CN101501768B - Optical component - Google Patents
Optical component Download PDFInfo
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- CN101501768B CN101501768B CN2007800294056A CN200780029405A CN101501768B CN 101501768 B CN101501768 B CN 101501768B CN 2007800294056 A CN2007800294056 A CN 2007800294056A CN 200780029405 A CN200780029405 A CN 200780029405A CN 101501768 B CN101501768 B CN 101501768B
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- 230000003287 optical effect Effects 0.000 title abstract description 37
- 239000000463 material Substances 0.000 claims abstract description 54
- 239000004020 conductor Substances 0.000 claims abstract description 50
- 238000000576 coating method Methods 0.000 claims description 17
- 239000011248 coating agent Substances 0.000 claims description 16
- 239000002131 composite material Substances 0.000 claims description 16
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 12
- 229910003437 indium oxide Inorganic materials 0.000 claims description 9
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 9
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 7
- 239000011347 resin Substances 0.000 claims description 7
- 229920002521 macromolecule Polymers 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 4
- 239000011787 zinc oxide Substances 0.000 claims description 4
- 238000011109 contamination Methods 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 35
- 230000000694 effects Effects 0.000 description 22
- 238000002310 reflectometry Methods 0.000 description 21
- 238000012360 testing method Methods 0.000 description 20
- 238000011156 evaluation Methods 0.000 description 19
- 230000008929 regeneration Effects 0.000 description 9
- 238000011069 regeneration method Methods 0.000 description 9
- 229910000420 cerium oxide Inorganic materials 0.000 description 8
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 8
- 230000003373 anti-fouling effect Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000003595 spectral effect Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical compound [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 238000003556 assay Methods 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229920005672 polyolefin resin Polymers 0.000 description 3
- 230000001172 regenerating effect Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 235000019504 cigarettes Nutrition 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- -1 perfluoroalkyl silane Chemical compound 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000004078 waterproofing Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/121—Protecting the head, e.g. against dust or impact with the record carrier
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
- G11B7/1372—Lenses
- G11B7/1374—Objective lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Optical Head (AREA)
Abstract
The present invention relates to an optical component (1) which is provided with a base material (2) and a reflection preventing film (3) formed on an n number of layers arranged on the surface of the base material (2) so as to prevent adhesion of contamination and scratches. The reflection preventing film (3) has an (n-1)th layer(Mn-1) made of a conductive material, and a distance between the surface of the (n-1)th layer(Mn-1)and the surface of the optical component (1) is 4-20nm.
Description
Technical field
The present invention relates to have the optics of soil resistance.
Background technology
In the past,, on the optics that is used for optical take-up apparatus etc., be provided with various coatings, for example: make removing of the pollution easy water barrier that becomes by paying the optical component surfaces water proofing property from safeguarding the viewpoint of optical property; Charged by preventing optical component surfaces to prevent to enclose the stain-proofing layer of dust because of static; Or the like.In addition, this stain-proofing layer also has the function of antireflection film, has the 1st layer to the 3rd layer conductive material layer that grade is made of conductive material (for example, with reference to patent documentation 1,2) from face side.
Patent documentation 1:(Japan) spy opens clear 59-90801 communique
Patent documentation 2:(Japan) special public clear 53-28214 communique
Summary of the invention
But,, but can not prevent to enclose pollution though above-mentioned water barrier can make the pollution of enclosing remove easily.
And in the above-mentioned stain-proofing layer, when the 1st layer of face side has the situation of conductive material layer, though can prevent to enclose pollution, smearing when wiping optical component surfaces, the surface of conductive material layer, be that the surface of optics abrades easily.Especially when the optics body is macromolecule resin system,,, abrade easily so the intensity of stain-proofing layer reduces because conductive material layer is in the low temperature substrates temperature film forming below 120 ℃.
In addition, in the above-mentioned stain-proofing layer, when the 3rd layer of face side has the situation of conductive material layer, owing to also forming 2 layers of non-conductive layer near the surface than conductive material layer, so, the electric conductivity of optical component surfaces reduces, and can not get sometimes in order to prevent to enclose the sufficient charged performance that prevents of pollution.
Problem of the present invention provides a kind of optics, can prevent scratch when preventing to enclose pollution.
The invention of the 1st record is a kind of optics, have base material and the antireflection film that is located at this substrate surface, optics is characterised in that, described antireflection film has conductive material layer, this conductive material layer is made of the material with electric conductivity, and the distance on the surface of this conductive material layer and the surface of this optics is 4～20nm.
