CN101446775B - Alignment light source apparatus - Google Patents
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- CN101446775B CN101446775B CN2008102049515A CN200810204951A CN101446775B CN 101446775 B CN101446775 B CN 101446775B CN 2008102049515 A CN2008102049515 A CN 2008102049515A CN 200810204951 A CN200810204951 A CN 200810204951A CN 101446775 B CN101446775 B CN 101446775B
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Abstract
The invention provides an alignment light source apparatus which comprises at least two sets of laser units having different wavelengths, wherein, the laser unit comprises a laser, a light intensity modulator, a phase modulator and a transmission fiber. The light path of a light beam is provided with a beam shaping device which comprises a first and a second optical rotation sheets, a first and a second polarizing beam splitters, a first and a second reshapers and a first and a second reflecting mirrors. The alignment light source apparatus reduces laser facula, improves the luminous energy utilization rate of the laser irradiated on the alignment mark and the intensity of alignment signals, increases the signal-to-noise of the alignment signals, and is beneficial to improving the alignment accuracy.
Description
Technical field
The present invention relates to integrated circuit manufacturing installation field, and be particularly related to a kind of alignment light source device and alignment system that is used for lithographic equipment.
Background technology
Lithographic equipment is mainly used in the manufacturing of integrated circuit (IC) or other microdevice.By lithographic equipment, the multilayer mask with different mask patterns is imaged on the wafer that is coated with photoresist under accurately aiming at successively, for example semiconductor wafer or LCD plate.Lithographic equipment is divided into two classes substantially, one class is the stepping lithographic equipment, the mask pattern single exposure is imaged on an exposure area of wafer, wafer moves with respect to mask subsequently, next exposure area is moved to mask pattern and projection objective below, again mask pattern is exposed in another exposure area of wafer, repeat the picture that this process all exposure areas on wafer all have mask pattern.Another kind of is the step-scan lithographic equipment, and in said process, mask pattern is not the single exposure imaging, but the scanning mobile imaging by the projection light field.In the mask pattern imaging process, mask and wafer move with respect to optical projection system and projected light beam simultaneously.
Critical step is with mask and wafer aligned in the lithographic equipment.After exposing on wafer, the ground floor mask pattern from device, removes, after the PROCESS FOR TREATMENT that wafer is correlated with, carry out the exposure of second layer mask pattern, but for guarantee second layer mask pattern and subsequently the picture of mask pattern mask and wafer accurately need be aimed at respect to the accurate location of exposed mask pattern image on the wafer.IC device by the photoetching technique manufacturing needs multiexposure, multiple exposure to form multilayer circuit in wafer, for this reason, requires the configuration alignment system in the lithographic equipment, realizes the accurate aligning of mask and wafer.When characteristic dimension requires more hour, the requirement of alignment precision and consequent requirement to alignment precision are become strict more.
The alignment system of lithographic equipment, its major function is to realize mask-wafer aligned before the alignment exposure, promptly measure the coordinate (XW of wafer in coordinate system of machine, YW, Φ WZ), and the coordinate (XR of mask in coordinate system of machine, YR, Φ RZ), and calculates the position of mask, to satisfy the requirement of alignment precision with respect to wafer.Prior art has two kinds of alignment scheme.A kind of is the TTL technique of alignment that sees through camera lens, the alignment mark of the periodic phase optical grating construction that laser lighting is provided with on wafer, diffraction light or scattered light by the collected wafer alignment marks of the projection objective of lithographic equipment shine on mask alignment mark, and this alignment mark can be amplitude or phase grating.Behind the mask mark detector is set, when scanning wafer under projection objective, surveys the light intensity that sees through the mask mark, the maximal value of detector output is represented correct alignment position.This aligned position provides zero reference for the position measurement of the laser interferometer that is used for monitoring wafer platform position and moves.Another kind is an OA off-axis alignment technology, is positioned at the reference mark of datum plate on a plurality of alignment marks on the wafer and the wafer station by the off-axis alignment systematic survey, realizes that wafer aligned and wafer station aim at; The reference mark of datum plate is aimed at mask alignment mark on the wafer station, realizes mask registration; The position relation of mask and wafer be can obtain thus, mask and wafer aligned realized.
At present, the most alignment so that adopts of lithographic equipment is a grating alignment.Grating alignment is meant that even illumination beam on the grating alignment mark diffraction takes place, and the emergent light behind the diffraction carries the full detail about alignment mark structure.Senior diffraction light scatters from the phase alignment grating with wide-angle, after filtering zero order light by spatial filter, gather diffraction light ± 1 order diffraction light, the perhaps raising that requires along with CD, gather multi-level diffraction light (comprising senior) simultaneously in picture plane interference imaging, through photodetector and signal Processing, determine the centering adjustment position.
