CN101665963A - Environmental non-cyanide plating solution for silver-plating - Google Patents
Environmental non-cyanide plating solution for silver-plating Download PDFInfo
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- CN101665963A CN101665963A CN200910112555A CN200910112555A CN101665963A CN 101665963 A CN101665963 A CN 101665963A CN 200910112555 A CN200910112555 A CN 200910112555A CN 200910112555 A CN200910112555 A CN 200910112555A CN 101665963 A CN101665963 A CN 101665963A
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- silver
- plating
- cyanide
- plating solution
- acid
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- 238000007747 plating Methods 0.000 title claims abstract description 78
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 title claims abstract description 19
- 230000007613 environmental effect Effects 0.000 title claims description 11
- 229910052709 silver Inorganic materials 0.000 claims abstract description 71
- 239000004332 silver Substances 0.000 claims abstract description 71
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 67
- 238000009713 electroplating Methods 0.000 claims abstract description 35
- 239000000203 mixture Substances 0.000 claims abstract description 21
- -1 amino acid compounds Chemical class 0.000 claims abstract description 18
- 239000008139 complexing agent Substances 0.000 claims abstract description 10
- 239000000654 additive Substances 0.000 claims abstract description 7
- 230000000996 additive effect Effects 0.000 claims abstract description 4
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 claims abstract description 3
- 150000001875 compounds Chemical class 0.000 claims description 8
- 229940024606 amino acid Drugs 0.000 claims description 6
- 235000001014 amino acid Nutrition 0.000 claims description 6
- UCMIRNVEIXFBKS-UHFFFAOYSA-N beta-alanine Chemical compound NCCC(O)=O UCMIRNVEIXFBKS-UHFFFAOYSA-N 0.000 claims description 6
- OPTASPLRGRRNAP-UHFFFAOYSA-N cytosine Chemical compound NC=1C=CNC(=O)N=1 OPTASPLRGRRNAP-UHFFFAOYSA-N 0.000 claims description 6
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 claims description 5
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 claims description 4
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims description 4
- 150000001412 amines Chemical class 0.000 claims description 4
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- UYTPUPDQBNUYGX-UHFFFAOYSA-N guanine Chemical compound O=C1NC(N)=NC2=C1N=CN2 UYTPUPDQBNUYGX-UHFFFAOYSA-N 0.000 claims description 4
- 150000002736 metal compounds Chemical class 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 229920000768 polyamine Polymers 0.000 claims description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 4
- LEHOTFFKMJEONL-UHFFFAOYSA-N Uric Acid Chemical compound N1C(=O)NC(=O)C2=C1NC(=O)N2 LEHOTFFKMJEONL-UHFFFAOYSA-N 0.000 claims description 3
- TVWHNULVHGKJHS-UHFFFAOYSA-N Uric acid Natural products N1C(=O)NC(=O)C2NC(=O)NC21 TVWHNULVHGKJHS-UHFFFAOYSA-N 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims description 3
- 229940000635 beta-alanine Drugs 0.000 claims description 3
- 229960002989 glutamic acid Drugs 0.000 claims description 3
- 229940116269 uric acid Drugs 0.000 claims description 3
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 claims description 2
- RAIPHJJURHTUIC-UHFFFAOYSA-N 1,3-thiazol-2-amine Chemical compound NC1=NC=CS1 RAIPHJJURHTUIC-UHFFFAOYSA-N 0.000 claims description 2
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 claims description 2
- 239000004593 Epoxy Substances 0.000 claims description 2
- 239000004471 Glycine Substances 0.000 claims description 2
- XUJNEKJLAYXESH-REOHCLBHSA-N L-Cysteine Chemical compound SC[C@H](N)C(O)=O XUJNEKJLAYXESH-REOHCLBHSA-N 0.000 claims description 2
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 claims description 2
- LEVWYRKDKASIDU-IMJSIDKUSA-N L-cystine Chemical compound [O-]C(=O)[C@@H]([NH3+])CSSC[C@H]([NH3+])C([O-])=O LEVWYRKDKASIDU-IMJSIDKUSA-N 0.000 claims description 2
