CN101636469B - Comprise the liquid crystal polymer of the patternable of thio-ether units - Google Patents
Comprise the liquid crystal polymer of the patternable of thio-ether units Download PDFInfo
- Publication number
- CN101636469B CN101636469B CN200780047888.2A CN200780047888A CN101636469B CN 101636469 B CN101636469 B CN 101636469B CN 200780047888 A CN200780047888 A CN 200780047888A CN 101636469 B CN101636469 B CN 101636469B
- Authority
- CN
- China
- Prior art keywords
- liquid crystal
- patterning
- group
- film
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229920000106 Liquid crystal polymer Polymers 0.000 title claims abstract description 142
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 title claims abstract description 131
- 125000000101 thioether group Chemical group 0.000 title abstract 2
- 238000000059 patterning Methods 0.000 claims abstract description 159
- 238000000034 method Methods 0.000 claims abstract description 148
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 137
- 239000000203 mixture Substances 0.000 claims abstract description 134
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 108
- 239000012298 atmosphere Substances 0.000 claims abstract description 33
- 229920000642 polymer Polymers 0.000 claims abstract description 27
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 23
- 239000001301 oxygen Substances 0.000 claims abstract description 22
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 21
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 12
- 239000010408 film Substances 0.000 claims description 160
- -1 acryloxy Chemical group 0.000 claims description 102
- 150000001875 compounds Chemical class 0.000 claims description 59
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 51
- 238000000576 coating method Methods 0.000 claims description 50
- 239000011248 coating agent Substances 0.000 claims description 48
- 238000002360 preparation method Methods 0.000 claims description 38
- 239000000654 additive Substances 0.000 claims description 36
- 230000000996 additive effect Effects 0.000 claims description 36
- 230000003287 optical effect Effects 0.000 claims description 33
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 31
- 239000002904 solvent Substances 0.000 claims description 31
- 150000002148 esters Chemical class 0.000 claims description 28
- 229910052799 carbon Inorganic materials 0.000 claims description 23
- 150000001336 alkenes Chemical class 0.000 claims description 22
- 125000000217 alkyl group Chemical group 0.000 claims description 22
- 125000000524 functional group Chemical group 0.000 claims description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 19
- 239000003999 initiator Substances 0.000 claims description 19
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 18
- 229910052736 halogen Inorganic materials 0.000 claims description 18
- 150000002367 halogens Chemical class 0.000 claims description 18
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 17
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 16
- 238000012545 processing Methods 0.000 claims description 16
- 229910052739 hydrogen Inorganic materials 0.000 claims description 15
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 15
- 239000001257 hydrogen Substances 0.000 claims description 14
- 230000010287 polarization Effects 0.000 claims description 14
- 239000010409 thin film Substances 0.000 claims description 14
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 13
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 13
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims description 12
- 238000010521 absorption reaction Methods 0.000 claims description 12
- 125000003118 aryl group Chemical group 0.000 claims description 12
- 239000003795 chemical substances by application Substances 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- 229920001567 vinyl ester resin Polymers 0.000 claims description 12
- 150000001345 alkine derivatives Chemical class 0.000 claims description 11
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 claims description 11
- 239000000178 monomer Substances 0.000 claims description 11
- 125000005842 heteroatom Chemical group 0.000 claims description 10
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 claims description 9
- 230000010363 phase shift Effects 0.000 claims description 9
- ZKJNETINGMOHJG-GGWOSOGESA-N (e)-1-[(e)-prop-1-enoxy]prop-1-ene Chemical compound C\C=C\O\C=C\C ZKJNETINGMOHJG-GGWOSOGESA-N 0.000 claims description 8
- 239000004593 Epoxy Substances 0.000 claims description 8
- 150000001721 carbon Chemical group 0.000 claims description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 8
- 239000004990 Smectic liquid crystal Substances 0.000 claims description 7
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 7
- 150000003568 thioethers Chemical group 0.000 claims description 7
- 230000033228 biological regulation Effects 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 6
- 229910052717 sulfur Inorganic materials 0.000 claims description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 5
- 239000011593 sulfur Substances 0.000 claims description 5
- 239000004986 Cholesteric liquid crystals (ChLC) Substances 0.000 claims description 4
- 150000001768 cations Chemical class 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- GXBYFVGCMPJVJX-UHFFFAOYSA-N Epoxybutene Chemical compound C=CC1CO1 GXBYFVGCMPJVJX-UHFFFAOYSA-N 0.000 claims description 3
- 125000005336 allyloxy group Chemical group 0.000 claims description 3
- 230000003098 cholesteric effect Effects 0.000 claims description 3
- 238000012937 correction Methods 0.000 claims description 3
- 239000008199 coating composition Substances 0.000 claims description 2
- 150000001555 benzenes Chemical class 0.000 claims 4
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
- 239000000463 material Substances 0.000 description 131
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 57
- 230000005855 radiation Effects 0.000 description 49
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical class COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 48
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 46
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 46
- 239000000243 solution Substances 0.000 description 36
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 33
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 30
- 238000004528 spin coating Methods 0.000 description 28
- 230000008569 process Effects 0.000 description 25
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 24
- 238000003847 radiation curing Methods 0.000 description 23
- 238000006243 chemical reaction Methods 0.000 description 21
- 238000010438 heat treatment Methods 0.000 description 21
- 239000002253 acid Substances 0.000 description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 18
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 18
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical group CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 17
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 17
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 16
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 16
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 16
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 16
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 15
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 14
- 125000004429 atom Chemical group 0.000 description 14
- 238000001723 curing Methods 0.000 description 14
- 239000011521 glass Substances 0.000 description 14
- 238000007639 printing Methods 0.000 description 14
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 13
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 12
- 229940059574 pentaerithrityl Drugs 0.000 description 12
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 12
- 238000007711 solidification Methods 0.000 description 12
- 230000008023 solidification Effects 0.000 description 12
- DJOWTWWHMWQATC-KYHIUUMWSA-N Karpoxanthin Natural products CC(=C/C=C/C=C(C)/C=C/C=C(C)/C=C/C1(O)C(C)(C)CC(O)CC1(C)O)C=CC=C(/C)C=CC2=C(C)CC(O)CC2(C)C DJOWTWWHMWQATC-KYHIUUMWSA-N 0.000 description 11
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 11
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 11
- 210000004027 cell Anatomy 0.000 description 11
- 125000004386 diacrylate group Chemical group 0.000 description 11
- 125000000623 heterocyclic group Chemical group 0.000 description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 10
- 230000008859 change Effects 0.000 description 10
- 230000005670 electromagnetic radiation Effects 0.000 description 10
- 229920005862 polyol Polymers 0.000 description 10
- 150000003077 polyols Chemical class 0.000 description 10
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 9
- 238000000137 annealing Methods 0.000 description 9
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 8
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 8
- 125000002837 carbocyclic group Chemical group 0.000 description 8
- 238000011161 development Methods 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 238000001228 spectrum Methods 0.000 description 8
- 150000003573 thiols Chemical class 0.000 description 8
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 7
- BJXXCOMGRRCAGN-CLFAGFIQSA-N [2,2-bis(hydroxymethyl)-3-[(z)-octadec-9-enoyl]oxypropyl] (z)-octadec-9-enoate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC(CO)(CO)COC(=O)CCCCCCC\C=C/CCCCCCCC BJXXCOMGRRCAGN-CLFAGFIQSA-N 0.000 description 7
- 239000002019 doping agent Substances 0.000 description 7
- 230000006870 function Effects 0.000 description 7
- 239000012299 nitrogen atmosphere Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 230000003595 spectral effect Effects 0.000 description 7
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 7
- WGYZMNBUZFHYRX-UHFFFAOYSA-N 1-(1-methoxypropan-2-yloxy)propan-2-ol Chemical compound COCC(C)OCC(C)O WGYZMNBUZFHYRX-UHFFFAOYSA-N 0.000 description 6
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 6
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- 239000007983 Tris buffer Substances 0.000 description 6
- 230000004913 activation Effects 0.000 description 6
- 230000001934 delay Effects 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Natural products OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 150000003254 radicals Chemical class 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 241001597008 Nomeidae Species 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical group O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 238000007306 functionalization reaction Methods 0.000 description 5
- 229910052738 indium Inorganic materials 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 230000007704 transition Effects 0.000 description 5
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Natural products CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 4
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- 229930185605 Bisphenol Natural products 0.000 description 4
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 241000222065 Lycoperdon Species 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- 241000768494 Polymorphum Species 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N Propionic acid Substances CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 238000002679 ablation Methods 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 229940114081 cinnamate Drugs 0.000 description 4
- 230000001143 conditioned effect Effects 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 150000001993 dienes Chemical class 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 210000005224 forefinger Anatomy 0.000 description 4
- 239000003205 fragrance Substances 0.000 description 4
- 239000003292 glue Substances 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 150000002430 hydrocarbons Chemical class 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- CMXPERZAMAQXSF-UHFFFAOYSA-M sodium;1,4-bis(2-ethylhexoxy)-1,4-dioxobutane-2-sulfonate;1,8-dihydroxyanthracene-9,10-dione Chemical compound [Na+].O=C1C2=CC=CC(O)=C2C(=O)C2=C1C=CC=C2O.CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC CMXPERZAMAQXSF-UHFFFAOYSA-M 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 4
- 230000000007 visual effect Effects 0.000 description 4
- ZFPGARUNNKGOBB-UHFFFAOYSA-N 1-Ethyl-2-pyrrolidinone Chemical compound CCN1CCCC1=O ZFPGARUNNKGOBB-UHFFFAOYSA-N 0.000 description 3
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 3
- PSYGHMBJXWRQFD-UHFFFAOYSA-N 2-(2-sulfanylacetyl)oxyethyl 2-sulfanylacetate Chemical compound SCC(=O)OCCOC(=O)CS PSYGHMBJXWRQFD-UHFFFAOYSA-N 0.000 description 3
- NTYQWXQLHWROSQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;2,2,2-tris(sulfanyl)acetic acid Chemical compound OC(=O)C(S)(S)S.CCC(CO)(CO)CO NTYQWXQLHWROSQ-UHFFFAOYSA-N 0.000 description 3
- PPPFYBPQAPISCT-UHFFFAOYSA-N 2-hydroxypropyl acetate Chemical compound CC(O)COC(C)=O PPPFYBPQAPISCT-UHFFFAOYSA-N 0.000 description 3
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229920002284 Cellulose triacetate Polymers 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 3
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 3
- UYAAVKFHBMJOJZ-UHFFFAOYSA-N diimidazo[1,3-b:1',3'-e]pyrazine-5,10-dione Chemical compound O=C1C2=CN=CN2C(=O)C2=CN=CN12 UYAAVKFHBMJOJZ-UHFFFAOYSA-N 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 239000000499 gel Substances 0.000 description 3
- 150000003949 imides Chemical class 0.000 description 3
- 230000006698 induction Effects 0.000 description 3
- 230000000977 initiatory effect Effects 0.000 description 3
- 150000002895 organic esters Chemical class 0.000 description 3
- 238000007699 photoisomerization reaction Methods 0.000 description 3
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 3
- 229940116423 propylene glycol diacetate Drugs 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000600 sorbitol Substances 0.000 description 3
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 3
- 235000021286 stilbenes Nutrition 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- CWERGRDVMFNCDR-UHFFFAOYSA-M thioglycolate(1-) Chemical compound [O-]C(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-M 0.000 description 3
- AFFLGGQVNFXPEV-UHFFFAOYSA-N 1-decene Chemical group CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical group CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- AOGGTZJQBXXLNX-UHFFFAOYSA-N SCC(=O)O.C(C(=C)C)(=O)O.C(C(=C)C)(=O)O.C(C(=C)C)(=O)O.C(O)C(C)(CO)CO Chemical compound SCC(=O)O.C(C(=C)C)(=O)O.C(C(=C)C)(=O)O.C(C(=C)C)(=O)O.C(O)C(C)(CO)CO AOGGTZJQBXXLNX-UHFFFAOYSA-N 0.000 description 2
- 229920002125 Sokalan® Polymers 0.000 description 2
- VSVDQVJQWXJJSS-UHFFFAOYSA-N [2,6-dibromo-4-[2-(3,5-dibromo-4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical compound C=1C(Br)=C(OC(=O)C=C)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(OC(=O)C=C)C(Br)=C1 VSVDQVJQWXJJSS-UHFFFAOYSA-N 0.000 description 2
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical compound C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 description 2
- 239000012190 activator Substances 0.000 description 2
- 125000002015 acyclic group Chemical group 0.000 description 2
- 125000001118 alkylidene group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 2
- 230000006399 behavior Effects 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000012295 chemical reaction liquid Substances 0.000 description 2
- 238000005352 clarification Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 239000013530 defoamer Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
- 238000007046 ethoxylation reaction Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 125000005456 glyceride group Chemical group 0.000 description 2
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 150000002576 ketones Chemical group 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- 125000005647 linker group Chemical group 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 2
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 125000004043 oxo group Chemical group O=* 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 239000004584 polyacrylic acid Substances 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- ASJTUSSZNYBWKO-UHFFFAOYSA-N propan-1-ol;prop-2-enoic acid Chemical compound CCCO.OC(=O)C=C.OC(=O)C=C ASJTUSSZNYBWKO-UHFFFAOYSA-N 0.000 description 2
- 235000013772 propylene glycol Nutrition 0.000 description 2
- 229960004063 propylene glycol Drugs 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 238000004080 punching Methods 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 239000013008 thixotropic agent Substances 0.000 description 2
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 2
- 238000001291 vacuum drying Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BWTMTZBMAGYMOD-UHFFFAOYSA-N (2,2,3,3,4,4,5,5-octafluoro-6-prop-2-enoyloxyhexyl) prop-2-enoate Chemical compound C=CC(=O)OCC(F)(F)C(F)(F)C(F)(F)C(F)(F)COC(=O)C=C BWTMTZBMAGYMOD-UHFFFAOYSA-N 0.000 description 1
- DHBXNPKRAUYBTH-UHFFFAOYSA-N 1,1-ethanedithiol Chemical compound CC(S)S DHBXNPKRAUYBTH-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- VYMPLPIFKRHAAC-UHFFFAOYSA-N 1,2-ethanedithiol Chemical compound SCCS VYMPLPIFKRHAAC-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- SRZXCOWFGPICGA-UHFFFAOYSA-N 1,6-Hexanedithiol Chemical compound SCCCCCCS SRZXCOWFGPICGA-UHFFFAOYSA-N 0.000 description 1
- GJRCLMJHPWCJEI-UHFFFAOYSA-N 1,9-Nonanedithiol Chemical compound SCCCCCCCCCS GJRCLMJHPWCJEI-UHFFFAOYSA-N 0.000 description 1
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 1
- CTXUTPWZJZHRJC-UHFFFAOYSA-N 1-ethenylpyrrole Chemical compound C=CN1C=CC=C1 CTXUTPWZJZHRJC-UHFFFAOYSA-N 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- RHNJVKIVSXGYBD-UHFFFAOYSA-N 10-prop-2-enoyloxydecyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCCCCCOC(=O)C=C RHNJVKIVSXGYBD-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- FNYSXXARASJZSL-UHFFFAOYSA-N 2,2-bis(prop-2-enoyloxymethyl)butyl benzoate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C1=CC=CC=C1 FNYSXXARASJZSL-UHFFFAOYSA-N 0.000 description 1
- SCBKKGZZWVHHOC-UHFFFAOYSA-N 2,2-bis(sulfanyl)propanoic acid Chemical compound CC(S)(S)C(O)=O SCBKKGZZWVHHOC-UHFFFAOYSA-N 0.000 description 1
- HCZMHWVFVZAHCR-UHFFFAOYSA-N 2-[2-(2-sulfanylethoxy)ethoxy]ethanethiol Chemical compound SCCOCCOCCS HCZMHWVFVZAHCR-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 1
- PNLQPWWBHXMFCA-UHFFFAOYSA-N 2-chloroprop-1-ene Chemical compound CC(Cl)=C PNLQPWWBHXMFCA-UHFFFAOYSA-N 0.000 description 1
- YBXYCBGDIALKAK-UHFFFAOYSA-N 2-chloroprop-2-enamide Chemical compound NC(=O)C(Cl)=C YBXYCBGDIALKAK-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- IQQVCMQJDJSRFU-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO IQQVCMQJDJSRFU-UHFFFAOYSA-N 0.000 description 1
- PMNLUUOXGOOLSP-UHFFFAOYSA-N 2-mercaptopropanoic acid Chemical compound CC(S)C(O)=O PMNLUUOXGOOLSP-UHFFFAOYSA-N 0.000 description 1
- AIDLAEPHWROGFI-UHFFFAOYSA-N 2-methylbenzene-1,3-dicarboxylic acid Chemical compound CC1=C(C(O)=O)C=CC=C1C(O)=O AIDLAEPHWROGFI-UHFFFAOYSA-N 0.000 description 1
- OORRCVPWRPVJEK-UHFFFAOYSA-N 2-oxidanylethanoic acid Chemical compound OCC(O)=O.OCC(O)=O OORRCVPWRPVJEK-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- IMOLAGKJZFODRK-UHFFFAOYSA-N 2-phenylprop-2-enamide Chemical compound NC(=O)C(=C)C1=CC=CC=C1 IMOLAGKJZFODRK-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- YYPNJNDODFVZLE-UHFFFAOYSA-N 3-methylbut-2-enoic acid Chemical compound CC(C)=CC(O)=O YYPNJNDODFVZLE-UHFFFAOYSA-N 0.000 description 1
- VATRWWPJWVCZTA-UHFFFAOYSA-N 3-oxo-n-[2-(trifluoromethyl)phenyl]butanamide Chemical compound CC(=O)CC(=O)NC1=CC=CC=C1C(F)(F)F VATRWWPJWVCZTA-UHFFFAOYSA-N 0.000 description 1
- FQMIAEWUVYWVNB-UHFFFAOYSA-N 3-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OC(C)CCOC(=O)C=C FQMIAEWUVYWVNB-UHFFFAOYSA-N 0.000 description 1
- SHLSSLVZXJBVHE-UHFFFAOYSA-N 3-sulfanylpropan-1-ol Chemical compound OCCCS SHLSSLVZXJBVHE-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- XESZUVZBAMCAEJ-UHFFFAOYSA-N 4-tert-butylcatechol Chemical compound CC(C)(C)C1=CC=C(O)C(O)=C1 XESZUVZBAMCAEJ-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- PGDIJTMOHORACQ-UHFFFAOYSA-N 9-prop-2-enoyloxynonyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCCCCOC(=O)C=C PGDIJTMOHORACQ-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Natural products OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- PTQAJIGNKQQAGE-UHFFFAOYSA-N C(C=C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.OCCC Chemical compound C(C=C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.OCCC PTQAJIGNKQQAGE-UHFFFAOYSA-N 0.000 description 1
- MVLIALZGAPLHFS-UHFFFAOYSA-N C(C=C)(=O)OC1=CC=CC=C1.C(C=C)(=O)OC1=CC=CC=C1 Chemical compound C(C=C)(=O)OC1=CC=CC=C1.C(C=C)(=O)OC1=CC=CC=C1 MVLIALZGAPLHFS-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-ZXXMMSQZSA-N D-iditol Chemical compound OC[C@@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-ZXXMMSQZSA-N 0.000 description 1
- 239000004985 Discotic Liquid Crystal Substance Substances 0.000 description 1
- 241001536352 Fraxinus americana Species 0.000 description 1
- 241000565357 Fraxinus nigra Species 0.000 description 1
- 239000005264 High molar mass liquid crystal Substances 0.000 description 1
- 101000605432 Homo sapiens Phospholipid phosphatase 1 Proteins 0.000 description 1
- 101000622430 Homo sapiens Vang-like protein 2 Proteins 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 229920002176 Pluracol® Polymers 0.000 description 1
- CEECCWHFMVXTBM-UHFFFAOYSA-N SCC(S)SC(S)CS Chemical compound SCC(S)SC(S)CS CEECCWHFMVXTBM-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- 102100023520 Vang-like protein 2 Human genes 0.000 description 1
- OWVIRVJQDVCGQX-VSGBNLITSA-N [(4r,5r)-5-[hydroxy(diphenyl)methyl]-2,2-dimethyl-1,3-dioxolan-4-yl]-diphenylmethanol Chemical compound C=1C=CC=CC=1C(O)([C@H]1[C@@H](OC(O1)(C)C)C(O)(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 OWVIRVJQDVCGQX-VSGBNLITSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000005196 alkyl carbonyloxy group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 230000003190 augmentative effect Effects 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 1
- ZDZHCHYQNPQSGG-UHFFFAOYSA-N binaphthyl group Chemical group C1(=CC=CC2=CC=CC=C12)C1=CC=CC2=CC=CC=C12 ZDZHCHYQNPQSGG-UHFFFAOYSA-N 0.000 description 1
- KYNFOMQIXZUKRK-UHFFFAOYSA-N bishydroxyethyldisulfide Natural products OCCSSCCO KYNFOMQIXZUKRK-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 238000003490 calendering Methods 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 150000001851 cinnamic acid derivatives Chemical class 0.000 description 1
- 229920001688 coating polymer Polymers 0.000 description 1
- 230000001447 compensatory effect Effects 0.000 description 1
- 235000009508 confectionery Nutrition 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 150000001924 cycloalkanes Chemical class 0.000 description 1
- 125000004367 cycloalkylaryl group Chemical group 0.000 description 1
- ZOJPTQRKWVDKTP-UHFFFAOYSA-N decane methanol prop-2-enoic acid Chemical compound C(C=C)(=O)O.C(C=C)(=O)O.CO.CO.CCCCCCCCCC ZOJPTQRKWVDKTP-UHFFFAOYSA-N 0.000 description 1
- WXZKPELXXQHDNS-UHFFFAOYSA-N decane-1,1-dithiol Chemical compound CCCCCCCCCC(S)S WXZKPELXXQHDNS-UHFFFAOYSA-N 0.000 description 1
- UOQACRNTVQWTFF-UHFFFAOYSA-N decane-1,10-dithiol Chemical compound SCCCCCCCCCCS UOQACRNTVQWTFF-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 238000002276 dielectric drying Methods 0.000 description 1
- WQABCVAJNWAXTE-UHFFFAOYSA-N dimercaprol Chemical compound OCC(S)CS WQABCVAJNWAXTE-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- VHJLVAABSRFDPM-ZXZARUISSA-N dithioerythritol Chemical compound SC[C@H](O)[C@H](O)CS VHJLVAABSRFDPM-ZXZARUISSA-N 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- KSEBMYQBYZTDHS-HWKANZROSA-N ferulic acid Chemical class COC1=CC(\C=C\C(O)=O)=CC=C1O KSEBMYQBYZTDHS-HWKANZROSA-N 0.000 description 1
- 210000003811 finger Anatomy 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 238000004108 freeze drying Methods 0.000 description 1
- 125000003976 glyceryl group Chemical group [H]C([*])([H])C(O[H])([H])C(O[H])([H])[H] 0.000 description 1
- DOGJSOZYUGJVKS-UHFFFAOYSA-N glyceryl monothioglycolate Chemical compound OCC(O)COC(=O)CS DOGJSOZYUGJVKS-UHFFFAOYSA-N 0.000 description 1
- 125000003147 glycosyl group Chemical group 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 210000004247 hand Anatomy 0.000 description 1
- ALPIESLRVWNLAX-UHFFFAOYSA-N hexane-1,1-dithiol Chemical compound CCCCCC(S)S ALPIESLRVWNLAX-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-UHFFFAOYSA-N hexane-1,2,3,4,5,6-hexol Chemical compound OCC(O)C(O)C(O)C(O)CO FBPFZTCFMRRESA-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 238000006317 isomerization reaction Methods 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 125000005358 mercaptoalkyl group Chemical group 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- BHPYRDLULHDSET-UHFFFAOYSA-N methoxymethane;prop-2-enoic acid Chemical compound COC.OC(=O)C=C.OC(=O)C=C BHPYRDLULHDSET-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004899 motility Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- DSWNRHCOGVRDOE-UHFFFAOYSA-N n,n-dimethylmethanimidamide Chemical compound CN(C)C=N DSWNRHCOGVRDOE-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 229920005787 opaque polymer Polymers 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- NCHIGRUKPIGGQF-UHFFFAOYSA-N pentane-1,1-dithiol Chemical compound CCCCC(S)S NCHIGRUKPIGGQF-UHFFFAOYSA-N 0.000 description 1
- KMTUBAIXCBHPIZ-UHFFFAOYSA-N pentane-1,5-dithiol Chemical compound SCCCCCS KMTUBAIXCBHPIZ-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 125000005562 phenanthrylene group Chemical group 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000003880 polar aprotic solvent Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920003214 poly(methacrylonitrile) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 239000012985 polymerization agent Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920001290 polyvinyl ester Polymers 0.000 description 1
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- ZJLMKPKYJBQJNH-UHFFFAOYSA-N propane-1,3-dithiol Chemical compound SCCCS ZJLMKPKYJBQJNH-UHFFFAOYSA-N 0.000 description 1
- HMPSOEYFMTWOFC-UHFFFAOYSA-N propane-2,2-dithiol Chemical compound CC(C)(S)S HMPSOEYFMTWOFC-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007763 reverse roll coating Methods 0.000 description 1
- 150000007659 semicarbazones Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000009329 sexual behaviour Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000005846 sugar alcohols Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 125000003698 tetramethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- QERYCTSHXKAMIS-UHFFFAOYSA-N thiophene-2-carboxylic acid Chemical group OC(=O)C1=CC=CS1 QERYCTSHXKAMIS-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
- C09K19/04—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
- C09K19/38—Polymers
- C09K19/3804—Polymers with mesogenic groups in the main chain
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
- C09K19/04—Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
- C09K19/38—Polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
- C09K19/52—Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
- C09K19/54—Additives having no specific mesophase characterised by their chemical composition
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2219/00—Aspects relating to the form of the liquid crystal [LC] material, or by the technical area in which LC material are used
- C09K2219/03—Aspects relating to the form of the liquid crystal [LC] material, or by the technical area in which LC material are used in the form of films, e.g. films after polymerisation of LC precursor
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
The present invention relates to photo polymerization, patterning or non-patterned liquid crystal polymer, particularly liquid crystalline polymer film or liquid crystal polymer network, it comprises the thio-ether units of formula (I): * covalent bond, the unit of formula (I) is connected on the remainder of polymer by it, wherein LC1Selected from liquid crystal residue group, X1Selected from aliphatic organic residue group, and n1It is >=integer of 0 and m1It it is >=the integer of 0;Premise is if n1It is 0, then m1> 0, and if m1It is 0, then n1> 0;It is preferably to contain aerobic with the amount of 0.1≤oxygen≤50%, more preferably containing with the amount of 1≤oxygen≤25% in the oxygen-containing atmosphere of aerobic, prepare the most in atmosphere;Premise is not include the scattered liquid crystal of polymer.Moreover, it relates to be used for preparing the compositions of the liquid crystal polymer of this photo polymerization of the present invention, the method preparing this liquid crystal polymer, and its purposes.
