CN102424957B - Multi-layer product support for vapor deposition, and chemical vapor deposition reaction chamber - Google Patents

Abstract

The invention relates to a multi-layer product support for vapor deposition and a chemical vapor deposition reaction chamber. The multi-layer product support includes a unit layer composed of a circular sleeve, an air distribution plate and a support rod; the structure of the unit layer is that the air distribution plate is placed on the circular sleeve, and the support rod is fixed upright on the air distribution plate for support For the substrate to be coated, place the circular sleeve of another unit layer on the gas distribution plate of one unit; the upper part of the circular sleeve wall is symmetrically provided with two notches to facilitate gas circulation. In the chemical vapor deposition reaction chamber, the multi-layer product support is placed on the gas distribution plate on the gas inlet in the chamber, the gas inlet is located at the bottom of the reaction chamber, and the gas outlet is located at the top of the reaction chamber opposite to the gas inlet. The quality of the coating products produced by using the multi-layer product bracket of the invention is uniform, and the quantity increases several times, thereby improving the production efficiency.

Description

A multi-layer product support for vapor deposition and chemical vapor deposition reaction chamber

technical field

The invention relates to a production fixture in a gas phase deposition chamber, in particular to a multilayer product support and a chemical vapor deposition reaction chamber for production in a gas phase deposition furnace with a multilayer structure.

Background technique

The chemical vapor deposition (CVD) method is considered to be the most promising coating preparation method for SiC because of its excellent adaptability to parts with complex shapes and internal surfaces, and the coating can be prepared at relatively low temperatures .

The application number filed by Xinwang Magnetic Materials Co., Ltd. on September 29, 1999 is 200510004777.6, and the name is "product support used in vapor deposition equipment". The product holder is mainly used to support planar samples. The product holder of the present invention includes a tubular body whose inner diameter is sized to hold the product. The body is made of stainless steel wire. An intermediate portion comprising a small diameter helical spring wound around a coil of the body having the coils disposed therein in spaced relationship to expose an article held in the article holder for surface viewing from outside the holder. deal with.

When producing silicon carbide coated products, the product to be coated is placed in the reaction chamber through the support of the bracket, and the gas reacts to form a silicon carbide coating on the surface of the product to be coated, so the quality and quantity of the production of silicon carbide coated products depend on In other words, proper bracket design and space placement are particularly important. At present, most of them focus on the single-layer fixture design that can not only ensure the coating quality, but also increase the number of products. However, due to the influence of objective conditions such as the diameter of the furnace, the increase in output is very limited by simply adding brackets. Generally speaking, the design and use of fixtures with various single-layer structures, the number of products is still small in single furnace production, the production efficiency is low, and the production cost is high.

Contents of the invention

Aiming at the deficiencies of the prior art, the invention provides a multi-layer product support for chemical vapor deposition.

The present invention also provides a chemical vapor deposition reaction chamber utilizing the above-mentioned multilayer article support.

The present invention also provides a method for preparing a silicon carbide coated product using the above-mentioned multi-layer product support.

Terminology Explanation:

Articles refer to workpieces that are coated or thin-film grown by chemical vapor deposition. The present invention mainly includes graphite substrates or substrates coated with silicon carbide, but is not limited thereto.

The product support, also known as the workpiece frame or fixture in production, is a supporting device placed in the chemical vapor deposition reaction chamber to carry the substrate to be coated.

Technical scheme of the present invention is as follows:

A multilayer product support for chemical vapor deposition, including a unit layer composed of a circular sleeve, a gas distribution disc and a support rod; the structure of the unit layer is that the gas distribution disc is placed on the circular sleeve, and the support rod is fixed upright on the The gas distribution plate is used to support the substrate to be coated, and a circular sleeve of another unit layer is placed on the gas distribution plate of one unit; wherein, the upper part of the wall of the circular sleeve is symmetrically provided with two notches to facilitate gas circulation; The pole has a pointed end.

Preferably according to the present invention, the outer diameter of the circular sleeve is the same as the diameter of the air distribution disc. It is convenient to arrange layer by layer combination of unit layers. The number of unit layers is determined according to the size of the chemical vapor deposition reaction chamber and the number of products produced in one furnace.

The gas distribution disc is a graphite disc provided with through holes, and the through holes are gas flow passages for uniformly dispersed gas.

The number and placement of the fixed poles on the gas distribution plate are determined according to the number, shape and size of the substrates to be coated, and the goal is to fix and support as many substrates as possible with as few tungsten needles as possible. Preferably, 3 to 6 struts support one substrate, and most preferably, 3 struts support one substrate.

The height of the circular sleeve is required to be 20-50mm from the top of the substrate to the air distribution plate of another unit layer after the support rod is fixed on the air distribution plate to support the substrate.

Preferably according to the present invention, the strut is a tungsten needle. The bottom end of the tungsten needle is fixed in the concave hole on the gas distribution plate, and the top end of the tungsten needle is in the shape of a needle point.

Preferably according to the present invention, the circular sleeve is made of graphite and has a wall thickness of 6-8mm.

