CN102254917A - 薄膜晶体管阵列基板及其制法 - Google Patents
薄膜晶体管阵列基板及其制法 Download PDFInfo
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- CN102254917A CN102254917A CN201110189950XA CN201110189950A CN102254917A CN 102254917 A CN102254917 A CN 102254917A CN 201110189950X A CN201110189950X A CN 201110189950XA CN 201110189950 A CN201110189950 A CN 201110189950A CN 102254917 A CN102254917 A CN 102254917A
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- thin film
- scanning signal
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/18, H10D48/04 and H10D48/07, with or without impurities, e.g. doping materials
- H01L21/44—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/38 - H01L21/428
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/01—Manufacture or treatment
- H10D86/021—Manufacture or treatment of multiple TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/441—Interconnections, e.g. scanning lines
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Thin Film Transistor (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
Claims (10)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110189950.XA CN102254917B (zh) | 2011-07-07 | 2011-07-07 | 薄膜晶体管阵列基板及其制法 |
US13/376,913 US8867004B2 (en) | 2011-07-07 | 2011-09-20 | Thin-film-transistor array substrate and manufacturing method thereof |
PCT/CN2011/079854 WO2013004050A1 (zh) | 2011-07-07 | 2011-09-20 | 薄膜晶体管阵列基板及其制法 |
US14/487,129 US9214483B2 (en) | 2011-07-07 | 2014-09-16 | Thin-film-transistor array substrate and manufacturing method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110189950.XA CN102254917B (zh) | 2011-07-07 | 2011-07-07 | 薄膜晶体管阵列基板及其制法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102254917A true CN102254917A (zh) | 2011-11-23 |
CN102254917B CN102254917B (zh) | 2014-05-21 |
Family
ID=44982052
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201110189950.XA Active CN102254917B (zh) | 2011-07-07 | 2011-07-07 | 薄膜晶体管阵列基板及其制法 |
Country Status (3)
Country | Link |
---|---|
US (2) | US8867004B2 (zh) |
CN (1) | CN102254917B (zh) |
WO (1) | WO2013004050A1 (zh) |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103018989A (zh) * | 2012-12-07 | 2013-04-03 | 京东方科技集团股份有限公司 | 一种阵列基板及其制造方法和液晶显示装置 |
WO2013139054A1 (zh) * | 2012-03-19 | 2013-09-26 | 深圳市华星光电技术有限公司 | 具有寄生电容补正结构的薄膜晶体管及用该薄膜晶体管的液晶显示器 |
CN103472647A (zh) * | 2013-09-22 | 2013-12-25 | 合肥京东方光电科技有限公司 | 一种阵列基板、液晶显示面板及显示装置 |
CN103499907A (zh) * | 2013-10-25 | 2014-01-08 | 合肥京东方光电科技有限公司 | 阵列基板、显示装置和阵列基板的制作方法 |
WO2014063386A1 (zh) * | 2012-10-22 | 2014-05-01 | 深圳市华星光电技术有限公司 | 液晶面板的驱动电路 |
US9025102B2 (en) | 2012-10-22 | 2015-05-05 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Drive circuit of liquid crystal panel |
CN104656328A (zh) * | 2013-11-15 | 2015-05-27 | 群创光电股份有限公司 | 显示面板及显示装置 |
WO2015192436A1 (zh) * | 2014-06-17 | 2015-12-23 | 深圳市华星光电技术有限公司 | Tft阵列基板结构 |
WO2016074295A1 (zh) * | 2014-11-14 | 2016-05-19 | 深圳市华星光电技术有限公司 | 一种液晶显示器及其阵列基板 |
WO2017076153A1 (zh) * | 2015-11-05 | 2017-05-11 | 京东方科技集团股份有限公司 | 阵列基板及显示装置 |
CN107134473A (zh) * | 2016-02-29 | 2017-09-05 | 三星显示有限公司 | 显示装置 |
WO2021051528A1 (zh) * | 2019-09-17 | 2021-03-25 | 深圳市华星光电半导体显示技术有限公司 | 阵列基板及显示面板 |
CN113851444A (zh) * | 2020-06-25 | 2021-12-28 | 株式会社日立功率半导体 | 功率模块 |
US11694614B2 (en) | 2016-09-23 | 2023-07-04 | Samsung Display Co., Ltd. | Display device |
US11721269B2 (en) | 2016-09-22 | 2023-08-08 | Samsung Display Co., Ltd. | Display device |
US11849615B2 (en) | 2016-11-29 | 2023-12-19 | Samsung Display Co., Ltd. | Display device with protection against electrostatic discharge |
