CN101805904A - Method for manufacturing pattern on metal material - Google Patents
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- CN101805904A CN101805904A CN200910007376A CN200910007376A CN101805904A CN 101805904 A CN101805904 A CN 101805904A CN 200910007376 A CN200910007376 A CN 200910007376A CN 200910007376 A CN200910007376 A CN 200910007376A CN 101805904 A CN101805904 A CN 101805904A
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Abstract
The invention discloses a method for manufacturing a pattern on a metal material, which comprises the following steps: providing a base material of which the glass transition temperature is more than or equal to 120 DEG C, identifying a predetermined pattern and a background area surrounding the predetermined pattern on one surface of the base material, forming at least one metal layer with a predetermined thickness on either the predetermined pattern or the background area by deposition, placing the base material with the metal layer on the surface thereof in a chamber, vacuumizing the chamber, providing a gas, and continuously providing the chamber with microwave energy during a predetermined time to change the gas into a microwave plasma which is then applied to the metal layer to melt the metal layer and form a plurality of spaced metal nano particles with a predetermined particle size. Therefore, the metal nano particles can be adopted to array the pattern on the base material and the pattern takes on a special colour visually.
Description
[technical field]
The present invention relates to a kind of method for making of pattern, particularly relate to the method for making of a kind of characteristic of utilizing metal nanoparticle with the pattern on metal material that visually presents special color effect.
[background technology]
Mostly selecting for use of existing impressing pattern method is the material with base material to be printed, and which kind of printing process the predetermined color that presents considers to use, for example, when being printed on the paper, can use printing materials such as ink, laser carbon dust, and see through the printing that methods such as spraying, wire mark are finished pattern.Yet, when base material to be printed is not a paper, but during other material, just must use the oiliness printing material, could be stably attached on this base material.In addition, if when the predetermined color that will present does not belong to simple primary colors color, then need several colors just can be presented more various color according to the different ratios allotment.
Therefore,, be necessary in fact to continue the new method of manufacturing pattern of exploitation in order on the base material to be printed of unlike material, stably to present the pattern of various colors, and existing known nanosecond science and technology, a wherein emphasis that may develop exactly.Since nano material on using, can make product have compact, economize characteristics such as the energy, high capacity density, high meticulous, high-performance and low public hazards, bring the impellent of traditional industry upgrading, high-tech industry sustainable development and Sustainable Development, make nano material become the foundation stone of nanosecond science and technology development, therefore, material, physics, chemistry, chemical industry and biological each field all have the researchist to drop into the research and development of nanosecond science and technology.
The nano material by type mainly can be divided into four kinds of nanoparticle, nanofiber, nano thin-film and nano blocks.Wherein, because the nanoparticle development time is long also ripe, and nano thin-film and nano block all be to come from nanoparticle, makes the preparation of nanoparticle seem even more important.The method of making nanoparticle at present mainly is divided into chemistry and two kinds of manufacture method of physics:
(1) chemical process: mainly be to use chemical reduction method,, relend by adding the due care agent metallics that is reduced is scattered in the solution equably, and prevent from whereby to produce between metallics and assemble with the chemical reduction metal ion.After treating that success forms the nanoparticle of protected dose of coating in this solution; a substrate is provided again; a wherein surface of this substrate is with a kind of specific organic molecule functionalized modification; whereby; this substrate surface can utilize static charge magnetism and chemical bonded refractory power; produce bond with nanoparticle, form from the ultrastructure of forming (self-assembly).Because chemical process need use organism such as toluene solution and organic mercaptan molecule, wherein, the steam of toluene solution also can cause cancerous lesion, therefore, these organism not only become source of pollution easily and the disappearance of more not environmental protection are arranged, and also have the toxicity that is detrimental to health easily.
