CN102236254B - radiation sensitive composition - Google Patents
radiation sensitive composition Download PDFInfo
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- CN102236254B CN102236254B CN 201010153239 CN201010153239A CN102236254B CN 102236254 B CN102236254 B CN 102236254B CN 201010153239 CN201010153239 CN 201010153239 CN 201010153239 A CN201010153239 A CN 201010153239A CN 102236254 B CN102236254 B CN 102236254B
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- Prior art keywords
- radiation
- sensitive composition
- alkyl
- film
- sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000005855 radiation Effects 0.000 title claims abstract description 46
- 239000000203 mixture Substances 0.000 title claims abstract description 45
- 229920005989 resin Polymers 0.000 claims abstract description 37
- 239000011347 resin Substances 0.000 claims abstract description 37
- 239000002253 acid Substances 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 229920001568 phenolic resin Polymers 0.000 claims description 24
- 239000005011 phenolic resin Substances 0.000 claims description 24
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 20
- 238000006243 chemical reaction Methods 0.000 claims description 17
- 229920000642 polymer Polymers 0.000 claims description 13
- 125000003545 alkoxy group Chemical group 0.000 claims description 12
- 150000002596 lactones Chemical group 0.000 claims description 12
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 11
- 230000004048 modification Effects 0.000 claims description 11
- 238000012986 modification Methods 0.000 claims description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 11
- 239000002904 solvent Substances 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 239000003086 colorant Substances 0.000 claims description 5
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims description 4
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 claims description 3
- 239000004094 surface-active agent Substances 0.000 claims description 3
- 239000000080 wetting agent Substances 0.000 claims description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- 229920001577 copolymer Polymers 0.000 claims 1
- 238000011161 development Methods 0.000 abstract description 20
- 238000005299 abrasion Methods 0.000 abstract description 5
- 238000007334 copolymerization reaction Methods 0.000 abstract description 3
- 229920002521 macromolecule Polymers 0.000 abstract description 2
- 239000000975 dye Substances 0.000 description 20
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- 230000018109 developmental process Effects 0.000 description 18
- 239000011248 coating agent Substances 0.000 description 17
- 238000000034 method Methods 0.000 description 17
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 16
- -1 poly(hydroxystyrene) Polymers 0.000 description 14
- 239000000047 product Substances 0.000 description 11
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 10
- 239000000178 monomer Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 238000003384 imaging method Methods 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
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- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical group O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 229930188620 butyrolactone Natural products 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical group CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
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- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 4
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 4
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
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- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 2
- OZJPLYNZGCXSJM-UHFFFAOYSA-N 5-valerolactone Chemical compound O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
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- 238000004132 cross linking Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000011981 development test Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
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- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 239000000123 paper Substances 0.000 description 2
- QROGIFZRVHSFLM-UHFFFAOYSA-N prop-1-enylbenzene Chemical compound CC=CC1=CC=CC=C1 QROGIFZRVHSFLM-UHFFFAOYSA-N 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
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- KSBAEPSJVUENNK-UHFFFAOYSA-L tin(ii) 2-ethylhexanoate Chemical compound [Sn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O KSBAEPSJVUENNK-UHFFFAOYSA-L 0.000 description 2
- 150000003918 triazines Chemical class 0.000 description 2
- CLECMSNCZUMKLM-UHFFFAOYSA-N (4-ethenylphenyl)methanol Chemical compound OCC1=CC=C(C=C)C=C1 CLECMSNCZUMKLM-UHFFFAOYSA-N 0.000 description 1
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 1
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical class C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 1
- SFIRETRJZMGEOA-UHFFFAOYSA-N 1,3-dimethyl-4-phenylpyrrole-2,5-dione Chemical compound O=C1N(C)C(=O)C(C)=C1C1=CC=CC=C1 SFIRETRJZMGEOA-UHFFFAOYSA-N 0.000 description 1
- UOZNXGJVAWDLQK-UHFFFAOYSA-N 1-(2,3-dimethylphenyl)pyrrole-2,5-dione Chemical compound CC1=CC=CC(N2C(C=CC2=O)=O)=C1C UOZNXGJVAWDLQK-UHFFFAOYSA-N 0.000 description 1
- STFXXRRQKFUYEU-UHFFFAOYSA-N 16-methylheptadecyl prop-2-enoate Chemical compound CC(C)CCCCCCCCCCCCCCCOC(=O)C=C STFXXRRQKFUYEU-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- ZPSJGADGUYYRKE-UHFFFAOYSA-N 2H-pyran-2-one Chemical class O=C1C=CC=CO1 ZPSJGADGUYYRKE-UHFFFAOYSA-N 0.000 description 1
- RBTBFTRPCNLSDE-UHFFFAOYSA-N 3,7-bis(dimethylamino)phenothiazin-5-ium Chemical compound C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RBTBFTRPCNLSDE-UHFFFAOYSA-N 0.000 description 1
- ZRYCRPNCXLQHPN-UHFFFAOYSA-N 3-hydroxy-2-methylbenzaldehyde Chemical compound CC1=C(O)C=CC=C1C=O ZRYCRPNCXLQHPN-UHFFFAOYSA-N 0.000 description 1
- YWHXSJOSFZIVON-UHFFFAOYSA-N 4,5,6-tris(trichloromethyl)triazine Chemical class ClC(Cl)(Cl)C1=NN=NC(C(Cl)(Cl)Cl)=C1C(Cl)(Cl)Cl YWHXSJOSFZIVON-UHFFFAOYSA-N 0.000 description 1