- HNDVDQJCIGZPNO-YFKPBYRVSA-N L-histidine Chemical compound OC(=O)[C@@H](N)CC1=CN=CN1 HNDVDQJCIGZPNO-YFKPBYRVSA-N 0.000 claims description 2
- FFEARJCKVFRZRR-BYPYZUCNSA-N L-methionine Chemical compound CSCC[C@H](N)C(O)=O FFEARJCKVFRZRR-BYPYZUCNSA-N 0.000 claims description 2
- GMEHFXXZSWDEDB-UHFFFAOYSA-N N-ethylthiourea Chemical compound CCNC(N)=S GMEHFXXZSWDEDB-UHFFFAOYSA-N 0.000 claims description 2
- 229950003476 aminothiazole Drugs 0.000 claims description 2
- 229910052787 antimony Inorganic materials 0.000 claims description 2
- 235000003704 aspartic acid Nutrition 0.000 claims description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims description 2
- 239000012964 benzotriazole Substances 0.000 claims description 2
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- 229910052793 cadmium Inorganic materials 0.000 claims description 2
- 229940104302 cytosine Drugs 0.000 claims description 2
- HNDVDQJCIGZPNO-UHFFFAOYSA-N histidine Natural products OC(=O)C(N)CC1=CN=CN1 HNDVDQJCIGZPNO-UHFFFAOYSA-N 0.000 claims description 2
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 claims description 2
- 229930182817 methionine Natural products 0.000 claims description 2
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 claims description 2
- YODZTKMDCQEPHD-UHFFFAOYSA-N thiodiglycol Chemical compound OCCSCCO YODZTKMDCQEPHD-UHFFFAOYSA-N 0.000 claims description 2
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 claims description 2
- 229940103494 thiosalicylic acid Drugs 0.000 claims description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims 2
- RWZYAGGXGHYGMB-UHFFFAOYSA-N anthranilic acid Chemical compound NC1=CC=CC=C1C(O)=O RWZYAGGXGHYGMB-UHFFFAOYSA-N 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- DWNBOPVKNPVNQG-LURJTMIESA-N (2s)-4-hydroxy-2-(propylamino)butanoic acid Chemical compound CCCN[C@H](C(O)=O)CCO DWNBOPVKNPVNQG-LURJTMIESA-N 0.000 claims 1
- 150000008575 L-amino acids Chemical class 0.000 claims 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims 1
- 150000001413 amino acids Chemical class 0.000 claims 1
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 claims 1
- AJGPQPPJQDDCDA-UHFFFAOYSA-N azanium;hydron;oxalate Chemical compound N.OC(=O)C(O)=O AJGPQPPJQDDCDA-UHFFFAOYSA-N 0.000 claims 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims 1
- 150000002460 imidazoles Chemical class 0.000 claims 1
- OQTOQAYHQVKZET-UHFFFAOYSA-N oxalonitrile;silver Chemical compound [Ag].N#CC#N OQTOQAYHQVKZET-UHFFFAOYSA-N 0.000 claims 1
- 229960003330 pentetic acid Drugs 0.000 claims 1
- VTGOHKSTWXHQJK-UHFFFAOYSA-N pyrimidin-2-ol Chemical compound OC1=NC=CC=N1 VTGOHKSTWXHQJK-UHFFFAOYSA-N 0.000 claims 1
- 229940088594 vitamin Drugs 0.000 claims 1
- 235000013343 vitamin Nutrition 0.000 claims 1
- 239000011782 vitamin Substances 0.000 claims 1
- 229930003231 vitamin Natural products 0.000 claims 1
- 150000003722 vitamin derivatives Chemical class 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 16
- 229910052802 copper Inorganic materials 0.000 abstract description 16
- 239000010949 copper Substances 0.000 abstract description 16
- 239000011248 coating agent Substances 0.000 abstract description 5
- 238000000576 coating method Methods 0.000 abstract description 5
- 229910000881 Cu alloy Inorganic materials 0.000 abstract description 4
- 239000000758 substrate Substances 0.000 abstract description 4
- 229910045601 alloy Inorganic materials 0.000 abstract description 3
- 239000000956 alloy Substances 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 abstract 1
- 238000007654 immersion Methods 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 36
- LFAGQMCIGQNPJG-UHFFFAOYSA-N silver cyanide Chemical compound [Ag+].N#[C-] LFAGQMCIGQNPJG-UHFFFAOYSA-N 0.000 description 7
- ISAKRJDGNUQOIC-UHFFFAOYSA-N Uracil Chemical compound O=C1C=CNC(=O)N1 ISAKRJDGNUQOIC-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 5
- 229910001369 Brass Inorganic materials 0.000 description 4
