CN102101396B - Method for aligning metal grid line in solar cell metallization process - Google Patents
Method for aligning metal grid line in solar cell metallization process Download PDFInfo
- Publication number
- CN102101396B CN102101396B CN2010105503530A CN201010550353A CN102101396B CN 102101396 B CN102101396 B CN 102101396B CN 2010105503530 A CN2010105503530 A CN 2010105503530A CN 201010550353 A CN201010550353 A CN 201010550353A CN 102101396 B CN102101396 B CN 102101396B
- Authority
- CN
- China
- Prior art keywords
- main grid
- solar cell
- printing
- square
- cell metallization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 54
- 239000002184 metal Substances 0.000 title claims abstract description 19
- 238000001465 metallisation Methods 0.000 title claims abstract description 15
- 238000007639 printing Methods 0.000 claims abstract description 32
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 9
- 239000010703 silicon Substances 0.000 claims abstract description 9
- 238000009792 diffusion process Methods 0.000 claims description 8
- 239000003550 marker Substances 0.000 claims description 8
- 238000007650 screen-printing Methods 0.000 abstract 1
- 238000005516 engineering process Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Photovoltaic Devices (AREA)
Abstract
The invention discloses a method for aligning a metal grid line in a solar cell metallization process. The method comprises the following steps of: 1, designing a mark pattern at four top ends of a main grid design position of a silicon chip respectively in a diffusing process or other processes, wherein the mark patterns are required to form an overall circular shape or an overall concentric square shape or an overall circular and concentric square shape; and 2, analyzing each mark pattern by using aligning software installed on an Italy Baccini printer to accurately calculate the central position of the pattern and accurately calculate delta X (transverse offset-a coordinate parallel to the main grid) and delta Y (longitudinal offset-a coordinate vertical to the main grid) of a specific region and the center of a screen printing plate pattern, and adding compensation values according to the data in a printing process so as to meet the requirement on accurate printing.
Description
Technical field
The present invention relates to the photovoltaic application field, be specifically related to metal grid lines alignment methods in a kind of solar cell metallization processes, so that metal grid lines is printed onto the appointed area accurately.
Background technology
The selective emitter technology---under the metal wire of serigraphy, accurately make the n+ zone that a severe is mixed, in order to further reduce contact resistance, thus the raising of realization transformation efficiency.There are several technology in current making selective emitter zone, for example anti-carve emitter stage (such as Merck, Schmid etc.), twice diffusion (as in the Nanjing electricity etc.) etc., but almost each all requires the multiple print steps of high accuracy and high duplication, metal wire must accurately directly be placed on the emitter region very much, otherwise, will lose its odds for effectiveness.Present Domestic Sunpower Corp. generally uses the centrally aligned technology, and its shortcoming is that alignment precision is low, and poor repeatability causes realizing electric current the clear superiority of fill factor, curve factor and efficient.The famous solar energy industry of most adopts twice printing technology or other high-efficiency batteries also must must very accurately directly be placed on first impression metal grid lines or the appointed area by metal wire in order to reach stable efficiency gain in addition.Therefore a kind of more advanced urgent most of high performance solar batteries manufacturing of quilt of grid line technique of alignment needs.
Summary of the invention
The objective of the invention is provides metal grid lines alignment methods in a kind of solar cell metallization processes in order to reach high maturity, high alignment precision, low cost and high-speed requirement, thereby realizes the print steps of high performance solar batteries in making.
The technical solution used in the present invention is: metal grid lines alignment methods in a kind of solar cell metallization processes, and the method may further comprise the steps:
The first step: by design respectively an indicia patterns on four tops of the main grid design attitude of silicon chip in diffusion or other process, requiring of this indicia patterns is as follows:
Be shaped as circular combination or the combination of concentric square or the combination of circle and concentric square;
Dimensional requirement: the main grid width is D (D〉0.4mm); For marked circle, radius of circle R is 0.2 mm≤R＜D/2; For concentric square, interior square length of side L
1Be 0.1 mm≤L
1＜D, outer square length of side L
2Be 0.2 mm≤L
3＜D;
Second step: by at Italian Baccini(Jonathan Bachini) the aligning software that carries of printing machine is analyzed this marker graphic, can calculate accurately the center of this figure, thereby can accurately calculate the Δ X(lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid), Δ Y(vertical misalignment-perpendicular to the coordinate of main grid), Δ θ (angular deflection), in printing process, add offset according to these data, just can reach the requirement of accurate printing.
