CN101356040B - Process for producing glass substrate for magnetic disk and process for manufacturing magnetic disk - Google Patents
Process for producing glass substrate for magnetic disk and process for manufacturing magnetic disk Download PDFInfo
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- CN101356040B CN101356040B CN2007800012384A CN200780001238A CN101356040B CN 101356040 B CN101356040 B CN 101356040B CN 2007800012384 A CN2007800012384 A CN 2007800012384A CN 200780001238 A CN200780001238 A CN 200780001238A CN 101356040 B CN101356040 B CN 101356040B
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Classifications
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/08—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
In the anterior grinding step wherein under the supply of a grinding fluid containing grind abrasive grains of large diameter, a glass substrate and a soft grind pad are moved in relative relationship so as to achieve grinding, there occurs a morphology such that edges of major surface of the glass substrate protrude relative to the central part thereof (ski jump). Thus, in the posterior grind step, using a grinding fluid containing grind abrasive grains of small diameter and a grind pad harder than the above grind pad, there is performed grinding such that if a glass substrate with flat edge portions were ground, a glass substrate whose edge portions of the major surface descend relative to the central part thereof (roll off) would be obtained. As a result, the glass substrate can be modified toward cancellation of the ski jump generated in the anterior grinding step, so that the configuration of the edge portions would approach flatness.
Description
Technical field
The present invention relates to the manufacturing approach and the disk manufacturing approach of glass substrate for disc, this disk is as the recording medium of computer etc. and use.
Background technology
In recent years, for magnetic recording medium, have and put forward requirement of high recording density more.In order to improve magnetic recording density, for example must reduce the float-amount of record head.Because reduce the float-amount of record head, can reduce clearance loss, improve packing density.
In order to reduce the float-amount of record head; Not only to reduce surface roughness as the disk of recording medium; And, for the come-up that makes record head is stable, the end shape of disk also must become compare with middle body do not rise and fall, smooth shape basically.For the end shape with disk becomes smooth basically shape, the end shape of the glass substrate that must disk be used becomes smooth basically shape.Implication about this end shape will be explained below.
Especially in recent years, in order to improve packing density, developed perpendicular magnetic recording etc.; But; If the end shape with glass substrate for disc does not remain the accurate even shape that does not does not rise and fall, then can not adopt perpendicular magnetic recording, can not improve packing density.
Before, prevent the manufacturing approach of glass substrate for disc of the disorder etc. of end shape, for example propose by patent documentation 1.
Patent documentation 1: TOHKEMY 2005-141852 communique
Summary of the invention
But, before, the float-amount from about the 10nm for example, advance low come-up to quantize, when the record head come-up was moved, the come-up of disk was unstable, produces the problem of record head crushing.The application inventors have studied the reason that magnetic head damages by pressure, and the result finds out that the end shape of glass substrate is not made required even shape, are the reasons of magnetic head crushing.
In addition, the application inventor has studied the grinding step of glass substrate, and the result finds out, and in back grinding step before, end shape is had can avoid the such flatness of said head crushing, be very difficult thing.Therefore, must seek and do end shape than the method for the better even shape of present situation.
But, in the manufacturing approach of glass substrate for disc, comprise the some treatment process that change with end shape headed by some grinding steps, that make glass substrate.If a treatment process of only improving in these some treatment process forms required end shape;, be limited then because other replenish to require the reason of (for example the cost of creating conditions of process time, processing conditions etc., as the characteristic value of the desired surface configuration of glass substrate).
The present invention improves with the some treatment process headed by some grinding steps in view of this problem, and the glass substrate for disc with required end shape is provided.
The application inventor; The end shape that is finally required for the end shape variation of the glass substrate from some grinding steps was found before the grinding step of going ahead of the rest, and grasped the change in shape characteristic (change in shape amount and changes shape) of the end shape in the grinding step of going ahead of the rest in advance; Determine the change in shape characteristic of the end shape in the follow-up grinding step; Can obtain to lower the end shape of magnetic head float-amount, in view of the above, accomplish the present invention.In addition, at the variation characteristic that the grinding step of going ahead of the rest is grasped before in advance, also can be used as the variation of the end shape in the follow-up grinding step.At this moment, according to the variation of grasping, the change in shape characteristic of setting the end shape in the grinding step of going ahead of the rest gets final product.
Below, embodiment of the present invention is described.
(the 1st mode)
The manufacturing approach of glass substrate for disc; The 1st treatment process and the 2nd treatment process that comprise the end shape variation of glass substrate; It is characterized in that, also be included in the 1st treatment process before, grasp the grasp operation of the end shape of the glass substrate after the 1st treatment process; In the 2nd treatment process, above-mentioned glass substrate is changed towards direction that offset to grasp the end shape that operation grasps, above-mentioned end shape is formed required form.
Above-mentioned required form can be that the end shape of glass substrate is flat condition in fact; Also can be the shape of end shape for descending of glass substrate than central portion.Specifically; For example, after having carried out above-mentioned the 1st treatment process and the 2nd treatment process, when for example also making end shape be changed to the chemical enhanced processing of projecting shape; In the moment that finishes above-mentioned the 2nd treatment process, the end of glass substrate is preferably formed as the shape that descends into than central portion.In addition, carried out the 2nd treatment process after, when not making the processing that end shape changes, in the moment that finishes above-mentioned the 2nd treatment process, the shape that the end shape of glass substrate is preferably smooth in fact.
(the 2nd mode)
The manufacturing approach of glass substrate for disc; Comprise that several contain the lapping liquid that grinds abrasive particle and supply to glass substrate and grind between the grinding pad of this glass substrate, above-mentioned glass substrate and above-mentioned grinding pad are relatively moved grind the grinding step of above-mentioned glass substrate; It is characterized in that; Above-mentioned several grinding steps comprise grinding step and follow-up grinding step in advance; The grinding of carrying out in the above-mentioned grinding step in advance makes the end shape of above-mentioned glass substrate first type surface become the shape than first type surface central portion protuberance (or decline); The grinding of carrying out in the above-mentioned follow-up grinding step makes above-mentioned glass substrate change, above-mentioned end shape is formed required shape towards the direction of the shape of offsetting the protuberance (or decline) that in above-mentioned grinding step in advance, forms.
(the 3rd mode)
In above-mentioned the 2nd mode; (1) at above-mentioned grinding step in advance; If make the first type surface end shape of above-mentioned glass substrate become the grinding of projecting shape; Then in above-mentioned follow-up grinding step, grind in this wise: when grinding the smooth glass substrate of above-mentioned end shape, make this end shape become the shape that descends than central portion; (2) at above-mentioned grinding step in advance; If make the end shape of above-mentioned glass substrate first type surface become the grinding of decline shape; Then in above-mentioned follow-up grinding step; Grind like this: when grinding the smooth glass substrate of above-mentioned end shape, make this end shape become shape than the central portion protuberance.
(the 4th mode)
In above-mentioned the 2nd mode; At above-mentioned grinding step in advance; If when making the end shape of above-mentioned glass substrate first type surface become the grinding of projecting shape, then in above-mentioned follow-up grinding step, use the grinding pad of the grinding bed hedgehopping of using in the above-mentioned grinding step in advance of hardness ratio; At above-mentioned in advance grinding step,, then in above-mentioned follow-up grinding step, use the low grinding pad of using in the above-mentioned grinding step in advance of hardness ratio of grinding pad if when making the end shape of above-mentioned glass substrate first type surface become the grinding of decline shape.
(the 5th mode)
In above-mentioned the 2nd mode, the grinding that above-mentioned follow-up grinding step carries out becomes below the 0.2nm roughness (Ra) of having carried out the above-mentioned glass substrate first type surface behind this follow-up grinding step.
(the 6th mode)
The manufacturing approach of disk is characterized in that, the surface of the glass substrate that obtains in the manufacturing approach with above-mentioned glass substrate for disc forms magnetosphere at least.
(the 7th mode)
The manufacturing approach of glass substrate for disc; Comprise contain the lapping liquid that grinds abrasive particle supply to glass substrate and the grinding this glass substrate first type surface grinding pad between, make above-mentioned glass substrate and above-mentioned grinding pad relatively move, grind the grinding step of above-mentioned glass substrate first type surface; It is characterized in that; In above-mentioned grinding step, through carrying out the 1st grinding step and the 2nd grinding step, the end shape of above-mentioned glass substrate is formed flat condition; At the 1st grinding step, grind the first type surface of above-mentioned glass substrate in this wise: when the smooth glass substrate of the end shape that grinds first type surface, the shape of this end is become than central portion shape protuberance or the shape that descends; At the 2nd grinding step, grind the first type surface of above-mentioned glass substrate in this wise: when the smooth glass substrate of the end shape that grinds first type surface, the shape of this end is become than central portion descend or the shape of protuberance.
