CN101579856A - Bad crystal grain selecting machine and method thereof - Google Patents
Bad crystal grain selecting machine and method thereof Download PDFInfo
- Publication number
- CN101579856A CN101579856A CNA2008100978358A CN200810097835A CN101579856A CN 101579856 A CN101579856 A CN 101579856A CN A2008100978358 A CNA2008100978358 A CN A2008100978358A CN 200810097835 A CN200810097835 A CN 200810097835A CN 101579856 A CN101579856 A CN 101579856A
- Authority
- CN
- China
- Prior art keywords
- crystal grain
- bad
- suction nozzle
- bad crystal
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
技术领域 technical field
本发明涉及一种不良晶粒挑选机及其方法,特别涉及一种利用接触式或非接触式排除装置的不良晶粒挑选机及其方法。The invention relates to a bad grain sorting machine and a method thereof, in particular to a bad grain sorting machine and a method using a contact or non-contact elimination device.
背景技术 Background technique
晶粒(die)为电子产业中基本的电子零件,其通过半导体制程步骤进行磊晶及后续制程,成为市面上常见的产品。在晶粒制程中,需将晶圆切割成晶粒,以利后续的封装等处理,但在切割过程中,极可能对晶粒造成毁损,故需要将不良晶粒挑选并搜集,以进行后续废弃等处理。A die is a basic electronic component in the electronics industry. It undergoes epitaxy and subsequent processes through the semiconductor process steps, and has become a common product on the market. In the die manufacturing process, the wafer needs to be cut into dies to facilitate subsequent packaging and other processing. However, during the cutting process, the dies are likely to be damaged, so it is necessary to select and collect bad dies for subsequent processing. Disposal, etc.
传统的不良晶粒挑选方法采用人工挑选,通过对晶圆上各晶粒进行对比,将不良晶粒挑选出并废弃。然而,随着半导体制程的微小化,晶粒的尺寸越来越小,使得人工挑选的难度增加,而且针对一片晶圆作不良晶粒挑选的工时极长。The traditional bad die selection method adopts manual selection, and by comparing the dies on the wafer, the bad dies are sorted out and discarded. However, with the miniaturization of the semiconductor manufacturing process, the size of the grains is getting smaller and smaller, which makes manual selection more difficult, and it takes a long time to select bad grains for a wafer.
针对上述问题,公知技术提出一种晶粒挑选机,通过挑选机先挑选出不良晶粒后,通过一吸嘴吸附不良晶粒,并经过一吸收装置,例如通过真空吸收方式,将不良晶粒吸收。例如,中国台湾专利号M253466提出的晶粒挑选机的快速晶粒挑捡结构改良。然而,半导体制程的微小化,使晶粒重量变轻,以晶粒为例,其晶圆在切割成晶粒后,放置在一胶膜上,在吸嘴吸附不良晶粒的同时,晶粒残留的黏胶将同时被吸嘴吸附,故晶粒极易被胶膜残留的黏胶所黏附至吸嘴上,而增加不良晶粒排除的难度,而吸收装置只有吸收的功能,并没有将不良晶粒从吸嘴上排除的功能。因此,现今仍需一能解决上述问题的不良晶粒排除机制,以提高排除效率。In response to the above problems, the known technology proposes a grain sorting machine. After the bad grains are selected by the sorting machine, a suction nozzle is used to absorb the bad grains, and through an absorption device, for example, by vacuum absorption, the bad grains are removed. absorb. For example, Chinese Taiwan Patent No. M253466 proposes an improvement in the fast die picking structure of a die sorting machine. However, the miniaturization of the semiconductor manufacturing process has made the weight of the die lighter. Taking the die as an example, the wafer is placed on an adhesive film after being cut into dies. The residual adhesive will be absorbed by the suction nozzle at the same time, so the die is easily adhered to the suction nozzle by the residual adhesive of the film, which increases the difficulty of removing bad die. The absorption device only has the function of absorption and does not remove The function of removing bad die from the nozzle. Therefore, there is still a need for a mechanism for removing bad grains that can solve the above-mentioned problems, so as to improve the removal efficiency.
