CN102401633B - Detection method for detecting thickness of barrier layer of porous alumina film - Google Patents
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Abstract
本发明提供了一种多孔氧化铝薄膜的阻挡层厚度的检测方法,其特征在于,该方法包括根据多孔氧化铝薄膜在200nm~2500nm范围内的透射光谱米判断多孔氧化铝薄膜是否含有阻挡层,其中,如果透射光谱在200nm~2500nm范围内出现振荡,则判断该多孔氧化铝薄膜的阻挡层的厚度大于0;如果透射光谱在200nm~2500nm范围内不出现振荡,则判断该多孔氧化铝薄膜的阻挡层的厚度为0。本发明的方法是一种无损检测方法,该方法能够简便、快速、高效、对样品无损害地监控以及检测多孔氧化铝薄膜的阻挡层的去除程度,在大规模生产中可以作为产品控制以及质量检测的重要手段。
The invention provides a method for detecting the thickness of a barrier layer of a porous alumina film, which is characterized in that the method comprises judging whether the porous alumina film contains a barrier layer according to the transmission spectrum of the porous alumina film in the range of 200nm to 2500nm, Wherein, if the transmission spectrum oscillates within the range of 200nm to 2500nm, it is judged that the thickness of the barrier layer of the porous alumina film is greater than 0; The barrier layer has a thickness of 0. The method of the present invention is a non-destructive testing method, which can monitor and detect the removal degree of the barrier layer of the porous aluminum oxide film simply, quickly, efficiently, and without damage to the sample, and can be used as a product control and quality control method in large-scale production. important means of detection.
Description
技术领域 technical field
本发明涉及的是一种多孔氧化铝薄膜的阻挡层厚度的检测方法。The invention relates to a method for detecting the thickness of a barrier layer of a porous aluminum oxide film.
背景技术 Background technique
自1995年,Masuda等人发明了两步阳极氧化法(Science,1995,268,1466~1468)制备大面积高度有序的蜂窝状结构的多孔氧化铝以来,多孔氧化铝薄膜作为模板被广泛应用于合成高度有序的金属、半导体或者高分子纳米线(纳米管),由于氧化铝不导电,因此在电沉积纳米线之前要先用酸液除去多孔氧化铝薄膜的阻挡层,再溅射一层金属薄膜作为电极进行电沉积。由于酸液腐蚀去除阻挡层的过程受很多因素影响,这就使得阻挡层的去除程度很难控制,因此目前迫切需要寻找一种简便的监控以及检测多孔氧化铝薄膜的阻挡层的去除程度的方法。Since Masuda et al. invented the two-step anodic oxidation method (Science, 1995, 268, 1466-1468) in 1995 to prepare porous alumina with a large area and highly ordered honeycomb structure, porous alumina films have been widely used as templates. For the synthesis of highly ordered metal, semiconductor or polymer nanowires (nanotubes), since aluminum oxide is not conductive, it is necessary to remove the barrier layer of porous aluminum oxide film with acid solution before electrodepositing nanowires, and then sputter a Layers of metal thin films are electrodeposited as electrodes. Since the process of removing the barrier layer by acid corrosion is affected by many factors, it is difficult to control the removal degree of the barrier layer. Therefore, it is urgent to find a simple method for monitoring and detecting the removal degree of the barrier layer of the porous alumina film. .
紫外-可见-近红外光谱检测技术以其样品制备简单、检测对象广泛、可实现非破坏性检测、检测速度快等优势被应用于很多领域,Jian Wang等人(Thin Solid Films,2008,516,7689~7694)利用紫外-可见-近红外光谱检测技术测试了含有阻挡层的多孔氧化铝薄膜的透射光谱,并使用透射极值包络法计算了多孔氧化铝薄膜的折射率、吸收系数以及光学能隙。CN200510027581.9利用四层介质模型来拟合透射光谱从而得出多孔氧化铝薄膜的厚度以及阻挡层厚度,其光谱测试范围仅为190nm~900nm,但是对于去掉阻挡层的多孔氧化铝薄膜的透射光谱没有进行研究,因此只能利用上述结果来检测刚制备的多孔氧化铝薄膜的厚度及阻挡层厚度,而对于用透射光谱技术检测通常用于制备纳米线的通孔多孔氧化铝薄膜的研究,目前未见文献以及专利报道。Ultraviolet-visible-near-infrared spectroscopy detection technology has been used in many fields due to its advantages of simple sample preparation, wide range of detection objects, non-destructive detection, and fast detection speed. Jian Wang et al. (Thin Solid Films, 2008, 516, 7689~7694) tested the transmission spectrum of the porous alumina film with barrier layer by using the ultraviolet-visible-near-infrared spectroscopy detection technology, and calculated the refractive index, absorption coefficient and optical properties of the porous alumina film by using the transmission extremum envelope method. Energy gap. CN200510027581.9 uses a four-layer medium model to fit the transmission spectrum to obtain the thickness of the porous aluminum oxide film and the thickness of the barrier layer. Its spectrum test range is only 190nm to 900nm, but for the transmission spectrum No research has been carried out, so the above results can only be used to detect the thickness of the newly prepared porous alumina film and the thickness of the barrier layer. For the research on the detection of through-hole porous alumina films that are usually used to prepare nanowires by transmission spectroscopy, currently There are no literature and patent reports.
发明内容 Contents of the invention
本发明的目的在于提供一种简单的检测多孔氧化铝薄膜的阻挡层的厚度的方法。The object of the present invention is to provide a simple method for detecting the thickness of the barrier layer of a porous aluminum oxide film.
本发明的发明人意外地发现,该多孔氧化铝薄膜含有阻挡层时,其透射光谱在200nm~2500nm范围内会出现振荡,而该多孔氧化铝薄膜不含有阻挡层时(即阻挡层被完全去除时),其透射光谱在200nm~2500nm范围内不出现振荡,由此完成了本发明。The inventors of the present invention have unexpectedly found that when the porous aluminum oxide film contains a barrier layer, its transmission spectrum will oscillate in the range of 200nm to 2500nm, and when the porous aluminum oxide film does not contain a barrier layer (that is, the barrier layer is completely removed) ), the transmission spectrum does not oscillate in the range of 200nm to 2500nm, thus completing the present invention.
本发明提供了一种多孔氧化铝薄膜的阻挡层厚度的检测方法,其特征在于,该方法包括根据多孔氧化铝薄膜的200nm~2500nm范围内的透射光谱来判断多孔氧化铝薄膜是否含有阻挡层,其中,如果透射光谱在200nm~2500nm范围内出现振荡,则判断该多孔氧化铝薄膜的阻挡层的厚度大于0;如果透射光谱在200nm~2500nm范围内不出现振荡,则判断该多孔氧化铝薄膜的阻挡层的厚度为0。The invention provides a method for detecting the thickness of the barrier layer of the porous alumina film, which is characterized in that the method comprises judging whether the porous alumina film contains a barrier layer according to the transmission spectrum in the range of 200nm to 2500nm of the porous alumina film, Wherein, if the transmission spectrum oscillates within the range of 200nm to 2500nm, it is judged that the thickness of the barrier layer of the porous alumina film is greater than 0; The barrier layer has a thickness of 0.
本发明以多孔氧化铝薄膜的制备为基础,利用紫外-可见-近红外光谱检测技术对多孔氧化铝薄膜以及去掉阻挡层的薄膜进行透射光谱测试,透射光谱的结果可以用于表征多孔氧化铝薄膜的阻挡层的厚度以及多孔氧化铝薄膜的通孔率。The present invention is based on the preparation of the porous alumina film, and uses the ultraviolet-visible-near-infrared spectrum detection technology to test the transmission spectrum of the porous alumina film and the film with the barrier layer removed, and the results of the transmission spectrum can be used to characterize the porous alumina film The thickness of the barrier layer and the through-porosity of the porous alumina film.
本发明的方法是一种无损检测方法,该方法能够简便、快速、高效、对样品无损害地监控以及检测多孔氧化铝薄膜的阻挡层的去除程度,在大规模生产中可以作为产品控制以及质量检测的重要手段。The method of the present invention is a non-destructive testing method, which can monitor and detect the removal degree of the barrier layer of the porous aluminum oxide film simply, quickly, efficiently, and without damage to the sample, and can be used as a product control and quality control method in large-scale production. important means of detection.
附图说明 Description of drawings
图1为实施例1中所得到的多孔氧化铝薄膜的紫外-可见-近红外透射光谱图。Fig. 1 is the ultraviolet-visible-near-infrared transmission spectrum diagram of the porous aluminum oxide film obtained in Example 1.
图2为实施例1中所得到的多孔氧化铝薄膜背面的FESEM形貌图。Fig. 2 is the FESEM image of the back side of the porous aluminum oxide film obtained in Example 1.
图3为实施例1中所得到的多孔氧化铝薄膜阻挡层的FESEM形貌图。FIG. 3 is a FESEM image of the barrier layer of the porous alumina film obtained in Example 1. FIG.
