CN102308364A - Laser exposure device - Google Patents
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- CN102308364A CN102308364A CN2010800064003A CN201080006400A CN102308364A CN 102308364 A CN102308364 A CN 102308364A CN 2010800064003 A CN2010800064003 A CN 2010800064003A CN 201080006400 A CN201080006400 A CN 201080006400A CN 102308364 A CN102308364 A CN 102308364A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
- H01L21/0275—Photolithographic processes using lasers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
- G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
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- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
- G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
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- G—PHYSICS
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70083—Non-homogeneous intensity distribution in the mask plane
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
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Abstract
本发明提供一种激光曝光装置,其具备:第一蝇眼透镜(2),其扩大激光的截面形状;第一光程差调整构件(3),其配置于第一蝇眼透镜(2)的激光的入射侧且使向第一蝇眼透镜(2)的各聚光透镜(2a)分别入射的激光产生相位差;会聚透镜(4),其将从第一蝇眼透镜(3)射出的激光转变为平行光;第二蝇眼透镜(6),其将激光带来的光掩模的照明区域内的光强度分布均匀化;第二光程差调整构件(7),其配置于第二蝇眼透镜(6)的激光的入射侧,使向第二蝇眼透镜(6)的各聚光透镜(6a)分别入射的激光产生相位差。由此,将由蝇眼透镜产生的激光的干涉条纹平均化,同时降低激光的照度不均。
The invention provides a laser exposure device, which comprises: a first fly-eye lens (2), which enlarges the cross-sectional shape of laser light; a first optical path difference adjustment member (3), which is arranged on the first fly-eye lens (2) The incident side of the laser light and make the laser light respectively incident on each condenser lens (2a) of the first fly's eye lens (2) produce phase difference; The laser light is converted into parallel light; the second fly-eye lens (6), which uniformizes the light intensity distribution in the illumination area of the photomask brought by the laser light; the second optical path difference adjustment member (7), which is configured in On the incident side of the laser beam of the second fly's eye lens (6), phase differences are generated in the laser beams respectively incident on the condenser lenses (6a) of the second fly's eye lens (6). Thereby, the interference fringes of the laser light generated by the fly-eye lens are averaged, and the unevenness of the illuminance of the laser light is reduced.
Description
技术领域 technical field
本发明涉及具备在与激光的光轴大致垂直的面内并列配置有多个聚光透镜的蝇眼(フライアイ)透镜而成的激光曝光装置,详细而言,涉及将由蝇眼透镜产生的激光的干涉条纹平均化,同时降低激光的照度不均而可进行均匀的曝光的激光曝光装置。The present invention relates to a laser exposure apparatus including a fly-eye lens in which a plurality of condenser lenses are arranged in parallel in a plane approximately perpendicular to the optical axis of laser light. A laser exposure device that averages the interference fringes and reduces the unevenness of the illumination of the laser light to perform uniform exposure.
背景技术 Background technique
现有的激光曝光装置为了使激光均匀地照射被曝光体,使用扩大激光的直径的光束扩展器、及用于将扩大了直径的激光的强度分布均匀化的蝇眼透镜等光积分仪等。而且,为了利用激光的相干性(可干涉性)而降低由蝇眼透镜的透过光干涉所产生的干涉条纹,在光束扩展器和蝇眼透镜之间设置光程差调整构件(例如,参照专利文献1)。A conventional laser exposure apparatus uses a beam expander for enlarging the diameter of the laser beam and an optical integrator such as a fly-eye lens for uniformizing the intensity distribution of the enlarged laser beam in order to uniformly irradiate the object to be exposed with the laser beam. And, in order to utilize the coherence (interferability) of laser light and reduce the interference fringes produced by the transmitted light interference of the fly-eye lens, an optical path difference adjustment member is provided between the beam expander and the fly-eye lens (for example, refer to Patent Document 1).
专利文献1:特开2004-12757号公报Patent Document 1: JP-A-2004-12757
但是,在这种现有的激光曝光装置中,因为光程差调整构件只设于光束扩展器和蝇眼透镜之间,因此,不能完全除去蝇眼透镜的透过光引起的干涉条纹,由于少许残存的干涉条纹而在被曝光体上产生照度不均,难以进行微细的图案的形成。However, in this existing laser exposure apparatus, because the optical path difference adjustment member is only arranged between the beam expander and the fly-eye lens, therefore, the interference fringes caused by the transmitted light of the fly-eye lens cannot be completely removed. Illumination unevenness occurs on the object to be exposed due to a small amount of remaining interference fringes, making it difficult to form fine patterns.
