CN102419480B - Two-stage beam shrinkage system based on photonic crystal resonant cavity and manufacturing method for two-stage beam shrinkage system - Google Patents

Abstract

The invention relates to a two-stage beam shrinkage system based on a photonic crystal resonant cavity and a manufacturing method thereof. The system is composed of a W7-type photonic crystal waveguide, a photonic crystal resonant cavity, a W1-type photonic crystal waveguide and a nanowire waveguide arranged in close order; the photonic crystal The resonant cavity is formed by adding point defects in the photonic crystal, and a row of dielectric columns is distributed at the junction of the photonic crystal resonator and the W7-type photonic crystal waveguide, and the row of dielectric columns constitutes the coupling area; the junction of the photonic crystal resonator and the W1-type photonic crystal waveguide , and one or more coupling medium columns are distributed corresponding to the point defects; the whole system is integrated on a substrate. The present invention adopts a two-stage compression structure, so that the light beam is compressed twice by one-stage compression and two-stage compression, so as to achieve a higher compression ratio and a smaller exit spot, high coupling efficiency, and low loss of optical information propagating between devices; In addition, compared with the graded waveguide, the volume of the device is greatly reduced, and the integration degree of the device is improved.

Description

Two-stage beam shrinkage system based on photonic crystal resonator and its manufacturing method

Technical field:

The invention belongs to the field of optical technology, and relates to a microstructure photonic crystal element, in particular to a two-stage beam shrinkage system based on a photonic crystal resonant cavity and a manufacturing method thereof.

Background technique:

Photonic crystals are artificial microstructures formed by substances with different dielectric constants arranged periodically in space. In recent years, optoelectronic functional devices based on photonic crystal materials have received extensive attention. Photonic crystal optoelectronic devices such as photonic crystal waveguides, filters, optical switches, and couplers have been used The report has laid a good foundation for the realization of large-scale optoelectronic integration and all-optical networks in the future.

Photonic crystals are artificial microstructures formed by periodic arrangements of media with different refractive indices. When electromagnetic waves propagate in them due to Bragg scattering, the electromagnetic waves will be modulated to form an energy band structure. This energy band structure is called photonic energy band. There may be a band gap between the photon energy bands, that is, the photonic band gap. Since no state exists in the bandgap, electromagnetic waves whose frequency falls in the bandgap are forbidden to propagate. If a dielectric defect or dielectric disorder is introduced into the photonic crystal, photon localization will occur, and a corresponding defect energy level will be formed in the photonic band gap, and light of a specific frequency can appear in this defect energy level. By introducing defects into the complete two-dimensional photonic crystal, destroying the photonic band gap and introducing defect states, it can be used to make two-dimensional photonic crystal functional devices. Introducing a line defect into a two-dimensional photonic crystal is to remove several rows of dielectric columns, then the electromagnetic wave of the corresponding frequency can only propagate in this line defect, and the line defect will rapidly decay when it leaves the line defect. to fabricate photonic crystal waveguides. Different from the internal reflection principle of traditional optical waveguides, the basic principle of photonic crystal waveguides is the resonance matching of defect modes in different directions. Therefore, theoretically, photonic crystal waveguides are not limited by the rotation angle, and the bending loss is extremely small, which can be used to make low-loss turning waveguides.

However, if you want to integrate existing photonic crystal devices on the same substrate, you will face many difficulties such as different light widths between devices and low coupling efficiency. Focused beam shrinking system is of great significance to the integration of multiphotonic crystal functional devices. The main technical parameters of the attenuator system are spot size, compression ratio and transmission efficiency. The compression rate refers to the ratio of the half-height width of the incident beam to the outgoing beam, and the larger the value, the better according to the design requirements. The transmission efficiency is the ratio of the light intensity at the output end to the input end, and the transmission efficiency directly affects the efficiency of the system. The graded waveguide can realize device connection and control the beam, however, the change of the width of the graded waveguide will cause serious reflection loss and mode mismatch, thereby affecting the transmission efficiency. Therefore, the tapered angle of the tapered waveguide is usually relatively small and the length is long, so it is difficult to reduce the volume and apply it to optoelectronic integration and all-optical networks. In order to reduce the loss caused by the width change, some studies propose to introduce a parabolic lens or a Galilean telescope optical system to increase the gradient angle so that the beam width can be controlled at a smaller length. But at the same time, the introduction of optical devices will complicate the structure of the graded waveguide and reduce the integration of the device. In addition, at the sub-micron scale of photonic crystal devices in the optical communication band, the diffraction effect of geometric optical devices is very obvious, which limits the application of the above two methods. Therefore, there is an urgent need for a beam shrinkage system that can adjust the beam at the submicron scale and has high transmission efficiency to achieve low-loss coupling transmission of optical information between devices.

