CN101493576A - Electrowetting display device and method of manufacturing the same - Google Patents
Electrowetting display device and method of manufacturing the same Download PDFInfo
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- CN101493576A CN101493576A CNA2008100085517A CN200810008551A CN101493576A CN 101493576 A CN101493576 A CN 101493576A CN A2008100085517 A CNA2008100085517 A CN A2008100085517A CN 200810008551 A CN200810008551 A CN 200810008551A CN 101493576 A CN101493576 A CN 101493576A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 40
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- 230000005660 hydrophilic surface Effects 0.000 claims abstract description 28
- 238000000034 method Methods 0.000 claims description 54
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- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 claims description 8
- 229920002120 photoresistant polymer Polymers 0.000 claims description 8
- 239000011521 glass Substances 0.000 claims description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 6
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 6
- 239000000975 dye Substances 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 239000011737 fluorine Substances 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 6
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- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims description 3
- 239000002120 nanofilm Substances 0.000 claims description 3
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 3
- 239000001103 potassium chloride Substances 0.000 claims description 3
- 235000011164 potassium chloride Nutrition 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 229920002545 silicone oil Polymers 0.000 claims description 3
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- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims 1
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- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
The invention discloses an electrowetting display device and a manufacturing method thereof. The electrowetting display device comprises a first substrate and a second substrate arranged oppositely, and a polar solution layer and a non-polar solution layer are sandwiched between the first substrate and the second substrate. The first transparent electrode layer is disposed on the first substrate. The second electrode layer is disposed on the second substrate. The dielectric layer is arranged on the second electrode layer. The retaining wall structure with hydrophilic surface is set directly on the dielectric layer and defines several areas, and the material layer with low surface energy is set on the dielectric layer in the areas.
Description
Technical field
The present invention relates to a kind of display equipment, be particularly to a kind of Electrowetting display apparatus and manufacture method thereof.
Background technology
The principle of Electrowetting display (Electrowetting Display) is to utilize wetting (Electrowetting) phenomenon of electricity or electrochemical kapillary (Electrocapillary) phenomenon.When fluid is subjected to electric field action and changes the surface free energy (Free Surface Energy) of fluid, make the fluid distribution area change.
WIPO's application case discloses WO and discloses a kind of Electrowetting display structure for No. 2005/051091.See also Fig. 1, traditional Electrowetting display comprises second substrate 3 and the 4 subtend settings of first substrate, and patterning pixel electrode 7 is arranged on second substrate 3.Dielectric layer 8 for example has hydrophobicity (hydrophobic) superficiality material layer, is arranged on second substrate 3 and the patterning pixel electrode 7.The water wettability shelves wall construction (pixel wall) 13 of patterning is arranged on the dielectric layer 8, defines each pixel region.The opaque non-polar liquid 5 that contains black dyes is arranged at the pixel region of 13 of grade wall constructions, and transparent polar liquid 6 is arranged in the gap between first substrate 4 and second substrate 3.When the operating voltage off status, opaque non-polar liquid 5 is uniformly distributed in the pixel, and this moment, the show state of pixel was dark attitude (dark state).
When operating voltage is opened state, that is produce electric fields between first substrate 4 and second substrate 3 by voltage source 9, it is poly-to cause opaque non-polar liquid 5 to be subjected in the electric wetting action power influence, thereby exposes most pixel region, and this moment, the show state of pixel was bright attitude (bright state).
The shelves wall construction 13 of tradition Electrowetting display apparatus is a hydrophilic-structure, it directly is made on the dielectric layer 8 of hydrophobicity and low-surface-energy material, its advantage forms low-surface-energy material for the mode that can adopt comprehensive coating, yet make hydrophilic barrier wall structure 13 be difficult for directly being produced on the dielectric layer 8, and come off from dielectric layer 8 easily, cause the inefficacy of display.