(the 8th mode)
The manufacturing approach of glass substrate for disc; Comprise grinding step and chemical enhanced treatment process; In grinding step; Supply to glass substrate and grind between the grinding pad of this glass substrate first type surface containing the lapping liquid that grinds abrasive particle, above-mentioned glass substrate and above-mentioned grinding pad are relatively moved, grind the first type surface of above-mentioned glass substrate; In chemical enhanced treatment process; Above-mentioned glass substrate is contacted with chemical enhanced treatment fluid; Make the ion exchange in a part of ion of containing in the above-mentioned glass substrate and this chemical enhanced treatment fluid, make the end shape of above-mentioned glass substrate first type surface become the shape of swelling than central portion; It is characterized in that above-mentioned grinding step comprises the 1st grinding step and the 2nd grinding step; At the 1st grinding step, grind the first type surface of above-mentioned glass substrate in this wise: when the smooth glass substrate of the end shape that grinds first type surface, make the shape of this end become shape than central portion shape protuberance (or decline); At the 2nd grinding step, grind the first type surface of above-mentioned glass substrate in this wise: when the smooth glass substrate of the end shape that grinds first type surface, the shape of this end is become than the descend shape of (or protuberance) of central portion; Through carrying out above-mentioned grinding step and chemical enhanced treatment process, the end shape of above-mentioned glass substrate is formed flat condition in fact.
Similarly, the grinding that above-mentioned the 2nd grinding step carries out becomes below the 0.2nm roughness (Ra) of having carried out the above-mentioned glass substrate first type surface behind the 2nd grinding step in the above-mentioned the 7th and the 8th mode.
(the 9th mode)
The manufacturing approach of disk is characterized in that, with the above-mentioned the 7th and the surface of the glass substrate that obtains of the manufacturing approach of the glass substrate for disc of the 8th mode, forms magnetosphere at least.
The lapping device that uses among the present invention; Utilize several, by grinding abrasive particle contained in the lapping liquid with while being supplied to the combination that grinding pad that lapping liquid and glass substrate relatively move constitutes; First type surface to glass substrate carries out the several times grinding, and above-mentioned several combinations comprise the 1st combination of the grinding step of going ahead of the rest and carry out the 2nd combination of follow-up grinding step.Grinding step carried out before follow-up grinding step in advance, made the end of first type surface become the shape than central portion protuberance (or decline).Follow-up grinding step makes the shape of protuberance (or decline) change towards offsetting direction, and it is smooth that the end is bordering on.
In addition, the result of the follow-up grinding step that the 2nd combination is carried out can be to make the end of first type surface become flat condition.Perhaps, if when after follow-up grinding step, also carrying out above-mentioned chemical enhanced processing, the result of this follow-up grinding step also can be to make the end of first type surface become the shape that descends than central portion.
The grinding bed hedgehopping of above-mentioned the 1st combination of the hardness ratio of grinding pad of above-mentioned the 2nd combination perhaps, also can be grinding pad low of hardness ratio the 1st combination of the grinding pad of the 2nd combination.
According to the present invention, between available several treatment process, offset the variation of end form, form required end shape.Especially, in follow-up grinding step, the projecting shape that in the grinding step of going ahead of the rest, forms is changed towards the direction of offsetting, the end that can make glass substrate for disc is near smooth.
According to the present invention, can make the end shape that in follow-up grinding step, obtains become flat condition, in addition, also can stay the shape of decline in advance.The shape of this decline is to stay in advance in order to offset the projecting shape that forms in the chemical enhanced treatment process of after follow-up grinding step, carrying out.Through chemical enhanced treatment process, finally can the end of glass substrate be formed smooth shape.
Description of drawings
Fig. 1 be the explanation glass substrate for disc of the present invention lapping device embodiment, be the figure of two sides lapping device.
Fig. 2 is the amplification profile of the grinding pad structure of explanation the present invention employing.
Fig. 3 is the glass substrate for disc of the present invention the 1st embodiment is made in explanation with the lapping device shown in Figure 1 sketch map of manufacturing approach.
Fig. 4 is the center of passing discoideus glass substrate, the profile when using face perpendicular to first type surface to cut off glass substrate.
Fig. 5 (a) is the figure of the grinding condition among expression the present invention the 1st embodiment, (b) is the figure of the grinding condition in expression and the 1st embodiment comparative example relatively.
Fig. 6 is the glass substrate for disc of the present invention the 2nd embodiment is made in explanation with the lapping device shown in Figure 1 sketch map of manufacturing approach.
Fig. 7 (a) is the figure of the grinding condition among expression the present invention the 2nd embodiment, (b) is the figure of the grinding condition in expression and the 2nd embodiment comparative example relatively.
The specific embodiment
At first, with Fig. 4 the term " protuberance " (below be called " sliding saltus step "), " decline " (below be called " slipping away ") of performance end shape, the implication of " smooth " are described among the application.So-called " sliding saltus step " is that the end that is illustrated in the glass substrate first type surface is the shape than the central portion protuberance.So-called " slipping away " is that the end of expression glass substrate first type surface is the shape that descends than central portion.In addition, so-called " smooth " is that the end of expression glass substrate first type surface is the shape (with the shape of first type surface orthogonal direction) roughly the same with central portion.These shapes are described below.
Fig. 4 is through the center of discoideus glass substrate 1, uses the profile when perpendicular to the face of first type surface 1a substrate 1 being cut off.Saltus step is slided in Fig. 4 (a) expression, and Fig. 4 (b) expression is slipped away.In the posting field M on the outline line of the planar major surface 1a of Fig. 4 (a), Fig. 4 (b), from set 2 datum mark R1, R2 successively by central side.In addition, set the boundary line R3 vertical with first type surface 1a (sliding the outer circumference end position of regional G), this boundary line R3 is again toward the edge of the certain distance of periphery direction from the peripheral end of posting field M.The intersection point of the outline line of boundary line R3 and glass substrate 1, as a R that slips away.Then, draw tie point R1 and the straight line R4 that puts R2.Among Fig. 4, be benchmark (null value), will go up direction and be decided to be positive direction, lower direction is decided to be negative direction with straight line R4.At this moment, the zone from a R2 to a R, having peaked point, promptly being positioned at some S deviation location the most, on glass substrate 1 outline line from straight line R4 towards positive direction, as sliding trip point.The value S5 that slides trip point S slides hop value (apart from the positive direction height of straight line R4).The value of a R of slipping away is the value of slipping away R5 (apart from the negative direction height of straight line R4).
In more detail, from the center of glass substrate 1, along radial direction set point R1, R2, R3.Among these points, some R1 and R2 are set in the central portion (near the positions the central authorities on the radial direction of glass substrate 1) of glass substrate 1.When marking the straight line R4 through a R1 and R2, the deviating from (perpendicular to deviating from of real estate direction) of this straight line R4 between measuring point R2 and the R3 and glass substrate 1 surface.Then, in deviating from this, positive direction (direction of protuberance) deviate from maximum point, as sliding trip point (some S), at this moment the size that deviates from as sliding hop value.On the other hand, maximum point of deviating from of negative direction (direction of decline), as the point that slips away (some R), at this moment the size that deviates from as the value of slipping away.
Among Fig. 4 (a), sliding hop value S5 just is, the value of slipping away R5 is negative.Among Fig. 4 (b), sliding hop value S5 is zero, and the value of slipping away R5 is negative.Among the application, shown in Fig. 4 (a), be positive shape, be called and slide saltus step (end of first type surface 1a is the shape than the central portion protuberance) sliding hop value S5.Shown in Fig. 4 (b), be zero, the shape of the value of slipping away R5 sliding hop value for bearing, be called slip away (end of first type surface 1a is the shape that descends than central portion).The absolute value that slides the hop value or the value of slipping away is more little, and end shape approaches smooth more, so, be defined as among the application, be zero if slide hop value with the value of slipping away, be exactly even shape.