Invention content:

A technical problem to be solved by the present invention is to provide a two-stage contraction system based on photonic crystal resonators that can adjust the light beam at the submicron scale, has high transmission efficiency, and can realize low-loss coupling transmission of optical information between devices. beam system.

In order to solve the above-mentioned technical problems, the two-stage beam shrinkage system based on the photonic crystal resonator of the present invention is composed of a W7 type photonic crystal waveguide, a photonic crystal resonator, a W1 type photonic crystal waveguide and a nanowire waveguide arranged in close order; the photonic crystal resonator It is formed by adding point defects in the photonic crystal, and a row of dielectric pillars is distributed at the junction of the photonic crystal resonator and the W7-type photonic crystal waveguide, and the row of dielectric pillars constitutes the coupling area; the junction of the photonic crystal resonator and the W1-type photonic crystal waveguide, and One or more coupling medium columns are distributed at the corresponding positions of the point defects; the whole system is integrated on a substrate.

The radius of the dielectric column constituting the main structure of the W7-type photonic crystal waveguide, the photonic crystal resonant cavity and the W1-type photonic crystal waveguide is r.

The defect region of the W7-type photonic crystal waveguide is composed of a dielectric column with a radius of _r1 , and _r1 is larger or smaller than r.

The point defect in the photonic crystal resonant cavity is composed of one or more dielectric columns with a radius _r3 , where _r3 is larger or smaller than r.

The point defect can also be a gap formed by removing one or more dielectric pillars in the photonic crystal.

The radius of the dielectric column in the coupling region of the photonic crystal resonator cavity is r ₂ , and r ₂ is larger or smaller than r.

The radius of the coupling medium column of the photonic crystal resonator is r ₄ , and r ₄ is larger or smaller than r.

In the present invention, the optical widths of the W7-type photonic crystal waveguide, the W1-type photonic crystal waveguide and the nanowire waveguide are different, especially the difference in the optical width between the W7-type photonic crystal waveguide and the nanowire waveguide is relatively large. For the W1 type photonic crystal waveguide in the communication band, its optical width is several hundred nanometers, which is relatively close to the optical width of the nanowire waveguide. Therefore, the present invention uses the W1 type photonic crystal waveguide and the photonic crystal resonator as an intermediary, and the W7 The photonic crystal waveguide is connected with the nanowire waveguide, that is, the control of the beam width is realized by two times of compression. The first-stage compression part is composed of a W7-type photonic crystal waveguide, a photonic crystal resonator and a W1-type photonic crystal waveguide, and the second-stage compression part is composed of a W1-type photonic crystal waveguide and a nanowire waveguide. The primary and secondary constricted beams are connected by a W1-type photonic crystal waveguide. Since the light-passing widths of the W7-type photonic crystal waveguide, the W1-type photonic crystal waveguide, and the nanowire waveguide decrease sequentially, as long as the efficient coupling between the three is realized, the micro-control of the beam width can be realized.

The invention has the advantage of adopting a two-stage compression structure, so that the light beam undergoes one-stage compression and two-stage compression twice, so as to achieve a higher compression ratio and a smaller exit spot. In particular, a photonic crystal resonator is used as an intermediary to connect the W7-type photonic crystal waveguide to the W1-type photonic crystal waveguide. A line of dielectric columns is distributed at the junction of the photonic crystal resonator and the W7-type photonic crystal waveguide as a coupling area. The photonic crystal resonator and the W1-type photonic crystal waveguide Coupling dielectric columns are distributed at the junction of the W1-type photonic crystal waveguide and corresponding to the point defect, which greatly improves the coupling efficiency, and the loss of optical information propagating between devices is low. In addition, compared with the graded waveguide, the invention greatly reduces the volume of the device and improves the integration of the device.

