[go: up one dir, main page]

CN102026807A - Method for protection of surface of material to be processed, and temporary fixing method - Google Patents

Method for protection of surface of material to be processed, and temporary fixing method Download PDF

Info

Publication number
CN102026807A
CN102026807A CN2009801171461A CN200980117146A CN102026807A CN 102026807 A CN102026807 A CN 102026807A CN 2009801171461 A CN2009801171461 A CN 2009801171461A CN 200980117146 A CN200980117146 A CN 200980117146A CN 102026807 A CN102026807 A CN 102026807A
Authority
CN
China
Prior art keywords
meth
acrylate
workpiece
protective film
curable composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN2009801171461A
Other languages
Chinese (zh)
Other versions
CN102026807B (en
Inventor
中岛刚介
南云贵之
大岛和宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Publication of CN102026807A publication Critical patent/CN102026807A/en
Application granted granted Critical
Publication of CN102026807B publication Critical patent/CN102026807B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C63/00Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
    • B29C63/0017Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor characterised by the choice of the material
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04Homopolymers or copolymers of esters
    • C09D133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/062Copolymers with monomers not covered by C09D133/06
    • C09D133/066Copolymers with monomers not covered by C09D133/06 containing -OH groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C63/00Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
    • B29C63/0065Heat treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2312/00Crosslinking
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laminated Bodies (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

本发明提供即使进行切割等加工,保护膜也不脱落的表面保护方法。在被加工件的表面层合保护膜的被加工件的表面保护方法,其特征在于,具有以下工序:在被加工件的表面层合由固化体构成的保护膜的层合工序,该固化体由含有(A)多官能(甲基)丙烯酸酯、(B)单官能(甲基)丙烯酸酯和(C)光聚合引发剂的固化性组合物形成;在层合工序后在80~150℃进行加热处理的加热工序;以及加热工序后对被加工件进行加工的加工工序。此外,上述保护膜优选含有(D)具有环戊二烯骨架的树脂。The present invention provides a surface protection method in which a protective film does not come off even when processing such as cutting is performed. The method for protecting the surface of a workpiece by laminating a protective film on the surface of the workpiece is characterized in that it includes the following steps: a lamination step of laminating a protective film made of a cured body on the surface of the workpiece, the cured body Formed from a curable composition containing (A) polyfunctional (meth)acrylate, (B) monofunctional (meth)acrylate, and (C) photopolymerization initiator; A heating step of performing heat treatment; and a processing step of processing a workpiece after the heating step. Moreover, it is preferable that the said protective film contains (D) resin which has a cyclopentadiene skeleton.

Description

被加工件的表面保护方法和临时固定方法 Surface protection method and temporary fixing method of workpiece

技术领域technical field

本发明涉及加工各种材料时该被加工件的表面保护方法和临时固定方法。更具体地说,本发明提出对光学用构件、半导体晶片等进行加工时,通过在被加工件的表面设置由固化性组合物形成的保护膜(以下也有时称为固化体),以保护不加工的部分免受加工时的异物附着、损伤等为目的的被加工件的表面保护方法。此外,本发明还提出被加工件的临时固定方法,其特征在于,通过将该被加工件与基材粘合,将被加工件加工后,将粘合部分浸渍于温水中,将上述保护膜取下,从而回收被加工件。The present invention relates to a surface protection method and a temporary fixing method of the workpiece when processing various materials. More specifically, when the present invention proposes to process optical members, semiconductor wafers, etc., a protective film (hereinafter also sometimes referred to as a cured body) formed by a curable composition is provided on the surface of the workpiece to protect the surface of the workpiece. The method of protecting the surface of the workpiece for the purpose of preventing the processed part from adhesion and damage of foreign matter during processing. In addition, the present invention also proposes a method for temporarily fixing a workpiece, which is characterized in that, by bonding the workpiece to a base material, after the workpiece is processed, the bonded part is immersed in warm water, and the above-mentioned protective film Take it off to recover the workpiece.

背景技术Background technique

在金属板、模具、铝框、塑料板、半导体晶片、电路基板、陶瓷、玻璃、石英等工学部件和传感器等电子、电气部件的加工,特别是切割、研削、研磨等精密加工等时,为了防止对该被加工件的已加工面、电路、传感器部位等的损伤、异物附着,广泛使用了暂时将部件保护的表面保护膜。作为该表面保护膜,主要使用了压敏粘合性片。In the processing of metal plates, molds, aluminum frames, plastic plates, semiconductor wafers, circuit boards, ceramics, glass, quartz and other engineering components and electronic and electrical components such as sensors, especially precision processing such as cutting, grinding, grinding, etc., for To prevent damage to the machined surface of the workpiece, circuits, sensor parts, etc., and foreign matter from adhering, surface protection films are widely used to temporarily protect parts. As the surface protection film, a pressure-sensitive adhesive sheet is mainly used.

例如,进行半导体晶片、光学部件等的薄型化时,采用所谓背面研削方法进行加工。所谓背面研削方法,是用表面保护片保护晶片的电路面、光学部件的非加工面,同时通过上述表面保护片将该等部件临时固定于基板,对与电路面相反侧的背面进行研削的方法。For example, when thinning semiconductor wafers, optical components, etc., processing is performed by a so-called back grinding method. The so-called back grinding method is to protect the circuit surface of the wafer and the non-processed surface of the optical component with a surface protection sheet, temporarily fix these components to the substrate through the surface protection sheet, and grind the back surface opposite to the circuit surface .

但是,现在使用的压敏粘合性的表面保护片在对于半导体晶片的电路的凹凸的追随性上存在极限。因此,由在晶片和表面保护层之间进入研削液等产生的污染常常成为问题。此外,将半导体晶片切割(Dicing)时,对于典型的半导体表面保护片,不能追随以凸点为代表的100μm以上的突起,存在产生污染、碎屑飞散的问题。However, the currently used pressure-sensitive adhesive surface protection sheet has a limit in followability to the unevenness of the circuit of the semiconductor wafer. Therefore, contamination by grinding fluid and the like entering between the wafer and the surface protective layer often becomes a problem. In addition, when a semiconductor wafer is diced, a typical semiconductor surface protection sheet cannot follow a protrusion of 100 μm or more typified by a bump, and there is a problem of contamination and scattering of debris.

以往的表面保护片一般是在聚合物膜材料上具有粘接剂层作为表面保护层的片,为了追随电路面的凹凸,将粘接剂设计为具有低弹性模量。但是,如果弹性模量过低,将片从晶片剥离除去时对晶片施加大的应力,导致晶片的破损。Conventional surface protection sheets generally have an adhesive layer on a polymer film material as a surface protection layer, and the adhesive is designed to have a low modulus of elasticity in order to follow the unevenness of the circuit surface. However, if the elastic modulus is too low, a large stress is applied to the wafer when the sheet is peeled and removed from the wafer, resulting in breakage of the wafer.

因此,开发了将片剥离前通过照射紫外线等能量线而使粘接剂固化,使晶片-保护片间的粘合力降低的能量线易剥离型保护片。但是,研削期间粘接剂层为未固化的状态,存在因过于柔软,晶片在研削中破损的问题。Therefore, an energy ray easily peelable protective sheet has been developed in which the adhesive is cured by irradiating energy rays such as ultraviolet rays before the sheet is peeled off, thereby reducing the adhesive force between the wafer and the protective sheet. However, the adhesive bond layer is in an uncured state during grinding, and there is a problem that the wafer is broken during grinding because it is too soft.

专利文献1公开了如下的晶片研削方法:将上述的能量线易剥离型保护片粘贴于形成有电路的晶片,用能量线将粘接剂层固化后,进行晶片的背面研削。但是,由于粘接剂不是流体,因此对于晶片电路面的凹凸的追随性不足。Patent Document 1 discloses a wafer grinding method in which the above-mentioned energy ray easily peelable protective sheet is attached to a wafer on which a circuit is formed, the adhesive layer is cured by energy ray, and then the back surface of the wafer is ground. However, since the adhesive is not a fluid, it does not have sufficient followability to irregularities on the circuit surface of the wafer.

另一方面,专利文献2中,公开了热熔型的半导体表面保护片。通过加热到60~100℃而熔融并显示流动性的热熔型片,能够追随电路面的凹凸,显示优异的研削性。但是,该片存在温度每次超过熔点时均会熔融的性质。On the other hand, Patent Document 2 discloses a hot-melt type semiconductor surface protection sheet. A hot-melt sheet that melts by heating at 60 to 100°C and exhibits fluidity can follow the unevenness of the circuit surface and exhibit excellent grindability. However, this sheet has a property of melting every time the temperature exceeds the melting point.

为了解决上述问题,本发明人提出了一种含有包含特定的(甲基)丙烯酸单体的树脂的树脂组合物,该树脂组合物不仅对光学部件的电路面的凹凸具有充分的的追随性,而且作为研削时的支持体也具有足够的刚性(参照专利文献3和4)。上述树脂组合物对于背面研削时的表面保护有效。但是,表面保护时,要求表面完全固化的树脂组合物。这是因为,如果表面研削-切割时的表面保护时受到由氧引起的阻聚,有时表面不能完全固化。In order to solve the above-mentioned problems, the present inventors proposed a resin composition containing a resin containing a specific (meth)acrylic monomer, which not only has sufficient followability to the unevenness of the circuit surface of the optical component, In addition, it has sufficient rigidity as a support during grinding (see Patent Documents 3 and 4). The above resin composition is effective for surface protection during back grinding. However, for surface protection, a resin composition that has completely cured the surface is required. This is because the surface may not be completely cured if polymerization inhibition by oxygen is received during the surface protection during grinding and dicing.

