CN101819377B - Method for evaluating multi-gray scale photomas - Google Patents
Method for evaluating multi-gray scale photomas Download PDFInfo
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- CN101819377B CN101819377B CN2010101261373A CN201010126137A CN101819377B CN 101819377 B CN101819377 B CN 101819377B CN 2010101261373 A CN2010101261373 A CN 2010101261373A CN 201010126137 A CN201010126137 A CN 201010126137A CN 101819377 B CN101819377 B CN 101819377B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/34—Phase-edge PSM, e.g. chromeless PSM; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The invention provides a method for evaluating multi-gray scale photomas, including: for the transfer patterns of the multi-gray scale photomas, obtaining a spatial image data under the condition of an exposure, and for the spatial image data, determining the predeterminned threshold value of the effect transmissivity. Then, The spatial image data is binarized by using the threshold value, and the transfer patterns are evaluated by using the binarized spatial image data.
Description
Technical field
The evaluation method of the multi-gray scale photomas that the present invention relates in photoetching process, use.
Background technology
In the past; In the manufacturing of electronic equipments such as liquid crystal indicator; Utilize photoetching process, under predetermined conditions of exposure, make public to pattern transferring being formed on the resist film of wanting on the etched machined layer, using photomask with predetermined pattern; And this resist film developed, form the resist pattern thus.Then, this resist pattern is carried out etching as mask to machined layer.
In photomask, have following multi-gray scale photomas, this multi-gray scale photomas has the lightproof area that covers exposure light, the transmission region of transmission overexposure light and the semi-transparent zone of a transmission overexposure light part.Using this multi-gray scale photomas that comprises lightproof area, semi-transparent zone and transmission region under the situation of transfer printing desired pattern on the resist film on the transfer printing body, via the transmission region and the semi-transparent regional irradiates light of multi-gray scale photomas.At this moment, the light amount ratio via the irradiation of semi-transparent zone is few via the light quantity of transmission region irradiation.Therefore, when the resist film that has shone light was like this developed, the residual film value of resist film was according to the light quantity of being shone and difference.That is, if positive corrosion-resisting agent, it is thinner than the residual film value of resist in the zone of having been covered light by lightproof area then to have shone the residual film value of resist in zone of light via the semi-transparent zone of multi-gray scale photomas.The residual film value of resist of in addition, having shone the zone of light via transmission region is 0 (zero).Like this, make public/develop, can form the resist pattern of residual film value (comprising residual film value zero) thus with at least 3 kinds of thickness through using multi-gray scale photomas.
At the resist film that uses the zone that comprises different residual film values like this; The transfer printing body that is formed with resist film is carried out under the etched situation; (the zone of exposing transfer printing body: the zone corresponding), zone of the residual film value of etching zero at first with the transmission region of multi-gray scale photomas; Afterwards, come the attenuate resist film through ashing.Thus, remove the relatively zone (with the corresponding zone, semi-transparent zone of multi-gray scale photomas) of thin resist film of thickness, expose the transfer printing body of this part.Then, this transfer printing body that exposes is carried out etching.Thus,, can improve the efficient of photoetching process through the sheet number that reduces employed photomask for the multi-gray scale photomas of the resist pattern of realizing having the residual film value of a plurality of differences, therefore very useful.
In TOHKEMY 2004-309327 communique (patent documentation 1), the method below having put down in writing: in the defect detecting method of gray scale mask, generate the view data of gray scale portion, enforcement can be discerned the Flame Image Process of the defective of gray scale portion, carries out defect inspection.
In multi-gray scale photomas, semi-transparent zone becomes the relatively formation zone of thin resist film of thickness with respect to lightproof area as stated.For example, be used for the TFT of liquid crystal indicator (thin film transistor (TFT)), this part can form the zone corresponding with groove, on the other hand, and lightproof area formation and corresponding zones such as source region, drain region.The part that forms through semi-transparent zone can influence the performance of the electronic equipment that institute hope such as liquid crystal indicator obtains as a rule largely.Particularly, if the live width in the semi-transparent zone of not strict control, exposure light transmission then can produce undesirable condition in the precision of the equipment that hope obtains and yield rate.Therefore, to this semi-transparent zone, need in exposure/transfer printing process, in advance the shape that is formed on the resist pattern on the transfer printing body be predicted, estimate, and carry out this prediction and evaluation easily and accurately.
But, in patent documentation 1, only view data is implemented Gaussian Blur and handles (Gaussianblur) and carry out defect inspection, rather than under the state of illuminate condition when having reflected actual use photomask and optical condition photomask is estimated.Therefore, can not implement with the resist pattern form that this photomask in fact forms on transfer printing body is the evaluation of foundation, accurate multi-gray scale photomas.