发明内容 Contents of the invention
因此,本发明针对这样的问题,其目的在于,提供一种将由蝇眼透镜产生的激光的干涉条纹平均化,同时降低激光的照度不均,可进行均匀的曝光的激光曝光装置。Therefore, the present invention addresses such a problem, and an object of the present invention is to provide a laser exposure apparatus that can average out interference fringes of laser light generated by a fly-eye lens, reduce uneven illuminance of laser light, and perform uniform exposure.
为了实现所述目的,本发明的激光曝光装置,具备:激光光源,其发射激光;第一蝇眼透镜,其在与所述激光的光轴大致正交的面内并列配置多个透镜,将射出光暂时聚光后,使其放射状地发散,扩大激光的截面形状;第一相位差产生装置,其配置于所述第一蝇眼透镜的激光的入射侧,使向所述第一蝇眼透镜的各聚光透镜分别入射的激光产生相位差;会聚透镜,其将从所述第一蝇眼透镜射出且扩大了截面形状的激光变换为平行光;第二蝇眼透镜,其在与所述会聚透镜的光轴大致正交的面内并列配置多个透镜,将激光带来的光掩模的照明区域内的光强度分布均匀化;第二相位差产生装置,其配置于所述第二蝇眼透镜的激光的入射侧,使向所述第二蝇眼透镜的各聚光透镜分别入射的激光产生相位差。In order to achieve the above object, the laser exposure apparatus of the present invention is provided with: a laser light source, which emits laser light; After the emitted light is temporarily concentrated, it is radially diverged to expand the cross-sectional shape of the laser light; the first phase difference generating device is arranged on the incident side of the laser light of the first fly-eye lens, so that Each condensing lens of the lens produces a phase difference between the incident laser light respectively; the condensing lens converts the laser light emitted from the first fly-eye lens and expands the cross-sectional shape into parallel light; A plurality of lenses are arranged in parallel in a plane on which the optical axes of the above-mentioned converging lenses are substantially perpendicular, so as to uniformize the light intensity distribution in the illumination area of the photomask brought by the laser light; the second phase difference generating device is arranged on the first The incident side of the laser beam of the second fly's eye lens causes a phase difference between the laser beams respectively incident on the condenser lenses of the second fly's eye lens.
根据这样的构成,从激光光源发射激光,使其不扩大光束直径而向配置于第一蝇眼透镜的激光的入射侧的第一相位差产生装置入射,通过该第一相位差产生装置使向在与第一蝇眼透镜的光轴大致正交的面内并列配置的多个聚光透镜分别入射的激光产生相位差,使从第一蝇眼透镜射出的激光的相干性降低,通过第一蝇眼透镜将各聚光透镜的射出光暂时聚光后,使其放射状发散,扩大激光的截面形状,通过会聚透镜将扩大了该截面形状的激光转变为平行光,通过配置于第二蝇眼透镜的激光的入射侧的第二相位差产生装置使向在与第二蝇眼透镜的光轴大致正交的面内并列配置的多个聚光透镜分别入射的激光产生相位差,使从第二蝇眼透镜射出的激光的相干性再次降低,通过第二蝇眼透镜将光强度分布均匀化使其照射光掩模。According to such a configuration, the laser light is emitted from the laser light source so that it enters the first phase difference generating device arranged on the incident side of the laser light of the first fly's eye lens without expanding the beam diameter, and the laser beam is incident on the first phase difference generating device by the first phase difference generating device. The laser beams incident on the plurality of condensing lenses arranged in parallel in a plane approximately perpendicular to the optical axis of the first fly's eye lens have a phase difference, which reduces the coherence of the laser beam emitted from the first fly's eye lens. The fly-eye lens temporarily condenses the emitted light from each condenser lens, diverges it radially, and expands the cross-sectional shape of the laser. The second phase difference generating device on the incident side of the laser beam of the lens generates a phase difference between the laser beams respectively incident on the plurality of condenser lenses arranged in parallel in a plane substantially perpendicular to the optical axis of the second fly's eye lens, so that the phase difference from the second fly's eye lens The coherence of the laser light emitted by the second fly-eye lens is reduced again, and the light intensity distribution is uniformized by the second fly-eye lens to irradiate the photomask.
