CN101585850A - Aromatic cyanate ester monomer containing silicon and preparation method thereof - Google Patents
Aromatic cyanate ester monomer containing silicon and preparation method thereof Download PDFInfo
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- CN101585850A CN101585850A CNA2009103038993A CN200910303899A CN101585850A CN 101585850 A CN101585850 A CN 101585850A CN A2009103038993 A CNA2009103038993 A CN A2009103038993A CN 200910303899 A CN200910303899 A CN 200910303899A CN 101585850 A CN101585850 A CN 101585850A
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- cyanate ester
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- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 23
- 239000010703 silicon Substances 0.000 title claims abstract description 23
- 125000003118 aryl group Chemical group 0.000 title claims abstract description 19
- 238000002360 preparation method Methods 0.000 title claims abstract description 16
- 239000000178 monomer Substances 0.000 title claims abstract description 15
- 239000004643 cyanate ester Substances 0.000 title claims description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 24
- -1 aromatic polyphenol Chemical class 0.000 claims abstract description 24
- 235000013824 polyphenols Nutrition 0.000 claims abstract description 14
- 239000005046 Chlorosilane Substances 0.000 claims abstract description 5
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims abstract description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 34
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 claims description 32
- 238000006243 chemical reaction Methods 0.000 claims description 27
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 25
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 24
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 21
- 239000000243 solution Substances 0.000 claims description 20
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 18
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 16
- 239000003960 organic solvent Substances 0.000 claims description 16
- 239000000203 mixture Substances 0.000 claims description 15
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 13
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 13
- 239000007864 aqueous solution Substances 0.000 claims description 12
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 12
- 238000003756 stirring Methods 0.000 claims description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 10
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 10
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 claims description 10
- 239000012074 organic phase Substances 0.000 claims description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 8
- 239000003513 alkali Substances 0.000 claims description 8
- 239000002904 solvent Substances 0.000 claims description 8
- 239000011230 binding agent Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 230000003068 static effect Effects 0.000 claims description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 6
- 235000011121 sodium hydroxide Nutrition 0.000 claims description 6
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 5
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Substances [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims description 5
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- ATDGTVJJHBUTRL-UHFFFAOYSA-N cyanogen bromide Chemical compound BrC#N ATDGTVJJHBUTRL-UHFFFAOYSA-N 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- WRECIMRULFAWHA-UHFFFAOYSA-N trimethyl borate Chemical compound COB(OC)OC WRECIMRULFAWHA-UHFFFAOYSA-N 0.000 claims description 4
- UBOXGVDOUJQMTN-UHFFFAOYSA-N 1,1,2-trichloroethane Chemical compound ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 claims description 3
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 125000000524 functional group Chemical group 0.000 claims description 3
- 235000011118 potassium hydroxide Nutrition 0.000 claims description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 claims description 3
- 235000017550 sodium carbonate Nutrition 0.000 claims description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims description 2
- 229910052801 chlorine Inorganic materials 0.000 claims description 2
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- YCITZMJNBYYMJO-UHFFFAOYSA-N chloro(diphenyl)silicon Chemical compound C=1C=CC=CC=1[Si](Cl)C1=CC=CC=C1 YCITZMJNBYYMJO-UHFFFAOYSA-N 0.000 claims description 2
- 150000007530 organic bases Chemical class 0.000 claims description 2
- 230000035484 reaction time Effects 0.000 claims description 2
- 239000005049 silicon tetrachloride Substances 0.000 claims description 2
- AJSTXXYNEIHPMD-UHFFFAOYSA-N triethyl borate Chemical compound CCOB(OCC)OCC AJSTXXYNEIHPMD-UHFFFAOYSA-N 0.000 claims description 2
- 125000001246 bromo group Chemical class Br* 0.000 claims 9
- 150000008442 polyphenolic compounds Chemical class 0.000 claims 7
- 239000003921 oil Substances 0.000 claims 5
- 239000003205 fragrance Substances 0.000 claims 4
- 229910052736 halogen Inorganic materials 0.000 claims 4
- 150000002367 halogens Chemical class 0.000 claims 4
- 238000001953 recrystallisation Methods 0.000 claims 4
- 239000004327 boric acid Substances 0.000 claims 3
