CN101949043A - Formulation for electroplating black rhodium layer and method thereof - Google Patents
Formulation for electroplating black rhodium layer and method thereof Download PDFInfo
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Abstract
本发明属于电镀技术，尤其涉及一种用于在金属表面电镀黑色铑层的镀铑液配方。为解决现有黑色镀层电镀工艺中操作条件重复性差，批量生产困难，所形成的镍、铬镀层的耐磨性差，抗腐蚀能力有限，且发雾，光亮性、抗变色性能也较差等问题，本发明提供一种镀铑液。该镀铑液组分包括硫酸铑、硫酸、苯磺酸。本发明采用了苯甲酰胺、间甲基苯甲醛以及邻甲基苯甲酰氯等添加剂以形成黑色铑层。本发明同时揭露了一种在金属表面电镀黑色铑层的方法。The invention belongs to electroplating technology, in particular to a rhodium plating liquid formula for electroplating a black rhodium layer on a metal surface. In order to solve the problems of poor repeatability of operating conditions and difficulties in mass production in the existing black coating electroplating process, the formed nickel and chromium coatings have poor wear resistance, limited corrosion resistance, fogging, poor brightness, and poor anti-tarnish performance, etc. , the invention provides a rhodium plating solution. The components of the rhodium plating solution include rhodium sulfate, sulfuric acid and benzenesulfonic acid. The present invention adopts additives such as benzamide, m-tolualdehyde and o-toluyl chloride to form the black rhodium layer. The invention also discloses a method for electroplating a black rhodium layer on a metal surface.
Description
技术领域technical field
本发明属于电镀技术，尤其涉及一种用于在金属表面电镀黑色铑层的镀铑液配方，以及一种在金属表面电镀黑色铑层的方法。The invention belongs to the electroplating technology, in particular to a rhodium plating solution formula for electroplating a black rhodium layer on a metal surface, and a method for electroplating a black rhodium layer on a metal surface.
背景技术Background technique
众所周知，黑色有很好的消光吸热性。在现代工业中，有大量的产品需要黑化来消除反光，改变热性能。黑化的产品具有良好的太阳能选择吸收性，可以被广泛地用于太阳能集热板中，以获得优良的节能效果。另外，在照相、光学设备、外科仪器和汽车零件等行业也广泛地使用了黑色镀层产品。黑色镀层产品也广泛存在于装饰品行业。随着人们对装饰品的审美标准越来越高，相较于金黄、银白，黑色已逐渐成为一种新颖、独特的装饰颜色，因此，黑色镀层也广泛地应用于珠宝首饰行业。As we all know, black has good matting and heat absorption. In modern industry, there are a large number of products that need blackening to eliminate reflection and change thermal performance. The blackened product has good selective absorption of solar energy, and can be widely used in solar collector panels to obtain excellent energy-saving effects. In addition, black coating products are also widely used in industries such as photography, optical equipment, surgical instruments and auto parts. Black plated products are also widely found in the decoration industry. As people have higher and higher aesthetic standards for decorations, black has gradually become a novel and unique decorative color compared to gold and silver. Therefore, black plating is also widely used in the jewelry industry.
目前，应用最多的黑色镀层主要是黑镍和黑铬。但是，它们在电镀工艺中存在一系列问题，诸如操作条件重复性差、批量生产困难的等。另外，黑镍、铬层的耐磨性差，抗腐蚀能力有限，且镀层发雾，光亮性、抗变色性能也较差，不能满足先进的科学仪器的要求，在装饰品行业中潜力不足，发展有限。因此，要发展一种性能优良的黑色镀层是必需的。At present, the most widely used black coatings are mainly black nickel and black chrome. However, they have a series of problems in the electroplating process, such as poor repeatability of operating conditions, difficulty in mass production, and the like. In addition, the black nickel and chrome layers have poor wear resistance, limited corrosion resistance, foggy plating, poor brightness and discoloration resistance, which cannot meet the requirements of advanced scientific instruments, and have insufficient potential in the decoration industry. limited. Therefore, it is necessary to develop a black coating with excellent performance.
黑色镀铑液性能稳定，工艺简单，操作性好，镀层硬度高，耐磨性好，抗腐蚀性优良，能很好的解决以上的难题。另外，黑色铑层性能稳定，抗变色性好，适合装饰品以及电子、光学仪器表面电镀。Black rhodium plating solution has stable performance, simple process, good operability, high coating hardness, good wear resistance and excellent corrosion resistance, which can well solve the above problems. In addition, the black rhodium layer has stable performance and good discoloration resistance, and is suitable for surface plating of decorations, electronic and optical instruments.