Invention according to the 1st record, because antireflection film has conductive material layer, the distance on the surface of this conductive material layer and the surface of optics is 4～20nm, so, situation when being positioned at optical component surfaces with the surface of conductive material layer is different, even smear the wiping optical component surfaces, also can prevent to abrade on this surface.In addition, kept the electric conductivity of optical component surfaces definitely, prevented chargedly, its result can prevent to enclose pollution.
Optics can be usually any as the optical element product (parts) of lens, prism, optical filtering etc.
The invention of the 2nd record is the optics of the 1st record, it is characterized in that, the sheet resistance value of this optics is a less than 10
5M Ω/.
According to the invention of the 2nd record, because the sheet resistance value of optics is a less than 10
5M Ω/, so, can prevent more properly that optical component surfaces is charged, prevents to enclose pollution.
The meaning that " " in the sheet resistance value unit is square.
The invention of the 3rd record is a kind of optics, have base material and the antireflection film that is located at this substrate surface, optics is characterised in that, described antireflection film has conductive material layer, this conductive material layer is at the inner side surface of this optics, be made of the material with electric conductivity, the sheet resistance value of this optics is a less than 10
5M Ω/.
Invention according to the 3rd record, because antireflection film has conductive material layer at the inner side surface of optics, so the situation when being positioned at optical component surfaces with the surface of conductive material layer is different,, also can prevent to abrade on this surface even smear the wiping optical component surfaces.In addition, because the sheet resistance value of optics is a less than 10
5M Ω/, so, kept the electric conductivity of optical component surfaces definitely, prevent chargedly, its result can prevent to enclose pollution.
The invention of the 4th record is the optics of any one record of the 1st～3, it is characterized in that, the thickness of described conductive material layer is 3～25nm.
According to the invention of the 4th record, because the thickness of conductive material layer is 3～25nm, so can prevent more properly that optical component surfaces is charged, prevents to enclose pollution.
The invention of the 5th record is the optics of the 4th record, it is characterized in that, the thickness of described conductive material layer is 3～18nm.
According to the invention of the 5th record, because the thickness of conductive material layer is 3～18nm, so can prevent more properly that optical component surfaces is charged, prevents to enclose pollution.
The invention of the 6th record is the optics of any one record of the 1st～5, it is characterized in that, described material with electric conductivity is a high-index material, and it is that the refractive index of light beam of 600nm is more than 1.55 for wavelength.
According to the invention of the 6th record, can access the identical effect of invention with any one record of the 1st～5.
Be that the refractive index of light beam of 600nm is more than 1.8 more preferably for wavelength.
The invention of the 7th record is the optics of the 6th record, it is characterized in that, described high-index material is the composite material that contains indium oxide system or Zinc oxide.
According to the invention of the 7th record, can access the same effect of invention with the 6th record.
The composite material of indium oxide system is the composite material that contains indium oxide at least, for example, is that the composite material with indium oxide and tin is the material of principal ingredient.The composite material of Zinc oxide is the composite material that contains zinc paste at least, for example, is that the composite material with zinc paste and gallium is the material of principal ingredient.
What is called contains, and can be to contain as a composition, also can be to contain as full composition.That is to say, can contain also and can not contain other compositions.
The invention of the 8th record is the optics of any one record of the 1st～7, it is characterized in that, described antireflection film has low-index layer, this low-index layer also near the surface of this optics, is that the low-index material of less than 1.55 constitute by the refractive index that is the light beam of 600nm than described conductive material layer to wavelength.
According to the invention of the 8th record, because antireflection film also has low-index layer near on the position of this optical component surfaces than conductive material layer, so, can prevent function by the reflection of this low-index layer raising optics.
The invention of the 9th record is the optics of the 8th record, it is characterized in that, the thickness of described low-index layer is 4～20nm.
According to the invention of the 9th record, can access the identical effect of invention with the 8th record.
The invention of the 10th record is the optics of the 8th or the 9th record, it is characterized in that, described low-index layer is positioned at the surface of this optics.
According to the invention of the 10th record, can access the identical effect of invention with the 8th or the 9th record.
The invention of the 11st record is the optics of the 8th or the 9th record, it is characterized in that having water-proof coating, this water-proof coating than described low-index layer also near the surface of this optics.
According to the invention of the 11st record, because also have water-proof coating near on the surface location of this optics than described low-index layer, so, can make the facilitation of removing that is attached to the optical component surfaces pollution.
The invention of the 12nd record is the optics of any one record of the 8th～11, it is characterized in that, described low-index layer contains composite material any of monox or monox and aluminium oxide.
According to the invention of the 12nd record, can access the same effect of invention with any one record of the 8th～11.