Summary of the invention
The present invention proposes just in view of the above problems; Its purpose is to provide a kind of method for evaluating multi-gray scale photomas; In the method; Can grasp the spatial image that multi-gray scale photomas forms under actual transfer printing condition, utilize and reflected that correctly the view data of the resist pattern that multi-gray scale photomas forms estimates multi-gray scale photomas on transfer printing body.
The method for evaluating multi-gray scale photomas of a mode of the present invention; This multi-gray scale photomas is through carrying out composition to the photomask at least that is formed on the transparency carrier; Thereby has the pattern transferring that comprises transmission region, lightproof area and semi-transparent zone; This method for evaluating multi-gray scale photomas is characterised in that and comprises following operation: to the said pattern transferring as evaluation object, obtain the operation of the aerial image data of the said pattern transferring under conditions of exposure; To said aerial image data, confirm the operation of the threshold value of predetermined actual effect transmissivity; And use said threshold value that said aerial image data is carried out binaryzation, the operation of using the aerial image data after the said binaryzation that said pattern transferring is estimated.
According to this method, can use actual transfer printing condition, utilize and reflected that correctly multi-gray scale photomas is formed on the view data of the resist pattern on the transfer printing body, estimates multi-gray scale photomas.
In this method for evaluating multi-gray scale photomas, can obtain aerial image data in advance to normal portion with normal pattern transferring, use the aerial image data of this normal portion to confirm said threshold value.
In this method for evaluating multi-gray scale photomas, said threshold value can be according to using said multi-gray scale photomas, the target live width after being transferred to said pattern transferring on the transfer printing body and definite threshold value.
In this method for evaluating multi-gray scale photomas, said threshold value can also be according to the live width design load that is formed on the said pattern transferring on the said multi-gray scale photomas and definite threshold value.
In this method for evaluating multi-gray scale photomas; The operation of the said pattern transferring of optimizing evaluation comprises: obtain in advance to the aerial image data after the said binaryzation of normal portion with normal pattern transferring, the aerial image data after the binaryzation of the aerial image data that obtained and said evaluation object is compared.
In this method for evaluating multi-gray scale photomas, preferably the pattern transferring as said evaluation object is included in the same photomask with said normal pattern transferring.
In this method for evaluating multi-gray scale photomas, preferably the pattern transferring as said evaluation object is before said comparison, has grasped the pattern transferring that semi light transmitting part in the said pattern transferring comprises defective part.
This method for evaluating multi-gray scale photomas preferably includes: through to comparing as the aerial image data after the binaryzation of aerial image data after the binaryzation in the pattern transferring of said evaluation object and said normal portion, judge and whether need revise the pattern transferring as said evaluation object.
This method for evaluating multi-gray scale photomas preferably includes the live width calculation process; In this live width calculation process; According to as the aerial image data after the binaryzation in the pattern transferring of said evaluation object, calculate the live width of said defective part when being transferred to said pattern transferring on the transfer printing body.In this case, preferably surpassed preset range and not simultaneously, be made as the defect correction object with respect to the live width that obtains according to the aerial image data after the binaryzation of said normal portion in the said live width that calculates.
In this method for evaluating multi-gray scale photomas, said semi-transparent zone can be on the said photomask that is formed on the said transparency carrier, and the fine pattern below the formation exposure machine resolving limit forms.
In this method for evaluating multi-gray scale photomas, said semi-transparent zone can be that the semi-permeable diaphragm that on said transparency carrier, forms a transmission overexposure light part forms.
In this method for evaluating multi-gray scale photomas; The operation that preferably obtains said aerial image data comprises: the said photomask that is formed with said pattern transferring is shone the exposure light under the said conditions of exposure, by image unit the transmitted light of said pattern transferring is taken.
The multi-gray scale photomas manufacturing approach of other type of the present invention; This multi-gray scale photomas is through carrying out composition to the photomask at least that is formed on the transparency carrier; Thereby has the pattern transferring that comprises transmission region, lightproof area and semi-transparent zone; This multi-gray scale photomas manufacturing approach is characterised in that and comprises: pattern forms operation, carries out said composition and forms said pattern transferring; And the evaluation operation, formed said pattern transferring to be estimated, said evaluation operation is based on above-mentioned evaluation method.
According to this method, utilize and reflected that correctly the view data of the resist pattern that multi-gray scale photomas forms estimates on transfer printing body, therefore can be manufactured on actual mask use in not in-problem multi-gray scale photomas.
In this multi-gray scale photomas manufacturing approach,, make that live width is distributed as the said photomask below the 0.15 μ m in the face of said pattern transferring when making on being transferred to transfer printing body preferably through said evaluation method.
The pattern transfer-printing method of other type of the present invention is characterized in that, uses the photomask of making based on above-mentioned multi-gray scale photomas manufacturing approach, the said pattern transferring of transfer printing on transfer printing body.
