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CN101055321A - High transmittance touch screen - Google Patents

High transmittance touch screen Download PDF

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Publication number
CN101055321A
CN101055321A CNA2006100667862A CN200610066786A CN101055321A CN 101055321 A CN101055321 A CN 101055321A CN A2006100667862 A CNA2006100667862 A CN A2006100667862A CN 200610066786 A CN200610066786 A CN 200610066786A CN 101055321 A CN101055321 A CN 101055321A
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layer
touch screen
light transmittance
high light
screen according
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黄聪智
何斌圣
陈胜宗
游钦胜
陈筱君
张家智
黎家俨
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Danotech Co Ltd
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Danotech Co Ltd
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Abstract

本发明公开了一种高透光率触控屏,包括一基板以及至少一个多层反射结构,该多层反射结构是涂布在基板正面的四层结构,从邻近于基板的一侧算起,这些膜层的折射率设计为高、低、高、低;其中最外层是一具有保护功能的保护层,其折射率介于1.3~1.5,厚度至少是0.1微米,并且硬度通过9H的ASTM-D3363国际检验标准;通过此保护层的设计,使本发明的触控屏的透光率可达到ASTM-D1003 92%以上,还可以强化其表面的抗磨性。

Figure 200610066786

The invention discloses a high-transmittance touch screen, comprising a substrate and at least one multi-layer reflective structure. The multi-layer reflective structure is a four-layer structure coated on the front of the substrate. The refractive index of these film layers is designed to be high, low, high, and low, starting from the side adjacent to the substrate. The outermost layer is a protective layer with a protective function, the refractive index of which is between 1.3 and 1.5, the thickness is at least 0.1 micron, and the hardness passes the ASTM-D3363 international test standard of 9H. Through the design of this protective layer, the light transmittance of the touch screen of the invention can reach more than 92% of ASTM-D1003, and the wear resistance of its surface can also be enhanced.

Figure 200610066786

Description

高透光率触控屏High transmittance touch screen

技术领域technical field

本发明涉及一种具有多层反射结构的触控屏,特别是涉及一种以保护层(protective layer)作为该多层反射结构的表面层,以强化抗磨效果的电容式触控屏(capacitive touch panel)。The invention relates to a touch screen with a multi-layer reflective structure, in particular to a capacitive touch screen with a protective layer as the surface layer of the multi-layer reflective structure to enhance the anti-wear effect. touch panel).

背景技术Background technique

抗反射光学涂布层以往应用在建材玻璃、护目镜等产品中,而随着科技的进步该技术已渐渐转用在半导体、光盘读取头、液晶显示器以及触控板等领域上。在传统的抗反射光学涂布层的设计原理中,涂布在接触基板上的层面具有较高的折射率(即H),接下来与该层面临接着另一具有低折射率(即L)的涂层,故传统的抗反射光学涂布层的结构为从邻近于基板的方向算起依次为H、L、H、L。Anti-reflective optical coatings were used in building materials such as glass and goggles in the past, but with the advancement of technology, this technology has gradually been transferred to semiconductors, optical disc read heads, liquid crystal displays, and touch panels. In the design principle of traditional anti-reflective optical coating layers, the layer coated on the contact substrate has a higher refractive index (i.e. H), and then faces this layer followed by another layer with a lower refractive index (i.e. L). Therefore, the structure of the traditional anti-reflection optical coating layer is H, L, H, L in order from the direction adjacent to the substrate.

而中国台湾专利公告第562736号(与美国专利第6,586,101号为同案),则提出一种以透明导电层作为抗反射光学涂布层的表面层的技术,该案的抗反射光学涂布层,也具有四层结构,并且各层膜的折射率的设计从邻近于基板的一侧算起依次为L、H、L、H。由于通过上述设计,将透明导电层制作在最外层,这样在制作电极时就不需要像现有技术那样需要利用超声波焊接,破坏表层以暴露出下层的透明导电层,从而可以克服大量生产抗反射光学涂布层所面临的难题。And China Taiwan Patent Announcement No. 562736 (the same case as U.S. Patent No. 6,586,101), then proposes a technology that uses a transparent conductive layer as the surface layer of the anti-reflection optical coating layer, the anti-reflection optical coating layer of the case , also has a four-layer structure, and the design of the refractive index of each layer of film is L, H, L, H in order from the side adjacent to the substrate. Due to the above design, the transparent conductive layer is made on the outermost layer, so it is not necessary to use ultrasonic welding to destroy the surface layer to expose the transparent conductive layer of the lower layer, so as to overcome the resistance to mass production. Challenges in Reflective Optical Coatings.

综上所述现有技术中,都是在强调透光率的表现以及解决制程上的难题,但是都没有特别针对抗反射光学涂布层的外表层的抗磨性或者防电磁波干扰(EMI)或者整体透光率的稳定性的提升,提出进一步的解决方案。To sum up, in the prior art mentioned above, all are emphasizing the performance of light transmittance and solving the difficult problems in the process, but none of them are particularly aimed at the abrasion resistance or anti-electromagnetic interference (EMI) of the outer layer of the anti-reflective optical coating layer. Or improve the stability of the overall light transmittance, and propose further solutions.