图4为实施例3中所得到的多孔氧化铝薄膜的紫外-可见-近红外透射光谱图。Fig. 4 is the ultraviolet-visible-near-infrared transmission spectrum diagram of the porous aluminum oxide film obtained in Example 3.
图5为实施例3中所得到的多孔氧化铝薄膜背面的FESEM形貌图。FIG. 5 is a FESEM image of the back surface of the porous aluminum oxide film obtained in Example 3.
图6为实施例3中所得到的多孔氧化铝薄膜阻挡层的FESEM形貌图。FIG. 6 is a FESEM image of the barrier layer of the porous alumina film obtained in Example 3. FIG.
图7为实施例5中所得到的多孔氧化铝薄膜的紫外-可见-近红外透射光谱图。FIG. 7 is the ultraviolet-visible-near-infrared transmission spectrum of the porous aluminum oxide film obtained in Example 5.
图8为实施例5中所得到的多孔氧化铝薄膜背面的FESEM形貌图。FIG. 8 is a FESEM image of the back surface of the porous alumina film obtained in Example 5.
图9为实施例5中所得到的多孔氧化铝薄膜阻挡层的FESEM形貌图。FIG. 9 is a FESEM topography image of the barrier layer of the porous alumina film obtained in Example 5. FIG.
图10为实施例7中所得到的多孔氧化铝薄膜的紫外-可见-近红外透射光谱图。FIG. 10 is the ultraviolet-visible-near-infrared transmission spectrum of the porous aluminum oxide film obtained in Example 7.
图11为实施例7中所得到的多孔氧化铝薄膜背面的FESEM形貌图。FIG. 11 is a FESEM image of the back surface of the porous alumina film obtained in Example 7.
图12为实施例7中所得到的多孔氧化铝薄膜阻挡层的FESEM形貌图。FIG. 12 is a FESEM image of the barrier layer of the porous alumina film obtained in Example 7. FIG.
图13为实施例9中所得到的多孔氧化铝薄膜的紫外-可见-近红外透射光谱图。FIG. 13 is the ultraviolet-visible-near-infrared transmission spectrum of the porous aluminum oxide film obtained in Example 9.
图14为实施例9中所得到的多孔氧化铝薄膜背面的FESEM形貌图。FIG. 14 is a FESEM image of the back surface of the porous alumina film obtained in Example 9.
图15为实施例9中所得到的多孔氧化铝薄膜阻挡层的FESEM形貌图。FIG. 15 is a FESEM image of the barrier layer of the porous alumina film obtained in Example 9. FIG.
图16为实施例11中所得到的多孔氧化铝薄膜的紫外-可见-近红外透射光谱图。FIG. 16 is the ultraviolet-visible-near-infrared transmission spectrum of the porous aluminum oxide film obtained in Example 11.
图17为实施例11中所得到的多孔氧化铝薄膜背面的FESEM形貌图。FIG. 17 is a FESEM image of the back surface of the porous alumina film obtained in Example 11.
图18为实施例11中所得到的多孔氧化铝薄膜阻挡层的FESEM形貌图。FIG. 18 is a FESEM image of the barrier layer of the porous alumina film obtained in Example 11.
具体实施方式 Detailed ways
本发明提供了一种多孔氧化铝薄膜的阻挡层厚度的检测方法,其特征在于,该方法包括根据多孔氧化铝薄膜的200nm~2500nm范围内的透射光谱来判断多孔氧化铝薄膜是否含有阻挡层,其中,如果透射光谱在200nm~2500nm范围内出现振荡,则判断该多孔氧化铝薄膜的阻挡层的厚度大于0;如果透射光谱在200nm~2500nm范围内不出现振荡,则判断该多孔氧化铝薄膜的阻挡层的厚度为0。The invention provides a method for detecting the thickness of the barrier layer of the porous alumina film, which is characterized in that the method comprises judging whether the porous alumina film contains a barrier layer according to the transmission spectrum in the range of 200nm to 2500nm of the porous alumina film, Wherein, if the transmission spectrum oscillates within the range of 200nm to 2500nm, it is judged that the thickness of the barrier layer of the porous alumina film is greater than 0; The barrier layer has a thickness of 0.
本发明的发明人进一步发现以下特征The inventors of the present invention have further found the following features
1、上述的多孔氧化铝薄膜的阻挡层厚度的检测方法,其中,透射光谱只在500nm~2500nm范围内出现振荡,且振荡峰的个数为17个,则多孔氧化铝薄膜的通孔率为0,阻挡层的厚度为80nm~90nm。1. The detection method of the thickness of the barrier layer of the porous alumina thin film, wherein the transmission spectrum only oscillates in the range of 500nm to 2500nm, and the number of oscillation peaks is 17, then the through-porosity of the porous alumina thin film is 0, the thickness of the barrier layer is 80 nm to 90 nm.
2、上述的多孔氧化铝薄膜的阻挡层厚度的检测方法,其中,透射光谱只在1000nm~2500nm范围内出现振荡,且振荡峰的个数为16个,则多孔氧化铝薄膜的通孔率为0,阻挡层的厚度为65nm~75nm。2. The detection method of the thickness of the barrier layer of the porous alumina thin film, wherein the transmission spectrum only oscillates in the range of 1000nm to 2500nm, and the number of oscillation peaks is 16, then the through-porosity of the porous alumina thin film is 0, the thickness of the barrier layer is 65 nm to 75 nm.
3、上述的多孔氧化铝薄膜的阻挡层厚度的检测方法,其中,透射光谱只在1000nm~2500nm范围内出现振荡,且振荡峰的个数为8个,则多孔氧化铝薄膜的通孔率为0,阻挡层的厚度为30nm~40nm。3. The detection method for the thickness of the barrier layer of the porous alumina thin film, wherein the transmission spectrum only oscillates in the range of 1000nm to 2500nm, and the number of oscillation peaks is 8, then the through-porosity of the porous alumina thin film is 0, the thickness of the barrier layer is 30 nm to 40 nm.
4、上述的多孔氧化铝薄膜的阻挡层厚度的检测方法,其中,透射光谱只在1500nm~2500nm范围内出现振荡,且振荡峰的个数为4个,则多孔氧化铝薄膜的通孔率为50%-80%,阻挡层的厚度为5nm~25nm。4. The method for detecting the thickness of the barrier layer of the porous alumina thin film, wherein the transmission spectrum only oscillates in the range of 1500nm to 2500nm, and the number of oscillation peaks is 4, then the through-porosity of the porous alumina thin film is 50%-80%, the thickness of the blocking layer is 5nm-25nm.
5、上述特征4所述的多孔氧化铝薄膜的阻挡层厚度的检测方法,若透光率在70%~80%,则多孔氧化铝薄膜的通孔率为50%-65%,阻挡层的厚度约为15nm~25nm。5. The detection method of the thickness of the barrier layer of the porous aluminum oxide film described in the
6、上述特征4所述的多孔氧化铝薄膜的阻挡层厚度的检测方法,若透光率在85%~90%,则多孔氧化铝薄膜的通孔率为70%-80%,阻挡层的厚度约为5nm~10nm。6. The method for detecting the thickness of the barrier layer of the porous aluminum oxide film described in
本发明中,通孔率是指通孔的个数与多孔氧化铝薄膜总的孔的个数之比,所述的通孔是指不含有阻挡层的孔。In the present invention, the through-porosity refers to the ratio of the number of through-holes to the total number of holes in the porous alumina film, and the said through-holes refer to holes without barrier layers.
上述的多孔氧化铝薄膜的阻挡层厚度的检测方法,其中,所述透射光谱为紫外-可见-近红外透射光谱。In the method for detecting the thickness of the barrier layer of the porous aluminum oxide film, the transmission spectrum is an ultraviolet-visible-near-infrared transmission spectrum.
上述的多孔氧化铝薄膜的阻挡层厚度的检测方法,其中,获取所述透射光谱的条件包括测量方式为扫描,波长范围可以为200nm~2500nm,扫描速率为900-950nm/min,优选为924nm/min。The method for detecting the thickness of the barrier layer of the porous aluminum oxide film above, wherein, the conditions for obtaining the transmission spectrum include scanning, the wavelength range can be 200nm to 2500nm, and the scanning rate is 900-950nm/min, preferably 924nm/min. min.
本发明所述的多孔氧化铝薄膜的阻挡层厚度的检测方法,其中,所述多孔氧化铝薄膜的厚度为1-30微米。多孔氧化铝薄膜的厚度采用场发射扫描电镜(Hitachi S4800)测得。The method for detecting the thickness of the barrier layer of the porous aluminum oxide film according to the present invention, wherein the thickness of the porous aluminum oxide film is 1-30 microns. The thickness of the porous alumina film was measured by a field emission scanning electron microscope (Hitachi S4800).