Another technical problem to be solved by the present invention is to provide a manufacturing method of a two-stage beam shrinkage system based on a photonic crystal resonator.

In order to solve the above technical problems, the fabrication method of the photonic crystal resonator-based two-stage beam shrinkage system of the present invention forms a beam shrinkage system structure by fabricating strontium titanate dielectric column arrays and strontium titanate nanowire waveguides on the substrate.

The specific production process is as follows:

The first step is to prepare the scribing groove required for scribing;

The second step is to prepare the photoresist mask required for ICP etching strontium titanate dielectric column array and strontium titanate nanowire waveguide;

The third step is to use the ICP photoresist mask structure prepared in the second step to perform ICP etching to make the main structure of the two-stage beam shrinkage system based on the photonic crystal resonator;

The fourth step is to separately process the dielectric column that requires a dimensional accuracy higher than 10nm;

The fifth step is to remove the edge region of the device structure.

The first step is to prepare the scribing groove required for scribing;

(A) cleaning the base of the silicon dioxide buried layer grown on the substrate silicon;

(B) Utilizing the sol-gel method to prepare a layer of strontium titanate thin film on the silicon dioxide buried layer;

(C) making a photoresist film on the strontium titanate thin film;

(D) putting the completed structure of step (C) into an oven for drying;

(E) UV exposure is carried out to the photoresist film to obtain the same pattern as the photolithography plate required for etching the scribe groove;

(F) After developing and hardening the film, the photoresist mask structure required for making the scribe groove is obtained;

(G) carry out ICP etching to the photoresist mask structure that step (F) makes, then remove photoresist film and obtain the scribe structure with scribe groove;

The second step is to prepare the photoresist mask required for ICP etching strontium titanate dielectric column array and strontium titanate nanowire waveguide;

(H) making a layer of photoresist film on the scribe structure with the scribe groove prepared in step (G);

(1) putting the structure prepared in step (H) into an oven before drying;

(J) Carrying out electron beam exposure to the prepared photoresist film;

(K) After development and film hardening, the ICP photoresist mask structure required for making strontium titanate dielectric column arrays and strontium titanate nanowire waveguides is obtained;

The third step is to use the ICP photoresist mask structure prepared in the second step to perform ICP etching to make the main structure of the two-stage beam shrinkage system based on the photonic crystal resonator;

(L) performing ICP etching on the ICP photoresist mask structure prepared in step (K), to obtain strontium titanate dielectric column arrays and strontium titanate nanowire waveguides;

(M) removing the photoresist on the strontium titanate dielectric column array and the strontium titanate nanowire waveguide, and cleaning;

The fourth step is to separately process the dielectric column that requires a dimensional accuracy higher than 10nm;

(N) coating a layer of photoresist on the structure obtained in step (M) as a protective layer;

(0) Optically exposing and developing the prepared photoresist to obtain a photoresist mask structure, exposing the area where the strontium titanate dielectric column to be processed is located;

(P) process the strontium titanate dielectric column to be processed by using the FIB process to make it reach the required size, and remove the photoresist;

The fifth step is to remove the edge region of the device structure;

(Q) coating the PMMA layer on the device structure surface that step (P) obtains;

(R) Carrying out synchrotron radiation X-ray exposure and development to the PMMA layer, and making a protective layer on the device structure;

(S) Scribing according to the scribing groove to obtain the main structure of the two-stage beam shrinking system device based on a photonic crystal resonator composed of a strontium titanate dielectric column array and a strontium titanate nanowire waveguide;

(T) put the device structure of the two-stage attenuation system based on the photonic crystal resonator obtained in step (S) into a grinding machine, and use different grinding fluids or polishing fluids for side grinding and polishing, remove the edge area and make The side of the device structure is flat.

The invention applies electron beam exposure plus ICP etching and FIB etching methods to process, so that the photonic crystal two-stage shrinkage system has the advantages of high processing precision, good focusing effect, low surface roughness, etc., and solves the problems caused by high roughness. The problem of large scattering is brought about. Combining synchrotron radiation X-ray lithography technology with grinding and polishing technology for edge area removal and side trimming can effectively protect the multi-level two-dimensional photonic crystal beam shrinkage system structure during the process of edge area removal.

