[go: up one dir, main page]

CN101837709B - Watermark type anti-counterfeiting pattern, manufacturing method thereof and anti-counterfeiting product with same - Google Patents

Watermark type anti-counterfeiting pattern, manufacturing method thereof and anti-counterfeiting product with same Download PDF

Info

Publication number
CN101837709B
CN101837709B CN 200910243052 CN200910243052A CN101837709B CN 101837709 B CN101837709 B CN 101837709B CN 200910243052 CN200910243052 CN 200910243052 CN 200910243052 A CN200910243052 A CN 200910243052A CN 101837709 B CN101837709 B CN 101837709B
Authority
CN
China
Prior art keywords
pattern
watermark
base layer
film
micrographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN 200910243052
Other languages
Chinese (zh)
Other versions
CN101837709A (en
Inventor
胡毓水
翟福甡
顾慧
马荣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
China Banknote Printing Technology Research Institute Co ltd
China Banknote Printing and Minting Group Co Ltd
Original Assignee
China Banknote Printing and Minting Corp
Institute of Printing Science and Technology Peoples Bank of China
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by China Banknote Printing and Minting Corp, Institute of Printing Science and Technology Peoples Bank of China filed Critical China Banknote Printing and Minting Corp
Priority to CN 200910243052 priority Critical patent/CN101837709B/en
Publication of CN101837709A publication Critical patent/CN101837709A/en
Application granted granted Critical
Publication of CN101837709B publication Critical patent/CN101837709B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Printing Methods (AREA)

Abstract

本发明公开了一种水印式防伪图纹的缩微图纹元素、具有缩微图纹的水印式防伪图纹及其制作方法、以及具有这种水印式防伪图纹的防伪制品。水印式防伪图纹的缩微图纹元素呈现缩微图案,所述缩微图纹元素包括:基层部分;以及视差部分,分布在所述基层部分中,与所述基层部分之间形成视觉差,同时保证所述缩微图纹元素呈现的所述缩微图案从整体视觉上来看是完整的。水印式防伪图纹包括一组缩微图纹元素,该组均布的缩微图纹元素构成缩微图纹阵列,其中:每个所述缩微图纹元素均呈现完整的缩微图案;所述缩微图纹阵列从整体上呈现:i)基层图案;以及,ii)水印图案。本发明的具有缩微图纹元素的水印式防伪图纹便于直观观察,同时提高了防伪性能。

Figure 200910243052

The invention discloses a micro-pattern element of a watermark anti-counterfeit pattern, a watermark anti-counterfeit pattern with a micro-pattern and a manufacturing method thereof, and an anti-counterfeit product with the watermark anti-counterfeit pattern. The micro-pattern element of the watermark anti-counterfeiting pattern presents a micro-pattern, and the micro-pattern element includes: a base layer part; The micropattern presented by the micropattern element is visually complete as a whole. The watermark anti-counterfeiting pattern includes a group of micro-pattern elements, and the group of evenly distributed micro-pattern elements constitutes a micro-pattern array, wherein: each of the micro-pattern elements presents a complete micro-pattern; the micro-pattern The array as a whole exhibits: i) the base layer pattern; and, ii) the watermark pattern. The watermark type anti-counterfeit pattern with micro-pattern elements of the present invention is convenient for visual observation and improves the anti-counterfeit performance at the same time.