另一方面,与表面保护片不同地,研究了在加工物表面涂布溶解于特定有机溶剂的紫外线固化型粘合剂,使其紫外线固化而被覆,保护表面免受加工时的切削屑等的方法。但是,由于使用有机溶剂,洗涤处理工序繁杂,作业环境方面存在问题,而且在存在微细的凹凸时,有机溶剂不能充分浸透,不能完全将保护膜除去,因此产生了该被加工物的外观上的问题。On the other hand, different from the surface protection sheet, it is studied to apply an ultraviolet-curable adhesive dissolved in a specific organic solvent on the surface of the processed object, and to make it UV-cured and coated to protect the surface from cutting chips during processing. method. However, due to the use of organic solvents, the cleaning process is complicated, and there are problems in the working environment. In addition, when there are fine unevenness, the organic solvent cannot penetrate sufficiently, and the protective film cannot be completely removed, so the appearance of the workpiece occurs. question.

作为对于晶片、光学部件等的电路面的凹凸的追随性充分并且作为研削时的支持体具有足够刚性的组合物,提出了以(甲基)丙烯酸单体和含有环戊二烯骨架的树脂为成分的树脂组合物(参照专利文献5)。As a composition that has sufficient followability to irregularities on the circuit surface of wafers, optical components, etc., and has sufficient rigidity as a support during grinding, a (meth)acrylic monomer and a resin containing a cyclopentadiene skeleton have been proposed. component resin composition (see Patent Document 5).

现有技术文献prior art literature

专利文献patent documents

专利文献1:日本特开平11-026406号公报Patent Document 1: Japanese Patent Application Laid-Open No. 11-026406

专利文献2:日本特开2000-038556号公报Patent Document 2: Japanese Unexamined Patent Publication No. 2000-038556

专利文献3:国际公开WO2007/004620小册子Patent Document 3: International Publication WO2007/004620 Pamphlet

专利文献4:国际公开WO2006/100788小册子Patent Document 4: International Publication WO2006/100788 Pamphlet

专利文献5:日本特开2007-186587号公报Patent Document 5: Japanese Patent Laid-Open No. 2007-186587

发明内容Contents of the invention

但是,上述专利文献5中,对于使用上述树脂组合物在被加工件的表面设置保护膜,并且设置在80~150℃进行加热处理的加热工序没有记载。而且也没有记载设置了加热工序时,即使进行切割在加工时保护膜也不脱落。However, in the above-mentioned Patent Document 5, there is no description of a heating step in which a protective film is provided on the surface of the workpiece using the above-mentioned resin composition, and the heating process is performed at 80 to 150°C. Also, there is no description that when a heating step is provided, the protective film does not fall off during processing even if cutting is performed.

本发明人为了解决上述问题进行了深入研究,结果发现在被加工件的表面设置了由上述固化性组合物形成的保护膜后,进行保护膜的加热处理,然后进行被加工件的加工,在加工时保护膜不脱落的情况下能够保护上述被加工件的表面,从而完成了本发明。The inventors of the present invention have carried out intensive studies in order to solve the above-mentioned problems. As a result, they have found that after the protective film formed of the above-mentioned curable composition is provided on the surface of the workpiece, heat treatment of the protective film is performed, and then the workpiece is processed. The present invention has been accomplished by being able to protect the surface of the above workpiece without peeling off the protective film during processing.

即,本发明涉及被加工件的表面保护方法,其特征在于:在被加工件的表面设置由固化性组合物形成的保护膜的被加工件的表面保护方法中,在被加工件的表面层合保护膜后,经过对保护膜进行加热处理的工序,然后进行被加工件的加工。That is, the present invention relates to a method for protecting the surface of a workpiece, characterized in that in the method for protecting the surface of a workpiece in which a protective film formed of a curable composition is provided on the surface of the workpiece, the surface layer of the workpiece After the protective film is combined, the process of heating the protective film is carried out, and then the workpiece is processed.

此外,本发明涉及被加工件的临时固定方法,其特征在于:在被加工件的表面设置由固化性组合物形成的保护膜,进行加热处理后,进行被加工件的加工,然后浸渍于90℃以下的温水将由上述固化性组合物形成的保护膜从上述被加工件取下。In addition, the present invention relates to a method for temporarily fixing a workpiece, which is characterized in that a protective film formed of a curable composition is provided on the surface of the workpiece, and after heat treatment, the workpiece is processed, and then dipped in 90 The protective film formed from the above-mentioned curable composition is removed from the above-mentioned workpiece with warm water below °C.

具体地,本发明如下所述。Specifically, the present invention is as follows.

本发明涉及在被加工件的表面层合保护膜的被加工件的表面保护方法,其特征在于,具有以下工序:在被加工件的表面层合由固化体构成的保护膜的层合工序,该固化体由含有下述(A)、(B)和(C)的固化性组合物形成;在层合工序后在80~150℃进行加热处理的加热工序;以及在加热工序后对被加工件进行加工的加工工序。The present invention relates to a method for protecting the surface of a workpiece in which a protective film is laminated on the surface of the workpiece, characterized in that it comprises the following steps: a lamination step of laminating a protective film made of a cured body on the surface of the workpiece, The cured body is formed from a curable composition containing the following (A), (B) and (C); a heating step of performing a heat treatment at 80 to 150° C. after the lamination step; The processing procedure for processing parts.

(A)多官能(甲基)丙烯酸酯(A) Multifunctional (meth)acrylate

(B)单官能(甲基)丙烯酸酯(B) Monofunctional (meth)acrylate

(C)光聚合引发剂(C) Photopolymerization initiator

此外,涉及第1项所述的被加工件的表面保护方法,其中,上述保护膜含有(D)具有环戊二烯骨架的树脂。Moreover, it is related with the surface protection method of the workpiece of Claim 1 in which the said protective film contains (D) resin which has a cyclopentadiene skeleton.

此外,涉及该被加工件的表面保护方法,其中,上述(D)具有环戊二烯骨架的树脂在分子内含有酯基或羟基。Moreover, it is related with the surface protection method of this workpiece, wherein said (D) resin which has a cyclopentadiene skeleton contains an ester group or a hydroxyl group in a molecule|numerator.

此外,涉及该被加工件的表面保护方法,其中,上述(A)多官能(甲基)丙烯酸酯和上述(B)单官能(甲基)丙烯酸酯均为疏水性。Moreover, it is related with the surface protection method of this to-be-processed object in which all of said (A) polyfunctional (meth)acrylate and said (B) monofunctional (meth)acrylate are hydrophobic.

此外,涉及该被加工件的表面保护方法,其中,上述固化性组合物在(A)和(B)的合计量100质量份中,含有5~50质量份(A)多官能(甲基)丙烯酸酯和50~95质量份(B)单官能(甲基)丙烯酸酯,相对于(A)和(B)的合计量100质量份,含有0.1~20质量份(C)光聚合引发剂和0.1~50质量份(D)具有环戊二烯骨架的树脂。Moreover, it is related with the surface protection method of this workpiece|work, wherein said curable composition contains 5-50 mass parts of (A) polyfunctional (methyl) Acrylate and 50 to 95 parts by mass of (B) monofunctional (meth)acrylate, relative to the total amount of (A) and (B) 100 parts by mass, containing 0.1 to 20 parts by mass of (C) photopolymerization initiator and 0.1-50 mass parts (D) Resin which has a cyclopentadiene frame|skeleton.

此外,涉及在被加工件的表面层合保护膜的被加工件的临时固定方法,其特征在于,具有以下工序:在被加工件的表面层合由固化体构成的保护膜的层合工序,该固化体由含有下述(A)、(B)和(C)的固化性组合物形成;在层合工序后在80~150℃进行加热处理的加热工序;在加热工序后进行被加工件的加工的加工工序;以及在加工工序后将被加工件浸渍于90℃以下的温水中,将上述保护膜从上述被加工件取下的取下工序。In addition, it relates to a method for temporarily fixing a workpiece in which a protective film is laminated on the surface of the workpiece, and is characterized in that it includes the following steps: a lamination step of laminating a protective film made of a cured body on the surface of the workpiece, The cured body is formed from a curable composition containing the following (A), (B) and (C); after the lamination process, a heating process of heat treatment at 80 to 150 ° C is performed; after the heating process, the workpiece is processed The processing step of processing; and the removal step of immersing the workpiece in warm water of 90° C. or lower after the processing step, and removing the protective film from the workpiece.

(A)多官能(甲基)丙烯酸酯(A) Multifunctional (meth)acrylate

(B)单官能(甲基)丙烯酸酯(B) Monofunctional (meth)acrylate

(C)光聚合引发剂(C) Photopolymerization initiator

本发明的被加工件的表面保护方法获得即使进行切割等加工,保护膜也不脱落的效果,能够防止对被加工件的已加工面、电路、传感器部位等的损伤、异物附着。The method for protecting the surface of a workpiece according to the present invention achieves the effect that the protective film does not fall off even when processing such as cutting is performed, and can prevent damage and adhesion of foreign matter to the processed surface of the workpiece, circuits, sensor parts, and the like.

具体实施方式Detailed ways

本发明涉及被加工件的表面保护方法,其特征在于:在被加工件的表面设置由固化性组合物形成的保护膜后,将保护膜在80~150℃进行加热处理,然后进行被加工件的加工,从而防止加工时的保护膜的脱落。The invention relates to a method for protecting the surface of a workpiece, which is characterized in that: after the surface of the workpiece is provided with a protective film formed of a curable composition, the protective film is heated at 80 to 150°C, and then the workpiece is processed. processing, so as to prevent the peeling off of the protective film during processing.

从保持保护膜的剥离性的观点出发,加热处理的温度优选80~150℃,更优选90~120℃。如果为80℃以上,能够获得加热处理产生的效果,如果为150℃以下,剥离性良好。From the viewpoint of maintaining the peelability of the protective film, the temperature of the heat treatment is preferably 80 to 150°C, more preferably 90 to 120°C. If it is 80° C. or higher, the effect of the heat treatment can be obtained, and if it is 150° C. or lower, the releasability is good.

本发明中作为保护膜使用的固化性组合物,在获得上述发明的效果方面,优选含有(A)多官能(甲基)丙烯酸酯、(B)单官能(甲基)丙烯酸酯、(C)光聚合引发剂和(D)含有环戊二烯骨架的树脂。The curable composition used as a protective film in the present invention preferably contains (A) polyfunctional (meth)acrylate, (B) monofunctional (meth)acrylate, (C) A photopolymerization initiator and (D) a cyclopentadiene skeleton-containing resin.

