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CN101232029A - Liquid crystal display panel and its semiconductor array substrate - Google Patents

Liquid crystal display panel and its semiconductor array substrate Download PDF

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CN101232029A
CN101232029A CN 200810081604 CN200810081604A CN101232029A CN 101232029 A CN101232029 A CN 101232029A CN 200810081604 CN200810081604 CN 200810081604 CN 200810081604 A CN200810081604 A CN 200810081604A CN 101232029 A CN101232029 A CN 101232029A
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liquid crystal
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array substrate
crystal display
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CN101232029B (en
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张俪琼
阙嘉慧
张禄坤
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AUO Corp
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Abstract

本发明公开了一种液晶显示面板及其半导体阵列基板,该液晶显示面板包括一彩色滤光片基板、一液晶层以及一半导体阵列基板。液晶层设置于两基板之间,半导体阵列基板设置于彩色滤光片基板的一侧,并且包括一透明基材、一平坦层、多个像素电极及一不透光层。平坦层覆盖于透明基材上,像素电极以阵列排列方式设置于平坦层上,各两相邻的像素电极间隔一间隙。不透光层设置于平坦层中,并且位于每一间隙下方。不透光层两侧具有延伸部往每一间隙的两侧延伸至部分像素电极下方。不透光层的厚度至少为平坦层厚度的二分之一。

Figure 200810081604

The invention discloses a liquid crystal display panel and its semiconductor array substrate. The liquid crystal display panel includes a color filter substrate, a liquid crystal layer and a semiconductor array substrate. The liquid crystal layer is arranged between the two substrates, and the semiconductor array substrate is arranged on one side of the color filter substrate, and includes a transparent substrate, a flat layer, a plurality of pixel electrodes and an opaque layer. The flat layer is covered on the transparent base material, and the pixel electrodes are arranged on the flat layer in an array arrangement, with a gap between two adjacent pixel electrodes. The opaque layer is disposed in the flat layer and located below each gap. Both sides of the opaque layer have extensions extending to both sides of each gap to the part of the pixel electrode below. The thickness of the opaque layer is at least 1/2 of the thickness of the flat layer.

Figure 200810081604

Description

液晶显示面板及其半导体阵列基板 Liquid crystal display panel and its semiconductor array substrate

技术领域technical field

本发明涉及一种液晶显示面板及其半导体阵列基板(semiconductorarray substrate),且尤其涉及一种超高开口率的液晶显示面板及其半导体阵列基板。The invention relates to a liquid crystal display panel and a semiconductor array substrate thereof, and in particular to an ultra-high aperture ratio liquid crystal display panel and a semiconductor array substrate thereof.

背景技术Background technique

近年来随着薄型化显示技术的进步,各种薄型化显示装置挟其体积小、重量轻、低辐射及低耗电等特点,成为消费者选购显示器或电视时的首选。在各种薄型化显示装置中,由于液晶显示装置的价格相对低廉,且市面上可见的产品线齐全,使得液晶显示装置成为最受市场瞩目的薄型化显示装置之一。然而,随着液晶显示装置在市场上的接受度大增,消费者对于液晶显示装置的画面质量也有日益严苛的要求,例如显示亮度及对比度等。In recent years, with the advancement of thinner display technology, various thinner display devices have become the first choice for consumers when purchasing monitors or TVs due to their small size, light weight, low radiation, and low power consumption. Among various thinner display devices, liquid crystal display devices have become one of the most attractive thinner display devices due to their relatively low price and complete product lines on the market. However, with the increasing acceptance of liquid crystal display devices in the market, consumers have increasingly stringent requirements on the picture quality of liquid crystal display devices, such as display brightness and contrast ratio.

目前业界发展出一种超高开口率(Super-High Aperture,SHA)的液晶显示面板,通过设置一平坦层于薄膜晶体管基板的结构中,可增加像素电极的面积,以提高开口率,进而提升显示对比度及亮度。请参照图1,其绘示现有技术中应用超高开口率技术的液晶显示面板的示意图。液晶显示面板100包括彩色滤光片基板110、液晶层130以及薄膜晶体管基板150。SHA技术中,是将一高透性特殊树脂的平坦层159设置于像素电极161与薄膜晶体管基板150的金属配线(例如数据线153)的间。平坦层159具有平坦的表面,可降低光源扭曲散射或折射的现象。另外,平坦层159具有一厚度,用以增加像素电极161与数据线(data line)153的距离,降低数据线153与像素电极161的间电容效应的影响,以及像素电极161与金属配线间发生短路的风险。如此可增加对应每一像素的像素电极161的面积,从而提升开口率,增加显示亮度,进一步提升显示质量。另外,液晶层130对应于像素电极161的边缘处具有多个边缘电场区(edge electric filed region)B。At present, the industry has developed a super-high aperture ratio (Super-High Aperture, SHA) liquid crystal display panel. By setting a flat layer in the structure of the thin film transistor substrate, the area of the pixel electrode can be increased to increase the aperture ratio, thereby improving Display contrast and brightness. Please refer to FIG. 1 , which shows a schematic diagram of a liquid crystal display panel using ultra-high aperture ratio technology in the prior art. The liquid crystal display panel 100 includes a color filter substrate 110 , a liquid crystal layer 130 and a thin film transistor substrate 150 . In the SHA technology, a planar layer 159 of a high-permeability special resin is disposed between the pixel electrode 161 and the metal wiring (such as the data line 153 ) of the TFT substrate 150 . The flat layer 159 has a flat surface, which can reduce distorted scattering or refraction of the light source. In addition, the flat layer 159 has a thickness to increase the distance between the pixel electrode 161 and the data line (data line) 153, reduce the influence of the capacitive effect between the data line 153 and the pixel electrode 161, and the distance between the pixel electrode 161 and the metal wiring. Risk of short circuit. In this way, the area of the pixel electrode 161 corresponding to each pixel can be increased, thereby increasing the aperture ratio, increasing the display brightness, and further improving the display quality. In addition, the edge of the liquid crystal layer 130 corresponding to the pixel electrode 161 has a plurality of edge electric field regions (edge electric fielded regions) B.