- 238000001035 drying Methods 0.000 claims 2
- 125000001033 ether group Chemical group 0.000 claims 2
- 238000001914 filtration Methods 0.000 claims 2
- 238000002156 mixing Methods 0.000 claims 2
- 238000004062 sedimentation Methods 0.000 claims 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 claims 1
- 229910052500 inorganic mineral Inorganic materials 0.000 claims 1
- 239000011707 mineral Substances 0.000 claims 1
- 235000010755 mineral Nutrition 0.000 claims 1
- 235000015320 potassium carbonate Nutrition 0.000 claims 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 abstract description 16
- 229920005989 resin Polymers 0.000 abstract description 11
- 239000011347 resin Substances 0.000 abstract description 11
- JMANVNJQNLATNU-UHFFFAOYSA-N glycolonitrile Natural products N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 6
- 239000011159 matrix material Substances 0.000 abstract description 5
- 239000002131 composite material Substances 0.000 abstract description 2
- 230000003647 oxidation Effects 0.000 abstract description 2
- 238000007254 oxidation reaction Methods 0.000 abstract description 2
- 229920000642 polymer Polymers 0.000 abstract description 2
- 239000011148 porous material Substances 0.000 abstract description 2
- 239000011825 aerospace material Substances 0.000 abstract 1
- 230000009257 reactivity Effects 0.000 abstract 1
- 239000007858 starting material Substances 0.000 abstract 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000003786 synthesis reaction Methods 0.000 description 10
- 239000003208 petroleum Substances 0.000 description 8
- IAZDPXIOMUYVGZ-WFGJKAKNSA-N Dimethyl sulfoxide Chemical compound [2H]C([2H])([2H])S(=O)C([2H])([2H])[2H] IAZDPXIOMUYVGZ-WFGJKAKNSA-N 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 6
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 238000002329 infrared spectrum Methods 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 3
- VHVUXJWGYUSRIA-UHFFFAOYSA-N tetrakis(4-bromophenyl)silane Chemical compound C1=CC(Br)=CC=C1[Si](C=1C=CC(Br)=CC=1)(C=1C=CC(Br)=CC=1)C1=CC=C(Br)C=C1 VHVUXJWGYUSRIA-UHFFFAOYSA-N 0.000 description 3
- AIHRQGUYNQTCBQ-UHFFFAOYSA-N 4-tris(4-hydroxyphenyl)silylphenol Chemical compound C1=CC(O)=CC=C1[Si](C=1C=CC(O)=CC=1)(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 AIHRQGUYNQTCBQ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 2
- 239000005054 phenyltrichlorosilane Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000011736 potassium bicarbonate Substances 0.000 description 2
- 235000015497 potassium bicarbonate Nutrition 0.000 description 2
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 235000011181 potassium carbonates Nutrition 0.000 description 2
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 2
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 2
- NHDIQVFFNDKAQU-UHFFFAOYSA-N tripropan-2-yl borate Chemical compound CC(C)OB(OC(C)C)OC(C)C NHDIQVFFNDKAQU-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- SWJPEBQEEAHIGZ-UHFFFAOYSA-N 1,4-dibromobenzene Chemical compound BrC1=CC=C(Br)C=C1 SWJPEBQEEAHIGZ-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- URVYHORJNSHLNT-UHFFFAOYSA-N 4-[(4-hydroxyphenyl)-diphenylsilyl]phenol Chemical compound C1=CC(O)=CC=C1[Si](C=1C=CC(O)=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 URVYHORJNSHLNT-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- VBXBHXSRFWKSIJ-UHFFFAOYSA-N [4-tris(4-cyanatophenyl)silylphenyl] cyanate Chemical compound C1=CC(OC#N)=CC=C1[Si](C=1C=CC(OC#N)=CC=1)(C=1C=CC(OC#N)=CC=1)C1=CC=C(OC#N)C=C1 VBXBHXSRFWKSIJ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical group OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- QPJDMGCKMHUXFD-UHFFFAOYSA-N cyanogen chloride Chemical group ClC#N QPJDMGCKMHUXFD-UHFFFAOYSA-N 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- PQZTVWVYCLIIJY-UHFFFAOYSA-N diethyl(propyl)amine Chemical compound CCCN(CC)CC PQZTVWVYCLIIJY-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- IQRYMGAVQCQZBN-UHFFFAOYSA-N tris(4-bromophenyl)-phenylsilane Chemical compound BrC1=CC=C(C=C1)[Si](C1=CC=CC=C1)(C1=CC=C(C=C1)Br)C1=CC=C(C=C1)Br IQRYMGAVQCQZBN-UHFFFAOYSA-N 0.000 description 1
Abstract
本发明提供了一种含硅芳香氰酸酯单体及其制备方法。所述的氰酸酯树脂单体结构如上:式中n为2到4之间的整数。它们以氯硅烷为起始原料,先合成含硅芳香多酚单体,然后再与卤化氰反应制得。本发明所述的含硅芳香氰酸酯单体具有很高的反应活性,制备的树脂具有良好的抗热氧化性和抗湿性,适合作为一种新的高性能聚合物复合材料的基体,应用于印刷电路板和航空航天材料等领域,特别是其中的多官能团树脂,因为其独特的空间网络结构,尤其适合于低介电常数材料和多孔材料领域。
The invention provides a silicon-containing aromatic cyanate monomer and a preparation method thereof. The structure of the cyanate resin monomer is as above: in the formula, n is an integer between 2 and 4. They use chlorosilane as the starting material to synthesize silicon-containing aromatic polyphenol monomers, and then react with cyanogen halides. The silicon-containing aromatic cyanate monomer of the present invention has very high reactivity, and the prepared resin has good thermal oxidation resistance and moisture resistance, and is suitable as a matrix of a new high-performance polymer composite material. In the fields of printed circuit boards and aerospace materials, especially the multifunctional resins, because of its unique space network structure, it is especially suitable for the fields of low dielectric constant materials and porous materials.