Figure 200910243052

Description

Watermark type anti-counterfeiting pattern and preparation method thereof and the anti-counterfeiting product with it
Technical field
The present invention relates to a kind of anti-counterfeiting pattern and mask-making technology thereof, especially relate to a kind of watermark type anti-counterfeiting pattern miniature figure line element, have the watermark type anti-counterfeiting pattern and preparation method thereof of miniature figure line and the anti-counterfeiting product with this watermark type anti-counterfeiting pattern.
Background technology
Invisible false proof technique is applied to industry-by-industry so that product is carried out anti-counterfeiting mark, is convenient to the user and recognizes qualified products and imitation.Especially in seal paper money industry, the anti-counterfeiting technology of utilizing stealthy figure line to make watermark recovery is widely applied and is fast-developing.
Granted publication number discloses a kind of dynamic hidden antifalse pattern and preparation method thereof for the patent of invention of CN1830692, make stealthy figure line in pattern basic unit, form minimum shape and the maximum shape of stealthy figure line with uniform parallel lines, and so that being the contrast of 45-90 degree at wiring direction, the minimum shape of stealthy figure line and maximum shape arrange, and both line numbers are identical, be furnished with 2-6 root line in every millimeter, adopt the carved intaglio manufacture craft to make intaglio plate, version line severity control is in the 0.02-0.08mm scope, and perhaps the method with printing down corrosion die hard is produced on the figure line on the mould.
This design must be take lines as the basis, and pattern is formed in the product that very easily finds same characteristics in the money based article, and the complexity of hidden pattern and interference line, easily are disturbed, are difficult for observing during the anti-counterfeiting characteristics such as interpolation characteristic printing ink.
Summary of the invention
The object of the invention is to: a kind of watermark type anti-counterfeiting pattern that can intuitively observe and preparation method thereof, the miniature figure line element that is used for this watermark type anti-counterfeiting pattern and the anti-counterfeiting product with this watermark type anti-counterfeiting pattern are provided.
For achieving the above object, according to an aspect of the present invention, provide a kind of miniature figure line element of watermark type anti-counterfeiting pattern, presented miniature pattern, it is characterized in that, having comprised: basic unit's part; And the parallax part, be distributed in basic unit's part, and form sight equation between basic unit's part, guarantee that simultaneously the miniature pattern that miniature figure line element presents is complete in view of whole vision.
Wherein, a plurality of parallaxes partly are to be distributed in basic unit's part in interrupted mode, and at least a formation in the following manner: a) form the difference in height that is higher or lower than basic unit's part; B) form the aberration that is different from basic unit's part.
Wherein, the parallax part is made of uniform lines, reticulate pattern or piece.
According to another aspect of the present invention, provide a kind of watermark type anti-counterfeiting pattern, comprised one group of miniature figure line element, one group of miniature figure line element consists of miniature figure line array, and wherein: each miniature figure line element all presents complete miniature pattern; Miniature figure line array presents on the whole: i) basic unit's pattern; And, ii) watermark recovery, wherein, miniature figure line array forms one of in the following manner watermark recovery: the miniature figure line of the part element that 1) relates at least watermark recovery in the miniature figure line array adopts in the claim 1 to 3 each miniature figure line element, and the parallax by these miniature figure line elements partly comes to present watermark recovery from visual global, so that watermark recovery is white watermark pattern; 2) the miniature figure line of the part element that wherein relates at least basic unit's pattern in the miniature figure line array adopts in the claim 1 to 3 each miniature figure line element, and the parallax by these miniature figure line elements partly comes to present basic unit's pattern from visual global, is black watermark recovery and set off by contrast watermark recovery; 3) wherein the miniature figure line element in the miniature figure line array adopts in the claim 1 to 3 each miniature figure line element, and forms the watermark recovery of white watermark form by increasing (for example comprise and increase height or increase density) part corresponding to watermark recovery of basic unit's pattern; And 4) wherein the miniature figure line element in the miniature figure line array adopts in the claim 1 to 3 each miniature figure line element, and forms the watermark recovery of Heisui River impression formula by reducing (for example comprise reduce highly or reduce density) part corresponding to watermark recovery of basic unit's pattern.
Alternatively, in above-mentioned watermark type anti-counterfeiting pattern, each miniature figure line element in the whole miniature figure line element employing claim 1 to 3 in the miniature figure line array, the parallax at least a parameter partly that wherein relates to the miniature figure line of the part element of basic unit's pattern is different from the relevant parameter of the parallax part of the miniature figure line of the part that relates to watermark recovery element, makes between basic unit's pattern and the watermark recovery and forms parallax.
Wherein, the parameter of the parallax of miniature figure line element part comprise shape, size, density, angle, highly, color.
Wherein, basic unit's pattern and watermark recovery can be arbitrary shape and the content that comprises polygon, circle, character, landscape, personage.
Wherein, miniature pattern can be for comprising arbitrary shape and the content of polygon, circle, character, landscape dotted line, personage's dotted line.
Wherein, the shape of parallax in the live width of the miniature figure line element in the miniature figure line array of elements and/or miniature figure line element part, size, density, angle, highly, in the color at least one change, the parallax that brings by this variation is so that the content revealing of basic unit's pattern or watermark recovery goes out level.
In accordance with a further aspect of the present invention, provide a kind of preparation method of watermark type anti-counterfeiting pattern, having comprised: design watermark type anti-counterfeiting pattern; Based on making a plate about the layout of watermark type anti-counterfeiting pattern; And, utilize the forme that makes to make the watermark type anti-counterfeiting pattern, it is characterized in that: the watermark type anti-counterfeiting pattern comprises one group of miniature figure line element, this group is organized miniature figure line element and is consisted of miniature figure line array; Each miniature figure line element all presents complete miniature figure line; And miniature figure line array presents on the whole: i) basic unit's pattern; And, ii) watermark recovery; And miniature figure line array forms one of in the following manner watermark recovery: the miniature figure line of the part element that 1) relates at least watermark recovery in the miniature figure line array adopts in the claim 1 to 3 each miniature figure line element, and the parallax by these miniature figure line elements partly comes to present watermark recovery from visual global, so that watermark recovery is white watermark pattern; 2) the miniature figure line of the part element that wherein relates at least basic unit's pattern in the miniature figure line array adopts in the claim 1 to 3 each miniature figure line element, and the parallax by these miniature figure line elements partly comes to present basic unit's pattern from visual global, is black watermark recovery and set off by contrast watermark recovery; 3) wherein the miniature figure line element in the miniature figure line array adopts in the claim 1 to 3 each miniature figure line element, and forms the watermark recovery of white watermark form by the height corresponding to the part of watermark recovery that increases basic unit's pattern; And 4) wherein the miniature figure line element in the miniature figure line array adopts in the claim 1 to 3 each miniature figure line element, and forms the watermark recovery of Heisui River impression formula by the height corresponding to the part of watermark recovery that reduces basic unit's pattern.
In the method, the step of design watermark type anti-counterfeiting pattern comprises: the definite watermark effect that will make; And based on the design watermark effect, determine the form of basic unit's pattern and watermark recovery, wherein, if the watermark effect of making is white watermark, then in the step of the form of determining basic unit's pattern and watermark recovery, make corresponding to the parallax in the miniature figure line element of watermark recovery and partly form the difference in height that is lower than basic unit's part, if the watermark effect of making is the Heisui River seal, then in the step of the form of determining basic unit's pattern and watermark recovery, make corresponding to the parallax in the miniature figure line element of watermark recovery and partly form the difference in height that is higher than basic unit's part.
Further, in the step of the form of determining basic unit's pattern and watermark recovery based on the design watermark effect: if the watermark effect of making is white watermark, further comprise: the shape that 1) in basic unit, miniature figure line arrangement of elements is become basic unit's pattern, 2) copy miniature figure line element in basic unit's pattern to watermark layer, and 3) in the miniature figure line element of intending the formation watermark recovery, add the parallax part, guarantee simultaneously the complete of miniature pattern; If the watermark effect of making is the Heisui River seal, further comprise: the shape that 1) in basic unit, miniature figure line arrangement of elements is become basic unit's pattern, 2) in miniature figure line element, add the parallax part, guarantee simultaneously the complete of miniature figure, 3) copy miniature figure line element in the basic unit to watermark layer, and 4) the miniature figure line element in the watermark layer is removed the parallax part.
Wherein, determine that based on the design watermark effect step of the form of basic unit's pattern and watermark recovery further comprises: adjust the shape, size, density, angle of the live width of the miniature figure line element in the miniature figure line array of elements and/or the parallax in miniature figure line element part, highly, in the color at least one, the parallax that brings by at least one variation is so that the content revealing of basic unit's pattern or watermark recovery goes out level.