然而,在液晶显示面板100的制作过程中,当进行彩色滤光片基板110与薄膜晶体管基板150的对组时,容易发生对位偏移的现象。当彩色滤光片基板110与薄膜晶体管基板150发生偏移时,彩色滤光片基板110上的黑色矩阵117便无法正确地对应位于相邻像素电极161间的间隙161a上方。如此一来,沿着特定角度穿透通过液晶层130的边缘电场区B的背光光线D,便无法受到黑色矩阵117的阻挡。因而会使液晶显示面板100发生斜向漏光的现象,并导致显示质量的下降。However, during the manufacturing process of the liquid crystal display panel 100 , when the color filter substrate 110 and the thin film transistor substrate 150 are assembled, the phenomenon of misalignment is likely to occur. When the color filter substrate 110 is offset from the TFT substrate 150 , the black matrix 117 on the color filter substrate 110 cannot be correctly located above the gap 161 a between adjacent pixel electrodes 161 . In this way, the backlight light D passing through the fringe electric field region B of the liquid crystal layer 130 at a specific angle cannot be blocked by the black matrix 117 . As a result, oblique light leakage occurs in the liquid crystal display panel 100 , resulting in a decrease in display quality.

为了解决对组偏移导致斜向漏光的现象,目前业界常见的解决办法是直接增加位于彩色滤光片基板110的黑色矩阵117的宽度,以阻挡沿特定角度穿透通过边缘电场区B的背光光线D。然而增加黑色矩阵117的宽度相对降低了液晶显示面板100的开口率。In order to solve the phenomenon of oblique light leakage caused by pair shift, the current common solution in the industry is to directly increase the width of the black matrix 117 located on the color filter substrate 110, so as to block the backlight penetrating through the fringe electric field region B at a specific angle Ray D. However, increasing the width of the black matrix 117 relatively reduces the aperture ratio of the liquid crystal display panel 100 .

因此,如何在增加开口率的同时,避免斜向漏光的现象发生,实为目前亟待解决的问题之一。Therefore, how to avoid oblique light leakage while increasing the aperture ratio is one of the problems to be solved urgently.

发明内容Contents of the invention

本发明所要解决的技术问题在于提供一种半导体阵列基板及液晶显示面板,将不透光层设置于位在像素电极与透明基材的间的平坦层中,并且使不透光层部分地重迭于像素电极下方,如此可避免应用半导体阵列基板的液晶显示面板产生斜向漏光的现象,进一步提升显示对比度,维持显示质量。The technical problem to be solved by the present invention is to provide a semiconductor array substrate and a liquid crystal display panel, the opaque layer is arranged in the flat layer between the pixel electrode and the transparent substrate, and the opaque layer is partially It is stacked under the pixel electrodes, so as to avoid oblique light leakage in liquid crystal display panels using semiconductor array substrates, further improve display contrast, and maintain display quality.

为实现上述目的,根据本发明,提出一种半导体阵列基板,其包括一透明基材、一平坦层、多个像素电极以及一不透光层。平坦层覆盖于透明基材上,像素电极以阵列排列的方式设置于平坦层上,且各两相邻的像素电极间隔一间隙。不透光层设置于平坦层中,不透光层实质上位于每一间隙的下方。不透光层两侧具有一延伸部,并往每一间隙的两侧延伸至部分像素电极的下方处。不透光层的厚度实质上至少为平坦层厚度的二分之一。To achieve the above object, according to the present invention, a semiconductor array substrate is provided, which includes a transparent substrate, a flat layer, a plurality of pixel electrodes and an opaque layer. The flat layer is covered on the transparent base material, and the pixel electrodes are arranged on the flat layer in an array, and two adjacent pixel electrodes are separated by a gap. The opaque layer is disposed in the flat layer, and the opaque layer is substantially located below each gap. Both sides of the opaque layer have an extension part, and extend to both sides of each gap to the lower part of the pixel electrode. The thickness of the opaque layer is substantially at least half of the thickness of the planar layer.

而且,为实现上述目的,根据本发明,另提出一种液晶显示装置,其包括一彩色滤光片基板、一液晶层以及一半导体阵列基板。液晶层设置于半导体阵列基板及彩色滤光片基板之间。半导体阵列基板设置于彩色滤光片基板之一侧,且包括一透明基材、一平坦层、多个像素电极及一不透光层。平坦层覆盖于透明基材上,像素电极是以阵列排列方式设置于平坦层上,各两相邻的像素电极间隔一间隙。液晶层具有多个边缘电场区,此些边缘电场区邻近像素电极的边缘处。不透光层设置于平坦层中,且实质上位于每一间隙下方,用以阻挡一背光光线沿一角度穿透通过此些边缘电场区。不透光层的两侧具有一延伸部,其往每一间隙的两侧延伸至部分像素电极的下方,并且凸出于每一边缘电场区对应各像素电极的下方处。不透光层的厚度实质上至少为平坦层厚度的二分之一。Moreover, in order to achieve the above object, according to the present invention, another liquid crystal display device is provided, which includes a color filter substrate, a liquid crystal layer, and a semiconductor array substrate. The liquid crystal layer is arranged between the semiconductor array substrate and the color filter substrate. The semiconductor array substrate is arranged on one side of the color filter substrate, and includes a transparent substrate, a flat layer, a plurality of pixel electrodes and an opaque layer. The flat layer is covered on the transparent base material, and the pixel electrodes are arranged on the flat layer in an array, with a gap between two adjacent pixel electrodes. The liquid crystal layer has a plurality of fringe electric field regions, and these fringe electric field regions are adjacent to edges of the pixel electrodes. The opaque layer is disposed in the flat layer and is substantially located below each gap, so as to block a backlight light from penetrating through the fringe electric field regions along an angle. Two sides of the opaque layer have an extension, which extends to the sides of each gap to the part of the pixel electrodes below, and protrudes from each fringe electric field region corresponding to each pixel electrode below. The thickness of the opaque layer is substantially at least half of the thickness of the planar layer.