目前关于铑镀液的现有技术主要集中在硫酸铑的制备上，关于铑镀液添加剂的研究尚无专利和文献报道。The prior art about rhodium plating solution mainly concentrates on the preparation of rhodium sulfate at present, and there is no patent and bibliographical information about the research of rhodium plating solution additive.
发明内容Contents of the invention
为此，本发明要解决的第一个技术问题是提供若干种用于电镀黑色铑层的镀铑液。For this reason, the first technical problem to be solved in the present invention is to provide several kinds of rhodium plating solutions for electroplating black rhodium layer.
本发明解决的第二个技术问题是提供一种电镀黑色铑层的方法。The second technical problem solved by the present invention is to provide a method for electroplating a black rhodium layer.
为解决第一个技术问题，本发明提供一种镀铑液。所述镀铑液组分包括：In order to solve the first technical problem, the invention provides a rhodium plating solution. Described rhodium plating liquid composition comprises:
硫酸铑，其浓度为1.5-5g/L；Rhodium sulfate, its concentration is 1.5-5g/L;
硫酸，其体积浓度为5-30ml/L；Sulfuric acid, its volume concentration is 5-30ml/L;
苯磺酸，其体积浓度为5-30ml/L，且硫酸与苯磺酸总体积浓度不超过40ml/L；Benzenesulfonic acid, its volume concentration is 5-30ml/L, and the total volume concentration of sulfuric acid and benzenesulfonic acid does not exceed 40ml/L;
苯甲酰胺，其浓度为0.1-2g/L，和benzamide in a concentration of 0.1-2 g/L, and
间甲基苯甲醛，其浓度为0.1-2g/L。m-tolualdehyde, its concentration is 0.1-2g/L.
本发明还提供一种镀铑液。所述镀铑液组分包括：The invention also provides a rhodium plating solution. Described rhodium plating liquid composition comprises:
硫酸铑，其浓度为1.5-5g/L；Rhodium sulfate, its concentration is 1.5-5g/L;
硫酸，其体积浓度为5-30ml/L；Sulfuric acid, its volume concentration is 5-30ml/L;
苯磺酸，其体积浓度为5-30ml/L，且硫酸与苯磺酸总体积浓度不超过40ml/L；Benzenesulfonic acid, its volume concentration is 5-30ml/L, and the total volume concentration of sulfuric acid and benzenesulfonic acid does not exceed 40ml/L;
苯甲酰胺，其浓度为0.1-2g/L，和benzamide in a concentration of 0.1-2 g/L, and
邻甲基苯甲酰氯，其浓度为0.1-2g/L。O-toluyl chloride, its concentration is 0.1-2g/L.
本发明还提供一种镀铑液。所述镀铑液组分包括：The invention also provides a rhodium plating solution. Described rhodium plating liquid composition comprises:
硫酸铑，其浓度为1.5-5g/L；Rhodium sulfate, its concentration is 1.5-5g/L;
硫酸，其体积浓度为5-30ml/L；Sulfuric acid, its volume concentration is 5-30ml/L;
苯磺酸，其体积浓度为5-30ml/L，且硫酸与苯磺酸总体积浓度不超过40ml/L；Benzenesulfonic acid, its volume concentration is 5-30ml/L, and the total volume concentration of sulfuric acid and benzenesulfonic acid does not exceed 40ml/L;
苯甲酰胺，其浓度为0.1-2g/L；Benzamide, its concentration is 0.1-2g/L;
间甲基苯甲醛，和邻甲基苯甲酰氯，且间甲基苯甲醛与邻甲基苯甲酰氯总浓度为0.1-2g/L。m-tolualdehyde, and o-toluyl chloride, and the total concentration of m-tolualdehyde and o-toluyl chloride is 0.1-2g/L.
为解决第二个技术问题，本发明提供一种电镀黑色铑层的方法。所述方法可使用上述各种的镀铑液，阳极选自铂、镀铂钛、钛、铑中的至少一种；电镀温度控制在30-80℃；电镀电流密度为5-18A/dm2；电镀时间为0.5-18分钟。To solve the second technical problem, the invention provides a method for electroplating a black rhodium layer. The method can use the various rhodium plating solutions mentioned above, and the anode is selected from at least one of platinum, platinized titanium, titanium, and rhodium; the electroplating temperature is controlled at 30-80°C; the electroplating current density is 5-18A/ dm ; Plating time is 0.5-18 minutes.