- KPSVDBWUTUPBKC-UHFFFAOYSA-N 4-(3,5-dimethoxyphenyl)-5,6-bis(trichloromethyl)triazine Chemical class ClC(Cl)(Cl)C1=C(C(=NN=N1)C1=CC(=CC(=C1)OC)OC)C(Cl)(Cl)Cl KPSVDBWUTUPBKC-UHFFFAOYSA-N 0.000 description 1
- JTLUGMGGICESBO-UHFFFAOYSA-N 4-(5-methoxynaphthalen-1-yl)-5,6-bis(trichloromethyl)triazine Chemical compound C1=CC=C2C(OC)=CC=CC2=C1C1=NN=NC(C(Cl)(Cl)Cl)=C1C(Cl)(Cl)Cl JTLUGMGGICESBO-UHFFFAOYSA-N 0.000 description 1
- IXAUCVOJRVFRBJ-UHFFFAOYSA-N 4-(trichloromethyl)triazine Chemical class ClC(Cl)(Cl)C1=CC=NN=N1 IXAUCVOJRVFRBJ-UHFFFAOYSA-N 0.000 description 1
- LCDYAJGWSATFHV-UHFFFAOYSA-N 4-methoxy-5-phenyltriazine Chemical class COC1=NN=NC=C1C1=CC=CC=C1 LCDYAJGWSATFHV-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 239000007848 Bronsted acid Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
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- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- PCSIMZDQSMALIT-UHFFFAOYSA-N OC1=CC=C(C=C1)C=1C(=O)NC(C1)=O.OC1=CC=C(C=C1)C=1C(=O)NC(C1)=O Chemical compound OC1=CC=C(C=C1)C=1C(=O)NC(C1)=O.OC1=CC=C(C=C1)C=1C(=O)NC(C1)=O PCSIMZDQSMALIT-UHFFFAOYSA-N 0.000 description 1
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- 230000009471 action Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
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- 230000032683 aging Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 150000003934 aromatic aldehydes Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000000981 basic dye Substances 0.000 description 1
- VEZXCJBBBCKRPI-UHFFFAOYSA-N beta-propiolactone Chemical compound O=C1CCO1 VEZXCJBBBCKRPI-UHFFFAOYSA-N 0.000 description 1
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- 230000015572 biosynthetic process Effects 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 239000001055 blue pigment Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- QKIUAMUSENSFQQ-UHFFFAOYSA-N dimethylazanide Chemical compound C[N-]C QKIUAMUSENSFQQ-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
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- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
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- 239000004744 fabric Substances 0.000 description 1
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- 229910052736 halogen Inorganic materials 0.000 description 1
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- 239000003999 initiator Substances 0.000 description 1
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- 230000007774 longterm Effects 0.000 description 1
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- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 1
- 125000004953 trihalomethyl group Chemical group 0.000 description 1
Landscapes
- Materials For Photolithography (AREA)
Abstract
Description
技术领域 technical field
本发明是关于一种用于平版印刷版的辐射敏感组合物。 The present invention relates to a radiation-sensitive composition for lithographic printing plates. the
背景技术 Background technique
平版印刷的特色是平版上着墨的图像区(image area)和不着墨的非图像区同处在一个平面上。其中,图像区是亲油疏水,非图像区则是亲水疏油。平版印刷的操作方式,即是利用油(油性物质或油墨)及水不相混的特性,先给印版着水,使非图像区形成亲水疏油的水膜,然后再给印版着墨,使图像区部分沾附油墨,在印刷压力的作用下,印版上的图文经橡皮滚筒转印到纸张或其它承印物表面。通常油墨是被转印至通称为中间材料的橡皮布(blanket),然后再将油墨转印至待复制图像的材料表面,即如纸张、布料、塑料或金属等表面。 The characteristic of lithography is that the inked image area (image area) and the non-inked non-image area on the lithography are on the same plane. Wherein, the image area is lipophilic and hydrophobic, and the non-image area is hydrophilic and oleophobic. The operation method of lithographic printing is to use the immiscible characteristics of oil (oily substance or ink) and water to first apply water to the printing plate, so that the non-image area forms a hydrophilic and oleophobic water film, and then ink the printing plate , so that the ink is partially attached to the image area, and under the action of printing pressure, the graphics on the printing plate are transferred to the surface of paper or other substrates through the rubber cylinder. Typically the ink is transferred to a blanket known as an intermediate material, and then the ink is transferred to the surface of the material on which the image is to be reproduced, such as paper, cloth, plastic or metal. the
预涂式感旋光性平版印刷版(Pre-Sensitized Plate,PS版)的制造方法,大致是将一铝板的表面先经过电解或研磨,以形成多个印刷所需的砂目,再将感旋光性或感热性的辐射敏感组合物涂布于该铝板的砂目上以形成一辐射敏感涂层,并对该辐射敏感涂层进行烘烤熟化。然后,通过一具有预定图像及文字的底片,将该底片上的图像及文字以曝光及显影的方式转移至辐射敏感涂层上,以制成用以将图像及文字印刷于文件上的印刷版。 The manufacturing method of the pre-coated photosensitive lithographic printing plate (Pre-Sensitized Plate, PS plate) is roughly that the surface of an aluminum plate is first electrolyzed or ground to form a plurality of grains required for printing, and then the photosensitive A radiation-sensitive or heat-sensitive composition is coated on the grains of the aluminum plate to form a radiation-sensitive coating, and the radiation-sensitive coating is baked and cured. Then, through a negative film with a predetermined image and text, the image and text on the negative film are transferred to the radiation-sensitive coating by exposure and development, so as to make a printing plate for printing the image and text on the document . the
近年来,使用计算机来处理及输出影像信息的数字化技术已广泛应用,各种对应的新影像输出方式已实用化。在平版印刷上如能省略底片的制作,直接将计算机的数字图案经由曝光显影程序,转移至辐射敏感涂层上,以制成用以将图像及文字印刷于文件上的印刷版,使制版作业大为简化,可大幅增加印刷速率并降低成本,此种技术称为计算机直接制版(Computer To Plate,CTP),而如何得到适用于该技术的印刷版成为重要的课题。 In recent years, digitization technology that uses computers to process and output image information has been widely used, and various corresponding new image output methods have been put into practical use. In lithographic printing, if the production of the negative can be omitted, the digital pattern of the computer is directly transferred to the radiation-sensitive coating through the exposure and development process to make a printing plate for printing images and text on the document, making the plate-making operation easier. It is greatly simplified, which can greatly increase the printing rate and reduce the cost. This technology is called Computer To Plate (CTP), and how to obtain a printing plate suitable for this technology has become an important issue. the
