CN102351281A - Fine-pitch multilayer pulse electric field flow treatment chamber - Google Patents

Abstract

The invention relates to a micro-pitch multi-layer pulsed electric field flow processing chamber, which includes a plurality of parallel layered processing chambers composed of a plurality of metal plate electrodes and insulating thin layers, and the insulating thin layer is arranged between the two metal plate electrodes The insulating thin layer needs to be specially tailored to form a streamlined processing chamber between the two metal flat electrodes. The thickness of the insulating thin layer is the electrode distance. The metal flat electrodes are staggered and placed, and the two ends are connected by metal screws to fix and conduct. In this way, only the metal plates at both ends need to be connected to the poles of the pulse power supply, and the use of multi-layer micro-pitch flat plate electrodes can reduce the production cost of the pulse power supply, that is, high field strength can be achieved without high voltage, and the electric field is evenly distributed and reduced. The edge effect is reduced and liquid circulation is facilitated; the device is small in size, which is conducive to the pulse electric field treatment technology entering the civilian field.

Description

A micro-pitch multi-layer pulsed electric field flow processing chamber

technical field

The invention relates to a sterilizing device for purifying civil water, in particular to a pulse electric field flow treatment chamber with multiple layers of micro-pitch and suitable for medium voltage.

Background technique

Pulsed electric field technology has the advantages of low treatment temperature, short sterilization time, low energy consumption, and no chemical by-products, so it has attracted widespread attention. The current pulsed electric field treatment chamber is relatively large, and a high-voltage pulsed electric field is often required to form an electric field sufficient to kill bacteria. Most of these devices are still in the stage of laboratory research and have not been widely used in industrial and civilian fields. Due to the influence of factors such as electrode shape, there is a problem of uneven electric field distribution in the treatment chamber, which makes the electric field strength of each part between the two electrodes very different, resulting in the possibility of arc discharge in the part where the electric field strength is too high; or the electric field strength is too low The treatment effect of the nominal electric field strength may not be achieved locally. And because the research on the pulsed electric field processing system is basically based on a large-capacity processing chamber, a high-voltage pulse generator is required. For example, Chinese Invention Patent No. 200410011305 discloses a high-voltage pulsed electric field treatment device, and Chinese Invention Patent No. 200710008437 discloses a pulsed electric field treatment chamber that can be used in continuous high-voltage pulsed electric field equipment. This type of device is bulky, high in cost, difficult to manufacture, and poor in stability. The micro-gap treatment chamber can use a low-voltage pulse generator to achieve the same sterilization effect, but the processing capacity of a single micro-gap treatment chamber is small, and the right-angled edge of the flat electrode has an edge effect, which is easy to generate electric sparks.

Therefore, there is an urgent need for a pulsed electric field sterilization equipment with simple structure, low cost and wide application range that can effectively process materials.

Contents of the invention

In view of this, in order to solve the above problems, the present invention proposes a pulsed electric field sterilization equipment with simple structure, low cost, and effective treatment of materials. By cascading multiple electrodes, not only can the capacity of the treatment chamber be expanded, but also can be used under low voltage conditions. High electric field can be obtained under the condition of pulse electric field, which solves the problem that high-voltage pulse power supply equipment must be used for pulse electric field sterilization, and reduces the cost of pulse power supply equipment. The processing chamber is designed to be streamlined to reduce the edge effect of the right-angled edge of the flat electrode and facilitate material circulation. Displaced plate electrodes are used to make the electric field evenly distributed, which facilitates more effective material processing.

A micro-pitch multilayer pulsed electric field flow processing chamber provided by the present invention includes at least one positive electrode, at least one negative electrode, at least two insulating thin layers and an insulating box; the positive electrode and the negative electrode are plate electrodes and are opposite to each other fixedly placed, the two insulating layers are respectively arranged on the opposite surfaces of the positive and negative electrodes, a processing chamber is formed between the opposite surfaces of the two insulating layers, the positive electrode and the negative electrode are respectively connected to the two poles of the pulse power supply, The electric force line direction of the electric field between the positive electrode and the negative electrode is perpendicular to the material flow direction in the processing chamber, and the positive and negative electrodes are sealed in an insulating box.

