CN101100156A

CN101100156A - False proof structure used for card and certificate and its identifying method

Info

Publication number: CN101100156A
Application number: CN 200710025250
Authority: CN
Inventors: 罗俊仪; 虞力英; 包勇强; 邵咏秋; 陈林森; 周小红; 浦东林; 叶燕; 邵洁; 吴智华
Original assignee: SUDA WEIGE DIGITAL OPTICS CO Ltd SUZHOU; Traffic Management Research Institute of Ministry of Public Security
Current assignee: SUDA WEIGE DIGITAL OPTICS CO Ltd SUZHOU; Traffic Management Research Institute of Ministry of Public Security
Priority date: 2007-07-20
Filing date: 2007-07-20
Publication date: 2008-01-09
Anticipated expiration: 2027-07-20
Also published as: CN100565251C

Abstract

The invention discloses an anti-counterfeiting structure for a card. On the main body of the card to be anti-counterfeiting, an identification pattern composed of a grating structure is arranged. The orientations of the grating structures in the pattern area are arranged orthogonally to form a dual visual channel; the grating period of the grating structure is 300-500 nanometers, the groove depth is 50-150 nanometers, and the grating structure is filled with transparent high-refractive-index A medium layer, the thickness of the medium layer is 20-30 nanometers, and the refractive index of the medium is greater than 1.6. The pattern of the present invention has remarkable visual characteristics, is easy to identify in public places, and can conveniently and quickly identify the authenticity of the certificate; at the same time, the strict coupled wave theory is used to calculate the structural data, and the above-mentioned microstructure is produced by using electron beam or laser interference lithography technology. Advanced, highly difficult process, with extremely high safety.

Description

An anti-counterfeit structure for card and identification method thereof

技术领域technical field

本发明涉及卡证防伪技术和公众安全领域，具体涉及一种利用光栅图像实现的用于卡证的防伪结构，具有颜色转换视觉效果，可适用于公众视读识别防伪，特别适用于国家法定证件或者证卡防伪安全。The present invention relates to the fields of card anti-counterfeiting technology and public safety, in particular to an anti-counterfeiting structure for cards realized by using a grating image, which has a visual effect of color conversion, and is applicable to the public's visual recognition and anti-counterfeiting, especially for national statutory certificates Or card anti-counterfeiting security.

背景技术Background technique

目前，涉及公共安全的有效证件的假冒伪造现象日益明显，如有价证券、认证标识、法律证件及各种行业内证书等缺乏有效的、高技术的防伪与视读识别手段。At present, the counterfeiting of valid documents related to public safety is becoming more and more obvious, such as securities, certification marks, legal documents and certificates in various industries, etc. lack effective and high-tech anti-counterfeiting and visual identification means.

众多企业和相关部门正采用一些防伪技术，如二维条码、激光全息标识、防伪油墨印刷等，但是，随着这些技术的普及与广泛应用，制作方法公开化，出现了仿制相对容易，上述技术的防伪功能明显下降的问题。此外，由于射频集成电路芯片技术的发展，部分卡证采用了智能射频芯片技术，有效提高了卡证的安全性。但是，采用芯片技术的卡证的真伪需要由专业检测仪器和掌握专业技术的人员进行鉴定，防伪成本较高，检测时间长。尤其对于在流动性场合使用的通用证件，需要工作人员在普通工作环境下，快速辨别证件真伪，仅采用芯片防伪技术，显然不合适。因此，对于机动性强的证件和重要文件，需要采用识别方法简易，技术含量高的视读识别方案。Many enterprises and relevant departments are adopting some anti-counterfeiting technologies, such as two-dimensional bar codes, laser holographic markings, anti-counterfeiting ink printing, etc. However, with the popularization and wide application of these technologies, the production methods are open, and imitation is relatively easy. The anti-counterfeiting function of the mobile phone has obviously declined. In addition, due to the development of radio frequency integrated circuit chip technology, some cards adopt intelligent radio frequency chip technology, which effectively improves the security of cards. However, the authenticity of cards using chip technology needs to be identified by professional testing instruments and personnel with professional skills. The cost of anti-counterfeiting is high and the detection time is long. Especially for general-purpose certificates used in mobile occasions, it is necessary for staff to quickly identify the authenticity of the certificates in an ordinary working environment. It is obviously inappropriate to only use chip anti-counterfeiting technology. Therefore, for highly mobile certificates and important documents, it is necessary to adopt a visual-reading identification scheme with simple identification methods and high technical content.

从视读防伪识别的功能要求看，用于视读图形的技术应具有如下几个重要特点：1、易识别，尤其适合公众视觉识别；2、高技术，具有专有性、工艺难度高、专业性强，增加仿制的技术门槛；3、工业化，视读防伪的基本要求是，相对乘载物的价值，应具有较低的费用，必须是采用工业化的制造方法；4、具有隐形二线功能，有利于管理部门的鉴定和认证。From the functional requirements of visual reading anti-counterfeiting identification, the technology used for visual reading graphics should have the following important characteristics: 1. Easy to identify, especially suitable for public visual recognition; 2. High technology, proprietary, difficult process, Strong professionalism, increasing the technical threshold for imitation; 3. Industrialization, the basic requirement for visual reading anti-counterfeiting is that it should have a lower cost compared to the value of the load, and must adopt industrialized manufacturing methods; 4. Has the invisible second-line function , which is conducive to the identification and certification of the management department.

