CN102169949B - 一种发光二极管基板及其制造方法 - Google Patents
一种发光二极管基板及其制造方法 Download PDFInfo
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- CN102169949B CN102169949B CN 201110045103 CN201110045103A CN102169949B CN 102169949 B CN102169949 B CN 102169949B CN 201110045103 CN201110045103 CN 201110045103 CN 201110045103 A CN201110045103 A CN 201110045103A CN 102169949 B CN102169949 B CN 102169949B
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- emitting diode
- substrate
- led
- light
- light emitting
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- 239000000758 substrate Substances 0.000 title claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 20
- 229910001195 gallium oxide Inorganic materials 0.000 claims abstract description 17
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 claims description 15
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 6
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 3
- 230000006872 improvement Effects 0.000 description 7
- 230000007547 defect Effects 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical group [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- QZQVBEXLDFYHSR-UHFFFAOYSA-N gallium(III) oxide Inorganic materials O=[Ga]O[Ga]=O QZQVBEXLDFYHSR-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229910021513 gallium hydroxide Inorganic materials 0.000 description 2
- CHPZKNULDCNCBW-UHFFFAOYSA-N gallium nitrate Chemical compound [Ga+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O CHPZKNULDCNCBW-UHFFFAOYSA-N 0.000 description 2
- DNUARHPNFXVKEI-UHFFFAOYSA-K gallium(iii) hydroxide Chemical compound [OH-].[OH-].[OH-].[Ga+3] DNUARHPNFXVKEI-UHFFFAOYSA-K 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 238000006557 surface reaction Methods 0.000 description 2
- 230000032683 aging Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 229940044658 gallium nitrate Drugs 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
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Application Number | Priority Date | Filing Date | Title |
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CN 201110045103 CN102169949B (zh) | 2011-02-25 | 2011-02-25 | 一种发光二极管基板及其制造方法 |
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CN 201110045103 CN102169949B (zh) | 2011-02-25 | 2011-02-25 | 一种发光二极管基板及其制造方法 |
Publications (2)
Publication Number | Publication Date |
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CN102169949A CN102169949A (zh) | 2011-08-31 |
CN102169949B true CN102169949B (zh) | 2013-10-09 |
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CN 201110045103 Active CN102169949B (zh) | 2011-02-25 | 2011-02-25 | 一种发光二极管基板及其制造方法 |
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CN (1) | CN102169949B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN103123947B (zh) * | 2012-12-07 | 2018-01-19 | 鹤山丽得电子实业有限公司 | 一种改善各种衬底外延底层长晶质量的方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4145437B2 (ja) * | 1999-09-28 | 2008-09-03 | 住友電気工業株式会社 | 単結晶GaNの結晶成長方法及び単結晶GaN基板の製造方法と単結晶GaN基板 |
US7223441B2 (en) * | 2004-03-10 | 2007-05-29 | Pilkington North America, Inc. | Method for depositing gallium oxide coatings on flat glass |
CN101746961A (zh) * | 2009-10-19 | 2010-06-23 | 鲁东大学 | 在平板玻璃上沉积多晶β-Ga2O3薄膜的方法 |
CN101728473A (zh) * | 2009-11-03 | 2010-06-09 | 山西光宇半导体照明有限公司 | 一种大功率led芯片支架 |
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Owner name: FOCUS LIGHINGS TECHNOLOGY CO., LTD. Free format text: FORMER NAME: FOCUS LIGHTING (SUZHOU) CO., LTD. |
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CP01 | Change in the name or title of a patent holder |
Address after: 215123 Suzhou Province Industrial Park, Jiangsu new road, No. 8 Patentee after: FOCUS LIGHTINGS TECH Co.,Ltd. Address before: 215123 Suzhou Province Industrial Park, Jiangsu new road, No. 8 Patentee before: Focus Lightings Tech Inc. |
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CP02 | Change in the address of a patent holder |
Address after: 223800 south of Dongwu Road, Suqian Economic and Technological Development Zone, Jiangsu Province Patentee after: FOCUS LIGHTINGS TECHNOLOGY (SUQIAN) Co.,Ltd. Address before: 223800 west side of development avenue of Suqian economic and Technological Development Zone in Jiangsu province (room 2005 of business center) Patentee before: FOCUS LIGHTINGS TECHNOLOGY (SUQIAN) Co.,Ltd. |
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Effective date of registration: 20200911 Address after: 223800 west side of development avenue of Suqian economic and Technological Development Zone in Jiangsu province (room 2005 of business center) Patentee after: FOCUS LIGHTINGS TECHNOLOGY (SUQIAN) CO.,LTD. Address before: 215123 No. 8 Qing Qing Road, Suzhou Industrial Park, Jiangsu, China Patentee before: FOCUS LIGHTINGS TECH Co.,Ltd. |