Description of drawings:

The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

FIG. 1 is a schematic plan view of a main body of a two-stage beam shrinkage system based on a photonic crystal resonator according to the present invention.

Figure 2 is a schematic diagram of the two-stage compression section.

FIG. 3 is a schematic diagram of a photolithography plate required for etching a scribe groove.

4a-4g are schematic diagrams of the process for preparing scribe grooves required for scribing.

5a-5f are schematic diagrams of the process for preparing the strontium titanate medium column.

6a to 6f are schematic diagrams of the process for processing dielectric columns that require a dimensional accuracy higher than 10 nm.

7a-7e are schematic diagrams of the process of removing the edge region of the device structure.

Detailed ways:

As shown in Figures 1 and 2, the two-stage beam shrinkage system based on photonic crystal resonators of the present invention is arranged closely in sequence by a W7-type photonic crystal waveguide 4, a photonic crystal resonator 5, a W1-type photonic crystal waveguide 6, and a nanowire waveguide 7. Composition; the photonic crystal resonator 5 is formed by adding point defects 14 in the photonic crystal, and a row of dielectric columns 13 is distributed at the joint between the photonic crystal resonator 5 and the W7-type photonic crystal waveguide 4, and the row of dielectric columns constitutes a coupling area; the photonic crystal resonator One or more coupling medium pillars 15 are distributed at the connection between the cavity 5 and the W1-type photonic crystal waveguide, and corresponding to the point defects 14; the whole system is integrated on a substrate.

The electromagnetic wave (1550nm) of the characteristic frequency is incident from the W7 photonic crystal waveguide on the left side. After the coupling effect of the high-quality photonic crystal resonator, the beam is coupled from the W7 photonic crystal waveguide to the W1 photonic crystal waveguide. Since the W1 photonic crystal waveguide is connected The size of the optical aperture is smaller than that of the W7 photonic crystal waveguide, and the light beam completes one-stage compression. The beam in the W1-type photonic crystal waveguide is efficiently coupled by the W1-type photonic crystal waveguide and the nanowire waveguide, and is emitted from the nanowire waveguide with a smaller optical aperture to complete the secondary compression of the beam.

The optical widths of W7-type photonic crystal waveguide, W1-type photonic crystal waveguide and nanowire waveguide are different, especially the difference in optical width between W7-type photonic crystal waveguide and nanowire waveguide is large. For the W1 type photonic crystal waveguide in the communication band, its optical width is several hundred nanometers, which is relatively close to the optical width of the nanowire waveguide. Therefore, the present invention uses the W1 type photonic crystal waveguide and the photonic crystal resonator as an intermediary, and the W7 The photonic crystal waveguide is connected with the nanowire waveguide, that is, the control of the beam width is realized by two times of compression. The two-stage photonic crystal compression system consists of two parts: one-stage compression and two-stage compression. The one-stage compression consists of W7 photonic crystal waveguide, photonic crystal resonator and W1 photonic crystal waveguide, and the second stage compression consists of W1 photonic crystal waveguide. and nanowire waveguides. The primary and secondary constricted beams are connected by a W1-type photonic crystal waveguide. Since the light-passing widths of the W7-type photonic crystal waveguide, the W1-type photonic crystal waveguide, and the nanowire waveguide decrease sequentially, as long as the efficient coupling between the three is realized, the micro-control of the beam width can be realized.

The radius of the dielectric pillar 11 constituting the main structure of the W7-type photonic crystal waveguide 4 , the photonic crystal resonant cavity 5 and the W1-type photonic crystal waveguide 6 is r. A row of coupling region dielectric pillars 13 with a radius of _r2 is distributed at the junction of the photonic crystal resonator 5 and the W1-type photonic crystal waveguide 4; the point defect 14 in the photonic crystal resonator is composed of a dielectric pillar with a radius of _r3 ; the photonic crystal resonator At the joint between the cavity 5 and the W1-type photonic crystal waveguide, and corresponding to the point defect 14, there is a coupling dielectric column 15, the radius of the coupling medium column is _r4 ; the width of the nanowire waveguide W=140nm, the point defect in the photonic crystal cavity The distance between 14 and the nanowire waveguide 7 is d=1.05 μm.

