CN101277577A - Plasma jet electrode device and system thereof - Google Patents

Abstract

The invention relates to a plasma jet electrode device and a system thereof. The plasma jet electrode device comprises a positioning seat, a ceramic tube, a disc and a high-voltage metal electrode, wherein a plurality of inclined holes which obliquely penetrate through are distributed on the disc, a dielectric discharge plasma area is formed between the high-voltage metal electrode and the ceramic tube, the device further comprises a rotating seat, a base plate and a grounding electrode, a low-temperature non-balanced plasma area is formed between the grounding electrode and the high-voltage metal electrode, and a magnetic nozzle head is arranged around the bottom end of the base plate; by this design, the plasma can be generated and flow in a turbulent manner, and the plasma processing area and uniformity can be improved by the rotating ejection of the nozzle head. The plasma jet electrode system has at least one plasma jet electrode device fixed by a support, which can greatly increase the plasma processing area and provide the functions of cooling, guiding, coating and etching the workpiece.

Description

Plasma jet electrode device and its system

technical field

The invention relates to a plasma jet electrode device, in particular to an unbalanced plasma jet that can be produced at low temperature and normal pressure, and can improve the plasma treatment area and uniformity, so as to achieve a more ideal Plasma jet electrode device and its system for workpiece surface treatment effect.

Background technique

In recent years, using the principle of gas ionization (plasma), the removal of pollutants by gaseous oxidation has been researched and developed successively, such as electron beam method (Electron Beam), corona discharge method (Corona Discharge), microwave method (Microwave), high-frequency electric Radio Frequency (RF), Dielectric Barrier Discharge (DBD), etc. have all been proven to have certain treatment effects. Among them, the dielectric discharge method can be effective under normal pressure. Discharge, and the cost is low, is one of the mainstream researches on the removal of pollutants by non-thermal plasma, and the dielectric plasma discharge method has been widely used in plastic film printing, ore electrostatic screening separator, ozone generation However, the non-thermal plasma is still in a high-temperature state, and there are still some deviations in the treatment of the surface of the workpiece and the treatment effect is not good. The disadvantages of uniformity still need to be further improved.

Contents of the invention

The object of the present invention is to provide a plasma jet electrode device with a new structure. The technical problem to be solved is to make it possible to produce an unbalanced plasma jet at low temperature and normal pressure, and to improve the plasma treatment area. And uniformity, can achieve a more ideal workpiece surface treatment effect, which is very suitable for practical use.

Another object of the present invention is to provide a plasma jet electrode system with a new structure. The technical problem to be solved is to fix at least one plasma jet electrode device by a bracket, so that the plasma jet can be greatly increased. The processing area is large, and it can provide functions such as cooling, guiding, coating and etching of the workpiece, making it more suitable for practical use.

The purpose of the present invention and the solution to its technical problems are achieved by adopting the following technical solutions. According to a plasma jet electrode device proposed by the present invention, it has a positioning seat, a ceramic tube is set in the positioning seat, a disc is set in the ceramic tube, and at least one inclined penetrating slant is arranged on the disc. A high-voltage metal electrode is set in the disc, a dielectric discharge plasma area is formed between the high-voltage metal electrode and the ceramic tube, a chassis is set at the bottom of the positioning seat, and a grounding electrode is set on the inner wall of the chassis A low-temperature unbalanced plasma region is formed between the ground electrode and the high-voltage metal electrode, and a nozzle head is arranged at the bottom of the chassis to eject the low-temperature unbalanced plasma.

The purpose of the present invention and the solution to its technical problem also adopt the following technical solutions to achieve. According to a plasma jet electrode device proposed by the present invention, it has a positioning seat, a ceramic tube is set in the positioning seat, a disc is set in the ceramic tube, and at least one through hole is arranged on the disc. A high-voltage metal electrode is set in the disk, and a dielectric discharge plasma area is formed between the high-voltage metal electrode and the ceramic tube. A rotating seat is arranged on the peripheral surface of the positioning seat so that the positioning seat can be rotated relative to the rotating seat. Rotating movement, the bottom of the rotating seat is provided with a chassis, the inner wall of the chassis is provided with a grounding electrode, a low-temperature unbalanced plasma area is formed between the grounding electrode and the high-voltage metal electrode, and a nozzle is provided at the bottom of the chassis The head is used to eject low-temperature unbalanced plasma.