US11895884B2 (en) | 2017-02-21 | 2024-02-06 | Samsung Display Co., Ltd. | Display device |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20160190157A1 (en) * | 2014-12-30 | 2016-06-30 | Shenzhen China Star Optoelectronics Technology Co. Ltd. | Pixel structure and manufacturing method thereof |
JP6376989B2 (ja) * | 2015-02-19 | 2018-08-22 | 株式会社ジャパンディスプレイ | 表示装置 |
CN106206746B (zh) * | 2016-09-28 | 2020-07-24 | 京东方科技集团股份有限公司 | 薄膜晶体管、goa电路、显示基板和显示装置 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003347558A (ja) * | 2002-05-23 | 2003-12-05 | Lg Philips Lcd Co Ltd | 液晶表示装置用アレイ基板及びその製造方法、並びに薄膜トランジスタ |
US20040080681A1 (en) * | 2000-06-09 | 2004-04-29 | Hong-Man Moon | Liquid crystal display device array substrate and method of manufacturing the same |
CN1987626A (zh) * | 2006-12-26 | 2007-06-27 | 友达光电股份有限公司 | 薄膜晶体管结构 |
CN101115333A (zh) * | 2006-07-24 | 2008-01-30 | 精工爱普生株式会社 | 电光装置用基板及电光装置以及电子设备 |
CN101359670A (zh) * | 2007-07-31 | 2009-02-04 | 北京京东方光电科技有限公司 | 一种有源驱动tft矩阵结构及其制造方法 |
US20110073860A1 (en) * | 2009-09-30 | 2011-03-31 | Sony Corporation | Semiconductor device and display device |
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US5327001A (en) * | 1987-09-09 | 1994-07-05 | Casio Computer Co., Ltd. | Thin film transistor array having single light shield layer over transistors and gate and drain lines |
JP2001257350A (ja) * | 2000-03-08 | 2001-09-21 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
KR100464208B1 (ko) * | 2001-12-20 | 2005-01-03 | 엘지.필립스 엘시디 주식회사 | 액정 표시장치 및 그 구동방법 |
JP4088190B2 (ja) * | 2002-05-21 | 2008-05-21 | セイコーエプソン株式会社 | 電気光学装置及び電子機器 |
US7538399B2 (en) * | 2004-12-15 | 2009-05-26 | Samsung Electronics Co., Ltd. | Thin film transistor substrate and manufacturing method thereof |
US7697093B2 (en) * | 2006-08-08 | 2010-04-13 | Au Optronics Corp. | Array panel |
JP5116277B2 (ja) * | 2006-09-29 | 2013-01-09 | 株式会社半導体エネルギー研究所 | 半導体装置、表示装置、液晶表示装置、表示モジュール及び電子機器 |
CN101504500B (zh) | 2008-02-04 | 2011-08-31 | 北京京东方光电科技有限公司 | 薄膜晶体管液晶显示器阵列基板的像素结构 |
KR101572084B1 (ko) * | 2008-07-16 | 2015-11-26 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
KR101294237B1 (ko) * | 2010-10-07 | 2013-08-07 | 엘지디스플레이 주식회사 | 프린지 필드 스위칭 모드 액정표시장치용 어레이 기판 및 이의 제조방법 |
KR20120049716A (ko) * | 2010-11-09 | 2012-05-17 | 삼성전자주식회사 | 표시 기판, 이의 제조 방법 및 이를 포함하는 표시 장치 |
-
2011
- 2011-07-07 CN CN201110189950.XA patent/CN102254917B/zh active Active
- 2011-09-20 WO PCT/CN2011/079854 patent/WO2013004050A1/zh active Application Filing
- 2011-09-20 US US13/376,913 patent/US8867004B2/en active Active
-
2014
- 2014-09-16 US US14/487,129 patent/US9214483B2/en not_active Expired - Fee Related
Patent Citations (6)
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US20040080681A1 (en) * | 2000-06-09 | 2004-04-29 | Hong-Man Moon | Liquid crystal display device array substrate and method of manufacturing the same |
JP2003347558A (ja) * | 2002-05-23 | 2003-12-05 | Lg Philips Lcd Co Ltd | 液晶表示装置用アレイ基板及びその製造方法、並びに薄膜トランジスタ |
CN101115333A (zh) * | 2006-07-24 | 2008-01-30 | 精工爱普生株式会社 | 电光装置用基板及电光装置以及电子设备 |
CN1987626A (zh) * | 2006-12-26 | 2007-06-27 | 友达光电股份有限公司 | 薄膜晶体管结构 |
CN101359670A (zh) * | 2007-07-31 | 2009-02-04 | 北京京东方光电科技有限公司 | 一种有源驱动tft矩阵结构及其制造方法 |
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Cited By (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013139054A1 (zh) * | 2012-03-19 | 2013-09-26 | 深圳市华星光电技术有限公司 | 具有寄生电容补正结构的薄膜晶体管及用该薄膜晶体管的液晶显示器 |
WO2014063386A1 (zh) * | 2012-10-22 | 2014-05-01 | 深圳市华星光电技术有限公司 | 液晶面板的驱动电路 |
US9025102B2 (en) | 2012-10-22 | 2015-05-05 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Drive circuit of liquid crystal panel |