The invention of the 13rd record is the optics of any one record of the 1st～12, it is characterized in that, described base material is formed by macromolecule resin.
According to the invention of the 13rd record, can access the same effect of invention with any one record of the 1st～12.
The effect of invention
According to the invention of the 1st record, can prevent that the surface of optics from abrading.Can also prevent to enclose pollution.
According to the invention of the 2nd record, can access the identical effect of invention with the 1st record, can more properly prevent to enclose pollution.
According to the invention of the 3rd record, can prevent that optical component surfaces from abrading.Can also prevent to enclose pollution.
According to the invention of the 4th record, can access the identical effect of invention with any one record of the 1st～3, can more properly prevent to enclose pollution.
According to the invention of the 5th record, can access and the 4th identical effect of putting down in writing of invention, can more properly prevent to enclose pollution.
According to the invention of the 6th record, can access the identical effect of invention with any one record of the 1st～5.
According to the invention of the 7th record, can access the identical effect of invention with the 6th record.
According to the invention of the 8th record, can access the identical effect of invention with any one record of the 1st～7, the reflection that can improve optics prevents function.
According to the invention of the 9th record, can access the identical effect of invention with the 8th record.
According to the invention of the 10th record, can access the identical effect of invention with the 8th or the 9th record.
According to the invention of the 11st record, can access the identical effect of invention with the 8th or the 9th record, can make the facilitation of removing of pollution that optical component surfaces has.
According to the invention of the 12nd record, can access the identical effect of invention with any one record of the 8th～11.
According to the invention of the 13rd record, can access the identical effect of invention with any one record of the 1st～12.
Description of drawings
Fig. 1: the illustration intention of the optics 1 that the present invention relates to, figure (a) is a summary construction diagram, figure (b) is the interior part enlarged drawing of round X among the figure (a).
The reflectivity Characteristics synoptic diagram of the optics of Fig. 2: embodiment (3), comparative example (1).
The reflectivity Characteristics synoptic diagram of the optics of Fig. 3: embodiment (12), comparative example (7).
The reflectivity Characteristics synoptic diagram of the optics of Fig. 4: embodiment (15), comparative example (8).
The reflectivity Characteristics synoptic diagram of the optics of Fig. 5: embodiment (16), comparative example (9).
Fig. 6: the figure that is used for illustrating the sheet resistance value assay method.
Symbol description
1 optics
2 base materials
3 antireflection films
M
N-1(n-1) layer (conductive material layer)
M
nN layer (low-index layer)
Embodiment
Following with reference to accompanying drawing, preferred forms of the present invention is described.But scope of invention is not limited to illustrative example.
Fig. 1 is the illustration intention of the optics 1 that the present invention relates to, and figure (a) is a summary construction diagram, and figure (b) is the interior part enlarged drawing of round X among the figure (a).
As shown in the drawing, optics 1 is object lens that for example are used as optical take-up apparatus in the vehicle mounted DVD device etc., has base material 2.
This base material 2 has curved optical surface in the present embodiment.The optical surface of optics 1 can be the plane, also can have microstructures such as diffraction structure.
This antireflection film 3 is to have reflection to prevent the film of function, by n (n for example be 4～7 natural number) layer M ... formation.
Below, if with these layers M ... from inside to outside be the 1st layer of M
1～the n layer M
n, then outermost n layer M
nThickness be 4～20nm, than n layer M
n(n-1) layer M that comes inboardly
N-1Thickness be 3～25nm, be preferably 3～18nm.In addition, (n-1) layer M
N-1The surface be positioned at the degree of depth apart from optical component surfaces 4～20nm.Wherein, n layer M
nCan be positioned at the most surperficial of optics 1, also can be positioned at and also will come inboardly than water-proof coating (not diagram).During the situation of the water coating of setting up defences in the outside of antireflection film 3, the pollution that is attached to optics 1 surface is removed easily.This water-proof coating can be with perfluoroalkyl silane (perfluoro-alkyl-silane), for example " Substance WR1 Patinal " (trade name, メ Le Network ジ ヤ パ Application Co., Ltd. produces) forms as material.
(n-2) layer M of antireflection film 3
N-2And n layer M
nForm (n-1) layer M by low-index material
N-1Be conductive material layer, form by high-index material with electric conductivity.Like this, the sheet resistance value less than 10 of optics 1
5M Ω/.
Here as low-index material, can adopt any of the composite material that contains monox or monox and aluminium oxide.As this composite material, for example " Substance L5 " (trade name, メ Le Network ジ ヤ パ Application Co., Ltd. produces) is more suitable.The material that is mixed in the monox is not limited to aluminium oxide.