因而，寻求一种新的符合上述功能要求的视读识别防伪方案，是本领域技术人员普遍关注的问题。Therefore, it is a common concern of those skilled in the art to seek a new anti-counterfeit solution for visual-reading identification that meets the above-mentioned functional requirements.

发明内容Contents of the invention

本发明的目的是提供一种具有特殊视觉效果的图案，制作难度高，用于类似机动性应用的证件等公共安全证件的防伪，能够在普通环境下进行快速视读识别的防伪结构。The purpose of the present invention is to provide an anti-counterfeiting structure with a special visual effect pattern, which is difficult to make, and can be used for anti-counterfeiting of public safety documents such as documents similar to mobile applications, and can be quickly visually recognized in ordinary environments.

为达到上述目的，本发明采用的技术方案是：一种用于卡证的防伪结构，在待防伪的卡证本体上，设置有由光栅结构构成的标识图案，所述标识图案至少包括两种图形区域，该两种图形区域中的光栅结构的取向正交排列，构成双视觉通道；所述光栅结构的光栅周期为300～500纳米，槽形深度为50～150纳米，在光栅结构上填充有透明高折射率介质层，所述介质层的厚度为20～30纳米，介质的折射率大于1.6。In order to achieve the above purpose, the technical solution adopted by the present invention is: an anti-counterfeiting structure for cards, on the body of the card to be anti-counterfeiting, an identification pattern composed of a grating structure is provided, and the identification pattern includes at least two In the graphic area, the orientations of the grating structures in the two graphic areas are arranged orthogonally to form a dual visual channel; the grating period of the grating structure is 300-500 nanometers, the groove depth is 50-150 nanometers, and the grating structure is filled with There is a transparent high refractive index medium layer, the thickness of the medium layer is 20-30 nanometers, and the refractive index of the medium is greater than 1.6.

上述技术方案中，所述两种图形区域相互不重叠。In the above technical solution, the two kinds of graphic areas do not overlap each other.

进一步的技术方案，设有第三种图形区域，该图形区域由具有定向散射特性的微结构图形组成，构成所述微结构图形的光栅结构的线宽在0.25～10微米范围内随机变化，结构浮雕深度范围为0.15～0.35微米。A further technical solution is provided with a third graphic area, which is composed of microstructure graphics with directional scattering characteristics, the line width of the grating structure constituting the microstructure graphics varies randomly within the range of 0.25 to 10 microns, and the structure The relief depth ranges from 0.15 to 0.35 microns.

上述技术方案中，采用了具有波长选择特性的微纳光栅周期结构和具有波长复合特性的微结构作为图案的基本单元，用于制作卡证上的个性化视读识别图案。对于正交排列的两种光栅结构，通过控制光栅周期、槽形深度和填充介质的折射率，可在亚微米光栅的镜面反射(0级光)方向上获得选择性窄带宽颜色光。对于具有定向散射特性的微结构图形，图形上的微结构(定向散斑)具有波长复合特性，根据光栅衍射理论，当入射光线方向平行于散斑取向方向时，其视觉特征为透明色；当入射光线方向垂直于散斑取向方向时，其视觉特征为金属银色。改变定向散射散斑的微结构取向，可以观察到的图形随着观察角度的变化而产生变化。由此，在白光入射光下，在其图案镜面反射方向观察时，不同微结构图形呈现出橙黄色或蓝绿色、金属银色视觉效果，极易识别；同时，不同微结构的制作技术先进，工艺难度高，安全性高。In the above technical solution, the micro-nano grating periodic structure with wavelength selection characteristics and the microstructure with wavelength recombination characteristics are used as the basic unit of the pattern, which are used to make the personalized visual recognition pattern on the card. For the two grating structures arranged orthogonally, by controlling the grating period, the groove depth and the refractive index of the filling medium, selective narrow-bandwidth color light can be obtained in the direction of the specular reflection (0th order light) of the submicron grating. For microstructure graphics with directional scattering characteristics, the microstructures (directional speckles) on the graphics have wavelength recombination characteristics. According to the grating diffraction theory, when the incident light direction is parallel to the speckle orientation direction, its visual feature is transparent color; when When the incident light direction is perpendicular to the speckle orientation direction, its visual feature is metallic silver. By changing the orientation of the microstructure of the directional scattering speckle, the observed pattern changes with the change of the viewing angle. Therefore, under the incident light of white light, when observed in the mirror reflection direction of the pattern, different microstructure patterns present orange-yellow or blue-green, metallic silver visual effects, which are easy to identify; at the same time, the production technology of different microstructures is advanced and the process High difficulty and high security.

上述技术方案中的微结构，可以采用电子束或激光束光刻技术制作，所述高折射率介质采用真空镀膜技术制作。The microstructure in the above technical solution can be made by electron beam or laser beam lithography technology, and the high refractive index medium is made by vacuum coating technology.