发明内容Contents of the invention
一方面,本发明提供一种能够提升不良晶粒排除效率的不良晶粒挑选机。On the one hand, the present invention provides a bad die sorting machine capable of improving the efficiency of removing bad dies.
为实现上述发明目的,本发明采用如下技术方案:In order to realize the above-mentioned purpose of the invention, the present invention adopts following technical scheme:
本发明提供的一种不良晶粒挑选机,包含操作基座,用以置放晶粒;拣选装置,包含吸嘴,其连接至真空源,用以吸附置于操作基座上的晶粒中的不良晶粒;以及非接触式排除装置,包含喷管连接至流体源,通过流体喷除吸嘴上的不良晶粒。上述非接触式排除装置包含静电去除装置。其中,静电去除装置包含静电枪或静电风扇。The present invention provides a bad grain sorting machine, which includes an operating base for placing grains; a sorting device, including a suction nozzle, which is connected to a vacuum source, and is used for absorbing the grains placed on the operating base bad grains; and a non-contact removal device, which includes a nozzle connected to a fluid source, and the bad grains on the suction nozzle are sprayed through the fluid. The above-mentioned non-contact type removal device includes a static electricity removal device. Wherein, the electrostatic removal device includes an electrostatic gun or an electrostatic fan.
本发明提供的另一种不良晶粒挑选机,包含操作基座,用以置放晶粒;拣选装置,包含吸嘴,其连接至真空源,用以吸附置于操作基座上的晶粒中的不良晶粒;以及接触式排除装置,包含直接接触器,通过直接接触器与吸嘴相互接触,以排除吸嘴上的不良晶粒。上述接触式排除装置包含静电去除装置。其中,静电去除装置包含静电枪或静电风扇。Another defective grain sorting machine provided by the present invention includes an operating base for placing grains; a sorting device includes a suction nozzle connected to a vacuum source for absorbing grains placed on the operating base The bad grains in it; and the contact removal device, which includes a direct contactor, through which the direct contactor and the suction nozzle are in contact with each other, so as to eliminate the bad grains on the suction nozzle. The above-mentioned contact type removal device includes a static electricity removal device. Wherein, the electrostatic removal device includes an electrostatic gun or an electrostatic fan.
另一方面,本发明提供一种能够提升不良晶粒排除效率的不良晶粒挑选方法。On the other hand, the present invention provides a method for selecting bad grains that can improve the efficiency of removing bad grains.
为实现上述发明目的,本发明采用如下技术方案:In order to realize the above-mentioned purpose of the invention, the present invention adopts following technical scheme:
本发明提供的一种不良晶粒挑选方法,包含备置操作基座,用以置放晶粒;通过拣选装置吸附操作基座上的晶粒中的不良晶粒;以及通过流体喷除拣选装置上的不良晶粒。此外,本不良晶粒挑选方法更包含去除拣选装置的静电。A method for selecting bad grains provided by the present invention includes preparing an operating base for placing grains; absorbing bad grains in the grains on the operating base through a sorting device; and removing the sorting device through fluid spraying bad grains on the In addition, the bad die sorting method further includes removing static electricity from the sorting device.
本发明提供的另一种不良晶粒挑选方法,包含备置操作基座,用以置放晶粒;通过拣选装置吸附操作基座上的晶粒中的不良晶粒;以及通过直接接触器与拣选装置的吸嘴相互接触,以排除吸嘴上的不良晶粒。此外,本不良晶粒挑选方法更包含去除直接接触器的静电。Another method for selecting bad grains provided by the present invention includes preparing an operation base for placing grains; adsorbing bad grains in the grains on the operation base by a sorting device; The suction nozzles of the picking device are in contact with each other to remove bad grains on the suction nozzles. In addition, the bad die selection method further includes removing static electricity from direct contacts.