As high-index material with electric conductivity, can adopt the material of the composite material that contains indium oxide system, Zinc oxide, specifically can adopt the material of the composite material of the composite material (ITO), zinc paste and the gallium that contain indium oxide and tin.The blending ratio of tin is 3～10wt% in the composite material of preferred indium oxide and tin.In addition, be mixed into the material that goes in indium oxide, the zinc paste, be not limited to tin, gallium.
Have reflection in antireflection film 3 integral body and prevent in the scope of function the 1st layer of M in the above-mentioned antireflection film 3
1～the (n-3) layer M
N-3Material and thickness, can design arbitrarily.
Above-mentioned optics 1 can be made by known in the past manufacture method.To the antireflection film 3 and the described water-proof coating of for example optics 1, specifically can plate the gas method, the method for splashing, CVD method etc. carry out film forming with vacuum.
According to this optics 1, because antireflection film 3 has (n-1) layer M in the inboard
N-1, be the surface of conductive material layer, the distance on this conductive material layer and optics 1 surface is 4～20nm, so to be positioned at the situation on optics 1 surface different with the conductive material laminar surface, can prevent to abrade on this surface when smearing polishing department of the Chinese Academy of Sciences part 1 surface.
In addition, kept the electric conductivity on optics 1 surface definitely, prevented chargedly, the result can prevent to enclose pollution.Also because the sheet resistance value less than 10 of optics 1
5M Ω/ so can more properly prevent the charged of optics 1 surface, prevents to enclose pollution.And because the thickness of conductive material layer is 3～25nm, preferred 3～18nm so can further prevent the charged of optics 1 surface definitely, prevents to enclose pollution.
In addition, because antireflection film 3 is also coming to such an extent that have n layer M near on the position on optics 1 surface than conductive material layer
n, be low-index layer, so this low-index layer can make the reflection of optics 1 prevent that function from improving.
In the above-mentioned embodiment, be illustrated as single optical element, but also can be used as a plurality of optical elements with optics 1.
Below exemplify embodiment and comparative example, further specify the present invention.
[structure of optics]
Embodiment (1)～(16) and comparative example (1)～(9) as the optics in the above-mentioned embodiment 1 have formed optics, establish antireflection film and the water-proof coating of layer structure shown in following table 1～table 7 at its base material 2 optical surfaces.
2 wavelength light beams as follows in detail, that use during corresponding to DVD and CD record regenerating embodiment (1)～(11) and comparative example (1)～(6).1 wavelength light beam that embodiment (12)～(14) and comparative example (7) use during corresponding to BD (Blu-ray Disc) record regenerating.3 wavelength light beams that use when in addition, embodiment (15)～(16) and comparative example (8)～(9) are corresponding to BD, DVD and CD record regenerating.
In the foregoing description (1)～(16) and comparative example (1)～(9), optical component surfaces is not established the film that does not show in the table.
Show the thickness of " d " presentation layer in each stage casing, hurdle, " n " represents refractive index." L5 " expression material is above-mentioned " Substance L5 ".
(table 1)
| ? | Embodiment (1) | Embodiment (2) | Embodiment (3) | Embodiment (4) |
| Base material | ア ペ Le Resin A PL5014DP | ア ペ Le Resin A PL5014DP | ア ペ Le Resin A PL5014DP | ア ペ Le Resin A PL5014DP |
| The 1st layer | Cerium oxide d1=71nm n1=1.82 | Cerium oxide d1=71nm n1=1.82 | Cerium oxide d1=71nm n1=1.82 | Cerium oxide d1=71nm n1=1.82 |
| The 2nd layer | Monox d2=118nm n2=1.44 | Monox d2=118nm n2=1.44 | L5 material d2=118nm n2=1.48 | Monox d2=118nm n2=1.44 |
| The 3rd layer | ITO d3＝8.1nm n3＝1.89 | ITO d3＝8.1nm n3＝1.89 | ITO d3＝8.1nm n3＝1.89 | ITO d3＝8.1nm n3＝1.89 |
| The 4th layer | Monox d4=4nm n4=1.44 | Monox d4=8nm n4=1.44 | L5 material d4=10nm n4=1.48 | Monox d4=19nm n4=1.44 |