Preferably, in above method, after the step of design watermark type anti-counterfeiting pattern, also comprise: design separate mesh sheet, have the net type that presents strain line or grid on the separate mesh sheet, the separate mesh sheet with watermark type anti-counterfeiting pattern Construction designing pattern with for follow-up plate-making.
Wherein, in the separate mesh sheet, live width is greater than 0.025mm, and less than the live width of anti-counterfeiting pattern extra fine wire; Distance between centers of tracks is greater than 0.03mm, and less than the live width of the equidirectional extra fine wire of anti-counterfeiting pattern.For example, live width is between 0.025-0.01mm, and distance between centers of tracks is between 0.03-0.12mm.
Alternatively, in the step of making a plate based on the layout that comprises the watermark type anti-counterfeiting pattern, making a plate is film makeup, comprising: layout is outputed to film; Utilization is made master or forme with the film of layout by the printing down corrosion.
Preferably, plate-making is film makeup, in the situation that form watermark recovery in mode (4), one of the step of making a plate based on the layout that comprises the watermark type anti-counterfeiting pattern comprises: make film, in the following ways: mode 4.1.a): basic unit's pattern and watermark recovery are outputed to the first film; The separate mesh sheet is outputed to the second film; Or mode 4.1.b): basic unit's pattern is outputed to the first film; With watermark recovery place part with complete black formal output to the second film, the part screening beyond the watermark recovery; Watermark recovery is outputed to the 3rd film, the part screening at watermark recovery place; One of make master or forme, in the following ways: mode 4.2.a): in master or forme, make basic unit's pattern and watermark recovery according to the first film by the printing down corrosion first; Corrode the part of in forme, deepening corresponding to basic unit's pattern and watermark recovery by printing down according to the second film again, and make it to keep complete; Or mode 4.2.b): in master or forme, make basic unit's pattern according to the first film by the printing down corrosion first; In master or forme, make basic unit's pattern have predetermined altitude according to the second film by printing down corrosion again, deepen simultaneously wherein the part corresponding to watermark recovery; Then in master or forme, make watermark recovery by the printing down corrosion according to the 3rd film.
Wherein, with mode 4.1.a) make in the step of film, can increase many films between the second film and the 3rd film, the content of exporting on these many films is: watermark recovery place part is complete black form, partially transparent beyond the watermark recovery.
Preferably, plate-making is film makeup, in the situation that form watermark recovery in mode (3), one of the step of making a plate based on the layout that comprises the watermark type anti-counterfeiting pattern comprises: make film, in the following way: mode 3.1.a): basic unit's pattern and watermark recovery are outputed to the first film; The separate mesh sheet is outputed to the second film; Or mode 3.1.b): basic unit's pattern is outputed to the first film; With watermark recovery part screening, the part beyond the watermark recovery is with complete black formal output to the three films; Watermark recovery is outputed to the second film with transparent form, the part screening beyond the watermark recovery; One of make master or forme, in the following ways: mode 3.2.a): in master or forme, make basic unit's pattern and watermark recovery according to the first film by the printing down corrosion first; In forme, deepen the part of basic unit's pattern and watermark recovery according to the second film by the printing down corrosion again, and make it to keep complete; Or mode 3.2.b): in master or forme, make basic unit's pattern according to the first film by the printing down corrosion first; In master or forme, make watermark recovery have predetermined altitude by printing down corrosion according to the 3rd film again, deepen simultaneously wherein the part corresponding to basic unit's pattern; Then in master or forme, make basic unit's pattern according to the second film by the printing down corrosion.
Wherein, with mode 3.2.a) make in the step of film, can increase many films between the second film and the 3rd film, the content of exporting on these many films is: watermark recovery place part is transparent form, part be entirely to deceive form beyond the watermark recovery.
Preferably, in the step of design separate mesh sheet: for the different levels of basic unit's pattern and watermark recovery, corresponding a plurality of different separate mesh sheets are provided, each separate mesh sheet has respectively dissimilar net type, in order to the difference in height between the version line degree of depth, watermark recovery and basic unit's pattern on the printing down corrosion time control seal carving version and the inking of forme.
Alternatively, in the step of making a plate based on the layout that comprises the watermark type anti-counterfeiting pattern, making a plate is engraving plate-making, comprising: the three-dimensional data of layout is outputed to execution laser engraving or the micro-machined platemaking equipment of numerical control; Platemaking equipment is made master or forme or pad pasting based on the three-dimensional data of layout by the engraving that carries out with laser engraving or the little processing mode of numerical control.
According to a further aspect of the invention, provide a kind of anti-counterfeiting product, had substrate, substrate can be paper, labeling, pad pasting, metallograph, alloy version, film etc., it is characterized in that having above each said watermark type anti-counterfeiting pattern on the substrate.
Alternatively, but in the parallax part of the miniature figure line element of watermark type anti-counterfeiting pattern, be added with for false proof identification marking thing.
Wherein, but the identification marking thing is visible or hiding data, image information or magnetic ink.
Wherein, the printing ink that is used for printing watermark formula anti-counterfeiting pattern is chosen as and presents different colors under different viewing angle.
The present invention has following technique effect:
1. the miniature figure line element of watermark type anti-counterfeiting pattern of the present invention comprises the parallax part, can be so that miniature figure line element embodies whole sight equations different when not having the parallax part, thereby when being used for being arranged in watermark recovery, can observe intuitively watermark recovery.
2. the notable feature of watermark type anti-counterfeiting pattern of the present invention is that basic unit's pattern and watermark recovery are that miniature figure line element by the miniature characteristic of tool consists of, like this, can be intuitively on carrier and intactly represent the global design pattern of basic unit's pattern, watermark recovery and these three kinds of patterns of miniature pattern, increased anti-counterfeiting performance.
3. the preparation method of watermark type anti-counterfeiting pattern of the present invention is utilized the variation of the parallax element (for example colourless element) of miniature figure line inside, cooperate different mask-making technologies, according to ink characteristics surface modification screening net type, the characteristic of combined high precision printing machine, the integrality of assurance figure line.
Should be appreciated that, above generality is described and the following detailed description is all enumerated and illustrative, and purpose is for to the claimed further instruction that the invention provides.
Description of drawings
Accompanying drawing consists of the part of this specification, is used for helping further to understand the present invention.These accompanying drawings have been described some embodiments of the present invention, and are used for together illustrating principle of the present invention in specification.Structure identical in the accompanying drawing represents with identical label.
Fig. 1 is according to the first embodiment of the present invention, the demonstration figure directly perceived when the watermark type anti-counterfeiting pattern is the white watermark effect;
Fig. 2 is the partial enlarged drawing of the I section among Fig. 1, shows the amplification effect of the miniature figure line element in basic unit's pattern and the white watermark pattern;
Fig. 3 is the partial section for the master of the white watermark anti-counterfeiting pattern of construction drawing 1 or forme and the money that produces, wherein shows the microstructure corresponding with the miniature figure line element of white watermark pattern among Fig. 1;
Fig. 4 utilizes the printing down etching process that forme is carried out the schematic diagram that screening is processed in the gravure plate-making method;
Fig. 5 is according to a second embodiment of the present invention, the demonstration figure directly perceived when the watermark type anti-counterfeiting pattern is Heisui River seal effect;
Fig. 6 is the partial enlarged drawing of the II section among Fig. 5, shows the amplification effect of the miniature figure line element in basic unit's pattern and the black watermark recovery;
Fig. 7 is the partial section for the forme of Heisui River of construction drawing 5 seal anti-counterfeiting pattern and the money that produces, wherein shows the microstructure corresponding with the miniature figure line element of black watermark recovery among Fig. 5;
Fig. 8 utilizes the direct mask-making technology of laser engraving to make the Heisui River that is used for Fig. 5 to print the master of anti-counterfeiting pattern or the method for forme;
Fig. 9 is a third embodiment in accordance with the invention, applies the design sketch of different qualities printing ink in the method for making the watermark type anti-counterfeiting pattern at forme;
Figure 10 is a fourth embodiment in accordance with the invention, the design sketch of a kind of available mode of texturing of watermark type anti-counterfeiting pattern.
Figure 11 is according to the of the present invention the 5th and the 6th embodiment, the schematic diagram of the first used film in the method for making the watermark type anti-counterfeiting pattern;
Figure 12 is the schematic diagram of the second used film of the 5th embodiment;
Figure 13 shows the content of watermark the 3rd film screening pattern among the 5th embodiment;
Figure 14 is Heisui River seal design sketch according to a fifth embodiment of the invention;
