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CN102093081A - Adaptive graphite-like carbon-based film material for mechanical seal and preparation method thereof - Google Patents

Adaptive graphite-like carbon-based film material for mechanical seal and preparation method thereof Download PDF

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CN102093081A
CN102093081A CN2009101176908A CN200910117690A CN102093081A CN 102093081 A CN102093081 A CN 102093081A CN 2009101176908 A CN2009101176908 A CN 2009101176908A CN 200910117690 A CN200910117690 A CN 200910117690A CN 102093081 A CN102093081 A CN 102093081A
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graphite
carbon
adaptive
friction
microns
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王立平
薛群基
王永欣
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Lanzhou Institute of Chemical Physics LICP of CAS
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Abstract

本发明公开了一种机械密封用自适应类石墨碳基薄膜材料及其制备方法。材料依次由基体材料、厚度为0.1~0.2微米的底层粘接层和厚度为1.5~2.5微米的类石墨碳表层构成。本发明材料硬度高达25GPa,其磨损寿命比未镀膜基体提高2个多数量级,干摩擦和水润滑条件下摩擦系数均稳定在0.04~0.06,在变工况下具有稳定的低摩擦和多环境摩擦磨损自适应特性。可用于陶瓷机械密封件如密封环、轴套以及水润滑陶瓷轴承等运动部件自润滑与延寿处理。The invention discloses an adaptive graphite-like carbon-based thin film material for mechanical sealing and a preparation method thereof. The material is sequentially composed of a matrix material, an underlying adhesive layer with a thickness of 0.1-0.2 microns and a graphite-like carbon surface layer with a thickness of 1.5-2.5 microns. The hardness of the material of the present invention is as high as 25GPa, and its wear life is more than 2 orders of magnitude higher than that of the uncoated substrate. The friction coefficient is stable at 0.04-0.06 under dry friction and water lubrication conditions, and it has stable low friction and multi-environment friction under variable working conditions Wear Adaptive Features. It can be used for self-lubrication and life extension treatment of moving parts such as ceramic mechanical seals such as sealing rings, shaft sleeves and water-lubricated ceramic bearings.

Description

机械密封用自适应类石墨碳基薄膜材料及其制备方法Self-adaptive graphite-like carbon-based film material for mechanical seal and preparation method thereof

技术领域technical field

本发明涉及一种自适应类石墨碳基薄膜材料及其制备方法,具体说是在机械陶瓷密封件表面获得类石墨碳基自润滑薄膜,属表面处理领域。The invention relates to a self-adaptive graphite-like carbon-based film material and a preparation method thereof, specifically obtaining a graphite-like carbon-based self-lubricating film on the surface of a mechanical ceramic seal, belonging to the field of surface treatment.

背景技术Background technique

为了降低或减少各种机械密封摩擦副因运动而产生的摩擦、磨损、振动、冲击、噪声、可靠性差和寿命短等问题,在机械密封关键零部件的制造中,摩擦副表面薄膜技术逐渐成为改善机械密封系统使役性能的重要途径。变工况环境(频繁起停、低速/高速、边界润滑/近-干摩擦等)是现代机械密封系统运行的主要特点,也是制约其寿命和可靠性的关键问题之一。随着现代机械密封系统向高效节能、工况多元化、超长服役寿命要求等发展,其表面薄膜加工技术正在面临以下两个方面的发展趋势:①要求表面薄膜具有超高硬度、超高韧性以及超低摩擦与优异抗磨性能;②要求表面薄膜具有一定的变工况环境自适应特性和边界润滑条件下优异的自润滑特性。其中表面碳基薄膜(如金刚石薄膜、类金刚石薄膜、类石墨薄膜等)在流体中显示出优异的减摩抗磨和耐蚀性能而受到普遍重视。在机械密封件表面碳基薄膜加工方面,目前仅有专利CN101133184A采用化学气相沉积技术在机械密封件或轴承表面镀覆金刚石膜,然而存在成本高、膜层表面粗糙、超高硬度金刚石膜抛光难度大等缺点。In order to reduce or reduce the friction, wear, vibration, impact, noise, poor reliability and short life of various mechanical seal friction pairs caused by movement, in the manufacture of key parts of mechanical seals, the surface film technology of friction pairs has gradually become An important way to improve the service performance of the mechanical seal system. Variable working conditions (frequent start and stop, low speed/high speed, boundary lubrication/near-dry friction, etc.) are the main characteristics of the operation of modern mechanical seal systems, and are also one of the key issues restricting their life and reliability. With the development of modern mechanical sealing systems towards high efficiency and energy saving, diversified working conditions, and ultra-long service life requirements, its surface film processing technology is facing the development trend of the following two aspects: ① The surface film is required to have ultra-high hardness and ultra-high toughness And ultra-low friction and excellent anti-wear performance; ②The surface film is required to have certain adaptive characteristics of variable working conditions and excellent self-lubricating characteristics under boundary lubrication conditions. Among them, surface carbon-based films (such as diamond films, diamond-like films, graphite-like films, etc.) have been widely valued for their excellent anti-friction, anti-wear and corrosion resistance properties in fluids. In terms of processing carbon-based films on the surface of mechanical seals, currently only patent CN101133184A uses chemical vapor deposition technology to coat diamond films on the surface of mechanical seals or bearings. However, there are high costs, rough surface of the film layer, and difficulty in polishing ultra-high hardness diamond films. Big and other shortcomings.

