CN101075596A - Stackable semiconductor package structure and manufacturing method thereof - Google Patents
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
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- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
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- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
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- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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Abstract
本发明公开一种堆叠式半导体封装结构及其制造方法,该堆叠式半导体封装结构包括一第一基板、一半导体元件、若干个凸块、若干条第一导线、一第二基板及一封胶材料。半导体元件位于第一基板上,且电性连接至第一基板。这些凸块位于半导体元件上方。这些第一导线将这些凸块与第一基板电性连接。这些凸块与第二基板相接触。封胶材料包覆第一基板、半导体元件、这些凸块、这些第一导线及第二基板。通过这种方式,可以避免在第二基板上进行打线作业,因此不会出现在现有封装结构中所存在的第二基板悬空及摇晃等问题。
The present invention discloses a stacked semiconductor packaging structure and a manufacturing method thereof, wherein the stacked semiconductor packaging structure comprises a first substrate, a semiconductor element, a plurality of bumps, a plurality of first wires, a second substrate and a sealing material. The semiconductor element is located on the first substrate and is electrically connected to the first substrate. The bumps are located above the semiconductor element. The first wires electrically connect the bumps to the first substrate. The bumps are in contact with the second substrate. The sealing material covers the first substrate, the semiconductor element, the bumps, the first wires and the second substrate. In this way, wire bonding operations on the second substrate can be avoided, so the problems of the second substrate being suspended and shaking in the existing packaging structure will not occur.
Description
技术领域technical field
本发明是有关于一种堆叠式半导体封装结构,且特别是有关于一种利用凸块支撑基板的堆叠式半导体封装结构。The present invention relates to a stacked semiconductor packaging structure, and in particular to a stacked semiconductor packaging structure using bumps to support a substrate.
背景技术Background technique
请参考图1所示的现有堆叠式半导体封装结构的剖视示意图。该现有堆叠式半导体封装结构1包括一第一基板11、一芯片12、一第二基板13、若干条导线14及一封胶材料15。该第一基板11具有一第一表面111及一第二表面112。该芯片12是以覆晶方式附着至该第一基板11的第一表面111上。该第二基板13利用一黏胶层16黏附于该芯片12上,该第二基板13具有一第一表面131及一第二表面132,其中该第一表面131上具有若干个第一焊垫133及若干个第二焊垫134。该第二基板13的表面积大于该芯片12的表面积,使得该第二基板13的一部分会延伸于该芯片12之外,从而形成一悬空部分。Please refer to FIG. 1 , which is a schematic cross-sectional view of a conventional stacked semiconductor package structure. The conventional stacked semiconductor package structure 1 includes a
这些导线14将该第二基板13的这些第一焊垫133电性连接至该第一基板11的第一表面111。该封胶材料15包覆第一基板11的第一表面111、芯片12、这些导线14及部分第二基板13,且暴露出位于该第二基板13的第一表面131上的这些第二焊垫134,而形成一封胶开口(Mold Area Opening)17。在通常情况下,该现有堆叠式半导体封装结构1可以在该封胶开口17中再叠放另一封装结构18或其它元件,其中该封装结构18的焊球181电性连接至位于该第二基板13的这些第二焊垫134。The
该现有堆叠式半导体封装结构1的缺点如下。首先,由于该第二基板13会有悬空部分,这些第一焊垫133位于该芯片12相对位置的外围(即该悬空部分),且将这些第一焊垫133与该芯片12的边缘的相对位置间的距离定义为一悬空长度。经实验显示,当该悬空长度大于该第二基板13的厚度三倍以上时,而在这种情况下进行打线(Wire Bonding)作业时,该悬空部分会有摇晃或是震荡的情况,而不利打线作业的进行。更甚至于,在打线作业时,当第二基板13所受到的向下的应力太大时,会造成该第二基板13破裂(crack)。其次,由于会有上述摇晃、震荡或是破裂的情况,因此该悬空部分不能太长,使得该第二基板13的面积受到限制,因而需要限制在封胶开口17内才可暴露出该第二基板13的第一表面131上的这些第二焊垫134的布局空间。此外,在灌胶(Molding)制程中,该封胶材料15会溢入上模具(图中未表示)与该第二基板13的第一表面131之间,所溢入的材料会形成余料(Flash),从而污染这些第二焊垫134。The disadvantages of the conventional stacked semiconductor package structure 1 are as follows. First of all, since the
因此,有必要提供一种新的堆叠式半导体封装结构,以解决上述问题。Therefore, it is necessary to provide a new stacked semiconductor package structure to solve the above problems.