Description
技术领域 technical field
本发明涉及一种氰酸酯单体及其制备方法,特别涉及一种含硅芳香氰酸酯单体及其制备方法。The invention relates to a cyanate monomer and a preparation method thereof, in particular to a silicon-containing aromatic cyanate monomer and a preparation method thereof.
技术背景 technical background
氰酸酯树脂是一种含二个或二个以上氰酸酯官能团(-O-C≡N)的新型树脂基体,它既有聚酰亚胺优良的耐热性,低毒性和低吸湿性的特点,又可采用与环氧树脂相种似的成型工艺固化成型,单体或预聚体在固化时不放出挥发组分。这种高性能热固性树脂具有玻璃化转变温度高,介电常数和介电损耗低,热膨胀系数小,对金属粘结强度高等优异性能,被广泛应用于电子、航空和粘合剂工业领域。相对其它树脂基体如聚马来酰亚胺、环氧树脂等,氰酸酯树脂具有更好的韧性,但它的许多其他性能如断裂抗力等还有待提高,许多添加剂,包括热塑性树脂,环氧,双马来酰亚胺等被用于它们的增韧,但总是会降低其中的一个或一个以上的关键物理性能。因此,创造新的单体结构具有非常重要的意义。Cyanate resin is a new type of resin matrix containing two or more cyanate functional groups (-O-C≡N), which has the characteristics of excellent heat resistance, low toxicity and low moisture absorption of polyimide , and can be cured and molded by a molding process similar to that of epoxy resin, and the monomer or prepolymer does not emit volatile components during curing. This high-performance thermosetting resin has excellent properties such as high glass transition temperature, low dielectric constant and dielectric loss, small thermal expansion coefficient, and high bonding strength to metals. It is widely used in the fields of electronics, aviation, and adhesive industries. Compared with other resin matrices such as polymaleimide, epoxy resin, etc., cyanate resin has better toughness, but many of its other properties, such as fracture resistance, need to be improved. Many additives, including thermoplastic resins, epoxy resins, etc. , Bismaleimide, etc. are used for their toughening, but it will always reduce one or more of the key physical properties. Therefore, it is of great significance to create new monomer structures.
将杂原子硅引入有机聚合物,是连接有机材料和无机材料的重要桥梁,这种原子尺寸剪裁手段将赋予它们一些独特优越的物理性质,是改善材料性能的重要手段。美国专利5260389、5504374和7387841,公开了一种含短链硅氧烷结构的芳香氰酸酯的制备方法,和其他对应氰酸酯树脂相比,由于硅原子的存在,它们具有很好的流动性,优越的阻燃性,更低的介电常数,良好的粘结性能,更低的吸水率。近年来,在线性聚合物主链中介入芳基硅结构,引起了人们广泛的兴趣,它们能显著增加材料的溶解性、降低熔点,尤其是其中芳香硅碳键的电子离域特性,赋予了这种材料比单纯碳碳键材料更好的热稳定性(Macromolecules,2001,34,3607;Macromolecules,2003,36,8225)。但目前还未见芳基硅结构的氰酸酯化合物的报道。The introduction of heteroatom silicon into organic polymers is an important bridge connecting organic materials and inorganic materials. This method of atomic size tailoring will endow them with some unique and superior physical properties, which is an important means to improve material performance. U.S. Patents 5,260,389, 5,504,374, and 7,387,841 disclose a method for preparing aromatic cyanate esters containing short-chain siloxane structures. Compared with other corresponding cyanate resins, they have good fluidity due to the presence of silicon atoms Sex, superior flame retardancy, lower dielectric constant, good bonding performance, lower water absorption. In recent years, the introduction of aryl silicon structures in the main chain of linear polymers has aroused widespread interest. They can significantly increase the solubility and lower the melting point of materials, especially the electron delocalization characteristics of aromatic silicon-carbon bonds, which endow This material has better thermal stability than pure carbon-carbon bond materials (Macromolecules, 2001, 34, 3607; Macromolecules, 2003, 36, 8225). However, there are no reports of cyanate ester compounds with aryl silicon structure.
