CN101481815B - Fixture for single-film plating used in an inert environment - Google Patents
Fixture for single-film plating used in an inert environment Download PDFInfo
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- CN101481815B CN101481815B CN2008101909232A CN200810190923A CN101481815B CN 101481815 B CN101481815 B CN 101481815B CN 2008101909232 A CN2008101909232 A CN 2008101909232A CN 200810190923 A CN200810190923 A CN 200810190923A CN 101481815 B CN101481815 B CN 101481815B
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- piston
- jig
- electrode pole
- electrode terminal
- fixture
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- 238000007747 plating Methods 0.000 title description 4
- 238000009713 electroplating Methods 0.000 claims abstract description 10
- 238000005538 encapsulation Methods 0.000 claims abstract 2
- 239000000463 material Substances 0.000 claims description 7
- 239000012528 membrane Substances 0.000 claims description 5
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims description 2
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims 1
- 238000007789 sealing Methods 0.000 abstract description 17
- 239000010408 film Substances 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 4
- 238000011282 treatment Methods 0.000 abstract description 4
- 238000012360 testing method Methods 0.000 abstract description 3
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 239000010409 thin film Substances 0.000 abstract description 2
- 238000005323 electroforming Methods 0.000 abstract 1
- 238000004070 electrodeposition Methods 0.000 description 5
- 230000004308 accommodation Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000007714 electro crystallization reaction Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
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- Electroplating Methods And Accessories (AREA)
Abstract
Description
技术领域technical field
本发明属于电沉积技术领域,涉及在惰性环境下使用的单面膜电镀用夹具。The invention belongs to the technical field of electrodeposition, and relates to a jig for single-film electroplating used in an inert environment.
技术背景technical background
电镀是材料表面工程的重要手段,目前被广泛用于各个工业领域。由于电化学反应的多样性,由于电结晶和电沉积本身的灵活多样的特点,目前电镀工艺已从传统的金属领域向非金属如半导体、功能复合材料等多种新兴领域。制取半导体材料,包括薄膜型半导体元件、平面显示器件、大面积廉价太阳能电池、光敏电阻、电容、光导、电导、磁导与记忆元件以及一些特殊的元器件,如发光和荧光元器件等等。在研究领域,许多电沉积过程,如电沉积IA、IIA族金属或其化合物,由于该类材料对水、氧环境非常敏感,故常常需要发生在无氧无水的惰性环境中,并且所沉积的材料需要在薄膜上单面成膜,能够在非破坏条件下取出样品作进一步的材料结构表征、性能测试等分析。Electroplating is an important means of material surface engineering and is currently widely used in various industrial fields. Due to the diversity of electrochemical reactions and the flexible and diverse characteristics of electrocrystallization and electrodeposition, the current electroplating process has shifted from the traditional metal field to non-metallic such as semiconductors, functional composite materials and other emerging fields. Preparation of semiconductor materials, including thin-film semiconductor components, flat-panel display devices, large-area cheap solar cells, photosensitive resistors, capacitors, photoconductors, conductance, magnetic conductance and memory components, as well as some special components, such as light-emitting and fluorescent components, etc. . In the field of research, many electrodeposition processes, such as electrodeposition of Group IA and IIA metals or their compounds, often need to occur in an oxygen-free and water-free inert environment because these materials are very sensitive to water and oxygen environments, and the deposited The materials need to be formed on one side of the film, and the samples can be taken out under non-destructive conditions for further material structure characterization, performance testing and other analysis.