发明内容Contents of the invention
本发明的主要目的在于提供一种堆叠式半导体封装结构,其结构排布合理,不但可以使得该封装结构具有良好的结构稳定性,而且能够确保其信号传输效果良好。The main purpose of the present invention is to provide a stacked semiconductor packaging structure, the structure of which is reasonably arranged, not only can make the packaging structure have good structural stability, but also can ensure that the signal transmission effect is good.
本发明的另一目的在于提供一种堆叠式半导体封装结构的制造方法,其不需要在第二基板进行打线作业,从而能够确保结构的稳定性,而且在封胶过程中,因其焊垫不易受到污染,从而能够产生良好的信号传输效果。Another object of the present invention is to provide a method for manufacturing a stacked semiconductor package structure, which does not need to perform wire bonding on the second substrate, thereby ensuring the stability of the structure. It is not easy to be polluted, so that it can produce a good signal transmission effect.
为达成上述目的或是其它目的,本发明采用如下技术方案:一种堆叠式半导体封装结构,其包括有:一第一基板、一半导体元件、若干个凸块、若干条第一导线、一第二基板及一封胶材料,其中所述第一基板具有一第一表面及一第二表面;所述半导体元件位于所述第一基板的第一表面,且电性连接至所述第一基板的第一表面;所述凸块位于所述半导体元件的上方;所述第一导线用来将这些凸块电性连接至所述第一基板的第一表面;所述第二基板具有一第一表面及一第二表面,且所述凸块与所述第二基板的第二表面相接触;所述封胶材料用来包覆所述第一基板的第一表面、所述半导体元件、所述凸块、所述第一导线及所述第二基板的第二表面。In order to achieve the above object or other objects, the present invention adopts the following technical solutions: a stacked semiconductor package structure, which includes: a first substrate, a semiconductor element, several bumps, several first wires, a first Two substrates and a sealing material, wherein the first substrate has a first surface and a second surface; the semiconductor element is located on the first surface of the first substrate and is electrically connected to the first substrate the first surface of the first substrate; the bump is located above the semiconductor element; the first wire is used to electrically connect these bumps to the first surface of the first substrate; the second substrate has a first a surface and a second surface, and the bump is in contact with the second surface of the second substrate; the sealing material is used to cover the first surface of the first substrate, the semiconductor element, The bump, the first wire and the second surface of the second substrate.
为达成上述目的或是其它目的,本发明还采用如下技术方案:一种堆叠式半导体封装结构的制造方法,其包括有步骤a至步骤g,其中步骤a是提供一第一基板,所述第一基板具有一第一表面及一第二表面;步骤b是将一半导体元件附着至所述第一基板的第一表面,且所述半导体元件电性连接至所述第一基板的第一表面;步骤c是在所述半导体元件上方形成若干个凸块;步骤d是形成若干条第一导线用来将这些凸块电性连接至所述第一基板的第一表面;步骤e是提供一第二基板,所述第二基板具有一第一表面及一第二表面;步骤f是将所述第二基板设置于这些凸块上,使得这些凸块接触到所述第二基板的第二表面;及步骤g是利用一封胶材料,用以包覆所述第一基板的第一表面、所述半导体元件、这些凸块、这些第一导线及所述第二基板的第二表面。To achieve the above object or other objects, the present invention also adopts the following technical solution: a method for manufacturing a stacked semiconductor package structure, which includes steps a to g, wherein step a is to provide a first substrate, and the first A substrate has a first surface and a second surface; step b is attaching a semiconductor element to the first surface of the first substrate, and the semiconductor element is electrically connected to the first surface of the first substrate ; step c is to form a plurality of bumps above the semiconductor element; step d is to form a plurality of first wires for electrically connecting these bumps to the first surface of the first substrate; step e is to provide a The second substrate, the second substrate has a first surface and a second surface; step f is to arrange the second substrate on these bumps, so that these bumps contact the second surface of the second substrate. surface; and step g is using a sealing material to cover the first surface of the first substrate, the semiconductor element, the bumps, the first wires and the second surface of the second substrate.
