CN101071640B - Methods of Verifying Flash Memory Devices - Google Patents
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- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
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Abstract
一种验证闪存器件的方法,包括:将分别连接到偶数位线和奇数位线的存储器单元串放电;接着,将电压施加到分别连接到偶数位线和奇数位线的存储器单元串,从而对存储器单元串进行预充电;通过对连接到偶数位线的每个存储器单元串的状态进行感测将连接到偶数位线的存储器单元串验证为被擦除;以及通过对连接到奇数位线的存储器单元串的状态进行感测将连接到奇数位线的每个存储器单元串验证为被擦除。
A method of verifying a flash memory device, comprising: discharging memory cell strings respectively connected to even bit lines and odd bit lines; then, applying a voltage to the memory cell strings respectively connected to even bit lines and odd bit lines, thereby to memory cell strings are precharged; memory cell strings connected to even bit lines are verified as erased by sensing the state of each memory cell string connected to the even bit lines; and memory cell strings connected to odd bit lines are verified as erased; The state of the memory cell strings is sensed to verify that each memory cell string connected to an odd bit line is erased.
Description
技术领域technical field
本专利一般地涉及一种闪存器件,并且更具体地,涉及一种使用页面缓冲器来验证闪存器件的方法,其中可以减少编程或擦除的验证时间并且可以缩短总驱动时间。This patent generally relates to a flash memory device, and more particularly, to a method of verifying a flash memory device using a page buffer, in which the verification time for programming or erasing can be reduced and the total driving time can be shortened.
背景技术Background technique
近些年,对这种半导体存储器件的需求增加,所述半导体存储器件可以进行电编程和擦除并且不需要每隔一段时间重写数据的刷新功能。另外,为了开发具有能够存储大量数据的大容量的存储器件,已经开发了存储器单元的高度集成技术。In recent years, demand has increased for semiconductor memory devices that can be electrically programmed and erased and that do not require a refresh function of rewriting data every once in a while. In addition, in order to develop a memory device having a large capacity capable of storing a large amount of data, a high integration technology of memory cells has been developed.
为了提高存储器单元的集成度,NAND闪存器件可以具有多个单元,将这些单元串联以形成一串和共享一个接触的两串。在NAND闪存器件中,通过控制存储器单元的阈值电压同时借助F-N隧穿将电子注入到浮动栅中从浮动栅中放出电子来执行编程和擦除。To increase the integration of memory cells, a NAND flash memory device may have multiple cells that are connected in series to form one string and two strings that share a contact. In a NAND flash memory device, programming and erasing are performed by controlling a threshold voltage of a memory cell while injecting electrons into a floating gate by F-N tunneling and releasing electrons from the floating gate.
因此,由于浮动栅的电子从擦除的单元放出,所以擦除的单元具有负的阈值电压。由于电子注入到编程单元的浮动栅中,所以编程的单元具有正的阈值电压。但是,在NAND闪存器件的情形中,可能由于电荷增益(gain)或电荷损失而出现失败。可以执行一些与这些特性有关的验证。为了验证编程和擦除是否已正常执行,使用页面缓冲器。Therefore, the erased cell has a negative threshold voltage due to the discharge of electrons of the floating gate from the erased cell. A programmed cell has a positive threshold voltage due to the injection of electrons into the floating gate of the programmed cell. However, in the case of NAND flash memory devices, failures may occur due to charge gain or charge loss. Some validation can be performed with respect to these properties. In order to verify that programming and erasing have been performed normally, the page buffer is used.
页面缓冲器用于从I/O焊盘接收大量的数据并且将所接收的数据供给到存储器单元或者存储存储器单元的数据且然后输出所存储的数据。过去,页面缓冲器由单个寄存器构成以临时存储数据。现在,页面缓冲器包括双寄存器,以便在NAND闪存器件中在对大容量数据进行编程时增加编程的速度。The page buffer is used to receive a large amount of data from the I/O pad and supply the received data to the memory unit or store the data of the memory unit and then output the stored data. In the past, the page buffer consisted of a single register to temporarily store data. Now, the page buffer includes double registers in order to increase the speed of programming when programming large-capacity data in the NAND flash memory device.
为了对具有双寄存器结构的页面缓冲器的NAND闪存器件执行擦除验证,使用一种列扫描方法:通过施加0V电压到全部字线来确定所有单元是否已接通。在这种列扫描方法中,如果一个单元关断则确定为失败。In order to perform erase verification on a NAND flash memory device having a page buffer of a double register structure, a column scan method is used to determine whether all cells are turned on by applying a voltage of 0V to all word lines. In this column scan method, a failure is determined if a cell is turned off.