本发明不透光层的宽度实质上小于现有技术中超高开口率(SHA)的液晶显示面板中不透光层的宽度,故可提高开口率,提升显示亮度。另外,部分的沿着一角度穿透通过液晶显示面板的背光光线,被不透光层阻挡,无法穿透通过边缘电场区。如此可避免斜向透光产生,提高液晶显示面板的对比度。整体而言,依照本发明的半导体阵列基板及液晶显示面板,可提高光学效率以及显示质量。The width of the opaque layer of the present invention is substantially smaller than the width of the opaque layer in the super high aperture ratio (SHA) liquid crystal display panel in the prior art, so the aperture ratio can be increased and the display brightness can be improved. In addition, part of the backlight light penetrating through the liquid crystal display panel along an angle is blocked by the opaque layer and cannot pass through the fringe electric field region. In this way, oblique light transmission can be avoided, and the contrast of the liquid crystal display panel can be improved. Overall, according to the semiconductor array substrate and the liquid crystal display panel of the present invention, the optical efficiency and display quality can be improved.

以下结合附图和具体实施例对本发明进行详细描述,但不作为对本发明的限定。The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments, but not as a limitation of the present invention.

附图说明Description of drawings

图1绘示现有技术中应用超高开口率技术的液晶显示面板的示意图;FIG. 1 shows a schematic diagram of a liquid crystal display panel using ultra-high aperture ratio technology in the prior art;

图2绘示依照本发明实施例的液晶显示面板的侧视剖面图;2 shows a side sectional view of a liquid crystal display panel according to an embodiment of the present invention;

图3绘示图2中对应一条数据线处的液晶显示面板的示意图;FIG. 3 is a schematic diagram of a liquid crystal display panel corresponding to a data line in FIG. 2;

图4及图5分别绘示具有不同宽度及厚度的不透光层的液晶显示面板的示意图;FIG. 4 and FIG. 5 respectively depict schematic diagrams of liquid crystal display panels with opaque layers of different widths and thicknesses;

图6A绘示图2中数据线、扫描线、半导体开关件及像素电极的俯视图;以及FIG. 6A shows a top view of data lines, scan lines, semiconductor switching elements and pixel electrodes in FIG. 2; and

图6B绘示图2中像素电极及不透光层的俯视图。FIG. 6B is a top view of the pixel electrode and the opaque layer in FIG. 2 .

其中,附图标记:Among them, reference signs:

100、200:液晶显示面板100, 200: LCD panel

110、210:彩色滤光片基板110, 210: color filter substrate

117:黑色矩阵117: black matrix

130、230:液晶层130, 230: liquid crystal layer

150、250、250’、250”:薄膜晶体管基板150, 250, 250’, 250”: thin film transistor substrate

153、253:数据线153, 253: data line

159、259:平坦层159, 259: flat layer

161、261:像素电极161, 261: pixel electrode

161a、261a:间隙161a, 261a: Clearance

251:透明基材251: transparent substrate

252:扫描线252: scan line

254:半导体开关件254: Semiconductor switch

255:保护层255: protective layer

257、257’、257”:不透光层257, 257’, 257”: opaque layer

257a:延伸部257a: Extension

B、E:边缘电场区B, E: fringe electric field region

D、L:背光光线D, L: backlight light

t1、t1’、t1”:不透光层的厚度t1, t1’, t1”: the thickness of the opaque layer

t2:平坦层的厚度t2: Thickness of the flat layer

w1、w1’、w1”:不透光层的宽度w1, w1’, w1”: the width of the opaque layer

w2:数据线的宽度w2: the width of the data line

θ:角度θ: angle

具体实施方式Detailed ways

依照本发明的半导体阵列基板及液晶显示面板的实施例,采用将平坦层设置于透明基材与像素电极之间的方式,使得像素电极与数据线路相隔一距离,且像素电极部分地重迭于数据线上方(上述仍为现有技术中,仅为说明之用)。本发明的实施例是将不透光层设置于平坦层中,并且使其厚度至少为平坦层厚度的二分之一。由于不透光层的两侧具有延伸部,其朝向相邻像素电极间间隙的两侧延伸至部分的像素电极下方,并且凸出于液晶层的边缘电场对应像素电极的下方处。因此,不透光层具有足够的宽度及厚度,以阻挡背光光线沿一角度穿透通过液晶层的边缘电场,可避免液晶显示面板斜向漏光的现象。以下提出依照本发明的实施例的详细说明,然实施例仅用以作为范例说明,并不会限缩本发明欲保护的范围。再者,实施例中的附图也省略不必要的元件,以清楚显示本发明的技术特点。According to the embodiments of the semiconductor array substrate and the liquid crystal display panel of the present invention, a flat layer is arranged between the transparent substrate and the pixel electrode, so that the pixel electrode and the data line are separated by a distance, and the pixel electrode partially overlaps the pixel electrode. Above the data line (the above is still in the prior art and is only for illustration). In an embodiment of the present invention, the opaque layer is disposed in the flat layer, and its thickness is at least 1/2 of the thickness of the flat layer. Since the two sides of the opaque layer have extensions, they extend toward the two sides of the gap between adjacent pixel electrodes to the part of the pixel electrodes below, and protrude out of the fringe electric field of the liquid crystal layer below the corresponding pixel electrodes. Therefore, the opaque layer has a sufficient width and thickness to prevent the backlight light from penetrating through the fringe electric field of the liquid crystal layer at an angle, so as to avoid oblique light leakage of the liquid crystal display panel. The following provides detailed descriptions of the embodiments according to the present invention, but the embodiments are only used as examples for illustration and will not limit the scope of protection of the present invention. Furthermore, the drawings in the embodiments also omit unnecessary components to clearly show the technical characteristics of the present invention.

