CN101504925B - Optical position measurement apparatus and method - Google Patents
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Abstract
The invention provides a device and a method for measuring the optical position. The method comprises the following steps: adopting a grating diffraction order enhancing method, namely regularly changing the breadth of a grating bar and the depth of a grating slot to obtain a corresponding diffraction order enhanced grating so as to enhance a position measurement signal. The measuring device adopts the grating with two types of cycles as reference marks, namely a first grating and a second grating, uses the light intensity changes modulated by the reference marks after the +/-1 order diffraction light coherent imaging of the first grating and the second grating to obtain large-scale position capture through phase information of a transmitted light signal, simultaneously uses one of the grating to perform enhancement of a corresponding diffraction order, and uses coherent image scanning of the enhanced high diffraction order to perform precise position measurement. Compared with the prior art, the reference marks adopt a grating diffraction order enhancing technique to achieve the position alignment precision, thus the method can support two-dimensional marks and one-dimensional marks.
Description
Technical field
The present invention relates to the apparatus and method of a kind of location of workpiece measurement and position alignment, particularly a kind of optical position measuring device and method.
Background technology
In manufacture of semiconductor, each step all needs location positioning accurately.Optical position measuring device under the present invention and method are applicable to two objects that detection moves relative to each other at least on a direction of measurement position.Position-measurement device comprises the measuring basis mark on measuring system and the measuring object, this measuring basis mark is made up of multi-form phase grating, and moving according to measuring object, be the reference signal that measurement mechanism produces position measurement that moves through of measuring basis mark, carry out the position alignment of position measurement and two measuring objects.This method of measurement can be used for the position measurement of single workpiece and the position alignment of two workpiece.
U.S. Pat 6803291 discloses a kind of top layer that makes alignment area in photoetching process smooth method that is kept perfectly behind cmp, wherein, this patent also disclosed on the semiconductor-based end has alignment mark, but this alignment mark only is one group of groove that structure is identical.
The present invention proposes according to above-mentioned background, uses the vicissitudinous phase grating of groove depth as reference mark, carries out the measurement and the position alignment of registration signal by optical measurement.
Summary of the invention
The invention provides a kind of optical position measuring device and method, adopted the method for a kind of optical grating diffraction level time enhancing, promptly width and the height by clocklike changing gratings strips obtains the corresponding order of diffraction time enhancement mode grating, and position measurement signal is enhanced.Measurement mechanism adopts the grating in two kinds of cycles as reference mark, first grating and second grating, utilize first grating and second grating ± 1 order diffraction light coherent imaging after the light intensity of reference marker modulation changes, obtaining large-scale position by the phase information of optical signal transmissive catches, utilize one of them grating to carry out the inferior enhancing of the corresponding order of diffraction simultaneously, utilize the high diffracting grade time relevant image scanning after strengthening to carry out the exact position measurement.
Optical position measuring device of the present invention comprises: reference mark, to be located on the measuring object, and described reference mark comprises the different grating of many groups; Light source module provides the light of two wavelength X 1, λ 2; Lighting module transmits the light of described two wavelength, shines on the described reference mark, and transmits the diffraction light of described reference mark; Image-forming module receives described diffraction light, obtains the grating picture of coherent imaging; Detecting module, the order of diffraction of surveying described grating picture is inferior, is converted to the grating image signal; Signal processing and locating module receive described grating image signal.
Optical position-measurement method of the present invention comprises: reference mark is located on the measuring object, and described reference mark comprises the different grating of many groups; Use light source module, the light of two wavelength X 1, λ 2 is provided; Use lighting module, transmit the light of described two wavelength, shine on the described reference mark, and transmit the diffraction light of described reference mark; Use image-forming module, receive described diffraction light, obtain the grating picture of coherent imaging; Use detecting module, the order of diffraction of surveying described grating picture is inferior, is converted to the grating image signal; Use signal processing and locating module, receive described grating image signal.
Compared with prior art, reference mark of the present invention adopts optical grating diffraction level time enhancement techniques, and utilize the grating ± 1 order diffraction light coherent imaging scanning of two kinds of different cycles to carry out the measuring position and catch, the relevant image scanning of the corresponding order of diffraction time enhancing by one of them grating carries out the exact position measurement, the position alignment precision that has realized by this method, this method can support two-dimensional marker and one dimension mark.