A kind of existing technical situation is (referring to Chinese invention patent, publication number: CN101114135, denomination of invention: a kind of alignment system that is used for lithographic equipment), the phase grating of three specific periods combinations of employing certain intervals is as alignment mark, shown in Fig. 2 (a) and (b).This mark is positioned on the front focal plane of 4f system, makes laser beam vertical irradiation mark, and special diaphragm only allows diffraction ± 1 grade light pass through, and forms the interference fringe of light intensity Sine distribution after ± 1 grade of light 4f system in optical module on its back focal plane; And be positioned on the 4f system back focal plane with reference to grating, be the amplitude grating in three cycles with reference to grating, its cycle is half of respective markers grating cycle, can obtain aligned position information by surveying with reference to the light intensity behind the grating and handling.Shown in Fig. 2 (a) and (b), the both sides of three periods phase grating are the gratings that are respectively the large period of p1, p2 the cycle, and the cycle difference of two gratings is very little, are mainly used in to enlarge capture range and coarse alignment.Because the cycle is that its capture range of p1 grating is p1/2 separately, so use its capture range of grating in two cycles to expand to simultaneously
The centre is to be the minor cycle grating of p0 in the cycle, is mainly used in fine alignment.Because the center distance of p1 and p0 is that the center distance of integral multiple, p2 and the p0 of p1/2 is the integral multiple of p2/2, so when in capture range, the phase grating mark being scanned, when the light intensity behind the amplitude grating of answering with the minor cycle grating pair is maximal value, light intensity behind the amplitude grating of answering with the large period grating pair also is maximal value, is aligned position this moment.
In this technology, owing to be labeled as strip, and laser facula is circular, so most of energy has all been wasted when rayed is on quasi-mark, shown in Fig. 3 (a) and (b).All carry out because follow-up registration signal is handled,, then require higher follow-up signal amplifying system if therefore the energy that reflects on the mark is low excessively at light intensity signal; When simultaneously hot spot is excessive, is radiated at easily on the integrated circuit pattern on mark next door and produces parasitic light, cause the signal to noise ratio (S/N ratio) of signal to descend.The present invention is primarily aimed at above-mentioned situation, proposes a kind of alignment light source device that comprises light-beam forming unit, and circular light beam is shaped as the strip hot spot, improves utilization ratio of laser energy, improves the signal to noise ratio (S/N ratio) of light intensity signal simultaneously.
Summary of the invention
In order to overcome the shortcoming that exists in the prior art, the invention provides a kind of energy and improve the alignment light source device that is radiated at the laser light energy utilization factor on the alignment mark and helps improving alignment precision.
To achieve these goals, the present invention proposes a kind of alignment light source device, comprises the different laser cell of at least two cover wavelength, and described laser cell comprises laser instrument, phase-modulator, light intensity modulator and Transmission Fibers.Described laser instrument sends light beam, described phase-modulator and described light intensity modulator are positioned on the light path of described light beam successively, described light beam penetrates by described Transmission Fibers, it is characterized in that on the light path of the light beam that described laser instrument sends, placing a light-beam forming unit, be used to dwindle beam and focus, described light-beam forming unit comprises:
First optical rotation plate and second optical rotation plate lay respectively at the two ends of described light-beam forming unit, and light beam enters described light-beam forming unit through described first optical rotation plate, penetrate through described second optical rotation plate;
First polarization beam apparatus and second polarization beam apparatus are arranged between described first optical rotation plate and described second optical rotation plate along optical path direction;
The first shaping device and the second shaping device are between described first polarization beam apparatus and described second polarization beam apparatus.
Described light-beam forming unit also comprises first catoptron and second catoptron, described first catoptron enters the described second shaping device with the reflection of the reflection emergent light of described first polarization beam apparatus, and the emergent light reflection that described second catoptron will the described second shaping device enters described second polarization beam apparatus or the emergent light of described first reshaper reflected and enters described second polarization beam apparatus.
All be coated with on described first catoptron and described second catoptron and increase anti-film.
Described increase anti-film be used to strengthen this wavelength the reflection of light ability increase anti-film.
Described laser instrument is gas laser or solid state laser or semiconductor laser or fiber laser.
Described first optical rotation plate and second optical rotation plate all comprise two zones: first transmission region and second transmission region, each transmission region is all semi-annular shape.The first transmission region optically-active angle is 90 degree, the polarization direction of incoming laser beam is revolved turn 90 degrees; The second transmission region optically-active angle is 0 degree, with polarization direction rotation 0 degree of incoming laser beam.