附图说明 Description of drawings
本发明可通过说明书中若干较佳实施例及详细叙述以及附图得以了解。然而,本领域的技术人员应当理解所有本发明的较佳实施例用以说明而非用以限制本发明的权利要求,其中:The present invention can be understood through several preferred embodiments and detailed description in the specification and accompanying drawings. However, those skilled in the art should understand that all preferred embodiments of the present invention are used to illustrate rather than limit the claims of the present invention, wherein:
图1为本发明不良晶粒挑选机的操作示意图;Fig. 1 is the schematic diagram of operation of the bad grain sorting machine of the present invention;
图2为图1所示本发明不良晶粒挑选机的拣选装置的侧视图;Fig. 2 is a side view of the sorting device of the defective grain sorting machine of the present invention shown in Fig. 1;
图3为图1所示本发明不良晶粒挑选机的非接触式排除装置的侧视图;Fig. 3 is a side view of the non-contact elimination device of the bad grain sorting machine of the present invention shown in Fig. 1;
图4为本发明不良晶粒挑选机的接触式排除装置的一实施例的剖面图;Fig. 4 is a cross-sectional view of an embodiment of the contact type elimination device of the defective grain sorting machine of the present invention;
图5为本发明不良晶粒挑选机的接触式排除装置的另一实施例的剖面图;Fig. 5 is a cross-sectional view of another embodiment of the contact elimination device of the defective grain sorting machine of the present invention;
图6为本发明不良晶粒挑选机的接触式排除装置的又一实施例的剖面图;Fig. 6 is a cross-sectional view of another embodiment of the contact elimination device of the bad grain sorting machine of the present invention;
图7为图6所示不良晶粒挑选机的接触式排除装置的上视图;Fig. 7 is the upper view of the contact elimination device of the defective grain sorting machine shown in Fig. 6;
图8为本发明不良晶粒挑选方法的步骤示意图。FIG. 8 is a schematic diagram of the steps of the method for selecting bad grains of the present invention.
具体实施方式 Detailed ways
为了使本技术领域的人员更好地理解本发明的技术方案,并使本发明的上述目的、特征和优点能够更加明显易懂,下面结合附图和实施例对本发明作进一步详细的说明。In order to enable those skilled in the art to better understand the technical solution of the present invention, and to make the above-mentioned purpose, features and advantages of the present invention more obvious and understandable, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments.
如图1所示,本发明提供的不良晶粒挑选机的较佳实施例中,包含:操作基座101、拣选装置102以及排除装置,其中,排除装置为非接触式排除装置103、接触式排除装置104或包含两者;操作基座101的作用在于置放晶粒106,拣选装置102包含吸嘴1021,通过吸嘴1021连接至真空源111,以吸附在操作基座101上的不良晶粒;而排除装置主要通过非接触式排除装置103使用流体排除方式或通过接触式排除装置104使用直接接触器与吸嘴1021相互接触方式排除吸嘴1021上的不良晶粒。As shown in Figure 1, in the preferred embodiment of the bad grain sorting machine provided by the present invention, it includes: an