- 239000010951 brass Substances 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229920002873 Polyethylenimine Polymers 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 229940035893 uracil Drugs 0.000 description 3
- YIROYDNZEPTFOL-UHFFFAOYSA-N 5,5-Dimethylhydantoin Chemical compound CC1(C)NC(=O)NC1=O YIROYDNZEPTFOL-UHFFFAOYSA-N 0.000 description 2
- 101710134784 Agnoprotein Proteins 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- FDGQSTZJBFJUBT-UHFFFAOYSA-N hypoxanthine Chemical compound O=C1NC=NC2=C1NC=N2 FDGQSTZJBFJUBT-UHFFFAOYSA-N 0.000 description 2
- TWBYWOBDOCUKOW-UHFFFAOYSA-N isonicotinic acid Chemical compound OC(=O)C1=CC=NC=C1 TWBYWOBDOCUKOW-UHFFFAOYSA-N 0.000 description 2
- 239000002736 nonionic surfactant Chemical class 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- UBQKCCHYAOITMY-UHFFFAOYSA-N pyridin-2-ol Chemical compound OC1=CC=CC=N1 UBQKCCHYAOITMY-UHFFFAOYSA-N 0.000 description 2
- 229960002317 succinimide Drugs 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 description 1
- RGPSXEGIFWXCDR-UHFFFAOYSA-N 3-cyano-3-oxopropanoic acid Chemical compound OC(=O)CC(=O)C#N RGPSXEGIFWXCDR-UHFFFAOYSA-N 0.000 description 1
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 1
- GFFGJBXGBJISGV-UHFFFAOYSA-N Adenine Chemical compound NC1=NC=NC2=C1N=CN2 GFFGJBXGBJISGV-UHFFFAOYSA-N 0.000 description 1
- 229930024421 Adenine Natural products 0.000 description 1
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
- UGQMRVRMYYASKQ-UHFFFAOYSA-N Hypoxanthine nucleoside Natural products OC1C(O)C(CO)OC1N1C(NC=NC2=O)=C2N=C1 UGQMRVRMYYASKQ-UHFFFAOYSA-N 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- OUYCCCASQSFEME-QMMMGPOBSA-N L-tyrosine Chemical compound OC(=O)[C@@H](N)CC1=CC=C(O)C=C1 OUYCCCASQSFEME-QMMMGPOBSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229960000643 adenine Drugs 0.000 description 1
- 229960004050 aminobenzoic acid Drugs 0.000 description 1
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- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 235000018417 cysteine Nutrition 0.000 description 1
- XUJNEKJLAYXESH-UHFFFAOYSA-N cysteine Natural products SCC(N)C(O)=O XUJNEKJLAYXESH-UHFFFAOYSA-N 0.000 description 1
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- 238000005034 decoration Methods 0.000 description 1
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- 235000013922 glutamic acid Nutrition 0.000 description 1
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- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
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Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Abstract
一种不含氰化物的环保型无氰银电镀液,该镀液含有银离子来源物、配位剂氨基酸类化合物及其衍生物、辅助配位剂及电镀添加剂。组成配比及工艺条件是:银盐0.01~1mol/L,氨基酸类化合物或其衍生物0.01~10mol/L,辅助配位剂0.002~2mol/L,电镀添加剂0.001~2.0g/L,镀银液pH 6~14,镀银液温度10~70℃。与传统的有氰镀银工艺配方相比,该环保型镀银液具有清洁电镀的特点;同时,镀液中银离子与铜、铜合金等活泼性金属及合金基底的置换速率非常慢,镀银过程中可采用一步型电镀方法,无需预镀银或浸银,且镀层光亮、结合力良好。An environment-friendly cyanide-free silver electroplating solution without cyanide. The plating solution contains silver ion sources, complexing agent amino acid compounds and derivatives thereof, auxiliary complexing agents and electroplating additives. The composition ratio and process conditions are: silver salt 0.01~1mol/L, amino acid compound or its derivatives 0.01~10mol/L, auxiliary complexing agent 0.002~2mol/L, electroplating additive 0.001~2.0g/L, silver plating The pH of the solution is 6-14, and the temperature of the silver-plating solution is 10-70°C. Compared with the traditional formula of silver plating with cyanide, this environmentally friendly silver plating solution has the characteristics of clean electroplating; at the same time, the replacement rate of silver ions in the plating solution with active metals and alloy substrates such as copper and copper alloys is very slow, and silver plating One-step electroplating method can be used in the process, without pre-plating silver or immersion silver, and the coating is bright and has good bonding force.