Described light-beam forming unit also comprises motor, by the switching between driven by motor first optical rotation plate and second optical rotation plate rotation each optical rotation plate first transmission region of realization and second transmission region.
Described first polarization beam apparatus is orthogonal or parallel with the beam-splitting surface of described second polarization beam apparatus.
The described first shaping device and the second shaping device are set of cylindrical lenses, or the liquid crystal light valve modulator, or micro optical element.
Described set of cylindrical lenses is made up of two different cylindrical lenses of focal length, and the ratio of two focal lengths is by the width decision of required strip hot spot.
The vertical placement mutually of the set of cylindrical lenses of the set of cylindrical lenses of the described first shaping device and the described second shaping device.
The cylindrical mirror plane along continuous straight runs of the described first shaping device set of cylindrical lenses, the cylindrical mirror plane of the described second shaping device set of cylindrical lenses is vertically; The cylindrical mirror plane of the perhaps described first shaping device set of cylindrical lenses vertically, the cylindrical mirror plane along continuous straight runs of the described second shaping device set of cylindrical lenses.
Described light-beam forming unit launching spot is circular, after the shaping of hot spot process, and outgoing strip hot spot.
To achieve these goals, the present invention also proposes a kind of alignment system that is used for lithographic equipment, be made of described alignment light source device, optical module, signal processing module and alignment mark, wherein the alignment light source device sends the aligning illuminating bundle, the irradiation alignment mark; Optical module is gathered alignment mark ± 1 order diffraction light, and is right ± 1 order diffraction light coherent imaging, and surveys the alignment light signal; Signal processing module is handled the positional information that the alignment light signal obtains alignment mark.Comprise described light-beam forming unit in the alignment light source device, the circular light spot that is used for aiming at illuminating bundle is shaped to the strip hot spot; Described alignment mark is the strip structure, comprises the phase grating of three groups of different cycles.Form three groups of phase gratings of alignment mark and arrange along aligning direction, form the strip structure, the cycle of one group of phase grating in the middle of being arranged in is less than the cycle of the phase grating that is arranged in its both sides.
The beneficial effect of a kind of alignment light source device of the present invention mainly shows: the present invention has dwindled laser facula, improves the laser light energy utilization factor that is radiated on the alignment mark, improves registration signal intensity, helps improving alignment precision; After circular light spot become strip, be not easy to be radiated on the integrated circuit pattern on alignment mark next door, reduce parasitic light, improved the signal to noise ratio (S/N ratio) of alignment light signal.Simultaneously since adopt in the apparatus for shaping be the energy transmitance at the optical rotation plate more than 98%, and light is full impregnated at the polarization beam apparatus place or is all-trans, so there is not off-energy basically, improved registration signal intensity.
Description of drawings
Fig. 1 is a lithographic equipment alignment system synoptic diagram;
Fig. 2 (a) and (b) are respectively X of the prior art, three cycle of Y direction mark synoptic diagram;
Fig. 3 (a) and (b) be prior art laser facula X, Y to three cycles mark scannng synoptic diagram;
Fig. 4 is the embodiment of the present invention first embodiment apparatus for shaping synoptic diagram;
Fig. 5 is the synoptic diagram of the optical rotation plate among Fig. 4;
Fig. 6 (a) and (b) for X, Y after the laser facula shaping of the present invention to three cycles mark scannng synoptic diagram;
Fig. 7 is the schematic diagram of set of cylindrical lenses reshaper compression hot spot;
Fig. 8 is the schematic diagram of cylindrical lens;
Fig. 9 (a) and (b) are respectively the synoptic diagram that liquid crystal light valve modulator apparatus for shaping is shaped to incident beam level, vertical direction strip hot spot;
Figure 10 (a) and (b) are respectively the synoptic diagram that the micro optical element apparatus for shaping is shaped to incident beam level, vertical direction strip hot spot;
Figure 11 is the embodiment of the present invention second embodiment apparatus for shaping synoptic diagram.