(2) physical method: mainly be to utilize five kinds of main method such as high-temperature calcination, electron beam partial bombardment, the local bombardment of heavy ion beam and pulse laser, the little shadow technology of nanometer at present, wherein four of fronts mainly utilize a kind of film that makes to be subjected to thermal rupture to form surface of discontinuity, form molten state again, with by capillary physical influence, reach the result who aggregates into nano spherical particle.Last a kind of method then is the light shield that covers the special array of one deck in advance at substrate surface, for example, it is tightly packed to utilize the nano silicone ball of a certain specific dimensions closely to be arranged in six sides, utilize the space between the silicon ball, deposition layer of metal film just can obtain having regularly arranged trilateral nanoparticle array on this substrate.But aforementioned five kinds of methods have following shortcoming respectively:
(i) high-temperature calcination (High temperature annealing): when carrying out, the time that one section intensification and cooling must be arranged, cause consuming time for a long time and efficient is not good, and because intensification needs the time of length with cooling, the pattern of formed nanoparticle surface is difficult for evenly, and is gathered into the particle of greater particle size easily.
(ii) electron beam partial bombardment (e-beam irradiation): need to use expensive plant and instrument-electron beam gun, in addition, the each sphere of action of electron beam gun is limited, cause the surperficial limited of primary treatment, and can't on base material, make nanoparticle in large area, the relatively poor disappearance of the efficient of manufacturing is arranged equally.
The (iii) local bombardment of heavy ion beam (heavy ion irradiation): the same with beam bombardment, need to use expensive plant and instrument, and at every turn can only Local treatment and can't big area make nanoparticle, the not good disappearance of the efficient of manufacturing is arranged equally, and present application still is confined to academic research.
(iv) pulse laser (pulsed laser irradiation): at every turn can only handle among a small circle, handle the larger area effect though can reach by constantly moving around, but need expend the more time relatively, but and processing area still limited, this law is had equally makes the not good shortcoming of efficient.
(the v) little shadow technology of nanometer (Nanolithography): though this method can be made the nanoparticle array in a large number on substrate, but step is very loaded down with trivial details, also need to utilize organic solvent washing in the very consuming time and process, make the relatively poor disappearance with more not environmental protection of efficient and have.
Therefore, develop new nanoparticle manufacture method in order to improve the efficient of existing method for making, except reaching the purpose that reduces cost, can also be by the method for making newly developed that has reduced cost, add the utilization of nanoparticle characteristic, reach the existing known printing process effect that is beyond one's reach.
[summary of the invention]
The objective of the invention is on base material, to make the metal nanoparticle that is arranged in predetermined pattern providing a kind of, with the method for making of the pattern on metal material that visually presents specific color effect.
The method for making of pattern on metal material of the present invention comprises the following step:
(i) provide a second-order transition temperature (abbreviating Tg as) more than or equal to 120 ℃ base material, and distinguish out a predetermined pattern and a background area around this predetermined pattern on a surface of this base material;
(ii) at wherein side's formation of deposits of this predetermined pattern and background area metal level of one deck pre-determined thickness at least, and this metal level is made by a material that is selected from following group: inert metal, and the formed alloy of inert metal;
The base material that (iii) surface has been formed with this metal level places a chamber, and this chamber is vacuumized, and a gas is provided; And
(iv) in one section preset time length, continuing provides a microwave energy to this chamber, make this gas form a microwave electricity slurry, and the metal level of effect to this base material, make this metal level fusion and form metal nanoparticle separately a plurality of and that have predetermined particle diameter.
Beneficial effect of the present invention is: by at the metal level with first formation of deposits predetermined pattern on the base material of predetermined transmittance, form microwave electricity slurry with arrange in pairs or groups this microwave energy of specific gas again, and effect is to this metal level, then when this metal level receives high-energy, fusion causes membrane structure to break gradually, and be inclined to by surface tension effects and form the long-pending state of least surface, and then spontaneously assemble respectively and the nanoparticle that is condensed into spherical, whereby, make the present invention relatively simpler method just make in the short period of time and have predetermined particle diameter in a large number, and be arranged in the metal nanoparticle of predetermined pattern, except convenient the manufacturing the advantage good with making efficient arranged, can also see through the material of metal nanoparticle and the pattern color that thickness characteristics control is presented, and then visually cause specific color effect.