涂布在平版印刷所使用的铝板表面上的辐射敏感组合物曝光后,其曝光部分转变为碱可溶性,从而在显影过程将其去除。此种版称为正型感光版; 反之,曝光部份会硬化(curing),转变为碱不可溶性,则称为负型感光版。在上述两情形时,残留的图像区为吸墨性或亲油性,而非图像区为吸水性或亲水性。感光版的正型或负型取决于铝板表面所涂布的辐射敏感组合物。 After exposure of the radiation-sensitive composition coated on the surface of an aluminum plate used for lithography, its exposed portion becomes alkali-soluble, thereby removing it during the development process. This type of plate is called a positive photosensitive plate; otherwise, the exposed part will harden (curing) and become alkali-insoluble, and it is called a negative photosensitive plate. In both cases, the remaining image area is ink-absorbent or lipophilic, while the non-image area is water-absorbent or hydrophilic. The positive or negative working of the photosensitive plate depends on the radiation sensitive composition coated on the surface of the aluminum plate. the
上述辐射敏感组合物主要由以下几种材料所组成:辐射吸收性染料(感光剂或感热剂)、酸生成剂、酚醛树脂(成膜剂)、共聚合高分子、溶剂,以及其它助剂。 The above-mentioned radiation-sensitive composition is mainly composed of the following materials: radiation-absorbing dye (sensitizer or thermal agent), acid generator, phenolic resin (film-forming agent), copolymerized polymer, solvent, and other additives . the
先前技术,例如美国专利第6,063,544号揭示一种涂布有酚醛树脂(novolac)或甲酚-甲醛树脂(cresol-formaldehyde)或聚羟基苯乙烯树脂(poly(hydroxystyrene))与红外线吸收染料的混合物的正型感光版。另外,美国专利第5,372,907、5,372,915、5,340,699、5,491,046号,则涂布novolac型酚醛树脂、cresol型酚醛树脂、红外线吸收染料或颜料及潜在性质子酸(Latent Bronstedacid)的混合物。这些版曝露于红外线辐射时,潜在性质子酸分解生成一种可促使不同型态酚醛树脂(例如novolac与cresol)发生交联的物质,使曝光区内的混合物硬化。进一步加热该曝光的印刷版时,会使该曝光的涂膜更加硬化而使其变为不溶于碱性显影液中,然而无曝光的区域仍然可溶解于显影液中。美国专利第5,919,601号揭示由粘结剂树脂(binder resin)、交联剂、热激发酸生成剂(thermal-activated acid generator)及红外线吸收剂组成的辐射敏感组合物,此组合物曝露于红外线后,该酸生成剂分解释出酸,进而由该酸引起通过交联剂使粘结剂树脂所进行的交联反应。 Prior art, such as U.S. Patent No. 6,063,544 discloses a coating coated with a mixture of phenolic resin (novolac) or cresol-formaldehyde resin (cresol-formaldehyde) or polyhydroxystyrene resin (poly(hydroxystyrene)) and infrared absorbing dye Positive photosensitive plate. In addition, U.S. Patent Nos. 5,372,907, 5,372,915, 5,340,699, and 5,491,046 are coated with a mixture of novolac type phenolic resin, cresol type phenolic resin, infrared absorbing dyes or pigments, and latent Bronstedacid. When these plates are exposed to infrared radiation, the latent protic acid decomposes to form a species that promotes the crosslinking of different types of phenolic resins (such as novolac and cresol), hardening the mixture in the exposed areas. Further heating of the exposed printing plate further hardens the exposed coating making it insoluble in an alkaline developer, however the unexposed areas remain soluble in the developer. U.S. Patent No. 5,919,601 discloses a radiation-sensitive composition composed of a binder resin (binder resin), a crosslinking agent, a thermal-activated acid generator (thermal-activated acid generator) and an infrared absorber. After the composition is exposed to infrared rays , the acid generator decomposes to release an acid, and the acid causes a crosslinking reaction of the binder resin by the crosslinking agent. the
上述各技术共通的缺点,就是印刷版显像后其显现的图像区常欠缺完整性(integrity),无法供长时间有效印刷,以致产生的印刷图像的清晰度及印刷质量均差。 The common disadvantage of the above-mentioned technologies is that after the printing plate is developed, the displayed image area often lacks integrity and cannot be used for long-term effective printing, so that the definition and printing quality of the printed image produced are poor. the
然而,在印刷业者不断被要求必须提高制版效率及印刷质量,以提升产业竞争力的前提下,印刷版上的辐射敏感涂层的感度被要求必须更快,即其曝光所需的能量更低或其曝光所需的时间更短。并且,已曝光部分在显影时,需更容易被显影液洗掉,未曝光部分则需更耐显影液的浸泡与冲刷,亦即对显影时显影液的温度、浓度、及浸泡冲刷的时间等条件的宽容度要更大。同时,还必须能维持完成的辐射敏感涂层的良好分辨率、着墨性、及耐磨耗性。此外,辐射敏感涂层与铝板的接着性也需更好。 However, under the premise that printers are constantly required to improve plate-making efficiency and printing quality to enhance industrial competitiveness, the sensitivity of radiation-sensitive coatings on printing plates is required to be faster, that is, the energy required for exposure is lower. or a shorter exposure time. In addition, the exposed part needs to be more easily washed off by the developer during development, and the unexposed part needs to be more resistant to immersion and scouring of the developer, that is, the temperature, concentration, and soaking and scouring time of the developer during development, etc. Conditions are more forgiving. At the same time, good resolution, inking properties, and abrasion resistance of the finished radiation sensitive coating must also be maintained. In addition, the adhesion between the radiation-sensitive coating and the aluminum plate needs to be better. the
许多专利提出不同观点与方法来解决印刷业者的不同要求,如美国专利 第7,425,402与7,455,949号针对辐射敏感涂层配方中的酚醛树脂或共聚合高分子,其结构中的酚醛单体单元(phenolic monomeric unit)进行改性,将酰亚胺(imide)或硫代酰亚胺(thioimide)官能基键结在酚基(phenol group)上的碳原子,可提高辐射敏感涂层的耐化学性(chemical resistance)。美国专利第7,458,320号针对辐射敏感涂层配方中的酚醛树脂或共聚合高分子,其结构中的酚醛单体单元进行改性,将酰亚胺官能基键结在酚基上的氢原子或酚基上羟基的氢原子,可提高辐射敏感涂层的耐化学性与显影宽容度。美国专利第7,563,556号叙述酚醛单体单元进行改性,结构如(A)所示,此结构所制备的辐射敏感涂层在显影过程中可以得到较干净的图案,较少的残渣残留在图案中。 Many patents put forward different views and methods to solve the different requirements of the printing industry, such as U.S. Patent No. 7,425,402 and No. 7,455,949 for the phenolic resin or copolymerized polymer in the radiation-sensitive coating formulation, the phenolic monomeric unit (phenolic monomeric) in its structure unit), the imide or thioimide functional group is bonded to the carbon atom on the phenol group, which can improve the chemical resistance of the radiation-sensitive coating. resistance). U.S. Patent No. 7,458,320 is aimed at phenolic resins or copolymerized polymers in radiation-sensitive coating formulations. The phenolic monomer units in the structure are modified, and the imide functional group is bonded to the hydrogen atom or phenolic group on the phenolic group. The hydrogen atom of the hydroxyl group on the base can improve the chemical resistance and development latitude of the radiation-sensitive coating. U.S. Patent No. 7,563,556 describes the modification of phenolic monomer units. The structure is shown in (A). The radiation-sensitive coating prepared by this structure can obtain a cleaner pattern during the development process, and less residue remains in the pattern. . the
结构式(A) Structural formula (A)
其中,R为H、D1或D2;R1为H或C1~C2的烷基;n为1、2或3;R2为H或C1~C6的烷基或烷氧基。 Wherein, R is H, D 1 or D 2 ; R 1 is H or C1-C2 alkyl; n is 1, 2 or 3; R 2 is H or C1-C6 alkyl or alkoxy.