发明内容Contents of the invention

本发明的主要目的在于提供一种高透光率触控屏,是在基板的正面涂布一多层反射结构,其中该多层结构的最外表层是一保护层,故本发明的高透光率触控屏除了具备高透光率外,还可以通过该保护层而进一步具有抗磨的特性。The main purpose of the present invention is to provide a high light transmittance touch screen, which is to coat a multi-layer reflective structure on the front surface of the substrate, wherein the outermost layer of the multi-layer structure is a protective layer, so the high transmittance of the present invention In addition to high light transmittance, the optical touch screen can further have anti-wear properties through the protective layer.

本发明的另一目的在于提供一种高透光率触控屏,是在基板的反面涂布另一多层反射结构,以更进一步减少反射而增加透光率,并具有防电磁波干扰(EMI)的功能。Another object of the present invention is to provide a high light transmittance touch screen, which is to coat another multi-layer reflective structure on the back surface of the substrate to further reduce reflection and increase light transmittance, and has anti-electromagnetic interference (EMI) ) function.

本发明的又一目的在于提供一种高透光率触控屏,是在涂布在基板的正面/反面的多层反射结构中,可增设一第五层(抗炫光层)(anti-glare layer),以使整体的透光率在可见光波长范围内的表现可更为稳定。Yet another object of the present invention is to provide a touch screen with high light transmittance, which can add a fifth layer (anti-glare layer) (anti- Glare layer), so that the overall light transmittance can be more stable in the visible light wavelength range.

基于上述主要目的,本发明提供一种高透光率触控屏,包括一基板以及一涂布在该基板正面的第一抗反射涂布层结构,该层结构的优选方式是将折射率设计为高、低、高、低的四层结构(从邻近于基板的一侧算起),且该四层结构称为第一~第四层。第一层是一氧化物层,具有高于1.5的折射率;第二层是一氧化物层,具有介于1.3~1.5的折射率;第三层是一透明传导层,具有介于1.8~2.5的折射率,且具有介于200~10000欧姆/单位面积的阻抗值;第四层是一保护层,具有介于1.3~1.5的折射率,其厚度至少为0.1微米(μm),且硬度通过9H的ASTM-D3363国际检验标准。Based on the above-mentioned main purpose, the present invention provides a high light transmittance touch screen, comprising a substrate and a first anti-reflection coating layer structure coated on the front of the substrate, the preferred mode of the layer structure is to design the refractive index It is a four-layer structure of high, low, high, and low (counting from the side adjacent to the substrate), and the four-layer structure is called the first to fourth layers. The first layer is an oxide layer with a refractive index higher than 1.5; the second layer is an oxide layer with a refractive index between 1.3 and 1.5; the third layer is a transparent conductive layer with a refractive index between 1.8 and A refractive index of 2.5, and has an impedance value between 200-10000 ohms/unit area; the fourth layer is a protective layer, has a refractive index between 1.3-1.5, has a thickness of at least 0.1 microns (μm), and a hardness Passed the ASTM-D3363 international inspection standard of 9H.

此外,基于上述另一目的,本发明提供一种高透光率触控屏,是在基板的反面涂布一第二抗反射涂布层结构,其中该结构的优选方式是将其折射率设计为高、低、高的三层结构(从邻近于基板的一侧算起),且该三层结构称为第八~第十层。第八层等同于第一层的折射率;第九层等同于第二层的折射率;第十层等同于第一层的折射率,且具有10~105欧姆/单位面积的阻抗值。In addition, based on the above another purpose, the present invention provides a high light transmittance touch screen, which is to coat a second anti-reflection coating layer structure on the back surface of the substrate, wherein the preferred mode of the structure is to design its refractive index It is a three-layer structure of high, low, and high (counting from the side adjacent to the substrate), and the three-layer structure is called the eighth to tenth layers. The eighth layer has the same refractive index as the first layer; the ninth layer has the same refractive index as the second layer; the tenth layer has the same refractive index as the first layer, and has an impedance value of 10-10 5 ohms/unit area.

另外,本发明所提供的一种高透光率触控屏,在仅基板正面具有四层的反射结构下,还可以通过将基板正/反面浸酸或酸蚀的方式,使基板表面呈粗糙状从而具有抗炫光的效果;另外也可以在上述四层反射结构的最外层(即保护层)添加微粒(particle),从而达到抗炫光的效果。当然也可以在第四层表面,或是在第三层及第四层之间另外形成一第五层(抗炫光层)。In addition, the touch screen with high light transmittance provided by the present invention can also make the surface of the substrate rough by dipping or etching the front and back sides of the substrate under the reflective structure with only four layers on the front side of the substrate. shape so as to have an anti-glare effect; in addition, particles can also be added to the outermost layer (ie, the protective layer) of the above-mentioned four-layer reflective structure to achieve an anti-glare effect. Of course, a fifth layer (anti-glare layer) can also be formed on the surface of the fourth layer, or between the third layer and the fourth layer.

综上所述,根据本发明的高透光率触控屏除具备高透光率外,还具有抗磨的特性及防电磁波干扰(EMI)的功能,并且整体的透光率在可见光波长范围内的表现更为稳定。In summary, in addition to high light transmittance, the high light transmittance touch screen according to the present invention also has anti-wear characteristics and anti-electromagnetic interference (EMI) functions, and the overall light transmittance is within the wavelength range of visible light performance is more stable.

附图说明Description of drawings

图1是本发明高透光率触控屏的第一优选实施例的剖视图。FIG. 1 is a cross-sectional view of a first preferred embodiment of a high light transmittance touch screen of the present invention.

