CN101196666B - Display substrate, display device, and producing method thereof - Google Patents
Display substrate, display device, and producing method thereof Download PDFInfo
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- CN101196666B CN101196666B CN2007103021508A CN200710302150A CN101196666B CN 101196666 B CN101196666 B CN 101196666B CN 2007103021508 A CN2007103021508 A CN 2007103021508A CN 200710302150 A CN200710302150 A CN 200710302150A CN 101196666 B CN101196666 B CN 101196666B
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- G—PHYSICS
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133553—Reflecting elements
- G02F1/133555—Transflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
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Abstract
本发明提供了一种具有反射区域和透射区域的显示器中，在透射区域形成隔壁的显示器及其制造方法。该隔壁将透射区域分割成两个部分至四个部分，以地形调整倾斜的液晶分子方向。而且，在对应于透射区域的上部基片的像素电极形成一定形状的图案，施加电压时也可以调整液晶分子的移动(旋转)方向。而且，可以简化制造工序，降低生产成本。
The present invention provides a display with a reflective region and a transmissive region, a display in which partition walls are formed in the transmissive region and a manufacturing method thereof. The partition wall divides the transmissive area into two to four parts, so as to topographically adjust the direction of the inclined liquid crystal molecules. Moreover, a pattern of a certain shape is formed on the pixel electrode of the upper substrate corresponding to the transmissive area, and the moving (rotating) direction of the liquid crystal molecules can also be adjusted when a voltage is applied. Moreover, the manufacturing process can be simplified and the production cost can be reduced.
Description
The application divides an application, and the application number of its original bill application is 200510000196.5, and the applying date is on January 6th, 2005, and denomination of invention is " display substrate, display, color filter substrate, LCD and a manufacture method ".
Related application
The present invention requires Korean application 2004-00701 number submitted on January 6th, 2004 and the right of priority of the Korean application submitted on February 27th, 2004 2004-13337 number.
Technical field
The present invention relates to a kind ofly show, have this demonstration with display device, the color filter substrate of substrate, LCD and manufacture method thereof with this color filter substrate with substrate.Specifically, the display that relate to a kind of display substrate of improving image quality, has this display substrate has improved the color filter substrate at visual angle, the LCD with this color filter substrate, display with the manufacture method of the manufacture method of substrate, manufacturing method of display device, color filter substrate and have the LCD manufacture method of this color filter substrate.
Background technology
Representing LCD in the flat-panel monitor is to utilize the permittivity anisotropy and the refractive index anisotropy of liquid crystal molecule, and utilizes the display according to the light polarized light property variation of electric field intensity.
This LCD relies on the anisotropy of liquid crystal molecule, and this device is because of variant according to the liquid crystal molecule anisotropic properties of visual angle light process, so the variation of image quality appears in the position difference of watching.Usually, the visual angle has and can obtain frequently being the angle of 10: 1 image.To comparing luminance difference in bright place of screen displayed and dark place.Above-mentioned to frequently when LCD embodies black state or have evenly gray scale, becoming big.
In order to embody black state, reduce the light leakage phenomenon, and adopt common black mode, and reduce the light reflection on black battle array surface.Above-mentioned common black (Normally Black) pattern shows black when not applying electric field.In order to have evenly gray scale, LCD adopts compensation film, and comprises the liquid crystal layer with numerous zones.
Developing the liquid crystal molecule of the liquid crystal molecule optical characteristics of the most suitable light process, display panels, compensation film etc. in order to solve the image quality variation issue with numerous zones.
For example, according to the VA of mode liquid crystal molecule exploitation (vertical orientated, VerticalAlignment), IPS (switching In-Plane Switching in the face) waits is one of representative of developing at present.Numerous zones are a kind ofly to make a pixel liquid crystal move (rotation) according to the zone to different directions when applying voltage, and make the liquid crystal molecule anisotropic properties of overall optical process change the technology that becomes minimum with view angle-independent.
In addition, move to show product for not only indoor but also also provide good image quality outdoor, use the display device formed by reflector space and regional transmission (below be called " half transmitting display).Usually, reflector space and regional transmission have the different-thickness liquid crystal layer according to light approach difference.This mobile demonstration product has been developed the application of vertical orientated or numerous regional development and technology recently also based on the visual angle requirement.
The half transmitting display uses polarizer respectively between Polarizer and liquid crystal, the light that therefore passes through Polarizer is according to the circular polarisation of phase differential.
The inclination of the luminous transparency liquid crystal layer of half transmitting display liquid crystal layer is important factor, thus think that can not having friction process forms, but, cause image quality reduction etc. by the liquid crystal molecule that loses directivity at regional transmission if when omitting friction process.Specifically, reflector space embossing pattern and reflector space and regional transmission layer difference form topographic liquid crystal and tilt, yet wide regional transmission is caused the problem of image quality reduction for liquid crystal has general direction if do not carry out friction process by the liquid crystal molecule that loses directivity.
Independent friction process increases production cost, and may cause vertical spot etc. bad.
Summary of the invention
First purpose of the present invention provides and a kind of vertical orientated or numerous regional development and technology is applicable to the half transmitting display, improves the display device substrate of image quality.
Second purpose of the present invention provides a kind of display with aforementioned display device with substrate.
The present invention's the 3rd purpose provides a kind of method of display with substrate that be used to make.
The present invention's the 4th purpose provides a kind of method that is used to make display.
The 5th purpose of the present invention provides a kind of color filter substrate that has improved visual angle and image quality.
It is the LCD with above-mentioned color filter substrate that the present invention's the 6th purpose provides a kind of.
The present invention's the 7th purpose provides a kind of method that is used to make color filter substrate.
The present invention's the 8th purpose provides a kind of method that is used to make LCD.
The display according to first embodiment of the invention of realizing the present invention's first purpose comprises plate (Plate), on-off element, insulation course and next door with substrate.Reflector space and the regional transmission adjacent with reflector space by the reflection exterior light limit plate).On-off element places on the substrate.Insulation course places on the substrate with on-off element, and first electrode of exposed portions serve on-off element, and the part of corresponding regional transmission lags behind the part of corresponding reflector space.Regional transmission is cut apart in the next door.
Regional transmission can be divided into impartial or non-equalization by the next door.According to different situations, can not cut apart regional transmission fully by the next door.The next door is the structure that extend on the surface from a regional transmission part along regional transmission, and it has certain degree of tilt.Under the state that does not apply landform (topographically) voltage, have degree of tilt and directivity, and can be orientated by next door, regional transmission and reflector space border liquid crystal.
Regional transmission can have circle, polygon, ellipse.Ellipse comprises quadrangle, sexangle, anistree shape.
Display with said structure roughly is divided into two kinds according to the formation position of pixel electrode.A kind of is the structure that pixel electrode is formed on top, next door, and another is that pixel electrode is formed on the bottom, next door.
In addition, reflector space has formed the structure of embossing pattern.Embossing pattern has even or non-homogeneous shape, and has the number of degrees or do not have the concaveconvex structure of the number of degrees.Liquid crystal also has embossing pattern under the landform voltage not applying according to embossing pattern, and orientation.The display semi-transmission type liquid crystal display device.
The display according to first embodiment of the invention of realizing the present invention's first purpose comprises plate, on-off element, the first pixel electrode portion, insulation course, second pixel electrode portion and the next door with substrate.On-off element is formed on the substrate.The first pixel electrode portion is formed on the substrate that forms on-off element.Insulation course is formed on the substrate that forms the on-off element and the first pixel electrode portion, and exposes on-off element first an electrode part.The second pixel electrode portion is formed on the insulation course, and is electrically connected with on-off element first electrode and the first pixel electrode portion.The next door places on first pixel electrode, and cuts apart the zone of the first pixel electrode portion qualification of being exposed.
The display according to another embodiment of the present invention of realizing the present invention's first purpose comprises plate, on-off element, insulation course, next door and pixel electrode with substrate.On-off element is formed on the substrate.Plate (Plate) is defined by the reflector space and the regional transmission adjacent with the echo area of reflection exterior light.On-off element is formed on the substrate.Insulation course is formed on the substrate that forms on-off element, and exposes on-off element first an electrode part, and the part of corresponding regional transmission lags behind corresponding reflector space part.The next door is formed on the substrate that forms on-off element and cuts apart regional transmission.Pixel electrode is electrically connected with on-off element first electrode, and it is formed on the insulation course.
The display according to an embodiment of the invention of realizing the present invention's second purpose comprises lower substrate and top substrate.Lower substrate comprise the reflector space that defines the reflection exterior light and the regional transmission adjacent with reflector space first plate, place on-off element on first plate, place on first plate with on-off element and expose on-off element first an electrode part, and the part of corresponding regional transmission lags behind the partial insulating layer of corresponding reflector space, the next door of separation regional transmission.Top substrate has second polate and places on the second polate and have the common electrode of an above pattern of corresponding cut zone.
Pattern may be to dwindle the shape of regional transmission or circle, ellipse, polygon.Pattern forms more than one at the pixel electrode of the substrate of corresponding regional transmission, its according to circumstances can with regional transmission or the corresponding position of regional transmission central authorities cut apart.Pattern is all or part of structure of removing the substrate common electrode.
Perhaps, substitute the common electrode pattern and can have the structure that forms the insulation course projection in pattern position.
Liquid crystal moves (rotation) to certain orientation under the state that applies voltage by pattern or projection.
The display according to another embodiment of the present invention of realizing the present invention's second purpose comprises lower substrate and top substrate.Lower substrate comprises first plate, be formed at the on-off element on first plate, be formed at the first pixel electrode portion on first plate that forms on-off element, be formed on first plate that forms the on-off element and the first pixel electrode portion and expose the insulation course of on-off element first an electrode part part, be formed on the insulation course and the second pixel electrode portion that is electrically connected with on-off element first electrode and the first pixel electrode portion, place in the first pixel electrode portion and cut apart the next door that limits by the first pixel electrode portion of exposing.Top substrate comprises second polate, place on the second polate and have the common electrode of the pattern in the corresponding zone of being cut apart by the next door.Top substrate and lower substrate are in the face of being provided with.
The display according to another embodiment of the present invention of realizing the present invention's second purpose comprises lower substrate and top substrate.Lower substrate comprise the reflector space that defines the reflection exterior light and the regional transmission adjacent with reflector space first plate, be formed at on-off element on first plate, be formed on first plate that forms on-off element and expose on-off element first an electrode part, and the part of corresponding regional transmission lag behind partial insulating layer, the separation regional transmission of corresponding reflector space the next door, be electrically connected and be formed at pixel electrode on the insulation course with on-off element first electrode.Top substrate comprises second polate, place on the second polate and have the common electrode of the pattern in the corresponding zone of being cut apart by the next door.Top substrate and lower substrate are in the face of being provided with.
In order to form the substrate of display according to an embodiment of the invention of the 3rd purpose, at first, on substrate, form on-off element.Then, on the substrate that forms on-off element, form the first pixel electrode portion.Then, on the substrate that forms the on-off element and the first pixel electrode portion, form the insulation course that exposes on-off element first an electrode part.Then, form the next door of cutting apart the zone that limits by the first pixel electrode portion of exposing.At last, on insulation course, form the second pixel electrode portion that is electrically connected with on-off element first electrode and the first pixel electrode portion.
In order to form the substrate of display according to another embodiment of the present invention of the 3rd purpose, at first, on the substrate of reflector space that defines the reflection exterior light and the regional transmission adjacent, form on-off element with reflector space.Then, on the substrate that forms on-off element, form the part of exposing on-off element first electrode part and corresponding regional transmission and lag behind corresponding reflector space partial insulating layer.Then, in regional transmission, form the next door of cutting apart regional transmission.At last, on insulation course, form the pixel electrode that is electrically connected with on-off element first electrode.
In order to make the display according to an embodiment of the invention of realizing the present invention's the 4th purpose, at first, on first plate of reflector space that defines the reflection exterior light and the regional transmission adjacent, form on-off element with reflector space.Then, on first plate that forms on-off element, form the part of exposing on-off element first electrode part and corresponding regional transmission and lag behind corresponding reflector space partial insulating layer.Then, in regional transmission, form the next door of cutting apart regional transmission.At last, on second polate, form the common electrode of an above pattern with corresponding cut zone.
The color filter substrate according to an embodiment of the invention of realizing the present invention's the 5th purpose comprises transparent substrate, color filter and common electrode.Transparent substrate comprises the viewing area and surrounds the neighboring area of viewing area.Color filter places in the viewing area on the transparent substrate, and it comprises numerous zones groove.Common electrode places neighboring area, color filter and numerous zone with on the groove inner face, uses groove by distortion by the electric field that the voltage that applies produces by numerous zones.
The LCD according to an embodiment of the invention that realizes the present invention's the 6th purpose comprises second polate, color filter, common electrode, first plate, pixel electrode and liquid crystal layer.Second polate comprises the viewing area and surrounds the neighboring area of viewing area.Color filter places in the viewing area on the second polate, and it comprises numerous zones groove.Common electrode places neighboring area, color filter and numerous zone with on the groove inner face.Use groove by distortion by the electric field that the voltage that applies produces by numerous zones.First plate comprises the pixel region of corresponding viewing area and places the interior on-off element of pixel region.Pixel electrode places in the pixel region on first plate, and it is electrically connected with on-off element.Liquid crystal layer places between pixel electrode and the common electrode.
In order to make the color filter substrate according to an embodiment of the invention of realizing the present invention's the 7th purpose, at first, the organism that coating has specified color on the transparent substrate of the neighboring area that defines viewing area and encirclement viewing area.Then, remove the organism part of coating, formation places in the viewing area and comprises the color filters of numerous zones with groove.Then, at the transparent substrate surface deposition transparent insulation material of whole formation color filter, form the electric field that produces by the voltage that applies and use groove by the common electrode of distortion by numerous zones.
In order to make the LCD according to an embodiment of the invention that realizes the present invention's the 8th purpose, at first, the organism that coating has specified color on the second polate of the neighboring area that defines viewing area and encirclement viewing area.Then, remove the organism part of coating, formation places in the viewing area and comprises the color filters of numerous zones with groove.Then, at the second polate surface deposition transparent insulation material of whole formation color filter, form the electric field that produces by the voltage that applies and use groove by the common electrode of distortion by numerous zones.Then, the pixel electrode that in pixel region that limits corresponding viewing area and pixel region, forms on-off element and be electrically connected with on-off element in the face of first plate of second polate.At last, filling liquid crystal layer between pixel electrode and common electrode.
Therefore, LCD has vertical orientated and numerous zones of formation and not only improves image quality, also according to circumstances can omit the advantage of friction process.Vertical orientatedly can be not parallel to substrate and certain angle tilts.And, in liquid crystal layer, form numerous zones, to improve the visual angle of liquid crystal layer.Further simplify manufacturing process, reduced manufacturing cost.
Description of drawings
Advantages and features of the invention become apparent by the detailed description of accompanying drawing.
Figure 1A is the display lower substrate arrangenent diagram that regional transmission is divided into two parts respectively according to the present invention;
Figure 1B is that regional transmission is divided into tetrameric display lower substrate arrangenent diagram respectively according to the present invention;
Fig. 2 A is the sectional view of Figure 1A along I-I ' line;
Fig. 2 B is the sectional view of Figure 1B along II-II ' line;
Fig. 3 A, 3B, 3C illustrate Fig. 2 A formation method according to operation;
Fig. 4 A, 4B, 4C illustrate the common electrode pattern that forms at the top substrate common electrode according to the present invention;
Fig. 5 A is the sectional view of Fig. 4 A along III-III ' line;
Fig. 5 B is the sectional view of Fig. 4 B along IV-IV ' line;
Fig. 5 C is the sectional view of Fig. 4 C along V-V ' line;
Fig. 6 is the LCD planimetric map according to the embodiment of the invention;
Fig. 7 is the sectional view of Fig. 6 along VI-VI ' line;
Fig. 8 is the sectional view of Fig. 6 along VII-VII ' line;
Fig. 9 A to Fig. 9 K is the method sectional view of the LCD shown in the shop drawings 6;
Figure 10 is a LCD planimetric map according to another embodiment of the present invention;
Figure 11 is Figure 10 first pixel electrode portion and the second pixel electrode facial planes figure;
Figure 12 is the sectional view of Figure 10 along VIII-VIII ' line;
Figure 13 is the sectional view of Figure 10 along IX-IX ' line;
Figure 14 A to Figure 14 J is a method sectional view of making Figure 10 LCD;
Figure 15 is a LCD planimetric map according to another embodiment of the present invention;
Figure 16 is the sectional view of Figure 15 along X-X ' line;
Figure 17 is a LCD planimetric map according to another embodiment of the present invention;
Figure 18 is Figure 17 first pixel electrode portion and the second pixel electrode facial planes figure;
Figure 19 is the sectional view of Figure 17 along XI-XI ' line;
Figure 20 is a LCD planimetric map according to another embodiment of the present invention;
Figure 21 is the sectional view of Figure 20 along XII-XII ' line;
Figure 22 is a LCD planimetric map according to another embodiment of the present invention; And
Figure 23 is the sectional view of Figure 22 along XIII-XIII ' line.
Embodiment
In order to make those skilled in the art can implement the present invention, describe embodiments of the invention in detail referring now to accompanying drawing, multi-form but the present invention can show as, the embodiment that it is not limited in this explanation.
In the drawings in order clearly to show each layer and zone, enlarging its thickness represents, in full piece of writing instructions, similar portions is enclosed the symbol of phase diagram, when mention part such as layer, film, zone, substrate other part " on " time, it is meant that " directly " is positioned on other part, also comprise the situation that accompanies other part therebetween, otherwise say when certain part " directly " is positioned on other part, refer to there is no other part therebetween.Represent identical parts with identical drawing reference numeral in the instructions full text.
Figure 1A is that regional transmission is divided into two-part display lower substrate arrangenent diagram respectively according to the present invention, and Figure 1B is that regional transmission is divided into tetrameric display lower substrate arrangenent diagram respectively according to the present invention.
Figure 1A, Figure 1B be illustrated in the display gate line 203 that forms on-off element 215 and be electrically connected with on-off element ', data line 211 ', the layout of the lower substrate of pixel region Px.Described on-off element 215 is made up of grid 202, first and second electrode 211,213, and described pixel region Px is made up of reflector space Ra and regional transmission Ta.Figure 1A, Figure 1B illustrate regional transmission Ta are evenly divided into two part Ta ', four parts respectively, but can inhomogeneously cut apart.Form embossing pattern at reflector space Ra.
Signal is selected in the output of driving circuit (not shown), and it is by gate line 203 ' transmission grid 203, and output data voltage, by data line 211 ' reaching on-off element 215 transmits pixel electrodes.
In addition, have the top substrate that forms color filter, common electrode etc., and the liquid crystal layer between lower substrate and top substrate on lower substrate top, to make display.At this moment, the common electrode of described top substrate comprises pattern.The liquid crystal molecule of liquid crystal layer is VA or RTN (oppositely TN) orientation.
Figure 1B is that regional transmission is divided into tetrameric display lower substrate arrangenent diagram respectively according to the present invention, and Fig. 2 A is the surface chart of Figure 1A along I-I ' line.
With reference to Fig. 2 A, the pixel electrode first pixel electrode portion 219 next doors, 223 bottoms form.
Form the on-off element 215 and the first pixel electrode portion 219 on first pole piece 201, next door 223, the insulation course 221 with regional transmission and the second pixel electrode portion 225 are formed at its top.The first pixel electrode portion 219 places in the regional transmission Ta, and the second pixel electrode portion 225 places in the reflector space Ra.
Particularly, comprise first plate 201, be formed at the on-off element 215 on first plate 201, be formed at first plate 201 and the first pixel electrode portion 219 of zone formation outside the zone that forms on-off element 215, at first plate 201 and on-off element 215, in the first pixel electrode portion 219 and expose first electrode, 213 parts of on-off element 215, and expose the first pixel electrode portion, 219 parts but in the first pixel electrode portion 219, form the insulation course 221 in next door 223, the second pixel electrode portion 225 that on insulation course 221, is electrically connected with on-off element 215 first electrodes 213 and the first pixel electrode portion 219.
Regional transmission is circle, polygon, ellipse.Polygon comprises quadrangle or sexangle, anistree shape.
The first pixel electrode portion 219 and the second pixel electrode portion, 225 simple layers or lamination layer structure.According to circumstances, between on-off element on the on-off element 215 and insulation course 221, fill passivation layer 217.In addition, the first pixel electrode portion 219 may be a transparency electrode, and it is made up of ITO, IZO.The second pixel electrode portion 225 is opaque electrodes, and it is made up of aluminium, aluminium alloy or aluminium and metal composite layer.And, between two electrodes, fill alloy-layers such as molybdenum tungsten in the zone that the first pixel electrode portion 219 and the second pixel electrode portion 225 are electrically connected.
With reference to Fig. 2 B, form the first pixel electrode portion 219 of pixel electrode on the next door 223.
Particularly, Fig. 2 B structure is except form the first pixel electrode portion 219 on insulation course 221, and is forming in the first pixel electrode portion 219 of reflector space outside the second line pixel electrode 225, identical with Fig. 2 A structure.Just, because on insulation course 221, form the first pixel electrode portion 219, so form the first pixel electrode portion 219 on 223 tops, regional transmission next door.
It is poor by next door 223 and reflector space and regional transmission boundary layer under the state that does not apply landform (topographically) voltage to have display with Fig. 2 A and Fig. 2 B same structure, liquid crystal has degree of tilt and orientation, to obtain good image quality, according to circumstances can omit friction process, therefore can improve bad that friction process causes, reduce production costs.
Fig. 3 A to 3D illustrates Fig. 2 A formation method according to operation.
With reference to Fig. 3 A, on first plate 202, form after the on-off element 215, the zone outside the zone that forms and forming on-off element 215 on first plate 201 forms the first pixel electrode portion 219.Then, in first plate 201, on-off element 215 and the first pixel electrode portion 219, form insulation course 221.
Particularly, on first plate 201, form grid 203 and gate line 203 ' afterwards, on the grid 203 and first plate, form gate insulator 205.Then, form on gate insulator 205 after semiconductor layer and the resistance articulamentum, the patterning case forms semiconductor pattern and resistance connection pattern with zone and neighboring area thereof at formation grid 203.Resistance connect form metal level on the pattern after, in the zone that forms grid 203 and the neighboring area form, and the patterning case makes it poor at grid 203 top cambium layer, with form first and second electrode 211,213 and data line 211 '.
First and second electrode 211,213 of patterning case is connected pattern as mask etching resistance, make cambium layer poor, form channel layer 207, to form on-off element 215.(all right in addition, form successively after semiconductor layer and resistance articulamentum, the metal level, carry out the patterning case simultaneously and form first and second electrode 211,213, the layer that forms resistance connection pattern is poor, to form on-off element 215.) according to circumstances, on on-off element 215, form passivation layer 217.Passivation layer 217 is insulation courses such as silicon nitride.
With reference to Fig. 3 B, prepare the grating 300 of the exposure device of formation pattern at described Fig. 3 A insulation course 221, pass through optical etching, second portion 213 parts of exposing on-off element 215, and expose the first pixel electrode portion, 219 parts, form insulation course 221, the next door is placed in the first pixel electrode portion 219.
In the present embodiment, organic insulator comprises photoresist.Form the method for removing specific region insulation course 221 by the optical etching operation that comprises exposure process and video picture operation.At this moment, organic layer 221 can form by the optical etching operation.
The photoresist chemical constitution of irradiates light is brought and the not different variations of photoresist chemical constitution of irradiates light, so can optionally remove by exposure process.Grating 300 forms non-transparent parts 302 on transparent component 301, for example form chromium etc. according to the pattern form, to finish making.
There is shown, form the zone that has the zone of non-transparent parts 302 and do not have non-transparent parts at grating 300, remove insulation course 221 parts by zone with non-transparent parts, but according to the photoresist feature, can exchange zone with non-transparent parts 302 and do not have zone of opacity the zone.
Pattern in grating 300 further formation will formation next door 223 that is used in exposure process forms next door 223 in the time of with the regional transmission that form to lag behind.The pattern that forms next door 223 is single pattern or slit pattern.When utilizing single pattern or slit pattern to form the next door, next door 223 height are identical with reflector space or less than reflector space.Particularly, when the grating 300 of slit pattern is appended in use, form the inclined partitions 223 lower than reflector space by light inflection phenomenon.
And, the pattern of formation embossing pattern on the insulation course 221 that forms reflector space.Pattern also forms by the optical etching operation.Form embossing pattern by heat treatment process after the video picture.
With reference to Fig. 3 C, the reflector space on insulation course 221 forms the second pixel electrode portion 225 of opaque electrode, and is electrically connected with the first pixel electrode portion 219 and second electrode 213.
As mentioned above, remove regional transmission insulation course 221 part or all, it is poor to form reflector space and regional transmission thickness of liquid crystal layer, to make the demonstration according to the transmissison characteristic of the reflection characteristic of reflector space and regional transmission.For example, when if the regional transmission thickness of liquid crystal layer is approximately 2 times of reflector space thickness of liquid crystal layer, can make the liquid crystal layer distance of carrying out identical, so that reflector space is similar with the regional transmission optical characteristics with the liquid crystal layer that carries out at regional transmission light distance at reflector space light.According to circumstances, adjust the reflector space thickness of liquid crystal layer, adjust the regional transmission thickness of liquid crystal layer, make reflector space have top condition according to reflector space thickness of liquid crystal layer of adjusting and insulation course 221 thickness.
And the display formation method (not shown) with Fig. 2 B structure forms the first pixel electrode portion 219 after forming insulation course 221, as Fig. 3 A to Fig. 3 C formation method.Just, form the first pixel electrode portion 219 and the second pixel electrode portion 225 after forming insulation course 221, remove the second pixel electrode portion 225 of opaque electrode then from regional transmission, with second pixel electrode portion 225 of qualification reflector space and the first pixel electrode portion 219 of regional transmission.And, between the first pixel electrode portion and the second pixel electrode portion, fill metal levels such as molybdenum tungsten.
Fig. 4 A, 4B, 4C illustrate the common electrode pattern that forms at the top substrate common electrode according to the present invention.
The common electrode pattern of top substrate forms more than one with any form in circle, ellipse or the polygon.And, when cutting apart regional transmission 117a, 117b, form pattern 402 at the top substrate common electrode of corresponding each cut zone by next door etc.Common electrode has multiple pattern.Pattern 402 is positioned at corresponding respectively regional transmission or the top substrate common electrode regional center of the regional transmission cut apart.Pattern has removes part or all structure of common electrode.
Have all Figure 1A, Figure 1B form at lower substrate and reflector space, on-off element etc.In addition, filling liquid crystal layer between lower substrate and top substrate, the liquid crystal mode of liquid crystal layer are VA (vertical orientated) or RTN (Reverse TN).
Usually, the half transmitting display has light source, shines from light guide plate and various thin slice (film), Polarizer and the polarizer of the light of light source ejaculation to panel comprehensively in lower substrate.Polarizer makes the circular polarisation of light source of linear polarisation with a direction of principal axis of λ/4 phase change light waves.And, have polarizer (λ/4 phase-plates), Polarizer on top substrate top.Form black mode by polarizer at reflector space, consistent at reflector space with black and white pattern in the regional transmission.And, substitute the common electrode pattern and form the insulation course projection in pattern position.
Fig. 5 A is the sectional view of Fig. 4 A along III-III ' line.
With reference to Fig. 5 A, lower substrate 501 display structure identical except no next door with Fig. 2 A.That is, form regional transmission but do not stay the next door and the structure of removing.In addition, the first pixel electrode portion 219 places on the insulation course 221.The top substrate 505 of corresponding lower substrate 501 forms color filter isotactic fixed structure at the substrate identical with lower substrate.Form common electrode 507 in top substrate 505 comprehensively.Common electrode 507 has pattern 402 in the position of corresponding lower substrate 501 regional transmissions, and has the oval configuration of longitudinal extension.At this moment, pattern 402 has quadrangle or circle.Perhaps substitute common electrode 507 patterns 402, form the insulation course projection in pattern position.
Display with Fig. 5 A structure moves (rotation) liquid crystal to certain orientation under the state that applies voltage by pattern, improve liquid crystal orientation, therefore forms numerous zones more well, shows image quality to improve.
Fig. 5 B is the sectional view of Fig. 4 B along IV-IV ' line, and Fig. 5 C is the sectional view of Fig. 4 C along V-V ' line.
Fig. 5 B and Fig. 5 C have the lower substrate 502,503 with Fig. 2 A and Fig. 2 B same structure.Among Fig. 5 B, the 5C, the top substrate 505 of corresponding lower substrate 502,503 and common electrode 507 have the structure identical with Fig. 5 A.
With reference to Fig. 5 B, 5C, common electrode 507 has pattern in the position of corresponding lower substrate 502,503 regional transmissions.Specifically, common electrode 507 patterns 402 are formed at top substrate common electrode 507 zones of zone outside the zone that forms the next door or the corresponding regional transmission of cutting apart.In not forming the regional transmission in next door, be formed centrally common electrode 507 patterns 402, pattern 402 forms more than one at regional transmission, forms respectively more than one in zone that correspondence is cut apart by the next door or the top substrate common electrode 507 that does not form the zone in next door.Or alternative common electrode 507 patterns form the insulation projection in pattern 402 positions.
Display, reflector space embossing pattern poor under the state that does not apply landform voltage with Fig. 5 B and Fig. 5 C-structure according to next door and reflector space boundary layer, liquid crystal can have the degree of tilt orientation, and, under the state that does not apply voltage, liquid crystal is moved (rotation) to certain orientation by pattern.And, concern that from the position of next door and pattern property complimentary to one another ground control is according to the orientation characteristic that does not apply voltage and the liquid crystal that applies voltage and according to the directivity that moves (rotation), not only can improve the demonstration image quality, also according to circumstances can omit friction process, improvement by friction process cause bad, reduce production costs.
Fig. 6 is the LCD planimetric map according to the embodiment of the invention, and Fig. 7 is the sectional view of Fig. 6 along VI-VI ' line, and Fig. 8 is the sectional view of Fig. 6 along VII-VII ' line.
With reference to Fig. 6 to Fig. 8, LCD comprises top substrate 1170, lower substrate 1180 and liquid crystal layer 1108.
The second polate 1100 and first plate 1120 use the clear glass of transmissive light.Glass is not for there being alkalescence.When glass is alkalescence, if alkali ion outputs to the liquid crystal cells from glass, reduce liquid crystal resistivity, change display characteristic, reduce the adhesion of unit and glass, influence the on-off element operation.
At this moment, the second polate 1100 and first plate 1120 comprise triacetyl cellulose (TAC), polycarbonate (PC), polyethersulfone (PES), polyethylene terephthalate (PET), poly-to naphthalenedicarboxylic acid second diester (PEN), polyvinyl alcohol (PVA) (PVA), polymethylmethacrylate (PMMA), cycloolefine polymer (COP) etc.
Preferably, the second polate 1100 and first plate 1120 have optic equidirectional.
Thin film transistor (TFT) 1119 forms in the reflector space 1128 of first plate 1120, and it comprises source electrode 1118a, grid 1118b, drain electrode 1118c and semiconductor layer pattern.Driving circuit (not shown) output data voltage, and pass through source electrode line 1118a ' to source electrode transmission 1118a.Output is selected signal and is transmitted to grid 1118b by gate line 1118b '.
The holding capacitor (not shown) is formed on first plate 1120, keeps between the common electrode 1106 and the second pixel electrode portion 1113 and the potential difference (PD) between the common electrode 1106 and the first pixel electrode portion 1112.
And opening is corresponding to the part of the transmission window 1129a of insulation course 1114, and the part of transmission window 1129a of corresponding lower substrate 1180 and the part of corresponding reflector space 1128 are highly differed from one another.At this moment, residual insulation course 1114 parts in transmission window 1129a.
Numerous zone with protruding 1131a corresponding to numerous regional with groove 1130a and place on the passivation layer 1116.The protruding 1131a in numerous zones has the straight square shape that extends to source electrode line 1118a ' direction.At this moment, with groove 1130a a plurality of numerous protruding 1131a in zone are set, with protruding 1131a a plurality of numerous zone groove 1130a are set corresponding to numerous zones corresponding to numerous zones.Preferably, numerous zones form with insulation course 1114 with protruding 1131a.
Adjust numerous zones with protruding 1131a and/or numerous zone groove 1130a size, adjust the liquid crystal arrangement that forms numerous zones.
The first pixel electrode portion 1112 is formed at insulation course 1114 surfaces, the contact hole inner face, numerous regional with in protruding 1131a and transmission window 1131a and the transmission window 1129a in the pixel region 1140, and is electrically connected with drain electrode 1118c.The first pixel electrode portion 1112 by put on and common electrode 1106 between Control of Voltage liquid crystal layer 1108 in liquid crystal, adjust transmittance.The first pixel electrode portion 1112 comprises tin indium oxide ITO, indium zinc oxide IZO, zinc paste ZO of transparent conductivity material etc.
The second pixel electrode portion 1113 places on the insulation course 1114 in the reflector space 1128, and it reflects exterior light.Preferably, the second pixel electrode portion 1113 is along being provided with in the lip-deep jog shapes of insulation course 1114, and to certain orientation reflection exterior light.The second pixel electrode portion 1113 comprises conductive material, and is electrically connected with drain electrode 1118c by the first pixel electrode portion 1112.
At this moment, the oriented layer (not shown) is set, can be orientated liquid crystal in top substrate 1170 and lower substrate 1180 surfaces.
If apply voltage between the first pixel electrode portion 1112 and the second pixel electrode portion 1113 and the common electrode 1106, then and lug boss 1115 and liner 1110 adjacent areas, transmission window 1129a and reflector space 1128 between have layer difference part (end difference, SteppedPortion), with numerous zones with groove 1130a and numerous zone with generation electric field distortion in the zone of protruding 1131a.Therefore, in liquid crystal layer 1108, form numerous zones, to improve the visual angle.
Fig. 9 A to Fig. 9 K is the method sectional view of the LCD shown in the shop drawings 6.
With reference to Fig. 9 A, at first, limit pixel region 1140 and lightproof area 1145 at first plate 1120.Pixel region 1140 comprises that transmission is from the optical transmission window 1129a of backlight assembly (not shown) generation and the reflector space 1128 of reflection exterior light.
Then, depositing electrically conductive material on first plate 1120.Then, remove a conductive material part, form grid 1118b and gate line 1118b '.Then, deposit megohmite insulant at first plate 1120 that forms grid 1118b and gate line 1118b ' on comprehensively, to form gate insulator 1126.
Then, on the gate insulator 1126 of corresponding grid 1118b, form amorphous silicon and N+ amorphous silicon, to form semiconductor layer.Then, depositing electrically conductive material on the gate insulator 1126 that forms semiconductor layer.Then, an etching conductive material part forms source electrode 1118a, source electrode line 1118a ' and drain electrode 1118c.Formation comprises the thin film transistor (TFT) 1119 of source electrode 1118a, grid 1118b, drain electrode 1118c and semiconductor layer.
Then, on first plate 1120 that forms thin film transistor (TFT) 1119, deposit megohmite insulant.
With reference to Fig. 9 B, then on the megohmite insulant of deposition, be coated with described organism.Preferably, organism comprises photoresist.
With reference to Fig. 9 C, then, utilize the organism 1114 ' and the video picture of mask exposure coating, form contact hole, lug boss 1115, jog and numerous protruding 1131a in zone.And, by the part of exposure imaging operation opening corresponding to transmission window 1129a.Exposure and video picture operation comprise an operation utilizing a mask or the several operation with a plurality of masks.When forming contact hole, lug boss 1115, jog and numerous zone with protruding 1131a by an operation utilizing a mask, a mask comprises opaque section, translucent portion and transparent part.Preferably, opaque section is corresponding to lug boss 1115, and translucent portion corresponds respectively to jog and numerous protruding 1131a in zone, and contact hole and transmission window 1129a are corresponding to transparent part.At this moment, the alternative translucent portion of mask comprises slit.Adjust translucent portion or slit width, numerous regional to adjust with protruding 1131a size.
Reference, Fig. 9 B, then, insulation course 1114, passivation layer 1116, contact hole inner face, transmission window 1129a inner face and numerous zone with protruding 1131a surface on the deposit transparent conductive material.Conductive material comprises ITO, IZO, ZO etc.Preferably, the transparent conductivity material comprises ITO.Then, the transparent conductivity material part of etching deposit forms the first pixel electrode portion 1112.In pixel electrode 1140, form the first pixel electrode portion 1112.
Then, the electric conductor of deposition high reflectance on first plate that forms the first pixel electrode portion 1112.Preferably, the electric conductor that reflectivity is high comprises aluminium and neodymium.Then, the electric conductor part that the etching reflectivity is high forms the second pixel electrode portion 1113 in reflector space 1128.
At this moment, the second pixel electrode portion 1113 has sandwich construction.When the second pixel electrode portion had sandwich construction, preferably, the second pixel electrode portion 1113 comprised molybdenum-tungalloy layer and the aluminum-neodymium alloys layer that forms on molybdenum-tungalloy layer.The second pixel electrode portion 1113 is electrically connected with drain electrode 1118c by the first pixel electrode portion 1112 and contact hole.At this moment, on insulation course 114 and contact hole inner face, form the second pixel electrode portion 1113, on a transmission window 1129a and the second pixel electrode portion, 1113 parts, form the first pixel electrode portion 1112, be electrically connected the first pixel electrode portion 1112 and drain electrode 1118c by the second pixel electrode portion 1113.
Thereby formation comprises first plate 1120, thin film transistor (TFT) 1119, source electrode line, gate line, insulation course 1114, the first pixel electrode portion 1112, the second pixel electrode portion 1113 and the numerous zone lower substrate 1180 with protruding 1131a.
With reference to Fig. 9 E, then, on second polate 1100, deposit vitrina.Then, remove a vitrina part, form black battle array 1102.At this moment, on second polate 1100, after coating vitrina and the photoresist, utilize optical etching (PhotoProcess) to form black battle array 1102.Optical etching comprises exposure process (Exposure Process) and video picture operation (Development Process).At this moment, on first plate 1120, form black battle array 1102.
With reference to Fig. 9 F, on the second polate 1100 that forms black battle array 1102, be coated with the potpourri that comprises red pigment and photoresist then.
With reference to Fig. 9 G, then utilize the potpourri 1104a ' and the video picture of mask exposure coating, form the red color filter 1104a of portion and numerous zone groove 1130a.Mask comprises slit, and slit is corresponding to numerous zone groove 1130a.Numerous zones use groove 1130a size corresponding to slit separation.At this moment, mask comprises translucent portion.Adjust the translucent portion width, to adjust numerous zones groove 1130a size.
With reference to Fig. 9 H, then on the second polate 1100 that forms black battle array 1102 and the 1104a of red color filter portion, form green color filter 1104b of portion and blue color filter portion.
With reference to Fig. 9 I, then, the translucent conductive material of deposition on the second polate 1100 of the black battle array 1102 of formation and color filter 1104a, 1104b, 1104c is to form common electrode 1106.
With reference to Fig. 9 J, then on described common electrode 1106, be coated with organism.Preferentially, described organism comprises photoresist (Photoresist) composition.Then, exposure organism, and video picture form liner 1110 on the common electrode 1106 of the black battle array 1102 of correspondence.At this moment, on first plate 1120, form liner 1110.
With reference to Fig. 9 K, commissure docks close portion's substrate 1170 and lower substrate 1180.
Then, between top substrate 1170 and lower substrate 1180, seal with sealant (Sealant, not shown) after the injection liquid crystal layer 1108.At this moment, behind drop (Drop) liquid crystal on top substrate 1170 that forms the sealant (not shown) or the lower substrate 1180, make top substrate 1170 and lower substrate 1180, form liquid crystal layer 1108 in the face of engaging.
Therefore, adjustment places the lug boss 1115 adjacent with liner 1110, the part of layer difference is arranged between transmission window 1129a and reflector space 1128 and arranges the numerous zones of formation in transmission window 1129a with numerous zones with the vertical orientated liquid crystal part in the protruding 1131a adjacent areas with groove 1130a and numerous zone.Numerous regional centers are corresponding to numerous regional with groove 1130a and numerous protruding 1131a in zone.
And, form numerous zone groove 131a with color filter 1104a, 1104b, 1104c, and, numerous protruding 1131a in zone formed with insulation course 1114, so simplified LCD manufacturing process.
Figure 10 is a LCD planimetric map according to another embodiment of the present invention, and Figure 11 is that Figure 10 first pixel electrode portion and the second pixel electrode facial planes figure, Figure 12 are the sectional view of Figure 10 along VIII-VIII ' line.
In the present embodiment, its composition structure is identical with Fig. 6 to Fig. 8 embodiment except external coating and insulation course, therefore omits its detailed description at this.
With reference to Figure 10 to Figure 13, LCD comprises top substrate 1170, lower substrate 1180 and liquid crystal layer 1108.
And, by opening, make corresponding to the part of the transmission window 1129a of top substrate 1170 highly different corresponding to the part of the transmission window 1129a of external coating 1105 with part corresponding to reflector space 1128.At this moment, form jog (Embossed Portion) on external coating 1105 surfaces corresponding to reflector space 1128.
At this moment, external coating 1105 parts residue in color filter 1104a, 1104b, the 1104c and numerous regional with on the groove 1132a corresponding to transmission window 1129a.Preferably, residual external coating 1105 is provided with groove 1132a along color filter 1104a, 1104b, 1104c and numerous zone.
Thin film transistor (TFT) 1119 is formed in the reflector space 1128 of first plate 1120, and it comprises source electrode 1118a, grid 1118b, drain electrode 1118c and semiconductor layer pattern.
At this moment, insulation course 1114 further comprises lug boss 1115, jog and numerous protruding 1134a in zone.
Numerous zones place on the insulation course 1114 with groove 1132a corresponding to numerous zones with protruding 1134a.Numerous zones have the straight square shape that extends to source electrode line 1118a ' direction with protruding 1134a.Numerous zones form with insulation course 1114 with protruding 1134a.
The first pixel electrode portion 1112 is formed at insulation course 1114 surfaces, the contact hole inner face and numerous regional with in the protruding 1134a in the pixel region 1140, and 1118c is electrically connected with drain electrode.
The second pixel electrode portion 1113 places on the insulation course 1114 in the reflector space 1128, the reflection exterior light.
If between the first pixel electrode portion 1112 and the second pixel electrode portion 1113 and common electrode 1106, apply voltage, and lug boss 1115 and liner 1110 adjacent areas, external coating 1105 and color filter 1104a, 1104b, 1104c between layer difference part (end difference, a Stepped Portion) arranged, with numerous zones with groove 1132a and numerous zone with generation distortion in the protruding 1134a adjacent areas.When liquid crystal was arranged with vertical alignment mode, the electric field by distortion in liquid crystal layer 1108 formed numerous zones, to improve the visual angle.
Figure 14 A to Figure 14 J is the method sectional view of making according to the LCD of second embodiment of the invention.
With reference to Figure 14 A, at first, form thin film transistor (TFT) 1119 at first plate 1120.Then, deposit transparent megohmite insulant on first plate 1120 that forms thin film transistor (TFT) 1119.Then, on the transparent insulation material of deposition, be coated with organism.Preferably, organism is a photoresist.
With reference to Figure 14 B, then, utilize the organism 1114 of mask exposure coating ', and video picture forms lug boss 1115, jog and numerous protruding 1134a in zone.Exposure and video picture operation comprise an operation utilizing a mask or the repeatedly operation with a plurality of masks.When forming contact hole, lug boss 1115, jog and numerous zone with protruding 1134a by an operation utilizing a mask, a mask comprises transparent part, opaque section and translucent portion.Preferably, transparent part is corresponding to contact hole, and opaque section is corresponding to lug boss 1115 and numerous protruding 1134a in zone, and translucent portion corresponds respectively to jog and transmission window 1129a.Therefore, reduce the difference of height (Height Difference) of insulation course 1114, simplified the protruding manufacturing process in numerous zones.At this moment, the alternative translucent portion of mask comprises slit.
With reference to Figure 14 C, then, the described picture zone 1140 on first plate 1120 that forms organic layer 1114 forms the first pixel electrode portion 1112.Then, form the second pixel electrode portion 1113 in the reflector space 1128 on first plate 1120 that forms the first pixel electrode portion 1112.
Thereby formation comprises first plate 1120, thin film transistor (TFT) 1119, source electrode line 1118a ', gate line 1118b ', insulation course 1114, the first pixel electrode portion 1112, the second pixel electrode portion 1113 and the numerous zone lower substrate 1180 with protruding 1134a.
With reference to Figure 14 D, then, on second polate 1100, form black battle array 1102.Then, on the second polate 1100 that forms black battle array 1102, be coated with the potpourri that comprises red pigment and photoresist.
With reference to Figure 14 E, then, utilize the potpourri 1104a ' of mask exposure coating, and video picture forms the red color filter 1104a of portion and numerous zone groove 1132a.
With reference to Figure 14 F, then, on the second polate 1100 that forms black battle array 1102 and the 1104a of red color filter portion, form green color filter 1104b of portion and blue color filter portion.
With reference to Figure 14 G, then, coating comprises organism on the second polate that forms black battle array 1102 and color filter 1104a, 1104b, 1104c.
With reference to Figure 14 H, then, utilize the organism 1105 of mask exposure coating ', color filter 1104a, 1104b, a 1104c part and numerous zone groove 1132a corresponding to lower substrate 1180 transmission window 1129a are exposed in and video picture.
With reference to Figure 14 I, then, deposit transparent conductive material on the second polate 1100 that forms black battle array 1102, color filter 1104a, 1104b, 1104c and external coating 1105 forms common electrode 1106.
Then, on corresponding to the part of the common electrode 1106 of deceiving battle array 1102, form liner 1110.
With reference to Figure 14 J, then, in the face of engaging top substrate 1170 and lower substrate 1180.
Then, between top substrate 1170 and lower substrate 1180, inject liquid crystal layer 1108, use sealant (Sealant, not shown) sealing then.
Therefore, if between common electrode 1106 and the first pixel electrode portion 1112 and the second pixel electrode portion 1113, apply voltage, then and liner 1110 and lug boss 1115 adjacent areas, external coating 1105 and color filter 1104a between the part that layer difference arranged and with numerous zones with groove 1132a and numerous zone with protruding 1134a adjacent areas in the numerous zones of formation.
And, highly different with liquid crystal layer 1108 according to external coating 1105 corresponding to reflector space corresponding to liquid crystal layer 1108 height of transmission window 1129a, therefore reduce 1114 layers of difference of insulation course, form numerous protruding 1134a in zone easily.
Figure 15 is a LCD planimetric map according to another embodiment of the present invention, and Figure 16 is the sectional view of Figure 15 along X-X ' line.
In the present embodiment, except numerous zones identical with Figure 10 to Figure 13 example structure with groove and numerous zone with the structure the projection, so detailed description of omitting its repeating part.
With reference to Figure 15 and Figure 16, LCD comprises top substrate 1170, lower substrate 1180 and liquid crystal layer 1108.
And, by opening, make part height corresponding to the transmission window 1129a of top substrate 1170 corresponding to the part of the transmission window 1129a of external coating 1105 with corresponding highly different with the part of reflector space 1128.
At this moment, insulation course 1114 further comprises lug boss 1115, jog and two numerous protruding 1134b in zone.
Numerous zones place on the insulation course 1114 with groove 1132b corresponding to numerous zones with protruding 1134b.Numerous zones have square shape with protruding 1134b.At this moment, numerous zones also can have the straight square shape that extends to the source electrode line direction with protruding 1134b.Numerous zones form with insulation course with protruding 1134b.
If apply voltage between the first pixel electrode portion 1112 and common electrode 1106, in 1108 a plurality of zones of formation in the adjacent liquid crystal layer of protruding 1134b with groove 1132b with corresponding to numerous regional 1132b and with numerous zones in each numerous zone.Thereby, increase the number of regions that is included in numerous zones, to improve the visual angle.
Figure 17 is a LCD planimetric map according to another embodiment of the present invention, and Figure 18 is Figure 17 first pixel electrode portion and the second pixel electrode facial planes figure, and Figure 19 is the sectional view of Figure 17 along XI-XI ' line.
In the present embodiment, the structure except the second pixel electrode portion and the first pixel electrode portion is as Figure 15 and Figure 16 embodiment, so the detailed description of omitting its repeating part.
With reference to Figure 17 to Figure 19, described LCD comprises top substrate 1170, lower substrate 1180 and liquid crystal layer 1108.
Numerous zones place on the insulation course 1114 with groove 1132c corresponding to numerous zones with protruding 1134c.
The first pixel electrode portion 1112 comprises first 1212a of transparency electrode portion, second 1212b of transparency electrode portion, the first connecting portion 1136a and the second connecting portion 1136b.
First 1212a of transparency electrode portion and second 1212b of transparency electrode portion place on the interior insulation course 1114 of transmission window 1129a.First 1212a of transparency electrode portion and second 1212b of transparency electrode portion setting adjacent one another are.
The first connecting portion 1136a places between first 1212a of transparency electrode portion and second 1212b of transparency electrode portion, is electrically connected first 1212a of transparency electrode portion and second 1212b of transparency electrode portion.Preferably, first 1212a of transparency electrode portion and second 1212b of transparency electrode portion are square.
The second connecting portion 1136b places the first connecting portion 1136a opposite of second 1212b of transparency electrode portion, is electrically connected second 1136b of transparency electrode portion and the second pixel electrode portion 1230.The part of second 1136b of transparency electrode portion extends in the contact hole, can be electrically connected the drain electrode 1118c of second 1136b of transparency electrode portion and thin film transistor (TFT) 1119.
The second pixel electrode portion 1230 places on the insulation course 1114 in the reflector space 1128, is square.
At this moment, first 1212a of transparency electrode portion, second 1212b of transparency electrode portion and the second pixel electrode portion 1230 can become polygon, circle etc.Polygon comprises quadrangle, sexangle, octagon etc.
Adjust between first 1212a of transparency electrode portion and second 1212b of transparency electrode portion distance between distance and/or second 1212b of transparency electrode portion and the second pixel electrode portion 1230, to adjust liquid crystal arrangement in the liquid crystal layer 1108.
If between the first pixel electrode portion 1220 and common electrode 1106, apply voltage, form a plurality of zones with groove 1132c with in each numerous zone corresponding to the liquid crystal layer 1108 adjacent with protruding 1134c of numerous zones with groove 1132c in each numerous zone.
And, between first 1212a of transparency electrode portion and second 1212b of transparency electrode portion, and second 1212b of transparency electrode portion and the second pixel electrode portion 1230 between produce electric distortion, to adjust liquid crystal arrangement, improve the visual angle.
Figure 20 is a LCD planimetric map according to another embodiment of the present invention, and Figure 21 is the sectional view of Figure 20 along XII-XII ' line.
In the present embodiment, the structure except second numerous zones usefulness groove is as the structure of Figure 17 to Figure 19 embodiment, the therefore detailed description of omitting its repeating part.
LCD comprises top substrate 1170, lower substrate 1180 and liquid crystal layer 1108.
By opening, the part height of the transmission window 1129a of top substrate 1170 is highly different with part corresponding to reflector space 1128 corresponding to the part of the transmission window 1129a of external coating 1105.
And, second numerous zones groove 1137 is set in the external coating 1105 corresponding to lower substrate 1180 reflector spaces 1128.
Numerous zones place on the insulation course 1114 with groove 1132d corresponding to first numerous zones with protruding 1134d.
If between the second pixel electrode portion 1230 and common electrode 1106, apply voltage, with second numerous regional groove 1137 adjacent areas in produce the electric field distortion.Thereby, adjust liquid crystal arrangement in the liquid crystal layer 1108 that places in the second pixel electrode portion 1230, in reflector space 1128, form a plurality of zones.
Figure 22 is a LCD planimetric map according to another embodiment of the present invention, and Figure 23 is the sectional view of Figure 22 along XIII-XIII ' line.
In the present embodiment, except first numerous zones with groove and the second numerous zone with structure the grooves as Figure 20 and Figure 21 embodiment, the therefore detailed description of omitting its repeating part.
LCD comprises top substrate 1170, lower substrate 1180 and liquid crystal layer 1108.
Second numerous zones are set with grooves 1138 in the external coating 1105 corresponding to the reflector space 1128 of lower substrate 1180.Preferably, second numerous zones are identical with groove 1132e size with first numerous zones with groove 1138 sizes.
Numerous zones, place on the insulation course 1114 corresponding to first numerous zone groove 1132e with protruding 1134e.
Thereby, adjust described first numerous zones with groove 1132e and described second numerous zones groove 1138 sizes, to adjust liquid crystal arrangement in the described liquid crystal layer 1108.
Picture display of the present invention forms vertical orientated (also comprise be not parallel to substrate and with the orientation of substrate formation certain angle) and numerous zone, not only can improve image quality, and according to circumstances can omit friction process.
And LCD comprises that numerous zones with groove and numerous zones projection, form numerous zones in liquid crystal layer, improves the visual angle.
And, between the first transparency electrode portion and the second transparency electrode portion, and the second transparency electrode portion and the second pixel electrode portion between produce electric distortion, to adjust liquid crystal arrangement, improve the visual angle.
And, simplified color filter substrate and LCD manufacturing process, reduce manufacturing expense.
The above is the preferred embodiments of the present invention only, is not limited to the present invention, and for a person skilled in the art, the present invention can have various changes and variation.Within the spirit and principles in the present invention all, any modification of being done, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (21)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR200400701 | 2004-01-06 | ||
| KR1020040000701A KR100989350B1 (en) | 2004-01-06 | 2004-01-06 | Display device and forming method thereof |
| KR2004-00701 | 2004-01-06 | ||
| KR1020040013337A KR101208723B1 (en) | 2004-02-27 | 2004-02-27 | Color filter substrate, liquid crystal display apparatus having the same and method of manufacturing the same |
| KR2004-13337 | 2004-02-27 | ||
| KR200413337 | 2004-02-27 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
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| CNB2005100001965A Division CN100428014C (en) | 2004-01-06 | 2005-01-06 | Display substrate, display, color filter substrate, liquid crystal display, and manufacturing method |
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| Publication Number | Publication Date |
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| CN101196666A CN101196666A (en) | 2008-06-11 |
| CN101196666B true CN101196666B (en) | 2011-03-09 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2012519887A (en) * | 2009-03-09 | 2012-08-30 | ピクセル チー コーポレイション | Backlight recirculation in transflective liquid crystal displays. |
| TWI413831B (en) * | 2009-03-09 | 2013-11-01 | Pixel Qi Corp | Normally black transflective liquid crystal displays |
| KR101097337B1 (en) | 2010-03-05 | 2011-12-21 | 삼성모바일디스플레이주식회사 | Organic light emitting display |
| KR101146988B1 (en) | 2010-05-04 | 2012-05-22 | 삼성모바일디스플레이주식회사 | Organic light emitting display device |
| KR101714539B1 (en) | 2010-08-24 | 2017-03-23 | 삼성디스플레이 주식회사 | Organic light emitting display device |
| KR20120035039A (en) | 2010-10-04 | 2012-04-13 | 삼성모바일디스플레이주식회사 | Organic light emitting display |
| KR20120124224A (en) | 2011-05-03 | 2012-11-13 | 삼성디스플레이 주식회사 | Organic light emitting display apparatus |
| KR102399416B1 (en) * | 2015-05-26 | 2022-05-18 | 삼성디스플레이 주식회사 | Organic light emitting diode display |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1430089A (en) * | 2001-12-15 | 2003-07-16 | 三星Sdi株式会社 | Reflection color liquid crystal display (LCD) |
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| JP3875125B2 (en) * | 2001-04-11 | 2007-01-31 | シャープ株式会社 | Liquid crystal display |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1430089A (en) * | 2001-12-15 | 2003-07-16 | 三星Sdi株式会社 | Reflection color liquid crystal display (LCD) |
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| JP特开2003-186030A 2003.07.03 |
| JP特开2003-318385A 2003.11.07 |
Also Published As
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| KR100989350B1 (en) | 2010-10-25 |
| CN101196666A (en) | 2008-06-11 |
| KR20050072310A (en) | 2005-07-11 |
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