CN103018989A (zh) * | 2012-12-07 | 2013-04-03 | 京东方科技集团股份有限公司 | 一种阵列基板及其制造方法和液晶显示装置 |
US9500922B2 (en) | 2013-09-22 | 2016-11-22 | Boe Technology Group Co., Ltd. | Array substrate, liquid crystal display panel and display device |
CN103472647A (zh) * | 2013-09-22 | 2013-12-25 | 合肥京东方光电科技有限公司 | 一种阵列基板、液晶显示面板及显示装置 |
CN103472647B (zh) * | 2013-09-22 | 2016-04-06 | 合肥京东方光电科技有限公司 | 一种阵列基板、液晶显示面板及显示装置 |
CN103499907A (zh) * | 2013-10-25 | 2014-01-08 | 合肥京东方光电科技有限公司 | 阵列基板、显示装置和阵列基板的制作方法 |
CN103499907B (zh) * | 2013-10-25 | 2016-01-06 | 合肥京东方光电科技有限公司 | 阵列基板、显示装置和阵列基板的制作方法 |
CN104656328A (zh) * | 2013-11-15 | 2015-05-27 | 群创光电股份有限公司 | 显示面板及显示装置 |
CN104656328B (zh) * | 2013-11-15 | 2017-10-31 | 群创光电股份有限公司 | 显示面板及显示装置 |
GB2541342A (en) * | 2014-06-17 | 2017-02-15 | Shenzhen China Star Optoelect | TFT array substrate structure |
WO2015192436A1 (zh) * | 2014-06-17 | 2015-12-23 | 深圳市华星光电技术有限公司 | Tft阵列基板结构 |
GB2541342B (en) * | 2014-06-17 | 2018-12-12 | Shenzhen China Star Optoelect | TFT array substrate structure |
WO2016074295A1 (zh) * | 2014-11-14 | 2016-05-19 | 深圳市华星光电技术有限公司 | 一种液晶显示器及其阵列基板 |
WO2017076153A1 (zh) * | 2015-11-05 | 2017-05-11 | 京东方科技集团股份有限公司 | 阵列基板及显示装置 |
US12092934B2 (en) | 2015-11-05 | 2024-09-17 | Boe Technology Group Co., Ltd. | Array substrate and display device |
US11493813B2 (en) | 2015-11-05 | 2022-11-08 | Boe Technology Group Co., Ltd. | Array substrate and display device |
CN107134473A (zh) * | 2016-02-29 | 2017-09-05 | 三星显示有限公司 | 显示装置 |
CN107134473B (zh) * | 2016-02-29 | 2023-11-07 | 三星显示有限公司 | 显示装置 |
US11721269B2 (en) | 2016-09-22 | 2023-08-08 | Samsung Display Co., Ltd. | Display device |
US11694614B2 (en) | 2016-09-23 | 2023-07-04 | Samsung Display Co., Ltd. | Display device |
US11849615B2 (en) | 2016-11-29 | 2023-12-19 | Samsung Display Co., Ltd. | Display device with protection against electrostatic discharge |
US11895884B2 (en) | 2017-02-21 | 2024-02-06 | Samsung Display Co., Ltd. | Display device |
WO2021051528A1 (zh) * | 2019-09-17 | 2021-03-25 | 深圳市华星光电半导体显示技术有限公司 | 阵列基板及显示面板 |
CN113851444A (zh) * | 2020-06-25 | 2021-12-28 | 株式会社日立功率半导体 | 功率模块 |
Also Published As
Publication number | Publication date |
---|---|
US9214483B2 (en) | 2015-12-15 |
US8867004B2 (en) | 2014-10-21 |
US20130009155A1 (en) | 2013-01-10 |
WO2013004050A1 (zh) | 2013-01-10 |
US20150004759A1 (en) | 2015-01-01 |
CN102254917B (zh) | 2014-05-21 |
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C53 | Correction of patent of invention or patent application | ||
CB03 | Change of inventor or designer information |
Inventor after: Zhang Conglong Inventor before: Zhang Conglong Inventor before: Tang Yunan Inventor before: Wang Jing |
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Free format text: CORRECT: INVENTOR; FROM: ZHANG CONGLONG TANG YUNAN WANG JING TO: ZHANG CONGLONG |
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Address after: 518132 No. 9-2 Ming Avenue, Guangming New District, Guangdong, Shenzhen Patentee after: TCL China Star Optoelectronics Technology Co.,Ltd. Address before: 518132 No. 9-2 Ming Avenue, Guangming New District, Guangdong, Shenzhen Patentee before: Shenzhen China Star Optoelectronics Technology Co.,Ltd. |
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Effective date of registration: 20210305 Address after: No.109, Kangping Road, Liuyang economic and Technological Development Zone, Changsha, Hunan 410300 Patentee after: Changsha Huike optoelectronics Co.,Ltd. Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Patentee before: TCL China Star Optoelectronics Technology Co.,Ltd. |