电镀过程中，镀件最好带电入槽。During the electroplating process, the plated parts are preferably charged into the tank.
而且，电镀过程中，可以同时搅拌所述镀铑液。Moreover, during the electroplating process, the rhodium plating solution can be stirred simultaneously.
本发明的各种镀铑液，以及使用本发明电镀方法进行电镀铑层有如下好处：Various rhodium-plating liquids of the present invention, and use electroplating method of the present invention to carry out electroplating rhodium layer has following benefit:
1.用上述各种镀铑液进行电镀，所获得的铑镀层均发黑。而且苯甲酰胺，甲基苯甲醛和邻甲基苯甲酰氯等的添加浓度越高，电流越大，镀层越黑。1. Carry out electroplating with above-mentioned various rhodium-plating liquids, the rhodium plating layer that obtains all turns black. Moreover, the higher the concentration of benzamide, tolualdehyde and o-toluyl chloride, the greater the current and the darker the coating.
2.本发明镀铑液配方简单，所形成的镀液稳定，便于电镀操作。而且相对于现有技术，本发明的操作条件的重复性好。2. The formula of the rhodium plating solution of the present invention is simple, the formed plating solution is stable, and is convenient for electroplating operation. Moreover, compared with the prior art, the repeatability of the operating conditions of the present invention is good.
3.采用本发明镀铑液，以及方法所获得的铑镀层光亮，抗变色性好。3. Adopt the rhodium plating solution of the present invention, and the rhodium coating obtained by the method is bright and has good discoloration resistance.
具体实施方式Detailed ways
为了使本发明的目的、技术方案及优点更加清楚明白，以下结合附图及实施例，对本发明进行进一步详细说明。应当理解，此处所描述的具体实施例仅仅用以解释本发明，并不用于限定本发明。In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
实施例1：Example 1:
使用水作为溶剂配制镀铑液。本实施例中镀铑液含有：Rhodium plating baths are prepared using water as a solvent. Rhodium plating solution contains in the present embodiment:
硫酸铑，其浓度为2g/L；Rhodium sulfate, its concentration is 2g/L;
硫酸，其体积浓度为20ml/L；Sulfuric acid, its volume concentration is 20ml/L;
苯磺酸，其体积浓度为20ml/L；Benzenesulfonic acid, its volume concentration is 20ml/L;
苯甲酰胺，其浓度为1g/L，和benzamide at a concentration of 1 g/L, and
间甲基苯甲醛，其浓度为2g/L。m-tolualdehyde, its concentration is 2g/L.
使用上述镀铑液进行电镀时，温度控制可在40℃，电镀电流密度在10A/dm2，电镀时间：2分钟，镀件带电入槽，电镀同时搅拌镀铑液。When using the above-mentioned rhodium-plating solution for electroplating, the temperature control can be at 40°C, the electroplating current density is 10A/dm2, the electroplating time: 2 minutes, the plated parts are charged into the tank, and the rhodium-plating solution is stirred while electroplating.
实施例2：Example 2:
使用水作为溶剂配制镀铑液。本实施例中镀铑液含有：Rhodium plating baths are prepared using water as a solvent. Rhodium plating solution contains in the present embodiment:
硫酸铑，其浓度为1.8g/L；Rhodium sulfate, its concentration is 1.8g/L;
硫酸，其体积浓度为10ml/L；Sulfuric acid, its volume concentration is 10ml/L;
苯磺酸，其体积浓度为10ml/L；Benzenesulfonic acid, its volume concentration is 10ml/L;
苯甲酰胺，其浓度为1g/L，和benzamide at a concentration of 1 g/L, and
邻甲基苯.甲酰氯，其浓度为2g/L。O-toluene. Formyl chloride, its concentration is 2g/L.
使用上述镀铑液进行电镀时，温度控制可在40℃，电镀电流密度在10A/dm2，电镀时间：2分钟，镀件带电入槽，电镀同时搅拌镀铑液。When using the above rhodium plating solution for electroplating, the temperature can be controlled at 40°C, the electroplating current density is 10A/dm 2 , the electroplating time: 2 minutes, the plated parts are charged into the tank, and the rhodium plating solution is stirred while electroplating.