According to this method, use to utilize the view data that has correctly reflected the resist pattern that multi-gray scale photomas forms on transfer printing body to carry out the multi-gray scale photomas of estimating, therefore transfer printing pattern transferring on transfer printing body correctly.
In method for evaluating multi-gray scale photomas of the present invention; Through the photomask at least that is formed on the transparency carrier is carried out composition; Thereby have the pattern transferring that comprises transmission region, lightproof area and semi-transparent zone,, obtain the aerial image data of the said pattern transferring under conditions of exposure to said pattern transferring as evaluation object; To said aerial image data; Confirm the threshold value of predetermined actual effect transmissivity, use said threshold value that said aerial image data is carried out binaryzation, use the aerial image data after the said binaryzation to estimate said pattern transferring; Therefore can utilize the view data of using actual transfer printing condition correctly to reflect the resist pattern that multi-gray scale photomas forms on transfer printing body, estimate multi-gray scale photomas.
Description of drawings
Fig. 1 (a) is the figure that an example of pattern transferring is shown, and Fig. 1 (b) is the figure that the relation between the position of pattern transferring of actual effect transmissivity and Fig. 1 (a) is shown, and Fig. 1 (c) is the figure that the relation between CD and the threshold value is shown.
Fig. 2 is the figure that an example of the device that the conditions of exposure to exposure machine reproduces is shown.
Fig. 3 (a) is the figure that an example of pattern transferring is shown; Fig. 3 (b) is the figure that the spatial image of this pattern transferring is shown; Fig. 3 (c) illustrates to use Fig. 3 (b); Confirm the figure of the binaryzation spatial image that threshold value obtains according to the target live width after being transferred to pattern transferring on the transfer printing body, Fig. 3 (d) is to use Fig. 3 (b), confirms the binaryzation spatial image that threshold value obtains according to the design live width of mask.
Fig. 4 (a)～(i) is a binaryzation spatial image of confirming portion that threshold value obtains, normal and evaluation object according to the target live width on the transfer printing body.
Fig. 5 (a)～(i) according to the design live width confirm that threshold value obtains, the binaryzation spatial image of normal portion and evaluation object.
Embodiment
Below, with reference to accompanying drawing embodiment of the present invention is elaborated.
The inventor is conceived to for the residual film value of the resist that on transfer printing body, obtains expecting; Only the film transmissivity of the semi-permeable diaphragm of the semi light transmitting part that is used for multi-gray scale photomas being controlled is this not enough situation; When having found on transfer printing body, to obtain the part of the residual film value of resist expected; In order to confirm the residual film value of this resist; Not only (depending on film component and thickness) exposure light transmission as film of the semi-permeable diaphragm that is used for mask is controlled, also must be according to the optical characteristics of the light source of use in the shape that is formed on the pattern on the mask, the exposure, the characteristic of optical system etc., the transmissivity of the light diffraction having considered to be produced is controlled.Therefore, the inventor proposes to replace the film transmissivity T of semi-permeable diaphragm
f, and light transmission (the actual effect transmissivity T of the actual effect of mask is crossed in the regulation transmission
A), and control this actual effect transmissivity.Wherein, this actual effect transmissivity T
ACan be considered to: under the conditions of exposure that reality is used, the for example semi-transparent regional transmission overexposure optical transmission rate of this mask.In fact, the light transmission in semi-transparent zone is because the influence of adjacent light shielding part etc., for example has distribution such shown in Fig. 1 (b), therefore can with the zone in the corresponding transmittance values of peak value of transmission curves be made as the typical value of actual effect transmissivity.
Actual effect transmissivity T
ATherefore be except the intrinsic transmissivity of film, also considered the index of optical condition and design, correctly reflected the light intensity of the exposure on the transfer printing body, be used for index that the residual film value of formed resist pattern is managed so be suitable as.In addition, as the actual effect transmissivity in semi-transparent zone, can be made as to be made as and on the light intensity distributions of the more than half transmission regions of transmission, had peaked part transmissivity at 100% o'clock at exposure light transmission with transmission region.This is because for example when using this photomask on transfer printing body, to form the resist pattern of positive corrosion-resisting agent, and is relevant with the minimum value of the residual film value of the resist that on semi-transparent zone, produces.For such scope management, for example when using multi-gray scale photomas to make thin film transistor (TFT) (TFT), semi-transparent zone is made as the zone corresponding with the channel region of TFT, be that 5 μ m are especially effective when following in this channel width.In addition, " Ch-L (channel length) " among Fig. 3 etc. means the width of this groove.