| Spectral reflectance characteristic λ 1(nm)(Rmin1(％)) | 750 (below 0.2) | 740 (below 0.2) | 755 (below 0.2) | 760 (below 0.2) |
(table 2)
(table 3)
| ? | Embodiment (5) | Embodiment (6) | Embodiment (7) | Comparative example (5) |
| Base material | ア ペ Le Resin A PL5014DP | ア ペ Le Resin A PL5014DP | ア ペ Le Resin A PL5014DP | ア ペ Le Resin A PL5014DP |
| The 1st layer | Cerium oxide d1=71nm n1=1.82 | Cerium oxide d1=71nm n1=1.82 | Cerium oxide d1=83nm n1=1.82 | Cerium oxide d1=71nm n1=1.82 |
| The 2nd layer | Monox d2=122nm n2=1.44 | Monox d2=106nm n2=1.44 | L5 material d2=80nm n2=1.48 | L5 material d2=125nm n2=1.48 |
| The 3rd layer | ITO d3＝3nm n3＝1.89 | ITO d3＝18nm n3＝1.89 | ITO d3＝24nm n3＝1.89 | ITO d3＝2nm n3＝1.89 |
| The 4th layer | Monox d4=10nm n4=1.44 | Monox d4=10nm n4=1.44 | L5 material d4=10nm n4=1.48 | L5 material d4=10nm n4=1.48 |
| Spectral reflectance characteristic λ 1(nm)(Rmin1(％)) | 750 (below 0.2) | 755 (below 0.2) | 750 (below 0.61) | 750 (below 0.2) |
(table 4)
(table 5)
(table 6)
(table 7)
[reflection prevents the evaluation of performance]
With measuring reflectance instrument " USPM-RU " (trade name, the manufacturing of オ リ Application パ ス Co., Ltd.) the spectral reflectance characteristic of the optics of embodiment (1)～(16) of the above-mentioned formation of mensuration, comparative example (1)～(9), prevent performance according to following benchmark evaluation reflection, obtain result shown in the following table 8.
In the spectral reflectance characteristic of wavelength 350～1000nm, be λ with the minimal wave length of representing minimum reflectivity
1(nm), with this wavelength X
1Corresponding reflectivity is Rmin1 (%); Its order 2 short wavelengths are λ
2(nm), with this wavelength X
2When corresponding reflectivity was Rmin2 (%), minimum reflectivity Rmin1, the Rmin2 of each optics descended shown in the hurdle as above-mentioned table 1～table 7 most.In addition, the spectral reflectance characteristic of each optics is shown in each figure, for example: embodiment (3) is " curve 1 " of Fig. 2; Comparative example (1) be Fig. 2's " curve 2 "; Embodiment (12) be Fig. 3's " curve 3 "; Comparative example (7) be Fig. 3's " curve 4 "; Embodiment (15) be Fig. 4's " curve 5 "; Comparative example (8) be Fig. 4's " curve 6 "; Embodiment (16) be Fig. 5's " curve 7 "; Comparative example (9) be Fig. 5's " curve 8 ";
Reflection prevents the evaluation level of performance
The situation of embodiment (1)～(11) and comparative example (1)～(6)
Zero: the wavelength X 1 of minimum reflectivity is 750 ± 20nm, the reflectivity Rmin1 less than 0.7% of its wavelength X 1.When being used as the object lens of optical take-up apparatus, there is not the problem in the practicality when information record, regeneration fully.
△: wavelength X 1 is 750 ± 20nm, and reflectivity Rmin1 is in 0.7% above less than 1%.There is not the problem in the practicality when record, regeneration.
*: benchmark above-mentioned zero, △ does not satisfy.Problem in the practicality is arranged when record, regeneration.
The situation of embodiment (12)～(14) and comparative example (7)
Zero: the wavelength X 1 of minimum reflectivity is 405 ± 20nm, the reflectivity Rmin1 less than 0.7% of its wavelength X 1.There is not the problem in the practicality when record, regeneration fully.
△: wavelength X 1 is 405 ± 20nm, and reflectivity Rmin1 is in 0.7% above less than 1.0%.There is not the problem in the practicality when record, regeneration.
*: benchmark above-mentioned zero, △ does not satisfy.Problem in the practicality is arranged when record, regeneration.
The situation of embodiment (15)～(16) and comparative example (8)～(9)
Zero: the wavelength X 1 of minimum reflectivity is 405 ± 20nm, the reflectivity Rmin1 less than 0.7% of its wavelength X 1.And the wavelength X 2 of minimum reflectivity is 700 ± 50nm, reflectivity Rmin 2 less thaies 0.7% of its wavelength X 2.There is not the problem in the practicality when record, regeneration fully.
△: wavelength X 1 is 405 ± 20nm, and reflectivity Rmin 1 is in 0.7% above less than 1%.And the wavelength X 2 of minimum reflectivity is 700 ± 50nm, and the reflectivity Rmin2 of its wavelength X 2 is in 0.7% above less than 1%.There is not the problem in the practicality when record, regeneration.