图2-1~图2-5是本发明高透光率触控屏的第二优选实施例的剖视图。2-1 to 2-5 are cross-sectional views of the second preferred embodiment of the high transmittance touch screen of the present invention.

图3是本发明高透光率触控屏的第三优选实施例的一状态的剖视图。FIG. 3 is a cross-sectional view of a state of the third preferred embodiment of the high light transmittance touch screen of the present invention.

图6是本发明高透光率触控屏的第三优选实施例的另一状态的剖视图。FIG. 6 is a cross-sectional view of another state of the third preferred embodiment of the high transmittance touch screen of the present invention.

图9是本发明高透光率触控屏的第四优选实施例的剖视图。FIG. 9 is a cross-sectional view of a fourth preferred embodiment of the high light transmittance touch screen of the present invention.

图4、图7、图10~图12是本发明与现有技术的透光率与在可见光波长区段间的关系图。Fig. 4, Fig. 7, Fig. 10 to Fig. 12 are diagrams showing the relationship between the light transmittance and the wavelength range of visible light in the present invention and the prior art.

图5、图8、图13~图15是本发明与现有技术的反射率与在可见光波长区段间的关系图。Fig. 5, Fig. 8, Fig. 13 - Fig. 15 are diagrams showing the relationship between the reflectance and the wavelength range of visible light in the present invention and the prior art.

图16是本发明与现有技术根据ASTM-D1003国际标准以Haze-Gard Plus雾度计所测量出的整体穿透率的关系图。Fig. 16 is a graph showing the relationship between the overall transmittance measured by the Haze-Gard Plus haze meter according to the ASTM-D1003 international standard of the present invention and the prior art.

具体实施方式Detailed ways

有关本发明的优选实施例与技术内容,现结合附图说明如下:Relevant preferred embodiment of the present invention and technical content, now in conjunction with accompanying drawing are described as follows:

首先,请参照图1,在第一实施例中,本发明的高透光率触控屏具有一基板6以及一第一抗反射涂布层结构A。其中,基板6具有一正面7以及一相对于正面7的反面12,在此定义其正面7是指邻近于使用者的那一面,且反面12是指邻近于背光源的那一面,基板6可以是玻璃、塑料或其它透明材质所制成的;第一抗反射涂布层结构A是一种四层结构,包括一第一层1、一第二层2、一第三层3以及一第四层4,并且从邻近于基板6的一侧依次将第一层1、第二层2、第三层3以及第四层4配置在基板6的正面7上,而这些层配置的方式可以利用真空镀膜(vacuum coating)的技术,如溅镀(sputtering)、蒸镀(evaporation)、化学气相沉积(chemical vapordeposition)或其它湿式镀膜技术(other wet coating technologies)而形成。First, please refer to FIG. 1 , in the first embodiment, the high transmittance touch screen of the present invention has a substrate 6 and a first anti-reflection coating layer structure A. As shown in FIG. Wherein, the substrate 6 has a front surface 7 and a reverse surface 12 relative to the front surface 7. It is defined here that the front surface 7 refers to the side adjacent to the user, and the reverse surface 12 refers to the side adjacent to the backlight source. The substrate 6 can be It is made of glass, plastic or other transparent materials; the first anti-reflection coating layer structure A is a four-layer structure, including a first layer 1, a second layer 2, a third layer 3 and a first layer Four layers 4, and the first layer 1, the second layer 2, the third layer 3 and the fourth layer 4 are sequentially arranged on the front surface 7 of the substrate 6 from the side adjacent to the substrate 6, and the configuration of these layers can be Formed by vacuum coating techniques such as sputtering, evaporation, chemical vapor deposition or other wet coating technologies.

第一层1是一氧化物层,具有高于1.5的折射率;而在本实施例中,第一层1的材质例如是五氧化二铌(Nb2O5)。当然,第一层1的材质也可以是选自包括氧化铟锡(ITO)、氧化锑锡(ATO)、铌氧化物(niobium oxide)、钛氧化物(titanium oxide)、钽氧化物(tantalum oxide)及其混合的氧化物(mixtures of these oxide)的族群。The first layer 1 is an oxide layer with a refractive index higher than 1.5; and in this embodiment, the material of the first layer 1 is, for example, niobium pentoxide (Nb 2 O 5 ). Of course, the material of the first layer 1 can also be selected from the group consisting of indium tin oxide (ITO), antimony tin oxide (ATO), niobium oxide, titanium oxide, tantalum oxide ) and their mixed oxides (mixtures of these oxides).

第二层2是一氧化物层,具有介于1.3~1.5的折射率;在本实施例中,第二层2的材质例如是二氧化硅(SiO2)。此外,第二层2的材质也可以是多孔性(porous)、添加氯素(fluorinated)或有机改造(organically modified)的低折射率材质。The second layer 2 is an oxide layer with a refractive index ranging from 1.3 to 1.5; in this embodiment, the material of the second layer 2 is, for example, silicon dioxide (SiO 2 ). In addition, the material of the second layer 2 can also be porous, fluorinated or organically modified low refractive index material.