According to the size of glass substrate 1, suitably select above-mentioned some R1, R2, boundary line R3.For example; When glass substrate 1 was the substrate of 2.5 inches of outside dimensions (external diameter
), boundary line R3 fixed on from the position of the past inboard 1mm of end face of glass substrate 1.In addition, when glass substrate 1 is the substrate of 2.5 inches of outside dimensions, from substrate 1 center to a R1, the distance of some R2, boundary line R3, end face, for example can be set at 23mm, 27mm, 31.5mm, 32.5mm respectively.In other words, see, a R1 is set, a R2 is set, a R3 is set in 97% position in 83% position in position apart from substrate external diameter (end face) 71% from the center of glass substrate 1.
Slide the absolute value of hop value and the value of slipping away when excessive, because the end shape deterioration, so the come-up bad stability of magnetic head; In addition; The rotational stabilization variation of disk produces the magnetic head crushing and can not be contained on the disc driver when serious, thus this absolute value excessive be disadvantageous.Slide hop value and the value of slipping away, be advisable in the scope of ± 0.10 μ m respectively, be preferably in ± scope of 0.05 μ m in.
Whether generation is slided saltus step or slipped away depends on various factors, for example, depends on hardness, grinding condition of particle diameter, the grinding pad of the grinding abrasive particle that contains in the lapping liquid etc.
In addition, for the float-amount that reduces magnetic head, the end shape of above-mentioned glass substrate first type surface no doubt is very important factor, and still, the roughness that first type surface is whole and the roughness of end shape also are very important.Because magnetic head moves to outer circumference end from first type surface with holding come-up interior week, so the roughness of the glass substrate first type surface end that the roughness of position, especially rotary speed are fast is very important.
Specifically, the first type surface of glass substrate, the surface roughness Ra when measuring with AFM (atomic force microscope) is preferably in below the 0.2nm.In addition, at this moment Rmax is preferably in below the 2nm.
In addition; Being in the surface configuration center, in 3.8 squares of mm rectangular areas from the dish outer circumference end towards the point on the direction 2.5mm of the disk center first type surface; Extracting the shape wavelength out is the band field surface shape of 16 μ m～1.9 μ m; During as small fluctuating Rq, this small fluctuating Rq is preferably in below the 0.5nm with the quadratic power mean roughness Rq (RMS) of this surface configuration.
[the 1st embodiment]
Below, with reference to accompanying drawing, specify manufacturing approach, disk manufacturing approach, and the 1st embodiment of the lapping device of glass substrate for disc of glass substrate for disc of the present invention.
[lapping device of glass substrate for disc]
Fig. 1 be the explanation glass substrate for disc of the present invention lapping device the 1st embodiment, be the figure of two sides lapping device.Two lapping devices 3 are to adopt grinding pad 10 and glass substrate 1 and grinding pad 10 are relatively moved and the device that grinds.
Fig. 1 (a) is the driving mechanism portion key diagram of two sides lapping device, and Fig. 1 (b) is a main profile with two sides lapping device of last lower platen.Shown in Fig. 1 (a), two sides lapping device 3 has the polishing carrier installation portion and clips top board 31 and the lower platen 32 that this polishing carrier installation portion is driven by contrary rotation each other.Above-mentioned polishing carrier installation portion has the internal gear 34 and central gear 35 that is driven in rotation with predetermined rotation ratio respectively.Top board 31 and lower platen 32, with glass substrate 1 face in opposite directions on, the grinding pad of stating after pasting respectively 10.Do the planetary gear motion with several polishing carriers 33 of internal gear 34 and central gear 35 engagements, on one side rotation on one side around central gear 35 revolution.
On several polishing carriers 33, keeping several glass substrates 1 respectively.Top board 31 can move towards above-below direction, shown in Fig. 1 (b), grinding pad 10 is pressed on the first type surface of glass substrate 1 positive and negative.Supply with on one side and contain the slurries that grind abrasive particle; On one side by the mutual contrary rotation of the planetary gear motion of polishing carrier 33 and top board 31 and lower platen 32; Glass substrate 1 relatively moves with grinding pad 10, and like this, the first type surface of glass substrate 1 positive and negative is ground.
The grinding abrasive particle that contains in the lapping liquid and constitute a combination while being supplied to the grinding pad 10 that lapping liquid and glass substrate 1 relatively move; The two sides lapping device 3 of above-mentioned structure adopts several above-mentioned combinations; In the manufacturing process of glass substrate, can carry out the grinding of several times to the first type surface of glass substrate 1 in interim ground.After state among the embodiment, as the operation of grinding glass substrate 1 first type surface, implement preparation and grind (1 time grind) operation and mirror ultrafinish (2 grindings) the such 2 times grinding step of operation.In these grinding steps, though the structure of two sides lapping device 3 is roughly the same, the composition of contained grinding abrasive particle and grinding pad 10 is different in the used lapping liquid (slurries).General tendency is, the operation to the back more, and the particle diameter that then grinds abrasive particle is more little, and the hardness of grinding pad 10 is soft more.
But, if in the roughing operation of before the preparation grinding step, carrying out, can obtain the low before substrate of roughness ratio, then grinding the pad of (preparation is ground) for 1 time, can use than soft before pad.Therefore, in 1 time is ground, carry out allowance and just can fully achieve the goal sometimes than the grinding of lacking before.But, in 1 time is ground, using when comparing soft before grinding pad, the protuberance (sliding saltus step) of the substrate end that forms sometimes is more remarkable.In this case, in 2 times are ground, can not offset and grind the saltus step of sliding that forms for 1 time, the substrate end might keep the shape that slides saltus step.As a method that addresses this problem, in this embodiment, be in the back operation is promptly ground for 2 times; The size of abrasive particle, the material hardness of grinding pad etc. are ground in change; Grinding condition is changed, like this, in 2 times are ground; Make the saltus step of sliding that in 1 time is ground, produces change, make the end shape of substrate be bordering on smooth towards the direction of offsetting.
Fig. 2 is the amplification profile of the grinding pad structure of explanation the present invention employing.As shown in Figure 2, grinding pad 10 adopts the foaming body of synthetic resin such as polyurethane, polyester.Especially at present, preferably use polyurathamc.As shown in Figure 2, lint layers 14 that grinding pad 10 is made basic unit 13 by nonwoven etc. and is stacked in these basic unit 13 surfaces constitute.In this lint layer 14, some bubbles form the water droplet shape at the thickness direction of lint layer 14.In this embodiment, this bubble as lint hole 15.The hardness of this foaming body can be regulated with the bubble of sneaking into (lint hole 15) amount.
[manufacturing approach of glass substrate for disc]
Fig. 3 is the sketch map that embodiment lapping device shown in Figure 1, glass substrate for disc manufacturing approach of the present invention is used in expression.This method comprises several grinding steps shown in Fig. 3 (a), Fig. 3 (b).In these grinding steps, supply with the lapping liquid that contain grinding abrasive particle 40 or 50 on one side, make glass substrate 1 and grinding pad 10 or 20 relatively move the first type surface of grinding glass substrate 1 on one side.Fig. 3 (a) is a grinding step in advance, in this goes ahead of the rest grinding step, the end of first type surface is become than the shape of central portion protuberance grind (sliding saltus step), states the preparation grinding step among the embodiment after being equivalent to.Fig. 3 (b) is follow-up grinding step, at this follow-up grinding step, is that the shape (sliding saltus step) that makes protuberance changes, makes the end approach smooth grinding towards the direction of offsetting.After being equivalent to, this follow-up grinding step states the mirror ultrafinish operation among the embodiment.Grinding step is used by grinding abrasive particle 40 and is realized with the combination that grinding pad 10 constitutes in advance.Follow-up grinding step is used by grinding abrasive particle 50 and is realized with the combination that grinding pad 20 constitutes.
In addition, above-mentioned " central portion " is meant when making disk with glass substrate for disc, writes zone in the information recording area of information, that comprise the center in the radial direction, is equivalent at least a portion zone of sliding regional G shown in Figure 4.
In this embodiment; Can also comprise the grasp operation; This grasps operation; Before the grinding step in advance of Fig. 3 (a), grasp the shape that slides saltus step that this operation forms, that swell than central portion the end in advance, the hardness of the grinding pad 20 that uses in the follow-up grinding step of decision Fig. 3 (b) and the particle diameter that grinds abrasive particle 50.This grasps operation, for example, can behind the grinding step of going ahead of the rest, measure the end shape of glass substrate in advance, determines the treatment conditions of follow-up grinding step.