上述技术方案中，所述具有波长选择特性的微纳周期光栅结构，是指具有亚微米结构的光栅填充高折射率介质后的产物，具有薄膜晶体特性，这种微纳周期光栅结构对白光入射时，仅对满足布拉格衍射角条件(镜面反射)的、白光(从紫色到红色)中某一窄带光波段形成选择反射衍射。所述微纳周期光栅结构包括基层、光栅结构和介质填充层，如附图1所示。衍射(反射)光波的波长与光栅结构的条纹间距T(见附图2)、入射光在光栅峰值面上的投影与栅线面的夹角θ(见附图2)、填充介质的厚度d₁(见附图1)、填充介质折射率n₁、光栅结构槽深d₂(见附图1)等参数有关。In the above technical solution, the micro-nano periodic grating structure with wavelength selection characteristics refers to the product after the grating with sub-micron structure is filled with a high refractive index medium, and has thin-film crystal characteristics. When , selective reflection diffraction is only formed for a narrow band of light in white light (from purple to red) that satisfies the Bragg diffraction angle condition (specular reflection). The micro-nano periodic grating structure includes a base layer, a grating structure and a dielectric filling layer, as shown in FIG. 1 . The wavelength of the diffracted (reflected) light wave and the fringe spacing T of the grating structure (see Figure 2), the angle θ between the projection of the incident light on the peak surface of the grating and the grating plane (see Figure 2), and the thickness d of the filling medium ₁ (see attached drawing 1), the refractive index n ₁ of the filling medium, the groove depth d ₂ of the grating structure (see attached drawing 1) and other parameters are related.

图中1a是类似PET基材(折射率n2)上压印的具有矩形槽型的光栅结构，图中1b是具有高光学折射率的介质层，根据严格耦合波理论(Rigorous CoupleWave，RCW)，由于TM偏振和TE偏振推导过程相似，只给出TE偏振下的情况，即电场矢量垂直于入射面而平行于光栅刻槽方向的偏振下的0级(镜面反射)反射衍射效率。1a in the figure is a grating structure with a rectangular groove imprinted on a PET substrate (refractive index n2), and 1b in the figure is a dielectric layer with a high optical refractive index. According to the strict coupled wave theory (Rigorous CoupleWave, RCW), Since the derivation process of TM polarization and TE polarization is similar, only the case of TE polarization is given, that is, the 0th-order (specular reflection) reflection diffraction efficiency under the polarization where the electric field vector is perpendicular to the incident plane and parallel to the groove direction of the grating.

设入射波为E_r＝exp{-jk₀n₀[sinθx+cosθ(z+d₁)]} (1)Let the incident wave be E _r ＝exp{-jk ₀ n ₀ [sinθx+cosθ(z+d ₁ )]} (1)

其中 $k_{0} = \frac{2 π}{λ_{0}},$ 而0区(16)、1区(17)和2区(18)总的电场分布为：in $k_{0} = \frac{2 π}{λ_{0}},$ And the total electric field distribution of zone 0 (16), zone 1 (17) and zone 2 (18) is:

${E E.}_{00} = = {E E.}_{r r} + + \underset{i i}{Σ Σ} {R R}_{i i} exp exp {{- - j j [[{k k}_{xi xi} x x - - {k k}_{00,, zi the zi} ((z z + + {d d}_{11}))]]}} - - - - - - ((22))$

${E E.}_{11} = = \underset{i i}{Σ Σ} {R R}_{11 i i} exp exp [[- - j j (({k k}_{xi xi} x x - - {k k}_{11,, zi the zi} z z))]] + + \underset{i i}{Σ Σ} {T T}_{11 i i} exp exp [[- - j j (({k k}_{xi xi} x x + + {k k}_{11,, zi the zi} z z))]] - - - - - - ((33))$

${E E.}_{22} = = \underset{i i}{Σ Σ} {T T}_{i i} exp exp {{- - j j [[{k k}_{xi xi} x x + + {k k}_{22,, zi the zi} ((z z - - {d d}_{22}))]]}} - - - - - - ((44))$

其中k_xi由光栅方程得到： $k_{xi} = k_{0} [n_{0} \sin θ - i \frac{λ_{0}}{T}] - - - (5)$ where k _xi is obtained from the grating equation: $k_{xi} = k_{0} [{no}_{0} \sin θ - i \frac{λ_{0}}{T}] - - - (5)$

k_1，zi，k_2，zi分别是反射衍射波和透射衍射波波矢量的z分量。λ₀为空气(折射率n₀)中的衍射光波长。k _{1 , zi} , k _{2 , zi} are the z components of the wave vectors of the reflected diffracted wave and the transmitted diffracted wave, respectively. λ ₀ is the wavelength of diffracted light in air (refractive index n ₀ ).

${k k}_{l l,, zi the zi} = = \{\begin{matrix} {k k}_{00} [[{n no}_{l l}^{22} - - {(({k k}_{xi xi} / / {k k}_{00}))}^{22} {]]}^{11 / / 22} \\ {- - jk jk}_{00} [[{(({k k}_{xi xi} / / {k k}_{00}))}^{22} - - {n no}_{i i}^{22} {]]}^{11 / / 22} \end{matrix},, l l = = 0,1,2 0,1,2 - - - - - - ((66))$