发明内容 Contents of the invention
本发明要解决的技术问题是提供一种含硅芳香氰酸酯单体及其制备方法。The technical problem to be solved by the present invention is to provide a silicon-containing aromatic cyanate monomer and a preparation method thereof.
本发明所述的一种酚酞型氰酸酯单体,具有以下结构:A kind of phenolphthalein type cyanate monomer of the present invention has following structure:
式中n为2到4之间的整数。In the formula, n is an integer between 2 and 4.
本发明的合成包括含硅芳香多溴、含硅芳香多酚和含硅芳香氰酸酯的制备三个步骤,合成路线如下:The synthesis of the present invention comprises three steps of preparing silicon-containing aromatic polybromine, silicon-containing aromatic polyphenol and silicon-containing aromatic cyanate, and the synthetic route is as follows:
含硅芳香多溴的制备:Preparation of silicon-containing aromatic polybromine:
将1,4-对二溴苯溶于有机溶剂中配成2%至30%的溶液,在-78℃至25℃,氮气保护下缓慢滴加正丁基锂的正己烷溶液,1,4-对二溴苯与正丁基锂的摩尔比为1∶1至1∶3;正丁基锂滴加完毕后继续搅拌2小时,再缓慢滴加氯硅烷,使溴原子与氯原子的摩尔比为0.1∶1至1∶0.1,滴加完毕后继续反应0.5至6小时后用稀盐酸水溶液终止反应;静止分液,有机相用无水硫酸镁干燥、过滤、重结晶后得到产物。Dissolve 1,4-p-dibromobenzene in an organic solvent to make a 2% to 30% solution, and slowly add n-butyllithium n-hexane solution dropwise under nitrogen protection at -78°C to 25°C, 1,4 - The molar ratio of p-dibromobenzene to n-butyllithium is 1:1 to 1:3; after the addition of n-butyllithium, continue to stir for 2 hours, and then slowly add chlorosilane to make the mole ratio of bromine atom to chlorine atom The ratio is 0.1:1 to 1:0.1. After the dropwise addition, the reaction is continued for 0.5 to 6 hours, and then the reaction is terminated with dilute hydrochloric acid aqueous solution; static liquid separation, the organic phase is dried with anhydrous magnesium sulfate, filtered, and recrystallized to obtain the product.
上述反应中使用的氯硅烷为二苯基氯硅烷、苯基三氯硅烷或四氯化硅;溶剂为乙醚、石油醚、四氢呋喃、二氧六环及其混合物。The chlorosilane used in the above reaction is diphenylchlorosilane, phenyltrichlorosilane or silicon tetrachloride; the solvent is diethyl ether, petroleum ether, tetrahydrofuran, dioxane and mixtures thereof.
含硅芳香多酚的制备:Preparation of silicon-containing aromatic polyphenols:
将上述步骤(1)得到的含硅芳香多溴产物溶于有机溶剂中配成5%至30%的溶液,在-78℃至25℃下缓慢滴加正丁基锂的正己烷溶液,溴原子与正丁基锂的摩尔比为1∶1至1∶5;滴加完毕后再缓慢滴加硼酸酯,溴原子与硼酸酯基团的摩尔数为1∶1至1∶5;在氮气保护下反应0.5至24小时后,先后加入碱水溶液和30%过氧化氢水溶液,使溴原子与碱的摩尔比为1∶1至1∶4,溴原子与过氧化氢的摩尔比为1∶1至1∶20,继续反应1至5小时后加入稀盐酸水溶液使反应体系为酸性,静止分液后,有机相用无水硫酸镁干燥、过滤、重结晶得产物。Dissolve the silicon-containing aromatic polybrominated product obtained in the above step (1) in an organic solvent to form a 5% to 30% solution, slowly add n-butyl lithium in n-hexane solution dropwise at -78°C to 25°C, bromine The molar ratio of atom to n-butyllithium is 1:1 to 1:5; after the dropwise addition, borate is slowly added dropwise, and the molar ratio of bromine atom to borate group is 1:1 to 1:5; After reacting for 0.5 to 24 hours under the protection of nitrogen, add alkali aqueous solution and 30% hydrogen peroxide aqueous solution successively, make the molar ratio of bromine atom and alkali be 1:1 to 1:4, the molar ratio of bromine atom and hydrogen peroxide is 1:1 to 1:20, continue the reaction for 1 to 5 hours, then add dilute hydrochloric acid aqueous solution to make the reaction system acidic, after static liquid separation, the organic phase is dried with anhydrous magnesium sulfate, filtered, and recrystallized to obtain the product.