Grasp operation by this, can make grinding pad 10 height that use in the grinding step in advance of hardness ratio Fig. 3 (a) of the grinding pad 20 that uses in the follow-up grinding step of Fig. 3 (b).The hardness of grinding pad 10,20 as stated, can be regulated with the bubbles volume of sneaking in these pads.In addition, by above-mentioned grasp operation, can make the grinding abrasive particle that uses in the in advance grinding step of size ratio Fig. 3 (a) of the grinding abrasive particle that uses in the follow-up grinding step of Fig. 3 (b) little.That is, the present invention comprises grasp operation and decision operation.In grasping operation, grasp the end shape of the glass substrate that in the grinding step of going ahead of the rest, obtains in advance.In the decision operation, the hardness of the grinding pad that determines to use in the follow-up grinding step and the particle diameter that grinds abrasive particle.
As stated; Higher and/or grind in the follow-up grinding step shown in the littler Fig. 3 (b) of abrasive particle particle diameter in grinding pad hardness; Grind in this wise: when supposing the glass substrate of abrasive tip portion flattening; Make this glass substrate as glass substrate 100, its end becomes the shape (slipping away) that descends than central portion.
Above-mentioned Ginding process, being used for the end has been when sliding the glass substrate 1 of saltus step shape, and the result shown in Fig. 3 (c), can form the end of first type surface flat condition in fact.Perhaps, the result of the follow-up grinding step of Fig. 3 (b) also can be to make the shape (slip away) of the end of first type surface than central portion decline.This Ginding process is to pre-estimate the end shape that produces in the chemical enhanced treatment process of after follow-up grinding step, carrying out to change (sliding saltus step), in follow-up grinding step, is pre-formed the Ginding process that slips away.Though be to form to slip away, this slips away is that the saltus step of sliding than the preparation grinding step forms approaches smooth slipping away.
Below, above-mentioned grinding step in advance (1 grinding step, preparation grinding step) and follow-up grinding step (2 grinding step, mirror ultrafinish operation) are described respectively.
In the in advance grinding step of this embodiment, make the end shape of stating the glass substrate behind the follow-up grinding step after having carried out make the end shape of glass substrate with becoming flat condition.Specifically, in grinding step in advance, the first type surface of grinding glass substrate in this wise: during smooth glass substrate, make the shape of this end become shape than the central portion protuberance in the end of grinding first type surface.
In addition, in the follow-up grinding step of this embodiment, the end shape of glass substrate is become flat condition.Specifically, in follow-up grinding step, the first type surface of grinding glass substrate in this wise: during smooth glass substrate, make the shape of this end become the shape that descends than central portion in the end of grinding first type surface.
In addition, in above-mentioned follow-up grinding step, the surface of glass substrate is formed minute surface.The grinding abrasive particle that uses in the follow-up grinding step preferably adopts colloidal silica particles.In addition, the content of the colloidal silica particles in the lapping liquid is preferably in more than the 5 weight %, below the 40 weight %.
In addition, the particle diameter of colloidal silica particles is preferably in below the 80nm, at 50nm with next better.Adopt this fine grinding abrasive particle, can obtain as the desirable smooth mirror surface of glass substrate for disc.In addition, the lower limit of particle diameter according to the decision of the attrition process speed in the follow-up grinding step, for example can be more than the 20nm preferably.
The grinding of carrying out in the follow-up grinding step makes that surface roughness, the for example arithmetic average roughness (Ra) of glass substrate 10 become below the 0.2nm, peak height (Rp) becomes below the 2nm.Here said peak height (Rp) is meant the surface configuration of the presumptive area of measuring glass baseplate surface, obtains the centre plane of this surface configuration, when being benchmark with this centre plane, peak is apart from the height of this centre plane.In addition, these values are values of measuring with AFM (atomic force microscope).
[manufacturing approach of disk]
At least form magnetosphere on the surface of the glass substrate that obtains with above-mentioned glass substrate for disc manufacturing approach, make disk, just can obtain the smooth in fact disk in end etc., have the disk of required end shape.
[manufacturing approach of glass substrate for disc]
More put it briefly, embodiment of the present invention comprises the 1st treatment process and the 2nd treatment process.In the 1st treatment process, glass substrate 1 is handled.In the 2nd treatment process, make substrate 1 towards offsetting the end shape that direction changes, formation is required that formed glass substrate 1 end shape of the 1st treatment process changes.The end shape that makes glass substrate 1 is not limited to some grinding steps towards the 1 2nd treatment process that the direction of cancelling out each other changes.That is, so long as in follow-up operation, make the end shape in the operation in advance change the technological thought that changes towards the direction of offsetting, all as embodiment of the present invention.
Following (A) (B) (C) etc. that for example given an example,
(A) the 1st treatment process: LAP (grind and cut), the 2nd treatment process: grind
(B) the 1st treatment process: chemical enhanced, the 2nd treatment process: grind
(C) the 1st treatment process: (1 grinding) ground in preparation, the 2nd treatment process: mirror ultrafinish (2 grindings)
Content with Fig. 1 to Fig. 3 explanation is above-mentioned (C) example.
Like this, grind, in chemical enhanced etc. the treatment process because end shape has produced variation, so, can before the 1st treatment process, grasp the variation of the end shape that produces in this operation in advance, determine the treatment conditions of the 2nd treatment process.In order to grasp the variation of glass substrate end shape in advance, for example can after the 1st treatment process, measure the end shape of glass substrate.
In addition, the number of treatment process is not limited to 2.For example, also can be that (D) 1 time grinds → 2 grindings → chemical enhanced operations, or (E) grind for 1 time and grind for → 2 times → chemical enhanced → operation of grinding, or (F) various forms such as operation of → 2 grindings time be ground in chemical enhanced → 1.No matter which kind of form can, as long as after each operation, the end shape of glass substrate becomes required form and gets final product.
Do not carry out under the chemical enhanced situation, as long as in last grinding step, end shape is formed flat condition.But; Shown in precedent (D); Under the situation of after this not grinding carrying out chemical enhanced operation after 2 grindings; To grasp the protuberance degree of chemical enhanced formed end shape in advance, make the end shape after chemical enhanced can become flat condition ground, become the shape that slips away to the end shape after 2 grindings.On the other hand; Shown in above-mentioned (E), (F) example; Under the situation of grinding again after chemical enhanced (hope), in order to grind with the least possible allowance at the state that keeps strengthening layer, when carrying out the improvement of roughness and end shape; To grasp the end shape that obtains with chemical intensified condition in advance, only make this end shape towards offsetting the grinding that direction changes.Like this, can keep the improvement that strengthening layer carries out end shape and roughness (having full intensity).Through this grinding, end shape is formed flat condition in fact.
The manufacturing approach of the glass substrate for disc of above-mentioned summary, the 2nd embodiment of stating after also being applicable to.
[the 1st embodiment]
In the 1st embodiment,, glass substrate for disc and perpendicular magnetic recording disk have been made through the operation of following (1)～(11).
(1) shape manufacturing procedure
At first, being ready to the multicomponent that amorphous glass constitutes is glass substrate.The kind of glass (nitre kind) is an alumina silicate glass, and concrete chemical composition is the SiO of 63.5 weight %
2, 14.2 weight % Al
2O
3, 10.4 weight % Na
2O, 5.4% Li
2The ZRO of O, 6.0 weight %
2, 0.4 weight % Sb
2O
3, 0.1 weight % As
2O
3
This glass substrate is shaped with direct pressurization, forms the glass substrate of plate-like.Use the middle body perforate of grinding stone again, form the plate-like glass substrate 1 that central part has circular hole at glass substrate.Then, peripheral end face and interior all end faces are implemented chamfer machining.
(2) end surface grinding operation
Then, Yi Bian make glass substrate 1 rotation, with the brush grinding surface roughness of glass substrate 1 end face (interior week, periphery) being ground to form degree, the arithmetic average roughness (Ra) that maximum height (Rmax) is 1.0 μ m on one side is the degree of 0.3 μ m.
(3) grind and cut operation
Then, with the abrasive particle of #1000 granularity, the flatness that the glass substrate first type surface is ground to form first type surface is that 3 μ m, Rmax are that degree, the Ra of 2 μ m is the degree of 0.2 μ m.Here said flatness is the highest part and the distance (difference of height) of lowermost portion at above-below direction (perpendicular to the direction on surface) of substrate surface, is to measure with the flatness determinator.In addition, Rmax and Ra are to measure with atomic force microscope (AFM) (nanoscope of デ ジ タ Le イ Application ス Star Le メ Application Star society system).