As preferably, radius of circle R is 0.4 mm in the first step of described step, the interior square length of side L of concentric square
1Be 0.6 mm, outer square length of side L
2Be 1mm.
Through the checking of great many of experiments, take circle or concentric square more to be conducive in software, analyze the center of figure, also be directly connected in addition the degree of accuracy of software analysis in the size of figure.Use four high accuracy cameras to capture four top marker graphics of main grid on the silicon chip, thereby calculate the exact position of appointed area.Then optimize every printing parameter and comprise the net spacing, scraper spacing, squeegee pressure, route that scraper and return blade and cell piece relatively move etc.
Beneficial effect: the present invention has adopted accurate location, has fundamentally solved high performance solar batteries metallization grid line and has aimed at difficult problem, guarantees that high-efficiency battery has the efficiency gain more than 0.5%.
Description of drawings
Fig. 1 is the embodiment of the invention 1 indicia patterns schematic diagram;
Fig. 2 is the embodiment of the invention 2 indicia patterns schematic diagrames.
The specific embodiment
The invention will be further described below in conjunction with the drawings and specific embodiments:
Metal grid lines alignment methods in a kind of solar cell metallization processes, the method may further comprise the steps:
The first step: by design respectively an indicia patterns on four tops of the main grid design attitude of silicon chip in diffusion or other process, this indicia patterns is the combination of two circles and a concentric square;
The main grid width is 1.8mm; Circular radius R is 0.4 mm; The interior square length of side L of concentric square
1Be 0.6 mm, outer square length of side L
2Be 1 mm;
Second step: by at Italian Baccini(Jonathan Bachini) the aligning software that carries of printing machine is analyzed this marker graphic, can calculate accurately the center of this figure, thereby can accurately calculate the Δ X(lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid), Δ Y(vertical misalignment-perpendicular to the coordinate of main grid), Δ θ (angular deflection), in printing process, add offset according to these data, just can reach the requirement of accurate printing.
Embodiment 2
Metal grid lines alignment methods in a kind of solar cell metallization processes, the method may further comprise the steps:
The first step: by design respectively an indicia patterns on four tops of the main grid design attitude of silicon chip in diffusion or other process, this indicia patterns is the combination of two concentric square;
The main grid width is 1.8mm; The interior square length of side L of concentric square
1Be 0.6 mm, outer square length of side L
3Be 1 mm;
Second step: by at Italian Baccini(Jonathan Bachini) the aligning software that carries of printing machine is analyzed this marker graphic, can calculate accurately the center of this figure, thereby can accurately calculate the Δ X(lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid), Δ Y(vertical misalignment-perpendicular to the coordinate of main grid), Δ θ (angular deflection), in printing process, add offset according to these data, just can reach the requirement of accurate printing.
Embodiment 3
Metal grid lines alignment methods in a kind of solar cell metallization processes, the method may further comprise the steps:
The first step: by design respectively an indicia patterns on four tops of the main grid design attitude of silicon chip in diffusion or other process, this indicia patterns is two circular combinations;
The main grid width is 1.8mm; Great circle circular radius R is 0.8mm, and roundlet circular radius R is 0.2mm;
Second step: by at Italian Baccini(Jonathan Bachini) the aligning software that carries of printing machine is analyzed this marker graphic, can calculate accurately the center of this figure, thereby can accurately calculate the Δ X(lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid), Δ Y(vertical misalignment-perpendicular to the coordinate of main grid), Δ θ (angular deflection), in printing process, add offset according to these data, just can reach the requirement of accurate printing.
Embodiment 4
Metal grid lines alignment methods in a kind of solar cell metallization processes, the method may further comprise the steps:
The first step: by design respectively an indicia patterns on four tops of the main grid design attitude of silicon chip in diffusion or other process, this indicia patterns is the combination of two concentric square;
The main grid width is 1.8mm; The interior square length of side L of concentric square
1Be 0.1 mm, outer square length of side L
2Be 0.2 mm;
Second step: by at Italian Baccini(Jonathan Bachini) the aligning software that carries of printing machine is analyzed this marker graphic, can calculate accurately the center of this figure, thereby can accurately calculate the Δ X(lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid), Δ Y(vertical misalignment-perpendicular to the coordinate of main grid), Δ θ (angular deflection), in printing process, add offset according to these data, just can reach the requirement of accurate printing.