上述多孔氧化铝薄膜的制备方法已为本领域技术公知,例如可以通过包括以下步骤的方法制备:The preparation method of the above-mentioned porous aluminum oxide film is known in the art, for example, it can be prepared by a method comprising the following steps:
1)预处理1) Pretreatment
将高纯Al片(99.999%)用丙酮和去离子水(18.2MΩ/cm)分别超声清洗10分钟,随后用体积比为7∶1∶2的浓磷酸、浓硫酸和浓硝酸的混合液在120℃化学抛光1分钟。High-purity Al flakes (99.999%) were ultrasonically cleaned with acetone and deionized water (18.2 MΩ/cm) for 10 minutes, respectively, followed by a mixture of concentrated phosphoric acid, concentrated sulfuric acid, and concentrated nitric acid with a volume ratio of 7:1:2. Chemical polishing at 120°C for 1 minute.
2)第一步阳极氧化2) The first step of anodizing
将步骤1)得到的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.2M~0.4M的草酸电解质水溶液中,40V~60V电压下,环境温度小于10℃时进行第一步阳极氧化,氧化时间1小时~12小时。Put the aluminum sheet obtained in step 1) in an electrolytic cell of plexiglass or polytetrafluoroethylene, use graphite as the cathode, and the aluminum sheet as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.2M to 0.4M, under a voltage of 40V to 60V , When the ambient temperature is less than 10°C, the first anodic oxidation is carried out, and the oxidation time is 1 hour to 12 hours.
3)腐蚀一次氧化膜3) Corrode the oxide film once
将步骤2)得到的铝片置于磷酸和铬酸的混合溶液中,在65℃烘箱中放置2小时~12小时,磷酸的浓度是5wt%,铬酸的浓度是1.5wt%。Place the aluminum sheet obtained in step 2) in a mixed solution of phosphoric acid and chromic acid, and place it in an oven at 65° C. for 2 hours to 12 hours. The concentration of phosphoric acid is 5 wt%, and the concentration of chromic acid is 1.5 wt%.
4)第二步阳极氧化4) The second step of anodizing
将步骤3)得到的腐蚀好的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.2M~0.4M的草酸电解质水溶液中,40V~60V电压下,环境温度小于10℃时进行第一步阳极氧化,氧化时间1分钟~30分钟。Place the corroded aluminum sheet obtained in step 3) in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum sheet as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.2M to 0.4M, at 40V to Under 60V voltage, the first step of anodic oxidation is carried out when the ambient temperature is less than 10°C, and the oxidation time is 1 minute to 30 minutes.
5)剥离铝基底5) Peel off the aluminum substrate
将步骤4)得到的产品,用饱和氯化铜浸泡,至没有气泡冒出时立即取出,得到了氧化铝膜。Soak the product obtained in step 4) with saturated copper chloride, and take it out immediately when no bubbles emerge, to obtain an aluminum oxide film.
6)去阻挡层6) Remove the blocking layer
将步骤5)得到的产品浸泡在5wt%的磷酸水溶液中5分钟~70分钟。Soak the product obtained in step 5) in 5 wt% phosphoric acid aqueous solution for 5 minutes to 70 minutes.
本发明的多孔氧化铝薄膜的测定采用紫外-可见-近红外透射光谱检测,运用透射光谱技术测试多孔氧化铝薄膜的紫外-可见-近红外光谱。测试的波长范围是200nm~2500nm。The measurement of the porous aluminum oxide film of the present invention adopts ultraviolet-visible-near-infrared transmission spectrum detection, and the ultraviolet-visible-near-infrared spectrum of the porous aluminum oxide film is tested by transmission spectrum technology. The wavelength range of the test is 200nm ~ 2500nm.
下面的实施例将对本发明作进一步的说明。The following examples will further illustrate the present invention.
实施例1Example 1
该实施例用于说明本发明提供的多孔氧化铝薄膜的阻挡层厚度的检测方法This embodiment is used to illustrate the detection method of the barrier layer thickness of the porous aluminum oxide film provided by the present invention
1.多孔氧化铝薄膜的制备1. Preparation of Porous Alumina Films
1)预处理1) Pretreatment
纯度为99.999%的高纯Al片(尺寸为2cm*2cm*0.025cm,购于北京蒙泰有研)用丙酮和去离子水(18.2MΩ/cm)分别超声清洗10分钟,并用体积比为7∶1∶2的浓磷酸、浓硫酸和浓硝酸的混合液在120℃化学抛光1分钟。High-purity Al flakes with a purity of 99.999% (size 2cm*2cm*0.025cm, purchased from Beijing Mengtai Research Institute) were ultrasonically cleaned with acetone and deionized water (18.2MΩ/cm) for 10 minutes, and the volume ratio was 7 A 1:2 mixture of concentrated phosphoric acid, concentrated sulfuric acid and concentrated nitric acid was chemically polished at 120° C. for 1 minute.
2)第一步阳极氧化2) The first step of anodizing
将步骤1)得到的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第一步阳极氧化,氧化时间1小时。Put the aluminum flake obtained in step 1) in an electrolytic cell of plexiglass or polytetrafluoroethylene, use graphite as the cathode, and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the ambient temperature is less than 10 The first anodic oxidation is carried out at ℃, and the oxidation time is 1 hour.
3)腐蚀一次氧化膜3) Corrode the oxide film once
将步骤2)得到的铝片置于磷酸和铬酸的混合溶液中,在65℃烘箱中放置4小时,磷酸的浓度是5wt%,铬酸的浓度是1.5wt%。Place the aluminum sheet obtained in step 2) in a mixed solution of phosphoric acid and chromic acid, and place it in an oven at 65° C. for 4 hours. The concentration of phosphoric acid is 5 wt%, and the concentration of chromic acid is 1.5 wt%.
4)第二步阳极氧化4) The second step of anodizing
将步骤3)得到的腐蚀好的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第二步阳极氧化,氧化时间5分钟。The corroded aluminum flake obtained in step 3) is placed in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the environment When the temperature is lower than 10°C, the second step of anodic oxidation is carried out, and the oxidation time is 5 minutes.
5)剥离铝基底5) Peel off the aluminum substrate
将步骤中4)得到的产品,用饱和氯化铜浸泡,至没有气泡冒出时立即取出,得到了氧化铝膜。The product obtained in step 4) is soaked with saturated copper chloride, and taken out immediately when no bubbles emerge, and an aluminum oxide film is obtained.
6)去阻挡层6) Remove the blocking layer
将步骤5)得到的产品浸泡在5wt%的磷酸水溶液中5分钟。The product obtained in step 5) was soaked in 5wt% phosphoric acid aqueous solution for 5 minutes.
2.多孔氧化铝薄膜的紫外-可见-近红外光谱测试2. UV-visible-near-infrared spectroscopy test of porous alumina film
运用透射光谱技术测试多孔氧化铝薄膜的紫外-可见-近红外光谱,测试条件为所使用的仪器为Perkin Elmer公司生产的Lambda 950系列紫外-可见-近红外分光光度计,测量方式为扫描,波长范围200nm~2500nm,扫描速率为924nm/min。结果如图1所示,采用的波长范围是200nm~2500nm。透射光谱在500nm~2500nm范围内出现振荡,振荡峰的个数为17个,判定多孔氧化铝薄膜的通孔率为0,阻挡层的厚度为80nm~90nm。The ultraviolet-visible-near-infrared spectrum of the porous alumina film is tested by transmission spectroscopy. The test conditions are that the instrument used is the Lambda 950 series ultraviolet-visible-near-infrared spectrophotometer produced by Perkin Elmer, and the measurement method is scanning. The range is 200nm~2500nm, and the scan rate is 924nm/min. The results are shown in Figure 1, and the wavelength range used is 200nm-2500nm. The transmission spectrum oscillates in the range of 500nm-2500nm, and the number of oscillation peaks is 17. It is determined that the through-porosity of the porous alumina film is 0, and the thickness of the barrier layer is 80nm-90nm.
用场发射扫描电镜(Hitachi S4800)观察形貌(见图2、图3),证明多孔氧化铝薄膜的通孔率为0,阻挡层的厚度约为80nm~90nm。与采用本发明的方法检测的结果一致。The morphology was observed with a field emission scanning electron microscope (Hitachi S4800) (see Figure 2 and Figure 3), which proved that the through-porosity of the porous alumina film was 0, and the thickness of the barrier layer was about 80nm-90nm. It is consistent with the result detected by the method of the present invention.
实施例2Example 2
1.多孔氧化铝薄膜的制备1. Preparation of Porous Alumina Films
1)预处理1) Pretreatment
纯度为99.999%的高纯Al片(尺寸为2cm*2cm*0.025cm,购于北京蒙泰有研)用丙酮和去离子水(18.2MΩ/cm)分别超声清洗10分钟,并用体积比为7∶1∶2的浓磷酸、浓硫酸和浓硝酸的混合液在120℃化学抛光1分钟。High-purity Al flakes with a purity of 99.999% (size 2cm*2cm*0.025cm, purchased from Beijing Mengtai Research Institute) were ultrasonically cleaned with acetone and deionized water (18.2MΩ/cm) for 10 minutes, and the volume ratio was 7 A 1:2 mixture of concentrated phosphoric acid, concentrated sulfuric acid and concentrated nitric acid was chemically polished at 120° C. for 1 minute.