(4) preparation grinding step
The preparation grinding step is to use grinding pad first, to cutting in operation (3) quilt and grind the operation of being ground by the glass substrate of roughing again after cutting above-mentioned grinding.With the lapping device 3 that can once grind 100～200 sheet glass substrates, two first type surfaces, implement the preparation grinding step.Grinding pad is to adopt the soft polished part of polyurethanes.In addition, grinding pad is to adopt the grinding pad that contains zirconia and cerium oxide in advance.
The grinding condition of Fig. 5 (a) expression embodiment 1.The lapping liquid in (1 time grind) operation is ground in preparation, is average grain diameter that the cerium oxide abrasive abrasive particle 40 of 1.2 μ m mixes with water and processes.The particle diameter that grinds abrasive particle 40 is preferably in the scope of 1.0～1.4 μ m.In addition, remove particle diameter above the grinding abrasive particle of 4 μ m in advance.When measuring lapping liquid, the maximum of the grinding abrasive particle that lapping liquid contains is that 3.5 μ m, mean value are that 1.2 μ m, D50 value are 1.1 μ m.In addition, the load that is applied on the glass substrate 1 is 80～100g/cm
2, it is 20～40 μ m that the surface element of glass substrate 1 is removed thickness.
" end shape " in Fig. 5 table is the end shape of expression when only having carried out this grinding step separately.Specifically, expression is with having the glass substrate of flat end, the end shape that has formed when having carried out this grinding step.In addition, " result " in Fig. 5 table is meant the end shape of the glass substrate after 1 time 2 times continuous grinding steps finish respectively.
End shape to having carried out behind these (4) preparation grinding step is observed, and shown in Fig. 3 (a), end shape is to slide the saltus step shape.
(5) mirror ultrafinish operation
The mirror ultrafinish operation is that the glass substrate that has passed through the preparation grinding is further ground, and the first type surface of glass substrate is ground to form the operation of minute surface.With the lapping device 3 that can once grind 100～200 sheet glass substrates, two first type surfaces, implement mirror ultrafinish (2 grindings) operation.Grinding pad is to adopt the soft polished part of polyurethanes.Lapping liquid in the mirror ultrafinish operation, the colloidal silica particles that in ultra-pure water, adds particle diameter and be 40nm is processed.The particle diameter of this colloidal silica particles is preferably in 20～60nm scope.End shape to having carried out after this (5) mirror ultrafinish operation is observed, and shown in Fig. 3 (c), end shape is smooth in fact shape.
In addition, be used in carry out (5) mirror ultrafinish operation before, end shape is the glass substrate of flat condition, carry out the mirror ultrafinish operation of (5) after, glass substrate 100 that kind of end shape shown in Fig. 3 (b) become the shape that slips away.
That is among the present invention, in the preparation grinding step, be the grinding that end shape is become slide the saltus step shape.In follow-up mirror ultrafinish operation, carry out forming original flat end shape the grinding of the shape that slips away.Like this, can the end shape of the glass substrate that finally obtains be controlled to be required flat condition.
(6) matting after mirror ultrafinish is handled
Then, be impregnated into glass substrate 1 in the NaOH aqueous solution of concentration 3～5wt%, carry out alkali and clean.Cleaning applies ultrasonic wave and carries out.Immerse successively again in each rinse bath of neutral detergent, pure water, pure water, isopropyl alcohol, isopropyl alcohol (vapour seasoning), clean.With the surface of the glass substrate 1 after AFM (nanoscope of デ ジ タ Le イ Application ス Star Le メ Application Star society system) the observation cleaning, do not find that colloidal silica grinds adhering to of abrasive particle.In addition, do not find the foreign matter of stainless steel, iron etc. yet.
(7) chemical enhanced treatment process
Then, the glass substrate 1 that is preheating to after 300 ℃ the cleaning,, carry out chemical enhanced processing potassium nitrate (60%) and sodium nitrate (40%) being mixed and being heated in 375 ℃ the chemical enhanced salt dipping about 3 hours.Handle through this, the lithium ion on glass substrate 1 surface, sodium ion respectively with chemical enhanced salt in sodium ion, potassium ion displacement (ion-exchange), glass substrate 1 is chemically strengthened.In addition, the thickness that is formed on the compressive stress layers on glass substrate 1 surface is about 100～200 μ m.Implemented chemical enhanced after, glass substrate 1 is impregnated in 20 ℃ the tank, carries out chilling, kept about 10 minutes.
The result of this chemical enhanced treatment process, the end of glass substrate 1, the compression stress expansion upheaval because of substrate surface produces produces sometimes and slides saltus step.Under this situation, when the mirror ultrafinish operation of going ahead of the rest finishes, also can not become flat condition completely, and the more residual slightly shape that slips away.That is, also can be after having carried out chemical enhanced treatment process, the end shape after making the end become flat condition ground, regulate the end shape behind 2 grinding steps (mirror ultrafinish operation) and/or grinding (preparation grinding step) for 1 time.
(8) matting after chemical enhanced
Then, be impregnated into the glass substrate behind the above-mentioned chilling 1 and be heated in about 40 ℃ sulfuric acid,,, accomplished the manufacturing of glass substrate for disc Yi Bian clean Yi Bian apply ultrasonic wave.
(9) the inspection operation of glass substrate for disc
Then, glass substrate for disc is checked.With the surface roughness of AFM (atomic force microscope) mensuration glass substrate for disc, peak height (Ra) is 1.8nm, and arithmetic average roughness (Ra) is 0.25nm.In addition, the surface is the mirror status of cleaning, does not have the foreign matter that hinders the magnetic head come-up, the foreign matter that causes hot unevenness (hot ア ス ペ リ テ イ) fault.
(10) disk manufacturing process
Then; To above-mentioned glass substrate for disc; On the surface of glass substrate successively the adhesion layer that constitutes by the Cr alloy of film forming, the soft ferromagnetic layer that constitutes by CoTaZr base alloy, the basalis that constitutes by Ru, the perpendicular magnetic recording layer that constitutes by CoCrPt base alloy, the protective layer that constitutes by hydrogenated carbon, by the lubricating layer that PFPE constitutes, processed perpendicular magnetic recording disk.
(11) the inspection operation of disk
Then, the disk of above-mentioned manufacturing is checked.Earlier use float-amount to use head, be implemented in a crushing test of moving on the disk as the inspection of 8nm.As a result, magnetic head does not contact foreign matter etc., does not produce the crushing problem.
Then, adopting the regeneration element portion is that magnetic resistance effect type element, recording element portion are that single magnetic pole type element, float-amount are the magnetic head of 8nm, has carried out the record regenerating test of perpendicular recording.Results verification information is normally write down, is regenerated.At this moment, in regenerated signal, do not detect hot unevenness signal, available 100 gigabits per square inch carry out record regenerating.
Then, carried out the glide height test of disk.This test is to make inspection reduce gradually, confirm that with the float-amount of head inspection is with the test that contact the float-amount that produce of head with disk.As a result, in the disk of present embodiment, to peripheral edge portion,, float-amount do not produce contact even being 4nm from the disk inner margin portion yet.At the peripheral edge portion of disk, glide height is 3.7nm.
Fig. 5 (b) is the table of the grinding condition in the comparative example of representing to make comparisons with present embodiment.The glass substrate that obtains with comparative example with the above-mentioned disk of likewise making, is implemented a crushing test, the result, and magnetic head and foreign matter etc. contact, and have produced the crushing problem.
Fig. 5 (a) and Fig. 5 (b) are compared, and the particle diameter in the 1 time 2 times grindings is all roughly the same, but the material of grinding used grinding pad for 1 time has nothing in common with each other.When grinding pad was compared, comparative example was the hardness of the grinding pad of Fig. 5 (b), in 1 time is ground, was 93C hardness, was 84C hardness in 2 grindings, and it is low that the grinding pad hardness ratio of 2 grindings is ground for 1 time.On the other hand, embodiments of the invention are the grinding pad hardness among Fig. 5 (a), in 1 time is ground, are 80C hardness, in 2 times are ground, are 84C hardness, the height during the grinding pad hardness ratio of 2 grindings is ground for 1 time.
In addition; Except will obtaining required end shape; Consider from the aspects such as surface roughness of process velocity (grinding rate), substrate; The grinding pad hardness of Fig. 5 (a) is preferably in the scope of 78～82C hardness (A Si card C hardness) in 1 time is ground, and in 2 times are ground, is preferably in the scope of 82～86C hardness.In other words, for the hardness (A Si card C hardness) of the grinding pad that uses among the present invention, the grinding pad that in 2 times are ground, uses cans be compared to the grinding bed hedgehopping that in 1 time is ground, uses most.