类石墨碳薄膜是最新发展起来的一种新型固体润滑材料,具有光滑平整、高硬度、低摩擦和长寿命等优点,是陶瓷密封件表面改性的理想材料。陶瓷密封件和滑动轴承的优势在于其高耐磨性和在潮湿或化学腐蚀环境中的低摩擦系数。但在干燥运转和润滑不足条件下,这些元件的工作性能却无法满足要求。如果能够在陶瓷密封件表面镀覆高硬度类石墨薄膜,将会显著提高其在变工况环境(频繁起停、低速/高速、边界润滑/近-干摩擦等)下的可靠寿命,使得其在混合摩擦条件和干燥运转下获得稳定的低摩擦并表面出一定的多环境自适应特性。目前国内还未见将自适应类石墨碳薄膜用于密封陶瓷件自润滑改性的相关专利报道。Graphite-like carbon film is a newly developed new type of solid lubricating material, which has the advantages of smoothness, high hardness, low friction and long life, and is an ideal material for surface modification of ceramic seals. The advantages of ceramic seals and plain bearings are their high wear resistance and low coefficient of friction in wet or chemically aggressive environments. However, under dry running and insufficient lubrication conditions, the performance of these components is not satisfactory. If a high-hardness graphite film can be coated on the surface of ceramic seals, it will significantly improve its reliable life under variable working conditions (frequent start and stop, low speed/high speed, boundary lubrication/near-dry friction, etc.), making its Under the conditions of mixed friction and dry operation, stable low friction is obtained and certain multi-environment adaptive characteristics are displayed. At present, there is no relevant patent report on the self-lubricating modification of self-lubricating ceramic parts using self-adaptive graphite-like carbon film.

发明内容Contents of the invention

本发明的目的是提供一种高硬度、高耐磨和在干摩擦或水润滑状态下具有减摩自润滑性能的机械密封件表面自适应薄膜及其表面加工方法,以此来改善陶瓷机械密封件在变工况如初期磨合、频繁启停、低速/高速、以及短期过载等导致的可靠性差等问题。The purpose of the present invention is to provide a mechanical seal surface self-adaptive film with high hardness, high wear resistance and self-lubricating performance under dry friction or water lubrication and its surface processing method, so as to improve ceramic mechanical seals Problems such as poor reliability caused by parts under variable working conditions such as initial run-in, frequent start and stop, low speed/high speed, and short-term overload.

为实现上述目的,本发明提供的技术方案是:To achieve the above object, the technical solution provided by the invention is:

一种机械密封用自适应类石墨碳基薄膜材料,依次由基体材料、厚度为0.1~0.2微米的底层粘接层和厚度为1.5~2.5微米的类石墨碳表层构成;所述的基体材料选自硬质合金、碳化硅和氮化硅陶瓷中的一种,所述的底层粘接层为Ti或Si;所述的类石墨碳表层中的类石墨的C-C结构中的sp2键含量为60~80%,属于典型的无氢类石墨碳结构。An adaptive graphite-like carbon-based film material for mechanical seals, which is sequentially composed of a base material, an underlying adhesive layer with a thickness of 0.1-0.2 microns, and a graphite-like carbon surface layer with a thickness of 1.5-2.5 microns; the base material is selected from From a kind of in cemented carbide, silicon carbide and silicon nitride ceramics, the bottom bonding layer is Ti or Si; the sp2 bond content in the C-C structure of graphite in the described graphite-like carbon surface layer is 60 ~80%, which belongs to the typical hydrogen-free graphitic carbon structure.