为了进行擦除验证,以与普通读取操作相同的方式,通过包括预充电、估算和感测的三个步骤,在所选位线上执行擦除验证。在上述列扫描方法中,通过将位线分成偶数位线和奇数位线来实现擦除验证。相应地,在偶数位线被验证之后,验证奇数位线。因此,通过两次验证过程来确定是否已执行擦除。这导致了长的擦除验证时间。For erase verification, erase verification is performed on a selected bit line through three steps including precharge, evaluation, and sensing in the same manner as a normal read operation. In the column scan method described above, erasure verification is realized by dividing bit lines into even bit lines and odd bit lines. Accordingly, after the even bit lines are verified, the odd bit lines are verified. Therefore, it is determined whether erasure has been performed by two verification processes. This results in long erase verification times.
同时,在多级单元中,擦除单元的阈值电压分布对编程单元的阈值电压有影响。因此,在已完成擦除的单元上执行后置程序(post program)。通过采用ISPP方法来执行后置程序并且在后置程序之后执行擦除验证。因此,如果擦除验证时间变长,则延长了总擦除时间。Meanwhile, in a multi-level cell, the threshold voltage distribution of erased cells has an influence on the threshold voltage of programmed cells. Therefore, a post program is executed on the erased cells. The post procedure is performed by adopting the ISPP method and the erasure verification is performed after the post procedure. Therefore, if the erase verification time becomes longer, the total erase time is extended.
另外,在编程时,以与上面相同的方式延长了编程验证时间。因此,总编程时间变长。Also, at the time of programming, the program verification time is extended in the same manner as above. Therefore, the total programming time becomes longer.
发明内容Contents of the invention
因此,本专利解决了上述问题,并且公开了一种验证闪存器件的方法,其中可以缩短验证时间并缩短总驱动时间。Therefore, this patent solves the above-mentioned problems and discloses a method of verifying a flash memory device in which the verification time can be shortened and the total driving time can be shortened.
本专利还公开了一种验证闪存器件的方法,其中对偶数位线和奇数位线同时进行预充电和估算,且随后顺序地进行感测,因此减少了验证时间。This patent also discloses a method of verifying a flash memory device, in which even and odd bit lines are precharged and evaluated simultaneously, and then sensed sequentially, thereby reducing verification time.
本专利还公开了一种验证闪存器件的方法,其中通过对偶数位线和奇数位线同时进行预充电和估算且随后顺序地对偶数位线和奇数位线进行感测,与现有技术相比本方法可以将验证时间减少一半,且因此与现有技术相比可以将总驱动时间减少2/3。This patent also discloses a method of verifying a flash memory device by simultaneously precharging and estimating even and odd bit lines and then sequentially sensing even and odd bit lines, compared to the prior art The verification time can be cut in half compared to the present method, and thus the total drive time can be reduced by 2/3 compared to the prior art.
根据本发明的一方面,提供一种验证闪存器件的方法,包括以下步骤:将分别连接到偶数位线和奇数位线的存储器单元串放电;将电压施加到分别连接到偶数位线和奇数位线的每个存储器单元串,从而对存储器单元串进行预充电;通过对连接到偶数位线的存储器单元串的状态进行感测来验证连接到该偶数位线的存储器单元串是否已经被擦除;并通过对连接到奇数位线的存储器单元串的状态进行感测来验证连接到该奇数位线的存储器单元串是否已经被擦除。According to an aspect of the present invention, there is provided a method for verifying a flash memory device, comprising the steps of: discharging memory cell strings respectively connected to even bit lines and odd bit lines; each memory cell string on the line, thereby precharging the memory cell string; verifying whether the memory cell string connected to the even bit line has been erased by sensing the state of the memory cell string connected to the even bit line ; and verify whether the memory cell string connected to the odd bit line has been erased by sensing the state of the memory cell string connected to the odd bit line.
在此专利中还描述了一种验证闪存器件的方法,包括:将分别连接到偶数位线和奇数位线的存储器单元串放电;将电压施加到分别连接到偶数位线和奇数位线的存储器单元串,从而对存储器单元串进行预充电;通过对连接到偶数位线的存储器单元串的状态进行感测来验证连接到偶数位线的存储器单元串是否已经被编程,以及通过对连接到奇数位线的存储器单元串的状态进行感测来验证连接到奇数位线的存储器单元串是否已经被编程。Also described in this patent is a method of verifying a flash memory device comprising: discharging memory cell strings respectively connected to even and odd bit lines; applying voltages to memory cell strings respectively connected to even and odd bit lines cell strings, thereby precharging the memory cell strings; verifying whether the memory cell strings connected to the even bit lines have been programmed by sensing the state of the memory cell strings connected to the even bit lines; The state of the memory cell strings of the bit lines is sensed to verify whether the memory cell strings connected to the odd bit lines have been programmed.