In addition, as stated as actual effect transmissivity T
A, can make transmissivity that the maximal value (if use positive corrosion-resisting agent, then this maximal value is equivalent to the bottom (minimum value) of the residual film of resist) of light intensity distributions curve in the semi-opaque region territory locates here as representative.That is, semi-transparent zone by two lightproof area clampings and the situation adjacent with these lightproof areas under, the light intensity distributions curve of transmitted light becomes the curve that hangs bell, actual effect transmissivity T
ABe meant the transmissivity corresponding with the peak value of this curve.This actual effect transmissivity is by film transmissivity T
f, actual exposure condition (dichroism of optical parametric, irradiates light) and actual optical mask pattern shape confirm.But, when actual evaluation,, can be representative with the model condition as conditions of exposure for easy.Conditions of exposure below this condition for example can be made as: use that numerical aperture (NA) is 0.08, degree of coherence (σ) is 0.8 optical system, use g line, h line, i line separately intensity be 1: 1: 1 irradiates light.
On the other hand, film transmissivity T
fCan be made as: on transparency carrier, forming semi-permeable diaphragm and when becoming the semi-opaque region territory, is the transmissivity in this semi-transparent zone in the enough big area with respect to the resolving limit under the conditions of exposure.Make or not in the semi-transparent zone, semi-permeable diaphragm not being set under the situation of function in the semi-transparent zone of interval (space) performance of the trickle live width in the light-shielding pattern, " the film transmissivity " in this interval in this semi-transparent zone equates with the transmittance section, becomes 100%.On the other hand, according to after state bright evaluation method, the transmissivity in semi-transparent zone receives the influence of the live width of pattern etc., therefore by actual effect transmissivity T
AThe exposure light transmission that defines semi-transparent zone in the actual pattern is useful.
As stated; Need reflection through actual exposure/transfer printing process obtain, resist pattern on the transfer printing body carries out the evaluation of multi-gray scale photomas; The completion result of needs assessment photomask, and easily and accurately whether inspection (evaluation) has produced the problem in the processing of machined layer.
The inventor is conceived to this respect and has found following situation: under the actual exposure condition, obtain aerial image data; Confirm the threshold value of predetermined actual effect transmissivity to this aerial image data; Utilize this threshold value that aerial image data is carried out binaryzation; Utilize this binaryzation aerial image data to estimate pattern transferring, can utilize the correct view data of the resist pattern that multi-gray scale photomas forms on transfer printing body that reflected to estimate multi-gray scale photomas thus.
Promptly; Through the photomask at least that is formed on the transparency carrier is carried out composition; Thereby has the pattern transferring that comprises transmission region, lightproof area and semi-transparent zone; To said pattern transferring as evaluation object, obtain the aerial image data of said pattern transferring under conditions of exposure, confirm the threshold value of predetermined actual effect transmissivity to said aerial image data; Use said threshold value that said aerial image data is carried out binaryzation; Use the aerial image data after the said binaryzation to estimate said pattern transferring, utilize the view data that has correctly reflected the resist pattern that multi-gray scale photomas forms under the actual exposure condition on transfer printing body thus, estimate multi-gray scale photomas.
Multi-gray scale photomas as the object of the evaluation method of embodiment of the present invention is meant, thereby through carrying out composition and have photomasks pattern transferring, more than 3 tones that comprise transmission region, lightproof area and semi-transparent zone being formed on photomask at least on the transparency carrier.That is, in this multi-gray scale photomas, except lightproof area and transmission region, also have semi-transparent zone, in the resist pattern on being formed on transfer printing body, be formed with zone thus with a plurality of thickness.Lightproof area covers exposure light in fact, and transmission region can expose transparency carrier and form.Semi-transparent zone is the transmissivity part relatively littler than transmission region, is the zone that on transfer printing body, forms the residual film of resist of expectation.This semi-transparent zone for example can form the semi-permeable diaphragm with predetermined film transmissivity and form on transparency carrier.Be made as 100% o'clock in the film transmissivity with transmission region, the film transmissivity of semi-permeable diaphragm is 10%～70%, more usefully 20%～60%.In addition, also can be through on the photomask that is formed on the transparency carrier, the pattern of the live width below the resolving limit of formation exposure machine is used as semi-transparent zone.In addition, also can be the photomask that has more than 4 tones of following resist pattern as the multi-gray scale photomas of evaluation method object, this resist pattern has the residual film value of resist more than 3 (except the residual film value of resist is zero part).
As transparency carrier, can enumerate out glass substrate etc.In addition, as the photomask that covers exposure light, can enumerate the such metal silicide film of metal film such as chromium film, silicon fiml, metal oxide film, molybdenum silicide film etc.In addition, preferably this photomask has antireflection film from the teeth outwards, as the material of this antireflection film, can enumerate oxide, nitride, carbonide and the fluoride etc. of chromium.As making the exposure transmittance semi-permeable diaphragm of a part excessively, can use oxide, nitride, carbonide, oxides of nitrogen, nitrogen-oxygen carbide or the metal silicide etc. of chromium.Especially preferably adopt oxide, nitride, oxides of nitrogen, carbonide of the such metal silicide film of chromium oxide film, chromium nitride film, molybdenum silicide film or these metal silicide films etc.And more preferably, can use the film of molybdenum silicide oxide, nitride, oxides of nitrogen, carbonide, oxidation nitrogenize carbonide etc.