如图1所示,操作基座101用以置放晶粒,一般而言,用于置放承载晶粒106的胶膜107;操作基座101通过管线108连接至真空源109,通过真空吸附胶膜107方式,固定胶膜107在操作基座101上;本发明所提及的固定胶膜107的方式,也可以机械固定方式或其它方式完成。机械固定方式通过固定胶膜外围的扩张环在操作基座101上,即通过一环具环绕在扩张环外围,以由一组卡紧件缩减环具的环绕空间,以便固定胶膜107在环具内。As shown in FIG. 1 , the
请同时参照图1及图2,拣选装置102包含吸嘴1021,通过管线110连接至真空源111,吸嘴1021至真空源111之间形成一真空路径,使吸嘴1021通过真空方式吸附操作基座101上的晶粒106;通过一判断装置,以确认各晶粒106完整或是不良品后,拣选装置102将配合顶针器105将不良晶粒106a吸附,移开操作基座101至一排除区;其中,排除区指排除及收取不良晶粒106a的区域,而排除装置即设置在排除区,在此,判断装置以视觉显示器,如电子显微镜、数字相机、数字显微相机、工业显微设备等,观察晶粒106的图案,配合微处理器分析以决定不良晶粒及其位置;而顶针器105紧贴胶膜107,在不良晶粒106a的位置处,通过顶针戳破胶膜107将不良晶粒106a移开胶膜107,顶针器105结构为现有技术在此省略顶针器105的相关详细叙述。胶膜107具有一定的黏性,故在顶针器105将不良晶粒106a移开胶膜107时,拣选装置102需同时通过吸嘴1021吸附不良晶粒106a,才能将不良晶粒106a准确地吸附于吸嘴1021。拣选装置102还包含机械手臂1022以及移动装置1023。在一实施例中,机械手臂1022由二关节以及三骨架所构成,用以将吸嘴1021移动,然其结构并非限于以上所述。移动装置1023用以控制机械手臂1022的垂直位置及水平位置,以利于三度空间动作。在一实施例中,移动装置1023包含二马达或其它驱动组件,马达如步进马达、伺服马达、音圈马达(voice coil motor)及直驱式马达(direct drive motor)等,其中一马达用以控制机械手臂1022的垂直位置,以于定点上升或下降,进而实行吸取或排除不良晶粒的动作。另一马达用以控制机械手臂1022的水平位置,在制程步骤中的若干装置例如排除装置及操作基座101之间移动,以利于连续进行连续的步骤。在吸嘴1021吸附不良晶粒106a之后,拣选装置102利用机械手臂1022将吸嘴1021及不良晶粒106a移动至排除区的排除装置。在操作基座101通过真空方式吸附胶膜107时,其通过管线108连接的真空源109,与真空源111为同一真空源,当然,在另一实施例中,真空源109与真空源111可为不同真空源。Please refer to FIG. 1 and FIG. 2 at the same time. The
请参照图1,在吸嘴1021吸附不良晶粒106a时,不良晶粒106a常会携带胶膜上的残余黏胶,因此在吸嘴1021上容易附着残余黏胶,导致不良晶粒106a黏滞在吸嘴1021无法排除,故而需要通过排除装置将吸嘴1021上的不良晶粒106a甚至于残余黏胶加以排除。如前文所述,排除装置包含非接触式排除装置103(如图1的左上角部分所示),接触式排除装置104(如图1的右上角部分所示),或以上两者,以下将分别叙述非接触式排除装置103及接触式排除装置104的结构。在接触式或非接触式排除装置104或103将不良晶粒106a排除后,拣选装置102返回至操作基座101的位置,以重复上述相同步骤。Please refer to FIG. 1, when the
图3为图1的非接触式排除装置的侧视图;请同时参照图1及图3,非接触式排除装置103包含喷管1031,喷管1031通过管线112连接至流体源113;当拣选装置102通过吸嘴1021吸附不良晶粒106a并移动至非接触式排除装置103时,流体源113提供喷管1031使用一流体,以排除吸嘴1021上的不良晶粒;流体源113为一气体源、一液体源或以上两者之一,通过流体源113所供给的气体或液体传送至喷管1031,通过喷管1031的出口喷出,进而将不良晶粒106a排除,以利于后续处理。在一实施例中,气体可为一般的空气、惰性气体或其它气体。在一实施例中,液体可为水或其它液体。Fig. 3 is the side view of the non-contact type removal device of Fig. 1; Please refer to Fig. 1 and Fig. 3 simultaneously, non-contact
在另一实施例中,排除装置可为接触式排除装置104,如图1右上角部分所示;接触式排除装置104利用直接接触方式,例如以直接接触器与不良晶粒106a相互接触,使不良晶粒106a从吸嘴1021脱落;其中,直接接触器为毛刷10401、弹性软板或其它的弹性材料,以在与吸嘴1021接触时,避免破坏拣选装置102的结构。弹性软板为一橡胶软板、PU软板或其它同等材料的软板。图4到图6分别为接触式排除装置的三种实施示意图,在此,为了叙述方便,直接接触器以毛刷10401作为范例;请参照图1及图4,接触式排除装置104包含毛刷10401、基部10406及置放机构10408;基部10406具有两端,毛刷10401位于基部10406的一端上,而基部10406的另一端放置于置放机构10408的通孔上,以螺丝锁固、黏胶固定等方式固定,此外,基部10406与置放机构10408也可为一体成型制作;在吸嘴1021移动至排除区时,通过将置放机构10408放置在吸嘴1021移动轨迹上,使毛刷10401与吸嘴1021直接接触,以排除吸嘴1021上的不良晶粒106a。In another embodiment, the removal device can be a