Description
The present invention relates to photo polymerization, patterning or non-patterned liquid crystal polymer, particularly to liquid crystal polymer
Film or liquid crystal polymer network, it comprises the thio-ether units of formula (I)
* covalent bond, the unit of formula (I) is connected on the remainder of polymer by it
Wherein
LC1Selected from liquid crystal residue group,
X1Selected from aliphatic organic residue group, and
n1Be >=integer of 0 and
m1It it is >=the integer of 0;
Premise is if n1It is 0, then m1> 0, and if m1It is 0, then n1> 0;With
It is preferably to contain aerobic with the amount of 0.1≤oxygen≤50%, more preferably containing aerobic with the amount of 1≤oxygen≤25%
Oxygen-containing atmosphere in, prepare the most in atmosphere;
Premise is not include the scattered liquid crystal of polymer.
The invention still further relates to preparation patterning and non-patterned liquid crystal polymer, liquid crystalline polymer film or polymerizable mesogenic
The method of thing network, and its application in optics or photoelectric cell.
Broer et al., at Molecular Crystal Liquid Crystal (1999), describes following in 332,259
The synthesis of the liquid crystal of the mercaptan-alkene functionalization of the formula be given
The shortcoming of this material is, the initial orientation of the liquid crystal of this mercaptan-alkene functionalization part in photo polymeric process is damaged
Lose, cause opaque polymer liquid crystal polymeric film.Polymerization shrinkage, is separated and crystallization is the master that the orientation of described macroscopic view is disturbed
Want reason.In order to overcome these problems, devise crosslinkable multiple functionalized mercaptan-alkene liquid crystal (seeing below):
But, as Wilderbeek (J.Phys.Chem.B (2002), 106,12874) points out, liquid crystal has low dissolving
Property character.Low-solubility may cause serious problem in the preparation method of liquid crystal film, such as, be coated on base due to liquid crystal
The suitability in method on material.And, there is no the easy way of this polyfunctional liquid crystal.Prepare their method bag
Include several processing step and at last uneconomic purification.It addition, use the LCP compound of such functionalization, finely
Regulate described mercaptan/alkene and still there is no motility than aspect.
GB2394718-A describes by controlling polymerizing condition such as radiant intensity, atmosphere and temperature, and/or uses properly
Polymerisable liquid crystal compound obtain there is the liquid crystal film of polymerization postponing pattern.Need nonetheless remain for obtaining patterned optical character
Simpler method to two or more different length of delays.This being readily available property all right and wrong for various application
Chang Youyong's.
The present invention relates to liquid crystal polymer, it comprises the thio-ether units of formula given above (I).
Preferably, the present invention relates to liquid crystal polymer given above, it is in the feelings not using cation light initiator
Preparation under condition.
Liquid crystal polymer the most given above, it is in the feelings not using the oxygen barrier layer getting rid of oxygen
Preparation under condition.
Additionally preferably, the present invention relates to liquid crystal polymer given above, it is to use low UV lamp power and energy system
Standby.
Wording " oxygen-containing atmosphere " has discharged inert gas atmosphere.
Preferably, the present invention relates to the liquid crystal polymer in above-mentioned prioritizing selection and restriction, the sulfur of its contained (Ia)
Ether unit
* covalent bond, the unit of formula (Ia) is connected on the remainder of polymer by it
(Ia)
Wherein
LC1, LC2And LCiIt is liquid crystal residue independently of one another,
Wherein
LCiSelected from lower group: LC3, LC4, LC5, LC6, LC7And LC8, they represent liquid crystal residue independently of one another,
X1And X2Being aliphatic organic residue independently of one another, it is preferably without reactive carbon-to-carbon degree of unsaturation,
n1And n2It is >=the integer of 0, the integer of preferably 1-10,
R is >=integer of 0, and the integer of preferably 0-1000,
m1, m2And m3It is >=the integer of 0 independently of one another, the integer of preferably 0-10,
Q is 0 or 1;
Premise is, if q is 0, then LC2And LCiIt is connected directly to one another;If with n1And n2It is 0, then at least one
m1, m2Or m3It is > 0, and if m1, m2And m3It is 0, then at least one n1And n2It is > 0.
It is highly preferred that the liquid crystal polymer that the present invention relates in above-mentioned prioritizing selection and restriction, its contained (Ib's)
Thio-ether units
* covalent bond, the unit of formula (Ib) is connected on the remainder of polymer by it
(Ib)
Wherein
LC1, LC2And LCiIt is liquid crystal residue independently of one another,
Wherein
LCiSelected from lower group: LC3, LC4, LC5, LC6, LC7And LC8, they represent liquid crystal residue independently of one another,
TbSelected from lower group: T1, T2, T3, T4, T5And T6, they are and the residue representing reactive additive independently of one another,
X1, X2And X3Being independently from each other aliphatic organic residue, preferably bivalence or polyvalent organic residue, it is the most not
Containing reactive carbon-to-carbon degree of unsaturation,
n1, n2And n3It is >=the integer of 0 independently of one another, the integer of preferably 1-10,
m1, m2, m3And m4It is >=the integer of 0 independently of one another, the integer of the integer of preferably 0-10, more preferably 0-2,
Q and q1 is 0 or 1 independently of one another, and
R and s is the integer of the integer of the integer of 0-1000, preferably 0-500, more preferably 0-100 independently of one another;Most preferably
" s " is the integer of 0-10, and particularly most preferably " s " is the integer of 0-5;" r " is in the range of 0-10;
Premise is, if q is 0, then LC2And LCiIt is connected directly to one another;If with n1, n2And n3It is 0, then at least one
Individual m1, m2, m3And m4More than 0, and if m1, m2, m3And m4It is 0, then at least one n1, n2And n3More than 0.
The value of subscript r and s depends on described material, is particularly depending on the group of compound for preparing described liquid crystal film
Become and prepare the process conditions of described liquid crystal polymer.
The preferably liquid crystal polymer of formula (Ib),
Wherein:
R and s is the integer of the integer of 0-500, more preferably 0-100 independently of one another;Most preferably " s " is in the scope of 0-10
In, particularly most preferably s represents that 0-5 and " r " are in the range of 0-10;And/or
n1, n2And n3It is the integer of 0-4 independently of one another, the integer of more preferably 0,1-2, most preferably 1 or 2.
Liquid crystal polymer is preferably liquid crystal liquid crystal property (co) polymer, elastomer, polymer gel, film or polymer network, more
Preferably liquid crystal polymer network or film.
Term " photo polymerization " describes below in the method for the invention.
Term " liquid crystal residue ", " reactive additive residue " and " compounds residues " is illustrated respectively in described polymerizable mesogenic
The polymerized form of described liquid crystal, reactive additive or compound in thing.
In a further preferred embodiment, the present invention relates to formula (I), (Ia) or the liquid crystal polymer of (Ib), wherein
It is connected to liquid crystal LC1、LC2And/or LCiThioether bond "-S-" comprise connection unit, it is selected from compound group given below
Compounds residues: norborene, vinyl ethers, vinyl esters, allyl ether, allyl ester, propenyl ether, pi-allyl triazine,
Isocyanuric acid allyl ester, alkene, acrylate, undersaturated ester, acid imide, maleimide, methacrylate, propylene
Nitrile, styrene, alkadienes, vinylamide and alkynes,
And it is most preferably selected from the compounds residues of given below group: alkynes, alkene, vinyl ethers, vinyl esters, alkene
Propyl ether, allyl ester, acrylate and methacrylate,
And particularly most preferably selected from the compounds residues of given below group: acrylate and methacrylate.
The residue of liquid crystal and the residue of reactive additive have the polymerisable sense of at least two at its non-polymerized form
Group, particularly two undersaturated carbon-carbon bonds.Described undersaturated carbon-carbon bond preferably comprises double bond and/or three keys, more preferably
Comprise double bond.
Preferably, the polymerisable functional group of described liquid crystal comprises undersaturated carbon-carbon bond, and it is preferably selected from including as follows
The compound group of compound: norborene, alkynes, vinyl ethers, vinyl esters, allyl ether, allyl ester, propenyl ether,
Pi-allyl triazine, isocyanuric acid allyl ester, alkene, acrylate, undersaturated ester, acid imide, maleimide, methyl-prop
Olefin(e) acid ester, acrylonitrile, styrene, alkadienes and vinylamide;There is described in it is highly preferred that gathering of unsaturated carbon-carbon bond
The functional group closed is selected from the compound group including following compound: alkynes, alkene, vinyl ethers, vinyl esters, allyl ether,
Allyl ester, acrylate and methacrylate;Be most preferably selected from acrylate and methacrylate.
The term liquid crystal used in the context of the present invention refer to have the ability of induction Mesomorphic behavior material or
Compound, such as, comprise one or more rod, plate shape (board-shaped) or disc (disk-shaped) mesomorphic base
Group.The liquid-crystal compounds with rod or plate shape group is also referred to as calamitic liquid crystal in the art.There is disc base
The liquid-crystal compounds of group is also referred to as discotic liquid crystal in the art.The described compound comprising mesomorphic group or material are originally
Body necessarily shows liquid crystalline phase.They only with the mixture of other compound in or when described mesomorphic compound or material or
Their mixture shows when being polymerized that Mesomorphic behavior is also possible.
The example of the suitable polymerisable liquid crystal that can use in the present invention is disclosed in such as WO2005/105932, WO
2005/054406, WO 2004/085547, WO 2003/027056, US 2004/0164272, US 6746729, US
6733690, WO 2000/48985, WO2000/07975, WO 2000/04110, WO 2000/05189, WO 99/37735,
In US6395351, US 5700393, US 5851424 and US 5650534.
The term " aliphatic organic residue " used in the context of the present invention relates to the organic residue of multi-thiol,
In the range of the implication being provided below and prioritizing selection.
In the context of the present invention, term " aliphatic " includes straight chain and branched hydrocarbon and saturated and undersaturated
Group, at least one of which carbon, hydrogen and/or hydrogen carbon can be by hetero atom such as N, S, O, OOC, COO, OCO, OCOO, OOCO, CO etc.
Substitute.Possible substituent group includes alkyl, cycloalkyl aryl, and amino, cyano group, epoxy, halogen, hydroxyl, nitro, oxo
Deng.The possible hetero atom that can substitute for carbon atom includes nitrogen, oxygen and sulfur.In the case of nitrogen, can be by group such as alkyl, virtue
Base and cycloalkyl are further substituted with.Similarly, term used herein " alkyl " and " alkylidene " include straight chain or branched
Group, and saturated and undersaturated group.
In the context of the present invention, during suitable multi-thiol can be those multi-thiols as known in the art
Any.As multi-thiol, it is possible to use comprise per molecule and there is molecule any of two or more thiol groups
Compound.Described multi-thiol has the molecular weight in the range of about 50-about 20,000.
Preferably, multi-thiol is monomeric fatty race multi-thiol, oligomer multi-thiol and polymer polyol mercaptan.
Preferably multi-thiol relate to two-, three-, four-or polyfunctional mercaptan.
Preferably polymer polyol mercaptan is that such as polytrimethylene ether glycol is double (β-mercaptopropionic acid ester), and it is anti-by esterification
Should be by polytrimethylene ether glycol (such as Pluracol P201, Wyandotte Chemical Corp.) and β-mercaptopropionic acid system
Standby.Poly-alpha mercaptoacetic acid ester or poly-β-mercaptopropionic acid ester, particularly trimethylolpropane triester or tetramethylolmethane four ester are excellent
Choosing.
Preferably the compound of alkyl hydrosulfide functionalization is such as 1,2-dimercaptoethane, 1,6-dimercaptohexane, 1,10-
Decanedithiol etc..The polythiaether resin that mercaptan blocks can also be used.
The most aliphatic two mercaptan include 1,2-dimercaptoethylsulfide, butanediethiol, 1,3-propanedithiol, 1,5-
Pentanedithiol, 2,3-dimercapto-1-propanol, 1,4-Dithioerythritol, 3,6-dioxa-1,8-octanedithiol, 1,8-octane
Two mercaptan, hexanedithiol, dithiodiglycol, pentanedithiol, decanedithiol, 2-methyl isophthalic acid, 4-butanediethiol,
Two-mercaptoethyl phenylmethane, 1,9-nonane two mercaptan (1,9-dimercapto nonane), ethylene glycol dimercapto acetate.
Preferably oligomer two mercaptan includes the oligourethane of dual functional Mercaptofunctional, and it is derived from hydroxyl
Ethanethio, hydroxypropyl mercaptan, dimercaptopropane, the end of dimercaptoethane, such as patent USP of Shustack
Described in 5744514.
The compound of preferred three thiol-functionals includes trimethylolethane trimethacrylate mercaptopropionic acid ester, trimethylolpropane tris
Mercaptopropionic acid ester (TMPTSH), trimethylolethane trimethacrylate mercaptoacetate, and trimethylolpropane tris mercaptoacetate, glycerol three
(11-sulfydryl hendecoic acid ester), trimethylolpropane tris (11-sulfydryl hendecoic acid ester).
The mercaptan of preferred four senses includes tetramethylolmethane four mercaptopropionic acid ester, tetramethylolmethane four mercaptoacetate, and season
Penta tetrol four (11-sulfydryl hendecoic acid ester).
The multi-functional thiol preferably with the degree of functionality more than 4 includes the 7th of the patent of Loctite (WO/8802902)
Multi-thiol described by Ye.
Polyfunctional mercaptan can be by making mercaptoalkyl carboxylic acid such as TGA, mercaptopropionic acid and the alcohol of high official energy, amine
Obtain with thiol reactant.And, polyfunctional mercaptan can react with silanol by making mercaptoalkyl trialkoxy silane
And obtain, described silanol can be polymer or silicon-dioxide-substrate silanol.Other preferred multi-functional thiol uses mercaptan
Carboxylic acid (HS-R-COOH, wherein R=alkyl or aryl group) such as sulfydryl hendecoic acid obtains, the COOH base of described thiol carboxylic acid
Group reacts with polyfunctional reactive alkene, alcohol, mercaptan or amine.
Preferably, multi-thiol has-C1-C10Alkylidene-COOH and polyol such as glycol, triol, tetrol, five
Alcohol or the organic residue of six alcohol.
It is highly preferred that organic residue is glycolic (-CH2COOH), α-propionic acid (-CH (CH3)-COOH and β-propanoic acid (-
CH2CH2COOH) with polyol such as glycol, triol, tetrol, pentol or the ester of six alcohol.
Preferably-C1-C10Alkylidene-COOH, preferably-C1-C4Alkylidene-COOH, most preferably-C2-C3Alkylidene-
The organic residue of the organic ester of COOH and polyol such as glycol, triol, tetrol, pentol or six alcohol.
More preferably-CH2COOH ,-CH (CH3)-COOH ,-CH2CH2COOH and polyol such as glycol, triol,
The organic residue of the ester of tetrol, pentol or six alcohol.