Figure 15 is the schematic diagram of the 3rd used film of the 6th embodiment;
Figure 16 is the schematic diagram of the second used film of the 6th embodiment;
Figure 17 is white watermark design sketch according to a sixth embodiment of the invention.
The specific embodiment
Watermark is to need the extensive a kind of false proof means that adopt on the false proof article such as money, bill and ticket etc.
On this type of anti-counterfeiting product, that pattern that printing opacity is seen in paper is referred to as watermark recovery.If on the surface of paper, form the pattern of the observing effect that is similar to watermark with printing means, this printed patterns can be referred to as " watermark type pattern ", and the figure line that comprises this " watermark type pattern " can be referred to as " watermark type anti-counterfeiting pattern (picture and text) ".Among the application, " watermark recovery " that comprises in the watermark type anti-counterfeiting pattern namely refers to this " watermark type pattern ", and what alleged " white (deceiving) watermark anti-counterfeiting figure line " referred in the literary composition also is " white (deceiving) watermark type anti-counterfeiting pattern ".
Below in conjunction with accompanying drawing, specific embodiments of the invention are described.
Embodiment 1: the white watermark anti-counterfeiting pattern
Referring to Fig. 1, Fig. 2, Fig. 3, Fig. 4, the situation the when watermark effect of watermark type anti-counterfeiting pattern is white watermark describes.
Make the watermark type anti-counterfeiting pattern and be divided into design, plate-making, printing three phases.
(1) design:
1) at first determine to intend forming the white watermark effect, such as Fig. 1, the white watermark design sketch is Bank of China's Bureau sign.If be Heisui River seal effect, when then designing so that only need the back the 4th) make the internal morphology of miniature figure line element opposite in the point.
2) area, the designing requirement that provides in the finished product according to anti-counterfeiting product (such as various moneys, the substrate of anti-counterfeiting product can adopt paper, labeling, pad pasting, metallograph, alloy version, film etc.) determines that the pattern A of basic unit and watermark type security pattern B intend the form that intuitively represents.Such as Fig. 1, can provide the area of 4.8mmx15mm to be put in design original text position in the finished product, intuitively representing the pattern A of basic unit is that square form, watermark recovery B are Bank of China's Bureau sign form.
3) analysis-by-synthesis mask-making technology, printing machine precision and ink characteristics, minimum shape (live width and height) and colourless element part (parallax part) shared proportion of determining to draw up and making miniature figure line.For example, intend the printing down etching process with film makeup shown in Figure 4, for this reason, referring to Fig. 2, in layout, the live width of miniature figure line can be decided to be more than or equal to 0.04mm, highly more than or equal to 0.02mm, colourless element part proportion scope in the miniature figure line element of whole white watermark part is more than 1/2nd.
4) in basic unit, miniature figure line arrangement of elements is become the shape of the pattern A of basic unit, copy among the pattern A of basic unit miniature figure line array of elements to watermark recovery B layer, guarantee the complete of miniature figure when in the miniature figure line that intend to form the watermark effect pattern, adding colourless element (lines or colourless reticulate pattern or without color lump etc., direction is 0 °-180 °).This mode that forms the miniature pattern of watermark part by copying miniature figure line array of elements among the pattern A of basic unit to the watermark recovery layer is suitable for miniature figure line in basic unit and the watermark layer and is the situation of same figure line, for example is miniature " 10 " word.In the present embodiment, the orientation of colourless element part can be 0 °.
If the miniature figure line that adopts in basic unit and the watermark layer is different, for example in basic unit, adopt miniature figure line " 10 ", and in watermark layer, adopt miniature figure line " 20 ", at this moment then can not need to adopt above-mentioned copy mode, but can directly design the miniature figure line array in the watermark layer.Vice versa.
With above-mentioned steps 4) in the design drawing line export by transparent film.
5) as required, can also further design independently net sheet 30 (as shown in Figure 4) again, consist of horizontal line or trellis etc., coloured live width is controlled between the 0.025mm-0.01mm, and white spacing is between the 0.03mm-0.12mm, and area is greater than basic unit's pattern.Coloured live width on the net sheet is used for forming latticed projection at the space of a whole page of forme, with better inking.Certainly, as required, also the sheet of throwing the net can be set more, to reach better effect.
(2) plate-making:
Transparent film plate-making is made the carved gravure version with the printing down etching process, and gravure line depth difference is controlled at more than the 0.02mm.
Referring to Fig. 3.Illustrated among Fig. 3 and be used for making above-mentioned steps 4) master or the space of a whole page cross-section structure of forme 10 and the printing cross-section structure of money 20 of the white watermark anti-counterfeiting pattern that designs.Wherein, higher the first protuberance M0 of the first darker recess N0 in master or the forme 10 and the height in the money 20 is corresponding to basic unit's part of the miniature figure line element at white watermark place, and lower the second protuberance M0 ' of the second more shallow recess N0 ' in master or the forme 10 and the height in the money 20 is corresponding to the colourless element part of the miniature figure line element at white watermark place.
(3) printing:
Adopt gravure printing, thereby can be made at the substrate such as money the white watermark anti-counterfeiting pattern.
Embodiment 2: Heisui River seal anti-counterfeiting pattern
Referring now to Fig. 5, Fig. 6, Fig. 7, Fig. 8,, the situation the when watermark effect of watermark type anti-counterfeiting pattern is the Heisui River seal describes.
(1) design:
1) determine to intend forming Heisui River seal effect, such as Fig. 5, Heisui River seal design sketch is the Chinese character " coin " that watermark recovery B presents.
2) can provide certain area to be put in design original text position in the finished product, intuitively represent the form of the pattern A of basic unit and the form of watermark recovery B.
3) intend with direct mask-making technology (Fig. 8), determine gravure printing machine and gravure China ink, the live width of miniature figure line is decided to be more than or equal to 0.04mm, height more than or equal to 0.03mm.
4) in basic unit, miniature figure line arrangement of elements is become the shape of the pattern A of basic unit, in miniature figure line, add colourless element (lines or colourless reticulate pattern or without color lump etc., coloured and colourless element accounting example is 2: 1), direction is 0 °-180 °, guarantee simultaneously the complete of miniature figure, copy miniature figure line array of elements in the pattern A of the basic unit layer to watermark recovery B layer, the miniature figure line in the watermark recovery B layer is removed colourless element.
Adding network process only uses when the technique of film makeup, directly in the technique of plate-making, if necessary, the data of relevant separate mesh sheet can be set before engrave, but go out for the outstanding reticulate pattern of strengthening inking with regard to direct engraving in the forme behind engraving like this, independent screening net sheet need not be provided.
(2) plate-making:
Direct plate-making three-dimensional data be set be 45 ° of laser angles or 90 °, the degree of depth is 0.03mm-0.12mm (these two layer depth of the patterned layer A of basic unit and watermark recovery layer B is poor for more than the 0.04mm), further, can arrange and hold China ink layer (namely working the plinthitic horizon of strengthening the inking effect) 0.01mm-0.04mm, hold 30 ° to 90 ° of the angles of China ink layer reticulate pattern, carved gravure master or forme, structure is Fig. 7,8, as can be seen from Figure 8, holding a China ink layer reticulate pattern has added and has been located at the master surface.Recessed master through after operation be used for printing after being processed into forme, the finished product cross-section structure after the printing is shown in the money 20 among Fig. 7.Gravure can directly be printed after later operation processing.
Referring to Fig. 7.Having illustrated among Fig. 7 and be used for making above-mentioned steps 4) Heisui River of design prints the space of a whole page cross-section structure of forme 10 of anti-counterfeiting pattern and the printing cross-section structure of money 20.Wherein, higher the first protuberance M0 of the first darker recess N0 in the forme 10 and the height in the money 20 is corresponding to basic unit's part of the miniature figure line element of Heisui River Yin Chu, and lower the second protuberance M0 ' of the second more shallow recess N0 ' in the forme 10 and the height in the money 20 is corresponding to the colourless element part of the miniature figure line element of Heisui River Yin Chu.
(3) printing:
Adopt gravure printing, thereby can be made at the substrate such as money Heisui River seal anti-counterfeiting pattern.
Embodiment 3: add security feature in the seal anti-counterfeiting pattern of Heisui River
Referring to Fig. 9, the situation of adding security feature in the seal anti-counterfeiting pattern of Heisui River is described.
(1) design:
1) determine to intend forming Heisui River seal effect, such as Fig. 5 effect, Heisui River seal design sketch is Bank of China's Bureau sign that watermark recovery B presents.
2) can provide certain area to be put in design original text position in the finished product, intuitively represent the form of the pattern A of basic unit and the form of watermark recovery B.
3) intend with direct mask-making technology (Fig. 8), determine gravure printing machine and gravure China ink, the live width of miniature figure line is decided to be more than or equal to 0.04mm, height more than or equal to 0.03mm.
4) in basic unit with the miniature shape that is arranged in pattern A, in miniature pattern, add colourless element (lines or colourless reticulate pattern or without color lump etc., coloured and colourless element accounting example is 4: 1), direction is 0 °, 180 °, guarantee simultaneously the complete of miniature figure, copy miniature figure line among the pattern A of basic unit to watermark recovery B layer, the watermark of watermark recovery B layer inside contracts micro element and removes colourless element.