[description of drawings]
Fig. 1 is a schema, and a preferred embodiment of the method for making of pattern on metal material of the present invention is described;
Fig. 2 is a synoptic diagram, illustrates that light shield of this preferred embodiment use forms the process of a predetermined pattern on metal material on a base material;
Fig. 3 is a synoptic diagram, illustrates to see through metal level that this light shield is deposited on this base material forms a plurality of metal nanoparticles through microwave action situation;
Fig. 4 is an experimental result comparison chart, illustrates that the metal nanoparticle that the metal level of different thickness is made presents different colours on base material;
Fig. 5 is an experimental result synoptic diagram, illustrates that the metal nanoparticle of being made was arranged out different pattern and presented different colours when the collocation light shield used on base material;
Fig. 6 is an experimental result comparison chart, illustrates that the metal nanoparticle that the metal level of different-alloy ratio is made presents different colours on base material.
[embodiment]
The present invention is described in detail below in conjunction with drawings and Examples:
Consult Fig. 1, Fig. 2 and Fig. 3, the preferred embodiment of the method for making of pattern on metal material of the present invention comprises the following step:
Wherein, the material of this base material should be not limited, and every second-order transition temperature all is suitable for making this base material 2 more than or equal to 120 ℃ material, and for example, this base material 2 can be ceramic material.Preferably, the material that this base material 2 is a light-permeable is made, and is that a material that is selected from following group is made: glass, silica glass, sheet mica (Mica), sapphire (Sapphire) and crystalline ceramics.In the present embodiment, base materials employed 2 transmittance is more than or equal to 85%.
Preferably, this metal level 3 is made by a metal species material that is selected from following group: gold and silver, and the alloy of gold.
Along with used light shield pattern difference, this metal level 3 can be deposited on the predetermined pattern 21 of this base material 2, also can be deposited on the background area 22 of this base material 2.When the predetermined pattern on this light shield 4 40 is the pattern of a hollow out, by the predetermined pattern 40 of these light shield 4 hollow outs, can be on the predetermined pattern 21 on these base material 2 surfaces this metal level 3 of formation of deposits.When the predetermined pattern on this light shield 4 40 is a solid pattern, then cover by these light shield 4 solid predetermined patterns 40, can be on these base material 2 lip-deep background areas 22 this metal level 3 of formation of deposits, whereby, can reach the effect that presents pattern equally.
In this preferred embodiment, be to cooperate a film thickness controller (F.T.M) to plate this metal level 3 on these base material 2 surfaces with pre-determined thickness in sputter (sputter coating) mode, and be the hollow out pattern or be solid pattern according to the predetermined pattern 40 of used light shield 4, at formation of deposits metal level 3 on the predetermined pattern 21 on these base material 2 surfaces or on the background area 22, reach the effect that presents pattern respectively.Wherein, the technology of this metal level 3 of sputter is a prior art on this base material 2, does not repeat them here.In the present embodiment, the predetermined pattern 40 of this light shield 4 is the hollow out pattern, therefore, certainly the metal material that sputters of this metal targets be along these predetermined pattern 40 formation of deposits on these base material 2 surfaces, and then on this base material 2, form the metal level 3 of this predetermined pattern.
Preferably, the thickness of this metal level 3 is 1nm～20nm.By the thickness of this metal level 3 of control, can control the particle size range of last formed nanoparticle effectively.
In addition, also can be along with the thickness of this metal level 3 or the total area and change the action time of this microwave energy, when thick more the or total area is big more when the thickness of this metal level 3, need more energy just can reach molten state, also increased relatively the action time of this microwave energy.Wherein, be to use a launched microwave unit to provide microwave energy, and the unitary output rating of this launched microwave is preferably 700W～1500W to this chamber.In the present embodiment, the output rating that sets is essentially 1100W, and comes down to the unitary frequency setting of this launched microwave is 2450MHz when using.
Can effectively on this base material 2, make the metal nanoparticle 31 of unlike material and different-grain diameter by aforementioned method for making, because the out-shell electron of metal itself belongs to the d-d transition, therefore has the characteristic that absorption spectrum is positioned at visible-range, and can or change its material by the size of controlling described metal nanoparticle, cause the change of optical characteristics, and then visually present distinct colors.