作为上述固化性组合物中使用的(A)多官能(甲基)丙烯酸酯,可以使用具有2个以上(甲基)丙烯酰基的多官能(甲基)丙烯酸酯低聚物/聚合物/单体。例如,作为多官能(甲基)丙烯酸酯低聚物/聚合物,可以列举1,2-聚丁二烯末端氨基甲酸酯(甲基)丙烯酸酯(例如,日本曹达公司制、“TE-2000”、“TEA-1000”)、上述的氢化物(例如,日本曹达公司制、“TEAI-1000”)、1,4-聚丁二烯末端氨基甲酸酯(甲基)丙烯酸酯(例如,大阪有机化学公司制、“BAC-45”)、聚异戊二烯末端(甲基)丙烯酸酯、聚氨酯丙烯酸酯(例如,日本合成公司制“UV-7000B”)、聚酯系氨基甲酸酯(甲基)丙烯酸酯(例如,日本合成公司制、“UV-3000B”)、聚醚系氨基甲酸酯(甲基)丙烯酸酯、聚酯(甲基)丙烯酸酯、双酚A型环氧(甲基)丙烯酸酯(例如,大阪有机化学公司制、“Biscoat#540”、昭和高分子公司制、“Biscoat VR-77”)等。这些中,在剥离性的效果大的方面,优选选自1,2-聚丁二烯末端氨基甲酸酯(甲基)丙烯酸酯、聚氨酯丙烯酸酯低聚物和聚酯系氨基甲酸酯丙烯酸酯低聚物中的1种或2种以上,更优选1,2-聚丁二烯末端氨基甲酸酯(甲基)丙烯酸酯。As the (A) polyfunctional (meth)acrylate used in the above-mentioned curable composition, polyfunctional (meth)acrylate oligomers/polymers/units having two or more (meth)acryloyl groups can be used. body. For example, as a multifunctional (meth)acrylate oligomer/polymer, 1,2-polybutadiene-terminated urethane (meth)acrylate (for example, manufactured by Nippon Soda Corporation, "TE -2000", "TEA-1000"), the above-mentioned hydrides (for example, "TEAI-1000" manufactured by Nippon Soda Co., Ltd.), 1,4-polybutadiene terminal urethane (meth)acrylate (e.g., "BAC-45" manufactured by Osaka Organic Chemicals Co., Ltd.), polyisoprene-terminated (meth)acrylate, urethane acrylate (e.g., "UV-7000B" manufactured by Nippon Gosei Co., Ltd.), polyester-based amino Formate (meth)acrylate (for example, "UV-3000B" manufactured by Nippon Gosei Co., Ltd.), polyether-based urethane (meth)acrylate, polyester (meth)acrylate, bisphenol A epoxy (meth)acrylate (for example, "Biscoat #540" manufactured by Osaka Organic Chemical Co., Ltd., "Biscoat VR-77" manufactured by Showa High Molecular Co., Ltd.), and the like. Among these, it is preferable to select from the group consisting of 1,2-polybutadiene-terminated urethane (meth)acrylate, urethane acrylate oligomer, and polyester-based urethane acrylic acid in that the effect of releasability is large. One or more of ester oligomers, more preferably 1,2-polybutadiene-terminated urethane (meth)acrylate.

此外,作为2官能(甲基)丙烯酸酯单体,可以列举二(甲基)丙烯酸1,3-丁二醇酯、二(甲基)丙烯酸1,4-丁二醇酯、二(甲基)丙烯酸1,6-己二醇酯、二(甲基)丙烯酸1,9-壬二醇酯、二(甲基)丙烯酸新戊二醇酯、二(甲基)丙烯酸二环戊烷基(dicyclopentanyl)酯、2-乙基-2-丁基-丙二醇(甲基)丙烯酸酯、新戊二醇改性三羟甲基丙烷二(甲基)丙烯酸酯、硬脂酸改性季戊四醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、2,2-双(4-(甲基)丙烯酰氧基二乙氧基苯基)丙烷、2,2-双(4-(甲基)丙烯酰氧基丙氧基苯基)丙烷、2,2-双(4-(甲基)丙烯酰氧基四乙氧基苯基)丙烷等。In addition, examples of bifunctional (meth)acrylate monomers include 1,3-butylene glycol di(meth)acrylate, 1,4-butylene glycol di(meth)acrylate, di(meth)acrylate ) 1,6-hexanediol acrylate, 1,9-nonanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, dicyclopentyl di(meth)acrylate ( dicyclopentanyl) ester, 2-ethyl-2-butyl-propylene glycol (meth)acrylate, neopentyl glycol modified trimethylolpropane di(meth)acrylate, stearic acid modified pentaerythritol di(meth)acrylate base) acrylate, polypropylene glycol di(meth)acrylate, 2,2-bis(4-(meth)acryloyloxydiethoxyphenyl)propane, 2,2-bis(4-(meth) base) acryloyloxypropoxyphenyl)propane, 2,2-bis(4-(meth)acryloyloxytetraethoxyphenyl)propane, etc.

作为3官能(甲基)丙烯酸酯单体,可以列举三羟甲基丙烷三(甲基)丙烯酸酯、三[(甲基)丙烯酰氧基乙基]异氰脲酸酯等。Examples of the trifunctional (meth)acrylate monomer include trimethylolpropane tri(meth)acrylate, tris[(meth)acryloyloxyethyl]isocyanurate, and the like.

作为4官能以上的(甲基)丙烯酸酯单体,可以列举二羟甲基丙烷四(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、季戊四醇乙氧基四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯等。Examples of the (meth)acrylate monomer having four or more functions include dimethylolpropane tetra(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol ethoxy tetra(meth)acrylate, Dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and the like.

这些中,在剥离性的效果大的方面,优选二(甲基)丙烯酸二环戊烷基酯和/或二(甲基)丙烯酸1,6-己二醇酯,更优选二(甲基)丙烯酸二环戊烷基酯。Among these, dicyclopentyl di(meth)acrylate and/or 1,6-hexanediol di(meth)acrylate are preferable, and di(methyl) Dicyclopentyl acrylate.

在(A)多官能(甲基)丙烯酸酯中,在剥离性的效果大的方面,优选将具有2个以上的(甲基)丙烯酰基的多官能(甲基)丙烯酸酯低聚物/聚合物和2官能(甲基)丙烯酸酯单体并用。具有2个以上的(甲基)丙烯酰基的多官能(甲基)丙烯酸酯低聚物/聚合物和2官能(甲基)丙烯酸酯单体的混合比例(质量比),在剥离性的效果大的方面,优选30~100∶70~0,更优选50~65∶50~35。Among the (A) polyfunctional (meth)acrylates, it is preferable to polymerize/polymerize polyfunctional (meth)acrylate oligomers and and 2-functional (meth)acrylate monomers are used together. The effect of the mixing ratio (mass ratio) of a polyfunctional (meth)acrylate oligomer/polymer having two or more (meth)acryloyl groups and a bifunctional (meth)acrylate monomer on peelability On a larger scale, it is preferably 30-100:70-0, more preferably 50-65:50-35.

本发明中使用的(A)多官能(甲基)丙烯酸酯,更优选为疏水性。疏水性的情况下,能够防止水溶性的情况下常常发生的现象,即加工时固化性组合物的固化体溶胀而引起位置偏离,加工精度差的现象。其中,所谓疏水性的多官能(甲基)丙烯酸酯,是指不具有羟基的(甲基)丙烯酸酯。例如,可以列举上述的多官能(甲基)丙烯酸酯等。其中,优选选自1,2-聚丁二烯末端氨基甲酸酯(甲基)丙烯酸酯、二(甲基)丙烯酸1,6-己二醇酯和二(甲基)丙烯酸二环戊烷基酯中的1种或2种以上。即使是亲水性,如果其固化性组合物的固化体不由于水而大幅度溶胀或一部分溶解,也可使用。The (A) polyfunctional (meth)acrylate used in the present invention is more preferably hydrophobic. In the case of hydrophobicity, it is possible to prevent the phenomenon that often occurs in the case of water-solubility, that is, the phenomenon that the cured body of the curable composition swells during processing to cause positional displacement and poor processing accuracy. Here, the hydrophobic polyfunctional (meth)acrylate means the (meth)acrylate which does not have a hydroxyl group. For example, the above-mentioned polyfunctional (meth)acrylate etc. are mentioned. Among them, preferably selected from 1,2-polybutadiene-terminated urethane (meth)acrylate, 1,6-hexanediol di(meth)acrylate and dicyclopentane di(meth)acrylate One or two or more of base esters. Even if it is hydrophilic, it can be used as long as the cured body of the curable composition is not greatly swollen or partially dissolved by water.

(A)多官能(甲基)丙烯酸酯的使用量,在(A)和后述的(B)单官能(甲基)丙烯酸酯成分的合计量100质量份中,优选5~50质量份,更优选20~40质量份。如果为5质量份以上,能够防止剥离性降低、或固化性组合物的固化体不成为膜状,如果为50质量份以上,不会担心固化收缩变大,初期的粘合性降低。(A) The usage-amount of a polyfunctional (meth)acrylate is preferably 5-50 mass parts in 100 mass parts of total amounts of (A) and the (B) monofunctional (meth)acrylate component mentioned later, More preferably, it is 20-40 mass parts. If it is 5 parts by mass or more, it is possible to prevent a decrease in peelability or to prevent the cured body of the curable composition from becoming a film, and if it is 50 parts by mass or more, there is no fear that the curing shrinkage will increase and the initial adhesiveness will decrease.