The aforementioned plasma jet electrode device, wherein the dielectric discharge plasma region formed between the high-voltage metal electrode and the ceramic tube has a distance, wherein the voltage passed into the high-voltage metal electrode is equal to the distance between the distance The ratio ranges from 1 to 5.

In the aforementioned plasma jet electrode device, wherein the low-temperature non-equilibrium plasma region formed between the high-voltage metal electrode and the ground electrode has a distance, the ratio range of the voltage fed into the high-voltage metal electrode to the distance is between 1 and 5.

The aforementioned plasma jet electrode device, wherein the positioning seat is provided with a top cover, a screw hole is provided in the top cover, a gas pipe is provided in the screw hole, a joint is provided at the top of the high-voltage metal electrode, and the joint An electric wire is arranged at the position, and the electric wire passes through the air pipe and is connected to a high-voltage electric terminal. A gap is formed between the air pipe and the electric wire, so that outside air and plasma process gas can enter the ceramic pipe through the air pipe to react.

The aforementioned plasma jet electrode device, wherein the disc is provided with an internal thread, and the top peripheral surface of the high-voltage metal electrode is provided with an external thread, so that the external thread of the high-voltage metal electrode is screwed on the disc. In the internal thread, a plurality of oblique holes are arranged on the disc, which are inclined at an angle of 45 degrees in the same direction.

In the aforementioned plasma jet electrode device, an outer ring groove is arranged on the peripheral surface of the positioning seat, a bearing is arranged at the outer ring groove, an inner ring groove is arranged on the inner wall of the rotating seat, and an inner ring groove is arranged on the inner wall of the rotating seat. The ring groove is sleeved on the bearing, so that the positioning seat can rotate relative to the rotating seat.

In the aforementioned plasma jet electrode device, at least one oblique hole is arranged on the nozzle head, and the oblique holes are distributed in a diffuse or radial manner.

In the aforementioned plasma jet electrode device, the outlet of the flat nozzle head is in-line.

The aforementioned plasma jet electrode device further includes a magnetic body located around the nozzle head to provide a magnetic field to the nozzle head.

In the aforementioned plasma jet electrode device, the high-voltage metal electrode is a hollow cylinder.

The aforementioned plasma jet electrode device, the device further includes a precursor flow controller, which is used to provide and control a precursor to the low-temperature non-equilibrium plasma region, so that the device can be applied to coating or etching Process.

The purpose of the present invention and the solution to its technical problems are also achieved by the following technical solutions.

A plasma jet electrode system, which at least comprises a plasma jet electrode device as claimed in claim 1 or 2, and a bracket, the bracket is used to fix the plasma jet electrode device.

The purpose of the present invention and its technical problems can also be further realized by adopting the following technical measures.

The aforementioned plasma jet electrode system further includes a plurality of plasma jet electrode devices, and the plurality of plasma jet electrode devices are arranged linearly or planarly and arranged on the support.

The aforementioned plasma jet electrode system further includes a cooling device arranged at one end of the support for cooling the workpiece processed by the plasma jet electrode system, wherein the cooling device is an air-cooled cooling device. device.

The aforementioned plasma jet electrode system further includes a guiding device connected under the support for guiding the support to move along a predetermined direction, wherein the guiding device is a roller.

The aforementioned plasma jet electrode system further includes a guiding device connected under the support for guiding the support to move along a predetermined direction.