What deserves to be explained is, in the time will making the metal nanoparticle 31 of alloy material, also can be according to types of alloys, on this base material 2, form the metal level 3 that multilayer contains different metal materials respectively earlier, after microwave electricity slurry is handled, described metal level 3 is fused mutually, and form the metal nanoparticle 31 of alloy material, described metal level 3 is respectively made by a material that is selected from following group: gold and silver, and the alloy of gold.For example, when forming the nanoparticle of electrum material, can on this base material 2, form the metal level 3 of one deck silver material and the metal level 3 of one deck gold material respectively, relend by microwave electricity slurry and make this two layers of metal level 3 fusions, and then make the two be mixed into electrum mutually, see through capillary physical influence again, spontaneously form the metal nanoparticle 31 of described spherical.Wherein, preferable being still of the total thickness of described metal level 3 is controlled at 1nm～20nm, and the thickness range of each layer metal level 3 then can be set in 0.1nm～19.9nm according to the film thickness monitoring machine specification of used sputter machine outfit.Material kind and thickness by each layer of control metal level 3 can form the metal nanoparticle 31 with different-alloy ratio.
＜embodiment one (different gold nanometer particle grain sizes present different colours) 〉
(1) glass baseplate of 8 identical sizes of preparation is put into acetone, ethanol, deionized water respectively with described base material, and respectively shake 5 minutes under ultrasonic wave, to remove some dust pollution things of described substrate surface.Dry up with the surface of nitrogen with all base materials, (piranha solution is H more described base material to be immersed in a Piranha solution subsequently respectively again
2SO
4With H
2O
2According to 3: 1 mixed, and the mixed solution of 80 ℃ of temperature) in 30 minutes, to remove some organic residues of described substrate surface, then, after a large amount of deionized water rinses, with nitrogen described base material is dried up fully again.
Will be through 8 clean plate substrates of aforementioned routine processes, put into a sputter machine (sputter coater) respectively, utilize film thickness controller control sputter in the metal layer thickness of this base material to needed size, at this is to plate the metal level of 1nm, 2nm, 3nm, 4nm, 5nm, 6nm, 7nm, 8nm respectively on this 8 plate substrate, and selects for use gold (Au) as target.
(2) make metal nanoparticle: the described base material that is combined with metal level is put into one respectively be equipped with the unitary chamber of a launched microwave, utilize one to bleed a unitary vacuum suction motor to this chamber evacuation, make the pressure reduction in this chamber and maintain 0.3torr, and see through an air supply unit (figure does not show) argon gas is imported in this chamber, restarting a launched microwave unit (figure does not show) provides microwave energy to act on this chamber, make this argon gas form microwave electricity slurry by microwave energy, high-octane microwave electricity slurry is with after this metal level contacts, make this metal level gradually fusion so that form more than separately nanoparticle not.Wherein, according to this metal layer thickness difference, also need the action time of this microwave energy to adjust relatively, therefore, when this metal layer thickness is respectively 1nm, 2nm, 3nm, 4nm, 5nm, 6nm, 7nm and 8nm, be respectively the action time of pairing this microwave energy 30 seconds, 45 seconds, 50 seconds, 55 seconds, 60 seconds, 65 seconds, 70 seconds and 75 seconds.
(3) result
Aforementioned 8 composite component by Bao Erhou, are labeled as sample (I according to its metal layer thickness respectively
1), (I
2), (I
3), (I
4), (I
5), (I
6), (I
7), (I
8), and utilize sweep electron microscope at the metal nanoparticle in the selected same range as, measure its particle diameter respectively, and calculate the particle diameter mean value of the described metal nanoparticle on each base material, can obtain result as shown in table 1 below, in addition, as shown in Figure 1, by controlling this metal layer thickness to change the particle diameter of the metal nanoparticle of being made, demonstration is along with the particle diameter difference of metal nanoparticle, the peak value of the absorbing wavelength of described metal nanoparticle is also different under visible light, and can present different colours.