请参照图2,其绘示依照本发明实施例的液晶显示面板的侧视剖面图。液晶显示面板200包括一彩色滤光片基板210、一液晶层230以及一半导体阵列基板250。液晶层230设置于半导体阵列基板210及彩色滤光片基板250之间。半导体阵列基板250设置于彩色滤光片基板210的一侧,并且包括一透明基材251、一平坦层259、多个像素电极261及一不透光层257。平坦层259覆盖于该透明基材251上。像素电极261以阵列排列方式设置于平坦层259上,且每两相邻的像素电极261之间间隔一间隙261a。液晶层230具有多个边缘电场区E,此些边缘电场区E对应于邻近像素电极261的边缘处。不透光层257设置于平坦层259中,且其厚度实质上至少为平坦层259厚度的二分之一。不透光层257实质上对应位于每一间隙261a下方,且不透光层257的两侧分别具有一延伸部257a,往每一间隙261a的两侧延伸至部分像素电极261的下方,且凸出于每一边缘电场区E对应各像素电极261的下方处。Please refer to FIG. 2 , which shows a side cross-sectional view of a liquid crystal display panel according to an embodiment of the present invention. The liquid crystal display panel 200 includes a color filter substrate 210 , a liquid crystal layer 230 and a semiconductor array substrate 250 . The liquid crystal layer 230 is disposed between the semiconductor array substrate 210 and the color filter substrate 250 . The semiconductor array substrate 250 is disposed on one side of the color filter substrate 210 and includes a transparent substrate 251 , a flat layer 259 , a plurality of pixel electrodes 261 and an opaque layer 257 . The flat layer 259 covers the transparent substrate 251 . The pixel electrodes 261 are arranged in an array on the flat layer 259 , and there is a gap 261 a between every two adjacent pixel electrodes 261 . The liquid crystal layer 230 has a plurality of fringe electric field regions E, and these fringe electric field regions E correspond to edges adjacent to the pixel electrodes 261 . The opaque layer 257 is disposed in the flat layer 259 , and its thickness is substantially at least half of the thickness of the flat layer 259 . The opaque layer 257 is substantially correspondingly located below each gap 261a, and the two sides of the opaque layer 257 respectively have an extension portion 257a, extending to the sides of each gap 261a to the part of the pixel electrode 261 below, and protruding Each fringe electric field region E corresponds to the position below each pixel electrode 261 .

更进一步来说,本实施例的半导体阵列基板250更包括多条数据线253,此些数据线253以相互平行的方式设置于透明基板251上。请参照图3,其绘示图2中对应一条数据线处的液晶显示面板的示意图。不透光层257覆盖于对应的数据线253上,且,各条数据线253的宽度w2至少实质上小于或是相等于不透光层257的宽度w1。本实施例中,不透光层257的厚度t1实质上为平坦层259厚度t2的二分之一,且不透光层257宽度w1大于数据线253的宽度w2。不透光层257用以阻挡一背光光线L沿一角度θ穿透通过边缘电场区E,使得沿着角度θ穿透通过液晶显示面板200的背光光线L不会落入边缘电场区E的范围内。因此,沿着角度θ通过液晶显示面板200的背光光线L不会受到边缘电场区E中非规则排列的液晶分子偏折,避免了液晶显示面板200于显示画面时发生斜向漏光的现象,可提高显示对比度,进一步提升显示质量。Furthermore, the semiconductor array substrate 250 of this embodiment further includes a plurality of data lines 253 , and these data lines 253 are arranged on the transparent substrate 251 in a manner parallel to each other. Please refer to FIG. 3 , which is a schematic diagram of a liquid crystal display panel corresponding to a data line in FIG. 2 . The opaque layer 257 covers the corresponding data lines 253 , and the width w2 of each data line 253 is at least substantially smaller than or equal to the width w1 of the opaque layer 257 . In this embodiment, the thickness t1 of the opaque layer 257 is substantially half of the thickness t2 of the planar layer 259 , and the width w1 of the opaque layer 257 is larger than the width w2 of the data line 253 . The opaque layer 257 is used to block a backlight light L from penetrating through the fringe electric field region E along an angle θ, so that the backlight light L penetrating through the liquid crystal display panel 200 along the angle θ will not fall into the range of the fringe electric field region E Inside. Therefore, the backlight light L passing through the liquid crystal display panel 200 along the angle θ will not be deflected by the irregularly arranged liquid crystal molecules in the fringe electric field region E, which avoids oblique light leakage from the liquid crystal display panel 200 when displaying images, and can Increase display contrast to further improve display quality.