作为上述固化性组合物中使用的(B)单官能(甲基)丙烯酸酯单体,可以列举(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸异辛酯、(甲基)丙烯酸异癸酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸硬脂酯、(甲基)丙烯酸苯酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸环己酯、(甲基)丙烯酸二环戊烷基酯、(甲基)丙烯酸二环戊烯基酯、(甲基)丙烯酸二环戊烯氧基乙酯、(甲基)丙烯酸异冰片酯、甲氧基化环癸三烯(甲基)丙烯酸酯、(甲基)丙烯酸2-羟基乙酯、(甲基)丙烯酸2-羟基丙酯、(甲基)丙烯酸3-羟基丙酯、(甲基)丙烯酸4-羟基丁酯、(甲基)丙烯酸四氢糠酯、(甲基)丙烯酸2-羟基-3-苯氧基丙酯、(甲基)丙烯酸缩水甘油酯、ω-羧基-聚己内酯单(甲基)丙烯酸酯、己内酯改性(甲基)丙烯酸四氢糠酯、(甲基)丙烯酸3-氯-2-羟基丙酯、(甲基)丙烯酸N,N-二甲基氨基乙酯、(甲基)丙烯酸N,N-二乙基氨基乙酯、(甲基)丙烯酸叔丁基氨基乙酯、(甲基)丙烯酸乙氧基羰基甲酯、苯酚环氧乙烷改性(甲基)丙烯酸酯、苯酚(环氧乙烷2摩尔改性)(甲基)丙烯酸酯、苯酚(环氧乙烷4摩尔改性)(甲基)丙烯酸酯、对枯基苯酚环氧乙烷改性(甲基)丙烯酸酯、壬基苯酚环氧乙烷改性(甲基)丙烯酸酯、壬基苯酚(环氧乙烷4摩尔改性)(甲基)丙烯酸酯、壬基苯酚(环氧乙烷8摩尔改性)(甲基)丙烯酸酯、壬基苯酚(环氧丙烷2.5摩尔改性)(甲基)丙烯酸酯、2-乙基己基卡必醇(甲基)丙烯酸酯、环氧乙烷改性邻苯二甲酸(甲基)丙烯酸酯、环氧乙烷改性琥珀酸(甲基)丙烯酸酯、(甲基)丙烯酸三氟乙酯、丙烯酸、甲基丙烯酸、马来酸、富马酸、ω-羧基-聚己内酯单(甲基)丙烯酸酯、邻苯二甲酸单羟基乙基(甲基)丙烯酸酯、(甲基)丙烯酸二聚体、β-(甲基)丙烯酰氧基乙基氢化琥珀酸酯、正-(甲基)丙烯酰氧基烷基六氢邻苯二甲酰亚胺、2-(1,2-环己烷二羧基酰亚胺)乙基(甲基)丙烯酸酯等。Examples of (B) monofunctional (meth)acrylate monomers used in the curable composition include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, ( Butyl methacrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, isodecyl (meth)acrylate, lauryl (meth)acrylate, (meth)acrylic acid Stearyl ester, phenyl (meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, dicyclopentyl (meth)acrylate, dicyclopentene (meth)acrylate Dicyclopentenyloxyethyl (meth)acrylate, Isobornyl (meth)acrylate, Methoxylated cyclodecatriene (meth)acrylate, 2-Hydroxyethyl (meth)acrylate ester, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, tetrahydrofurfuryl (meth)acrylate, (meth)acrylic acid 2-Hydroxy-3-phenoxypropyl ester, glycidyl (meth)acrylate, ω-carboxy-polycaprolactone mono(meth)acrylate, caprolactone-modified tetrahydrofurfuryl (meth)acrylate Ester, 3-chloro-2-hydroxypropyl (meth)acrylate, N,N-dimethylaminoethyl (meth)acrylate, N,N-diethylaminoethyl (meth)acrylate, ( tert-butylaminoethyl methacrylate, ethoxycarbonylmethyl (meth)acrylate, phenol ethylene oxide modified (meth)acrylate, phenol (ethylene oxide 2 mole modified) (methyl) base) acrylate, phenol (ethylene oxide 4 mole modified) (meth)acrylate, p-cumylphenol ethylene oxide modified (meth)acrylate, nonylphenol ethylene oxide modified ( Meth)acrylate, nonylphenol (modified by 4 moles of ethylene oxide) (meth)acrylate, nonylphenol (modified by 8 moles of ethylene oxide) (meth)acrylate, nonylphenol ( Propylene oxide 2.5 mole modification) (meth)acrylate, 2-ethylhexyl carbitol (meth)acrylate, ethylene oxide modified phthalate (meth)acrylate, ethylene oxide Alkyl-modified succinic acid (meth)acrylate, trifluoroethyl (meth)acrylate, acrylic acid, methacrylic acid, maleic acid, fumaric acid, ω-carboxy-polycaprolactone mono(meth)acrylic acid ester, monohydroxyethyl (meth)acrylate phthalate, (meth)acrylic acid dimer, β-(meth)acryloyloxyethyl hydrosuccinate, n-(meth)acrylic acid Acyloxyalkylhexahydrophthalimide, 2-(1,2-cyclohexanedicarboxyimide)ethyl(meth)acrylate, and the like.

这些中,在剥离性的效果大的方面,优选选自2-(1,2-环己烷二羧基酰亚胺)乙基(甲基)丙烯酸酯、苯酚环氧乙烷2摩尔改性(甲基)丙烯酸酯、(甲基)丙烯酸二环戊烯氧基乙酯、(甲基)丙烯酸苄酯、ω-羧基-聚己内酯单(甲基)丙烯酸酯和(甲基)丙烯酸2-羟基-3-苯氧基丙酯中的1种或2种以上,更优选2-(1,2-环己烷二羧基酰亚胺)乙基(甲基)丙烯酸酯和/或苯酚环氧乙烷2摩尔改性(甲基)丙烯酸酯。苯酚环氧乙烷2摩尔改性(甲基)丙烯酸酯与2-(1,2-环己烷二羧基酰亚胺)乙基(甲基)丙烯酸酯的混合比例(质量比),在剥离性的效果大的方面,优选20~70∶80~30,更优选30~45∶70~55。Among these, it is preferable to select from 2-(1,2-cyclohexanedicarboxyimide) ethyl (meth)acrylate, phenol oxirane 2 mole modified ( Meth)acrylate, dicyclopentenyloxyethyl (meth)acrylate, benzyl (meth)acrylate, ω-carboxy-polycaprolactone mono(meth)acrylate and (meth)acrylic acid2 - One or more of hydroxy-3-phenoxypropyl esters, more preferably 2-(1,2-cyclohexanedicarboxyimide) ethyl (meth)acrylate and/or phenol ring Oxyethane 2 mole modified (meth)acrylate. The mixing ratio (mass ratio) of 2 moles of phenol oxirane modified (meth)acrylate and 2-(1,2-cyclohexanedicarboximide) ethyl (meth)acrylate, in stripping In terms of the large effect of sex, it is preferably 20-70:80-30, more preferably 30-45:70-55.

(B)单官能(甲基)丙烯酸酯优选与(A)成分同样地为疏水性。It is preferable that (B) monofunctional (meth)acrylate is hydrophobic similarly to (A) component.

其中,所谓疏水性,是指不具有羟基的(甲基)丙烯酸酯。疏水性的情况下,能够防止水溶性的情况下常常发生的现象,即加工时固化性组合物的固化体溶胀而引起位置偏离,加工精度差的现象。即使是亲水性,如果其固化性组合物的固化体不由于水而大幅度溶胀或一部分溶解,也可使用。Here, hydrophobicity means (meth)acrylate which does not have a hydroxyl group. In the case of hydrophobicity, it is possible to prevent the phenomenon that often occurs in the case of water-solubility, that is, the phenomenon that the cured body of the curable composition swells during processing to cause positional displacement and poor processing accuracy. Even if it is hydrophilic, it can be used as long as the cured body of the curable composition is not greatly swollen or partially dissolved by water.

(B)单官能(甲基)丙烯酸酯的使用量,在(A)成分和(B)成分的合计量100质量份中,优选50~95质量份,更优选60~80质量份。如果为50质量份以上,不会担心初期的粘合性降低,如果为95质量份以下,剥离性不会降低,能够以膜状得到固化性组合物的固化体。(B) The usage-amount of a monofunctional (meth)acrylate is 50-95 mass parts in 100 mass parts of total amounts of (A) component and (B) component, More preferably, it is 60-80 mass parts. If it is 50 parts by mass or more, there is no fear of a decrease in initial adhesiveness, and if it is 95 parts by mass or less, a cured body of the curable composition can be obtained in a film form without a decrease in releasability.

此外,上述组成的(A)成分和(B)成分中,通过进一步并用(甲基)丙烯酰氧乙基酸式磷酸酯、二丁基2-(甲基)丙烯酰氧乙基酸式磷酸酯、二辛基2-(甲基)丙烯酰氧乙基磷酸酯、二苯基2-(甲基)丙烯酰氧乙基磷酸酯、(甲基)丙烯酰氧乙基聚乙二醇酸式磷酸酯等具有乙烯基或(甲基)丙烯酰基的磷酸酯,能够使与金属面的密合性进一步提高。In addition, by further using (meth)acryloyloxyethyl acid phosphoric acid ester and dibutyl 2-(meth)acryloyloxyethyl acid phosphoric acid in combination with (A) component and (B) component of the above-mentioned composition, Dioctyl 2-(meth)acryloyloxyethyl phosphate, Diphenyl 2-(meth)acryloyloxyethyl phosphate, (meth)acryloyloxyethyl polyethylene glycol Phosphate esters having a vinyl group or a (meth)acryloyl group such as formula phosphate ester can further improve the adhesion to the metal surface.