| Project | Gold thickness (metal layer thickness) | Size (metal nanoparticle particle diameter) | The peak value of absorbing wavelength | Present color |
| ??a 1 | ??1nm | ??8±3nm | ??532nm | Rose pink |
| ??a 2 | ??2nm | ??13±5nm | ??536nm | Pink |
| ??a 3 | ??3nm | ??17±7nm | ??542nm | Wind rose |
| ??a 4 | ??4nm | ??23±11nm | ??546nm | Purple powder |
| ??a 5 | ??5nm | ??36±13nm | ??550nm | Lavender |
| ??a 6 | ??6nm | ??47±15nm | ??558nm | Intense violet color |
| ??a 7 | ??7nm | ??55±19nm | ??568nm | Light blue |
| ??a 8 | ??8nm | ??70±24nm | ??586nm | Mazarine |
Shown by above experimental result, can utilize the particle diameter that changes described metal nanoparticle, the color that control will present when cooperating light shield to use, just can form the predetermined pattern with particular color on base material.
＜embodiment two (character pattern that the different thickness metal level forms) 〉
With＜embodiment one〉method for making, prepare 1 clean base material, with 4 light shields with different pierced patterns, repeatedly put in regular turn on this base material, when being that target is on this base material during the formation of deposits metal level with the gold, begin by the superiors, behind the intact predefined thickness of every plating, in regular turn described light shield is removed, whereby, make orlop form one first relatively with different thickness to the light shield of the superiors, one second, the metal level of the 3rd and the 4th pattern, and the metal layer thickness of this first pattern is 1nm, the metal layer thickness of this second pattern is 2nm, the metal layer thickness of the 3rd pattern is 3nm, and the metal layer thickness of the 4th pattern is 4nm, the base material that is formed with described different thickness and patterned metal layer is put into a chamber, argon gas is provided after vacuumizing earlier again, make the pressure in the chamber maintain 0.4torr, and provided the microwave energy effect 60 seconds, just can comply with described metal layer thickness difference respectively on this base material fusion for having predetermined particle diameter, and be arranged in this first, second, the metal nanoparticle of the 3rd and the 4th pattern, as shown in Figure 5, respectively with (III
1), (III
2), (III
3), (III
4) represent this first, second, the the 3rd and the 4th pattern, under general visible light, can on this base material, see along with metal layer thickness change and present different colours this first, second, the the 3rd and the 4th pattern, along with the corresponding metal layer thickness of institute increases, can make described pattern present lightpink respectively, pink, deep pink and purple powder, show that the present invention makes the metal nanoparticle except utilizing microwave action, can also further utilize the design of predetermined pattern on this light shield, and sedimentary metal layer thickness, control the arrangement mode and the size of described metal nanoparticle, and then on this base material, present the pattern of different colours, and produce specific visual effect.
＜embodiment three (utilizing the color of alloy ratio control metal nanoparticle) 〉
With＜embodiment one〉method for making, different is to be formed with two layers of metal level on this base material, and be to be respectively that target carries out sputter earlier at this base material formation the first layer metal level with silver, be that target carries out sputter again with the gold, on this first layer metal level, to form the second layer metal layer again, form the metal level of two layers of different metal materials whereby, wherein, the resolving power of the film thickness controller that the sputter machine that uses when carrying out the metal level sputter is carried can reach 0.1nm, the whole span of control of this controller is 0.1nm～999nm, therefore, each metal layer thickness minimum controllable is built in 0.1nm, at this is to change gold respectively, the metal layer thickness ratio of silver material, and make the total thickness of these two layers of metal levels maintain 4nm, prepare 5 clean base materials respectively, and on described base material, form two layers of metal level that total thickness is 4nm respectively, and these two layers of metal layer thickness ratios are respectively (II
1) gold/silver=0.5nm/3.5nm, (II
2) gold/silver=1.0nm/3.0nm, (II
3) gold/silver=2.0nm/2.0nm, (II
4) gold/silver=3.0nm/1.0nm, (II
5) gold/silver=3.5nm/0.5nm, the time of microwave action all is set at 20 seconds.After microwave electricity slurry is handled, form the metal nanoparticle of electrum pattern, as shown in Figure 6, be respectively the color that the formed metal nanoparticle of electrum of different ratios is presented under visible light, demonstration is along with the ratio of silver in alloy reduces, the color that is presented can change red-violet colour into gradually from yellow, wherein, and (II
1)～(II
5) color be respectively yellow, deep yellow, safran, redness and red-violet colour in fact.Therefore, except presenting the different colours by the particle diameter that changes formed metal nanoparticle, can also utilize different alloy species and ratio, make formed metal nanoparticle present different colours, when collocation design has the light shield of predetermined pattern to use, can on base material, form predetermined pattern equally with particular color.