As the pattern transferring of multi-gray scale photomas, can enumerate:, thereby implement the pattern transferring that predetermined composition forms respectively through formation semi-permeable diaphragm and photomask on transparency carrier; Perhaps on transparency carrier, form photomask, the fine pattern below the exposure machine resolution is carried out composition, produce the pattern transferring of medium tone etc. through the diffraction of light effect.
In the evaluation method of the multi-gray scale photomas of embodiment of the present invention; For pattern transferring as evaluation object; Obtain the aerial image data of pattern transferring under conditions of exposure; To the threshold value of the definite actual effect transmissivity of being scheduled to of aerial image data, use this threshold value that aerial image data is carried out binaryzation, the aerial image data after the use binaryzation is estimated pattern transferring.
In this evaluation method,, obtain the aerial image data of pattern transferring under conditions of exposure to pattern transferring as evaluation object.That is, obtaining under the situation of aerial image data, be formed with on the photomask of pattern transferring, the exposure light under the irradiation conditions of exposure is taken the transmitted light of pattern transferring by image unit.Conditions of exposure when the conditions of exposure here is to use this multi-gray scale photomas.Particularly, conditions of exposure is utilized in NA (numerical aperture), σ (degree of coherence) and the illumination wavelength of the optical system when using this multi-gray scale photomas.In addition, so-called here spatial image is meant, under the said conditions of exposure pattern transferring is being carried out being applied to the picture (light intensity distributions) on the transfer printing body under the situation of exposure.For example; The strength ratio according to wavelength at NA=0.08, σ=0.8, exposure light is under the conditions of exposure of g line/h line/i line=1/1/1; Pattern transferring (channel length: 5.0 μ m, film transmissivity are 40%) to the TFT shown in Fig. 3 (a) has carried out under the situation of exposure, and resulting spatial image is shown in Fig. 3 (b).In addition, in Fig. 3 (a), reference number 21 is a photomask, and reference number 22 is a semi-permeable diaphragm.
In this evaluation method,, confirm the threshold value of predetermined actual effect transmissivity to aerial image data.For example, at the pattern transferring shown in Fig. 1 (a), promptly between two photomasks 21, be provided with in the pattern transferring of semi-permeable diaphragm 22, when the actual effect transmissivity asked between A-B, become shown in Fig. 1 (b).The threshold value of the actual effect transmissivity in this operation is to the characteristic threshold value (TH1, TH2, TH3) shown in Fig. 1 (b).The difference of threshold value provides poor to the exposure of photomask.
The benchmark of threshold value when estimating pattern transferring is necessary, and it confirms that method is extremely important.As stated, actual effect transmissivity T
AThe for example semi-transparent regional transmission overexposure optical transmission rate that means mask under the conditions of exposure that reality is used.This actual effect transmissivity changes according to live width as stated, shown in Fig. 1 (c), thinks (to have correlativity between the CD (Critical Dimension: critical dimension)) in the threshold value of actual effect transmissivity and corresponding to the live width of the part in semi-transparent zone.Threshold value means corresponding to the live width of the part in semi-transparent zone more little more greatly.Can confirm the threshold value of this actual effect transmissivity according to the target live width of using after photomask is transferred to pattern transferring on the transfer printing body.Perhaps, can confirm threshold value according to the live width design load that is formed on the pattern transferring on the photomask.
For example, can ask for the aerial image data when having used conditions of exposure in advance to normal portion with normal pattern transferring.Can be with reference to this aerial image data, ask for the actual effect transmissivity of having given above-mentioned target live width (for example, wanting to form the target live width in the semi-transparent zone of groove), with this actual effect transmissivity as threshold value.Perhaps, also can ask for the actual effect transmissivity of the live width design load (for example, the design live width in the semi-transparent zone corresponding) of having given photomask with reference to the spatial image of above-mentioned normal portion with channel part, with this actual effect transmissivity as threshold value.
Then, can use threshold value, the aerial image data as the pattern transferring of evaluation object is carried out binaryzation, obtain the binaryzation aerial image data by above-mentioned definite actual effect transmissivity.Use the aerial image data after this binaryzation, pattern transferring is estimated.For example, can judge the absolute value of live width, and whether white defective, black defective are arranged according to this binaryzation aerial image data.For example; Can also be according to as the aerial image data after the binaryzation in the pattern transferring of evaluation object; Calculating on transfer printing body transfer printing the live width (live width calculation process) of the defective part during pattern transferring; The live width that here calculates has surpassed preset range and not simultaneously, has been made as the defect correction object.