5) make two look masterplates with the method for film or directly plate-making.
As shown in Figure 9, have on the first look masterplate 40 on the first characteristic printing ink 45, the second look masterplates 50 and have the second characteristic printing ink 55.The first or second characteristic can be the various physical characteristics that can directly or indirectly identify such as color, magnetic, spectrum.Can apply at the different parts of forme 10 (be Fig. 8 10) printing ink of different qualities by the look masterplate, to increase security feature.
In practice, can design by the configuration of printing machine more look masterplate.
(2) plate-making:
It is 45 ° to 63 ° of laser angles that direct plate-making three-dimensional data is set, and the degree of depth is 0.03mm-0.12mm (two-layer depth difference is more than the 0.04mm).Further, can arrange and hold China ink layer 0.01mm, 90 ° of angles, carved gravure master or forme, structure is Fig. 7,8.Recessed master through after operation turn over the plating forme after processing can be for printing, gravure can directly be printed after later operation processing.Forme 10 has been shown among Fig. 9.
(3) printing:
Utilize above-mentioned at least two look masterplates 40 and 50, be respectively forme 10 ink supply, to print at intaglio printing press.The different information that comprise in the different qualities printing ink can detect by specific instrument and read, and improve anti-counterfeiting performance thereby increase.
In addition, can select the characteristic of different China inks to the printing ink that is used for printing watermark formula anti-counterfeiting pattern, so that under different viewing angles, present different colors, for example, spin upside down changeable colour.
Embodiment 4: the meticulous variation of using miniature figure line element line in the watermark type anti-counterfeiting pattern
Referring to Figure 10, show the meticulous variation of in the watermark type anti-counterfeiting pattern, using miniature figure line element line and change with the level that represents basic unit's pattern and watermark recovery.
(1) design:
1) determine to intend forming the white watermark effect, such as Figure 10, the white watermark design sketch is the Chinese character " coin " that watermark recovery B presents.
2) can provide certain area to be put in design original text position in the finished product, intuitively represent the form of the pattern A of basic unit and the form of watermark recovery B.
3) intend with direct mask-making technology (Fig. 8), determine gravure printing machine and gravure China ink, the live width of miniature figure line is decided to be 0.04mm-0.12mm, height greater than 0.01mm.
4) design width of cloth gray-scale map or a binary map in basic unit, utilize form and aspect to change the shape that miniature figure line arrangement of elements is become the pattern A of basic unit, copy miniature figure line among the pattern A of basic unit to watermark recovery B layer, colourless element part (lines or colourless reticulate pattern or without color lump etc. will be added in the miniature figure line on the watermark recovery B layer, coloured and colourless element accounting example is 3: 1), direction is 0 °, guarantees simultaneously the complete of miniature figure.Structure such as Figure 10, local enlarging section C among Figure 10 show shape by the parallax in the live width of adjusting the miniature figure line element in the miniature figure line array of elements and/or miniature figure line element part, size, density, angle, highly, in the color at least one can bring visual difference, thereby so that the content revealing of basic unit's pattern or watermark recovery goes out level.In the practice, the adjustment of the visual effect of figure line can by false proof software (for example drawing the Layout+ of (Jura) company as Hungary is excellent, the softwares such as Fortuna of the dotrix department of Ai Kefa (Agfa) company) to the shape of the live width of miniature figure line element and/or the part of the parallax in the miniature figure line element, size, density, angle, highly, color automatically adjusts and realizes.
(2) plate-making:
It is 60 °-63 ° of laser angles that direct plate-making three-dimensional data is set, and the degree of depth is 0.01mm-0.10mm (two-layer depth difference is more than the 0.04mm), hold China ink layer 0.01mm, 0 ° of angle, carved gravure master or forme.Recessed master through after operation turn over the plating forme after processing can be for printing, gravure can directly be printed after later operation processing.
(3) printing:
Adopt gravure printing, make the white watermark anti-counterfeiting pattern, and in basic unit's pattern and watermark recovery, show stereovision, thereby play antifalse effect better.
Embodiment 5 and embodiment 6 utilize unobstructed, the different principle of the inside and outside height of watermark to form respectively two embodiment black, white watermark pattern, and referring to Figure 11-17, in this embodiment, the pattern A of basic unit is the landscape pattern, and watermark recovery B is literal " CBPMC ".
Embodiment 5: simulating black watermark effect (film printing down mode)
As shown in figure 11, form the pattern A of basic unit at the first film F1, the pattern A of basic unit is rendered as gravure cutting with landscape, personage etc., is formed by the combination of the multiple miniature figure line element (M1 among the figure, M2, M3 etc.) that comprises little line segment and straight line.Miniature figure line element M 1 is oblique grid wider among the figure, and miniature figure line element M 2 is oblique grid (plagioclase bar) narrower among the figure, and miniature figure line element M 3 is the pattern part of the roughly Wall bricks shape among the figure.
As described in Figure 12, on the second film F2, form watermark recovery B (being about to described watermark recovery place part entirely to deceive formal output to the second film) with complete black form.Watermark recovery is the watermark layer pattern and character " CBPMC " shown in Figure 13, and the part outside the upper literal of the second film F2 forms net.In the specific implementation, obvious for guaranteeing the watermark shape, can suitably enlarge watermark recovery.
As described in Figure 13, form the watermark recovery B of the written form corresponding with the second film at the 3rd film F3, the part at the literal place forms net.
In the specific implementation, can increase many films between the second film and the 3rd film, output content is: watermark recovery place part is complete black form, partially transparent beyond the described watermark recovery.
Making master (is mother matrix, can be used for making forme) or during forme, utilize first the first film F1 in master or forme, to make landscape, recycle the second film F2 and make it to have predetermined altitude by the printing down corrosion described basic unit of intensification pattern in master or forme, but do not deepen wherein the part corresponding to watermark recovery, and then utilize the 3rd film F3 in master or forme, to make described watermark recovery by the printing down corrosion, so that be higher than landscape part (height that for example makes the residing aspect ratio of literal degree of depth basic unit pattern greater than 20um more than) at word segment on master or the forme, master or forme side are Fig. 7, thereby form the Heisui River seal effect that word segment is higher than the landscape part when printing, printing effect as shown in figure 14.
In addition, as a kind of easier mode, in practice, also basic unit's pattern and watermark recovery all can be outputed on first film, and a separate mesh sheet is outputed to the second film.
In this case, when making master or forme, in master or forme, make described basic unit pattern and watermark recovery according to described the first film by the printing down corrosion first, and then in forme, deepen the part of described basic unit pattern and watermark recovery according to described the second film by printing down corrosion, and make it to keep complete.
Embodiment 6: simulation white watermark effect (film printing down mode)
As the same manner as in Example 5, form the pattern A of basic unit at the first film F1 (seeing Figure 11).Emphasize watermark recovery B at the second film F2 (seeing Figure 16), the part screening beyond the watermark recovery.Form watermark recovery B, the part screening at watermark recovery place at the 3rd film F3 (seeing Figure 15).In the specific implementation, obvious for guaranteeing the watermark shape, can suitably enlarge watermark recovery.
As different from Example 5, when making master or forme, after making basic unit's pattern according to the first film F1, utilize first the 3rd film F3 to make literal, recycle the second film F2 and make landscape, so that be lower than landscape part (the residing height of the aspect ratio literal degree of depth that for example makes basic unit's pattern greater than 20um more than) at word segment on the forme, master or forme side are Fig. 3, thereby form the white watermark effect that word segment is lower than the landscape part when printing, printing effect as shown in figure 17.
In addition, as a kind of easier mode, in practice, also basic unit's pattern and watermark recovery all can be outputed on first film, and a separate mesh sheet is outputed to the second film.
In this case, when making master or forme, in master or forme, make described basic unit pattern and watermark recovery according to described the first film by the printing down corrosion first, and then in forme, deepen the part of described basic unit pattern and watermark recovery according to described the second film by printing down corrosion, and make it to keep complete.
Can know, embodiment 5 and 6 also can adopt direct mask-making technology.For example, to form the white watermark effect shown in the embodiment as example, when adopting direct plate-making mode, can the degree of depth inside and outside the literal be set by the figure requirement, for example, the degree of depth of word segment (watermark recovery B) is set to 5um-40um, and the degree of depth of landscape part (the pattern A of basic unit) is set to 60um-80um.Like this, can be deeper than the landscape part by the word segment of direct platemaking equipment output on master or forme, the forme side is Fig. 3, thereby is lower than the landscape part at the money formation word segment of printing, thereby presents white watermark printing effect as shown in figure 17.
Being the preferred embodiments of the present invention only below, is not that for a person skilled in the art, the present invention can have various modifications and variations for restriction the present invention.All any modifications of making within the spirit and principles in the present invention, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.