本专利还描述了一种验证闪存器件的方法,其中该闪存器件包括:第一晶体管,用于响应于第一控制信号通过偶数位线和奇数位线将验证信号供给到存储器单元阵列;第二晶体管,用于响应于第二控制信号通过偶数位线和奇数位线来连接存储器单元阵列和第一节点;第三晶体管,用于响应第三控制信号将电流供给到第一节点;锁存器,用于存储来自存储器单元阵列的所选单元的输出数据;第四晶体管,用于根据第一节点的电压电平和第四控制信号来控制锁存器的状态。该方法包括:响应第一控制信号对分别连接到偶数位线和奇数位线的存储器单元串进行放电,且同时,响应第三控制信号将电压供给到第一节点,且同时,响应第一电压电平的第二控制信号将第一节点的电压供给到分别连接到偶数位线和奇数位线的存储器单元串,从而对存储器单元串预充电;响应第二电压电平的第二控制信号通过存储连接到偶数位线的存储器单元串的状态来验证连接到偶数位线的存储器单元串是否已被擦除;以及,响应第三电压电平的第二控制信号通过存储连接到奇数位线的存储器单元串的状态来验证连接到奇数位线的存储器单元串是否已被擦除。This patent also describes a method of verifying a flash memory device, wherein the flash memory device includes: a first transistor for supplying a verification signal to a memory cell array through an even bit line and an odd bit line in response to a first control signal; a transistor for connecting the memory cell array and the first node through an even bit line and an odd bit line in response to a second control signal; a third transistor for supplying a current to the first node in response to a third control signal; a latch , for storing output data from selected cells of the memory cell array; and a fourth transistor, for controlling the state of the latch according to the voltage level of the first node and the fourth control signal. The method includes: discharging memory cell strings respectively connected to even and odd bit lines in response to a first control signal, and at the same time, supplying a voltage to the first node in response to a third control signal, and at the same time, responding to the first voltage The second control signal of the level supplies the voltage of the first node to the memory cell strings respectively connected to the even bit lines and the odd bit lines, thereby precharging the memory cell strings; in response to the second control signal of the second voltage level by Storing the states of the memory cell strings connected to the even bit lines to verify whether the memory cell strings connected to the even bit lines have been erased; The state of the memory cell strings is used to verify whether the memory cell strings connected to the odd bit lines have been erased.
第一控制信号可以保持为1.6到5.5V的电压电平或电源电压Vcc。The first control signal may maintain a voltage level of 1.6 to 5.5V or a power supply voltage Vcc.
第一电压电平的第二控制信号可以保持为1.0到5.5V的电压电平或电源电压Vcc,第二电压电平和第三电压电平的第二控制信号可以保持为1.0到2.2V的电压电平,并且第二电压电平可以保持为与第一电压电平相同或更高的电压电平。The second control signal of the first voltage level can be maintained at a voltage level of 1.0 to 5.5V or the power supply voltage Vcc, and the second control signal of the second voltage level and the third voltage level can be maintained at a voltage of 1.0 to 2.2V level, and the second voltage level may be maintained at the same or higher voltage level as the first voltage level.
可将第二电压电平的第二控制信号的施加时间设置为比第三电压电平的第二控制信号的施加时间长。The application time of the second control signal of the second voltage level may be set to be longer than the application time of the second control signal of the third voltage level.
附图说明Description of drawings
图1是根据本发明的实施例的验证NAND闪存器件的方法中使用的页面缓冲器的电路图;以及1 is a circuit diagram of a page buffer used in a method for verifying a NAND flash memory device according to an embodiment of the present invention; and
图2是页面缓冲器的操作波形,用于说明根据本发明的实施例的验证NAND闪存器件的方法。FIG. 2 is an operation waveform of a page buffer for illustrating a method of verifying a NAND flash memory device according to an embodiment of the present invention.