Especially, most preferably from the organic residue of following material: multi-thiol such as glycolate (glycolate)
And propionic ester, such as ethylene glycol bis (mercaptoacetate), ethylene glycol bis (β-mercaptopropionic acid ester), trimethylolpropane tris (sulfydryl
Acetas), trimethylolpropane tris (β-mercaptopropionic acid ester), tetramethylolmethane four (β-mercaptopropionic acid ester), ethylene glycol bisthioglycolate sulfydryl second
Acid esters, 1,2,6-hexanetriol tri-thiol acetas, trimethylolethane trimethacrylate mercaptoacetate, tetramethylolmethane four (TGA
Ester), trimethylolpropane tris mercaptoacetate and glyceryl thioglycolate;With propionic ester such as trimethylolethane trimethacrylate-(3-
Mercaptopropionic acid ester), tetramethylolmethane four (3-thiopropionate), trimethylolpropane tris (3-thiopropionate) or ethylene glycol bisthioglycolate mercapto
Base propionic ester, they are all available commercially, and maybe can be obtained by methods known in the art.
The term " reactive additive " used in the context of the present invention refers to polymerisable reactive additive, its
There is at least one polymerisable group.Such as, reactive additive is cross-linking agent, reactive diluent, single reaction liquid crystal,
The mercaptan of simple function, such as lauryl mercaptan.
It addition, reactive additive is selected from the additive with at least one polymerizable groups set forth below
Group: antioxidant, accelerator, dyestuff, inhibitor, activator, filler, chain tra nsfer inhibitor, pigment, antistatic additive, fire retardant, increase
Thick dose, thixotropic agent, surfactant, viscosity improver, extending oil, plasticizer, viscosifier, catalyst, sensitizer, stabilizer,
Lubricant;Dispersant, water-repelling agent, binding agent, flow improving agent (flow improvers), defoamer, degasser, diluent,
Auxiliary ingredient, coloring agent, dyestuff and pigment.
The term " single reaction liquid crystal " used in the context of the present invention refers to have a polymerisable functional group,
The liquid crystal of preferably unsaturated carbon-carbon bond.Described unsaturated carbon-carbon bond preferably comprises double bond and/or three keys, and more preferably comprises double
Key.
Preferably, described reactive additive has at least one, preferably greater than two polymerisable functional groups.Preferably
It is such as unsaturated carbon-carbon bond, particularly acrylate and methacrylic acid ester group, more particularly acrylate group etc
Polymerisable functional group.
Cross-linking agent is known to technical staff.Suitably compound is described in such as patent publications EP 0331233,
WO 95/24454, US 5,567,349, US 5,650,534, WO00/04110, WO 00/07975, WO 00/48985, WO
In 00/55110 and WO 00/63154.
Reactive additive can be selected from, but not limited to, with norborene, vinyl ethers, vinyl esters, allyl ether,
Allyl ester, propenyl ether, pi-allyl triazine, isocyanuric acid allyl ester, alkene, acrylate, undersaturated ester, acyl is sub-
Amine, maleimide, methacrylate, acrylonitrile, styrene, alkadienes, vinylamide and alkynes polymerizable groups
Monomer.
It is most preferably selected from given below group: alkynes, alkene, vinyl ethers, vinyl esters, allyl ether, allyl ester,
Acrylate and methacrylate.
Particularly most preferably, the polymerizable functional group of the reactive additive described in unsaturated carbon-carbon bond is propylene
Acid esters or methacrylate, such as: trimethylolpropane trimethacrylate;Glycol diacrylate;TEG dipropyl
Olefin(e) acid ester;1,6-hexanediyl ester;Pentaerythritol triacrylate;Diethylene glycol diacrylate;BDO
Diacrylate;Tetramethylol methane tetraacrylate;1,3 butylene glycol diacrylate;Triethylene glycol diacrylate;New penta 2
Alcohol diacrylate;2-butylene-Isosorbide-5-Nitrae-diacrylate;1,3-bis-[(acryloyloxymethyl) phenethyl] tetramethyl two silica
Alkane;Tripropylene glycol diacrylate;Trimethylolpropane b-oxide triacrylate;1,2-PD diacrylate;1,
Ammediol diacrylate;2,2,3,3,4,4,5,5-octafluoro hexane-1,6-diacrylate;1,5-PD diacrylate
Ester;Bis-phenol a diacrylate;Bis-phenol a propoxide diacrylate;Decamethylene-glycol diacrylate;2,2-dibromos new penta
Omega-diol diacrylate;3,3 '-dimethyl bisphenol " a " diacrylate;Dipentaerythritol Pentaacrylate;Ethoxylation double
Phenol a diacrylate;The tetrabromobisphenol a diacrylate of ethoxylation;Glyceryl propoxylate;4,4 '-(sub-six
Fluorine isopropyl) diphenyl diacrylate;1,9-nonanediol diacrylate;Dimethyl pentaerythritol acrylate;Hydroquinone two
Acrylate;Sorbitol diacrylate;Sorbitol five acrylate;2,2 ', 6,6 '-tetrabromobisphenol a diacrylate;
2,2 ', 6,6 '-tetrachlorobisphenol a diacrylate;Tetraethoxy bis-phenol a diacrylate;2,2,3,3-tetra-fluoro-Isosorbide-5-Nitrae-butane two
Acrylate;Mercaptan diethylene glycol diacrylate;1,1,1-methylolethane triacrylate;Isocyanuric acid three (2-hydroxyl
Base ethyl) ester triacrylate;5-ethyl-5-(hydroxymethyl)-β, beta-dimethyl-1,3-dioxane-2-ethanol diacrylate
Ester;1,6-dihexyl two [oxygen (2-hydroxyl-3,1-glyceryl)] diacrylate;kayarad r-551;
kayaradpeg400da;Isosorbide-5-Nitrae-cyclohexanedimethyl Isosorbide-5-Nitrae-diacrylate;Glycerol propoxylate triacrylate;Two seasons penta
Tetrol five-and six-acrylate;Two (trimethylolpropane) tetraacrylate;Neopentyl glycol b-oxide diacrylate;Season
Penta tetrol diacrylate monostearate;Trimethylolpropane b-oxide methyl ether diacrylate;(3-
(allanoyloxy)-5-[4-(benzamido)-2-oxopyrimidin-1 (2h)-yl] oxolane-2-base;Diacrylate 1,
3-Asia phenyl ester;Fluorescein dimethylacrylate;3-hydroxyl-2,2-dimethyl propyl 3-hydroxyl-PA ester two
Acrylate;2,2 ', 6,6 '-tetrabromobisphenol " a " diacrylate;Bis-phenol a glyceride (1 glycerol/phenol) diacrylate;
Trimethylolpropane benzoate diacrylate;Propylene glycol glyceride diacrylate;Three (propylene glycol) glyceride two
Acrylate;Glycerol 1,3-bis-glyceride diacrylate;Hydroxyl valeryl hydroxy new pentane acid ester two [6-(acryloyl-oxy
Base) alkyl caproate];1,6-hexanediol propoxide diacrylate;Tetramethylolmethane propoxide triacrylate;1,6-hexanediol
B-oxide diacrylate;2,2,3,3,4,4-hexafluoro-1,5-amyl group diacrylate;2,2,3,3,4,4,5,5-octafluoros-
1,6-hexyl diacrylate;Three rings [5.2.1.02,6] decane Dimethanol Diacrylate.
It is highly preferred that described liquid crystal has at least two carbon-carbon bond polymerisable, undersaturated of formula (II)
Wherein:
A1-A6It is hydrogen independently of one another, polar group, unsubstituted or substituted methyl group, or unsubstituted or replacement
2-40 carbon atom hydrocarbyl radical group, wherein one or more carbon atoms are substituted in the way of oxygen atom is not connected to each other by hetero atom
Or do not substituted by hetero atom, or wherein one or more carbon atoms are replaced by unsubstituted or substituted aromatic carbocyclic or heterocyclic group
Generation or do not substituted by unsubstituted or substituted aromatic carbocyclic or heterocyclic group;Include or do not include tool with wherein said hydrocarbyl group
There is the polymerizable functional group of unsaturated carbon-carbon bond;Premise is A1-A6At least one of, two preferably comprise have unsaturated carbon-
The polymerizable functional group of carbon bond;
B1And B2Represent singly-bound, oxygen atom or the hydrocarbyl group of optionally substituted 1-80 carbon atom independently of one another, one of them
Or multiple carbon atom can be substituted in the way of oxygen atom is not connected to each other by hetero atom;
MG1There is the implication of lower formula (III)
Wherein
C1-C4It is substituted or unsubstituted, non-aromatic independently of one another or the carbocyclic ring of aromatics or heterocyclic group, the most logical
Cross described bridge linkage group Z1-Z3It is connected to each other in para-position,
Z1-Z3 is independently of one another
-CH(OH)-、-CO-、-CH2(CO)-、-SO-、-CH2(SO)-、-SO2-、-CH2(SO2)-、-COO-、-OCO-、-
COCF2-、-CF2CO-、-S-CO-、-CO-S-、-SOO-、-OSO-、-SOS-、-CH2-CH2-、-OCH2-、-CH2O-,-CH=
CH-,-C ≡ C-,-CH=CH-COO-,-OCO-CH=CH-,-CH=N-,-CH (CH3)=N-,-N=N-or single covalent bond,
a1, a2And a3It is the integer of 0-3 independently of one another so that 1≤a1+a2+a3≤ 3,
A7And A8Have and A given above1-A6Identical implication;
MG2And MG3There is the implication of lower formula (IV) independently of one another
Wherein
C1’-C4', Z1’-Z3’, a1’, a2’And a3’Have and corresponding " letter number ": C1-C4, Z1-Z3, a1, a2And a3Identical
Implication and prioritizing selection;
n1And n2It is 1 or 2 independently of one another, wherein " n1=2 " (or " n2=2 ") show at described group MG1And MG2(or
MG2And MG3Two are had via described group B between)1(or described group B2) single connection;With
n3It is the integer of the integer of 0-1000, preferably 0-5, more preferably 0 or 1;
n4It is 0 or 1.
In the context of the present invention, term " hydrocarbon " includes straight chain or branched alkylidene, and saturated and unsaturated
Group, and the carbocyclic ring of optionally substituted aromatics or heterocyclic group.
Term " aromatic monocyclic " includes the ring of 5 or 6 atoms, the monocycle of two adjacent 5 or 6 atoms, 8,9 or 10
The bicyclic ring system of atom, or three ring member ring systems of 13 or 14 atoms;Preferably, use in the context of the present invention
Term " aromatics " preferably represents unsubstituted or substituted carbocyclic ring and heterocyclic group, is combined with 5,6,10 or 14 annular atomses,
Such as furan, benzene or phenylene, pyridine, pyrimidine, naphthalene, it can form ring group, such as biphenylene or sub-terphenyl, its quilt
Or be not interrupted by least one hetero atom and/or at least one bridge linkage group;Or the polycyclic system condensed, such as luxuriant and rich with fragrance, naphthane.
Preferably, aromatic group is benzene, phenylene, biphenylene or sub-terphenyl.Preferred aromatic group is benzene, phenylene and
Biphenylene.
Carbocyclic ring or heterocyclic aromatic group preferably have 5,6,10 or 14 annular atomses, such as such as furan, and benzene, pyridine, triazine,
Pyrimidine, naphthalene, luxuriant and rich with fragrance, biphenylene or naphthane unit are such, preferably such as naphthalene, luxuriant and rich with fragrance, and biphenylene or phenylene are such, the most such as
Naphthalene, biphenylene or phenylene are such, and most preferably as phenylene.
The carbocyclic ring of described aromatics or heterocyclic group are the most unsubstituted or single or multiple substituted.Carbocyclic ring or heterocyclic aromatic base
The preferred substituent group of group is at least one halogen, hydroxyl, polar group, acryloxy, alkyl acyloxy, alcoxyl
Base, alkyl carbonyl oxy, alkoxyl carbonyloxy group, alkoxo carbonyloxy group, methacryloxy, vinyl, vinyl epoxide and/
Or allyloxy group, wherein said alkyl residue preferably has 1-20 carbon atom, more preferably has 1-10 carbon atom.Preferably
Polar group is nitro, cyano group or carboxylic group, and/or ring-type, straight chain or branched C1-C30Alkyl, it is unsubstituted, single
Substituted or many.C1-C30The preferred substituent group of alkyl is methyl, fluorine and/or chlorine, wherein one or more, the most non-conterminous
-CH2-group can be connected group independently of one another and substitute.Preferably, described linking group is selected from-O-,-CO-,-COO-
And/or-OCO-.
The monocycle of five or six atoms is such as furan, benzene, preferably phenylene, pyridine, pyrimidine.
Eight, the bicyclic ring system of nine or ten atoms is such as naphthalene, biphenylene or naphthane.
Three ring member ring systems of 13 or 14 atoms are such as luxuriant and rich with fragrance.
The term " phenylene " used in the context of the present invention preferably represents 1,2-, 1,3-or Isosorbide-5-Nitrae-phenylene base
Group, it is optionally substituted.The most described phenylene group is 1,3-or Isosorbide-5-Nitrae-phenylene group.Isosorbide-5-Nitrae-phenylene group is special
The most preferred.
Term " halogen " refers to chlorine, fluorine, bromine or iodine substituent group, preferably chlorine or fluoro substituents.
The term " polar group " used in the context of the present invention is primarily referred to as the base of such as nitro, cyano group or carboxyl
Group.
The term " hetero atom " used in the context of the present invention is primarily referred to as oxygen, sulfur and nitrogen, preferably oxygen and nitrogen, rear
Preferred form in-NH-in the case of one.At nitrogen as in the case of heteroatomic, it can be with group such as alkyl, aryl and cycloalkanes
Base is further substituted with.
The term " substituted " used in the context of the present invention is primarily referred to as being replaced by following group: low alkyl group is such as
C1-C6Alkyl, lower alkoxy such as C1-C6Alkoxyl, aryl and group of naphthene base, and amino, cyano group, carboxyl, epoxy, halogen
Element, hydroxyl, nitro, oxo and hydroxyl.
Preferably, A1And A8At least one of inclusion compound residue formula (V) independently of one another:
P-(Sp)k-(X)t- (V)
Wherein:
P is hydrogen or polar group, preferably nitro, cyano group, halogen;Or unsubstituted or substituted methyl group, or have
The polymerizable functional group of unsaturated carbon-carbon bond, this polymerizable functional group is selected from and comprises norborene, vinyl ethers, vinyl esters,
Allyl ether, allyl ester, propenyl ether, pi-allyl triazine, isocyanuric acid allyl ester, alkene, alkynes, acrylate, no
Saturated ester, acid imide, maleimide, methacrylate, acrylonitrile, styrene, alkadienes, vinylamide and allyl
The group of base amide;
Sp is unsubstituted or substituted straight chain or branched C1-30Alkylidene group, wherein one or more-CH2-group
Can substitute by hetero atom and/or by polar group, and/or one or more carbon-to-carbon singly-bound is replaced by carbon-to-carbon double bond or three keys
Generation, and/or be the most optionally possible by least one optionally substituted aromatic carbocyclic or heterocyclic group replacement,
K is integer, has the value of 0-4,
X is-O-,-S-,-NH-,-N (CH3)-,-CH (OH)-,-CO-,-CH2(CO)-,-SO-,-CH2(SO)-,-
SO2-,-CH2(SO2)-,-COO-,-OCO-,-OCO-O-,-S-CO-,-CO-S-,-SOO-,-OSO-,-SOS-,-CH2-CH2-,-
OCH2-,-CH2O-,-CH=CH-,-C ≡ C-, or singly-bound,
T is the integer of the value with 0 or 1.
Described C1-30Alkylidene or C1-20Alkylidene group Sp can comprise branched or straight chain alkylen, and can
Being unsubstituted, or by the single or multiple replacement of following groups: alkyl, aryl, cycloalkyl, amino, cyano group, epoxy, halogen, hydroxyl
Base, nitro, particularly F, Cl, Br, I or CN.Altematively or additionally, the one or more CH being present in described hydrocarbon chain2
Group can be substituted by one or more groups selected from lower group independently :-O-,-S-,-NH-, N (CH3)-,-CH (OH)-,-
CO-,-CH2(CO)-,-SO-,-CH2(SO)-,-SO2-,-CH2(SO2)-,-COO-,-OCO-,-OCO-O-,-S-CO-,-CO-
S-,-SOO-,-OSO-,-SOS-,-C ≡ C-,-(CF2)r1-,-(CH2)s1-or C (W1)=C (W2)-, premise is two oxygen atoms
It is not connected directly to one another.W1And W2Represent H, H-(CH independently of one another2)q2-or Cl.Described integer r1, s2 and q2 are independently of one another
Represent the number between 1 and 15.
Preferably, Sp represents C1-20Alkylidene group, more preferably C1-13Alkylidene group, it is unsubstituted or with alkyl,
Aryl, cycloalkyl, amino, cyano group, epoxy, halogen, hydroxyl, nitro is substituted, and wherein one or more-CH2-group can
To be substituted by hetero atom;And/or substituted by carbocyclic ring or the heterocyclic group of at least one optionally substituted aromatics, given above
In the range of implication and prioritizing selection.
Preferably, P is hydrogen, nitro, cyano group, halogen, unsubstituted or substituted methyl group, or have unsaturated carbon-
The polymerizable functional group of carbon bond, this polymerizable functional group is selected from and comprises vinyl ethers, vinyl esters, allyl ether, allyl ester,
Propenyl ether, alkene, alkynes, acrylate, undersaturated ester and the group of methacrylate, be preferably selected from comprising acrylic acid
Ester and the group of methacrylate.
Preferably, X represents-O-,-CO-,-COO-,-OCO-,-C=C-, and it is highly preferred that X be-O-,-COO-or-
OCO-。
It is further preferred that
Sp represents C1-20Straight chain alkylen, more preferably C1-13Alkylidene group, it is unsubstituted or with alkyl, fragrant
Base, cycloalkyl, amino, cyano group, epoxy, halogen, hydroxyl or nitro are substituted, and wherein one or more carbon atoms can be by miscellaneous former
Son substitutes and/or is substituted by carbocyclic ring or the heterocyclic group of at least one optionally substituted aromatics;
X represents-O-,-CO-,-COO-,-OCO-,-C=C-, and preferably, X is-O-,-COO-,-OCO-, and
P is hydrogen or the polymerizable functional group with unsaturated carbon-carbon bond, and this polymerizable functional group is selected from comprising vinyl
Ether, vinyl esters, allyl ether, allyl ester, acrylate, the group of methacrylate, and preferably-O-,-COO-,-
OCO-。
Preferably, B1And/or B2Comprise the group of formula (VI) independently of one another:
(X4)t2-(Sp2)k2-(X5)t3 (VI)
Wherein:
Sp2Represent C1-20Alkylidene group;
X4And X5Expression-O-independently of one another ,-S-,-NH-, N (CH3)-,-CH (OH)-,-CO-,-CH2(CO)-,-
SO-,-CH2(SO)-,-SO2-,-CH2(SO2)-,-COO-,-OCO-,-OCO-O-,-S-CO-,-CO-S-,-SOO-,-OSO-,-
SOS-,-CH2-CH2-,-OCH2-,-CH2O-,-CH=CH-,-C ≡ C-or singly-bound;
K2 is integer, has the value of 0 or 1;
T2 and t3 is integer, has the value of 0 or 1 independently of one another;
Premise is that oxygen atom is not connected to each other.
Preferably, B1And B2Represent the group of formula (VI) independently of one another, wherein:
X4And X5Expression-O-,-CO-,-COO-,-OCO-,-C ≡ C-, or singly-bound independently of one another, particularly-O-,-
COO-,-OCO-or singly-bound;With
Sp2Represent C1-20Straight chain alkylen, particularly ethylidene, propylidene, butylidene, pentylidene, hexylidene, sub-
Heptyl, octylene, nonamethylene, decylene, alkylene undecyl or sub-dodecyl.
A kind of particularly preferred polymer is wherein B1And B2Represent group and the A of formula (VI) independently of one another1-A8Each
Represent the polymer of the group of formula V independently.
Preferably, C1-C4It is selected from:
Wherein:
L is-CH3,-COCH3,-NO2,-CN or halogen,
U1 is 0,1,2,3, or 4,
U2 is 0,1,2, or 3,
U3 is 0,1, or 2.
It is highly preferred that C1-C4It is selected from: cyclohexylidene, phenylene, naphthylene or phenanthrylene.
Most preferably, C1-C4It is selected from: phenylene
Preferably, Z1-Z3Expression-COO-,-OCO-,-CH independently of one another2-CH2-,-OCH2-,-CH2O-,-CH=
CH-,-C ≡ C-,-CH=CH-COO-,-OCO-CH=CH-or single covalent bond.
It is highly preferred that Z1-Z3Expression-COO-,-OCO-,-CH=CH-COO-,-OCO-CH=CH-or list independently of one another
Covalent bond.
The most preferably liquid crystal of the present invention of formula (VII)
Wherein:
A1, A2, A7, C1, C2, C3, Z1And Z2And a1 with a2 has identical implication given above and prioritizing selection.