R_i是第i级反射衍射波的复振幅，T_i是第i级透射衍射波(包括倏逝波)的复振幅。R_1i、T_1i分别是在1区内的反射和透射衍射波的振幅。在光栅区(19)，根据常见的耦合波方程，光栅区的电磁场切向分量分布可以写成：R _i is the complex amplitude of the i-th order reflected diffracted wave, and T _i is the complex amplitude of the i-th order transmitted diffracted wave (including evanescent wave). R _1i , T _1i are the amplitudes of reflected and transmitted diffracted waves in zone 1, respectively. In the grating region (19), according to the common coupled wave equation, the distribution of the tangential component of the electromagnetic field in the grating region can be written as:

${S S}_{yi yi} ((z z)) = = {Σ Σ}_{m m = = 11}^{n no} {w w}_{i i,, m m} {{{c c}_{m m}^{+ +} exp exp ((- - {k k}_{00} {q q}_{m m} z z)) + + {c c}_{m m}^{- -} exp exp [[{k k}_{00} {q q}_{m m} ((z z - - {d d}_{22}))]]}} - - - - - - ((77))$

${U u}_{xi xi} ((z z)) = = {Σ Σ}_{m m = = 11}^{n no} {v v}_{i i,, m m} {{- - {c c}_{m m}^{+ +} exp exp ((- - {k k}_{00} {q q}_{m m} z z)) + + {c c}_{m m}^{- -} exp exp [[{k k}_{00} {q q}_{m m} ((z z - - {d d}_{22}))]]}} - - - - - - ((88))$

构建矩阵V＝WQ，其中Q是由q_m构成的对角矩阵，c_m ⁺，c_m ^-是可以由边界条件确定的未知系数。Construct matrix V=WQ, where Q is a diagonal matrix composed of q _m , c _m ⁺ , _cm ^- are unknown coefficients that can be determined by boundary conditions.

在z＝-d₁处，即1区和光栅区的边界处，根据电磁场的切向分量连续，可以得到下列关系：At z=-d ₁ , that is, at the boundary between zone 1 and the grating zone, according to the continuity of the tangential component of the electromagnetic field, the following relationship can be obtained:

δ_ir+R_i＝R_1iexp(-jk_1，zid₁)+T_1iexp(jk_1，zid₁) (9)δ _ir +R _i ＝R _1i exp(-jk _{1, zi} d ₁ )+T _1i exp(jk _{1, zi} d ₁ ) (9)

jn₀ cosθδ_ir+j(k_0，zi/k₀)R_i＝j(k_1，zi/k₀)R_1iexp(-jk_1，zid₁)-j(k_1，zi/k₀)T_1iexp(jk_1，zid₁) (10)jn ₀ cosθδ _ir +j(k _{0, zi} /k ₀ )R _i ＝j(k _{1, zi} /k ₀ )R _1i exp(-jk _{1, zi} d ₁ )-j(k _{1, zi} /k ₀ )T _1i exp(jk _{1, zi} d ₁ ) (10)

写成矩阵形式为：Written in matrix form as:

在z＝0处，即1区和光栅区的边界处，同样可以得到：At z=0, that is, at the boundary of area 1 and the grating area, it can also be obtained:

${R R}_{11 i i,, n no} + + {T T}_{11 i i,, n no} = = {Σ Σ}_{m m = = 11}^{n no} {w w}_{i i,, m m} [[{c c}_{m m}^{+ +} + + {c c}_{m m}^{- -} exp exp ((- - {k k}_{00} {q q}_{m m} {d d}_{22}))]] - - - - - - ((1212))$

$- - j j (({k k}_{11,, zi the zi} / / {k k}_{00})) {R R}_{11 i i,, n no} + + j j (({k k}_{11,, zi the zi} / / {k k}_{00})) {T T}_{11 i i,, n no} = = {Σ Σ}_{m m = = 11}^{n no} {v v}_{i i,, m m} [[{c c}_{m m}^{+ +} - - {c c}_{m m}^{- -} exp exp ((- - {k k}_{00} {q q}_{m m} {d d}_{22}))]] - - - - - - ((1313))$

写成矩阵形式为：Written in matrix form as:

$[\begin{matrix} I I \\ - - j j {Y Y}_{11} \end{matrix}] [[{R R}_{ln ln}]] + + [\begin{matrix} I I \\ {jY J}_{11} \end{matrix}] [[{T T}_{ln ln}]] = = [\begin{matrix} W W & WX WX \\ V V & - - VX VX \end{matrix}] [\begin{matrix} {c c}^{+ +} \\ {c c}^{- -} \end{matrix}] - - - - - - ((1414))$

在z＝d₂处，即2区和光栅区的边界处：At z = d ₂ , i.e. at the boundary of Zone 2 and the grating zone:

${Σ Σ}_{m m = = 11}^{n no} {w w}_{i i,, m m} [[{c c}_{m m}^{+ +} exp exp ((- - {k k}_{00} {q q}_{m m} {d d}_{22})) + + {c c}_{m m}^{- -}]] = = {T T}_{i i} - - - - - - ((1515))$

${Σ Σ}_{m m = = 11}^{n no} {v v}_{i i,, m m} [[{c c}_{m m}^{+ +} exp exp ((- - {k k}_{00} {q q}_{m m} {d d}_{22})) - - {c c}_{m m}^{- -}]] = = j j (({k k}_{22,, zi the zi} / / {k k}_{00})) {T T}_{i i} - - - - - - ((1616))$

写成矩阵形式为：Written in matrix form as:

$[\begin{matrix} WX WX & W W \\ VX VX & - - V V \end{matrix}] [\begin{matrix} {c c}^{+ +} \\ {c c}^{- -} \end{matrix}] = = [\begin{matrix} I I \\ j j {Y Y}_{22} \end{matrix}] [[T T]] - - - - - - ((1717))$

δ_ir是n×n的矩阵，中心元素为1，其余为0。X₁，X₂，X，Y₀，Y₁，Y₂都是对角矩阵，其对角元素分别是exp(-jk_1，zid₁)，exp(jk_1，zid₁)，exp(-q_md)，k_0，zi/k₀，k_1，zi/k₀和k_2，zi/k₀。w_i，m为本征矢量W的元素，构建矩阵V＝WQ，其中Q是由q_m构成的对角矩阵。通过式(11)、(14)、(17)解出R，从而得到反射衍射波的衍射效率：δ _ir is an n×n matrix, the central element is 1, and the rest are 0. X ₁ , X ₂ , X, Y ₀ , Y ₁ , Y ₂ are all diagonal matrices, and their diagonal elements are exp(-jk _{1, zi} d ₁ ), exp(jk _{1, zi} d ₁ ), exp (-q _m d), k _{0, zi} /k ₀ , k _{1, zi} /k ₀ and k _{2, zi} /k ₀ . w _{i, m} are the elements of the eigenvector W, constructing a matrix V=WQ, where Q is a diagonal matrix formed by q _m . R is solved by formulas (11), (14), and (17), so as to obtain the diffraction efficiency of the reflected diffracted wave:

${DE DE}_{ri the ri} = = {| | {R R}_{i i} | |}^{22} Re Re ((\frac{{k k}_{00,, zi the zi}}{})) - - - - - - ((1818))$

附图3为反射衍射的波长选择性位置与光栅周期的对应关系曲线。在基材PET上形成的光栅槽深d₂范围50nm-150nm，填充的介质层厚度为d₂+20nm，T＝300nm-500nm时，入射在图形上白光的反射衍射光波峰值选择曲线出处于可见光范围内，便于视读识别。由附图3可见，当T＝380nm时，被选择的反射衍射光波长为580nm左右，为橙黄色。与当图形的微纳结构光栅参数决定后，对不同方向入射到图形上的白光，其反射衍射光应满足选择衍射的布拉格条件：2Tcosθ＝λ₀/n₁；式中T为光栅常数。随着入射夹角θ逐渐增大，被选择的光波长向短波方向偏移，表现出蓝绿色。入射光方向垂直与光栅栅线方向的观察示意图如附图4所示，入射光方向平行于光栅栅线方向的观察示意图如附图5所示。Accompanying drawing 3 is the corresponding relationship curve of the wavelength selective position of reflection diffraction and grating period. The groove depth _d2 of the grating formed on the substrate PET ranges from 50nm to 150nm, and the thickness of the filled medium layer is _d2 +20nm. When T=300nm-500nm, the peak selection curve of the reflection and diffraction light wave of white light incident on the pattern is in the visible light Within the range, it is easy to read and identify. It can be seen from Fig. 3 that when T=380nm, the wavelength of the selected reflected and diffracted light is about 580nm, which is orange-yellow. When the parameters of the micro-nano structured grating of the pattern are determined, for white light incident on the pattern in different directions, the reflected and diffracted light should satisfy the Bragg condition of selective diffraction: 2Tcosθ=λ ₀ /n ₁ ; where T is the grating constant. As the incident angle θ gradually increases, the selected light wavelength shifts to the short-wave direction, showing blue-green. The observation schematic diagram of the incident light direction perpendicular to the grating line direction is shown in Figure 4, and the observation schematic diagram of the incident light direction parallel to the grating line direction is shown in Figure 5.

为了增加可视读识别性，还应用可变亮度的金属银色效果，所述具有波长复合特性的微结构是根据二元光学方法设计的具有定向衍射特性的散斑结构。该微结构位相角分布可表示为φ(u，v)，其衍射光场满足：In order to increase the visibility and readability, a metallic silver effect with variable brightness is also applied, and the microstructure with wavelength recombination characteristics is a speckle structure with directional diffraction characteristics designed according to the binary optical method. The phase angle distribution of the microstructure can be expressed as φ(u, v), and its diffracted light field satisfies:

$F f {{exp exp [[iφ iφ ((u u,, v v))]]}} = = rect rect ((\frac{x x}{22 a a})) rand rand ((x x,, y the y)) - - - - - - ((1919))$

再现的光场对入射光进行压缩，衍射后的各色光波叠加成狭缝分布，因此，表现出银白色，再现光路如附图6所示。微结构的定向排列方向可以进行设计，具有不同取向的具有不同的衍射方向，因此，基于该微结构的图像具有变色银效果。所述变色银微结构，线宽：0.25-10um，深度：0.15-0.35um。该微结构的详细光学特性与制作方法已在受理专利200610038417.2中作了详细描述。The reproduced light field compresses the incident light, and the diffracted light waves of various colors are superimposed into a slit distribution, so it appears silvery white. The reproduced light path is shown in Figure 6. The alignment direction of the microstructure can be designed, and those with different orientations have different diffraction directions. Therefore, the image based on the microstructure has a color-changing silver effect. The color-changing silver microstructure has a line width of 0.25-10um and a depth of 0.15-0.35um. The detailed optical characteristics and manufacturing method of the microstructure have been described in detail in the accepted patent 200610038417.2.