2)第一步阳极氧化2) The first step of anodizing
将步骤1)得到的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.4M的草酸电解质水溶液中,40V电压下,环境温度小于10℃时进行第一步阳极氧化,氧化时间12小时。Put the aluminum flake obtained in step 1) in an electrolytic cell of plexiglass or polytetrafluoroethylene, use graphite as the cathode, and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.4M, at a voltage of 40V, the ambient temperature is less than 10 The first anodic oxidation is carried out at ℃, and the oxidation time is 12 hours.
3)腐蚀一次氧化膜3) Corrode the oxide film once
将步骤2)得到的铝片置于磷酸和铬酸的混合溶液中,在65℃烘箱中放置12小时,磷酸的浓度是5wt%,铬酸的浓度是1.5wt%。The aluminum sheet obtained in step 2) was placed in a mixed solution of phosphoric acid and chromic acid, and placed in an oven at 65° C. for 12 hours. The concentration of phosphoric acid was 5 wt%, and the concentration of chromic acid was 1.5 wt%.
4)第二步阳极氧化4) The second step of anodizing
将步骤3)得到的腐蚀好的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.4M的草酸电解质水溶液中,40V电压下,环境温度小于10℃时进行第二步阳极氧化,氧化时间30分钟。The corroded aluminum flake obtained in step 3) is placed in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum flake as the anode, in an aqueous solution of oxalic acid electrolyte with a concentration of 0.4M, under 40V voltage, ambient When the temperature is lower than 10°C, the second step of anodic oxidation is carried out, and the oxidation time is 30 minutes.
5)剥离铝基底5) Peel off the aluminum substrate
将步骤中4)得到的产品,用饱和氯化铜浸泡,至没有气泡冒出时立即取出,得到了氧化铝膜。The product obtained in step 4) is soaked with saturated copper chloride, and taken out immediately when no bubbles emerge, and an aluminum oxide film is obtained.
6)去阻挡层6) Remove the blocking layer
将步骤5)得到的铝片浸泡在5wt%的磷酸水溶液中10分钟。Soak the aluminum sheet obtained in step 5) in 5 wt% phosphoric acid aqueous solution for 10 minutes.
2.多孔氧化铝薄膜的紫外-可见-近红外光谱测试2. UV-visible-near-infrared spectroscopy test of porous alumina film
运用透射光谱技术测试多孔氧化铝薄膜的紫外-可见-近红外光谱,测试条件为所使用的仪器为Perkin Elmer公司生产的Lambda 950系列紫外-可见-近红外分光光度计,测量方式为扫描,波长范围200nm~2500nm,扫描速率为924nm/min。透射光谱在500nm~2500nm范围内出现振荡,振荡峰的个数为17个,判定多孔氧化铝薄膜的通孔率为0,阻挡层的厚度为80nm~85nm。The ultraviolet-visible-near-infrared spectrum of the porous alumina film is tested by transmission spectroscopy. The test conditions are that the instrument used is the Lambda 950 series ultraviolet-visible-near-infrared spectrophotometer produced by Perkin Elmer, and the measurement method is scanning. The range is 200nm~2500nm, and the scan rate is 924nm/min. The transmission spectrum oscillates in the range of 500nm-2500nm, and the number of oscillation peaks is 17. It is determined that the through-porosity of the porous alumina film is 0, and the thickness of the barrier layer is 80nm-85nm.
用场发射扫描电镜(Hitachi S4800)观察形貌,表明多孔氧化铝薄膜的通孔率为0,阻挡层的厚度约为80nm~85nm,与采用本发明的方法检测的结果一致。Observing the morphology with a field emission scanning electron microscope (Hitachi S4800) shows that the through-porosity of the porous aluminum oxide film is 0, and the thickness of the barrier layer is about 80nm to 85nm, which is consistent with the results detected by the method of the present invention.
实施例3Example 3
1.多孔氧化铝薄膜的制备1. Preparation of Porous Alumina Films
1)预处理1) Pretreatment
纯度为99.999%的高纯Al片(尺寸为2cm*2cm*0.025cm,购于北京蒙泰有研)用丙酮和去离子水(18.2MΩ/cm)分别超声清洗10分钟,并用体积比为7∶1∶2的浓磷酸、浓硫酸和浓硝酸的混合液在120℃化学抛光1分钟。High-purity Al flakes with a purity of 99.999% (size 2cm*2cm*0.025cm, purchased from Beijing Mengtai Youyan) were ultrasonically cleaned with acetone and deionized water (18.2MΩ/cm) for 10 minutes, and a volume ratio of 7 A 1:2 mixture of concentrated phosphoric acid, concentrated sulfuric acid and concentrated nitric acid was chemically polished at 120° C. for 1 minute.
2)第一步阳极氧化2) The first step of anodizing
将步骤1)得到的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第一步阳极氧化,氧化时间8小时。Put the aluminum flake obtained in step 1) in an electrolytic cell of plexiglass or polytetrafluoroethylene, use graphite as the cathode, and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the ambient temperature is less than 10 The first anodic oxidation is carried out at ℃, and the oxidation time is 8 hours.
3)腐蚀一次氧化膜3) Corrode the oxide film once
将步骤2)得到的铝片置于磷酸和铬酸的混合溶液中,在65℃烘箱中放置4小时,磷酸的浓度是5wt%,铬酸的浓度是1.5wt%。Place the aluminum sheet obtained in step 2) in a mixed solution of phosphoric acid and chromic acid, and place it in an oven at 65° C. for 4 hours. The concentration of phosphoric acid is 5 wt%, and the concentration of chromic acid is 1.5 wt%.
4)第二步阳极氧化4) The second step of anodizing
将步骤3)得到的腐蚀好的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第二步阳极氧化,氧化时间5分钟。The corroded aluminum flake obtained in step 3) is placed in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the environment When the temperature is lower than 10°C, the second step of anodic oxidation is carried out, and the oxidation time is 5 minutes.
5)剥离铝基底5) Peel off the aluminum substrate
将步骤4)得到的产品,用饱和氯化铜浸泡,至没有气泡冒出时立即取出,得到了氧化铝膜。Soak the product obtained in step 4) with saturated copper chloride, and take it out immediately when no bubbles emerge, to obtain an aluminum oxide film.
6)去阻挡层6) Remove the blocking layer
将步骤5)得到的产品浸泡在5wt%的磷酸水溶液中15分钟。The product obtained in step 5) was soaked in 5wt% phosphoric acid aqueous solution for 15 minutes.
2.多孔氧化铝薄膜的紫外-可见-近红外光谱测试2. UV-visible-near-infrared spectroscopy test of porous alumina film
运用透射光谱技术测试多孔氧化铝薄膜的紫外-可见-近红外光谱,测试条件为所使用的仪器为Perkin Elmer公司生产的Lambda 950系列紫外-可见-近红外分光光度计,测量方式为扫描,波长范围200nm~2500nm,扫描速率为924nm/min。结果如图4所示,透射光谱在1000nm~2500nm范围内出现振荡,震荡峰的数目为16个,判定多孔氧化铝薄膜的通孔率为0,阻挡层的厚度为65nm~75nm。The ultraviolet-visible-near-infrared spectrum of the porous alumina film is tested by transmission spectroscopy. The test conditions are that the instrument used is the Lambda 950 series ultraviolet-visible-near-infrared spectrophotometer produced by Perkin Elmer, and the measurement method is scanning. The range is 200nm~2500nm, and the scan rate is 924nm/min. The results are shown in Figure 4. The transmission spectrum oscillates in the range of 1000nm-2500nm, and the number of oscillation peaks is 16. It is determined that the through-porosity of the porous alumina film is 0, and the thickness of the barrier layer is 65nm-75nm.
用场发射扫描电镜(Hitachi S4800)观察形貌(参见图5、图6),证明多孔氧化铝薄膜的通孔率为0,阻挡层的厚度约为65nm~75nm,与采用本发明的方法检测的结果一致。Use field emission scanning electron microscope (Hitachi S4800) to observe morphology (referring to Fig. 5, Fig. 6), prove that the through-porosity of porous aluminum oxide thin film is 0, and the thickness of blocking layer is about 65nm~75nm, and adopts the method detection of the present invention The results were consistent.