另外,不透光层257的配置方式不限制于图3所示者。本实施例中还可利用改变不透光层257的厚度t1,来改变不透光层257所需的宽度,相应地改变不透光层257与像素电极261重迭的面积,进一步改变液晶显示面板200的开口率。请参照图4及图5,其分别绘示具有不同宽度及厚度的不透光层的液晶显示面板的示意图。图4所绘示的液晶显示面板200中,不透光层257’的厚度t1’大于平坦层259厚度t2的二分之一,且不透光层257’的宽度w1’大于数据线的宽度253。也即图4中不透光层257’的厚度t1’,大于图3中不透光层257的厚度t1。由于不透光层257’需具有足够的宽度w1’,以阻挡沿角度θ穿透通过边缘电场区E的背光光线L,因此不透光层257’可具有一小于不透光层257的宽度w1’,足以阻挡沿角度θ穿透通过边缘电场区E的背光光线L。再者,图5的不透光层257”的厚度t1”实质上相等于平坦层259的厚度t2,且不透光层257”的宽度w1”实质上相等于数据线253的宽度w2。也即图5中不透光层257”的厚度t1”,大于图4中不透光层257’的厚度t1’;图5中不透光层257”的宽度w1”,大于图4中不透光层257’的宽度w1’。如此可阻挡沿角度θ穿透通过边缘电场区E的背光光线L,并且同时可进一步提升液晶显示面板200的开口率。In addition, the arrangement of the opaque layer 257 is not limited to that shown in FIG. 3 . In this embodiment, changing the thickness t1 of the opaque layer 257 can also be used to change the required width of the opaque layer 257, correspondingly changing the overlapping area of the opaque layer 257 and the pixel electrode 261, and further changing the liquid crystal display. The aperture ratio of the panel 200. Please refer to FIG. 4 and FIG. 5 , which respectively illustrate schematic diagrams of liquid crystal display panels with opaque layers of different widths and thicknesses. In the liquid crystal display panel 200 shown in FIG. 4, the thickness t1' of the opaque layer 257' is greater than half of the thickness t2 of the flat layer 259, and the width w1' of the opaque layer 257' is greater than the width of the data lines. 253. That is, the thickness t1' of the opaque layer 257' in FIG. 4 is greater than the thickness t1 of the opaque layer 257 in FIG. 3 . Since the opaque layer 257' needs to have a sufficient width w1' to block the backlight light L passing through the fringe electric field region E along the angle θ, the opaque layer 257' may have a width smaller than that of the opaque layer 257. w1' is sufficient to block the backlight light L passing through the fringe electric field region E along the angle θ. Furthermore, the thickness t1" of the opaque layer 257" in FIG. That is, the thickness t1" of the opaque layer 257" in Fig. 5 is greater than the thickness t1' of the opaque layer 257' in Fig. 4; the width w1" of the opaque layer 257" in Fig. 5 is greater than that in Fig. The width w1' of the transparent layer 257'. In this way, the backlight light L penetrating through the fringe electric field region E along the angle θ can be blocked, and at the same time, the aperture ratio of the liquid crystal display panel 200 can be further increased.

实际应用上,当角度θ接近约90度角或者接近大约180度角时,可视为沿着液晶层230中液晶分子轴向通过液晶层230(包含前述的多个边缘电场区E)的非斜向漏光的背光光线L。因此,本实施例中不透光层257较佳地是用以阻挡沿着大约45度角穿透通过边缘电场区E的背光光线L。以下以数据线253的宽度w2为12μm为例,将平坦层259厚度t2对不透光层257厚度t1的比值,与不透光层257宽度w1的实际数据做成表一,以进行说明。In practical applications, when the angle θ is close to about 90 degrees or close to about 180 degrees, it can be regarded as a non-polar phase that passes through the liquid crystal layer 230 (including the aforementioned multiple fringe electric field regions E) along the axial direction of the liquid crystal molecules in the liquid crystal layer 230 . The backlight light L of oblique light leakage. Therefore, the opaque layer 257 in this embodiment is preferably used to block the backlight light L penetrating through the fringe electric field region E along an angle of approximately 45 degrees. Taking the width w2 of the data line 253 as 12 μm as an example, the ratio of the thickness t2 of the flat layer 259 to the thickness t1 of the opaque layer 257 and the actual data of the width w1 of the opaque layer 257 are shown in Table 1 for illustration.

  平坦层厚度对不透光层厚度的比值The ratio of the thickness of the flat layer to the thickness of the opaque layer   不透光层宽度(μm)Opaque layer width (μm)   0.50.5   1515   0.60.6   14.414.4   0.70.7   13.813.8   0.80.8   13.213.2   0.90.9   12.612.6   1.01.0   1212

表一Table I

由表一可知,当平坦层259厚度t2对于不透光层257厚度t1的比值增加时,也即不透光层257的厚度t1增加时,不透光层257的宽度w1逐渐缩小。当不透光层257于透明基材251上的宽度w1减少时,相对增加了液晶显示面板200的开口率。另外,根据实际测量结果,在各条数据线宽度均为约12μm的条件下,且不透光层设置于彩色滤光片基板上的超高开口率(Super-HighAperture,SHA)液晶显示面板,其不透光层的宽度实际上大约为16.5μm。而本实施例的液晶显示面板200中,具有厚度t1至少为平坦层259厚度t2的一半的不透光层257,其宽度w1至多约为15μm。相较于现有技术中的不透光层宽度,本实施例的不透光层257可减少覆盖于透明基材251上的面积,相对提升开口率,进一步改善液晶显示面板20的光学效率。It can be seen from Table 1 that when the ratio of the thickness t2 of the flat layer 259 to the thickness t1 of the opaque layer 257 increases, that is, when the thickness t1 of the opaque layer 257 increases, the width w1 of the opaque layer 257 gradually decreases. When the width w1 of the opaque layer 257 on the transparent substrate 251 is reduced, the aperture ratio of the liquid crystal display panel 200 is relatively increased. In addition, according to the actual measurement results, under the condition that the width of each data line is about 12 μm, and the opaque layer is arranged on the color filter substrate, the super-high aperture ratio (Super-High Aperture, SHA) liquid crystal display panel, The width of its opaque layer is actually about 16.5 μm. In the liquid crystal display panel 200 of this embodiment, the opaque layer 257 having a thickness t1 at least half of the thickness t2 of the flat layer 259 has a width w1 of at most about 15 μm. Compared with the width of the opaque layer in the prior art, the opaque layer 257 of this embodiment can reduce the area covered on the transparent substrate 251 , relatively increase the aperture ratio, and further improve the optical efficiency of the liquid crystal display panel 20 .