机械密封用自适应类石墨碳基薄膜材料的制备方法,其特征在于该方法步骤为:(1)等离子溅射清洗基材,将基体材料置于磁控溅射气相沉积系统中,进行氩等离子体溅射清洗,氩气气体流量为50~70sccm,偏压为800~1000V,处理时间为30~40min;(2)磁控溅射沉积Ti或Si粘接层,金属Ti靶或Si靶为阴极,工作气体为氩气,控制电源功率为300~500W,偏压为-300V,处理时间为30~50min;(3)磁控溅射沉积类石墨碳膜,沉积过程中,真空室的本底真空为5×10-4Pa,放电气压为0.5Pa,高纯石墨靶为阴极,靶电流为1~1.2A,底材施加偏压300~500V,沉积时间120~150min,最后在基体材料表面获得高硬度自适应类石墨碳基薄膜材料。A method for preparing an adaptive graphite-like carbon-based film material for mechanical seals, characterized in that the steps of the method are: (1) cleaning the base material by plasma sputtering, placing the base material in a magnetron sputtering vapor deposition system, and performing argon plasma Bulk sputtering cleaning, the flow rate of argon gas is 50-70sccm, the bias voltage is 800-1000V, and the processing time is 30-40min; (2) Ti or Si bonding layer is deposited by magnetron sputtering, and the metal Ti target or Si target is Cathode, the working gas is argon, the control power is 300~500W, the bias voltage is -300V, and the processing time is 30~50min; (3) Magnetron sputtering deposits graphite-like carbon film. During the deposition process, the vacuum chamber The bottom vacuum is 5×10-4Pa, the discharge pressure is 0.5Pa, the high-purity graphite target is the cathode, the target current is 1-1.2A, the bias voltage is 300-500V applied to the substrate, and the deposition time is 120-150min. Obtain high-hardness adaptive graphite-like carbon-based thin film materials.

采用拉曼光谱、X射线光电子能谱仪和高分辨投射电子显微镜(HRTEM)对本发明所制备的类石墨碳薄膜进行测试,类石墨碳表层中的类石墨的C-C结构中的sp2键含量为60~80%,属于典型的无氢类石墨碳结构。HRTEM分析表明其结构为:在非晶碳基质中弥散分布有许多颗粒尺寸在3-8nm的纳米石墨团簇和金刚石颗粒,这是导致薄膜高硬度的主要原因(25GPa)。Adopt Raman spectrum, X-ray photoelectron energy spectrometer and high-resolution projection electron microscope (HRTEM) to test the prepared graphitic carbon film of the present invention, the sp2 bond content in the C-C structure of graphitic class in the graphitic carbon surface layer is 60 ~80%, which belongs to the typical hydrogen-free graphitic carbon structure. HRTEM analysis shows that its structure is: there are many nano-graphite clusters and diamond particles with a particle size of 3-8nm dispersed in the amorphous carbon matrix, which is the main reason for the high hardness of the film (25GPa).

对实施例中所制备的高硬度类石墨碳基薄膜分别在大气(HR=30±5%)和水中进行球盘式往复摩擦磨损测试(如表1):结果显示该薄膜材料在干摩擦条件下,摩擦系数可稳定在0.06左右,水润滑条件下其摩擦系数可达0.04。与未镀膜的陶瓷基体氮化硅、碳化硅以及硬质合金相比,本发明获得的高硬度类石墨碳基薄膜的耐磨性提高1-2个数量级,其在干摩擦和水润滑下的摩擦系数和磨损率均差别不大,表明其在变工况环境下具有优异的低摩擦和稳定固体润滑特性,凸显出一定的多环境摩擦磨损自适应特性。本发明高硬度类石墨碳基薄膜材料具有优异的变工况自润滑行为(干摩擦/水环境)和高耐磨特性,可用于陶瓷机械密封件如密封环、轴套以及水润滑陶瓷轴承等运动部件自润滑与延寿处理。Carry out ball-on-disk reciprocating friction and wear test (as shown in Table 1) in atmosphere (HR=30 ± 5%) and water respectively to the high-hardness graphite-like carbon-based film prepared in the embodiment: the result shows that this film material is under dry friction condition Under the condition of water lubrication, the friction coefficient can be stabilized at about 0.06, and under the condition of water lubrication, the friction coefficient can reach 0.04. Compared with uncoated ceramic matrix silicon nitride, silicon carbide and cemented carbide, the wear resistance of the high-hardness graphite-like carbon-based film obtained by the present invention is improved by 1-2 orders of magnitude, and its performance under dry friction and water lubrication The friction coefficient and wear rate are not much different, indicating that it has excellent low friction and stable solid lubrication characteristics under variable working conditions, highlighting certain multi-environmental friction and wear adaptive characteristics. The high-hardness graphite-like carbon-based film material of the present invention has excellent variable-condition self-lubricating behavior (dry friction/water environment) and high wear resistance, and can be used for ceramic mechanical seals such as seal rings, shaft sleeves and water-lubricated ceramic bearings, etc. Self-lubricating and life-extending treatment of moving parts.