另外,在所述会聚透镜的激光的入射侧设有相对光轴倾斜配置并以光轴为中心旋转的透明的平行平面旋转板。由此,将设于会聚透镜的激光的入射侧并相对光轴倾斜配置的透明的平行平面旋转板以光轴为中心旋转,使向第二蝇眼透镜入射的激光的入射角度变化。In addition, a transparent plane-parallel rotating plate that is arranged obliquely to the optical axis and rotates around the optical axis is provided on the incident side of the laser light of the condensing lens. Thereby, the transparent plane-parallel rotating plate provided on the incident side of the laser beam of the condenser lens and arranged obliquely with respect to the optical axis is rotated around the optical axis to change the incident angle of the laser beam incident on the second fly's eye lens.
根据第一方面的激光曝光装置的发明,通过第一及第二两个相位差产生装置使向第一及第二蝇眼透镜的各聚光透镜分别入射的多个激光产生相位差,使从第一及第二蝇眼透镜射出的激光的相干性降低,因此,能够相比现有技术进一步降低在照明区域产生的干涉条纹。另外,相比使用一个蝇眼透镜的情况,能够将激光的强度分布更均匀化,进一步降低照度不均。从而,能够对光掩模均匀照明而进行均匀的曝光,易于对被曝光体进行微细的图案的曝光。另外,第一蝇眼透镜具有均匀化激光的功能和扩大光束直径的功能这两种功能,因此,不需要另外配备光束扩展器,能够减少零件个数。According to the invention of the laser exposure device of the first aspect, the phase difference is generated by the first and second two phase difference generating devices to the plurality of laser beams respectively incident on the condenser lenses of the first and second fly's eye lenses, so that The coherence of the laser light emitted by the first and second fly's eye lenses is reduced, so the interference fringes generated in the illumination area can be further reduced compared with the prior art. In addition, compared to the case of using a single fly-eye lens, the intensity distribution of the laser light can be more uniform, and the unevenness of illumination can be further reduced. Accordingly, it is possible to uniformly illuminate the photomask to perform uniform exposure, and it is easy to perform exposure of a fine pattern on an object to be exposed. In addition, since the first fly-eye lens has both functions of homogenizing the laser light and expanding the beam diameter, it is not necessary to separately provide a beam expander, and the number of parts can be reduced.
另外,根据第二方面的发明,能够使向第二蝇眼透镜入射的激光的入射角度在曝光中变化。因此,能够使从第二蝇眼透镜的各聚光透镜射出的激光带来的光掩模上的照明区域随着平行平面旋转板的旋转而微动,能够将在光掩模上的照明区域产生的激光的干涉条纹平均化使其不显著。由此,能够进一步降低激光的照度不均,能够更均匀地曝光被曝光体。In addition, according to the second aspect of the invention, the incident angle of the laser beam incident on the second fly's eye lens can be changed during exposure. Therefore, the illumination area on the photomask brought by the laser light emitted from each condenser lens of the second fly's eye lens can be slightly moved along with the rotation of the parallel plane rotating plate, and the illumination area on the photomask can be adjusted The interference fringes of the generated laser light are averaged to make them inconspicuous. Thereby, the unevenness of the illuminance of a laser beam can be further reduced, and an object to be exposed can be exposed more uniformly.
附图说明 Description of drawings
图1是表示本发明的激光曝光装置的第一实施方式的正视图。FIG. 1 is a front view showing a first embodiment of a laser exposure apparatus of the present invention.
图2是表示上述激光曝光装置的平行平面旋转板的位置和向第二蝇眼透镜入射的激光的入射角度及光掩模上的照明区域的变化的关系的说明图。2 is an explanatory view showing the relationship between the position of the plane-parallel rotating plate of the laser exposure apparatus, the incident angle of the laser beam incident on the second fly-eye lens, and the change of the illuminated area on the photomask.
图3是表示本发明的激光曝光装置的第二实施方式的正视图。3 is a front view showing a second embodiment of the laser exposure apparatus of the present invention.