Further, the insulating thin layer includes a first insulating thin layer and a second insulating thin layer, the middle of the first insulating thin layer and the second insulating thin layer is recessed, and the first insulating thin layer and the second insulating thin layer A streamlined processing chamber with narrow ends and a wide middle is formed between them;

Further, the width of the first insulating thin layer is larger than the width of the corresponding position of the second insulating thin layer and the first insulating thin layer;

Further, the upper and lower ends of the positive electrode are fixed by a first metal screw, and the upper and lower ends of the negative electrode are fixed by a second metal screw;

Further, the positive and negative electrodes are respectively provided with a first wiring slot and a second wiring slot, and the side of the insulating box is provided with a first wiring opening and a second wiring opening, and the first wiring opening is connected to the first wiring slot , the second wiring port is connected to the second wiring slot;

Further, the insulating box is provided with an inlet and an outlet. The inlet and the outlet communicate with the processing chamber, and the side of the insulating box with the inlet is provided with a groove matching the width of the processing chamber, and the inlet is located in the center of the groove. The side of the insulating box with the outlet is provided with a groove matching the width of the processing chamber, and the outlet is located in the center of the groove;

Further, the positive and negative electrodes are flat metal electrodes. The positive and negative electrodes are also provided with a hydrophilic coating, and the thickness of the hydrophilic coating is 0 to 5 microns;

Further, the metal plate electrode is made of stainless steel;

Further, the insulating thin layer is made of polytetrafluoroethylene;

Further, the positive and negative electrodes include 12 metal flat plates, and the metal flat plates are parallel and overlapable along the direction of the screw.

The advantage of the present invention is that: the use of cascaded multi-electrodes can not only expand the capacity of the treatment chamber, but also obtain a high electric field under low voltage conditions, which solves the problem that high-voltage pulse power supply equipment must be used for pulse electric field sterilization, and reduces the cost of pulse power supply equipment. Cost, so that the energy consumption is relatively low, which can further improve the energy utilization rate, and the device is small; the processing chamber is designed to be streamlined, which can reduce the edge effect of the right-angled edge of the flat electrode and facilitate material circulation; the misplaced flat electrode is used, and the electric field is evenly distributed , to facilitate more effective material processing; the electrodes are fixed by metal screws, and all corresponding positive and negative electrodes can be realized by connecting external power at both ends; at the same time, fixed by screws, it is easy to disassemble, clean and replace the electrodes. Therefore, the present invention greatly reduces the pulse power supply voltage, reduces the cost, improves the safety, and facilitates the pulse electric field technology to enter the civilian field.

Other advantages, objects and features of the present invention will be set forth in the following description to some extent, and to some extent, will be obvious to those skilled in the art based on the investigation and research below, or can be obtained from It is taught in the practice of the present invention. The objectives and other advantages of the invention may be realized and attained by the structure particularly pointed out in the written description and claims hereof as well as the appended drawings.

Description of drawings

In order to make the purpose, technical solutions and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with the accompanying drawings, wherein:

Fig. 1 is the schematic diagram of the processing chamber of the present invention without end cap;

Fig. 2 is a schematic diagram of the electrode structure of the present invention;

Fig. 3 is a schematic diagram of the sealing box of the present invention;

Fig. 4 is an internal schematic diagram of a single processing unit of the present invention;

Fig. 5 is a schematic diagram of the top of the sealing box of the present invention;

Figure 6 is the velocity profile of a channel with a width of 2 cm at the entrance and a channel with a width of 2 cm at the exit (the entrance velocity is 0.01 m/s);

Figure 7 is the velocity distribution diagram at the exit of the channel with an entrance width of 2 cm and an exit width of 2 cm (the entrance velocity is 0.01 m/s);

Figure 8 is the velocity profile of a channel with an entrance width of 2 cm and an exit width of 4 cm (entrance velocity is 0.01 m/s);

Figure 9 is the distribution of velocity at the exit of a channel with an entrance width of 2 cm and an exit width of 4 cm (entrance velocity is 0.01 m/s);

Figure 10 is the velocity profile of a channel with an entrance width of 2 cm and an exit width of 6 cm (entrance velocity is 0.01 m/s);

Figure 11 is the velocity distribution diagram at the exit of the channel with an entrance width of 2 cm and an exit width of 6 cm in Figure 7 (the entrance velocity is 0.01 m/s);

Figure 12 is the velocity profile of a channel with an entrance width of 2 cm and an exit width of 4 cm (entrance velocity is 0.001 m/s);

Figure 13 is the velocity profile of a channel with an entrance width of 2 cm and an exit width of 4 cm (entrance velocity is 0.02 m/s).