Description
技术领域 technical field
本发明涉及一种电化学镀银技术领域,具体说涉及一种用以替代剧毒的氰化镀银液的环保型无氰银电镀液的配方The invention relates to the technical field of electrochemical silver plating, in particular to a formula for an environment-friendly cyanide-free silver plating solution used to replace highly toxic cyanide silver plating solution
技术背景 technical background
银镀层已广泛应用于装饰品、餐具和电子制品等领域。迄今为止,国内外的电镀银工艺大多还是采用有氰镀银工艺电镀银层。但氰化物剧毒,对人体和环境的危害极大。随着世界各国环境保护意识的加强和相关政策的出台,有氰电镀成为限制申报、原则淘汰的工艺。Silver plating has been widely used in fields such as decorations, tableware and electronic products. So far, most of the electroplating silver processes at home and abroad still use the cyanide silver plating process to electroplate the silver layer. However, cyanide is highly toxic and extremely harmful to humans and the environment. With the strengthening of environmental protection awareness and the promulgation of relevant policies in various countries around the world, cyanide electroplating has become a process with restricted declarations and eliminated in principle.
与有氰镀银工艺相比,无氰镀银工艺的研究是近几十年的事。无氰镀银是以无机或有机化合物,替换氰化物作为银离子的配合剂,以便提高镀液的阴极极化程度,从而使银还原时具有类似于氰配合剂的电沉积特性。至今为止,尽管国内外电镀工作者对无氰镀银进行了大量的研究,但还没有一个可以完全取代氰化物镀银。大致存在以下几个问题:(1)镀银层容易变色。银在大多数有机酸、强酸及盐溶液中有良好的化学稳定性,但在含有卤化物、硫化物的空气中,银表面很快变色。这是所有镀银普遍存在的问题(包括氰化镀银工艺),所以一般要进行镀后处理。(2)镀层结合力差。镀银制件一般是铜和铜合金,由于铜的标准电位比银负得多,当铜及其合金零件进入镀液时,在未通电前即发生置换反应,表面形成置换层,它与基体的结合力差,同时还有部分的铜杂质污染镀液,经常采用预镀银的方式才能避免此类问题的发生。(3)镀液稳定性较差,寿命较短。主要原因有:①镀液中配合剂配合能力不够,在光照和热的条件下Ag+离子很容易还原成银单质;②配合剂自身的性质。很多配合剂在电镀工艺条件下会变质,如丁二酰亚胺在碱性条件下的水解。(4)镀液成本较高,工业实用价值不高。无氰镀银所使用的配合剂和添加剂价格昂贵,购买困难,虽然其小槽实验镀液和镀层性能都接近氰化镀银,但如果应用于实际生产,厂家难接受。Compared with the cyanide silver plating process, the research on the cyanide-free silver plating process has been done in recent decades. Cyanide-free silver plating uses inorganic or organic compounds to replace cyanide as a complexing agent for silver ions, so as to increase the cathodic polarization of the plating solution, so that the silver can be reduced to have electrodeposition characteristics similar to cyanide complexing agents. So far, although electroplating workers at home and abroad have conducted a lot of research on cyanide-free silver plating, none of them can completely replace cyanide silver plating. There are roughly the following problems: (1) the silver-plated layer is easy to change color. Silver has good chemical stability in most organic acids, strong acids and salt solutions, but in the air containing halides and sulfides, the surface of silver will change color quickly. This is a common problem in all silver plating (including cyanide silver plating process), so post-plating treatment is generally required. (2) The bonding force of the coating is poor. Silver-plated parts are generally copper and copper alloys. Since the standard potential of copper is much more negative than that of silver, when copper and its alloy parts enter the plating solution, a replacement reaction occurs before power is applied, and a replacement layer is formed on the surface. The bonding force is poor, and some copper impurities contaminate the plating solution. Pre-plating silver is often used to avoid such problems. (3) The stability of the plating solution is poor and the service life is short. The main reasons are: ①The complexing ability of the complexing agent in the plating solution is not enough, and Ag + ions are easily reduced to simple silver under the conditions of light and heat; ②The properties of the complexing agent itself. Many complexing agents will deteriorate under the conditions of the electroplating process, such as the hydrolysis of succinimide under alkaline conditions. (4) The cost of the plating solution is high, and the industrial practical value is not high. The compounding agents and additives used in cyanide-free silver plating are expensive and difficult to purchase. Although the small tank experimental plating solution and coating performance are close to cyanide silver plating, it is difficult for manufacturers to accept it if it is used in actual production.