具有波长选择特性的微纳光栅结构的反射衍射光呈窄带颜色，而具有波长复合特性的微结构的衍射光呈特殊的金属银色。与激光全息图中的一级衍射彩虹色相比，本发明的颜色特征显著，极易分辨。同时，所述两种微结构是采用电子束光刻或激光光刻技术制作而成，且需要对微结构的槽深等诸多参数进行精确控制，方可达到所述效果，因此，该微结构制成技术先进，难度高，具有极高的安全性。The reflected and diffracted light of the micro-nano grating structure with wavelength selective characteristics is in a narrow-band color, while the diffracted light of the microstructure with wavelength recombination characteristic is in a special metallic silver color. Compared with the first-order diffraction iridescent color in the laser hologram, the color feature of the invention is remarkable and easy to distinguish. At the same time, the two microstructures are produced by electron beam lithography or laser lithography technology, and it is necessary to precisely control many parameters such as the groove depth of the microstructure to achieve the above effect. Therefore, the microstructure The technology is advanced, the difficulty is high, and the safety is extremely high.

采用上述防伪结构的卡证的识别方法是：取待识别的卡证，使白光照射在所述标识图案上，在镜面反射方向观察，当入射光线垂直于其中一个图形区域的光栅栅线方向时，该区域图形呈橙黄色，光栅方向与其正交的另一个区域的图形呈蓝绿色；将卡证绕中心法线转动90°观察，前一个图形区域的颜色转为蓝绿色，后一个图形区域的颜色转为橙黄色；符合上述特征，则认定该卡证为真；否则认定该卡证为假。The identification method of the card adopting the above-mentioned anti-counterfeiting structure is as follows: take the card to be identified, irradiate the white light on the logo pattern, observe in the mirror reflection direction, when the incident light is perpendicular to the direction of the grating lines in one of the graphic areas , the graphics in this area are orange-yellow, and the graphics in another area perpendicular to the grating direction are blue-green; when the card is rotated 90° around the center normal, the color of the former graphic area turns blue-green, and the latter graphic area The color of the card turns orange; if the above characteristics are met, the card is considered to be genuine; otherwise, the card is considered to be false.

进一步，对于同时采用正交图案和定向散斑图案的卡证的识别方法可以是，取待识别的卡证，使白光照射在所述标识图案上，在镜面反射方向观察，当入射光线垂直于其中一个图形区域的光栅栅线方向时，该区域图形呈橙黄色，光栅方向与其正交的另一个区域的图形呈蓝绿色；将卡证绕中心法线转动90°观察，前一个图形区域的颜色转为蓝绿色，后一个图形区域的颜色转为橙黄色；绕中心法线方向转动卡证，观察第三图形区域，当入射光线方向平行于散斑取向方向时，第三图形区域为透明色；当入射光线方向垂直于散斑取向方向时，第三图形区域为金属银色；符合上述特征，则认定该卡证为真；否则认定该卡证为假。Further, the identification method for a card that simultaneously adopts an orthogonal pattern and a directional speckle pattern may be as follows: take the card to be identified, irradiate white light on the identification pattern, observe it in the direction of mirror reflection, and when the incident light is perpendicular to When the raster line direction of one of the graphics areas is in the direction of the grating, the graphics in this area are orange-yellow, and the graphics in the other area where the grating direction is perpendicular to it are blue-green; when the card is rotated 90° around the center normal line, the graphics in the previous graphics area The color turns to blue-green, and the color of the last graphic area turns to orange-yellow; rotate the card around the normal direction of the center, and observe the third graphic area. When the incident light direction is parallel to the speckle orientation direction, the third graphic area is transparent color; when the direction of the incident light is perpendicular to the direction of the speckle orientation, the third graphic area is metallic silver; if the above characteristics are met, the card is considered to be genuine; otherwise, the card is considered to be false.

在证件的视读识别标识中，通过不同视觉效果图像进行组合，使得在特定视觉方向具有至少一种颜色特征，如黄橙色、蓝紫色、银色或不同颜色的组合，具有显著的识别特征。In the visual-reading identification of documents, images with different visual effects are combined to have at least one color feature in a specific visual direction, such as yellow-orange, blue-purple, silver or a combination of different colors, which have significant identification features.

由于上述方案的应用，本发明作为一种公共证件视读防伪方案，与现有视读识别方案相比，具有下列优点：Due to the application of the above-mentioned scheme, the present invention, as a public document visual-reading anti-counterfeiting scheme, has the following advantages compared with the existing visual-reading identification scheme:

1、本发明的防伪结构由于对微结构的参数的特定选择，获得了具有动态效果的衍射复合的金属银色，与传统彩虹色相比，视觉特征显著，易于识别。1. Due to the specific selection of microstructure parameters, the anti-counterfeiting structure of the present invention obtains a diffraction composite metallic silver color with dynamic effects. Compared with traditional rainbow colors, the visual characteristics are remarkable and easy to identify.