Preferably, according to the present invention, the shape of the recess on the upper part of the circular sleeve wall is arc, rectangle, square or cone.

Preferably according to the present invention, the multilayer substrate support for chemical vapor deposition consists of 3-5 unit layers.

A chemical vapor deposition reaction chamber, comprising a reaction chamber cavity and the multi-layer product support of the present invention, the multi-layer product support is placed on the gas distribution plate on the air inlet in the chamber, the air inlet It is located at the bottom of the reaction chamber, and the gas outlet is opposite to the air inlet at the top of the reaction chamber.

The chemical vapor deposition reaction chamber mentioned above is a low-pressure chemical vapor deposition equipment.

The multilayer article support of the present invention can be used in the production of various coated articles by chemical vapor deposition. Especially for the production of graphite substrate silicon carbide coated products, it can greatly improve production efficiency.

A high-efficiency production method for silicon carbide coated products, including using the multi-layer product support of the present invention, placing the multi-layer product support on the gas distribution plate on the air inlet in the cavity of the vapor deposition reaction chamber On the top, the substrate to be coated is placed on the tip of the support rod, and a substrate to be coated is supported by 3 to 4 support rods. The raw material gas enters from the bottom of the reaction chamber, and the reacted gas is discharged from the top of the reaction chamber.

The raw material gases are SiCl ₄ and H ₂ . The reaction chamber temperature is 1300-1600°C. A large number of silicon carbide coated products can be produced in one furnace.

The excellent effects of the present invention are as follows:

The structure of the multi-layer product support of the present invention is simple and reasonable, and the layers are combined, and can be flexibly combined and used according to the size of the reaction chamber. When the multi-layer product support is used, it is located in the constant temperature zone of the reaction chamber, and the production conditions of each layer are basically the same, which can ensure the uniform product quality of each layer.

The tungsten needle is preferred in the multi-layer product support of the present invention to directly contact the substrate to be coated, and the substrate to be coated is placed on the tip of the top of the tungsten needle, so that the product to be coated is exposed except for at least 3 very small support points. It can be coated in the atmosphere, which can ensure the complete and uniform coating. In addition, the tungsten needle has high hardness and good load bearing, and the space occupied by the needle tip is also small; the tungsten needle has good high temperature resistance, and will not react or melt under the high temperature condition in the reaction chamber.

Using the multi-layer product support of the present invention to produce coated products, the number of coated products in one furnace can be several times that of traditional devices, which greatly improves production efficiency, reduces production costs, and reduces the cost of multiple operations. Trouble and waste of manpower and resources. It can double the number of products produced in one furnace while ensuring product quality.

The multi-layer product support of the present invention has a multi-layer design in one furnace, which greatly improves production efficiency and cost saving, and can be applied to the production of various coated products.

Description of drawings

Fig. 1 is a schematic diagram of the structure of the multi-layer product support of the present invention.

Fig. 2 is a top view of the circular sleeve of the multi-layer product support of the present invention.

Fig. 3 is a schematic diagram of the structure of a chemical vapor deposition reaction chamber using the multi-layer product support of the present invention.

In the figure: 1. Round sleeve, 2. Air distribution plate, 3. Strut (tungsten needle), 4. Substrate to be coated (product), 5. Notch, 6. Through hole on the air distribution plate; 7. The cavity of the reaction chamber, 8. the air distribution plate on the air inlet, 9. the air inlet, and 10. the air outlet.

Concrete example method

The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but is not limited thereto.

Embodiment 1,

A kind of multi-layer product support for chemical vapor deposition, the structure is shown in Figure 1, Figure 2, comprises the unit layer that is made up of circular sleeve 1, gas distribution plate 2 and strut 3; The structure of described unit layer is gas distribution The disk 2 is placed on the circular sleeve 1, and the outer diameter of the circular sleeve 1 is the same as that of the gas distribution disk 2. The support rod 3 is fixed upright on the air distribution plate 2, and the circular sleeve 1 of another unit layer is placed on the air distribution plate 2 of one unit layer, and a total of 3 unit layers are arranged layer by layer; wherein, the circular sleeve The upper part of the wall of cylinder 1 is symmetrically provided with two rectangular notches 5 as gas circulation channels; the support rod is a tungsten needle, and the bottom end of the tungsten needle is fixed in the concave hole on the gas distribution plate. The substrate on which the product is placed.

The gas distribution disc 2 is a graphite disc with through holes, which is made according to the prior art. The tungsten needles fixed on the gas distribution plate 2 are supported by 3 tungsten needles for each substrate, and the arrangement of the tungsten needles is determined according to the shape and quantity of the substrate to be coated.

The circular sleeve 1 is made of graphite with a wall thickness of 7 mm. The height requirement is that after the tungsten needle is fixed on the gas distribution plate to support the substrate, the top of the substrate is 30 mm away from the gas distribution plate of another unit layer.