The most particularly most preferably be the compound of formula (VII), wherein:
-A1And A2It is compound formula V independently of one another:
P-(Sp)k-(X)t- (V)
Wherein
P is the polymerizable functional group with unsaturated carbon-carbon bond, and it is selected from comprising vinyl ethers, vinyl esters, pi-allyl
Ether, allyl ester, propenyl ether, alkene, alkynes, acrylate, undersaturated ester and the group of methacrylate, preferably select
Self-contained acrylate and the group of methacrylate;
Preferably, at A1And A2Middle P is identical;
Sp represents C1-20Alkylidene group, more preferably C1-13Alkylidene group, it is unsubstituted or with alkyl, aryl, ring
Alkyl, amino, cyano group, epoxy, halogen, hydroxyl, nitro is substituted, and wherein one or more-CH2-group can be by miscellaneous former
Son substitutes;And/or substituted by least one optionally substituted aromatic carbocyclic or heterocyclic group, implication given above is with preferential
In the range of choice;
X represents-O-,-CO-,-COO-,-OCO-,-C=C-, and more preferably X is-O-,-COO-,-OCO-;
K is the integer of the value with 0-4,
T is the integer of the value with 0 or 1;And/or
-A7There is identical implication given above and prioritizing selection;Preferably, A7It is hydrogen or polar group, preferably nitre
Tool in the range of base, cyano group, halogen, unsubstituted or substituted methyl group, or implication given above and prioritizing selection
There is the polymerizable functional group of unsaturated carbon-carbon bond;Preferably, A7It is hydrogen or polar group, preferably nitro, cyano group, halogen, do not take
Generation or substituted methyl group and/or
-C1, C2And C3It is identical identical meanings given above and prioritizing selection;Especially, C1, C2And C3It is sub-benzene
Base;And/or
-Z1And Z2It is identical, and there is identical implication given above and prioritizing selection;Preferably, Z1And Z2Be-
COO-,-OCO-,-CH=CH-COO-,-OCO-CH=CH-or singly-bound;If Z1And Z2One of be singly-bound, then another Z is excellent
Choosing is-COO-,-OCO-,-CH=CH-COO-or-OCO-CH=CH-.
It addition, most preferably A1And A2It is identical.
It addition, the liquid crystal polymer of the most preferably present invention of formula (VIII)
Wherein:
A1, A2, A5, A6, C1, C2, C3, B1, Z1And Z2, C1', C2', C3', Z1' and Z2' and a1, a2, a1 ' and a2 ' have
Identical implication given above and prioritizing selection.
The most particularly most preferably be the compound of formula (VIII), wherein
-A1, A2, A5, A6It is compounds residues formula (V) independently of one another:
P-(Sp)k-(X)t- (V)
Wherein
P is the polymerizable functional group with unsaturated carbon-carbon bond, and it is selected from comprising vinyl ethers, vinyl esters, pi-allyl
Ether, allyl ester, propenyl ether, alkene, alkynes, acrylate, undersaturated ester and the group of methacrylate, and preferably
Selected from the group comprising acrylate and methacrylate;Preferably at A1, A2, A5, A6In P be identical;
Sp represents C1-20Alkylidene group, more preferably C1-13Alkylidene group, it is unsubstituted or with alkyl, aryl, ring
Alkyl, amino, cyano group, epoxy, halogen, hydroxyl, nitro are substituted, and wherein one or more-CH2-group can be miscellaneous
Atom substitutes;And/or substituted by least one optionally substituted aromatic carbocyclic or heterocyclic group, implication given above and excellent
In the first range of choice;
X represents-O-,-CO-,-COO-,-OCO-,-C=C-, it is highly preferred that X is-O-,-COO-,-OCO-;
K is the integer of the value with 0-4,
T is the integer of the value with 0 or 1;
Preferably A1, A2, A5, A6It is identical;
And/or
-B1Comprise the group of formula (VI):
(X4)t2-(Sp2)k2-(X5)t3 (VI)
Wherein:
Sp2Represent C1-20Alkylidene group;
X4And X5Expression-O-independently of one another ,-S-,-NH-, N (CH3)-,-CH (OH)-,-CO-,-CH2(CO)-,-
SO-,-CH2(SO)-,-SO2-,-CH2(SO2)-,-COO-,-OCO-,-OCO-O-,-S-CO-,-CO-S-,-SOO-,-OSO-,-
SOS-,-CH2-CH2-,-OCH2-,-CH2O-,-CH=CH-,-C ≡ C-or singly-bound;
K2 is integer, has the value of 0 or 1;
T2 and t3 is integer, has the value of 0 or 1 independently of one another;
Premise is that oxygen atom is not connected to each other;
Preferably, B1Represent the group of formula (VI), wherein:
X4And X5Expression-O-,-CO-,-COO-,-OCO-,-C ≡ C-, or singly-bound independently of one another, particularly-O-,-
COO-,-OCO-or singly-bound;With
Sp2Represent C1-20Straight chain alkylen, particularly ethylidene, propylidene, butylidene, pentylidene, hexylidene, sub-
Heptyl, octylene, nonamethylene, decylene, alkylene undecyl or sub-dodecyl;And/or
-C1', C2' and C3' and C1, C2And C3It is identical and there is identical implication given above and prioritizing selection;Special
Not, C1', C2' and C3' and C1, C2And C3It it is phenylene;And/or
-Z1And Z2And Z1' and Z2' it is identical, and there is identical implication given above and prioritizing selection;Preferably,
Z1And Z2And Z1' and Z2' it is-COO-,-OCO-,-CH=CH-COO-,-OCO-CH=CH-or singly-bound;If Z1And Z2One of be
Singly-bound, then another Z preferably-COO-,-OCO-,-CH=CH-COO-or-OCO-CH=CH-, and if Z1' and Z2’
One of be singly-bound, then another Z preferably-COO-,-OCO-,-CH=CH-COO-or-OCO-CH=CH.
The invention still further relates to compositions (XX), it comprises:
A) multi-thiol of at least one formula (IX)
Wherein
XaIt is aliphatic organic residue,
ntIt is >=the integer of 2, the integer of preferably 2-10, more preferably 3 or 4, and
B) at least one has the liquid crystal of at least two polymerizable functional group, and
C) a kind of reactive and/or non-reacted additive, and
D) optionally at least a kind of initiator, and
E) optionally at least a kind of solvent.
The preferably compositions of the present invention, does not the most include tetramethylolmethane four (β-dodecy) propionic ester.
The more preferably compositions of the present invention, wherein said liquid-crystal compounds is with more than 50 weight % to described compositions
The amount of gross weight exists.
Furthermore it is preferred that the present invention relates to liquid crystal polymer given above, it does not contains cation light initiator.
In another preferred embodiment, described solvent account for described compound less than 50 weight %, preferably comprise institute
State compound less than 30 weight %, more preferably account for described compound less than 10 weight %.
In a preferred embodiment in accordance with this invention, described compositions comprises initiator.
Described liquid crystal, multi-thiol, aliphatic organic residue, polymerisable functional group and non-reacted additive have
Identical implication given above and prioritizing selection.
It is particularly preferred that XaIt is-C1-C10Alkylidene-COOH and polyol such as glycol, triol, tetrol, pentol or
The multivalence aliphatic organic residue of the organic ester of six alcohol.
It is highly preferred that XaIt is glycolic (-CH2COOH), α-propionic acid (-CH (CH3)-COOH and β-propanoic acid (-CH2CH2COOH)
With polyol such as glycol, triol, tetrol, pentol or the ester of six alcohol.
Preferably HS-C1-C10Alkylidene-COOH, preferably HS-C1-C4Alkylidene-COOH, most preferably HS-C2-C3Alkylene
The multi-thiol of the organic ester of base-COOH and polyol such as glycol, triol, tetrol, pentol or six alcohol.
More preferably TGA (HS-CH2COOH), alpha-mercapto propanoic acid (HS-CH (CH3)-COOH and β-mercaptopropionic acid
(HS-CH2CH2COOH) with polyol such as glycol, triol, tetrol, the multi-thiol of ester of pentol or six alcohol.
Especially, most preferred multi-thiol is ethyl glycolate and propionic ester, such as ethylene glycol bis (mercaptoacetate), second
Glycol is double (β-mercaptopropionic acid ester), trimethylolpropane tris (mercaptoacetate), trimethylolpropane tris (β-mercaptopropionic acid ester),
Tetramethylolmethane four (β-mercaptopropionic acid ester), ethylene glycol dimercapto acetate, 1,2,6-hexanetriol tri-thiol acetas, trihydroxy methyl
Ethane tri-thiol acetas, tetramethylolmethane four (mercaptoacetate), trimethylolpropane tris mercaptoacetate and glyceryl sulfydryl
Acetas;And propionic ester, such as trimethylolethane trimethacrylate-(3-thiopropionate), tetramethylolmethane four (3-thiopropionate), three
Hydroxymethyl-propane three (3-thiopropionate) or glycol dimercaptopropionate, all these be all available commercially, or
Can be obtained by methods known in the art.
Polymerization can be carried out with or without initiator, initiator is preferably used and carries out.Initiator whether is used to depend on
The kind of beginning material and technological parameter.Any kind of initiator in addition to cation light initiator can be selected.Preferably
Radical initiator.Described initiator can be heat or light trigger or a combination thereof.More preferably free radical photo-initiation.
Generally, light trigger has absorption at the wavelength of actinic radiation.When polymerization utilizes UV light to carry out, it is possible to use
UV irradiates the lower free radical decomposed to produce starting polyreaction or the light trigger of ion.UV light trigger is preferred, special
It it not free radical UV light trigger.The example of free radical photo-initiation or maleimide light trigger is by Dias et al.
(SurfaceCoatings International, JOCCA 2000,10,502-506 and WO-01/27040) describes.
Light trigger as the standard for radical polymerization, it is possible to use be such as available commercially907,651,369,184,
1173 or4205 (all deriving from Ciba SpecialtyChemicals).
Non-reacted additive such as relates to antioxidant, accelerator, dyestuff, inhibitor, activator, filler, pigment, resists quiet
Electricity agent, fire retardant, thickening agent, thixotropic agent, surfactant, viscosity improver, extending oil, plasticizer, viscosifier, catalyst,
Sensitizer, stabilizer, such as phenol derivatives, such as 4-thanatol or 2,6-di-tert-butyl-4-methy phenol (BHT),
Lubricant;Dispersant, water-repelling agent, binding agent, flow improving agent, defoamer, degasser, diluent, curing inhibitors, auxiliary is joined
Photo-orientable monomer described in mixture, coloring agent, dyestuff, pigment or EP1 090 325 B or oligomer or polymer;
Especially, if requiring colored filter, can add dye in the compositions of the present invention.
The conventional solidification that can be used to stable component or curable compositions thus prevent premature solidification from starting presses down
Preparation or polymerization inhibitor can include hydroquinone;P-tert-butyl catechol;2,6-di-t-butyls-p-methyl phenol;Phenothiazine;N-benzene
Base-2-naphthylamine.
Described compositions is solid, or dilutes in a solvent with the form of solution, gel, dispersion or emulsion, described molten
Agent is organic solvent and/or water.
Preferably, described compositions is transparent solution.The described solvent used in this application or solvent mixture can
To be any compound of the liquid-crystal composition that can dissolve the present invention.At least one solvent, the most common pole can be used
Property solvent or non-polar solven.Particularly preferred solvent is the solution causing described material good coating on applied base material
Those of property or printing.
Non-polar solven is to have low dielectric constant and water-immiscible compound, such as hexane, benzene, toluene,
Ether, chloroform, ethyl acetate, dichloromethane.
Polar solvent is non-proton or proton.
Polar non-solute is to have the ion-solubility ability of proton solvent but does not have the solvent of acidic hydrogen.These are molten
Agent is generally of high dielectric constant and high polarity.Example is Isosorbide-5-Nitrae-dioxane, oxolane (THF), acetone, acetonitrile
(MeCN), dimethylformamide (DMF), dimethyl sulfoxide (DMSO), N-Methyl pyrrolidone (NMP), ethyl pyrrolidone, N-second
Vinyl pyrrolidone, butoxy ethanol (BC), gamma-butyrolacton (BL), N-methylmorpholine, gamma-butyrolacton, acetonitrile, diethylene glycol
One ether, DEGMBE, diethylene glycol monoethyl ether acetate, ethylene glycol, Propylene glycol monoacetate, propylene-glycol diacetate,
Dipropylene glycol, and DPGME, chlorobenzene, oxolane, butyl cellosolve, Ketocyclopentane (CP), methyl ethyl ketone
(MEK), ethyl acetate (EA), methyl phenyl ethers anisole (AN), Ketohexamethylene (CHN), methyl iso-butyl ketone (MIBK) (MIBK), 1-methoxy-2-propanol
Acetas (MPA), N, N-dimethyl-formamidine (DMF), dichloromethane, gamma-butyrolacton (BL), and their mixture.
Polar aprotic solvent is the solvent containing dissociable H+, such as fluohydric acid gas.The molecule of such solvent can be given
Go out H+ (proton).On the contrary, aprotic solvent can not give hydrogen bond.The total characteristic of proton solvent is display hydrogen bonding, has acid
Property hydrogen (although they are probably very weak acid), it is possible to stabilizing ion is (by not sharing free electron to stable cationic, logical
Cross hydrogen bond and stablize anion).Example is acetic acid, n-butyl alcohol, isopropanol, normal propyl alcohol, ethanol, methanol, formic acid and water.
Preferably, the organic solvent used in this application is proton or non-proton polarity or non-polar solven.
Preferably solvent is but not limited to:
-one, such as acetone, Ketocyclopentane (CP), Ketohexamethylene (CH), methyl iso-butyl ketone (MIBK) (MIBK), methyl ethyl ketone
(MEK),
-amide, such as DMF (DMF), N-Methyl pyrrolidone (NMP), N-ethyl pyrrolidone, N-
Vinyl pyrrolidone, N,N-dimethylacetamide,
-carbamate,
-ether, such as methyl phenyl ethers anisole (AN), oxolane (THF), ethylene glycol, dipropylene glycol, DEGMBE, diethylene glycol
Monoethyl ether acetate, DPGME,
-ester, such as ethyl acetate (EA), 1-methoxy-2-propanol acetas (MPA), gamma-butyrolacton (BL), propylene glycol
Monoacetate, propylene-glycol diacetate, DPGME,
-ol, such as butoxy ethanol (BC), ethyl cellosolve, butyl cellosolve,
-dimethyl sulfoxide (DMSO),
-halogenated hydrocarbons, such as dichloromethane, chlorobenzene,
-non-polar solven, such as but not limited to hydrocarbon, such as hexane, heptane, toluene, petroleum ether,
Mixture with them.
Preferred solvent is acetone, Ketocyclopentane (CP), Ketohexamethylene (CH), methyl iso-butyl ketone (MIBK) (MIBK), Methylethyl
Ketone (MEK), DMF (DMF), N-Methyl pyrrolidone (NMP), N-ethyl pyrrolidone, N-vinyl pyrrole
Alkanone, N,N-dimethylacetamide, (AN), and oxolane (THF), ethylene glycol, dipropylene glycol, DEGMBE, diethylene glycol
Monoethyl ether acetate, DPGME, ethyl acetate (EA), 1-methoxy-2-propanol acetas (MPA), γ-Ding Nei
Ester (BL), Propylene glycol monoacetate, propylene-glycol diacetate, DPGME, dimethyl sulfoxide (DMSO).
Most preferably Ketocyclopentane (CP), Ketohexamethylene (CH), methyl iso-butyl ketone (MIBK) (MIBK), methyl ethyl ketone (MEK), second
Acetoacetic ester (EA), 1-methoxy-2-propanol acetas (MPA), dimethyl sulfoxide (DMSO).
The amount of described reactive or non-reacted additive in the composition is prepared by by described compositions (XX)
Film liquid crystalline phase limit, described liquid crystalline phase must be kept.Generally, the amount of described reactive or non-reacted additive is institute
State 0.1-50 weight % of compositions, 1-30 weight % of the most described compositions, the most described compositions
1-10 weight %.
In the case of the compositions of the present invention comprises stabilizer, stabilizer is generally with 0.01-5 weight %, preferably 0.1-1
The amount of weight % exists, based on described compositions meter.
Initiator is effectively to measure use for causing the solidification of described compound.Described effective dose depends on technique
Parameter and the character of initiation material.Typically, described amount is in the range of 0.1-10 weight %, preferably in 0.5-8 weight %
In the range of, more preferably in the range of 1-5 weight %, based on the gross weight of described compositions.Can also use two kinds or
The combination of more kinds of initiators (light trigger or thermal initiator).
Preferably liquid crystal polymer of the present invention (I), (Ia) or (Ib) is prepared by compositions, multi-thiol in said composition
Thiol group is less than 2, preferably in the range of about 0.005-1, more preferably at 0.001-with the mol ratio of unsaturated carbon-carbon bond
In the range of 0.5, most preferably in the range of 0.002-0.5.
Depend on intended purposes, add solvent and be probably favourable.The typical case of the described compositions being placed in solvent is dense
Degree between 2 and 50%, preferably between 10 and 40%, with active component such as multi-thiol, liquid crystal and optional polymerization agent,
Initiator and the additive weight concentration meter in described solvent.
In another embodiment, the compositions (XX) that the present invention relates to the present invention is used for preparing elastomer, and liquid crystal gathers
The application of compound gel, liquid crystal polymer, liquid crystal polymer network or liquid crystalline polymer film.
The compound of the present invention can use method well known to those skilled in the art (such as at Houben-Weyl,
Methoden der Organischen Chemie, Thieme-Verlag, Stuttgart or at U.S. Patent number 6630076
Or those methods described in WO 2005/054406) easily prepare.
Different methods can be used for being initially formed liquid crystal film or the liquid of needs by described polymerisable composition (XX)
Crystal mesh network.Can use base material such as glass or plastic basis material, described base material can optionally be coated with tin indium oxide (ITO).For
Prepare liquid crystal film or network, particularly importantly avoid the formation of defect or inhomogeneities.Accordingly, it is preferred that base material includes glass
Glass or plastics, (polyimides such as rubbed or the layer of polyamic acid or the photic of Photoinduced alignment are gathered particularly to include both alignment layers
The layer of compound (LPP)) those.Use described layer to allow the homogeneous orientation of liquid crystal compound.Homogeneous orientation can also be passed through
Other method known in the art realizes.Described polymerisable composition (XX) is coated on base material and is polymerized.Preferably, institute
State the compositions (XXI) of polymerisable coating by photo polymerization, it means that making to use up, preferably UV light makes it solidify, to provide
Liquid crystal polymer (LCP) film of crosslinking.Hardening time depends on the reactivity of described polymerizable material among others, the layer of coating
Thickness, the type of polymerization initiator and the power of UV lamp.According to the present invention, it is preferably no longer than described hardening time 10 minutes,
Particularly preferably it is no longer than 5 minutes, is very particularly preferably shorter than 2 minutes.For producing in enormous quantities, 1 minute or less, very preferably
1 minute or less, particularly 10 seconds or less short hardening time were preferred.After being exposed to light and temperature, described film
It it is mechanical resistance.
In the context of the present invention, term " radiation curing " and " photo polymerization " synonymously use.
The method that the invention still further relates to prepare liquid crystal polymer, particularly liquid crystal film or liquid crystal network, the method includes:
Preferably containing aerobic with the amount of 0.1≤oxygen≤50%, more preferably with amount the containing containing aerobic of 1≤oxygen≤25%
In oxygen atmosphere, the most in atmosphere,
A) coating composition (XX), wherein said compositions has identical meanings given above and prioritizing selection;So
After
B) optionally it is dried, and then
The compositions (XXI) of the described coating obtained after c) being aggregated in step a) or step b), it is preferably film.
Preferably, the present invention relates to method presented above, the most do not use the oxygen barrier layer getting rid of oxygen.
Additionally, it is preferred that the present invention relate to liquid crystal polymer given above, it is to use low UV lamp power and energy system
Standby.
Moreover, it relates to the compositions (XXI) of coating, it can be according to processing step a) described above with optional
Ground b) obtains.
Usual described compositions is coated with by general coating known in the art and printing process.Coating process is such as to revolve
Being coated with, air doctor blade, scratch (blade coating), blade coating (knifecoating), reverse roll coating, transferring roller is coated with, recessed
Print roller coat cloth, kiss roll is coated with, and casting is coated with, spraying, slotted opening coating (slot-orifice coating), calendering coating, electricity
Deposition (electrodepositing coating), dip-coating or die orifice coating (diecoating).
Printing process is such as: letterpress, such as aniline printing, ink jet printing;Intaglio printing, such as directly intaglio process
Brush or offset gravure (offset gravure printing);Lithographic printing, such as hectographic printing;Or silk screen printing, example
Such as screen printing.
Whether it is dried step and depends on the denseness of described compositions.
If described compositions comprises solvent, generally it is dried described compositions after the coating step.