Detailed ways

The preferred embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings; it should be understood that the preferred embodiments are only for illustrating the present invention, rather than limiting the protection scope of the present invention.

Fig. 1 is the schematic diagram of the treatment chamber of the present invention without the end cap; the embodiment provided by the present invention adopts 6 positive electrodes and 6 negative electrodes, and Fig. 2 is a schematic diagram of the electrode structure of the present invention; Fig. 3 is a schematic diagram of the sealed box of the present invention; Fig. 4 It is the internal schematic diagram of the single processing unit of the present invention. As shown in the figure: a micro-pitch multi-layer pulsed electric field flow treatment chamber provided by the present invention includes at least one positive electrode 1, at least one negative electrode 2, at least two insulating thin layers 13 and an insulating box 12; The electrode 1 and the negative electrode 2 are plate-shaped electrodes and are relatively fixedly placed. The two insulating layers 13 are respectively arranged on the opposite surfaces of the positive and negative electrodes, and a processing chamber 3 is formed between the opposite surfaces of the two insulating layers 13. The positive electrode 1 and the negative electrode 2 are respectively connected to the two poles of the pulse power supply, the direction of the electric field between the positive electrode 1 and the negative electrode 2 is perpendicular to the flow direction of the material in the processing chamber 3, and the positive and negative electrodes are sealed in an insulating In the box body 12; when actually placed, the box is placed flat, that is, the liquid to be treated can enter from the left and exit from the right.

As a further improvement of the above-mentioned embodiment, the insulating thin layer 13 includes a first insulating thin layer 131 and a second insulating thin layer 132, the middle parts of the first insulating thin layer 131 and the second insulating thin layer 132 are recessed, and the A streamlined processing chamber with a narrow top and a wide bottom is formed between the first insulating thin layer 131 and the second insulating thin layer 132 .

As a further improvement of the above embodiment, the thickness of the first insulating thin layer 131 is greater than the thickness of the second insulating thin layer 132 at a position corresponding to the first insulating thin layer 131 .

As a further improvement of the above embodiment, the upper and lower ends of the positive electrode are fixed by the first metal screw 4 , and the upper and lower ends of the negative electrode are fixed by the second metal screw 5 .

As a further improvement of the above embodiment, the positive and negative electrodes are respectively provided with a first junction groove 6 and a second junction groove 7, and the position of the second junction groove 7 at the other side electrode corresponds to the position of the first junction groove 6, The side of the insulating box body 12 is provided with a first connection port 8 and a second connection port 9, the second connection port corresponds to the position 8 on the opposite side of the first connection port 8, and the first connection port 8 is connected to the first connection port. The slot 6 is connected, the second connection port 9 is connected to the second connection slot 7, and the first connection slot 6 and the second connection slot 7 on the positive and negative electrodes inside the insulating box 12 are respectively connected to the first connection port 8 on the outside. It corresponds to the position of the second wiring port 9 and connects, and then realizes the connection with the pulse power supply equipment.

As a further improvement of the above embodiment, the insulating box 12 is provided with an inlet 10 and an outlet 11, the inlet 10 and the outlet 11 are connected to the processing chamber 3, and all positive and negative electrodes are fixed and placed in a sealed box 12 In the inner space, they together form a treatment chamber that can be used for continuous treatment; the side of the insulating box body that has an entrance is provided with a groove 14 that matches the width of the treatment chamber 3, and the groove inside the outlet of the sealed box is recessed inside the entrance of the sealed box The opposite side of the groove 14 corresponds to the position of 14, the inlet is located in the center of the groove, the side of the insulating box with the outlet is provided with a groove matching the width of the processing chamber 3, and the outlet is located in the groove. central.

As a further improvement of the above embodiment, the positive and negative electrodes are flat metal electrodes; the positive and negative electrodes are also provided with a hydrophilic coating, and the thickness of the hydrophilic coating is 0 to 5 microns.

As a further improvement of the above embodiment, the flat metal electrode is made of stainless steel.