United States Patent (USP) discloses No.2007/0188676 in early days and discloses a kind of Electrowetting display, and it is poly-to utilize opaque non-polar liquid to be subjected in the wetting action of electric field electricity, with the bright attitude and the dark attitude of control display picture element.Fig. 2 is the diagrammatic cross-section that shows another traditional Electrowetting display.See also Fig. 2, traditional Electrowetting display apparatus comprises backlight module 20 and Electrowetting display 50, as photoswitch.Electrowetting display 50 comprises second substrate 22, and pixel electrode 24 is arranged on second substrate 22.Dielectric layer (tool hydrophobic surface character) 26 is arranged on the pixel electrode 24.The water wettability shelves wall construction 28 of patterning is arranged on the dielectric layer 26, defines each pixel region.Containing the opaque non-polar liquid 45 of black dyes and transparent polar liquid 40 is arranged in each pixel region.First substrate 30 has the common electrode 32 of patterning on it, and relative second substrate 22 is arranged on grade wall construction 28 and the transparent polar liquid 40.
Moreover, WIPO's application case discloses WO and discloses a kind of half-inversed type Electrowetting display structure for No. 2006/017129, in anti-structure of wearing Electrowetting display partly, second substrate and first substrate of having colored filter are organized upright encapsulation, and insert polar solvent and black non-polar solution in inside.The partly counter colored electroweting method displaying appliance of wearing form has a plurality of pixels, and on second substrate, makes penetrating region and echo area in the individual pixel.
Fig. 3 is the diagrammatic cross-section that shows traditional half-inversed type Electrowetting display.See also Fig. 3, traditional half-inversed type colored electroweting method display comprises that second substrate 112 is arranged on the backlight module 111.Patterning reflecting plate 113, the echo area in respective pixel zone is arranged on second substrate 112.Second transparent electrode layer, 114 comprehensive being arranged on second substrate 112, and cover reflecting plate 113.Dielectric layer (tool hydrophobic surface character) 115 is arranged on second transparent electrode layer 114.Patterning barrier wall structure 116 is arranged on the dielectric layer 115, defines a plurality of pixel regions.
Main second board structure of traditional electrical wet-type display comprises low surface energy material, and the hydrophilic-structure of patterning is made in low surface energy material.Yet,, cause to be difficult to carry out follow-up large tracts of land material coating and subsequent technique because the surface of low surface energy material has anti-character of being stained with sticking (anti-adhesion).What is more, even make hydrophilic-structure reluctantly thereon, also can be because of the character of surface of low surface energy material, and cause hydrophilic-structure to come off from low surface energy material.Therefore, industry enterprise needs a kind ofly overcome hydrophilic-structure and be made in manufacture method on the dielectric layer and the electric wet-type display structure of improving its structural stability.
Summary of the invention
The embodiment of the invention provides a kind of structure and method for making of Electrowetting display, low surface energy material is designed to patterned shape, and the water wettability barricade directly be produced between low surface energy material and with the bottom dielectric layer directly contact, with simplify the water wettability barricade technology with promote structural fiduciary level.
The invention provides a kind of Electrowetting display apparatus, comprising: first substrate and the second substrate subtend are provided with, and insert and put polar solvent layer and non-polar solution layer therebetween; First transparent electrode layer is arranged on this first substrate; The second electrode lay is arranged on this second substrate; Dielectric layer is arranged on this second electrode lay; And the barrier wall structure of tool hydrophilic surface directly is arranged on the dielectric layer, and this barrier wall structure defines a plurality of zones; And the material layer with low-surface-energy is arranged on the dielectric layer in this zone.
The present invention provides a kind of Electrowetting display apparatus in addition, comprising: first substrate and the second substrate subtend are provided with, and insert and put transparent polar solution layer and opaque non-polar solution layer therebetween; First transparent electrode layer is arranged on this first substrate; The second electrode lay is arranged on this second substrate; Dielectric layer is arranged on this second electrode lay; And the barrier wall structure of tool hydrophilic surface directly is arranged on the dielectric layer, and this barrier wall structure defines the pixel region of Electrowetting display; And the material layer with low-surface-energy is arranged on the interior dielectric layer of each pixel region.