实施例4Example 4
1.多孔氧化铝薄膜的制备1. Preparation of Porous Alumina Films
1)预处理1) Pretreatment
纯度为99.999%的高纯Al片(尺寸为2cm*2cm*0.025cm,购于北京蒙泰有研)用丙酮和去离子水(18.2MΩ/cm)分别超声清洗10分钟,并用体积比为7∶1∶2的浓磷酸、浓硫酸和浓硝酸的混合液在120℃化学抛光1分钟。High-purity Al flakes with a purity of 99.999% (size 2cm*2cm*0.025cm, purchased from Beijing Mengtai Research Institute) were ultrasonically cleaned with acetone and deionized water (18.2MΩ/cm) for 10 minutes, and the volume ratio was 7 A 1:2 mixture of concentrated phosphoric acid, concentrated sulfuric acid and concentrated nitric acid was chemically polished at 120° C. for 1 minute.
2)第一步阳极氧化2) The first step of anodizing
将步骤1)得到的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.2M的草酸电解质水溶液中,50V电压下,环境温度小于10℃时进行第一步阳极氧化,氧化时间8小时。Put the aluminum flake obtained in step 1) in an electrolytic cell of plexiglass or polytetrafluoroethylene, use graphite as the cathode, and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.2M, under a voltage of 50V, the ambient temperature is less than 10 The first anodic oxidation is carried out at ℃, and the oxidation time is 8 hours.
3)腐蚀一次氧化膜3) Corrode the oxide film once
将步骤2)得到的铝片置于磷酸和铬酸的混合溶液中,在65℃烘箱中放置4小时,磷酸的浓度是5wt%,铬酸的浓度是1.5wt%。Place the aluminum sheet obtained in step 2) in a mixed solution of phosphoric acid and chromic acid, place it in an oven at 65°C for 4 hours, the concentration of phosphoric acid is 5wt%, and the concentration of chromic acid is 1.5wt%.
4)第二步阳极氧化4) The second step of anodizing
将步骤3)得到的腐蚀好的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.2M的草酸电解质水溶液中,50V电压下,环境温度小于10℃时进行第二步阳极氧化,氧化时间15分钟。The corroded aluminum flake obtained in step 3) is placed in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.2M, under a voltage of 50V, the environment When the temperature is lower than 10°C, the second step of anodic oxidation is carried out, and the oxidation time is 15 minutes.
5)剥离铝基底5) Peel off the aluminum substrate
将步骤4)得到的产品,用饱和氯化铜浸泡,至没有气泡冒出时立即取出,得到了氧化铝膜。Soak the product obtained in step 4) with saturated copper chloride, and take it out immediately when no bubbles emerge, to obtain an aluminum oxide film.
6)去阻挡层6) Remove the blocking layer
将步骤5)得到的产品浸泡在5wt%的磷酸水溶液中20分钟。The product obtained in step 5) was soaked in 5wt% phosphoric acid aqueous solution for 20 minutes.
2.多孔氧化铝薄膜的紫外-可见-近红外光谱测试2. UV-visible-near-infrared spectroscopy test of porous alumina film
运用透射光谱技术测试多孔氧化铝薄膜的紫外-可见-近红外光谱,测试条件为所使用的仪器为Perkin Elmer公司生产的Lambda 950系列紫外-可见-近红外分光光度计,测量方式为扫描,波长范围200nm~2500nm,扫描速率为924nm/min。透射光谱在1000nm~2500nm范围内出现振荡,振荡峰的个数为16个,判定多孔氧化铝薄膜的通孔率为0,阻挡层的厚度为65nm~75nm。The ultraviolet-visible-near-infrared spectrum of the porous alumina film is tested by transmission spectroscopy. The test conditions are that the instrument used is the Lambda 950 series ultraviolet-visible-near-infrared spectrophotometer produced by Perkin Elmer, and the measurement method is scanning. The range is 200nm~2500nm, and the scan rate is 924nm/min. The transmission spectrum oscillates in the range of 1000nm-2500nm, and the number of oscillation peaks is 16. It is determined that the through-porosity of the porous alumina film is 0, and the thickness of the barrier layer is 65nm-75nm.
用场发射扫描电镜(Hitachi S4800)观察形貌,表明多孔氧化铝薄膜的通孔率为0,阻挡层的厚度约为65nm~75nm,与采用本发明的方法检测的结果一致。Observing the morphology with a field emission scanning electron microscope (Hitachi S4800) shows that the through-porosity of the porous aluminum oxide film is 0, and the thickness of the barrier layer is about 65nm to 75nm, consistent with the results detected by the method of the present invention.
实施例5Example 5
1.多孔氧化铝薄膜的制备1. Preparation of Porous Alumina Films
1)预处理1) Pretreatment
纯度为99.999%的高纯Al片(尺寸为2cm*2cm*0.025cm,购于北京蒙泰有研)用丙酮和去离子水(18.2MΩ/cm)分别超声清洗10分钟,并用体积比为7∶1∶2的浓磷酸、浓硫酸和浓硝酸的混合液在120℃化学抛光1分钟。High-purity Al flakes with a purity of 99.999% (size 2cm*2cm*0.025cm, purchased from Beijing Mengtai Research Institute) were ultrasonically cleaned with acetone and deionized water (18.2MΩ/cm) for 10 minutes, and the volume ratio was 7 A 1:2 mixture of concentrated phosphoric acid, concentrated sulfuric acid and concentrated nitric acid was chemically polished at 120° C. for 1 minute.
2)第一步阳极氧化2) The first step of anodizing
将步骤1)得到的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第一步阳极氧化,氧化时间4小时。Put the aluminum flake obtained in step 1) in an electrolytic cell of plexiglass or polytetrafluoroethylene, use graphite as the cathode, and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the ambient temperature is less than 10 The first anodic oxidation is carried out at ℃, and the oxidation time is 4 hours.
3)腐蚀一次氧化膜3) Corrode the oxide film once
将步骤2)得到的铝片置于磷酸和铬酸的混合溶液中,在65℃烘箱中放置4小时,磷酸的浓度是5wt%,铬酸的浓度是1.5wt%。Place the aluminum sheet obtained in step 2) in a mixed solution of phosphoric acid and chromic acid, and place it in an oven at 65° C. for 4 hours. The concentration of phosphoric acid is 5 wt%, and the concentration of chromic acid is 1.5 wt%.
4)第二步阳极氧化4) The second step of anodizing
将步骤3)得到的腐蚀好的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第二步阳极氧化,氧化时间1分钟。The corroded aluminum flake obtained in step 3) is placed in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the environment When the temperature is lower than 10°C, the second step of anodic oxidation is carried out, and the oxidation time is 1 minute.
5)剥离铝基底5) Peel off the aluminum substrate
将步骤4)得到的产品,用饱和氯化铜浸泡,至没有气泡冒出时立即取出,得到了氧化铝膜。Soak the product obtained in step 4) with saturated copper chloride, and take it out immediately when no bubbles emerge, to obtain an aluminum oxide film.
6)去阻挡层6) Remove the blocking layer
将步骤5)得到的产品浸泡在5wt%的磷酸水溶液中30分钟。The product obtained in step 5) was soaked in 5wt% phosphoric acid aqueous solution for 30 minutes.
2.多孔氧化铝薄膜的紫外-可见-近红外光谱测试2. UV-visible-near-infrared spectroscopy test of porous alumina film
运用透射光谱技术测试多孔氧化铝薄膜的紫外-可见-近红外光谱,测试方法为所使用的仪器为Perkin Elmer公司生产的Lambda 950系列紫外-可见-近红外分光光度计,测量方式为扫描,波长范围200nm~2500nm,扫描速率为924nm/min。结果如图7所示,透射光谱只在1000nm~2500nm范围内出现振荡,震荡峰的数目为8个,判定多孔氧化铝薄膜的通孔率为0,阻挡层的厚度为30nm~40nm。The ultraviolet-visible-near-infrared spectrum of the porous alumina film is tested by transmission spectroscopy. The test method is the Lambda 950 series ultraviolet-visible-near-infrared spectrophotometer produced by Perkin Elmer. The measurement method is scanning, wavelength The range is 200nm~2500nm, and the scan rate is 924nm/min. The results are shown in Figure 7. The transmission spectrum only oscillates in the range of 1000nm-2500nm, and the number of oscillation peaks is 8. It is determined that the through-porosity of the porous alumina film is 0, and the thickness of the barrier layer is 30nm-40nm.
用场发射扫描电镜(Hitachi S4800)观察形貌(参见图8、图9),证明多孔氧化铝薄膜的通孔率为0,阻挡层厚度约为30nm~40nm,与采用本发明的方法检测的结果一致。Observing the morphology (see Fig. 8, Fig. 9) with a field emission scanning electron microscope (Hitachi S4800), proves that the through-porosity of the porous aluminum oxide film is 0, and the thickness of the barrier layer is about 30nm~40nm, which is consistent with the result detected by the method of the present invention unanimous.