如上所述,大部分专利皆叙述如何提高辐射敏感涂层经曝光显影后在印版上的特性,而较少叙述辐射敏感涂层的显影制程宽容度,因此本发明主要尝试寻找其它可提高显影制程宽容度的方法。 As mentioned above, most of the patents describe how to improve the characteristics of the radiation-sensitive coating on the printing plate after exposure and development, and seldom describe the latitude of the development process of the radiation-sensitive coating. Therefore, the present invention mainly tries to find other methods that can improve the development method for process tolerance. the
美国专利第5,770,750、6,166,151与6,291,077号叙述了酚醛树脂的改性方法,改性后的酚醛树脂应用在涂布工业。在此改性方法中,酚醛树脂与内酯结构(lactone structure)反应,如下反应式(B)所示。 US Patent Nos. 5,770,750, 6,166,151 and 6,291,077 describe methods for modifying phenolic resins, and the modified phenolic resins are used in the coating industry. In this modification method, the phenolic resin reacts with a lactone structure, as shown in the following reaction formula (B). the
反应式(B) Reaction (B)
发明内容 Contents of the invention
本发明的目的在于提供一种辐射敏感组合物,将此组合物涂布于适当基材,例如印刷用版上,经过烘烤、曝光及显影后,可得到图像,此图像具有良好的硬度、耐磨耗性、接着性、耐印量,并可增加显影宽容值,可大幅提高产品良率与质量。 The object of the present invention is to provide a radiation-sensitive composition, which can be coated on a suitable substrate, such as a printing plate, and after baking, exposure and development, an image can be obtained, and the image has good hardness, Abrasion resistance, adhesion, printing capacity, and can increase the development tolerance value, which can greatly improve product yield and quality. the
为了达成上述目的,本发明提供一种辐射敏感组合物,其含有通式(I)酚醛树脂与通式(II)内酯结构反应改性的成膜树脂。该辐射敏感组合物被施用于一基板上形成图像层,可有效改善显影宽容度,并且不影响辐射敏感涂层的硬度、耐磨耗性及粘着性。 In order to achieve the above object, the present invention provides a radiation-sensitive composition, which contains a film-forming resin modified by the reaction of the general formula (I) phenolic resin and the general formula (II) lactone structure. The radiation-sensitive composition is applied on a substrate to form an image layer, which can effectively improve the developing latitude without affecting the hardness, abrasion resistance and adhesion of the radiation-sensitive coating. the
通式(I) General formula (I)
其中Q可为H、C1~C2的烷基;D可为H、OH、C1~C8的烷基、环烷基、烷氧基或苯基,p=1、2或3,n≥1。 Wherein Q can be H, C1-C2 alkyl; D can be H, OH, C1-C8 alkyl, cycloalkyl, alkoxy or phenyl, p=1, 2 or 3, n≥1. the
通式(II) General formula (II)
其中x=0~17的整数,R3、R4、R5可分别为H、C1~C20的烷基、环烷基、烷氧基或苯基。 Where x=an integer of 0-17, R 3 , R 4 , and R 5 can be H, C1-C20 alkyl, cycloalkyl, alkoxy or phenyl, respectively.
本发明的辐射敏感组合物,还可包含辐射吸收性染料、共聚合高分子、溶剂、表面活性剂、着色剂、湿润剂、酸生成剂或其组合。 The radiation-sensitive composition of the present invention may further comprise a radiation-absorbing dye, a copolymerized polymer, a solvent, a surfactant, a colorant, a wetting agent, an acid generator, or a combination thereof. the
本发明辐射敏感组合物产生的功效如下:本发明首次使用了含有酚醛树脂或聚羟基(甲基)苯乙烯树脂与内酯结构反应改性的成膜树脂的组合物,将含有此成膜树脂的组合物涂布于适当基材上,经过烘烤、曝光及显影后,可得到图像,此图像具有良好的硬度、耐磨耗性、接着性、耐印量,并可增加显影宽容值,可大幅提高产品良率与质量。这是因为当酚醛树脂与内酯结构反应后,因其酚醛树脂上的羟基至主链的链长度不同,在显影制程与碱性显影液应会有不同程度的作用,而使显影宽容度增加。 The effect that the radiation-sensitive composition of the present invention produces is as follows: the present invention has used the composition of the film-forming resin that contains phenolic resin or polyhydroxy (methyl) styrene resin and lactone structural reaction modification for the first time, will contain this film-forming resin The composition is coated on a suitable substrate, and after baking, exposure and development, an image can be obtained. The image has good hardness, wear resistance, adhesion, printing durability, and can increase the development tolerance value. Can greatly improve product yield and quality. This is because when the phenolic resin reacts with the lactone structure, because of the different chain lengths from the hydroxyl group on the phenolic resin to the main chain, it should have different effects in the development process and alkaline developer, which will increase the development latitude . the
具体实施方式Detailed ways
本发明提供一种辐射敏感组合物,可在基板上形成图像层,而该组合物可作为正型及负型感光版的涂层使用。本发明的组合物是含有通式(I)酚醛树脂与通式(II)内酯结构反应改性的成膜树脂,其结构如下所示: The invention provides a radiation-sensitive composition, which can form an image layer on a substrate, and the composition can be used as a coating of positive and negative photosensitive plates. Composition of the present invention is the film-forming resin that contains general formula (I) phenolic resin and general formula (II) lactone structure reaction modification, and its structure is as follows:
通式(I) General formula (I)
其中Q可为H、C1~C2的烷基;D可为H、OH、C1~C8的烷基、环烷基、烷氧基或苯基;p=1、2或3;及 Wherein Q can be H, C1-C2 alkyl; D can be H, OH, C1-C8 alkyl, cycloalkyl, alkoxy or phenyl; p=1, 2 or 3; and
通式(II) General formula (II)
其中x=0~17的整数;R3、R4、R5可分别为H、C1~C20的烷基、环烷基、烷氧基或苯基。 Where x=an integer of 0-17; R 3 , R 4 , and R 5 can be H, C1-C20 alkyl, cycloalkyl, alkoxy or phenyl, respectively.
使用酚醛树脂与内酯反应改性后的成膜树脂,其结构如下所示: The structure of the film-forming resin modified by the reaction of phenolic resin and lactone is as follows:
其中,Q可为H、C1~C2的烷基;D可为H、OH、C1~C8的烷基、环烷基、烷氧基或苯基;p=0、1、2或3;r为1~4的整数,且p+r=4;x=0~17的整数;R3、R4、R5可分别为H、C1~C20的烷基、环烷基、烷氧基或苯基。 Wherein, Q can be H, C1~C2 alkyl; D can be H, OH, C1~C8 alkyl, cycloalkyl, alkoxy or phenyl; p=0, 1, 2 or 3; r is an integer from 1 to 4, and p+r=4; x=an integer from 0 to 17; R 3 , R 4 , and R 5 can be H, C1-C20 alkyl, cycloalkyl, alkoxy or phenyl.
其中E可为H、CH3;s为1~5的整数;t为整数,且s+t=5;x=0~17的整数;R3、R4、R5可分别为H、C1~C20的烷基、环烷基、烷氧基或苯基。 Where E can be H, CH 3 ; s is an integer of 1 to 5; t is an integer, and s+t=5; x=an integer of 0 to 17; R 3 , R 4 , and R 5 can be H and C1 respectively ~C20 alkyl, cycloalkyl, alkoxy or phenyl.