Generally, " being dried " is to extract described solvent, such as, by applying heated air, use and such as pass through
Convection current applies described heat and takes away the air stream (convective drying or convection drying) of solvent vapour.It is dried at a higher temperature
Comparatively fast;But, the liquid crystalline phase of the compositions (XXI) of described coating must be kept, and which has limited the temperature that can apply, preferably less than
Clear point in the compositions (XXI) of described coating.It addition, when determining to be dried applied temperature, it is necessary to
Consider product or the quality of film.Other probability is: vacuum drying, is wherein conducted by contact or radiates (or microwave) supply heat
Amount, the steam simultaneously produced is removed by vacuum system;Indirectly or contact drying (being heated by hot wall), such as drum dried,
Vacuum drying;Dielectric drying (radio frequency or microwave are absorbed in described material);Lyophilization or lyophilizing;The machinery of solvent carries
Take.
The initiator of described reactive and/or non-reacted additive and described compositions is generally before described method
With described polymerizable liquid-crvstalline or multi-thiol premixing during or.
In a preferred embodiment in accordance with this invention, described method includes the compositions of coating described in photo polymerization
(XXI)。
Described photo polymerization is carried out by radiation.
In the context of the present invention, radiation is polarization or unpolarized light.
The most unpolarized light, but in the embodied case, it is also possible to that applying polarizes or partial polarization, line
Property, circle or the light of elliptical polarization.
Generally, lamp is used for photo polymerization.Intensity for the lamp of described irradiation should be preferably above 0.2mW/cm2, more preferably
Higher than 10mW/cm2, most preferably higher than 20mW/cm2, particularly most preferably higher than 50mW/cm2.Most probable ground, described polyreaction can
To be caused by any photochemical light source.Generally, it is aggregated under common room temperature condition and completes.The class that can be used for the present invention is photochemical
Just ultraviolet light and by the sun or by artificial light source such as RS type daylight lamp, carbon lamp, xenon arc lamp, mercury vapor lamp, tungsten halogenation
The actinic radiation of other form being generally found in the ray that thing lamp etc. sends.If described photo curable polyenoid/polynary sulfur
Alcohol composition contains suitable photo polymerization accelerator, and ultraviolet radiation can use most effectively.By suitably selecting ultraviolet light
Source, photo polymerization accelerator and its concentration, temperature and molecular weight, and described polymerizable liquid-crvstalline and the reactive base of multi-thiol
Group's degree of functionality, can be adjusted to the shortest, and be the most commercially economical hardening time.
Described liquid crystal polymer can also be passed through electron beam (EB) and obtain.This curing is without requiring initiator.
Optionally, described photo polymerization can be in the situation not using light trigger in the way of being similar to Bowman description
Under carry out, wherein use have strong transmitting specific UV light source (Bowman et al., Macromolecules 2002,35,
5361-5365), and maleimide can be used as described in EP0618237 to carry out.
The invention still further relates to liquid crystal polymer, preferably formula (I), (Ia) or the liquid crystal polymer of (Ib), it can be by above
The inventive method described obtains, and the polymerization especially by the present composition obtains.
Preferably, the present invention relates to liquid crystal polymer, preferably formula (I), (Ia) or the liquid crystal polymer of (Ib), it can pass through
Present invention as described above method obtains, and the polymerization especially by the present composition obtains, and premise is not include polymer
Scattered liquid crystal.
The invention still further relates to described liquid crystal polymer (I), the liquid crystal film of the compositions (XXI) of described coating or network are in system
Application in the standby non-patterned or optics of patterning or photoelectric cell and system (particularly multilayer system) or device.
Optical element, system or device produce, handle or measure electromagnetic radiation.
Photoelectric cell, system or device are run by the optical property being changed material by electric field.Therefore, it relates to electromagnetism
Interaction between electricity (electronics) state of (light) and material.
Non-patterned or that pattern optics or photoelectric cell can be used for (but not limited to): waveguide, safety or business
Mark protection element, bar code, grating, light filter, delayer (retarder), compensation film, reflective polarizer films, absorbability polarizes
Film, anisotropic scattering film, compensate and phase shift films, the phase shift films (twisted retarder film) of torsion, cholesteric liquid
Epitaxial, guest of honour's type liquid crystal film, monomer ripple film, smectic liquid crystal film, polariser, piezoelectric battery (piezoelectric cell), aobvious
Showing the thin film of nonlinear optical property, ornamental optical element, brightness improves film, the element compensated for wavelength band selectivity,
The element compensated for multizone, the element of multi-view angle LCD, achromatic retarder (achromaticretarder), partially
Polarization state correction/regulation film, optics or the element of photoelectric sensor, brightness improves the element of film, for the unit of light base telecommunications devices
Part, has the G/H-polariser of the patterning of anisotropic absorption device, the reflexive circuit polarizer of patterning, the reflection of patterning
Property linear polarization, the MC (monomer ripple film) of patterning.
Preferably safety element, compensator and phase shift films.
Another aspect of the present invention provides optics or photoelectric cell and multilayer system, and its liquid crystal comprising the present invention gathers
Compound, liquid crystalline polymer film or network.
Preferably, patterning refers to birefringence patterning and/or the thickness patterning and/or patterning of optic axis orientation,
And/or the patterning of the degree of polymerization.Birefringence refers to the difference between the extra-ordinary index of refraction and ordinary refractive index.
The invention still further relates to the liquid crystal polymer of preparation patterning, the particularly method of birefringent film, the method includes figure
The compositions (XXI) of polymerisable coating described in case, the most birefringence patterning and/or thickness patterning and/or optic axis
The patterning of orientation, and/or the patterning of the degree of polymerization, and further preferably include photo polymerization.
Moreover, it relates to the liquid crystal polymer (I) of patterning, particularly birefringent film, or include such pattern
The network of the liquid crystal polymer changed and optical element.
In the context of the present invention, the thin film of the liquid crystal polymer (I) of patterning preferably patterning.
It is highly preferred that the method that the present invention relates to the liquid crystal polymer (I) of preparation patterning, the method includes planar
Two-dimensional patterned or three dimensional patterned in space, the most described pattern is periodic or acyclic.Three dimensional form is
Such as specific surface relief structure (relief structure), that such as tilt or the liquid crystal polymer structures of bending, example
Such as lenticule or micro-prism structure.
The method of the liquid crystal polymer (I) of described preparation patterning provides preparation and has specific surface relief structure such as
The convenient means of the birefringent film of lenticule or micro-prism structure.
It is highly preferred that patterning refers to the method for the compositions (XXI) of coating described in radiation curing.Most preferably,
The present invention relates to the degree of polymerization that patterned by generation and then optionally by rinsing the remaining of described liquid-crystal composition
Unpolymerized liquid crystal or component prepare the method for the liquid crystal polymer of patterning, the step bag of the degree of polymerization of described generation patterning
Include and make the present composition (XXI) the one or many ground of coating be exposed to radiation by one or more masks, the most parallel
Radiation, and/or be exposed to the radiation of scanning beam form.
The degree of polymerization of local can be by the local ratio of unreacted polymerizable groups in liquid-crystal composition after polymerisation
The measurement of example quantifies.
Being it desired to realize the high-resolution of described patterning, it is favourable for using parallel radiation.
By radiation-induced polymerization, preferably radical polymerization feasible region selective polymerisation, be wherein coated with by not gathering
Close the compositions (XXI) (i.e. wet film) of liquid crystal composition by by planar mask (shadow mask) or gray masks (gray
Mask) radiant exposure, and/or utilize flying spot bundle radiant exposure.
In the context of the present invention, polymerization refers to obtain any reaction of polymer according to it.Polymerization is such as
Any polyreaction, solidification and cross-linking reaction.Term solidification refers to polymerization.
Especially, most preferably, the method that the present invention relates to the liquid crystal polymer (I) of preparation patterning, the method includes
In single step of exposure or in multiple step of exposure,
A) by black/white ash or spectral selection mask, or by can reappose between step of exposure black/
White or ash or spectral selection mask, or by the black/white can being replaced between step of exposure or ash or spectral selection
Mask;
And/or
B) by the radiation of scanning beam form
It is polymerized the present composition (XXI) of described polymerisable coating.
In the context of the present invention, black/white mask refers to that described mask is by district wholly transmissive for each radiation
Territory and the region composition blocked completely.Lycoperdon polymorphum Vitt mask refers to there is also the region of the absorbance with by-level.
It is highly preferred that the method that the present invention relates to the liquid crystal polymer (I) by birefringent patterning preparation patterning.
Birefringent impact can be utilized by process conditions, the compositions (XXI) of described coating to be patterned.Institute
State the birefringence in the compositions (XXI) of polymerisable coating or liquid crystal polymer (I) and depend on the order parameter of liquid crystal molecule
(order parameter).Described order parameter such as can be gathered by the compositions (XXI) of described polymerisable coating or liquid crystal
The temperature impact of compound (I).Therefore temperature on the impact of described order parameter and depends on polymerization to described birefringent impact
Degree.Complete unpolymerized liquid-crystal composition shows the birefringence strong dependency to temperature.Along with the degree of polymerization improves, described dependence
Property dies down.Therefore, the patterning of the above-mentioned degree of polymerization can be used by making described liquid-crystal composition be exposed to a certain temperature
Carry out the patterning of induced birefringence.The birefringent pattern so produced can fix by applying the second polymerization procedure.
Most preferably, the method that the present invention relates to the liquid crystal polymer (I) patterned by birefringent patterning preparation,
The method includes
A) compositions (XXI) or the liquid crystal polymer (I) that make described polymerisable coating pass through one or more masks one
Secondary or be repeatedly exposed to radiation, and/or one or many is exposed to the radiation of scanning beam form,
With
B) the most at elevated temperatures, preferably at a temperature of the clear point higher than described compositions second gather
Close.Hot or photoinduced polymerization is all possible, preferably the combination of the polymerization of photo polymerization or light and heat induction.
Or, birefringent pattern can be produced by being polymerized described film the most under different conditions.Can be
The birefringent condition affecting liquid crystal film in patterning polymerization procedure is the temperature of described film, for causing the radiation of described polymerization
Intensity, dosage, spectrum, store the atmosphere of described film in the course of the polymerization process.The combination of these conditions is also possible.Described
Partial polymerization under different condition can by realizing through the repeatedly radiant exposure of mask that is different or that reappose, or
Utilize for causing the flying spot bundle of described polymerization to realize.
Birefringence additionally can utilize the induced reaction art pattern CAD of locally variable.Described radiation is preferably by electromagnetic radiation
Composition, is preferably made up of visible ray and/or UV light and/or X-ray and/or electron beam.Described radiation can pass through black/white, ash
Or wavelength selectivity mask applies, or applied by beam scanning on birefringent film region.Optionally, described reaction
By subsequently or simultaneously applying the temperature of rising and/or can carry out in atmosphere reactive.
Most preferably, the method that the present invention relates to the liquid crystal polymer (I) patterned by birefringent patterning preparation,
The method includes by under different process conditions, the most at different temperature;And/or in the radiation for exposure not
Same energy (preferably above 1mJ/cm2, more preferably at 1mJ/cm2-5J/cm2In the range of), under intensity or spectrum;And/or
Under different atmosphere, described polymerizable liquid-crvstalline or polymerizable liquid-crvstalline compositions one or many is made to be covered by one or more
Film is exposed to radiation and/or one or many is exposed to the radiation of scanning beam form and produces pattern in terms of the degree of polymerization.
Most preferably, the present invention relates to the use of radiation, compositions (XXI) or liquid crystal by described polymerisable coating are gathered
The method of the liquid crystal polymer (I) of the birefringent patterning preparation patterning of compound (I).
Preferably, the radiation for described method represents in the visible and/or electromagnetic radiation of UV and/or x-radiation range
And/or particle radiation, such as electronics and/or atom and/or ion and/or molecular radiation, most preferably UV radiates, and thus causes local
Variable radiation-induced physically or chemically reaction.Described radiation-induced reaction changes local birefringence.In the present invention one
In individual preferred embodiment, described radiation-induced reaction is realized by the change of the degree of polymerization.
In another embodiment of the invention, the one in the described polymerizable liquid-crvstalline compositions (XX) of the present invention
Or the component of multiple radiation activatable allows to rely on partial radiation to process the birefringence regulating described liquid-crystal composition.Can spoke
Penetrating the component of activation can be that such as can be transformed into a kind of different isomeric forms from a kind of isomeric forms (the most suitable
Isomerization) component, depend on by the Local treatment that carries out of radiation.Preferably, the radioactivation process of described patterning is in institute
Carry out before stating the polymerization of liquid-crystal composition.For between different isomers switching activation described radiation can by black/
In vain, ash or wavelength selectivity mask are applied or are applied by beam scanning on described liquid crystal combination object area.Optionally,
The effect of described radiation can be by heat treatment subsequently or simultaneously or by the storage in particular atmosphere of the described liquid-crystal composition
Deposit and improve.Process, according to described partial radiation, the described different isomer produced and affect having in liquid crystal film by different way
Sequence, and therefore can realize birefringent local modulation.Preferably, the process of described photoisomerization and described polymerization
Initiation separate.Described birefringent pattern can be fixed by causing the polymerization of described liquid-crystal composition subsequently.
The combination of the method for above-mentioned patterned birefringent is also possible.
Most preferably, the present invention relates to the use of the photoisomerization of the present composition (XXI) that radiation is coated with by use
The method of liquid crystal polymer (I) of means preparation patterning, the present composition (XXI) of described coating is containing can light isomery
The component changed.
Preferably the compound of photoisomerization can comprise N=N, C=C or C=N unit.
Most preferably, the present invention relates to by birefringent patterning or the patterning of the thickness of polymerizable liquid-crvstalline (I)
Or the side of the liquid crystal polymer (I) of the patterning preparation patterning of the thickness of the present composition (XXI) of polymerisable coating
Method.
This can be come by the part of the original uniform membrane material of regioselectivity removing (preferably rinse or dissolve)
Realize.
Generally, such as by sample leaching is removed unpolymerized part in a solvent, or it is aggregated in the temperature of rising
Under carry out, polymerization the most subsequently can by photochemistry or/and thermal initiation, preferably exceed described unpolymerized liquid crystal material
Clarifying temp at a temperature of cause.In both cases, create and have or the region of high or low optical delay value
Digital pattern.In the former case, thickness profile is defined due to the removal of unpolymerized material;In the later case, real
Having showed more or less uniform film, its local is birefringent or non-birefringent, or local has or high or low two-fold
Penetrate.
Such as, in one embodiment, the degree of polymerization of patterning is produced the most in the first step.?
In second step, utilize the liquid-crystal composition of the degree of polymerization described in suitable solvent development with patterning, i.e. use described solvent
Rinse described film, or described film is immersed in described solvent.Due to the dissolubility of described material and the material that therefore removes
Amount can depend on the degree of polymerization, the pattern therefore pattern of the degree of polymerization translating into film thickness is possible.Use solvent
Described developing method can be carried out at elevated temperatures.
For the suitable solvent of described developing method according to the component of the compositions (XXI) of described polymerisable coating and institute
State the Comparative dissolution Sexual behavior mode of the liquid crystal film (I) of solidification, and be such as acetone, methyl phenyl ethers anisole, butyl acetate, methacrylic acid fourth
Ester, butyl glycol (butyl cellosolve), gamma-butyrolacton, Ketohexamethylene, Ketocyclopentane, diethylene glycol-Anaesthetie Ether, diethylene glycol,
Diethylene glycol dimethyl ether (Diglyme), DMF, dipropylene glycol dimethyl ether, DPGME,
Dioxane, ethyl acetate, ethyl lactate, ethylene acetate, acetic acid 2-ethoxyethyl group ester, ethyl-3-ethyoxyl-the third
Acid-ethyl ester, ethylene glycol, ethanol, 4-hydroxy-4-methyl-2-pentanone, isopropanol, 2-propanol, dichloromethane, methyl ethyl ketone,
4-methyl-2 pentanone, 1-methoxy-2-propanol, 1-methoxy-2-propanol acetas, methyl propyl ketone, 1-methyl-2-pyrroles
Alkanone, propyl acetate, 2-Pyrrolidone, propylene glycol propyl ether, oxolane, toluene, dimethylbenzene.
Most preferably, the present invention relates to remove polymerizable liquid-crvstalline or polymerizable liquid-crvstalline compositions by regioselectivity
Or the method for the liquid crystal polymer (I) of the component of described liquid-crystal composition and/or liquid crystal polymer preparation patterning.
Particularly most preferably, the method that the present invention relates to the liquid crystal polymer (I) of preparation patterning, the method includes
The described polymerizable liquid-crvstalline film one prepared by the compositions (XXI) of described coating is made under different process conditions
It is secondary or be exposed to radiation by one or more masks in multiple times and/or be exposed to the radiation of scanning beam form,
With
Followed by solvent development, and/or by the temperature polymerizations raised.
The liquid crystal polymer (I) of the degree of polymerization with patterning produced by said method is it can in addition contain by pattern
Change, wherein by utilizing the uniform material ablation of particle and/or electromagnetic radiation to realize the layer thickness of patterning.Described particle spoke
Penetrating can be by ion, atom, and molecule and/or electronics composition, described electromagnetic radiation can be by IR, it is seen then that UV light or x-ray groups
Become.
In another embodiment, for the liquid crystal polymer (I) of homogeneous polymerization, described material ablation is with patterning
Mode is carried out.The ablation of described patterning is realized by uneven applying particle and/or electromagnetic radiation.Described uneven applying is led to
Cross described birefringence liquid crystal compositions to be exposed by the single or multi-step of one or more black/whites or ash or wavelength selectivity mask
Light and/or the beam scanned by applying are realized on described liquid-crystal composition.Described particle radiation can be divided by atom
Son, ion and/or electronics composition, described electromagnetic radiation can be by IR, it is seen then that UV light or x-ray composition.
Another method of the film thickness producing patterning is to be selectively deposited on base material by described material area.Institute
State and be preferably deposited by printing process and complete.The printing process of typical types is ink jet printing, spin coating, hectographic printing, intaglio process
Brush, aniline printing etc..
Another the inventive method for film thickness patterning is the use of regioselectivity manufacturing process, such as impressing,
Punching press or method of moulding.Described manufacturing process can be applied in birefringence that is unpolymerized, partially polymerized or that be polymerized completely
Film.
The another kind of method of the film thickness of patterned birefringent film is to use lithographic plate printing method.Described lithographic plate printing method
May include steps of: coating photoresist, expose by radiation patternization, development step, etching step and strip step.Described
Lithographic plate printing method is preferably applied in the birefringent film being partially or completely polymerized.
In order to obtain the patterning of optical delay, birefringence patterning and thickness patterning combination is also possible.
Particularly most preferably, the method that the present invention relates to the liquid crystal polymer (I) of preparation patterning, pass through
A) with making the described polymerizable liquid-crvstalline film one or many prepared by the compositions (XXI) of described coating by one
Individual or multiple masks are exposed to radiation and/or are exposed to the radiation of scanning beam form,
With
B) followed by uniform particle radiation and/or uniform electromagnetic radiation, preferably with the radiation ablation of patterning by
The liquid crystal film of non-homogeneous solidification prepared by the compositions (XXI) of described coating.
It addition, particularly most preferably, the method that the present invention relates to the liquid crystal polymer (I) of preparation patterning, pass through
A) regioselectivity ground prints described material area selectivity, and/or
B) regioselectivity ground impressing, punching press or mould described material, and/or
C) material described in offset printing.
Another embodiment of the invention is the method including patterning the optic axis of described liquid crystal polymer (I).
In the case of alignment, by seen from partial polarization and/or UV light, preferably partial linear, circle or ellipse
The inclination of the light of polarization or vertical exposure, or the exposure by the inclination of non-polarized light, introduce described orientation function
Both alignment layers.
The patterning of described optic axis can realize by means of the both alignment layers of the patterning below liquid crystal film.Described orientation
Layer allows to introduce the azimutal orientation of the patterning of optic axis liquid crystal film, or the inclination angle that will be patterned into introduces in institute
State both alignment layers and the liquid crystal molecule of the intermembranous interface of described liquid crystal.Depending on the type of both alignment layers, described orientation function is permissible
Producing by being exposed to radiation, wherein said radiation can be electromagnetic radiation, particularly visible and/or UV light, or particle spoke
Penetrate, particularly atom, molecule, ion and/or electronics.It addition, described orientation such as can be rubbed by the mechanical treatment of both alignment layers
Wipe described layer, stretch described layer and/or introduce the groove of submicron in said layer and induce.The function of base material and both alignment layers is permissible
It is combined, i.e. depends on that the type of base material, described base material can functionalised itself, with to the liquid being coated on described base material top
Epitaxial introduces orientation.The method of all above-mentioned induction orientation functions can also be applied directly to such suitable base material.
In liquid crystal film (I), the another way of patterned optical axle orientation is to use additive, and preferred reactive is added
Agent, described additive depends on that their characteristic affects described slant characteristic (tilt profile) and/or azimuth orientation is special
Levy (azimuthal alignmentprofile).Such additive be such as convert activation after change they polarity,
Their pKa constant, their additive of screw twisted merit (helical twisting power) etc..
The conversion activation of described additive can be exposed to radiation, preferred electromagnetic radiation, more preferably UV and/or visible ray
Rear generation.
