艺》.2010,第39卷(第5期),第141-147页. |
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