发明内容Contents of the invention
本发明的目的是提供在惰性环境下使用的单面膜电镀用夹具,能够非破坏性取出样品的夹具。本发明的技术方案是:、在惰性环境下使用的单面膜电镀用夹具,包括容置空腔和活塞两个主体部分,容置空腔的一侧设有阶梯型样品处理窗口,窗口内侧设置有下密封圈,活塞与容置空腔之间为螺纹连接,活塞与容置空腔接触处设有上密封圈,活塞的内部置有电极极柱,电极极柱的下端面与活塞底面保持在一个平面上,电极极柱上端延伸至活塞外部并设有螺帽,直接与外电路通过夹具相连,电极极柱与活塞之间为紧封装,在电极极柱上置有内密封圈。电极极柱为铜或不锈钢材质,容置空腔为长方体或圆柱体,容置空腔材料为聚四氟乙烯。试样装入容置空腔,仅通过样品窗口露出预处理表面,未露出的部分通过与容置空腔的紧密装配,达到不漏液、不漏气的目的。夹具的另一侧装配有一个可与外电路形成电流通路的极柱,电极极柱与盒体之间亦采用密封接触。电极极柱不仅起着导电的作用,且能够在电极极柱的轴向方向上上下移动以满足不同膜厚样品的紧封装。电极极柱与膜样品非处理面之间采用面接触,与传统的电接触相比,可以最大限度地保证二者的电接触稳定性,并且也可以使二者之间接触更紧密以降低接触电阻。The object of the present invention is to provide a jig for single-film electroplating used in an inert environment, and a jig capable of taking out samples non-destructively. The technical solution of the present invention is: 1. The clamp for single-film electroplating used in an inert environment, including two main parts of the accommodating cavity and the piston, one side of the accommodating cavity is provided with a stepped sample processing window, and the inner side of the window is provided There is a lower sealing ring, the piston and the accommodation cavity are threadedly connected, an upper sealing ring is provided at the contact between the piston and the accommodation cavity, and an electrode pole is placed inside the piston, and the lower end surface of the electrode pole is kept in contact with the bottom surface of the piston. On a plane, the upper end of the electrode pole extends to the outside of the piston and is provided with a nut, which is directly connected to the external circuit through a clamp. The electrode pole and the piston are tightly packaged, and an inner sealing ring is placed on the electrode pole. The electrode pole is made of copper or stainless steel, the accommodating cavity is a cuboid or cylinder, and the material of the accommodating cavity is polytetrafluoroethylene. The sample is loaded into the containing cavity, and only the pretreated surface is exposed through the sample window, and the unexposed part is tightly assembled with the containing cavity to achieve the purpose of no liquid leakage and no air leakage. The other side of the fixture is equipped with a pole that can form a current path with the external circuit, and the electrode pole and the box are also in sealed contact. The electrode pole not only plays a conductive role, but also can move up and down in the axial direction of the electrode pole to meet the tight packaging of samples with different film thicknesses. Surface contact is used between the electrode pole and the non-treated surface of the membrane sample. Compared with the traditional electrical contact, it can ensure the stability of the electrical contact between the two to the greatest extent, and can also make the contact between the two closer to reduce the contact. resistance.
本发明的有益效果是:能够对薄膜样品需要单侧处理时提供电极通路,能够对不同厚度的膜样品进行电镀而不影响其密封效果;能够在实验室简单条件下进行样品的封装与测试,而不需要其他辅助工具,非常灵活试样;不仅能够用于惰性条件下的膜样品电沉积、电结晶处理,对于需要特殊气氛以及特殊工艺下进行的各种表面处理亦非常适用。The beneficial effects of the present invention are: it can provide electrode access when the film sample needs to be processed on one side, it can electroplate film samples of different thickness without affecting its sealing effect; it can package and test the sample under simple conditions in the laboratory, It does not need other auxiliary tools, and it is very flexible for samples; it can not only be used for electrodeposition and electrocrystallization of film samples under inert conditions, but also very suitable for various surface treatments that require special atmospheres and special processes.
附图说明Description of drawings
面结合附图对本发明作进一步说明。The present invention will be further described with reference to the accompanying drawings.
图1为本发明的剖面装配示意图。Fig. 1 is a schematic sectional assembly diagram of the present invention.
图2为本发明的整体结构立体剖面示意图。Fig. 2 is a schematic three-dimensional cross-sectional view of the overall structure of the present invention.
图中:1、容置空腔,2、活塞,3、螺帽,4、电极极柱,5、内密封圈,6、下密封圈,7、上密封圈。In the figure: 1. Accommodating cavity, 2. Piston, 3. Nut, 4. Electrode pole, 5. Inner sealing ring, 6. Lower sealing ring, 7. Upper sealing ring.
