CN101967661A - Trivalent chromium plating solution - Google Patents
Trivalent chromium plating solution Download PDFInfo
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- CN101967661A CN101967661A CN 201010521848 CN201010521848A CN101967661A CN 101967661 A CN101967661 A CN 101967661A CN 201010521848 CN201010521848 CN 201010521848 CN 201010521848 A CN201010521848 A CN 201010521848A CN 101967661 A CN101967661 A CN 101967661A
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- trivalent chromium
- chromium plating
- plating liquid
- chloride
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Abstract
The invention discloses trivalent chromium plating solution. The plating solution contains cylinder opening agent, 1 to 100g/L of stabilizer and 1 to 10g/L of wetting agent, wherein the stabilizer is neutral amino acid; and the cylinder opening agent consists of 90 to 140g/L trivalent chromium salt, 180 to 300g/L of conductive salt and 25 to 90g/L of pH buffering agent. The plating solution has simple components and is convenient for maintenance, and a plating layer has good corrosion resistance and is not burnt in a high current density area.
Description
Technical field
The present invention relates to a kind of trivalent chromium plating liquid.
Background technology
Along with development in science and technology, trivalent chromium plating liquid more and more is subjected to people's attention, and its advantage is: chromic toxicity only is chromic 1%, and sewage disposal is easy; Trivalent chromium plating liquid is when electroplating, even current interruptions, the bonding force of coating can not be affected yet; The dispersive ability of trivalent chromium plating liquid, covering power are better than the sexavalent chrome electroplate liquid; The current efficiency of trivalent chromium plating liquid is higher, can reach about 25%.
Yet, the complicated component of existing trivalent chromium plating liquid, inconvenience safeguards that corrosion resistance is relatively poor relatively, the coating high current density region is burnt easily.
Summary of the invention
The purpose of this invention is to provide a kind of trivalent chromium plating liquid.
The technical solution used in the present invention is:
A kind of trivalent chromium plating liquid, this plating bath contains out the stablizer of cylinder agent, 1-100g/L, the wetting agent of 1-10g/L, wherein, stablizer is a neutral amino acids, opens the cylinder agent and is made up of 90-140g/L chromic salt, 180-300g/L conducting salt, 25-90g/L pH buffer reagent.
Stablizer is 36-80g/L.
Neutral amino acids is at least a in glycine, L-Ala, leucine, Threonine, the Serine.
Chromic salt is a chromium chloride.
Conducting salt is at least a in Repone K, sodium-chlor, magnesium chloride, ammonium chloride, Sodium tetrafluoroborate, potassium fluoborate, the Ammonium sulfamate.
The pH buffer reagent is at least a in boric acid, the aluminum chloride.
Wetting agent is at least a in OP emulsifying agent, sodium sulfo-succinate, OT aerosol, the sodium lauryl tri(oxyethyl) sulfate.
The invention has the beneficial effects as follows: the composition of electroplate liquid is simple, and is easy to maintenance, and the coating corrosion resistance is better, and the coating high current density region can not burnt.
Embodiment
Be described further below in conjunction with embodiment.
Embodiment 1
Following table 1 is the composition that trivalent chromium plating liquid is comprised.
Table 1: the composition that trivalent chromium plating liquid is comprised
| Raw material | Concentration |
| Chromium chloride | 130g/L |
| Glycine | 50g/L |
| Ammonium chloride | 100g/L |
| Repone K | 80g/L |
| Boric acid | 40g/L |
| Sodium-chlor | 50g/L |
| The OP emulsifying agent | 1.2g/L |
Embodiment 2
Following table 2 is compositions that trivalent chromium plating liquid is comprised.
Table 2: the composition that trivalent chromium plating liquid is comprised
| Raw material | Concentration |
| Chromium chloride | 110g/L |
| Leucine | 40g/L |
| Ammonium chloride | 120g/L |
| Sodium tetrafluoroborate | 50g/L |
| Boric acid | 40g/L |
| Sodium-chlor | 50g/L |
| The OP emulsifying agent | 2g/L |
Embodiment 3
Following table 3 is compositions that trivalent chromium plating liquid is comprised.