When r=102nm, r ₁ =51nm, r ₂ =35nm, r ₃ =75nm, the beam shrinking system has an output efficiency of 93.1%.

When r=102nm, r ₁ =51nm, r ₂ =45nm, r ₃ =r ₄ =57nm, the output efficiency can reach 91.87%;

When r=102nm, r ₁ =51nm, r ₂ =170nm, r ₃ =r ₄ =205nm, the output efficiency is 90.45%;

When r=102nm, r ₁ =51nm, r ₂ =55nm, r ₃ =r ₄ =235nm, the output efficiency is 85.6%;

When r=102nm, r ₁ =51nm, r ₂ =67nm, r ₃ =r ₄ =228nm, the output efficiency is 87.5%;

When r=102nm, r ₁ =51nm, r ₂ =40nm, r ₃ =r ₄ =80nm, the output efficiency is 92.32%;

When r=102nm, r ₁ =51nm, r ₂ =82nm, r ₃ =r ₄ =160nm, the output efficiency is 90.49%;

When r=102nm, r ₁ =51nm, r ₂ =105nm, r ₃ =r ₄ =82nm, the output efficiency is 85.68%;

When r=102nm, r ₁ =51nm, r ₂ =95nm, r ₃ =r ₄ =75nm, the output efficiency is 80.25%.

In order to achieve the purpose of shrinking the beam, the present invention utilizes the high-efficiency coupling of the W7 photonic crystal waveguide, the high-quality photonic crystal cavity and the W1 photonic crystal waveguide to compress the light beam. During the production process, it is required to optimize the radii of the W7-type photonic crystal waveguide defect region dielectric pillar, the coupling region dielectric pillar of the photonic crystal resonator, the dielectric pillar constituting point defects, and the coupling dielectric pillar in the complete photonic crystal structure. Wherein, the dielectric columns on the main body of the attenuation system are all strontium titanate dielectric columns, and the strontium titanate dielectric columns are prepared on the substrate. The strontium titanate dielectric column has a square lattice structure, and its lattice period is 510nm. The height of the strontium titanate dielectric column is h=220nm, the thickness of the buried silicon dioxide layer 102 of the substrate is h ₂ =3 μm, and the thickness of the substrate silicon 101 is h ₃ =600 μm.

FIG. 3 is a schematic diagram of a photolithography plate required for etching a scribe groove. The photoresist plate is a square structure with a side length A=2cm, and the square structure is divided into 16 small square units, and the length of each unit becomes a=0.5cm. The designed two-dimensional photonic crystal beam reduction system is fabricated in a small unit, and 16 groups of two-stage beam reduction systems can be obtained after scribing and one exposure.

The two-stage attenuation system of the present invention is fabricated on a substrate, and tens to hundreds of strontium titanate dielectric columns and a strontium titanate nanowire waveguide are arranged on the substrate. The base is composed of a silicon dioxide buried layer (low refractive index layer) 102 and substrate silicon 101 . The strontium titanate dielectric column array and the nanowire waveguide are in contact with the silicon dioxide buried layer.

Concrete manufacturing process of the present invention is as follows:

The first step is to prepare the scribing groove required for scribing;

(A) Cleaning the substrate silicon 101 with a thickness of 600 μm and growing a buried silicon dioxide layer 102 with a thickness of 3 μm (as shown in FIG. 4 a );

(B) As shown in FIG. 4b, a strontium titanate thin film 103 is prepared on the silicon dioxide buried layer 102 by a sol-gel method;

(C) As shown in FIG. 4c, a photoresist film 104 with a thickness of 2-3 μm is formed on the strontium titanate thin film 103;

(D) putting the completed structure of step (C) into an oven for drying;

(E) As shown in FIG. 4d, the photoresist film 104 is exposed to ultraviolet light to obtain the same pattern as the photolithography plate required for etching the scribe groove;

(F) As shown in Figure 4e, after developing and hardening the film, the photoresist mask structure required for making the scribe groove is obtained;

(G) As shown in Figure 4f, perform ICP (Inductively Coupled Plasma Etching) etching on the photoresist mask structure prepared in step (F), and the etching depth is 4 μm; as shown in Figure 4g, remove the photoresist The resist film 104 obtains a scribe structure with scribe grooves;