具体实施方式 Detailed ways
下面,基于附图对本发明的实施方式详细进行说明。图1是表示本发明的激光曝光装置的第一实施方式的正视图。该激光曝光装置经由光掩模向被曝光体照射激光进行曝光,其具备激光光源1、第一蝇眼透镜2、第一光程差调整构件3、第一会聚透镜4、平行平面旋转板5、第二蝇眼透镜6、第二光程差调整构件7、第二会聚透镜8而成。Hereinafter, embodiments of the present invention will be described in detail based on the drawings. FIG. 1 is a front view showing a first embodiment of a laser exposure apparatus of the present invention. This laser exposure apparatus irradiates laser light to an object to be exposed through a photomask to expose, and includes a
上述激光光源1为紫外线脉冲激光振荡器,可使用准分子激光器或YAG激光器等。The above-mentioned
在上述激光光源1的激光的发射方向前方设有第一蝇眼透镜2。该第一蝇眼透镜2在将从激光光源1发射的激光暂时聚光后,使其放射状发散,实现扩大激光的截面形状的光束扩展器的功能,同时,将后述第二蝇眼透镜6的入射侧面内的光强度分布均匀化,在大致正交于激光的光轴的面内,例如纵3个×横3个矩阵状地并排配置有多个聚光透镜2a。A first fly-eye lens 2 is arranged in front of the emission direction of the laser light of the above-mentioned
在上述第一蝇眼透镜2的激光的入射侧设有第一光程差调整构件3。该第一光程差调整构件3用于降低从第一蝇眼透镜2射出的激光的相干性并抑制从第一蝇眼透镜2的各聚光透镜2a射出的多个激光在第二蝇眼透镜6的入射侧面上发生干涉,构成使分别向第一蝇眼透镜2的各聚光透镜2a入射的多个激光产生相位差的第一相位差产生装置。A first optical path
具体而言,第一光程差调整构件3与第一蝇眼透镜2的各聚光透镜2a相对应,为设置有平行于光轴的轴方向的长度分别不同且折射率大于1的棒状的透明构件3a,例如石英玻璃或透明玻璃等的构件,其发挥改变向第一蝇眼透镜2的各聚光透镜2a分别入射的多个激光的光学的光路长度的功能。Specifically, the first optical path
在上述激光的行进方向,在第一蝇眼透镜2的下游侧设有第一会聚透镜4。该第一会聚透镜4用于将从第一蝇眼透镜2射出的放射状的激光变为平行光,光的入射侧为平坦的平凸透镜,使其前焦点位置与第一蝇眼透镜2的后焦点位置大致重合地进行配置。A
在上述第一蝇眼透镜2和第一会聚透镜4之间的光路上设有平行平面旋转板5。该平行平面旋转板5用于改变向后述第二蝇眼透镜6入射的激光的入射角度,其将透明的例如玻璃圆板设为相对光轴倾斜,且其以光轴为中心旋转。由此,使光掩模9上的激光的照明区域微动,将在光掩模9上产生的由第二蝇眼透镜6引起的激光的干涉条纹平均化使其不显著。另外,经过第一光程差调整构件3使从第一蝇眼透镜发射的激光的照度不均降低。A parallel plane rotating plate 5 is provided on the optical path between the above-mentioned first fly's eye lens 2 and the
图2是表示平行平面旋转板5的位置与向第二蝇眼透镜6入射的激光的入射角度及光掩模9上的照明区域的变化的关系的说明图。在平行平面旋转板5以光轴为中心旋转时,平行平面旋转板5以在图2(a)的正视图中如箭头所示地往复移动。该情况下,平行平面旋转板5位于同图(a)中实线所示的位置时,激光由该平行平面旋转板5如实线所示折射,以一定的入射角度向第二蝇眼透镜6的聚光透镜6a入射。FIG. 2 is an explanatory view showing the relationship between the position of the plane-parallel rotating plate 5 , the incident angle of the laser beam incident on the second fly-
另一方面,平行平面旋转板5旋转,在达到图2(a)中虚线所示的位置时,激光由该平行平面旋转板5如虚线所示地折射,以与上述不同的入射角度向上述聚光透镜6a入射。其结果为,由从第二蝇眼透镜6射出的激光照明的光掩模9上的照明区域10从同图(b)中实线所示的区域向虚线所示的区域移动。这样,旋转平行平面旋转板5而使向第二蝇眼透镜6入射的激光的入射角度变化,由此,将从第一蝇眼透镜2射出的激光的强度不均平均化,同时,使光掩模9上的照明区域10微动,能够使由于从第二蝇眼透镜6射出的多个激光的干涉而在光掩模9上产生的干涉条纹的明暗状态及照度不均平均化,使其不显著。On the other hand, when the plane-parallel rotating plate 5 rotates and reaches the position shown by the dotted line in FIG. The
在上述激光的行进方向,在第一会聚透镜4的下游侧设有第二蝇眼透镜6。该第二蝇眼透镜6将光掩模9的照明区域10内的光强度分布均匀化,在与第一会聚透镜4的光轴大致正交的面内例如纵12个×横4个的矩阵状地配置有多个聚光透镜6a,为将两组相同蝇眼透镜组合而成的双蝇眼透镜。A second fly-