For above-mentioned feature and advantage of the present invention can be become apparent, preferred embodiment cited below particularly, and conjunction with figs. are described in detail below.
Description of drawings
Fig. 1 a is depicted as the structural representation of the used 2 stage enhancement type gratings of optical position measuring device of the present invention.
Fig. 1 b is depicted as the used 2 stage enhancement type grating diffration Energy distribution analogous diagram of optical position measuring device of the present invention.
Fig. 1 c is depicted as the structural representation of the used 2 grade standard gratings of optical position measuring device of the present invention.
Fig. 1 d is depicted as the used 2 grade standard grating diffration Energy distribution analogous diagram of optical position measuring device of the present invention.
Fig. 2 a is depicted as the structural representation of the used 3 stage enhancement type gratings of optical position measuring device of the present invention.
Fig. 2 b is depicted as the used 3 stage enhancement type grating diffration Energy distribution analogous diagram of optical position measuring device of the present invention.
Fig. 3 a is depicted as the used directions X one dimension of optical position measuring device of the present invention reference mark 300X schematic diagram.
Fig. 3 b is depicted as the used Y direction of optical position measuring device of the present invention one dimension reference mark 300Y schematic diagram.
Figure 4 shows that the used two-dimentional reference mark schematic diagram of optical position measuring device of the present invention.
Figure 5 shows that the used reference mark corresponding reference of optical position measuring device of the present invention mark structure schematic diagram.
Figure 6 shows that optical position measuring device structural representation of the present invention.
Figure 7 shows that optical position measuring device frequency plane of the present invention filtering and light deflection device architecture and effect schematic diagram.
Figure 8 shows that the signal scanning structural representation after optical position-measurement method of the present invention is through gain.
Embodiment
In order more to understand technology contents of the present invention, especially exemplified by specific embodiment and cooperate appended graphic being described as follows.
Fig. 1 a is depicted as the structural representation of the used 2 stage enhancement type gratings of optical position measuring device of the present invention.Fig. 1 b is depicted as the used 2 stage enhancement type grating diffration Energy distribution analogous diagram of optical position measuring device of the present invention.Fig. 1 c is depicted as the structural representation of the used 2 grade standard gratings of optical position measuring device of the present invention.Fig. 1 d is depicted as the used 2 grade standard grating diffration Energy distribution analogous diagram of optical position measuring device of the present invention.Shown in Fig. 1 a, 1b, 1c, 1d, strengthening the inferior principle of the corresponding order of diffraction of grating is the groove depth that clocklike changes grating, promptly reaches wild phase by the change phase place and answers diffraction efficiency.As can be seen according to the groove depth difference, can be divided into large period grating P2 and minor cycle grating P1 from Fig. 1 a, wherein the grating P1 cycle is 1/2nd of grating P2.The grating P1 cycle is the distance between the adjacent gratings groove, and the grating P2 cycle is adjacent than the distance between the dark grating groove of deep trouth, as shown in Figure 1a.Fig. 1 b is the analogous diagram of grating diffration Energy distribution shown in Fig. 1 a.Fig. 1 c is to be that P2 and duty ratio are 1: 1 master grating in the cycle.Fig. 1 d is the analogous diagram of grating diffration Energy distribution shown in Fig. 1 c.From the analogous diagram of optical grating diffraction Energy distribution shown in Fig. 1 b, the 1d relatively as can be seen, the 2 order diffraction light of grating large period P2 (minor cycle grating one-level) diffraction efficiency has obtained enhancing.
The groove depth of grating can be by following setting: the groove depth of minor cycle grating P1 can be set at (2k-1) * λ/4 (k=1,2,3.....); Large period grating P2 groove depth with respect to the groove depth of minor cycle grating P1 trench bottom be (2k-1) * λ/4 (k=1,2,3.....), usually according to photoetching process with can be set at λ/4 by realization degree.
Fig. 2 a is depicted as the structural representation of the used 3 stage enhancement type gratings of optical position measuring device of the present invention.Fig. 2 b is depicted as the used 3 stage enhancement type grating diffration Energy distribution analogous diagram of optical position measuring device of the present invention.The principle of the 3 stage enhancement type gratings that optical position measuring device of the present invention is used is identical with 2 stage enhancement type gratings, but has strengthened the corresponding 3 order diffraction efficient of grating.