In the 1st embodiment of the present invention, in 2 times are ground, make the shape that in 1 time is ground, forms the glass substrate end of sliding saltus step change towards the direction of offsetting, form the value of slipping away slipping away for-0.046 μ m.On the other hand, in the comparative example, in 2 times are ground, not only not offsetting and form the end shape of the glass substrate that slips away in grinding for 1 time, is slipping away of 0.173 μ m but also formed that absolute value increases, the value of slipping away.Can know from this result,, cancel out each other because the end shape that grinding step forms before and after making changes, so it is smooth that end shape is more approached according to the embodiment of the invention.In other words, be very difficult in order finally to make the level and smooth glass substrate for disc of smooth end shape and first type surface, only to regulate each operation respectively, the control end shape is very important in some operations continuously.That is, grasp variable quantity in advance, make 2 end shapes behind the grinding step become flatly, regulate the end shape in the grinding step 1 time, like this, can produce glass substrate for disc with flat end shape by the end shape of 2 grinding step variations.
[the 2nd embodiment]
Below, the 2nd embodiment of the lapping device of manufacturing approach, disk manufacturing approach and the glass substrate for disc of detailed description glass substrate for disc of the present invention.
[lapping device of glass substrate for disc]
For lapping device because use in the 1st embodiment two sides lapping device 3 with reference to Fig. 1 explanation, with reference to the grinding pad 10 of Fig. 2 explanation, so their detailed description is omitted.
After among the 2nd embodiment that states, similarly,, implement preparation and grind (1 time grind) operation and mirror ultrafinish (2 times grind) such 2 grinding steps of operation as the operation of grinding glass substrate first type surface.In these grinding steps, though the structure of two sides lapping device 3 is roughly the same, the composition of contained grinding abrasive particle and grinding pad 10 is different in the used lapping liquid (slurries).General tendency is, the operation to the back more, and the particle diameter that grinds abrasive particle is more little, and the hardness of grinding pad 10 is soft more.
But, all conditions such as particle diameter of the hardness of the grinding pad that adopts in grinding with 1 time, material, grinding abrasive particle, the decline (slipping away) of the end that produces sometimes is more remarkable.During this situation, in 2 times are ground, can not offset 1 time and grind slipping away of producing, the substrate end might keep the shape that slips away.As a method that addresses this problem, in the 2nd embodiment, be in the back operation is promptly ground for 2 times; The size of abrasive particle, the material hardness of grinding pad etc. are ground in change; Grinding condition is changed, like this, in 2 times are ground; Make slipping away of in 1 time is ground, forming change, make the end of substrate be bordering on smooth towards the direction of offsetting.
[manufacturing approach of glass substrate for disc]
Fig. 6 is that expression uses two sides shown in Figure 1 lapping device 3 to make the sketch map of the 2nd embodiment of the manufacturing approach of glass substrate for disc of the present invention.This method also with the 1st embodiment likewise, comprise several grinding steps shown in Fig. 6 (a), Fig. 6 (b).In these grinding steps, supply with the lapping liquid that contain grinding abrasive particle 40 or 50 on one side, make glass substrate 1 and grinding pad 10 or 20 relatively move the first type surface of grinding glass substrate 1 on one side.Fig. 6 (a) is the grinding step of going ahead of the rest, and the grinding of in advance carrying out in the grinding step makes the end of first type surface become the shape (sliding saltus step) that descends than central portion, states the preparation grinding step among the 2nd embodiment after being equivalent to.Fig. 6 (b) is follow-up grinding step; The grinding that this follow-up grinding step carries out; The shape (slipping away) that makes decline changes towards the direction of offsetting, and it is smooth that the end of glass substrate 1 is approached, and states the mirror ultrafinish operation among the 2nd embodiment after this follow-up grinding step is equivalent to.Grinding step is used by grinding abrasive particle 40 and is realized with the combination that grinding pad 10 constitutes in advance.Follow-up grinding step is used by grinding abrasive particle 50 and is realized with the combination that grinding pad 20 constitutes.
In the 2nd embodiment; Can also comprise the grasp operation; This grasps operation; Before the grinding step in advance of Fig. 6 (a), grasp the shape that slips away that this operation forms, that the end descends than central portion in advance, the hardness of the grinding pad 20 that uses in the follow-up grinding step of decision Fig. 6 (b) and the particle diameter that grinds abrasive particle 50.This grasps operation, for example, can behind the grinding step of going ahead of the rest, measure the end shape of glass substrate in advance, determines the treatment conditions of follow-up grinding step.
Grasp operation by this, can make the grinding pad 10 that uses in the grinding step in advance of hardness ratio Fig. 6 (a) of the grinding pad 20 that uses in the follow-up grinding step of Fig. 6 (b) low.The hardness of grinding pad 10,20 as stated, can be regulated with the bubbles volume of sneaking in these pads.In addition, by above-mentioned grasp operation, can make the grinding abrasive particle that uses in the in advance grinding step of size ratio Fig. 6 (a) of the grinding abrasive particle that uses in the follow-up grinding step of Fig. 6 (b) little.That is, this 2nd embodiment also comprises grasp operation and decision operation.In grasping operation, grasp the end shape of the glass substrate that obtains with the grinding step of going ahead of the rest in advance.In the decision operation, the hardness of the grinding pad that determines to use in the follow-up grinding step and the particle diameter that grinds abrasive particle.
As stated; Lower and/or grind in the follow-up grinding step shown in the bigger Fig. 6 (b) of abrasive particle particle diameter in grinding pad hardness; Grind in this wise: when supposing the glass substrate of abrasive tip portion flattening; As glass substrate 100, make the end become shape (sliding saltus step) than the central portion protuberance.
Being used for the end to above-mentioned Ginding process has been that the result shown in Fig. 6 (c), can form the end of first type surface flat condition in fact when slipping away the glass substrate 1 of shape.Perhaps, the result of the follow-up grinding step of Fig. 6 (b) also can be to make the end of first type surface become the shape (slipping away) that descends than central portion.This Ginding process is to pre-estimate the end shape that produces in the chemical enhanced treatment process of after follow-up grinding step, carrying out to change (sliding saltus step), in follow-up grinding step, is pre-formed the Ginding process that slips away.Though be to form to slip away, this slips away is to approach smooth slipping away than slipping away of preparation grinding step formation.
[disk manufacturing approach]
Of the 1st embodiment, form magnetosphere on the surface of the glass substrate that obtains with above-mentioned glass substrate for disc manufacturing approach at least, make disk, just can obtain the smooth in fact disk in end etc., have the disk of required end shape.
[the 2nd embodiment]
In the 2nd embodiment, also pass through the operation of following (1)～(11), made glass substrate for disc and perpendicular magnetic recording disk.
(1) shape manufacturing procedure
At first, being ready to the multicomponent that amorphous glass constitutes is glass substrate.The kind of glass is an alumina silicate glass, and concrete chemical composition is the SiO of 63.5 weight %
2, the Al of 14.2 weight %
2O
3, the Na of 10.4 weight %
2O, the Li of 5.4 weight %
2O, the ZRO of 6.0 weight %
2, the Sb of 0.4 weight %
2O
3, the As of 0.1 weight %
2O
3
This glass substrate is shaped with direct pressurization, becomes the glass substrate of plate-like.Use the middle body perforate of grinding stone again, form the plate-like glass substrate 1 that central part has circular hole at glass substrate.Then, peripheral end face and interior all end faces are implemented chamfer machining.
(2) end surface grinding operation
Then, Yi Bian make glass substrate 1 rotation, with the brush grinding surface roughness of glass substrate 1 end face (interior week, periphery) being ground to form degree, the arithmetic average roughness (Ra) that maximum height (Rmax) is 1.0 μ m on one side is the degree of 0.3 μ m.
(3) grind and cut operation
Then, with the abrasive particle of #1000 granularity, it is that 3 μ m, Rmax are that degree, the Ra of 2 μ m is the degree of 0.2 μ m that glass baseplate surface is ground the flatness that is whittled into first type surface.Here said flatness is the highest part and the distance (difference of height) of lowermost portion at above-below direction (perpendicular to the direction on surface) of substrate surface, is to measure with the flatness determinator.In addition, Rmax and Ra are to measure with atomic force microscope (AFM) (nanoscope of デ ジ タ Le イ Application ス Star Le メ Application Star society system).