第三层3是一透明传导层(transparent conductive layer),具有介于1.8~2.5的折射率,并且具有介于200~10000欧姆/单位面积(Ohm/square)的阻抗值;在本实施例中,第三层3是连接到触控面板边缘的电极图案(electrode pattern)上;另外,第三层3的材质例如是在氧化铟锡(ITO)中添加五氧化二铌(Nb2O5)。当然,第三层3的材质也可以是氧化锑锡(ATO)、氧化铟锡(ITO)、二氧化锡(SnO2)、二氧化锌(ZnO2)、三氧化二铟(In2O3)及其组合,在此,氧化铟锡(ITO)是指纯ITO(pure ITO)。然而,上述的添加物(五氧化二铌(Nb2O5))可以根据需求决定添加与否,且添加的含量约占整体的0.1~20%。The third layer 3 is a transparent conductive layer with a refractive index between 1.8-2.5 and an impedance value between 200-10000 Ohm/unit area (Ohm/square); in this embodiment , the third layer 3 is connected to the electrode pattern on the edge of the touch panel; in addition, the material of the third layer 3 is, for example, niobium pentoxide (Nb 2 O 5 ) added to indium tin oxide (ITO) . Of course, the material of the third layer 3 can also be antimony tin oxide (ATO), indium tin oxide (ITO), tin dioxide (SnO 2 ), zinc dioxide (ZnO 2 ), indium trioxide (In 2 O 3 ) and combinations thereof, where indium tin oxide (ITO) refers to pure ITO (pure ITO). However, the above-mentioned additive (Nb 2 O 5 ) can be added or not according to requirements, and the added content accounts for about 0.1-20% of the whole.

第四层4是一保护层,具有介于1.3~1.5的折射率(refractiveindex),该层的厚度至少是0.1微米(μm),并且该层的硬度通过9H的ASTM-D3363国际检验标准,并可以通过至少1000次美国陆军军规抗刮伤标准(military standard MIL-C-675C)的抗刮测试;在本实施例中,第四层4的材质可以是二氧化硅(SiO2)或者有机改造硅土(organically modified silica)。The fourth layer 4 is a protective layer with a refractive index between 1.3 and 1.5, the thickness of the layer is at least 0.1 micrometer (μm), and the hardness of the layer passes the ASTM-D3363 international inspection standard of 9H, and Can pass at least 1,000 scratch resistance tests of the U.S. Army military standard (military standard MIL-C-675C); in this embodiment, the material of the fourth layer 4 can be silicon dioxide (SiO 2 ) or organic Modified silica (organically modified silica).

从上述可知,本发明在触控屏的基板6正面7涂布一种四层结构的抗反射涂布层,这些膜层的折射率从邻近基板6的一侧算起,依次设计为高、低、高、低(表示为H、L、H、L),如此可以使本发明的触控屏的透光率可达到ASTM-D1003 92%以上。另外,由于将这些膜层的最外层定义为一保护层,并通过此保护层的设计,从而可以强化其表面的抗磨性。As can be seen from the above, the present invention coats a four-layer anti-reflection coating layer on the front surface 7 of the substrate 6 of the touch screen. Low, high, low (expressed as H, L, H, L), so that the light transmittance of the touch screen of the present invention can reach more than 92% of ASTM-D1003. In addition, because the outermost layer of these film layers is defined as a protective layer, and through the design of the protective layer, the abrasion resistance of the surface can be enhanced.

接着,请参照图2-1~图2-5,是本发明的第二优选实施例,有五种状态,如图2-1所示,在上述四层的抗反射结构下,还可以通过将基板6的双面以浸酸或酸蚀的方式,使基板6的正、反面7、12的表面粗糙化,从而具有抗炫光(anti-glare)的效果。当然,并不局限于上述双面浸酸或酸蚀的方式,也可以如图2-2所示,仅在接近使用者的基板6的正面7形成一粗糙的表面。另外,如图2-3所示,也可以在上述四层抗反射结构的最外层(即第四层4)添加若干个微粒(particle)13,使该微粒13的折射率变为1.5~2.5,从而达到抗炫光的效果,而上述微粒13的直径是介于0.01~4微米(μm)之间。另外,也可以在上述四层的抗反射结构下,如图2-4,在抗反射结构的第四层4上另外喷涂一第五层(抗炫光层)5,该第五层(抗炫光层)5采用喷涂的方式形成,并且平均粗糙度(roughness)介于0.01~0.4微米(μm)之间,可以使其表面粗糙化,从而具有抗炫光的效果。当然,上述所提及的第五层(抗炫光层)5,并不限定在四层的抗反射结构都制作完成后才形成,也可以如图2-5所示,在制作第三层3后,即喷涂该第五层(抗炫光层)5,最后再形成第四层4。Next, please refer to Figure 2-1 to Figure 2-5, which are the second preferred embodiment of the present invention. There are five states, as shown in Figure 2-1, under the above-mentioned four-layer anti-reflection structure, you can also The two sides of the substrate 6 are pickled or etched to roughen the surfaces of the front and back sides 7, 12 of the substrate 6, thereby having an anti-glare effect. Of course, the method is not limited to the above-mentioned method of double-sided pickling or acid etching. As shown in FIG. 2-2 , a rough surface can be formed only on the front side 7 of the substrate 6 close to the user. In addition, as shown in Figures 2-3, it is also possible to add several particles (particles) 13 to the outermost layer (that is, the fourth layer 4) of the above-mentioned four-layer antireflection structure, so that the refractive index of the particles 13 becomes 1.5 to 1.5. 2.5, so as to achieve the anti-glare effect, and the diameter of the particles 13 is between 0.01-4 microns (μm). In addition, it is also possible to spray a fifth layer (anti-glare layer) 5 on the fourth layer 4 of the anti-reflection structure under the above-mentioned four-layer anti-reflection structure, as shown in Figure 2-4. The glare layer) 5 is formed by spraying, and the average roughness (roughness) is between 0.01-0.4 microns (μm), which can roughen the surface and thus have an anti-glare effect. Certainly, the fifth layer (anti-glare layer) 5 mentioned above is not limited to be formed after the anti-reflection structures of the four layers are all fabricated, and may also be formed after the third layer is fabricated as shown in Fig. 2-5. After 3, the fifth layer (anti-glare layer) 5 is sprayed, and finally the fourth layer 4 is formed.