The present invention provides a kind of manufacture method of Electrowetting display apparatus in addition, comprising: first substrate is provided, and forms first transparent electrode layer thereon; Second substrate is provided, and forms the second electrode lay thereon; Form dielectric layer on this second electrode lay; The material layer with low-surface-energy that forms patterning is in this dielectric layer, and this dielectric layer surface of exposing a part; The barrier wall structure that forms the tool hydrophilic surface is on this dielectric layer, and this barrier wall structure defines a plurality of zones, makes it expose the material layer that this has low-surface-energy; And subtend makes up this first substrate and this second substrate, makes and inserts and puts polar solvent layer and non-polar solution layer therebetween.
The present invention provides a kind of manufacture method of Electrowetting display apparatus in addition, comprising: first substrate is provided, and forms first transparent electrode layer thereon; Second substrate is provided, and forms the second electrode lay thereon; Form dielectric layer on this second electrode lay; The barrier wall structure that forms the tool hydrophilic surface is on this dielectric layer, and wherein this barrier wall structure defines a plurality of pixel regions; Formation has on material layer this dielectric layer in this pixel region of low-surface-energy; And subtend makes up this first substrate and this second substrate, makes and inserts and puts polar solvent layer and non-polar solution layer therebetween.
For the present invention can be become apparent, embodiment cited below particularly, and conjunction with figs. are described in detail below.
Description of drawings
Fig. 1 is the diagrammatic cross-section that shows a traditional Electrowetting display;
Fig. 2 is the diagrammatic cross-section that shows another traditional Electrowetting display;
Fig. 3 is the diagrammatic cross-section that shows traditional half-inversed type Electrowetting display;
Fig. 4 A and 4B show relatively the diagrammatic cross-section of tradition and second board structure of the Electrowetting display of the embodiment of the invention respectively;
Fig. 5 is the process flow diagram according to the Electrowetting display manufacture method of one embodiment of the invention;
Fig. 6 A-6E shows the diagrammatic cross-section of making each step of Electrowetting display according to one embodiment of the invention;
Fig. 7 A-7D is the synoptic diagram of demonstration according to the barrier wall structure of the various hydrophilic surfaces of the embodiment of the invention;
Fig. 8 is the process flow diagram of Electrowetting display manufacture method according to another embodiment of the present invention;
Fig. 9 A-9E shows the diagrammatic cross-section of making each step of Electrowetting display according to another embodiment of the present invention; And
Figure 10 shows the diagrammatic cross-section of Electrowetting display according to another embodiment of the present invention.
Description of reference numerals
Known technology part (Fig. 1～3)
3 second substrates, 4 first substrates
The polar liquid that 5 opaque non-polar liquids 6 are transparent
7 pixel electrodes, 8 dielectric layers
13 grades of wall constructions of 9 voltage sources (pixel wall)
20 backlight modules, 22 second substrates
24 pixel electrodes, 26 dielectric layers
28 water wettability shelves wall constructions, 30 first substrates
The polar liquid that 32 common electrodes 40 are transparent
45 opaque non-polar liquid 50 Electrowetting displays
111 backlight modules, 112 second substrates
113 reflecting plates, 114 second transparent electrode layers
115 dielectric layers, 117 first transparent electrode layers
118 first substrate 120a-120c non-polar solution layers
121 polar solvent layers, 126 penetration region
The present invention's part (Fig. 4 A～10)
The material layer of 210 second board structure 220A, 220B tool low-surface-energy
225A, 225B interface 230A, the hydrophilic barrier wall structure of 230B
S310-S340 manufacturing process step 410 second substrate
420 second electrodes, 430 dielectric layers
440 rollers, 442 relief printing plates
445 have the material layer of low-surface-energy
The hydrophobic polymer material of 445 ' spraying fluorinated
450, the barrier wall structure of 450A-450D, 450a hydrophilic surface
460 first substrates, 470 first transparent electrode layers
480 non-polar solution layers, 485 polar solvent layer, 500 ink discharge device
Embodiment
Below with each embodiment and be accompanied by the example of graphic explanation, as reference frame of the present invention.In graphic or instructions were described, similar or identical part was all used identical figure number.And in the drawings, the shape of embodiment or thickness can enlarge, and to simplify or convenient the sign.Moreover the part of each element will be it should be noted that to describe explanation respectively among the figure, the element that does not illustrate among the figure or describe is the form known to the technician in the affiliated technical field, in addition, only for disclosing the ad hoc fashion that the present invention uses, it is not in order to limit the present invention to certain embodiments.