上述固化性组合物中使用的(C)光聚合引发剂用于利用可见光线、紫外线的活性光线使其增感而促进固化性组合物的光固化,可以使用公知的各种光聚合引发剂。具体地,可以列举二苯甲酮及其衍生物、苯偶酰及其衍生物、蒽醌及其衍生物、苯偶姻、苯偶姻甲醚、苯偶姻乙醚、苯偶姻丙醚、苯偶姻异丁醚、苯偶酰二甲基缩酮等苯偶姻衍生物、二乙氧基苯乙酮、4-叔丁基三氯苯乙酮等苯乙酮衍生物、苯甲酸2-二甲基氨基乙酯、苯甲酸对-二甲基氨基乙酯、二苯基二硫醚、噻吨酮及其衍生物、樟脑醌、7,7-二甲基-2,3-二氧代双环[2.2.1]庚烷-1-羧酸、7,7-二甲基-2,3-二氧代双环[2.2.1]庚烷-1-羧基-2-溴乙酯、7,7-二甲基-2,3-二氧代双环[2.2.1]庚烷-1-羧基-2-甲酯、7,7-二甲基-2,3-二氧代双环[2.2.1]庚烷-1-羧酰氯等樟脑醌衍生物、2-甲基-1-[4-(甲硫基)苯基]-2-吗啉代丙烷-1-酮、2-苄基-2-二甲基氨基-1-(4-吗啉代苯基)-丁酮-1等α-氨基烷基苯酮衍生物、苯甲酰基二苯基氧化膦、2,4,6-三甲基苯甲酰基二苯基氧化膦、苯甲酰基二乙氧基氧化膦、2,4,6-三甲基苯甲酰基二甲氧基苯基氧化膦、2,4,6-三甲基苯甲酰基二乙氧基苯基氧化膦等酰基氧化膦衍生物等。(C)光聚合引发剂可以使用其中的1种或者将2种以上组合使用。The photopolymerization initiator (C) used in the above-mentioned curable composition is used to sensitize it with active rays such as visible rays and ultraviolet rays to accelerate photocuring of the curable composition, and various known photopolymerization initiators can be used. Specifically, benzophenone and its derivatives, benzil and its derivatives, anthraquinone and its derivatives, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, Benzoin derivatives such as benzoin isobutyl ether and benzil dimethyl ketal, acetophenone derivatives such as diethoxyacetophenone and 4-tert-butyltrichloroacetophenone, benzoic acid 2 -Dimethylaminoethyl ester, p-dimethylaminoethyl benzoate, diphenyl disulfide, thioxanthone and its derivatives, camphorquinone, 7,7-dimethyl-2,3-di Oxobicyclo[2.2.1]heptane-1-carboxylic acid, 7,7-dimethyl-2,3-dioxobicyclo[2.2.1]heptane-1-carboxy-2-bromoethyl ester, 7,7-Dimethyl-2,3-dioxobicyclo[2.2.1]heptane-1-carboxy-2-methyl ester, 7,7-dimethyl-2,3-dioxobicyclo[ 2.2.1] Camphorquinone derivatives such as heptane-1-carboxylic acid chloride, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzyl Base-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1 and other α-aminoalkylphenone derivatives, benzoyldiphenylphosphine oxide, 2,4,6 -Trimethylbenzoyldiphenylphosphine oxide, benzoyldiethoxyphosphine oxide, 2,4,6-trimethylbenzoyldimethoxyphenylphosphine oxide, 2,4,6- Acylphosphine oxide derivatives such as trimethylbenzoyldiethoxyphenylphosphine oxide and the like. (C) The photoinitiator can use these 1 type or in combination of 2 or more types.

(C)光聚合引发剂的使用量,相对于(A)成分和(B)成分的合计量100质量份,优选0.1~20质量份,更优选3~10质量份。如果为0.1质量份以上,能可靠地获得促进固化的效果,如果为20质量份以下,能够实现充分的固化速度。作为更优选的形态,通过使用3质量份以上的(C)成分,能够不依赖于光照射量而固化。(C) The usage-amount of a photoinitiator is preferably 0.1-20 mass parts with respect to 100 mass parts of total amounts of (A) component and (B) component, More preferably, it is 3-10 mass parts. When it is 0.1 mass part or more, the effect of accelerating hardening can be acquired reliably, and when it is 20 mass parts or less, sufficient hardening rate can be realizable. As a more preferable aspect, by using 3 mass parts or more of (C)component, it can harden|cure independently of light irradiation amount.

本发明中使用的(D)具有环戊二烯骨架的树脂,只要是具有环戊二烯骨架的树脂,可以是任何树脂,但软化点优选50~200℃,在(A)成分、(B)成分中的溶解性方面,更优选数均分子量(Mn)为300~600的树脂。软化点的测定按照JIS K 2207环球式。数均分子量的测定按照GPC(凝胶渗透色谱法)聚苯乙烯换算值。作为(D),可以列举以从C5馏分中提取的环戊二烯为主原料制造的石油树脂,具体地,可以列举日本瑞翁公司制的“Quintone 1700”、“Quintone 1500”、“Quintone 1325”等。其中,在粘合性方面,优选含有羟基。作为含有羟基的树脂,可以列举“Quintone 1700”等。The (D) resin having a cyclopentadiene skeleton used in the present invention may be any resin as long as it is a resin having a cyclopentadiene skeleton, but the softening point is preferably 50 to 200°C. In terms of solubility in the ) component, resins having a number average molecular weight (Mn) of 300 to 600 are more preferable. The softening point was measured in accordance with JIS K 2207 ring and ball method. The measurement of the number average molecular weight is based on GPC (gel permeation chromatography) polystyrene conversion value. Examples of (D) include petroleum resins produced from cyclopentadiene extracted from C5 fractions as the main raw material, specifically, "Quintone 1700", "Quintone 1500", "Quintone 1325" manufactured by Japan Zeon Corporation, etc. "wait. Among them, it is preferable to contain a hydroxyl group in terms of adhesiveness. "Quintone 1700" etc. are mentioned as a resin containing a hydroxyl group.

(D)具有环戊二烯骨架的树脂的使用量,相对于(A)成分和(B)成分的合计量100质量份,优选0.5~50质量份,更优选5~30质量份。如果为0.5质量份以上,不会没有形成膜而以糊的形式残留,如果为50质量份以下,粘合性不会降低。(D) The usage-amount of the resin which has a cyclopentadiene skeleton is preferably 0.5-50 mass parts with respect to 100 mass parts of total amounts of (A) component and (B) component, More preferably, it is 5-30 mass parts. If it is 0.5 mass parts or more, it will not remain as a paste without forming a film, and if it is 50 mass parts or less, adhesiveness will not fall.

本发明的固化性组合物,为了提高其贮藏稳定性,可以使用少量的阻聚剂。例如,作为阻聚剂,可以列举甲基氢醌、氢醌、2,2-亚甲基-双(4-甲基-6-叔丁基苯酚)、儿茶酚、氢醌单甲醚、单叔丁基氢醌、2,5-二叔丁基氢醌、对苯醌、2,5-二苯基-对-苯醌、2,5-二叔丁基-对苯醌、苦味酸、柠檬酸、吩噻嗪、叔丁基儿茶酚、2-丁基-4-羟基茴香醚和2,6-二叔丁基-对-甲酚等。In order to improve the storage stability of the curable composition of this invention, a small amount of polymerization inhibitor can be used. For example, as a polymerization inhibitor, methylhydroquinone, hydroquinone, 2,2-methylene-bis(4-methyl-6-tert-butylphenol), catechol, hydroquinone monomethyl ether, Mono-tert-butyl hydroquinone, 2,5-di-tert-butyl hydroquinone, p-benzoquinone, 2,5-diphenyl-p-benzoquinone, 2,5-di-tert-butyl-p-benzoquinone, picric acid, citric acid, Phenothiazine, tert-butyl catechol, 2-butyl-4-hydroxyanisole and 2,6-di-tert-butyl-p-cresol, etc.

这些中,优选选自2,2-亚甲基-双(4-甲基-6-叔丁基苯酚)、氢醌单甲醚和对苯醌中的1种或2种以上,更优选2,2-亚甲基-双(4-甲基-6-叔丁基苯酚)。Among these, one or more selected from 2,2-methylene-bis(4-methyl-6-tert-butylphenol), hydroquinone monomethyl ether and p-benzoquinone is preferred, more preferably 2 , 2-methylene-bis(4-methyl-6-tert-butylphenol).

这些阻聚剂的使用量,相对于(A)成分和(B)成分的合计量100质量份,优选0.001~3质量份,更优选0.01~2质量份。如果为0.001质量份以上,贮存稳定性充分,如果为3质量份以下,能够获得可靠的粘合性,不必担心未固化。The usage-amount of these polymerization inhibitors is preferably 0.001-3 mass parts with respect to 100 mass parts of total amounts of (A) component and (B) component, More preferably, it is 0.01-2 mass parts. When it is 0.001 mass part or more, storage stability is sufficient, and when it is 3 mass parts or less, reliable adhesiveness can be acquired, and there is no need to worry about uncured.

本发明中使用的固化性组合物,在不损害本发明的目的的范围内,可以使用一般使用的丙烯酸橡胶、聚氨酯橡胶、丙烯腈-丁二烯-苯乙烯橡胶等各种弹性体,无机填料、溶剂、增量材料、增强材料、增塑剂、增粘剂、染料、颜料、阻燃剂、硅烷偶联剂和表面活性剂等添加剂。As the curable composition used in the present invention, various elastomers such as acrylic rubber, urethane rubber, acrylonitrile-butadiene-styrene rubber, and inorganic fillers that are generally used can be used within the range that does not impair the purpose of the present invention. , solvents, extenders, reinforcing materials, plasticizers, tackifiers, dyes, pigments, flame retardants, silane coupling agents and surfactants and other additives.

本发明涉及被加工件的表面保护方法,其特征在于,在被加工件的表面设置由上述固化性组合物形成的保护膜,对保护膜进行加热处理后,进行被加工件的加工,从而防止加工时的保护膜的脱落,保护被加工件的表面。The present invention relates to a method for protecting the surface of a workpiece, which is characterized in that a protective film formed of the above-mentioned curable composition is provided on the surface of the workpiece, and after the protective film is heat-treated, the workpiece is processed to prevent The peeling of the protective film during processing protects the surface of the workpiece.

作为在被加工件的表面层合保护膜的层合工序,优选在被加工件的表面涂布厚20~200μm、优选50~150μm的固化性组合物而设置保护膜,在波长365nm、累积光量1000~4000mJ/cm2、优选1500~3000mJ/cm2的条件下固化的工序。As a lamination step of laminating a protective film on the surface of the workpiece, it is preferable to apply a curable composition with a thickness of 20 to 200 μm, preferably 50 to 150 μm, on the surface of the workpiece to form a protective film. A step of curing under the conditions of 1000 to 4000 mJ/cm 2 , preferably 1500 to 3000 mJ/cm 2 .