相较于现有技术,在本发明中,由于不需要在第二基板上进行打线作业,因此不会出现如现有封装结构中所存在的第二基板悬空及摇晃等问题。而且在封胶材料的灌胶制程中,封胶材料不会溢进上模具与第二基板的第一表面之间,因此这些第一焊垫不会受到污染。此外,本发明堆叠式半导体封装结构的上表面(即第二基板的第一表面)为一平整的表面,其不仅平面度佳,而且可再置放更大或是更多的另一封装结构或其它元件。Compared with the prior art, in the present invention, since there is no need for wire bonding on the second substrate, problems such as suspension and shaking of the second substrate in the existing packaging structure will not occur. Moreover, during the encapsulation process of the encapsulant material, the encapsulant material will not overflow between the upper mold and the first surface of the second substrate, so the first pads will not be polluted. In addition, the upper surface (i.e., the first surface of the second substrate) of the stacked semiconductor package structure of the present invention is a flat surface, which not only has good flatness, but also can place larger or more other package structures. or other components.
附图说明Description of drawings
图1为现有堆叠式半导体封装结构的剖视示意图。FIG. 1 is a schematic cross-sectional view of a conventional stacked semiconductor package structure.
图2为本发明堆叠式半导体封装结构的第一实施例的剖视示意图。FIG. 2 is a schematic cross-sectional view of the first embodiment of the stacked semiconductor package structure of the present invention.
图3为本发明堆叠式半导体封装结构的第一实施例的制造方法流程图。FIG. 3 is a flow chart of the manufacturing method of the first embodiment of the stacked semiconductor package structure of the present invention.
图4为本发明堆叠式半导体封装结构的第二实施例的剖视示意图。4 is a schematic cross-sectional view of a second embodiment of the stacked semiconductor package structure of the present invention.
图5为本发明堆叠式半导体封装结构的第二实施例的制造方法流程图。FIG. 5 is a flow chart of the manufacturing method of the second embodiment of the stacked semiconductor package structure of the present invention.
图6为本发明堆叠式半导体封装结构的第三实施例的剖视示意图。FIG. 6 is a schematic cross-sectional view of a third embodiment of the stacked semiconductor package structure of the present invention.