接着,请参照图3,是本发明的第三优选实施例的其中一种状态,该实施例与上述实施例不同之处在于:增设一第二抗反射涂布层结构B,包括一第八层8、一第九层9以及一第十层10,并且从邻近于基板6的一侧依次将第八层8、第九层9以及第十层10配置在基板6的反面12上,这些层同样可以利用真空镀膜的技术,如溅镀、蒸镀、化学气相沉积或者其它湿式镀膜技术而形成。Next, please refer to Fig. 3, which is one of the states of the third preferred embodiment of the present invention. layer 8, a ninth layer 9, and a tenth layer 10, and the eighth layer 8, the ninth layer 9, and the tenth layer 10 are sequentially arranged on the reverse surface 12 of the substrate 6 from the side adjacent to the substrate 6, these Layers can also be formed using vacuum coating techniques such as sputtering, evaporation, chemical vapor deposition or other wet coating techniques.

第八层8的折射率等同于第一层1;第九层的折射率等同于第二层2;第十层10的折射率等同于第三层3,且具有10~105欧姆/单位面积的阻抗值,并连接在面板边缘的导体(conductor)上。在本实施例中,第十层10可以是一氧化铟锡(ITO)层,并且具有100~700欧姆/单位面积(ohm/square)的阻抗值。The refractive index of the eighth layer 8 is equal to that of the first layer 1; the refractive index of the ninth layer is equal to that of the second layer 2; the refractive index of the tenth layer 10 is equal to that of the third layer 3, and has 10-10 5 ohms/unit The impedance value of the area and is connected to the conductor (conductor) at the edge of the panel. In this embodiment, the tenth layer 10 may be an indium tin oxide (ITO) layer, and has an impedance value of 100˜700 ohm/unit area (ohm/square).

从上述可知,本发明在触控屏的基板6的反面12涂布一种三层结构的抗反射涂布层,这些膜层的折射率从邻近基板6的一侧算起,依次设计为高、低、高(表示为H、L、H),以使本发明的触控屏可以进一步减少反射并增加透光率,而第十层10的设计还可以具有防电磁波干扰(EMI)的功能。As can be seen from the above, the present invention coats a three-layer structure anti-reflection coating layer on the reverse side 12 of the substrate 6 of the touch screen, and the refractive index of these film layers is calculated from the side adjacent to the substrate 6, and is successively designed to be high. , low, high (expressed as H, L, H), so that the touch screen of the present invention can further reduce reflection and increase light transmittance, and the design of the tenth layer 10 can also have the function of preventing electromagnetic interference (EMI) .

在上述双层ITO加一保护层的结构下,其透光率及反射率的表现可以参照图4以及图5,波长在431~692nm的区段,其透光率平均都可以增至92%以上;波长在440~700nm的区段,其反射率都低于10%。Under the structure of the above-mentioned double-layer ITO plus a protective layer, the performance of its light transmittance and reflectance can refer to Figure 4 and Figure 5. In the wavelength range of 431-692nm, the average light transmittance can be increased to 92%. above; the reflectance is lower than 10% in the wavelength range of 440-700nm.

然后,请参照图6,是本发明的第三优选实施例的另一实施状态,相对于图3其差异在于在抗反射结构的第四层4上同样可以喷涂一第五层(抗炫光层)5。当然,第五层(抗炫光层)5也可以如上述那样,配置在第三层3以及第四层4之间(未图示)。Then, please refer to Fig. 6, which is another implementation state of the third preferred embodiment of the present invention, its difference with respect to Fig. 3 is that on the fourth layer 4 of the anti-reflection structure, a fifth layer (anti-glare) can be sprayed equally layer) 5. Of course, the fifth layer (anti-glare layer) 5 may also be disposed between the third layer 3 and the fourth layer 4 as described above (not shown).

而在上述双层ITO加一保护层以及一第五层(抗炫光层)5的结构下,其透光率以及反射率的表现可以参照图7及图8,尤其可以将透光率大于等于90%以及反射率在小于等于10%的区段调整为较为平滑的曲线。And under the structure of the above-mentioned double-layer ITO plus a protective layer and a fifth layer (anti-glare layer) 5, the performance of its light transmittance and reflectance can refer to Figure 7 and Figure 8, especially the light transmittance can be greater than It is equal to 90% and the reflectivity is adjusted to a smoother curve in the range of less than or equal to 10%.

接着,请参照图9,是本发明的第四优选实施例,该实施例与第三优选实施例不同之处在于,第二抗反射涂布层结构B还可以包括有第十一层11,其折射率等同于第四层4,并且此第十一层11是一配置在第十层10上的保护层。Next, please refer to FIG. 9, which is the fourth preferred embodiment of the present invention. The difference between this embodiment and the third preferred embodiment is that the second anti-reflection coating layer structure B may also include an eleventh layer 11, Its refractive index is equal to that of the fourth layer 4 , and this eleventh layer 11 is a protective layer arranged on the tenth layer 10 .