请参照图1及图5,接触式排除装置104包含毛刷10401、基部10406、滑轨10409及动子10410;基部10406具有两端,毛刷10401位于基部10406的一端上,而基部10406的另一端连接于动子10410的通孔10411上,以螺丝锁固、黏胶固定等方式,连接于动子10410上,此外,基部10406与动子10410也可为一体成型制作;动子10410套在滑轨10409外,限制动子10410在滑轨10409的水平方向(图5的箭头方向)移动,通过气压缸、电磁阀或其它水平移动的装置,使动子10410进行水平方向移动;在吸嘴1021移动至排除区时,通过动子10410在滑轨10409进行水平移动,带动毛刷10401至吸嘴1021的移动轨迹上,使毛刷10401与吸嘴1021直接接触,排除吸嘴1021上的不良晶粒106a。除了气压缸、电磁阀外,依照机构设计的多样性,也可以螺杆、皮带等连动装置,连接在一马达及动子10410之间,其中马达为步进马达、伺服马达,通过步进马达或伺服马达带动连动装置,进而带动毛刷10401作水平移动。Please refer to Fig. 1 and Fig. 5, contact-
图7为图6中接触式排除装置的上视图,请参照图1、图6及图7,接触式排除装置104包含毛刷10401、基部10406、外框10402、横杆10403、二连动螺丝10405及马达(未图示)。基部10406具有两端,毛刷10401位于基部10406的一端上,而基部10406的另一端连接在横杆10403的一通孔10404上,基部10406通过放置在通孔10404中,以螺丝锁固、黏胶固定等方式,连接于驱动装置横杆10403上,此外,基部10406与横杆10403也可为一体成型制作;外框10402具有两相对设置的支撑板,在支撑板上各具有一穿洞,将二连动螺丝10405穿设于两支撑板的穿洞,并锁固横杆10403的两端,以固定横杆10403于两支撑板之间。为了降低外框10402制作的复杂度,如图7所示,将外框10402设计成中空方形或矩形机构,以有效控制两支撑板的距离,将横杆10403置于外框10402内部。马达为步进马达、伺服马达,其连接至连动螺丝10405,通过马达带动连动螺丝10405呈顺时钟或逆时钟旋转。在吸嘴1021移动至排除区时,通过马达动作,连动螺丝10405呈顺时钟或逆时钟旋转,连带使毛刷10401在外框10402内呈顺时钟或逆时钟旋转,至吸嘴1021的移动轨迹上,使毛刷10401与吸嘴1021直接接触,以排除吸嘴1021上的不良晶粒106a。本实施例中,毛刷10401可为多个,通过马达带动多个毛刷10401进行顺时钟或逆时钟旋转,以排除吸嘴1021上的不良晶粒106a。多个毛刷10401分别置于多个基部10406一端上,通过将多个基部10406的另一端连接在横杆10403的通孔10404上,将毛刷10401及基部10406固定于横杆10403上。Fig. 7 is a top view of the contact removal device in Fig. 6, please refer to Fig. 1, Fig. 6 and Fig. 7, the
请参照图1,不良晶粒挑选机还包含一收取装置,收取装置作为不良晶粒收取之用,故在非接触式排除装置103与接触式排除装置104的功能均相同。以下仅以非接触式排除装置103为例说明,请同时参照图1及图3,收取装置114具有本体1141以及凹部1142,并放置在临近喷管1031处;凹部1142形成在本体1141的上表面,在喷管1031喷出流体排除吸嘴1021上的不良晶粒106a后,不良晶粒106a将掉落在凹部1142中。非接触式排除装置103及收取装置114可以分开,也可以设计成一体成型,如图3即是非接触式排除装置103及收取装置114一体成型的侧视图,喷管1031设置在凹部1142的侧壁上且位于凹部1142之中。Please refer to FIG. 1 , the bad grain sorting machine also includes a collecting device for collecting bad grains, so the functions of the non-contact removing
请参照图1,在吸嘴1021吸附不良晶粒106a,使其从胶膜107移除时,会使吸嘴1021及不良晶粒106a感应产生静电,此类静电极易造成不良晶粒106a更加难以从吸嘴1021排除,因此,在本发明的一实施例中,排除装置上可附加静电去除装置。Please refer to FIG. 1, when the
请参照图1,以非接触式排除装置103为例,喷管1031所连接的流体源113,在使用气体源时,可设置一离子产生装置,以产生一离子气体作为流体源113所供应的流体,而离子气体除了排除吸嘴1021上不良晶粒106a以外,同时具有将吸嘴1021上的静电排除的功能。其中,离子产生装置为一具有带电荷的物体,例如离子针,通过静电枪或静电风扇等静电去除装置的原理,即当离子产生装置通过外接电源,使离子产生装置电晕放电,以使通过的气流电离为大量正负离子,使离子风快速吹向需除静电区域将静电中和。当然,在使用流体源113的同时,流体源113并非离子气体的状态下,不良晶粒挑选机也可使用静电枪或静电风扇等静电去除装置,对吸嘴1021进行静电排除。静电去除装置并没有特定的位置,只要吸嘴1021能接触静电去除装置所产生的离子气体即可。Please refer to Fig. 1, taking the non-contact
请参照图4至图6,接触式排除装置104可附加接地线10407,将静电导离,接地线10407连接于不良晶粒挑选机的机台表面或电源插座的接地点,与接触式排除装置104之间。此外,不良晶粒挑选机可使用静电枪或静电风扇等静电去除装置,对吸嘴1021进行静电排除。静电去除装置并没有特定的位置,只要吸嘴1021接触静电去除装置所产生的离子气体即可。Please refer to Fig. 4 to Fig. 6, the