Compared with the prior art, the present invention has obvious advantages and beneficial effects. As can be seen from the above, in order to achieve the above object, the present invention provides a plasma jet electrode device, which has a positioning seat, a ceramic tube is arranged in the positioning seat, a disc is arranged in the ceramic tube, and several A slanted hole penetrates obliquely. A high-voltage metal electrode is set in the disk. A dielectric discharge plasma area is formed between the high-voltage metal electrode and the ceramic tube. A grounding electrode is arranged on the inner wall of the chassis, and a low-temperature unbalanced plasma area is formed between the grounding electrode and the high-voltage metal electrode. A nozzle head is arranged at the bottom of the chassis, and several oblique holes are arranged on the nozzle head.

With the above technical solutions, the plasma jet electrode device and its system of the present invention have at least the following advantages and beneficial effects:

With the above-mentioned structural design, the wires can be connected to the power supply, so that the electrical circuit can transmit the AC high-frequency high-voltage power used to generate the plasma, and ground the chassis, while the low-temperature and normal-pressure atmosphere and the plasma process gas enter through the gas pipe , and the plasma generated by flowing through the dielectric discharge plasma region through the inclined holes arranged on the disk atomizes the plasma in a turbulent manner, and generates low-temperature non-equilibrium plasma in the subsequent low-temperature non-equilibrium plasma region. Balanced plasma, and through the rotation mechanism of the nozzle head and the design of the inclined hole jet flow, the low temperature and normal pressure unbalanced plasma is rotated and ejected, which can change the plasma treatment area and uniformity, which is very suitable for practical use.

The plasma jet electrode device and its system of the present invention effectively improve the treatment area and uniformity of the low-temperature and atmospheric-pressure unbalanced plasma, and make the plasma jet electrode device more widely used, not only for cleaning, It can also be used in etching, which improves the industrial application of the plasma jet electrode device and its system, and has great industrial value.

To sum up, the present invention relates to a plasma jet electrode device and its system. The plasma jet electrode device has a positioning seat, a ceramic tube, a disk and a high-voltage metal electrode. Several oblique holes are arranged on the disk, and a dielectric medium is formed between the high-voltage metal electrode and the ceramic tube. In the discharge plasma area, the device further includes a rotating seat, a chassis and a ground electrode. A low-temperature unbalanced plasma area is formed between the ground electrode and the high-voltage metal electrode. The bottom of the chassis is provided with a nozzle head surrounded by magnetic materials; This design enables stronger plasma generation and flow to form turbulent flow, and sprays out through the rotation of the nozzle head, which can improve the plasma treatment area and uniformity. In the plasma jet electrode system, at least one plasma jet electrode device is fixed by a bracket, which can greatly increase the plasma treatment area, and can provide functions such as cooling, guiding, coating and etching of workpieces. The present invention has the above-mentioned many advantages and practical value, it has great improvement no matter in the structure or function of the product, it has significant progress in technology, and produces easy-to-use and practical effects, so it is more suitable for practical use, and It has wide application value in the industry, and it is a novel, progressive and practical new design.

The above description is only an overview of the technical solution of the present invention. In order to better understand the technical means of the present invention, it can be implemented according to the contents of the description, and in order to make the above and other purposes, features and advantages of the present invention more obvious and understandable , the following preferred embodiments are specifically cited below, and are described in detail as follows in conjunction with the accompanying drawings.

Description of drawings

FIG. 1 is a schematic cross-sectional view of the plasma jet electrode device of the present invention.

FIG. 2 is a perspective view of a disc in the plasma jet electrode device of the present invention.

3 is a schematic cross-sectional view of plasma operation in the plasma jet electrode device of the present invention.

FIG. 4 is a schematic cross-sectional view of another plasma jet electrode device of the present invention.

5 is a schematic cross-sectional view of yet another plasma jet electrode device of the present invention.

FIG. 6 is a schematic perspective view of the plasma jet electrode system of the present invention.

FIG. 7 is a schematic top view of the plasma jet electrode system in FIG. 6 .

FIG. 8 is a schematic perspective view of another plasma jet electrode system of the present invention.

FIG. 9 is a schematic top view of the plasma jet electrode system in FIG. 8 .

FIG. 10 is a three-dimensional schematic diagram of adding a cooling device to the plasma jet electrode system of the present invention.