Fig. 3 a is depicted as the used directions X one dimension of optical position measuring device of the present invention reference mark 300X schematic diagram.Fig. 3 b is depicted as the used Y direction of optical position measuring device of the present invention one dimension reference mark 300Y schematic diagram.Shown in Fig. 3 a, 3b, wherein grating 301,303 is the grating of structure described in Fig. 1 a-1d, Fig. 2 a and Fig. 2 b, is that P1, P2 grating are formed by the cycle, and grating 302,304 is the monocycle grating, and the cycle is P3.Use the 1 order diffraction light (the 1 order diffraction light of P1 is same as senior the diffraction light of P2) of grating P1, P2 and P3 in the measuring process.By the cycle is that 1 order diffraction light coherent imaging of P2, P3 grating carries out position bigness scale amount, be that the position measuring range is caught, utilize the cycle accurately to measure, measure and alignment function to finish the optical position measuring device high precision position for 1 order diffraction light coherent imaging of P1 grating carries out the position.
Capture range is expressed as P3 * P2/[2 (P3-P2)].Grating cycle P1, P2 are more or less the same, and (1 ± r%) P1, wherein the r value is between 5 to 15 generally to get P2=.For example, the large period P2 of grating 301,303 is 12um, and grating 302,304 cycle P3 are 13um, and then capture range is 78um.Minor cycle P1＜the P2 of grating 301,303, and P1＜P3 are used for position accurate measurement amount and aligning.For example, the minor cycle P1 of grating 301,303 can be 2 μ m.
Three groups of grating cycles of this optical position measuring device reference mark can be according to filtering deviation requirement on requirement of optical position measuring device alignment precision and the frequency plane, carry out suitable cycle coupling, can produce the registration signal with strong Technological adaptability, high sensitivity and high s/n ratio, the optical position measuring device repeatability precision can reach 3-5nm.
Figure 4 shows that the used two-dimentional reference mark schematic diagram of optical position measuring device of the present invention.As shown in Figure 4, the used two-dimentional reference mark 400 of optical position measuring device of the present invention, wherein grating 401,402 is used for the directions X position and catches and aim at, and grating 403,404 is used for Y direction position and catches and aim at.
In addition, reference mark of the present invention can further include the 4th grating that the cycle is different from above-mentioned three groups of gratings, even more grating.
Figure 5 shows that the used reference mark corresponding reference of optical position measuring device of the present invention mark structure schematic diagram.As shown in Figure 5, reference marker comprises six groups of amplitude gratings: grating 501, grating 502, grating 503, grating 504, grating 505 and grating 506, correspond respectively to 301 and 401 cycle P2, the grating 302,402 of reference mark grating 301 and 401 cycle P1, grating, the diffraction ± 1 grade grating picture of fiducial mark grating 303 and 403 cycle P1, grating 303,403 cycle P2, grating 304,404.Six groups of amplitude gratings along the length of cycle direction can be slightly less than or also can greater than correspondence ± length of 1 grade of reference mark grating picture.Be respectively arranged with the Transmission Fibers bundle behind six groups of amplitude gratings, comprise optical fiber 507,508,509,510,511 and 512, the transmitted light of respectively organizing grating of reference marker is transferred to the corresponding photo detector array, in the reference mark scanning process, obtain the registration signal of reference mark X and Y direction, as shown in Figure 8, comprise grating alignment signal P1, grating alignment signal P2 and grating alignment signal P3 after the process gain process.
Figure 6 shows that optical position measuring device structural representation of the present invention.This optical position measuring device mainly is made up of light source module, lighting module, image-forming module, detecting module, signal processing and locating module (not illustrating among the figure) etc.Light source module mainly comprises light source, shutter, optical isolator and the radio frequency modulator (not illustrating among the figure) that two wavelength are provided.Lighting module comprises Transmission Fibers and lamp optical system.Image-forming module mainly comprises: the object lens 611 of large-numerical aperture, beam splitter 614, bi-directional beam divider 618, space filtering deflection device 619, space filtering deflection device 624 and lens 620, lens 625.Detecting module comprises reference marker 621, reference marker 626, Transmission Fibers 616, Transmission Fibers 622, Transmission Fibers 627, CCD camera 617 and photodetector 623, photodetector 628.Signal processing and locating module mainly comprise photosignal conversion and amplification, analog-to-digital conversion and digital signal processing circuit etc.