在上述第二蝇眼透镜6的激光的入射侧设有第二光程差调整构件7。该第二光程差调整构件7用于降低从第二蝇眼透镜6射出的激光的相干性并抑制从第二蝇眼透镜6的各聚光透镜6a射出的多个激光在光掩模9上干涉,成为使分别向第二蝇眼透镜6的各聚光透镜6a入射的多个激光产生相位差的第二相位差产生装置。A second optical path difference adjustment member 7 is provided on the incident side of the laser light of the second fly's
具体而言,第二光程差调整构件7分别与第二蝇眼透镜6的纵4列的聚光透镜6a对应,使平行于光轴的轴方向的长度分别不同且折射率大于1的板状的透明构件7a例如石英玻璃或透明玻璃等沿横方向重合而形成,发挥改变向第二蝇眼透镜6的各聚光透镜6a分别入射的纵4列的激光在横方向邻接的列之间的光学的光路长度功能。Specifically, the second optical path difference adjustment member 7 corresponds to the
在上述激光的行进方向,在第二蝇眼透镜6的下游侧设有第二会聚透镜8。该第二会聚透镜8用于将从第二蝇眼透镜6射出的激光变为平行光并使其垂直向光掩模9入射,光的入射侧将平坦的两个平凸透镜组合而构成,且使其前焦点位置与第二蝇眼透镜6的后焦点位置大致重合地配置。另外,在图1中,符号11、12、13为弯折光路的平面反射镜。A second converging lens 8 is provided on the downstream side of the second fly's
下面,对这样构成的激光曝光装置的动作进行说明。Next, the operation of the laser exposure apparatus configured in this way will be described.
从激光光源1发射的激光由两个反射镜11、12进行反射,并向第一光程差调整构件3入射。该第一光程差调整构件3与第一蝇眼透镜2的各聚光透镜2a相对应,将平行于光轴的轴方向的长度分别不同且折射率大于1的多个透明构件3a组合而构成,因此,从第一光程差调整构件3的多个透明构件3a射出的多个激光相互相位错开。Laser light emitted from the
从第一光程差调整构件3的多个透明构件3a射出的多个激光分别向第一蝇眼透镜2的对应的聚光透镜2a入射。而且,从第一蝇眼透镜2的各聚光透镜2a射出的多个激光分别在聚光于各聚光透镜3a的后焦点后,放射状地发散。该情况下,向第一蝇眼透镜2的各聚光透镜2a入射的各激光因为相互相位错位,所以降低了从第一蝇眼透镜2射出的激光的相干性。因此,在由从各聚光透镜2a射出的多个激光照明的第二蝇眼透镜6上,抑制了各激光的干涉,且抑制了干涉条纹的产生,第二蝇眼透镜6被大致均匀地照明。A plurality of laser beams emitted from the plurality of
从第一蝇眼透镜3射出的放射状的激光通过第一会聚透镜4转变为平行光后,经第二光程差调整构件7向第二蝇眼透镜6入射。此时,在第一会聚透镜4的激光的入射侧设有相对光轴倾斜配置有透明的例如玻璃的圆板的平行平面旋转板5,由于其以光轴为中心旋转,因此,如图2(a)所示,由平行平面旋转板5折射并从此射出的激光的主光线的向第一会聚透镜4入射的位置在第一会聚透镜4的半径方向发生变化。由此,如同图(a)所示,向第二蝇眼透镜6入射的激光的入射角度发生变化。同时,将向第二蝇眼透镜6入射的激光的照度不均平均化。The radial laser light emitted from the first fly's
另一方面,从第一会聚透镜4射出的激光在将平行于光轴的轴方向的长度分别不同且折射率大于1的多个透明构件7a组合而构成的第二光程差调整构件7被分割为多束激光,对第二蝇眼透镜6进行照明。此时,因为通过第二光程差调整构件7的各透明构件7a的各激光的光学光路长不同,所以,在从第二光程差调整构件7射出的各激光之间产生相位差。因此,降低了从第二蝇眼透镜6射出的激光的相干性,且抑制了从第二蝇眼透镜6的各聚光透镜6a射出并向光掩模9照射的各激光的干涉。On the other hand, the laser light emitted from the first converging
从第二蝇眼透镜6的各聚光透镜6a射出的激光分别暂时聚光于各聚光透镜6a的焦点后,放射状发散并向平面反射镜13入射。而且,激光由平面反射镜13反射后由第二会聚透镜8转变为平行光,大致垂直地向光掩模9入射,对光掩模9上均匀进行照明。The laser light emitted from each condensing
在此,在上述第一实施方式中,通过将光轴方向的长度不同且在纵方向长的板状的透明构件7a沿横方向重合而构成第二光程差调整构件7,对于沿第二蝇眼透镜6的纵方向排列的各聚光透镜6a入射同相位的激光,对于沿横方向排列的各聚光透镜6a入射相位不同的激光,因此,在光掩模9上的照明区域10可能产生极少的从沿第二蝇眼透镜6的纵方向排列的各聚光透镜6a射出的同相位的激光引起的干涉条纹。但是,在上述第一实施方式中,在第一会聚透镜4的入射侧设有平行平面旋转板5,其以其光轴为中心旋转,因此,向第二蝇眼透镜6入射的激光的入射角度发生变化。因此,如图2(b)所示,光掩模9上的激光产生的照明区域10微动,将上述干涉条纹的明暗状态平均化并使其不显著,同时能够将激光的照度不均平均化,进行均匀的曝光。Here, in the above-mentioned first embodiment, the second optical path difference adjusting member 7 is formed by overlapping the plate-shaped