从上述可知,本发明的触控屏中的第二抗反射涂布层结构B还可以增加为四层结构,其折射率相对于第一抗反射涂布层结构(HLHL)A恰好为镜射(mirror)配置的设计,从而可以使整体的透光率在可见光的波长范围内的表现可以更为稳定。As can be seen from the above, the second anti-reflection coating layer structure B in the touch screen of the present invention can also be increased to a four-layer structure, and its refractive index is just a mirror image with respect to the first anti-reflection coating layer structure (HLHL) A (mirror) configuration design, so that the performance of the overall light transmittance in the wavelength range of visible light can be more stable.

本发明所能达到的功效还可以进一步从下文以及对应的图式中获得证明。首先说明透光率的比较,对单纯的玻璃基板来说,波长在380~780nm的可见光范围内,其整体的透光率是介于80~90%的之间(如图10所示);玻璃基板涂布双层ITO后,波长在442~625nm的区段,其透光率可以增至90%以上,但波长小于407nm、大于747nm的区段,透光率则下降至80%以下(如图11所示);基于上述再进一步涂布本发明的保护层后,波长在431~692nm的区段,其透光率平均都可以增至92%以上(如图4所示);换言之,本发明在涂布了保护层后,除了增加抗磨的效果外,透光率在92%以上的区段范围,相对于仅涂布双层ITO的玻璃基板的范围更广;接着,请参照图7,本发明再加上第五层(抗炫光层)5时,尤其可以将透光率在90%以上的区段调整为较为平滑的曲线;换言之,可以进一步稳定该触控屏在显示上的表现。而上述图形其透光率在可见光区段间的整体比较,可以参照图12。The effect that the present invention can achieve can also be further proved from the following and corresponding drawings. Firstly, the comparison of light transmittance is explained. For a simple glass substrate, the overall light transmittance is between 80% and 90% in the visible light range with a wavelength of 380-780nm (as shown in Figure 10); After the glass substrate is coated with double-layer ITO, the light transmittance can be increased to more than 90% in the wavelength range of 442-625nm, but the light transmittance in the wavelength range of less than 407nm and greater than 747nm drops to below 80% ( As shown in Figure 11); after further coating the protective layer of the present invention based on the above, the light transmittance can be increased to more than 92% on average in the segment of 431-692nm wavelength (as shown in Figure 4); in other words , after the present invention is coated with the protective layer, in addition to increasing the anti-abrasion effect, the range of light transmittance above 92% is wider than that of the glass substrate coated with double-layer ITO; then, please Referring to Fig. 7, when the present invention adds the fifth layer (anti-glare layer) 5, especially the section with light transmittance above 90% can be adjusted to a relatively smooth curve; in other words, the touch screen can be further stabilized performance on display. For the overall comparison of the light transmittance of the above graph in the visible light range, refer to FIG. 12 .

接着,请参照图5、图13~图15,这些图式的Y轴另外用反射率来表示,单纯采用玻璃基板,并且波长在可见光范围内,其整体的反射率都在10%以下(如图13所示);在玻璃基板上涂布双层ITO后,波长在480~580nm的区段,其反射率下降至5%以下,但波长小于440nm、大于660nm的区段,反射率则上升10%以上(如图14所示);在更进一步涂布本发明的保护层后,反射率低于10%以下的区段相对于单纯涂布双层ITO的玻璃基板,其可以增至波长440~700nm的范围(如图5所示);本发明再加上第五层(抗炫光层)5时,尤其可以将反射率在10%以下的区段调整为较为平滑的曲线,进而提高触控屏在显示上的表现(如图8所示)。而上述图形其反射率在可见光区段的整体比较,可以参照图15。Next, please refer to Fig. 5, Fig. 13-Fig. 15. The Y-axis of these figures is represented by reflectance. If only a glass substrate is used, and the wavelength is in the visible light range, the overall reflectance is below 10% (such as As shown in Figure 13); after coating double-layer ITO on the glass substrate, the reflectance in the wavelength range of 480-580nm drops below 5%, but the reflectance in the wavelength range of less than 440nm and greater than 660nm increases More than 10% (as shown in Figure 14); after further coating the protective layer of the present invention, the reflectivity of the section below 10% can be increased to the wavelength The scope of 440~700nm (as shown in Figure 5); When the present invention adds the 5th layer (anti-glare layer) 5 again, especially can adjust the section of reflectance below 10% to be comparatively smooth curve, and then Improve the performance of the touch screen on the display (as shown in Figure 8). For the overall comparison of the reflectance of the above graph in the visible light range, refer to FIG. 15 .

此外,请参照下表一以及图16,是表示根据ASTM-D 1003国际标准用Haze-Gard Plus雾度计(该雾度计是TFT-LCD穿透性测量例如全透过率、穿透性雾度、透视性清晰度的标准仪器)所测量出的整体穿透率,由结果可以看出本发明在多了一层保护层或第五层(抗炫光层)5的架构下相对于单纯是玻璃基板或者双层ITO的架构下,其整体穿透率确实是优于现有技术。In addition, please refer to the following Table 1 and Figure 16, which shows the Haze-Gard Plus haze meter used according to the ASTM-D 1003 international standard (the haze meter is used to measure the penetration of TFT-LCD, such as total transmittance, transmittance The overall transmittance measured by the standard instrument of haze and perspective clarity), it can be seen from the results that the present invention has an additional layer of protective layer or the fifth layer (anti-glare layer) Under the structure of pure glass substrate or double-layer ITO, its overall penetration rate is indeed better than that of the existing technology.

