CN101287304B - 具有厚氧化物输入级晶体管的深亚微米mos前置放大器 - Google Patents
具有厚氧化物输入级晶体管的深亚微米mos前置放大器 Download PDFInfo
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- CN101287304B CN101287304B CN2007101857943A CN200710185794A CN101287304B CN 101287304 B CN101287304 B CN 101287304B CN 2007101857943 A CN2007101857943 A CN 2007101857943A CN 200710185794 A CN200710185794 A CN 200710185794A CN 101287304 B CN101287304 B CN 101287304B
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- Prior art keywords
- integrated circuit
- circuit die
- deep submicron
- mos integrated
- signal input
- Prior art date
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 16
- 239000003990 capacitor Substances 0.000 claims description 8
- 238000004891 communication Methods 0.000 claims description 8
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 230000000903 blocking effect Effects 0.000 claims 2
- 230000001413 cellular effect Effects 0.000 claims 1
- 235000014676 Phragmites communis Nutrition 0.000 description 9
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000009434 installation Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- RGCLLPNLLBQHPF-HJWRWDBZSA-N phosphamidon Chemical compound CCN(CC)C(=O)C(\Cl)=C(/C)OP(=O)(OC)OC RGCLLPNLLBQHPF-HJWRWDBZSA-N 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000002463 transducing effect Effects 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R19/00—Electrostatic transducers
- H04R19/01—Electrostatic transducers characterised by the use of electrets
- H04R19/016—Electrostatic transducers characterised by the use of electrets for microphones
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F1/00—Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
- H03F1/52—Circuit arrangements for protecting such amplifiers
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F1/00—Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
- H03F1/52—Circuit arrangements for protecting such amplifiers
- H03F1/523—Circuit arrangements for protecting such amplifiers for amplifiers using field-effect devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F1/00—Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
- H03F1/56—Modifications of input or output impedances, not otherwise provided for
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/181—Low-frequency amplifiers, e.g. audio preamplifiers
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/181—Low-frequency amplifiers, e.g. audio preamplifiers
- H03F3/183—Low-frequency amplifiers, e.g. audio preamplifiers with semiconductor devices only
- H03F3/185—Low-frequency amplifiers, e.g. audio preamplifiers with semiconductor devices only with field-effect devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/181—Low-frequency amplifiers, e.g. audio preamplifiers
- H03F3/183—Low-frequency amplifiers, e.g. audio preamplifiers with semiconductor devices only
- H03F3/187—Low-frequency amplifiers, e.g. audio preamplifiers with semiconductor devices only in integrated circuits
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R19/00—Electrostatic transducers
- H04R19/005—Electrostatic transducers using semiconductor materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
- H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
- H10D84/0144—Manufacturing their gate insulating layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F2200/00—Indexing scheme relating to amplifiers
- H03F2200/03—Indexing scheme relating to amplifiers the amplifier being designed for audio applications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F2200/00—Indexing scheme relating to amplifiers
- H03F2200/18—Indexing scheme relating to amplifiers the bias of the gate of a FET being controlled by a control signal
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F2200/00—Indexing scheme relating to amplifiers
- H03F2200/222—A circuit being added at the input of an amplifier to adapt the input impedance of the amplifier
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R2201/00—Details of transducers, loudspeakers or microphones covered by H04R1/00 but not provided for in any of its subgroups
- H04R2201/003—Mems transducers or their use
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Multimedia (AREA)
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Signal Processing (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Amplifiers (AREA)
- Bipolar Transistors (AREA)
- Circuit For Audible Band Transducer (AREA)
Abstract
Description
Claims (28)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US87545206P | 2006-12-18 | 2006-12-18 | |
US60/875,452 | 2006-12-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101287304A CN101287304A (zh) | 2008-10-15 |
CN101287304B true CN101287304B (zh) | 2013-02-06 |
Family
ID=38529830
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007101857943A Expired - Fee Related CN101287304B (zh) | 2006-12-18 | 2007-12-17 | 具有厚氧化物输入级晶体管的深亚微米mos前置放大器 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8094846B2 (zh) |
EP (1) | EP1936689B1 (zh) |
KR (1) | KR101485067B1 (zh) |
CN (1) | CN101287304B (zh) |
AT (1) | ATE549794T1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8542850B2 (en) | 2007-09-12 | 2013-09-24 | Epcos Pte Ltd | Miniature microphone assembly with hydrophobic surface coating |
DE102007058951B4 (de) * | 2007-12-07 | 2020-03-26 | Snaptrack, Inc. | MEMS Package |
ITTO20090495A1 (it) | 2009-06-30 | 2011-01-01 | St Microelectronics Srl | Circuito preamplificatore per un trasduttore acustico capacitivo di tipo microelettromeccanico |
DE102010006132B4 (de) | 2010-01-29 | 2013-05-08 | Epcos Ag | Miniaturisiertes elektrisches Bauelement mit einem Stapel aus einem MEMS und einem ASIC |
US9181086B1 (en) | 2012-10-01 | 2015-11-10 | The Research Foundation For The State University Of New York | Hinged MEMS diaphragm and method of manufacture therof |
US9331655B2 (en) * | 2013-07-10 | 2016-05-03 | Broadcom Corporation | Pop-click noise grounding switch design with deep sub-micron CMOS technology |
US9608437B2 (en) * | 2013-09-12 | 2017-03-28 | Qualcomm Incorporated | Electro-static discharge protection for integrated circuits |
CN108605181A (zh) * | 2016-02-01 | 2018-09-28 | 美商楼氏电子有限公司 | 用于偏置mems马达的设备 |
US12091313B2 (en) | 2019-08-26 | 2024-09-17 | The Research Foundation For The State University Of New York | Electrodynamically levitated actuator |
CN112290899B (zh) * | 2020-10-26 | 2024-02-06 | 杭州爱华仪器有限公司 | 一种测量电路前置放大器 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1414617A (zh) * | 2001-10-25 | 2003-04-30 | 夏普公司 | 一种在硅衬底上形成mos器件的方法 |
WO2003067924A1 (fr) * | 2002-02-06 | 2003-08-14 | Hosiden Corporation | Microphone a condensateurs electret |
CN1447403A (zh) * | 2002-03-25 | 2003-10-08 | 华邦电子股份有限公司 | 深次微米mos装置及其制造方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03196677A (ja) | 1989-12-26 | 1991-08-28 | Nec Corp | 半導体装置 |
US6426673B2 (en) | 1997-07-30 | 2002-07-30 | Programmable Silicon Solutions | High performance integrated radio frequency circuit devices |
JP2001102875A (ja) | 1999-10-01 | 2001-04-13 | Hosiden Corp | 半導体増幅回路及び半導体エレクトレットコンデンサマイクロホン |
US6181193B1 (en) | 1999-10-08 | 2001-01-30 | International Business Machines Corporation | Using thick-oxide CMOS devices to interface high voltage integrated circuits |
US6353344B1 (en) | 2000-05-22 | 2002-03-05 | Microtronic Us, Inc. | High impedance bias circuit |
US6642543B1 (en) | 2000-09-26 | 2003-11-04 | The Board Of Trustees Of The Leland Stanford Junior University | Thin and thick gate oxide transistors on a functional block of a CMOS circuit residing within the core of an IC chip |
WO2002073792A2 (en) | 2001-03-09 | 2002-09-19 | Techtronic A/S | An electret condensor microphone preamplifier that is insensitive to leakage currents at the input |
SE522714C2 (sv) | 2001-07-13 | 2004-03-02 | Ericsson Telefon Ab L M | Framställning av lågbrusig MOS-anordning |
US7149317B2 (en) | 2002-04-18 | 2006-12-12 | Sonionmicrotronic Nederland B.V. | CMOS high impedance circuit |
US6888408B2 (en) | 2002-08-27 | 2005-05-03 | Sonion Tech A/S | Preamplifier for two terminal electret condenser microphones |
US7142682B2 (en) | 2002-12-20 | 2006-11-28 | Sonion Mems A/S | Silicon-based transducer for use in hearing instruments and listening devices |
US7466835B2 (en) | 2003-03-18 | 2008-12-16 | Sonion A/S | Miniature microphone with balanced termination |
US7787642B2 (en) | 2003-07-17 | 2010-08-31 | Massachusetts Institute Of Technology | Low-power high-PSRR current-mode microphone pre-amplifier system and method |
US6977543B2 (en) | 2003-08-26 | 2005-12-20 | Intel Corporation | Biasing technique using thin and thick oxide transistors |
US7391873B2 (en) | 2003-12-01 | 2008-06-24 | Audioasics A/S | Microphone with voltage pump |
ATE410820T1 (de) | 2004-01-12 | 2008-10-15 | Sonion As | Verstärkerschaltung für kapazitive umformer |
EP1599067B1 (en) | 2004-05-21 | 2013-05-01 | Epcos Pte Ltd | Detection and control of diaphragm collapse in condenser microphones |
US7271651B2 (en) | 2005-06-17 | 2007-09-18 | Agere Systems Inc. | High performance differential amplifiers with thick oxide devices for high impedance nodes |
EP1742506B1 (en) * | 2005-07-06 | 2013-05-22 | Epcos Pte Ltd | Microphone assembly with P-type preamplifier input stage |
-
2007
- 2007-12-17 CN CN2007101857943A patent/CN101287304B/zh not_active Expired - Fee Related
- 2007-12-17 US US11/958,103 patent/US8094846B2/en active Active
- 2007-12-18 EP EP07150087A patent/EP1936689B1/en active Active
- 2007-12-18 KR KR20070133653A patent/KR101485067B1/ko not_active Expired - Fee Related
- 2007-12-18 AT AT07150087T patent/ATE549794T1/de active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1414617A (zh) * | 2001-10-25 | 2003-04-30 | 夏普公司 | 一种在硅衬底上形成mos器件的方法 |
WO2003067924A1 (fr) * | 2002-02-06 | 2003-08-14 | Hosiden Corporation | Microphone a condensateurs electret |
CN1447403A (zh) * | 2002-03-25 | 2003-10-08 | 华邦电子股份有限公司 | 深次微米mos装置及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1936689B1 (en) | 2012-03-14 |
CN101287304A (zh) | 2008-10-15 |
EP1936689A1 (en) | 2008-06-25 |
US8094846B2 (en) | 2012-01-10 |
ATE549794T1 (de) | 2012-03-15 |
KR20080056683A (ko) | 2008-06-23 |
US20080152171A1 (en) | 2008-06-26 |
KR101485067B1 (ko) | 2015-01-21 |
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Owner name: EPCOS PRIVATE PRIVATE INVESTMENT LIMITED Free format text: FORMER OWNER: PULSE APS (DK) Effective date: 20130122 |
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Address after: Roskilde Patentee after: Pars components Pte. Ltd. Address before: Roskilde Patentee before: Sanno |
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Effective date of registration: 20130122 Address after: Singapore Singapore Patentee after: EPCOS Private Investment Co.,Ltd. Address before: Roskilde Patentee before: Pars components Pte. Ltd. |
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Effective date of registration: 20170330 Address after: Tokyo, Japan Patentee after: TDK Corp. Address before: Singapore Singapore Patentee before: EPCOS Private Investment Co.,Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130206 Termination date: 20191217 |