Embodiment 5
Metal grid lines alignment methods in a kind of solar cell metallization processes, the method may further comprise the steps:
The first step: by design respectively an indicia patterns on four tops of the main grid design attitude of silicon chip in diffusion or other process, this indicia patterns is the combination of two circles and a concentric square;
The main grid width is 1.8mm; Circular radius R is 0.2 mm; The interior square length of side L of concentric square
1Be 1.5 mm, outer square length of side L
2Be 1.7mm;
Second step: by at Italian Baccini(Jonathan Bachini) the aligning software that carries of printing machine is analyzed this marker graphic, can calculate accurately the center of this figure, thereby can accurately calculate the Δ X(lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid), Δ Y(vertical misalignment-perpendicular to the coordinate of main grid), Δ θ (angular deflection), in printing process, add offset according to these data, just can reach the requirement of accurate printing.
Claims (3)
1. metal grid lines alignment methods in the solar cell metallization processes, it is characterized in that: the method may further comprise the steps:
The first step: by design respectively an indicia patterns on four tops of the main grid design attitude of silicon chip in diffusion or other process, requiring of this indicia patterns is as follows:
Be shaped as circular combination or the combination of concentric square or the combination of circle and concentric square;
Dimensional requirement: the main grid width is D, wherein D〉0.4mm; For marked circle, radius of circle R is 0.2 mm≤R＜D/2; For concentric square, interior square length of side L
1Be 0.1 mm≤L
1＜D, outer square length of side L
2Be 0.2 mm≤L
2＜D;
Second step: analyze this marker graphic by the aligning software that carries at Italian Baccini Jonathan Bachini printing machine, can calculate accurately the center of this figure, thereby can accurately calculate the lateral shift of appointed area and printing screen plate centre of figure-the be parallel to coordinate of main grid: Δ X, vertical misalignment-perpendicular to the coordinate of main grid: Δ Y, angular deflection: Δ θ, in printing process, add offset according to these data, just can reach the requirement of accurate printing.
2. metal grid lines alignment methods in a kind of solar cell metallization processes according to claim 1, it is characterized in that: radius of circle R is 0.4 mm in the first step of described step.
3. metal grid lines alignment methods in a kind of solar cell metallization processes according to claim 1 is characterized in that: the interior square length of side L of concentric square in the first step of described step
1Be 0.6 mm, outer square length of side L
2Be 1mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105503530A CN102101396B (en) | 2010-11-19 | 2010-11-19 | Method for aligning metal grid line in solar cell metallization process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105503530A CN102101396B (en) | 2010-11-19 | 2010-11-19 | Method for aligning metal grid line in solar cell metallization process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102101396A CN102101396A (en) | 2011-06-22 |
| CN102101396B true CN102101396B (en) | 2013-04-24 |
Family
ID=44154541
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010105503530A Expired - Fee Related CN102101396B (en) | 2010-11-19 | 2010-11-19 | Method for aligning metal grid line in solar cell metallization process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102101396B (en) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102501592A (en) * | 2011-10-28 | 2012-06-20 | 浙江鸿禧光伏科技股份有限公司 | Method for measuring screen plate overlay accuracy of solar cell |
| CN102602183B (en) * | 2012-03-06 | 2014-05-14 | 英利能源（中国）有限公司 | Printing method for positive electrode of selective emitter cell |
| CN102810603B (en) * | 2012-09-04 | 2015-04-22 | 镇江大全太阳能有限公司 | Screen printing overprinting alignment detection method for solar cell electrodes |
| CN103855239B (en) * | 2012-11-30 | 2016-12-21 | 茂迪股份有限公司 | Front electrode of solar cell and manufacturing method thereof |
| CN103855227A (en) * | 2012-12-07 | 2014-06-11 | 茂迪股份有限公司 | solar cell and solar cell module |
| CN103612494A (en) * | 2013-10-18 | 2014-03-05 | 浙江晶科能源有限公司 | Method for correcting printing deviation of solar cell SE |
| CN103640349B (en) * | 2013-11-26 | 2016-11-23 | 常州天合光能有限公司 | The secondary printing alignment method of crystal silicon solar batteries |