具体实施方式Detailed ways
现在将参照附图描述根据本专利的各实施例。因为这些实施例是为了让本领域技术人员能够理解本专利而提供的,所以它们可以以各种方式进行修改并且本专利的范围不受后面描述的各实施例限制。Embodiments according to this patent will now be described with reference to the accompanying drawings. Since these embodiments are provided for those skilled in the art to understand this patent, they can be modified in various ways and the scope of this patent is not limited by each embodiment described later.
图1是根据本发明的实施例的验证NAND闪存器件的方法中使用的页面缓冲器的电路图。在图1中示出了具有主寄存器和高速缓存寄存器的双寄存器结构的页面缓冲器中的主寄存器的电路图。FIG. 1 is a circuit diagram of a page buffer used in a method of verifying a NAND flash memory device according to an embodiment of the present invention. FIG. 1 shows a circuit diagram of a main register in a page buffer having a dual register structure of a main register and a cache register.
参见图1,位线选择单元120包括多个晶体管。分别响应于偶数和奇数放电信号DISCHe和DISCHo来驱动第一和第二NMOS晶体管N101和N102,并相应地将验证电压VIRPWR施加到连接到偶数位线BLe或奇数位线BLo的存储器单元阵列110的存储器单元串。分别响应于偶数和奇数位线选择信号BSLe和BSLo来驱动第三和第四NMOS晶体管N103和N104,并相应地连接存储器单元阵列110的位线和感测节点SO。Referring to FIG. 1, the bit line selection unit 120 includes a plurality of transistors. The first and second NMOS transistors N101 and N102 are driven in response to the even and odd discharge signals DISCHe and DISCHo, respectively, and correspondingly apply the verification voltage VIRPWR to the memory cell array 110 connected to the even bit line BLe or the odd bit line BLo. string of memory cells. The third and fourth NMOS transistors N103 and N104 are driven in response to the even and odd bit line selection signals BSLe and BSLo, respectively, and connect the bit lines of the memory cell array 110 and the sense node SO accordingly.
响应于预充电信号PRECHb来驱动PMOS晶体管P101,从而将电压施加到感测节点SO。The PMOS transistor P101 is driven in response to the precharge signal PRECHb, thereby applying a voltage to the sense node SO.
在回拷贝程序时,第五NMOS晶体管105响应回拷贝信号COPYBACK而连接感测节点SO和锁存器130的输出节点QAb。锁存器130临时存储从存储器单元阵列110输出的输出数据以及外部供给的数据。根据感测节点SO的电压电平来驱动第六NMOS晶体管N106。响应读取信号READ_L来驱动第七NMOS晶体管N107,并因此连接了锁存器130的输出节点QAb和接地端子Vss。During the copy-back process, the fifth NMOS transistor 105 is connected to the sense node SO and the output node QAb of the latch 130 in response to the copy-back signal COPYBACK. The latch 130 temporarily stores output data output from the memory cell array 110 and externally supplied data. The sixth NMOS transistor N106 is driven according to the voltage level of the sensing node SO. The seventh NMOS transistor N107 is driven in response to the read signal READ_L, and thus connects the output node QAb of the latch 130 and the ground terminal Vss.
响应于信号DI_L来驱动第八NMOS晶体管N108,并因此连接了I/O端子YA和锁存器130的输出节点QAb。响应信号nDI_L来驱动第九NMOS晶体管N109,并因此连接了I/O端子YA和锁存器130的输入节点QA。响应重置信号RESET_L来驱动第十NMOS晶体管N110并因此重置锁存器130。在编程操作时响应信号PROGRAM_L来驱动第十一NMOS晶体管N111,并因此将待编程的信息发送到所选位线。The eighth NMOS transistor N108 is driven in response to the signal DI_L, and thus connects the I/O terminal YA and the output node QAb of the latch 130 . The ninth NMOS transistor N109 is driven in response to the signal nDI_L, and thus connects the I/O terminal YA and the input node QA of the latch 130 . The tenth NMOS transistor N110 is driven in response to a reset signal RESET_L and thus resets the latch 130 . The eleventh NMOS transistor N111 is driven in response to the signal PROGRAM_L in a program operation, and thus transmits information to be programmed to a selected bit line.
响应信号PBDO_L来驱动第十二NMOS晶体管N112并且因此输出编程节点NA的电压电平。另外,反向器I101将锁存器130的输出节点QAb的电压电平反相,并且将反相的电压电平传送到编程节点NA。The twelfth NMOS transistor N112 is driven in response to the signal PBDO_L and thus outputs the voltage level of the program node NA. In addition, the inverter I101 inverts the voltage level of the output node QAb of the latch 130 and transmits the inverted voltage level to the program node NA.