在银电镀过程中,镀银零件的基体材料一般都是铜和铜合金件,也有钢铁作为基体镀银的,但通常先镀上一层铜作底镀层。当铜及其合金件等活泼性金属基体进入镀银液时,包括氰化镀银液和无氰镀银液,镀件的表面形成的置换银层不仅严重影响镀层与基体的结合力,而且置换过程中产生的铁和铜离子还会污染镀液。因此,传统的镀银工艺中镀件进入镀银液之前,必须进行预镀银层。显然,传统工艺流程不仅进一步提高了电镀成本,而且费时。一步型镀银可以简化镀银工艺流程,节省电镀时间,从而可能降低运行成本,有利于无氰镀银体系在电镀工业中的实际应用。In the silver electroplating process, the base materials of silver-plated parts are generally copper and copper alloys, and steel is also used as the base for silver plating, but usually a layer of copper is first plated as the bottom coating. When active metal substrates such as copper and its alloys enter the silver plating solution, including cyanide silver plating solution and cyanide-free silver plating solution, the replacement silver layer formed on the surface of the plated parts not only seriously affects the bonding force between the coating and the substrate, but also The iron and copper ions generated during the replacement process can also contaminate the bath. Therefore, before the plated parts enter the silver plating solution in the traditional silver plating process, a pre-silvering layer must be carried out. Obviously, the traditional process not only further increases the cost of electroplating, but also takes time. One-step silver plating can simplify the silver plating process and save plating time, which may reduce operating costs and is beneficial to the practical application of cyanide-free silver plating systems in the electroplating industry.
发明内容 Contents of the invention
本发明的目的就是提供一种不含氰化物的环保型无氰银电镀液,该电镀液含有银离子来源物、氨基酸类化合物或其衍生物、辅助配位剂和电镀添加剂,它们在无氰银镀液中的配比组成及工艺条件是:The purpose of the present invention is to provide a kind of environment-friendly cyanide-free silver electroplating solution that does not contain cyanide. The proportioning composition and process conditions in the silver plating solution are:
银盐 0.01~1mol/LSilver salt 0.01~1mol/L
氨基酸类化合物或其衍生物 0.01~10mol/LAmino acid compounds or their derivatives 0.01~10mol/L
辅助配位剂 0.002~2mol/L。Auxiliary complexing agent 0.002~2mol/L.
电镀添加剂 0.001~2.0g/LElectroplating Additives 0.001~2.0g/L
镀银液pH 6~14pH of silver plating solution 6~14
镀银液温度 10~70℃。The temperature of the silver plating solution is 10-70°C.
所述的配位剂氨基酸类化合物或其衍生物优是指甘氨酸、α-丙氨酸、β-丙氨酸、半胱氨酸、胱氨酸、络氨酸、组氨酸、蛋氨酸、邻氨基苯甲酸、天冬氨酸、谷氨酸、氨基磺酸、氨二乙酸、氨三乙酸、二乙基三胺五乙酸、N-羟乙基乙二胺三乙酸或芳香环氨基酸中的一种或多种任意比例的混合物。The described coordinating agent amino acid compounds or their derivatives preferably refer to glycine, α-alanine, β-alanine, cysteine, cystine, tyrosine, histidine, methionine, ortho One of aminobenzoic acid, aspartic acid, glutamic acid, sulfamic acid, nitrilodiacetic acid, nitrilotriacetic acid, diethyltriaminepentaacetic acid, N-hydroxyethylethylenediaminetriacetic acid, or aromatic ring amino acids One or more mixtures in any proportion.
所述的辅助剂是指丁二酰亚胺、乙内酰脲、5,5-二甲基乙内酰脲、尿嘧啶、胞嘧啶或次黄嘌呤中的一种或多种任意比例的混合物。The auxiliary agent refers to a mixture of one or more of succinimide, hydantoin, 5,5-dimethylhydantoin, uracil, cytosine or hypoxanthine in any proportion .