2、采用具有双通道视角的相互正交的两组图形，衍射波长选择再现光波颜色相互转换，对入射光方向有特定要求(镜面反射条件)，从而使得图像的特征颜色应在特定视角下识别，具有防伪特征。2. Two sets of mutually orthogonal graphics with dual-channel viewing angles are adopted, and the diffraction wavelength selection reproduces the mutual conversion of light wave colors. There are specific requirements for the direction of incident light (specular reflection conditions), so that the characteristic color of the image should be in a specific viewing angle. Identification, with anti-counterfeiting features.

3、具有不同视觉特征的微结构在亚微米量级，采用电子束光刻或激光光刻技术制作而成，需要对微结构的槽深等诸多参数进行精确控制，方可达到所述效果，其制作手段先进，工艺难度高，安全性高。3. The microstructures with different visual characteristics are on the sub-micron scale, and are produced by electron beam lithography or laser lithography technology. It is necessary to precisely control many parameters such as the groove depth of the microstructures to achieve the above effect. Its production method is advanced, the process is difficult, and the safety is high.

附图说明Description of drawings

附图1是具有波长选择特性的亚微米结构示意图；Accompanying drawing 1 is a schematic diagram of a submicron structure with wavelength selective properties;

附图2是波长选择特性微结构衍射光路示意图；Accompanying drawing 2 is the schematic diagram of the diffraction optical path of the wavelength selective characteristic microstructure;

附图3是某一填充介质厚度下，微纳结构光栅槽深与选择波长曲线图；Accompanying drawing 3 is a curve diagram of groove depth and selected wavelength of the micro-nano structured grating under a certain filling medium thickness;

附图4是入射光垂直于光栅栅线是的观察示意图；Accompanying drawing 4 is the observation schematic diagram that incident light is perpendicular to grating line;

附图5是入射光平行于光栅栅线是的观察示意图；Accompanying drawing 5 is the observation schematic diagram that incident light is parallel to grating line;

附图6是变色银效果光路示意图；Accompanying drawing 6 is the optical path schematic diagram of color-changing silver effect;

附图7a-7b是实施例一设计方案图示；Accompanying drawing 7a-7b is the schematic illustration of the design scheme of embodiment one;

附图8a-8b是实施例二设计方案图示。Accompanying drawing 8a-8b is the diagram of the design scheme of embodiment 2.

具体实施方式Detailed ways

下面结合附图及实施例对本发明作进一步描述：The present invention will be further described below in conjunction with accompanying drawing and embodiment:

实施例一：一种用于卡证的防伪结构，在待防伪的卡证本体上，设置有由光栅结构构成的标识图案，所述标识图案至少包括两种图形区域，该两种图形区域中的光栅结构的取向正交排列，构成双视觉通道，两种图形区域相互不重叠；所述光栅结构的光栅周期为300～500纳米，槽形深度为50～150纳米，在光栅结构上填充有透明高折射率介质层，所述介质层的厚度为20～30纳米，介质的折射率大于1.6。其中的微结构，可以采用电子束或激光束光刻技术制作，所述高折射率介质采用真空镀膜技术制作。Embodiment 1: An anti-counterfeit structure for a card. On the body of the card to be anti-counterfeited, an identification pattern composed of a grating structure is provided. The identification pattern includes at least two types of graphic areas, and the two types of graphic areas are The orientation of the grating structure is arranged orthogonally to form a dual visual channel, and the two graphic areas do not overlap each other; the grating period of the grating structure is 300-500 nanometers, the groove depth is 50-150 nanometers, and the grating structure is filled with A transparent high-refractive index medium layer, the thickness of the medium layer is 20-30 nanometers, and the refractive index of the medium is greater than 1.6. The microstructure can be made by electron beam or laser beam lithography technology, and the high refractive index medium can be made by vacuum coating technology.

参见附图7a，该图像为两种特征微结构组合排布示意图。图中71、72是亚微米光栅结构。当视读方向沿着图示入射光方向时，71部分呈黄橙色，72部分呈蓝紫色。若将视读图像旋转90°，如附图7b所示。则71部分呈现蓝紫色，72部分呈现黄橙色。正视识别时，上述图形呈透明效果。也就是，图形71、图形72在相互正交的双视觉通道上的颜色相互转换；若被告知该图像的视觉特征，在公共场所，即可快速识别证件真伪。Referring to Figure 7a, this image is a schematic diagram of the combined arrangement of two characteristic microstructures. 71 and 72 in the figure are submicron grating structures. When the viewing direction is along the incident light direction shown in the figure, part 71 is yellow-orange, and part 72 is blue-purple. If the reading image is rotated by 90°, as shown in Figure 7b. Then 71 parts appear blue-purple, and 72 parts appear yellow-orange. When facing up to the recognition, the above-mentioned graphics have a transparent effect. That is, the colors of the graphics 71 and 72 on the mutually orthogonal dual visual channels are mutually converted; if the visual characteristics of the images are informed, the authenticity of the certificate can be quickly identified in public places.