What deserves to be mentioned is; experimental result also shows; after the microwave treatment; described metal nanoparticle can be stably in conjunction be attached on this base material; be difficult on this base material, coming off; even on described nanoparticle, do not cover protective layer; described nanoparticle still is difficult for because touching this substrate surface or electrostatic force certainly, and this base material comes off; for example; when being raw material with the gold; through stable being combined on this base material of formed golden nanometer particle energy after the microwave energy effect, and along with the microwave action time is of a specified duration more, the bonding force of formed golden nanometer particle and base material also can be stronger.The major cause that forms this phenomenon may be that the bottom part of the formed described nanoparticle of metal level can be embedded in the base material, combines so can form closely with this base material under the effect of high temperature microwave electricity slurry.
By above explanation as can be known, the method for making of pattern on metal material of the present invention can be obtained following effect and advantage, so can reach purpose of the present invention really:
One, by the pressure of controlling in this reaction cavity 31, and provide microwave energy to make the specific gas that is provided be converted into high-octane microwave electricity slurry, just can be in the extremely short time, make metal level 3 fusions that contact with this microwave electricity slurry and form metal nanoparticle 31 with predetermined particle diameter size, when described nanoparticle 31 particle diameters not simultaneously, can present distinct colors, when matching design has the light shield of predetermined pattern 40 to use, just can on this base material 2, form predetermined pattern with particular color, make the present invention make metal nanoparticle 31 at short notice fast and in large quantities, and then utilize described nanoparticle 31 formation to have the pattern on metal material of specific color, make the practical value that efficient is higher and can supply the commercialization manufacturing to produce and have.
Two, the metal nanoparticle of making through method for making of the present invention 31, not needing to see through other program also can combine with forming closely with base material 2 again, the metal nanoparticle 31 that the present invention is made is difficult for coming off on base material 2, and then the pattern on metal material that described metal nanoparticle 31 is arranged form is difficult for impairedly, and has preferable stability and reliability.
Three, the present invention is except the color that can be presented by the size control of change metal nanoparticle 31, can also see through change the metal material kind of metal nanoparticle 31 and alloy ratio and present different colours, therefore, can be by the particle diameter and the material kind that change nanoparticle 31, change and multicolour combination, and have utmost point range of application widely.
Claims (19)
1. the method for making of a pattern on metal material; It is characterized in that: this method for making comprises the following step:
(i) provide a second-order transition temperature more than or equal to 120 ℃ base material, and distinguish out a predetermined pattern and a background area around this predetermined pattern on this base material one surface;
(ii) a wherein side of this predetermined pattern and background area, formation of deposits is the metal level of one deck pre-determined thickness at least, and this metal level is made by a material that is selected from following group: inert metal, and the formed alloy of inert metal;
The base material that (iii) surface has been formed with this metal level places a chamber, and this chamber is vacuumized, and a gas is provided; And
(iv) in one section preset time length, continuing provides a microwave energy to this chamber, make this gas form microwave electricity slurry, and the metal level of effect to this base material, make this metal level fusion and form metal nanoparticle separately a plurality of and that have predetermined particle diameter.
2. the method for making of pattern on metal material as claimed in claim 1, it is characterized in that: in step (i), be the surface that utilizes a light shield with a predetermined pattern to cover this base material, make the surface of this base material distinguish out this predetermined pattern and around this background area of this predetermined pattern.
3. the method for making of pattern on metal material as claimed in claim 2, it is characterized in that: in step (i), this predetermined pattern on this light shield is a kind of pattern of hollow out, so, step (ii) in, be predetermined pattern by this light shield hollow out, this metal level of formation of deposits in the predetermined pattern of this substrate surface.