上述反应采用的硼酸酯包括硼酸三甲酯,硼酸三乙酯、硼酸三异丙酯;上述反应采用的碱包括有机胺、氢氧化钠、氢氧化钾、碳酸钠、碳酸钾、碳酸氢钠、碳酸氢钾及其混合物;反应溶剂包括乙醚、石油醚、四氢呋喃、二氧六环及其混合物。The borates used in the above reaction include trimethyl borate, triethyl borate, triisopropyl borate; the base used in the above reaction includes organic amine, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate , Potassium bicarbonate and mixtures thereof; Reaction solvents include ether, petroleum ether, tetrahydrofuran, dioxane and mixtures thereof.
含硅芳香氰酸酯的制备Preparation of silicon-containing aromatic cyanate
将卤化氰溶解于有机溶剂,再加入含硅芳香多酚和缚酸剂的混合溶液,也可先将含硅芳香多酚先溶解于有机溶剂中,再依次加入卤化氰和缚酸剂。其中含硅芳香多酚与卤化氰的官能团摩尔比为1∶1至1∶10,含硅芳香多酚与缚酸剂的官能团摩尔比为1∶1至1∶5。反应温度为-30℃至50℃,反应时间为0.5至24小时。将反应后的混合溶液过滤后在沉降剂中沉降,这种沉降剂包括正己烷、环己烷、石油醚、乙醚及其混合物。沉降产物在有机溶剂中重结晶,重结晶的有机溶剂包括氯仿、二氯甲烷、乙醚、石油醚、乙酸乙酯及其混合物。上述制备含硅芳香氰酸酯所用的有机溶剂包括乙酸乙酯、苯、甲苯、石油醚、乙醚,丙酮,氯仿、1,1,2-三氯乙烷、二氯甲烷及其混合物。Dissolve cyanogen halide in organic solvent, and then add the mixed solution of silicon-containing aromatic polyphenol and acid-binding agent, or first dissolve silicon-containing aromatic polyphenol in organic solvent, and then add cyanogen halide and acid-binding agent in sequence. The molar ratio of silicon-containing aromatic polyphenol to cyanogen halide functional group is 1:1 to 1:10, and the functional group molar ratio of silicon-containing aromatic polyphenol to acid-binding agent is 1:1 to 1:5. The reaction temperature is -30°C to 50°C, and the reaction time is 0.5 to 24 hours. After the reacted mixed solution is filtered, it settles in a settling agent, and this settling agent includes n-hexane, cyclohexane, petroleum ether, diethyl ether and mixtures thereof. The precipitated product is recrystallized in an organic solvent, and the recrystallized organic solvent includes chloroform, dichloromethane, diethyl ether, petroleum ether, ethyl acetate and mixtures thereof. The organic solvents used in the preparation of silicon-containing aromatic cyanates include ethyl acetate, benzene, toluene, petroleum ether, diethyl ether, acetone, chloroform, 1,1,2-trichloroethane, dichloromethane and mixtures thereof.
上述制备含硅芳香氰酸酯所用的敷酸剂可以是碱,包括有机碱或无机碱,比如碳酸钠、碳酸钾、碳酸氢钠、碳酸氢钾、氢氧化钠,氢氧化钾,甲醇钠,甲醇钾及各种胺,如三乙胺、二乙基丙基胺、吡啶。The acid-coating agent used for the above-mentioned preparation of silicon-containing aromatic cyanate can be an alkali, including an organic base or an inorganic base, such as sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium hydroxide, potassium hydroxide, sodium methylate, Potassium methoxide and various amines, such as triethylamine, diethylpropylamine, pyridine.
上述制备含硅芳香氰酸酯所用的卤化氰为氯化氰或溴化氰。The cyanogen halide used in the above preparation of silicon-containing aromatic cyanate is cyanogen chloride or cyanogen bromide.
本发明所述的氰酸酯是一种含有四芳基硅结构的氰酸酯,可以是双官能团化合物,也可以是三官能团或四官能团化合物。单体具有很高的活性,固化后的产物具有良好的热稳定,抗热氧化能力,较高的玻璃化转变温度和低吸水率,使得这种氰酸酯树脂适合作为一种新的高性能聚合物材料的基体,应用于印刷电路板基体和航空航天用的高韧性结构复合材料基体等领域,特别是其中的多官能团树脂,因为其独特的空间网络结构,尤其适合于低介电常数材料和多孔材料领域。The cyanate ester described in the present invention is a cyanate ester containing a tetraaryl silicon structure, which may be a difunctional compound, or a trifunctional or tetrafunctional compound. The monomer has high activity, and the cured product has good thermal stability, thermal oxidation resistance, high glass transition temperature and low water absorption, making this cyanate ester resin suitable as a new high-performance The matrix of polymer materials is used in the fields of printed circuit board matrix and high toughness structural composite material matrix for aerospace, especially the multifunctional resin, because of its unique space network structure, it is especially suitable for low dielectric constant materials and porous materials.