实施例6Example 6
1.多孔氧化铝薄膜的制备1. Preparation of Porous Alumina Films
1)预处理1) Pretreatment
纯度为99.999%的高纯Al片(尺寸为2cm*2cm*0.025cm,购于北京蒙泰有研)用丙酮和去离子水(18.2MΩ/cm)分别超声清洗10分钟,并用体积比为7∶1∶2的浓磷酸、浓硫酸和浓硝酸的混合液在120℃化学抛光1分钟。High-purity Al flakes with a purity of 99.999% (size 2cm*2cm*0.025cm, purchased from Beijing Mengtai Research Institute) were ultrasonically cleaned with acetone and deionized water (18.2MΩ/cm) for 10 minutes, and the volume ratio was 7 A 1:2 mixture of concentrated phosphoric acid, concentrated sulfuric acid and concentrated nitric acid was chemically polished at 120° C. for 1 minute.
2)第一步阳极氧化2) The first step of anodizing
将步骤1)得到的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.4M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第一步阳极氧化,氧化时间4小时。Put the aluminum flake obtained in step 1) in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.4M, at a voltage of 60V, the ambient temperature is less than 10 The first anodic oxidation is carried out at ℃, and the oxidation time is 4 hours.
3)腐蚀一次氧化膜3) Corrode the oxide film once
将步骤2)得到的铝片置于磷酸和铬酸的混合溶液中,在65℃烘箱中放置8小时,磷酸的浓度是5wt%,铬酸的浓度是1.5wt%。The aluminum sheet obtained in step 2) was placed in a mixed solution of phosphoric acid and chromic acid, and placed in an oven at 65° C. for 8 hours. The concentration of phosphoric acid was 5 wt%, and the concentration of chromic acid was 1.5 wt%.
4)第二步阳极氧化4) The second step of anodizing
将步骤3)得到的腐蚀好的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.4M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第二步阳极氧化,氧化时间20分钟。The corroded aluminum flake obtained in step 3) is placed in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum flake as the anode, in an aqueous solution of oxalic acid electrolyte with a concentration of 0.4M, under a voltage of 60V, the environment When the temperature is lower than 10°C, the second step of anodic oxidation is carried out, and the oxidation time is 20 minutes.
5)剥离铝基底5) Peel off the aluminum substrate
将步骤4)得到的产品,用饱和氯化铜浸泡,至没有气泡冒出时立即取出,得到了氧化铝膜。Soak the product obtained in step 4) with saturated copper chloride, and take it out immediately when no bubbles emerge, to obtain an aluminum oxide film.
6)去阻挡层6) Remove the blocking layer
将步骤5)得到的产品浸泡在5wt%的磷酸水溶液中35分钟。The product obtained in step 5) was soaked in 5wt% phosphoric acid aqueous solution for 35 minutes.
2.多孔氧化铝薄膜的紫外-可见-近红外光谱测试2. UV-visible-near-infrared spectroscopy test of porous alumina film
运用透射光谱技术测试多孔氧化铝薄膜的紫外-可见-近红外光谱,测试方法为所使用的仪器为Perkin Elmer公司生产的Lambda 950系列紫外-可见-近红外分光光度计,测量方式为扫描,波长范围200nm~2500nm,扫描速率为924nm/min。透射光谱在1000nm~2500nm范围内出现振荡,振荡峰的个数为8个,判定多孔氧化铝薄膜的通孔率为0,阻挡层的厚度为30nm~40nm。The ultraviolet-visible-near-infrared spectrum of the porous alumina film is tested by transmission spectroscopy. The test method is the Lambda 950 series ultraviolet-visible-near-infrared spectrophotometer produced by Perkin Elmer. The measurement method is scanning, wavelength The range is 200nm~2500nm, and the scan rate is 924nm/min. The transmission spectrum oscillates in the range of 1000nm-2500nm, and the number of oscillation peaks is 8. It is determined that the through-porosity of the porous alumina film is 0, and the thickness of the barrier layer is 30nm-40nm.
用场发射扫描电镜(Hitachi S4800)观察形貌,表明多孔氧化铝薄膜的通孔率为0,阻挡层的厚度约为30nm~40nm,与采用本发明的方法检测的结果一致。Observing the morphology with a field emission scanning electron microscope (Hitachi S4800) shows that the through-porosity of the porous aluminum oxide film is 0, and the thickness of the barrier layer is about 30nm to 40nm, which is consistent with the results detected by the method of the present invention.
实施例7Example 7
1.多孔氧化铝薄膜的制备1. Preparation of Porous Alumina Films
1)预处理1) Pretreatment
纯度为99.999%的高纯Al片(尺寸为2cm*2cm*0.025cm,购于北京蒙泰有研)用丙酮和去离子水(18.2MΩ/cm)分别超声清洗10分钟,并用体积比为7∶1∶2的浓磷酸、浓硫酸和浓硝酸的混合液在120℃化学抛光1分钟。High-purity Al flakes with a purity of 99.999% (size 2cm*2cm*0.025cm, purchased from Beijing Mengtai Research Institute) were ultrasonically cleaned with acetone and deionized water (18.2MΩ/cm) for 10 minutes, and the volume ratio was 7 A 1:2 mixture of concentrated phosphoric acid, concentrated sulfuric acid and concentrated nitric acid was chemically polished at 120° C. for 1 minute.
2)第一步阳极氧化2) The first step of anodizing
将步骤1)得到的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第一步阳极氧化,氧化时间1小时。Put the aluminum flake obtained in step 1) in an electrolytic cell of plexiglass or polytetrafluoroethylene, use graphite as the cathode, and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the ambient temperature is less than 10 The first anodic oxidation is carried out at ℃, and the oxidation time is 1 hour.
3)腐蚀一次氧化膜3) Corrode the oxide film once
将步骤2)得到的铝片置于磷酸和铬酸的混合溶液中,在65℃烘箱中放置2小时,磷酸的浓度是5wt%,铬酸的浓度是1.5wt%。Place the aluminum sheet obtained in step 2) in a mixed solution of phosphoric acid and chromic acid, place it in an oven at 65°C for 2 hours, the concentration of phosphoric acid is 5wt%, and the concentration of chromic acid is 1.5wt%.
4)第二步阳极氧化4) The second step of anodizing
将步骤3)得到的腐蚀好的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第二步阳极氧化,氧化时间5分钟。The corroded aluminum flake obtained in step 3) is placed in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the environment When the temperature is lower than 10°C, the second step of anodic oxidation is carried out, and the oxidation time is 5 minutes.
5)剥离铝基底5) Peel off the aluminum substrate
将步骤4)得到的产品,用饱和氯化铜浸泡,至没有气泡冒出时立即取出,得到了氧化铝膜。Soak the product obtained in step 4) with saturated copper chloride, and take it out immediately when no bubbles emerge, to obtain an aluminum oxide film.
6)去阻挡层6) Remove the blocking layer
将步骤5)得到的产品浸泡在5wt%的磷酸水溶液中40分钟。The product obtained in step 5) was soaked in 5wt% phosphoric acid aqueous solution for 40 minutes.
2.多孔氧化铝薄膜的紫外-可见-近红外光谱测试2. UV-visible-near-infrared spectroscopy test of porous alumina film
运用透射光谱技术测试多孔氧化铝薄膜的紫外-可见-近红外光谱,测试方法为所使用的仪器为Perkin Elmer公司生产的Lambda 950系列紫外-可见-近红外分光光度计,测量方式为扫描,波长范围200nm~2500nm,扫描速率为924nm/min。结果如图10所示,透射光谱只在1500nm~2500nm范围内出现振荡,震荡峰的数目为4个,透光率为70%,判定多孔氧化铝薄膜的通孔率为50%,阻挡层的厚度为15nm~25nm。The ultraviolet-visible-near-infrared spectrum of the porous alumina film is tested by transmission spectroscopy. The test method is the Lambda 950 series ultraviolet-visible-near-infrared spectrophotometer produced by Perkin Elmer. The measurement method is scanning, wavelength The range is 200nm~2500nm, and the scan rate is 924nm/min. The results are shown in Figure 10, the transmission spectrum only oscillates in the range of 1500nm to 2500nm, the number of oscillation peaks is 4, the light transmittance is 70%, the through-porosity of the porous aluminum oxide film is determined to be 50%, and the barrier layer The thickness is 15nm-25nm.
用场发射扫描电镜(Hitachi S4800)观察形貌(参见图11、图12),证明多孔氧化铝薄膜的通孔率为50%,阻挡层厚度约为15nm~25nm,与采用本发明的方法检测的结果一致。Observing the morphology (referring to Fig. 11, Fig. 12) with a field emission scanning electron microscope (Hitachi S4800), proves that the through-porosity of the porous aluminum oxide film is 50%, and the thickness of the barrier layer is about 15nm~25nm, which is the same as that detected by the method of the present invention. The results were consistent.
实施例8Example 8
1.多孔氧化铝薄膜的制备1. Preparation of Porous Alumina Films
1)预处理1) Pretreatment
纯度为99.999%的高纯Al片(尺寸为2cm*2cm*0.025cm,购于北京蒙泰有研)用丙酮和去离子水(18.2MΩ/cm)分别超声清洗10分钟,并用体积比为7∶1∶2的浓磷酸、浓硫酸和浓硝酸的混合液在120℃化学抛光1分钟。High-purity Al flakes with a purity of 99.999% (size 2cm*2cm*0.025cm, purchased from Beijing Mengtai Research Institute) were ultrasonically cleaned with acetone and deionized water (18.2MΩ/cm) for 10 minutes, and the volume ratio was 7 A 1:2 mixture of concentrated phosphoric acid, concentrated sulfuric acid and concentrated nitric acid was chemically polished at 120° C. for 1 minute.
2)第一步阳极氧化2) The first step of anodizing
将步骤1)得到的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,40V电压下,环境温度小于10℃时进行第一步阳极氧化,氧化时间12小时。Put the aluminum flake obtained in step 1) in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, at a voltage of 40V, the ambient temperature is less than 10 The first anodic oxidation is carried out at ℃, and the oxidation time is 12 hours.
3)腐蚀一次氧化膜3) Corrode the oxide film once
将步骤2)得到的铝片置于磷酸和铬酸的混合溶液中,在65℃烘箱中放置12小时,磷酸的浓度是5wt%,铬酸的浓度是1.5wt%。The aluminum sheet obtained in step 2) was placed in a mixed solution of phosphoric acid and chromic acid, and placed in an oven at 65° C. for 12 hours. The concentration of phosphoric acid was 5 wt%, and the concentration of chromic acid was 1.5 wt%.
4)第二步阳极氧化4) The second step of anodizing
将步骤3)得到的腐蚀好的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,40V电压下,环境温度小于10℃时进行第二步阳极氧化,氧化时间10分钟。The corroded aluminum flake obtained in step 3) is placed in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum flake as the anode, in an aqueous solution of oxalic acid electrolyte with a concentration of 0.3M, under a voltage of 40V, the environment When the temperature is lower than 10°C, the second step of anodic oxidation is carried out, and the oxidation time is 10 minutes.
5)剥离铝基底5) Peel off the aluminum substrate
将步骤4)得到的产品,用饱和氯化铜浸泡,至没有气泡冒出时立即取出,得到了氧化铝膜。Soak the product obtained in step 4) with saturated copper chloride, and take it out immediately when no bubbles emerge, to obtain an aluminum oxide film.
6)去阻挡层6) Remove the blocking layer
将步骤5)得到的产品浸泡在5wt%的磷酸水溶液中45分钟。The product obtained in step 5) was soaked in 5wt% phosphoric acid aqueous solution for 45 minutes.
2.多孔氧化铝薄膜的紫外-可见-近红外光谱测试2. UV-visible-near-infrared spectroscopy test of porous alumina film
运用透射光谱技术测试多孔氧化铝薄膜的紫外-可见-近红外光谱(见附图22),测试方法为所使用的仪器为Perkin Elmer公司生产的Lambda 950系列紫外-可见-近红外分光光度计,测量方式为扫描,波长范围200nm~2500nm,扫描速率为924nm/min。透射光谱只在1500nm~2500nm范围内出现振荡,震荡峰的数目为4个,透光率在80%,判定多孔氧化铝薄膜的通孔率为65%,阻挡层的厚度为15nm~25nm。Utilize transmission spectrum technology to test the ultraviolet-visible-near-infrared spectrum (see accompanying drawing 22) of porous aluminum oxide film, test method is the Lambda 950 series ultraviolet-visible-near-infrared spectrophotometer that the instrument used is Perkin Elmer Company to produce, The measurement method is scanning, the wavelength range is 200nm~2500nm, and the scanning rate is 924nm/min. The transmission spectrum only oscillates in the range of 1500nm-2500nm, the number of oscillating peaks is 4, the light transmittance is 80%, the through-porosity of the porous aluminum oxide film is determined to be 65%, and the thickness of the barrier layer is 15nm-25nm.
用场发射扫描电镜(Hitachi S4800)观察形貌,表明多孔氧化铝薄膜的通孔率为65%,阻挡层厚度约为15nm~25nm,与采用本发明的方法检测的结果一致。Observing the morphology with a field emission scanning electron microscope (Hitachi S4800) shows that the through-porosity of the porous aluminum oxide film is 65%, and the thickness of the barrier layer is about 15nm to 25nm, which is consistent with the result detected by the method of the present invention.
实施例9Example 9
1.多孔氧化铝薄膜的制备1. Preparation of Porous Alumina Films
1)预处理1) Pretreatment
纯度为99.999%的高纯Al片(尺寸为2cm*2cm*0.025cm,购于北京蒙泰有研)用丙酮和去离子水(18.2MΩ/cm)分别超声清洗10分钟,并用体积比为7∶1∶2的浓磷酸、浓硫酸和浓硝酸的混合液在120℃化学抛光1分钟。High-purity Al flakes with a purity of 99.999% (size 2cm*2cm*0.025cm, purchased from Beijing Mengtai Research Institute) were ultrasonically cleaned with acetone and deionized water (18.2MΩ/cm) for 10 minutes, and the volume ratio was 7 A 1:2 mixture of concentrated phosphoric acid, concentrated sulfuric acid and concentrated nitric acid was chemically polished at 120° C. for 1 minute.
2)第一步阳极氧化2) The first step of anodizing
将步骤1)得到的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第一步阳极氧化,氧化时间2小时。Put the aluminum flake obtained in step 1) in an electrolytic cell of plexiglass or polytetrafluoroethylene, use graphite as the cathode, and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the ambient temperature is less than 10 The first anodic oxidation is carried out at ℃, and the oxidation time is 2 hours.
3)腐蚀一次氧化膜3) Corrode the oxide film once
将步骤2)得到的铝片置于磷酸和铬酸的混合溶液中,在65℃烘箱中放置2小时,磷酸的浓度是5wt%,铬酸的浓度是1.5wt%。Place the aluminum sheet obtained in step 2) in a mixed solution of phosphoric acid and chromic acid, place it in an oven at 65°C for 2 hours, the concentration of phosphoric acid is 5wt%, and the concentration of chromic acid is 1.5wt%.
4)第二步阳极氧化4) The second step of anodizing
将步骤3)得到的腐蚀好的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第二步阳极氧化,氧化时间5分钟。The corroded aluminum flake obtained in step 3) is placed in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the environment When the temperature is lower than 10°C, the second step of anodic oxidation is carried out, and the oxidation time is 5 minutes.
5)剥离铝基底5) Peel off the aluminum substrate
将步骤4)得到的产品,用饱和氯化铜浸泡,至没有气泡冒出时立即取出,得到了氧化铝膜。Soak the product obtained in step 4) with saturated copper chloride, and take it out immediately when no bubbles emerge, to obtain an aluminum oxide film.
6)去阻挡层6) Remove the blocking layer
将步骤5)得到的产品浸泡在5wt%的磷酸水溶液中50分钟。The product obtained in step 5) was soaked in 5wt% phosphoric acid aqueous solution for 50 minutes.
2.多孔氧化铝薄膜的紫外-可见-近红外光谱测试2. UV-visible-near-infrared spectroscopy test of porous alumina film
运用透射光谱技术测试多孔氧化铝薄膜的紫外-可见-近红外光谱(见附图22),测试方法为所使用的仪器为Perkin Elmer公司生产的Lambda 950系列紫外-可见-近红外分光光度计,测量方式为扫描,波长范围200nm~2500nm,扫描速率为924nm/min。结果如图13所示,透射光谱只在1500nm~2500nm范围内出现振荡,震荡峰的数目为4个,透光率在85%,判定多孔氧化铝薄膜的通孔率为70%,阻挡层的厚度为5nm~10nm。Utilize transmission spectrum technology to test the ultraviolet-visible-near-infrared spectrum (see accompanying drawing 22) of porous aluminum oxide film, test method is the Lambda 950 series ultraviolet-visible-near-infrared spectrophotometer that the instrument used is Perkin Elmer Company to produce, The measurement method is scanning, the wavelength range is 200nm~2500nm, and the scanning rate is 924nm/min. The results are shown in Figure 13, the transmission spectrum only oscillates in the range of 1500nm to 2500nm, the number of oscillation peaks is 4, the light transmittance is 85%, it is determined that the through-porosity of the porous alumina film is 70%, and the barrier layer The thickness is 5nm-10nm.
用场发射扫描电镜(Hitachi S4800)观察形貌(参见图14、图15),证明多孔氧化铝薄膜的通孔率为70%,阻挡层厚度约为5nm~10nm,与采用本发明的方法检测的结果一致。Observing the morphology (referring to Fig. 14, Fig. 15) with a field emission scanning electron microscope (Hitachi S4800), it is proved that the through-porosity of the porous aluminum oxide film is 70%, and the thickness of the barrier layer is about 5nm~10nm, which is the same as that detected by the method of the present invention. The results were consistent.