In the evaluation of pattern transferring, also can obtain in advance to the aerial image data after the binaryzation of normal portion with normal pattern transferring, compare with aerial image data after the binaryzation of evaluation object.Then, according to this comparative result, whether use to the standard of defective live width distribution of mask etc. is estimated, and according to circumstances judge whether need defect correction.Promptly; Can be through to comparing as the aerial image data after the binaryzation of the aerial image data after the binaryzation in the pattern transferring of evaluation object and normal portion; Whether judge the completion result as the pattern transferring of evaluation object thus, perhaps can judge needs to revise.
Here; As the standard that whether has defective; For example can enumerate following standard etc.: utilize said method to generate the check image of black defective part; In by the semi-transparent zone (semi-permeable diaphragm 22 of Fig. 1 (a)) of lightproof area (photomask 21 of Fig. 1 (a)) clamping, under the situation that detects the island-shaped pattern below the threshold value, with its standard as the correction object; Perhaps, above-mentioned threshold value is made as maximum actual effect transmissivity+2.0% in semi-transparent zone, generates the check image of white defective part, in semi-transparent zone, detect under the situation of disappearance pattern, with it as the standard of revising object.
The pattern transferring that becomes evaluation object can be included in the same photomask with normal pattern transferring.For example, as being that the mask evaluation can judge whether defectiveness through only the pattern in the zones of different that is in same photomask being compared each other, and is very useful under the situation of repeat patterns the representative, that be arranged with unit cell pattern with TFT.
In addition, as the pattern transferring of evaluation object can be and normal portion between compare before, grasped the semi light transmitting part in the pattern transferring comprise defective part pattern transferring.For example; When in multi-gray scale photomas, having found pattern defect through mask pattern shape defect testing fixture; Can be through above-mentioned evaluation method, come to grasp in advance the resist pattern that this photomask is formed on the transfer printing body and whether can have problems under the actual exposure condition.Therefore, has the advantage that before the actual exposure operation, promptly to grasp in the stage that mask is estimated.
Only extensively carried out judging whether defectiveness, but the inventor finds according to the specification of mask pattern in the past: carried out the pattern transferring behind the determining defects under the actual exposure condition according to this method, possibly not have problems, perhaps opposite.And the inventor also finds: be judged to be the defective of black defective (superfluous defective) through common pattern form defect inspection, the difference according to photomask in the reality uses possibly act as white defective (shortcoming defective).Think that this is that synergism owing to the such exposure wavelength scope of i line～g line and pattern form, size etc. produces.
Make under the situation of multi-gray scale photomas comprising above-mentioned evaluation method, on transparency carrier, form photomask at least, the film on the said transparency carrier is carried out composition form pattern transferring, utilize said method to estimate formed pattern transferring.Then, if in this evaluation, need defect correction, then carry out defect correction, and can utilize identical method to estimate once more.The multi-gray scale photomas utilization that this evaluation of process obtains has correctly reflected the view data of the resist pattern that multi-gray scale photomas forms on transfer printing body, estimate, and therefore is not in-problem multi-gray scale photomas in the mask of reality uses.Especially, can make high-quality multi-gray scale photomas through using this evaluation method, live width distributes and is made as below the 0.15 μ m in the face of the pattern transferring that this multi-gray scale photomas can be when being transferred on the transfer printing body.
Particularly, in the evaluation of pattern transferring, obtain in advance, compare with aerial image data after the binaryzation of said evaluation object to the aerial image data after the binaryzation of normal portion with normal pattern transferring.Obtain like this in advance to the aerial image data after the binaryzation of normal portion, compare, therefore can carry out correct mask evaluation with this aerial image data with normal pattern transferring.In addition, preferably be included in the same photomask with said normal pattern transferring as the pattern transferring of evaluation object.
Live width below being distributed as 0.15 μ m can be in the face, with respect to the live width of live width standard value distribute (absolute value of the difference of live width maximal value and live width minimum value) be below the 0.15 μ m.For example, can be made as standard value with the live width design load of the pattern transferring in this photomask, perhaps said pattern transferring being transferred to transfer printing body (processed body) the target live width in last time.Perhaps, can the same pattern in pattern transferring between, its live width distributed to be made as in the 0.15 μ m.
The multi-gray scale photomas that obtains like this can carry out transfer printing to pattern transferring on transfer printing body.This multi-gray scale photomas utilization has reflected that correctly the view data of the resist pattern that multi-gray scale photomas forms estimates on transfer printing body, therefore can correctly on transfer printing body, carry out transfer printing to pattern transferring.
Here, make pattern transferring become the device of aerial image data, for example can enumerate device shown in Figure 2 as being used to.This device is mainly by constituting with the lower part: light source 1; Illuminating optical system 2, it is to the light of photomask 3 irradiations from light source 1; Objective system 4, it makes transmission cross the photoimaging of photomask 3; And image unit 5, it is taken the picture that obtains through objective system 4.