所述电镀添加剂是指可溶性金属化合物、非离子表面活性剂、聚胺类化合物、含硫化合物或氮杂环化合物中的一种或多种任意比例的混合物。其中可溶性金属化合物是指Bi、Co、Cd、Cu、Se或Sb的无机酸盐氧化物或氢氧化物中的一种或多种任意比例的混合物;非离子表面活性剂是指聚乙二醇(分子量为100~100000)或环氧胺缩聚物(分子量为100~100000)中的一种或两种任意比例的混合物;聚胺类化合物是指聚乙烯亚胺(分子量为100~100000)或聚乙烯胺(分子量为100~100000)中的一种或两种任意比例的混合物;氮杂环化合物是指异烟酸、咪唑、苯并咪唑、苯并三氮唑、2-羟基吡啶、2,2-联吡啶、尿嘧啶、尿酸、腺嘌呤或鸟嘌呤中的一种或多种任意比例的混合物;含硫化合物是指Na2S2O3、K2S2O3、硫脲、乙基硫脲、氨基噻唑、苯并噻唑、巯基苯并噻唑、巯基苯并咪唑、硫代二乙二醇或硫代水杨酸中的一种或多种任意比例的混合物。The electroplating additive refers to a mixture of one or more of soluble metal compounds, non-ionic surfactants, polyamine compounds, sulfur-containing compounds or nitrogen heterocyclic compounds in any proportion. Wherein the soluble metal compound refers to the mixture of one or more of the inorganic acid salt oxides or hydroxides of Bi, Co, Cd, Cu, Se or Sb in any proportion; the nonionic surfactant refers to polyethylene glycol (molecular weight 100-100000) or epoxy amine polycondensate (molecular weight 100-100000) or a mixture of two in any proportion; polyamine compounds refer to polyethyleneimine (molecular weight 100-100000) or Polyvinylamine (molecular weight: 100-100,000) or a mixture of two in any proportion; nitrogen heterocyclic compounds refer to isonicotinic acid, imidazole, benzimidazole, benzotriazole, 2-hydroxypyridine, 2 , a mixture of one or more of 2-bipyridine, uracil, uric acid, adenine or guanine in any proportion; sulfur-containing compounds refer to Na 2 S 2 O 3 , K 2 S 2 O 3 , thiourea, A mixture of one or more of ethylthiourea, aminothiazole, benzothiazole, mercaptobenzothiazole, mercaptobenzimidazole, thiodiethylene glycol or thiosalicylic acid in any proportion.
本发明同背景技术相比所产生的显著优点:The present invention compares the remarkable advantage that background technology produces:
(1)采用氨基酸类化合物及其衍生物作为配位剂与银离子形成配位化合物,完全取代了氰化物,消除了电镀过程中氰化物对人体和环境的危害,实现了清洁电镀;(1) Amino acid compounds and their derivatives are used as coordination agents to form coordination compounds with silver ions, which completely replace cyanide, eliminate the harm of cyanide to the human body and the environment during the electroplating process, and realize clean electroplating;
(2)镀液中银离子与铜、铜合金等活波性金属基底的置换速率非常慢,镀件无需预镀银或浸银,可实施一步型镀银工艺,简化了镀银工艺流程,降低了生成成本;(2) The replacement rate of silver ions in the plating solution with active metal substrates such as copper and copper alloys is very slow, and the plated parts do not need to be pre-plated or immersed in silver, and a one-step silver plating process can be implemented, which simplifies the silver plating process and reduces generated cost;
(3)该无氰银电镀液的原料成本低、来源广泛,镀层结合可靠,镀液稳定性能高,能很好地满足电镀工业需求。(3) The raw material cost of the cyanide-free silver electroplating solution is low, the sources are wide, the plating layer is bonded reliably, and the plating solution has high stability performance, which can well meet the needs of the electroplating industry.