图2是页面缓冲器的操作波形,用于说明根据本发明实施例的验证NAND闪存器件的方法。下面将参考图1和2来描述根据本发明实施例的NAND闪存器件的擦除验证方法。FIG. 2 is an operation waveform of a page buffer for illustrating a method for verifying a NAND flash memory device according to an embodiment of the present invention. An erasure verification method for a NAND flash memory device according to an embodiment of the present invention will be described below with reference to FIGS. 1 and 2 .
1)时段A:放电1) Period A: discharge
在同一时间段,同时施加为1.6V到5.5V的高电平或电源电压Vcc的偶数和奇数放电信号DISCHe和DISCHo,从而接通第一和第二NMOS晶体管N101和N102。因此,验证信号VIRPWR的电压电平通过第一和第二NMOS晶体管N101和N102供给到位线BLe和BLo。在擦除验证时验证信号VIRPWR保持0V的电压电平。因此,偶数和奇数位线BLe和BLo被施加以0V的电压。另外,重置信号RESET_L被施加为高电平的脉冲,从而接通第十NMOS晶体管N110。因此,节点QA变成低电平并且节点QAb保持高电平。结果,重置锁存器130。此时,全部字线WL0到WL31被施加以0到1V的电压,并且漏极选择线DSL和源极选择线SSL也被施加以0V的电压。During the same period, the even and odd discharge signals DISCHe and DISCHo of a high level of 1.6V to 5.5V or the power supply voltage Vcc are simultaneously applied, thereby turning on the first and second NMOS transistors N101 and N102 . Accordingly, the voltage level of the verification signal VIRPWR is supplied to the bit lines BLe and BLo through the first and second NMOS transistors N101 and N102. The verification signal VIRPWR maintains a voltage level of 0V at the time of erase verification. Therefore, the even and odd bit lines BLe and BLo are applied with a voltage of 0V. In addition, the reset signal RESET_L is applied as a pulse of a high level, thereby turning on the tenth NMOS transistor N110. Therefore, node QA becomes low level and node QAb maintains high level. As a result, latch 130 is reset. At this time, all the word lines WL0 to WL31 are applied with a voltage of 0 to 1V, and the drain selection line DSL and the source selection line SSL are also applied with a voltage of 0V.
2)时段B:预充电2) Period B: pre-charging
当偶数和奇数放电信号DISCHe和DISCHo被施加为低电平时,第一和第二NMOS晶体管N101和N102关断。另外,由于将预充电信号PRECHb施加为低电平,所以第一PMOS晶体管P101接通。因此,将电源电压Vcc施加到感测节点SO,使得感测节点SO保持高电平。另外,将偶数和奇数位线选择信号BSLe和BSLo施加为1.0到5.5V的电压电平或者约为电源电压Vcc的第一电压V1。因此,偶数和奇数位线BLe和BLo被分别施加以第一电压V1和电压(V1-Vt)(其中从第一电压V1减去第三或第四NMOS晶体管N103或N104的阈值电压Vt)。在此情形中,对漏极选择线DSL施加了电压。When the even and odd discharge signals DISCHe and DISCHo are applied at a low level, the first and second NMOS transistors N101 and N102 are turned off. In addition, since the precharge signal PRECHb is applied to a low level, the first PMOS transistor P101 is turned on. Accordingly, the power supply voltage Vcc is applied to the sensing node SO such that the sensing node SO maintains a high level. In addition, the even and odd bit line selection signals BSLe and BSLo are applied at a voltage level of 1.0 to 5.5V or a first voltage V1 approximately of a power supply voltage Vcc. Accordingly, the even and odd bit lines BLe and BLo are respectively applied with the first voltage V1 and the voltage (V1-Vt) in which the threshold voltage Vt of the third or fourth NMOS transistor N103 or N104 is subtracted from the first voltage V1. In this case, a voltage is applied to the drain select line DSL.