在另一实施例中,如图8所示,本发明提供的一种不良晶粒挑选方法;在本发明的不良晶粒挑选方法中,首先在步骤201备置操作基座,用以置放多个晶粒在其上;之后,在步骤202通过拣选装置,吸附上述操作基座上晶粒中的不良晶粒;请参照图1,在此步骤中,不良晶粒需通过顶针器105戳破胶膜107以将不良晶粒106a顶起并同时配合拣选装置102吸附不良晶粒106a,才能将不良晶粒106a吸附至拣选装置102上;然后,可以进行步骤203或步骤204,在步骤203通过流体喷除拣选装置上的不良晶粒,而在步骤204通过直接接触器与拣选装置的吸嘴相互接触,以排除吸嘴上的不良晶粒,步骤203所述即是使用非接触式排除装置103,通过流体喷除拣选装置102上的不良晶粒106a,步骤204所述则是使用接触式排除装置104,通过直接接触器与拣选装置102的吸嘴1021相互接触,以排除拣选装置102上的不良晶粒106a。在步骤204中,直接接触器根据图4至图6,可有三种的实施方法,一是将直接接触器放置在一置放机构上,使直接接触器固定在置放机构上,并放置在吸嘴移动轨迹上,使直接接触器与吸嘴直接接触;第二种方法是将直接接触器连接在一动子上,通过驱动装置带动动子于滑轨上进行水平移动,进而带动直接接触器水平动作,以与吸嘴相互接触;第三种方法为将直接接触器连接于一横杆上,并在外框的二相对支撑板上形成二相对穿洞,再将二连动螺丝穿设穿洞并锁固横杆的两端,通过驱动装置带动连动螺丝转动,进而带动直接接触器转动,以与吸嘴相互接触。In another embodiment, as shown in FIG. 8 , a method for selecting bad grains provided by the present invention; A plurality of crystal grains are on it; afterward, in
本发明提供的不良晶粒挑选机,在拣选不良晶粒的同时,通过接触式或非接触式的排除装置,克服因吸嘴上附着残余黏胶,导致不良晶粒黏滞在吸嘴上而无法排除的问题。而且,通过排除装置上所附加的静电去除装置将吸嘴上的静电去除,可提升不良晶粒的排除效率。此外,本发明的不良晶粒挑选机的接触式排除装置,通过直接接触器与吸嘴直接的相互接触,实际的排除能力较非接触式排除装置佳,可以提升排除效率。The bad grain sorting machine provided by the present invention, while sorting bad grains, through contact or non-contact exclusion device, overcomes the sticking of bad grains on the suction nozzle due to residual glue on the suction nozzle and cannot Excluded issues. Moreover, the static electricity on the suction nozzle can be removed by the static electricity removal device attached to the removal device, which can improve the removal efficiency of bad crystal grains. In addition, the contact type removal device of the bad grain sorting machine of the present invention directly contacts the suction nozzle through the direct contactor, and the actual removal ability is better than that of the non-contact type removal device, which can improve the removal efficiency.
以上所述,仅为本发明较佳的具体实施方式,但本发明的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本发明揭露的技术范围内,可轻易想到的变化或替换,都应涵盖在本发明的保护范围的内。因此,本发明的保护范围应该以权利要求的保护范围为准。The above is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any person skilled in the art within the technical scope disclosed in the present invention can easily think of changes or Replacement should be covered within the protection scope of the present invention. Therefore, the protection scope of the present invention should be determined by the protection scope of the claims.
Claims (26)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNA2008100978358A CN101579856A (en) | 2008-05-16 | 2008-05-16 | Bad crystal grain selecting machine and method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNA2008100978358A CN101579856A (en) | 2008-05-16 | 2008-05-16 | Bad crystal grain selecting machine and method thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