表一   玻璃基板(素玻璃)2.8m/m   双层ITO2.8m/m   双层ITO+单层保护层2.8m/m  双层ITO+单层保护层+第五层(抗炫光层)2.8m/m   T   92.2   93   93.7  93.2 Table I Glass substrate (plain glass) 2.8m/m Double layer ITO2.8m/m Double-layer ITO+ single-layer protective layer 2.8m/m Double-layer ITO + single-layer protective layer + fifth layer (anti-glare layer) 2.8m/m T 92.2 93 93.7 93.2

以上所述仅为本发明的优选实施例而已,并不用于限制本发明。在上述实施例中,本发明可以有各种更改和变化。凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,例如在基板6的正面7或是反面12,依据上述形成四层抗反射结构的基本原则,重复形成更多层的抗反射层,均应包含在本发明的保护范围之内。The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. In the above-described embodiments, various modifications and changes are possible to the present invention. Within the spirit and principles of the present invention, any modifications, equivalent replacements, improvements, etc., such as on the front side 7 or the back side 12 of the substrate 6, are repeated to form more The anti-reflective layer of the layer should be included in the protection scope of the present invention.

Claims (16)

1. high light transmittance ratio touch screen is characterized in that comprising:
One substrate has a positive and reverse side with respect to described front; And
One first reflection coating layer structure, comprise a ground floor, a second layer, one the 3rd layer and one the 4th layer, and outside a side direction that is adjacent to described substrate with described ground floor, the described second layer, described the 3rd layer and described the 4th layer arranged in order on the described front of described substrate, wherein:
Described ground floor is the monoxide layer, has to be higher than 1.5 refractive index;
The described second layer is the monoxide layer, has the refractive index between 1.3~1.5;
Described the 3rd layer is a transparent conductive layer, has the refractive index between 1.8~2.5, and has the resistance value between 200~10000 ohm/unit area;
Described the 4th layer is a protective seam, has the refractive index between 1.3~1.5, and described the 4th layer thickness is at least 0.1 micron (μ m), and described the 4th layer hardness is by the international test stone of the ASTM-D3363 of 9H.
2. high light transmittance ratio touch screen according to claim 1 is characterized in that: the material of described ground floor is to be selected from niobium pentaoxide (Nb 2O 5), tin indium oxide (ITO), antimony tin (ATO), niobium oxide (niobium oxide), titanium oxide (titanium oxide), tantalum pentoxide (tantalum oxide) and the oxide (mixtures of these oxide) that mixes thereof.
3. high light transmittance ratio touch screen according to claim 1 is characterized in that: the material of the described second layer is silicon dioxide (SiO 2).
4. high light transmittance ratio touch screen according to claim 1 is characterized in that: the material of the described second layer is the low-refraction material of poriness (porous), interpolation chlorine element (fluorinated) or organic transformation (organically modified).
5. high light transmittance ratio touch screen according to claim 1 is characterized in that: described the 3rd layer material is that tin indium oxide (ITO) adds niobium pentaoxide (Nb 2O 5) additive.
6. high light transmittance ratio touch screen according to claim 1 is characterized in that: described the 3rd layer optional autoxidation antimony of material tin (ATO), tin indium oxide (ITO), tin ash (SnO 2), zinc oxide (ZnO 2), indium sesquioxide (In 2O 3) and combination.
7. high light transmittance ratio touch screen according to claim 1 is characterized in that: described the 4th layer material is silicon dioxide (SiO 2) or organic transformation tripoli (organicallymodified silica).
8. high light transmittance ratio touch screen according to claim 1, it is characterized in that: the described first reflection coating layer structure also comprises a layer 5, described layer 5 is to be configured in the anti-photosphere (anti-glare layer) of dazzling of one on described the 4th layer, described layer 5 (the anti-photosphere of dazzling) has a rough surface (rough surface), and mean roughness (roughness) is between 0.01~0.4 micron (μ m).
9. high light transmittance ratio touch screen according to claim 1 is characterized in that: the described front of described substrate and described reverse side or only described front are a roughened surface.
10. high light transmittance ratio touch screen according to claim 1, it is characterized in that: also further be added with a plurality of particulates (particle) in described the 4th layer, the diameter of these particulates makes described particulate have 1.5~2.5 refractive index between 0.01~4 micron (μ m).
11. high light transmittance ratio touch screen according to claim 1, it is characterized in that: also comprise a layer 5, described layer 5 is one to be configured in the anti-photosphere of dazzling between described the 3rd layer and described the 4th layer, described layer 5 (the anti-photosphere of dazzling) has a rough surface (roughsurface), and mean roughness (roughness) is between 0.01~0.4 micron (μ m).
12. high light transmittance ratio touch screen according to claim 1, it is characterized in that: also comprise one second reflection coating layer structure, comprise one the 8th layer, one the 9th layer and 1 the tenth layer, and outside a side direction that is adjacent to described substrate with described the 8th layer, the arranged in order of described the 9th layer and the described ten layer on the described reverse side of described substrate, wherein:
Described the 8th layer refractive index is equal to described ground floor;
Described the 9th layer refractive index is equal to the described second layer;
The described ten layer refractive index is equal to described the 3rd layer, and has 10~10 5The resistance value of ohm/unit area (ohm/square).
13. high light transmittance ratio touch screen according to claim 12 is characterized in that: the described ten layer is a tin indium oxide (ITO) layer, and has the resistance value of 100~700 ohm/unit area (ohm/square).
14. high light transmittance ratio touch screen according to claim 12; it is characterized in that: the described second reflection coating layer structure also comprises an eleventh floor; the refractive index of described eleventh floor is equal to described the 4th layer, and described eleventh floor is one to be configured in the protective seam on the described ten layer.
15. high light transmittance ratio touch screen according to claim 12, it is characterized in that: also comprise a layer 5, described layer 5 is to be configured in the anti-photosphere of dazzling of one on described the 4th layer, described layer 5 (the anti-photosphere of dazzling) has a rough surface (rough surface), and mean roughness (roughness) is between 0.01~0.4 micron (μ m).
16. high light transmittance ratio touch screen according to claim 12, it is characterized in that: also comprise a layer 5, described layer 5 is to be configured in the anti-photosphere of dazzling of one between described the 3rd layer and described the 4th layer, described layer 5 (the anti-photosphere of dazzling) has a rough surface (rough surface), and mean roughness (roughness) is between 0.01~0.4 micron (μ m).
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CN101452351B (en) * 2007-12-03 2010-11-17 义强科技股份有限公司 Touch device with high light transmittance
CN101978343A (en) * 2008-03-26 2011-02-16 京瓷株式会社 Touch panel and touch panel display apparatus
CN102662542A (en) * 2012-03-27 2012-09-12 深圳市宝明科技股份有限公司 Novel metal-electrode-layer-free non-overlapped integral capacitive touch screen and manufacturing method thereof
CN102736764A (en) * 2011-04-04 2012-10-17 宸鸿科技(厦门)有限公司 Touch panel and manufacturing method thereof
CN102774084A (en) * 2012-05-02 2012-11-14 普发玻璃(深圳)有限公司 Uvioresistant antireflective coated layer with heat insulating function
CN102830880A (en) * 2012-08-21 2012-12-19 深圳市宝明科技股份有限公司 Non-overlapped integral capacitive touch screen with ITO (indium tin oxide) layer and manufacturing method of novel non-overlapped integral capacitive touch screen
CN103373820A (en) * 2012-04-11 2013-10-30 钜永真空科技股份有限公司 Colored glass and its manufacturing process
CN104571721A (en) * 2015-02-17 2015-04-29 合肥鑫晟光电科技有限公司 TCO (transparent conductive oxide) pattern blanking structure, touch panel and display device
US9285922B2 (en) 2011-09-09 2016-03-15 Tpk Touch Solutions (Xiamen) Inc. Touch stack-up structure
CN110275228A (en) * 2019-06-03 2019-09-24 合肥昊泰新材料科技有限责任公司 A kind of stealthy film and preparation method thereof
CN110442268A (en) * 2019-08-06 2019-11-12 江西沃格光电股份有限公司 Flexible touch screen and its manufacturing method, display device