3)时段C:估算3) Period C: Estimation
由于偶数和奇数位线选择信号BSLe和BSLo被施加为低电平,所以第三和第四NMOS晶体管N103和N104关断。因此,停止了对偶数和奇数位线BLe和BLo的功率供给,并且根据连接到偶数和奇数位线BLe和BLo的存储器单元的状态分别控制偶数和奇数位线BLe和BLo的电压电平。即,如果存储器单元不处于擦除状态,则偶数或奇数位线BLe或BLo的电压电平保持为V1-Vt的电压电平。但是,如果存储器单元处于擦除状态,则偶数或奇数位线BLe和BLo的电压电平从V1-Vt逐渐减小并且随后保持为低电平。此时,由于第一PMOS晶体管P101通过低电平的预充电信号PRECHb而保持接通,所以感测节点SO保持高电平。同时,通过漏极选择线DSL和源极选择线SSL而施加高电平的信号。单元估算时段被设置为保持10μs或更少的时间。Since the even and odd bit line selection signals BSLe and BSLo are applied to a low level, the third and fourth NMOS transistors N103 and N104 are turned off. Accordingly, power supply to the even and odd bit lines BLe and BLo is stopped, and the voltage levels of the even and odd bit lines BLe and BLo are respectively controlled according to states of memory cells connected to the even and odd bit lines BLe and BLo. That is, if the memory cell is not in the erased state, the voltage level of the even or odd bit line BLe or BLo remains at the voltage level of V1-Vt. However, if the memory cell is in an erased state, the voltage levels of the even or odd bit lines BLe and BLo gradually decrease from V1-Vt and then remain at a low level. At this time, since the first PMOS transistor P101 is kept turned on by the precharge signal PRECHb of a low level, the sensing node SO maintains a high level. At the same time, a high-level signal is applied through the drain selection line DSL and the source selection line SSL. The cell evaluation period is set to hold for 10 μs or less.
4)时段D:偶数单元感测4) Period D: even cell sensing
由于将预充电信号PRECHb施加为高电平,所以第一PMOS晶体管P101关断。由于将偶数位线选择信号BSLe施加为保持约1.0到2.2V电压电平的第二电压V2,所以第三NMOS晶体管N103接通。如果存储器单元不是擦除单元,则将偶数位线BLe的电压电平保持为V1-Vt的电压电平,并将感测节点SO的电压电平保持为高电平。如果存储器单元不是擦除单元,则偶数位线Ble的电压电平保持为V1-Vt的电压电平且感测节点SO的电压电平保持为高电平。如果存储器单元处在擦除状态,则偶数位线Ble的电压电平逐渐降低且然后保持为低电平。在此状态中,如果读取信号READ_L被施加为1.0到10μs的高电平脉冲,则当存储器单元不是擦除单元时感测节点SO保持为高电平。因此,响应高脉冲的读取信号READ_L,第六NMOS晶体管N106接通并且第七NMOS晶体管N107接通。结果,节点QAb保持为低电平并且节点QA保持为高电平。相反,如果存储器单元是擦除单元,则感测节点SO保持为低电平且第七NMOS晶体管N107关断。因此,节点QAb被保持为高电平并且节点QA保持为低电平。因此,对节点QA的电压电平进行检测以便感测偶数单元的状态。Since the precharge signal PRECHb is applied to a high level, the first PMOS transistor P101 is turned off. Since the even bit line selection signal BSLe is applied as the second voltage V2 maintaining a voltage level of about 1.0 to 2.2V, the third NMOS transistor N103 is turned on. If the memory cell is not an erased cell, the voltage level of the even bit line BLe is maintained at a voltage level of V1-Vt, and the voltage level of the sense node SO is maintained at a high level. If the memory cell is not an erased cell, the voltage level of the even bit line Ble remains at the voltage level of V1-Vt and the voltage level of the sensing node SO remains at the high level. If the memory cell is in an erased state, the voltage level of the even bit line Ble gradually decreases and then remains at a low level. In this state, if the read signal READ_L is applied as a high level pulse of 1.0 to 10 μs, the sense node SO remains at a high level when the memory cell is not an erased cell. Therefore, in response to the read signal READ_L of the high pulse, the sixth NMOS transistor N106 is turned on and the seventh NMOS transistor N107 is turned on. As a result, node QAb remains at low level and node QA remains at high level. On the contrary, if the memory cell is an erased cell, the sense node SO remains at a low level and the seventh NMOS transistor N107 is turned off. Therefore, node QAb is held at high level and node QA is held at low level. Therefore, the voltage level of the node QA is detected in order to sense the state of the even-numbered cells.