The optical position measuring device principle is: the light beam 601 of light source module output (comprises two kinds of choosing wavelengths, also can use simultaneously) enter light beam bundling device 602, be transferred to the polarizer 604 via monofilm polarization maintaining optical fibre 603, lens 605, illuminating aperture diaphragm 606 and lens 607, reflecting prism 608 on dull and stereotyped 609 impinges perpendicularly on the object lens 611 that achromatic λ/4 wave plates 610 enter large-numerical aperture (4F lens preceding group) then, light beam is assembled through the object lens 611 of large-numerical aperture and is shone on the reference mark 612 concurrent gaining interest and penetrate, 612 at different levels diffraction lights of reference mark return along former road and enter beam splitter 614 through dull and stereotyped 609, beam splitter 614 reflexes to the CCD light path through lens 615 with the sub-fraction diffraction light through plated film reflecting surface 613, Transmission Fibers 616, image in and be used to observe reference mark imaging situation on the CCD617, another part diffraction light along the light path transmissive by 618 two kinds of wavelength light beams of Amici prism separately, enter different light paths respectively, through corresponding space filtering deflection device 619, the diffraction lighting level that 624 selections of space filtering deflection device need is inferior, in embodiments of the present invention, be respectively each grating ± 1 order diffraction light, and scioptics 620, lens 625, the object lens 611 of large-numerical aperture (4F lens back group) become the corresponding order of diffraction time interference of light picture at reference marker 621, on 626, the reference mark order of diffraction time interference image is via reference marker 621, the signal that 626 scannings obtain is through Transmission Fibers 622,627 are transported to photodetector 623,628 carry out acquisition of signal.
Figure 7 shows that optical position measuring device frequency plane of the present invention filtering and light deflection device architecture and effect schematic diagram.As shown in Figure 7, diffraction takes place in light beam irradiates behind the reference mark grating, and light beam is divided into many beamlets, and these light beams become different angle [alpha] with relative grating normal
n(not shown) penetrates, and wherein said angle is defined by the optical grating diffraction equation:
Sinα
n＝nλ/P
Wherein n is that the diffraction lighting level is inferior, and P is the grating cycle.
The path of optical grating reflection beamlet and lens combination L1 (object lens 611 of large-numerical aperture) merge, and this lens combination changes the different directions of beamlet on the frequency plane WEP diverse location d
n:
d
n＝f*α
n
On this plane, for the coherent imaging position with different beamlets separately is provided with filtering deflection device WEP, its effect allows large period grating P2, P3 ± 1 order diffraction light not change direction and vertically to pass through, realize by filtering hole or plate glass w2, w2`, allow grating P1 ± 1 order diffraction light passes through to the certain angle of equidirectional deviation, realizes that the device of deviation can be wedge w1, w1`.The angle of concrete deviation can be decided as the actual range needs that separate separately according to grating on the image planes, and the light deflection angle of wedge w1, w1` should be identical generally speaking.
Beamlet is through after the filtering and deviation of frequency plane, through imaging on the reference marker face behind the lens combination L2 (lens 620, lens 625), wherein grating P1, P2, P3 image in respectively on reference marker G1, G2, the G3, carry out the detection of grating picture and corresponding reference marker sweep signal through thereafter highly sensitive photodetector D1, D2, D3.
Figure 8 shows that the signal scanning structural representation after optical position-measurement method of the present invention is through gain.As shown in Figure 8, wherein scanning probe signal SP2, SP3 are used for the position coarse alignment, and promptly catch the position, and scanning probe signal SP1 is used for the position and accurately aims at.
Though the present invention discloses as above with preferred embodiment; right its is not in order to limit the present invention; have in the technical field under any and know the knowledgeable usually; without departing from the spirit and scope of the present invention; when can doing a little change and retouching, so protection scope of the present invention is as the criterion when looking claims person of defining.