具体实施方式 Detailed ways
实施例1Example 1
双(4-溴苯基)二硅烷的合成:将25g 1,4-对二溴苯溶于80ml四氢呋喃中,降温至-78℃,缓慢滴加31.2ml 2.5N正丁基锂的正己烷溶液,滴加完毕继续搅拌0.5小时后,滴加2.4ml二苯基二氯硅烷,滴加完毕后继续反应5小时,用稀盐酸水溶液终止反应。分离有机相,用无水硫酸镁干燥后旋干溶剂,残余物用乙酸乙酯重结晶,得到白色晶体14g,产率87.4%。Synthesis of bis(4-bromophenyl)disilane: Dissolve 25g of 1,4-p-dibromobenzene in 80ml of tetrahydrofuran, cool down to -78°C, and slowly add 31.2ml of 2.5N n-butyllithium n-hexane solution dropwise After the dropwise addition was completed and stirring was continued for 0.5 hours, 2.4 ml of diphenyldichlorosilane was added dropwise, and after the dropwise addition was completed, the reaction was continued for 5 hours, and the reaction was terminated with dilute hydrochloric acid aqueous solution. The organic phase was separated, dried with anhydrous magnesium sulfate, and the solvent was spin-dried, and the residue was recrystallized with ethyl acetate to obtain 14 g of white crystals with a yield of 87.4%.
双(4-羟基苯基)二硅烷的合成:将1.9g双(4-溴苯基)二硅烷溶于40ml四氢呋喃中,降温至-78℃,缓慢滴加3.7ml 2.5N正丁基锂的正己烷溶液,滴加完毕后,滴加3.5ml硼酸三甲酯,滴加完毕后继续搅拌3小时,加入6ml 3M氢氧化钠水溶液和2ml 30%双氧水,搅拌反应3小时后,用盐酸水溶液调至酸性。静止分液,有机相用无水硫酸镁干燥后旋干溶剂,残余物用氯仿重结晶,得到白色晶体0.59克,产率68.2%。Synthesis of bis(4-hydroxyphenyl)disilane: Dissolve 1.9g of bis(4-bromophenyl)disilane in 40ml of tetrahydrofuran, cool to -78°C, slowly add dropwise 3.7ml of 2.5N n-butyllithium n-hexane solution, after the dropwise addition, add 3.5ml of trimethyl borate dropwise, continue stirring for 3 hours after the dropwise addition, add 6ml of 3M aqueous sodium hydroxide solution and 2ml of 30% hydrogen peroxide, stir and react for 3 hours, then adjust with hydrochloric acid aqueous solution to acidic. After static liquid separation, the organic phase was dried with anhydrous magnesium sulfate and the solvent was spin-dried, and the residue was recrystallized with chloroform to obtain 0.59 g of white crystals with a yield of 68.2%.
双(4-氰酸酯基苯基)二苯基硅烷的合成:将双(4-羟基苯基)二苯基硅烷(3.68g,10mmol)溶于30ml丙酮中,降温至-5℃,加入溴化氰(3.48g,30mmol)和三乙胺(5.6ml,20mmol),搅拌反应4小时终止反应。将上述混合物过滤大量环己烷中沉降过滤得到粗产物,用60-90℃石油醚重结晶,过滤干燥得到氰酸酯3.95g,产率94.5%。Synthesis of bis(4-cyanatophenyl)diphenylsilane: Dissolve bis(4-hydroxyphenyl)diphenylsilane (3.68g, 10mmol) in 30ml acetone, cool to -5°C, add Cyanogen bromide (3.48g, 30mmol) and triethylamine (5.6ml, 20mmol) were stirred for 4 hours to terminate the reaction. The above mixture was filtered through a large amount of cyclohexane to obtain a crude product, which was recrystallized with 60-90°C petroleum ether, filtered and dried to obtain 3.95 g of cyanate, with a yield of 94.5%.
红外光谱(溴化钾压片法,cm-1):3035,2270,2234,1598,1499,1451;Infrared spectrum (potassium bromide tablet method, cm -1 ): 3035, 2270, 2234, 1598, 1499, 1451;
核磁共振氢谱(400MHz,DMSO-d6):δ(ppm):7.77(d,4H),7.53(d,8H),7.36(m,6H).Proton NMR spectrum (400MHz, DMSO-d6): δ (ppm): 7.77 (d, 4H), 7.53 (d, 8H), 7.36 (m, 6H).