The second step is to prepare the mask required for ICP etching strontium titanate dielectric column array and strontium titanate nanowire waveguide;

(H) As shown in Figures 5a and 5b, make a layer of photoresist film 201 with a thickness of 100nm on the scribe structure with scribe grooves prepared in step (G);

(1) putting the structure prepared in step (H) into an oven before drying;

(J) As shown in FIG. 5c, electron beam exposure is carried out to the prepared photoresist film 201;

(K) As shown in Figure 5d, after development and film hardening, the ICP photoresist mask structure required for making the main structure of the two-stage beam shrinkage system based on the photonic crystal resonator is obtained;

The third step is to use the ICP photoresist mask structure prepared in the second step to perform ICP etching to make the main structure of the two-stage beam shrinkage system based on the photonic crystal resonator;

(L) As shown in Figure 5e, perform ICP etching on the ICP photoresist mask structure prepared in step (K), the etching depth is 220nm, and obtain strontium titanate dielectric column array and strontium titanate nanowire waveguide;

(M) As shown in Figure 5f, the photoresist on the strontium titanate dielectric column array and the strontium titanate nanowire waveguide is removed and cleaned;

The fourth step is to separately process the dielectric column that requires a dimensional accuracy higher than 10nm;

(N) As shown in Figures 6a and 6b, coat a layer of photoresist 301 as a protective layer on the structure obtained in step (M);

(O) As shown in Figures 6c and 6d, optically expose and develop the prepared photoresist 301 to obtain a photoresist mask structure, and place the strontium titanate dielectric column (including the primary photonic crystal defect area) that needs to be processed Dielectric column 12, photonic crystal resonator coupling area dielectric column 13, photonic crystal resonator point defect dielectric column 14, photonic crystal resonator coupling dielectric column 15, the area where dielectric column 14 is taken as an example) is exposed;

(P) As shown in Figures 6e and 6f, use the focused ion beam (FIB) process to process the strontium titanate dielectric column to be processed with high precision so that it reaches the required size, and remove the photoresist (the dielectric column 11 in the figure is W7-type photonic crystal waveguide 4, photonic crystal resonator 5 and W1-type photonic crystal waveguide 6 have a main structure dielectric column, which is a dielectric column that does not need to be processed separately);

The fifth step is to remove the edge region of the device structure;

(Q) as shown in Figure 7a, 7b, the device structure surface that obtains in step (P) is coated with PMMA layer 401;

(R) as shown in Figure 7c, 7d, carry out synchrotron radiation X-ray exposure, development to PMMA layer 401, make a protective layer on device structure;

(S) Scribing according to the scribing groove to obtain 16 main structures of the two-stage beam shrinking system device based on the photonic crystal resonator composed of the strontium titanate dielectric column array and the strontium titanate nanowire waveguide;

(T) As shown in Figure 7e, put the device structure of the two-stage beam shrinkage system based on the photonic crystal resonator obtained in step (S) into the grinding machine, and use different grinding fluids or polishing fluids for side grinding and polishing , remove the edge region and flatten the side of the device structure.

Since the refractive index of PMMA is lower than that of silicon material, it satisfies the condition of total reflection in the direction perpendicular to the device, so PMMA is kept as the protective structure of the device, which increases the firmness of the device and is not easy to be damaged.

Claims (7)

1. the two-stage contracting beam system based on photonic crystal resonant cavity is characterized in that connecting airtight arrangement by W7 type photon crystal wave-guide (4), photonic crystal resonant cavity (5), W1 type photon crystal wave-guide (6) and Nanowire Waveguides (7) order consists of; Photonic crystal resonant cavity (5) adopts and add point defect (14) formation in photonic crystal, and photonic crystal resonant cavity (5) and W7 type photon crystal wave-guide (4) joining place distribution delegation's medium post (13), and this row medium post consists of coupled zone; Photonic crystal resonant cavity (5) and W1 type photon crystal wave-guide joining place, and be distributed with one or more couplant posts (15) with point defect (14) correspondence position; Whole system is integrated in the substrate.