Table 3: the composition that trivalent chromium plating liquid is comprised
| Raw material | Concentration |
| Chromium chloride | 108g/L |
| Leucine | 20g/L |
| Glycine | 30g/L |
| Ammonium chloride | 90g/L |
| Sodium tetrafluoroborate | 80g/L |
| Boric acid | 50g/L |
| Sodium-chlor | 100g/L |
| Sodium sulfo-succinate | 2.5g/L |
Embodiment 4
Following table 4 is compositions that trivalent chromium plating liquid is comprised.
Table 4: the composition that trivalent chromium plating liquid is comprised
| Raw material | Concentration |
| Chromium chloride | 90g/L |
| Threonine | 35g/L |
| Serine | 30g/L |
| Magnesium chloride | 60g/L |
| Ammonium sulfamate | 55g/L |
| Boric acid | 75g/L |
| Repone K | 65g/L |
| The OT aerosol | 3.5g/L |
Embodiment 5
Following table 5 is compositions that trivalent chromium plating liquid is comprised.
Table 5: the composition that trivalent chromium plating liquid is comprised
| Raw material | Concentration |
| Chromium chloride | 140g/L |
| L-Ala | 35g/L |
| Serine | 45g/L |
| Magnesium chloride | 45g/L |
| Ammonium sulfamate | 55g/L |
| Boric acid | 45g/L |
| Aluminum chloride | 45g/L |
| Repone K | 100g/L |
| Sodium lauryl tri(oxyethyl) sulfate | 5g/L |
Embodiment 6
Following table 6 is compositions that trivalent chromium plating liquid is comprised.
Table 6: the composition that trivalent chromium plating liquid is comprised
| Raw material | Concentration |
| Chromium chloride | 120g/L |
| L-Ala | 36g/L |
| Serine | 36g/L |
| Ammonium chloride | 105g/L |
| Ammonium sulfamate | 95g/L |
| Boric acid | 45g/L |
| Aluminum chloride | 40g/L |
| Repone K | 100g/L |
| Sodium lauryl tri(oxyethyl) sulfate | 8g/L |
Embodiment 7
Following table 7 is compositions that trivalent chromium plating liquid is comprised.
Table 7: the composition that trivalent chromium plating liquid is comprised
| Raw material | Concentration |
| Chromium chloride | 95g/L |
| L-Ala | 36g/L |
| Ammonium chloride | 90g/L |
| Boric acid | 25g/L |
| Repone K | 90g/L |
| Sodium lauryl tri(oxyethyl) sulfate | 1g/L |
Embodiment 8
Following table 8 is compositions that trivalent chromium plating liquid is comprised.
Table 8: the composition that trivalent chromium plating liquid is comprised
| Raw material | Concentration |
| Chromium chloride | 115g/L |
| L-Ala | 20g/L |
| Serine | 25g/L |
| Ammonium chloride | 90g/L |
| Boric acid | 55g/L |
| Repone K | 90g/L |
| Sodium-chlor | 65g/L |
| The OT aerosol | 10g/L |
The trivalent chromium plating liquid composition that embodiment 1-8 obtains is simple, easy to maintenance, and salt-fog test reached more than 72 hours, and corrosion resistance nature is splendid, coating high current density region (35-45A/dm
2) do not burn.
And generally do not use neutral amino acids to cook the electroplate liquid of stablizer, and the empyreumatic situation of coating high current density region appears in use easily, and salt-fog test was difficult to reach more than 72 hours simultaneously, and corrosion resistance nature is relatively poor.
Claims (7)
1. trivalent chromium plating liquid, it is characterized in that: this plating bath contains out the stablizer of cylinder agent, 1-100g/L, the wetting agent of 1-10g/L, wherein, stablizer is a neutral amino acids, opens the cylinder agent and is made up of 90-140g/L chromic salt, 180-300g/L conducting salt, 25-90g/L pH buffer reagent.
2. a kind of trivalent chromium plating liquid according to claim 1 is characterized in that: stablizer is 36-80g/L.
3. a kind of trivalent chromium plating liquid according to claim 1 is characterized in that: neutral amino acids is at least a in glycine, L-Ala, leucine, Threonine, the Serine.
4. a kind of trivalent chromium plating liquid according to claim 1 is characterized in that: chromic salt is a chromium chloride.
5. a kind of trivalent chromium plating liquid according to claim 1 is characterized in that: conducting salt is at least a in Repone K, sodium-chlor, magnesium chloride, ammonium chloride, Sodium tetrafluoroborate, potassium fluoborate, the Ammonium sulfamate.
