CN102081262A - Ultraviolet irradiation device - Google Patents
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- CN102081262A CN102081262A CN2010105556519A CN201010555651A CN102081262A CN 102081262 A CN102081262 A CN 102081262A CN 2010105556519 A CN2010105556519 A CN 2010105556519A CN 201010555651 A CN201010555651 A CN 201010555651A CN 102081262 A CN102081262 A CN 102081262A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Microscoopes, Condenser (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
- Planar Illumination Modules (AREA)
Abstract
Description
技术领域technical field
本发明涉及一种例如面向液晶面板的制造的对制造中的面板(被处理基板)照射紫外线的紫外线照射装置。The present invention relates to an ultraviolet irradiation device for irradiating an ultraviolet ray to a panel (substrate to be processed) under manufacture, for example, for the manufacture of a liquid crystal panel.
背景技术Background technique
在液晶面板的制造中,对内部封入有液晶体和具有光反应性的高分子体的被处理基板进行冷却,并从紫外线照射装置对其照射紫外线。紫外线照射装置中设置有抑制波长340nm以下的紫外线的透过的滤波器,通过经由该滤波器的紫外线照射,使被处理基板的内部的高分子体反应形成相对部(例如,参照JP2008-116672(KOKAI)。In the manufacture of liquid crystal panels, a substrate to be processed in which liquid crystals and photoreactive polymers are sealed is cooled and irradiated with ultraviolet rays from an ultraviolet irradiation device. The ultraviolet irradiation device is provided with a filter that suppresses the transmission of ultraviolet rays with a wavelength of 340nm or less, and through the ultraviolet irradiation through the filter, the polymer body inside the substrate to be processed is reacted to form an opposing portion (for example, refer to JP2008-116672 ( KOKAI).
在上述技术中,为了进行液晶面板的高品质制造,控制性良好地形成使液晶体在规定的方向定向的定向膜是非常重要的。虽然一般使用的是用布擦试膜的“摩擦法”,但是使用摩擦法时会存在尘埃落下、粘附污垢或者由于静电等导致被处理基板所具有的半导体元件破损等问题。In the above techniques, in order to manufacture high-quality liquid crystal panels, it is very important to form an alignment film that aligns liquid crystals in a predetermined direction with good controllability. Generally, the "rubbing method" of wiping the film with a cloth is used, but when using the rubbing method, there are problems such as falling dust, adhering dirt, or damaging semiconductor elements on the substrate to be processed due to static electricity.
因此,作为代替摩擦法的技术,采用的是在基板上形成光反应性物质,通过照射紫外线使光反应性物质化学反应以使其具有定向功能的技术。这时,会发生这样的问题:如果对液晶面板(被处理基板)照射的紫外线发生强度不均,就不能控制性良好地均匀地形成定向膜。Therefore, as a technique instead of the rubbing method, a technique of forming a photoreactive substance on a substrate and irradiating ultraviolet rays to chemically react the photoreactive substance so as to have an alignment function is employed. In this case, there is a problem that if the intensity of ultraviolet rays irradiated to the liquid crystal panel (substrate to be processed) varies, the alignment film cannot be formed uniformly with good controllability.
因此,作为使紫外线的强度不均减少的紫外线照射装置的实例,例如有JPH8-225992(KOKAI)、WO2006/094220、JPH6-260295(KOKAI)等所揭示的紫外线照射装置。这些装置为了改善强度不均,采用使紫外线向被处理基板的方向反射的反射板,而且在该文献中还记载着最好预先实施一定的加工以使得该反射表面具有光扩散性。但是,即使采用这些文献所记载的表面加工技术,在强度不均的减轻上还是有限度的,尤其是在液晶面板的制造用途上,还要求强度不均更小的紫外线照射装置。Therefore, examples of ultraviolet irradiation devices that reduce unevenness in the intensity of ultraviolet rays include those disclosed in JPH8-225992 (KOKAI), WO2006/094220, and JPH6-260295 (KOKAI). In order to improve the unevenness of intensity, these devices use reflective plates that reflect ultraviolet rays toward the substrate to be processed, and this document also describes that it is preferable to perform a certain process in advance so that the reflective surface has light diffusing properties. However, even with the surface processing techniques described in these documents, there is still a limit to the reduction of intensity unevenness, and especially for the production of liquid crystal panels, an ultraviolet irradiation device with less intensity unevenness is required.
发明内容Contents of the invention
本发明的目的在于提供一种能够对更大面积照射均一强度的紫外线的紫外线照射装置。An object of the present invention is to provide an ultraviolet irradiation device capable of irradiating a wider area with ultraviolet rays of uniform intensity.