FIG. 11 is a schematic side sectional view of the plasma jet electrode system in FIG. 10 .

FIG. 12 is a schematic perspective view of the addition of a guide device to the plasma jet electrode system of the present invention.

10: Positioning seat 11: Inner ring groove

12: Outer ring groove 13: Bearing

20: ceramic tube 21: inner ring groove

30: Disc 31: Inclined hole

40: High voltage metal electrode 401: Stratum tank

41: Connector 411: Hierarchy slot

42: Wire 421: Connector

50: Swivel seat 51: Inner ring groove

60: Top cover 61: Screw hole

62: Trachea 70: Chassis

701: convex part 71: ground electrode

72: Nozzle head 73: Inclined hole

80: Magnetic body 90: Bracket

91: cooling device 92: guiding device

A: Dielectric discharge plasma area B: Low temperature non-equilibrium plasma area

Detailed ways

In order to further explain the technical means and effects of the present invention to achieve the intended purpose of the invention, the specific implementation and structure of the plasma jet electrode device and its system proposed according to the present invention will be described below in conjunction with the accompanying drawings and preferred embodiments. , features and their effects are described in detail below.

Please refer to FIG. 1 and FIG. 2 . FIG. 1 is a schematic cross-sectional view of the plasma jet electrode device of the present invention, and FIG. 2 is a perspective view of a disc in the plasma jet electrode device of the present invention. The plasma jet electrode device of the preferred embodiment of the present invention has a positioning seat 10, a ceramic tube 20 is arranged in the positioning seat 10, a disc 30 is arranged in the ceramic tube 20, and several The slanted hole 31 that penetrates obliquely, its three-dimensional schematic diagram is shown in Figure 2, a high-voltage metal electrode 40 is arranged in the disk 30, and the high-voltage metal electrode 40 is a hollow cylinder, which is easier to dissipate heat. Form a dielectric discharge plasma area A; In addition, a top cover 60 is set on the positioning seat 10, a screw hole 61 is set in the top cover 60, a gas pipe 62 is set in the screw hole 61, and the top of the high-voltage metal electrode 40 is set A joint 421, the joint 421 is connected with an electric wire 42, the electric wire 42 passes through the gas pipe 62 and is connected to a high-voltage electric terminal, a gap is formed between the gas pipe 62 and the electric wire 42, so that the outside air and the plasma process gas can pass through the gas pipe 62 Enter the ceramic tube 20 for reaction.

The plasma process gas entering the ceramic tube 20 through the gas pipe 62 may be air (Air), argon (Ar), carbon dioxide (CO ₂ ), nitrogen (N 2 ), helium (He), oxygen (O ₂ ) or their mixed gases.

Also, a rotating seat 50 is arranged on the peripheral surface of the positioning seat 10, a chassis 70 is arranged at the bottom of the rotating seat 50, a grounding electrode 71 is arranged on the inner wall of the chassis 70, and a low-temperature unbalanced electric circuit is formed between the grounding electrode 71 and the high-voltage metal electrode 40. In the slurry area B, a nozzle head 72 is arranged at the bottom of the chassis 70 to spray low-temperature unbalanced plasma, wherein, in this embodiment, more than one inclined hole 73 can be arranged on the nozzle head 72, for example A plurality of oblique holes 73 distributed radially (refer to FIG. 1 ).

Above-mentioned disc 30 can be stainless steel material, and an internal thread is set in disc 30, and an external thread is set on the top peripheral surface of high-voltage metal electrode 40, and external thread can be screwed in internal thread, makes high-voltage metal electrode 40 solid. The knot is positioned in the disc 30 .

A ceramic tube 20 is arranged in the above-mentioned positioning seat 10 , which forms an inner ring groove 11 in the positioning seat 10 , so that the ceramic tube 20 can be placed in the positioning seat 10 and positioned on the inner ring groove 11 .

The above-mentioned ceramic tube 20 is provided with a disc 30 , which forms an inner ring groove 21 in the ceramic tube 20 , so that the disc 30 can be inserted into the ceramic tube 20 and positioned on the inner ring groove 21 .