In the accompanying drawing: 1, base station mark; 2, mask mark; 3, base station mark; 4, mask; 5, substrate marker; 6, mask stage; 7, substrate; 9, base station; 10, the laser facula during shaping not; 11, the laser facula after the shaping; 12, first cylindrical lens; 13, second cylindrical lens; 14, cylindrical lens; 20, the first liquid crystal light valve modulator; 21, the second liquid crystal light valve modulator; 22, first micro optical element; 23, second micro optical element; 100, alignment device; 101, alignment mark signal; 102, Transmission Fibers; 103, Transmission Fibers; 111, first optical rotation plate; 112, first polarization beam apparatus; 113, first catoptron; 114, first reshaper; 121, second optical rotation plate; 122, second polarization beam apparatus; 123, second catoptron; 124, second reshaper; 200, signal processor; 211, first transmission region; 212, second transmission region; 213, optical rotation plate; 300, alignment light source; P0x, x are to the minor cycle grating of three cycle marks; P1x, x are to the large period grating of three cycle marks; P2x, x are to the another kind of large period grating of three cycle marks; P0y, y are to the minor cycle grating of three cycle marks; P1y, y are to the large period grating of three cycle marks; P2y, y are to the another kind of large period grating of three cycle marks; Basad displacement measuring device laser interferometer of IFx, x; Basad displacement measuring device laser interferometer of IFy, y; PL, projection objective;
Embodiment
Below in conjunction with accompanying drawing the specific embodiment of the present invention is further described.
A kind of alignment light source device of the present invention is used for the lithography alignment system, please refer to Fig. 1, and Fig. 1 is a lithographic equipment alignment system synoptic diagram.Primary structure comprises: alignment light source device 300, optical module 100, alignment mark 1,2,3,5, signal processing module 200.Peripheral element comprises: mask 4, mask stage 6, projection objective PL, substrate 7, base station 9, Transmission Fibers 102 and 103.The composition and the effect of each construction module are described below.
Alignment mark is a strip, and by the optical grating constitution of three different cycles of certain intervals, three groups of gratings are arranged along aligning direction, and the cycle of one group of phase grating in the middle of being arranged in is less than the cycle of the phase grating that is arranged in its both sides, as shown in Figure 2.Fig. 2 (a) shows and is used for x to the three cycle mark structures of aiming at.Comprise the grating branch of three of p0x, p1x, p2x, its cycle is respectively p0, p1, p2.Wherein p2x branch, p1x branch mark mid point become the center to be symmetrically distributed with respect to p0x branch mid point, and promptly the centre of form of whole mark overlaps with the p0x branch centre of form.Fig. 2 (b) shows and is used for y to the three cycle mark structures of aiming at.Fig. 3 comprises the grating branch of three of p0y, p1y, p2y, and its cycle is respectively p0, p1, p2.Wherein p2y branch, p1y branch mark mid point become the center to be symmetrically distributed with respect to p0y branch mid point, and promptly the centre of form of whole mark overlaps with the p0y branch centre of form.
The alignment scheme principle of three periodic optical grating marks is as follows: this mark is positioned on the front focal plane of 4f system, the laser beam vertical irradiation mark generation diffraction that the alignment light source device is sent, have only diffraction ± 1 grade light separately to pass through through behind the diaphragm, ± 1 grade of light forms the interference fringe of light intensity Sine distribution through interference on its back focal plane after the 4f system.And be positioned on the 4f system back focal plane with reference to grating, be the amplitude grating in three cycles with reference to grating, its cycle is half of respective markers grating cycle.When mark was scanned with respect to the reference grating, the light intensity behind three amplitude gratings was with mark and the corresponding sinusoidal signal that changes with reference to the relative position of grating, by signal processing module this signal is handled the aligned position information that draws.Shown in Fig. 2 (a) and (b), the both sides of three periods phase grating are the gratings that are respectively the large period of p1, p2 the cycle, are mainly used in to enlarge capture range and coarse alignment.Because the cycle is that its capture range of p1 grating is p1/2 separately, so use its capture range of grating in two cycles to be simultaneously
Because the cycle difference of two gratings is very little, so capture range increases greatly.The centre is to be the minor cycle grating of p0 in the cycle, is mainly used in fine alignment.Because the center distance of p1 and p0 is that the center distance of integral multiple, p2 and the p0 of p1/2 is the integral multiple of p2/2, so when in capture range, the phase grating mark being scanned, when the light intensity behind the amplitude grating of answering with the minor cycle grating pair is maximal value, light intensity behind the amplitude grating of answering with the large period grating pair also is maximal value, is aligned position this moment.
Whole alignment procedures is carried out in two steps, the first step is as follows: utilize the mask mark 2 on the mask 4 of non-exposure wavelength light source irradiation mask stage 6 carryings of more low-energy exposure light source or other, by projection objective PL the reduced image of mask mark 2 is projected on the base station mark 3 as the reference mark set on the base station 9, the sensor that utilizes base station mark 3 to be transmitted under it carries out the photosignal conversion, by a series of scanning collection signal, carry out process of fitting treatment in conjunction with the locus signal that records by x basad displacement measuring device laser interferometer IFx and basad displacement measuring device laser interferometer of y IFy, set up the coordinate transformation relation of mask and base station.