另外一方面,本实施例的液晶显示面板200更包括多个半导体开关件及多条扫描线(scan line)。请参照图6A及图6B,图6A绘示图2中数据线、扫描线、半导体开关件及像素电极的俯视图;图6B绘示图2中像素电极及不透光层的俯视图。像素电极261以阵列排列方式设置于平坦层(未显示于图6A及图6B中)上,此些半导体开关件254也以阵列排列方式设置于透明基材251上,每一半导体开关件254连接于对应的数据线253、对应的扫描线252及对应的像素电极261。此些半导体开关件254例如是多个薄膜晶体管(Thin-FilmTransistor,TFT),此半导体阵列基板例如是薄膜晶体管基板(TFTsubstrate)。此些扫描线252以相互平行的方式设置于透明基材251与平坦层之间。不透光层257实质上更位于此些扫描线252上方,并且更覆盖于此些半导体开关件254。On the other hand, the liquid crystal display panel 200 of this embodiment further includes a plurality of semiconductor switching elements and a plurality of scan lines. Please refer to FIG. 6A and FIG. 6B. FIG. 6A shows a top view of the data lines, scan lines, semiconductor switching elements and pixel electrodes in FIG. 2; FIG. 6B shows a top view of the pixel electrodes and the opaque layer in FIG. The pixel electrodes 261 are arranged in an array on the flat layer (not shown in FIG. 6A and FIG. 6B ), and these semiconductor switching elements 254 are also arranged in an array on the transparent substrate 251. Each semiconductor switching element 254 is connected to In the corresponding data line 253 , the corresponding scan line 252 and the corresponding pixel electrode 261 . The semiconductor switching elements 254 are, for example, a plurality of thin-film transistors (Thin-Film Transistor, TFT), and the semiconductor array substrate is, for example, a thin-film transistor substrate (TFT substrate). The scanning lines 252 are arranged between the transparent substrate 251 and the flat layer in parallel to each other. The opaque layer 257 is substantially located above the scan lines 252 and covers the semiconductor switch elements 254 .

另外,本实施例的液晶显示面板200还可选择性地包括一保护层(passivation layer)255。如图2所示,保护层255设置于平坦层259与透明基材251之间,并且至少覆盖于数据线253上,可阻挡液晶显示面板200中离子的侵蚀、提升绝缘性并且减缓电场干扰。In addition, the liquid crystal display panel 200 of this embodiment may optionally include a passivation layer 255 . As shown in FIG. 2 , the protection layer 255 is disposed between the planar layer 259 and the transparent substrate 251 and covers at least the data lines 253 , which can block the erosion of ions in the liquid crystal display panel 200 , improve insulation and slow down electric field interference.

依照本发明实施例的半导体阵列基板的制造方法,除了利用习用的光掩模制作过程于透明基材251上形成扫描线252及数据线253,进而于完成半导体开关件254之后,再利用例如是旋转涂布(spin coat)的方式涂布不透光材料,使其完整覆盖于透明基材251及半导体开关件254。再来,利用曝光显影的方式将对应于数据线253及半导体开关件254外的处,以及选择性地对应于扫描线252外之处的不透光材料移除,以形成图案化后的不透光层257。接着,形成具有平坦上表面的平坦层259,且使平坦层259至少完全覆盖不透光层257。而后,将像素电极261形成于平坦层259上。如此完成如图3或图4中所示的半导体阵列基板250或250’。此外,此处所描述的半导体阵列基板250或250’的制作过程中,也可选择性地在涂布不透光材料之前,先利用溅镀或其它习用的制作过程步骤形成保护层255。According to the manufacturing method of the semiconductor array substrate of the embodiment of the present invention, in addition to using the conventional photomask manufacturing process to form the scanning line 252 and the data line 253 on the transparent substrate 251, and then after completing the semiconductor switching element 254, reuse, for example, Spin coating is used to coat the opaque material so that it completely covers the transparent substrate 251 and the semiconductor switch 254 . Next, the opaque material corresponding to the positions outside the data lines 253 and the semiconductor switching elements 254, and selectively corresponding to the positions outside the scanning lines 252, is removed by exposure and development, so as to form a patterned opaque material. Optical layer 257. Next, a flat layer 259 with a flat upper surface is formed, and the flat layer 259 at least completely covers the light-proof layer 257 . Then, the pixel electrode 261 is formed on the flat layer 259 . This completes the semiconductor array substrate 250 or 250' as shown in FIG. 3 or FIG. 4 . In addition, in the manufacturing process of the semiconductor array substrate 250 or 250' described here, the protective layer 255 can also be optionally formed by sputtering or other conventional manufacturing process steps before coating the opaque material.

另外,当形成的不透光层257”的厚度t1”实质上等同于平坦层259的厚度t2时,如图5所示,半导体阵列基板250”可例如依照下述方式制作。首先,在利用习用的光掩模制作过程于透明基材251上形成扫描线252及数据线253,进而于完成半导体开关件254之后,利用旋转涂布的方式涂布平坦层259,使其全面覆盖于透明基材251及半导体开关件254上。接着,利用曝光显影的方式将欲制作不透光层257处(例如对应于数据线253及半导体开关件254之处)的平坦层259移除。再来,利用旋转涂布的方式将不透光材料填入平坦层259被移除之处。接着,利用曝光显影以及抛光(polishing)等步骤,将不透光材料与平坦层259进行表面处理,使其表面形成平坦的表面。与平坦层259位于相同水平面的不透光材料为不透光层257”,如图5所示。而后,将像素电极261形成于平坦层259及不透光层257”上,如此完成如图5中所示的半导体阵列基板250’。此外,此处所描述的制作过程中,可选择性地在涂布平坦层259之前,先利用溅镀或其它习用的制作过程步骤形成保护层255。In addition, when the thickness t1" of the formed opaque layer 257" is substantially equal to the thickness t2 of the planar layer 259, as shown in FIG. The conventional photomask manufacturing process forms the scanning line 252 and the data line 253 on the transparent substrate 251, and then after the semiconductor switching device 254 is completed, a flat layer 259 is coated by spin coating to completely cover the transparent substrate. Material 251 and semiconductor switch element 254. Then, utilize the mode of exposure and development to remove the flat layer 259 at the place where the opaque layer 257 is to be made (such as the place corresponding to the data line 253 and the semiconductor switch element 254). The method of spin coating fills the opaque material into the place where the planar layer 259 is removed. Then, the opaque material and the planar layer 259 are surface treated by exposure, development and polishing to make the surface Form a flat surface. The opaque material on the same level as the flat layer 259 is the opaque layer 257", as shown in FIG. 5 . Then, the pixel electrode 261 is formed on the planar layer 259 and the opaque layer 257", thus completing the semiconductor array substrate 250' as shown in FIG. Before coating the planarization layer 259, the protective layer 255 is formed by sputtering or other conventional fabrication process steps.