5)时段E:奇数单元感测5) Period E: odd cell sensing
由于将偶数位线选择信号BSLe施加为低电平,所以第三NMOS晶体管N103关断。由于将奇数位线选择信号BSLo施加为保持到大约1.0到2.2V电压电平的第三电压V3,所以第四NMOS晶体管N104接通。要求第三电压V3小于或等于第二电压V2并且第三电压V3的施加时间短于第二电压V2的施加时间。如果存储器单元不是擦除单元,则奇数位线BLo的电压电平被保持为V1-Vt的电压电平,并且感测节点SO的电压电平保持为高电平。Since the even bit line selection signal BSLe is applied to a low level, the third NMOS transistor N103 is turned off. Since the odd bit line selection signal BSLo is applied as the third voltage V3 maintained to a voltage level of about 1.0 to 2.2V, the fourth NMOS transistor N104 is turned on. It is required that the third voltage V3 is less than or equal to the second voltage V2 and the application time of the third voltage V3 is shorter than the application time of the second voltage V2. If the memory cell is not an erased cell, the voltage level of the odd bit line BLo is maintained at a voltage level of V1-Vt, and the voltage level of the sense node SO is maintained at a high level.
但是,如果存储器单元是处于擦除状态,则奇数位线BLo的电压电平逐渐减小且随后保持为低电平,并且感测节点SO的电压电平保持为低电平。在此状态中,将读取信号READ_L施加为1.0到10μs高电平脉冲。如果存储器单元不在擦除单元中,则感测节点SO保持为高电平。因此,响应高脉冲的读取信号READ_L,第六NMOS晶体管N106接通并且第七NMOS晶体管N107接通。由于节点QAb保持为低电平,所以节点QA保持为高电平。相反,如果存储器单元是擦除单元,则感测节点SO保持为低电平,并且第七NMOS晶体管N107关断。因此,节点QAb保持为高电平并且节点QA保持为低电平。因此,对节点QA的电压电平进行检测以便感测奇数单元的状态。However, if the memory cell is in an erased state, the voltage level of the odd bit line BLo gradually decreases and then remains at a low level, and the voltage level of the sense node SO remains at a low level. In this state, the read signal READ_L is applied as a 1.0 to 10 μs high-level pulse. If the memory cell is not in the erased unit, the sense node SO remains at a high level. Therefore, in response to the read signal READ_L of the high pulse, the sixth NMOS transistor N106 is turned on and the seventh NMOS transistor N107 is turned on. Since node QAb remains at low level, node QA remains at high level. On the contrary, if the memory cell is an erased cell, the sense node SO remains at a low level, and the seventh NMOS transistor N107 is turned off. Therefore, node QAb remains at high level and node QA remains at low level. Therefore, the voltage level of node QA is detected in order to sense the state of odd cells.
上面已经描述了根据本发明实施例的NAND闪存器件的擦除验证方法。但是,该方法可以以相同方式应用到编程验证方法。因此,省略这种方法的详细描述。The erasure verification method of the NAND flash memory device according to the embodiment of the present invention has been described above. However, this method can be applied to the program verification method in the same manner. Therefore, a detailed description of this method is omitted.
如上所述,将偶数位线和奇数位线同时预充电和估算且随后顺序地进行感测。因此,擦除验证时间与现有技术相比最多可以减少一半,并且总擦除时间与现有技术相比可以减少2/3。因此可以提高器件的操作速度。另外,本发明可以以相同方式应用到编程验证。因此也可以减少编程时间。As described above, the even and odd bit lines are precharged and evaluated simultaneously and then sensed sequentially. Therefore, the erase verification time can be reduced by at most half compared with the prior art, and the total erase time can be reduced by 2/3 compared with the prior art. Therefore, the operating speed of the device can be increased. In addition, the present invention can be applied to program verification in the same manner. Programming times can thus also be reduced.
尽管已经关于各实施例作出前面的描述,应该理解,本领域普通技术人员在不脱离本专利和所附权利要求的精神和范围的情况下,可以对本专利进行变化和修改。Although the foregoing description has been made with respect to various embodiments, it should be understood that changes and modifications to this patent can be made by those skilled in the art without departing from the spirit and scope of this patent and the appended claims.