该辐射敏感组合物可由30~95重量%成膜树脂(成膜剂),该成膜树脂是利用酚醛树脂与内酯反应改性、4~65重量%的共聚合高分子、0.1~45重量%的辐射吸收性染料、0.1~15重量%的酸生成剂混合所组成。本发明主张的组合物还可包含溶剂及添加剂。 The radiation-sensitive composition can be composed of 30-95% by weight of film-forming resin (film-forming agent), the film-forming resin is modified by reaction with phenolic resin and lactone, 4-65% by weight of copolymerized polymer, 0.1-45% by weight % of radiation absorbing dye, 0.1-15% by weight of acid generator. The compositions claimed in the present invention may also comprise solvents and additives. the
本发明亦提供一种图像的制造方法,该方法包括:(I)于基板上涂布一成像层,而此成像层是由酚醛树脂与内酯反应改性的成膜树脂、共聚合高分子、辐射吸收性染料、酸生成剂所构成。此成像层还可包含溶剂及添加剂;(II)使该成像层适当干燥;(III)使该成像层的成像区曝露于一可充分射出的能源,例如可为波长在320nm~750nm的UV/Vis光束或波长在750nm~1350nm的IR光束;及(IV)使该成像区与显影液接触而将曝光部份从该基板去除。 The present invention also provides a method for producing an image. The method includes: (1) coating an imaging layer on a substrate, and the imaging layer is a film-forming resin modified by a reaction between a phenolic resin and a lactone, and a copolymerized polymer. , radiation-absorbing dyes, and acid generators. This imaging layer can also comprise solvent and additive; (II) make this imaging layer dry properly; (III) make the imaging area of this imaging layer be exposed to the energy source that can emit fully, for example can be wavelength at 320nm~750nm UV/ a Vis beam or an IR beam with a wavelength of 750 nm to 1350 nm; and (IV) contacting the imaging area with a developing solution to remove the exposed portion from the substrate. the
适用于本发明的酚醛树脂,其可为酚、邻甲酚、间甲酚、对甲酚、2-萘酚、酚衍生物或上述两种或两种以上的混合物与甲醛、乙醛、其它脂族或芳香族醛等醛缩合反应产物。该酚醛树脂宜具有介于为300~400,000范围内的重量平均分子量。 The phenolic resin suitable for the present invention can be phenol, o-cresol, m-cresol, p-cresol, 2-naphthol, phenol derivatives or a mixture of two or more of the above with formaldehyde, acetaldehyde, other Aldehyde condensation reaction products such as aliphatic or aromatic aldehydes. The phenolic resin preferably has a weight average molecular weight in the range of 300-400,000. the
适用于本发明的内酯,其可为丙内酯(propiolactone)、丁内酯(butyrolactone)、戊内酯(Valerolactone)、己内酯(caprolactone)及其内酯衍生物。 The lactones suitable for the present invention may be propiolactone, butyrolactone, valerolactone, caprolactone and their lactone derivatives. the
适用于本发明的共聚合高分子,其单体可为(甲基)丙烯酸单体,如甲基丙烯酸甲酯(MMA)、甲基丙烯酸(MAA)、(甲基)丙烯酸月桂酯、(甲基)丙烯酸异硬酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸乙基己酯、(甲基)丙烯酸月桂酯等,苯乙烯及其衍生物,如α-甲基苯乙烯、对羟基苯乙烯(4-hydroxystyrene)、对羟基甲基苯乙烯(4-hydroxymethylstyrene)含卤素的(甲基)苯乙烯等,顺丁烯二酐(Maleic Anhydride),丙烯腈(acrylonitrile AN)及氮取代马来酰亚胺单体(N-substituted maleimide monomer,其中氮取代马来酰亚胺单体可为N-苯基马来酰亚胺(N-phenylmaleimide PMI)、对羟基苯基马来酰亚胺(4-hydroxyphenylmaleimide)、N-2,3二甲基苯基马来酰亚胺(N-(2,3-dimethylphenyl)Maleimide等,利用高分子聚合方法将上述单体依不同组成及比例合成,应用于感光涂层。 The copolymerization macromolecule that is applicable to the present invention, its monomer can be (meth) acrylic acid monomer, as methyl methacrylate (MMA), methacrylic acid (MAA), (meth) acrylate lauryl, (methacrylic acid) base) isostearyl acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, ethylhexyl (meth)acrylate, lauryl (meth)acrylate, etc., styrene and its derivatives, such as α-methylstyrene, 4-hydroxystyrene, 4-hydroxymethylstyrene, halogen-containing (methyl)styrene, etc., maleic anhydride, propylene Nitrile (acrylonitrile AN) and nitrogen-substituted maleimide monomer (N-substituted maleimide monomer, wherein nitrogen-substituted maleimide monomer can be N-phenylmaleimide (N-phenylmaleimide PMI), p-hydroxyphenylmaleimide (4-hydroxyphenylmaleimide), N-2,3 dimethylphenylmaleimide (N-(2,3-dimethylphenyl)Maleimide, etc., the above-mentioned Monomers are synthesized according to different compositions and ratios, and are applied to photosensitive coatings.