表1Table 1

Figure G2009101176908D00031
Figure G2009101176908D00031

具体实施方式Detailed ways

实施例1:Example 1:

机械密封用氮化硅表面自适应类石墨碳基薄膜材料,依次由氮化硅基体、厚度为0.2微米的底层Si粘接层和厚度为1.5微米的类石墨碳表层构成。The self-adaptive graphite-like carbon-based film material on the surface of silicon nitride for mechanical sealing is composed of a silicon nitride substrate, an underlying Si bonding layer with a thickness of 0.2 microns, and a graphite-like carbon surface layer with a thickness of 1.5 microns.

氮化硅表面高硬度类石墨碳基薄膜材料处理工艺按照以下步骤进行:(1)等离子溅射清洗氮化硅基材,将基材置于磁控溅射气相沉积系统中,进行氩等离子体溅射清洗,氩气气体流量为60sccm,偏压为1000V,处理时间为30min;(2)磁控溅射沉积Si粘接层,Si靶为阴极,工作气体为氩气,控制射频电源功率为500W,基体施加偏压为500V,处理时间为50min;(3)磁控溅射沉积类石墨碳膜,沉积过程中,真空室的本底真空为5×10-4Pa,放电气压为0.5Pa,高纯石墨靶为阴极,靶电流为1.2A,底材施加偏压300V,沉积时间150min,最后在氮化硅基材表面获得高硬度自适应类石墨碳基薄膜材料。The treatment process of high-hardness graphite-like carbon-based film materials on the surface of silicon nitride is carried out according to the following steps: (1) Plasma sputtering cleans the silicon nitride substrate, puts the substrate in a magnetron sputtering vapor deposition system, and conducts argon plasma Sputtering cleaning, the argon gas flow rate is 60sccm, the bias voltage is 1000V, and the processing time is 30min; (2) magnetron sputtering deposits the Si bonding layer, the Si target is the cathode, the working gas is argon, and the power of the radio frequency power supply is controlled as 500W, the applied bias voltage of the substrate is 500V, and the processing time is 50min; (3) Magnetron sputtering deposits graphite-like carbon film. During the deposition process, the background vacuum of the vacuum chamber is 5×10-4Pa, and the discharge pressure is 0.5Pa. The high-purity graphite target is the cathode, the target current is 1.2A, the substrate is biased at 300V, and the deposition time is 150min. Finally, a high-hardness adaptive graphite-like carbon-based film material is obtained on the surface of the silicon nitride substrate.

实施例2:Example 2:

机械密封用碳化硅表面自适应类石墨碳基薄膜材料,依次由碳化硅基体、厚度为0.2微米的底层Si粘接层和厚度为2微米的类石墨碳表层构成。The self-adaptive graphite-like carbon-based film material on the surface of silicon carbide for mechanical seals is sequentially composed of a silicon carbide substrate, an underlying Si bonding layer with a thickness of 0.2 microns, and a graphite-like carbon surface layer with a thickness of 2 microns.

碳化硅表面高硬度类石墨碳基薄膜材料处理工艺按照以下步骤进行:(1)等离子溅射清洗碳化硅基材,将基材置于磁控溅射气相沉积系统中,进行氩等离子体溅射清洗,氩气气体流量为60sccm,偏压为1000V,处理时间为30min;(2)磁控溅射沉积Si粘接层,Si靶为阴极,工作气体为氩气,控制射频电源功率为500W,基体施加偏压为500V,处理时间为50min;(3)磁控溅射沉积类石墨碳膜,沉积过程中,真空室的本底真空为5×10-4Pa,放电气压为0.5Pa,高纯石墨靶为阴极,靶电流为1.2A,底材施加偏压300V,沉积时间240min,最后在碳化硅基材表面获得高硬度自适应类石墨碳基薄膜材料。The treatment process of high-hardness graphite-like carbon-based film materials on the surface of silicon carbide is carried out according to the following steps: (1) plasma sputtering to clean the silicon carbide substrate, place the substrate in a magnetron sputtering vapor deposition system, and perform argon plasma sputtering Cleaning, the argon gas flow rate is 60sccm, the bias voltage is 1000V, and the processing time is 30min; (2) Magnetron sputtering deposits the Si bonding layer, the Si target is the cathode, the working gas is argon, and the power of the radio frequency power supply is controlled to 500W, The bias voltage applied to the substrate was 500V, and the processing time was 50min; (3) The graphite-like carbon film was deposited by magnetron sputtering. During the deposition process, the background vacuum of the vacuum chamber was 5×10-4Pa, and the discharge pressure was 0.5Pa. The graphite target is the cathode, the target current is 1.2A, the substrate is biased at 300V, and the deposition time is 240min. Finally, a high-hardness adaptive graphite-like carbon-based film material is obtained on the surface of the silicon carbide substrate.

实施例3:Example 3:

机械密封用WC硬质合金表面自适应类石墨碳基薄膜材料,依次由硬质合金基体、厚度为0.1微米的底层Ti粘接层和厚度为2微米的类石墨碳表层构成。The self-adaptive graphite-like carbon-based film material on the surface of WC cemented carbide for mechanical seals is composed of a cemented carbide substrate, a bottom Ti bonding layer with a thickness of 0.1 microns, and a graphite-like carbon surface layer with a thickness of 2 microns.

WC硬质合金表面高硬度类石墨碳基薄膜材料处理工艺按照以下步骤进行:(1)等离子溅射清洗碳化硅基材,将基材置于磁控溅射气相沉积系统中,进行氩等离子体溅射清洗,氩气气体流量为60sccm,偏压为1000V,处理时间为30min;(2)磁控溅射沉积Ti粘接层,金属Ti靶为阴极,工作气体为氩气,控制靶电流为2.0A,基体施加偏压为500V,处理时间为20min;(3)磁控溅射沉积类石墨碳膜,沉积过程中,真空室的本底真空为5×10-4Pa,放电气压为0.5Pa,高纯石墨靶为阴极,靶电流为1.2A,底材施加偏压300V,沉积时间240min,最后在碳化硅基材表面获得高硬度自适应类石墨碳基薄膜材料。The treatment process of high-hardness graphite-like carbon-based film materials on the surface of WC cemented carbide is carried out according to the following steps: (1) Plasma sputtering cleans the silicon carbide substrate, puts the substrate in a magnetron sputtering vapor deposition system, and conducts argon plasma Sputtering cleaning, the argon gas flow rate is 60sccm, the bias voltage is 1000V, and the processing time is 30min; (2) Ti bonding layer is deposited by magnetron sputtering, the metal Ti target is the cathode, the working gas is argon, and the target current is controlled as 2.0A, the applied bias voltage of the substrate is 500V, and the processing time is 20min; (3) Magnetron sputtering deposits graphite-like carbon film. During the deposition process, the background vacuum of the vacuum chamber is 5×10-4Pa, and the discharge pressure is 0.5Pa , the high-purity graphite target is the cathode, the target current is 1.2A, the substrate is biased at 300V, and the deposition time is 240min. Finally, a high-hardness adaptive graphite-like carbon-based film material is obtained on the surface of the silicon carbide substrate.

Claims (2)

1.一种机械密封用自适应类石墨碳基薄膜材料,依次由基体材料、厚度为0.1~0.2微米的底层粘接层和厚度为1.5~2.5微米的类石墨碳表层构成;所述的基体材料选自硬质合金、碳化硅和氮化硅陶瓷中的一种,所述的底层粘接层为Ti或Si;所述的类石墨碳表层中的类石墨的C-C结构中的sp2键含量为60~80%,属于典型的无氢类石墨碳结构。1. A self-adaptive graphite-like carbon-based film material for mechanical sealing, which is successively composed of a base material, a thickness of 0.1 to 0.2 microns, an underlying adhesive layer, and a thickness of 1.5 to 2.5 microns of graphite-like carbon surface layer; the substrate The material is selected from one of cemented carbide, silicon carbide and silicon nitride ceramics, the bottom bonding layer is Ti or Si; the sp2 bond content in the graphite-like C-C structure in the graphite-like carbon surface layer It is 60-80%, which belongs to the typical hydrogen-free graphitic carbon structure. 2.如权利要求1所述的涂层的制备方法,其特征在于该方法步骤为:(1)等离子溅射清洗基材,将基体材料置于磁控溅射气相沉积系统中,进行氩等离子体溅射清洗,氩气气体流量为50~70sccm,偏压为800~1000V,处理时间为30~40min;(2)磁控溅射沉积Ti或Si粘接层,金属Ti靶或Si靶为阴极,工作气体为氩气,控制电源功率为300~500W,偏压为-300V,处理时间为30~50min;(3)磁控溅射沉积类石墨碳膜,沉积过程中,真空室的本底真空为5×10-4Pa,放电气压为0.5Pa,高纯石墨靶为阴极,靶电流为1~1.2A,底材施加偏压300~500V,沉积时间120~150min,最后在基体材料表面获得高硬度自适应类石墨碳基薄膜材料。2. the preparation method of coating as claimed in claim 1 is characterized in that this method step is: (1) plasma sputtering cleans base material, base material is placed in magnetron sputtering vapor deposition system, carries out argon plasma Bulk sputtering cleaning, the flow rate of argon gas is 50-70sccm, the bias voltage is 800-1000V, and the processing time is 30-40min; (2) Ti or Si bonding layer is deposited by magnetron sputtering, and the metal Ti target or Si target is Cathode, the working gas is argon, the control power is 300~500W, the bias voltage is -300V, and the processing time is 30~50min; (3) Magnetron sputtering deposits graphite-like carbon film. During the deposition process, the vacuum chamber The bottom vacuum is 5×10-4Pa, the discharge pressure is 0.5Pa, the high-purity graphite target is the cathode, the target current is 1-1.2A, the bias voltage is 300-500V applied to the substrate, and the deposition time is 120-150min. Obtain high-hardness adaptive graphite-like carbon-based thin film materials.
CN2009101176908A 2009-12-09 2009-12-09 Adaptive graphite-like carbon-based film material for mechanical seal and preparation method thereof Pending CN102093081A (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104694893A (en) * 2013-12-04 2015-06-10 中国科学院宁波材料技术与工程研究所 Carbon-based antifriction wear resistant coat and production method thereof
CN108004500A (en) * 2017-12-08 2018-05-08 文晓斌 A kind of film for improving compressor sliding blade anti-friction wear-resistant and preparation method thereof
WO2019079800A1 (en) * 2017-10-20 2019-04-25 Research Foundation Of The City University Of New York Ultra-hard carbon film from epitaxial two-layer graphene
CN114231898A (en) * 2021-12-24 2022-03-25 中国电子科技集团公司第十四研究所 High-precision high-wear-resistance titanium alloy gear forming method
CN115141036A (en) * 2021-03-29 2022-10-04 翔名科技股份有限公司 Graphite assembly and method of making the same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104694893A (en) * 2013-12-04 2015-06-10 中国科学院宁波材料技术与工程研究所 Carbon-based antifriction wear resistant coat and production method thereof
WO2019079800A1 (en) * 2017-10-20 2019-04-25 Research Foundation Of The City University Of New York Ultra-hard carbon film from epitaxial two-layer graphene
US11591716B2 (en) 2017-10-20 2023-02-28 Research Foundation Of The City University Of New York Ultra-hard carbon film from epitaxial two-layer graphene
CN108004500A (en) * 2017-12-08 2018-05-08 文晓斌 A kind of film for improving compressor sliding blade anti-friction wear-resistant and preparation method thereof
CN115141036A (en) * 2021-03-29 2022-10-04 翔名科技股份有限公司 Graphite assembly and method of making the same
CN114231898A (en) * 2021-12-24 2022-03-25 中国电子科技集团公司第十四研究所 High-precision high-wear-resistance titanium alloy gear forming method

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