*: benchmark above-mentioned zero, △ does not satisfy.Problem in the practicality is arranged when record, regeneration.
(table 8)
[the charged evaluation that prevents performance]
Optics as embodiment (1)～(16), comparative example (1)～(9), make following mensuration test portion (1), (2), use utmost point teraohmmeter (SM-10E type, East Asia electric wave Industrial Co., Ltd make) actual measurement and calculating then, according to the charged performance that prevents of following benchmark evaluation, the result who obtains is as following table 9 and upward shown in the table 8.
Measure test portion
Measure test portion (1): diameter
30mm, the discoid plastics testing spare of thickness 3mm
Measure test portion (2): the optics of object shapes
And the antireflection film of said determination test portion (1), (2) and water-proof coating adopt vacuum plating gas method or the method for splashing, CVD method etc., forms device by antireflection film, with identical condition formation.
In addition, measure test portion (1) and only embodiment (1) is made, measure test portion (2) and respectively embodiment (1)～(16), comparative example (1)～(9) are made.
Measure and computing method
Step 1: sheet resistance value reduction coefficient Rso/R calculates
At first, for said determination test portion (1), measure the sheet resistance value Rso (unit: M Ω/) of optical surface with described utmost point teraohmmeter with antireflection film.
And for measuring test portion (2), as shown in Figure 6, at first, in coating on the optical surface of antireflection film, form electrode 5a, 5b with conductive coating paints such as silver-colored pastes, with the resistance value R (unit: M Ω) between above-mentioned utmost point teraohmmeter 6 this electrode of mensuration 5a, 5b.
Then, calculate Rso/R, be worth as the sheet resistance value reduction coefficient with this from sheet resistance value Rso and the resistance value R that measures.
Above step 1 is carried out embodiment (1).Thus, from measuring test portion (1) actual measurement sheet resistance value Rso, obtain Rso=4 * 10
4The result of M Ω/.In addition, from measuring test portion (2) actual measurement resistance value R, obtain R=2 * 10
3The result of M Ω.Then, obtain the result of sheet resistance value reduction coefficient Rso/R=20.
The mensuration of step 2: sheet resistance value Rs.
Mensuration test portion (2) for embodiment (1)～(16), comparative example (1)～(9), after the same shape of in formation of test portion surface and above-mentioned steps 1, using, electrode 5a, the 5b of configuration together (with reference to Fig. 6), with the resistance value R (unit: M Ω), try to achieve sheet resistance value Rs between above-mentioned this electrode of utmost point teraohmmeter 6 actual measurements 5a, 5b by following calculating formula.That is, only make mensuration test portion (2) for embodiment (2)～(16), comparative example (1)～(9) and measure resistance value R,,, try to achieve sheet resistance value Rs by being multiplied by the sheet resistance value reduction coefficient Rso/R (=20) that tries to achieve for embodiment (1).
Rs＝R×(Rso/R)
Because the value of sheet resistance value Rs and resistance value R is measured the humidity effect of environment easily, so said determination is to carry out under the low humidity condition of 15～25 ℃ of relative humidity 20%, temperature.
The charged evaluation level that prevents performance
Zero: sheet resistance value Rs less than 10
5M Ω/.Under moving state, the charged effect that prevents is arranged also.
△: sheet resistance value Rs is 10
5～7M Ω/.The charged effect that prevents is arranged under quiet state.
*: sheet resistance value Rs is 10
7More than M Ω/.Static charge is accumulated in the surface, does not have the charged effect that prevents.
Above-mentioned metewand is set according to " charged state-of-the-art technology and the application start that prevents material " (publishing house: the ジ of Co., Ltd. one エ system シ one publishes).
(table 9)
| Comparative example (9) | 2.5～3.5×10E+5 | 5～7×10E+6 | △ |
" 10E+n " in the above-mentioned table 9 (n is a natural number) represents " 10n ".
[evaluation of antifouling property]
The said determination test portion (1) as optics of embodiment (1)～(16), comparative example (1)～(9), the antifouling transmitance variation that causes of (2) are measured,, obtained the result of above-mentioned table 8 according to following benchmark evaluation antifouling property.
Assay method
At first, with known in the past transmitance determinator, adopt and measure test portion (2), measure respectively: embodiment (1)～(11) and comparative example (1)～(6) are to the transmitance of wavelength 650nm light beam; Embodiment (12)～(16) and comparative example (7)～(9) are to the transmitance of wavelength 405nm light beam.Subsequent, humidity is maintained below 20%, the mensuration test portion (2) of each embodiment of configuration, comparative example was placed after 1 week in being full of the glass container of smoke from cigarette, measured transmitance with same condition.