上述依照本发明实施例的半导体阵列基板及液晶显示面板,应用一平坦层使像素电极与数据线相隔一距离,且像素电极部分地重迭于数据线上方。在平坦层中包括有一不透光层,不透光层的宽度至少等同于对应的数据线的宽度,不透光层的厚度实质上至少为平坦层厚度的二分之一,至多为等同于平坦层的厚度。本发明实施例的不透光层的宽度实质上小于现有技术中超高开口率(SHA)的液晶显示面板中不透光层的宽度,故可提高开口率,提升显示亮度。另外,部分的沿着一角度穿透通过液晶显示面板的背光光线,被不透光层阻挡,无法穿透通过边缘电场区。如此可避免斜向透光产生,提高液晶显示面板的对比度。整体而言,依照本发明实施例的半导体阵列基板及液晶显示面板,可提高光学效率以及显示质量。In the above-mentioned semiconductor array substrate and liquid crystal display panel according to the embodiments of the present invention, a flat layer is used to separate the pixel electrodes from the data lines by a certain distance, and the pixel electrodes partially overlap the data lines. The flat layer includes an opaque layer, the width of the opaque layer is at least equal to the width of the corresponding data line, and the thickness of the opaque layer is substantially at least half of the thickness of the flat layer, at most equal to The thickness of the flat layer. The width of the opaque layer in the embodiment of the present invention is substantially smaller than the width of the opaque layer in the prior art super high aperture ratio (SHA) liquid crystal display panel, so the aperture ratio can be increased and the display brightness can be improved. In addition, part of the backlight light penetrating through the liquid crystal display panel along an angle is blocked by the opaque layer and cannot pass through the fringe electric field region. In this way, oblique light transmission can be avoided, and the contrast of the liquid crystal display panel can be improved. Overall, the semiconductor array substrate and the liquid crystal display panel according to the embodiments of the present invention can improve optical efficiency and display quality.

当然,本发明还可有其它多种实施例,在不背离本发明精神及其实质的情况下,熟悉本领域的技术人员当可根据本发明作出各种相应的改变和变形,但这些相应的改变和变形都应属于本发明所附的权利要求的保护范围。Certainly, the present invention also can have other multiple embodiments, without departing from the spirit and essence of the present invention, those skilled in the art can make various corresponding changes and deformations according to the present invention, but these corresponding Changes and deformations should belong to the scope of protection of the appended claims of the present invention.

Claims (15)

1.一种半导体阵列基板,其特征在于,包括:1. A semiconductor array substrate, characterized in that, comprising: 一透明基材;a transparent substrate; 一平坦层,覆盖于该透明基材上;a flat layer covering on the transparent substrate; 多个像素电极,以阵列排列方式设置于该平坦层上,各两相邻的该些像素电极间隔一间隙;以及a plurality of pixel electrodes arranged in an array on the flat layer, with a gap between two adjacent pixel electrodes; and 一不透光层,设置于该平坦层中,该不透光层位于每一该些间隙下方,该不透光层两侧具有一延伸部,并往每一该些间隙的两侧延伸至部分该像素电极的下方处;An opaque layer is disposed in the flat layer, the opaque layer is located below each of the gaps, the opaque layer has an extension on both sides, and extends to both sides of each of the gaps to a portion below the pixel electrode; 其中,该不透光层的厚度至少为该平坦层厚度的二分之一。Wherein, the thickness of the opaque layer is at least 1/2 of the thickness of the flat layer. 2.根据权利要求1所述的半导体阵列基板,其特征在于,该不透光层的厚度至多相等于该平坦层的厚度。2. The semiconductor array substrate according to claim 1, wherein the thickness of the opaque layer is at most equal to the thickness of the planar layer. 3.根据权利要求1所述的半导体阵列基板,其特征在于,该半导体阵列基板于邻近该些像素电极的边缘处,具有多个边缘电场区,该不透光层用以阻挡一背光光线沿一角度穿透通过该些边缘电场区。3. The semiconductor array substrate according to claim 1, wherein the semiconductor array substrate has a plurality of fringe electric field regions adjacent to the edges of the pixel electrodes, and the opaque layer is used to block a backlight light along the An angle penetrates through the fringe electric field regions. 4.根据权利要求3所述的半导体阵列基板,其特征在于,该角度为45度角。4. The semiconductor array substrate according to claim 3, wherein the angle is 45 degrees. 5.根据权利要求1所述的半导体阵列基板,其特征在于,还包括:5. The semiconductor array substrate according to claim 1, further comprising: 多条数据线,以相互平行的方式设置于该透明基材上,该不透光层覆盖于该对应的数据在线;A plurality of data lines are arranged on the transparent substrate in a parallel manner, and the opaque layer covers the corresponding data lines; 该不透光层覆盖于该对应的数据在线的宽度,至少相等于各该数据线的宽度。The width of the corresponding data lines covered by the opaque layer is at least equal to the width of each of the data lines. 6.根据权利要求5所述的半导体阵列基板,其特征在于,还包括:6. The semiconductor array substrate according to claim 5, further comprising: 一保护层,设置于该平坦层与该透明基材之间,并且至少覆盖于该些数据在线。A protective layer is arranged between the flat layer and the transparent substrate, and at least covers the data lines. 7.根据权利要求5所述的半导体阵列基板,其特征在于,还包括:7. The semiconductor array substrate according to claim 5, further comprising: 多个半导体开关件,以阵列排列方式设置于该透明基材上,每一该些半导体开关件连接于该对应的数据线及该对应的像素电极;a plurality of semiconductor switching elements arranged in an array on the transparent substrate, and each of the semiconductor switching elements is connected to the corresponding data line and the corresponding pixel electrode; 该不透光层更覆盖该些半导体开关件。The opaque layer further covers the semiconductor switching elements. 8.根据权利要求1所述的半导体阵列基板,其特征在于,还包括:8. The semiconductor array substrate according to claim 1, further comprising: 多条扫描线,以相互平行的方式设置于该透明基材与该平坦层之间,该不透光层更位于该些扫描线上方。A plurality of scanning lines are arranged between the transparent substrate and the flat layer in a parallel manner, and the opaque layer is located above the scanning lines. 9.一种液晶显示面板,其特征在于,包括:9. A liquid crystal display panel, characterized in that it comprises: 一彩色滤光片基板;a color filter substrate; 一液晶层,具有多个边缘电场区;以及a liquid crystal layer having a plurality of fringe electric field regions; and 一半导体阵列基板,设置于该彩色滤光片基板的一侧,且该液晶层设置于该半导体阵列基板及该彩色滤光片基板之间,该半导体阵列基板包括:A semiconductor array substrate is arranged on one side of the color filter substrate, and the liquid crystal layer is arranged between the semiconductor array substrate and the color filter substrate, and the semiconductor array substrate includes: 一透明基材;a transparent substrate; 一平坦层,覆盖于该透明基材上;a flat layer covering on the transparent substrate; 多个像素电极,以阵列排列方式设置于该平坦层上,各两相邻的该些像素电极间隔一间隙,该些边缘电场区邻近该些像素电极的边缘处;及a plurality of pixel electrodes arranged in an array on the flat layer, each two adjacent pixel electrodes are separated by a gap, and the fringe electric field regions are adjacent to the edges of the pixel electrodes; and 一不透光层,设置于该平坦层中,用以阻挡一背光光线沿一角度穿透通过该些边缘电场区,该不透光层位于每一该些间隙下方,该不透光层两侧具有一延伸部,并往每一该些间隙的两侧延伸至部分该像素电极的下方处,且凸出于每一该些边缘电场区对应各该像素电极的下方处,该不透光层的厚度至少为该平坦层厚度的二分之一。An opaque layer, arranged in the flat layer, is used to prevent a backlight light from penetrating through the fringe electric field regions along an angle, the opaque layer is located under each of the gaps, and the opaque layer is two The side has an extension part, and extends to the two sides of each of the gaps to a part of the bottom of the pixel electrode, and protrudes from the bottom of each of the fringe electric field regions corresponding to each of the pixel electrodes. The thickness of the layer is at least one-half the thickness of the planar layer. 10.根据权利要求9所述的液晶显示面板,其特征在于,该不透光层的厚度至多相等于该平坦层的厚度。10. The liquid crystal display panel according to claim 9, wherein the thickness of the opaque layer is at most equal to the thickness of the flat layer. 11.根据权利要求9所述的液晶显示面板,其特征在于,该角度为45度角。11. The liquid crystal display panel according to claim 9, wherein the angle is 45 degrees. 12.根据权利要求9所述的液晶显示面板,其特征在于,该半导体阵列基板还包括:12. The liquid crystal display panel according to claim 9, wherein the semiconductor array substrate further comprises: 多条数据线,以相互平行的方式设置于该透明基材上,该不透光层覆盖于该对应的数据在线;A plurality of data lines are arranged on the transparent substrate in a parallel manner, and the opaque layer covers the corresponding data lines; 该不透光层覆盖于该对应的数据在线的宽度,至少相等于各该数据线的宽度。The width of the corresponding data lines covered by the opaque layer is at least equal to the width of each of the data lines. 13.根据权利要求12所述的液晶显示面板,其特征在于,该半导体阵列基板还包括:13. The liquid crystal display panel according to claim 12, wherein the semiconductor array substrate further comprises: 一保护层,设置于该平坦层与该透明基材之间,并且至少覆盖于该些数据在线。A protective layer is arranged between the flat layer and the transparent substrate, and at least covers the data lines. 14.根据权利要求12所述的液晶显示面板,其特征在于,该半导体阵列基板还包括:14. The liquid crystal display panel according to claim 12, wherein the semiconductor array substrate further comprises: 多个半导体开关件,以阵列排列方式设置于该透明基材上,每一该些半导体开关件连接于该对应的数据线及该对应的像素电极;a plurality of semiconductor switching elements arranged in an array on the transparent substrate, and each of the semiconductor switching elements is connected to the corresponding data line and the corresponding pixel electrode; 该不透光层更覆盖该些半导体开关件。The opaque layer further covers the semiconductor switching elements. 15.根据权利要求9所述的液晶显示面板,其特征在于,该半导体阵列基板还包括:15. The liquid crystal display panel according to claim 9, wherein the semiconductor array substrate further comprises: 多条扫描线,以相互平行的方式设置于该透明基材与该平坦层之间,该不透光层更位于该些扫描线上方。A plurality of scanning lines are arranged between the transparent substrate and the flat layer in a parallel manner, and the opaque layer is located above the scanning lines.
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