(4) preparation grinding step
The preparation grinding step, be first with grinding pad to cutting in operation (3) quilt and grind the operation of being ground by the substrate of roughing again after cutting above-mentioned grinding.With the lapping device 3 that can once grind 100～200 sheet glass substrates, two first type surfaces, implement the preparation grinding step.Grinding pad is to adopt the soft polished part of polyurethanes.In addition, grinding pad is to adopt the grinding pad that contains zirconia and cerium oxide in advance.
The table of the grinding condition of Fig. 7 (a) expression the 2nd embodiment.The lapping liquid in (1 time grind) operation is ground in preparation, is average grain diameter that the cerium oxide abrasive abrasive particle 40 of 1.2 μ m mixes with water and processes.The particle diameter that grinds abrasive particle 40 is preferably in the scope of 1.0～1.4 μ m.The load that is applied on the glass substrate 1 is 80～100g/cm
2, it is 20～40 μ m that the surface element of glass substrate 1 is removed thickness.
" end shape " in Fig. 7 table is the end shape that this grinding step has only been carried out in expression separately.Specifically, expression is with having the glass substrate of flat end, the end shape that has formed when having carried out this grinding step.In addition, " result " in Fig. 7 table is meant the end shape of the substrate after 1 time 2 times continuous grinding steps finish respectively.
End shape to having carried out behind these (4) preparation grinding step is observed, and shown in Fig. 6 (a), end shape is the shape that slips away.
(5) mirror ultrafinish operation
The mirror ultrafinish operation is the glass substrate that grinds through preparation, further grinds, and the first type surface of glass substrate is ground to form the operation of minute surface.With the lapping device 3 that can once grind 100～200 sheet glass substrates, two first type surfaces, implemented mirror ultrafinish (2 grindings) operation.Grinding pad is to adopt polyurethanes hard polished part.Lapping liquid in the mirror ultrafinish operation, the cerium oxide particles that in ultra-pure water, adds particle diameter and be 0.5 μ m is processed.In this mirror ultrafinish operation (2 grindings) operation, slide the saltus step shape in order to form, the particle diameter of the grinding-material of use is preferably in more than the 0.3 μ m.Consider the mirror-quality that finally obtains, particle diameter is preferably in the scope of 0.3～0.6 μ m.
End shape to having carried out after this (5) mirror ultrafinish operation is observed, and end shape is smooth in fact shape.
In addition, be used in carry out (5) mirror ultrafinish operation before, end shape is the glass substrate of flat condition, carry out the mirror ultrafinish operation of (5) after, end shape becomes and slides the saltus step shape.
That is, in this 2nd embodiment, the grinding in that the preparation grinding step carries out makes end shape become the shape that slips away.The grinding of carrying out in follow-up mirror ultrafinish operation forms original flat end shape and slides the saltus step shape.Like this, can the end shape of the glass substrate that finally obtains be controlled to be required flat condition.
(6) matting after mirror ultrafinish is handled
Then, with the 1st embodiment likewise, be impregnated into glass substrate 1 in the NaOH aqueous solution of concentration 3～5wt%, carry out alkali and clean.Cleaning applies ultrasonic wave and carries out.Immerse successively again in each rinse bath of neutral detergent, pure water, pure water, isopropyl alcohol, isopropyl alcohol (vapour seasoning), clean.With the surface of the glass substrate 1 after AFM (nanoscope of デ ジ タ Le イ Application ス Star Le メ Application Star society system) the observation cleaning, do not find adhering to of cerium oxide abrasive abrasive particle.In addition, do not find the foreign matter of stainless steel, iron etc. yet.
(7) chemical enhanced treatment process
Then, with the 1st embodiment likewise, the glass substrate 1 that is preheating to after 300 ℃ the cleaning,, carry out chemical enhanced processing potassium nitrate (60%) and sodium nitrate (40%) being mixed and being heated in 375 ℃ the chemical enhanced salt dipping about 3 hours.Handle through this, the lithium ion on glass substrate 1 surface, sodium ion respectively with chemical enhanced salt in sodium ion, potassium ion displacement (ion-exchange), glass substrate 1 is chemically strengthened.In addition, the thickness that is formed on the compressive stress layers on glass substrate 1 surface is about 100～200 μ m.Implemented chemical enhanced after, glass substrate 1 is impregnated in 20 ℃ the tank, carries out chilling, kept about 10 minutes.
The result of this chemical enhanced treatment process, the superficial expansion protuberance of substrate 1 produces sometimes and slides saltus step.Under this situation, when the mirror ultrafinish operation of going ahead of the rest finishes, also can not form flat condition completely, and the more residual slightly shape that slips away.
(8) matting after chemical enhanced
Then, with the 1st embodiment likewise, be impregnated into the glass substrate behind the above-mentioned chilling 1 and be heated in about 40 ℃ sulfuric acid, Yi Bian apply ultrasonic wave,, accomplished the manufacturing of glass substrate for disc Yi Bian clean.
(9) the inspection operation of glass substrate for disc
Then, glass substrate for disc is checked.The surface is the mirror status of cleaning, does not have the foreign matter that hinders the magnetic head come-up, the foreign matter that causes hot unevenness fault.
(10) disk manufacturing process
Then; With the 1st embodiment likewise; To above-mentioned glass substrate for disc; On the surface of glass substrate successively the adhesion layer that constitutes by the Cr alloy of film forming, the soft ferromagnetic layer that constitutes by CoTaZr base alloy, the basalis that constitutes by Ru, the perpendicular magnetic recording layer that constitutes by CoCrPt base alloy, the protective layer that constitutes by hydrogenated carbon, by the lubricating layer that PFPE constitutes, processed perpendicular magnetic recording disk.
(11) the inspection operation of disk
Then, the disk of above-mentioned manufacturing is checked.Earlier use float-amount to use head, be implemented in a crushing test of moving on the disk as the inspection of 8nm.As a result, magnetic head does not contact foreign matter etc., does not produce the crushing problem.
Then, adopting the regeneration element portion is that magnetic resistance effect type element, recording element portion are that single magnetic pole type element, float-amount are the magnetic head of 8nm, has carried out the record regenerating test of perpendicular recording.Results verification information is normally by record, regeneration.At this moment, in regenerated signal, do not detect hot unevenness signal, available 100 gigabits per square inch carry out record regenerating.
Then, carried out the glide height test of disk.This test is to make inspection reduce gradually, confirm that with the float-amount of head inspection is with the test that contact the float-amount that produce of head with disk.As a result, in the disk of present embodiment, to peripheral edge portion,, float-amount do not produce contact even being 4nm from the disk inner margin portion yet.At the peripheral edge portion of disk, glide height is 3.7nm.
Use with the present invention make like this end shape towards offset method that direction changes different, the glass substrate that obtains of the comparative example of technology before, with the above-mentioned disk of likewise making, implement a crushing test, the result, magnetic head and foreign matter etc. contact generation crushing problem.
Fig. 7 (b) is the table of the grinding condition in the comparative example of representing to make comparisons with this 2nd embodiment.With the glass substrate that comparative example obtains,, implement a crushing test with the above-mentioned disk of likewise making.As a result, magnetic head contacts with foreign matter etc., has produced the crushing problem.
Fig. 7 (a) and Fig. 7 (b) are compared, and particle diameter is all identical in the 1 time 2 times grindings, but the material of grinding used grinding pad for 1 time has nothing in common with each other.When grinding pad was compared, comparative example was the hardness of the grinding pad of Fig. 7 (b), in 1 time is ground, was 93C hardness, in 2 times are ground, was 84C hardness, low during the grinding pad hardness ratio of grinding for 2 times is ground for 1 time.On the other hand, the present invention the 2nd embodiment be Fig. 7 (a) grinding pad hardness similarly, in 1 time is ground, be 90C hardness, in 2 times are ground, be 72C hardness, low during the grinding pad hardness ratio of grinding for 2 times is ground for 1 time, but hardness number is different with Fig. 7 (b).
In addition, the grinding pad hardness of Fig. 7 (a) is preferably in the scope of 90～96C hardness (A Si card C hardness) in 1 time is ground, and is preferably in 70～86C hardness range in 2 grindings.