适用于本发明的辐射吸收性染料,大致包含光敏性染料及热敏性染料。光敏性染料大致以1,2-萘醌重氮-4-磺酸氯或1,2-萘醌重氮-5-磺酸氯与多羟基化合物的酯化缩合物为主。热敏性染料则以吸收波长在700-900nm的染料为主,如花青染料(Cyanine dye)、聚次甲基染料(polymethine dyes)、萘醌染料(naphthoquinone dyes)、酞菁染料(phthalocyanine dyes)、蒽醌染料 (anthraquinone dyes),或靛苯胺金属络合染料(indoaniline metal complex dyes)等为主。 The radiation-absorbing dyes suitable for the present invention generally include photosensitive dyes and thermosensitive dyes. Photosensitizing dyes are mainly esterified condensates of 1,2-naphthoquinonediazo-4-sulfonic acid chloride or 1,2-naphthoquinonediazo-5-sulfonic acid chloride and polyhydroxy compounds. Thermosensitive dyes are mainly dyes with an absorption wavelength of 700-900nm, such as cyanine dyes, polymethine dyes, naphthoquinone dyes, phthalocyanine dyes, anthracene dyes, and polymethine dyes. Anthraquinone dyes or indoaniline metal complex dyes are the main ones. the
适用于本发明的酸生成剂,是一种曝露于红外线光谱区的热或光能时可生成质子酸。生成的质子酸可在正型感光料的曝露区的聚合物产生光分解作用。此种物质,即通过热化学可产生质子酸的化合物,已揭露于例如美国专利第5,466,557号中,此专利拟并入本案供作参考。特别有用的化合物为例如卤化三氮杂苯(或S-三氮杂苯衍生物)、卤化2-吡喃酮、卤化恶唑、卤化恶二唑及卤化噻唑等卤化合物。这些化合物一般具有三卤甲基等受红外辐射的热时,会生成可取之氢卤酸的聚卤甲基。最常取得的酸生成剂可选自各种三氯甲基三氮杂苯,即可有利的选自,但不局限于三-三氯甲基三氮杂苯、二-三甲基苯基三氮杂苯、二-三氯甲基邻-或对-甲氧苯基三氮杂苯、二-三氯甲基(3,5-二甲氧基)苯基三氮杂苯、二-三氯甲基萘基三氮杂苯、二-三氯甲基5-甲氧萘基三氮杂苯、二-三氯甲基苯乙烯基三氮杂苯、二-三氯甲基苯乙烯基三氮杂苯及二-三氯甲基(4-甲氧基)苯乙烯基三氮杂苯等。 Acid generators suitable for use in the present invention are those which generate protic acids when exposed to heat or light energy in the infrared region of the spectrum. The generated protonic acid can photodecompose the polymer in the exposed area of the positive photosensitive material. Such materials, ie, compounds that generate protic acids by thermochemistry, are disclosed, for example, in US Patent No. 5,466,557, which is hereby incorporated by reference. Particularly useful compounds are halogenated compounds such as halogenated triazines (or S-triazine derivatives), halogenated 2-pyrones, halogenated oxazoles, halogenated oxadiazoles and halogenated thiazoles. These compounds generally have polyhalomethyl groups such as trihalomethyl groups that can generate desirable hydrohalic acids when they are heated by infrared radiation. The most commonly available acid generators may be selected from various trichloromethyltriazines, which may advantageously be selected from, but not limited to, tris-trichloromethyltriazines, di-trimethylphenyl Triazines, bis-trichloromethyl o- or p-methoxyphenyl triazines, bis-trichloromethyl(3,5-dimethoxy)phenyl triazines, di- Trichloromethylnaphthyl triazine, bis-trichloromethyl 5-methoxynaphthyl triazine, bis-trichloromethyl styryl triazine, bis-trichloromethyl styrene Triazine and bis-trichloromethyl (4-methoxy) styryl triazine, etc. the
本发明所使用溶剂可选自,例如醇类、酯类、酮类、醚类、酰胺类、芳香族类及其混合物。特别是1-甲氧基-2-乙醇、1-甲氧基-2-丙醇、乙基乙二醇乙酸酯、乙酸乙酯、丙酮、丁酮、二异丁基酮、甲基异丁基酮、环己酮、甲苯、二甲苯、正-丙醇、异丙醇、四氢呋喃、丁内酯、乳酸甲酯、二甲基酰胺及其混合物。 The solvent used in the present invention can be selected from, for example, alcohols, esters, ketones, ethers, amides, aromatics and mixtures thereof. Especially 1-methoxy-2-ethanol, 1-methoxy-2-propanol, ethyl glycol acetate, ethyl acetate, acetone, methyl ethyl ketone, diisobutyl ketone, methyl iso Butyl ketone, cyclohexanone, toluene, xylene, n-propanol, isopropanol, tetrahydrofuran, butyrolactone, methyl lactate, dimethylamide and mixtures thereof. the
本发明所使用的添加剂可为表面活性剂、着色剂及湿润剂等添加物。着色剂的使用主要为了印刷版于显影后容易分辨图像之用,适用于本发明的着色剂可为油溶性染料或碱基性染料。例如结晶紫(Crystal Violet)、孔雀石绿(Malachite green)、维多利亚蓝(Victoria Blue)、甲基蓝(Methylene Blue)、乙基紫(Ethyl Violet)、油蓝(Oil Blue 603/613)、罗丹明B(Rhodamine B)等其中一者或它们的混合物。 The additives used in the present invention can be additives such as surfactants, colorants and wetting agents. The use of the coloring agent is mainly for the purpose of easily distinguishing the image after the printing plate is developed. The coloring agent suitable for the present invention can be an oil-soluble dye or a basic dye. Such as Crystal Violet, Malachite Green, Victoria Blue, Methylene Blue, Ethyl Violet, Oil Blue 603/613, Rodin Ming B (Rhodamine B) and other one or their mixture. the
以下通过几个实施例对本发明进行更为详细的说明: The present invention is described in more detail below by several embodiments:
<实施例1>成膜树脂改性 <Example 1> film-forming resin modification
将40克的酚醛树脂-Rezicure5200(高纯度的间甲酚酚醛树脂,由SpecialCheme公司出品)、12克的酚醛树脂- SD-1508(双酚为主的酚醛树脂,由Hexion公司出品)、10.0克己内酯与200克二甲苯置入500ml 四颈反应瓶中,四颈瓶分别接上搅拌叶、温度计、氮气及回流管,升温至120℃待酚醛树脂全溶,加入2克的辛酸亚锡(T-9催化剂)(0.1%),再加入2克的硫酸(0.1%),升温至130℃后持温反应,待反应完成后,将二甲苯抽干即可得到改性成膜树酯(产品编号N-1)。 With 40 grams of phenolic resin-Rezicure5200 (high-purity m-cresol phenolic resin, produced by SpecialChem), 12 grams of phenolic resin- SD-1508 (bisphenol-based phenolic resin, produced by Hexion), 10.0 grams of caprolactone and 200 grams of xylene were placed in a 500ml four-necked reaction flask, and the four-necked flask was respectively connected with stirring blades, a thermometer, nitrogen and reflux Tube, heat up to 120°C until the phenolic resin is completely dissolved, add 2 grams of stannous octoate (T-9 catalyst) (0.1%), then add 2 grams of sulfuric acid (0.1%), heat up to 130°C and keep warm for reaction. After the reaction is completed, the xylene is drained to obtain the modified film-forming resin (product number N-1).