具体实施方式Detailed ways
请参考图2所示的本发明堆叠式半导体封装结构的第一实施例的剖视示意图。该堆叠式半导体封装结构2包括一第一基板21、一半导体元件22、若干个凸块(Stud Bump)23、若干条第一导线24、一第二基板25、一支撑胶体26、一封胶材料27、若干个焊球28。Please refer to FIG. 2 , which is a schematic cross-sectional view of the first embodiment of the stacked semiconductor package structure of the present invention. The stacked
该第一基板21具有一第一表面211及一第二表面212。该半导体元件22位于该第一基板21的第一表面211,且电性连接至该第一基板21的第一表面211。在本实施例中,该半导体元件22为一芯片,该半导体元件22是以覆晶方式附着至该第一基板21的第一表面211上。The
这些凸块23(例如金凸块(Gold Stud Bump))位于该半导体元件22上方。在本实施例中,这些凸块23位于该半导体元件22的顶面上。这些第一导线24用来将这些凸块23连接至该第一基板21的第一表面211上。These bumps 23 (such as gold stud bumps) are located above the
该第二基板25具有一第一表面251及一第二表面252。该第二基板25的第一表面251具有若干个第一焊垫253,该第二基板25的第二表面252具有若干个第二焊垫254。这些凸块23与位于该第二基板25的第二表面252上的这些第二焊垫254相接触并形成电性连接。这些凸块23用以支撑该第二基板25,且将该第二基板25的信号经由这些第一导线24传递至该第一基板21。The
该支撑胶体26位于该半导体元件22的顶面和该第二基板25的第二表面252之间,用以增加对该第二基板25的支撑力量。该封胶材料27包覆该第一基板21的第一表面211、该半导体元件22、这些凸块23、这些第一导线24、该第二基板25的第二表面252及该支撑胶体26。这些焊球28位于该第一基板21的第二表面212。The supporting
在通常情况下,该堆叠式半导体封装结构2可以再将另一封装结构29或其它元件叠放于该第二基板25的第一表面251上,且与该第二基板25的第一表面251上的这些第一焊垫253电性连接。Under normal circumstances, the stacked
请参考图3所示的本发明堆叠式半导体封装结构的第一实施例的制造方法流程图。请同时参考图2,该堆叠式半导体封装结构2的制造方法包括以下步骤。步骤S301是提供一第一基板21,该第一基板21具有一第一表面211及一第二表面212。步骤S302是将一半导体元件22附着至该第一基板21的第一表面211,且该半导体元件22电性连接至该第一基板21的第一表面211。在本实施例中,该半导体元件22为一芯片,该半导体元件22是以覆晶方式附着至该第一基板21的第一表面211上。Please refer to the flowchart of the manufacturing method of the first embodiment of the stacked semiconductor package structure of the present invention shown in FIG. 3 . Please also refer to FIG. 2 , the manufacturing method of the stacked
步骤S303是在该半导体元件22上方形成一支撑胶体26。在本实施例中,该支撑胶体26是直接形成且黏附于该半导体元件22的顶面。要注意的是,本步骤为一选择性的步骤。步骤S304是在该半导体元件22上方形成若干个凸块23(例如金凸块(Gold Stud Bump))。在本实施例中,这些凸块23是直接形成且附着于该半导体元件22的顶面。Step S303 is to form a support colloid 26 above the
步骤S305是形成若干条第一导线24,用以将这些凸块23电性连接至该第一基板21的第一表面211。步骤S306是提供一第二基板25,该第二基板25具有一第一表面251及一第二表面252。步骤S307是将该第二基板25设置于这些凸块23及该支撑胶体26上,使得这些凸块23及该支撑胶体26接触且支撑该第二基板25的第二表面252。Step S305 is to form a plurality of
步骤S308为灌胶制程,其利用一封胶材料27以包覆该第一基板21的第一表面211、该半导体元件22、这些凸块23、这些第一导线24、该支撑胶体26及该第二基板25的第二表面252。步骤S309是在该第一基板21的第二表面212上形成若干个焊球28,从而得到该堆叠式半导体封装结构2。Step S308 is a potting process, which uses a sealing
在本发明中,由于不需要在该第二基板25上进行打线作业,因此不会出现如现有封装结构1(图1)中所产生的该第二基板13悬空及摇晃等问题。再者,在该封胶材料27的灌胶制程中,该封胶材料27不会溢进上模具(图中未表示)与该第二基板25的第一表面251之间,因此这些第一焊垫253不会受到污染。此外,该堆叠式半导体封装结构2的上表面(即该第二基板25的第一表面251)为一平整的表面,其不仅平面度佳,而且可再置放更大或是更多的另一封装结构29或其它元件。In the present invention, since there is no need to perform wire bonding on the