图3是表示本发明的激光曝光装置的第二实施方式的正视图。在该第二实施方式中,与第一实施方式不同之处是代替第二会聚透镜8而在平面反射镜13的位置配置了准直反射镜14。该情况下,使准直反射镜14的前焦点位置与第二蝇眼透镜6的后焦点位置大致一致。由此,可以将从第二蝇眼透镜6射出的激光光转换为平行光,使其向光掩模9垂直入射。3 is a front view showing a second embodiment of the laser exposure apparatus of the present invention. This second embodiment differs from the first embodiment in that a collimating mirror 14 is arranged in place of the plane mirror 13 instead of the second converging lens 8 . In this case, the front focus position of the collimating mirror 14 is substantially aligned with the back focus position of the second fly's
另外,在上述第一及第二实施方式中,第二光程差调整构件7与第二蝇眼透镜6的纵4列的聚光透镜6a分别对应,将平行于光轴的轴方向的长度分别不同的板状的透明构件7a在横方向重合而形成的情况进行了说明,但本发明不限于此,也可以与第二蝇眼透镜6的各聚光透镜6a对应,将平行于光轴的轴方向的长度分别不同的棒状的透明构件组合而形成。该情况下,因为从第二蝇眼透镜6的各聚光透镜6a射出的各激光的相位完全不同,因此,各激光在光掩模9上干涉的可能性减少。In addition, in the above-mentioned first and second embodiments, the second optical path difference adjustment member 7 corresponds to the
另外,在上述实施方式中,对相位差产生装置为光程差调整构件的情况进行了说明,但本发明不限于此,也可以为对应蝇眼透镜的各聚光透镜设置的相位板。In addition, in the above-mentioned embodiment, the case where the phase difference generator is the optical path difference adjusting member has been described, but the present invention is not limited thereto, and may be a phase plate provided corresponding to each condenser lens of the fly's eye lens.
符号说明Symbol Description
1…激光光源1…laser light source
2…第一蝇眼透镜(蝇眼透镜)2…The first fly-eye lens (fly-eye lens)
2a…第一蝇眼透镜的聚光透镜2a...Condenser lens of the first fly-eye lens
3…第一光程差调整构件(第一相位差产生装置)3...First optical path difference adjusting member (first phase difference generating device)
3a…第一光程差调整构件的透明构件3a...Transparent member of the first optical path difference adjusting member
4…第一会聚透镜4…first converging lens
5…平行平面旋转板5...parallel plane rotating plate
6…第二蝇眼透镜6…second fly eye lens
6a…第二蝇眼透镜的聚光透镜6a...Condenser lens of the second fly-eye lens
7…第二光程差调整构件(第二相位差产生装置)7...second optical path difference adjusting member (second phase difference generating means)
7a…第二光程差调整构件的透明构件7a...Transparent member of the second optical path difference adjusting member
8…第二会聚透镜8...Second converging lens
9…光掩模9…photomask
10…光掩模上的照明区域10…Illumination area on the photomask
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JP5803222B2 (en) * | 2011-04-05 | 2015-11-04 | 株式会社ブイ・テクノロジー | Laser illumination device |
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