Second step is as follows: the strip hot spot of alignment light source device 300 outgoing is radiated on the base station mark 1, collects the alignment mark signal 101 that reflects on the mark by optical module 100.When base station mark 1 be arranged as the form of Fig. 2 (a) and (b) the time, carry out x to measure have three cycle x to the first-order diffraction light signal have three the tunnel, carry out y to measure have y to the first-order diffraction light signal have three the tunnel, six road signals are collected through alignment optical module 100 altogether, guide to than finishing in the registration signal processing module 200 at a distance by Transmission Fibers 102 and leave in the storage address of appointment after opto-electronic conversion and signal amplify conditioning and analog to digital conversion.Simultaneously, can obtain corresponding movement position information simultaneously by x basad displacement measuring device laser interferometer IFx and basad displacement measuring device laser interferometer of y IFy.To record numerical value and carry out process of fitting treatment, can find base station mark 1 corresponding alignment point coordinate figure (x under the base station coordinate system
1, y
1).In like manner, alignment optical module 100 can be measured substrate marker 5, obtains substrate marker 5 corresponding coordinate figure (x under the base station coordinate system
5, y
5).
By (x
1, y
1) and (x
5, y
5) can learn the position of substrate with respect to base station, in conjunction with the position of front base station, promptly know the coordinate of substrate with respect to mask with respect to mask.In scanning process, substrate is 0 o'clock with respect to the coordinate of mask, has promptly realized aiming at of substrate and mask.
Alignment light source device 300 comprises the different laser cell of at least two cover wavelength, and described laser cell comprises laser instrument, phase-modulator, light intensity modulator and Transmission Fibers.Described laser instrument sends light beam, and described phase-modulator and described light intensity modulator are positioned on the light path of described light beam successively, and described light beam penetrates by described Transmission Fibers, places a light-beam forming unit on the light path of described light beam, please refer to Fig. 4.Fig. 4 is the embodiment of the present invention first embodiment apparatus for shaping synoptic diagram, on scheming, can see, described light-beam forming unit comprises: first optical rotation plate 111 and second optical rotation plate 121, be positioned at the two ends of described light-beam forming unit, light beam enters described light-beam forming unit through described first optical rotation plate 111, penetrates through described second optical rotation plate 121; First polarization beam apparatus 112 and second polarization beam apparatus 122 are between described first optical rotation plate 111 and described second optical rotation plate 121; The first shaping device 114 and the second shaping device 124, between described first polarization beam apparatus 112 and described second polarization beam apparatus 122, described first shaping device 114 and the described second shaping device 124 are set of cylindrical lenses or liquid crystal light valve modulator or micro optical element.Described light-beam forming unit also comprises first catoptron 113 and second catoptron 123, described first catoptron 113 enters the described second shaping device 124 with the reflection emergent light reflection of described first polarization beam apparatus 112, and described second catoptron 123 enters described second polarization beam apparatus 122 with the emergent light reflection of the described second shaping device 124.All be coated with on described first catoptron 113 and described second catoptron 123 and increase anti-film.It is described that to increase anti-film be that described laser cell uses the anti-film of increasing of wavelength place.Described light-beam forming unit launching spot is circular, after the shaping of hot spot process, and outgoing strip hot spot.Described laser instrument is gas laser or solid state laser or semiconductor laser or fiber laser.
When scanning the long mark of vertical direction, issue an order by host computer, make driven by motor first optical rotation plate 111 and 121 rotations of second optical rotation plate, making its optically-active angle to incident laser is 0.The S polarized light light path of incident this moment is as follows: transmission by first optical rotation plate 111, first polarization beam apparatus, 112 places reflections, the second shaping device 124 of the reflection of first catoptron, 113 places, the transmission strip hot spot by the incident circular light spot being shaped to vertical direction, in the reflection of second catoptron, 123 places, reflection on second polarization beam apparatus 122, transmission by second optical rotation plate 121, last emergent light is the strip hot spot of the vertical direction of S polarization.