By be exposed to radiation combined also change environmental condition such as temperature and/or surrounding atmosphere carry out activating also be
Possible.
Patterning can by described compound under different reactive additive activation conditions regioselectivity
Ground is polymerized each district, or is realized by the patterning activation of the conversion of the most described additive.
The combination of the method for above-mentioned patterned birefringent, film thickness and optic axis orientation is also possible.
Most preferably, the method that the present invention relates to be prepared the birefringent film of the polymerization of patterning by both alignment layers.
Particularly most preferably, the present invention relates to the liquid crystal polymer by preparing patterning with both alignment layers pattern liquid-crystalline
(I) method, the display of described both alignment layers tilts and/or azimutal orientation.
Particularly most preferably, the method that the present invention relates to the liquid crystal polymer (I) of preparation patterning, described liquid crystal polymer
(I) liquid crystal and additive, preferred reactive additive are comprised;And/or chiral dopant.
In a preferred embodiment in accordance with this invention, additive represents that impact tilts and/or the adding of azimutal orientation
Add agent, and chiral dopant represents the chiral dopant preferably with variable torsional work.
Particularly most preferably, the present invention relates to prepare patterning by the combination of method presented above and/or additive
The method of liquid crystal polymer (I) of polymerization.
In the context of the present invention, the radiation of patterning refers to the incident illumination that the local being radiated on object changes.
In the context of the present invention, both alignment layers refers to have induce in the liquid crystal layer being coated in described both alignment layers and joins
To the layer of function.
In the context of the present invention, chiral dopant is used as additive, is preferably used as reactive additive, its
Making described polymerizable liquid-crvstalline film is thermochromism, and thermochromism mode makes the pitch that reflected by said composition and therefore
Wavestrip can be selected by variations in temperature, and the color i.e. reflected by described film is partially dependent on temperature when described film is cured
Degree (as described in such as US6117920).Described chiral dopant such as can be selected from the n-nonanoic acid cholesteric being available commercially
Alcohol ester (CN), CB15, R/S-811, R/S-1011, R/S-2011, R/S-3011 or R/S-4011 (Merck KGaA,
Or derive from BASF's Darmstadt)LC756.Be particularly suitable to comprise chirality glycosyl group, have
The adulterant of high torsional work, the most double anhydrous hexitol (dianhydrohexitol) derivants, such as Sorbitol, sweet
Dew sugar alcohol or the derivant of iditol, the sorbitol derivatives disclosed in highly preferred WO98/00428.Further preferably:
GB 2,348, the adulterant comprising benzyleneglycol group disclosed in 207, the chiral binaphthyl base disclosed in WO 02/94805
Derivant, the chirality bis-phenol acetal derivant disclosed in WO 02/34739, chirality TADDOL disclosed in WO 02/06265 is spread out
Disclosed in biology, and WO 02/06196 and WO 02/06195, there is at least one fluorination linking group and end or center hands
The chiral dopant of property group, and U.S. Patent number 5,250,222, U.S. Patent number 5,411,676, U.S. Patent number 5,
093,027, U.S. Patent number 5,637,255, U.S. Patent number 5,230,828, U.S. Patent number 5,356,559, United States Patent (USP)
Chiral dopant disclosed in numbers 5,360,577.
In the context of the present invention, optical delay is by the long-pending definition of the thickness of birefringence and birefringent film.Birefringence quilt
The difference being defined as between the extra-ordinary index of refraction and ordinary refractive index.
In the context of the present invention, azimuth alignment direction refers to that the azimuth of abnormal axle takes in the plane of described layer
To.It addition, alignment features (profile) refers to azimuth and/or the polarity alignment direction thickness direction along described birefringent film
Change, as such as in twisted retarder (retarder).
In the context of the present invention, tilt to refer to the angle between the orientation of membrane plane and liquid crystal molecule, and tilt
Feature indicates that described inclination angle changes along the depth direction of described film, and the most in some cases, described slant characteristic can lead to
Cross and illustrate average slope angle and approximate.
In the context of the present invention, ' A plate ' refers to utilize the optical delay of the layer of uniaxial birefringent material, described list
The abnormal axle of axle birefringent material is parallel to the planar orientation of described layer.
In the context of the present invention, ' C plate ' refers to utilize the optical delay of the layer of uniaxial birefringent material, described list
The abnormal axle of axle birefringent material is perpendicular to the planar orientation of described layer.
In the context of the present invention, ' O plate ' refers to utilize the optical delay of the layer of uniaxial birefringent material, described list
The abnormal axle of axle birefringent material relative to described layer plane with tilt angular orientation.
Comprise A-, C-and O-plate also referred to as "+A/C/O with positive birefringent, optically uniaxial birefringent material
Plate " or " positive A/C/O plate ".Comprise and there is A-, C-and O-plate of negative birefringent, optically uniaxial birefringent material film also
It is referred to as "-A/C/O plate " or " negative A/C/O plate ".
In the context of the present invention, term " radiation curing " refers to by radiation-induced polymerization or crosslinking or process.
In a preferred embodiment in accordance with this invention, the liquid crystal polymer (I) of patterning is three-dimensional or two-dimensional pattern
The liquid crystal polymer changed.
Additionally, it is preferable that the liquid crystal polymer of patterning, the preferably liquid crystal polymer of formula (I), it can pass through the present invention
Method obtain, particularly its can by polymerization, preferably obtained by photo polymerization.
Preferably, the present invention relates to the liquid crystal polymer (I) of the patterning prepared by the compositions (XXI) of described coating.
Preferably, the present invention relates to liquid crystal polymer (I), it has the performance that at least one is lateral patterning, Qi Zhongsuo
It can be periodic or acyclic for stating pattern.
" lateral patterning " in above-mentioned definition refers to that the character of described birefringent film becomes in the plane of described film
Change.
Described liquid crystal polymer (I) also can be passed through electron beam (EB) and obtain.This curing is without requiring initiator.
Preferably, the present invention relates to optics or photoelectric cell, it comprises the torsion of the liquid crystal polymer (I) containing patterning
Delayer film and/or cholesteric liquid crystal film and/or guest of honour's type liquid crystal film and/or smectic liquid crystal film.
Described birefringent film is toleration (resistant) when being exposed to light and temperature, and can be used for system
Make device, such as safety element, compensate film, phase shift films, light filter, polariser, grating, waveguide, light cell, piezoelectric battery or display
The thin film of nonlinear optical property.Preferably compensate and phase shift films.
Furthermore it is preferred that the present invention relates to the delayer film reversed, it comprises the liquid crystal polymer of the present invention of patterning
(I)。
Furthermore it is preferred that the present invention relates to cholesteric liquid crystal film, it comprises the liquid crystal polymer of the present invention of patterning
(I).Preferably, described cholesteric liquid crystal film is the A-plate reversed, and display wavelength and polarization selectivity luminous reflectance wherein reflect
The wavelength band of light depend on pitch or the pitch gradient of through-thickness, and depend on the two-fold of described liquid crystal polymer (I)
Penetrate character.
Furthermore it is preferred that the present invention relates to guest of honour's type liquid crystal film, it comprises the liquid crystal polymer of the present invention (I) of patterning.
Preferably, described guest of honour's type liquid crystal film includes the molecule of the anisotropic absorption added, and described molecule is preferably about parallel to
Indicator (director) orientation of described liquid crystal.
Preferably, the molecule of anisotropic absorption is for the typically different polarization in about 150-2000nm wave-length coverage
The light of state shows different absorbent properties.
The molecule of normally used described anisotropic absorption has carbon-to-carbon, carbon-to-nitrogen or nitrogen-nitrogen double bond.
The molecule of described anisotropic absorption is such as azo dye, anthraquinone, mericyanine, methane, 2-phenylazo
Thiazole (2-phenylazothiazole), 2-phenylazobenzthiazole (2-phenylazobenzthiazole), 1,2-bis-
Styrene, Isosorbide-5-Nitrae-bis-(2-phenyl vinyl) benzene, 4,4 '-bis-(arylazo) stilbene classes, 4,8-diaminourea-
1,5-naphthoquinone dyestuff, has the ketone part with two aromatic ring conjugation or the diaryl ketone of ketone derivatives, the most substituted hexichol
Ketone, benzophenone imines, phenyl hydrazones, and semicarbazone class or cinnamate.
The preparation of the material of anisotropic absorption listed above is it is well known that such as such as Hoffman et al. is in U.S.
State's patent No. 4,565,424, Jones et al. at U.S. Patent number 4,401,369, Cole, Jr. et al. at U.S. Patent number 4,
122,027, Etzbach et al. at U.S. Patent number 4, and 667,020, and Shannon et al. is at U.S. Patent number 5, in 389,285
Disclosed.
Preferably the molecule of anisotropic absorption is arylazo, anthraquinone, poly-(arylazo), stilbene and two
Aryl ketones derivant and cinnamate.
More preferably arylazo, stilbene, diaryl ketone and cinnamate.
The molecule of described anisotropic absorption can be by covalent bonding in trunk polymer, and they can be as side chain radical
Roll into a ball by covalent bonding on main chain, or they can exist in the polymer as the solute of nonbonding.
Polymer such as represents polyacrylate, polymethacrylates, polyimides, polyamic acid, poly-maleimide
Amine, poly-2-chloropropene acid esters, poly-2-phenyl acrylate;Unsubstituted or use C1-C6The substituted polyacrylamide of alkyl, poly-
Methacrylamide, poly-2-chloroacrylamide, poly-2-Phenyl Acrylamide, polyvingl ether, polyvinylesters, polystyrene
The straight chain of derivant, polysiloxanes, polyacrylic acid or polymethylacrylic acid or branched alkyl ester;Polyacrylic acid phenoxyalkyl
Ester, polymethylacrylic acid phenoxyalkyl ester, there is the polymethylacrylic acid phenylalkyl ester of the alkyl residue of 1-20 carbon atom;
Polyacrylonitrile, polymethacrylonitrile, polystyrene, poly-4-methyl styrene or their mixture.
Preferably, the invention still further relates to the non-patterned of the present invention or the optics patterned or photoelectric cell as delay
Film and/or compensate film and/or reflective polarizer films and/or absorb polarizing coating and/or the application of anisotropic scattering film, is used for
(a) stable twisted nematic (TN) liquid crystal display, nematic (HAN) liquid crystal display of hydridization orientation, electric control
Birefringence (ECB) liquid crystal display, super-twisted nematic (STN) liquid crystal display, birefringence (OCB) liquid crystal of optical compensation
Showing device, π-pond liquid crystal display, copline switching (IPS) liquid crystal display, fringing field switches (FFS) liquid crystal display, vertically
(VA) liquid crystal display of orientation;All aforementioned display device types are with transmission or reflection or transflector (transflective) mould
Formula is applied;
B () produces 3-D view or the display of the image with visual angle change;
(c) safety or trademark protection device;
(d) ornamental optics;
E () brightness improves film;
(f) optical pickocff;
(e) light base telecommunications devices.
Furthermore it is preferred that the present invention relates to monomer ripple film (monomer corrugatedfilm).
Furthermore it is preferred that the present invention relates to comprise the smectic liquid crystal film of described liquid crystal polymer (I).
Smectic liquid crystal film refers to the liquid crystal film of the polymerization in smectic phase, and wherein the liquid crystal molecule in smectic phase removes and has orientation
Outer have certain position degree of order the most in one direction.
Furthermore it is preferred that the present invention relates to the stacked body of device given above.
Another embodiment of the invention relates to comprising optics or photoelectric cell, preferred compensation and phase shift films (visual angle, color
Displacement (color shift), contrast, grey level's stability (graylevel stability), brightness) device, it is used
In:
Safety element,
Wavelength band selectivity compensates: birefringence-compensated film, and it is sub-by the RGB (i.e. red, green and blue) according to liquid crystal display
Pixel (subpixels) patterns, and most preferably adapts to the compensatory of respective wavelength band by described sub-pix transmission to provide
Matter,
Multizone (such as permeable reflective liquid crystal display device) compensates: have according to the cross directional variations character pattern being compensated device
The birefringence-compensated film of the character changed,
The element of multi-view angle LCD: as compensation or the phase shift films of display device, described display is not for
Same visual angle provides different images,
The element of three-dimensional liquid crystal display: be used as the compensation of the element of the liquid crystal display of three-dimensional image information is provided or prolongs
Film late,
Achromatic delayer: delayer film, different from simple colored delayer, this delayer film is for wider
Wavelength band (the most whole visible wavelength range) provides the similar change of polarization state,
Polarization state correction/regulation film: birefringent film, it is used for revising or regulation polarization state, it is therefore an objective to make function energy
Enough performances played or improve optics,
Optics or the element of photoelectric sensor, the particularly element of polarization sensitivity/selective sensor,
Brightness improves the element of film,
Safety device or ornamental optics,
For light base telecommunications devices, it is based particularly on the element of the device of polarized light.
Another embodiment of the invention relates to the G/H-polariser with anisotropic absorption agent comprising patterning
Device.
Preferably, the G/H-polariser with anisotropic absorption agent of described patterning is thin film polarizer, liquid crystal cell
Built-in (in-cell) polariser, safety device or ornamental optics.
Another embodiment of the invention relates to the device of the reflexive circuit polarizer comprising patterning.
Preferably, the reflexive circuit polarizer of described patterning is that brightness improves film, safety device or ornamental optics device
Part.
Another embodiment of the invention relates to the device of the reflective linear polarizer comprising patterning.
Preferably, the reflective linear polarizer of described patterning is that brightness improves film, safety device or ornamental optics device
Part.
Another embodiment of the invention relates to beam steering optics, and it comprises optics or photoelectric cell, is preferred for
The compensation of wavefront modification device and phase shift films.
Another embodiment of the invention relates to the device of MC (the i.e. monomer ripple) film comprising patterning.
Preferably, the monomer ripple film of described patterning is anisotropic scattering film, anisotropic emission body, antireflection
Film, has the birefringent film of raising, safety device or ornamental optics.
In the present invention, the most following device: nematic (TN) liquid crystal display of torsion, hydridization
Nematic (HAN) liquid crystal display of orientation, birefringence (ECB) liquid crystal display of electric control, super-twisted nematic (STN) liquid
Crystal display, birefringence (OCB) liquid crystal display of optical compensation, π-pond liquid crystal display, copline switching (IPS) liquid crystal
Show device, fringing field switching (FFS) liquid crystal display, (VA) liquid crystal display of vertical orientation;All aforementioned display device types with
Transmission or reflection or transflector model application, they can be used to 3-D view or the display of the image with visual angle change
Device;Beam steering optics;Light base telecommunications devices;Optical pickocff;The stacked body of device.
In the present invention, it was discovered that the liquid crystal compound of novel patternable, it is given by simple method and obtains
Patterned optical character to two or more different length of delays by way of.This being readily available property is for various application
It is all highly useful.
As a result, due to use standard acrylate LCP time for exposure dose and temperature very limited amount of process window
Mouthful, described delay patterning method with use described in include having the mercaptan described in the present invention or thio-ether units component,
Can the method for LCP material of air curing to compare be extremely difficult.Only have dissolubility contrast (developing method) or postpone right
Than trading off and can be conditioned between degree (method with the more than clear point second polymerization) and the resolution of described pattern.Can
The LCP mixture of air curing major advantage in terms of patterning is that the exposure dose regulation using and causing the reasonable degree of polymerization exists
Polymerization in LCP film and the probability of the transition of non-polymeric interregional good restriction.
Embodiment
Wt% % weight
The photopolymerizable polymer that LPP is linear
LCP liquid crystal polymer
LC liquid crystal
Min minute
Rpm rev/min
FTIR fourier-transform infrared
IR is infrared
TANAnnealing temperature
TcClarifying temp
CP Ketocyclopentane
MIBK methyl iso-butyl ketone (MIBK)
CHN Ketohexamethylene
AN methyl phenyl ethers anisole
LCP (1) 2,5-pair [4-6-acryloxy hexyloxy) benzoyloxy] benzoic acid amyl group ester, it is available commercially
Derive from ROLIC Technologies, Switzerland or be similar to U.S. Patent number 5, the route 1,2,3,4 of 593,617
Preparation
LCP (2) has the implication of the liquid-crystal compounds of following formula
LCP (2) can be known by those skilled in the art
Preparation method obtain.Preferably, LCP (2) is obtained by the method described in the embodiment of WO 95/24454.
LCP (3) has the implication of the liquid-crystal compounds of following formula
LCP (3) can be known by those skilled in the art
Preparation method obtain.Preferably, LCP (3) is by described in the route of WO 00,/55,110 1 and 2 and embodiment
Method obtain.
LPP has the implication of the polymer of photo polymerization " can linearly ".
In order to prepare LPP both alignment layers, suitable LPP material is such as described in patent publications EP 0611786, WO
In 96/10049 and EP 0763552, and include cinnamic acid derivative and ferulic acid derivative.Such as, following LPP material
ROP-103 is chosen.
ROP-103 is commercially available alignment material
(ROLIC Technologies, Switzerland).This alignment polymer is based on as photoreactive group
Cinnamate.The polymer backbone of described alignment material is acrylic ester type.
Embodiment 1 (compositions M1):
Polymerisable composition M1 preparation is as follows:
It is stirred at room temperature described compositions M1 30wt% solution in Ketocyclopentane 30 minutes.
The preparation of both alignment layers
In order to both alignment layers is spun on base material, ROP-103 is dissolved in Ketocyclopentane with the solid concentration of 2 weight %.
It is stirred at room temperature described LPP solution 30 minutes.
Base material (glass baseplate) is with described LPP solution spin coating (1 minute under 2000rpm).It is dried 10 minutes at 180 DEG C
After, by sample with from there is optical filter to select the polarized light of the high pressure Hg arc light of 300-330nm spectral region (such as
100mJ/cm2, use Schott UG11 and WG 295) irradiate.
Then by the solution of mixture M 1 by spin-on deposition on the base material that this LPP is coated with, and at 39 DEG C anneal 2 points
Clock.The clarifying temp of M1 is 44 DEG C.Unpolarized UVA light is used to make described thin film the most photic subsequently
Polymerization (500mJ/cm2, lamp intensity=50mW/cm2, time=10s), to provide tack-free LC film (thickness=2.44 of polymerization
μm).Refer to that viscosity (finger tack) is test for sample by touching with forefinger and records the most described sample glues
(i.e. viscosity) tests.Described film can be referred to as tack-free (touching dry), although may not be completely crued.
In order to characterize the orientation performance of described liquid crystal material, the polarizing microscope with crossed polarizers is used to measure described
The contrast of the liquid crystal layer of crosslinking, described polarizing microscope is further configured with the photodiode for luminous intensity measurement.Described
Contrast be calculated as along relative to one of described polariser in 45 ° and 0 ° orientation described crosslinked fluid crystal layers optic axis mensuration
The ratio of light intensity.The high-contrast of 4000: 1 confirms the excellent orientation performance of M1.
Use FTIR (ATI Mattson Genesis Series FTIR Spectrometer) for described alkene part
Determine chemistry conversion ratio.The layer of 2.65 μ m-thick of described reactive composition is spin-coated on silicon chip.The thickness of described film is last
Measure with Tencor alpha-stepper 500.The infrared spectrum of described film is measured before curing with after solidification.At 810cm-1
Bands of a spectrum (corresponding to C=C-H deformation peak) less affected by overlapping with other bands of a spectrum, be therefore selected for described conversion ratio
Measurement.The formula calculating described unsaturated carbon-carbon bond conversion ratio is as follows: conversion ratio (%)=(A0-At)/A0, wherein A0And At
Represent before UV exposes and (500mJ/cm after UV exposure2) at 810cm-1IR bands of a spectrum.
Described 810cm-1Bands of a spectrum are relative to as interior target 1510cm-1Bands of a spectrum (v (Isosorbide-5-Nitrae-C6H4) bands of a spectrum of aromatics) normalizing
Change.
The conversion ratio of described unsaturated carbon-carbon bond is 68%.
Comparative example 1 (compositions C1)
The preparation of polymerizable liquid-crvstalline compositions C1 is as follows:
Coating is carried out in the way of similar with described in embodiment 1.LC annealing is carried out 2 minutes at 50 DEG C.Ca-M1's is clear
Clear temperature is 55 DEG C.Subsequently by described thin film isotropism UVA light photo polymerization (500mJ/ the most in air atmosphere
cm2, lamp intensity=50mW/cm2, time=10s), obtain the film of viscosity.The conversion ratio of described alkene part is the lowest (42%).
Comparative example 2 (compositions C2)
The preparation of polymerizable liquid-crvstalline compositions C2 is as follows:
Coating is carried out in the way of similar with described in embodiment 1.LC annealing is carried out 2 minutes at 43 DEG C.Ca-M1's is clear
Clear temperature is 47 DEG C.Subsequently by described thin film isotropism UVA light photo polymerization (500mJ/ the most in air atmosphere
cm2, lamp intensity=50mW/cm2, time=10s), obtain the film of viscosity.The conversion ratio of described alkene part is the lowest (41%).
This embodiment highlights the photoinitiator concentration material impact at air curing aspect of performance.