Claims (26)

1.一种水印式防伪图纹的缩微图纹元素,呈现缩微图案,其特征在于,包括:1. A watermark type anti-counterfeit pattern micro-pattern element, which presents a micro-pattern, is characterized in that it includes: 基层部分;以及the grassroots part; and 视差部分,分布在所述基层部分中,与所述基层部分之间形成视觉差,同时保证所述缩微图纹元素呈现的所述缩微图案从整体视觉上来看是完整的。The parallax part, distributed in the base layer part, forms a visual difference with the base layer part, and at the same time ensures that the miniature pattern presented by the miniature pattern element is visually complete as a whole. 2.根据权利要求1所述的水印式防伪图纹的缩微图纹元素,其特征在于,多个所述视差部分是以断续方式分布在所述基层部分中,并且通过以下方式中的至少一种构成:2. The micrographic element of the watermark type anti-counterfeiting pattern according to claim 1, characterized in that, a plurality of the parallax parts are distributed in the base layer part in an intermittent manner, and by at least one of the following methods A composition: a)形成高于或低于所述基层部分的高度差;a) creating a height difference above or below said base layer portion; b)形成不同于所述基层部分的色差。b) Forming a color difference different from the base layer portion. 3.根据权利要求1或2所述的水印式防伪图纹的缩微图纹元素,其特征在于,所述视差部分由均布的线条、网纹或块构成。3. The miniature pattern element of watermark anti-counterfeit pattern according to claim 1 or 2, characterized in that, the parallax part is composed of evenly distributed lines, meshes or blocks. 4.一种水印式防伪图纹,其特征在于,包括一组缩微图纹元素,所述一组缩微图纹元素构成缩微图纹阵列,其中:4. A watermark type anti-counterfeiting pattern, characterized in that it includes a group of micrographic elements, and the group of micrographic elements constitutes a micrographic array, wherein: 每个所述缩微图纹元素均呈现完整的缩微图案;each of said micrographic elements presents a complete micrographic pattern; 所述缩微图纹阵列从整体上呈现:i)基层图案;以及,ii)水印图案,The micropattern array as a whole exhibits: i) a base layer pattern; and, ii) a watermark pattern, 其中,所述缩微图纹阵列以下述方式之一形成所述水印图案:Wherein, the micropattern array forms the watermark pattern in one of the following ways: 1)所述缩微图纹阵列中至少涉及所述水印图案的部分所述缩微图纹元素采用权利要求1到3中任一项所述的缩微图纹元素,并且通过这些缩微图纹元素的视差部分来从视觉整体上呈现所述水印图案,使得所述水印图案为白水印图案;1) In the micropattern array, at least part of the micropattern elements related to the watermark pattern adopts the micropattern elements described in any one of claims 1 to 3, and through the parallax of these micropattern elements partially presenting the watermark pattern visually as a whole, so that the watermark pattern is a white watermark pattern; 2)其中所述缩微图纹阵列中至少涉及所述基层图案的部分所述缩微图纹元素采用权利要求1到3中任一项所述的缩微图纹元素,并且通过这些缩微图纹元素的视差部分来从视觉整体上呈现所述基层图案,而反衬所述水印图案为黑水印图案;2) wherein in the micropattern array, at least part of the micropattern elements related to the base layer pattern adopts the micropattern elements described in any one of claims 1 to 3, and through the micropattern elements The parallax part is used to visually present the base layer pattern as a whole, while contrasting the watermark pattern as a black watermark pattern; 3)其中所述缩微图纹阵列中的所述缩微图纹元素采用权利要求1到3中任一项所述的缩微图纹元素,并且通过增加所述基层图案的对应于所述水印图案的部分而形成白水印形式的所述水印图案;以及3) The micrographic element in the micrographic array adopts the micrographic element described in any one of claims 1 to 3, and by adding the base layer pattern corresponding to the watermark pattern partially forming said watermark pattern in the form of a white watermark; and 4)其中所述缩微图纹阵列中的所述缩微图纹元素采用权利要求1到3中任一项所述的缩微图纹元素,并且通过降低所述基层图案的对应于所述水印图案的部分而形成黑水印形式的所述水印图案。4) Wherein the micrographic element in the micrographic array adopts the micrographic element described in any one of claims 1 to 3, and by reducing the base layer pattern corresponding to the watermark pattern part to form said watermark pattern in the form of a black watermark. 5.根据权利要求4所述的水印式防伪图纹,其特征在于,所述缩微图纹阵列中的全部所述缩微图纹元素采用权利要求1到3中任一项所述的缩微图纹元素,其中涉及所述基层图案的部分所述缩微图纹元素的视差部分的至少一种参数不同于涉及所述水印图案的部分所述缩微图纹元素的视差部分的相应参数,使所述基层图案与所述水印图案之间形成视差。5. The watermark anti-counterfeiting pattern according to claim 4, characterized in that, all the elements of the micrographic pattern in the micrographic pattern array adopt the micrographic pattern described in any one of claims 1 to 3. element, wherein at least one parameter of the parallax portion of said microtexture element relating to a portion of said base layer pattern differs from a corresponding parameter of a parallax portion of said microtexture element relating to a portion of said watermark pattern, such that said base layer A parallax is formed between the pattern and the watermark pattern. 6.根据权利要求4或5所述的水印式防伪图纹,其特征在于,所述缩微图纹元素的视差部分的参数包括形状、大小、疏密、角度、高度、色彩。6. The watermark anti-counterfeiting pattern according to claim 4 or 5, characterized in that, the parameters of the parallax part of the miniature pattern elements include shape, size, density, angle, height, and color. 7.根据权利要求4或5所述的水印式防伪图纹,其特征在于,所述基层图案和所述水印图案可以为包括多边形、圆形、字符、风景、人物在内的任意形状和内容。7. The watermark anti-counterfeiting pattern according to claim 4 or 5, characterized in that, the base layer pattern and the watermark pattern can be any shape and content including polygons, circles, characters, landscapes, and characters . 8.根据权利要求4或5中所述的水印式防伪图纹,其特征在于,所述缩微图案可以为包括多边形、圆形、字符、风景点线、人物点线在内的任意形状和内容。8. According to the watermark anti-counterfeiting pattern described in claim 4 or 5, it is characterized in that the miniature pattern can be any shape and content including polygons, circles, characters, landscape points and lines, and character points and lines . 9.根据权利要求4或5中所述的水印式防伪图纹,其特征在于,所述缩微图纹元素阵列中的缩微图纹元素的线宽和/或所述缩微图纹元素中的视差部分的形状、大小、疏密、角度、高度、色彩中的至少一项是变化的,通过该变化带来的视差使得所述基层图案或所述水印图案的内容展现出层次。9. The watermark anti-counterfeiting pattern according to claim 4 or 5, characterized in that, the line width of the micrographic elements in the micrographic element array and/or the parallax in the micrographic elements At least one of the shape, size, density, angle, height, and color of the part is changed, and the parallax brought about by the change makes the content of the base layer pattern or the watermark pattern show layers. 10.一种水印式防伪图纹的制作方法,包括:10. A method for making a watermark anti-counterfeiting pattern, comprising: 设计水印式防伪图纹;Design watermark anti-counterfeiting patterns; 基于关于所述水印式防伪图纹的设计图案进行制版;以及plate-making based on the design pattern about the watermark anti-counterfeiting pattern; and 利用制得的印版来制作所述水印式防伪图纹,Utilize the obtained printing plate to make the watermark type anti-counterfeiting pattern, 其特征在于:It is characterized by: 所述水印式防伪图纹包括一组缩微图纹元素,该组缩微图纹元素构成缩微图纹阵列;The watermark anti-counterfeiting pattern includes a group of micro-pattern elements, and the group of micro-pattern elements constitutes a micro-pattern array; 每个所述缩微图纹元素均呈现完整的缩微图纹;以及,所述缩微图纹阵列从整体上呈现:i)基层图案;以及,ii)水印图案;以及Each of said micrographic elements exhibits a complete micrographic; and, said micrographic array as a whole exhibits: i) a base layer pattern; and, ii) a watermark pattern; and 所述缩微图纹阵列以下述方式之一形成所述水印图案:The micropattern array forms the watermark pattern in one of the following ways: 1)所述缩微图纹阵列中至少涉及所述水印图案的部分所述缩微图纹元素采用权利要求1到3中任一项所述的缩微图纹元素,并且通过这些缩微图纹元素的视差部分来从视觉整体上呈现所述水印图案,使得所述水印图案为白水印图案;1) In the micropattern array, at least part of the micropattern elements related to the watermark pattern adopts the micropattern elements described in any one of claims 1 to 3, and through the parallax of these micropattern elements partially presenting the watermark pattern visually as a whole, so that the watermark pattern is a white watermark pattern; 2)其中所述缩微图纹阵列中至少涉及所述基层图案的部分所述缩微图纹元素采用权利要求1到3中任一项所述的缩微图纹元素,并且通过这些缩微图纹元素的视差部分来从视觉整体上呈现所述基层图案,而反衬所述水印图案为黑水印图案;2) wherein in the micropattern array, at least part of the micropattern elements related to the base layer pattern adopts the micropattern elements described in any one of claims 1 to 3, and through the micropattern elements The parallax part is used to visually present the base layer pattern as a whole, while contrasting the watermark pattern as a black watermark pattern; 3)其中所述缩微图纹阵列中的所述缩微图纹元素采用权利要求1到3中任一项所述的缩微图纹元素,并且通过增加所述基层图案的对应于所述水印图案的部分的高度而形成白水印形式的所述水印图案;以及3) The micrographic element in the micrographic array adopts the micrographic element described in any one of claims 1 to 3, and by adding the base layer pattern corresponding to the watermark pattern the height of the portion to form said watermark pattern in the form of a white watermark; and 4)其中所述缩微图纹阵列中的所述缩微图纹元素采用权利要求1到3中任一项所述的缩微图纹元素,并且通过降低所述基层图案的对应于所述水印图案的部分的高度而形成黑水印形式的所述水印图案。4) Wherein the micrographic element in the micrographic array adopts the micrographic element described in any one of claims 1 to 3, and by reducing the base layer pattern corresponding to the watermark pattern The height of the part forms the watermark pattern in the form of a black watermark. 11.根据权利要求10所述的水印式防伪图纹的制作方法,其特征在于,其中设计水印式防伪图纹的步骤包括:11. The method for making a watermark-type anti-counterfeit pattern according to claim 10, wherein the step of designing a watermark-type anti-counterfeit pattern comprises: 确定要制作的水印效果;以及determine the watermark effect to be produced; and 基于设计水印效果,确定基层图案和水印图案的形态,Based on the designed watermark effect, determine the shape of the base layer pattern and watermark pattern, 其中,如果要制作的水印效果为白水印,则在确定基层图案和水印图案的形态的步骤中,使对应于水印图案的缩微图纹元素中的视差部分形成低于所述基层部分的高度差,Wherein, if the watermark effect to be produced is a white watermark, in the step of determining the shape of the base layer pattern and the watermark pattern, the parallax portion in the micrographic element corresponding to the watermark pattern forms a height difference lower than the base layer portion , 如果要制作的水印效果为黑水印,则在确定基层图案和水印图案的形态的步骤中,使对应于水印图案的缩微图纹元素中的视差部分形成高于所述基层部分的高度差。If the watermark effect to be produced is a black watermark, in the step of determining the base layer pattern and the shape of the watermark pattern, the parallax portion in the micrographic element corresponding to the watermark pattern forms a height difference higher than the base layer portion. 12.根据权利要求11所述的水印式防伪图纹的制作方法,其特征在于,在基于设计水印效果确定基层图案和水印图案的形态的步骤中:12. The method for making watermark-type anti-counterfeiting patterns according to claim 11, characterized in that, in the step of determining the form of the base layer pattern and the watermark pattern based on the designed watermark effect: 如果要制作的水印效果为白水印,进一步包括:1)在基层上将缩微图纹元素排列成基层图案的形状,2)复制基层图案中的缩微图纹元素至水印层,以及3)在拟形成水印图案的缩微图纹元素中加入视差部分,同时保证缩微图案的完整;If the watermark effect to be produced is a white watermark, it further includes: 1) arranging the micrographic elements on the base layer into the shape of the base layer pattern, 2) copying the micrographic elements in the base layer pattern to the watermark layer, and 3) preparing the watermark in the base layer. The parallax part is added to the micro-pattern elements forming the watermark pattern, while ensuring the integrity of the micro-pattern; 如果要制作的水印效果为黑水印,进一步包括:1)在基层上将缩微图纹元素排列成基层图案的形状,2)在缩微图纹元素内加入视差部分,同时保证缩微图形的完整,3)复制基层中的缩微图纹元素至水印层,以及4)对水印层内的缩微图纹元素去掉视差部分。If the watermark effect to be produced is a black watermark, it further includes: 1) arranging the micrographic elements on the base layer into the shape of the base layer pattern, 2) adding parallax parts in the micrographic elements, while ensuring the integrity of the micrographics, 3. ) copying the micrographic elements in the base layer to the watermark layer, and 4) removing the parallax part from the micrographic elements in the watermark layer. 13.