2. the method for making of the two-stage contracting beam system based on photonic crystal resonant cavity as claimed in claim 1, it is characterized in that consisting of contracting beam system structure by make strontium titanates medium post array and strontium titanates Nanowire Waveguides in substrate, concrete manufacturing process is as follows:

The first step, the required scribe line of preparation scribing;

Second step, preparation ICP etching strontium titanates medium post array and the required photoresist mask of strontium titanates Nanowire Waveguides;

The 3rd step, utilize the ICP photoresist mask structure of second step preparation to carry out the ICP etching, make the two-stage contracting beam system agent structure based on photonic crystal resonant cavity;

In the 4th step, the medium post that requires dimensional accuracy to be higher than 10nm is processed separately;

The 5th step, removal devices structural edge district.

3. the method for making of the two-stage contracting beam system based on photonic crystal resonant cavity according to claim 2, the step that it is characterized in that preparing the required scribe line of scribing is as follows:

(A) cleaning is carried out in substrate; Described substrate is made of silicon dioxide buried regions (102) and substrate silicon (101), and silicon dioxide buried regions (102) is grown on the substrate silicon (101);

(B) utilize sol-gal process to prepare one deck strontium titanate film (103) at silicon dioxide buried regions (102);

(C) make one deck photoresist film (104) at strontium titanate film (103);

(D) structure that step (C) is completed is put into the baking oven front baking;

(E) photoresist film (104) is carried out uv-exposure, obtain the figure identical with the required reticle of etching scribe line;

(F) through development, post bake, obtain making the required photoresist mask structure of scribe line;

(G) the photoresist mask structure of step (F) being made carries out the ICP etching, then removes photoresist film (104) and obtains scribing structure with scribe line.

4. the method for making of the two-stage contracting beam system based on photonic crystal resonant cavity according to claim 3 is characterized in that preparing the required photoresist mask step of ICP etching strontium titanates medium post array and strontium titanates Nanowire Waveguides as follows:

(H) the scribing structure with scribe line for preparing in step (G) is made one deck photoresist film (201);

(I) structure of step (H) preparation being finished is put into the baking oven front baking;

(J) photoresist film (201) for preparing is carried out electron beam exposure;

(K) through development, post bake, obtain making strontium titanates medium post array and the required ICP photoresist mask structure of strontium titanates Nanowire Waveguides.

5. the method for making of the two-stage contracting beam system based on photonic crystal resonant cavity according to claim 4, it is characterized in that utilizing the ICP photoresist mask structure of second step preparation to carry out the ICP etching, make as follows based on the two-stage contracting beam system agent structure step of photonic crystal resonant cavity:

(L) the ICP photoresist mask structure of step (K) being made carries out the ICP etching, obtains strontium titanates medium post array and strontium titanates Nanowire Waveguides;

(M) photoresist on strontium titanates medium post array and the strontium titanates Nanowire Waveguides is removed, and cleaned.

6. the method for making of the two-stage contracting beam system based on photonic crystal resonant cavity according to claim 5 is characterized in that the step that the medium post that requires dimensional accuracy to be higher than 10nm is processed separately is as follows:

(N) structure that obtains in step (M) applies one deck photoresist (301) as protective seam;

(O) photoresist (301) for preparing is carried out optical exposure, development, obtain the photoresist mask structure, come out in the strontium titanates medium post region of needs processing;

(P) utilize FIB technique that the strontium titanates medium post of needs processing is processed and make it reach required size, remove photoresist.

7. the method for making of the two-stage contracting beam system based on photonic crystal resonant cavity according to claim 6 is characterized in that removal devices structural edge district step is as follows:

(Q) apply PMMA layer (401) on the device architecture surface that step (P) obtains;

(R) PMMA layer (401) is carried out the synchrotron radiation X-ray exposure, develops, make a protective seam at device architecture;

(S) according to the scribe line scribing, obtain the two-stage contracting beam system device main body structure based on photonic crystal resonant cavity that is consisted of by strontium titanates medium post array and strontium titanates Nanowire Waveguides;

(T) the two-stage contracting beam system device architecture based on photonic crystal resonant cavity that step (S) is obtained is put into wafer lapping machine, carries out the side with different lapping liquids or polishing fluid respectively and grinds and polish, and removes the marginarium and also makes the device architecture flat side down.

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