When the long mark of horizontal scan direction, issue an order by host computer, make driven by motor first optical rotation plate 111 and 121 rotations of second optical rotation plate, making its optically-active angle to incident laser is 90 degree.The S polarized light light path of incident this moment is as follows: transmission becomes the P polarized light after by first optical rotation plate 111, in the first shaping device 114, the transmission on second polarization beam apparatus 122 of transmission on first polarization beam apparatus 112, the transmission strip hot spot by the incident circular light spot being shaped to horizontal direction, become the P polarized light again the S polarized light through second optical rotation plate 121, and last emergent light is the strip hot spot of the horizontal direction of S polarization.
Please refer to Fig. 5, Fig. 5 is the synoptic diagram of the optical rotation plate among Fig. 4.As can be seen from the figure, optical rotation plate 213 is in the form of annular discs, and is middle porose.The optically-active angle in the first optically-active zone 211 is that the optically-active angle in 0, the second optically-active zone 212 is 90 degree.Optical rotation plate is fixed at interstitial hole place and motor, makes laser be incident on zones of different on the optical rotation plate by driven by motor optical rotation plate rotation, thereby realizes the switching between the optically-active angle.Described light-beam forming unit is placed between described laser instrument and the described phase-modulator, can realizes circular light spot is shaped as the strip hot spot of level (or vertical) direction, improved capacity usage ratio greatly.
Below, please refer to Fig. 6, Fig. 6 (a) and (b) for X, Y after the laser facula shaping of the present invention to three cycles mark scannng synoptic diagram, from the contrast of Fig. 6 and Fig. 3 as can be seen, after the present invention is shaped to level (vertically) direction strip hot spot with circular light beam, most of energy all is radiated on the mark, has improved capacity usage ratio greatly.And Fig. 3 in the aligning illumination circular Gaussian beam of circle, energy exposure is not utilized beyond mark greatly.
The lens combination that the first shaping device 114 that relates among Fig. 4, the second shaping device 124 can be made up of two different cylindrical lenses of focal length, determine the ratio of two cylindrical lens focal lengths according to the width of needed strip hot spot, as shown in Figure 7, Fig. 7 is the schematic diagram of set of cylindrical lenses reshaper compression hot spot, as seen from the figure
Because laser is the monochromatic light of small field of view, so two cylindrical lenses can be realized good shaping effect, therefore whole orthopedic systems structure is very simple.Fig. 8 is the schematic diagram of cylindrical lens, because incident light is approximately directional light, and by being focused to a line behind the cylindrical lens, i.e. line segment AB among the figure.
The first shaping device 114 and the second shaping device 124 are identical, make the first shaping device 114 and the 124 vertical placements of the second shaping device when just placing.
The first shaping device 114 that relates among Fig. 4 and the second shaping device 124 also can replace with the liquid crystal light valve modulator, shown in accompanying drawing 9 (a) and (b).The most current electrical addressing liquid crystal light valve modulator is a thin film transistor (TFT) transmissive arrays formula LCD TV now, this electrical addressing LCD space light modulator can be easily and computer interface, under the optical modulation pattern of setting, realize the amplitude of units corresponding pixel or the modulation of phase place.By selecting suitable voltage to be added on each liquid crystal pixel, the circular Gaussian beam of incident can be shaped to the strip hot spot of level (or vertical) direction.When elder generation is much by calculating, drawing the voltage that is added on each liquid crystal pixel, can realize the circular Gaussian beam of incident is shaped to the strip hot spot of level (or vertical) direction.With this voltage array process correlation computations, convert the control signal array of the controlling computer of liquid crystal light valve modulator to then.When the circular Gaussian beam vertical irradiation on the liquid crystal light valve modulator, its transmitted light just becomes the strip hot spot of level (or vertical) direction.
The first shaping device 114 and the second shaping device 124 that relate among Fig. 4 can also replace with micro optical element, shown in accompanying drawing 10 (a) and (b).Micro optical element is to make a plurality of optical components that are of a size of micron, nanometer scale on the sheet base, when light by the time can modulate its phase place.When the circular Gaussian beam of incident sees through when having the micro optical element of suitable phase modulation (PM) function, the phase place of transmitted light wave has realized suitable variation, and causing emergent light is the strip hot spot of level (or vertical) direction.Calculate the PHASE DISTRIBUTION function of micro optical element earlier, make micro optical element according to this PHASE DISTRIBUTION function then.When the circular Gaussian beam vertical irradiation was on micro optical element, its transmitted light just became the strip hot spot of level (or vertical) direction.
At last, please refer to Figure 11, Figure 11 is the embodiment of the present invention second embodiment apparatus for shaping synoptic diagram.With second catoptron 123 in the accompanying drawing 4 and second polarization beam apparatus, 122 switches, and the beam-splitting surface of second polarization beam apparatus 122 is parallel with the beam-splitting surface of first polarization beam apparatus 112, the position of while second optical rotation plate 121 is respective change also, allows light from top outgoing.