6. a kind of trivalent chromium plating liquid according to claim 1 is characterized in that: the pH buffer reagent is at least a in boric acid, the aluminum chloride.
7. a kind of trivalent chromium plating liquid according to claim 1 is characterized in that: wetting agent is at least a in OP emulsifying agent, sodium sulfo-succinate, OT aerosol, the sodium lauryl tri(oxyethyl) sulfate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010521848 CN101967661A (en) | 2010-10-26 | 2010-10-26 | Trivalent chromium plating solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010521848 CN101967661A (en) | 2010-10-26 | 2010-10-26 | Trivalent chromium plating solution |
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| CN101967661A true CN101967661A (en) | 2011-02-09 |
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| CN 201010521848 Pending CN101967661A (en) | 2010-10-26 | 2010-10-26 | Trivalent chromium plating solution |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102400120A (en) * | 2011-12-27 | 2012-04-04 | 广东东硕科技有限公司 | Chemical nickel-precipitating solution |
| CN103215621A (en) * | 2012-02-06 | 2013-07-24 | 闫瑞景 | Composite chrome plating additive |
| CN104388989A (en) * | 2014-11-14 | 2015-03-04 | 无锡信大气象传感网科技有限公司 | Trivalent chromium electroplating liquid and preparation method thereof |
| CN105671599A (en) * | 2016-04-11 | 2016-06-15 | 济南德锡科技有限公司 | Sulfate trivalent chromium electroplating solution and preparation method thereof |
| CN107313078A (en) * | 2016-04-27 | 2017-11-03 | 中国科学院金属研究所 | A kind of trivalent chromium plating solution and preparation method thereof |
| CN107491110A (en) * | 2017-09-20 | 2017-12-19 | 山东大学 | PH is stable and has alumina fluid dispersion of soda acid buffering and preparation method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101092721A (en) * | 2006-06-19 | 2007-12-26 | 比亚迪股份有限公司 | Solution in use for plating trivalent chromium, and plating method for using the plating solution |
| CN101512047A (en) * | 2006-08-01 | 2009-08-19 | 弗劳恩霍弗实用研究促进协会 | Method for deposition of chromium layers as hard- chrome plating, electroplating bath and hard- chrome surfaces |
| CN101665960A (en) * | 2009-09-04 | 2010-03-10 | 厦门大学 | Trivalent chromium sulfate plating solution and preparation method thereof |
-
2010
- 2010-10-26 CN CN 201010521848 patent/CN101967661A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101092721A (en) * | 2006-06-19 | 2007-12-26 | 比亚迪股份有限公司 | Solution in use for plating trivalent chromium, and plating method for using the plating solution |
| CN101512047A (en) * | 2006-08-01 | 2009-08-19 | 弗劳恩霍弗实用研究促进协会 | Method for deposition of chromium layers as hard- chrome plating, electroplating bath and hard- chrome surfaces |
| CN101665960A (en) * | 2009-09-04 | 2010-03-10 | 厦门大学 | Trivalent chromium sulfate plating solution and preparation method thereof |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102400120A (en) * | 2011-12-27 | 2012-04-04 | 广东东硕科技有限公司 | Chemical nickel-precipitating solution |
| CN103215621A (en) * | 2012-02-06 | 2013-07-24 | 闫瑞景 | Composite chrome plating additive |
| CN103215621B (en) * | 2012-02-06 | 2016-06-29 | 闫瑞景 | A kind of compound chromium plating additive |
| CN104388989A (en) * | 2014-11-14 | 2015-03-04 | 无锡信大气象传感网科技有限公司 | Trivalent chromium electroplating liquid and preparation method thereof |
| CN105671599A (en) * | 2016-04-11 | 2016-06-15 | 济南德锡科技有限公司 | Sulfate trivalent chromium electroplating solution and preparation method thereof |
| CN107313078A (en) * | 2016-04-27 | 2017-11-03 | 中国科学院金属研究所 | A kind of trivalent chromium plating solution and preparation method thereof |
| CN107491110A (en) * | 2017-09-20 | 2017-12-19 | 山东大学 | PH is stable and has alumina fluid dispersion of soda acid buffering and preparation method thereof |
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Application publication date: 20110209 |