CN101579856A true CN101579856A (en) | 2009-11-18 |
Family
ID=41362234
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2008100978358A Pending CN101579856A (en) | 2008-05-16 | 2008-05-16 | Bad crystal grain selecting machine and method thereof |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN101579856A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104550054A (en) * | 2014-12-29 | 2015-04-29 | 苏州凯锝微电子有限公司 | Grain crystal sorting device |
CN104550055A (en) * | 2014-12-30 | 2015-04-29 | 苏州凯锝微电子有限公司 | Crystal grain sorting machine |
CN106269585A (en) * | 2016-07-14 | 2017-01-04 | 无锡宏纳科技有限公司 | The instrument of defective crystal grain is selected by photographic head |
CN106328555A (en) * | 2016-08-26 | 2017-01-11 | 扬州杰盈汽车芯片有限公司 | Magnetic force ink jet test technology applied to semiconductor |
CN107556571A (en) * | 2016-07-01 | 2018-01-09 | 兴美实业公司 | Rubber product, suction nozzle thereof and preparation process |
CN110211898A (en) * | 2019-05-08 | 2019-09-06 | 深圳市中科智诚科技有限公司 | A kind of stable type chip sorting equipment with function of eliminating static |
CN110538811A (en) * | 2018-05-29 | 2019-12-06 | 惠特科技股份有限公司 | Automatic edge-emitting laser dual-temperature synchronous detection and classification equipment |
CN112110192A (en) * | 2019-06-20 | 2020-12-22 | 矽电半导体设备(深圳)股份有限公司 | LED core particle sorting method |
CN112317339A (en) * | 2020-09-10 | 2021-02-05 | 中国石油大学(华东) | A kind of LED chip sorting system and sorting method |
TWI743870B (en) * | 2020-07-06 | 2021-10-21 | 友達光電股份有限公司 | Mapping arrangement mechanism |
-
2008
- 2008-05-16 CN CNA2008100978358A patent/CN101579856A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104550054A (en) * | 2014-12-29 | 2015-04-29 | 苏州凯锝微电子有限公司 | Grain crystal sorting device |
CN104550055A (en) * | 2014-12-30 | 2015-04-29 | 苏州凯锝微电子有限公司 | Crystal grain sorting machine |
CN107556571A (en) * | 2016-07-01 | 2018-01-09 | 兴美实业公司 | Rubber product, suction nozzle thereof and preparation process |
CN106269585A (en) * | 2016-07-14 | 2017-01-04 | 无锡宏纳科技有限公司 | The instrument of defective crystal grain is selected by photographic head |
CN106328555A (en) * | 2016-08-26 | 2017-01-11 | 扬州杰盈汽车芯片有限公司 | Magnetic force ink jet test technology applied to semiconductor |
CN110538811A (en) * | 2018-05-29 | 2019-12-06 | 惠特科技股份有限公司 | Automatic edge-emitting laser dual-temperature synchronous detection and classification equipment |