根据权利要求12所述的水印式防伪图纹的制作方法,其特征在于,其中基于设计水印效果确定基层图案和水印图案的形态的步骤进一步包括:13. The method for making watermark-type anti-counterfeit patterns according to claim 12, wherein the step of determining the shape of the base layer pattern and the watermark pattern based on the designed watermark effect further comprises: 调整所述缩微图纹元素阵列中的缩微图纹元素的线宽和/或所述缩微图纹元素中的视差部分的形状、大小、疏密、角度、高度、色彩中的至少一项,通过所述至少一项的变化带来的视差,使得所述基层图案或所述水印图案的内容展现出层次。Adjusting at least one of the line width of the micrographic elements in the micrographic element array and/or the shape, size, density, angle, height, and color of the parallax part in the micrographic elements, by The parallax brought about by the change of the at least one item makes the content of the base layer pattern or the watermark pattern show layers. 14.根据权利要求10-13中任一项所述的水印式防伪图纹的制作方法,其特征在于,其中设计水印式防伪图纹的步骤之后进一步包括:14. The method for making the watermark anti-counterfeit pattern according to any one of claims 10-13, wherein the step of designing the watermark anti-counterfeit pattern further comprises: 设计独立网片,所述独立网片上具有呈现线纹或网格的网型,所述独立网片随所述水印式防伪图纹一起构成所述设计图案以用于后续制版。An independent mesh sheet is designed, and the independent mesh sheet has a mesh pattern showing lines or grids, and the independent mesh sheet forms the design pattern together with the watermark anti-counterfeiting pattern for subsequent plate making. 15.根据权利要求14所述的水印式防伪图纹的制作方法,其特征在于,在所述独立网片中,线宽大于0.025mm,并且小于防伪图纹最细线的线宽;线间距大于0.03mm,并且小于防伪图纹同方向最细线的线宽。15. The method for making watermark-type anti-counterfeit patterns according to claim 14, characterized in that, in the independent mesh, the line width is greater than 0.025mm, and less than the line width of the thinnest line of the anti-counterfeit pattern; line spacing Greater than 0.03mm, and less than the line width of the thinnest line in the same direction of the anti-counterfeiting pattern. 16.根据权利要求10-13、15中任一项所述的水印式防伪图纹的制作方法,其特征在于,在基于包含所述水印式防伪图纹的设计图案进行制版的步骤中,所述制版为胶片制版,包括:16. according to the making method of watermark type anti-counterfeit pattern according to any one of claim 10-13,15, it is characterized in that, in the step of plate-making based on the design pattern that comprises described watermark type anti-counterfeit pattern, the The plate making mentioned above is film plate making, including: 将所述设计图案输出到胶片;exporting the design pattern to film; 利用带有所述设计图案的所述胶片通过晒版腐蚀制作原版或印版。Utilizing the film with the design pattern to produce an original plate or printing plate through plate etching. 17.根据权利要求10所述的水印式防伪图纹的制作方法,其特征在于,所述制版为胶片制版,在以所述方式4)形成所述水印图案的情况下,所述基于包含所述水印式防伪图纹的设计图案进行制版的步骤包括:17. The method for making a watermark-type anti-counterfeiting pattern according to claim 10, characterized in that, the plate-making is a film-plate-making, and in the case of forming the watermark pattern in the manner 4), the method based on including the The step of carrying out plate-making of the design patterns of the watermark type anti-counterfeiting patterns includes: 制作胶片,采用以下方式之一:To make a film, use one of the following methods: 方式4.1.a):Mode 4.1.a): 将所述基层图案和水印图案输出到第一胶片;exporting the base layer pattern and the watermark pattern to a first film; 将独立网片输出到第二胶片;Export individual meshes to a second film; 或方式4.1.b):or way 4.1.b): 将所述基层图案输出到第一胶片;outputting the base layer pattern to a first film; 将所述水印图案所在部分以全黑形式输出到第二胶片,所述水印图案以外的部分加网;Outputting the part where the watermark pattern is located to the second film in full black, and adding a screen to the part other than the watermark pattern; 将所述水印图案输出到第三胶片,所述水印图案所在的部分加网;Output the watermark pattern to a third film, and screen the part where the watermark pattern is located; 制作原版或印版,采用以下方式之一:To make a master or printing plate, use one of the following methods: 方式4.2.a):Mode 4.2.a): 先根据所述第一胶片通过晒版腐蚀在原版或印版中制出所述基层图案和水印图案;First, according to the first film, the base pattern and the watermark pattern are produced in the original plate or the printing plate by printing and etching; 再根据所述第二胶片通过晒版腐蚀在印版中加深对应于所述基层图案和水印图案的部分,并使之保持完整;deepening the part corresponding to the base layer pattern and the watermark pattern in the printing plate by plate etching according to the second film, and keeping it intact; 或方式4.2.b):or way 4.2.b): 先根据所述第一胶片通过晒版腐蚀在原版或印版中制出所述基层图案;First make the base layer pattern in the original plate or printing plate by printing and etching according to the first film; 再根据所述第二胶片通过晒版腐蚀在原版或印版中使基层图案具有预定高度,同时加深其中对应于所述水印图案的部分;Making the base layer pattern have a predetermined height in the original plate or the printing plate by printing and etching according to the second film, and deepening the part corresponding to the watermark pattern; 然后根据所述第三胶片通过晒版腐蚀在所述原版或印版中制出所述水印图案。Then, the watermark pattern is produced in the original plate or printing plate by plate etching according to the third film. 18.根据权利要求17所述的水印式防伪图纹的制作方法,其特征在于:18. The method for making a watermark-type anti-counterfeiting pattern according to claim 17, characterized in that: 在以方式4.1.a)制作胶片的步骤中,所述第二胶片和第三胶片之间可以增加多张胶片,该多张胶片上输出的内容为:水印图案所在部分为全黑形式,所述水印图案以外部分透明。In the step of making films in the manner 4.1.a), multiple films can be added between the second film and the third film, and the output content on the multiple films is: the part where the watermark pattern is located is completely black, so The parts other than the above watermark pattern are transparent. 19.根据权利要求10所述的水印式防伪图纹的制作方法,其特征在于,所述制版为胶片制版,在以所述方式3)形成所述水印图案的情况下,所述基于包含所述水印式防伪图纹的设计图案进行制版的步骤包括:19. The method for making a watermark-type anti-counterfeit pattern according to claim 10, characterized in that, the plate-making is a film-plate-making, and in the case of forming the watermark pattern in the manner 3), the method based on including the The step of carrying out plate-making of the design patterns of the watermark type anti-counterfeiting patterns includes: 制作胶片,采用如下方式之一:To make a film, use one of the following methods: 方式3.1.a):Mode 3.1.a): 将所述基层图案和水印图案输出到第一胶片;exporting the base layer pattern and the watermark pattern to a first film; 将独立网片输出到第二胶片;Export individual meshes to a second film; 或方式3.1.b):or way 3.1.b): 将所述基层图案输出到第一胶片;outputting the base layer pattern to a first film; 将所述水印图案部分加网,所述水印图案以外的部分以全黑形式输出到第三胶片;Screening part of the watermark pattern, and outputting the part other than the watermark pattern to the third film in a completely black form; 将所述水印图案以透明形式输出到第二胶片,所述水印图案以外的部分加网;Outputting the watermark pattern to a second film in a transparent form, and adding a screen to the part other than the watermark pattern; 制作原版或印版,采用以下方式之一:To make a master or printing plate, use one of the following methods: 方式3.2.a):Mode 3.2.a): 先根据所述第一胶片通过晒版腐蚀在原版或印版中制出所述基层图案和水印图案;First, according to the first film, the base pattern and the watermark pattern are produced in the original plate or the printing plate by printing and etching; 再根据所述第二胶片通过晒版腐蚀在印版中加深所述基层图案和水印图案的部分,并使之保持完整;Then according to the second film, deepen the part of the base layer pattern and the watermark pattern in the printing plate by printing and etching, and keep it intact; 或方式3.2.b):or way 3.2.b): 先根据所述第一胶片通过晒版腐蚀在原版或印版中制出所述基层图案;First make the base layer pattern in the original plate or printing plate by printing and etching according to the first film; 再根据所述第三胶片通过晒版腐蚀在原版或印版中使水印图案具有预定高度,同时加深其中对应于所述基层图案的部分;Make the watermark pattern have a predetermined height in the original plate or the printing plate by printing and etching according to the third film, and deepen the part corresponding to the base pattern at the same time; 然后根据所述第二胶片通过晒版腐蚀在所述原版或印版中制出所述基层图案。The base layer pattern is then produced in the master or printing plate by photolithography based on the second film. 20.根据权利要求19所述的水印式防伪图纹的制作方法,其特征在于:20. The method for making a watermark-type anti-counterfeit pattern according to claim 19, characterized in that: 在以方式3.2.a)制作胶片的步骤中,所述第二胶片和第三胶片之间可以增加多张胶片,该多张胶片上输出的内容为:水印图案所在部分为透明形式,所述水印图案以外部分为全黑形式。In the step of making films in the manner 3.2.a), multiple films can be added between the second film and the third film, and the output content on the multiple films is: the part where the watermark pattern is located is in a transparent form, and the The part other than the watermark pattern is completely black. 21.根据权利要求14在引用权利要求13时所述的水印式防伪图纹的制作方法,其特征在于,在设计独立网片的步骤中:21. According to claim 14, when quoting claim 13, the method for making the watermark type anti-counterfeiting pattern is characterized in that, in the step of designing an independent mesh: 针对所述基层图案和所述水印图案的不同层次,提供相应的多个不同的独立网片,各所述独立网片分别具有不同类型的网型,用以在晒版腐蚀时控制所述印版上的版纹深度、水印图案与基层图案之间的高度差以及所述印版的着墨性。For the different levels of the base layer pattern and the watermark pattern, a plurality of different independent mesh sheets are provided correspondingly, each of the independent mesh sheets has a different type of mesh type, and is used to control the printed image when the printing plate is corroded. The depth of the plate on the plate, the height difference between the watermark pattern and the base layer pattern, and the ink receptivity of the plate. 22.根据权利要求10-13、15中任一项所述的水印式防伪图纹的制作方法,其特征在于,在基于包含所述水印式防伪图纹的设计图案进行制版的步骤中,所述制版为雕版制版,包括:22. The method for making a watermark-type anti-counterfeit pattern according to any one of claims 10-13,15, characterized in that, in the step of plate-making based on the design pattern comprising the watermark-type anti-counterfeit pattern, the The plate-making mentioned above is engraving plate-making, including: 将设计图案的三维数据输出到执行激光雕刻或数控微加工的制版设备;Output the three-dimensional data of the design pattern to the plate making equipment that performs laser engraving or CNC micromachining; 所述制版设备基于所述设计图案的三维数据,通过以激光雕刻或数控微加工方式进行的雕刻来制作原版或印版或贴膜。Based on the three-dimensional data of the design pattern, the plate-making equipment makes an original plate or a printing plate or a sticking film by laser engraving or numerical control micromachining. 23.一种防伪制品,具有基片,其特征在于,所述基片上具有权利要求4到9中任一项所述的水印式防伪图纹。23. An anti-counterfeiting product, having a substrate, characterized in that the substrate has the watermark anti-counterfeiting pattern according to any one of claims 4 to 9. 24.根据权利要求23所述的防伪制品,其特征在于:在水印式防伪图纹的缩微图纹元素的视差部分中添加有用于防伪的可识别标识物。24. The anti-counterfeiting product according to claim 23, characterized in that: identifiable markers for anti-counterfeiting are added to the parallax part of the micro-pattern elements of the watermark anti-counterfeiting pattern. 25.根据权利要求24所述的防伪制品,其特征在于:所述可识别标识物为可见或隐藏的数据、图像信息或磁性油墨。25. The anti-counterfeit product according to claim 24, characterized in that: the identifiable mark is visible or hidden data, image information or magnetic ink. 26.根据权利要求23所述的防伪制品,其特征在于:用于印刷所述水印式防伪图纹的油墨选择为在不同观察角度下呈现不同的颜色。26. The anti-counterfeit product according to claim 23, characterized in that: the ink used for printing the watermark-type anti-counterfeit pattern is selected to present different colors under different viewing angles.
CN 200910243052 2009-12-22 2009-12-22 Watermark type anti-counterfeiting pattern, manufacturing method thereof and anti-counterfeiting product with same Active CN101837709B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200910243052 CN101837709B (en) 2009-12-22 2009-12-22 Watermark type anti-counterfeiting pattern, manufacturing method thereof and anti-counterfeiting product with same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200910243052 CN101837709B (en) 2009-12-22 2009-12-22 Watermark type anti-counterfeiting pattern, manufacturing method thereof and anti-counterfeiting product with same