作为层合工序后进行加热处理的加热工序,优选如下工序:在80~150℃、优选80~120℃下将保护膜加热处理5~30分钟。As the heating step of performing heat treatment after the lamination step, a step of heat-treating the protective film at 80 to 150° C., preferably 80 to 120° C., for 5 to 30 minutes is preferable.

作为加热工序后加工被加工件的加工工序,优选如下工序:在转数5000~40000rpm、优选10000~35000rpm、输送速度0.2~50mm/sec、优选0.5~30mm/sec、切片尺寸0.5~15mm见方的条件下进行切割。As the processing step of processing the workpiece after the heating step, the following step is preferable: at a rotation speed of 5,000 to 40,000 rpm, preferably 10,000 to 35,000 rpm, a conveying speed of 0.2 to 50 mm/sec, preferably 0.5 to 30 mm/sec, and a slice size of 0.5 to 15 mm square conditions for cutting.

此外,本发明涉及被加工件的临时固定方法,其特征在于,在被加工件的表面设置由固化性组合物形成的保护膜,进行加热处理后,进行被加工件的加工,然后,具有浸渍于70~90℃以下的温水、优选75~85℃的温水中,从上述被加工件取下由上述固化性组合物形成的保护膜的取下工序。In addition, the present invention relates to a temporary fixing method of a workpiece, which is characterized in that a protective film formed of a curable composition is provided on the surface of the workpiece, and after heat treatment, the workpiece is processed, and then dipped A removing step of removing the protective film formed of the above-mentioned curable composition from the above-mentioned workpiece in warm water of 70 to 90°C or lower, preferably in warm water of 75 to 85°C.

将上述固化性组合物的固化体取下时,由于能以膜状从部件回收,因此获得作业性优异的效果。再有,对于固化体与温水接触的方法,连同被加工件一起浸渍于温水中的方法简便,因此推荐。When the cured body of the above-mentioned curable composition is removed, it can be recovered from the parts in the form of a film, thereby obtaining an effect of excellent workability. In addition, as for the method of contacting the solidified body with warm water, the method of immersing the workpiece together with the warm water is recommended because it is convenient.

实施例Example

以下列举实施例对本发明更详细地说明,但本发明并不受实施例限定而解释。The following examples are given to describe the present invention in more detail, but the present invention is not limited to the examples and interpreted.

再有,实验例I-1~I-15为本发明的实施例,实验例II-1~II-5为比较例。In addition, Experimental Examples I-1 to I-15 are examples of the present invention, and Experimental Examples II-1 to II-5 are comparative examples.

(实验例I-1)(Experimental example I-1)

在由作为(A)多官能(甲基)丙烯酸酯的日本曹达公司制、“TE-2000”(1,2-聚丁二烯末端氨基甲酸酯甲基丙烯酸酯、以下简写为“TE-2000”)20质量份,二丙烯酸二环戊烷基酯(日本化药公司制、“KAYARAD R-684”以下简称为“R-684”)15质量份,作为(B)单官能(甲基)丙烯酸酯的2-(1,2-环己烷二羧基酰亚胺)乙基丙烯酸酯(东亚合成公司制、“AronixM-140”、以下简称“M-140”)40质量份和苯酚环氧乙烷2摩尔改性丙烯酸酯(东亚合成公司制、“Aronix M-101A”、以下简称为“M-101A”)25质量份组成的组合物的100质量份中,配合作为(C)光聚合引发剂的2-甲基-1-[4-(甲硫基)苯基]-2-吗啉代丙烷-1-酮(汽巴精化公司制、“IRGACURE907”、以下简称“I-907”)6质量份,作为(D)含有环戊二烯骨架的树脂的环戊二烯骨架树脂(日本瑞翁公司制、“Quintone 1700”、含有羟基、软化点为100℃、数均分子量为380。以下简称为“Quintone1700”)10质量份,作为阻聚剂的2,2-亚甲基-双(4-甲基-6-叔丁基苯酚)(以下简称为“MDP”)0.1质量份,制作固化性组合物。使用得到的固化性组合物,采用以下所示的评价方法进行拉伸剪切粘合强度的测定、密合性试验和剥离试验。将结果示于表1。"TE-2000" (1,2-polybutadiene-terminated urethane methacrylate, hereinafter abbreviated as "TE" manufactured by Nippon Soda Co., Ltd. as (A) multifunctional (meth)acrylate -2000") 20 parts by mass, dicyclopentyl diacrylate (manufactured by Nippon Kayaku Co., Ltd., "KAYARAD R-684" hereinafter referred to as "R-684") 15 parts by mass, as (B) monofunctional (methyl 40 parts by mass of 2-(1,2-cyclohexanedicarboxyimide) ethyl acrylate (manufactured by Toagosei Co., Ltd., "Aronix M-140", hereinafter referred to as "M-140") and phenol (C) 2-Methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one (manufactured by Ciba Specialty Chemicals Co., Ltd., "IRGACURE907", hereinafter referred to as "I -907") 6 parts by mass, as (D) cyclopentadiene skeleton resin (manufactured by Nippon Zeon Co., Ltd., "Quintone 1700", containing hydroxyl groups, softening point: 100°C, number average The molecular weight is 380. Hereinafter abbreviated as "Quintone1700") 10 parts by mass, 2,2-methylene-bis(4-methyl-6-tert-butylphenol) (hereinafter abbreviated as "MDP") as a polymerization inhibitor 0.1 parts by mass to prepare a curable composition. Using the obtained curable composition, the measurement of the tensile shear adhesive strength, the adhesiveness test, and the peeling test were performed by the evaluation method shown below. The results are shown in Table 1.

(评价方法)(Evaluation method)

粘合强度(拉伸剪切粘合强度):Adhesive strength (tensile shear adhesive strength):

粘合强度(拉伸剪切粘合强度)按照JIS K 6850测定。具体地,使用耐热Pyrex(注册商标)玻璃(25mm×25mm×2.0mm(纵×横×厚))作为被粘合材料。粘合部位为直径8mm的圆形,以厚度100μm用制作的固化性组合物将2片耐热Pyrex(注册商标)玻璃贴合,通过使用了无电极放电灯的FUSION公司制固化装置,在365nm的波长的累积光量2000mJ/cm2的条件下使其固化,制作拉伸剪切粘合强度试验片。对于制作的试验片,使用万能试验机,在温度23℃、湿度50%的环境下以拉伸速度10mm/min测定拉伸剪切粘合强度。Adhesive strength (tensile shear adhesive strength) was measured in accordance with JIS K 6850. Specifically, heat-resistant Pyrex (registered trademark) glass (25 mm×25 mm×2.0 mm (length×width×thickness)) was used as a material to be adhered. The bonded part is a circle with a diameter of 8 mm, and two sheets of heat-resistant Pyrex (registered trademark) glass are bonded together with a curable composition prepared at a thickness of 100 μm. It was cured under the condition that the cumulative light intensity of the wavelength was 2000mJ/cm 2 , and a tensile shear adhesive strength test piece was produced. For the produced test piece, the tensile shear adhesive strength was measured at a tensile speed of 10 mm/min in an environment with a temperature of 23° C. and a humidity of 50% using a universal testing machine.

切割后的保护膜的保持状况(密合性试验):The maintenance status of the protective film after cutting (adhesion test):

在温度23℃、湿度50%的环境下进行了密合性的试验。在硅片上将固化性组合物涂布为厚100μm,通过使用了无电极放电灯的FUSION公司制固化装置,在365nm的波长的累积光量2000mJ/cm2的条件下使固化性组合物固化,制作保护膜。然后,在100℃下对保护膜加热处理10分钟后,在转数30000rpm、输送速度1.0mm/sec、切片尺寸1mm见方的条件下进行切割,观察切割后是否保持着保护膜。计测25片切片中保持着保护膜的切片的片数。The adhesion test was performed in the environment of temperature 23 degreeC, and humidity 50%. The curable composition was applied to a thickness of 100 μm on a silicon wafer, and the curable composition was cured under the condition of a cumulative light intensity of 2000 mJ/cm at a wavelength of 365 nm by using a curing device manufactured by Fusion Corporation using an electrodeless discharge lamp. Make a protective film. Then, after heat-treating the protective film at 100° C. for 10 minutes, cutting was carried out under the conditions of rotation speed 30,000 rpm, conveying speed 1.0 mm/sec, and slice size 1 mm square, and whether the protective film remained after cutting was observed. The number of slices holding the protective film among the 25 slices was counted.

80℃温水剥离时间(剥离试验):Peeling time in warm water at 80°C (peeling test):

对于在上述切割后仍保持着保护膜的试验体,浸渍于温水(80℃)中后,测定直至保护膜从硅片剥离的时间。After immersing in warm water (80 degreeC) about the test body which maintained the protective film after the said dicing, the time until the protective film peeled off from a silicon wafer was measured.

剥离状态的观察(剥离试验):Observation of peeling state (peeling test):

在采用上述80℃温水的剥离时间(剥离试验)的试验后,观察剥离的保护膜。After the test using the peeling time (peeling test) of the above-mentioned 80° C. warm water, the peeled protective film was observed.

[表1][Table 1]

Figure BPA00001255155400131
Figure BPA00001255155400131

[表2][Table 2]

Figure BPA00001255155400151
Figure BPA00001255155400151

(实验例I-2、I-3、I-11和I-12)(Experimental example I-2, I-3, I-11 and I-12)

除了在表1所示的温度下进行了加热处理以外,与实验例I-1同样地制作固化性组合物。关于得到的固化性组合物,与实验例I-1同样地进行评价。将它们的结果示于表1。Except having heat-processed at the temperature shown in Table 1, the curable composition was produced similarly to Experimental example I-1. About the obtained curable composition, it evaluated similarly to Experimental example I-1. These results are shown in Table 1.