CN110211898A (en) * | 2019-05-08 | 2019-09-06 | 深圳市中科智诚科技有限公司 | A kind of stable type chip sorting equipment with function of eliminating static |
CN110211898B (en) * | 2019-05-08 | 2021-06-04 | 常州市工业互联网研究院有限公司 | A stable chip sorting device with static elimination function |
CN112110192A (en) * | 2019-06-20 | 2020-12-22 | 矽电半导体设备(深圳)股份有限公司 | LED core particle sorting method |
TWI743870B (en) * | 2020-07-06 | 2021-10-21 | 友達光電股份有限公司 | Mapping arrangement mechanism |
CN112317339A (en) * | 2020-09-10 | 2021-02-05 | 中国石油大学(华东) | A kind of LED chip sorting system and sorting method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101579856A (en) | Bad crystal grain selecting machine and method thereof | |
CN102254764B (en) | Bearing device of component | |
KR101514461B1 (en) | Method and apparatus for cutting protective tape of semiconductor wafer | |
KR20170054371A (en) | Die bonder and bonding method | |
WO2017094388A1 (en) | Method for cleaning chamber of substrate processing apparatus | |
KR20070074426A (en) | Cleaning Equipment for Semiconductor Manufacturing Process | |
TWI306361B (en) | System for eliminating electrostatic charges | |
JP6064831B2 (en) | Test equipment, test method | |
JP2012086301A (en) | Apparatus and method for producing semiconductor | |
JP2010129776A (en) | Processing device and ionized-air supply program | |
TWI364812B (en) | Bad die sorter and method of the same | |
CN113286438A (en) | Vertical equipment | |
CN110062667B (en) | Contact type brush cleaner | |
CN110869155B (en) | Welding device and welding system | |
CN208661553U (en) | A kind of silicon wafer painting source device | |
CN102059842B (en) | Separation device and separation method thereof | |
JP2004356240A (en) | Electronic component packaging equipment | |
CN116833886A (en) | Equipment and method for increasing adhesive force of metal coating on silicon substrate | |
CN207343397U (en) | Non-contact cleaning equipment | |
US20120017938A1 (en) | Platen cleaning | |
KR102440451B1 (en) | Semiconductor Package Processing Apparatus | |
KR102431793B1 (en) | Align apparatus of laminating sheet for ultra thin glass | |
TWI626506B (en) | Non-contact reticle/wafer cleaning device | |
CN110560327A (en) | Silicon wafer coating source device | |
JP6385144B2 (en) | Processing equipment |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C12 | Rejection of a patent application after its publication | ||
RJ01 | Rejection of invention patent application after publication |
Open date: 20091118 |