Promptly when scanning the long mark of vertical direction, issue an order by host computer, make driven by motor first optical rotation plate 111 and 121 rotations of second optical rotation plate, making its optically-active angle to incident laser is 0.The S polarized light light path of incident this moment is as follows: transmission by first optical rotation plate 111, at first polarization beam apparatus, 112 places reflections, the second shaping device 124, reflection on second polarization beam apparatus 122, transmission at the reflection of first catoptron, 113 places, the transmission strip hot spot by the incident circular light spot being shaped to vertical direction by second optical rotation plate 121, last emergent light is the strip hot spot of the vertical direction of S polarization.
When the long mark of horizontal scan direction, issue an order by host computer, make driven by motor first optical rotation plate 111 and 121 rotations of second optical rotation plate, making its optically-active angle to incident laser is 90 degree.The S polarized light light path of incident this moment is as follows: transmission becomes the P polarized light after by first optical rotation plate 111, at the first shaping device 114 of transmission on first polarization beam apparatus 112, the transmission strip hot spot by the incident circular light spot being shaped to horizontal direction, in the reflection of first catoptron, 123 places, transmission on second polarization beam apparatus 122, become the P polarized light again the S polarized light through second optical rotation plate 121, and emergent light is the strip hot spot of the horizontal direction of S polarization at last.
Above first reshaper among two embodiment strip hot spot, second reshaper that the incident circular light spot are shaped to horizontal direction the incident circular light spot is shaped to the strip hot spot of vertical direction, also can first reshaper incident circular light spot be shaped to the strip hot spot of vertical direction, the strip hot spot that second reshaper is shaped to the incident circular light spot horizontal direction.
Though the present invention discloses as above with preferred embodiment, so it is not in order to limit the present invention.The persond having ordinary knowledge in the technical field of the present invention, without departing from the spirit and scope of the present invention, when being used for a variety of modifications and variations.Therefore, protection scope of the present invention is as the criterion when looking claims person of defining.
Claims (16)
1. alignment light source device, comprise the different laser cell of at least two cover wavelength, described laser cell comprises a laser instrument at least, it is characterized in that: place a light-beam forming unit on the light path of the light beam that described laser instrument sends, be used to dwindle beam and focus, described light-beam forming unit comprises:
First optical rotation plate and second optical rotation plate lay respectively at the two ends of described light-beam forming unit, and light beam enters described light-beam forming unit through described first optical rotation plate, penetrate through described second optical rotation plate;
First polarization beam apparatus and second polarization beam apparatus are arranged between described first optical rotation plate and described second optical rotation plate along optical path direction;
The first shaping device and the second shaping device are between described first polarization beam apparatus and described second polarization beam apparatus;
First catoptron and second catoptron, described first catoptron enters the described second shaping device with the reflection of the reflection emergent light of described first polarization beam apparatus, and the emergent light reflection that described second catoptron will the described second shaping device enters described second polarization beam apparatus or the emergent light of described first reshaper reflected and enters described second polarization beam apparatus.
2. a kind of alignment light source device according to claim 1 is characterized in that: all be coated with on described first catoptron and described second catoptron and increase anti-film.
3. a kind of alignment light source device according to claim 2 is characterized in that: described increase anti-film be used to strengthen this wavelength the reflection of light ability increase anti-film.
4. a kind of alignment light source device according to claim 1 is characterized in that: described laser instrument is gas laser or solid state laser or semiconductor laser or fiber laser.
5. a kind of alignment light source device according to claim 1 is characterized in that: described first optical rotation plate and second optical rotation plate all comprise two zones: first transmission region and second transmission region, each transmission region is all semi-annular shape.
6. a kind of alignment light source device according to claim 5 is characterized in that: the described first transmission region optically-active angle is 90 degree, the polarization direction of incoming laser beam is revolved turn 90 degrees.
7. a kind of alignment light source device according to claim 5 is characterized in that: the described second transmission region optically-active angle is 0 degree, with polarization direction rotation 0 degree of incoming laser beam.
8. a kind of alignment light source device according to claim 5, it is characterized in that: described light-beam forming unit also comprises motor, by the switching between driven by motor first optical rotation plate and second optical rotation plate rotation each optical rotation plate first transmission region of realization and second transmission region.
9. a kind of alignment light source device according to claim 1 is characterized in that: described first polarization beam apparatus is orthogonal or parallel with the beam-splitting surface of described second polarization beam apparatus.