实施例2Example 2
三(4-溴苯基)苯基硅烷的合成:将18g 1,4-对二溴苯溶于80ml四氢呋喃中,降温至-78℃,缓慢滴加47.4ml 2.5N正丁基锂的正己烷溶液,滴加完毕继续搅拌4小时后,滴加1.5ml苯基三氯硅烷,滴加完毕后继续反应2小时,用稀盐酸水溶液终止反应。分离有机相,用无水硫酸镁干燥后旋干溶剂,残余物用二氯甲烷重结晶,得到白色晶体2g,产率89.2%。Synthesis of tris(4-bromophenyl)phenylsilane: Dissolve 18g of 1,4-p-dibromobenzene in 80ml of tetrahydrofuran, cool to -78°C, slowly add 47.4ml of 2.5N n-butyl lithium in n-hexane After the solution was continuously stirred for 4 hours after the dropwise addition, 1.5 ml of phenyltrichlorosilane was added dropwise. After the dropwise addition, the reaction was continued for 2 hours, and the reaction was terminated with dilute hydrochloric acid aqueous solution. The organic phase was separated, dried with anhydrous magnesium sulfate, and the solvent was spin-dried, and the residue was recrystallized with dichloromethane to obtain 2 g of white crystals with a yield of 89.2%.
三(4-羟基苯基)苯基硅烷的合成:将2.3g四(4-溴苯基)硅烷溶于50ml四氢呋喃中,降温至-78℃,缓慢滴加9.3ml 2.5N正丁基锂的正己烷溶液,滴加完毕后,滴加2.5ml硼酸三异丙酯,滴加完毕后继续搅拌3小时,加入12ml 3M氢氧化钠水溶液和5ml 30%双氧水,搅拌反应4小时后,用盐酸水溶液调至酸性。静止分液,有机相用无水硫酸镁干燥后旋干溶剂,残余物用乙酸乙酯重结晶,得到白色晶体1.21克,产率69.9%。Synthesis of tris(4-hydroxyphenyl)phenylsilane: Dissolve 2.3g of tetrakis(4-bromophenyl)silane in 50ml of tetrahydrofuran, cool to -78°C, slowly add 9.3ml of 2.5N n-butyl lithium dropwise n-Hexane solution, after the dropwise addition, add 2.5ml triisopropyl borate dropwise, continue stirring for 3 hours after the dropwise addition, add 12ml 3M aqueous sodium hydroxide solution and 5ml 30% hydrogen peroxide, and stir for 4 hours, then use hydrochloric acid aqueous solution Adjust to acidic. After static liquid separation, the organic phase was dried with anhydrous magnesium sulfate and the solvent was spin-dried, and the residue was recrystallized with ethyl acetate to obtain 1.21 g of white crystals with a yield of 69.9%.
三(4-氰酸酯基苯基)苯基硅烷的合成:将三(4-羟基苯基)苯基硅烷(3.84g,10mmol)溶于40ml丙酮中,降温至-5℃,加入溴化氰(4.24g,40mol)和三乙胺(8.4ml,30mol),搅拌反应4小时终止反应。将上述混合物过滤大量环己烷中沉降过滤得到粗产物,用60-90℃石油醚重结晶,过滤干燥得到氰酸酯4.1g,产率94.4%。Synthesis of tris(4-cyanatophenyl)phenylsilane: Dissolve tris(4-hydroxyphenyl)phenylsilane (3.84g, 10mmol) in 40ml acetone, cool to -5°C, add brominated Cyanogen (4.24g, 40mol) and triethylamine (8.4ml, 30mol) were stirred for 4 hours to terminate the reaction. The above mixture was filtered through a large amount of cyclohexane to settle and filter to obtain a crude product, which was recrystallized with 60-90°C petroleum ether, filtered and dried to obtain 4.1 g of cyanate ester with a yield of 94.4%.
红外光谱(溴化钾压片法,cm-1):3032,2272,2238,1599,1494,1451;Infrared spectrum (potassium bromide tablet method, cm- 1 ): 3032, 2272, 2238, 1599, 1494, 1451;
核磁共振氢谱(400MHz,DMSO-d6):δ(ppm):7.77(d,6H),7.52(d,8H),7.36(m,3H).Proton NMR spectrum (400MHz, DMSO-d6): δ (ppm): 7.77 (d, 6H), 7.52 (d, 8H), 7.36 (m, 3H).