实施例10Example 10
1.多孔氧化铝薄膜的制备1. Preparation of Porous Alumina Films
1)预处理1) Pretreatment
纯度为99.999%的高纯Al片(尺寸为2cm*2cm*0.025cm,购于北京蒙泰有研)用丙酮和去离子水(18.2MΩ/cm)分别超声清洗10分钟,并用体积比为7∶1∶2的浓磷酸、浓硫酸和浓硝酸的混合液在120℃化学抛光1分钟。High-purity Al flakes with a purity of 99.999% (size 2cm*2cm*0.025cm, purchased from Beijing Mengtai Research Institute) were ultrasonically cleaned with acetone and deionized water (18.2MΩ/cm) for 10 minutes, and the volume ratio was 7 A 1:2 mixture of concentrated phosphoric acid, concentrated sulfuric acid and concentrated nitric acid was chemically polished at 120° C. for 1 minute.
2)第一步阳极氧化2) The first step of anodizing
将步骤1)得到的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第一步阳极氧化,氧化时间4小时。Put the aluminum flake obtained in step 1) in an electrolytic cell of plexiglass or polytetrafluoroethylene, use graphite as the cathode, and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the ambient temperature is less than 10 The first anodic oxidation is carried out at ℃, and the oxidation time is 4 hours.
3)腐蚀一次氧化膜3) Corrode the oxide film once
将步骤2)得到的铝片置于磷酸和铬酸的混合溶液中,在65℃烘箱中放置6小时,磷酸的浓度是5wt%,铬酸的浓度是1.5wt%。The aluminum sheet obtained in step 2) was placed in a mixed solution of phosphoric acid and chromic acid, and placed in an oven at 65° C. for 6 hours. The concentration of phosphoric acid was 5 wt%, and the concentration of chromic acid was 1.5 wt%.
4)第二步阳极氧化4) The second step of anodizing
将步骤3)得到的腐蚀好的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第二步阳极氧化,氧化时间10分钟。The corroded aluminum flake obtained in step 3) is placed in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the environment When the temperature is lower than 10°C, the second step of anodic oxidation is carried out, and the oxidation time is 10 minutes.
5)剥离铝基底5) Peel off the aluminum substrate
将步骤4)得到的产品,用饱和氯化铜浸泡,至没有气泡冒出时立即取出,得到了氧化铝膜。Soak the product obtained in step 4) with saturated copper chloride, and take it out immediately when no bubbles emerge, to obtain an aluminum oxide film.
6)去阻挡层6) Remove the blocking layer
将步骤5)得到的产品浸泡在5wt%的磷酸水溶液中60分钟。The product obtained in step 5) was soaked in 5 wt% phosphoric acid aqueous solution for 60 minutes.
2.多孔氧化铝薄膜的紫外-可见-近红外光谱测试2. UV-visible-near-infrared spectroscopy test of porous alumina film
运用透射光谱技术测试多孔氧化铝薄膜的紫外-可见-近红外光谱,测试方法为所使用的仪器为Perkin Elmer公司生产的Lambda 950系列紫外-可见-近红外分光光度计,测量方式为扫描,波长范围200nm~2500nm,扫描速率为924nm/min。透射光谱只在1500nm~2500nm范围内出现振荡,震荡峰的数目为4个,透光率在90%,判定多孔氧化铝薄膜的通孔率为80%,阻挡层的厚度为5nm~10nm。The ultraviolet-visible-near-infrared spectrum of the porous alumina film is tested by transmission spectroscopy. The test method is the Lambda 950 series ultraviolet-visible-near-infrared spectrophotometer produced by Perkin Elmer. The measurement method is scanning, wavelength The range is 200nm~2500nm, and the scan rate is 924nm/min. The transmission spectrum only oscillates in the range of 1500nm-2500nm, the number of oscillating peaks is 4, the light transmittance is 90%, the through-porosity of the porous aluminum oxide film is determined to be 80%, and the thickness of the barrier layer is 5nm-10nm.
用场发射扫描电镜(Hitachi S4800)观察形貌,表明多孔氧化铝薄膜的通孔率为80%,阻挡层厚度约为5nm~10nm,与采用本发明的方法检测的结果一致。Observing the morphology with a field emission scanning electron microscope (Hitachi S4800) shows that the through-porosity of the porous aluminum oxide film is 80%, and the thickness of the barrier layer is about 5nm to 10nm, which is consistent with the result detected by the method of the present invention.
实施例11Example 11
1.多孔氧化铝薄膜的制备1. Preparation of Porous Alumina Films
1)预处理1) Pretreatment
纯度为99.999%的高纯Al片(尺寸为2cm*2cm*0.025cm,购于北京蒙泰有研)用丙酮和去离子水(18.2MΩ/cm)分别超声清洗10分钟,并用体积比为7∶1∶2的浓磷酸、浓硫酸和浓硝酸的混合液在120℃化学抛光1分钟。High-purity Al flakes with a purity of 99.999% (size 2cm*2cm*0.025cm, purchased from Beijing Mengtai Research Institute) were ultrasonically cleaned with acetone and deionized water (18.2MΩ/cm) for 10 minutes, and the volume ratio was 7 A 1:2 mixture of concentrated phosphoric acid, concentrated sulfuric acid and concentrated nitric acid was chemically polished at 120° C. for 1 minute.
2)第一步阳极氧化2) The first step of anodizing
将步骤1)得到的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第一步阳极氧化,氧化时间3小时。Put the aluminum flake obtained in step 1) in an electrolytic cell of plexiglass or polytetrafluoroethylene, use graphite as the cathode, and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the ambient temperature is less than 10 The first anodic oxidation is carried out at ℃, and the oxidation time is 3 hours.
3)腐蚀一次氧化膜3) Corrode the oxide film once
将步骤2)得到的铝片置于磷酸和铬酸的混合溶液中,在65℃烘箱中放置3小时,磷酸的浓度是5wt%,铬酸的浓度是1.5wt%。Place the aluminum sheet obtained in step 2) in a mixed solution of phosphoric acid and chromic acid, and place it in an oven at 65° C. for 3 hours. The concentration of phosphoric acid is 5 wt%, and the concentration of chromic acid is 1.5 wt%.
4)第二步阳极氧化4) The second step of anodizing
将步骤3)得到的腐蚀好的铝片在有机玻璃或者聚四氟乙烯的电解槽中,以石墨为阴极,铝片为阳极,在浓度为0.3M的草酸电解质水溶液中,60V电压下,环境温度小于10℃时进行第二步阳极氧化,氧化时间5分钟。The corroded aluminum flake obtained in step 3) is placed in an electrolytic cell of plexiglass or polytetrafluoroethylene, with graphite as the cathode and the aluminum flake as the anode, in an aqueous oxalic acid electrolyte solution with a concentration of 0.3M, under a voltage of 60V, the environment When the temperature is lower than 10°C, the second step of anodic oxidation is carried out, and the oxidation time is 5 minutes.
5)剥离铝基底5) Peel off the aluminum substrate
将步骤4)得到的产品,用饱和氯化铜浸泡,至没有气泡冒出时立即取出,得到了氧化铝膜。Soak the product obtained in step 4) with saturated copper chloride, and take it out immediately when no bubbles emerge, to obtain an aluminum oxide film.
6)去阻挡层6) Remove the blocking layer
将步骤5)得到的产品浸泡在5wt%的磷酸水溶液中70分钟。The product obtained in step 5) was soaked in 5wt% phosphoric acid aqueous solution for 70 minutes.
2.多孔氧化铝薄膜的紫外-可见-近红外光谱测试2. UV-visible-near-infrared spectroscopy test of porous alumina film
运用透射光谱技术测试多孔氧化铝薄膜的紫外-可见-近红外光谱,测试方法为所使用的仪器为Perkin Elmer公司生产的Lambda 950系列紫外-可见-近红外分光光度计,测量方式为扫描,波长范围200nm~2500nm,扫描速率为924nm/min。结果如图16所示,透射光谱在200nm~2500nm范围内不出现振荡,判定多孔氧化铝薄膜的通孔率为100%,阻挡层的厚度为0nm。The ultraviolet-visible-near-infrared spectrum of the porous alumina film is tested by transmission spectroscopy. The test method is the Lambda 950 series ultraviolet-visible-near-infrared spectrophotometer produced by Perkin Elmer. The measurement method is scanning, wavelength The range is 200nm~2500nm, and the scan rate is 924nm/min. The results are shown in Figure 16, the transmission spectrum does not oscillate in the range of 200nm-2500nm, it is determined that the through-porosity of the porous alumina film is 100%, and the thickness of the barrier layer is 0nm.
用场发射扫描电镜(Hitachi S4800)观察形貌(参见图17、图18),证明多孔氧化铝薄膜的通孔率为100%,阻挡层厚度为0nm,与采用本发明的方法检测的结果一致。Observing the morphology with a field emission scanning electron microscope (Hitachi S4800) (see Figure 17, Figure 18), it is proved that the through-porosity of the porous aluminum oxide film is 100%, and the thickness of the barrier layer is 0nm, which is consistent with the result detected by the method of the present invention.
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