The above-mentioned disc 30 is provided with a plurality of inclined holes 31 that penetrate obliquely, as shown in Figure 2, preferably, these plurality of inclined holes 31 are at an inclination angle of 45 degrees in the same direction, so that the The air flow can generate turbulent turbulent flow in the dielectric discharge plasma area A, so that the generated plasma can be fully mixed and atomized, but it should not be limited to this, as long as it is inclined in the same direction. It has the effect of varying degrees of turbulent flow that produces eddies and turbulent flows.

The top of the above-mentioned high-voltage metal electrode 40 is provided with a metal connector 41 and a joint 421, which is provided with a perforation in the high-voltage metal electrode 40, and a hierarchical groove 401 is provided in the perforation, and another perforation is also provided in the connector 41 , another hierarchical groove 411 is set in the perforation, the connector 41 is inserted in the hierarchical groove 401 of the high voltage metal electrode 40, and the connector 421 is inserted in the hierarchical groove 411 of the connector 41, the connector 41 and the connector 421 are both Conductive metal parts, but the electric wire 42 can be connected to the connector 421, the gas pipe 62 communicates with the outside world for the insulator, and the electric wire 42 passes through the gas pipe 62 and the end is connected to a power supply (not shown in the figure), so that the electric circuit can transmit the generated The AC high-frequency high-voltage power used by the plasma is on the high-voltage metal electrode 40, wherein the ceramic tube 20 is grounded, and the dielectric discharge plasma area A formed between the high-voltage metal electrode 40 and the ceramic tube 20 has a proportional size The chassis 70 is grounded, and the low-temperature unbalanced plasma region B formed between the high-voltage metal electrode 40 and the ground electrode 71 also has a proportional distance, wherein the dielectric discharge plasma region A The distance from the proportional dimension of the low-temperature non-equilibrium plasma region B is formed in different proportional dimensions according to the plasma process gas passed into it and the applied voltage. The ratio is 1 to 5, for example:

A voltage of 5kv (kilovolts) is applied, and the spacing size can be 1-5mm;

A voltage of 4kv (kilovolts) is applied, and the spacing size can be 0.8-4mm (millimeters);

A voltage of 3kv (kilovolts) is applied, and the spacing size can be 0.6-3mm (millimeters);

A voltage of 2kv (kilovolts) is applied, and the spacing size can be 0.4 to 2mm (millimeters);

When a voltage of 1kv (kilovolt) is applied, the spacing size can be 0.2-1mm (millimeter), and the relationship between other settable high voltages above kv and the spacing size can be deduced in the same way.

The top of the positioning seat 10 is provided with a top cover 60, which is provided with external threads on the top peripheral surface of the positioning seat 10, and internal threads are provided on the inner wall surface of the lower end of the top cover 60. The internal threads of the top cover 60 can be screwed on the positioning On the external thread at the top of the seat 10, wherein the material of the top cover 60 can be polytetrafluoroethylene (ie Teflon).

Preferably, in order to improve the plasma treatment area and uniformity of the plasma jet electrode device 1, a rotating seat 50 can be provided on the peripheral surface of the above-mentioned positioning seat 10 of the present invention, as shown in Figure 1, it is located on the positioning seat 10 An outer ring groove 12 is arranged on the peripheral surface, a bearing 13 is arranged at the outer ring groove 12, and an inner ring groove 51 is arranged on the inner wall of the rotating seat 50, and the inner ring groove 51 of the rotating seat 50 is sleeved on the bearing 13, and by the bearing The rotation of 13 can make the swivel seat 50 rotate on the surface of the positioning seat 10. A chassis 70 is arranged at the bottom of the swivel seat 50, and external threads are arranged on the peripheral surface of the bottom edge of the swivel seat 50, and the inner wall surface of the chassis 70 The internal thread is provided so that the external thread of the rotating base 50 can be screwed into the internal thread of the chassis 70 to be screwed and positioned.