Publications (2)

Publication Number Publication Date
CN101837709A CN101837709A (en) 2010-09-22
CN101837709B true CN101837709B (en) 2013-02-20

Family

ID=42741470

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200910243052 Active CN101837709B (en) 2009-12-22 2009-12-22 Watermark type anti-counterfeiting pattern, manufacturing method thereof and anti-counterfeiting product with same

Country Status (1)

Country Link
CN (1) CN101837709B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103015248B (en) * 2013-01-10 2015-03-18 保定钞票纸业有限公司 Anti-counterfeiting paper comprising watermark combination with bright window and method for manufacturing anti-counterfeiting paper
CN104480790B (en) * 2014-11-04 2016-06-01 保定钞票纸业有限公司 False proof paper
CN104773003B (en) * 2015-04-17 2019-12-10 中钞油墨有限公司 Printing stock printed with pattern for enhancing dynamic optical variation anti-counterfeiting effect and manufacturing method thereof
CN106585165B (en) * 2016-12-06 2019-05-07 中钞特种防伪科技有限公司 Optical anti-counterfeit element, optical anti-counterfeiting product and preparation method thereof

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001130124A (en) * 1999-11-02 2001-05-15 Printing Bureau Ministry Of Finance Japan Printed product having forgery preventive structure, method for discriminating it and discriminating implement
JP2003112487A (en) * 2001-10-04 2003-04-15 Printing Bureau Ministry Of Finance Printed matter of certificate whereon minute sign- character group composed of many minute signs and characters is printed
CN1830692A (en) * 2006-04-21 2006-09-13 中国印钞造币总公司 Dynamic hidden antifalse pattern and its manufacturing method
WO2007137744A2 (en) * 2006-05-31 2007-12-06 Giesecke & Devrient Gmbh Refractive transparent security element
WO2008000350A1 (en) * 2006-06-27 2008-01-03 Giesecke & Devrient Gmbh Method of applying a microstructure, mould and article with a microstructure
CN101120139A (en) * 2005-02-18 2008-02-06 捷德有限公司 Security element and method of manufacturing the same
CN101528474A (en) * 2006-10-24 2009-09-09 德国捷德有限公司 See-through security element with microstructures

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001130124A (en) * 1999-11-02 2001-05-15 Printing Bureau Ministry Of Finance Japan Printed product having forgery preventive structure, method for discriminating it and discriminating implement
JP2003112487A (en) * 2001-10-04 2003-04-15 Printing Bureau Ministry Of Finance Printed matter of certificate whereon minute sign- character group composed of many minute signs and characters is printed
CN101120139A (en) * 2005-02-18 2008-02-06 捷德有限公司 Security element and method of manufacturing the same
CN1830692A (en) * 2006-04-21 2006-09-13 中国印钞造币总公司 Dynamic hidden antifalse pattern and its manufacturing method
WO2007137744A2 (en) * 2006-05-31 2007-12-06 Giesecke & Devrient Gmbh Refractive transparent security element
WO2008000350A1 (en) * 2006-06-27 2008-01-03 Giesecke & Devrient Gmbh Method of applying a microstructure, mould and article with a microstructure
CN101528474A (en) * 2006-10-24 2009-09-09 德国捷德有限公司 See-through security element with microstructures

Also Published As

Publication number Publication date
CN101837709A (en) 2010-09-22

Similar Documents

Publication Publication Date Title
CN101863193B (en) Printed anti-counterfeiting pattern, method for manufacturing same and anti-counterfeiting product with same
EP0513156B1 (en) Image handling
RU2279982C2 (en) Storage medium with print obtained by intaglio printing method and method of transforming initial images into linear structure and into printing areas of printing plate for intaglio printing
CA2577246C (en) Data carrier with an optically variable structure
CN109476173A (en) Method of making a safety device
US8614834B2 (en) Method of generating patterns representing a halftone image
JP2009543712A (en) Hidden image identification system, product, identification means, and manufacturing method
JP2005512846A (en) Certificate of value
CN101837709B (en) Watermark type anti-counterfeiting pattern, manufacturing method thereof and anti-counterfeiting product with same
WO2013138486A1 (en) Multi-image optical device
CN111942070A (en) Micro-carving gold stamping plate for gold stamping of tipping paper and gold stamping process
CN105374281A (en) Three-dimentional label by using fine pattern and microlens
EP1645437A2 (en) Printed product and method for the production thereof
JP4229270B2 (en) Method and apparatus for simulating printed matter using two-dimensional data
CN209987606U (en) Anti-counterfeiting mark integrating dark lines, latent images and unlocking
CN107480480A (en) A kind of method and device of copyright ownership tracking
JP6112357B2 (en) Anti-counterfeit latent image display structure
JP4264830B2 (en) Printed material with characters in part of line drawing
CN106079966B (en) A kind of memorial money and manufacturing method
CN100579796C (en) Data support with middle tone image, intaglio printing plate for printing middle tone image and method for manufacturing intaglio printing plate
CN109703227B (en) Method for manufacturing anti-counterfeiting pattern integrating hidden lines, latent images and unlocking by embossing
CN102760379B (en) Anti-fake label and manufacture method thereof
JP2000015919A (en) Forming method of printed or indicated image, and image indicator formed by the forming method
CN215203934U (en) Large-breadth seamless anti-counterfeiting holographic plate and manufacturing device thereof
CN100431849C (en) Method for the production of a stamping tool to stamp safety elements in surfaces of carrier materials, as well as carrier material with at least one safety element

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20210407

Address after: 100070 8th floor, building 2, No.5 Zhonghe Road, Fengtai Science City, Fengtai District, Beijing

Patentee after: China Banknote Printing Technology Research Institute Co.,Ltd.

Patentee after: CHINA BANKNOTE PRINTING AND MINTING Corp.

Address before: 100070 science Road 5, Beijing, Fengtai District

Patentee before: SECURITY PRINTING INSTITUTE OF PEOPLE'S BANK OF CHINA

Patentee before: CHINA BANKNOTE PRINTING AND MINTING Corp.

CP01 Change in the name or title of a patent holder
CP01 Change in the name or title of a patent holder

Address after: 100070 8th floor, building 2, No.5 Zhonghe Road, Fengtai Science City, Fengtai District, Beijing

Patentee after: China Banknote Printing Technology Research Institute Co.,Ltd.

Patentee after: China Banknote Printing and Minting Group Co.,Ltd.

Address before: 100070 8th floor, building 2, No.5 Zhonghe Road, Fengtai Science City, Fengtai District, Beijing

Patentee before: China Banknote Printing Technology Research Institute Co.,Ltd.

Patentee before: CHINA BANKNOTE PRINTING AND MINTING Corp.