Summary of the invention
The objective of the invention is to, a kind of preparation method who improves the polymer efficiency of solar cell is provided, wherein be to adopt efficient cheap electron beam evaporation technique to prepare the negative electrode Al electrode of polymer solar cell, and, have characteristics such as cost is low, simple to operate, widely applicable, practical by the efficient that the preparation technology of control electrode improves solar cell.
The invention provides a kind of preparation method who improves the polymer efficiency of solar cell, electrode adopts the electron beam evaporation technique preparation, and the preparation method comprises the steps:
Step 1: on the glass layer, make the ITO layer, as the anode of solar cell;
Step 2: adopt the method for photoetching, ITO layer one side etched away, etching depth prevents that to the surface of glass layer ITO is communicated with the negative electrode of battery;
Step 3: on the glass layer that exposes and the ITO layer prepare one deck PEDOT:PSS layer, as the hole transmission layer of solar cell;
Step 4: the PEDOT:PSS layer above ITO layer one side is wiped, wiped the surface of the degree of depth to the ITO layer, make the ITO layer of exposure form table top, this table top is an anode, is connected with external circuit;
Step 5: on the PEDOT:PSS layer, prepare polymer/fullerene derivate blend film;
Step 6: preparation Al film on polymer/fullerene derivate blend film;
Step 7: preparation Al electrode on the Al film, this Al electrode is a negative electrode;
Step 8: annealing, with the polymer solar cell annealing that preparation is finished, finish the preparation of electrode.
Wherein annealing is to carry out thermal annealing in being full of the glove box of high pure nitrogen, and the water in the glove box and the content of oxygen are lower than 1ppm, and annealing temperature is 120-160 ℃, and annealing time is 5-15 minute.
The background vacuum pressure that wherein prepares the used electron beam evaporation system of Al film and Al electrode is 1-3 * 10
-4Pa, the line of electron gun are 80-120mA, and operating voltage is 8500-9500V.When wherein preparing the Al film, preparation temperature is 20-25 ℃, and deposition rate is
/ second.
Wherein the thickness of Al film is 50-120nm.
When wherein preparing the Al electrode, preparation temperature is 70-90 ℃, and deposition rate is
/ second.
Wherein the thickness of Al electrode is 80-150nm.
The present invention also provides a kind of preparation method who improves the polymer efficiency of solar cell, and electrode adopts the electron beam evaporation technique preparation, and the preparation method comprises the steps:
Step 1: on the glass layer, make the ITO layer, as the anode of solar cell;
Step 2: adopt the method for photoetching, ITO layer one side etched away, etching depth prevents that to the surface of glass layer ITO is communicated with the negative electrode of battery;
Step 3: on the glass layer that exposes and the ITO layer prepare one deck PEDOT:PSS layer, as the hole transmission layer of solar cell;
Step 4: the PEDOT:PSS layer above ITO layer one side is wiped, wiped the surface of the degree of depth to the ITO layer, make the ITO layer of exposure form table top, this table top is an anode, is connected with external circuit;
Step 5: on the PEDOT:PSS layer, prepare polymer/fullerene derivate blend film;
Step 6: preparation Al electrode on polymer/fullerene derivate blend film, this Al electrode is a negative electrode;
Step 7: annealing, with the polymer solar cell annealing that preparation is finished, finish the preparation of electrode.
Wherein annealing is to carry out thermal annealing in being full of the glove box of high pure nitrogen, and the water in the glove box and the content of oxygen are lower than 1ppm, and annealing temperature is 120-160 ℃, and annealing time is 5-15 minute.
The background vacuum pressure that wherein prepares the used electron beam evaporation system of Al electrode is 1-3 * 10
-4Pa, the line of electron gun are 80-120mA, and operating voltage is 8500-9500V.
When wherein preparing the Al electrode, preparation temperature is 70-90 ℃, and deposition rate is
/ second.
Wherein the thickness of Al electrode is 80-150nm.
Embodiment
See also Figure 1A, the invention provides a kind of preparation method who improves the polymer efficiency of solar cell, electrode adopts the electron beam evaporation technique preparation, and the preparation method comprises the steps:
Step 1: make ITO layer 20 on glass layer 10, as the anode of polymer solar cell, the square resistance of ITO layer 20 is the 7-15 ohms/square;
Step 2: adopt the method for photoetching, ITO layer 20 1 side are etched away, etching depth prevents that to the surface of glass layer 10 ITO is communicated with the negative electrode of battery;
Step 3: on the glass layer 10 that exposes and ITO layer 20 preparation one deck PEDOT:PSS layer 30, as the hole transmission layer of polymer solar cell, the thickness of PEDOT:PSS layer 30 is 20~40 nanometers;
Step 4: the PEDOT:PSS layer 30 above ITO layer 20 1 side is wiped, wiped the surface of the degree of depth to ITO layer 20, make the ITO layer 20 of exposure form table top 21, this table top is the anode of polymer solar cell, is used for being connected with external circuit;
Step 5: on PEDOT:PSS layer 30, prepare semi-conductive polymer/fullerene derivate blend film 40, as the photosensitive layer of battery;
Step 6:
preparation Al film 50 on semi-conductive polymer/fullerene
derivate blend film 40, when wherein preparing
Al film 50, preparation temperature is 20-25 ℃, deposition rate is
/ second, the thickness of this
Al film 50 is 50-120nm;
Step 7:
preparation Al electrode 60 on
Al film 50, this
Al electrode 60 is the negative electrode of polymer solar cell, and when wherein preparing
Al electrode 60, preparation temperature is 70-90 ℃, and deposition rate is
/ second, the thickness of this
Al electrode 60 is 80-150nm;
The background vacuum pressure that wherein prepares the used electron beam evaporation system of Al film 50 and Al electrode 60 is 2 * 10
-4Pa, the line of electron gun are 80-120mA, and operating voltage is 8500-9500V;
Step 8: annealing, with the polymer solar cell annealing that preparation is finished, finish the preparation of electrode, described annealing is to carry out thermal annealing in being full of the glove box of high pure nitrogen, the water in the glove box and the content of oxygen are lower than 1ppm, and annealing temperature is 120-160 ℃, and annealing time is 5-15 minute.