<实施例2>成膜树脂改性 <Example 2> film-forming resin modification
大致与实施例1的改性方法相同,不同之处在于其中使用8.0克己内酯,此改性成膜树酯产品编号为N-2。 Roughly the same as the modification method of Example 1, the difference is that 8.0 grams of caprolactone is used, and the product number of this modified film-forming resin is N-2. the
<实施例3>成膜树脂改性 <Example 3> film-forming resin modification
大致与实施例1的改性方法相同,不同之处在于其中使用6.0克己内酯,此改性成膜树酯产品编号为N-3。 Roughly the same as the modification method of Example 1, the difference is that 6.0 grams of caprolactone is used, and the product number of this modified film-forming resin is N-3. the
<实施例4>成膜树脂改性 <Example 4> film-forming resin modification
大致与实施例1的改性方法相同,不同之处在于其中使用7.5克丁内酯,此改性成膜树酯产品编号为N-4。 Roughly the same as the modification method of Example 1, the difference is that 7.5 grams of butyrolactone is used, and the product number of this modified film-forming resin is N-4. the
<实施例5>成膜树脂改性 <Example 5> film-forming resin modification
大致与实施例1的改性方法相同,不同之处在于其中使用6.0克丁内酯,此改性成膜树酯产品编号为N-5。 Roughly the same as the modification method of Example 1, the difference is that 6.0 grams of butyrolactone is used, and the product number of this modified film-forming resin is N-5. the
<实施例6>成膜树脂改性 <Example 6> film-forming resin modification
大致与实施例1的改性方法相同,不同之处在于其中使用4.5克丁内酯,此改性成膜树酯产品编号为N-6。 Roughly the same as the modification method of Example 1, the difference is that 4.5 grams of butyrolactone is used, and the product number of this modified film-forming resin is N-6. the
<实施例7>共聚合高分子合成 <Example 7> copolymerization polymer synthesis
将35克N-苯基马来酰亚胺(PMI)、30克甲基丙烯酸甲酯(MMA)、35克丙烯腈(AN)、1克引发剂(偶氮二异丁腈(AIBN))及200克溶剂(二甲基甲酰胺,DMF)置入500ml四颈反应瓶中,四颈瓶分别接上搅拌叶、温度计、氮气及回流管,温度控制在70℃反应24小时,反应完成后,降温并将反应溶液 倒入6kg水中,共聚合高分子将在水中析出,过滤干燥即可得到共聚合高分子(样品代号P-1)。其它不同组成的共聚合高分子也可以上述方法获得。 35 grams of N-phenylmaleimide (PMI), 30 grams of methyl methacrylate (MMA), 35 grams of acrylonitrile (AN), 1 gram of initiator (azobisisobutyronitrile (AIBN)) and 200 grams of solvent (dimethylformamide, DMF) were placed in a 500ml four-necked reaction flask, and the four-necked flask was respectively connected with a stirring blade, a thermometer, nitrogen and a reflux tube, and the temperature was controlled at 70°C for 24 hours. After the reaction was completed, , lower the temperature and pour the reaction solution into 6kg of water, the copolymerized polymer will be precipitated in the water, filter and dry to obtain the copolymerized polymer (sample code P-1). Other copolymerized polymers with different compositions can also be obtained by the above method. the
<实施例8>感热型辐射敏感组合物及CTP印刷版的制备 <Example 8> Preparation of heat-sensitive radiation-sensitive composition and CTP printing plate
20克的酚醛树脂-Rezicure5200、6克的酚醛树脂- SD-1508、9.0克的共聚合高分子(样品代号P-1)、0.8克的辐射吸收性染料-花菁染料IR dye23b[PCAS](在IR波长下会反应的染料,由PCAS公司出品)、0.24克二-三氯甲基(4-甲氧基)苯乙烯基三氮杂苯、0.5克的着色剂-维多利亚蓝、0.5克的着色剂-结晶紫内酯,6ml的溶剂-乙酸乙酯,以及104克的溶剂-乙基乙二醇乙酸酯,搅拌至全溶,即得本实施例的感热型辐射敏感组合物。 20 grams of phenolic resin-Rezicure5200, 6 grams of phenolic resin- SD-1508, 9.0 grams of copolymerized polymer (sample code P-1), 0.8 grams of radiation-absorbing dye-cyanine dye IR dye23b[PCAS] (the dye that will react under the IR wavelength, produced by PCAS company) , 0.24 gram of bis-trichloromethyl (4-methoxy) styryl triazine, 0.5 gram of colorant-Victoria blue, 0.5 gram of colorant-crystal violet lactone, 6 ml of solvent-ethyl acetate Esters, and 104 grams of solvent-ethyl glycol acetate, were stirred until completely dissolved to obtain the heat-sensitive radiation-sensitive composition of this embodiment.
另外准备一片经过亲水处理的铝板,将上述感热型辐射敏感组合物涂布在该铝板上,涂布膜厚为1.8g/m2,经100℃、4分钟的烘干后,再经过50℃、24小时的熟成,即得一正型热敏CTP印刷版。 In addition, prepare a piece of aluminum plate that has undergone hydrophilic treatment, and coat the above-mentioned heat-sensitive radiation-sensitive composition on the aluminum plate with a film thickness of 1.8g/m 2 . After drying at 100°C for 4 minutes, and then After aging at 50°C for 24 hours, a positive heat-sensitive CTP printing plate can be obtained.
<实施例9>感热型辐射敏感组合物及CTP印刷版的制备 <Example 9> preparation of thermosensitive radiation-sensitive composition and CTP printing plate
大致与实施例8的正型热敏CTP印刷版相同,不同之处在于20克的酚醛树脂-Rezicure5200及6克的酚醛树脂- SD-1508,以26克改性成膜树脂(N-1)取代。 Roughly the same as the positive thermal CTP printing plate of Example 8, the difference is that 20 grams of phenolic resin-Rezicure5200 and 6 grams of phenolic resin- SD-1508, replaced with 26 grams of modified film-forming resin (N-1).
<实施例10>感热型辐射敏感组合物及CTP印刷版的制备 <Example 10> preparation of thermosensitive radiation-sensitive composition and CTP printing plate
大致与实施例9的正型热敏CTP印刷版相同,不同之处在于其中使用样品编号为N-2的改性成膜树脂。 It is roughly the same as the positive heat-sensitive CTP printing plate of Example 9, except that the modified film-forming resin whose sample number is N-2 is used. the
<实施例11>感热型辐射敏感组合物及CTP印刷版的制备 <Example 11> preparation of thermosensitive radiation-sensitive composition and CTP printing plate
大致与实施例9的正型热敏CTP印刷版相同,不同之处在于其中使用样品编号为N-3的改性成膜树脂。 It is roughly the same as the positive heat-sensitive CTP printing plate of Example 9, except that the modified film-forming resin whose sample number is N-3 is used. the
<实施例12>感热型辐射敏感组合物及CTP印刷版的制备 <Example 12> preparation of thermosensitive radiation-sensitive composition and CTP printing plate
大致与实施例9的正型热敏CTP印刷版相同,不同之处在于其中使用样品编号为N-4的改性成膜树脂。 It is roughly the same as the positive thermosensitive CTP printing plate of Example 9, except that the modified film-forming resin whose sample number is N-4 is used. the
<实施例13>感热型辐射敏感组合物及CTP印刷版的制备 <Example 13> preparation of thermosensitive radiation-sensitive composition and CTP printing plate
大致与实施例9的正型热敏CTP印刷版相同,不同之处在于其中使用样品编号为N-5的改性成膜树脂。 It is roughly the same as the positive heat-sensitive CTP printing plate of Example 9, except that the modified film-forming resin whose sample number is N-5 is used. the
<实施例14>感热型辐射敏感组合物及CTP印刷版的制备 <Example 14> preparation of thermosensitive radiation-sensitive composition and CTP printing plate
大致与实施例9的正型热敏CTP印刷版相同,不同之处在于其中使用样品编号为N-6的改性成膜树脂。 It is roughly the same as the positive heat-sensitive CTP printing plate of Example 9, except that the modified film-forming resin whose sample number is N-6 is used. the