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101452351B (en) * 2007-12-03 2010-11-17 义强科技股份有限公司 Touch device with high light transmittance
CN101978343A (en) * 2008-03-26 2011-02-16 京瓷株式会社 Touch panel and touch panel display apparatus
CN102736764B (en) * 2011-04-04 2015-08-12 宸鸿科技(厦门)有限公司 Contact panel and manufacture method thereof
CN102736764A (en) * 2011-04-04 2012-10-17 宸鸿科技(厦门)有限公司 Touch panel and manufacturing method thereof
US9285922B2 (en) 2011-09-09 2016-03-15 Tpk Touch Solutions (Xiamen) Inc. Touch stack-up structure
CN102662542A (en) * 2012-03-27 2012-09-12 深圳市宝明科技股份有限公司 Novel metal-electrode-layer-free non-overlapped integral capacitive touch screen and manufacturing method thereof
CN103373820A (en) * 2012-04-11 2013-10-30 钜永真空科技股份有限公司 Colored glass and its manufacturing process
CN102774084A (en) * 2012-05-02 2012-11-14 普发玻璃(深圳)有限公司 Uvioresistant antireflective coated layer with heat insulating function
CN102830880A (en) * 2012-08-21 2012-12-19 深圳市宝明科技股份有限公司 Non-overlapped integral capacitive touch screen with ITO (indium tin oxide) layer and manufacturing method of novel non-overlapped integral capacitive touch screen
CN104571721A (en) * 2015-02-17 2015-04-29 合肥鑫晟光电科技有限公司 TCO (transparent conductive oxide) pattern blanking structure, touch panel and display device
CN104571721B (en) * 2015-02-17 2018-11-23 合肥鑫晟光电科技有限公司 A kind of transparent conductive oxide pattern blanking structure, touch panel and display device
US10216299B2 (en) 2015-02-17 2019-02-26 Boe Technology Group Co., Ltd. Transparent conductive oxide pattern blanking structure, touch panel and display device
CN110275228A (en) * 2019-06-03 2019-09-24 合肥昊泰新材料科技有限责任公司 A kind of stealthy film and preparation method thereof
CN110442268A (en) * 2019-08-06 2019-11-12 江西沃格光电股份有限公司 Flexible touch screen and its manufacturing method, display device

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