If there is no rotating seat 50, the positioning seat 10 can also be directly provided with a chassis 70, and the positioning seat 10 and the chassis 70 can be integrally formed, or connected with each other by screwing.

A nozzle head 72 is provided at the bottom of the above-mentioned chassis 70, which forms a downwardly extending convex portion 701 at the bottom of the chassis 70, external threads are provided on the peripheral surface of the convex portion 701, and internal threads are provided on the inner wall surface of the nozzle head 72. The inner thread of the nozzle head 72 can be screwed into the outer thread of the peripheral surface of the convex part 701, wherein the plurality of inclined holes 73 provided on the nozzle head 72 are distributed in a diffuse or radial shape inclined outward.

Please refer to FIG. 3 , which is a schematic cross-sectional view of plasma operation in the plasma jet electrode device of the present invention. The plasma jet electrode device 1 of the present invention can pass the AC high-frequency high-voltage power provided by the power supply (not shown) to the high-voltage metal electrode 40 through the wire 42, the joint 421 and the connecting piece 41, and the low temperature and normal pressure The atmosphere and plasma process gas can enter the ceramic tube 20 through the gas pipe 62, and the plasma generated by the dielectric discharge plasma area A flows through the inclined hole 31 arranged on the disk 30, forming a turbulent state. The plasma is atomized by the flow of the atomized plasma, and the atomized plasma can generate low-temperature unbalanced plasma through the low-temperature unbalanced plasma area B, and through the rotation mechanism of the nozzle head 72 and the jet flow design of the inclined hole 73, the The low temperature and normal pressure unbalanced plasma is rotated and ejected. Therefore, the design of the present invention can increase the area and uniformity of the plasma treatment, making it more effective in plasma treatment.

Furthermore, the nozzle head 72 of the present invention can also be designed as a straight line, please refer to FIG. 4 , which is a schematic cross-sectional view of another plasma jet electrode device of the present invention. The low-temperature and atmospheric-pressure unbalanced plasma can form a linear plasma treatment area through the nozzle head 72 designed in a straight line, so that the application range of the plasma jet electrode device 1 of the present invention is wider. , can form a uniform planar plasma treatment area, and can improve the treatment effect.

In addition, please refer to FIG. 5 , which is a schematic cross-sectional view of another plasma jet electrode device of the present invention. The plasma jet electrode device 1 of the present invention further includes a magnetic body 80, such as a magnet, which is positioned around the nozzle head 72. Due to the setting of the magnetic body 80, a magnetic field can be provided to the nozzle head 72 to improve the flow rate through the nozzle head 72. The probability of electrons and molecules colliding with each other in the plasma increases the free state, which increases the concentration of the low-temperature and atmospheric-pressure non-equilibrium plasma, thereby improving the plasma treatment effect.

The plasma jet electrode device 1 of the present invention may further include a precursor flow controller (not shown in the figure) to provide and control the precursor to the low-temperature non-equilibrium plasma region B, wherein the precursor is organic , inorganic or metal-organic coating process gases (for example: tetraethoxysilane, oxygen, polyethylene, methane, acetylene, etc.) or etching process gases (for example: hydrogen, carbon tetrachloride, etc.), so that the plasma of the present invention The spout electrode device 1 can be applied to coating or etching processes.

According to the above idea, the present invention also provides a plasma jet electrode system 2, please refer to Fig. 6 and Fig. 7, Fig. 6 is a three-dimensional schematic diagram of the plasma jet electrode system of the present invention, and Fig. Schematic top view of the plasma jet electrode system in 6. The plasma jet flow electrode system 2 of the present invention includes at least one plasma jet flow electrode device 1, and these plasma jet flow electrode devices 1 are positioned with a bracket 90, and the plasma jet flow electrode device 1 can be designed according to actual design requirements. The jet flow electrode devices 1 are arranged linearly, as shown in Figure 7, and a plurality of plasma jet flow electrode devices 1 can also be arranged in a planar manner, as shown in Figure 8 and Figure 9, and Figure 8 is another electrode device of the present invention. The three-dimensional schematic view of the plasma jet electrode system, FIG. 9 is a top view schematic diagram of the plasma jet electrode system in FIG.