请参考图4所示的本发明堆叠式半导体封装结构的第二实施例的剖视示意图。该堆叠式半导体封装结构3包括一第一基板31、一半导体元件32、若干条第二导线33、一中介元件34、若干个凸块35、若干条第一导线36、一第二基板37、一支撑胶体38、一封胶材料39及若干个焊球40。Please refer to FIG. 4 , which is a schematic cross-sectional view of the second embodiment of the stacked semiconductor package structure of the present invention. The stacked
该第一基板31具有一第一表面311及一第二表面312。该半导体元件32位于该第一基板31的第一表面311,且电性连接至该第一基板31的第一表面311。在本实施例中,该半导体元件32为一第一芯片,该半导体元件32黏附于该第一基板31的第一表面311上,且利用这些第二导线33电性连接至该第一基板31的第一表面311。The
该中介元件34黏附于该半导体元件32上。该中介元件34可以是一间隔物(Spacer),该间隔物不具有电性功能;或是该中介元件34也可以是另一个具有电性功能的芯片。The
这些凸块35(例如金凸块(Gold Stud Bump))位于该半导体元件32上方。在本实施例中,这些凸块35位于该中介元件34的顶面上。这些第一导线36可以将这些凸块35电性连接至该第一基板31的第一表面311。These bumps 35 (such as gold stud bumps) are located above the
该第二基板37具有一第一表面371及一第二表面372。该第二基板37的第一表面371具有若干个第一焊垫373,该第二基板37的第二表面372具有若干个第二焊垫374。这些凸块35是与位于该第二基板37的第二表面372上的这些第二焊垫374电性连接并相互接触。这些凸块35用以支撑该第二基板37,且将该第二基板37的信号经由这些第一导线35传递至该第一基板31。The
该支撑胶体38位于该中介元件34的顶面及该第二基板37的第二表面372之间,用以增加对该第二基板37的支撑力量。该封胶材料39包覆该第一基板31的第一表面311、该半导体元件32、这些第二导线33、该中介元件34、这些凸块35、这些第一导线36、该第二基板37的第二表面372及该支撑胶体38。这些焊球40位于该第一基板31的第二表面312。The supporting
在通常情况下,由于本发明堆叠式半导体封装结构3的上表面(即第二基板37的第一表面371)为一平整的表面,所以该堆叠式半导体封装结构3可以再将另一封装结构41或其它元件叠放于该第二基板37的第一表面371上,且与该第二基板37的第一表面371上的这些第一焊垫373电性连接。Under normal circumstances, since the upper surface of the stacked
参考图5所示的本发明堆叠式半导体封装结构的第二实施例的制造方法流程图。请同时参考图4所示,该堆叠式半导体封装结构3的制造方法包括以下步骤。步骤S501是提供一第一基板31,该第一基板31具有一第一表面311及一第二表面312。步骤S502是将一半导体元件32附着至该第一基板31的第一表面311,且该半导体元件32电性连接至该第一基板31的第一表面311。在本实施例中,该半导体元件32为一第一芯片,本步骤是将该半导体元件32黏附于该第一基板31的第一表面311上,且利用这些第二导线33将该半导体元件32电性连接至该第一基板31的第一表面311。Refer to the flow chart of the manufacturing method of the second embodiment of the stacked semiconductor package structure of the present invention shown in FIG. 5 . Please also refer to FIG. 4 , the manufacturing method of the stacked
步骤S503是将一中介元件34黏附至该半导体元件32的顶面。该中介元件34可以是一间隔物,该间隔物不具有电性功能;或是该中介元件34也可以是另一个具有电性功能的芯片。Step S503 is to adhere an
步骤S504是在该半导体元件32上方形成一支撑胶体38。在本实施例中,该支撑胶体38直接形成且黏附于该中介元件34的顶面。要注意的是,本步骤为一选择性的步骤。步骤S505是在该半导体元件32上方形成若干个凸块35(例如金凸块(Gold Stud Bump))。在本实施例中,这些凸块35直接形成且附着于该中介元件34的顶面。Step S504 is to form a
步骤S506是形成若干条第一导线36以将这些凸块35电性连接至该第一基板31的第一表面311。步骤S507是提供一第二基板37,该第二基板37具有一第一表面371及一第二表面372。步骤S508是将该第二基板37设置于这些凸块35及该支撑胶体38上,使得这些凸块35与该支撑胶体38相接触且用于支撑该第二基板37的第二表面372。Step S506 is to form a plurality of