In the 2nd embodiment of the present invention, in 2 times are ground, make the shape that in 1 time is ground, forms the glass substrate end of slipping away change towards the direction of offsetting, form and slide the saltus step of sliding that hop value is 0.034 μ m.On the other hand, in comparative example, in 2 times are ground, not only do not offset and form the glass substrate end shape that slips away in grinding for 1 time, but also the value of slipping away that has formed absolute value and increased is slipping away of-0.173 μ m.Can know that from this result the 2nd embodiment according to the present invention cancels out each other because the end shape that grinding step forms before and after making changes, so it is smooth that end shape is more approached.
The present invention can be used for manufacturing approach and the disk manufacturing approach as the glass substrate for disc of recording mediums such as computer use.
Claims (7)
1. the manufacturing approach of a glass substrate for disc; Comprise several contain the lapping liquid that grinds abrasive particle supply to glass substrate and grind between the grinding pad of first type surface of this glass substrate, the grinding step of the first type surface that above-mentioned glass substrate and above-mentioned grinding pad relatively moved grind above-mentioned glass substrate; It is characterized in that; Above-mentioned several grinding steps comprise grinding step and follow-up grinding step in advance;
The grinding that above-mentioned in advance grinding step carries out, use designed combination grind the 1st combination that abrasive particle and the 1st grinding pad constitute by the 1st, the end shape of the first type surface of above-mentioned glass substrate is become than the central portion protuberance of first type surface or the shape that descends;
The grinding that above-mentioned follow-up grinding step carries out makes above-mentioned glass substrate change, above-mentioned end shape is formed required form towards the direction of the shape of offsetting the protuberance that in above-mentioned grinding step in advance, forms or decline.
2. the manufacturing approach of glass substrate for disc as claimed in claim 1 is characterized in that, above-mentioned required form is meant that the end shape of above-mentioned glass substrate is essentially flat condition.
3. the manufacturing approach of glass substrate for disc as claimed in claim 1; It is characterized in that; Above-mentioned required form is meant the shape that the end shape of above-mentioned glass substrate descends than central portion; After above-mentioned follow-up grinding step, carry out chemical enhanced processing, this chemical enhanced processing is implemented to strengthen through glass substrate is carried out ion-exchange.
4. the manufacturing approach of glass substrate for disc as claimed in claim 1; It is characterized in that; In above-mentioned in advance grinding step, if make the end shape of the first type surface of above-mentioned glass substrate become the grinding of projecting shape, then in above-mentioned follow-up grinding step; Grind like this: when grinding the smooth glass substrate of above-mentioned end shape, make this end shape become the shape that descends than central portion;
In above-mentioned grinding step in advance; If make the end shape of the first type surface of above-mentioned glass substrate become the grinding of decline shape; Then in above-mentioned follow-up grinding step; Grind like this: when grinding the smooth glass substrate of above-mentioned end shape, make this end shape become shape than the central portion protuberance.
5. the manufacturing approach of glass substrate for disc as claimed in claim 1; It is characterized in that; In above-mentioned grinding step in advance; If make the end shape of the first type surface of above-mentioned glass substrate become the grinding of projecting shape, then in above-mentioned follow-up grinding step, use the grinding pad of the grinding bed hedgehopping of using in the above-mentioned grinding step in advance of hardness ratio;
In above-mentioned grinding step in advance,, then in above-mentioned follow-up grinding step, use the low grinding pad of using in the above-mentioned grinding step in advance of hardness ratio of grinding pad if make the end shape of the first type surface of above-mentioned glass substrate become the grinding of decline shape.
6. the manufacturing approach of glass substrate for disc as claimed in claim 1 is characterized in that, the grinding that above-mentioned follow-up grinding step carries out becomes below the 0.2nm roughness Ra that has carried out the above-mentioned glass substrate first type surface behind this follow-up grinding step.
7. the manufacturing approach of a disk is characterized in that, the surface of the glass substrate that obtains in the manufacturing approach with each described glass substrate for disc in the claim 1 to 6 forms magnetosphere at least.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006253572 | 2006-09-19 | ||
| JP253571/2006 | 2006-09-19 | ||
| JP2006253571 | 2006-09-19 | ||
| JP253572/2006 | 2006-09-19 | ||
| PCT/JP2007/067619 WO2008035586A1 (en) | 2006-09-19 | 2007-09-11 | Process for producing glass substrate for magnetic disk and process for manufacturing magnetic disk |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201210090406.4A Division CN102615588B (en) | 2006-09-19 | 2007-09-11 | Process for producing glass substrate for magnetic disk and process for manufacturing magnetic disk |
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| CN101356040A CN101356040A (en) | 2009-01-28 |
| CN101356040B true CN101356040B (en) | 2012-05-30 |
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| CN2007800012384A Active CN101356040B (en) | 2006-09-19 | 2007-09-11 | Process for producing glass substrate for magnetic disk and process for manufacturing magnetic disk |
| CN201210090406.4A Active CN102615588B (en) | 2006-09-19 | 2007-09-11 | Process for producing glass substrate for magnetic disk and process for manufacturing magnetic disk |
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| CN201210090406.4A Active CN102615588B (en) | 2006-09-19 | 2007-09-11 | Process for producing glass substrate for magnetic disk and process for manufacturing magnetic disk |
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| Country | Link |
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| CN (2) | CN101356040B (en) |
| MY (1) | MY165952A (en) |
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| CN101827686B (en) | 2008-07-03 | 2013-07-17 | 旭硝子株式会社 | Method of polishing glass substrate and process for producing glass substrate, and method for manufacturing glass substrate for magnetic disc |
| CN106297833B (en) * | 2009-12-29 | 2019-03-08 | Hoya株式会社 | The manufacturing method and glass substrate for disc of glass substrate for disc |
| CN106024031B (en) * | 2009-12-29 | 2019-01-22 | Hoya株式会社 | The manufacturing method and glass substrate for disc of glass substrate for disc |
| WO2011145662A1 (en) * | 2010-05-20 | 2011-11-24 | 旭硝子株式会社 | Process for producing glass substrate for information recording medium and process for producing magnetic disk |
| CN102581750B (en) * | 2012-03-31 | 2015-04-29 | 天津西美科技有限公司 | Wax-free grinding and polishing template with double inlaying layers |
| JP5898381B2 (en) * | 2013-06-27 | 2016-04-06 | Hoya株式会社 | GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIUM, INFORMATION RECORDING MEDIUM, AND MAGNETIC DISC DEVICE |
| CN104029117B (en) * | 2014-07-01 | 2015-04-29 | 中州大学 | Corner clutch type permanent magnet suction cup |
| WO2016060168A1 (en) * | 2014-10-14 | 2016-04-21 | Hoya株式会社 | Method for manufacturing substrate for magnetic disc and method for manufacturing magnetic disc |
| JP6913295B2 (en) * | 2016-12-27 | 2021-08-04 | 日本電気硝子株式会社 | Glass plate and manufacturing method of glass plate |
| KR102391872B1 (en) * | 2017-05-26 | 2022-04-29 | 삼성디스플레이 주식회사 | Method of manufacturing a glass substrate and device for polishing a glass substrate |
| JP7370347B2 (en) * | 2019-02-15 | 2023-10-27 | 東洋鋼鈑株式会社 | Manufacturing method of hard disk substrate |
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| JP2004265582A (en) * | 1999-09-30 | 2004-09-24 | Hoya Corp | Glass substrate for magnetic disk, and magnetic disk |
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| JP3568888B2 (en) * | 1999-09-30 | 2004-09-22 | Ｈｏｙａ株式会社 | Glass substrate for information recording medium, information recording medium, and method for producing them |
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- 2007-09-11 WO PCT/JP2007/067619 patent/WO2008035586A1/en active Application Filing
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| CN1280356A (en) * | 1999-07-09 | 2001-01-17 | 日本碍子株式会社 | Base board for magnetic disc, method for producing disc and disc base board |
| EP1195798A1 (en) * | 2000-04-12 | 2002-04-10 | Shin-Etsu Handotai Co., Ltd | Method for producing semiconductor wafer and semiconductor wafer |
| CN1240057C (en) * | 2001-05-14 | 2006-02-01 | Hoya株式会社 | Glass substrate for magnetic record mediuma nd method for making same |
Also Published As
| Publication number | Publication date |
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| MY165952A (en) | 2018-05-18 |
| CN102615588A (en) | 2012-08-01 |
| CN101356040A (en) | 2009-01-28 |
| WO2008035586A1 (en) | 2008-03-27 |
| CN102615588B (en) | 2014-12-17 |
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