Claims (24)
1. an optical position measuring device comprises
Reference mark is located on the measuring object;
Light source module provides the light of two wavelength X 1, λ 2;
Lighting module transmits the light of described two wavelength, shines on the described reference mark, and transmits the diffraction light of described reference mark;
Image-forming module receives described diffraction light, obtains the grating picture of coherent imaging;
Detecting module is surveyed described grating picture and corresponding reference light scanning gate signal;
Signal processing and locating module receive and handle described grating picture and corresponding reference light scanning gate signal;
It is characterized in that: described reference mark is made up of the phase grating in two kinds of cycles, and wherein the raster width of the phase grating in any cycle and grating depth are the rule variation, and is inferior in order to strengthen the corresponding order of diffraction.
2. optical position measuring device according to claim 1 is characterized in that, two kinds of periods phase grating of described reference mark comprise many group phase gratings.
3. optical position measuring device according to claim 2 is characterized in that the groove depth of described phase grating differs the integral multiple of λ/4 or λ/4.
4. optical position measuring device according to claim 1 is characterized in that, the cycle of described two kinds of periods phase grating meets P3=, and (1 ± r%) P1, wherein P1, P3 are described two kinds of periods phase grating cycles, and the r value is between 5 to 15.
5. optical position measuring device according to claim 1 is characterized in that, the grating face of described two kinds of periods phase grating is in the same plane.
6. optical position measuring device according to claim 1 is characterized in that, every group of phase grating is according to the gratings strips width of the level that will strengthen time this group grating of adjusting and the frequency that grating depth changes in the phase grating in described two kinds of cycles.
7. an optical position measuring device comprises
Alignment mark is located on the measuring object;
Light source module provides the light of two wavelength X 1, λ 2;
Lighting module transmits the light of described two wavelength, shines on the described alignment mark, and transmits the diffraction light of described alignment mark;
Image-forming module receives described diffraction light, obtains the grating picture of coherent imaging;
Detecting module is surveyed described grating picture and corresponding reference light scanning gate signal;
Signal processing and locating module receive and handle described grating picture and corresponding reference light scanning gate signal;
It is characterized in that: described alignment mark is by strengthening the composite marking that high diffracting grade time phase place grating and monocycle phase grating form; Described enhancing high diffracting grade time phase place grating is made up of the phase grating in two kinds of cycles, and wherein raster width and grating depth are the rule variation in the phase grating in any cycle, and is inferior in order to strengthen the corresponding order of diffraction.
8. optical position measuring device according to claim 7 is characterized in that, described enhancing high diffracting grade time phase place grating and monocycle phase grating are formed unidirectional one dimension alignment mark.
9. optical position measuring device according to claim 8 is characterized in that, described one dimension alignment mark is level or vertical direction is arranged.
10. optical position measuring device according to claim 7 is characterized in that, described enhancing high diffracting grade time phase place grating and monocycle phase grating are formed cross two-dimensional alignment mark.
11. optical position measuring device according to claim 7 is characterized in that, described light source module comprises shutter, optical isolator and radio frequency modulator.
12. optical position measuring device according to claim 7 is characterized in that, described detecting module survey diffraction light ± 1 grade and strengthen after high diffracting grade.
13. optical position measuring device according to claim 7 is characterized in that, described signal processing and locating module comprise photosignal conversion and amplification, analog-to-digital conversion and digital signal processing circuit.
14. optical position measuring device according to claim 7 is characterized in that, described image-forming module comprises beam splitter, bi-directional beam divider, space filtering deflection device and lens.
15. optical position measuring device according to claim 14 is characterized in that, described detecting module comprises reference marker, Transmission Fibers, CCD camera and photodetector.
16. optical position measuring device according to claim 15 is characterized in that, described reference marker is an amplitude grating, and the cycle of described amplitude grating is identical with the cycle and the position of respective aligned mark phase grating interference image with the position.
17. optical position measuring device according to claim 15 is characterized in that, by regulating the deviation angle of the above space filtering deflection device of frequency plane, realize described reference marker sub-gratings location swap and move.