The evaluation level of antifouling property
Zero: the transmitance after the placement is reduced to less than 1%.
△: the transmitance after the placement is reduced to more than 1%～less than 2%.
*: the transmitance after the placement is reduced to more than 2%.
[evaluation of film strength]
The said determination test portion (1) as optics of embodiment (1)～(16), comparative example (1)～(9), the film strength of (2) are measured,, obtained the result of above-mentioned table 8 according to following benchmark evaluation antifouling property.
Assay method
With dye into the cotton rod of isopropyl alcohol smear and wipe the surface of measuring test portion (2), to surface reflection prevent film or waterproof membrane peel off till mensuration smear the wiping number of times.Smear and wipe load-carrying between 5～10g.In addition, mensuration is that the part that does not have convex-concave shapes such as diffraction structure is carried out.
The evaluation level of film strength
Zero: antireflection film, the water-proof coating on 50 top layers of less than are not peeled off.
△: antireflection film, the water-proof coating on 10 top layers of less than are not peeled off, and less than is peeled off for 50 times.
*: antireflection film, the water-proof coating on 10 top layers of less than are peeled off.
Comprehensive evaluation
According to above result, according to following evaluation level, the comprehensive evaluation of carrying out to the optics of embodiment (1)～(16), comparative example (1)～(9) has obtained the as above result shown in the table 8.
The evaluation level of comprehensive evaluation
The all assessment items of project were zero in zero: 4.Extremely excellent in the practicality.
△: have only 1 to be △ in 4 projects, other all are zero.No problem in the practicality.
*: above-mentioned zero, △ benchmark does not satisfy.Problem is arranged in the practicality.
Hence one can see that, and the thickness of conductive material layer ((n-1) layer) is below the above 25nm of 3nm, and the distance of the outmost surface of conductive material laminar surface and optics is when the above 20nm of 4nm is following, and comprehensive evaluation is more than the △ level, and is no problem in the practicality.
Wherein as can be known, especially at the thickness of conductive material layer during greater than 18n m, shown in embodiment (7), (11) and comparative example (6), film strength is the △ level.Can think that this is because compare lower reasons such as conductive material layer film strength, for example hardness, density, erasibility with metal oxide, silicon oxide layer.In the time of can also thinking because of film forming conductive material layer on resinous base material, compare with the situation of film forming on the base material of glass, can not keep the high temperature of base material temperature, the film strength of conductive material layer reduces, if so increase thickness of electrically conductive layer, even then establish layers such as monox in its face side, the film strength of antireflection film integral body is also not variable good.
To this, the thickness of conductive material layer is when the above 18nm of 3nm is following as can be known, and the problems referred to above improve, and comprehensive evaluation is zero level.
Otherwise as can be known, the thickness of conductive material layer is during greater than 25nm, and sheet resistance value reduces, and is difficult to keep good reflection and prevents performance, does not also improve film strength (please refer to comparative example (6)) even establish layers such as monox in addition in the face side of conductive material layer.
In addition we know, the thickness of conductive material layer is when not enough 3nm, and it is big that sheet resistance value becomes, and the change of plating the resistance value that the gas condition causes in addition increases, and charged performance, the antifouling property of preventing of its result reduces (please refer to comparative example (5)).
In addition we know, when face side lamination monox of conductive material layer etc., the words of the not enough 4nm of the thickness of this layer, so because low film strength (please refer to comparative example (2)) that can not improve antireflection film of film strength of conductive material layer, and more than 4nm, then can improve film strength (please refer to embodiment (1)～(16)).Film strength is some among the embodiment (7), (11) is lower than the △ level, can think because the bed thickness of conductive material layer is greater than the reason of 18nm as mentioned above.In addition we know, if the bed thickness of monox etc. more than 20nm, though can improve film strength, the sheet resistance value of antireflection film increases, charged performance and the antifouling property of preventing reduces (please refer to comparative example (3), (4)).
Claims (12)
1. optics, have base material and the antireflection film that is located at this substrate surface, optics is characterised in that, described antireflection film has conductive material layer, this conductive material layer is made of the material with electric conductivity, and the distance on the surface of this conductive material layer and this optics is 4～20nm.
2. the optics of record in the claim 1 is characterized in that the sheet resistance value less than 10 of this optics
5M Ω/.
3. the optics of claim 1 or 2 records is characterized in that the thickness of described conductive material layer is 3～25nm.