Comparative example 3 (compositions C1)
The coating of C1 is carried out in the way of similar with described in embodiment 1.LC annealing is carried out 2 minutes at 50 DEG C.M1's
Clarifying temp is 55 DEG C.Subsequently by described thin film isotropism UVA light photo polymerization (500mJ/cm in a nitrogen atmosphere2, lamp
Intensity=50mW/cm2, time=10s), obtain the tack-free LC film (thickness=2.57 μm) of polymerization.Turning of described alkene part
Rate is 70%.
Comparative example 4 (compositions M1)
The coating of M1 is carried out in the way of similar with described in embodiment 1.LC annealing is carried out 2 minutes at 39 DEG C.Subsequently
By described thin film isotropism UVA light photo polymerization (500mJ/cm in a nitrogen atmosphere2, lamp intensity=50mW/cm2, the time
=10s), obtain the tack-free LC film (thickness=2.44 μm) of polymerization.The conversion ratio of described alkene part is 79%.
Embodiment 5 (compositions M2)
Polymerizable liquid-crvstalline mixture M 2 is prepared as follows:
Coating is carried out in the way of similar with described in embodiment M1.LC annealing is carried out 2 minutes at 30 DEG C.The clarification of M3
Temperature is 33 DEG C.Subsequently by described thin film isotropism UVA light at room temperature photo polymerization (500mJ/cm in air atmosphere2,
Lamp intensity=50mW/cm2, time=10s), obtain tack-free LC film (thickness=2.45 μm).The conversion ratio of described alkene part
It is 62%.
This example illustrates the reactive additive participating in network and being formed (here for dipentaerythritol five propylene
Acid esters) use.
Embodiment 6
Mercaptan structure and the impact of concentration
The preparation of film
Unless otherwise mentioned, following application conditions is used.
In order to both alignment layers be spin-coated on base material, described ROP-103 is dissolved in Ketocyclopentane with the solid concentration of 2 weight %
In.Described LPP solution is stirred at room temperature 30 minutes.
Base material (glass baseplate) is with described LPP solution spin coating (1 minute under 2000rpm).It is dried 10 minutes at 180 DEG C
After, by sample polarized light (the such as 100mJ/cm from the high pressure Hg arc light with optical filter2, spectral region is 300-
330nm) irradiate.
For result below, described LCP compound is as follows, except as otherwise noted.
Described solution is stirred at room temperature 30 minutes, by spin coating (2500rpm-3000rpm, 1min;Average thickness is about
1.20 μm) it is deposited on the base material of this LPP coating, and at TAN(annealing temperature) anneals 2 minutes.The clarifying temp of described mixture
It is Tc(being given in table).Unpolarized UVA light is used to make the photo polymerization the most in air atmosphere of described thin film subsequently
(500 or 1000mJ/cm2, lamp intensity=60mW/cm2), to provide the LC film of polymerization.Refer to that viscosity is by touching tested with forefinger
Sample and record described sample and the most how to glue (i.e. viscosity) and test.Orientation performance and chemical conversion rate the most above institute
State mensuration.
Table (I)
Embodiment 7
The additive impact on curing performance
The preparation of film
In order to both alignment layers be spin-coated on base material, described ROP-103 is dissolved in Ketocyclopentane with the solid concentration of 2 weight %
In.Described LPP solution is stirred at room temperature 30 minutes.
With described LPP solution spin coating (1 minute under 2000rpm) base material (glass baseplate).It is dried 10 minutes at 180 DEG C
After, by sample polarized light (the such as 100mJ/cm from the high pressure Hg arc light with optical filter2, spectral region is 300-
330nm) irradiate.
Except as otherwise noted, described LCP compound is as follows:
Described solution is stirred at room temperature 30 minutes, by spin coating (2000rpm-3000rpm, 1min;Average thickness is about
1.20 μm) it is deposited on the base material of this LPP coating, and at TAN(annealing temperature) anneals 2 minutes.The clarifying temp of described mixture
It is Tc(being given in table).Unpolarized UVA light is used to make the photo polymerization the most in air atmosphere of described thin film subsequently
(500 or 1000mJ/cm2, lamp intensity=60mW/cm2), to provide the LC film of polymerization.Refer to that viscosity is by touching tested with forefinger
Sample and record described sample and the most how to glue (i.e. viscosity) and test.Orientation performance and chemical conversion rate the most above institute
State mensuration.
Embodiment 8
LCP " alkene " part and the degree of functionality impact on curing performance
The preparation of film
In order to both alignment layers be spin-coated on base material, described ROP-103 is dissolved in Ketocyclopentane with the solid concentration of 2 weight %
In.Described LPP solution is stirred at room temperature 30 minutes.
With described LPP solution spin coating (1 minute under 2000rpm) base material (glass baseplate).It is dried 10 minutes at 180 DEG C
After, by sample polarized light (the such as 100mJ/cm from the high pressure Hg arc light with optical filter2, spectral region is 300-
330nm) irradiate.
For result below, described LCP compound is as follows, except as otherwise noted.
Described solution is stirred at room temperature 30 minutes, by spin coating (2500rpm-3000rpm, 1min;Average thickness is about
1.20 μm) it is deposited on the base material of this LPP coating, and at TAN(annealing temperature) anneals 2 minutes.The clarifying temp of described mixture
It is Tc(being given in table).Unpolarized UVA light is used to make the photo polymerization the most in air atmosphere of described thin film subsequently
(500 or 1000mJ/cm2, lamp intensity=60mW/cm2), to provide the LC film of polymerization.Refer to that viscosity is by touching tested with forefinger
Sample and record described sample and the most how to glue (i.e. viscosity) and test.Orientation performance and chemical conversion rate the most above institute
State mensuration.
Explanation | A Al.p. P √ 0 ++ + 0 | Can air curing Orientation performance Multi-thiol (weight %) Can air curing Can not air curing Extraordinary contrast (> 500) Good contrast (< 500) Without contrast |
Embodiment 9
Have studied the art methods (Journal of SID 12/3,2004) described by Philips, with the present invention
Method compare.In order to reappear the result of described prior art, employ the acrylate polymerizable LC mixture of standard
(composition as listed is in Table A), and being aggregated in nitrogen atmosphere of patterning carry out.In order to prevent region wide (area-wide)
Polymerization, the least exposure energy must be used according to the description of described prior art.
It is prepared for 4 samples according to the process conditions listed in table B.Washed D263 glass plate is used as base material.
By ROP-103 (the alignment material of ROLICTechnologies) that spin coating solid content is 2 weight % in Ketocyclopentane
Solution, is prepared for dry thickness and is of about the both alignment layers of 60nm.Described both alignment layers subsequently by hot plate at a temperature of 180 DEG C heat
Process 10 minutes.Then, make described alignment layer be vertically exposed to linear polymerization UVB light (wavelength 280 and 320nm it
Between).With 3mW/cm2Intensity apply 150mJ/cm2Dosage.In the next step, will according to Table A (a), standard based on
The polymerisable liquid crystal compound of acrylate is spin-coated on above the alignment layer of described functionalization.Use in methyl phenyl ethers anisole for this
25 weight % solution.Realize the build of about 800nm by this way.Then carry out on hot plate at a temperature of 40 DEG C
Heat treatment 10 minutes.Then, the radiation curing patterned is carried out.To this end, make described film by having 100 microns of bar patens
Black and white mask be exposed to collimated light.Described mask is maintained at the distance on about 15 microns of the surface away from described liquid crystal layer.Logical
Mask described in transmission from one meridian to another with 1,5,10 and 500mJ/cm2UV dose exposure carry out polymer sample.Then, carry out developing process, will
Described sample is immersed in ethyl acetate 10 seconds, to remove unpolymerized material.Fig. 1 shows employing 1mJ/cm in blanket of nitrogen2
The thickness profile (Alpha-stepper 500, KLA-TencorCorporation) of measurement of sample of dosage polymerization, Fig. 2
Show employing 10mJ/cm in blanket of nitrogen2The thickness profile of sample of dosage polymerization, and Fig. 3 shows in blanket of nitrogen
Use 500mJ/cm2The thickness profile of sample of dosage polymerization.
The most described patterning also works according to art methods.But, two basic shortcomings are apparent
:
(1) if polymerization dosage increase, lateral resolution reduces (1mJ/cm2: with and without the mistake between the district of LCP
Crossing district is 7 microns;5mJ/cm2: 30 microns of transition regions;10mJ/cm2: 45 microns of transition regions), for 500mJ/cm2, unexposed area
In the degree of polymerization of material be too high and in developing process to completely remove described material, and
(2) if polymerization decrease in dose, then dissolubility contrast is at a fairly low, the non-event of material of the most considerable fraction of polymerization
It is dissolved (1mJ/cm to meaning2: residual thickness 600nm;10mJ/cm2: residual thickness: 800nm).
Therefore, the method only allows regulation compromise between the lateral resolution of dissolubility contrast and pattern.
Another sample is prepared according to the present invention.Use previously described identical method.But, use containing mercaptan list
The liquid crystal compound of unit replaces the acrylic ester compound thing of described standard.The component of described mixture indicates in Table A (b).For
Carry out the exposure patterned, use 500mJ/cm2UV dosage.In this case, developing process is in the exposure of described sample
Region only results in the least material unaccounted-for (MUF) (< 5%), and at the quilt in developing process of material described in unexposed area
Completely remove, i.e. dissolubility contrast is the highest.And, lateral resolution is the highest (transition region is 5 microns), and
And the much lower dependency that display is to actual processing conditions.The thickness profile of described sample shows in the diagram.Technological parameter exists
Table C indicates.
Table A: the component of polymerizable liquid-crvstalline mixture
The acrylate mixture of (a) standard:
(b) acrylate/mercaptan mixture:
Table B: for the technological parameter of the acrylate mixture of standard
Base material: | Washed D263 glass (Schott AG) |
Both alignment layers: | |
Material: | ROP-103 (alignment material derives from ROLIC Technologies) |
Solution: | 2%, in Ketocyclopentane |
Spin coating: | The 2000rpm60 second |
Heat treatment: | 180 DEG C 10 minutes, on hot plate |
LPUV exposes: | 150mJ/cm2(UVB), 3mW/cm2 |
Polymerizable liquid-crvstalline material: | |
Material: | The acrylate mixture (Table A (a)) of standard, Tc≈55℃ |
Solution: | 25%, in methyl phenyl ethers anisole |
Spin coating: | The 800rpm60 second |
Heat treatment: | 40 DEG C 10 minutes, on hot plate |
The radiation curing of patterning: | 1,5,10 and 500mJ/cm2(UVA and UVB), 8mW/cm2, collimated light |
(a) developing method: | Sample be immersed in ethyl acetate bath in about 10 seconds |
(b) second spoke at elevated temperatures Penetrate solidification: | 500mJ/cm2(UVA and UVB), 50mW/cm2, non-collimated light Without the second radiation curing exposure of mask, in atmosphere Temperature: ≈ 60 DEG C, is applied through hot plate |
Table C: for the technological parameter of acrylate/mercaptan mixture.
Base material: | |
Both alignment layers: | Identical with table B |
Polymerizable liquid-crvstalline material: | |
Material: | Acrylate/mercaptan mixture (Table A (b)), Tc≈44℃ |
Solution: | 25%, in methyl phenyl ethers anisole |
Spin coating: | The 800rpm60 second |
Heat treatment: | 40 DEG C 10 minutes, on hot plate |
The radiation curing of patterning: | 500mJ/cm2(UVA and UVB), 8mW/cm2, collimated light, In air atmosphere |
(a) developing method: | Identical with table B |
(b) second spoke at elevated temperatures Penetrate solidification: | Identical with table B |
Embodiment 10
Method is according to embodiment 9, and premise is not carry out developing method, but in the clarification higher than unexposed LCP region
The second polymerization (parameter indicates in table B) is applied at a temperature of Dian.
Using the acrylate material of described standard, the restriction to low exposure dose causes such problem, is i.e. only capable of reality
The least between exposure area with the degree of polymerization of the unexposed area existing difference the least difference of clear point (and therefore).Cause
This, it is very difficult on the described region of described sample, control temperature with enough degree of accuracy so that unexposed region
Temperature is still below described clear point just above described clear point and described partially polymerized region.
If described first exposure, the patterned exposure of the acrylate LCP film of the most described standard uses 10mJ/cm2's
Dosage is carried out, and resolution has significantly reduced compared with the situation using lower dosage.But on the other hand, exposing and do not exposing
The contrast of the interregional clear point of light has been sizable.However it has been found that between the unexposed striped reduced and exposure striped
Contrast.In the case of being aggregated in carry out at a temperature of 50 DEG C described second, find residual in described unexposed striped
Remaining birefringence, it is isotropic by inference.If applying lower exposure dose such as 5 or 1mJ/cm2To improve described horizontal stroke
To resolution, this shortcoming becomes even more to highlight.
For the described polymerizable liquid-crvstalline mixture containing mercaptan, it is possible to achieve the highest exposure and unexposed area
Between the contrast of clear point.The 2nd UV exposure the most at elevated temperatures easily provides has birefringent region
The region of exposure (in the patterning polymerization process of the described first step) and not there is the region of any residual birefringence (described
The region not exposed in the patterning polymerization process of the first step).
As a result, due to use standard acrylate LCP time for exposure dose and temperature very limited amount of process window
Mouthful, use that include there is the component of mercaptan or thio-ether units, can the delay patterning method of LCP material of air curing be phase
When readily, and cause the most preferably resolution.Only have dissolubility contrast (developing method) or delay contrast (has
The method of the second more than clear point polymerization) and the resolution of described pattern between compromise can be conditioned.Can air curing
LCP mixture major advantage in terms of patterning is that the exposure dose using and causing the reasonable degree of polymerization regulates in LCP film
The probability of the transition of polymerization and non-polymeric interregional good restriction.
Embodiment 11: contain the polymerizable liquid of thiol component at the upper patterning of plastic basis material i.e. cellulose triacetate (TAC)
The method of brilliant compound
Processing conditions is listed in table D.
The thickness profile measured after development confirms that described patterning method works in a preferred manner.
Table D: processing conditions: the patterning on plastic basis material TAC
Base material: | There is the TAC (cellulose triacetate) of solvent barrier |
Both alignment layers: | |
Material: | ROP-103 (alignment material derives from ROLIC Technologies) |
Solution, spin coating: | 2%, in MEK, the 2000rpm60 second |
Heat treatment: | 60 DEG C 10 minutes, on hot plate |
LPUV exposes: | 150mJ/cm2(UVB), 3mW/cm2 |
Polymerizable liquid-crvstalline material: | |
Material: | Acrylate/mercaptan mixture (Table A (b)), Tc≈44℃ |
Solution: | 25%, in methyl phenyl ethers anisole |
Spin coating: | The 800rpm60 second |
Heat treatment: | 40 DEG C 10 minutes, on hot plate |
The radiation curing of patterning: | 500mJ/cm2(UVA and UVB), 8mW/cm2, collimated light In air atmosphere |
(a) developing method: | Sample is rinsed about 10 seconds by ethyl acetate |
Embodiment 12: as the patterning polymerisable liquid crystal compound containing thiol component on the silicon wafer of base material.
Processing conditions is listed in table E.
The thickness profile measured after development confirms that described patterning method works in a preferred manner.
Table E: processing conditions: patterning on silicon
Base material: | Si wafer |
Both alignment layers: | |
Material: | ROP-103 (alignment material derives from ROLIC Technologies) |
Solution, spin coating: | 2%, in Ketocyclopentane, the 2000rpm60 second |
Heat treatment: | 180 DEG C 10 minutes |
LPUV exposes: | 150mJ/cm2(UVB), at 3mW/cm2Under |
Polymerizable liquid-crvstalline material: | |
Material: | Acrylate/mercaptan mixture (Table A (b)), Tc≈44℃ |
Solution: | 25%, in methyl phenyl ethers anisole |
Spin coating: | The 800rpm60 second |
Heat treatment: | 40 DEG C 10 minutes, on hot plate |
The radiation curing of patterning: | 500mJ/cm2(UVA and UVB), 8mW/cm2, collimated light In air atmosphere |
(a) developing method: | Sample is rinsed about 10 seconds by ethyl acetate |
Embodiment 13: the polyimide layer rubbed by use makes the polymerisable liquid crystal compound containing thiol component join
To patterning
First, by polymerizable liquid-crvstalline compound orientation, and carry out patterning method subsequently.Processing conditions is listed in table F
In.Perfect orientation can be realized by the method.The thickness profile measured after development confirms that described patterning method is with excellent
The mode of choosing works.
Table F: processing conditions: there is rubbed polyimides as the patterning on the glass of both alignment layers
Base material: | Washed D263 glass |
Both alignment layers: | |
Material: | Nissan SE-150 |
Spin coating: | The 2000rpm60 second |
Heat treatment: | 80 DEG C 15 minutes, 250 DEG C 50 minutes |
Friction treatment | |
Polymerizable liquid-crvstalline material: | |
Material: | Acrylate/mercaptan mixture (Table A (b)), Tc≈44℃ |
Solution: | 25%, in methyl phenyl ethers anisole |
Spin coating: | The 800rpm60 second |
Heat treatment: | 40 DEG C 10 minutes, on hot plate |
The radiation curing of patterning: | 500mJ/cm2(UVA and UVB), 8mW/cm2, collimated light In air atmosphere |
(a) developing method: | Sample is immersed in ethyl acetate bath in about 10 seconds |
Embodiment 14: the TAC base material rubbed by use come that orientation is coated directly onto on TAC base material containing thiol component
The patterning of polymerisable liquid crystal compound
First, by polymerizable liquid-crvstalline compound orientation, and carry out patterning method subsequently.Processing conditions is listed in table G
In.Perfect orientation can be realized by the method.The thickness profile measured after development confirms that described patterning method is with excellent
The mode of choosing works.
Table G: processing conditions: the patterning on rubbed TAC base material
Base material: | TAC (cellulose triacetate) |
Both alignment layers: | |
Material: | Without extra play |
Friction treatment | |
Polymerizable liquid-crvstalline material: | |
Material: | Acrylate/mercaptan mixture (Table A (b)), Tc≈44℃ |
Solution: | 25%, in methyl phenyl ethers anisole |
Spin coating: | The 800rpm60 second |
Heat treatment: | 40 DEG C 10 minutes, on hot plate |
The radiation curing of patterning: | 500mJ/cm2(UVA and UVB), 8mW/cm2, collimated light In air atmosphere |
(a) developing method: | Sample is immersed in ethyl acetate bath in about 10 seconds |
The method of the pattern of the length of delay (isotropism or certain Δ nd) that embodiment 15: two or three is different
The stacked body of the liquid crystal layer (is to be patterning uniformly with) of two polymerizations is applied according to reality
The binary executing example 15 postpones patterning method, and two kinds of different length of delays can be conditioned (delay of ground floor and ground floor
Postpone to add the delay of the second layer).In this embodiment, it is not required that additional alignment layer, because described additional LCP can pass through
The following direct orientation of the LCP layer being uniformly directed.
But, the additional alignment layer for described second liquid crystalline polymer layer brings additional degree of freedom, its example
As allowed to regulate three kinds of different length of delays, if described alignment layer is LPUV exposure in a patterned manner, with choosing
Shift to selecting property 0 ° and 90 ° orientation of optic axis to liquid crystal molecule atop.Described three kinds of different length of delays are by such as
Lower means are given: the delay of a LCP, and the delay of a LCP adds the delay of the second layer, and the delay of a LCP subtracts the second layer
Delay.The method represents digital delay patterning and the combination of azimutal orientation patterning in double LCP layer methods.
The digital delay patterning diagram of combination is patterned in Figure 5 with the azimutal orientation of the second LCP layer.With in Fig. 5
Description contrast, patterned the azimutal orientation and then of the first LCP layer by the alignment of the patterning of LPP1
The delay of the second LCP layer patterning uniform orientation is also possible.In this way, it is also possible to regulate three kinds of different prolonging
Value late.It addition, described first LCP layer can have the variable azimutal orientation having identical optical delay level.If it is described
The value of the azimutal orientation of patterning is not restricted to 0 ° and 90 °, can regulate the different local more than three kinds or four kinds double
Refractive properties.The additional delay of the Photoinduced alignment of patterning and the second layer by allowing two LCP layer patterns, described from
It is further augmented by degree.In the case of described film the most developed (i.e. part remove), if or described film developed but
Covering with planarization (planarization) layer subsequently, the patterning of the delay of two LCP layer is also possible.
Use the method for development in ethyl acetate and be described in unexposed area according to the processing method in table 8 and 9
Clear point more than polymerization method be prepared for sample.