Illuminating optical system 2 guiding are from the light of light source 1, to photomask 3 irradiates lights.This illuminating optical system 2 is variable for numerical aperture (NA) is made as, and has aperture device (aperture diaphragm 7).Preferred this illuminating optical system 2 has and is used for visual field aperture 6 that the rayed scope of photomask 3 is regulated.Illumination through this illuminating optical system 2 is mapped on the photomask 3 that is kept by mask holder tool 3a.This illuminating optical system 2 is arranged in the housing 13.
The picture of 5 pairs of photomasks 3 of this image unit is taken.For example can use imaging apparatuss such as CCD to be used as image unit 5.
In this device, the numerical aperture of the numerical aperture of illuminating optical system 2 and objective system 4 is variable respectively, therefore can change the ratio of numerical aperture with the numerical aperture of objective system 4 of illuminating optical system 2, i.e. sigma value (σ: degree of coherence).Can be through suitably selecting above-mentioned condition, reproduce or the optical condition during approximate exposure.
In addition, in this device, be provided with: arithmetic element 11, it is to the photographed images that is obtained by image unit 5, carry out Flame Image Process, computing, with the comparison of defined threshold and demonstration etc.; Control module 14 with display unit 12; And the move operation unit 15 that changes the position of housing 13.Therefore, the light intensity distributions that use resulting photographed images, perhaps obtains according to this photographed images is carried out predetermined operation by control module, can obtain photographed images or light intensity distributions and transmissivity under the condition of using other exposure light.
In having the device shown in Figure 2 of this structure, NA and σ value can change, and the line source of light source also can change, and therefore can reproduce the conditions of exposure of various exposure machines.
Here, specify the situation whether above-mentioned evaluation method is judged needs defect correction of utilizing.
At first, the TFT of shape shown in the evaluation map 3 (a) makes and uses pattern transferring.The design load of this pattern transferring is that to comprise channel length be that 5.0 μ m, film transmissivity are the pattern in 40% semi-transparent zone.Using device shown in Figure 2 that this pattern transferring is made public, takes, obtain the spatial image shown in Fig. 3 (b), is that the basis is made as aerial image data with this spatial image.The conditions of exposure of this moment is that the strength ratio according to wavelength of NA=0.08, σ=0.8, exposure light is g line/h line/i line=1/1/1.
At first, the normal portion to having normal pattern obtains the spatial image under the above-mentioned conditions of exposure.Can use this aerial image data, ask for the actual effect transmissivity of having given the target live width after the transfer printing, this actual effect transmissivity is confirmed as threshold value.For example, if the target live width of the channel length after the transfer printing is made as 4.2 μ m, then the actual effect transmissivity is 0.183, therefore this actual effect transmissivity is made as threshold value.Fig. 3 (c) is the binaryzation spatial image of having used after this threshold value.
Can with this threshold application in as the aerial image data of the pattern transferring of evaluation object the time, this aerial image data is carried out binaryzation.This is shown in Fig. 4 (b)～(i).Perhaps, also can be in the aerial image data of above-mentioned normal pattern, replace the target live width after the transfer printing, and ask for the actual effect transmissivity of the live width design load of having given mask, this actual effect transmissivity is made as threshold value.For example, if the live width design load is made as 5.0 μ m, the actual effect transmissivity of then having given this live width is 0.122 (Fig. 3 (d)).Therefore, can use this threshold value that the aerial image data of the pattern transferring of evaluation object is carried out binaryzation.Fig. 5 (b)～(i) is its binaryzation spatial image.Wherein, the Th among Fig. 3 (c), (d) is the threshold value (threshold) in the actual effect transmissivity.
As stated; Can judge whether to revise black defective and white defective through to the aerial image data (Fig. 4 (a), Fig. 5 (a)) after the binaryzation of normal portion, compare with aerial image data (Fig. 4 (b)～(i), Fig. 5 (b)～(i)) after the binaryzation of evaluation object.
The invention is not restricted to above-mentioned embodiment, can suitably change and implement.For example, the material in the above-mentioned embodiment, patterning, components number, size and treatment step etc. are examples, can carry out various changes and implement.
Claims (13)
1. method for evaluating multi-gray scale photomas; This multi-gray scale photomas is through carrying out composition to the photomask at least that is formed on the transparency carrier; Thereby has the pattern transferring that comprises transmission region, lightproof area and semi-transparent zone; This method for evaluating multi-gray scale photomas is characterised in that and comprises following operation: to the said pattern transferring as evaluation object, obtain the operation of the aerial image data of the said pattern transferring under the conditions of exposure; To said aerial image data, confirm the operation of the threshold value of predetermined actual effect transmissivity; And use said threshold value that said aerial image data is carried out binaryzation, the operation of using the aerial image data after the said binaryzation that said pattern transferring is estimated,
In the operation of the threshold value of confirming said actual effect transmissivity; Obtain aerial image data to normal portion with normal pattern transferring; Use the aerial image data of this normal portion; Confirm threshold value according to the target live width after being transferred to said pattern transferring on the transfer printing body, perhaps confirm threshold value according to the live width design load of said pattern transferring.