18. an optical position-measurement method comprises
Reference mark is located on the measuring object, and described reference mark is made up of the phase grating in two kinds of cycles, and wherein raster width and grating depth are the rule variation in the phase grating in any cycle, and is inferior in order to strengthen the corresponding order of diffraction;
Use light source module, the light of two wavelength X 1, λ 2 is provided;
Use lighting module, transmit the light of described two wavelength, shine on the described reference mark, and transmit the diffraction light of described reference mark;
Use image-forming module, receive described diffraction light, obtain the grating picture of coherent imaging;
Use detecting module, survey described grating picture and corresponding reference light scanning gate signal;
Use signal processing and locating module, receive described grating as sweep signal.
19. optical position-measurement method according to claim 18, it is characterized in that, the capture range of the position of described optical position-measurement method meets P3 * P2/[2 (P3-P2)], wherein P3 has wild phase to answer that the order of diffraction time grating ± 1 order diffraction grating is as the cycle in the phase grating in described two kinds of cycles, and P2 is the monocycle phase grating in described two kinds of periods phase grating.
20. optical position-measurement method according to claim 18 is characterized in that, described detecting module comprises reference marker, Transmission Fibers, CCD camera and photodetector.
21. optical position-measurement method according to claim 20 is characterized in that, described is amplitude grating with reference to grating, and the cycle of described amplitude grating is identical with the cycle and the position of the corresponding order of diffraction of corresponding base quasi-mark grating time interference image with the position.
22. optical position-measurement method according to claim 20 is characterized in that, each amplitude grating of described reference marker carries out signal scanning with corresponding reference mark diffraction light interference image and obtains corresponding sweep signal.
23. optical position-measurement method according to claim 19, it is characterized in that, on the basis of catching in described position, utilize the phase information of the corresponding enhancing order of diffraction time grating picture with enhancement mode grating and the signal that obtains with reference to raster scan accordingly to carry out the exact position and measure.
24. optical position-measurement method according to claim 18 is characterized in that, described signal processing and locating module comprise photosignal conversion and amplification, analog-to-digital conversion and digital signal processing circuit.
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| DE102011075286A1 (en) * | 2011-05-05 | 2012-11-08 | Dr. Johannes Heidenhain Gmbh | Optical position measuring device |
| DE102011076055A1 (en) * | 2011-05-18 | 2012-11-22 | Dr. Johannes Heidenhain Gmbh | Optical position measuring device |
| CN102607418B (en) * | 2012-03-30 | 2014-06-11 | 中国科学院长春光学精密机械与物理研究所 | Absolute position measurement device |
| CN105151820B (en) * | 2015-06-24 | 2017-10-27 | 南京梅山冶金发展有限公司 | A kind of control method of multigroup feed bin dump car |
| DE102016200847A1 (en) * | 2016-01-21 | 2017-07-27 | Dr. Johannes Heidenhain Gesellschaft Mit Beschränkter Haftung | Optical position measuring device |
| CN106249333B (en) * | 2016-09-21 | 2019-06-21 | 安徽大学 | A narrow band stop filter |
| DE102017201257A1 (en) * | 2017-01-26 | 2018-07-26 | Dr. Johannes Heidenhain Gmbh | Position measuring device |
| JP6953242B2 (en) * | 2017-09-06 | 2021-10-27 | 株式会社ディスコ | Height detector and laser machining equipment |
| CN111505914B (en) * | 2019-01-31 | 2021-06-25 | 上海微电子装备（集团）股份有限公司 | Optical alignment device and photoetching system |
| CN111610586B (en) * | 2020-06-24 | 2022-04-29 | 中国科学院微电子研究所 | Design method and system for a diffraction grating |
| CN113885031A (en) * | 2020-07-02 | 2022-01-04 | 宁波舜宇车载光学技术有限公司 | Lidar transmitter |
| CN112420718A (en) * | 2020-11-18 | 2021-02-26 | 长江存储科技有限责任公司 | Semiconductor structure and forming method and alignment method thereof |
| CN112378934B (en) * | 2021-01-15 | 2021-09-10 | 同源微（北京）半导体技术有限公司 | Optical chip, detector and manufacturing method |
| CN112902996B (en) * | 2021-01-21 | 2022-09-30 | 中国科学院微电子研究所 | Phase grating structure with enhanced diffraction efficiency of the 9th diffraction order |
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