Specific embodiment
Example 1: consult shown in Figure 1A, make
ITO layer 20 on
glass layer 10, the square resistance of
ITO layer 20 is 15 ohms/square.Adopt the method for photoetching,
ITO layer 20 1 side are etched away, etching depth is to the surface of glass layer 10.On the
glass layer 10 that exposes and
ITO layer 20 preparation one deck PEDOT:
PSS layer 30, the thickness of PEDOT:
PSS layer 30 is 30 nanometers.PEDOT:
PSS layer 30 above
ITO layer 20 1 side is wiped, wiped the surface of the degree of depth, make the
ITO layer 20 of exposure
form table top 21 to ITO layer 20.Spin coating P3HT/
PCBM blend film 40 on PEDOT:
PSS layer 30, the mass ratio of P3HT and PCBM is 1: 1, thickness is 100 nanometers.Adopt electron beam evaporation system depositing
Al film 50 on P3HT/
PCBM blend film 40, the background vacuum pressure of electron beam evaporation system is 2 * 10
-4Pa, the line of electron gun are 100mA, and operating voltage is 9000V, underlayer temperature T
1Be 25 ℃, deposition rate is
/ second, the thickness of
Al film 50 is 50nm.Adopt electron beam evaporation system depositing
Al electrode 60 on
Al membrane electrode 50 then, the background vacuum pressure of electron beam evaporation system is 2 * 10
-4Pa, the line of electron gun are 100mA, and operating voltage is 9000V, and underlayer temperature is 80 ℃, and deposition rate is for being
/ second, the thickness of
Al film 60 is 100nm.Be full of high-purity N
2Glove box in, battery is carried out thermal annealing, annealing temperature is 150 ℃, annealing time is 10 minutes.At the big sunlight of standard (AM 1.5G, a 100mW/cm
2) following open circuit voltage 0.68V, the short-circuit current density 8.97mA/cm that records battery of irradiation
2, fill factor, curve factor 0.45, energy conversion efficiency be 2.7%.
Example 2: consult shown in Figure 1B, make
ITO layer 20 on
glass layer 10, the square resistance of
ITO layer 20 is 15 ohms/square.Adopt the method for photoetching,
ITO layer 20 1 side are etched away, etching depth is to the surface of glass layer 10.On the
glass layer 10 that exposes and
ITO layer 20 preparation one deck PEDOT:
PSS layer 30, the thickness of PEDOT:
PSS layer 30 is 30 nanometers.PEDOT:
PSS layer 30 above
ITO layer 20 1 side is wiped, wiped the surface of the degree of depth, make the
ITO layer 20 of exposure
form table top 21 to ITO layer 20.Spin coating P3HT/
PCBM blend film 40 on PEDOT:
PSS layer 30, the mass ratio of P3HT and PCBM is 1: 1, thickness is 100 nanometers.Adopt thermal evaporation system depositing Al electrode 50 ' on P3HT/
PCBM blend film 40, the background vacuum pressure of thermal evaporation system is 2 * 10
-4Pa, underlayer temperature T are 25 ℃, and deposition rate V is
/ second, the thickness d of Al electrode 50 ' is 150 nanometers.In the glove box that is full of high-purity N 2, battery is carried out thermal annealing, annealing temperature is 150 ℃, annealing time is 10 minutes.At the big sunlight of standard (AM 1.5G, a 100mW/cm
2) following open circuit voltage 0.66V, the short-circuit current density 6.62mA/cm that records battery of irradiation
2, fill factor, curve factor 0.56, energy conversion efficiency be 2.5%.
Wherein the difference of first embodiment and second embodiment is, this second embodiment only lacks one deck Al film 50 of growing than first embodiment.
Growth result
As shown in Figure 2, adopt method of the present invention, adopt electron beam evaporation technique to prepare the negative electrode Al electrode of polymers of excellent properties solar cell, promptly earlier at 25 ℃ of Al films that deposit 50nm, then at the Al of 80 ℃ of deposit 100nm electrode, annealing is after 10 minutes down at 150 ℃ for battery, and the efficient of polymer solar cell brings up to 2.77% than the efficient height of the battery of routine techniques preparation from 2.46%.
Invention is compared the significative results that is had with background technology
Utilize electron beam evaporation technique, adopt the two-step method depositing operation, successfully prepared the negative electrode Al electrode of polymers of excellent properties solar cell.The Al film of deposition and the good adhesion of organic film can not chap behind high annealing.In addition, utilize electron beam evaporation to adopt the two-step method depositing operation to prepare the cathode electrode of polymer battery, the efficient of battery will be higher than the battery of conventional thermal evaporation prepared.Therefore, cleaning, utilization rate of raw materials height, controllability and the good electron beam evaporation process of stable type can be applied in the metal electrode preparation of large tracts of land polymer solar cell, for the industrialization that realizes cheap organic photovoltaic is laid a good foundation.
The above; only be the embodiment among the present invention, but protection scope of the present invention is not limited thereto, anyly is familiar with the people of this technology in the disclosed technical scope of the present invention; the conversion that can expect easily or replacement all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection range of claims.