(实验例I-4~I-10和I-13~I-15)(Experimental example I-4~I-10 and I-13~I-15)

除了以表1所示的组成使用表1所示种类的原材料以外,与实验例I-1同样地制作固化性组合物。关于得到的固化性组合物,与实验例I-1同样地进行评价。将它们的结果示于表1。Except having used the raw material of the kind shown in Table 1 in the composition shown in Table 1, it carried out similarly to Experimental example I-1, and produced curable composition. About the obtained curable composition, it evaluated similarly to Experimental example I-1. These results are shown in Table 1.

(使用材料)(used material)

QM:甲基丙烯酸二环戊烯氧基乙酯(Rohm&Hass公司制、“QM-657”)QM: Dicyclopentenyloxyethyl methacrylate (manufactured by Rohm & Hass, "QM-657")

BZ:甲基丙烯酸苄酯(共荣社化学公司制、“Light Ester BZ”)BZ: Benzyl methacrylate (manufactured by Kyoeisha Chemical Co., Ltd., "Light Ester BZ")

UV-7000B:聚氨酯丙烯酸酯低聚物(日本合成化学公司制、“UV-7000B”)UV-7000B: Urethane acrylate oligomer (manufactured by Nippon Synthetic Chemicals Co., Ltd., "UV-7000B")

UV-3000B:聚酯系氨基甲酸酯丙烯酸酯低聚物(日本合成化学公司制、“UV-3000B”)UV-3000B: Polyester-based urethane acrylate oligomer (manufactured by Nippon Synthetic Chemicals Co., Ltd., "UV-3000B")

1,6-HX-A:二丙烯酸1,6-己二醇酯(共荣社化学公司制、“Light Acrylate1,6-HX-A”)1,6-HX-A: 1,6-hexanediol diacrylate (manufactured by Kyoeisha Chemical Co., Ltd., "Light Acrylate 1,6-HX-A")

M-5300:ω-羧基-聚己内酯单丙烯酸酯(东亚合成公司制、“AronixM-5300”)M-5300: ω-carboxy-polycaprolactone monoacrylate (manufactured by Toagosei Co., Ltd., "Aronix M-5300")

M-5710:2-羟基-3-苯氧基丙基丙烯酸酯(东亚合成公司制、“AronixM-5710”)M-5710: 2-Hydroxy-3-phenoxypropyl acrylate (manufactured by Toagosei Co., Ltd., "Aronix M-5710")

Quintone 1500:环戊二烯骨架树脂(日本瑞翁公司制、“Quintone1500”、含有酯基、软化点为125℃、数均分子量为470)Quintone 1500: Cyclopentadiene skeleton resin (manufactured by Nippon Zeon Co., Ltd., "Quintone 1500", contains an ester group, has a softening point of 125°C, and a number average molecular weight of 470)

BDK:苯偶酰二甲基缩酮(汽巴精化公司制、“IRGACURE651”)BDK: benzil dimethyl ketal (manufactured by Ciba Specialty Chemicals, "IRGACURE651")

(实验例II-1和II-2)(Experimental Examples II-1 and II-2)

除了在表2所示的温度下进行了加热处理以外,与实验例I-1同样地制作固化性组合物。关于得到的固化性组合物,与实验例I-1同样地进行评价。将它们的结果示于表2。再有,实验例II-1的加热处理温度的“-”意味着没有进行加热处理。Except having heat-processed at the temperature shown in Table 2, the curable composition was produced similarly to Experimental example I-1. About the obtained curable composition, it evaluated similarly to Experimental example I-1. These results are shown in Table 2. In addition, "-" in the heat treatment temperature of Experimental Example II-1 means that no heat treatment was performed.

(实验例II-3~II-5)(Experimental examples II-3 to II-5)

除了以表2所示的组成使用表2所示种类的原材料以外,与实验例I-1同样地制作固化性组合物。关于得到的固化性组合物,与实验例I-1同样地进行评价。将它们的结果示于表2。Except having used the raw material of the kind shown in Table 2 in the composition shown in Table 2, it carried out similarly to Experimental example I-1, and produced curable composition. About the obtained curable composition, it evaluated similarly to Experimental example I-1. These results are shown in Table 2.

[表3][table 3]

(使用材料)(used material)

IBX:甲基丙烯酸异冰片酯(共荣社化学公司制、“Light Ester IB-X”)IBX: Isobornyl methacrylate (manufactured by Kyoeisha Chemical Co., Ltd., "Light Ester IB-X")

其结果,实验例II-1由于没有进行加热处理而进行了切割,因此切割时保护膜剥离。此外,实验例II-2中,切割时保护膜没有剥离而保持,但由于加热处理的温度过高,因此剥离性降低,然后未能进行温水剥离。As a result, in Experimental Example II-1, since dicing was performed without heat treatment, the protective film peeled off during dicing. In addition, in Experimental Example II-2, the protective film was held without peeling during dicing, but since the temperature of the heat treatment was too high, the peelability was lowered, and then hot water peeling could not be performed.

此外,实验例II-3中,由于没有配合(A)多官能(甲基)丙烯酸酯,因此固化性组合物的固化体成为热塑性,由于加工前的加热处理而使保护膜溶解,未能保护表面。此外,实验例II-4中,由于没有配合(C)光聚合引发剂,因此光照射后也没有固化。实验例II-5中,由于没有配合(B)单官能(甲基)丙烯酸酯,因此固化收缩产生的变形大,在固化体的表面发现了裂纹。实验例II-5中,固化性组合物的固化体没有从晶片剥离。In addition, in Experimental Example II-3, since the (A) polyfunctional (meth)acrylate was not compounded, the cured body of the curable composition became thermoplastic, and the protective film was dissolved due to the heat treatment before processing, and the protective film could not be protected. surface. Moreover, in Experimental Example II-4, since (C) photoinitiator was not mix|blended, it did not harden even after light irradiation. In Experimental Example II-5, since the (B) monofunctional (meth)acrylate was not blended, the deformation due to curing shrinkage was large, and cracks were observed on the surface of the cured body. In Experimental Example II-5, the cured body of the curable composition did not peel off from the wafer.

而实验例I-1~I-14中,加热处理后进行了切割,因此所有情况下均是切割时保护膜没有脱落,能够保护表面。此外,实验例I-1~I-14中,均是将(A)多官能(甲基)丙烯酸酯和(B)单官能(甲基)丙烯酸酯与光聚合引发剂一起均衡地配合,因此光聚合后的固化性组合物的粘合强度充分,切割后将固化性组合物的固化体从硅晶片剥离时的剥离状态也良好。而且切割后的硅晶片的表面也得到良好的保护。此外,实验例I-15中,由于没有配合(D)环戊二烯骨架树脂,因此表面没有完全固化,发现了发粘,但粘合强度良好。On the other hand, in Experimental Examples I-1 to I-14, dicing was performed after the heat treatment, so in all cases, the protective film did not come off during dicing, and the surface could be protected. In addition, in Experimental Examples I-1 to I-14, (A) polyfunctional (meth)acrylate and (B) monofunctional (meth)acrylate are mixed together with photopolymerization initiator in a balanced manner, so The adhesive strength of the curable composition after photopolymerization is sufficient, and the peeling state when the cured body of the curable composition is peeled from the silicon wafer after dicing is also good. Moreover, the surface of the cut silicon wafer is also well protected. In addition, in Experimental Example I-15, since the (D) cyclopentadiene skeleton resin was not blended, the surface was not completely cured and stickiness was observed, but the adhesive strength was good.

本发明通过在被加工件的表面设置上述保护膜,将保护膜加热处理后,进行被加工件的加工,从而能够防止加工时的保护膜的脱落,因此能够保护被加工件的表面免受损伤、污染。此外,本发明的固化性组合物对于电路面等表面的凹凸的追随性充分,不仅是平滑的面,即使对于有凹凸的面,也能保护表面免受损伤、污染。In the present invention, the above-mentioned protective film is provided on the surface of the workpiece, and after the protective film is heat-treated, the workpiece is processed, thereby preventing the peeling of the protective film during processing, so the surface of the workpiece can be protected from damage. ,pollute. In addition, the curable composition of the present invention has sufficient followability to irregularities on surfaces such as circuit surfaces, and can protect not only smooth surfaces but also surfaces with irregularities from damage and contamination.

本发明的保护膜,通过在被加工件的加工后浸渍于90℃以下的温水中,能够以膜状从上述被加工件回收,因此获得作业性优异的效果。此外,不必使用对于以往的粘合剂而言必不可少的有机溶剂,获得环境负荷降低的效果。The protective film of the present invention can be recovered from the workpiece in the form of a film by immersing it in warm water of 90° C. or lower after processing the workpiece, and thus has an effect of being excellent in workability. In addition, there is no need to use an organic solvent, which is essential for conventional adhesives, and an effect of reducing environmental load is obtained.

本发明使用上述固化性组合物在被加工件的表面设置保护膜。本发明能获得例如即使在输送速度2mm/sec以下的条件下进行切割,加工时保护膜也不脱落的效果。In the present invention, a protective film is provided on the surface of a workpiece using the curable composition described above. The present invention can obtain the effect that, for example, the protective film does not come off during processing even if cutting is performed under the condition of a conveying speed of 2 mm/sec or less.

本发明的表面保护方法,由固化性组合物形成的保护膜由于其组成而具有光固化性,利用可见光、紫外线固化,因此与以往的热熔粘合剂相比,能够在省力化、节能化、作业缩短的方面获得显著的效果。此外,将上述保护膜层合在被加工件的表面后,经过加热处理工序,从而能够缓和上述保护膜的内部变形,在后续的被加工件的加工工序中能够抑制保护膜的脱落。此外,通过使用上述方法,上述保护膜对加工时使用的切削液等无影响而显现高粘合强度,能够保护被加工件的表面免受切削液的进入、切削屑等产生的损伤、异物的附着。In the surface protection method of the present invention, the protective film formed from the curable composition has photocurability due to its composition and can be cured by visible light and ultraviolet rays, so compared with conventional hot melt adhesives, it can save labor and energy. , Job shortening achieved significant results. In addition, after the protective film is laminated on the surface of the workpiece, the internal deformation of the protective film can be alleviated by a heat treatment process, and the peeling of the protective film can be suppressed in the subsequent processing of the workpiece. In addition, by using the above-mentioned method, the above-mentioned protective film exhibits high adhesive strength without affecting the cutting fluid etc. attached.