When the above-mentioned plasma jet electrode system 2 processes the workpiece (not shown in the figure) with plasma, the situation that the temperature of the workpiece will rise often occurs, so the plasma jet electrode system 2 of the present invention also provides a cooling For the device 91, please refer to FIG. 10 and FIG. 11. FIG. 10 is a three-dimensional schematic diagram of adding a cooling device to the plasma jet electrode system of the present invention, and FIG. 11 is a side view schematic diagram of the plasma jet electrode system in FIG. 10. The cooling device 91 is arranged on one side of the support 90, as shown in Figure 11, when the support 90 moves and the plasma jet electrode device 1 moves to process the workpiece, the cooling device 91 is an air-cooled cooling device, which can provide An air flow is blown down towards the workpiece, providing heat convection around the workpiece, thereby reducing the temperature of the workpiece itself.

In addition, the plasma jet electrode system 2 of the present invention further includes a guiding device 92, which is a roller, connected to the bottom of the bracket 90, and used to guide the bracket 90 to move along a predetermined direction, so as to keep the plasma The fixed distance between the jet flow electrode device 1 and the workpiece (not shown in the figure) not only provides the uniformity of the plasma treatment, but also maintains the stable operation of the bracket 90; in addition, the guiding device 92 can be connected by an adjustable connecting piece 920 is connected to the bottom of the support 90, and the height can be adjusted by the connecting piece 920, so that the guide device 92 can meet the requirements of the distance between different processing workpieces and the plasma jet electrode device 1, so that the plasma jet electrode system 2 It has more flexible application and meets the purpose of the specific application required by the user.

In summary, the plasma jet electrode device 1 and the plasma jet electrode system 2 of the present invention effectively improve the treatment area and uniformity of the low-temperature and atmospheric pressure unbalanced plasma, making the plasma jet electrode device The application range is wider, not only can be used for cleaning, but also can be used for etching, which improves the industrial application of the plasma jet electrode device and its system, and has great industrial value.

The above description is only a preferred embodiment of the present invention, and does not limit the present invention in any form. Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Anyone familiar with this field Those skilled in the art, without departing from the scope of the technical solution of the present invention, may use the technical content disclosed above to make some changes or modify them into equivalent embodiments with equivalent changes, but as long as they do not depart from the technical solution of the present invention, the Technical Essence Any simple modifications, equivalent changes and modifications made to the above embodiments still fall within the scope of the technical solution of the present invention.

Claims (17)

1. an electricity is starched the jet flow electrode assembly, it is characterized in that it has a positioning seat, one earthenware is set in this positioning seat, one disk is set in this earthenware, lay the inclined hole that at least one inclination runs through on this disk, one high-pressure metal electrode is set in this disk, form dielectric medium discharge electricity slurry zone between this high-pressure metal electrode and this earthenware, the bottom of this positioning seat is provided with a chassis, the inwall on this chassis is provided with a grounding electrode, form the electric slurry of low temperature unbalanced zone between this grounding electrode and this high-pressure metal electrode, the bottom on this chassis is provided with a nozzle head, in order to low temperature unbalanced electricity slurry is sprayed.

2. an electricity is starched the jet flow electrode assembly, it is characterized in that it has a positioning seat, one earthenware is set in this positioning seat, one disk is set in this earthenware, lay at least one open-work on this disk, one high-pressure metal electrode is set in this disk, form dielectric medium discharge electricity slurry zone between this high-pressure metal electrode and this earthenware, this positioning seat side face is provided with a rotating seat, make this positioning seat be rotated motion with respect to this rotating seat, the bottom of this rotating seat is provided with a chassis, the inwall on this chassis is provided with a grounding electrode, form the electric slurry of low temperature unbalanced zone between this grounding electrode and this high-pressure metal electrode, the bottom on this chassis is provided with a nozzle head, in order to low temperature unbalanced electricity slurry is sprayed.

3. electricity slurry jet flow electrode assembly according to claim 1 and 2, it is characterized in that formed dielectric medium discharge electricity slurry zone has a spacing between wherein said high-pressure metal electrode and this earthenware, wherein, feeding the voltage of this high-pressure metal electrode and the ratio range of this spacing is between 1 to 5.

4. electricity slurry jet flow electrode assembly according to claim 1 and 2, it is characterized in that formed low temperature unbalanced electricity slurry zone has a spacing between wherein said high-pressure metal electrode and this grounding electrode, feeding the voltage of this high-pressure metal electrode and the ratio range of this spacing is between 1 to 5.

5. electricity slurry jet flow electrode assembly according to claim 1 and 2, it is characterized in that being provided with on the wherein said positioning seat top cover, one screw is set in this top cover, one tracheae is set in this screw, the top of this high-pressure metal electrode is provided with a joint, continues an electric wire is set in this joint, and this electric wire is passed by this tracheae and continues to a high-tension electricity end, form the space between this tracheae and this electric wire, outside air and plasma manufacture gas can be entered in this earthenware by this tracheae react.

6. electricity slurry jet flow electrode assembly according to claim 1 and 2, it is characterized in that being provided with in the wherein said disk internal thread, and the top side face of this high-pressure metal electrode is provided with an external screw thread, the external screw thread of this high-pressure metal electrode is arranged in the internal thread of this disk, wherein lay the inclined hole that a plurality of inclinations run through on this disk, it is the angle of inclination that is equidirectional 45 degree.

7. electricity slurry jet flow electrode assembly according to claim 1 and 2, the side face that it is characterized in that wherein said positioning seat is provided with an outer groove, at this outer groove place one bearing is set, the inwall of this rotating seat is provided with an inner groove, the inner groove of this rotating seat is set on this bearing, makes this positioning seat be rotated motion with respect to this rotating seat.

8. electricity slurry jet flow electrode assembly according to claim 1 and 2 is characterized in that being provided with on the wherein said nozzle head at least one inclined hole, and this inclined hole distributes with diffusion type or radiation wire.

9. electricity slurry jet flow electrode assembly according to claim 1 and 2, the outlet that it is characterized in that wherein said flat nozzle head is an in-line.

10. electricity slurry jet flow electrode assembly according to claim 1 and 2 is characterized in that also further comprising a magnetic, be positioned at this nozzle head around, provide a magnetic field to this nozzle head.

11. electricity slurry jet flow electrode assembly according to claim 1 and 2 is characterized in that wherein said high-pressure metal electrode is to be a hollow circular cylinder.

12. electricity slurry jet flow electrode assembly according to claim 1 and 2, it is characterized in that this device further comprises a predecessor flow controller, be in order to provide and to control a predecessor to this low temperature unbalanced electricity slurry zone, to make this device can be applied to plated film or etch process.

13. an electricity slurry jet flow electrode system is characterized in that it comprises at least just like claim 1 or 2 described electricity slurry jet flow electrode assemblies, and a support, this support is in order to fix this electricity slurry jet flow electrode assembly.

14. electric slurry jet flow electrode system according to claim 13 is characterized in that wherein more comprising a plurality of electricity slurry jet flow electrode assemblies, these a plurality of electricity are starched jet flow electrode assemblies with linear or planar arrangement, and are arranged on this support.

15. electricity slurry jet flow electrode system according to claim 13, it is characterized in that more comprising a cooling device, be arranged at a side of this support, in order to cool off the handled workpiece of this electricity slurry jet flow electrode system, wherein this cooling device is to be a ventilation type cooling device.

16. electricity slurry jet flow electrode system according to claim 13, its feature is more comprising a guiding device, is connected in this support below, moves along a predetermined direction in order to guide this support, and wherein this guiding device is to be a roller.

17. electricity slurry jet flow electrode system according to claim 16 is characterized in that wherein more comprising a guiding device, is connected in this support below, moves along a predetermined direction in order to guide this support.

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