As a further improvement of the above embodiment, the insulating thin layer is made of polytetrafluoroethylene.

As a further improvement of the above embodiment, the positive and negative electrodes include 12 metal flat plates, and the metal flat plates can be overlapped in parallel along the screw direction. The first metal screw 4 includes two metal screws fixed on the upper and lower ends of the positive electrode respectively. The metal screw 5 includes two metal screws fixed on the upper and lower ends of the negative electrode respectively, and a total of four screws realize the fixing and conduction of the same polarity.

Each pair of positive and negative electrodes is separated by an insulating sheet to form a processing chamber, and the electrodes at both ends are provided with junction slots 6 and 7 to facilitate connection with the two poles of the pulse electric field equipment. The number of electrodes can be increased or decreased according to actual needs, so as to generate different numbers of processing chambers and achieve different single processing quantities. The thickness of the insulating sheet can also be appropriately adjusted, such as 200 microns, 300 microns or greater thickness, and the insulating sheet can also be processed directly on both sides of the metal electrode 2 with an insulating material having a thickness of several hundred microns. The electrodes are fixed and conducted with metal screws, which facilitates disassembly, cleaning and replacement of the electrodes.

The shape of the insulating thin layer 13 is shown in the shaded part in Fig. 4, and a streamlined processing chamber 3 with a narrow top and a wide bottom is formed in the middle. In order to correspond to the staggered electrodes, the width of the left and right insulating layers is not symmetrical.

The metal plate positive and negative electrodes 1 and 2 are made of stainless steel or more corrosion-resistant metal electrodes can be selected. The insulating thin layer 13 or the insulating coating 13 is made of polytetrafluoroethylene. The sealed box 12 can also be made of polytetrafluoroethylene.

The working process using a single chamber is described in detail below:

The treatment chamber placed in the insulating box is placed horizontally, that is, the treatment liquid enters from the left side and flows out from the right side. In actual use, multiple treatment chambers can be connected in series to further improve the sterilization effect.

When using a single-layer static treatment chamber (that is, one positive electrode and one negative electrode), the electric field strength is 20 kV/cm, the number of pulses is 50, the pulse width is 50 microns, and the pulse interval is 400 ms, E. coli has 3.22 orders of magnitude When it is actually used for flow treatment, the pulse frequency is much higher, which is more conducive to sterilization.

The size of the electrode can be adjusted according to actual needs. In this example, the electrode width is 10 cm and the length is 15 cm. The width of the actual processing chamber can be adjusted appropriately, but it is best to meet the narrow entrance and exit width; the number of electrodes is 12, and the electrode distance is 200 microns , The electrode thickness is 1 mm, and the size of the sealed box can be adjusted according to the number of electrodes used, that is, the internal size is just enough to accommodate multi-layer electrodes, and the grooves at both ends are 5 mm deep.

Fig. 6 is the velocity profile of a channel with an entrance width of 2 cm and an exit width of 2 cm (the entrance velocity is 0.01 m/s); Fig. 7 is a velocity profile at the exit of a channel with an entrance width of 2 cm and an exit width of 2 cm (the entrance velocity is 0.01 m/s); Figure 8 is the velocity profile of a channel with an entrance width of 2 cm and an exit width of 4 cm (the entrance velocity is 0.01 m/s); Figure 9 is the velocity at the exit of a channel with an entrance width of 2 cm and an exit width of 4 cm Distribution map (inlet velocity is 0.01 m/s); Figure 10 is the velocity profile of the channel with an entrance width of 2 cm and an exit width of 6 cm (inlet velocity is 0.01m/s); Figure 11 is a channel with an entrance width of 2 cm and an exit width of 6 cm The velocity profile at the exit of the cm channel (inlet velocity is 0.01 m/s); Figure 12 is the velocity profile of the channel with an entrance width of 2 cm and an exit width of 4 cm (inlet velocity is 0.001 m/s); Figure 13 is the entrance width Velocity profile of a 2 cm channel with a 4 cm exit width (entrance velocity is 0.02 m/s). It can be seen from these figures that when the width of the inlet and outlet is the same, the velocity distribution in the entire processing channel is relatively more uneven; of course, the larger the width of the outlet, the better. Excessive temperature rise of the liquid may result in the process channel. Therefore, after comprehensive consideration, this example chooses a processing channel with an entrance width of 2 cm, an exit width of 4 cm, and a width of 7 cm in the middle.