2. method for evaluating multi-gray scale photomas according to claim 1; It is characterized in that; The operation of estimating said pattern transferring comprises: obtain in advance to the aerial image data after the said binaryzation of the normal portion with normal pattern transferring, the aerial image data after the binaryzation of this aerial image data that obtains and said evaluation object is compared.
3. method for evaluating multi-gray scale photomas according to claim 1 is characterized in that, is included in the same photomask with said normal pattern transferring as the pattern transferring of said evaluation object.
4. method for evaluating multi-gray scale photomas according to claim 2 is characterized in that, is before said comparison as the pattern transferring of said evaluation object, has grasped the pattern transferring that semi light transmitting part in the said pattern transferring comprises defective part.
5. method for evaluating multi-gray scale photomas according to claim 1; It is characterized in that; This method for evaluating multi-gray scale photomas comprises: through to comparing as the aerial image data after the binaryzation of aerial image data after the binaryzation in the pattern transferring of said evaluation object and said normal portion, judge and whether need revise the pattern transferring as said evaluation object.
6. method for evaluating multi-gray scale photomas according to claim 4; It is characterized in that; This method for evaluating multi-gray scale photomas comprises the live width calculation process; In this live width calculation process,, calculate the live width of said defective part when being transferred to said pattern transferring on the transfer printing body according to as the aerial image data after the binaryzation in the pattern transferring of said evaluation object.
7. method for evaluating multi-gray scale photomas according to claim 6; It is characterized in that; Surpassed preset range and not simultaneously, be made as the defect correction object with respect to the live width that obtains according to the aerial image data after the binaryzation of said normal portion in the said live width that calculates.
8. method for evaluating multi-gray scale photomas according to claim 1 is characterized in that, said semi-transparent zone is on the said photomask that is formed on the said transparency carrier, and the fine pattern below the formation exposure machine resolving limit forms.
9. method for evaluating multi-gray scale photomas according to claim 1 is characterized in that, said semi-transparent zone is that the semi-permeable diaphragm that on said transparency carrier, forms a transmission overexposure light part forms.
10. method for evaluating multi-gray scale photomas according to claim 1; It is characterized in that; The operation that obtains said aerial image data comprises: the said photomask that is formed with said pattern transferring is shone the exposure light under the said conditions of exposure, by image unit the transmitted light of said pattern transferring is taken.
11. multi-gray scale photomas manufacturing approach; This multi-gray scale photomas is through carrying out composition to the photomask at least that is formed on the transparency carrier; Thereby has the pattern transferring that comprises transmission region, lightproof area and semi-transparent zone; This multi-gray scale photomas manufacturing approach is characterised in that and comprises: pattern forms operation, carries out said composition and forms said pattern transferring; And the evaluation operation, formed said pattern transferring to be estimated, said evaluation operation is based on any described evaluation method in the claim 1 to 10.
12. multi-gray scale photomas manufacturing approach according to claim 11 is characterized in that, through said evaluation method, makes that live width is distributed as the said photomask below the 0.15 μ m in the face of said pattern transferring when making on being transferred to transfer printing body.
13. a pattern transfer-printing method is characterized in that, uses the photomask of making based on the described multi-gray scale photomas manufacturing approach of claim 11, the said pattern transferring of transfer printing on transfer printing body.
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| US8609550B2 (en) * | 2011-09-08 | 2013-12-17 | Synopsys, Inc. | Methods for manufacturing integrated circuit devices having features with reduced edge curvature |
| US11139402B2 (en) | 2018-05-14 | 2021-10-05 | Synopsys, Inc. | Crystal orientation engineering to achieve consistent nanowire shapes |
| JP7017475B2 (en) * | 2018-06-19 | 2022-02-08 | 信越化学工業株式会社 | Photomask blank-related evaluation method of surface condition of substrate |
| KR102367141B1 (en) | 2019-02-27 | 2022-02-23 | 호야 가부시키가이샤 | Photomask, method for manufacturing photomask, and method for manufacturing display device |
| US11264458B2 (en) | 2019-05-20 | 2022-03-01 | Synopsys, Inc. | Crystal orientation engineering to achieve consistent nanowire shapes |
| JP7229138B2 (en) * | 2019-09-27 | 2023-02-27 | Hoya株式会社 | Pattern inspection method, photomask inspection apparatus, photomask manufacturing method, and display device manufacturing method |
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