具体实施方式Detailed ways
本发明包括容置空腔1和活塞2两个主体部分,容置空腔1,容置空腔1为中空的圆环体结构,活塞2为圆环形结构。容置空腔1一侧设有阶梯型样品处理窗口,窗口内侧设置有下密封圈6,该密封圈主要作用是隔绝镀液环境与非处理表面;圆环形容置空腔1内壁车有螺纹,供活塞2进入,并通过活塞2的移动使样品紧压在阶梯型窗口处,露在窗口的膜镀件样品表面为预处理表面,封闭于腔体内的表面为非处理面。活塞2与容置空腔1之间为螺纹连接,为了进一步保持密封效果,活塞2与容置空腔1接触处设有上密封圈7,以防止镀液进入镀件非处理区域。活塞2的内部置有不锈钢材质的电极极柱4,电极极柱4的下端面与活塞2底面保持在一个平面上,以使样品能够与电极极柱4通过面接触方式形成电流通路,电极极柱4上端延伸至活塞2外部并设有螺帽3,直接与外电路通过夹具相连,为保证密封效果,电极极柱4与活塞2之间为紧封装,在电极极柱4上置有内密封圈5,进一步保证密封性。The present invention comprises two main parts of accommodating cavity 1 and piston 2, accommodating cavity 1, accommodating cavity 1 is a hollow ring structure, and piston 2 is a ring structure. There is a stepped sample processing window on one side of the accommodation cavity 1, and a lower sealing ring 6 is arranged on the inner side of the window. The main function of the sealing ring is to isolate the plating solution environment from the non-treated surface; , for the entry of the piston 2, and the movement of the piston 2 makes the sample tightly pressed against the stepped window. The surface of the coating sample exposed in the window is the pretreatment surface, and the surface enclosed in the cavity is the non-treatment surface. The piston 2 and the housing cavity 1 are threaded. In order to further maintain the sealing effect, an upper sealing ring 7 is provided at the contact between the piston 2 and the housing cavity 1 to prevent the plating solution from entering the non-treatment area of the plating piece. The inside of the piston 2 is equipped with an electrode pole 4 made of stainless steel, and the lower end surface of the electrode pole 4 is kept on a plane with the bottom surface of the piston 2, so that the sample can form a current path with the electrode pole 4 through surface contact. The upper end of the column 4 extends to the outside of the piston 2 and is provided with a nut 3, which is directly connected to the external circuit through a clamp. In order to ensure the sealing effect, the electrode pole 4 and the piston 2 are tightly packaged, and an internal The sealing ring 5 further ensures the tightness.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN2008101909232A CN101481815B (en) | 2008-12-30 | 2008-12-30 | Fixture for single-film plating used in an inert environment |
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Application Number | Priority Date | Filing Date | Title |
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CN2008101909232A CN101481815B (en) | 2008-12-30 | 2008-12-30 | Fixture for single-film plating used in an inert environment |
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CN101481815A CN101481815A (en) | 2009-07-15 |
CN101481815B true CN101481815B (en) | 2010-06-09 |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3493433A (en) * | 1964-10-13 | 1970-02-03 | American Cyanamid Co | Electrodeposition of alkali metals from nonaqueous solvents |
CN1297588A (en) * | 1998-02-18 | 2001-05-30 | 波利普拉斯电池有限公司 | Plating metal negative electrodes under protective coatings |
CN1546737A (en) * | 2003-11-28 | 2004-11-17 | 魏连o | One side electroplating method and apparatus therefor |
CN2937158Y (en) * | 2006-07-25 | 2007-08-22 | 深圳市好利时实业有限公司 | Special hanger for one-side electroplating |
CN101162772A (en) * | 2007-10-12 | 2008-04-16 | 哈尔滨工业大学 | Spume lithium cathode of lithium metal secondary batteries and method for producing the same |
-
2008
- 2008-12-30 CN CN2008101909232A patent/CN101481815B/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3493433A (en) * | 1964-10-13 | 1970-02-03 | American Cyanamid Co | Electrodeposition of alkali metals from nonaqueous solvents |
CN1297588A (en) * | 1998-02-18 | 2001-05-30 | 波利普拉斯电池有限公司 | Plating metal negative electrodes under protective coatings |
CN1546737A (en) * | 2003-11-28 | 2004-11-17 | 魏连o | One side electroplating method and apparatus therefor |
CN2937158Y (en) * | 2006-07-25 | 2007-08-22 | 深圳市好利时实业有限公司 | Special hanger for one-side electroplating |
CN101162772A (en) * | 2007-10-12 | 2008-04-16 | 哈尔滨工业大学 | Spume lithium cathode of lithium metal secondary batteries and method for producing the same |
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CN101481815A (en) | 2009-07-15 |
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