主要元件符号说明Description of main component symbols
110存储器单元阵列110 memory cell array
120位线选择单元120 bit line selection unit
130锁存器130 latches
Ble偶数位线Ble even bit line
Blo奇数位线BLoBlo Odd Bit Line BLo
BSLe偶数位线选择信号BSLe even bit line selection signal
BSLo奇数位线选择信号BSLo odd bit line select signal
COPYBACK回拷贝信号COPYBACK back copy signal
DI_L信号DI_L signal
DISChe偶数放电信号DISChe even discharge signal
DISCHo奇数放电信号DISCHo odd discharge signal
DSL漏极选择线DSL Drain Select Line
I101反向器I101 Inverter
N101第一NMOS晶体管N101 first NMOS transistor
N102第二NMOS晶体管N102 second NMOS transistor
N103第三NMOS晶体管N103 third NMOS transistor
N104第四NMOS晶体管N104 fourth NMOS transistor
N105第NMOS晶体管N105th NMOS transistor
N106第六NMOS晶体管N106 sixth NMOS transistor
N107第七NMOS晶体管N107 seventh NMOS transistor
N108第八NMOS晶体管N108 eighth NMOS transistor
N109第九NMOS晶体管N109 ninth NMOS transistor
N110第十NMOS晶体管N110 tenth NMOS transistor
N111第十一NMOS晶体管N111 eleventh NMOS transistor
N112第十二NMOS晶体管N112 Twelfth NMOS transistor
NA编程节点NA programming node
nDI_L信号nDI_L signal
P101PMOS晶体管P101PMOS transistor
P201第一PMOS晶体管P201 first PMOS transistor
PRECHb预充电信号PRECHb precharge signal
PROGRAM_L信号PROGRAM_L signal
QA输入节点QA input node
QAb输出节点QAb output node
READ_L读取信号READ_L read signal
RESET_L重置信号RESET_L reset signal
SO感测节点SO sensing node
SSL源极选择线SSL source select line
V1第一电压V1 first voltage
V2第二电压V2 second voltage
V3第三电压V3 third voltage
Vcc电源电压Vcc supply voltage
VIRPWR验证信号VIRPWR verification signal
Vss接地端子Vss ground terminal
Vt阈值电压Vt threshold voltage
WL0-WL31字线WL0-WL31 word line
YA I/O端子YA I/O terminal
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| KR101068494B1 (en) | 2009-06-29 | 2011-09-29 | 주식회사 하이닉스반도체 | Erasing Method of Nonvolatile Memory Device |
| KR101371516B1 (en) | 2009-10-21 | 2014-03-10 | 삼성전자주식회사 | The operation method of flash memory device and memory system including the same |
| CN103700400B (en) * | 2012-09-28 | 2017-10-31 | 上海华虹集成电路有限责任公司 | Data-latching circuit for Flash EEPROM |
| KR102153017B1 (en) * | 2012-12-07 | 2020-09-07 | 에스케이하이닉스 주식회사 | Semiconductor memory device and operation method thereof |
| CN110838323A (en) * | 2018-08-17 | 2020-02-25 | 北京兆易创新科技股份有限公司 | Programming method and system of memory |
| KR102701556B1 (en) * | 2019-04-08 | 2024-09-04 | 에스케이하이닉스 주식회사 | Page buffer, memory device having the page buffer and operating method thereof |
| US11314588B2 (en) * | 2019-11-11 | 2022-04-26 | Winbond Electronics Corp. | Memory device and multi physical cells error correction method thereof |
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| JPH09180483A (en) * | 1995-12-26 | 1997-07-11 | Sony Corp | Semiconductor nonvolatile storage device |
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| KR100259972B1 (en) * | 1997-01-21 | 2000-06-15 | 윤종용 | Non-volatile semiconductor memory device with more than two storage states per memory cell |
| JP3592887B2 (en) * | 1997-04-30 | 2004-11-24 | 株式会社東芝 | Nonvolatile semiconductor memory device |
| JP3447939B2 (en) * | 1997-12-10 | 2003-09-16 | 株式会社東芝 | Nonvolatile semiconductor memory and data reading method |
| KR19990075686A (en) * | 1998-03-23 | 1999-10-15 | 윤종용 | Nonvolatile Semiconductor Memory Devices |
| US6049492A (en) | 1998-06-29 | 2000-04-11 | Siemens Aktiengesellschaft | Interleaved sense amplifier with a single-sided precharge device |
| JP2002279788A (en) | 2001-03-16 | 2002-09-27 | Toshiba Corp | Non-volatile semiconductor memory |
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| CN1270394A (en) * | 1999-04-02 | 2000-10-18 | 株式会社东芝 | Non-volatile semiconductor memroy device and control method for data erasion |
| US6262928B1 (en) * | 2000-09-13 | 2001-07-17 | Silicon Access Networks, Inc. | Parallel test circuit and method for wide input/output DRAM |
| CN1641793A (en) * | 2004-01-15 | 2005-07-20 | 旺宏电子股份有限公司 | Programmable Verification Method of Flash Memory |
| DE102005052696A1 (en) * | 2004-10-28 | 2006-05-04 | Samsung Electronics Co., Ltd., Suwon | Non-volatile memory component, e.g. for portable device such as digital camera. mobile- (cell-) phone etc, has page buffer provided with scanning node selectively joined to bit line |
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