步骤S509为灌胶制程,其利用一封胶材料39以包覆该第一基板31的第一表面311、该半导体元件32、这些第二导线33、该中介元件34、这些凸块35、这些第一导线36、该第二基板37的第二表面372及该支撑胶体38。步骤S510是于该第一基板31的第二表面312上形成若干个焊球40,从而得到该堆叠式半导体封装结构3。Step S509 is a potting process, which utilizes a sealing
请参考图6所示的本发明堆叠式半导体封装结构的第三实施例的剖视示意图。该堆叠式半导体封装结构5与该第二实施例的堆叠式半导体封装结构3(图4)的不同之处在于:该堆叠式半导体封装结构5多了一第二芯片42,该第二芯片42黏附于该中介元件34上,且该支撑胶体38与这些凸块35位于该第二芯片42的顶面上。而且在本实施例中,该中介元件34为一不具有信号传输功能的间隔物。Please refer to FIG. 6 , which is a schematic cross-sectional view of a third embodiment of the stacked semiconductor package structure of the present invention. The difference between the stacked
该堆叠式半导体封装结构5的制造方法与该第二实施例的堆叠式半导体封装结构3的制造方法(图5)的不同之处在于:在该图5所示的步骤S503之后,还包括一将一第二芯片42黏附于该中介元件34上的步骤。且在该图5所示的步骤S504中的支撑胶体38直接形成且黏附于该第二芯片42的顶面,在该图5所示的步骤S505中的这些凸块35直接形成且附着于该第二芯片42的顶面。The difference between the manufacturing method of the stacked
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CN100539131C (en) * | 2007-11-29 | 2009-09-09 | 日月光半导体制造股份有限公司 | Electronic component packaging structure |
CN103311207A (en) * | 2013-05-29 | 2013-09-18 | 华为技术有限公司 | Stacked package structure |
CN104900597A (en) * | 2014-03-07 | 2015-09-09 | 台湾积体电路制造股份有限公司 | Semiconductor package and method |
CN112038299A (en) * | 2019-06-04 | 2020-12-04 | 胜丽国际股份有限公司 | Stacked Sensor Package Structure |
WO2024007392A1 (en) * | 2022-07-08 | 2024-01-11 | 长鑫存储技术有限公司 | Semiconductor package structure and preparation method therefor |
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TW556961U (en) * | 2002-12-31 | 2003-10-01 | Advanced Semiconductor Eng | Multi-chip stack flip-chip package |
CN100524736C (en) * | 2005-11-11 | 2009-08-05 | 南茂科技股份有限公司 | Stacked chip package structure |
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CN100539131C (en) * | 2007-11-29 | 2009-09-09 | 日月光半导体制造股份有限公司 | Electronic component packaging structure |
CN103311207A (en) * | 2013-05-29 | 2013-09-18 | 华为技术有限公司 | Stacked package structure |
CN104900597A (en) * | 2014-03-07 | 2015-09-09 | 台湾积体电路制造股份有限公司 | Semiconductor package and method |
CN104900597B (en) * | 2014-03-07 | 2018-06-08 | 台湾积体电路制造股份有限公司 | Semiconductor package part and method |
CN112038299A (en) * | 2019-06-04 | 2020-12-04 | 胜丽国际股份有限公司 | Stacked Sensor Package Structure |
CN112038299B (en) * | 2019-06-04 | 2022-05-06 | 胜丽国际股份有限公司 | Stacked Sensor Package Structure |
WO2024007392A1 (en) * | 2022-07-08 | 2024-01-11 | 长鑫存储技术有限公司 | Semiconductor package structure and preparation method therefor |
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