具体实施方式 Detailed ways
实施例1Example 1
按0.15mol/L AgNO3、0.6mol/L β-丙氨酸、0.1mol/L尿嘧啶及0.002g/L聚乙烯亚胺组成将各物质溶于去离子水中,配制成环保型银电镀液,调节镀银液pH值为13,银电镀液温度为15℃。将铜或黄铜镀件浸入银电镀液中,采用一步电镀法,以电流密度为0.2A/dm2对铜镀件实施电镀,镀到银层厚度为3μm时为止。所得银层光亮,与基体结合力良好。According to the composition of 0.15mol/L AgNO 3 , 0.6mol/L β-alanine, 0.1mol/L uracil and 0.002g/L polyethyleneimine, dissolve each substance in deionized water to prepare an environment-friendly silver plating solution , adjust the pH of the silver plating solution to be 13, and the temperature of the silver plating solution to be 15°C. Immerse the copper or brass plated parts in the silver electroplating solution, and use the one-step electroplating method to electroplate the copper plated parts with a current density of 0.2A/ dm2 until the thickness of the silver layer is 3μm. The obtained silver layer is bright and has good bonding force with the matrix.
实施例2Example 2
按0.15mol/L AgNO3、0.5mol/L胱氨酸、0.1mol/L异烟酸、0.05g/L聚乙烯亚胺和0.05g/L苯丙三氮唑组成将各物质溶于去离子水中,配制成环保型银电镀液,调节镀银液pH值为10,银电镀液温度为40℃。将铜或黄铜镀件浸入银电镀液中,采用一步电镀法,以电流密度为0.2A/dm2对铜镀件实施电镀,镀到银层厚度为3μm时为止。所得银层光亮,与基体结合力良好。Dissolve each substance in deionized In the water, an environment-friendly silver electroplating solution is prepared, the pH of the silver plating solution is adjusted to be 10, and the temperature of the silver electroplating solution is 40°C. Immerse the copper or brass plated parts in the silver electroplating solution, and use the one-step electroplating method to electroplate the copper plated parts with a current density of 0.2A/ dm2 until the thickness of the silver layer is 3μm. The obtained silver layer is bright and has good bonding force with the matrix.
实施例3Example 3
按0.1mol/L AgSO3CH3、0.5mol/L氨二乙酸、0.1mol/L 5,5-二甲基乙内酰脲、0.95g/L聚乙烯亚胺和0.05g/L 10ppm Sb组成将各物质溶于去离子水中,配制成环保型银电镀液,调节镀银液pH值为8,银电镀液温度为40℃。将黄铜镀件浸入银电镀液中,采用一步电镀法,以电流密度为0.2A/dm2对铜镀件实施电镀,镀到银层厚度为3μm时为止。所得银层光亮,与基体结合力良好。Composition of 0.1mol/L AgSO 3 CH 3 , 0.5mol/L aminodiacetic acid, 0.1mol/L 5,5-dimethylhydantoin, 0.95g/L polyethyleneimine and 0.05g/L 10ppm Sb Each substance was dissolved in deionized water to prepare an environment-friendly silver electroplating solution, the pH of the silver plating solution was adjusted to be 8, and the temperature of the silver electroplating solution was 40°C. Immerse the brass plated parts in the silver electroplating solution, and use the one-step electroplating method to electroplate the copper plated parts with a current density of 0.2A/dm 2 until the thickness of the silver layer is 3 μm. The obtained silver layer is bright and has good bonding force with the matrix.
实施例4Example 4
按0.1mol/L AgNO3、0.5mol/L谷氨酸、0.1mol/L尿酸、0.01g/L聚乙二醇和2.0g/L2,2-联吡啶组成将各物质溶于去离子水中,配制成环保型银电镀液,调节镀银液pH值为6,银电镀液温度为65℃。将铜或黄铜镀件浸入银电镀液中,采用一步电镀法,以电流密度为0.2A/dm2对铜镀件实施电镀,镀到银层厚度为3μm时为止。所得银层光亮,与基体结合力良好。Dissolve each substance in deionized water according to the composition of 0.1mol/L AgNO 3 , 0.5mol/L glutamic acid, 0.1mol/L uric acid, 0.01g/L polyethylene glycol and 2.0g/L 2,2-bipyridine, and prepare Become an environment-friendly silver electroplating solution, adjust the pH of the silver plating solution to be 6, and the temperature of the silver electroplating solution to be 65°C. Immerse the copper or brass plated parts in the silver electroplating solution, and use the one-step electroplating method to electroplate the copper plated parts with a current density of 0.2A/ dm2 until the thickness of the silver layer is 3μm. The obtained silver layer is bright and has good bonding force with the matrix.
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2009
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