Table H: processing conditions: there is the delay patterning of two LCP layer: the orientation of the second LCP layer is perpendicular to ground floor
Orientation
Base material: | Washed D263 glass |
Both alignment layers: ground floor | |
Material: | ROP103 (alignment material, derive from ROLIC) |
Solution, spin coating: | 2%, in Ketocyclopentane, the 2000rpm60 second |
Heat treatment: | 180 DEG C 10 minutes |
LPUV exposes: | 150mJ/cm2(UVB), 3mW/cm2 |
Polymerizable liquid-crvstalline material: ground floor | |
Material: | The acrylate mixture (Table A (a)) of standard, Tc≈55℃ |
Solution, spin coating: | 40%, in methyl phenyl ethers anisole, the 1000rpm60 second |
Heat treatment: | 40 DEG C 10 minutes, on hot plate |
Radiation curing: | 5J/cm2(UVA and UVB), 50mW/cm2, non-collimated light, without covering Film, in nitrogen atmosphere |
Both alignment layers: the second layer | |
Material: | ROP103 (alignment material derives from ROLIC) |
Solution, spin coating: | 2%, in Ketocyclopentane, the 2000rpm60 second |
Heat treatment: | 180 DEG C 10 minutes |
LPUV exposes: | 150mJ/cm2(UVB), 3mW/cm2, it is perpendicular to the first both alignment layers and joins To |
Polymerizable liquid-crvstalline material: the second layer | |
Material: | Acrylate/mercaptan mixture (Table A (b)), Tc≈44℃ |
Solution, spin coating: | 25%, in methyl phenyl ethers anisole, the 800rpm60 second |
Heat treatment: | 40 DEG C 10 minutes, on hot plate |
The radiation curing of patterning: | 1J/cm2(UVA and UVB), 8mW/cm2, collimated light, at air gas In atmosphere |
(a) developing method: | |
Sample is immersed in ethyl acetate bath in about 10 seconds | |
(b) second spoke at elevated temperatures Penetrate solidification: | |
Radiation curing: | 500mJ/cm2(UVA and UVB), 50mW/cm2, non-collimated light Second radiation curing exposes without mask, in atmosphere |
Temperature: | ≈ 60 DEG C, utilizes hot plate to apply |
In one example, use the second alignment layer, prepare this second alignment layer to induce first and second
The vertical optic axis (table H) of liquid crystalline polymer layer.In this embodiment, the observed result of the sample between crossed polarizers shows
Corresponding to the darker area by the delay given by the difference between the delay level of said two LCP film, with corresponding to only described
The brighter areas of the delay of (the most non-patterned) liquid crystalline polymer film uniformly.
In second example, between said two liquid crystalline polymer film, do not use additional alignment layer (Table I).
Therefore, the liquid crystalline polymer film of described second patterning is parallel to described first polymeric film orientation.Orthogonal polariser it
Between observed result show, create the relatively Gao Yan with two length of delay sums corresponding to said two liquid crystalline polymer film
The region of slow value and the relatively low length of delay of the length of delay having corresponding to only following non-patterned liquid crystalline polymer film
Region.
Additionally determine if the alignment direction of the second layer utilizes the LPUV of the patterning of alignment layer to expose (0 ° or 90 °)
Justice, it is possible to achieve there is the film of the arbitrary graphic pattern of three kinds of different optical delay values.
Table I: processing conditions: there is the delay patterning of two LCP layer: the orientation of the second LCP layer is perpendicular to ground floor
Orientation.
Base material: | Washed D263 glass |
Both alignment layers: | |
Material: | ROP103 (alignment material, derive from ROLIC) |
Solution, spin coating: | 2%, in Ketocyclopentane, the 2000rpm60 second |
Heat treatment: | 180 DEG C 10 minutes |
LPUV exposes: | 150mJ/cm2(UVB), 3mW/cm2 |
Polymerizable liquid-crvstalline material: ground floor | |
Material: | The acrylate mixture (Table A (a)) of standard, Tc≈55℃ |
Solution: | 40%, in methyl phenyl ethers anisole |
Spin coating: | The 1000rpm60 second |
Heat treatment: | 40 DEG C 10 minutes, on hot plate |
Radiation curing: | 5J/cm2(UVA and UVB), 50mW/cm2, non-collimated light, without mask, In nitrogen atmosphere |
Polymerizable liquid-crvstalline material: the second layer | |
Material: | Acrylate/mercaptan mixture (Table A (b)), Tc≈44℃ |
Solution: | 30%, in methyl phenyl ethers anisole |
Spin coating: | The 1000rpm60 second |
Heat treatment: | 40 DEG C 10 minutes, on hot plate |
The radiation curing of patterning: | 1J/cm2(UVA and UVB), 8mW/cm2, collimated light, in air atmosphere |
(a) developing method: | Sample is immersed in ethyl acetate bath in about 10 seconds |
(b) second spoke at elevated temperatures Penetrate solidification: | 500mJ/cm2(UVA and UVB), 50mW/cm2, non-collimated light Temperature: ≈ 60 DEG C, utilizes hot plate to apply |
Embodiment 16: use the delay patterning of Lycoperdon polymorphum Vitt mask radiation curing
Allow patterned retardation to the straightforward procedure of two or more different length of delays for various application all
It is highly useful.Due to the benefit mentioned above of described acrylate/mercaptan patterning method, there is variable delay value
The several methods of such patterning is feasible.
A kind of probability is to use gray level mask, and the local pattern of its transmitted radiation intensity is to the liquid crystal being polymerized
Monomer film.The intensity pattern so produced causes the pattern of the degree of polymerization in described sample area.For shifting the described degree of polymerization
The first method of the pattern pattern that becomes optical delay be to carry out the second radiation curing at elevated temperatures.Depend on polymerization
Degree, the optical delay in each part (partition) of described film will reduce a certain amount.The region of strong polymerization will be aobvious
Show the least reduction, and the region of weak polymerization will experience sizable reduction or lose optical delay completely.In order to allow
Regulating described desired optical delay value, the method requires precise control of temperature and accurately regulates institute in described sample area
State the probability of temperature.
Further possibility is that the film utilizing gray level mask to be polymerized that the leaching of described film developed in a suitable solvent.?
In this example, LCP material will be removed according to partial polymerization degree, and therefore shows the pattern of optical delay.
The present embodiment includes described second method.The technological parameter of application is listed in table J and K.Each sample is by four
Region forms, and described region uses different exposure dose polymerization specified in table J.It is aggregated in nitrogen atmosphere described
In the case of row, described patterning method is invalid.But using acrylate/thiol material, described patterning method is imitated
Fruit is very well.Four kinds of different delay levels can be conditioned.Value including the exposure dose of described acrylate/mercaptan mixture
Shown in figure 6 at interior described sample with the value of optical delay.Described result shows, with it, described delay can
With by the intermittent pattern with non-constant width.Depending on application, the post polymerization method after described developing method is probably needs,
To improve Bulk polymerization degree.
Table J: processing conditions: use the delay patterning of Lycoperdon polymorphum Vitt mask radiation curing: the acrylate liquid crystal of standard is polymerized
Thing material
Base material: | Washed D263 glass |
Both alignment layers: ground floor | |
Material: | ROP103 (alignment material, derive from ROLIC) |
Solution, spin coating: | 2%, in Ketocyclopentane, the 2000rpm60 second |
Heat treatment: | 180 DEG C 10 minutes |
LPUV exposes: | 150mJ/cm2(UVB), mW/cm2 |
Polymerizable liquid-crvstalline material: the second layer | |
Material: | The acrylate mixture (Table A (a)) of standard, Tc≈55℃ |
Solution: | 25%, in methyl phenyl ethers anisole |
Spin coating: | The 800rpm60 second |
Heat treatment: | 40 DEG C 10 minutes, on hot plate |
The radiation curing of patterning: | 1J/cm2, 6,1 and 0mJ/cm2(UVA and UVB), 8mW/cm2, Collimated light, in atmosphere |
(a) developing method: | Sample is immersed in ethyl acetate bath in about 10 seconds |
Table K: processing conditions: use the delay of Lycoperdon polymorphum Vitt mask radiation curing to pattern: acrylate/mercaptan mixture
The same process conditions be given in table J, premise is to use described acrylate/mercaptan mixing Thing (Table A (b)), and in order to carry out the radiation curing patterned, use air atmosphere generation For nitrogen atmosphere |
Claims (18)
1. photo polymerization, patterning or non-patterned liquid crystal polymer, the thio-ether units of its contained (Ia)
* covalent bond, the unit of formula (Ia) is connected on the remainder of polymer by it
(Ia)
Wherein
LC1, LC2And LCiIt is liquid crystal residue independently of one another,
Wherein
LCiSelected from lower group: LC3, LC4, LC5, LC6, LC7And LC8, they represent liquid crystal residue independently of one another,
Wherein said liquid crystal residue is the polymerized form of liquid crystal, and this liquid crystal has a lower formula (VII):
Wherein:
-A1And A2It is compound formula V independently of one another:
P-(Sp)k-(X)t- (V)
Wherein
P is selected from lower group: vinyl ethers, allyl ether, propenyl ether, alkene, alkynes, and undersaturated ester;
Sp represents C1-13Alkylidene group, it is unsubstituted or with alkyl, aryl, cycloalkyl, amino, cyano group, epoxy, halogen,
Hydroxyl, nitro is substituted, and wherein one or more-CH2-group is optionally selected from the hetero atom of oxygen, sulfur and nitrogen and substitutes;
X represents-O-,-CO-,-COO-,-OCO-or-C=C-;
K is the integer of the value with 0-4,
T is the integer of the value with 0 or 1;And/or
-A7It is hydrogen, nitro, cyano group, halogen, methyl group, or above-mentioned group P;
-C1, C2And C3It is unsubstituted benzene, phenylene, biphenylene or sub-terphenyl independently of one another, or by halogen, hydroxyl
Base, nitro, cyano group, carboxyl, acryloxy, alkyl acyloxy, alkoxyl, alkane carbonyloxy group, alkyl oxy carbonyl oxygen, methyl-prop
Alkene acyloxy, vinyl, vinyl epoxide and/or the substituted benzene of allyloxy, biphenylene, phenylene, sub-terphenyl, on
State the alkyl residue in the group containing alkyl and there is 1-10 carbon atom;
-Z1And Z2It is-COO-,-OCO-,-CH=CH-COO-,-OCO-CH=CH-or singly-bound;If Z1And Z2One of be singly-bound,
So another Z is-COO-,-OCO-,-CH=CH-COO-or-OCO-CH=CH-;
Or described liquid crystal has a lower formula (VIII):
Wherein:
-A1, A2, A5, A6It is compounds residues formula (V) defined above independently of one another;
-C1, C1′, C2, C2′, C3And C3′It is unsubstituted benzene, phenylene, biphenylene or sub-terphenyl independently of one another, or
Person is by halogen, hydroxyl, nitro, cyano group, carboxyl, acryloxy, alkyl acyloxy, alkoxyl, alkane carbonyloxy group, alcoxyl carbonyl
Epoxide, methacryloxy, vinyl, vinyl epoxide and/or the substituted benzene of allyloxy, biphenylene, phenylene, Asia
Terphenyl, the alkyl residue in the above-mentioned group containing alkyl has 1-10 carbon atom;
-Z1, Z1′, Z2And Z2′It is-COO-,-OCO-,-CH=CH-COO-,-OCO-CH=CH-or singly-bound;
-a1, a2, a1 ' and a2 ' are the integer of 0 to 3 independently of one another so that 1≤a1+a2≤a3 and 1≤a1 '+a2 '≤3;
-B1Comprise the group of formula (VI):
(X4)t2-(Sp2)k2-(X5)t3 (VI)
Wherein:
Sp2Represent C1-20Alkylidene group;
X4And X5Expression-O-,-S-,-NH-,-N (CH independently of one another3)-,-CH (OH)-,-CO-,-CH2-CO-,-SO-,-CH2-
SO-,-SO2-,-CH2-SO2-,-COO-,-OCO-,-OCO-O-,-S-CO-,-CO-S-,-SOO-,-OSO-,-SOS-,-CH2-
CH2-,-OCH2-,-CH2O-,-CH=CH-,-C ≡ C-or singly-bound;
K2 is integer, has the value of 0 or 1;
T2 and t3 is integer, has the value of 0 or 1 independently of one another;
Premise is that oxygen atom is not connected to each other;
X1And X2It is aliphatic organic residue independently of one another,
n1And n2It is >=the integer of 0,
R is >=integer of 0,
m1, m2And m3It is >=the integer of 0 independently of one another,
Q is 0 or 1;
Premise is, if q is 0, then LC2And LCiIt is connected directly to one another;If with n1And n2It is 0, then at least one m1, m2
Or m3It is > 0, and if m1, m2And m3It is 0, then at least one n1And n2It is > 0;With
It is prepared in oxygen-containing atmosphere in the case of not using cation light initiator;
Premise is not include the scattered liquid crystal of polymer and cholesteric crystal.
2. the liquid crystal polymer described in claim 1, wherein P is selected from lower group: vinyl esters, allyl ester, acrylate and first
Base acrylate.
3. the liquid crystal polymer described in claim 1, the residue of wherein said liquid crystal is the polymerized form of liquid crystal, its unpolymerized shape
Formula has at least two and has the polymerizable functional group of undersaturated carbon-to-carbon or carbon-nitrogen bond.
4. compositions (XX), it comprises:
A) multi-thiol of at least one formula (IX)
Wherein
XaIt is aliphatic organic residue,
Nt is >=integer of 2, and
B) formula (VII) described at least one claim 1 or the liquid crystal of formula (VIII),
C) a kind of reactive and/or non-reacted additive,
D) optionally at least a kind of initiator, and
E) optionally at least a kind of solvent.
5. the method for preparation liquid crystal polymer described in claim 1, the method includes
A) coating compositions (XX) described in claim 4, and then
B) optionally it is dried, and then
C) in oxygen-containing atmosphere, it is aggregated in the compositions (XXI) of the described coating obtained after step a) or step b).
6. the compositions (XXI) of coating, it according to the processing step a) described in claim 5 and b) can obtain.
7. liquid crystal polymer, it can obtain in accordance with the method for claim 5.
8. the method for liquid crystal polymer of preparation patterning, the method includes described in claim 6 and according to claim 5
Compositions (XXI) patterning of the coating of described preparation.
9. the method described in claim 8, including birefringence patterning and/or the thickness patterning and/or figure of optic axis orientation
Case and/or the patterning of the degree of polymerization.
10. the method described in claim 8 or 9, including photo polymerization.
The liquid crystal polymer of 11. patternings, it can be obtained by the method described in claim 8-10.
Described in 12. claim 1 or 7 or according to the liquid crystal polymer of preparation described in claim 5, or described in claim 4
Compositions (XX), or the compositions (XXI) of the coating described in claim 6, or the liquid crystal of the patterning described in claim 11
Polymer purposes in preparation patterning and non-patterned optics or photoelectric cell, system or device.
The 13. non-patterned or optics of patterning or photoelectric cell, system or devices, its comprise described in claim 1 or 7 or by
According to the liquid crystal polymer of preparation described in claim 5, or the liquid crystal polymer of the patterning described in claim 11, or right will
Seek the liquid crystal polymer of patterning described in 8-10.
Non-patterned or the optics of patterning or photoelectric cell described in 14. claim 13 are protected for waveguide, safety or trade mark
Protection element, bar code, grating, light filter, delayer, compensate film, reflective polarizer films, absorb polarizing coating, anisotropic scattering film
Compensate and phase shift films, the delayer film of torsion, cholesteric liquid crystal film, guest of honour's type liquid crystal film, monomer ripple film, smectic liquid crystal
Film, polariser, piezoelectric battery, brightness improves film, the element compensated for wavelength band selectivity, the element compensated for multizone,
The element of multi-view angle LCD, achromatic retarder, polarization state correction/regulation film, optics or the element of photoelectric sensor, bright
Degree improves the element of film, for the element purposes of light base telecommunications devices.
Non-patterned or the optics of patterning or photoelectric cell described in 15. claim 13 are used for showing nonlinear optical property
The purposes of thin film.
Non-patterned or the optics of patterning or photoelectric cell described in 16. claim 13 are used for having anisotropic absorption agent
The G/H-polariser of patterning, the reflecting circular polariser of patterning, the reflective linear polarizer of patterning, the monomer of patterning
The purposes of ripple film.
Non-patterned described in 17. claim 13 or the optics of patterning or photoelectric cell are for the use of ornamental optical element
On the way.
18. comprise the non-patterned or optics of patterning described in claim 13 or the device of photoelectric cell.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06127151 | 2006-12-22 | ||
EP06127143.3 | 2006-12-22 | ||
EP06127151.6 | 2006-12-22 | ||
EP06127143 | 2006-12-22 | ||
PCT/CH2007/000622 WO2008077261A1 (en) | 2006-12-22 | 2007-12-11 | Patternable liquid crystal polymer comprising thio-ether units |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101636469A CN101636469A (en) | 2010-01-27 |
CN101636469B true CN101636469B (en) | 2016-08-17 |
Family
ID=38016754
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200780047888.2A Active CN101636469B (en) | 2006-12-22 | 2007-12-11 | Comprise the liquid crystal polymer of the patternable of thio-ether units |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN101636469B (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8693203B2 (en) * | 2011-01-14 | 2014-04-08 | Harris Corporation | Method of making an electronic device having a liquid crystal polymer solder mask laminated to an interconnect layer stack and related devices |
CN105062505B (en) * | 2015-07-15 | 2017-11-14 | 深圳市景世源科技有限公司 | Polymer liquid crystal composition, liquid crystal handwriting display device and preparation method |
KR102494750B1 (en) | 2016-12-01 | 2023-02-01 | 메르크 파텐트 게엠베하 | Polymerizable liquid crystal substances and polymerized liquid crystal films |
CN106632772B (en) * | 2016-12-05 | 2022-01-07 | 北京大学 | Method for preparing polymer dispersed liquid crystal film based on vinyl ether-mercaptan ultraviolet curing system |
CN106950744B (en) * | 2017-04-26 | 2019-07-19 | 华中科技大学 | A kind of holographic polymer dispersed liquid crystal grating and preparation method thereof |
CN109030478B (en) * | 2018-07-25 | 2021-01-05 | 华南师范大学 | Liquid crystal composite gel, preparation method and application thereof, and hydrogen sulfide gas detection method |
CN111440401B (en) * | 2020-04-03 | 2021-07-23 | Tcl华星光电技术有限公司 | Polarized luminescent material and preparation method of polarized luminescent layer |
CN113060711B (en) * | 2021-03-19 | 2022-05-10 | 中国科学院新疆理化技术研究所 | Compound cadmium sulfur phosphorus, mercury sulfur phosphorus and mercury infrared nonlinear optical crystal, and preparation method and application thereof |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1602345A (en) * | 2001-12-12 | 2005-03-30 | 默克专利股份有限公司 | Biaxial film |
-
2007
- 2007-12-11 CN CN200780047888.2A patent/CN101636469B/en active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1602345A (en) * | 2001-12-12 | 2005-03-30 | 默克专利股份有限公司 | Biaxial film |
Also Published As
Publication number | Publication date |
---|---|
CN101636469A (en) | 2010-01-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101636469B (en) | Comprise the liquid crystal polymer of the patternable of thio-ether units | |
US8574454B2 (en) | Patternable liquid crystal polymer comprising thio-ether units | |
TWI418612B (en) | Functionalized photoreactive compounds | |
CN1989444B (en) | Transflective LCD comprising a patterned retardation film | |
TWI521278B (en) | Phase difference plate, display device having phase difference plate, and manufacturing method of phase difference plate | |
JP5834489B2 (en) | Polymerizable naphthalene compound | |
CN105518035B (en) | Compound, polymer, liquid crystal alignment film, liquid crystal display element, and optical anisotropic body | |
JP6002996B2 (en) | Liquid crystal alignment film | |
TWI523936B (en) | Copolymer and liquid crystal alignment layer which is a cured product of the copolymer | |
TWI500745B (en) | Liquid crystal display device | |
CN1993636B (en) | Biaxial film having local birefringence that varies periodically | |
JP4296821B2 (en) | Maleimide derivatives and polymers thereof | |
Chen et al. | Photoresponsive thin films of well-synthesized azobenzene side-chain liquid crystalline polynorbornenes as command surface for patterned graphic writing | |
JP5396815B2 (en) | Polymerizable compound, polymerizable liquid crystal compound, polymerizable liquid crystal composition, liquid crystal polymer and optical anisotropic body | |
JP6841283B2 (en) | Coloring composition, color filter and its manufacturing method, liquid crystal display device, and light emission display device | |
CN104903405B (en) | Cured film is formed with composition, orientation material and phase difference material | |
CN109642162A (en) | The curable adhesion promoter of UV based on functional polyethylene alcohol | |
JP2009244356A (en) | Optical device, and transflective and half-reflection type liquid crystal display device including the same | |
WO2006002766A1 (en) | Biaxial film ii | |
JP5648352B2 (en) | Polymerizable naphthalene compound | |
KR20110040666A (en) | Polymerizable Naphthalene Compound | |
JP6733840B2 (en) | Polymerizable composition, cured product thereof, photo spacer, overcoat for display element, interlayer insulating material for display element, and liquid crystal display element | |
JP4836335B2 (en) | Phenylacetylene polymer, optical anisotropic body, and optical or liquid crystal device | |
JP2011095390A (en) | Color filter substrate having biaxial optically anisotropic layer | |
JPWO2020121822A1 (en) | Liquid crystal display device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant |