CN101106180B - Image display system - Google Patents
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- CN101106180B CN101106180B CN2006100915716A CN200610091571A CN101106180B CN 101106180 B CN101106180 B CN 101106180B CN 2006100915716 A CN2006100915716 A CN 2006100915716A CN 200610091571 A CN200610091571 A CN 200610091571A CN 101106180 B CN101106180 B CN 101106180B
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Abstract
Description
技术领域technical field
本发明涉及一种影像显示系统,特别涉及一种具有串联式有机电致发光二极管的影像显示系统。The invention relates to an image display system, in particular to an image display system with serial organic electroluminescent diodes.
背景技术Background technique
近年来,随着电子产品发展技术的进步及其日益广泛的应用,如移动电话、PDA及笔记本型计算机的问市,使得与传统显示器相比具有较小体积及电力消耗特性的平面显示器的需求与日俱增,成为目前最重要的电子应用产品之一。在平面显示器当中,由于有机电致发光件具有自发光、高亮度、广视角、高应答速度及容易制备等特性,使得有机电致发光件无疑的将成为下一代平面显示器的最佳选择。In recent years, with the advancement of electronic product development technology and its increasingly wide application, such as the advent of mobile phones, PDAs and notebook computers, the demand for flat-panel displays with smaller volume and power consumption characteristics compared with traditional displays Increasing day by day, become one of the most important electronic application products at present. Among flat-panel displays, organic electroluminescent devices will undoubtedly become the best choice for next-generation flat-panel displays due to their characteristics of self-luminescence, high brightness, wide viewing angle, high response speed, and easy fabrication.
有机电致发光件为使用有机层作为主动层(active layer)的发光二极管,近年来已渐渐使用于平面面板显示器(flat panel display)上。开发出具有高发光效率及长使用寿命的有机电致发光器件是目前平面显示技术的主要趋势之一。Organic electroluminescent devices are light-emitting diodes that use organic layers as active layers, and have been gradually used in flat panel displays in recent years. The development of organic electroluminescent devices with high luminous efficiency and long service life is one of the main trends of flat panel display technology at present.
近年来,为进一步增加有机电致发光器件单一画素的亮度及达到全彩色化的目的,一种称为串联式(tandem)有机电致发光装置在业界所提出。串联式有机电致发光装置,顾名思义即为将多个有机发光二极管(organic lightemitting doide、OLED)垂直堆叠,以串联方式连接在一起,并以单一电源驱动。In recent years, in order to further increase the brightness of a single pixel of an organic electroluminescent device and achieve full colorization, a tandem organic electroluminescent device has been proposed in the industry. The tandem organic electroluminescence device, as its name implies, is to vertically stack a plurality of organic light emitting diodes (OLEDs), connect them in series, and drive them with a single power source.
请参照图1,其显示常规串联式有机电致发光装置10剖面结构的示意图。该常规串联式有机电致发光装置10包含第一有机发光二极管20及堆叠于该第有机发光二极管20之上的第二有机发光二极管30,其中,该第一有机发光二极管20依序包含第一电极21、第一有机材料层22、连接电极23,而该第二有机发光二极管30则以该连接电极23作为下电极,并依序包含第二有机材料层32及第二电极33。值得注意的是,该连接电极23作为该第一有机发光二极管20的上电极,并作为该第二有机发光二极管30的下电极。Please refer to FIG. 1 , which shows a schematic diagram of a cross-sectional structure of a conventional tandem organic
在串联式(tandem)有机电致发光装置的研究及开发展上,最大的挑战即在于如何研发出有效的连接电极结构,其设置于相邻的发光单元之间,以便使电流可顺利地流经而不受实质界面的能垒所阻碍。In the research and development of tandem organic electroluminescent devices, the biggest challenge is how to develop an effective connection electrode structure, which is arranged between adjacent light-emitting units, so that the current can flow smoothly. without being hindered by the energy barrier of the substantial interface.
目前常规的连接电极的结构及形成方式列举并讨论如下:The structures and formation methods of conventional connecting electrodes are listed and discussed as follows:
Forrest,S.R.等人(Science1997,276,2009;J.App.Phys.1999,86,4067;J.App.Phys.1999,864076)第一次提出串联式有机电致发光结构(tandemOLED’s structure)概念,其用来作为连接电极的是ITO,其方法为在完成第一有机发光二极管之有机材料层后,利用溅镀的方式形成ITO电极于该第一有机发光二极管的有机材料层上,接着再形成第二有机发光二极管的有机材料层及电极层于ITO电极之上。然而,在溅镀形成ITO透明导电层的过程中,由于作为衬层(under layer)的有机材料层会受到靶材所射出的离子轰击,进而使得有机材料层表面氧化、变质、或使原本的平整度被破坏,因而使得透明阴极与有机材料层之间的异质界面的能垒增加,导致电荷载体不易由透明阴极进入至有机材料层而在界面产生累积,如此一来,将导致器件操作电压的上升及器件寿命下降。Forrest, S.R. et al. (Science1997, 276, 2009; J.App.Phys.1999, 86, 4067; J.App.Phys.1999, 864076) first proposed the concept of tandem OLED's structure , which is used as the connecting electrode is ITO, and the method is to form an ITO electrode on the organic material layer of the first organic light emitting diode by sputtering after completing the organic material layer of the first organic light emitting diode, and then The organic material layer and the electrode layer of the second organic light emitting diode are formed on the ITO electrode. However, in the process of forming the ITO transparent conductive layer by sputtering, since the organic material layer as the under layer will be bombarded by the ions emitted by the target, the surface of the organic material layer will be oxidized, deteriorated, or the original The flatness is destroyed, thus increasing the energy barrier of the heterogeneous interface between the transparent cathode and the organic material layer, making it difficult for charge carriers to enter the organic material layer from the transparent cathode and accumulate at the interface, which will lead to device operation Voltage increases and device life decreases.
Howard,W.E.and Jones,G.W等人(US专利6337492B1)则利用Mg:Ag/IZO的复合结构作为连接电极,其作法为在完成第一有机发光二极管之有机材料层后,利用溅镀的方式依序形成Mg:Ag电极层及IZO电极层,接着再形成第二有机发光二极管的有机材料层及电极层于IZO电极。Howard利用Mg:Ag/IZO的复合结构有利于电荷载体的传输,然而,由于仍利用溅镀的方式形成连接电极,所以仍会伤害到作为衬层的有机材料层。Howard, W.E.and Jones, G.W et al. (US Patent 6337492B1) used the composite structure of Mg:Ag/IZO as the connection electrode. After completing the organic material layer of the first organic light-emitting diode, the method was sputtered according to the method. The Mg:Ag electrode layer and the IZO electrode layer are formed sequentially, and then the organic material layer and the electrode layer of the second organic light emitting diode are formed on the IZO electrode. Howard uses the composite structure of Mg:Ag/IZO to facilitate the transport of charge carriers. However, since the connecting electrodes are still formed by sputtering, the organic material layer as the lining layer will still be damaged.
Kido,J等人(SID03Digest2003,34,979)则利用Cs:Bphen/V2O5作为连接电极结构,其作法为在完成第一有机发光二极管的有机材料层后,利用溅镀的方式依序形成Cs:Bphen电极层及V2O5电极层接着再形成第二有机发光二极管的有机材料层及电极层于V2O5电极。所得的器件其器件效率为单一层器件结构的2倍。然而,Cs及Bphen原料成本高,此串联式有机发光二极管不易量产。此外,Cs极易在蒸镀的过程中氧化。Kido, J et al. (SID03Digest2003, 34, 979) used Cs:Bphen/V 2 O 5 as the connection electrode structure, and the method was to use sputtering sequentially after completing the organic material layer of the first organic light-emitting diode. Forming the Cs:Bphen electrode layer and the V 2 O 5 electrode layer and then forming the organic material layer and the electrode layer of the second organic light emitting diode on the V 2 O 5 electrode. The obtained device has a device efficiency twice that of a single-layer device structure. However, the Cs and Bphen raw material costs are high, and the tandem OLED is not easy to mass-produce. In addition, Cs is easily oxidized during the evaporation process.
Tang,C.W.等人(Appl.Phys.Lett.2004,84,167)则利用Alq:Li(或TPBI:Li)/NPB:FeCl3作为连接电极结构,其作法为在完成第一有机发光二极管的有机材料层后,利用蒸镀的方式形成Alq:Li(或TPBI:Li)层,并接着形成NPB:FeCl3电极层,接着再形成第二有机发光二极管的有机材料层及电极层于NPB:FeCl3电极层上。所得的器件其器件效率为单一层器件结构的2倍。然而,其缺点在于Li掺杂(doping)时浓度控制不易,且Li易在蒸镀时氧化成Li2O。Tang, CW et al. (Appl. Phys. Lett. 2004, 84, 167) used Alq:Li (or TPBI:Li)/NPB:FeCl 3 as the connection electrode structure, and the method was to complete the first organic light-emitting diode After the organic material layer, form an Alq:Li (or TPBI:Li) layer by vapor deposition, and then form an NPB: FeCl electrode layer, and then form an organic material layer and an electrode layer of the second organic light-emitting diode on the NPB: FeCl 3 electrode layer. The obtained device has a device efficiency twice that of a single-layer device structure. However, its disadvantages are that it is not easy to control the concentration during Li doping, and Li is easily oxidized to Li 2 O during evaporation.
Chen,C.H.等人(Jpn J.Appl.Phys.2004,43,6418)利用Alq:Mg/WO3作为连接电极结构,其作法为在完成第一有机发光二极管的有机材料层后,利用蒸镀的方式依序形成Alq:Mg/WO3,接着再形成第二有机发光二极管的有机材料层及电极层于WO3上,其器件效率为单一层器件结构的4倍。但其缺点为会导致色移(color shift)的情形发生。Chen, CH et al. (Jpn J.Appl.Phys.2004, 43, 6418) used Alq:Mg/WO 3 as the connection electrode structure, which was done by vapor deposition after completing the organic material layer of the first organic light-emitting diode. Alq:Mg/WO 3 is sequentially formed in the same way, and then the organic material layer and electrode layer of the second organic light-emitting diode are formed on WO 3 , and the device efficiency is 4 times that of a single-layer device structure. But its disadvantage is that it will cause color shift.
Tsutsui,T等人(Curr.Appl.Phys.2005,5,341)利用Alq:Mg/V2O5作为连接电极结构,其作法为在完成第一有机发光二极管的有机材料层后,利用溅镀的方式依序形成Alq:Mg电极层及V2O5电极层接着再形成第二有机发光二极管的有机材料层及电极层于V2O5电极上。所得器件的器件效率为单一层器件结构的2倍。Tsutsui, T et al. (Curr.Appl.Phys.2005, 5, 341) used Alq:Mg/V 2 O 5 as the connection electrode structure, which was done by sputtering after the organic material layer of the first organic light-emitting diode was completed. The Alq:Mg electrode layer and the V 2 O 5 electrode layer are sequentially formed in this manner, and then the organic material layer and the electrode layer of the second organic light emitting diode are formed on the V 2 O 5 electrode. The device efficiency of the obtained device is twice that of a single-layer device structure.
Kwok,H.S.等人(Appl.Phys.Lett.2005,87,093504)利用LiF/Ca/Ag(或Au)作为连接电极结构,其作法为在完成第一有机发光二极管的有机材料层后,利用蒸镀法依序形成LiF、Ca、及Ag电极层,接着再形成第二有机发光二极管的有机材料层及电极层于Ag电极上。所得器件的器件效率为单一层器件结构的1.9倍。然而,其缺点在于Ca极易氧化。Kwok, H.S. et al. (Appl. Phys. Lett. 2005, 87, 093504) used LiF/Ca/Ag (or Au) as the connection electrode structure, and the method was to use The evaporation method forms LiF, Ca, and Ag electrode layers in sequence, and then forms the organic material layer and electrode layer of the second organic light emitting diode on the Ag electrode. The device efficiency of the obtained device is 1.9 times that of a single-layer device structure. However, its disadvantage is that Ca is extremely easily oxidized.
有鉴于此,发展出新颖的串联式有机电致发光装置的连接电极结构,以克服常规技术所产生的问题,是目前串联式有机电致发光装置技术的一项重要课题。In view of this, developing a novel connecting electrode structure of the tandem organic electroluminescent device to overcome the problems caused by the conventional technology is an important subject of the current tandem organic electroluminescent device technology.
发明内容Contents of the invention
有鉴于此,本发明的目的为提供一种具有有机电致发光二极管的影像显示系统,其具有新颖的复合电极结构(或连接电极结构),可增加有机电致发光二极管(或串联式电致发光二极管)的发光效率,且可避免色移(color shift)的情形,符合目前平面显示器市场的需求。In view of this, the object of the present invention is to provide an image display system with organic electroluminescent diodes, which has a novel composite electrode structure (or connection electrode structure), which can increase the organic electroluminescent diode (or series electroluminescent The luminous efficiency of the light-emitting diode) and the situation of avoiding color shift (color shift) can be avoided, which meets the demand of the current flat-panel display market.
为达成本发明目的,本发明的优选实施例为提供影像显示系统,该影像显示系统包含电致发光二极管,该电致发光二极管具有复合电极结构,其中该复合电极结构包含:具有碱金属或碱土金属化合物的膜层,其中该碱金属或碱土金属化合物具有羰基或氟;以及金属氧化物层或半导体化合物层。In order to achieve the object of the present invention, the preferred embodiment of the present invention provides an image display system, the image display system includes an electroluminescent diode, and the electroluminescent diode has a composite electrode structure, wherein the composite electrode structure includes: a film layer of a metal compound, wherein the alkali metal or alkaline earth metal compound has a carbonyl group or fluorine; and a metal oxide layer or a semiconductor compound layer.
此外,根据本发明另一优选实施例,该影像显示系统包含串联式电致发光二极管,而该电致发光二极管包含:第一电极、第二电极、多个有机电致发光单元、以及至少一个连接电极结构。其中,该多个有机电致发光单元形成于该第一电极及该第二电极之间,且该连接电极结构设置于任意两相邻的有机电致发光单元之间。其中,该连接电极结构包含:具有碱金属或碱土金属化合物的膜层,其中该碱金属或碱土金属化合物具有羰基或氟基,以及金属氧化物层或半导体化合物层。In addition, according to another preferred embodiment of the present invention, the image display system includes a tandem electroluminescent diode, and the electroluminescent diode includes: a first electrode, a second electrode, a plurality of organic electroluminescent units, and at least one Connect the electrode structure. Wherein, the plurality of organic electroluminescent units are formed between the first electrode and the second electrode, and the connecting electrode structure is arranged between any two adjacent organic electroluminescent units. Wherein, the connection electrode structure includes: a film layer having an alkali metal or alkaline earth metal compound, wherein the alkali metal or alkaline earth metal compound has a carbonyl group or a fluorine group, and a metal oxide layer or a semiconductor compound layer.
为使本发明上述目的、特征能更明显易懂,下文特举优选实施例,并配合附图,作详细说明如下:In order to make the above-mentioned object and features of the present invention more obvious and easy to understand, the preferred embodiments are specifically cited below, and in conjunction with the accompanying drawings, the detailed description is as follows:
附图说明Description of drawings
图1为示出常规串联式有机电致发光装置的剖面结构示意图。FIG. 1 is a schematic diagram showing a cross-sectional structure of a conventional tandem organic electroluminescent device.
图2为示出本发明优选实施所述的包含复合电极结构的一般有机电致发光二极管的示意图。FIG. 2 is a schematic diagram showing a general organic electroluminescent diode including a composite electrode structure according to a preferred embodiment of the present invention.
图3示出本发明优选实施例所述的串联式电致发光二极管。Figure 3 shows the series-connected electroluminescent diodes according to the preferred embodiment of the present invention.
图4示出本发明另一优选实施例所述的串联式电致发光二极管。FIG. 4 shows a series-connected electroluminescent diode according to another preferred embodiment of the present invention.
图5为示出本发明实施例1~4及比较实施例1所述的电致发光二极管的操作电压与电流密度关系的图。5 is a graph showing the relationship between the operating voltage and the current density of the electroluminescent diodes described in Examples 1-4 and Comparative Example 1 of the present invention.
图6为示出本发明实施例1~4及比较实施例1所述的电致发光二极管的电流密度与亮度关系的图。6 is a graph showing the relationship between current density and luminance of the electroluminescent diodes described in Examples 1 to 4 and Comparative Example 1 of the present invention.
图7为示出本发明实施例1~4及比较实施例1所述的电致发光二极管的电流密度与发光效率关系的图。7 is a graph showing the relationship between the current density and luminous efficiency of the electroluminescent diodes described in Examples 1 to 4 and Comparative Example 1 of the present invention.
图8为示出本发明实施例5~7及比较实施例2所述的电致发光二极管的操作电压与电流密度关系的图。8 is a graph showing the relationship between the operating voltage and the current density of the electroluminescent diodes described in Examples 5-7 and Comparative Example 2 of the present invention.
图9为示出本发明实施例5~7及比较实施例2所述的电致发光二极管的电流密度与亮度关系的图。9 is a graph showing the relationship between current density and luminance of the electroluminescent diodes described in Examples 5 to 7 and Comparative Example 2 of the present invention.
图10为示出本发明实施例5~7及比较实施例2所述的电致发光二极管的电流密度与发光效率关系的图。10 is a graph showing the relationship between the current density and the luminous efficiency of the electroluminescent diodes described in Examples 5 to 7 and Comparative Example 2 of the present invention.
图11为示出本发明实施例5~7及比较实施例2所述的电致发光二极管的强度与发光波长关系的图。11 is a graph showing the relationship between the intensity and the emission wavelength of the electroluminescent diodes described in Examples 5 to 7 and Comparative Example 2 of the present invention.
图12为示出本发明所述的影像显示系统的构造示意图。FIG. 12 is a schematic diagram showing the structure of an image display system according to the present invention.
【主要器件符号说明】【Description of main device symbols】
常规串联式有机电致发光装置~10;第一有机发光二极管~20;第二有机发光二极管~30;第一电极~21;第一有机材料层~22;连接电极~23;第二有机材料层~32;第二电极~33;一般有机电致发光二极管(单一发光单元结构)~100;基板~110;阳极~120;有机电致发光单元~130;发光层~131;空穴注入层~132;空穴传输层~133;电子传输层~134;电子注入层~135;复合电极结构~140;具有碱金属或碱土金属化合物的膜层~142;金属氧化物层或半导体化合物层~144;串联式电致发光二极管~200;基板~210;阳极~220;第一有机电致发光单元~230;发光层~231;空穴注入层~232;空穴传输层~233;电子传输层~234;电子注入层~235;连接电极结构~240;具有碱金属或碱土金属化合物的膜层~242;金属氧化物层或半导体化合物层~244;金属层~246;第二有机电致发光单元~250;阴极~260;串联式电致发光二极管~300。Conventional tandem organic electroluminescent device ~ 10; first organic light emitting diode ~ 20; second organic light emitting diode ~ 30; first electrode ~ 21; first organic material layer ~ 22; connecting electrode ~ 23; second organic material Layer ~ 32; second electrode ~ 33; general organic electroluminescent diode (single light-emitting unit structure) ~ 100; substrate ~ 110; anode ~ 120; organic electroluminescent unit ~ 130; light-emitting layer ~ 131; hole injection layer ~132; hole transport layer ~133; electron transport layer ~134; electron injection layer ~135; composite electrode structure ~140; film layer with alkali metal or alkaline earth metal compound ~142; metal oxide layer or semiconductor compound layer ~ 144; serial electroluminescent diode ~ 200; substrate ~ 210; anode ~ 220; first organic electroluminescent unit ~ 230; light emitting layer ~ 231; hole injection layer ~ 232; hole transport layer ~ 233; electron transport layer~234; electron injection layer~235; connecting electrode structure~240; film layer~242 with alkali metal or alkaline earth metal compound; metal oxide layer or semiconductor compound layer~244; metal layer~246; Light emitting unit ~ 250; cathode ~ 260; series electroluminescent diode ~ 300.
具体实施方式Detailed ways
本发明提供一种新颖的复合电极结构,其可作为一般有机电致发光二极管(单一发光单元结构)的阴极电极或阳极电极,或是串联式有机电致发光二极管的连接电极结构,可增加有机电致发光二极管(或串联式电致发光二极管)的发光效率,且可避免色移(color shift)的情形。The present invention provides a novel composite electrode structure, which can be used as the cathode electrode or anode electrode of a general organic electroluminescent diode (single light-emitting unit structure), or the connection electrode structure of a series organic electroluminescent diode, which can increase the The luminous efficiency of electroluminescent diodes (or series electroluminescent diodes) can be improved, and the situation of color shift can be avoided.
请参照图2,其示出以本发明所述的复合电极结构作为阴极的一般有机电致发光二极管(单一发光单元结构)100。该单一发光单元结构的有机电致发光器件100包括基板110,例如:玻璃、陶瓷、塑料基板或是半导体基板。该基板可视需要加以选用,亦即若要形成上发光式(top-emission)有机电致发光器件,则该基板亦可为不透明基板:此外,如要形成下发光或两面发光式有机电致发光器件,则该基板可为透明基板。阳极120形于该基板110之上表面。该阳极可为透明电极、金属电极或是复合电极,其材料例如可选自锂、镁、钙、铝、银、铟、金、钨、镍、铂、上述元素所形成的合金、铟锡氧化物(ITO)、铟锌氧化物(IZO)、锌铝氧化物(AZO)、氧化锌(ZnO)或其结合,而其形成方式可为热蒸镀、溅射或等离子强化式化学气相沉积方式。Please refer to FIG. 2 , which shows a general organic electroluminescent diode (single light-emitting unit structure) 100 using the composite electrode structure of the present invention as a cathode. The
接着,有机电致发光单元130形成于该阳极120之上。该有机电致发光单元130至少包含发光层131(light emitting layer),且还可包含空穴注入层132、空穴传输层133、电子传输层134、及电子注入层135。该有机电致发光单元130的各膜层可分别为小分子有机电致发光材料或高分子有机电致发光材料,若为小分子有机发光二极管材料,可利用真空蒸镀方式形成有机发光二极管材料层;若为高分子有机发光二极管材料,则可使用旋涂、喷墨或网版印刷等方式形成有机发光二极管材料层。此外,该发光层131可包含有机电致发光材料及掺杂物(dopant),本领域技术人员可视所使用的有机电致发光材料及所需的器件特性而改变所搭配的掺杂物的掺杂量。因此,掺杂物之掺杂量的多少不是本发明的特征,不是限制本发明范围的依据。该掺杂物可为能量传移(energy transfer)型掺杂材料或是载体捕集(carrier trapping)型掺杂材料,且该掺杂物有助于抑制该有机电致发光材料的浓度消光现象,并使器件获得高效率及高亮度。该有机电致发光材料可为荧光(fluorescence)发光材料。而在本发明的某些优选实施例中,该有机电致发光材料也可为磷光(phosphorescence)发光材料。Next, an
参照图2,本发明所述的复合电极结构140设置在该有机电致发光单元130之上,在此实施例中作为该一般有机电致发光二极管(单一发光单元结构)100的阴极。Referring to FIG. 2 , the
根据本发明优选实施例,该用于电致发光二极管的复合电极结构140,包含具有碱金属或碱土金属化合物的膜层142,以及金属氧化物层或半导体化合物层144。其中,该碱金属或碱土金属化合物具有羰基或氟。该碱金属或碱土金属化合物可为含Li、Na、K、Rb、Cs、Be、Mg、Ca、Sr、或Ba的氟化物,在本发明之一系列的实施例中,该碱金属或碱土金属化合物为NaF、KF、RbF、CsF、BeF2、MgF2、CaF2、SrF2、或BaF2。该碱金属或碱土金属化合物可为含Na、K、Rb、Cs、Be、Mg、Ca、Sr、或Ba的羰基化合物,在本发明的一系列的实施例中,该碱金属或碱土金属化合物为Li2CO3、LiCO3、Na2CO3、NaCO3、K2CO3、KCO3、Rb2CO3、RbCO3、Cs2CO3、CsCO3、BeCO、BeCO3、MgCO、MgCO3、CaO、Ca2CO3、CaCO3、SrCO、SrCO3、BaCO或BaCO3。值得注意的是,该具有碱金属或碱土金属化合物的膜层,可进一步掺杂有电子传输材料(electron transport material),该电子传输材料可为常规任何的电子传输材料,例如为Alq3、BeBq2、TPBI、PBD、或TAZ。According to a preferred embodiment of the present invention, the
该金属氧化物层包含过渡金属氧化物,其中该过渡金属氧化物为IB族、IIB族、IVB族、VB族、或VIIIB族金属的氧化物、Cr的氧化物、或W的氧化物。优选为V、或W的氧化物,在本发明的一系列的实施例中,该金属氧化物层可包括WO、W2O3、WO2、WO3、W2O5、VO、V2O3、VO2、或V2O5。The metal oxide layer includes a transition metal oxide, wherein the transition metal oxide is an oxide of a Group IB, Group IIB, Group IVB, Group VB, or Group VIIIB metal, an oxide of Cr, or an oxide of W. It is preferably an oxide of V or W. In a series of embodiments of the present invention, the metal oxide layer may include WO, W 2 O 3 , WO 2 , WO 3 , W 2 O 5 , VO, V 2 O 3 , VO 2 , or V 2 O 5 .
该半导体化合物层包含Si、Ge、GaAs、SiC、或SiGe的半导体层。根据本发明优选实施例,该半导体化合物层为未掺杂的半导体化合物层。此外,根据本发明另一优选实施例,该半导体化合物层为掺杂P型元素或N型元素的半导体化合物层,其中该P型元素可例如为硼,而N型元素可例如为磷、砷、或锑。The semiconductor compound layer includes a semiconductor layer of Si, Ge, GaAs, SiC, or SiGe. According to a preferred embodiment of the present invention, the semiconductor compound layer is an undoped semiconductor compound layer. In addition, according to another preferred embodiment of the present invention, the semiconductor compound layer is a semiconductor compound layer doped with P-type elements or N-type elements, wherein the P-type elements can be, for example, boron, and the N-type elements can be, for example, phosphorus, arsenic , or antimony.
请参照图3,示出本发明一个优选实施例所述的串联式电致发光二极管200,在此以具有两个有机电致发光单元的串联式电致发光二极管为例。根据本发明精神,本发明所述的串联式电致发光二极管200也可包含两个以上的有机电致发光单元。该串联式电致发光二极管200包括基板210,例如:玻璃、陶瓷、塑料基板或是半导体基板。该基板210可视需要加以选用,亦即如要形成上发光式(top-emission)有机电致发光器件,则该基板也可为不透明基板:此外,如要形成下发光或两面发光式有机电致发光器件,则该基板可为透明基板。阳极220形于该基板210的上表面上。该阳极可为透明电极、金属电极或是复合电极,其材料可例如为选自锂、镁、钙、铝、银、铟、金、钨、镍、铂、上述元素所形成的合金、铟锡氧化物(ITO)、铟锌氧化物(IZO)、锌铝氧化物(AZO)、氧化锌(ZnO)或其结合,而其形成方式可为热蒸镀、溅射或等离子强化式化学气相沉积方式。Please refer to FIG. 3 , which shows a
接着,第一有机电致发光单元230形成于该阳极220之上。该有机电致发光单元230至少包含发光层231(light emitting layer),且更可包含空穴注入层232、空穴传输层233、电子传输层234、及电子注入层235。该第一有机电致发光单元230的各膜层可分别为小分子有机电致发光材料或高分子有机电致发光材料,若为小分子有机发光二极管材料,可利用真空蒸镀方式形成有机发光二极管材料层;若为高分子有机发光二极管材料,则可使用旋涂、喷墨或网版印刷等方式形成有机发光二极管材料层。此外,该发光层231可包含有机电致发光材料及掺杂物(dopant),本领域技术人员可视所使用的有机电致发光材料及所需的器件特性而改变所搭配的掺杂物的掺杂量。因此,掺杂物的掺杂量的多少不是本发明的必要特征,不是限制本发明范围的依据。该掺杂物可为能量传移(energy transfer)型掺杂材料或是载体捕集(carriertrapping)型掺杂材料,且该掺杂物有助于抑制该有机电致发光材料的浓度消光现象,并使器件获得高效率及高亮度。该有机电致发光材料可为荧光(fluorescence)发光材料。而在本发明的某些优选实施例中,该有机电致发光材料也可为磷光(phosphorescence)发光材料。Next, the first
仍参照图3,连接电极结构240设置在该第一有机电致发光单元230之上。其中,该用于串联式电致发光二极管200的连接电极结构240,包含具有碱金属或碱土金属化合物的膜层242,以及金属氧化物层或半导体化合物层244。其中,该碱金属或碱土金属化合物具有羰基或氟。该碱金属或碱土金属化合物可为含Li、Na、K、Rb、Cs、Be、Mg、Ca、Sr、或Ba的氟化物,在本发明的一系列的实施例中,该碱金属或碱土金属化合物为NaF、KF、RbF、CsF、BeF2、MgF2、CaF2、SrF2、或BaF2。该碱金属或碱土金属化合物系可为含Na、K、Rb、Cs、Be、Mg、Ca、Sr、或Ba的羰基化合物,在本发明的一系列的实施例中,该碱金属或碱土金属化合物为Li2CO3、LiCO3、Na2CO3、NaCO3、K2CO3、KCO3、Rb2CO3、RbCO3、Cs2CO3、CsCO3、BeCO、BeCO3、MgCO、MgCO3、CaO、Ca2CO3、CaCO3、SrCO、SrCO3、BaCO或BaCO3。Still referring to FIG. 3 , the
值得注意的是,该具有碱金属或碱土金属化合物的膜层,可进一步掺杂有电子传输材料(electron transport material),该电子传输材料可为常规的任何电子传输材料,例如为Alq3、BeBq2、TPBI、PBD、或TAZ。It is worth noting that the film layer with alkali metal or alkaline earth metal compound can be further doped with an electron transport material (electron transport material), and the electron transport material can be any conventional electron transport material, such as Alq 3 , BeBq 2. TPBI, PBD, or TAZ.
该金属氧化物层包含过渡金属氧化物,其中该过渡金属氧化物为IB族、IIB族、IVB族、VB族、或VIIIB族金属的氧化物、Cr的氧化物、或W的氧化物。优选为V、或W的氧化物,在本发明的一系列的实施例中,该金属氧化物层可包括WO、W2O3、WO2、WO3、W2O5、VO、V2O3、VO2、或V2O5。The metal oxide layer includes a transition metal oxide, wherein the transition metal oxide is an oxide of a Group IB, Group IIB, Group IVB, Group VB, or Group VIIIB metal, an oxide of Cr, or an oxide of W. It is preferably an oxide of V or W. In a series of embodiments of the present invention, the metal oxide layer may include WO, W 2 O 3 , WO 2 , WO 3 , W 2 O 5 , VO, V 2 O 3 , VO 2 , or V 2 O 5 .
该半导体化合物层包含Si、Ge、GaAs、SiC、或SiGe的半导体层。根据本发明一优选实施例,该半导体化合物层为未掺杂的半导体化合物层。此外,根据本发明另一优选实施例,该半导体化合物层为掺杂P型元素或N型元素的半导体化合物层,其中该P型元素可例如为硼,而N型元素可例如为磷、砷、或锑。The semiconductor compound layer includes a semiconductor layer of Si, Ge, GaAs, SiC, or SiGe. According to a preferred embodiment of the present invention, the semiconductor compound layer is an undoped semiconductor compound layer. In addition, according to another preferred embodiment of the present invention, the semiconductor compound layer is a semiconductor compound layer doped with P-type elements or N-type elements, wherein the P-type elements can be, for example, boron, and the N-type elements can be, for example, phosphorus, arsenic , or antimony.
接着,第二有机电致发光单元250形成于该连接电极结构240之上。该第二有机电致发光单元250至少包含发光层231(light emitting layer),且更可包含空穴注入层232、空穴传输层233、电子传输层234、及电子注入层235。最后,形成阴极260于该第二有机电致发光单元250之上。值得注意的是,该多个有机电致发光单元可具有相同光色的激发光,例如,红、蓝、绿光;此外,该多个有机电致发光单元也可具有不同光色的激发光,以使该串联式电致发光二极管发出白光。Next, the second
此外,根据本发明的另一优选实施例,该复合电极结构或该连接电极结构,还可包含金属层。请参照图4,为本发明某一优选实施例所述的串联式电致发光二极管300,该连接电极结构240还包含金属层246,其设置在该具有碱金属或碱土金属化合物的膜层242与该金属氧化物层或半导体化合物层之间244。其中,该金属层246包含Al、Ag、Au、或其合金。In addition, according to another preferred embodiment of the present invention, the composite electrode structure or the connecting electrode structure may further include a metal layer. Please refer to FIG. 4, which is a
以下通过实施例1、实施例2及比较实施例1来说明本发明所述的有机电致发光器件各层的实际组成及本发明的优点所在。The actual composition of each layer of the organic electroluminescent device according to the present invention and the advantages of the present invention are described below through Example 1, Example 2 and Comparative Example 1.
单色电致发光二极管的制备Fabrication of monochromatic electroluminescent diodes
比较实施例1:Comparative Example 1:
使用中性清洁剂、丙酮、及乙醇以超声振荡将100nm厚的具有ITO透明电极(阳极)的玻璃基材洗净。以氮气将基材吹干,进一步以UV/臭氧清洁。接着于10-5Pa的压力下依序沉积空穴注入层、空穴传输层、电子传输层兼发光层、电子注入层、金属电极于该ITO电极上,以得到该电致发光装置(1).以下为列出各层的材料及厚度。A 100-nm-thick glass substrate having an ITO transparent electrode (anode) was cleaned by ultrasonic vibration using a neutral detergent, acetone, and ethanol. The substrate was blown dry with nitrogen and further cleaned with UV/ozone. Then, under a pressure of 10 −5 Pa, a hole injection layer, a hole transport layer, an electron transport layer and light-emitting layer, an electron injection layer, and a metal electrode are sequentially deposited on the ITO electrode to obtain the electroluminescent device (1 ). The material and thickness of each layer are listed below.
空穴注入层:厚度为20nm,材料为PEDT/PSS(聚(3,4-亚乙基二氧噻吩)聚(苯乙烯磺酸)水溶性分散体)。Hole injection layer: the thickness is 20 nm, and the material is PEDT/PSS (poly(3,4-ethylenedioxythiophene) poly(styrenesulfonic acid) water-soluble dispersion).
空穴传输层:厚度为40nm,材料为NPB(N,N′-二-1-萘基-N,N′-二苯基-1,1′-联苯基-1,1′-联苯基-4,4′-二胺)。Hole transport layer: thickness is 40nm, material is NPB (N, N'-di-1-naphthyl-N, N'-diphenyl-1,1'-biphenyl-1,1'-biphenyl base-4,4'-diamine).
电子传输层兼发光层:厚度为60nm,材料为Alq3(三(8-羟基喹啉)铝),光色为黄绿色,λmax=540nm。Electron transport layer and light-emitting layer: the thickness is 60nm, the material is Alq 3 (tris(8-quinolinol)aluminum), the light color is yellow-green, λmax=540nm.
电子注入层:厚度为1nm,材料为Cs2CO3。Electron injection layer: the thickness is 1 nm, and the material is Cs 2 CO 3 .
金属电极:厚度为100nm,材料为Al。Metal electrode: the thickness is 100nm, and the material is Al.
接着,以PR650及Minolta LS110测量该电致发光装置(1)的光学特性。请参照图5,示出该电致发光装置(1)的操作电压与电流密度的关系;图6则显示电流密度与亮度的关系;此外,图7则显示电流密度与发光效率的关系。Then, the optical characteristics of the electroluminescent device (1) were measured with PR650 and Minolta LS110. Please refer to FIG. 5, which shows the relationship between the operating voltage and current density of the electroluminescent device (1); FIG. 6 shows the relationship between current density and brightness; in addition, FIG. 7 shows the relationship between current density and luminous efficiency.
实施例1Example 1
使用中性清洁剂、丙酮、及乙醇以超声振荡将100nm厚的具有ITO透明电极(阳极)的玻璃基材洗净。以氮气将基材吹干,进一步以UV/臭氧清洁。接着于10-5Pa的压力下依序沉积空穴注入层、第一空穴传输层、电子传输层兼第一发光层、连接电极结构、第二空穴传输层、电子传输层兼第二发光层、电子注入层、金属电极于该ITO电极上,以得到该电致发光装置(2)。以下列出各层的材料及厚度。A 100-nm-thick glass substrate having an ITO transparent electrode (anode) was cleaned by ultrasonic vibration using a neutral detergent, acetone, and ethanol. The substrate was blown dry with nitrogen and further cleaned with UV/ozone. Then, under a pressure of 10 -5 Pa, the hole injection layer, the first hole transport layer, the electron transport layer and the first light-emitting layer, the connection electrode structure, the second hole transport layer, the electron transport layer and the second A light-emitting layer, an electron injection layer, and a metal electrode are placed on the ITO electrode to obtain the electroluminescent device (2). The material and thickness of each layer are listed below.
空穴注入层:厚度为20nm,材料为PEDT/PSS(聚(3,4-亚乙基二氧噻吩)聚(苯乙烯磺酸)水溶性分散体)。Hole injection layer: the thickness is 20 nm, and the material is PEDT/PSS (poly(3,4-ethylenedioxythiophene) poly(styrenesulfonic acid) water-soluble dispersion).
第一空穴传输层:厚度为40nm,材料为NPB(N,N′-二-1-萘基-N,N′-二苯基-1,1′-联苯基-1,1′-联苯基-4,4′-二胺)。The first hole transport layer: the thickness is 40nm, the material is NPB (N, N'-di-1-naphthyl-N, N'-diphenyl-1,1'-biphenyl-1,1'- biphenyl-4,4'-diamine).
电子传输层兼第一发光层:厚度为40nm,材料为Alq3(三(8-羟基喹啉)铝),光色为黄绿色,λmax=540nm。Electron transport layer and first light-emitting layer: the thickness is 40nm, the material is Alq 3 (tris(8-hydroxyquinoline)aluminum), the light color is yellow-green, λmax=540nm.
连接电极结构:该连接电极结构依序包含具有碱金属或碱土金属化合物的膜层、金属层及金属氧化物层。其中,该具有碱金属或碱土金属化合物的膜层的厚度为20nm,材料为掺杂有Cs2CO3的Alq3层,其中该Cs2CO3以及Alq3的重量比为1:4。该金属层的厚度为5nm,材料为Al。另外,该金属氧化物层的厚度为5nm,材料为MoO3。Connection electrode structure: the connection electrode structure sequentially includes a film layer with an alkali metal or alkaline earth metal compound, a metal layer and a metal oxide layer. Wherein, the thickness of the film layer with alkali metal or alkaline earth metal compound is 20nm, and the material is Alq 3 layer doped with Cs 2 CO 3 , wherein the weight ratio of Cs 2 CO 3 and Alq 3 is 1:4. The thickness of the metal layer is 5 nm, and the material is Al. In addition, the thickness of the metal oxide layer is 5 nm, and the material is MoO 3 .
第二空穴传输层:厚度为40nm,材料为NPB(N,N′-二-1-萘基-N,N′-二苯基-1,1′-联苯基-1,1′-联苯基-4,4′-二胺)。The second hole transport layer: the thickness is 40nm, the material is NPB (N,N'-di-1-naphthyl-N,N'-diphenyl-1,1'-biphenyl-1,1'- biphenyl-4,4'-diamine).
电子传输层兼第二发光层:厚度为60nm,材料为Alq3(三(8-羟基喹啉)铝),光色为黄绿色,λmax=540nm。Electron transport layer and second light-emitting layer: the thickness is 60nm, the material is Alq 3 (tris(8-hydroxyquinoline)aluminum), the light color is yellow-green, λmax=540nm.
电子注入层:厚度为1nm,材料为CsCO3。Electron injection layer: the thickness is 1 nm, and the material is CsCO 3 .
金属电极:厚度为100nm,材料为Al。Metal electrode: the thickness is 100nm, and the material is Al.
接着,以PR650及Minolta LS110测量该电致发光装置(2)的光学特性。请参照图5,示出该电致发光装置(2)的操作电压与电流密度的关系;图6则显示电流密度与亮度的关系;此外,图7则显示电流密度与发光效率的关系。Then, the optical characteristics of the electroluminescent device (2) were measured with PR650 and Minolta LS110. Please refer to FIG. 5, which shows the relationship between the operating voltage and current density of the electroluminescent device (2); FIG. 6 shows the relationship between current density and brightness; in addition, FIG. 7 shows the relationship between current density and luminous efficiency.
实施例2~4:
实施例2所述的电致发光装置(3)除了金属层的厚度调整为1nm外,其余与实施例1相同。The electroluminescence device (3) described in
实施例3所述的电致发光装置(4)除了金属层的材料改为Ag外,其余与实施例2相同。The electroluminescence device (4) described in
实施例4所述的电致发光装置(5)除了移除该金属层外,其余与实施例1相同。The electroluminescence device (5) described in Example 4 is the same as that of Example 1 except that the metal layer is removed.
请参照第5~7图,其为比较实施例1及实施例1~4一系列的光电特性对比。如图所示,亮度(brightness,在20mA/cm2时):电致发光装置(2~4)(3000cd/m2)>电致发光装置(5)(1200cd/m2)>电致发光装置(1)(700cd/m2);发光效率(efficiency,在20mA/cm2时):电致发光装置(2及4)(8.3cd/A)>电致发光装置(3)(~8cd/A)>电致发光装置(5)(5.8cd/A)>电致发光装置(1)(3.8cd/A)。Please refer to Figures 5-7, which are a series of photoelectric characteristic comparisons of Comparative Example 1 and Examples 1-4. As shown in the figure, brightness (brightness, at 20mA/cm 2 ): electroluminescent device (2~4) (3000cd/m 2 )>electroluminescent device (5) (1200cd/m 2 )>electroluminescent device Device (1) (700cd/m 2 ); luminous efficiency (efficiency, at 20mA/cm 2 ): electroluminescent device (2 and 4) (8.3cd/A) > electroluminescent device (3) (~8cd /A)>Electroluminescent device (5) (5.8cd/A)>Electroluminescent device (1) (3.8cd/A).
白光电致发光二极管的制备Fabrication of White Light Emitting Diodes
比较实施例2:Comparative Example 2:
使用中性清洁剂、丙酮、及乙醇以超声振荡将100nm厚的具有ITO透明电极(阳极)的玻璃基材洗净。以氮气将基材吹干,进一步以UV/臭氧清洁。接着于10-5Pa的压力下依序沉积空穴注入层、空穴传输层、蓝光发光层、红光发光层、电子传输层、电子注入层、金属电极于该ITO电极上,以得到该电致发光装置(6).以下列出各层的材料及厚度。A 100-nm-thick glass substrate having an ITO transparent electrode (anode) was cleaned by ultrasonic vibration using a neutral detergent, acetone, and ethanol. The substrate was blown dry with nitrogen and further cleaned with UV/ozone. Then, a hole injection layer, a hole transport layer, a blue light emitting layer, a red light emitting layer, an electron transport layer, an electron injection layer, and a metal electrode are sequentially deposited on the ITO electrode under a pressure of 10 −5 Pa to obtain the Electroluminescence device (6). The material and thickness of each layer are listed below.
空穴注入层:厚度为60nm,材料为HI-406,Idemitsu日本出光兴产的三苯基胺衍生物)。Hole injection layer: the thickness is 60nm, and the material is HI-406, a triphenylamine derivative produced by Idemitsu).
空穴传输层:厚度为20nm,材料为HT-302,日本出光兴产的三苯基胺衍生物。Hole transport layer: the thickness is 20 nm, and the material is HT-302, a triphenylamine derivative produced by Idemitsu Kogyo.
蓝发光层:厚度为10nm,材料为掺杂有BD-04(日本出光兴产的蒽(anthence)衍生物)的BH-01层(日本出光兴产的蒽(anthence)衍生物),其中该BD-04与BH-01的重量比为2.5:97.5。Blue light-emitting layer: the thickness is 10nm, and the material is a BH-01 layer (anthracene (anthence) derivative produced by Idemitsu Kogyo) doped with BD-04 (anthracene (anthence) derivative produced by Idemitsu Kogyo), wherein the The weight ratio of BD-04 to BH-01 is 2.5:97.5.
红发光层:厚度为25nm,材料为掺杂有RD-01(日本出光兴产的蒽衍生物)之BH-01层(日本出光兴产的蒽衍生物,其中该RD-01与BH-01的重量比为2.68:97.32。Red light-emitting layer: the thickness is 25nm, and the material is BH-01 layer (anthracene derivative produced by Idemitsu Kosho) doped with RD-01 (anthracene derivative produced by Idemitsu Kosho, where the RD-01 and BH-01 The weight ratio is 2.68:97.32.
电子传输层:厚度为10nm,材料为Alq3(三(8-羟基喹啉)铝)。Electron transport layer: the thickness is 10 nm, and the material is Alq 3 (tris(8-hydroxyquinoline)aluminum).
电子注入层:厚度为0.7nm,材料为LiF。Electron injection layer: the thickness is 0.7nm, and the material is LiF.
金属电极:厚度为100nm,材料为Al。Metal electrode: the thickness is 100nm, and the material is Al.
接着,以PR650及Minolta LS110测量该电致发光装置(6)的光学特性。请参照图8,示出该电致发光装置(6)的操作电压与电流密度的关系;图9则显示电流密度与亮度的关系;此外,图10则显示电流密度与发光效率的关系。Next, measure the optical characteristic of this electroluminescent device (6) with PR650 and Minolta LS110. Please refer to FIG. 8, which shows the relationship between the operating voltage and current density of the electroluminescent device (6); FIG. 9 shows the relationship between current density and brightness; in addition, FIG. 10 shows the relationship between current density and luminous efficiency.
实施例5Example 5
使用中性清洁剂、丙酮、及乙醇以超声振荡将100nm厚的具有ITO透明电极(阳极)的玻璃基材洗净。以氮气将基材吹干,进一步以UV/臭氧清洁。接着于10-5Pa的压力下依序沉积第一空穴注入层、第一空穴传输层、第一蓝光发光层、第一红光发光层、第一电子传输层、连接电极结构、第二空穴注入层、第二空穴传输层、第二蓝光发光层、第二红光发光层、第二电子传输层、电子注入层、金属电极于该ITO电极上,以得到该电致发光装置(7)。以下列出各层的材料及厚度。A 100-nm-thick glass substrate having an ITO transparent electrode (anode) was cleaned by ultrasonic vibration using a neutral detergent, acetone, and ethanol. The substrate was blown dry with nitrogen and further cleaned with UV/ozone. Next, the first hole injection layer, the first hole transport layer, the first blue light-emitting layer, the first red light-emitting layer, the first electron transport layer , the connection electrode structure, the first Two hole injection layers, a second hole transport layer, a second blue light emitting layer, a second red light emitting layer, a second electron transport layer, an electron injection layer, and a metal electrode are placed on the ITO electrode to obtain the electroluminescence device (7). The material and thickness of each layer are listed below.
第一空穴注入层:厚度为60nm,材料为HI-406。The first hole injection layer: the thickness is 60nm, and the material is HI-406.
第一空穴传输层:厚度为20nm,材料为HT-302。The first hole transport layer: the thickness is 20nm, and the material is HT-302.
第一蓝发光层:厚度为10nm,材料为掺杂有BD-04的BH-01层,其中该BD-04以及BH-01的重量比为2.5:97.5。The first blue light-emitting layer: the thickness is 10 nm, and the material is BH-01 layer doped with BD-04, wherein the weight ratio of BD-04 and BH-01 is 2.5:97.5.
第一红发光层:厚度为25nm,材料为掺杂有RD-01的BH-01层,其中该RD-01以及BH-01的重量比为2.68:97.32。The first red light-emitting layer: the thickness is 25 nm, and the material is a BH-01 layer doped with RD-01, wherein the weight ratio of RD-01 and BH-01 is 2.68:97.32.
第一电子传输层:厚度为10nm,材料为Alq3(三(8-羟基喹啉)铝)。The first electron transport layer: the thickness is 10 nm, and the material is Alq 3 (tris(8-hydroxyquinoline)aluminum).
连接电极结构:该连接电极结构依序包含具有碱金属或碱土金属化合物的膜层、金属层及金属氧化物层。其中,该具有碱金属或碱土金属化合物的膜层的厚度为20nm,材料为掺杂有Cs2CO3的Alq3层,其中该Cs2CO3以及Alq3的重量比为1:4%。该金属层的厚度为1nm,材料为Al。另外,该金属氧化物层的厚度为5nm,材料为MoO3。Connection electrode structure: the connection electrode structure sequentially includes a film layer with an alkali metal or alkaline earth metal compound, a metal layer and a metal oxide layer. Wherein, the thickness of the film layer with alkali metal or alkaline earth metal compound is 20nm, and the material is Alq 3 layer doped with Cs 2 CO 3 , wherein the weight ratio of Cs 2 CO 3 and Alq 3 is 1:4%. The thickness of the metal layer is 1 nm, and the material is Al. In addition, the thickness of the metal oxide layer is 5 nm, and the material is MoO 3 .
第二空穴注入层:厚度为50nm,材料为HI-406。The second hole injection layer: the thickness is 50nm, and the material is HI-406.
第二空穴传输层:厚度为20nm,材料为HT-302。The second hole transport layer: the thickness is 20nm, and the material is HT-302.
第二蓝发光层:厚度为10nm,材料为掺杂有BH-04的BH-01层,其中该BH-04以及BH-01的重量比为2.5:97.5。The second blue light-emitting layer: the thickness is 10 nm, and the material is the BH-01 layer doped with BH-04, wherein the weight ratio of the BH-04 and BH-01 is 2.5:97.5.
第二红发光层:厚度为25nm,材料为掺杂有RH-01的BH-01层,其中该RH-01以及BH-01的重量比为2.68:97.32。The second red light-emitting layer: the thickness is 25 nm, and the material is a BH-01 layer doped with RH-01, wherein the weight ratio of RH-01 and BH-01 is 2.68:97.32.
第二电子传输层:厚度为25nm,材料为Alq3(三(8-羟基喹啉)铝)。The second electron transport layer: the thickness is 25 nm, and the material is Alq 3 (tris(8-hydroxyquinoline)aluminum).
电子注入层:厚度为1nm,材料为Cs2CO3。Electron injection layer: the thickness is 1 nm, and the material is Cs 2 CO 3 .
金属电极:厚度为100nm,材料为Al。Metal electrode: the thickness is 100nm, and the material is Al.
接着,以PR650及Minolta LS110测量该电致发光装置(7)的光学特性。请参照图8,示出该电致发光装置(7)的操作电压与电流密度的关系;图9则显示电流密度与亮度的关系;此外,图10则显示电流密度与发光效率的关系。Then, measure the optical characteristic of this electroluminescent device (7) with PR650 and Minolta LS110. Please refer to FIG. 8, which shows the relationship between the operating voltage and current density of the electroluminescent device (7); FIG. 9 shows the relationship between current density and brightness; in addition, FIG. 10 shows the relationship between current density and luminous efficiency.
实施例6~7:
实施例6、7所述的电致发光装置(8)及(9)除了第二空穴注入层的厚度分别调整为55nm及60nm外,其余与实施例5相同。The electroluminescent devices (8) and (9) described in Examples 6 and 7 are the same as in Example 5 except that the thickness of the second hole injection layer is adjusted to 55 nm and 60 nm, respectively.
请参照第8~10图,为比较实施例2及实施例5~7一系列的光电特性比较。如图所示,亮度(brightness,在20mA/cm2时):电致发光装置(7~9)(3600cd/m2)>电致发光装置(6)(1500cd/m2);发光效率(efficiency,在20mA/cm2时):电致发光装置(9)(17.5cd/A)>电致发光装置(7)(16.9cd/A)>电致发光装置(8)(16.6cd/A)>电致发光装置(6)(8.3cd/A)。此外,请参照图11,值得注意的是,电致发光装置(7~9)所得的发光光谱的最大放射波长(λmax)与单层器件结构相同,并无色移(color shift)的情形发生。Please refer to Figures 8-10 for a series of photoelectric characteristic comparisons between Example 2 and Examples 5-7. As shown in the figure, brightness (brightness, at 20mA/cm2): electroluminescent device (7~9) (3600cd/m2) > electroluminescent device (6) (1500cd/m2); luminous efficiency (efficiency, at 20mA/cm2): electroluminescent device (9) (17.5cd/A) > electroluminescent device (7) (16.9cd/A) > electroluminescent device (8) (16.6cd/A) > electroluminescent device Lighting device (6) (8.3 cd/A). In addition, please refer to FIG. 11. It is worth noting that the maximum emission wavelength (λ max ) of the luminescence spectrum obtained by the electroluminescent device (7-9) is the same as that of the single-layer device, and there is no color shift (color shift) occur.
请参照图12,显示本发明所述的包含电致发光装置的影像显示系统的构造示意图,其中该包含电致发光装置的影像显示系统600包含显示面板400,该显示面板具有本发明所述的主动有机电致发光装置(例如图2、图3、或图4所示的电致发光二极管100、200、或300),而该显示面板400可例如为有机电致发光二极管面板。仍参照图5,该显示面板400可为电子装置的一部份(如图所示的影像显示系统600)。一般来说,该影像显示系统600包含显示面板400及输入单元500,与该显示面板连接,其中该输入单元传输信号至该显示面板,以使该显示面板显示影像。该影像显示系统600可例如为移动电话、数字相机、PDA(个人数据助理)、笔记本型计算机、桌上型计算机、电视、车用显示器、或是可携式DVD放映机。Please refer to FIG. 12 , which shows a schematic structural diagram of an image display system including an electroluminescent device according to the present invention, wherein the
虽然本发明已用优选实施例描述如上,但是其并非用于限定本发明,任何本领域熟练技术人员,在不脱离本发明之精神和范围内,可作各种变更和修改,因此本发明的保护范围应当以所附权利要求界定的范围为准。Although the present invention has been described above with preferred embodiments, it is not intended to limit the present invention. Any skilled person in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the present invention The scope of protection should be defined by the appended claims.
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| EP2436233B1 (en) | 2009-05-29 | 2016-08-10 | Semiconductor Energy Laboratory Co, Ltd. | Light-emitting element, light-emitting device, electronic device, and lighting device |
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