Embodiment 2,

A chemical vapor deposition multilayer product support, as described in Example 1, the difference is that there are 4 unit layers; wherein, the upper part of the wall of the circular sleeve 1 is symmetrically provided with two arc-shaped notches as A gas circulation channel; the tungsten needles fixed on the gas distribution plate are supported by 4 tungsten needles per substrate. The circular sleeve is made of graphite, with a wall thickness of 8 mm, and the height is 25 mm from the top of the substrate to the gas distribution plate of another unit layer after the tungsten needle is fixed on the gas distribution plate to support the substrate.

Embodiment 3,

A chemical vapor deposition reaction chamber, comprising a reaction chamber cavity 7 and the multilayer product support described in Embodiment 1, the multilayer product support is placed on the gas distribution plate 8 on the air inlet 9 in the chamber Above, the gas inlet 9 is located at the bottom of the reaction chamber, and the gas outlet 10 is located at the top of the reaction chamber relative to the gas inlet 9 . It is used as a chemical vapor deposition equipment with a vacuum degree of 200-5000 Pa.

Embodiment 4,

A method for high-yield silicon carbide coated products, comprising using the multi-layer product support of the present invention and the chemical vapor deposition reaction chamber described in Example 3, placing the multi-layer product support in the reaction chamber cavity On the gas distribution plate on the gas inlet, the substrate 4 to be coated is placed on the tip of the tungsten needle, the raw material gas enters from the bottom of the reaction chamber, and the reacted gas is discharged from the top of the reaction chamber. The raw material gas is SiCl ₄ and H ₂ with a volume ratio of 1:5-50, the temperature of the reaction chamber is 1300-1600° C., and the vacuum degree in the reaction chamber is 200-5000 Pa. The specific operation is as follows:

First place a circular sleeve 1 on the furnace arranged in the reaction chamber, and then place the disc-shaped gas distribution plate 2 on the circular sleeve 1. Since the diameters are the same, it is easier to place it. Fix the tungsten needle support rod in advance, and then place the graphite substrate 4 to be coated on the tip of the tungsten needle 3. Three tungsten needles support one substrate, so that the graphite substrate is suspended in the space except for three small support points. , the comprehensive coverage of easy reaction deposition; after the first layer is arranged, another layer of circular sleeve is placed on the first layer of gas distribution plate 2, and then the second layer of pre-fixed tungsten needles is placed The method of placing the gas distribution plate and the graphite substrate is the same as that of the first layer. Repeat the above operations to place the third layer of units, so that the combination of multi-layer structures can be realized. The specific number of unit layers depends on the size of the product and the space in the furnace. After the substrate is placed, the gas circulation will not be hindered, and the airflow density of each layer structure is uniform. At the same time, because it is placed in a temperature uniform area, the temperature consistency of each layer structure is also guaranteed. The guarantee of production parameters is also the guarantee of product quality, which ensures the high efficiency of production and the reliability of quality.

Compared with single-layer structure fixtures, the quality of products produced by multi-layer structure product brackets is uniform, and the quantity is increased several times, which greatly improves production efficiency, saves energy and time, and reduces production costs.

Claims (10)

1. A chemical vapor deposition multilayer product support is characterized in that comprising a unit layer made up of a circular sleeve, an air distribution disc and a pole; the structure of the unit layer is that the gas distribution disc is placed on the circular sleeve, The poles are fixed upright on the air distribution plate to support the substrate to be coated, and the circular sleeve of another unit layer is placed on the air distribution plate of one unit; wherein, the upper part of the circular sleeve wall is symmetrically provided with two recesses. The mouth facilitates gas circulation; the strut has a pointed end. 2. The multi-layer product support according to claim 1, wherein the outer diameter of the circular sleeve is the same as the diameter of the air distribution disc. 3 . The multi-layer product support according to claim 1 , wherein the gas distribution disc is a graphite disc provided with through holes. 4 . 4. The multi-layer product support according to claim 1, wherein the height of the circular sleeve is 20-50mm from the top of the substrate to another layer of the air distribution plate after the support rod is fixed on the air distribution plate to support the substrate. 5. The multi-layer product support according to claim 1, wherein the support rod is a tungsten needle. 6 . The multi-layer product support according to claim 1 , wherein the circular sleeve is made of graphite and has a wall thickness of 6-8 mm. 7. The multi-layer product support according to claim 1, characterized in that, the shape of the notch on the upper part of the circular sleeve wall is arc, rectangle, square or cone. 8. The multi-layer product support according to claim 1, characterized in that, the multi-layer product support consists of 3-5 unit layers. 9. A chemical vapor deposition reaction chamber, comprising the multi-layer product support and the reaction chamber cavity according to any one of claims 1-8, the multi-layer product support is placed on the air inlet cloth on the air inlet in the chamber On the gas plate, the air inlet is located at the bottom of the reaction chamber, and the air outlet is located at the top of the reaction chamber opposite to the air inlet. 10. A method for producing a silicon carbide coated product, comprising using the multi-layer product support according to any one of claims 1-8, and placing the multi-layer product support on the air inlet in the cavity of the vapor deposition reaction chamber Place the substrate to be coated on the tip of the support rod on the air inlet and gas distribution board, and 3 to 4 support rods support a substrate to be coated. The raw material gas enters from the bottom of the reaction chamber, and the reacted gas is discharged from the top of the reaction chamber.

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