As a treatment chamber suitable for continuous flow, it is necessary to control its flow rate, especially the micro-gap channel of the present invention. It is necessary to ensure that the treatment liquid receives a sufficient number of pulses in the channel, and at the same time ensure a sufficient processing volume per unit time. It is also necessary to reduce the possibility of air bubbles when the liquid is circulated, and an appropriate flow rate is required. It can be seen from Figures 8, 12, and 13 that when the inlet velocity reaches 0.02 m/s, the flow velocity distribution in the channel becomes extremely irregular, and bubbles are likely to be generated. The lower the inlet velocity, the more uniform the flow velocity distribution in the entire channel. Considering all factors, the inlet velocity can be selected between 0.001 m/s and 0.01 m/s.

The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalent technologies, the present invention also intends to include these modifications and variations.

Claims (10)

1. little spacing multilayer pulsed electrical field flowing process chamber is characterized in that: comprise at least one positive electrode (1), at least one negative potential (2), two heat insulating laminas (13) and insulation box body (12) at least; Said positive electrode (1) is that plate electrode and relative fixed are placed with negative potential (2); Said two insulation layers (13) are arranged at respectively on the opposite face of positive and negative electrode; Form treatment chamber (3) between said two insulation layers (13) opposite face; Said positive electrode (1) is connected with the two poles of the earth of the pulse power respectively with negative potential (2); The power line direction of electric field is vertical with treatment chamber (3) Flow of Goods and Materials direction between said positive electrode (1) and the negative potential (2), and said positive and negative electrode is sealed in the insulation box body (12).

2. little spacing multilayer pulsed electrical field flowing process according to claim 1 chamber; It is characterized in that: said heat insulating lamina (13) comprises first heat insulating lamina (131) and second heat insulating lamina (132); The medial recess of said first heat insulating lamina (131) and second heat insulating lamina (132) forms the wide streamlined treatment chamber in narrow centre, two ends between said first heat insulating lamina (131) and second heat insulating lamina (132).

3. little spacing multilayer pulsed electrical field flowing process according to claim 2 chamber is characterized in that: the width of said first heat insulating lamina (131) is greater than the width of second heat insulating lamina (132) with first heat insulating lamina (131) opposite position.

4. little spacing multilayer pulsed electrical field flowing process according to claim 3 chamber is characterized in that: said positive electrode upper and lower ends is fixing through first metal screw (4), and said negative potential upper and lower ends is fixing through second metal screw (5).

5. little spacing multilayer pulsed electrical field flowing process according to claim 4 chamber; It is characterized in that: said positive and negative electrode is respectively arranged with first connecting groove (6) and second connecting groove (7); Said insulation box body (12) side is provided with first connection jaws (8) and second connection jaws (9); Said first connection jaws (8) links to each other with first connecting groove (6), and said second connection jaws (9) links to each other with second connecting groove (7).

6. little spacing multilayer impulse electric field flowing process according to claim 5 chamber; It is characterized in that: said insulation box body (12) is provided with inlet (10) and outlet (11); Said inlet (10) and outlet (11) are connected with treatment chamber (3); The side that said insulation box body offers inlet is provided with the groove (14) with process chamber (3) width coupling; Said inlet is positioned at the central authorities at groove position; The side that said insulation box body offers outlet is provided with the groove (15) with process chamber (3) width coupling, and said outlet is positioned at the central authorities at groove position.

7. little spacing multilayer pulsed electrical field flowing process according to claim 6 chamber, it is characterized in that: said positive and negative electrode is the metal plate electrode; Said positive and negative electrode also is provided with hydrophilic coating, and said hydrophilic coating thickness is 0 to 5 micron.

8. little spacing multilayer pulsed electrical field flowing process according to claim 7 chamber is characterized in that: said metal plate electrodes use stainless steel is made.

9. little spacing multilayer pulsed electrical field flowing process according to claim 8 chamber is characterized in that: described heat insulating lamina adopts the tetrafluoroethylene material to make.

10. little spacing multilayer pulsed electrical field flowing process according to claim 9 chamber, it is characterized in that: said positive and negative electrode comprises 12 metal plates, said metal plate along the screw rod direction is parallel can be overlapping.

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