Fig. 4 A and 4B show relatively the diagrammatic cross-section of tradition and second board structure of the Electrowetting display of the embodiment of the invention respectively.See also Fig. 4 A, second board structure of traditional Electrowetting display comprises second board structure 210, and it comprises dielectric layer (not shown).Low surface energy material (or tool hydrophobic surface character) 220A is formed on second board structure 210 comprehensively.Then, again the barrier wall structure 230A of tool hydrophilic surface is formed at low surface energy material 220A.Yet, as discussed previously, because the surface of low surface energy material 220A has the anti-sticking character of being stained with, make the interface 225A between low surface energy material 220A and barrier wall structure 230A can't form good stickability, and cause and be difficult to carry out large tracts of land formed material coating and subsequent technique because of polarity is different.Even and form hydrophilic-structure reluctantly, also possible low-surface-energy characteristic because of low surface energy material 220A, and cause hydrophilic-structure to come off from dielectric layer.
Relatively, see also Fig. 4 B, second board structure of the Electrowetting display of the embodiment of the invention comprises second board structure 210.Second board structure 210 comprises that other active members, passive device, pixel electrode and dielectric layer (not shown) cover thereon.The low surface energy material of patterning (or tool hydrophobic surface character) 220B is formed on second board structure 210, exposes second board structure, 210 surfaces of predetermined space.Then, the barrier wall structure 230B with the tool hydrophilic surface is formed between the low surface energy material 220B again, directly contacts with the surface of second board structure 210.So, can avoid directly forming barrier wall structure 230B on low surface energy material 220B, and the stickability good of the interface 225B between second board structure 210 and barrier wall structure 230B, thereby improve the fiduciary level of Electrowetting display because of polarity compatible forms.
Fig. 5 is the process flow diagram according to the Electrowetting display manufacture method of one embodiment of the invention.See also Fig. 5, the manufacture method of Electrowetting display apparatus comprises provides first substrate (S310), and forms first transparent electrode layer (S312) thereon.On the other hand, provide second substrate (S320), and form the second electrode lay (S322) thereon.The second electrode lay can be transparency electrode, perhaps is the reflecting electrode of tool reflectivity properties.Then, form dielectric layer (S324) on the second electrode lay, form the material layer with low-surface-energy (S326) on this dielectric layer of patterning again, corresponding each pixel region, spacing is therebetween exposed this dielectric layer surface of a part.Then, form the barrier wall structure (S328) on this dielectric layer of tool hydrophilic surface again, this barrier wall structure is positioned at the spacing of patterning tool low surface energy material, and directly contacts with dielectric layer, define a plurality of zones thus, make it expose the material layer that this has low-surface-energy.Then, subtend makes up this first substrate and this second substrate, makes and inserts and puts polar solvent layer and non-polar solution layer (S330) therebetween.At last, advance other subsequent steps of shape, for example assembling backlight module and color filter film are finished Electrowetting display apparatus (S340).
Fig. 6 A-6E shows the diagrammatic cross-section of making each step of Electrowetting display according to one embodiment of the invention.See also Fig. 6 A, second substrate 410 is provided, its material comprises glass, macromolecular material or metal, and forms second electrode 420 on second substrate 410.Then, form dielectric layer 430 on second electrode 420.
The second electrode lay 420 is a pattern structure, comprise rectangle, square, triangle, circle, trapezoidal or oval, and its material comprises metal or oxide.Moreover the thickness range of the second electrode lay 420 is approximately between 0.01-1 micron (μ m).
The material of dielectric layer 430 comprises silicon dioxide (SiO
2), silicon nitride (SiN
x), tantalum oxide (Ta
2O
3), lead zirconate titanate (PZT), barium strontium titanate (BST), barium titanate (BTO) or polyvinylidene fluoride (polyvinylidene difluoride, PVDF).
Then, impose letterpress (relief printing) step, be needed on the dielectric layer 430, corresponding each pixel region by roller 440 and relief printing plate 442 the material layer with low-surface-energy 445 with patterning, spacing is therebetween exposed dielectric layer 430 surfaces of a part, shown in Fig. 6 B.This material with material layer 445 of low-surface-energy comprises the hydrophobic macromolecular material of fluorine-containing or chloride class, the autohemagglutination molecular film of fluorine-containing or chloride class, its thickness range approximately between 0.1 nanometer (nm) to 1 micron (μ m), and its surface tension value is preferably less than 20dyne/cm less than 25dyne/cm.
See also Fig. 6 C, form thick-film material layer 450 comprehensively, for example positive photoresist, negative photoresist, photo-curable resin or thermoset resin, on dielectric layer 430, and the material layer 445 of covering tool low-surface-energy.Then, impose photoetching and etching step, to form the barrier wall structure 450 of hydrophilic surface with its patterning.This barrier wall structure 450 is positioned at the spacing place of patterning tool low surface energy material, and directly contacts with dielectric layer 430, defines a plurality of zones thus, makes it expose the material layer 445 with low-surface-energy, shown in Fig. 6 D.
It should be noted that barrier wall structure 450 can be the black matrix" barrier wall structure, can absorb the light of visible wavelength range.Moreover the thickness range of barrier wall structure is approximately between 5-50 micron (μ m).
See also Fig. 6 D again, on the other hand, provide first substrate 460, and form first transparent electrode layer 470 thereon.The material of first substrate 460 comprises glass, macromolecular material or metal.First transparent electrode layer 470 is a pattern structure, comprises rectangle, square, triangle, circle, trapezoidal or oval, and perhaps this first transparent electrode layer 470 also can be comprehensive electrode structure.Moreover the material of first transparent electrode layer 470 comprises metal or oxide, and its thickness range is approximately between 0.01-1 micron (μ m).
Then, subtend makes up second substrate 410 and first substrate 460, makes to insert and put non-polar solution layer 480 and polar solvent layer 485 therebetween, shown in Fig. 6 E.The material of non-polar solution layer 480 comprises any mixing of silicone oil (silicon oil), decane (decane), dodecane (dodecane), the tetradecane (tetradecane) or above-mentioned material, and on the whole its thickness range is 1～10 micron (μ m).Moreover non-polar solution layer 480 comprises coloured dyestuff (dye) or colored pigment (pigment) in addition.On the other hand, the material of polar solvent layer comprises water, sodium-chloride water solution or potassium chloride solution, and its thickness range is between 10-100 micron (μ m).
Fig. 7 A-7D is the synoptic diagram of demonstration according to the barrier wall structure of the various hydrophilic surfaces of the embodiment of the invention, but this is for example but not is only limited to this barrier wall structure.See also Fig. 7 A, the barrier wall structure 450A of tool hydrophilic surface can be strip ridge shape, width homogeneous and equal the width of 445 spacings of the material layer with low-surface-energy of patterning.See also Fig. 7 B, according to another embodiment of the present invention, the barrier wall structure 450B of tool hydrophilic surface directly contacts with dielectric layer 430, and other has the material layer 445 of the low-surface-energy of extension cover part, both sides.The top width of the barrier wall structure 450B of tool hydrophilic surface is equal to or greater than its bottom width.Perhaps, see also Fig. 7 C, the barrier wall structure 450C of tool hydrophilic surface directly contacts with dielectric layer 430, and its section is trapezoidal, that is the top width of the barrier wall structure 450C of tool hydrophilic surface is less than its bottom width.See also Fig. 7 D, the barrier wall structure 450D of tool hydrophilic surface is a clathrate.Perhaps, the material layer 445 of low-surface-energy be shaped as strip, and the barrier wall structure 450D of hydrophilic surface is a clathrate, make the barrier wall structure 450D of hydrophilic surface directly contact, and barrier wall structure 450D contact with the material layer 445 of low-surface-energy along the part of other direction with dielectric layer 430 along the part of the material layer 445 of strip low-surface-energy.
Fig. 8 is the process flow diagram of Electrowetting display manufacture method according to another embodiment of the present invention.The manufacture method step of the Electrowetting display of present embodiment substantially should be identical with previous described corresponding Fig. 5 embodiment step, by the technical staff in the technical field of the invention is understood, for asking simple and clear event, omits the disclosure of correlative detail at this.Right difference is, forms the barrier wall structure (S328) on dielectric layer of tool hydrophilic surface earlier, defines a plurality of pixel regions, makes it expose dielectric layer.Then, form again on the dielectric layer of the material layer with low-surface-energy in pixel region of patterning (S326).For example on the dielectric layer of hydrophobic polymer material in pixel region with ink-jet method spraying fluorinated.
Fig. 9 A-9E shows the diagrammatic cross-section of making each step of Electrowetting display according to another embodiment of the present invention.See also Fig. 9 A, second substrate 410 is provided, its material comprises glass, macromolecular material or metal, and forms second electrode 420 on second substrate 410.Then, form dielectric layer 430 on second electrode 420.
See also Fig. 9 B, form thick-film material layer 450 comprehensively, for example positive photoresist, negative photoresist, photo-curable resin or thermoset resin are on dielectric layer 430.Then, impose photoetching and etching step, to form the barrier wall structure 450 of hydrophilic surface with its patterning.
Then, see also Fig. 9 C, impose ink jet printing (inkjet printing) step, by ink discharge device 500, the dielectric layer 430 of hydrophobic polymer material 445 ' in each pixel region of spraying fluorinated is to form the material layer with low-surface-energy 445 of patterning.
See also Fig. 9 D, on the other hand, provide first substrate 460, and form first transparent electrode layer 470 thereon.Then, subtend makes up second substrate 410 and first substrate 460, makes to insert and put non-polar solution layer 480 and polar solvent layer 485 therebetween, shown in Fig. 9 E.At last, carry out other subsequent steps, for example assembling backlight module and color filter film are finished Electrowetting display apparatus.
It should be noted, though in the various embodiments described above of the present invention, directly contact first substrate 460 with the upper limb of the barrier wall structure 450 of hydrophilic surface and be the example explanation, right non-in order to limit Electrowetting display of the present invention.In other embodiments, the height of the barrier wall structure 450a of hydrophilic surface can be lower than the clearance height (cell gap) between first substrate, second substrate, and barrier wall structure 450a is not contacted with first substrate 460, as shown in figure 10.For example, about 10 microns of the height of barrier wall structure 450a (μ m), the clearance height between first substrate, second substrate (cell gap) is about 50 microns (μ m).
Though the present invention discloses as above with embodiment; so it is not in order to limit scope of the present invention; any the technical staff in the technical field of the invention without departing from the spirit and scope of the present invention; when can doing a little change and retouching, so protection scope of the present invention is when looking being as the criterion that accompanying Claim defines.
Claims (50)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100085517A CN101493576B (en) | 2008-01-23 | 2008-01-23 | Electrowetting display device and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100085517A CN101493576B (en) | 2008-01-23 | 2008-01-23 | Electrowetting display device and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101493576A true CN101493576A (en) | 2009-07-29 |
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