实施例3Example 3
四(4-溴苯基)硅烷的合成:将25g 1,4-对二溴苯溶于80ml四氢呋喃中,降温至-78℃,缓慢滴加63.2ml 2.5N正丁基锂的正己烷溶液,滴加完毕继续搅拌1小时后,滴加2.5ml四氯硅烷,滴加完毕后继续反应2小时,用稀盐酸水溶液终止反应。分离有机相,用无水硫酸镁干燥后旋干溶剂,残余物用二氯甲烷重结晶,得到白色晶体16g,产率93.7%。Synthesis of tetrakis(4-bromophenyl)silane: Dissolve 25g of 1,4-p-dibromobenzene in 80ml of tetrahydrofuran, cool to -78°C, slowly add 63.2ml of 2.5N n-hexane solution of n-butyl lithium dropwise, After the dropwise addition was completed and stirring was continued for 1 hour, 2.5 ml of tetrachlorosilane was added dropwise, and the reaction was continued for 2 hours after the dropwise addition, and the reaction was terminated with dilute hydrochloric acid aqueous solution. The organic phase was separated, dried with anhydrous magnesium sulfate, and the solvent was spin-dried, and the residue was recrystallized with dichloromethane to obtain 16 g of white crystals with a yield of 93.7%.
四(4-羟基苯基)硅烷的合成:将1.3g四(4-溴苯基)硅烷溶于50ml四氢呋喃中,降温至-78℃,缓慢滴加7.3ml 2.5N正丁基锂的正己烷溶液,滴加完毕后,滴加3.5ml硼酸三甲酯,滴加完毕后继续搅拌3小时,加入10ml 3M氢氧化钠水溶液和3ml 30%双氧水,搅拌反应5小时后,用盐酸水溶液调至酸性。静止分液,有机相用无水硫酸镁干燥后旋干溶剂,残余物用乙酸乙酯重结晶,得到白色晶体0.51克,产率63.2%。Synthesis of tetrakis(4-hydroxyphenyl)silane: Dissolve 1.3g of tetrakis(4-bromophenyl)silane in 50ml of tetrahydrofuran, cool to -78°C, slowly add 7.3ml of 2.5N n-butyl lithium in n-hexane Solution, after the dropwise addition, add 3.5ml trimethyl borate dropwise, continue to stir for 3 hours after the dropwise addition, add 10ml 3M aqueous sodium hydroxide solution and 3ml 30% hydrogen peroxide, stir and react for 5 hours, then adjust to acidity with aqueous hydrochloric acid solution . After static liquid separation, the organic phase was dried with anhydrous magnesium sulfate and the solvent was spin-dried, and the residue was recrystallized with ethyl acetate to obtain 0.51 g of white crystals, with a yield of 63.2%.
四(4-氰酸酯基苯基)硅烷的合成:将4g四(4-羟基苯基)硅烷溶于50ml丙酮中,降温至-5℃,加入5.52g溴化氰和11.2ml三乙胺,搅拌反应4小时终止反应。将上述混合物过滤大量环己烷中沉降过滤得到粗产物,用60-90℃石油醚重结晶,过滤干燥得到氰酸酯4.2g,产率88.4%。Synthesis of tetrakis(4-cyanatophenyl)silane: Dissolve 4g of tetrakis(4-hydroxyphenyl)silane in 50ml of acetone, cool to -5°C, add 5.52g of cyanogen bromide and 11.2ml of triethylamine , stirring the reaction for 4 hours to terminate the reaction. The above mixture was filtered through a large amount of cyclohexane to obtain a crude product, which was recrystallized with 60-90°C petroleum ether, filtered and dried to obtain 4.2 g of cyanate ester, with a yield of 88.4%.
红外光谱(溴化钾压片法,cm-1):3030,2271,2235,1594,1501,1451;Infrared spectrum (potassium bromide tablet method, cm -1 ): 3030, 2271, 2235, 1594, 1501, 1451;
核磁共振氢谱(400MHz,DMSO-d6):δ(ppm):7.76(s,8H),7.55(d,8H)。Proton NMR spectrum (400MHz, DMSO-d6): δ (ppm): 7.76 (s, 8H), 7.55 (d, 8H).
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CN103012297A (en) * | 2012-12-13 | 2013-04-03 | 中南大学 | Cyanate ester and polymer containing s-triazine structure and preparation methods of cyanate ester and polymer |
CN110591590A (en) * | 2019-07-26 | 2019-12-20 | 四川羽玺新材料股份有限公司 | Preparation process of low-viscosity high-temperature-resistant protective film |
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CN103012297A (en) * | 2012-12-13 | 2013-04-03 | 中南大学 | Cyanate ester and polymer containing s-triazine structure and preparation methods of cyanate ester and polymer |
CN103012297B (en) * | 2012-12-13 | 2015-05-06 | 中南大学 | Cyanate ester and polymer containing s-triazine structure and preparation methods of cyanate ester and polymer |
CN110591590A (en) * | 2019-07-26 | 2019-12-20 | 四川羽玺新材料股份有限公司 | Preparation process of low-viscosity high-temperature-resistant protective film |
CN110591590B (en) * | 2019-07-26 | 2021-10-01 | 四川羽玺新材料股份有限公司 | Preparation process of low-viscosity high-temperature-resistant protective film |
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