为了解决上述课题,本发明的一实施形态的紫外线照射装置,其特征在于,包括:紫外线灯,其由具有紫外线透过性的材料形成为管状;和具有扩散反射面的反射板,所述反射板与所述紫外线灯相对配置,并形成为在与该紫外线灯的轴正交的平面上呈现的截面为抛物线形状,所述反射板的所述抛物线形状满足由以下第一条件和第二条件组成的两个条件中的至少一方,所述第一条件是最小曲率半径R为82mm以上且88mm以下,所述第二条件是开口宽度W为227mm以上且300mm以下。In order to solve the above-mentioned problems, an ultraviolet irradiation device according to an embodiment of the present invention is characterized in that it includes: an ultraviolet lamp formed in a tubular shape from a material having ultraviolet permeability; The plate is arranged opposite to the ultraviolet lamp, and is formed to have a parabolic cross-section on a plane perpendicular to the axis of the ultraviolet lamp, and the parabolic shape of the reflecting plate satisfies the following first condition and second condition At least one of the two conditions of the composition, the first condition is that the minimum curvature radius R is not less than 82 mm and not more than 88 mm, and the second condition is that the opening width W is not less than 227 mm and not more than 300 mm.
采用本发明,可以提供一种能够对更大面积照射均一强度的紫外线的紫外线照射装置。According to the present invention, it is possible to provide an ultraviolet irradiation device capable of irradiating a wider area with ultraviolet rays of uniform intensity.
附图说明Description of drawings
图1是示出本发明的一实施形态的紫外线照射装置的基本结构的纵向截面图。FIG. 1 is a longitudinal sectional view showing a basic structure of an ultraviolet irradiation device according to an embodiment of the present invention.
图2是图1中所示的A-Aa位置的箭头方向的纵向截面图。Fig. 2 is a longitudinal sectional view in the direction of the arrow at the position A-Aa shown in Fig. 1 .
图3是稍详细地表示图1中所示的紫外线灯的结构图。Fig. 3 is a configuration diagram showing the ultraviolet lamp shown in Fig. 1 in some detail.
图4是比较示出铁系金属卤化物灯和铊系金属卤化物灯的强度分光分布的图表。Fig. 4 is a graph comparing intensity spectral distributions of iron-based metal halide lamps and thallium-based metal halide lamps.
图5是说明图1中所示的反射板的反射面形状的一个实例的立体图。FIG. 5 is a perspective view illustrating an example of the shape of the reflection surface of the reflection plate shown in FIG. 1 .
图6是放大显示图5所示的反射板的由箭头A所指的区域表面的说明图。FIG. 6 is an explanatory view enlargedly showing the surface of the region indicated by arrow A of the reflection plate shown in FIG. 5 .
图7A、图7B是比较显示比较例的反射板和图5所示的反射板的紫外线反射形态的说明图。7A and 7B are explanatory diagrams showing comparatively the reflection form of ultraviolet rays of the reflection plate of the comparative example and the reflection plate shown in FIG. 5 .
图8是将图1所示的紫外线照射装置所照射的紫外线照射面的强度分布与比较例比较所示的图表。FIG. 8 is a graph comparing the intensity distribution of the ultraviolet irradiation surface irradiated by the ultraviolet irradiation device shown in FIG. 1 with a comparative example.
图9是进一步说明实施形态的紫外线照射装置中紫外线灯和反射板的位置关系的配置图(截面图示)。9 is an arrangement diagram (sectional view) further explaining the positional relationship between the ultraviolet lamp and the reflection plate in the ultraviolet irradiation device according to the embodiment.
图10是示出分别对使得实施形态的紫外线照射装置的反射板的最小曲率半径R以及开口宽度W变化时的紫外线照射面的强度的均匀度进行测定所得到的结果的表。10 is a table showing the results of measuring the uniformity of the intensity of the ultraviolet irradiation surface when the minimum curvature radius R and the opening width W of the reflection plate of the ultraviolet irradiation device according to the embodiment were changed.
图11是提取图10所示的表中反射板的开口宽度W为230mm时的情形而绘制的图表。FIG. 11 is a graph extracted from the table shown in FIG. 10 and drawn when the opening width W of the reflector is 230 mm.
图12是提取图10所示的表中反射板的最小曲率半径R为85mm时的情形而绘制的图表。FIG. 12 is a graph extracted from the table shown in FIG. 10 and drawn when the minimum radius of curvature R of the reflector is 85 mm.
图13是示出本发明的其他实施形态的紫外线照射装置的基本结构的纵向截面图。Fig. 13 is a longitudinal sectional view showing a basic structure of an ultraviolet irradiation device according to another embodiment of the present invention.
图14是图13中所示的B-Ba位置的箭头方向的纵向截面图。Fig. 14 is a longitudinal sectional view in the direction of the arrow at the position B-Ba shown in Fig. 13 .
图15是图14所示的纵向截面图的局部放大图。Fig. 15 is a partial enlarged view of the longitudinal sectional view shown in Fig. 14 .
图16是概略示出本发明的另一实施形态的紫外线照射装置的结构的纵向截面图。Fig. 16 is a longitudinal sectional view schematically showing the structure of an ultraviolet irradiation device according to another embodiment of the present invention.
符号说明Symbol Description
100 紫外线灯100 UV lamps
200、300 冷却单元200, 300 cooling unit
11 放电空间11 discharge space
12 发光管12 luminous tubes
13a、13b 电极13a, 13b Electrodes
14a、14b 内导线14a, 14b inner wire
15a、15b 金属箔15a, 15b metal foil
16a、16b 插座16a, 16b socket
17a、17b 导线17a, 17b wire
18 冷却块18 cooling blocks
181 冷却片181 cooling fins
19、94 反射板19, 94 reflector
21 灯罩21 lampshades
23 窗部23 window
24 短波长侧光截止滤光片24 Short wavelength side light cut filter
25、93 长波长侧光截止滤光片25, 93 Long wavelength side light cut filter
26 罩子26 cover
27 吸入口27 suction port
28 通气口28 Vents
29 排气筒29 exhaust pipe
30a、30b 供电线30a, 30b power supply line
61 反射面61 reflective surface
31 内管31 inner tube
32 外管32 outer tube
33a、33b 连接管33a, 33b Connecting pipe
34 冷却液。34 Coolant.
具体实施方式Detailed ways
(实施例的说明)(Description of Example)
本发明的实施例是参照附图来进行说明的,但提供这些附图只是出于图解的目的,无论如何它们都不是用来限定发明的。Embodiments of the present invention are described with reference to the accompanying drawings, but these drawings are provided for illustration purposes only and they are not intended to limit the invention in any way.
下面,参照附图对实施本发明的最佳形态进行详细说明。Hereinafter, the best mode for carrying out the present invention will be described in detail with reference to the accompanying drawings.
图1~图3是用来说明本发明的一实施形态的紫外线照射装置的图,图1是示出其基本结构的纵向截面图,图2是图1中所示的A-Aa位置的箭头方向的纵向截面图,图3是稍详细地表示图1中所示的紫外线灯的结构图。1 to 3 are diagrams for explaining an ultraviolet irradiation device according to an embodiment of the present invention, FIG. 1 is a longitudinal sectional view showing its basic structure, and FIG. 2 is an arrow at the position A-Aa shown in FIG. 1 A longitudinal cross-sectional view in the direction, Fig. 3 is a structural diagram showing the ultraviolet lamp shown in Fig. 1 in a little detail.
如图1、图2所示,该紫外线照射装置具有例如4根紫外线灯100和冷却单元200。As shown in FIGS. 1 and 2 , this ultraviolet irradiation device has, for example, four
如图3所示,紫外线灯100设有具有气密的放电空间11的发光管12,该发光管12由具有紫外线透过性的石英玻璃制成,并形成为管状。在该发光管12的轴方向两端的内部,配置有一对例如钨材的电极13a、13b。发光管12是例如外径φ为27.5mm、壁厚m为1.5mm、发光长L为1800mm左右的单层管。As shown in FIG. 3 , the
电极13a、13b分别通过内导线14a、14b焊接于金属箔15a、15b的一端。金属箔15a、15b的另一端焊接于图未示的外导线的一端。金属箔15a、15b的一部分用于对内导线14a、14b和外导线之间的发光管12进行加热并密封。
另外,金属箔15a、15b只要是与形成发光管12的石英玻璃的热膨胀率接近的材料,任何材料都可以,在此采用的是符合该条件的钼的薄板。一端分别与金属箔15a、15b连接的外导线的另一端,电连接有绝缘密封于例如陶瓷制的插座16a、16b内的供电用导线17a、17b,并且导线17a、17b与图未示的电源电路连接。In addition, the metal foils 15a and 15b may be made of any material as long as the coefficient of thermal expansion is close to that of the quartz glass forming the
在放电空间11内,除了用于维持电弧放电的充分的量的稀有气体之外、还封入有水银、卤素、以及从作为使紫外线发光用的金属的铁、锡、铟、铋、铊以及锰所组成的组中选择的至少一种。由此,可以使波长300~400nm的紫外线发光。另外,在技术上通常往往将波长380nm作为紫外光和可视光的边界,但由于本申请中表示的是一个连续波长区域,因此将其方便地表示为“波长300~400nm的紫外线”。In the
图4是比较显示封入所述发光金属中的铁的铁系金属卤化物灯和封入铊的铊系金属卤化物灯的强度分光分布的图表。从图4可知,利用这些灯,能够得到波长300~400nm的紫外线。Fig. 4 is a graph comparing intensity spectral distributions of an iron-based metal halide lamp in which iron is enclosed in the luminescent metal and a thallium-based metal halide lamp in which thallium is enclosed. As can be seen from FIG. 4 , these lamps can obtain ultraviolet rays having a wavelength of 300 to 400 nm.
再次参照图1、图2,符号18是由例如铝制成的冷却块。冷却块18的一面侧抵接有与紫外线灯100的上部半周面相对的反射板19,在另一面侧一体形成有多个冷却片181。反射板19将例如SUS(不锈钢)材、铝材等作为材质。Referring again to FIGS. 1 and 2 ,
另外,在反射板19的背面和冷却块18之间配置有热传导性高的构件(未图示),能将反射板19的热更容易地传递给冷却块18,由此可以实现更高效率的冷却。In addition, a member (not shown) with high thermal conductivity is arranged between the back surface of the
如图5所示,在该实施形态中,反射板19具有截面为例如Y=(1/170)·X2的函数形的反射面形状(截面为抛物线形状)。反射板19以一定间隔与紫外线灯100相对配置,其在与紫外线灯100的轴正交的平面呈现的截面为抛物线形状。又,其反射表面为具有扩散性的反射面。对其表面状态的一个实例进行说明的话,例如是图6所示的状态。图6是放大显示图5所示的反射板的由箭头A所指的区域表面的说明图。即,沿着表面的曲面组合细小的反射面61成为扩散入射光的状态的表面。由此,如图7B所示,入射到反射板19上的紫外线扩散反射。图7A、图7B是比较显示比较例的反射板和图5所示的反射板的紫外线反射形态的说明图。具有这样的扩散功能的反射面61的反射板19可以通过例如模具的冲压加工而形成。又,也能够通过表面的压纹加工获得。As shown in FIG. 5 , in this embodiment, the
在使用铝材作为反射板19的情况下,作为用于向该表面赋予紫外线扩散性的其他方法,可以采用以下这样的方法。作为其中之一,是将具有实施过一次镜面加工的表面的铝材作为基材,在该表面上实施锤纹加工或者粉饰加工,形成不规则的凹凸。或者,也可以不形成不规则的凹凸,而是形成例如蜂窝状等的按照规定的模式的表面结构。In the case of using an aluminum material as the
又,作为另一个实例的反射板19,也能够使用通过在玻璃表面形成多层金属氧化物的蒸镀层使其特别对紫外线具有扩散反射性的分色镜。又,作为另一个实例的反射板19,也能够使用使例如硫酸钡等具有紫外线反射性的物质以粗的粒径蒸镀或者粘附在玻璃表面或者金属表面上的反射板。Also, as another example of the reflecting
再次参照图1、图2,冷却片181起到易于对紫外线灯100所发生的热进行散热,使紫外线灯100的温度不上升到规定以上的作用。在冷却块18的下侧形成有可以收容紫外线灯100和反射板19的灯罩21。Referring to FIGS. 1 and 2 again, the cooling
如图1、图2所示,与紫外线灯100相对的灯罩21的壁上形成有使从紫外线灯100发射的紫外线通过的窗部23,在该窗部23上设置有截断例如波长320nm以下的紫外线的短波长侧光截止滤光片24,以及截断400nm以上的可视光以及红外线的长波长侧光截止滤光片25。As shown in Fig. 1 and Fig. 2, a
使紫外线灯100放电点亮时,波长320~400nm的紫外线透过短波长侧光截止滤光片24以及长波长侧光截止滤光片25对作为被照射物的液晶面板(被处理基板)进行照射。由此,产生由紫外线所导致的光反应性物质的化学反应,形成定向膜。When the
在冷却块18的上侧,沿着紫外线灯100的灯轴方向配置有覆盖冷却块18的罩子26作为冷却结构部的一部分。在罩子26的长度方向的一端形成有吸入口27,在另一端形成有通气口28。然后,安装筒状的排气筒29使其与通气口28连通。On the upper side of the
高频点亮装置500的高频输出端的一方经由供电线30a、导线17a等与紫外线灯100的一个电极13a连接,高频点亮装置300的高频输出端的另一方经由供电线30b、导线17b等与紫外线灯100的另一个电极13b连接。高频点亮装置500被施加电源时,高频电压被施加在电极13a和电极13b之间,由此可以使紫外线在放电空间11中产生。One of the high-frequency output ends of the high-
图8将图1所示的紫外线照射装置所照射的紫外线照射面的强度分布和比较例进行比较显示。在这里,图8的横轴“测定点”表示在与反射板19相对的平面上所取的与反射板19的长度方向正交的直线Z(参照图5)上的位置。FIG. 8 shows the intensity distribution of the ultraviolet irradiation surface irradiated by the ultraviolet irradiation device shown in FIG. 1 in comparison with a comparative example. Here, the horizontal axis "measuring point" in FIG. 8 represents a position on a straight line Z (see FIG. 5 ) perpendicular to the longitudinal direction of the
如图8所示,该实施形态与比较例相比较,由于反射板19的表面所具有的光扩散功能的作用,在测定点的全部区域都是平均的强度。As shown in FIG. 8 , compared with the comparative example, this embodiment has an average intensity in the entire area of the measurement point due to the effect of the light diffusion function of the surface of the
因此,该实施形态的紫外線照射装置能够对作为被照射物的液晶面板(被处理基板)照射均匀的紫外线,因此可以有助于提高液晶面板制造的成品率。Therefore, the ultraviolet irradiation device of this embodiment can irradiate uniform ultraviolet rays to a liquid crystal panel (substrate to be processed) as an object to be irradiated, and thus can contribute to improvement of the yield of liquid crystal panel manufacture.
接下来,图9是进一步说明实施形态的紫外线照射装置中紫外线灯100和反射板19的位置关系的配置图(截面图示)。下面,对紫外线灯100和反射板19的理想配置关系进行说明。Next, FIG. 9 is an arrangement diagram (cross-sectional view) for further explaining the positional relationship between the
如图9所示,反射板19以抛物线中心轴为中央对称地向两翼扩展,其两翼之间的间隔被定义为开口宽度W。另外,该反射板19在纸面垂直的方向上的各个截面都是相同的,因此抛物线中心被定义为向纸面垂直方向延长的抛物线中心轴。在与开口宽度W的方向正交的平面上投影的抛物线的图示上下方向的最大尺寸被定义为高度H。抛物线在抛物线中心显现最小曲率半径R。而且,一般在抛物线上定义焦点。焦点被定义为,包含相对于抛物线的中心的法线方向的光线的平行光入射到反射板19上时,该平行光的反射光聚光于一点的点。由于反射板19在纸面垂直的方向上的各个截面都是相同的,因此焦点能够被定义为向纸面垂直方向延长的焦点轴。紫外线灯100的发光管轴,如图所示,至少位于包含抛物线中心轴以及焦点轴的平面内,与这两个轴平行。As shown in FIG. 9 , the reflecting
图10是示出分别对使得实施形态的紫外线照射装置的反射板的最小曲率半径R以及开口宽度W变化时的紫外线照射面的强度的均匀度进行测定所得到的结果的表。所谓均匀度是指,以规定的计算式将紫外线照射面内的强度不均的程度数值化的值,数值[%]越低则均匀度越好,数值[%]越高则均匀度越差。此处,使用紫外线照射面内最大强度以及最小强度,通过计算式(最大强度-最小强度)/(最大强度+最小强度)求出均匀度。另外,在这里,反射板19采用的是其表面被压纹(emboss)加工过的反射板。10 is a table showing the results of measuring the uniformity of the intensity of the ultraviolet irradiation surface when the minimum curvature radius R and the opening width W of the reflection plate of the ultraviolet irradiation device according to the embodiment were changed. The so-called uniformity is a value obtained by quantifying the degree of intensity unevenness in the ultraviolet irradiated surface with a predetermined calculation formula. The lower the value [%], the better the uniformity, and the higher the value [%], the worse the uniformity . Here, using the maximum intensity and the minimum intensity in the ultraviolet irradiation plane, the uniformity was obtained by the calculation formula (maximum intensity-minimum intensity)/(maximum intensity+minimum intensity). In addition, here, as the
在该测定中,除了限定最小曲率半径R、开口宽度W之外,还将紫外线灯100放置在其中心轴距离抛物线中心轴55mm的位置。又,紫外线灯100的直径是70mm。另外,在抛物线的开口宽度W、最小曲率半径R被限定时,抛物线的高度H被唯一确定。In this measurement, in addition to defining the minimum radius of curvature R and opening width W, the
如图10所示,强度的均匀度在最小曲率半径R为85mm、开口宽度W为230mm时为最佳。因此,在此时的条件下,抛物线中心轴至焦点轴的距离为42.5mm,抛物线的高度H为80mm。由于抛物线中心轴至焦点轴的距离为42.5mm,因此紫外线灯100的中心轴配置在以下这样的位置,即从反射板19的抛物线中心轴看在离开反射板19的抛物线形状的焦点轴一侧,且位于反射板19的抛物线形状的高度内侧的位置。偏离该条件时,例如发光管轴相比焦点轴位于抛物线中心轴侧时,由于反射板19和灯100的距离很近,因此容易发生反射板19的热变形。由于该影响可能会导致均匀度恶化。又,在偏离至相反侧时,即发光管轴位于抛物线形状的高度外侧时,反射光容易被被灯100遮挡,光的利用效率下降,因此均匀度还是会变差。As shown in Figure 10, the uniformity of strength is optimal when the minimum curvature radius R is 85 mm and the opening width W is 230 mm. Therefore, under the conditions at this time, the distance from the central axis of the parabola to the focal axis is 42.5 mm, and the height H of the parabola is 80 mm. Since the distance from the central axis of the parabola to the focal axis is 42.5 mm, the central axis of the
图11是提取图10所示的表中反射板的开口宽度W为230mm时的情形而绘制的图表。图12是提取图10所示的表中反射板的最小曲率半径R为85mm时的情形而绘制的图表。在图12中,测定到W=300mm为止,这是因为装置的空间上的其他限制,不能再比该数值大了。FIG. 11 is a graph extracted from the table shown in FIG. 10 and drawn when the opening width W of the reflector is 230 mm. FIG. 12 is a graph extracted from the table shown in FIG. 10 and drawn when the minimum radius of curvature R of the reflector is 85 mm. In Fig. 12, it was measured until W = 300 mm, but it cannot be larger than this value because of other limitations on the space of the device.
从图10至图12可知,为了将强度的均匀度保持为接近极小,可以使其满足由抛物线的最小曲率半径R为82mm以上且88mm以下即第一条件和抛物线的开口宽度W为227mm以上且300mm以下即第二条件组成的两个条件中的至少一方。如果两个条件都满足的话,则尤其好。It can be seen from Fig. 10 to Fig. 12 that in order to keep the uniformity of the intensity close to the minimum, it can be satisfied that the minimum curvature radius R of the parabola is not less than 82 mm and not more than 88 mm, that is, the first condition and the opening width W of the parabola is not less than 227 mm. And less than 300mm is at least one of the two conditions composed of the second condition. Especially good if both conditions are met.
另外,在结果示于图10中的测定中,反射板19采用的是其表面被压纹加工的反射板,但为了进行比较,也得到了使用进行这样的压纹加工之前的具有镜面的反射板时的结果。其结果是,强度的均匀度整体上差了4%左右。因此,通过使得反射板19的反射面具有光扩散性,以及对反射板19的上述那样的抛物线的最小曲率半径R的值或者开口宽度W的值进行限定,可以得到均匀度特别好的反射板。In addition, in the measurement whose results are shown in FIG. 10, the reflecting
接下来,图13~图15是用来说明本发明的另一实施形态的紫外线照射装置的图,图13是示出其基本结构的纵向截面图,图14是图13中所示的B-Ba位置的箭头方向的纵向截面图,图15是图14所示的纵向截面图的局部放大图。在这些图中,对与已经说明的附图中所示的构成物相同的构成物标注相同的符号。Next, FIGS. 13 to 15 are diagrams for explaining another embodiment of the ultraviolet irradiation device of the present invention, FIG. 13 is a longitudinal sectional view showing its basic structure, and FIG. 14 is a B- A longitudinal sectional view in the direction of the arrow at the Ba position, and FIG. 15 is a partially enlarged view of the longitudinal sectional view shown in FIG. 14 . In these drawings, the same symbols are assigned to the same components as those shown in the drawings already described.
在该实施形态中,为了将紫外线灯100维持在规定温度(例如850℃)以下,其冷却方式采用的是水冷式。该实施形态与参照图1、图2说明的实施形态一样,也以具有例如四根紫外线灯100的结构为例进行如下说明。这四根紫外线灯100分别伴有各自的冷却单元300。In this embodiment, in order to maintain the
紫外线灯100和冷却单元300之间通过安装于紫外线灯100的插座16a、16b上的隔离件91a、91b保持规定的间隔。A predetermined distance is maintained between the
冷却单元300是具有圆筒状的由石英玻璃等具有紫外线透过性的材料构成的内管31和设在其外侧的外管32的双层管结构。紫外线灯100内包在内管31内。The
冷却单元300的内管31其内径d1例如为32mm,外径d2例如为36mm,外管32的内径d3例如为66mm,外径d4例如为70mm。The
冷却单元300中,通过设在其外周的两端部的连接管33a、33b从外部循环获得水等的冷却液34。即,从连接管33a侧供给温度低的冷却液34,由此冷却液34一边对紫外线灯100进行冷却一边移动,变热的冷却液34从连接管33被回收。变热并被回收了的冷却液34通过未图示的冷却装置冷却,再次被供给连接管33a侧。In the
在外管32的外表面分别形成有截止可视光以及红外线的长波长侧光截止滤光片93。也可以根据情况,重叠形成截止不必要的紫外线的短波长侧光截止滤光片92。On the outer surface of the
在冷却单元300的图示上侧,配置有具有反射面的反射板94,该反射面具有紫外线扩散性。反射板94例如是与参照图5、图6、图7(b)所说明的结构相同的结构。On the upper side of the
使紫外线灯100放电点亮时,波长320~400nm的紫外线透过长波长侧光截止滤光片93对作为被照射物的液晶面板(被处理基板)进行照射。由此,产生由紫外线所导致的光反应性物质的化学反应,形成定向膜。When the
波长320~400nm的紫外线除了从紫外线灯100直接照射在被照射物上之外,还通过被反射板94扩散反射达到被照射物。这样叠加的紫外线在被照射物上的强度如已经说明的那样,例如呈图8所示那样的均匀度好的分布。因此,通过适用于液晶面板制造过程,能够控制性良好地均匀地形成定向膜。Ultraviolet rays with a wavelength of 320 to 400 nm are not only directly irradiated from the
该实施形态的紫外線照射装置能够对作为被照射物的液晶面板(被处理基板)照射均匀的紫外线,因此可以有助于提高液晶面板制造的成品率。在该实施形态中,由于采用使用冷却液34的冷却单元300,因此冷却能力高,所以能够将紫外线灯100容易地保持在规定温度(例如850℃)以下,在例如装置寿命等的方面具有很大的优点。The ultraviolet ray irradiation device of this embodiment can irradiate uniform ultraviolet rays to a liquid crystal panel (substrate to be processed) as an object to be irradiated, and thus can contribute to improvement of the yield of liquid crystal panel manufacture. In this embodiment, since the
接下来,图16是概略示出本发明的另一实施形态的紫外线照射装置的结构的纵向截面图。在该图中,对与已经说明的附图中所示的构件相同或者相当于相同的构件标注相同的符号。只要没有应该添加的事项,就省略其说明。Next, FIG. 16 is a longitudinal sectional view schematically showing the structure of an ultraviolet irradiation device according to another embodiment of the present invention. In this figure, the same code|symbol is attached|subjected to the member which is the same as or equivalent to the member shown in the drawing already demonstrated. As long as there is no item that should be added, its description is omitted.
如图16所示,该紫外线照射装置在图示的横向平行地配置有八根紫外线灯400,各紫外线灯400分别伴有反射板410。在反射板410的相反侧的与紫外线灯400相对的位置上设有滤光片420。然后,紫外线灯400的隔着滤光片420的相反侧为载置被照射物的紫外线照射面。该照射面的图示横向宽度例如是1890mm,由此可以使用于大型的液晶面板的制造。As shown in FIG. 16 , in this ultraviolet irradiation device, eight
即便是这样的需要特别大的照射面的紫外线照射装置,也能够通过适用与上述实施形态所说明的技术相同的技术,照射均匀强度的紫外线。Even such an ultraviolet irradiation device requiring a particularly large irradiation surface can irradiate ultraviolet rays of uniform intensity by applying the same technique as that described in the above-mentioned embodiment.
以上说明的各实施形态的紫外线灯并不限于所说明的那样的长弧的金属卤化物灯,也可以是闪光灯、电介质阻挡放电灯、无电极灯等的紫外线灯。The ultraviolet lamps in each embodiment described above are not limited to the long-arc metal halide lamps described above, and may be ultraviolet lamps such as flash lamps, dielectric barrier discharge lamps, and electrodeless lamps.
本发明并不限于在此处图解并说明了的特定的形态、其包含了所有在权利要求书的范围内所作的任何变形。The present invention is not limited to the specific forms illustrated and described herein, and includes all modifications within the scope of the claims.
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CN201010555651.9A Expired - Fee Related CN102081262B (en) | 2009-11-13 | 2010-11-12 | Ultraviolet lamp |
Country Status (4)
Country | Link |
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JP (1) | JP2011107264A (en) |
KR (1) | KR20110053183A (en) |
CN (1) | CN102081262B (en) |
TW (1) | TW201131263A (en) |
Cited By (8)
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CN102289107A (en) * | 2011-07-01 | 2011-12-21 | 深圳市华星光电技术有限公司 | Device and method for making pretilt angle of liquid crystal panel |
CN103257481A (en) * | 2013-05-31 | 2013-08-21 | 深圳市华星光电技术有限公司 | Orientation ultraviolet ray liquid crystal irradiating device and water-cooling sleeve pipe |
WO2014029117A1 (en) * | 2012-08-20 | 2014-02-27 | 深圳市华星光电技术有限公司 | Liquid crystal alignment device |
CN105689227A (en) * | 2016-03-19 | 2016-06-22 | 广州市龙珠化工有限公司 | Coating line for rapid coating of rod-shaped appliance and coating process |
CN107228561A (en) * | 2016-03-25 | 2017-10-03 | 塞米西斯科株式会社 | Light sintering equipment |
CN108146065A (en) * | 2016-12-05 | 2018-06-12 | 塞米西斯科株式会社 | It is capable of the light sintering equipment of water cooling |
CN109844605A (en) * | 2016-06-29 | 2019-06-04 | 法雷奥舒适驾驶助手公司 | Video generation device and relevant head-up display including thermally contacting area |
CN114342042A (en) * | 2019-10-07 | 2022-04-12 | 优志旺电机株式会社 | Ultraviolet irradiation device |
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US9341951B2 (en) * | 2012-12-21 | 2016-05-17 | Ultratech, Inc. | Wynn-dyson imaging system with reduced thermal distortion |
JP6349208B2 (en) * | 2014-09-09 | 2018-06-27 | 東京応化工業株式会社 | Ultraviolet irradiation apparatus, ultraviolet irradiation method, substrate processing apparatus, and manufacturing method of substrate processing apparatus |
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CN87208844U (en) * | 1987-06-05 | 1988-03-30 | 赖克正 | Curved-surface-extending plane lamp chamber |
CN1831604A (en) * | 2005-09-07 | 2006-09-13 | 长兴化学工业股份有限公司 | Reflective sheet with high light diffusion |
JP2008116672A (en) * | 2006-11-02 | 2008-05-22 | Au Optronics Corp | Liquid crystal panel manufacturing apparatus and liquid crystal panel manufacturing method |
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Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102289107A (en) * | 2011-07-01 | 2011-12-21 | 深圳市华星光电技术有限公司 | Device and method for making pretilt angle of liquid crystal panel |
WO2013004053A1 (en) * | 2011-07-01 | 2013-01-10 | 深圳市华星光电技术有限公司 | Device, method, sample table and light source device for making pre-tilt angle of liquid crystal panel |
WO2014029117A1 (en) * | 2012-08-20 | 2014-02-27 | 深圳市华星光电技术有限公司 | Liquid crystal alignment device |
CN103257481A (en) * | 2013-05-31 | 2013-08-21 | 深圳市华星光电技术有限公司 | Orientation ultraviolet ray liquid crystal irradiating device and water-cooling sleeve pipe |
WO2014190586A1 (en) * | 2013-05-31 | 2014-12-04 | 深圳市华星光电技术有限公司 | Alignment ultraviolet liquid crystal illumination device, water-cooling sleeving |
CN103257481B (en) * | 2013-05-31 | 2015-09-30 | 深圳市华星光电技术有限公司 | Orientation ultraviolet liquid crystal irradiation unit, water cold sleeve |
CN105689227A (en) * | 2016-03-19 | 2016-06-22 | 广州市龙珠化工有限公司 | Coating line for rapid coating of rod-shaped appliance and coating process |
CN105689227B (en) * | 2016-03-19 | 2019-01-22 | 广州市龙珠化工有限公司 | A kind of rapidly coating paint line of rod-shaped utensil and coating process |
CN107228561A (en) * | 2016-03-25 | 2017-10-03 | 塞米西斯科株式会社 | Light sintering equipment |
CN107228561B (en) * | 2016-03-25 | 2019-11-19 | 塞米西斯科株式会社 | Light sintering equipment |
CN109844605A (en) * | 2016-06-29 | 2019-06-04 | 法雷奥舒适驾驶助手公司 | Video generation device and relevant head-up display including thermally contacting area |
CN108146065A (en) * | 2016-12-05 | 2018-06-12 | 塞米西斯科株式会社 | It is capable of the light sintering equipment of water cooling |
CN108146065B (en) * | 2016-12-05 | 2020-05-12 | 塞米西斯科株式会社 | Light sintering device capable of being cooled by water |
CN114342042A (en) * | 2019-10-07 | 2022-04-12 | 优志旺电机株式会社 | Ultraviolet irradiation device |
Also Published As
Publication number | Publication date |
---|---|
JP2011107264A (en) | 2011-06-02 |
CN102081262B (en) | 2015-09-09 |
TW201131263A (en) | 2011-09-16 |
KR20110053183A (en) | 2011-05-19 |
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