上述实施例8至实施例14制得的正型热敏CTP印刷版进行曝光显影测试。显影测试的显影液为Kodak premium(柯达公司出品),显影液的温度为23℃、显影时间为30秒,iCPlate2[X-rite]印刷版量测仪器(由爱色丽公司出品)进行50%网点呈像测试。其等结果整理如下表1。 The positive heat-sensitive CTP printing plates prepared in the above-mentioned Examples 8 to 14 were tested for exposure and development. The developing solution of developing test is Kodak premium (produced by Kodak Company), the temperature of developing solution is 23 ℃, developing time is 30 seconds, iCPlate2[X-rite] printing plate measuring instrument (produced by X-Rite Company) carries out 50% Dot rendering test. The results are summarized in Table 1 below. the
表1 Table 1
以X-rite 528色度分析仪器(由爱色丽公司出品)测量实施例8至实施例14的减薄差值(即感光层前后减少的比率)、并以酒精滴至版底无颜色变化为基准,测量其等对应的澄清点(clean point),通常感光层含有颜料,例如蓝色颜料,若基板上残留有感光层,酒精可以将感光层内的颜料溶出,也就是通过酒精测量基板上是否残留有未经感光的感光层。此外,因手指的接触是造成印刷接触表面脱落或刮伤的主要原因,故以硬度实验对产品进行表面刮伤测试,以标准铅笔硬度标示,来判别产品表面硬度。使用3M#610型胶带,胶带贴于印纹上,用力压紧,不要有空气残存于胶带与印纹粘合处,贴完后, 静置一分钟,一分钟后撕下胶带,若印纹为完整状态,则接着OK,若印纹有被撕下,则接着NG。使用耐摩擦机,湿式测试法来回摩擦100次,观测表面有无磨损,共分三等级,分别为差、普通与佳。最终以加速磨耗印刷条件,测试该基板商业上可接受质量图像之印刷量。其等结果整理如下表2。 Measure the thinning difference (i.e. the ratio of reduction before and after the photosensitive layer) of Example 8 to Example 14 with X-rite 528 chromaticity analysis instrument (produced by X-Rite Company), and drop to the bottom of the plate with alcohol without color change As a benchmark, measure the corresponding clear point (clean point). Usually the photosensitive layer contains pigments, such as blue pigments. If the photosensitive layer remains on the substrate, alcohol can dissolve the pigment in the photosensitive layer, that is, measure the substrate through alcohol Whether there is any unsensitized photosensitive layer remaining on the surface. In addition, because finger contact is the main cause of peeling off or scratches on the printed contact surface, the surface scratch test of the product is carried out by the hardness test, and the surface hardness of the product is judged by the standard pencil hardness. Use 3M#610 adhesive tape, stick the tape on the print, press it firmly, no air will remain in the joint between the tape and the print, after pasting, let it stand for one minute, tear off the tape after one minute, if the print If it is in a complete state, then proceed to OK, and if the print has been torn off, proceed to NG. Using a friction-resistant machine, the wet test method is rubbed back and forth 100 times to observe whether the surface is worn or not. There are three grades, namely poor, normal and good. Finally, under accelerated abrasion printing conditions, the substrates were tested for yield of images of commercially acceptable quality. The results are summarized in Table 2 below. the
表2 Table 2
显影测试的显影液为Kodak premium,显影液的温度为23℃、显影时间为45秒,iCPlate2[X-rite]量测仪器进行50%网点呈像测试并以X-rite 528色度分析仪器测量实施例8至实施例14的减薄差值、并以酒精滴至版底无颜色变化为基准测量其等对应的澄清点。其等结果整理如下表3。 The developing solution used in the development test is Kodak premium, the temperature of the developing solution is 23°C, and the developing time is 45 seconds. The iCPlate2[X-rite] measuring instrument conducts a 50% dot rendering test and measures it with an X-rite 528 chromaticity analysis instrument The difference in thinning from Example 8 to Example 14, and the corresponding clarification points were measured based on the fact that there was no color change when the alcohol was dripped onto the bottom of the plate. The results are summarized in Table 3 below. the
表3 table 3
显影测试的显影液为Kodak premium,显影液的温度为25℃、显影时间 为30秒,iCPlate2[X-rite]量测仪器进行50%网点呈像测试并以X-rite 528色度分析仪器测量实施例8至实施例14的减薄差值、并以酒精滴至版底无颜色变化为基准,测量其等对应的澄清点。其等结果整理如下表4。 The developing solution used in the development test is Kodak premium, the temperature of the developing solution is 25°C, and the developing time is 30 seconds. The iCPlate2[X-rite] measuring instrument conducts a 50% dot image test and measures it with an X-rite 528 chromaticity analysis instrument The difference in thinning from Example 8 to Example 14, and based on the fact that there is no color change when the alcohol drips onto the bottom of the plate, is used to measure the corresponding clearing point. The results are summarized in Table 4 below. the
表4 Table 4
由上述数据可以发现本发明导入改性成膜树脂的正型热敏CTP印刷版感度高、耐碱性好,延长显影时间或提高显影温度后,50%网点表现差异很小,可见能有效提高显影宽容度。故导入改性成膜树脂可增加印刷版的感度、硬度、接着、耐磨耗与耐印量等特性,通过此法能提高产品良率与质量。 From the above data, it can be found that the positive-type heat-sensitive CTP printing plate introduced with modified film-forming resin of the present invention has high sensitivity and good alkali resistance. After prolonging the developing time or increasing the developing temperature, there is little difference in the performance of 50% dots, which shows that it can effectively improve Development latitude. Therefore, the introduction of modified film-forming resin can increase the sensitivity, hardness, adhesion, wear resistance and printing durability of the printing plate, and the product yield and quality can be improved through this method. the
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US5340699A (en) * | 1993-05-19 | 1994-08-23 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates |
US5770750A (en) * | 1997-01-10 | 1998-06-23 | Georgia-Pacific Resins, Inc. | Alkyd and aralkyd derivatives of phenolic polymers |
US6166151A (en) * | 1999-06-22 | 2000-12-26 | Georgia-Pacific Resins, Inc. | Lactone chain-extended phenolic polyester polyols |
JP2007131710A (en) * | 2005-11-09 | 2007-05-31 | Lintec Corp | Method for producing photodegradable polymer compound |
US20070224550A1 (en) * | 2004-06-11 | 2007-09-27 | Kabushiki Kaisha Toshiba | Photosensitive composition and method for forming pattern using same |
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US5340699A (en) * | 1993-05-19 | 1994-08-23 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates |
US5770750A (en) * | 1997-01-10 | 1998-06-23 | Georgia-Pacific Resins, Inc. | Alkyd and aralkyd derivatives of phenolic polymers |
US6166151A (en) * | 1999-06-22 | 2000-12-26 | Georgia-Pacific Resins, Inc. | Lactone chain-extended phenolic polyester polyols |
US20070224550A1 (en) * | 2004-06-11 | 2007-09-27 | Kabushiki Kaisha Toshiba | Photosensitive composition and method for forming pattern using same |
JP2007131710A (en) * | 2005-11-09 | 2007-05-31 | Lintec Corp | Method for producing photodegradable polymer compound |
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