10. a kind of alignment light source device according to claim 1 is characterized in that: described light-beam forming unit launching spot is circle, after the shaping of hot spot process, and outgoing strip hot spot.
11. a kind of alignment light source device according to claim 1 is characterized in that: the described first shaping device and the second shaping device are set of cylindrical lenses, or the liquid crystal light valve modulator, or micro optical element.
12. a kind of alignment light source device according to claim 11 is characterized in that: described set of cylindrical lenses is made up of two different cylindrical lenses of focal length, and the ratio of two focal lengths is by the width decision of required strip hot spot.
13. a kind of alignment light source device according to claim 11 is characterized in that: the vertical placement mutually of the set of cylindrical lenses of the set of cylindrical lenses of the described first shaping device and the described second shaping device.
14. a kind of alignment light source device according to claim 11 is characterized in that: the cylindrical mirror plane along continuous straight runs of the described first shaping device set of cylindrical lenses, the cylindrical mirror plane of the described second shaping device set of cylindrical lenses is vertically; The cylindrical mirror plane of the perhaps described first shaping device set of cylindrical lenses vertically, the cylindrical mirror plane along continuous straight runs of the described second shaping device set of cylindrical lenses.
15. alignment system that is used for lithographic equipment, it is characterized in that: described alignment system is by alignment light source device as claimed in claim 1, and optical module, signal processing module and alignment mark formation, wherein the alignment light source device sends the aligning illuminating bundle, the irradiation alignment mark; Optical module is gathered alignment mark ± 1 order diffraction light, and is right ± 1 order diffraction light coherent imaging, and surveys the alignment light signal; Signal processing module is handled the positional information that the alignment light signal obtains alignment mark, comprises light-beam forming unit in the described alignment light source device, and the circular light spot that is used for aiming at illuminating bundle is shaped to the strip hot spot; Described alignment mark is the strip structure, comprises the phase grating of three groups of different cycles.
16. a kind of alignment system that is used for lithographic equipment according to claim 15, it is characterized in that: three groups of phase gratings forming alignment mark are arranged along aligning direction, form the strip structure, the cycle of one group of phase grating in the middle of being arranged in is less than the cycle of the phase grating that is arranged in its both sides.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2008102049515A CN101446775B (en) | 2008-12-30 | 2008-12-30 | Alignment light source apparatus |
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| CN2008102049515A CN101446775B (en) | 2008-12-30 | 2008-12-30 | Alignment light source apparatus |
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| CN101446775A CN101446775A (en) | 2009-06-03 |
| CN101446775B true CN101446775B (en) | 2011-03-30 |
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| CN102081309B (en) * | 2009-11-27 | 2013-01-16 | 上海微电子装备有限公司 | Method for improving alignment scanning success rate |
| CN102540743B (en) * | 2010-12-22 | 2015-03-25 | 上海微电子装备有限公司 | Device and method for installing and adjusting reference grating of lithography equipment |
| JP5985661B2 (en) | 2012-02-15 | 2016-09-06 | アップル インコーポレイテッド | Scan depth engine |
| KR101806753B1 (en) * | 2013-06-17 | 2017-12-07 | 애플 인크. | Modular optics for scanning engine |
| JP6792782B2 (en) * | 2016-09-01 | 2020-12-02 | Kddi株式会社 | Light beam generator with spatial phase and amplitude distribution |
| CN106501958B (en) * | 2016-11-02 | 2018-01-16 | 长春理工大学 | A kind of transmission-type Polarization aberration compensation device based on path-splitting Polarization Modulation |
| CN108613110B (en) * | 2016-12-22 | 2020-06-02 | 深圳市绎立锐光科技开发有限公司 | Light source system, automobile lighting system and control method |
| TWI699496B (en) * | 2017-03-31 | 2020-07-21 | 億光電子工業股份有限公司 | Light-emitting device and lighting module |
| US10680145B2 (en) | 2017-08-04 | 2020-06-09 | Everlight Electronics Co., Ltd. | LED package structure and method for manufacturing same |
| CN107894665B (en) * | 2017-11-03 | 2020-02-21 | 西安炬光科技股份有限公司 | A method, device and system for realizing light spot transformation |
| CN111347172A (en) * | 2020-03-27 | 2020-06-30 | 大族激光科技产业集团股份有限公司 | Laser cutting method and system for terminal short circuit ring of liquid crystal display device |
| CN113532637A (en) * | 2020-04-20 | 2021-10-22 | 山东华光光电子股份有限公司 | Adapter capable of monitoring numerical aperture and power of light spot and manufacturing and using method thereof |
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