实施例3：Example 3:
使用水作为溶剂配制镀铑液。本实施例中镀铑液含有：Rhodium plating baths are prepared using water as a solvent. Rhodium plating solution contains in the present embodiment:
硫酸铑，其浓度为1.8g/L；Rhodium sulfate, its concentration is 1.8g/L;
硫酸，其体积浓度为10ml/L；Sulfuric acid, its volume concentration is 10ml/L;
苯磺酸，其体积浓度为10ml/L；Benzenesulfonic acid, its volume concentration is 10ml/L;
苯甲酰胺，其浓度为1g/L；Benzamide, its concentration is 1g/L;
间甲基苯甲醛，其浓度为1g/L；和m-tolualdehyde in a concentration of 1 g/L; and
邻甲基苯甲酰氯，其浓度为1g/L。O-toluyl chloride, its concentration is 1g/L.
使用上述镀铑液进行电镀时，温度控制可在40℃，电镀电流密度在10A/dm2，电镀时间：2分钟，镀件带电入槽，电镀同时搅拌镀铑液。When using the above rhodium plating solution for electroplating, the temperature can be controlled at 40°C, the electroplating current density is 10A/dm 2 , the electroplating time: 2 minutes, the plated parts are charged into the tank, and the rhodium plating solution is stirred while electroplating.
本发明的各种镀铑液，以及使用本发明电镀方法进行电镀铑层有如下好处：Various rhodium-plating liquids of the present invention, and use electroplating method of the present invention to carry out electroplating rhodium layer has following benefit:
1.用上述各种镀铑液进行电镀，所获得的铑镀层均发黑。而且苯甲酰胺，甲基苯甲醛和邻甲基苯甲酰氯等的添加浓度越高，电流越大，镀层越黑。1. Carry out electroplating with above-mentioned various rhodium-plating liquids, the rhodium plating layer that obtains all turns black. Moreover, the higher the concentration of benzamide, tolualdehyde and o-toluyl chloride, the greater the current and the darker the coating.
2.本发明镀铑液配方简单，所形成的镀液稳定，便于电镀操作。而且相对于现有技术，本发明的操作条件的重复性好。2. The formula of the rhodium plating solution of the present invention is simple, the formed plating solution is stable, and is convenient for electroplating operation. Moreover, compared with the prior art, the repeatability of the operating conditions of the present invention is good.
3.采用本发明镀铑液，以及方法所获得的铑镀层光亮，抗变色性好。3. Adopt the rhodium plating solution of the present invention, and the rhodium coating obtained by the method is bright and has good discoloration resistance.
要说明的是，上述说明仅是对本发明较佳实施例的详细描述，叙述仅为说明本发明的可实现性及其突出效果，具体特征并不能用来作为对本发明的技术方案的限制，本发明的保护范围应以本发明所附权利要求书为准。It should be noted that the above description is only a detailed description of the preferred embodiments of the present invention, and the description is only to illustrate the realizability and outstanding effects of the present invention, and the specific features can not be used as limitations on the technical solutions of the present invention. The scope of protection of the invention should be based on the appended claims of the present invention.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105506685A (en) * | 2016-01-25 | 2016-04-20 | 东莞联桥电子有限公司 | Novel rhodanizing process for PCBs |
| CN107687008A (en) * | 2017-08-28 | 2018-02-13 | 立美珠宝服务（深圳）有限公司 | Electric Jinsui River and preparation method thereof |
Citations (2)
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|---|---|---|---|---|
| US1949131A (en) * | 1932-11-14 | 1934-02-27 | Thomas P Shields | Rhodium plating |
| CN1420948A (en) * | 1999-12-23 | 2003-05-28 | Omg电镀技术有限公司 | Bath for electrochemically depositing highly lustrous white rhodium coatings and whitening agent for same |
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- 2010-09-08 CN CN2010102769689A patent/CN101949043B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1949131A (en) * | 1932-11-14 | 1934-02-27 | Thomas P Shields | Rhodium plating |
| CN1420948A (en) * | 1999-12-23 | 2003-05-28 | Omg电镀技术有限公司 | Bath for electrochemically depositing highly lustrous white rhodium coatings and whitening agent for same |
Non-Patent Citations (2)
| Title |
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| 《材料保护》 20040930 曹人平等 镀铑工艺研究 23-24 1-6 第37卷, 第9期 2 * |
| 《江苏工业学院学报》 20070630 沈介发等 装饰性镀铑液的研究 26-29 1-6 第19卷, 第2期 2 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105506685A (en) * | 2016-01-25 | 2016-04-20 | 东莞联桥电子有限公司 | Novel rhodanizing process for PCBs |
| CN107687008A (en) * | 2017-08-28 | 2018-02-13 | 立美珠宝服务（深圳）有限公司 | Electric Jinsui River and preparation method thereof |
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