由于获得上述的效果,本发明在工学部件、传感器等电子、电气部件的加工,特别是切割、研削、研磨等精密加工等的产业中有用。Since the above-mentioned effects are obtained, the present invention is useful in the processing of electronic and electrical components such as engineering components and sensors, especially in the industries of precision processing such as cutting, grinding, and grinding.

再有,将2008年5月12日申请的日本专利申请2008-125321号的说明书、权利要求和摘要的全部内容引用于此,作为本发明的说明书的公开而并入。In addition, all the content of the specification, a claim, and the abstract of the Japanese patent application 2008-125321 for which it applied on May 12, 2008 are referred here, and it takes in as disclosure of the specification of this invention.

Claims (6)

1.在被加工件的表面层合保护膜的被加工件的表面保护方法,其特征在于,具有以下工序:在被加工件的表面层合由固化体构成的保护膜的层合工序,该固化体由含有下述(A)、(B)和(C)的固化性组合物形成;在层合工序后在80~150℃进行加热处理的加热工序;以及在加热工序后对被加工件进行加工的加工工序,1. The method for protecting the surface of a workpiece by laminating a protective film on the surface of the workpiece, comprising the steps of: laminating a protective film made of a cured body on the surface of the workpiece, the The cured body is formed from a curable composition containing the following (A), (B) and (C); a heating process of performing a heat treatment at 80 to 150° C. after the lamination process; the process of processing, (A)多官能(甲基)丙烯酸酯(A) Multifunctional (meth)acrylate (B)单官能(甲基)丙烯酸酯(B) Monofunctional (meth)acrylate (C)光聚合引发剂。(C) Photopolymerization initiator. 2.根据权利要求1所述的被加工件的表面保护方法,其中,所述保护膜含有(D)具有环戊二烯骨架的树脂。2. The method for protecting the surface of a workpiece according to claim 1, wherein the protective film contains (D) a resin having a cyclopentadiene skeleton. 3.根据权利要求2所述的被加工件的表面保护方法,其中,所述(D)具有环戊二烯骨架的树脂在分子内含有酯基或羟基。3. The method for protecting the surface of a workpiece according to claim 2, wherein the (D) resin having a cyclopentadiene skeleton contains an ester group or a hydroxyl group in a molecule. 4.根据权利要求1~3中任一项所述的被加工件的表面保护方法,其中,所述(A)多官能(甲基)丙烯酸酯和所述(B)单官能(甲基)丙烯酸酯均为疏水性。4. The surface protection method of a workpiece according to any one of claims 1 to 3, wherein the (A) multifunctional (meth)acrylate and the (B) monofunctional (methyl) Acrylates are hydrophobic. 5.根据权利要求2~4中任一项所述的被加工件的表面保护方法,其中,所述固化性组合物在(A)和(B)的合计量100质量份中,含有5~50质量份(A)多官能(甲基)丙烯酸酯和50~95质量份(B)单官能(甲基)丙烯酸酯,相对于(A)和(B)的合计量100质量份,含有0.1~20质量份(C)光聚合引发剂和0.1~50质量份(D)具有环戊二烯骨架的树脂。5. The surface protection method of a workpiece according to any one of claims 2 to 4, wherein the curable composition contains 5 to 100 parts by mass of the total amount of (A) and (B). 50 parts by mass of (A) polyfunctional (meth)acrylate and 50 to 95 parts by mass of (B) monofunctional (meth)acrylate, with respect to the total amount of (A) and (B) 100 parts by mass, containing 0.1 -20 parts by mass of (C) a photopolymerization initiator and 0.1-50 parts by mass of (D) a resin having a cyclopentadiene skeleton. 6.在被加工件的表面层合保护膜的被加工件的临时固定方法,其特征在于,具有以下工序:在被加工件的表面层合由固化体构成的保护膜的层合工序,该固化体由含有下述(A)、(B)和(C)的固化性组合物形成;在层合工序后在80~150℃进行加热处理的加热工序;在加热工序后进行被加工件的加工的加工工序;以及在加工工序后将被加工件浸渍于90℃以下的温水中,将所述保护膜从所述被加工件取下的取下工序,6. A method for temporarily fixing a workpiece by laminating a protective film on the surface of the workpiece, comprising the following steps: a lamination step of laminating a protective film made of a cured body on the surface of the workpiece, the The cured body is formed from a curable composition containing the following (A), (B) and (C); after the lamination process, a heating process of heat treatment at 80 to 150 ° C is performed; after the heating process, the workpiece is processed a processing step of processing; and a removing step of immersing the workpiece in warm water of 90° C. or lower after the processing step to remove the protective film from the workpiece, (A)多官能(甲基)丙烯酸酯(A) Multifunctional (meth)acrylate (B)单官能(甲基)丙烯酸酯(B) Monofunctional (meth)acrylate (C)光聚合引发剂。(C) Photopolymerization initiator.
CN200980117146.1A 2008-05-12 2009-05-11 Surface protection method and temporary fixing method of workpiece Active CN102026807B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008125321 2008-05-12
JP2008-125321 2008-05-12
PCT/JP2009/058783 WO2009139357A1 (en) 2008-05-12 2009-05-11 Method for protection of surface of material to be processed, and temporary fixing method

Publications (2)

Publication Number Publication Date
CN102026807A true CN102026807A (en) 2011-04-20
CN102026807B CN102026807B (en) 2014-05-21

Family

ID=41318725

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980117146.1A Active CN102026807B (en) 2008-05-12 2009-05-11 Surface protection method and temporary fixing method of workpiece

Country Status (4)

Country Link
JP (1) JP5507451B2 (en)
KR (1) KR101555729B1 (en)
CN (1) CN102026807B (en)
WO (1) WO2009139357A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110234506A (en) * 2017-02-28 2019-09-13 迪睿合株式会社 The preparation method and Photocurable resin composition of lamilate
CN110235222A (en) * 2017-02-02 2019-09-13 日立化成株式会社 The manufacturing method of electronic component, interim protection resin combination and interim protection resin film

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011155112A (en) * 2010-01-27 2011-08-11 Disco Abrasive Syst Ltd Method of processing wafer
JP2012033788A (en) * 2010-08-02 2012-02-16 Denki Kagaku Kogyo Kk Machining and peeling method of planar article to be ground
KR102236041B1 (en) * 2019-07-23 2021-04-05 주식회사 한솔케미칼 Quantum dot optical film and quantum dot composition included therein
JP7597565B2 (en) 2020-12-15 2024-12-10 株式会社ディスコ Method for processing plate-like object and method for processing package substrate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004119780A (en) 2002-09-27 2004-04-15 Nitto Denko Corp Working method of semiconductor wafer
JP4376610B2 (en) * 2003-12-18 2009-12-02 株式会社きもと Surface protective film and surface protective film using the same
KR101320823B1 (en) * 2006-01-13 2013-10-21 덴끼 가가꾸 고교 가부시키가이샤 Curable resin composition, surface protection method, temporary fixation method, and separation method
JP5052792B2 (en) 2006-01-13 2012-10-17 電気化学工業株式会社 Resin composition and method for temporarily fixing and protecting surface of workpiece using the same
JP5020577B2 (en) 2006-09-14 2012-09-05 電気化学工業株式会社 Method for removing protective film coated on workpiece

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110235222A (en) * 2017-02-02 2019-09-13 日立化成株式会社 The manufacturing method of electronic component, interim protection resin combination and interim protection resin film
CN110235222B (en) * 2017-02-02 2023-07-14 株式会社力森诺科 Method for producing electronic component, resin composition for temporary protection, and resin film for temporary protection
CN110234506A (en) * 2017-02-28 2019-09-13 迪睿合株式会社 The preparation method and Photocurable resin composition of lamilate
CN110234506B (en) * 2017-02-28 2021-05-11 迪睿合株式会社 Method for producing laminate and photocurable resin composition

Also Published As

Publication number Publication date
JP5507451B2 (en) 2014-05-28
WO2009139357A1 (en) 2009-11-19
KR20110008180A (en) 2011-01-26
CN102026807B (en) 2014-05-21
JPWO2009139357A1 (en) 2011-09-22
KR101555729B1 (en) 2015-09-25

Similar Documents

Publication Publication Date Title
CN101501152B (en) Adhesive composition and method for temporarily fixing member by using the same
CN101681823B (en) Semiconductor wafer grinding method, resin composition used in the same, and protective sheet
JP5254014B2 (en) Resin composition and method for temporarily fixing and protecting surface of workpiece using the same
CN102105546B (en) Interim fixing/stripping means of component and be suitable to the interim fixing of its and stick with glue agent
JP5052792B2 (en) Resin composition and method for temporarily fixing and protecting surface of workpiece using the same
JP4916681B2 (en) Photocurable adhesive for temporary fixing method and temporary fixing method of member using the same
JP5016224B2 (en) Composition and method for temporarily fixing member using the same
CN102026807A (en) Method for protection of surface of material to be processed, and temporary fixing method
CN102516893A (en) Adherent composition and method of temporarily fixing member therewith
JP4932300B2 (en) Temporary fixing composition and member temporary fixing method using the same
CN101146837B (en) Adherent composition and method of temporarily fixing member therewith
JP5408836B2 (en) Composition and method for temporarily fixing and peeling member using the same
JP2010095627A (en) Composition for transportation and method for transporting member
JP5085162B2 (en) Resin composition and method for temporarily fixing and protecting surface of workpiece using the same
JP5132045B2 (en) Composition and method for temporarily fixing member using the same
JP4749751B2 (en) Temporary fixing method for members
JP2011148842A (en) Resin composition
JP5596205B2 (en) Material transport method
JP2009041033A (en) Adhesive composition for glass member and method for temporarily fixing glass member using the same

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant