CN101493425B - Full automatic ultraviolet optical detection method for microscopic surface flaw and system thereof - Google Patents
Full automatic ultraviolet optical detection method for microscopic surface flaw and system thereof Download PDFInfo
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- CN101493425B CN101493425B CN2008101726000A CN200810172600A CN101493425B CN 101493425 B CN101493425 B CN 101493425B CN 2008101726000 A CN2008101726000 A CN 2008101726000A CN 200810172600 A CN200810172600 A CN 200810172600A CN 101493425 B CN101493425 B CN 101493425B
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CN2008101726000A CN101493425B (en) | 2008-10-31 | 2008-10-31 | Full automatic ultraviolet optical detection method for microscopic surface flaw and system thereof |
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CN2008101726000A CN101493425B (en) | 2008-10-31 | 2008-10-31 | Full automatic ultraviolet optical detection method for microscopic surface flaw and system thereof |
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CN101493425A CN101493425A (en) | 2009-07-29 |
CN101493425B true CN101493425B (en) | 2011-07-20 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9970873B1 (en) | 2014-11-12 | 2018-05-15 | Kla-Tencor Corporation | System and method for luminescent tag based wafer inspection |
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CN105891215B (en) * | 2016-03-31 | 2019-01-29 | 浙江工业大学 | Welding visible detection method and device based on convolutional neural networks |
CN106442548A (en) * | 2016-11-25 | 2017-02-22 | 北京兆维电子(集团)有限责任公司 | Full automatic detection system based on CELL screen |
CN107421954A (en) * | 2017-08-03 | 2017-12-01 | 合肥祥国电子商务有限公司 | A kind of ceramic gift comes to the surface quality detecting system |
CN107677703A (en) * | 2017-09-22 | 2018-02-09 | 铜陵泽辉电子有限责任公司 | A kind of metallized film precision intellectualized detection method of capacitor |
DE102018107689A1 (en) | 2018-03-29 | 2019-10-02 | Krones Ag | Method and device for inspecting containers |
CN109613004A (en) * | 2018-12-13 | 2019-04-12 | 武汉精立电子技术有限公司 | Defect display methods in a kind of inspection of backlight |
CN111948220A (en) * | 2020-09-11 | 2020-11-17 | 浙江水晶光电科技股份有限公司 | Chip testing equipment |
Citations (8)
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JP2000352507A (en) * | 1999-06-10 | 2000-12-19 | Sony Corp | Inspection apparatus |
JP2002214159A (en) * | 2001-01-12 | 2002-07-31 | Sony Corp | Substrate inspecting device, substrate inspecting method, and manufacturing method for liquid crystal display device |
CN1379459A (en) * | 2001-01-22 | 2002-11-13 | 索尼株式会社 | Apparatus used for evaluating polycrystalline silicon film |
WO2004100206A1 (en) * | 2003-05-09 | 2004-11-18 | Ebara Corporation | Electron beam device, electron beam inspection method, electron beam inspection device, pattern inspection method and exposure condition determination method |
CN1699915A (en) * | 2001-03-06 | 2005-11-23 | 东丽株式会社 | Inspection method, inspection device and manufacturing method for display panel |
JP2006098156A (en) * | 2004-09-29 | 2006-04-13 | Hitachi High-Technologies Corp | Defect inspection method and apparatus |
US20060163503A1 (en) * | 2005-01-21 | 2006-07-27 | Yuta Urano | Method for inspecting pattern defect and device for realizing the same |
CN201302555Y (en) * | 2008-10-31 | 2009-09-02 | 东莞康视达自动化科技有限公司 | Full-automatic ultraviolet optical detection system for microscopic surface defects |
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- 2008-10-31 CN CN2008101726000A patent/CN101493425B/en active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000352507A (en) * | 1999-06-10 | 2000-12-19 | Sony Corp | Inspection apparatus |
JP2002214159A (en) * | 2001-01-12 | 2002-07-31 | Sony Corp | Substrate inspecting device, substrate inspecting method, and manufacturing method for liquid crystal display device |
CN1379459A (en) * | 2001-01-22 | 2002-11-13 | 索尼株式会社 | Apparatus used for evaluating polycrystalline silicon film |
CN1699915A (en) * | 2001-03-06 | 2005-11-23 | 东丽株式会社 | Inspection method, inspection device and manufacturing method for display panel |
WO2004100206A1 (en) * | 2003-05-09 | 2004-11-18 | Ebara Corporation | Electron beam device, electron beam inspection method, electron beam inspection device, pattern inspection method and exposure condition determination method |
JP2006098156A (en) * | 2004-09-29 | 2006-04-13 | Hitachi High-Technologies Corp | Defect inspection method and apparatus |
US20060163503A1 (en) * | 2005-01-21 | 2006-07-27 | Yuta Urano | Method for inspecting pattern defect and device for realizing the same |
CN201302555Y (en) * | 2008-10-31 | 2009-09-02 | 东莞康视达自动化科技有限公司 | Full-automatic ultraviolet optical detection system for microscopic surface defects |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9970873B1 (en) | 2014-11-12 | 2018-05-15 | Kla-Tencor Corporation | System and method for luminescent tag based wafer inspection |
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CN101493425A (en) | 2009-07-29 |
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Effective date of registration: 20130104 Address after: 523000 Guangdong Province, Dongguan City Luo Sha Sha Xiang Wei called LIAN building community building A Industrial Zone No. 601 Patentee after: CSTMV Automation Technology Co., Ltd. Address before: 523000 Guangdong Province, Dongguan City Dongcheng Avenue GITIC tower C Patentee before: Dongguan Csray Automation Technology Co.,Ltd. |
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Denomination of invention: Full automatic ultraviolet optical detection method for microscopic surface flaw and system thereof Effective date of registration: 20150922 Granted publication date: 20110720 Pledgee: China Co truction Bank Corp Dongguan branch Pledgor: CSTMV Automation Technology Co., Ltd. Registration number: 2015990000805 |
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Address after: No. 333, Zhushan Zhenxing Road, Dongcheng District, Dongguan City, Guangdong Province Patentee after: Guangdong Keshi Optical Technology Co.,Ltd. Address before: 523000 Room 601, building a, Lianchuang building, Jiaowei Industrial Zone, Shaxiang, Luosha community, Guancheng, Dongguan City, Guangdong Province Patentee before: CST AUTOMATION TECHNOLOGY Co.,Ltd. |
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Date of cancellation: 20211019 Granted publication date: 20110720 Pledgee: China Co. truction Bank Corp Dongguan branch Pledgor: CST AUTOMATION TECHNOLOGY Co.,Ltd. Registration number: 2015990000805 |