4. the method for making of pattern on metal material as claimed in claim 2, it is characterized in that: in step (i), the predetermined pattern of this light shield is a kind of solid pattern, so, step (ii) in, be to cover, at this metal level of background area formation of deposits of this substrate surface by the solid predetermined pattern of this light shield.
5. the method for making of pattern on metal material as claimed in claim 3, it is characterized in that: in step (i), this base material is a stupalith.
6. the method for making of pattern on metal material as claimed in claim 3, it is characterized in that: in step (i), this base material is that light-transmitting materials is made, and its transmittance is more than or equal to 85%.
7. the method for making of pattern on metal material as claimed in claim 6, it is characterized in that: in step (i), this base material is that a material that is selected from following group is made: glass, silica glass, sheet mica, sapphire and crystalline ceramics.
8. the method for making of pattern on metal material as claimed in claim 3 is characterized in that: step (ii) in, this metal level is made by a material that is selected from following group: gold and silver, and the alloy of gold.
9. the method for making of pattern on metal material as claimed in claim 8 is characterized in that: step (ii) in, this metal layer thickness is 1nm～20nm.
10. the method for making of pattern on metal material as claimed in claim 9 is characterized in that: step (iii) in, be to make pressure in this chamber reduce and maintain the scope of 0.2torr～6.0torr.
11. the method for making of pattern on metal material as claimed in claim 10 is characterized in that: step (iv) in, the particle diameter of formed described metal nanoparticle is 3nm～200nm.
12. the method for making of pattern on metal material as claimed in claim 11 is characterized in that: step (iii) in, the gas that is provided is one to be selected from the gas in following group: argon gas, nitrogen and oxygen.
13. the method for making of pattern on metal material as claimed in claim 6 is characterized in that: step (ii) in, on this base material, be formed with the metal level of multilayer unlike material.
14. the method for making of pattern on metal material as claimed in claim 13 is characterized in that: step (ii) in, described metal level is respectively made by a material that is selected from following group: gold and silver, and the gold alloy.
15. the method for making of pattern on metal material as claimed in claim 14 is characterized in that: step (ii) in, the total thickness of described metal level is 1nm～20nm.
16. the method for making of pattern on metal material as claimed in claim 15 is characterized in that: step (ii) in, each layer metal layer thickness scope is 0.1nm～19.9nm.
17. the method for making of pattern on metal material as claimed in claim 16 is characterized in that: step (iii) in, be to make pressure in this chamber reduce and maintain the scope of 0.2torr～6.0torr.
18. the method for making of pattern on metal material as claimed in claim 17 is characterized in that: step (iv) in, be to use a launched microwave unit to provide this microwave energy, and the unitary frequency of this launched microwave comes down to be set at 2450MHz to this chamber.
19. the method for making of pattern on metal material as claimed in claim 18 is characterized in that: step (iv) in, the peak value of the absorbing wavelength of described metal nanoparticle is 400nm～650nm.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105441941A (en) * | 2016-01-07 | 2016-03-30 | 西南交通大学 | Pattern drawing method |
| CN106864152A (en) * | 2017-03-02 | 2017-06-20 | 西藏中艺金像科技股份有限公司 | A kind of preparation method of gold image calligraphy and painting |
| CN111172536A (en) * | 2020-02-21 | 2020-05-19 | 攀钢集团攀枝花钢铁研究院有限公司 | Preparation method of iron-based vanadium carbide coating |
-
2009
- 2009-02-17 CN CN2009100073764A patent/CN101805904B/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105441941A (en) * | 2016-01-07 | 2016-03-30 | 西南交通大学 | Pattern drawing method |
| CN106864152A (en) * | 2017-03-02 | 2017-06-20 | 西藏中艺金像科技股份有限公司 | A kind of preparation method of gold image calligraphy and painting |
| CN111172536A (en) * | 2020-02-21 | 2020-05-19 | 攀钢集团攀枝花钢铁研究院有限公司 | Preparation method of iron-based vanadium carbide coating |
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