4. the optics of record in the claim 3 is characterized in that the thickness of described conductive material layer is 3～18nm.
5. the opticses of claim 1 or 2 records is characterized in that described material with electric conductivity is a high-index material, and it is that the refractive index of light beam of 600nm is more than 1.55 for wavelength.
6. the optics of record in the claim 5 is characterized in that, described high-index material is the composite material that contains indium oxide system or Zinc oxide.
Claim 1 or 2 the record opticses, it is characterized in that, described antireflection film has low-index layer, and this low-index layer, is made of the low-index material of refractive index less than 1.55 that to wavelength is the light beam of 600nm also near the surface of this optics than described conductive material layer.
8. the optics of record in the claim 7 is characterized in that the thickness of described low-index layer is 4～20nm.
9. the optics of claim 7 record is characterized in that described low-index layer is positioned at the surface of this optics.
10. the optics of claim 7 record is characterized in that having water-proof coating, this water-proof coating than described low-index layer also near the surface of this optics.
11. the optics of claim 7 record is characterized in that, described low-index layer contains composite material any of monox or monox and aluminium oxide.
12. the optics of claim 1 or 2 records is characterized in that described base material is formed by macromolecule resin.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006219826 | 2006-08-11 | ||
| JP219826/2006 | 2006-08-11 | ||
| PCT/JP2007/065064 WO2008018340A1 (en) | 2006-08-11 | 2007-08-01 | Optical component |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101501768A CN101501768A (en) | 2009-08-05 |
| CN101501768B true CN101501768B (en) | 2011-10-26 |
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|---|---|---|---|
| CN2007800294056A Expired - Fee Related CN101501768B (en) | 2006-08-11 | 2007-08-01 | Optical component |
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| Country | Link |
|---|---|
| JP (1) | JPWO2008018340A1 (en) |
| CN (1) | CN101501768B (en) |
| WO (1) | WO2008018340A1 (en) |
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|---|---|---|---|---|
| JP5391629B2 (en) | 2008-10-02 | 2014-01-15 | コニカミノルタ株式会社 | LENS, OPTICAL DEVICE, AND LENS MANUFACTURING METHOD |
| CN104090313B (en) * | 2014-07-25 | 2015-11-18 | 丹阳丹耀光学有限公司 | A kind of superhard waterproof membrane and processing technology thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5667880A (en) * | 1992-07-20 | 1997-09-16 | Fuji Photo Optical Co., Ltd. | Electroconductive antireflection film |
| CN1680829A (en) * | 2004-04-07 | 2005-10-12 | 柯尼卡美能达精密光学株式会社 | Objective lens and optical pickup apparatus |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6113202A (en) * | 1984-06-29 | 1986-01-21 | Nec Corp | Laser mirror |
| JPH0634802A (en) * | 1992-07-20 | 1994-02-10 | Fuji Photo Optical Co Ltd | Conductive antireflection film |
| JPH09152502A (en) * | 1995-11-28 | 1997-06-10 | Toppan Printing Co Ltd | Conductive anti-reflective coating |
| JP2005181519A (en) * | 2003-12-17 | 2005-07-07 | Fuji Photo Film Co Ltd | Antireflection film, polarizing plate and image display device |
| JP4802568B2 (en) * | 2004-11-30 | 2011-10-26 | 凸版印刷株式会社 | Antireflection laminate, optical functional filter, optical display device and optical article |
| JP2006184493A (en) * | 2004-12-27 | 2006-07-13 | Fuji Photo Film Co Ltd | Optical functional film and its manufacturing method, and polarizing plate and image display device using the same |
| JP2006221142A (en) * | 2005-01-14 | 2006-08-24 | Sony Corp | Optical element, lens barrel, image pick-up device and electronic equipment |
-
2007
- 2007-08-01 JP JP2008528790A patent/JPWO2008018340A1/en active Pending
- 2007-08-01 WO PCT/JP2007/065064 patent/WO2008018340A1/en active Application Filing
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5667880A (en) * | 1992-07-20 | 1997-09-16 | Fuji Photo Optical Co., Ltd. | Electroconductive antireflection film |
| CN1680829A (en) * | 2004-04-07 | 2005-10-12 | 柯尼卡美能达精密光学株式会社 | Objective lens and optical pickup apparatus |
Non-Patent Citations (1)
| Title |
|---|
| JP特开2006-184493A 2006.07.13 |
Also Published As
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|---|---|
| JPWO2008018340A1 (en) | 2009-12-24 |
| WO2008018340A1 (en) | 2008-02-14 |
| CN101501768A (en) | 2009-08-05 |
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