实施例二：一种用于卡证的防伪结构，在待防伪的卡证本体上，设置有由光栅结构构成的标识图案，所述标识图案至少包括两种图形区域，该两种图形区域中的光栅结构的取向正交排列，构成双视觉通道，两种图形区域相互不重叠；所述光栅结构的光栅周期为300～500纳米，槽形深度为50～150纳米，在光栅结构上填充有透明高折射率介质层，所述介质层的厚度为20～30纳米，介质的折射率大于1.6。设有第三种图形区域，该图形区域由具有定向散射特性的微结构图形组成，构成所述微结构图形的光栅结构的线宽在0.25～10微米范围内随机变化，结构浮雕深度范围为0.15～0.35微米。Embodiment 2: An anti-counterfeiting structure for a card. On the body of the card to be anti-counterfeited, an identification pattern composed of a grating structure is provided. The identification pattern includes at least two types of graphic areas, and the two types of graphic areas are The orientation of the grating structure is arranged orthogonally to form a dual visual channel, and the two graphic areas do not overlap each other; the grating period of the grating structure is 300-500 nanometers, the groove depth is 50-150 nanometers, and the grating structure is filled with A transparent high-refractive index medium layer, the thickness of the medium layer is 20-30 nanometers, and the refractive index of the medium is greater than 1.6. There is a third graphic area, which is composed of microstructured graphics with directional scattering characteristics. The line width of the grating structure that constitutes the microstructured graphics varies randomly within the range of 0.25 to 10 microns, and the depth of the structural relief is 0.15 microns. ~0.35 microns.

其中的微结构，可以采用电子束或激光束光刻技术制作，所述高折射率介质采用真空镀膜技术制作。The microstructure can be made by electron beam or laser beam lithography technology, and the high refractive index medium can be made by vacuum coating technology.

参见附图8a，该图像为本发明中三种特征微结构组合排布示意图。图中81、82是亚微米光栅结构，83是具有定向散斑分布微结构。当视读方向沿着图示入射光方向时，81部分呈黄橙色，82部分呈蓝紫色，83部分呈透明色。若将视读图像旋转90°，如附图8b所示。则81部分呈现蓝紫色，82部分呈现黄橙色，而83部分呈现金属银色。若被告知该图像的视觉特征，在公共场所，即可快速识别证件真伪。Referring to Fig. 8a, the image is a schematic diagram of the combined arrangement of three characteristic microstructures in the present invention. In the figure, 81 and 82 are submicron grating structures, and 83 is a microstructure with directional speckle distribution. When the viewing direction is along the incident light direction shown in the figure, part 81 is yellow-orange, part 82 is blue-purple, and part 83 is transparent. If the reading image is rotated by 90°, as shown in Figure 8b. Then part 81 presents blue-purple, part 82 presents yellow-orange, and part 83 presents metallic silver. If you are informed of the visual characteristics of the image, you can quickly identify the authenticity of the document in a public place.

类似实施例一、实施例二，可根据实际图像设计需要，确定特征微结构的组合。Similar to Embodiment 1 and Embodiment 2, the combination of characteristic microstructures can be determined according to actual image design requirements.

Claims

1. anti-counterfeit structure that is used to the card card, treating to be provided with the identification pattern that is made of optical grating construction on the false proof card card body, it is characterized in that: described identification pattern comprises two kinds of graphics fields at least, the orientation orthogonal arrangement of the optical grating construction in these two kinds of graphics fields constitutes double vision feel passage; The grating cycle of described optical grating construction is 300～500 nanometers, and the flute profile degree of depth is 50～150 nanometers, is filled with transparent high refractive index medium layer on optical grating construction, and the thickness of described dielectric layer is 20～30 nanometers, and the refractive index of medium is greater than 1.6.

2. the anti-counterfeit structure that is used to the card card according to claim 1 is characterized in that: described two kinds of graphics field phase non-overlapping copies.

3. the anti-counterfeit structure that is used to the card card according to claim 1 and 2, it is characterized in that: be provided with the third graphics field, this graphics field is made up of the microstructure graph with directional scattering characteristic, constitute live width change at random in 0.25～10 micrometer range of the optical grating construction of described microstructure graph, structure relief depth scope is 0.15～0.35 micron.

4. the described recognition methods that is used to the anti-counterfeit structure of card card of claim 1, it is characterized in that: get card card to be identified, make white light on described identification pattern, observe at the minute surface reflection direction, when incident ray during perpendicular to the grating grid line direction of one of them graphics field, these regional graphics are orange-yellow, and another regional figure of grating orientation and its quadrature is blue-green; To block card and rotate 90 ° of observations around centre normal, the color of previous graphics field transfers blue-green to, and the color of a back graphics field transfers to orange-yellow; Meet above-mentioned feature, assert that then this card card is for true; Otherwise assert that this card card is for false.

5. the described recognition methods that is used to the anti-counterfeit structure of card card of claim 3, it is characterized in that: get card card to be identified, make white light on described identification pattern, observe at the minute surface reflection direction, when incident ray during perpendicular to the grating grid line direction of one of them graphics field, these regional graphics are orange-yellow, and another regional figure of grating orientation and its quadrature is blue-green; To block card and rotate 90 ° of observations around centre normal, the color of previous graphics field transfers blue-green to, and the color of a back graphics field transfers to orange-yellow; Rotate the card card around the centre normal direction, observe the 3rd graphics field, when the incident ray direction was parallel to the speckle differently-oriented directivity, the 3rd graphics field was a Transparent color; When incident ray direction during perpendicular to the speckle differently-oriented directivity, the 3rd graphics field is a metallic silver color; Meet above-mentioned feature, assert that then this card card is for true; Otherwise assert that this card card is for false.