| FR3018391B1 (en) * | 2014-03-07 | 2016-04-01 | Commissariat Energie Atomique | METHOD FOR MAKING A SELECTIVE DOPING PHOTOVOLTAIC CELL |
| CN105437765A (en) * | 2015-12-25 | 2016-03-30 | 江苏华宇印涂设备集团有限公司 | Positioning adjusting method |
| CN105895741B (en) * | 2016-05-26 | 2017-08-25 | 协鑫集成科技股份有限公司 | The back side overprinting method of photovoltaic cell |
| CN112018192A (en) * | 2019-05-28 | 2020-12-01 | 盐城阿特斯阳光能源科技有限公司 | A grid line structure, screen plate, solar cell and traceability method |
| CN111634133B (en) * | 2020-05-09 | 2022-04-29 | 浙江爱旭太阳能科技有限公司 | A method for adjusting grid line offset of solar cell and its application |
| CN112172338B (en) * | 2020-09-24 | 2022-03-15 | 山西潞安太阳能科技有限责任公司 | Automatic positioning system for silk-screen printing Mark points |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1158011A (en) * | 1995-11-22 | 1997-08-27 | 埃伯乐太阳能公司 | Structure and manufacturing process of an aluminum alloy junction self-aligned back-contact silicon solar cell |
| CN101438207A (en) * | 2006-03-31 | 2009-05-20 | 应用材料股份有限公司 | Method for making an improved thin film solar cell interconnect using etch and deposition processes |
| CN101853886A (en) * | 2009-04-03 | 2010-10-06 | 上海晶龙光电科技有限公司 | Electrode pattern of solar cell |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070169806A1 (en) * | 2006-01-20 | 2007-07-26 | Palo Alto Research Center Incorporated | Solar cell production using non-contact patterning and direct-write metallization |
| US8673679B2 (en) * | 2008-12-10 | 2014-03-18 | Applied Materials Italia S.R.L. | Enhanced vision system for screen printing pattern alignment |
-
2010
- 2010-11-19 CN CN2010105503530A patent/CN102101396B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1158011A (en) * | 1995-11-22 | 1997-08-27 | 埃伯乐太阳能公司 | Structure and manufacturing process of an aluminum alloy junction self-aligned back-contact silicon solar cell |
| CN101438207A (en) * | 2006-03-31 | 2009-05-20 | 应用材料股份有限公司 | Method for making an improved thin film solar cell interconnect using etch and deposition processes |
| CN101853886A (en) * | 2009-04-03 | 2010-10-06 | 上海晶龙光电科技有限公司 | Electrode pattern of solar cell |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102101396A (en) | 2011-06-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102101396B (en) | Method for aligning metal grid line in solar cell metallization process | |
| CN102779861B (en) | Electrode structure with grid lines on front surface | |
| CN201029148Y (en) | Electronic component locating and fitting structure | |
| CN102931245A (en) | Solar cell front face grid line and solar cell sheet printed with same | |
| CN204994090U (en) | Prevent welding general tool board | |
| CN102299203B (en) | Solar energy cell and solar energy cell right side electrode design method | |
| CN203055923U (en) | Solar cell front face grid line and solar cell sheet printed with same | |
| CN103171263A (en) | Screen board used for printing of positive electrode of crystalline silicon solar cell | |
| CN202528567U (en) | Screen for printing positive electrode of crystalline silica solar cell | |
| CN202259207U (en) | A detection device for detecting back-contact cell | |
| CN203427438U (en) | Cost-saving large-format composite screen printing plate | |
| CN202528566U (en) | Mesh plate used for printing of positive electrode of crystalline silicon solar cell | |
| CN203085565U (en) | Novel solar battery positive electrode | |
| CN103171257B (en) | Solar cell electrode AB screen board in grid line complementary structure and printing method thereof | |
| CN202528558U (en) | Matching metal solar screen for multi-time printing | |
| CN202259326U (en) | Novel front grid line electrode of solar cell | |
| CN201693833U (en) | A mask structure for printing silver paste on silicon panels of solar photovoltaic cells | |
| CN202695462U (en) | Sectional-type positive-electrode highly-efficient solar cell sheet | |
| CN202601632U (en) | Crystalline silicon solar energy cell | |
| CN203409386U (en) | Turbulent wave nozzle cover plate | |
| CN212561210U (en) | Template for checking preformed hole of bridge bearing and marking auxiliary beam erecting line | |
| CN202772145U (en) | SE battery improved structure adopting non-paraffin mask main grid structure | |
| CN203674221U (en) | MWT cell with novel main gate electrode pattern | |
| CN202120965U (en) | Lamination moldboard | |
| CN205177860U (en) | Solar cell |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130424 Termination date: 20181119 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |